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WO2015188354A1 - 一种真空镀膜设备以及真空镀膜的方法 - Google Patents

一种真空镀膜设备以及真空镀膜的方法 Download PDF

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Publication number
WO2015188354A1
WO2015188354A1 PCT/CN2014/079755 CN2014079755W WO2015188354A1 WO 2015188354 A1 WO2015188354 A1 WO 2015188354A1 CN 2014079755 W CN2014079755 W CN 2014079755W WO 2015188354 A1 WO2015188354 A1 WO 2015188354A1
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WO
WIPO (PCT)
Prior art keywords
column
vapor deposition
bracket
vacuum coating
deposition chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2014/079755
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English (en)
French (fr)
Inventor
文洁
何自坚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHENZHEN TATFOOK QUAINTFAB Co Ltd
Original Assignee
SHENZHEN TATFOOK QUAINTFAB Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by SHENZHEN TATFOOK QUAINTFAB Co Ltd filed Critical SHENZHEN TATFOOK QUAINTFAB Co Ltd
Priority to PCT/CN2014/079755 priority Critical patent/WO2015188354A1/zh
Priority to CN201480010790.XA priority patent/CN105339522B/zh
Publication of WO2015188354A1 publication Critical patent/WO2015188354A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Definitions

  • the present invention relates to a vacuum coating apparatus and a method of vacuum coating.
  • the nano-protective film is formed on the surface of the product without gaps in a vacuum environment, and is called a vacuum vapor deposition nano-coating film.
  • the nano-coating and traditional coating or spray coating and painting of this process have the following characteristics: 1. Waterproof, moisture-proof and no pores, good sealing; 2. Coating acid and alkali resistance, high insulation grade, anti-static generation; 3. Smooth coating surface , anti-fouling dirt adhesion, low friction, easy to scrub; 4, appearance color, can be adjusted according to demand, from high transparency to other colors. 5, the coating thickness is from 0.1 micron to more than 50 microns; 6, the coating adhesion is good, no internal internal stress, bubble holes, coating film to adapt to the ambient temperature ⁇ 200 ° C, does not fall off wrinkles.
  • the raw material is vaporized at 150 ° C to form a gaseous state in the material chamber, and then enters a cracking furnace at a high temperature of about 650 ° C to be decomposed into nano-sized molecules. It enters the coating chamber at normal temperature, and forms a film by vapor deposition in a vacuum state to uniformly cover the pinholes and gaps on the surface of the product. It differs from metallization and spray paint in that it can be vacuum-vapor deposited nano-coating on the surface of the product and uniformly covered to form a pinhole-free, dense, transparent film.
  • the invention provides a vacuum coating device and a vacuum coating method, which can implement batch vacuum nano-coating on a coated workpiece to improve the efficiency of the vacuum nano-coating of the workpiece to be coated and the coating effect.
  • the present invention provides a vacuum coating apparatus including a vapor deposition chamber, a bracket, and a gas guide column, and the bracket is disposed in the vapor deposition chamber.
  • the bracket includes a bracket column, the air guide column is hollow, and a plurality of first vent holes are disposed on a sidewall of the air guide column, and the bracket column is hollow and a plurality of second ventilation holes are disposed on a sidewall of the support column, and the air guide column is inserted into the support column from one end of the support column, and the support column is nested outside the air guide column and
  • the polymer material cracking gas can be uniformly diffused around the first vent hole and the second vent hole and deposited on the workpiece to be coated.
  • the first vent hole is a strip hole provided in the longitudinal direction along the axial direction of the air guide column.
  • the first vent holes disposed adjacent to each other in the axial direction of the air guide column are staggered from each other in the axial direction of the air guide column.
  • the second vent hole is a circular hole, and the length of the first vent hole is larger than the diameter of the second vent hole.
  • bracket further comprises a top cover sealed to the other end of the bracket post.
  • the vacuum coating apparatus further includes an inlet disposed at a sidewall of the vapor deposition chamber and a temperature reducing splitter baffle disposed in the vapor deposition chamber opposite the inlet, the inlet for introducing a polymer material
  • the cracking gas is cooled by the cooling material splitting baffle and diffused in the vapor deposition chamber.
  • the vacuum coating apparatus further includes a magnetic rotating component, the magnetic rotating component including a first rotating magnet disposed on the outdoor side of the vapor deposition chamber and a second rotating magnet disposed on a side of the vapor deposition chamber, a rotating magnet is magnetically coupled to the second rotating magnet, the first rotating magnet is rotated by the rotating driving motor, and can drive the second rotating magnet to rotate, thereby driving the bracket column to guide the air guiding The column rotates.
  • a magnetic rotating component including a first rotating magnet disposed on the outdoor side of the vapor deposition chamber and a second rotating magnet disposed on a side of the vapor deposition chamber, a rotating magnet is magnetically coupled to the second rotating magnet, the first rotating magnet is rotated by the rotating driving motor, and can drive the second rotating magnet to rotate, thereby driving the bracket column to guide the air guiding The column rotates.
  • the air guiding column is disposed through the vapor deposition chamber, and the first rotating magnet and the second rotating magnet are respectively rotatably supported on the air guiding column and rotatable around the air guiding column.
  • the air guiding column is disposed on a bottom wall of the vapor deposition chamber and extends in a vertical direction
  • the bracket column is nested in the vertical direction to the outside of the air guiding column and is seated at the seat On the second rotating magnet.
  • top of the vapor deposition chamber is provided with an opening through which the bracket can be placed in or taken out of the vapor deposition chamber.
  • the vacuum coating apparatus further includes a cooling tower disposed on the outdoor side of the vapor deposition chamber and connected to the gas guiding column, and the residual gas after vapor deposition passes through the second vent hole and the first vent hole
  • the gas guide column is further introduced into the cooling tower through the gas guide column.
  • the bracket further includes a main support ring and a plurality of main support bars, the main support ring and the support post are nested and fixed on the support post, and the plurality of main support bars are disposed on the bracket
  • the main support ring extends radially outward of the main support ring.
  • the second vent hole is disposed between the main support bars disposed adjacent to each other along an axial direction of the bracket column.
  • the bracket further includes an auxiliary support ring and a plurality of auxiliary support rods, wherein the auxiliary support ring is disposed on the main support rod and is nested with the main support ring in a radial direction of the support post
  • the plurality of auxiliary support rods are disposed on the auxiliary support ring and extend radially outward of the auxiliary support ring.
  • a vacuum coating method comprising: placing a workpiece to be coated on a support; and placing the support on a vapor deposition device of a vacuum coating device; Indoor, so that the workpiece to be coated is disposed in the vapor deposition chamber; a polymer material cracking gas is introduced from a sidewall of the vapor deposition chamber sidewall, and the polymer material cracking gas is cooled by a cooling splitter baffle and diffused in the vapor deposition chamber. After rotating, the rotating bracket is evenly distributed in the vapor deposition chamber, diffused and deposited on the workpiece to be coated, and further uniformly extracts residual gas through the first vent hole of the air guiding column and the second vent hole on the bracket column of the bracket.
  • the invention has the beneficial effects that: different from the prior art, a vacuum coating device and a vacuum coating method are provided.
  • the vacuum coating device comprises a vapor deposition chamber, a support and a gas guide column, and the air guide column and the air guide column can be arranged.
  • the rotating support column through the first vent hole on the air guide column and the second vent hole on the support column, uniformly disperses the introduced polymer material cracking gas in the vapor deposition chamber of the vacuum coating device to deposit on the film to be coated On the workpiece. In this way, the efficiency of the vacuum nano-coating film and the effect of the plating film can be effectively improved.
  • FIG. 1 is a schematic structural view of a vacuum coating apparatus according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a gas guiding column of a vacuum coating apparatus according to an embodiment of the present invention
  • FIG. 3 is a schematic structural view of a bracket column of a vacuum coating apparatus according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a bracket of a vacuum coating apparatus according to an embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of another vacuum coating apparatus according to an embodiment of the present invention.
  • FIG. 6 is a flow chart of a method of vacuum coating according to an embodiment of the present invention.
  • FIG. 1 is a schematic structural diagram of a vacuum coating apparatus according to an embodiment of the present invention.
  • the vacuum coating apparatus of the embodiment includes a vapor deposition chamber 1, a bracket 2, and a gas guide column 32.
  • the bracket 2 is disposed on a vapor deposition layer.
  • the bracket 2 includes a bracket column 22, the air guiding column 32 is hollow, and a plurality of first ventilation holes 321 are disposed on the side wall of the air guiding column 32, and the bracket column 22 is hollow.
  • a plurality of second ventilation holes 221 are disposed on the side wall of the support column 22, and the air guide post 32 is inserted into the support post 22 from one end of the support post 22, and the support post 22 is nested outside the air guide post 32 and can be guided around The gas column 32 is rotated, and the introduced polymer material cracking gas is uniformly diffused through the first vent hole 321 and the second vent hole 221 and deposited on the workpiece to be coated.
  • FIG. 2 is a schematic structural view of a gas guiding column of a vacuum coating apparatus according to an embodiment of the present invention.
  • the first venting hole 321 is along the axis of the air guiding column 32 in the longitudinal direction.
  • the first vent holes 321 disposed adjacent to each other in the axial direction of the air guide post 32 are staggered from each other along the axial direction of the air guide post 32.
  • FIG. 3 is a schematic structural diagram of a bracket column of a vacuum coating device according to an embodiment of the present invention.
  • the second vent hole 221 disposed on the sidewall of the bracket column 22 is a circle.
  • the shape of the first vent hole 321 is larger than the diameter of the second vent hole 221 .
  • the vacuum coating apparatus of the present embodiment further includes an inlet 38 disposed on the sidewall of the vapor deposition chamber 1 and a temperature-reducing splitter baffle 38 disposed in the vapor deposition chamber 1 opposite to the inlet 37, which is cracked.
  • the polymer material gas is introduced through the inlet 37, and is cooled by the cooling splitter baffle 38 and then diffused into the vapor deposition chamber 1.
  • the vacuum coating apparatus of the embodiment further includes a magnetic rotating assembly including a first rotating magnet 34 disposed outside the vapor deposition chamber 1 and a second rotating magnet 35 disposed inside the vapor deposition chamber 1, the first rotation The magnet 34 is magnetically coupled to the second rotating magnet 35.
  • the first rotating magnet 34 is rotated by the rotating driving motor, and can drive the second rotating magnet 35 to rotate, thereby driving the bracket 2 to rotate.
  • the air guiding column 32 is disposed through the vapor deposition chamber 1.
  • the first rotating magnet 34 and the second rotating magnet 35 are respectively rotatably supported on the air guiding column 32 and can be rotated around the air guiding column 32, thereby driving the bracket 2 to guide the air.
  • the column 32 is rotated.
  • the air guiding column 32 is disposed on the bottom wall of the vapor deposition chamber 1 and extends in the vertical direction, and the bracket column 22 is nested in the vertical direction to the outside of the air guiding column 32 and is seated on the second rotating magnet 35. .
  • an opening 36 is provided on the top of the vapor deposition chamber 1, and the holder 2 can be placed in the vapor deposition chamber 1 through the opening 36 or taken out from the vapor deposition chamber 1.
  • the vacuum coating apparatus of the present embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the gas guide column 32, and the residual gas after vapor deposition passes through the second vent hole 221 and the first
  • the vent 321 enters the air guide post 32 and is further introduced into the cooling tower 39 through the air guide post 32.
  • a sensor is also installed in the cooling tower, and the content of the cracking gas of the polymer material in the residual gas can be detected by the sensor, and the inlet 37 is adjusted according to the content of the cracking gas of the polymer material in the residual gas to reduce or The amount of the polymer cracking gas introduced into the vapor deposition chamber 1 is increased.
  • FIG. 4 is a schematic structural diagram of a bracket of a vacuum coating apparatus according to an embodiment of the present invention.
  • the bracket 2 further includes a top cover 33 sealed on the other end of the bracket post 22 .
  • the bracket 2 further includes a main support ring 28 and a plurality of main support bars 231.
  • the main support ring 28 is nested and fixed on the support post 22, and the plurality of main support bars 231 are disposed on the main support ring 28. And extending radially to the outside of the main support ring 28.
  • the second vent holes 221 are disposed between the main support bars 231 disposed adjacently in the axial direction of the rack column 22.
  • the bracket 2 further includes an auxiliary support ring 30 and a plurality of auxiliary support rods 232.
  • the auxiliary support ring 30 is disposed on the main support rod 232 and spaced apart from the main support ring 30 along the radial direction of the support post 22, and a plurality of The auxiliary support bar 232 is disposed on the auxiliary support ring 30 and extends radially outward of the auxiliary support ring 30.
  • FIG. 5 is another vacuum coating apparatus according to an embodiment of the present invention.
  • the vacuum coating apparatus of the embodiment includes a raw material storage tank 3, a cracking furnace 4, a vapor deposition chamber 1 and a The holder 2 in the vapor deposition chamber, the temperature reducing splitter 38, the vacuum pump 5, the rotary drive motor 6, and the cooling tower 39.
  • the raw material storage tank 3 is used for storing a polymer material for a raw material, that is, for vacuum coating, such as Parylene.
  • a polymer material for a raw material such as Parylene.
  • N parylene
  • Parylene C polychloro-p-xylene
  • Parylene A cracking gas of at least one material of D polydichloro-p-xylene
  • the raw material is heated to 150 degrees by using a first-stage heating furnace (not shown) to form a gaseous polymer material, which is introduced into a cracking furnace.
  • the cracking furnace 4 is connected to the raw material storage tank 3, receives the polymer material heated to the gaseous state by the first stage, and is subjected to secondary heating to 650 degrees, and then is cracked into a nanometer gas of the polymer material, and is passed through the inlet 37 of the side wall of the vapor deposition chamber 1.
  • the polymer material nano gas is introduced into the vapor deposition chamber 1.
  • the temperature is lowered by the cooling and splitting baffle 38 to prevent the 650-degree gas from directly hitting the product to be coated, and the cracked polymer material nano gas encounters the cooling and distributing baffle 38. Spread to the surrounding.
  • the vacuum coating apparatus further includes a discharge column 32, a rotating assembly 7, a vapor deposition chamber 1, and a support 2 disposed in the vapor deposition chamber 1.
  • the vacuum coating apparatus of this embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, and the residual gas after vapor deposition passes through the second vent hole and the row on the support column of the bracket.
  • the first vent of the gas column 32 enters the exhaust column and is further introduced into the cooling tower 39 through the exhaust column 32.
  • the polymer material gas in the residual gas is rapidly solidified by the cooling tower 39 to prevent its outward diffusion.
  • the vacuum coating apparatus of the present embodiment further includes a vacuum pump 5 connected to the cooling tower 39 to evacuate the vapor deposition chamber through the exhaust column 32 to form a vacuum negative pressure in the vapor deposition chamber 1 to facilitate efficient gas phase realization. Deposition.
  • the vacuum coating apparatus of the embodiment further includes a rotary drive motor 6 connected to the first rotating magnet through a timing belt for driving the rotation of the first rotating magnet to drive the second rotating magnet, thereby driving the bracket in the vapor deposition chamber.
  • the column 32 is rotated.
  • the polymer material in the embodiment of the present invention may be Parylene N (parylene), Parylene. At least one material of C (polychloro-p-xylene) and Parylene D (polydichloro-p-xylene), most preferably parylene.
  • FIG. 6 is a flowchart of a method for vacuum coating according to an embodiment of the present invention.
  • the method for vacuum coating of the embodiment includes:
  • the opening on the vapor deposition chamber of the vacuum coating apparatus is opened, and the holder in which the workpiece to be coated is placed is placed in the vapor deposition chamber of the vacuum coating apparatus, so that the workpiece to be coated is placed in the vapor deposition chamber.
  • the gas discharge pipe is rotated so that the cracked gas can be uniformly dispersed in the vapor deposition chamber and deposited on the workpiece to be coated.
  • the residual gas is discharged from the central residual gas discharge pipe.
  • the content of the polymer cracking gas in the residual gas is monitored in real time, and the pipe opening size of the 650 degree cracking furnace is adjusted in time to maximize the polymer deposition efficiency.
  • the vacuum pump continuously draws a vacuum from the vapor deposition chamber (extracting the residual gas after vapor deposition) so that the cracked nano-organic polymer of the 650-degree cracking furnace is continuously diffused into the vapor phase precipitation furnace.
  • the polymer material in the embodiment of the invention may be Parylene N (parylene) or Parylene. At least one material of C (polychloro-p-xylene) and Parylene D (polydichloro-p-xylene), most preferably parylene.
  • the vacuum coating device provided by the embodiment of the present invention provides a vacuum coating device, which comprises a vapor deposition chamber, a bracket and a gas guide column, and is provided by guiding a gas guide column and a support column capable of rotating around the gas guide column.
  • the first vent hole on the gas column and the second vent hole on the support column uniformly disperse the introduced polymer material cracking gas in the vapor deposition chamber of the vacuum coating device to deposit on the workpiece to be coated. In this way, the efficiency of the vacuum nano-coating film and the effect of the plating film can be effectively improved.

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Abstract

一种真空镀膜设备以及真空镀膜的方法，该真空镀膜设备包括气相沉积室、支架以及导气柱，支架设置于气相沉积室内且用于放置待镀膜工件，支架包括支架柱，导气柱呈中空状且在导气柱的侧壁上设置有多个第一通气孔L，支架柱呈中空状且支架柱的侧壁上设置有多个第二通气孔L，导气柱从所述支架柱的一端插入支架柱，支架柱嵌套设置于导气柱外侧且能够绕所述导气柱转动，引入的高分子材料裂解气体经第一通气孔L和第二通气孔L均匀扩散并沉积于待镀膜工件上。通过上述方式，能够有效提高真空纳米镀膜的效率以及镀膜的效果。

Description

一种真空镀膜设备以及真空镀膜的方法
【技术领域】
本发明涉及一种真空镀膜设备以及真空镀膜的方法。
【背景技术】
将高分子材料裂解成纳米分子后在真空环境内均匀无间隙附着在产品表面形成纳米保护膜，称之为真空气相沉积纳米镀膜。这种工艺的纳米镀膜与传统镀膜或者喷油、喷漆具有以下特性：1、防水防潮无细孔，密封性好；2、镀膜耐酸碱、绝缘等级高、防静电产生；3、镀膜表面平顺，防污脏物粘附，摩擦力小，易擦洗；4、外观色泽，可根据需求调整，从高透明到其它颜色。5、镀膜厚度是从0.1微米到50微米以上皆可；6、镀膜附着力好，无内内应力，气泡孔，镀膜适应环境温度±200℃，不脱落不起皱。
纳米镀膜时，原料在材料室内经过150℃的汽化形成气态后进入到高温650℃左右的裂解炉，分解成纳米级分子。进入到常温的镀膜室，在真空状态下以气相沉积防水形成薄膜，均匀覆盖产品表面针孔及间隙。它与金属喷镀及喷油漆不同之处在于，只要产品表面与空气接触都能都能被真空气相沉积纳米镀膜，均匀覆盖，形成无针孔、致密均匀、高透明的薄膜。
由于纳米镀膜时，需镀膜的产品表面都要与空气接触，因此，如何对镀膜设备进行改进以适应不同产品镀膜是一个有待解决的技术问题。
【发明内容】
本发明提供一种真空镀膜设备以及真空镀膜的方法，能够对带镀膜工件实行批量真空纳米镀膜，提高待镀膜工件真空纳米镀膜的效率以及镀膜效果。
为解决上述技术问题，本发明提供的一种技术方案是：提供一种真空镀膜设备，所述真空镀膜设备包括气相沉积室、支架以及导气柱，所述支架设置于所述气相沉积室内且用于放置待镀膜工件，所述支架包括支架柱，所述导气柱呈中空状且在所述导气柱的侧壁上设置有多个第一通气孔，所述支架柱呈中空状且所述支架柱的侧壁上设置有多个第二通气孔，所述导气柱从所述支架柱的一端插入所述支架柱，所述支架柱嵌套设置于所述导气柱外侧且能够绕所述导气柱转动，引入的高分子材料裂解气体经所述第一通气孔和所述第二通气孔均匀扩散并沉积于所述待镀膜工件上。
其中，所述第一通气孔为长度方向沿所述导气柱的轴向方向设置的条形孔。
其中，沿所述导气柱的轴向方向相邻设置的所述第一通气孔沿所述导气柱的轴向方向彼此错开。
其中，所述第二通气孔为圆形孔，所述第一通气孔的长度大于所述第二通气孔的直径。
其中，所述支架进一步包括密封设置于所述支架柱的另一端的顶盖。
其中，所述真空镀膜设备进一步包括设置于所述气相沉积室侧壁的入口以及设置于所述气相沉积室内与所述入口正对着的降温分流挡板，所述入口用于引入高分子材料裂解气体，所述高分子材料裂解气体经所述降温分流挡板冷却后扩散于所述气相沉积室内。
其中，所述真空镀膜设备进一步包括磁性转动组件，所述磁性转动组件包括设置于所述气相沉积室外侧的第一旋转磁体以及设置于所述气相沉积室内侧的第二旋转磁体，所述第一旋转磁体与所述第二旋转磁体磁性耦合，所述第一旋转磁体在旋转驱动马达带动下转动，并能够带动所述第二旋转磁体转动，进而带动所述支架柱能够绕所述导气柱转动。
其中，所述导气柱贯穿所述气相沉积室设置，所述第一旋转磁体和所述第二旋转磁体分别转动支撑于所述导气柱上且能够绕所述导气柱进行转动。
其中，所述导气柱贯穿设置于所述气相沉积室的底壁上且沿竖直方向延伸，所述支架柱沿所述竖直方向嵌套至所述导气柱外侧且承座于所述第二旋转磁体上。
其中，所述气相沉积室的顶部上设置有开口，所述支架可以通过所述开口放置于所述气相沉积室中或者从所述气相沉积室中取出。
其中，所述真空镀膜设备进一步包括设置于所述气相沉积室外侧并与所述导气柱连接的冷却塔，气相沉积后的残余气体经过所述第二通气孔和所述第一通气孔进入所述导气柱，进一步通过所述导气柱导入到所述冷却塔中。
其中，所述支架进一步包括主支撑环和多个主支撑杆，所述主支撑环与所述支架柱嵌套设置且固定于所述支架柱上，所述多个主支撑杆设置于所述主支撑环上且向所述主支撑环的外侧放射状延伸。
其中，所述第二通气孔设置于沿所述支架柱的轴向方向相邻设置的所述主支撑杆之间。
其中，所述支架进一步包括辅支撑环和多个辅支撑杆，所述辅支撑环设置于所述主支撑杆上且沿所述支架柱的径向方向与所述主支撑环间隔嵌套设置，所述多个辅支撑杆设置于所述辅支撑环上且向所述辅支撑环的外侧放射状延伸。
为解决上述技术问题，本发明提供的另一种技术方案是：提供一种真空镀膜的方法，所述方法包括：将待镀膜工件放置于支架上；所述支架放置于真空镀膜设备的气相沉积室内，以使所述待镀膜工件设置于所述气相沉积室内；从气相沉积室侧壁入口引入高分子材料裂解气体，所述高分子材料裂解气体经降温分流挡板冷却后扩散于气相沉积室内，旋转支架转动后在气相沉积室内均匀分布于，扩散并沉积于待镀膜工件上，并进一步通过导气柱的第一通气孔和支架的支架柱上的第二通气孔均匀抽出残余气体。
本发明的有益效果是：区别于现有技术，提供一种真空镀膜设备以及真空镀膜的方法，真空镀膜设备包括气相沉积室、支架以及导气柱，通过设置导气柱以及能够绕导气柱转动的支架柱，通过导气柱上的第一通气孔以及支架柱上的第二通气孔，将从引入的高分子材料裂解气体均匀的分散于真空镀膜设备的气相沉积室内以沉积在待镀膜工件上。通过这样的方式，能够有效提高真空纳米镀膜的效率以及镀膜的效果。
【附图说明】
图1是本发明实施例提供的一种真空镀膜设备的结构示意图；
图2是本发明实施例提供的一种真空镀膜设备的导气柱的结构示意图；
图3是本发明实施例提供的一种真空镀膜设备的支架柱的结构示意图；
图4是本发明实施例提供的一种真空镀膜设备的支架的结构示意图；
图5是本发明实施例提供的另一种真空镀膜设备的结构示意图；
图6是本发明实施例提供的一种真空镀膜的方法的流程图。
【具体实施方式】
下面结合附图和实施例对本发明进行详细说明。
请参阅图1，图1是本发明实施例提供的一种真空镀膜设备的结构示意图，本实施例的真空镀膜设备包括气相沉积室1、支架2以及导气柱32，支架2设置于气相沉积室1内且用于放置待镀膜工件，支架2包括支架柱22，导气柱32呈中空状且在导气柱32的侧壁上设置有多个第一通气孔321，支架柱22呈中空状且支架柱22的侧壁上设置有多个第二通气孔221，导气柱32从支架柱22的一端插入支架柱22，支架柱22嵌套设置于导气柱32外侧且能够绕导气柱32转动，引入的高分子材料裂解气体经第一通气孔321和第二通气孔221均匀扩散并沉积于待镀膜工件上。
其中，请结合参阅图2，图2是本发明实施例提供的一种真空镀膜设备的导气柱的结构示意图，如图所示，第一通气孔321为长度方向沿导气柱32的轴向方向设置的条形孔。
其中，优选地，沿导气柱32的轴向方向相邻设置的第一通气孔321沿导气柱32的轴向方向彼此错开。
其中，请结合参阅图3，图3是本发明实施例提供的一种真空镀膜设备的支架柱的结构示意图，如图所示，支架柱22的侧壁上设置的第二通气孔221为圆形孔，第一通气孔321的长度大于第二通气孔221的直径。
请继续参阅图1，本实施例的真空镀膜设备进一步包括设置于气相沉积室1侧壁的入口38以及设置于气相沉积室1内与入口37正对着的降温分流挡板38，经裂解的高分子材料气体经入口37引入，并经降温分流挡板38冷却后扩散于气相沉积室1内。
其中，本实施例的真空镀膜设备进一步包括磁性转动组件，磁性转动组件包括设置于气相沉积室1外侧的第一旋转磁体34以及设置于气相沉积室1内侧的第二旋转磁体35，第一旋转磁体34与第二旋转磁体35磁性耦合，第一旋转磁体34在旋转驱动马达带动下转动，并能够带动第二旋转磁体35转动，进而带动支架2转动。
其中，导气柱32贯穿气相沉积室1设置，第一旋转磁体34和第二旋转磁体35分别转动支撑于导气柱32上且能够绕导气柱32进行转动，进而带动支架2绕导气柱32进行转动。
优选地，导气柱32贯穿设置于气相沉积室1的底壁上且沿竖直方向延伸，支架柱22沿竖直方向嵌套至导气柱32外侧且承座于第二旋转磁体35上。
优选地，气相沉积室1的顶部上设置有开口36，支架2可以通过开口36放置于气相沉积室1中或者从气相沉积室1中取出。
请继续参阅图1，本实施例的真空镀膜设备还进一步包括设置于气相沉积室1外侧并与导气柱32连接的冷却塔39，气相沉积后的残余气体经过第二通气孔221和第一通气孔321进入导气柱32，进一步通过导气柱32导入到冷却塔39中。以避免残余气体向外扩散，同时冷却塔内还装设有传感器，通过传感器可以检测残余气体中高分子材料裂解气体的含量，并根据残余气体中高分子材料裂解气体的含量调节入口37，以减少或增加引入气相沉积室1的高分子裂解气体的量。
请进一步结合参阅图4，图4是本发明实施例提供的真空镀膜设备的支架的结构示意图，支架2进一步包括密封设置于支架柱22的另一端的顶盖33。其中，支架2进一步包括主支撑环28和多个主支撑杆231，主支撑环28与支架柱22嵌套设置且固定于支架柱22上，多个主支撑杆231设置于主支撑环28上且向主支撑环28的外侧呈放射状延伸。
优选地，第二通气孔221设置于沿支架柱22的轴向方向相邻设置的主支撑杆231之间。
其中，支架2进一步包括辅支撑环30和多个辅支撑杆232，辅支撑环30设置于主支撑杆232上且沿支架柱22的径向方向与主支撑环30间隔嵌套设置，多个辅支撑杆232设置于辅支撑环30上且向辅支撑环30的外侧放射状延伸。
请参阅图5，图5是本发明实施例提供的另一种真空镀膜设备，如图所示，本实施例的真空镀膜设备包括原料存储罐3、裂解炉4、气相沉积室1以及设置于气相沉积室内的支架2、降温分流挡板38、真空泵5、旋转驱动马达6、以及冷却塔39。
其中，原料存储罐3用于存储用于原料，即用于真空镀膜的高分子材料，比如Parylene N（聚对二甲苯）、Parylene C（聚一氯对二甲苯）和 Parylene D（聚二氯对二甲苯）的至少一种材料的裂解气体，其中最优选是聚对二甲苯裂解气体。并利用其内一级加热炉（图未示出）将原料加热到150度后形成气态高分子材料，导入到裂解炉中。
裂解炉4与原料存储罐3连接，接收经一级加热成气态的高分子材料，并进行二级加热到650度后裂解成高分子材料纳米气体，通过气相沉积室1侧壁的入口37将高分子材料纳米气体导入到气相沉积室1中。
高分子材料纳米气体从入口37进入后，经过降温分流挡板降温38，以避免650度的气体直接碰到待镀膜的产品上，裂解后的高分子材料纳米气体遇到降温分流挡板38后向四周扩散。
真空镀膜设备进一步包括排气柱32、旋转组件7、气相沉积室1以及设置于气相沉积室1内的支架2，这些构成部分的具体组成以及功能请参阅上述实施例的详细描述，本实施例不一一标注说明。
本实施例的真空镀膜设备还包括冷却塔39，冷却塔39设置于气相沉积室1外侧并与排气柱32连接，气相沉积后的残余气体经过支架的支架柱上的第二通气孔和排气柱32的第一通气孔进入排气柱，进一步通过排气柱32导入到冷却塔39中。经过冷却塔39把残余气体中的高分子材料气体迅速凝固，防止其对外扩散。
本实施例的真空镀膜设备进一步包括真空泵5，真空泵5与上述冷却塔39连接，以通过排气柱32对气相沉积室进行抽真空，使气相沉积室1形成真空负压，便于高效地实现气相沉积。
更进一步地，本实施例的真空镀膜设备还包括旋转驱动马达6，通过同步带与第一旋转磁体连接，用于驱动第一旋转磁体转动，带动第二旋转磁体，进而带动气相沉积室内的支架柱32进行转动。
需要说明的是，本发明实施例中的高分子材料可以是Parylene N（聚对二甲苯）、Parylene C（聚一氯对二甲苯）和 Parylene D（聚二氯对二甲苯）的至少一种材料，其中最优选是聚对二甲苯。
更进一步地，在以上提供的真空镀膜设备的基础上，本发明实施例还提供一种真空镀膜的方法，该真空镀膜方法通过使用上述的真空镀膜设备对待镀膜工件进行真空镀膜。请参阅图6，图6是本发明实施例提供的一种真空镀膜的方法的流程图，本实施例真空镀膜的方法包括：
S101：将待镀膜工件放置于支架上；
S102：支架放置于真空镀膜设备的气相沉积室内，以使待镀膜工件设置于气相沉积室内；
打开真空镀膜设备的气相沉积室上的开口，将放置好待镀膜工件的支架放置于真空镀膜设备的气相沉积室内，以使得待镀膜工件设置于气相沉积室内。
S103：从气相沉积室侧壁入口引入高分子材料裂解气体，高分子材料裂解气体经降温分流挡板冷却后扩散于气相沉积室内，旋转支架转动后在气相沉积室内均匀扩散并沉积于待镀膜工件上，并进一步通过导气柱的第一通气孔和支架的支架柱上的第二通气孔均匀抽出残余气体。
从气相沉积室侧壁入口将高分子材料裂解气体引入气相沉积室，驱动真空镀膜设备的第一旋转磁体进行转动，并带动第二旋转磁体进行转动，进而带动支架柱能够绕导气柱（残余气体排出管）进行转动，使得裂解气体能够均匀分散于气相沉积室内并沉积在待镀膜工件上。并把残余气体从中心残余气体排出管排出。经过冷却塔降温后实时监测残余气体中高分子裂解气体的含量，及时调整650度裂解炉的管道开口大小，使之实现高分子沉积效率最大化。真空泵不断从气相沉积室抽取真空（抽取气相沉积后的残余气体）使之让650度裂解炉的裂解纳米有机高分子不断向气相沉淀炉扩散。
其中，本发明实施例中的高分子材料可以Parylene N（聚对二甲苯）、Parylene C（聚一氯对二甲苯）和 Parylene D（聚二氯对二甲苯）的至少一种材料，其中最优选是聚对二甲苯。
以上本发明实施例提供的真空镀膜设备，提供一种真空镀膜设备，真空镀膜设备包括气相沉积室、支架以及导气柱，通过设置导气柱以及能够绕导气柱转动的支架柱，通过导气柱上的第一通气孔以及支架柱上的第二通气孔，将从引入的高分子材料裂解气体均匀的分散于真空镀膜设备的气相沉积室内以沉积在待镀膜工件上。通过这样的方式，能够有效提高真空纳米镀膜的效率以及镀膜的效果。
以上所述仅为本发明的具体实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (15)

  1. 一种真空镀膜设备，其特征在于，所述真空镀膜设备包括气相沉积室、支架以及导气柱，所述支架设置于所述气相沉积室内且用于放置待镀膜工件，所述支架包括支架柱，所述导气柱呈中空状且在所述导气柱的侧壁上设置有多个第一通气孔，所述支架柱呈中空状且所述支架柱的侧壁上设置有多个第二通气孔，所述导气柱从所述支架柱的一端插入所述支架柱，所述支架柱嵌套设置于所述导气柱外侧且能够绕所述导气柱转动，引入的高分子材料裂解气体经所述第一通气孔和所述第二通气孔均匀扩散并沉积于所述待镀膜工件上。
  2. 根据权利要求1所述的真空镀膜设备，其特征在于，所述第一通气孔为长度方向沿所述导气柱的轴向方向设置的条形孔。
  3. 根据权利要求2所述的真空镀膜设备，其特征在于，沿所述导气柱的轴向方向相邻设置的所述第一通气孔沿所述导气柱的轴向方向彼此错开。
  4. 根据权利要求2所述的真空镀膜设备，其特征在于，所述第二通气孔为圆形孔，所述第一通气孔的长度大于所述第二通气孔的直径。
  5. 根据权利要求1所述的真空镀膜设备，其特征在于，所述支架进一步包括密封设置于所述支架柱的另一端的顶盖。
  6. 根据权利要求1所述的真空镀膜设备，其特征在于，所述真空镀膜设备进一步包括设置于所述气相沉积室侧壁的入口以及设置于所述气相沉积室内与所述入口正对着的降温分流挡板，所述入口用于引入高分子材料裂解气体，所述高分子材料裂解气体经所述降温分流挡板冷却后扩散于所述气相沉积室内。
  7. 根据权利要求1所述的真空镀膜设备，其特征在于，所述真空镀膜设备进一步包括磁性转动组件，所述磁性转动组件包括设置于所述气相沉积室外侧的第一旋转磁体以及设置于所述气相沉积室内侧的第二旋转磁体，所述第一旋转磁体与所述第二旋转磁体磁性耦合，所述第一旋转磁体在旋转驱动电机带动下转动，并能够带动所述第二旋转磁体转动，进而带动所述支架柱能够绕所述导气柱转动。
  8. 根据权利要求7所述的真空镀膜设备，其特征在于，所述导气柱贯穿所述气相沉积室设置，所述第一旋转磁体和所述第二旋转磁体分别转动支撑于所述导气柱上且能够绕所述导气柱进行转动。
  9. 根据权利要求8所述的真空镀膜设备，其特征在于，所述导气柱贯穿设置于所述气相沉积室的底壁上且沿竖直方向延伸，所述支架柱沿所述竖直方向嵌套至所述导气柱外侧且承座于所述第二旋转磁体上。
  10. 根据权利要求9所述的真空镀膜设备，其特征在于，所述气相沉积室的顶部上设置有开口，所述支架可以通过所述入口放置于所述气相沉积室中或者从所述气相沉积室中取出。
  11. 根据权利要求1所述的真空镀膜设备，其特征在于，所述真空镀膜设备进一步包括设置于所述气相沉积室外侧并与所述导气柱连接的冷却塔，气相沉积后的残余气体经过所述第二通气孔和所述第一通气孔进入所述导气柱，进一步通过所述导气柱导入到所述冷却塔中。
  12. 根据权利要求1所述的真空镀膜设备，其特征在于，所述支架进一步包括主支撑环和多个主支撑杆，所述主支撑环与所述支架柱嵌套设置且固定于所述支架柱上，所述多个主支撑杆设置于所述主支撑环上且向所述主支撑环的外侧放射状延伸。
  13. 根据权利要求12所述的真空镀膜设备，其特征在于，所述第二通气孔设置于沿所述支架柱的轴向方向相邻设置的所述主支撑杆之间。
  14. 根据权利要求12所述的真空镀膜设备，其特征在于，所述支架进一步包括辅支撑环和多个辅支撑杆，所述辅支撑环设置于所述主支撑杆上且沿所述支架柱的径向方向与所述主支撑环间隔嵌套设置，所述多个辅支撑杆设置于所述辅支撑环上且向所述辅支撑环的外侧放射状延伸。
  15. 一种真空镀膜的方法，其特征在于，所述方法包括：
    将待镀膜工件放置于支架上；
    所述支架放置于真空镀膜设备的气相沉积室内，以使所述待镀膜工件设置于所述气相沉积室内；
    从气相沉积室侧壁入口引入高分子材料裂解气体，所述高分子材料裂解气体经降温分流挡板冷却后扩散于气相沉积室内，旋转支架转动后在气相沉积室内均匀分布于，扩散并沉积于待镀膜工件上，并进一步通过导气柱的第一通气孔和支架的支架柱上的第二通气孔均匀抽出残余气体。
PCT/CN2014/079755 2014-06-12 2014-06-12 一种真空镀膜设备以及真空镀膜的方法 Ceased WO2015188354A1 (zh)

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