WO2015188353A1 - Vacuum coating device - Google Patents
Vacuum coating device Download PDFInfo
- Publication number
- WO2015188353A1 WO2015188353A1 PCT/CN2014/079754 CN2014079754W WO2015188353A1 WO 2015188353 A1 WO2015188353 A1 WO 2015188353A1 CN 2014079754 W CN2014079754 W CN 2014079754W WO 2015188353 A1 WO2015188353 A1 WO 2015188353A1
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- WO
- WIPO (PCT)
- Prior art keywords
- bracket
- vapor deposition
- vacuum coating
- deposition chamber
- coating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Definitions
- the invention relates to a vacuum coating apparatus.
- the nano-protective film is formed on the surface of the product without gaps in a vacuum environment, and is called a vacuum vapor deposition nano-coating film.
- the nano-coating and traditional coating or spray coating and painting of this process have the following characteristics: 1. Waterproof, moisture-proof and no pores, good sealing; 2. Coating acid and alkali resistance, high insulation grade, anti-static generation; 3. Smooth coating surface , anti-fouling dirt adhesion, low friction, easy to scrub; 4, appearance color, can be adjusted according to demand, from high transparency to other colors. 5, the coating thickness is from 0.1 micron to more than 50 microns; 6, the coating adhesion is good, no internal internal stress, bubble holes, coating film to adapt to the ambient temperature ⁇ 200 ° C, does not fall off wrinkles.
- the raw material is vaporized at 150 ° C to form a gaseous state in the material chamber, and then enters a cracking furnace at a high temperature of about 650 ° C to be decomposed into nano-sized molecules. It enters the coating chamber at normal temperature, and forms a film by vapor deposition in a vacuum state to uniformly cover the pinholes and gaps on the surface of the product. It differs from metallization and spray paint in that it can be vacuum-vapor deposited nano-coating on the surface of the product and uniformly covered to form a pinhole-free, dense, transparent film.
- the invention provides a vacuum coating device capable of performing batch vacuum nano-coating on a workpiece to be coated, thereby improving the efficiency of the vacuum nano-coating of the workpiece to be coated and the coating effect.
- the present invention provides a vacuum coating apparatus including a vapor deposition chamber, a bracket, and a magnetic rotating component connected to the bracket, the bracket being disposed on a vapor deposition chamber for placing a workpiece to be coated, the magnetic rotating assembly comprising a first rotating magnet disposed on an outer side of the vapor deposition chamber and a second rotating magnet disposed on a side of the vapor deposition chamber, A rotating magnet is magnetically coupled to the second rotating magnet, and the first rotating magnet is rotated by the synchronous motor, and can drive the second rotating magnet to rotate, thereby driving the bracket to rotate.
- the vacuum coating apparatus further includes an exhaust column disposed through the vapor deposition chamber, the first rotating magnet and the second rotating magnet being respectively rotatably supported on the exhaust column and Rotating around the exhaust column, thereby driving the bracket to rotate around the exhaust column.
- the bracket includes a bracket column, and the bracket column is hollow.
- the exhaust column is inserted into the bracket column from one end of the bracket column, and the bracket column is nested outside the exhaust column.
- the exhaust column is disposed on a bottom wall of the vapor deposition chamber and extends in a vertical direction, and the bracket column is nested to the outside of the exhaust column in the vertical direction and is seated in the first
- the rotating magnet is rotated around the exhaust column by the second rotating magnet.
- top of the vapor deposition chamber is provided with an opening through which the support can be placed in or taken out of the vapor deposition chamber.
- the vacuum coating apparatus further includes an inlet disposed at a sidewall of the vapor deposition chamber and a temperature reducing splitter baffle disposed in the vapor deposition chamber opposite the inlet, the inlet for introducing a polymer material
- the cracking gas is cooled by the cooling material splitting baffle and diffused in the vapor deposition chamber.
- the exhaust column is hollow and a plurality of first ventilation holes are disposed on a sidewall of the exhaust column, and a plurality of second ventilation holes are disposed on a sidewall of the support column, the height
- the molecular material cracking gas is uniformly diffused through the first vent hole and the second vent hole and deposited on the workpiece to be coated.
- the first vent hole is a strip hole provided in the longitudinal direction along the axial direction of the exhaust column.
- the first vent holes disposed adjacent to each other in the axial direction of the exhaust column are staggered from each other in the axial direction of the exhaust column.
- the second vent hole is a circular hole, and the length of the first vent hole is larger than the diameter of the second vent hole.
- the vacuum coating apparatus further includes a cooling tower disposed on the outdoor side of the vapor deposition chamber and connected to the exhaust column, and the residual gas after vapor deposition passes through the second vent hole and the first vent hole The exhaust column is further introduced into the cooling tower through the exhaust column.
- bracket further comprises a top cover sealed to the other end of the bracket post.
- the bracket further includes a main support ring and a plurality of main support bars, the main support ring and the support post are nested and fixed on the support post, and the plurality of main support bars are disposed on the bracket
- the main support ring extends radially outward of the main support ring.
- the second vent hole is disposed between the main support bars disposed adjacent to each other along an axial direction of the bracket column.
- the bracket further includes an auxiliary support ring and a plurality of auxiliary support rods, wherein the auxiliary support ring is disposed on the main support rod and is nested with the main support ring in a radial direction of the support post
- the plurality of auxiliary support rods are disposed on the auxiliary support ring and extend radially outward of the auxiliary support ring.
- a vacuum coating device includes a vapor deposition chamber, a bracket and a magnetic rotating component connected to the bracket, and the magnetic rotating component is disposed through the vacuum coating device.
- the rotating magnet rotates, which in turn drives the vacuum coating device to rotate the bracket for placing the workpiece to be coated.
- FIG. 1 is a schematic structural view of a vacuum coating apparatus according to an embodiment of the present invention.
- FIG. 2 is a schematic structural view of an exhaust column of a vacuum coating apparatus according to an embodiment of the present invention
- FIG. 3 is a schematic structural view of a bracket column of a vacuum coating apparatus according to an embodiment of the present invention.
- FIG. 4 is a schematic structural view of a bracket of a vacuum coating apparatus according to an embodiment of the present invention.
- FIG. 5 is a schematic structural view of another vacuum coating apparatus according to an embodiment of the present invention.
- FIG. 1 is a schematic structural diagram of a vacuum coating apparatus according to an embodiment of the present invention.
- the vacuum coating apparatus of the embodiment includes a vapor deposition chamber 1, a bracket 2, and a magnetic rotating component connected to the bracket 2, and the bracket 2 Provided in the vapor deposition chamber 1 for placing a workpiece to be coated, the magnetic rotating assembly includes a first rotating magnet 34 disposed outside the vapor deposition chamber 1 and a second rotating magnet 35 disposed inside the vapor deposition chamber 1, the first rotation The magnet 34 is magnetically coupled to the second rotating magnet 35.
- the rotary driving motor (not shown) drives the first rotating magnet 34 to rotate, and the first rotating magnet 34 drives the second rotating magnet 35 to rotate, thereby driving the bracket 2 to rotate.
- the vacuum coating apparatus of the embodiment of the present invention further includes an exhaust column 32 disposed through the vapor deposition chamber 1 , and the first rotating magnet 34 and the second rotating magnet 35 are respectively rotatably supported on the exhaust column 32 and capable of being Rotating around the exhaust column 32, thereby driving the bracket 2 to rotate around the exhaust column 32.
- the bracket 2 includes a bracket column 22, and the bracket column 22 is hollow.
- the exhaust column 32 is inserted into the bracket column 22 from one end of the bracket column 22.
- the bracket column 22 is nested outside the exhaust column 32, and the exhaust column 32 is disposed through.
- the lower exhaust column 32 is rotated.
- an opening 36 is provided on the top of the vapor deposition chamber 1 to allow the stent 2 to be placed in the vapor deposition chamber 1 through the opening 36 or to be removed from the vapor deposition chamber 1.
- the vacuum coating apparatus of the present embodiment further includes an inlet 37 disposed at a sidewall of the vapor deposition chamber 1 and a temperature-reducing splitter baffle 38 disposed opposite the inlet 37 in the vapor deposition chamber, and the cracked polymer material gas is passed through the inlet. 37 is introduced and cooled by the cooling splitter baffle 38 to diffuse into the vapor deposition chamber 1.
- the exhaust column 32 is hollow, and a plurality of first ventilation holes 321 are disposed on the sidewall of the exhaust column 32, and a plurality of second ventilation holes 221 are disposed on the sidewall of the support column 22 to further exhaust the exhaust holes.
- the polymer material cracking gas introduced by the column 32 enters the vapor deposition chamber 1 through the first vent hole 321 and the second vent hole 221 and is deposited on the workpiece to be coated.
- FIG. 2 is a schematic structural diagram of an exhaust column of a vacuum coating apparatus according to an embodiment of the present invention.
- the first ventilation hole 321 is a longitudinal direction along the axis of the exhaust column 32.
- a strip hole that is oriented in the direction.
- the first vent holes 321 disposed adjacently in the axial direction of the exhaust column 32 are staggered from each other in the axial direction of the exhaust column 32.
- FIG. 3 is a schematic structural diagram of a bracket column of a vacuum coating apparatus according to an embodiment of the present invention.
- the second vent hole 221 of the bracket column 22 is a circular hole, and the first pass The length of the air hole 321 is larger than the diameter of the second ventilation hole 221.
- the vacuum coating apparatus of the present embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, and the residual gas after vapor deposition passes through the second vent 221 and the first
- the vent 321 enters the exhaust column 32 and is further introduced into the cooling tower 39 through the exhaust column 32.
- a sensor is also installed in the cooling tower, and the content of the cracking gas of the polymer material in the residual gas can be detected by the sensor, and the inlet 37 is adjusted according to the content of the cracking gas of the polymer material in the residual gas to reduce or The amount of the polymer cracking gas introduced into the vapor deposition chamber 1 is increased.
- FIG. 4 is a schematic structural diagram of a bracket of a vacuum coating apparatus according to an embodiment of the present invention.
- the bracket 2 further includes a top cover 33 sealed on the other end of the bracket post 22 .
- the bracket 2 further includes a main support ring 28 and a plurality of main support bars 231.
- the main support ring 28 is nested and fixed on the support post 22, and the plurality of main support bars 231 are disposed on the main support ring 28. And extending radially to the outside of the main support ring 28.
- the second vent holes 221 are disposed between the main support bars 231 disposed adjacent to each other in the axial direction of the bracket column 22.
- the residual gas after vacuum deposition in the vapor deposition chamber 1 can be uniformly extracted from the exhaust column 32 through the first vent hole 321 and the second vent hole 221.
- the bracket 2 further includes an auxiliary support ring 30 and a plurality of auxiliary support rods 232.
- the auxiliary support ring 30 is disposed on the main support rod 232 and spaced apart from the main support ring 30 along the radial direction of the support post 22, and a plurality of The auxiliary support bar 232 is disposed on the auxiliary support ring 30 and extends radially outward of the auxiliary support ring 30.
- the first auxiliary support ring 30 and the second auxiliary support ring 31 can be provided with as many support bars as possible.
- FIG. 5 is another vacuum coating apparatus according to an embodiment of the present invention.
- the vacuum coating apparatus of the embodiment includes a raw material storage tank 3, a cracking furnace 4, a vapor deposition chamber 1 and a The holder 2 in the vapor deposition chamber, the temperature reducing splitter 38, the vacuum pump 5, the rotary drive motor 6, and the cooling tower 39.
- the raw material storage tank 3 is used for storing a polymer material for a raw material, that is, for vacuum coating, such as Parylene.
- a polymer material for a raw material such as Parylene.
- N parylene
- Parylene C polychloro-p-xylene
- Parylene A cracking gas of at least one material of D polydichloro-p-xylene
- the raw material is heated to 150 degrees by using a first-stage heating furnace (not shown) to form a gaseous polymer material, which is introduced into a cracking furnace.
- the cracking furnace 4 is connected to the raw material storage tank 3, receives the polymer material heated to the gaseous state by the first stage, and is subjected to secondary heating to 650 degrees, and then is cracked into a nanometer gas of the polymer material, and is passed through the inlet 37 of the side wall of the vapor deposition chamber 1.
- the polymer material nano gas is introduced into the vapor deposition chamber 1.
- the temperature is lowered by the cooling and splitting baffle 38 to prevent the 650-degree gas from directly hitting the product to be coated, and the cracked polymer material nano gas encounters the cooling and distributing baffle 38. Spread to the surrounding.
- the vacuum coating apparatus further includes a discharge column 32, a rotating assembly 7, a vapor deposition chamber 1, and a support 2 disposed in the vapor deposition chamber 1.
- the vacuum coating apparatus of this embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, and the residual gas after vapor deposition passes through the second vent hole and the row on the support column of the bracket.
- the first vent of the gas column 32 enters the exhaust column and is further introduced into the cooling tower 39 through the exhaust column 32.
- the polymer material gas in the residual gas is rapidly solidified by the cooling tower 39 to prevent its outward diffusion.
- the vacuum coating apparatus of the present embodiment further includes a vacuum pump 5 connected to the cooling tower 39 to evacuate the vapor deposition chamber through the exhaust column 32 to form a vacuum negative pressure in the vapor deposition chamber 1 to facilitate efficient gas phase realization. Deposition.
- the vacuum coating apparatus of the embodiment further includes a rotary drive motor 6 connected to the first rotating magnet through a timing belt for driving the rotation of the first rotating magnet to drive the second rotating magnet, thereby driving the bracket in the vapor deposition chamber.
- the column 32 is rotated.
- the polymer material in the embodiment of the present invention may be Parylene N (parylene), Parylene. At least one material of C (polychloro-p-xylene) and Parylene D (polydichloro-p-xylene), most preferably parylene.
- the vacuum coating apparatus includes a vapor deposition chamber, a bracket, and a magnetic rotating component connected to the bracket, and the magnetic rotating component passes through the first rotating magnet disposed on the outdoor side of the vapor deposition apparatus of the vacuum coating apparatus and a second rotating magnet disposed on the side of the vapor deposition chamber, wherein the first rotating magnet is magnetically coupled to the second rotating magnet, and the first rotating magnet is rotated by the synchronous motor to drive the second rotating magnet to rotate, thereby driving the vacuum coating device
- the holder for placing the workpiece to be coated is rotated.
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Abstract
Description
【技术领域】[Technical Field]
本发明涉及一种真空镀膜设备。The invention relates to a vacuum coating apparatus.
【背景技术】 【Background technique】
将高分子材料裂解成纳米分子后在真空环境内均匀无间隙附着在产品表面形成纳米保护膜,称之为真空气相沉积纳米镀膜。这种工艺的纳米镀膜与传统镀膜或者喷油、喷漆具有以下特性:1、防水防潮无细孔,密封性好;2、镀膜耐酸碱、绝缘等级高、防静电产生;3、镀膜表面平顺,防污脏物粘附,摩擦力小,易擦洗;4、外观色泽,可根据需求调整,从高透明到其它颜色。5、镀膜厚度是从0.1微米到50微米以上皆可;6、镀膜附着力好,无内内应力,气泡孔,镀膜适应环境温度±200℃,不脱落不起皱。After the polymer material is cleaved into nano-molecules, the nano-protective film is formed on the surface of the product without gaps in a vacuum environment, and is called a vacuum vapor deposition nano-coating film. The nano-coating and traditional coating or spray coating and painting of this process have the following characteristics: 1. Waterproof, moisture-proof and no pores, good sealing; 2. Coating acid and alkali resistance, high insulation grade, anti-static generation; 3. Smooth coating surface , anti-fouling dirt adhesion, low friction, easy to scrub; 4, appearance color, can be adjusted according to demand, from high transparency to other colors. 5, the coating thickness is from 0.1 micron to more than 50 microns; 6, the coating adhesion is good, no internal internal stress, bubble holes, coating film to adapt to the ambient temperature ± 200 ° C, does not fall off wrinkles.
纳米镀膜时,原料在材料室内经过150℃的汽化形成气态后进入到高温650℃左右的裂解炉,分解成纳米级分子。进入到常温的镀膜室,在真空状态下以气相沉积防水形成薄膜,均匀覆盖产品表面针孔及间隙。它与金属喷镀及喷油漆不同之处在于,只要产品表面与空气接触都能都能被真空气相沉积纳米镀膜,均匀覆盖,形成无针孔、致密均匀、高透明的薄膜。In the nano-coating, the raw material is vaporized at 150 ° C to form a gaseous state in the material chamber, and then enters a cracking furnace at a high temperature of about 650 ° C to be decomposed into nano-sized molecules. It enters the coating chamber at normal temperature, and forms a film by vapor deposition in a vacuum state to uniformly cover the pinholes and gaps on the surface of the product. It differs from metallization and spray paint in that it can be vacuum-vapor deposited nano-coating on the surface of the product and uniformly covered to form a pinhole-free, dense, transparent film.
由于纳米镀膜时,需镀膜的产品表面都要与空气接触,因此,如何对镀膜设备进行改进以适应不同产品镀膜是一个有待解决的技术问题。Because of the nano-coating, the surface of the product to be coated must be in contact with air. Therefore, how to improve the coating equipment to adapt to different product coatings is a technical problem to be solved.
【发明内容】 [Summary of the Invention]
本发明提供一种真空镀膜设备,能够对待镀膜工件实行批量真空纳米镀膜,提高待镀膜工件真空纳米镀膜的效率以及镀膜效果。The invention provides a vacuum coating device capable of performing batch vacuum nano-coating on a workpiece to be coated, thereby improving the efficiency of the vacuum nano-coating of the workpiece to be coated and the coating effect.
为解决上述技术问题,本发明提供的一种技术方案是:提供一种真空镀膜设备,所述真空镀膜设备包括气相沉积室、支架以及与所述支架连接的磁性转动组件,所述支架设置于所述气相沉积室内且用于放置待镀膜工件,所述磁性转动组件包括设置于所述气相沉积室外侧的第一旋转磁体以及设置于所述气相沉积室内侧的第二旋转磁体,所述第一旋转磁体与所述第二旋转磁体磁性耦合,所述第一旋转磁体在同步电机带动下转动,并能够带动所述第二旋转磁体转动,进而带动所述支架转动。In order to solve the above technical problem, the present invention provides a vacuum coating apparatus including a vapor deposition chamber, a bracket, and a magnetic rotating component connected to the bracket, the bracket being disposed on a vapor deposition chamber for placing a workpiece to be coated, the magnetic rotating assembly comprising a first rotating magnet disposed on an outer side of the vapor deposition chamber and a second rotating magnet disposed on a side of the vapor deposition chamber, A rotating magnet is magnetically coupled to the second rotating magnet, and the first rotating magnet is rotated by the synchronous motor, and can drive the second rotating magnet to rotate, thereby driving the bracket to rotate.
其中,所述真空镀膜设备进一步包括排气柱,所述排气柱贯穿所述气相沉积室设置,所述第一旋转磁体和所述第二旋转磁体分别转动支撑于所述排气柱上且能够绕所述排气柱进行转动,进而带动所述支架绕所述排气柱进行转动。Wherein the vacuum coating apparatus further includes an exhaust column disposed through the vapor deposition chamber, the first rotating magnet and the second rotating magnet being respectively rotatably supported on the exhaust column and Rotating around the exhaust column, thereby driving the bracket to rotate around the exhaust column.
其中,所述支架包括支架柱,所述支架柱呈中空状,所述排气柱从所述支架柱的一端插入所述支架柱,所述支架柱嵌套设置于所述排气柱外侧,所述排气柱贯穿设置于所述气相沉积室的底壁上且沿竖直方向延伸,所述支架柱沿所述竖直方向嵌套至所述排气柱外侧且承座于所述第二旋转磁体上,进而在所述第二旋转磁体带动下绕所述排气柱进行转动。The bracket includes a bracket column, and the bracket column is hollow. The exhaust column is inserted into the bracket column from one end of the bracket column, and the bracket column is nested outside the exhaust column. The exhaust column is disposed on a bottom wall of the vapor deposition chamber and extends in a vertical direction, and the bracket column is nested to the outside of the exhaust column in the vertical direction and is seated in the first The rotating magnet is rotated around the exhaust column by the second rotating magnet.
其中,所述气相沉积室的顶部上设置有开口,所述支架可以通过所述入口放置于所述气相沉积室中或者从所述气相沉积室中取出。Wherein the top of the vapor deposition chamber is provided with an opening through which the support can be placed in or taken out of the vapor deposition chamber.
其中,所述真空镀膜设备进一步包括设置于所述气相沉积室侧壁的入口以及设置于所述气相沉积室内与所述入口正对着的降温分流挡板,所述入口用于引入高分子材料裂解气体,所述高分子材料裂解气体经所述降温分流挡板冷却后扩散于所述气相沉积室内。Wherein the vacuum coating apparatus further includes an inlet disposed at a sidewall of the vapor deposition chamber and a temperature reducing splitter baffle disposed in the vapor deposition chamber opposite the inlet, the inlet for introducing a polymer material The cracking gas is cooled by the cooling material splitting baffle and diffused in the vapor deposition chamber.
其中,所述排气柱呈中空状且在所述排气柱的侧壁上设置有多个第一通气孔,所述支架柱的侧壁上设置有多个第二通气孔,所述高分子材料裂解气体经所述第一通气孔和所述第二通气孔均匀扩散并沉积于所述待镀膜工件上。Wherein, the exhaust column is hollow and a plurality of first ventilation holes are disposed on a sidewall of the exhaust column, and a plurality of second ventilation holes are disposed on a sidewall of the support column, the height The molecular material cracking gas is uniformly diffused through the first vent hole and the second vent hole and deposited on the workpiece to be coated.
其中,所述第一通气孔为长度方向沿所述排气柱的轴向方向设置的条形孔。Wherein, the first vent hole is a strip hole provided in the longitudinal direction along the axial direction of the exhaust column.
其中,沿所述排气柱的轴向方向相邻设置的所述第一通气孔沿所述排气柱的轴向方向彼此错开。The first vent holes disposed adjacent to each other in the axial direction of the exhaust column are staggered from each other in the axial direction of the exhaust column.
其中,所述第二通气孔为圆形孔,所述第一通气孔的长度大于所述第二通气孔的直径。The second vent hole is a circular hole, and the length of the first vent hole is larger than the diameter of the second vent hole.
其中,所述真空镀膜设备进一步包括设置于所述气相沉积室外侧并与所述排气柱连接的冷却塔,气相沉积后的残余气体经过所述第二通气孔和所述第一通气孔进入所述排气柱,进一步通过所述排气柱导入到所述冷却塔中。Wherein the vacuum coating apparatus further includes a cooling tower disposed on the outdoor side of the vapor deposition chamber and connected to the exhaust column, and the residual gas after vapor deposition passes through the second vent hole and the first vent hole The exhaust column is further introduced into the cooling tower through the exhaust column.
其中,所述支架进一步包括密封设置于所述支架柱的另一端的顶盖。Wherein the bracket further comprises a top cover sealed to the other end of the bracket post.
其中,所述支架进一步包括主支撑环和多个主支撑杆,所述主支撑环与所述支架柱嵌套设置且固定于所述支架柱上,所述多个主支撑杆设置于所述主支撑环上且向所述主支撑环的外侧放射状延伸。The bracket further includes a main support ring and a plurality of main support bars, the main support ring and the support post are nested and fixed on the support post, and the plurality of main support bars are disposed on the bracket The main support ring extends radially outward of the main support ring.
其中,所述第二通气孔设置于沿所述支架柱的轴向方向相邻设置的所述主支撑杆之间。The second vent hole is disposed between the main support bars disposed adjacent to each other along an axial direction of the bracket column.
其中,所述支架进一步包括辅支撑环和多个辅支撑杆,所述辅支撑环设置于所述主支撑杆上且沿所述支架柱的径向方向与所述主支撑环间隔嵌套设置,所述多个辅支撑杆设置于所述辅支撑环上且向所述辅支撑环的外侧放射状延伸。Wherein, the bracket further includes an auxiliary support ring and a plurality of auxiliary support rods, wherein the auxiliary support ring is disposed on the main support rod and is nested with the main support ring in a radial direction of the support post The plurality of auxiliary support rods are disposed on the auxiliary support ring and extend radially outward of the auxiliary support ring.
本发明的有益效果是:区别于现有技术,提供一种真空镀膜设备,真空镀膜设备包括气相沉积室、支架以及与所述支架连接的磁性转动组件,磁性转动组件通过设置于真空镀膜设备的气相沉积室外侧的第一旋转磁体以及设置于气相沉积室内侧的第二旋转磁体,其中第一旋转磁体与第二旋转磁体磁性耦合,第一旋转磁体在同步电机带动下转动,并带动第二旋转磁体转动,进而带动真空镀膜设备用于放置待镀膜工件的支架转动。通过这样的设计,能够避免漏气现象,而且能够对待镀膜工件进行批量真空纳米镀膜,有效提高待镀膜工件真空纳米镀膜的效率以及镀膜效果。The invention has the beneficial effects that: different from the prior art, a vacuum coating device includes a vapor deposition chamber, a bracket and a magnetic rotating component connected to the bracket, and the magnetic rotating component is disposed through the vacuum coating device. a first rotating magnet on the outdoor side of the vapor deposition and a second rotating magnet disposed on the side of the vapor deposition chamber, wherein the first rotating magnet is magnetically coupled to the second rotating magnet, and the first rotating magnet is rotated by the synchronous motor and drives the second The rotating magnet rotates, which in turn drives the vacuum coating device to rotate the bracket for placing the workpiece to be coated. Through such a design, leakage can be avoided, and batch vacuum nano-coating can be performed on the coated workpiece, thereby effectively improving the efficiency of the vacuum nano-coating of the workpiece to be coated and the coating effect.
【附图说明】 [Description of the Drawings]
图1是本发明实施例提供的一种真空镀膜设备的结构示意图;1 is a schematic structural view of a vacuum coating apparatus according to an embodiment of the present invention;
图2是本发明实施例提供的一种真空镀膜设备的排气柱的结构示意图;2 is a schematic structural view of an exhaust column of a vacuum coating apparatus according to an embodiment of the present invention;
图3是本发明实施例提供的一种真空镀膜设备的支架柱的结构示意图;3 is a schematic structural view of a bracket column of a vacuum coating apparatus according to an embodiment of the present invention;
图4是本发明实施例提供的一种真空镀膜设备的支架的结构示意图;4 is a schematic structural view of a bracket of a vacuum coating apparatus according to an embodiment of the present invention;
图5是本发明实施例提供的另一种真空镀膜设备的结构示意图。FIG. 5 is a schematic structural view of another vacuum coating apparatus according to an embodiment of the present invention.
【具体实施方式】 【detailed description】
下面结合附图和实施例对本发明进行详细说明。The invention will now be described in detail in conjunction with the drawings and embodiments.
请参阅图1,图1是本发明实施例提供的一种真空镀膜设备的结构示意图,本实施例的真空镀膜设备包括气相沉积室1、支架2以及与支架2连接的磁性转动组件,支架2设置于气相沉积室1内且用于放置待镀膜工件,磁性转动组件包括设置于气相沉积室1外侧的第一旋转磁体34以及设置于气相沉积室1内侧的第二旋转磁体35,第一旋转磁体34与第二旋转磁体35磁性耦合,旋转驱动马达(未示出)带动第一旋转磁体34转动,第一旋转磁体34带动第二旋转磁体35转动,进而带动支架2转动。Please refer to FIG. 1. FIG. 1 is a schematic structural diagram of a vacuum coating apparatus according to an embodiment of the present invention. The vacuum coating apparatus of the embodiment includes a vapor deposition chamber 1, a bracket 2, and a magnetic rotating component connected to the bracket 2, and the bracket 2 Provided in the vapor deposition chamber 1 for placing a workpiece to be coated, the magnetic rotating assembly includes a first rotating magnet 34 disposed outside the vapor deposition chamber 1 and a second rotating magnet 35 disposed inside the vapor deposition chamber 1, the first rotation The magnet 34 is magnetically coupled to the second rotating magnet 35. The rotary driving motor (not shown) drives the first rotating magnet 34 to rotate, and the first rotating magnet 34 drives the second rotating magnet 35 to rotate, thereby driving the bracket 2 to rotate.
其中,本发明实施例的真空镀膜设备进一步包括排气柱32,排气柱32贯穿气相沉积室1设置,第一旋转磁体34和第二旋转磁体35分别转动支撑于排气柱32上且能够绕排气柱32进行转动,进而带动支架2绕排气柱32进行转动。The vacuum coating apparatus of the embodiment of the present invention further includes an exhaust column 32 disposed through the vapor deposition chamber 1 , and the first rotating magnet 34 and the second rotating magnet 35 are respectively rotatably supported on the exhaust column 32 and capable of being Rotating around the exhaust column 32, thereby driving the bracket 2 to rotate around the exhaust column 32.
其中,支架2包括支架柱22,支架柱22呈中空状,排气柱32从支架柱22的一端插入支架柱22,支架柱22嵌套设置于排气柱32外侧,排气柱32贯穿设置于气相沉积室1的底壁上且沿竖直方向延伸,支架柱22沿竖直方向嵌套至排气柱32外侧且承座于第二旋转磁体35上,进而在第二旋转磁体35带动下绕排气柱32进行转动。The bracket 2 includes a bracket column 22, and the bracket column 22 is hollow. The exhaust column 32 is inserted into the bracket column 22 from one end of the bracket column 22. The bracket column 22 is nested outside the exhaust column 32, and the exhaust column 32 is disposed through. On the bottom wall of the vapor deposition chamber 1 and extending in the vertical direction, the support column 22 is nested in the vertical direction outside the exhaust column 32 and seated on the second rotating magnet 35, thereby being driven by the second rotating magnet 35. The lower exhaust column 32 is rotated.
优选地,气相沉积室1的顶部上设置有开口36,以允许通过开口36将支架2放置于气相沉积室1中或者从气相沉积室1中取出支架2。Preferably, an opening 36 is provided on the top of the vapor deposition chamber 1 to allow the stent 2 to be placed in the vapor deposition chamber 1 through the opening 36 or to be removed from the vapor deposition chamber 1.
其中,本实施例的真空镀膜设备进一步包括设置于气相沉积室1侧壁的入口37以及设置于气相沉积室内与入口37正对着的降温分流挡板38,经裂解的高分子材料气体经入口37引入,并经降温分流挡板38冷却后扩散于气相沉积室1内。The vacuum coating apparatus of the present embodiment further includes an inlet 37 disposed at a sidewall of the vapor deposition chamber 1 and a temperature-reducing splitter baffle 38 disposed opposite the inlet 37 in the vapor deposition chamber, and the cracked polymer material gas is passed through the inlet. 37 is introduced and cooled by the cooling splitter baffle 38 to diffuse into the vapor deposition chamber 1.
其中,排气柱32呈中空状且在排气柱32的侧壁上设置有多个第一通气孔321,支架柱22的侧壁上设置有多个第二通气孔221,进而使排气柱32所引入的高分子材料裂解气体经第一通气孔321和第二通气孔221进入气相沉积室1并沉积于待镀膜工件上。The exhaust column 32 is hollow, and a plurality of first ventilation holes 321 are disposed on the sidewall of the exhaust column 32, and a plurality of second ventilation holes 221 are disposed on the sidewall of the support column 22 to further exhaust the exhaust holes. The polymer material cracking gas introduced by the column 32 enters the vapor deposition chamber 1 through the first vent hole 321 and the second vent hole 221 and is deposited on the workpiece to be coated.
其中,请进一步结合图2,图2是本发明实施例提供的一种真空镀膜设备的排气柱的结构示意图,如图所示,第一通气孔321为长度方向沿排气柱32的轴向方向设置的条形孔。2, FIG. 2 is a schematic structural diagram of an exhaust column of a vacuum coating apparatus according to an embodiment of the present invention. As shown in the figure, the first ventilation hole 321 is a longitudinal direction along the axis of the exhaust column 32. A strip hole that is oriented in the direction.
优选地,沿排气柱32的轴向方向相邻设置的第一通气孔321沿排气柱32的轴向方向彼此错开。Preferably, the first vent holes 321 disposed adjacently in the axial direction of the exhaust column 32 are staggered from each other in the axial direction of the exhaust column 32.
其中,请进一步结合图3,图3是本发明实施例提供的真空镀膜设备的支架柱的结构示意图,如图所示,支架柱22上的第二通气孔221为圆形孔,第一通气孔321的长度大于第二通气孔221的直径。FIG. 3 is a schematic structural diagram of a bracket column of a vacuum coating apparatus according to an embodiment of the present invention. As shown in the figure, the second vent hole 221 of the bracket column 22 is a circular hole, and the first pass The length of the air hole 321 is larger than the diameter of the second ventilation hole 221.
请继续参阅图1,本实施例的真空镀膜设备还进一步包括设置于气相沉积室1外侧并与排气柱32连接的冷却塔39,气相沉积后的残余气体经过第二通气孔221和第一通气孔321进入排气柱32,进一步通过排气柱32导入到冷却塔39中。以避免残余气体向外扩散,同时冷却塔内还装设有传感器,通过传感器可以检测残余气体中高分子材料裂解气体的含量,并根据残余气体中高分子材料裂解气体的含量调节入口37,以减少或增加引入气相沉积室1的高分子裂解气体的量。Referring to FIG. 1, the vacuum coating apparatus of the present embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, and the residual gas after vapor deposition passes through the second vent 221 and the first The vent 321 enters the exhaust column 32 and is further introduced into the cooling tower 39 through the exhaust column 32. In order to avoid the outflow of residual gas, a sensor is also installed in the cooling tower, and the content of the cracking gas of the polymer material in the residual gas can be detected by the sensor, and the inlet 37 is adjusted according to the content of the cracking gas of the polymer material in the residual gas to reduce or The amount of the polymer cracking gas introduced into the vapor deposition chamber 1 is increased.
请进一步结合参阅图4,图4是本发明实施例提供的真空镀膜设备的支架的结构示意图,支架2进一步包括密封设置于支架柱22的另一端的顶盖33。Please refer to FIG. 4 for further reference. FIG. 4 is a schematic structural diagram of a bracket of a vacuum coating apparatus according to an embodiment of the present invention. The bracket 2 further includes a top cover 33 sealed on the other end of the bracket post 22 .
其中,支架2进一步包括主支撑环28和多个主支撑杆231,主支撑环28与支架柱22嵌套设置且固定于支架柱22上,多个主支撑杆231设置于主支撑环28上且向主支撑环28的外侧呈放射状延伸。The bracket 2 further includes a main support ring 28 and a plurality of main support bars 231. The main support ring 28 is nested and fixed on the support post 22, and the plurality of main support bars 231 are disposed on the main support ring 28. And extending radially to the outside of the main support ring 28.
第二通气孔221设置于沿支架柱22的轴向方向相邻设置的主支撑杆231之间。以使得气相沉积室1内经真空沉积后的残余气体能够均匀地经第一通气孔321以及第二通气孔221从排气柱32中抽出。The second vent holes 221 are disposed between the main support bars 231 disposed adjacent to each other in the axial direction of the bracket column 22. The residual gas after vacuum deposition in the vapor deposition chamber 1 can be uniformly extracted from the exhaust column 32 through the first vent hole 321 and the second vent hole 221.
其中,支架2进一步包括辅支撑环30和多个辅支撑杆232,辅支撑环30设置于主支撑杆232上且沿支架柱22的径向方向与主支撑环30间隔嵌套设置,多个辅支撑杆232设置于辅支撑环30上且向辅支撑环30的外侧放射状延伸。The bracket 2 further includes an auxiliary support ring 30 and a plurality of auxiliary support rods 232. The auxiliary support ring 30 is disposed on the main support rod 232 and spaced apart from the main support ring 30 along the radial direction of the support post 22, and a plurality of The auxiliary support bar 232 is disposed on the auxiliary support ring 30 and extends radially outward of the auxiliary support ring 30.
通过支架2上的第一主支撑环28以及第二主支撑环29,第一辅支撑环30、第二辅支撑环31,能够设置尽可能多的支撑杆。Through the first main support ring 28 and the second main support ring 29 on the bracket 2, the first auxiliary support ring 30 and the second auxiliary support ring 31 can be provided with as many support bars as possible.
请参阅图5,图5是本发明实施例提供的另一种真空镀膜设备,如图所示,本实施例的真空镀膜设备包括原料存储罐3、裂解炉4、气相沉积室1以及设置于气相沉积室内的支架2、降温分流挡板38、真空泵5、旋转驱动马达6、以及冷却塔39。Please refer to FIG. 5. FIG. 5 is another vacuum coating apparatus according to an embodiment of the present invention. As shown in the figure, the vacuum coating apparatus of the embodiment includes a raw material storage tank 3, a cracking furnace 4, a vapor deposition chamber 1 and a The holder 2 in the vapor deposition chamber, the temperature reducing splitter 38, the vacuum pump 5, the rotary drive motor 6, and the cooling tower 39.
其中,原料存储罐3用于存储用于原料,即用于真空镀膜的高分子材料,比如Parylene N(聚对二甲苯)、Parylene C(聚一氯对二甲苯)和 Parylene D(聚二氯对二甲苯)的至少一种材料的裂解气体,其中最优选是聚对二甲苯裂解气体。并利用其内一级加热炉(图未示出)将原料加热到150度后形成气态高分子材料,导入到裂解炉中。Among them, the raw material storage tank 3 is used for storing a polymer material for a raw material, that is, for vacuum coating, such as Parylene. N (parylene), Parylene C (polychloro-p-xylene) and Parylene A cracking gas of at least one material of D (polydichloro-p-xylene), most preferably a parylene cracking gas. The raw material is heated to 150 degrees by using a first-stage heating furnace (not shown) to form a gaseous polymer material, which is introduced into a cracking furnace.
裂解炉4与原料存储罐3连接,接收经一级加热成气态的高分子材料,并进行二级加热到650度后裂解成高分子材料纳米气体,通过气相沉积室1侧壁的入口37将高分子材料纳米气体导入到气相沉积室1中。The cracking furnace 4 is connected to the raw material storage tank 3, receives the polymer material heated to the gaseous state by the first stage, and is subjected to secondary heating to 650 degrees, and then is cracked into a nanometer gas of the polymer material, and is passed through the inlet 37 of the side wall of the vapor deposition chamber 1. The polymer material nano gas is introduced into the vapor deposition chamber 1.
高分子材料纳米气体从入口37进入后,经过降温分流挡板降温38,以避免650度的气体直接碰到待镀膜的产品上,裂解后的高分子材料纳米气体遇到降温分流挡板38后向四周扩散。After the nano-gas of the polymer material enters from the inlet 37, the temperature is lowered by the cooling and splitting baffle 38 to prevent the 650-degree gas from directly hitting the product to be coated, and the cracked polymer material nano gas encounters the cooling and distributing baffle 38. Spread to the surrounding.
真空镀膜设备进一步包括排气柱32、旋转组件7、气相沉积室1以及设置于气相沉积室1内的支架2,这些构成部分的具体组成以及功能请参阅上述实施例的详细描述,本实施例不一一标注说明。The vacuum coating apparatus further includes a discharge column 32, a rotating assembly 7, a vapor deposition chamber 1, and a support 2 disposed in the vapor deposition chamber 1. The specific composition and function of these components are described in detail in the above embodiments. Do not label the instructions one by one.
本实施例的真空镀膜设备还包括冷却塔39,冷却塔39设置于气相沉积室1外侧并与排气柱32连接,气相沉积后的残余气体经过支架的支架柱上的第二通气孔和排气柱32的第一通气孔进入排气柱,进一步通过排气柱32导入到冷却塔39中。经过冷却塔39把残余气体中的高分子材料气体迅速凝固,防止其对外扩散。The vacuum coating apparatus of this embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, and the residual gas after vapor deposition passes through the second vent hole and the row on the support column of the bracket. The first vent of the gas column 32 enters the exhaust column and is further introduced into the cooling tower 39 through the exhaust column 32. The polymer material gas in the residual gas is rapidly solidified by the cooling tower 39 to prevent its outward diffusion.
本实施例的真空镀膜设备进一步包括真空泵5,真空泵5与上述冷却塔39连接,以通过排气柱32对气相沉积室进行抽真空,使气相沉积室1形成真空负压,便于高效地实现气相沉积。The vacuum coating apparatus of the present embodiment further includes a vacuum pump 5 connected to the cooling tower 39 to evacuate the vapor deposition chamber through the exhaust column 32 to form a vacuum negative pressure in the vapor deposition chamber 1 to facilitate efficient gas phase realization. Deposition.
更进一步地,本实施例的真空镀膜设备还包括旋转驱动马达6,通过同步带与第一旋转磁体连接,用于驱动第一旋转磁体转动,带动第二旋转磁体,进而带动气相沉积室内的支架柱32进行转动。Further, the vacuum coating apparatus of the embodiment further includes a rotary drive motor 6 connected to the first rotating magnet through a timing belt for driving the rotation of the first rotating magnet to drive the second rotating magnet, thereby driving the bracket in the vapor deposition chamber. The column 32 is rotated.
需要说明的是,本发明实施例中的高分子材料可以是Parylene N(聚对二甲苯)、Parylene C(聚一氯对二甲苯)和 Parylene D(聚二氯对二甲苯)的至少一种材料,其中最优选是聚对二甲苯。It should be noted that the polymer material in the embodiment of the present invention may be Parylene N (parylene), Parylene. At least one material of C (polychloro-p-xylene) and Parylene D (polydichloro-p-xylene), most preferably parylene.
本发明实施例提供的真空镀膜设备,真空镀膜设备包括气相沉积室、支架以及与所述支架连接的磁性转动组件,磁性转动组件通过设置于真空镀膜设备的气相沉积室外侧的第一旋转磁体以及设置于气相沉积室内侧的第二旋转磁体,其中第一旋转磁体与第二旋转磁体磁性耦合,第一旋转磁体在同步电机带动下转动,并带动第二旋转磁体转动,进而带动真空镀膜设备用于放置待镀膜工件的支架转动。通过这样的设计,能够避免漏气现象,而且能够对待镀膜工件进行批量真空纳米镀膜,有效提高待镀膜工件真空纳米镀膜的效率以及镀膜效果。In the vacuum coating apparatus provided by the embodiment of the present invention, the vacuum coating apparatus includes a vapor deposition chamber, a bracket, and a magnetic rotating component connected to the bracket, and the magnetic rotating component passes through the first rotating magnet disposed on the outdoor side of the vapor deposition apparatus of the vacuum coating apparatus and a second rotating magnet disposed on the side of the vapor deposition chamber, wherein the first rotating magnet is magnetically coupled to the second rotating magnet, and the first rotating magnet is rotated by the synchronous motor to drive the second rotating magnet to rotate, thereby driving the vacuum coating device The holder for placing the workpiece to be coated is rotated. Through such a design, leakage can be avoided, and batch vacuum nano-coating can be performed on the coated workpiece, thereby effectively improving the efficiency of the vacuum nano-coating of the workpiece to be coated and the coating effect.
以上所述仅为本发明的具体实施方式,并非因此限制本发明的专利范围,凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。The above description is only the specific embodiment of the present invention, and is not intended to limit the scope of the invention, and the equivalent structure or equivalent process transformation of the present invention and the contents of the drawings may be directly or indirectly applied to other related The technical field is equally included in the scope of patent protection of the present invention.
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| CN114574829A (en) * | 2022-03-08 | 2022-06-03 | 松山湖材料实验室 | Micro-deep hole internal coating process and coating device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110724926A (en) * | 2019-11-28 | 2020-01-24 | 宁波涂冠镀膜科技有限公司 | Vacuum coating fixture |
| WO2023082855A1 (en) * | 2021-11-11 | 2023-05-19 | 上海陛通半导体能源科技股份有限公司 | Vapor deposition device capable of rotating and lifting in reciprocating manner |
| US12227845B2 (en) | 2021-11-11 | 2025-02-18 | Betone Technology Shanghai, Inc. | Vapor deposition device capable of reciprocating rotation and lifting |
| CN114574829A (en) * | 2022-03-08 | 2022-06-03 | 松山湖材料实验室 | Micro-deep hole internal coating process and coating device |
| CN114574829B (en) * | 2022-03-08 | 2023-10-27 | 松山湖材料实验室 | Micro deep hole inner coating process and coating device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106661725B (en) | 2019-05-21 |
| CN106661725A (en) | 2017-05-10 |
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