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WO2015190873A1 - Composition polymère de siloxane - Google Patents

Composition polymère de siloxane Download PDF

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Publication number
WO2015190873A1
WO2015190873A1 PCT/KR2015/005950 KR2015005950W WO2015190873A1 WO 2015190873 A1 WO2015190873 A1 WO 2015190873A1 KR 2015005950 W KR2015005950 W KR 2015005950W WO 2015190873 A1 WO2015190873 A1 WO 2015190873A1
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Prior art keywords
weight
siloxane polymer
compound
polymer composition
interlayer insulating
Prior art date
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Ceased
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PCT/KR2015/005950
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English (en)
Korean (ko)
Inventor
김삼민
장학순
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Chemtronics Co Ltd
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Chemtronics Co Ltd
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Application filed by Chemtronics Co Ltd filed Critical Chemtronics Co Ltd
Priority to CN201580038134.5A priority Critical patent/CN106795287A/zh
Publication of WO2015190873A1 publication Critical patent/WO2015190873A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes

Definitions

  • the present invention relates to a siloxane polymer composition, a cured film formed from the composition, and an interlayer insulating film, which are suitable as a material for forming a cured film such as an interlayer insulating film of a display device such as a liquid crystal display device (LCD) or an organic EL display device.
  • a siloxane polymer composition a siloxane polymer composition, a cured film formed from the composition, and an interlayer insulating film, which are suitable as a material for forming a cured film such as an interlayer insulating film of a display device such as a liquid crystal display device (LCD) or an organic EL display device.
  • LCD liquid crystal display device
  • organic EL display device organic EL display device
  • a color TFT liquid crystal display element or the like is created by overlapping a color filter substrate and a TFT array substrate.
  • an interlayer insulating film is formed in order to insulate between wirings generally arranged in a layer shape.
  • a positive radiation-sensitive composition is widely used in that there are few processes for obtaining the required pattern shape, and it is preferable to have sufficient flatness.
  • an input device for operating the device by pressing an on-screen display called a touch panel, a touch screen or a touch screen is used for an automatic teller machine such as a bank, a vending machine, a mobile phone, a portable information display terminal, or a digital audio player have.
  • a protective film is provided.
  • the protective film requires surface hardness such as adhesion to the wiring of the touch panel element and scratch resistance as a protective film.
  • the present inventors have made efforts to develop a siloxane-based polymer composition which can be used as a material of an interlayer insulating film having excellent heat resistance and transmittance while improving surface hardness.
  • the siloxane polymer composition is used, the present inventors have found that it is possible to form an interlayer insulating film capable of balancing the general required properties of heat resistance and transmittance while improving hardness, and completed the present invention.
  • An object of the present invention is to provide a method for forming a siloxane-based polymer composition, a cured film formed from the siloxane-based polymer composition, an interlayer insulating film, and an interlayer insulating film which can be used as a material of an interlayer insulating film having improved hardness and excellent heat resistance and transmittance.
  • the present invention provides a siloxane polymer obtained by hydrolytically condensing (A) (a1) a silane compound with (a2) benzyl alcohol or benzyl ether; (a1) The silane compound is a compound (a1) and a compound ( a2) 70% to 97% by weight of the total weight, (a2) benzyl alcohol or benzyl ether, wherein the siloxane polymer uses from 3% to 30% by weight of the total weight of compound (a1) and compound (a2), and (B) Provides the siloxane polymer composition containing a solvent.
  • the siloxane polymer of (A) component is a compound which has a siloxane bond obtained by hydrolytic condensation of (a1) a silane compound and (a2) benzyl alcohol or benzyl ether.
  • the said (a1) silane compound is a hydrolysable silane compound represented by following General formula (1).
  • R 1 in Formula 1 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 20 carbon atoms.
  • the alkyl group include methyl group, ethyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, t-butyl group, n-hexyl group and n-decyl group.
  • the aryl group include phenyl group, tolyl group, naphthyl group and the like. However, some or all of the hydrogen atoms of these alkyl groups and aryl groups may be substituted.
  • R 2 in the formula (1) each independently indicate a hydrogen atom, any of acyl group, or an aryl group having 6 to 15 of the alkyl group having 1 to 6 carbon atoms, having 1 to 6 carbon atoms.
  • the alkyl group include methyl group, ethyl group, propyl group and butyl group.
  • the acyl group include an ethyl group, propionyl group, and butanoyl group.
  • Examples of the aryl group include a phenyl group, a naphthyl group, and the like. However, some or all of the hydrogen atoms of these alkyl groups and aryl groups may be substituted.
  • N in the said Formula (1) represents the integer of 0-3.
  • n 1, a trifunctional silane
  • Examples of the hydrolyzable silane compound according to the present invention represented by Chemical Formula 1 include tetramethoxy silane, tetraethoxy silane, tetraacetoxy silane, tetra phenoxy silane, methyl trimethoxy silane, methyl triethoxy silane, Ethyl tri-i-propoxy silane, methyl tributoxy silane, n-propyl trimethoxy silane, n-propyl triethoxy silane, n-butyl trimethoxy silane, n-butyl triethoxy silane, n-hexyl Trimethoxy silane, n-hexyl triethoxy silane, phenyl trimethoxy silane, phenyl triethoxy silane and the like. It is preferable to use trifunctional silane and tetrafunctional silane from a hardness viewpoint of a cured film among these hydrolyzable silane compounds.
  • the benzyl alcohol or benzyl ether (a2) is preferably a compound represented by the following formula (2).
  • R in Formula 2 is an alkyl group or hydrogen atom having 1 to 4 carbon atoms
  • R ' is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms
  • X is a hydrogen atom or an OH group
  • Y is a hydrogen atom, methyl or triple Orormethyl.
  • R is one of a hydrogen atom, methyl, ethyl, propyl, and n-butyl group
  • R ' is one of a hydrogen atom, methyl, ethyl and t-butyl.
  • hydrolyzable silane compound is usually hydrolyzed to produce a silanol group by heating in a temperature range of room temperature (about 25 ° C.) to about 100 ° C. in the absence of a catalyst and excess water. It refers to a compound having an existing group or a group capable of forming a siloxane condensate.
  • the siloxane monomer represented by Formula 1 and the benzyl alcohol or benzyl ether represented by Formula 2 may produce the (A) siloxane polymer of the present invention by hydrolysis and condensation polymerization, preferably (a1) silane 70 wt% to 97 wt% of the total weight of the compound (a1) and the compound (a2), and (a2) benzyl alcohol or benzyl ether, 3 wt% to 30 wt.% Of the total weight of the compound (a1) and the compound (a2).
  • hydrolysis and condensation polymerization can be made "(A) siloxane polymer".
  • (A) siloxane polymer was prepared by varying the weight ratio of (a1) and / or (a2).
  • the amount of the (a2) benzyl compound to be used exceeds 30% by weight, the transparency of the interlayer insulating film to be produced decreases, and when it is 3% by weight to 30% by weight, the interlayer insulating film having excellent hardness and transparency It was confirmed that manufacturing is possible. Therefore, it is preferable to use 70 to 97 weight% of siloxane monomer (a1) compounds, and 3 to 30 weight% of benzyl compounds (a2) at the time of preparation of (A) siloxane polymer.
  • the solvent which can be used for the said hydrolysis polymerization is not specifically limited. Usually, as long as it is a solvent used for a positive photosensitive composition, it can use without a restriction.
  • etheryuno is tetrahydrofuran
  • diethylene glycol is diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethylmethyl ether
  • ethers such as ethylene glycol monoalkyl ether acetate and propylene glycol monoalkyl ether acetate, ketones such as methyl ethyl ketone and various esters can be used.
  • toluene, xylene, etc. can be used as aromatic hydrocarbons.
  • water used for the hydrolysis condensation it is preferable to use water purified by a method such as reverse osmosis membrane treatment, ion exchange treatment, distillation or the like. By using such purified water, a side reaction can be suppressed and the reactivity of hydrolysis can be improved.
  • the amount of water to be used is preferably 0.1 to 3 moles, more preferably 0.3 to 2 moles, even more preferably 0.5 to 1.5 moles with respect to 1 mole of the total amount of the hydrolyzable groups of the hydrolyzable silane compound represented by the formula (1). Amount. By using this amount of water, the reaction rate of hydrolysis-condensation can be optimized.
  • the hydrolysis and condensation reaction of the (a) silane compound and the (a2) benzyl alcohol or benzyl ether for preparing the (A) siloxane polymer according to the present invention may be preferably performed under an acid catalyst.
  • the said catalyst is a Lewis acid, all can be used.
  • the Lewis acid any Lewis acid such as hydrochloric acid, sulfuric acid, nitric acid, formic acid, oxalic acid, acetic acid, trifluoro acetic acid, trifluoro sulfonic acid, toluene sulfonic acid, phosphoric acid and the like can be used.
  • reaction temperature and reaction time in hydrolysis condensation for production of the (A) siloxane polymer according to the present invention can be appropriately set.
  • Reaction temperature becomes like this.
  • Preferably it is 40-200 degreeC, More preferably, it is 50-150 degreeC.
  • the reaction time is preferably 30 minutes to 24 hours, more preferably 1 to 12 hours.
  • Hydrolysis condensation reaction can be performed efficiently under such reaction temperature and reaction time.
  • the hydrolyzable silane compound, water, and catalyst may be added to the reaction system at one time, and the reaction may be performed in one step.
  • the hydrolyzable silane compound, water, and catalyst may be added in several times in the reaction system.
  • the hydrolysis condensation reaction may be carried out in multiple stages. After the hydrolytic condensation reaction, water and the resulting alcohol can be removed from the reaction system by adding a dehydrating agent and then adding to the evaporation.
  • the molecular weight of the (A) siloxane polymer which is the hydrolysis-condensation product of the hydrolyzable silane compound which concerns on this invention is the number average molecular weight of polystyrene conversion using GPC (gel permeation chromatography) which used tetrahydrofuran for the mobile phase. It can be measured as. And it is preferable to make the number average molecular weight of a hydrolysis-condensation product into the value within the range of 1,000-40,000 normally. When the value of the number average molecular weight of a hydrolysis-condensation product is 1,000 or more, the film-forming property of the coating film of a positive radiation sensitive composition can be improved. On the other hand, by making the value of the number average molecular weight of a hydrolysis-condensation product into 40,000 or less, the radiation-sensitive fall of a positive radiation sensitive composition can be prevented.
  • (B) component is a solvent. Although it does not specifically limit, It is preferable to contain the alcohol solvent which is especially a protic solvent. By using an alcoholic solvent, each component can be dissolved or dispersed uniformly, thereby making it possible to improve the coatability of the composition solution to a large substrate, and also to apply coating stains (stripe-shaped stains, pin trace stains, mist stains). Etc.) can be suppressed and the film thickness uniformity can be further improved.
  • alcohol solvents examples include long-chain alkyl alcohols such as 1-hexanol, 1-octanol, 1-nonanol, 1-dodecanol, 1,6-hexanediol, and 1,8-octanediol; Aromatic alcohols such as benzyl alcohol; Ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, and propylene glycol monobutyl ether; Diethylene glycol monoalkyl ethers such as diethylene glycol monomethyl ether and diethylene glycol monoethyl ether; Dipropylene glycol monoalkyl ethers such as
  • benzyl alcohol ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, and propylene glycol monoethyl ether are particularly preferable from the viewpoint of improving coating properties.
  • a component may be used individually by 1 type and may mix and use 2 or more types.
  • the usage-amount of (B) component becomes like this. Preferably it is 5 mass parts-300 mass parts, More preferably, it is 10 mass parts-200 mass parts with respect to 100 mass parts of (A) component.
  • coating property improvement with respect to a glass substrate etc. is attained, the generation
  • coating stain stripe-shaped stain, pin trace stain, fog stain, etc. is suppressed, and film thickness uniformity Can be further improved.
  • ethers diethylene glycol alkyl ethers, ethylene glycol alkyl ether acetates, propylene glycol monoalkyl ether propionates, aromatic hydrocarbons, ketones And esters.
  • ethers For example, tetrahydrofuran etc .
  • diethylene glycol alkyl ether For example, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, etc .
  • ethylene glycol alkyl ether acetates For example, methyl cellosolve acetate, ethyl cellosolve acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monoethyl ether acetate, etc .
  • propylene glycol monoalkyl ether acetates For example, propylene glycol monomethyl ether acetate, a propylene glycol monoethyl ether acetate, a propylene glycol monopropyl ether acetate, a propylene glycol monobutyl ether acetate, etc .
  • propylene glycol monoalkyl ether propionates a propylene glycol mono
  • aromatic hydrocarbons For example, toluene, xylene, etc .
  • ketones for example, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 2-heptanone, 4-hydroxy-4-methyl-2-phene
  • esters for example, methyl acetate, ethyl acetate, propyl acetate, i-propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2- Ethyl methyl propionate, methyl hydroxyacetic acid, ethyl hydroxyacetic acid, hydroxyacetic acid butyl, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, 3-hydroxypropionic acid methyl, 3-hydroxypropionic acid, 3-hydroxypropionic acid Propyl, butyl 3-hydroxypropionate, methyl 2-hydroxy-3-methylbutanoic acid, methyl methoxyacetic acid, ethyl methoxyacetic acid, methoxyacetic acid propyl, methoxyacetic acid butyl, ethoxyacetic acid methyl, ethoxyacetic acid ethyl Propyl
  • the polysiloxane composition of this invention can contain the following component further.
  • ⁇ (C) component A thermal acid generator or a thermal base generator>
  • the thermal acid generator or the thermal base generator is an acidic active substance which acts as a catalyst in the hydrolytic condensation-curing reaction of the compound (a1) and the compound (a2) in preparing the (A) siloxane polymer according to the present invention. It is defined as a compound capable of releasing basic active substances.
  • the condensation reaction of the component in the heating process after image development of a positive radiation sensitive composition can be accelerated
  • a thermal acid generator or a thermal base generator of (C) component at the time of prebaking at comparatively low temperature (for example, 70-120 degreeC) in the coating film formation process of a positive radiation sensitive composition.
  • An ionic compound and a nonionic compound are contained in the thermal acid generator of (C) component.
  • an ionic compound it is preferable that heavy metal and no halogen ion are included.
  • the ionic thermosensitive acid generator include triphenylsulfonium, 1-dimethylthionaphthalene, 1-dimethylthio-4-hydroxynaphthalene, 1-dimethylthio-4,7-dihydroxynaphthalene and 4-hydroxy Phenyldimethylsulfonium, benzyl 4-hydroxyphenylmethylsulfonium, 2-methylbenzyl 4-hydroxyphenylmethylsulfonium, 2-methylbenzyl-4-acetylphenylmethylsulfonium, 2-methylbenzyl-4 Methane sulfonate, trifluoromethane sulfonate, camphor sulfonate, p-toluene sulfonate, hexafluoro phosphonate, etc., such
  • nonionic thermosensitive acid generator examples include halogen-containing compounds, diazomethane compounds, sulfone compounds, sulfonic acid ester compounds, carboxylic acid ester compounds, phosphate ester compounds, sulfonimide compounds, sulfone benzotriazole compounds, and the like. have.
  • halogen-containing compound a haloalkyl group containing hydrocarbon compound, a haloalkyl group containing heterocyclic compound, etc. are mentioned.
  • halogen-containing compounds examples include 1,1-bis (4-chlorophenyl) -2,2,2-trichloroethane, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2 -Naphthyl-4,6-bis (trichloromethyl) -s-triazine, etc. are mentioned.
  • diazomethane compounds include bis (trifluoromethylsulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, bis (phenylsulfonyl) diazomethane and bis (p-tolylsulfonyl) dia Crude methane, bis (2,4-xyrylsulfonyl) diazomethane, bis (p-chlorophenylsulfonyl) diazomethane, tilsulfonyl-p-toluenesulfonyldiazomethane,
  • a sulfone compound the (beta) -keto sulfone compound, the (beta) -sulfonyl sulfone compound, a diaryl disulfone compound, etc. are mentioned.
  • a preferable sulfone compound 4-trisphenacyl sulfone, mesityl penacyl sulfone, bis (phenylsulfonyl) methane, 4-chlorophenyl- 4-methylphenyl disulfone compound, etc. are mentioned.
  • a sulfonic acid ester compound an alkyl sulfonic acid ester, a haloalkyl sulfonic acid ester, an aryl sulfonic acid ester, an imino sulfonate, etc. are mentioned.
  • Examples of the preferable sulfonic acid ester compound include benzointosylate, pyrogallol trimesylate, nitrobenzyl-9,10-diethoxyanthracene-2-sulfonate, 2,6-dinitrobenzylbenzenesulfonate, and the like.
  • a carboxylic acid ester compound carboxylic acid o-nitrobenzyl ester is mentioned.
  • thermal base generator of component (C) examples include transition metal complexes such as cobalt, orthonitrobenzylcarbamates, ⁇ , ⁇ -dimethyl-3,5-dimethoxybenzylcarbamates, acyloxyiminos, and the like. have.
  • transition metal complex examples include bromopentaammonium cobalt perchlorate, bromopentamethylamine cobalt perchlorate, bromopentapropylamine cobalt perchlorate, hexaammonia cobalt perchlorate, hexamethylamine cobalt perchlorate, hexapropylamine cobalt perchlorate Salts; and the like.
  • acyloxyiminos examples include propionylacetophenone oxime, propionylbenzophenone oxime, propionyl acetone oxime, butyryl acetophenone oxime, butyryl benzophenone oxime, butyryl acetone oxime, adipoyl acetophenone oxime, adipoylbenzo Phenone oxime, adipoyl acetone oxime, acroyl acetophenone oxime, acroyl benzophenone oxime, acroyl acetone oxime and the like.
  • thermosensitive base generator examples include 2-nitrobenzylcyclohexyl carbamate and O-carbamoylhydroxyamide.
  • the present invention is not limited thereto, and either the acid or the base may be used as the thermal acid generator or the thermal base generator of the component (C), one type may be used alone, or two or more types may be mixed and used.
  • the quantity in the case of using (C) component becomes like this.
  • it is 0.1 mass part-10 mass parts, More preferably, it is 1 mass part-5 mass parts with respect to 100 mass parts of (A) component.
  • the present invention provides a cured film formed of the polysiloxane composition of the present invention and a method of forming the cured film.
  • the cured film which concerns on this invention can be manufactured including the following process.
  • the substrate As a material of the substrate which can be used in the present invention, glass, silicon, quartz, resin, and the like can be used.
  • the solvent is removed and a coating film is formed.
  • a coating film In order to pattern a coating film, it exposes through the photomask which has a predetermined pattern. After exposure to light of a certain wavelength through the photomask, unnecessary portions are removed to form a pattern.
  • a developing solution used for a developing process aqueous alkali solution is preferable. Examples of the alkali used may include sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide and the like.
  • the patterned thin film is heated to cure. Such postbaking is usually conducted for a certain time at 120 degrees or more and 250 degrees or less.
  • an interlayer insulating film for display elements having a fine pattern can be easily formed.
  • the interlayer insulation film thus formed is formed with an interlayer insulation film excellent in hardness, heat resistance, and transparency.
  • the "cured film” is a generic term for a thermoset formed by using the siloxane polymer composition, and examples of the cured film of the display element include a protective film, an interlayer insulating film, and the like.
  • the siloxane polymer composition which concerns on this invention can form the cured film excellent in transparency and scratch resistance, such a cured film can be applied to the technical use which requires high scratch resistance, etc. transparency,
  • a liquid crystal display element or a touch It can use suitably as a protective film, an interlayer insulation film, etc. of various devices, such as a panel.
  • the cured film formed from the polysiloxane composition of this invention is excellent in the surface hardness, heat resistance, and transparency characteristic with respect to a board
  • the present invention it is possible to provide a siloxane-based polymer composition which can be used as a material of an interlayer insulating film having improved hardness and excellent heat resistance and transmittance, a cured film formed from the siloxane-based polymer composition, an interlayer insulating film, and a method of forming the interlayer insulating film. . Therefore, the interlayer insulation film formed by this invention can be used suitably also for uses, such as a display film and a protective film of a touchscreen display element.
  • the weight average molecular weight (Mw) of the hydrolysis-condensation product of the hydrolyzable silane compound obtained from each synthesis example below was measured by the gel permeation chromatography (GPC) according to the following specification.
  • GPC-KF-801 Column: GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804 (manufactured by Showa Denko KK)
  • 35 wt% of phenyltriethoxy silane, 35 wt% of methyltriethoxysilane, 25 wt% of tetraethoxysilane, and 5 wt% of 4,4'-isopropylidenebis (2,6-dihydroxymethylphenol) 50 parts by weight of a tetrahydrofuran solvent was added to a reactor equipped with a reflux condenser, and vigorously stirred, a solution in which 2% by weight of sulfuric acid was added to 20 parts by weight of ultrapure water was slowly added to the reactor. The reactor was refluxed for 12 hours and then cooled. After diluting the cooled reaction solution, GPC analysis was conducted to prepare a polymer having a polystyrene reduced weight average molecular weight of 3,500.
  • the siloxane polymer (Synthesis Examples 1 to 7, Comparative Examples 1 to 3) prepared above was spin-coated and then prebaked at 100 degrees for 3 minutes. After prebaking, the film thickness was obtained at about 4.0 microns. The coating film thus obtained was post-baked at 240 degrees for 1 hour. The pencil hardness of the cured film was measured using the pencil hardness meter. The measurement results are as shown in Table 1.
  • the cured coating film thickness was measured (T1) and the thickness (T2) obtained by further baking the coating film at 230 degrees for 1 hour was measured. [(T1-T2) / T2 x 100 (%) The thickness deviation before and after further baking was calculated as a percentage. When the thickness variation ratio is 3% or less, it can be said that heat resistance is excellent, and it is as shown in Table 1.
  • the cured film was obtained by heating at 230 degree
  • the glass substrate which has this cured film was measured at 400 nm using the spectrophotometer, and the result is shown in Table 1.

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Polymers & Plastics (AREA)
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  • General Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)

Abstract

La présente invention concerne : une composition de polymère de siloxane, qui est convient comme matériau de formation d'une couche durcie, tel qu'un film isolant intercouche d'un dispositif d'affichage, tel qu'un affichage à cristaux liquides (LCD) ou un dispositif d'affichage électroluminescent organique; un film durci formé à partir de la composition; un film isolant intercouche; et un procédé permettant de former le film isolant intercouche. La présente invention peut fournir : une composition de polymère à base de siloxane, qui est utilisable comme matériau pour un film isolant intercouche ayant une dureté améliorée et une excellente résistance à la chaleur et transmittance; un film durci formé à partir de la composition polymère à base de siloxane; un film isolant intercouche; et un procédé permettant de former le film isolant intercouche. Par conséquent, le film isolant intercouche formé par la présente invention est utile étant donné que le film isolant intercouche peut également être utilisé comme film de protection d'un dispositif d'affichage ou d'un dispositif d'affichage tactile, ou analogue.
PCT/KR2015/005950 2014-06-12 2015-06-12 Composition polymère de siloxane Ceased WO2015190873A1 (fr)

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