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WO2016002815A1 - Procédé de production d'un élément céramique et d'un outil de support - Google Patents

Procédé de production d'un élément céramique et d'un outil de support Download PDF

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Publication number
WO2016002815A1
WO2016002815A1 PCT/JP2015/068911 JP2015068911W WO2016002815A1 WO 2016002815 A1 WO2016002815 A1 WO 2016002815A1 JP 2015068911 W JP2015068911 W JP 2015068911W WO 2016002815 A1 WO2016002815 A1 WO 2016002815A1
Authority
WO
WIPO (PCT)
Prior art keywords
support
base material
ceramic
ceramic coating
ceramic member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/068911
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English (en)
Japanese (ja)
Inventor
靖隆 古賀
敬司 広瀬
直貴 樋口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Publication of WO2016002815A1 publication Critical patent/WO2016002815A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Definitions

  • the present invention relates to a method for producing a ceramic member in which a ceramic film is formed on a substrate and a support.
  • Ceramic members in which a ceramic film is formed on a substrate by a CVD method are used in various fields because the substrate can be protected with the ceramic film.
  • Ceramic parts that use graphite with excellent workability as the base material and whose surface is protected by a ceramic coating are used for semiconductor manufacturing equipment, single crystal pulling, etc., for the purpose of preventing reaction of the base material due to the ceramic coating and improving wear resistance. It is used in various fields such as equipment and structural ceramic parts.
  • the CVD method it is necessary to support the base material, and a ceramic coating cannot be formed at the support point, so that a portion where the base material is exposed is formed. When the substrate is exposed and used in a reactive environment, there is a problem that the support point portion is consumed and deteriorated.
  • Various solutions have been made to solve such problems.
  • a ceramic member is manufactured by supporting a ceramic substrate at the tip and forming a ceramic member coating on the ceramic substrate in a reaction furnace so as not to form an exposed support point of the substrate.
  • a ceramic base material support having a core material made of graphite and a support film having a pyrolytic carbon layer interposed on a surface including at least a tip portion is used.
  • the ceramic substrate support has a graphite core, the surface of the graphite is coated with pyrolytic carbon, and the surface is further coated with the support coating. . Since pyrolytic carbon has no pores, when the support coating is coated, the support coating is not formed by penetrating into the pyrolytic carbon layer, thereby reducing the adhesive force between the support coating and the pyrolytic carbon layer. be able to.
  • burrs of the ceramic coating are generated when the support is separated from the base material, which tends to remain as harmful protrusions that cause scratches and particles. Further, a minute crack is generated when the support and the substrate are separated. The minute crack rarely reaches the base material of the ceramic member and causes the life of the ceramic member to be shortened. For this reason, a ceramic member free from burrs or minute cracks around the support point is desired.
  • an object of the present invention is to provide a method for manufacturing a ceramic member and a support tool capable of preventing the generation of burrs or minute cracks around a support point when the ceramic member is manufactured.
  • the method for producing a ceramic member of the present invention for solving the above-mentioned problem is the method for producing a ceramic member in which a ceramic film is formed on the surface of the base material by a CVD method after supporting the base material using a support.
  • the said support tool consists of a support part which contacts the said surface of the said base material, and a cover part which surrounds the said support part so that it may have a clearance gap with respect to the said surface of the said base material.
  • a base material is supported using a support, and in this state, a ceramic film is formed on the surface of the base material by a CVD method.
  • a support has a support part which contacts the surface of a base material, and a cover part which surrounds a support part so that it may have a clearance gap with respect to the surface of a base material.
  • the method for producing a ceramic member of the present invention is as follows.
  • the said support tool the said support part and the said cover part are comprised integrally. Since the support part is configured integrally with the support part and the cover part, when the base material is placed on the support tool, if the base material is inclined and placed, the base material comes first from the cover part. Contact. For example, when the base material is a flat surface, the support portion can come into contact with the base material only when the mounting surface formed by the tips of the plurality of (for example, three points) support portions and the base material are parallel to each other. For this reason, it is hard to damage the front-end
  • the distance between the outermost edge of the support part and the outermost edge of the cover part is 4 to 20 times the gap. Since the distance between the support part and the cover part in the support tool is four times or more the gap interval, the source gas that has entered from the gap can hardly reach the contact point between the support part and the substrate. In addition, it is possible to make it difficult for the support portion and the base material to adhere to each other. Moreover, since the opening part in which the ceramic film is not formed in a base material can be made small as the distance of a support part and a cover part is 20 times or less of the space
  • the ceramic coating is SiC.
  • SiC SiC
  • the base material or the core material of the base material is made of graphite. Since graphite has a cleavage plane in the crystal, if the base material or the core material of the base material is made of graphite, it can be easily processed, and ceramic members having various shapes can be obtained. That the core material of a base material is graphite includes the case where most of a base material consists of graphite, for example, the ceramic film is formed in graphite.
  • the method for manufacturing the ceramic member is repeated a plurality of times by changing the position of the support relative to the base material.
  • the method for producing a ceramic member of the present invention a plurality of times while changing the position of the support relative to the substrate, exposure of the central portion of the substrate can be prevented.
  • the base material is graphite
  • the base material made of graphite is exposed in the vicinity where the support portion abuts.
  • a second ceramic coating is formed, so that two layers of exposed graphite base material are formed. Can be covered with a ceramic coating on the eyes.
  • the support of the present invention for solving the above problems is a support for supporting a ceramic member when a ceramic coating is formed on the surface of a base material by a CVD method, and is in contact with the surface of the base material. And a cover portion surrounding the support portion so as to have a gap with respect to the surface of the substrate.
  • the cover portion can prevent the entry of the CVD source gas into the support portion, and can prevent the support portion and the base material from being fixed by the formed ceramic coating. it can.
  • a cover part is arrange
  • the support tool includes the support part that supports the base material and the cover part that surrounds the support part so as to have a gap between the base material. Intrusion of the source gas can be prevented. For this reason, it can prevent that a support part and a base material adhere by the formed ceramic membrane
  • or (C) is process drawing which shows the manufacturing method of the ceramic member which concerns on 1st Embodiment.
  • (A) is a perspective view of the support, and (B) is a cross-sectional view taken along the line BB in (A).
  • (A)-(D) are the perspective view and sectional drawing which show the modification of a support tool.
  • (A), (B) is sectional drawing and the bottom view of the site
  • or (C) is process drawing which shows the manufacturing method of the ceramic member which concerns on 2nd Embodiment. It is the front view seen from VI direction in Drawing 5 (A).
  • the method for producing a ceramic member of the present invention is the method for producing a ceramic member in which a ceramic film is formed on the surface of the base material by a CVD method after the base material is supported using the support tool. It consists of the support part which contacts the said surface of material, and the cover part which surrounds the said support part so that it may have a clearance gap with respect to the said surface of the said base material.
  • a base material is supported using a support, and in this state, a ceramic film is formed on the surface of the base material by a CVD method.
  • a support has a support part which contacts the surface of a base material, and a cover part which surrounds a support part so that it may have a clearance gap with respect to the surface of a base material.
  • the method for producing a ceramic member of the present invention is as follows.
  • the said support tool the said support part and the said cover part are comprised integrally. Since the support part is configured integrally with the support part and the cover part, when the base material is placed on the support tool, if the base material is inclined and placed, the base material comes first from the cover part. Contact. For example, when the base material is a flat surface, the support portion can come into contact with the base material only when the mounting surface formed by the tips of the plurality of (for example, three points) support portions and the base material are parallel to each other. For this reason, it is hard to damage the front-end
  • the distance between the outermost edge of the support part and the outermost edge of the cover part is 4 to 20 times the gap. Since the distance between the support part and the cover part in the support tool is four times or more the gap interval, the source gas that has entered from the gap can hardly reach the contact point between the support part and the substrate. In addition, it is possible to make it difficult for the support portion and the base material to adhere to each other. Moreover, since the opening part in which the ceramic film is not formed in a base material can be made small as the distance of a support part and a cover part is 20 times or less of the space
  • the ceramic coating is SiC.
  • SiC SiC
  • the base material or the core material of the base material is made of graphite. Since graphite has a cleavage plane in the crystal, if the base material or the core material of the base material is made of graphite, it can be easily processed, and ceramic members having various shapes can be obtained. That the core material of a base material is graphite includes the case where most of a base material consists of graphite, for example, the ceramic film is formed in graphite.
  • the method for manufacturing the ceramic member is repeated a plurality of times by changing the position of the support relative to the base material.
  • the method for producing a ceramic member of the present invention a plurality of times while changing the position of the support relative to the substrate, exposure of the central portion of the substrate can be prevented.
  • the base material is graphite
  • the base material made of graphite is exposed in the vicinity where the support portion abuts.
  • a second ceramic coating is formed to form two layers of exposed graphite base material. Can be covered with a ceramic coating on the eyes.
  • the support of the present invention is a support for supporting a ceramic member when a ceramic film is formed on the surface of a substrate by a CVD method, the support being in contact with the surface of the substrate, and the base And a cover portion surrounding the support portion so as to have a gap with respect to the surface of the material.
  • the cover portion can prevent the entry of the CVD source gas into the support portion, and can prevent the support portion and the base material from being fixed by the formed ceramic coating. it can.
  • a cover part is arrange
  • the ceramic member manufacturing method and the support 30 according to the first embodiment will be described.
  • the ceramic member manufacturing method of the first embodiment the ceramic member 10 ⁇ / b> A is manufactured by forming the ceramic coating 21 on the base material 20 using the support 30.
  • the base material 20 is supported by a support tool 30.
  • the number of the support tools 30 is not particularly limited. If the center of gravity of the substrate 20 can be lower than the support surface 322 at the tip of the support portion 32, even one support 30 can be stably formed by the CVD method using the ceramic coating 21 (the first ceramic coating 22 and the second ceramic coating 23). ) Can be formed.
  • the ceramic coating 21 can be formed by the CVD method by arranging the support portion 32 described later so that the area of the support portion 32 is sufficiently large and the center of gravity of the substrate 20 enters the support surface 322 of the support portion 32.
  • the base material 20 is mounted substantially horizontally on a plurality of (three or more) support tools 30 will be described.
  • the substrate 20 is not particularly limited. For example, anything such as metal or ceramic can be used. Ceramic is suitable because it has heat resistance. Among them, ALN, Al 2 O 3 , graphite, BN, SiO 2 , Si 3 N 4 and the like can be used as the ceramic, and among them, graphite can be preferably used because it has excellent workability.
  • the shape of the base material 20 is not particularly limited. Since the ceramic member 10A is manufactured by forming the ceramic coating 21 on the base material 20, the base material 20 is processed into the shape of the target ceramic member 10A. The ceramic member 10A is manufactured in various shapes according to the application. For example, any disk, ring, cylinder, plate, box, etc. may be used and there is no particular limitation.
  • the support 30 has a columnar support body 31, for example, and contacts the surface 201 of the base material 20 at the center of the body upper surface 311. It has the support part 32 to do.
  • the support portion 32 has an overall truncated cone shape and has a side surface 321 and a support surface 322.
  • the support surface 322 has a planar shape with a certain area, but may have a shape with a sharp tip (conical shape).
  • a cover portion 33 is provided so as to protrude upward along the outer peripheral portion of the main body upper surface 311.
  • the cover part 33 can be formed so as to surround the support part 32 concentrically, and the upper surface 331 is planar.
  • the height of the cover portion 33 is lower than the height of the support portion 32.
  • the support portion 32 protrudes above the upper surface 331 of the cover portion 33, and when the support surface 322 of the support portion 32 supports the base material 20, the base material A gap S is formed between 20 and the cover portion 33.
  • the distance L between the outermost edge 323 in the support portion 32 and the outermost edge 332 in the cover portion 33 is 4 to 20 times the interval (S) of the gap S.
  • the support tool main body 31, the support part 32, and the cover part 33 are integrally formed.
  • the support tool body 31, the support part 32, and the cover part 33 can be formed by shaving or molding with a die.
  • the support tool main body 31, the support part 32, and the cover part 33 can also be integrated by bonding with an adhesive or the like.
  • the support part 32 can also be adhere
  • FIGS. 3A and 3B it is also possible to employ a support tool 30A in which the tip of the cover portion 33 has a sharp shape. Further, as shown in FIGS.
  • a support 30B in which the support body 31 is formed in a quadrangular prism shape and the cover portion 33 is formed in a square shape.
  • the shape of the support part 32 and the support part 32 projecting upward from the cover part 33 are the same.
  • a first ceramic film 22 (ceramic film 21) is formed on the surface of the base material 20 supported by the support 30 by a CVD method.
  • the cover portion 33 of the support 30 restricts the flow of the raw material gas of the coating into the cover portion 33, and only a small amount of the raw material gas flows from the gap S between the cover portion 33 and the base material 20.
  • the first ceramic coating 22 is formed with an inclined portion 221 that is inclined toward the base material 20 toward the support portion 32 at a position where the upper surface 331 of the cover portion 33 of the support 30 is opposed.
  • An opening 222 where the first ceramic coating 22 is not formed is formed inside the inclined portion 221.
  • the cover part 33 and the support part 32 concentric in a plan view, the deviation in the distance that the source gas reaches is small, and it is possible to equally prevent the base material 20 from being fixed regardless of the direction. .
  • the ceramic coating 21 is not particularly limited.
  • SiC, TaC, TiN, etc. can be used. Since SiC has the same thermal expansion coefficient as graphite having excellent workability, it is difficult to peel off, is harder than graphite, and has corrosion resistance. Therefore, it is desirable to use SiC in combination with a graphite base material.
  • the portion of the base material 20 supported by the support tool 30 is changed and placed on the support tool 30 again, and the second ceramic coating 23 (ceramic) is formed by the CVD method.
  • a coating 21) is formed.
  • the base 20 can be rotated while the upper and lower surfaces are left as they are, and the support portion by the support 30 on the lower surface can be changed.
  • the ceramic member 10A manufactured as described above will be described.
  • the ceramic member 10A is subjected to CVD twice, and has two ceramic coatings 21 (first ceramic coating 22 and second ceramic coating 23).
  • the base material 20 is covered with the first ceramic film 22 and the second ceramic film 23.
  • the first ceramic coating 22 corresponds to the “ceramic coating” of the present invention.
  • the substrate 20 and the first ceramic coating 22 correspond to the “substrate” of the present invention
  • the second ceramic coating 23 corresponds to the “ceramic coating” of the present invention.
  • the first CVD the position of the support relative to the substrate is changed, and the substrate 20 is covered with the first ceramic film and / or the second ceramic film.
  • a support region 220 including an inclined portion 221 and an opening 222 is formed by the support tool 30 that is supported when the first ceramic coating 22 is formed (FIG. 1B). reference).
  • the opening 222 and the inclined portion 221 generated when the first ceramic coating 22 is formed are covered with the second ceramic coating 23 by the second (last) CVD as shown in FIG. That is, the opening 222 and the inclined portion 221 formed by the first CVD become the portion 222 ′ and the inclined portion 221 ′ which are the opening portions by the second (last) CVD, and the support region 220 is A portion 220 ′ that was covered with the second ceramic coating 23 and was a support region is formed.
  • the second ceramic film is formed on the portion supported by the support tool 30 when the second ceramic film 23 is formed in the second CVD.
  • an inclined portion 221 is formed in which the film thickness gradually decreases from the surface of the second ceramic coating 23 to the interface 232 with the first ceramic coating 22.
  • the opening 222 and the inclined portion 221 constitute a support region 220.
  • the area of the opening 222 is 10% to 60% of the area of the support region 220.
  • the opening 222 and the support region 220 do not necessarily have a circular shape depending on the state of work, even when the cover portion 33 of the support 30 is circular, and may be decentered or deformed into an elliptical shape or the like.
  • the base material 20 is supported using the support tool 30, and the ceramic coating 21 is formed on the surface of the base material 20 by the CVD method in this state.
  • the support tool 30 includes a support portion 32 that contacts the surface 201 of the base material 20 and a cover portion 33 that surrounds the support portion 32 so as to have a gap S with respect to the surface 201 of the base material 20.
  • the cover part 33 can prevent the CVD source gas from entering the support part 32 and can prevent the support part 32 and the base material 20 from being fixed by the ceramic coating 21 formed thereon. Moreover, since the cover part 33 is arrange
  • the support tool 30 is configured integrally with the support part 32 and the cover part 33, when placing the base material 20 on the support tool 30, When the substrate 20 is inclined and placed, the substrate 20 comes in contact with the cover portion 33 first.
  • the support portion 32 comes into contact with the base material 20 only when the mounting surface formed by the tips of the plurality of (for example, three points) support portions 32 and the base material 20 become parallel. become able to. For this reason, it is difficult to damage the tip of the support portion 32.
  • interval of the clearance gap S of the base material 20 and the cover part 33 is securable.
  • the distance L between the outermost edge 323 of the support portion 32 and the outermost edge 332 of the cover portion 33 in the support 30 is four times or more the gap S interval.
  • the source gas that has entered from the gap S can hardly reach the contact point between the support portion 32 and the substrate 20. For this reason, sticking of the support part 32 and the base material 20 can be made difficult to occur.
  • the distance L between the outermost edge 323 of the support portion 32 and the outermost edge 332 of the cover portion 33 is 20 times or less of the interval of the gap S, the opening portion 222 where the ceramic coating 21 is not formed on the base material 20. Since the area covered by the ceramic coating 21 can be increased, the substrate 20 can be easily protected.
  • the ceramic coating 21 is SiC
  • the ceramic coating 21 is SiC
  • the substrate 20 is made of graphite in the first CVD. Since graphite has a cleavage plane in the crystal, if the central portion of the substrate 20 is made of graphite, it can be easily processed, and ceramic members 10A having various shapes can be obtained.
  • a base material made of graphite covered with the ceramic coating 21 (first ceramic coating 22) is used. Since graphite is a core material, it can be easily processed in the same manner, and various shapes of ceramic members 10A can be obtained.
  • the method for manufacturing a ceramic member of the first embodiment exposure of the central portion of the base material 20 can be prevented by changing the position of the support 30 with respect to the base material 20 and repeating the process a plurality of times.
  • the base material 20 is graphite
  • the ceramic coating 21 first ceramic coating 22
  • the ceramic member 10 ⁇ / b> A that is the base material 20 on which the ceramic coating 21 is formed is used as a new base material 20 to form the second ceramic coating 21 (second ceramic coating 23). I do.
  • the exposed graphite substrate 20 can be covered with the second ceramic coating 21 (second ceramic coating 23).
  • Examples 1 to 3 and a comparative example according to the first embodiment will be described.
  • the support part 32 in the support 30 when the ceramic member 10A is manufactured is the same, and the cover part 33 is different.
  • Examples 1 to 3 each have a cover portion 33 having a different diameter, and the comparative example does not have a cover portion 33.
  • graphite having a ceramic coating 21 (first ceramic coating 22) formed on the surface thereof is used as the substrate 20, and a ceramic coating 21 (second ceramic coating 23) is further formed thereon. .
  • the formation of the second ceramic coating 23 will be described. However, if the base material 20 is only graphite, the manufacturing method of the first embodiment can be applied to the formation of the first ceramic coating 22. .
  • a base material 20 having a ceramic coating 21 (first ceramic coating 22) on graphite is placed on three supports 30, and is made of SiC using MTS (methyltrichlorosilane) as a source gas in a CVD furnace.
  • a ceramic coating 21 was formed.
  • Table 1 shows the relationship between the flat portion at the tip of the support portion 32, the cover portion 33, and the gap, the state of fixation and separation when the ceramic coating is formed, the presence or absence of cracks, and burrs.
  • the shape of the used support tool 30 is demonstrated below.
  • a support tool 30 having a circular flat portion (support surface 322) at the tip of the support portion 32 and having a ring-shaped cover portion 33 was used.
  • the cover 33 is a rotating body (see FIG. 3A) with a sharp tip.
  • the base material 20 having the ceramic coating 21 (first ceramic coating 22) on graphite has a support region 220 formed on the support portion 32 when the first ceramic coating 22 is formed.
  • An opening 222 is provided.
  • a ceramic member 10A was formed in the same manner by using a support tool that was composed of only the support portion 32 as in Examples 1 to 3 and did not have a cover portion.
  • the measurement results of Examples 1 to 3 and the comparative example are shown below.
  • the support tool 30 is the same as that used in the first embodiment.
  • the support tool 40 has the same configuration as the support tool 30, and includes a support tool body 41, a support part 42, and a cover part 43.
  • the cover portion 43 is provided so as to surround the support portion 42 and have a gap S from the outer surface of the base material.
  • the surface of the base material 20 with which the tip of the cover portion 43 abuts after CVD is composed of an opening 422 and an inclined portion 421 extending to the side surface and the two bottom surfaces of the base material 20.
  • a support region 420 is formed.
  • the portion supported by the support tool 30 is separated from the opening 222 and the inclined portion 221 in the same manner as described in the first embodiment.
  • a support region 220 is formed.
  • a support region 420 including an opening 422 and an inclined portion 421 is formed on a surface covered with the cover portion 43 at a portion supported by the support tool 40.
  • a support region 220 including an opening 222 and an inclined portion 221 is formed at a portion supported by the support tool 30 in the same manner as described in the first embodiment. Further, a support region 420 including an opening 422 and an inclined portion 421 is formed on a surface covered with the cover portion 43 at a portion supported by the support tool 40.
  • the openings 222 and 422 and the inclined portions 221 and 421 in the formation of the first ceramic coating 22 are covered with the second ceramic coating 23, respectively, and the portion 222 ′ that was the opening 422 ′ and the inclined portions 221 ′ and 421 ′.
  • the same operations and effects as those of the ceramic member 10A manufactured by the method for manufacturing a ceramic member of the first embodiment can be obtained.
  • the method for manufacturing a ceramic member and the ceramic members 10A and 10B of the present invention are not limited to the above-described embodiments, and appropriate modifications and improvements can be made.
  • the ceramic coating 21 is formed twice by changing the position of the support 30 with respect to the substrate 20.
  • the ceramic members 10 ⁇ / b> A and 10 ⁇ / b> B can be manufactured by changing the positions of the supports 30 and 40 with respect to the base material 20 and forming the ceramic coating 21 a plurality of times (three or more times). In this case, the number of ceramic coating layers corresponding to the number of times can be formed.
  • the case where the support part 32 and the cover part 33 of the support tool 30 were formed integrally was illustrated.
  • the cover portion 33 can be formed of another member. In this case, after mounting the base material 20 on the support part 32, the support tool which attaches the cover part 33 can be utilized.
  • the method for producing a ceramic member of the present invention can be used for producing a ceramic member having a ceramic film formed on a substrate.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne : un procédé de production d'un élément céramique et d'un outil de support, qui sont capables d'empêcher la formation de bavures ou de fines fissures autour d'un point de support lors de la production d'un élément céramique. Un outil de support (30) est constitué : d'une partie formant support (32) qui supporte une base (20) ; et d'une partie formant couvercle (33) qui entoure la partie formant support (32) de manière à avoir un espace (S) entre elle-même et la base (20). Par conséquent, une entrée d'un matériau de départ gazeux de dépôt chimique en phase vapeur dans la partie formant support (32) peut être empêchée au moyen de la partie formant couvercle (33), et la liaison de partie formant support (32) à la base (20) peut être empêchée par un film de revêtement céramique (21) formé entre celles-ci. En outre, étant donné que la partie formant couvercle (33) est agencée de manière à avoir un espace entre elle-même et la base (20), la liaison de la partie formant couvercle (33) à la base (20) peut être empêchée par le film de revêtement céramique (21). Par conséquent, il n'y a pas d'adhérence de la base (20) à l'outil de support (30) au moyen du film de revêtement céramique (21) lorsque la base (20) est séparée de l'outil formant support (30), de sorte que la formation de bavures nuisibles ou de fines fissures puisse être empêchée.
PCT/JP2015/068911 2014-06-30 2015-06-30 Procédé de production d'un élément céramique et d'un outil de support Ceased WO2016002815A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014134936A JP6383588B2 (ja) 2014-06-30 2014-06-30 セラミック部材の製造方法および支持具
JP2014-134936 2014-06-30

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WO2016002815A1 true WO2016002815A1 (fr) 2016-01-07

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JP6506056B2 (ja) * 2015-03-13 2019-04-24 イビデン株式会社 セラミック部材の製造方法
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124572A (ja) * 1984-11-21 1986-06-12 Hitachi Chem Co Ltd 化学蒸着方法
JPH0855898A (ja) * 1994-02-25 1996-02-27 Applied Materials Inc 堆積装置用サセプタ
JPH08100265A (ja) * 1994-09-30 1996-04-16 Kawasaki Steel Corp Ｃｖｄ装置およびｃｖｄ皮膜の形成方法
JP2003318116A (ja) * 2002-04-25 2003-11-07 Shin Etsu Handotai Co Ltd サセプタおよび半導体ウェーハの製造方法
JP2012184152A (ja) * 2011-03-08 2012-09-27 Ibiden Co Ltd セラミックス基材支持具及びセラミックス部材の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124572A (ja) * 1984-11-21 1986-06-12 Hitachi Chem Co Ltd 化学蒸着方法
JPH0855898A (ja) * 1994-02-25 1996-02-27 Applied Materials Inc 堆積装置用サセプタ
JPH08100265A (ja) * 1994-09-30 1996-04-16 Kawasaki Steel Corp Ｃｖｄ装置およびｃｖｄ皮膜の形成方法
JP2003318116A (ja) * 2002-04-25 2003-11-07 Shin Etsu Handotai Co Ltd サセプタおよび半導体ウェーハの製造方法
JP2012184152A (ja) * 2011-03-08 2012-09-27 Ibiden Co Ltd セラミックス基材支持具及びセラミックス部材の製造方法

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