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WO2016092368A3 - Plasma generator with at least one non-metallic component - Google Patents

Plasma generator with at least one non-metallic component Download PDF

Info

Publication number
WO2016092368A3
WO2016092368A3 PCT/IB2015/002449 IB2015002449W WO2016092368A3 WO 2016092368 A3 WO2016092368 A3 WO 2016092368A3 IB 2015002449 W IB2015002449 W IB 2015002449W WO 2016092368 A3 WO2016092368 A3 WO 2016092368A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
plasma generator
ionization chamber
metallic component
electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2015/002449
Other languages
French (fr)
Other versions
WO2016092368A2 (en
Inventor
Thomas N. Horsky
Sami K. Hahto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Ion Equipment Co Ltd
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/961,021 external-priority patent/US9865422B2/en
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Publication of WO2016092368A2 publication Critical patent/WO2016092368A2/en
Publication of WO2016092368A3 publication Critical patent/WO2016092368A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/082—Electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31705—Impurity or contaminant control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A plasma generator (1401) for an ion implanter is provided. The plasma generator includes an ionization chamber (1410) for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface (1420) of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator may include a thermionic emitter (1420a,b) with at least one surface which may or may not be exposed to the plasma, or an electron gun for generating a secondary plasma. The thermionic emitter may be constructed from a second non-metallic material. The plasma generator further may include an exit aperture (1430) for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other.
PCT/IB2015/002449 2014-12-10 2015-12-08 Plasma generator with at least one non-metallic component Ceased WO2016092368A2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201462090017P 2014-12-10 2014-12-10
US62/090,017 2014-12-10
US201562189917P 2015-07-08 2015-07-08
US62/189,917 2015-07-08
US14/961,021 US9865422B2 (en) 2013-03-15 2015-12-07 Plasma generator with at least one non-metallic component
US14/961,021 2015-12-07

Publications (2)

Publication Number Publication Date
WO2016092368A2 WO2016092368A2 (en) 2016-06-16
WO2016092368A3 true WO2016092368A3 (en) 2016-08-11

Family

ID=55182490

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2015/002449 Ceased WO2016092368A2 (en) 2014-12-10 2015-12-08 Plasma generator with at least one non-metallic component

Country Status (1)

Country Link
WO (1) WO2016092368A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106969440B (en) * 2017-05-03 2024-04-12 深圳烯康智能科技有限公司 Anion instrument
US10748738B1 (en) * 2019-03-18 2020-08-18 Applied Materials, Inc. Ion source with tubular cathode
US12046443B2 (en) 2021-11-22 2024-07-23 Applied Materials, Inc. Shield for filament in an ion source
CN117790260B (en) * 2024-02-23 2024-04-30 成都菲奥姆光学有限公司 A device for regulating electromagnetic variables to protect discharge filaments

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5857889A (en) * 1996-03-27 1999-01-12 Thermoceramix, Llc Arc Chamber for an ion implantation system
US20040031935A1 (en) * 2002-08-13 2004-02-19 Nissin Electric Co., Ltd. Thermoelectron generating source and ion beam radiating apparatus with the same
KR20080102830A (en) * 2007-05-22 2008-11-26 삼성전자주식회사 Ion generator
US20090001290A1 (en) * 2006-05-17 2009-01-01 Nissin Ion Equipment Co., Ltd. Ion Source and Method For Operating Same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5857889A (en) * 1996-03-27 1999-01-12 Thermoceramix, Llc Arc Chamber for an ion implantation system
US20040031935A1 (en) * 2002-08-13 2004-02-19 Nissin Electric Co., Ltd. Thermoelectron generating source and ion beam radiating apparatus with the same
US20090001290A1 (en) * 2006-05-17 2009-01-01 Nissin Ion Equipment Co., Ltd. Ion Source and Method For Operating Same
KR20080102830A (en) * 2007-05-22 2008-11-26 삼성전자주식회사 Ion generator

Also Published As

Publication number Publication date
WO2016092368A2 (en) 2016-06-16

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