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WO2015093794A1 - Composition for forming dicing film adhesive layer, and dicing film - Google Patents

Composition for forming dicing film adhesive layer, and dicing film Download PDF

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Publication number
WO2015093794A1
WO2015093794A1 PCT/KR2014/012284 KR2014012284W WO2015093794A1 WO 2015093794 A1 WO2015093794 A1 WO 2015093794A1 KR 2014012284 W KR2014012284 W KR 2014012284W WO 2015093794 A1 WO2015093794 A1 WO 2015093794A1
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WO
WIPO (PCT)
Prior art keywords
group
acrylate
meth
adhesive layer
dicing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2014/012284
Other languages
French (fr)
Korean (ko)
Inventor
김영국
김희정
김세라
조정호
김정학
남승희
이광주
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020140178602A external-priority patent/KR101709689B1/en
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to US14/782,200 priority Critical patent/US10526513B2/en
Priority to CN201480022020.7A priority patent/CN105143382B/en
Priority to JP2016560325A priority patent/JP6393779B2/en
Publication of WO2015093794A1 publication Critical patent/WO2015093794A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08Macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • H10P72/7402
    • H10P72/7404
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00Presence of (meth)acrylic polymer
    • H10P72/7416
    • H10P72/7438
    • H10P72/744
    • H10W72/01304
    • H10W72/01336
    • H10W72/0198
    • H10W72/354

Definitions

  • the present invention relates to a composition for forming a dicing film adhesion layer and a dicing film.
  • the manufacturing process of the semiconductor chip includes a process of forming a fine pattern on the wafer and a process of polishing and packaging the wafer to meet the specifications of the final device.
  • the packaging process includes a wafer inspection process for inspecting a defect of a semiconductor chip; A dicing step of cutting the wafer into separate chips; A die bonding process of attaching the separated chip to a circuit film (ci rcui t f i lm) or a mounting plate of a lead frame; A wire bonding process of connecting the chip pad provided on the semiconductor chip and the circuit pattern of the circuit film or the lead frame with electrical connection means such as wire; A molding process of wrapping the outside with an encapsulant to protect the internal circuit and other components of the semiconductor chip; Trim process for cutting the dam bar connecting the lead and the lead; Forming process of bending the lead into a desired shape; And a finished product inspection process for inspecting defects of the finished package.
  • Dicing step the diamond wafer to the wheel, such as the process proceeds the 'standing after the laminate, the process of dicing the film to come appropriate conditions and the rear face of the wafer in order to secure the predetermined is cut to a thickness of eu The wafer.
  • a die bonding film adheresive film
  • the dicing process is a step of cutting a semiconductor wafer with a dicing blade, and irradiating ultraviolet rays to the base film of the semiconductor wafer, for cutting the semiconductor wafer.
  • Picking up the individual chips separated by the step there is a problem that the fixation between the film occurs during the pick-up process and the peel strength between the film is too low, the success of the pick-up of the chip is lowered or the chip crack occurs during the pickup .
  • the present invention is a dicing for providing a dicing die-bonding film that can prevent the sticking between the films in the dicing process to increase the pick-up success rate and exhibit a relatively high die share strength to prevent the peeling phenomenon due to the adhesive force degradation It is to provide a composition for forming a film adhesion layer.
  • the present invention is to provide the dicing die-bonding film. In addition, the present invention is to provide a dicing method of a semiconductor wafer using the dicing die bonding film.
  • a polymer additive comprising at least one polymer selected from; Adhesive binders; And a photoinitiator, wherein the weight ratio of the polymer additive to the adhesive binder is
  • composition for dicing film adhesion layer formation which is 0.01%-4.5% is provided.
  • the polymer including the (meth) acrylate-based functional group and the non-polar functional group may include a repeating unit represented by the following Chemical Formula 1.
  • 3 ⁇ 4 is hydrogen, an alkyl group having 1 to 20 carbon atoms
  • 3 ⁇ 4 is hydrogen, an alkyl group having 1 to 20 carbon atoms, a polyester group or a polyether group
  • n is an integer of 1 to 300.
  • the (meth) acrylate polymer containing one or more fluorine may include a (meth) acrylate polymer substituted with a perfluoroalkyl group having 1 to 10 carbon atoms or a fluorinated alkenyl group having 1 to 10 carbon atoms.
  • the silicone-modified (meth) acrylate-based polymer including the reactive functional group may include at least one "" semi-active functional group selected from the group consisting of a hydroxy group, an alkylene alcohol having 1 to 10 carbon atoms, an epoxy, an amino group, a thi group, or a carboxyl group. It may include a silicone-modified (meth) acrylate-based polymer substituted above.
  • the polymer additive may further include one or more organic solvents selected from the group consisting of alcohols, ethers, acetates and ketones.
  • the adhesive binder may be a (meth) acrylate-based polymer or a (meth) acrylate-based one or more substituted or unsubstituted one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, a vinyl group, and a (meth) acrylate group. Copolymers may be included.
  • the adhesive binder may include an internal adhesive binder in which an acrylate having a carbon-carbon double bond is added to the side chain of the (meth) acrylate resin.
  • an internal adhesive binder in which an acrylate having a carbon-carbon double bond is added to the side chain of the (meth) acrylate resin.
  • a polymer resin in which 1 wt% to 45 wt% of a (meth) acrylate functional group is added to the main chain of the (meth) acrylate base resin as a side chain may be used as the intrinsic adhesive binder.
  • the adhesive binder may include a polymer resin having a weight average molecular weight of 100, 000 to 1, 500, 000.
  • the photoinitiator is a group consisting of benzoin and its alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones, ⁇ -aminoacetophenones, acylphosphine oxides, and oxime esters. It may include one or more selected from.
  • the photoinitiator may include 0.01 to 5 parts by weight based on 100 parts by weight of the adhesive binder.
  • the composition for forming a dicing film adhesive layer may further include a curing agent.
  • the curing agent may include at least one selected from the group consisting of an isocyanate compound, an aziridine compound, an epoxy compound, and a metal chelate compound. Can be.
  • the dicing film adhesive layer-forming composition may include 0.01 to 30 parts by weight of the curing agent relative to 100 parts by weight of the adhesive binder.
  • a dicing film comprising a base film and a pressure-sensitive adhesive formed on at least one surface of the base film, wherein the pressure-sensitive adhesive layer comprises the composition for forming a .dielectric film pressure-sensitive adhesive layer of claim 1 to be provided. Can be.
  • the base film has a thickness of 10 to 200 IM, and the adhesive layer has a thickness of 0.5 ⁇ to 50.
  • the dicing film In addition, in the present specification, the dicing film; And an adhesive layer formed on at least one surface of the dicing film, a dicing die bonding film may be provided.
  • the dicing die bonding film And a wafer stacked on at least one surface of the dicing die-bonding film; a preprocessing step of partially or partially dividing the semiconductor wafer; Expanding the semiconductor wafer after the pretreatment step; And irradiating ultraviolet rays to the base film of the expanded semiconductor wafer and picking up individual chips separated by the division of the semiconductor wafer.
  • Dicing film adhesive layer for providing a dicing die-bonding film that can prevent the sticking between the films in the dicing process to increase the pick-up success rate and exhibit a relatively high die share strength to prevent the peeling phenomenon due to the decrease in adhesion
  • a dicing method comprising a dicing film comprising the composition for forming and the adhesive layer comprising the composition and the dicing film, and a dicing method of a semiconductor wafer using the dicing die bonding film is provided.
  • a (meth) acrylate-based polymer and a non-polar functional group a polymer, a (meth) acrylate-based polymer containing at least one fluorine and a silicone modified (meth) acrylate-based containing a semi-functional group
  • a polymer additive comprising at least one polymer selected from the group consisting of polymers; Adhesive binders; And a photoinitiator, wherein the weight ratio of the polymer additive to the adhesive binder is 0.01% to 4.5%, and a dicing film adhesive layer-forming composition may be provided.
  • the inventors of the present invention provide a polymer comprising a (meth) acrylate-based functional group and a non-polar functional group, a (meth) acrylate-based polymer containing at least one fluorine, and a silicone-modified (meth) acrylate-based polymer containing a reactive functional group.
  • the polymer additive may be more effective in providing releasability and slippage as the non-polar part is positioned on the surface of the adhesive layer while minimizing transfer by reacting with the adhesive binder.
  • the polymer additive is 0.01% to 4.5% compared to the adhesive binder, —_
  • the adhesive layer of the dicing film prepared from the dicing film adhesive layer-forming composition of the embodiment may have a peel strength, for example, UV. 180 degrees peeling force and tack strength and peeling force against SUS can be greatly increased before and after irradiation.
  • the adhesive layer of the die film prepared from the dicing film adhesive layer-forming composition of the embodiment is peel strength, for example, 180 degrees peeling force before and after uv irradiation and Tack strength and
  • the adhesive strength of the dicing film prepared from the dicing film adhesive layer-forming composition of the embodiment may lower the peel strength to some extent, the die of the adhesive layer As the shear strength is significantly lowered, peeling may occur due to a decrease in adhesive strength, and thus, reliability may be degraded during semiconductor manufacturing.
  • the polymer including the (meth) acrylate-based functional group and the non-polar functional group may include a repeating unit represented by the following Chemical Formula 1.
  • is hydrogen, an alkyl group having 1 to 20 carbon atoms
  • 3 ⁇ 4 is hydrogen, an alkyl group having 1 to 20 carbon atoms, a polyester group or a polyether group
  • n is an integer of 1 to 300.
  • Examples of commercially available products of the polymer including the (meth) acrylate-based functional groups and non-polar functional groups include BYKO-350, BYK-352, BYK-354, BYK-355, BYK-356, BY -358N, BYK-361N, BYK- 380, BYK-392 or BYK-394, but the specific examples of the polymer additives are not limited thereto.
  • the (meth) acrylate-based polymer containing one or more of the bloso is substituted with a perfluoroalkyl group having 1 to 10 carbon atoms or a fluorinated alkenyl group having 1 to 10 carbon atoms.
  • It may contain a (meth) acrylate-based polymer.
  • Examples of commercially available products of the (meth) acrylate-based polymer containing one or more of fluorine include Psentant 222F (manufactured by Neos), F470 (DIC), F489 (DIC), or V-8FM.
  • Psentant 222F manufactured by Neos
  • F470 DIC
  • F489 DIC
  • V-8FM V-8FM
  • specific examples of the polymer additives are not limited thereto.
  • the silicone-modified (meth) acrylate-based polymer including the semi-functional group includes one or more reactive functional groups selected from the group consisting of a hydroxy group, an alkylene alcohol having 1 to 10 carbon atoms, an epoxy, an amino group, a thiol group, or a carboxyl group. Silicone-modified (meth) acrylate-based polymer may be included.
  • silicone-modified (meth) acrylate-based polymer containing the reactive functional group include a hydroxy functional silicone-modified polyacrylate, examples of commercially available products thereof include BYK SIL-CLEAN 3700, Specific examples of the polymer additives are not limited thereto.
  • the polymer additive including the above polymer may further include one or more organic solvents selected from the group consisting of alcohols, ethers, acetates, and ketones.
  • the polymer additive may include 1 to 50% by weight of the polymer and the remaining amount of the organic solvent.
  • the adhesive binder may use a polymer resin known to be able to be used to form a tack of the dicing film without great limitation, for example A polymer resin in which a predetermined reactive functional group is substituted or a polymer resin in a main chain including a reactive functional group can be used.
  • the adhesive binder is a (meth) acrylate polymer or (meth) in which at least one functional group selected from the group consisting of a hydroxyl group, an isocyanate group, a vinyl group, and a (meth) acrylate group is substituted or unsubstituted It may include an acrylate copolymer.
  • the pressure-sensitive adhesive binder may be an internal pressure-sensitive adhesive binder in which an acrylate having a carbon to carbon double bond is added to the side chain of the (meth) acrylate resin.
  • an acrylate having a carbon to carbon double bond is added to the side chain of the (meth) acrylate resin.
  • a polymer resin in which 1 wt% to 45 wt% of a (meth) acrylate functional group is added to the main chain of the (meth) acrylate base resin as a side chain may be used as the internal adhesive binder.
  • the adhesive binder may include a polymer resin having a weight average molecular weight of 100, 000 to 1, 500, 000.
  • the copolymer may have a weight average molecular weight of 100, 000 to 1, 500, 000.
  • (meth) acrylate is meant to include both acrylate [acryl ate] and (meth) acrylate [(meth) acrylate].
  • Such a (meth) acrylate polymer or a (meth) acrylate copolymer may be, for example, a polymer or copolymer of a (meth) acrylic acid ester monomer and a crosslinkable functional group-containing monomer.
  • examples of the (meth) acrylic acid ester monomer include alkyl (meth) acrylate, and more specifically, a monomer having an alkyl group having 1 to 12 carbon atoms, pentyl (meth) acrylate, and n-butyl (meth).
  • examples of the crosslinkable functional group-containing monomer include one or more kinds of hydroxy group-containing monomers, carboxyl group-containing monomers, or nitrogen-containing monomers.
  • examples of the hydroxyl group-containing compound include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and the like.
  • examples of the carboxyl group-containing compound include (meth) acrylic acid.
  • examples of the nitrogen-containing monomer include (meth) acrylonitrile, N ⁇ vinyl pyrrolidone or N ⁇ vinyl caprolactam, but are not limited thereto.
  • the (meth) acrylate resin may further include vinyl acetate, styrene, or acrylonitrile carbon-carbon double defect-containing low molecular weight compounds and the like from the viewpoint of improving other functionalities such as compatibility.
  • the internal pressure-sensitive adhesive binder to which the acrylate having a carbon-carbon double bond is added to the side chain of the (meth) acrylate resin may have a weight average molecular weight of 100, 000 to 1, 500, 000.
  • the coating property or the cohesion of the dicing film adhesive layer-forming composition of the embodiment may be lowered, the peeling of the adhesive layer formed from the composition of the embodiment Residue may remain on the adherend or the adhesive layer may be destroyed.
  • the weight average molecular weight of the polymer resin included in the adhesive binder is too high, ultraviolet curing of the composition for forming a die-film adhesive layer of the embodiment may not occur in a small amount, thereby peeling off the adhesive layer formed from the composition. The force may not be significantly lowered, which may lower the pickup success.
  • the dicing film adhesive layer-forming composition may further comprise an ultraviolet curable compound.
  • the type of the UV-curable compound is not particularly limited, and for example, a polyfunctional compound having a weight average molecular weight of about 500 to 300, 000 (ex. Polyfunctional urethane acrylate, polyfunctional acrylate monomer or oligomer, etc.) Can be used.
  • a polyfunctional compound having a weight average molecular weight of about 500 to 300, 000 ex. Polyfunctional urethane acrylate, polyfunctional acrylate monomer or oligomer, etc.
  • the average person skilled in the art can easily select the appropriate compound according to the intended use.
  • the content of the ultraviolet curable compound is 100 parts by weight of the above-mentioned adhesive binder 5 to 400 parts by weight, preferably 10 to 200 parts by weight, relative to the total amount. If the content of the ultraviolet curable compound is less than 5 parts by weight, there is a risk that the drop in adhesive strength after curing is not divided, the pick-up property may be degraded. There is a fear that it will not be made easily.
  • photoinitiator included in the composition for forming a dicing film adhesive layer of the above embodiment is not limited, and conventionally known photoinitiators may be used without particular limitation O.
  • photoinitiator benzoin and its alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones, ⁇ -aminoacetophenones, acylphosphine oxides, and oximes Esters or two or more kinds thereof can be used.
  • the amount of the photoinitiator is determined in consideration with such type and characteristics of the adhesive binder used and the properties and characteristics of the adhesive layer to be produced, and ', for example, the embodiment dicing film composition for adhesive layer formation is the adhesive binder 100 It may include 0.01 to 8 parts by weight of the photoinitiator relative to parts by weight.
  • the composition for forming a dicing film adhesion layer of the embodiment may further comprise a curing agent.
  • the curing agent may react with the reactor of the pressure-sensitive adhesive or react at a temperature of 30 to 50 ° C. to form a crosslink.
  • the predetermined semi-unggi contained in the curing agent remains in the non-ungung state, and further cross-linking is carried out through UV irradiation before pickup, thereby lowering the adhesive force of the adhesive layer.
  • the curing agent may include one or more selected from the group consisting of an isocyanate compound, an aziridine compound, an epoxy compound, and a metal chelate compound.
  • the amount of the curing agent may be determined in consideration of the physical properties and properties of the adhesive layer to be prepared and the type and characteristics of the adhesive binder used, for example, the composition for forming a dicing film adhesive layer of the embodiment is 100 weight of the adhesive binder. It may comprise 0.1 to 30 parts by weight of the curing agent relative to parts.
  • the base film and the base film It includes a pressure-sensitive adhesive layer formed on at least one surface, wherein the pressure-sensitive adhesive layer may be provided with a dicing film comprising a composition for forming a die film adhesion layer of the above-described embodiment.
  • the type of the base film is not particularly limited, and for example, a plastic film or a metal foil known in the art may be used.
  • the base film may include low density polyethylene, linear polyethylene, medium density polyethylene, high density polyethylene, ultra low density polyethylene, random copolymer of polypropylene, block copolymer of polypropylene, homopolypropylene, polymethylpentene (po l ymethyl pent ene), ethylene-vinyl acetate copolymer, ethylene-methacrylic acid copolymer, ethylene-methyl methacrylate copolymer, ethylene-ionomer copolymer, ethylene-vinyl alcohol copolymer, polybutene, styrene copolymer or And a combination of two or more of these.
  • the meaning of the base film including a mixture of two or more polymers in the above means that a film having a structure in which two or more layers of films including each of the aforementioned polymers are laminated or a single layer containing two or more of the aforementioned polymers includes both films. do.
  • the thickness of the base film is not particularly limited, and is usually formed in a thickness of 10 kPa to 200 kPa, preferably 50 kPa to 180. If the thickness is less than 10 mm, the control of the cut depth may become unstable in the dicing process. If the thickness exceeds 200 mm, a large amount of burrs may be generated or the elongation is lowered in the dicing process. the extreme pending process there is a concern not done not "accurately.
  • the base film may be subjected to conventional physical or chemical treatments such as matt treatment, corona discharge treatment, primer treatment or crosslinking treatment, as necessary.
  • the adhesive layer has a thickness of 0. 5 im to 50 ⁇ , or 5 to 30 days.
  • the contents of the dicing film adhesive layer-forming composition included in the adhesive layer include all the contents described above with respect to the embodiment.
  • the dicing film according to another embodiment of the invention, the dicing film; And an adhesive layer formed on at least one surface of the dicing film.
  • the adhesive charge may include an epoxy resin, a low elastic high molecular weight resin, and a curing agent for an adhesive layer.
  • the epoxy resin may include an epoxy resin for general adhesives known in the art, for example, an epoxy resin containing two or more epoxy groups in a molecule and having a weight average molecular weight of 100 to 5,000.
  • the epoxy resin may form a hard crosslinked structure through a curing process, and may exhibit excellent adhesion, heat resistance, and mechanical strength.
  • the epoxy resin it is particularly preferable to use an epoxy resin having an average epoxy equivalent of 100 to 1,000. If the epoxy equivalent of the said epoxy resin is less than 100, a crosslinking density will become high too much, and there exists a possibility that an adhesive film may show a hard property as a whole, and when the epoxy equivalent of the said epoxy resin exceeds 1,000, there exists a possibility that heat resistance may fall.
  • Bifunctional epoxy resin such as a bisphenol A epoxy resin or a bisphenol F epoxy resin; Or cresol novolac epoxy resin, phenol novolac epoxy resin, tetrafunctional epoxy resin, biphenyl type epoxy resin, triphenol methane type epoxy resin, alkyl modified triphenol methane type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene
  • polyfunctional epoxy resins having three or more functional groups such as a type epoxy resin or a dicyclopentadiene modified phenol type epoxy resin, are not limited thereto.
  • multifunctional epoxy resin refers to an epoxy resin having three or more functional groups: That is, in general, a bifunctional epoxy resin has excellent flexibility and flowability at high temperatures, but has low heat resistance and curing rate, while a functional group
  • the polyfunctional epoxy resin having three or more has a fast curing rate and shows excellent heat resistance due to high crosslinking density, but is inferior in flexibility and flowability. Therefore, by appropriately mixing and using the above two kinds of resins, it is possible to suppress chip scattering and burr generation during the dicing process while controlling the elasticity and tack characteristics of the adhesive layer.
  • the low elastic high molecular weight resin is a soft segment in the adhesive It can play a role of imparting the relaxation characteristics at high temperatures.
  • the high molecular weight resin it may be blended with the epoxy resin to cause viscoelasticity after formation of a crosslinked structure without causing breakage during film formation, and any resin component may be used as long as it has excellent compatibility with other components and storage stability. Can be.
  • the specific kind of the low elastic high molecular weight resin is not particularly limited as long as it satisfies the above-described characteristics.
  • the (meth) acrylate-based resin may include an acrylic copolymer including (meth) acrylic acid and derivatives thereof, and examples of (meth) acrylic acid and derivatives thereof include (meth) acrylic acid; Alkyl (meth) acrylate containing a C1-C12 alkyl group, such as methyl (meth) acrylate or ethyl (meth) acrylate; (Meth) acrylonitrile or (meth) acrylamide; And other co-polymerizable monomers.
  • the (meth) acrylate resin may also include one or more functional groups such as glycidyl group, hydroxy group, carboxyl group and amine group, and such functional group may be glycidyl (meth) acrylate, hydroxy ( It can introduce
  • the curing agent that can be included in the adhesive composition is not particularly limited as long as it can react with the epoxy resin and / or the low elastic high molecular weight resin to form a crosslinked structure.
  • a curing agent capable of forming a crosslinked structure by simultaneously reacting with the two components may be used.
  • Such a curing agent forms a crosslinked structure with the soft and hard segments in the adhesive, respectively, to improve heat resistance, and at the same time, the interface between the two components. It can act as a cross-linking agent of two segments in to improve the reliability of the semiconductor package.
  • the thickness of the adhesive layer is not particularly limited, but may be, for example, in the range of 1 to 100 ⁇ , or 3 to 50.
  • Example 1 By using a dicing die-bonding film including the dicing film, it is possible to minimize the burr phenomenon that may occur during the dicing process of the semiconductor wafer to prevent contamination of the semiconductor chip and improve the reliability and life of the semiconductor chip. Can be. Specific embodiments of the present invention are described in more detail in the following examples. However, the embodiments described below. The examples are only illustrative of specific embodiments of the invention, but the content of the present invention is not limited by the following examples. Example 1
  • UV curable adhesive compositions 2 parts by weight of isocyanate-based curing agent (polyfunctional isocyanate oligomer), 0.2 parts by weight of BYK-Si lean 3700 (BYK), and 1 part by weight of the photo-curable adhesive binder resin, the photocuring agent, and the increased amount of the photopolymerizable binder resin are UV curable adhesive compositions.
  • a polymer resin Mw 300, 000 in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.
  • the UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ m.
  • Example 2 2 parts by weight of an isocyanate-based curing agent (polyfunctional isocyanate oligomer), 0.2 parts by weight of BYK-Si lean 394 (by KK), and 1 part by weight of the polylocker TP0 as a photoinitiator with respect to 100 parts by weight of the photocurable adhesive binder resin.
  • the photocurable adhesive binder resin a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.
  • the UV-curable adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ m. Comparative Example 1
  • the UV curable adhesive composition was prepared by mixing 2 parts by weight of an isocyanate-based curing agent (polyfunctional isocyanate oligomer) with respect to 100 parts by weight of the photocurable pressure-sensitive adhesive binder resin and 1 part by weight of the multilocker TP0 as a photoinitiator.
  • an isocyanate-based curing agent polyfunctional isocyanate oligomer
  • the photocurable adhesive binder resin a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.
  • the UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ l. Comparative Example 2
  • an isocyanate-based curing agent polyfunctional isocyanate oligomer
  • BYK BYK-Sil clean 3700
  • the Darocer TP0 as a photoinitiator, based on 100 parts by weight of the photocurable adhesive binder resin.
  • a polymer resin Mw 300, 000 in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.
  • the UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ m. Comparative Example 3
  • a UV curable pressure-sensitive adhesive composition was prepared by 5 parts by weight and 1 part by weight of the darocalor TPO as a photoinitiator.
  • the photocurable adhesive binder resin a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.
  • the UV-curable adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ m.
  • Test Example 1 The UV-curable adhesive composition was coated on one side of a polyolefin film of 100 ⁇ m and dried to prepare a dicing film including an adhesive layer of 100 ⁇ m.
  • a dimming film of 25 mm width was prepared, and SUS 304 was made to adhere and adhered. After hardening for 1 hour after adhesion, the 90 degree peeling strength was measured at the speed of 300 kPa / min. The measurement was performed three or more times per sample to describe the average value.
  • Tack strength was measured using a 1 inch ball type probe. At this time, the force applied to the probe was 800gf, the contact time was 0.01 seconds, the measurement speed of detaching the probe was 1 ⁇ / s, and the instrument used for the measurement was a texture analyzer. 4. Pickup success rate
  • Dicing die-bonding films and wafers prepared from dicing films prepared according to the examples and comparative examples were laminated at 7C C conditions. Subsequently, ultraviolet irradiation was performed on the number and the dicing film surface which carried out the dicing process on the following conditions using the dicing equipment (made by NEON company) on the following conditions. Thereafter, 200 chips were picked up by a die bonder (Shinkawa Co., Ltd.), and the number of chips not picked up was measured and expressed in percentage. [Dicing Condition]
  • Blade rotation speed 40, 000rpm
  • Lamp metal ha 1 i de type
  • the dichroic film prepared in Examples 1 to 2 has a relatively low 180-degree peeling force and tack strength before and after UV irradiation as compared to the dicing film prepared in Comparative Example 1 It was also confirmed that the SUS peeling force was also relatively low, indicating a high pickup success rate.
  • the dicing film prepared in Examples 1 to 2 exhibits a relatively high die share strength compared to the dicing films prepared in Comparative Examples 2 to 3 can prevent the peeling phenomenon due to the adhesive force decrease and thus ripple It has been found that low cracks can be suppressed and the reliability of the semiconductor manufacturing process can be improved.

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Abstract

The present invention relates to a composition for forming a dicing film adhesive layer, a dicing film containing an adhesive layer comprising the composition, a dicing die bonding film containing the dicing film, and a method for dicing a semiconductor wafer by using the dicing die bonding film, the composition comprising: a polymer additive comprising one or more types of polymers selected from the group consisting of a polymer containing a (meth)acrylate-based functional group and a nonpolar functional group, a (meth)acrylate-based polymer containing at least one fluorine, and a silicone modified (meth)acrylate-based polymer containing a reactive functional group; an adhesive binder; and a photoinitiator, wherein the weight ratio of the polymer additive to the adhesive binder is 0.01-4.5%.

Description

【명세서】  【Specification】

【발명의 명칭】  [Name of invention]

다이싱 필름 점착층 형성용 조성물 및'다이싱 필름 Dicing film adhesive layer forming composition and ' dicing film

【기술분야】  Technical Field

본 발명은 다이싱 필름 점착층 형성용 조성물 및 다이싱 필름에 관한 것이다.  The present invention relates to a composition for forming a dicing film adhesion layer and a dicing film.

【발명의 배경이 되는 기술】  [Technique to become background of invention]

일반적으로 반도체 칩의 제조 공정은 웨이퍼에 미세한 패턴을 형성하는 공정 및 최종 장치의 규격에 맞도록 웨이퍼를 연마하여 패키징 (packaging)하는 공정을 포함한다.  In general, the manufacturing process of the semiconductor chip includes a process of forming a fine pattern on the wafer and a process of polishing and packaging the wafer to meet the specifications of the final device.

패키징 공정은 반도체 칩의 불량을 검사하는 웨이퍼 검사 공정; 웨이퍼를 절단하여 낱개의 칩으로 분리하는 다이싱 공정; 분리된 칩을 회로 필름 (ci rcui t f i lm) 또는 리드 프레임의 탑재판에 부착시키는 다이본딩 공정; 반도체 칩 상에 구비된 칩 패드와 회로 필름 또는 리드 프레임의 회로 패턴을 와이어와 같은 전기적 접속 수단으로 연결시키는 와이어 본딩 공정; 반도체 칩의 내부 회로와 그 외의 부품을 보호하기 위해 봉지재로 외부를 감싸는 몰딩 공정; 리드와 리드를 연결하고 있는 댐바를 절단하는 트림 공정; 리드를 원하는 형태로 구부리는 포밍 공정; 및 완성된 패키지의 불량을 검사하는 완성품 검사공정 등을 포함한다.  The packaging process includes a wafer inspection process for inspecting a defect of a semiconductor chip; A dicing step of cutting the wafer into separate chips; A die bonding process of attaching the separated chip to a circuit film (ci rcui t f i lm) or a mounting plate of a lead frame; A wire bonding process of connecting the chip pad provided on the semiconductor chip and the circuit pattern of the circuit film or the lead frame with electrical connection means such as wire; A molding process of wrapping the outside with an encapsulant to protect the internal circuit and other components of the semiconductor chip; Trim process for cutting the dam bar connecting the lead and the lead; Forming process of bending the lead into a desired shape; And a finished product inspection process for inspecting defects of the finished package.

다이싱 공정에서는 웨이퍼를 다이아몬드 휠 등을 사용하여 소정의 두께로 커팅하게 된다ᅳ 이때 웨이퍼를 고정시켜 주기 위해 웨이퍼 후면에 다이싱 필름올 적절한 조건에 '서 라미네이트한 후, 공정을 진행한다. 또한, 다이싱된 개개의 칩을 회로기판에 부착하기 위해서 다이본딩 필름 (접착 필름)이 사용된다. Dicing step, the diamond wafer to the wheel, such as the process proceeds the 'standing after the laminate, the process of dicing the film to come appropriate conditions and the rear face of the wafer in order to secure the predetermined is cut to a thickness of eu The wafer. In addition, a die bonding film (adhesive film) is used to attach the diced individual chips to the circuit board.

한편, 다이싱 공정은 반도체 웨이퍼를 다이싱 블레이드로 절삭하는 단계, 및 상기 반도체 웨이퍼의 기저필름에 자외선을 조사하고, 상기 반도체 웨이퍼의 절삭에. 의해 분리된 개별 칩들을 픽업하는 단계를 포함하는데, 픽업 공정 시 필름 사이의 고착화가 발생하는 문제 및 필름 사이의 필강도가 과다하여 칩들의 픽업 성공를이 낮아지거나 픽업 중에 칩크랙이 발생하는 문제점이 있었다.  On the other hand, the dicing process is a step of cutting a semiconductor wafer with a dicing blade, and irradiating ultraviolet rays to the base film of the semiconductor wafer, for cutting the semiconductor wafer. Picking up the individual chips separated by the step, there is a problem that the fixation between the film occurs during the pick-up process and the peel strength between the film is too low, the success of the pick-up of the chip is lowered or the chip crack occurs during the pickup .

【발명의 내용】  [Content of invention]

【해결하고자 하는 과제】 본 발명은 다이싱 공정에서 필름 사이의 고착화를 방지하여 픽업 성공률이 높일 수 있으며 상대적으로 높은 다이 쉐어 강도를 나타내어 접착력 저하로 인한 박리 현상을 방지할 수 있는 다이싱 다이본딩 필름을 제공하기 위한 다이싱 필름 점착층 형성용 조성물을 제공하기 위한 것이다. Problem to be solved The present invention is a dicing for providing a dicing die-bonding film that can prevent the sticking between the films in the dicing process to increase the pick-up success rate and exhibit a relatively high die share strength to prevent the peeling phenomenon due to the adhesive force degradation It is to provide a composition for forming a film adhesion layer.

또한, 본 발명은 상기 다이싱 다이본딩 필름을 제공하기 위한 것이다. 또한, 본 발명은 상기 다이싱 다이본딩 필름을 이용한 반도체 웨이퍼의 다이싱 방법을 제공하기 위한 것이다.  In addition, the present invention is to provide the dicing die-bonding film. In addition, the present invention is to provide a dicing method of a semiconductor wafer using the dicing die bonding film.

【과제의 해결 수단】  [Measures of problem]

본 명세서에서는, (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자 및 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 첨가제; 점착 바인더; 및 광개시제;를 포함하고, 상기 점착 바인더 대비 상기 고분자 첨가제의 중량비가 In the present specification, the group consisting of a polymer containing a (meth) acrylate-based functional group and a non-polar functional group, a (meth) acrylate-based polymer containing at least one fluorine and a silicone-modified (meth) acrylate-based polymer containing a semi-functional group A polymer additive comprising at least one polymer selected from; Adhesive binders; And a photoinitiator, wherein the weight ratio of the polymer additive to the adhesive binder is

0.01% 내지 4.5%인, 다이싱 필름 점착층 형성용 조성물이 제공된다. The composition for dicing film adhesion layer formation which is 0.01%-4.5% is provided.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자는 하기 화학식 1의 반복 단위를 포함할 수 있다.  The polymer including the (meth) acrylate-based functional group and the non-polar functional group may include a repeating unit represented by the following Chemical Formula 1.

Figure imgf000003_0001
Figure imgf000003_0001

상기 화학식 1에서, ¾은 수소, 탄소수 1 내지 20의 알킬기이고 ¾는 수소, 탄소수 1 내지 20의 알킬기, 폴리에스테르기 또는 폴리에테르기이며, n은 1 내지 300의 정수이다.  In Formula 1, ¾ is hydrogen, an alkyl group having 1 to 20 carbon atoms, ¾ is hydrogen, an alkyl group having 1 to 20 carbon atoms, a polyester group or a polyether group, and n is an integer of 1 to 300.

상기 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자는 탄소수 1 내지 10의 퍼플루오로알킬기 또는 탄소수 1 내지 10의 불소화 알케닐기가 치환된 (메타)아크릴레이트계 고분자를 포함할 수 있다. 상기 반응성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자는 히드록시기, 탄소수 1내지 10의 알킬렌 알코을, 에폭시, 아미노기, 티을기 또는 카르복실기로 이루어진 군에서 선택된 1종 이상의""반웅성 작용기가 1이상 치환된 실리콘 변성 (메타)아크릴레이트계 고분자를 포함할 수 있다. The (meth) acrylate polymer containing one or more fluorine may include a (meth) acrylate polymer substituted with a perfluoroalkyl group having 1 to 10 carbon atoms or a fluorinated alkenyl group having 1 to 10 carbon atoms. The silicone-modified (meth) acrylate-based polymer including the reactive functional group may include at least one "" semi-active functional group selected from the group consisting of a hydroxy group, an alkylene alcohol having 1 to 10 carbon atoms, an epoxy, an amino group, a thi group, or a carboxyl group. It may include a silicone-modified (meth) acrylate-based polymer substituted above.

상기 고분자 첨가제는 알코을류, 에테르류, 아세테이트류 및 케톤류로 이루어진 군에서 선택된 1종 이상의 유기 용매를 더 포함할 수 있디- .  The polymer additive may further include one or more organic solvents selected from the group consisting of alcohols, ethers, acetates and ketones.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자 및 상기 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자 각각이 1 증량 % 내지 50중량? ¾의 유기 용액 기준으로 10 mg OH/g 내지 50 mg KOH/g의 산가를 가질 수 있다.  1% by weight to 50% by weight of each of the polymer including the (meth) acrylate-based functional group and the non-polar functional group and the silicone-modified (meth) acrylate-based polymer including the semi-aromatic functional group? It may have an acid value of 10 mg OH / g to 50 mg KOH / g based on an organic solution of ¾.

상기 점착 바인더는 하이드록시기, 이소시아네이트기, 비닐기 및 (메타)아크릴레이트기로 이루어진 군에서 선택된 1종 이상의 작용기가 1이상 치환 또는 비치환된 (메타)아크릴레이트계 중합체 또는 (메타)아크릴레이트계 공중합체를 포함할 수 있다.  The adhesive binder may be a (meth) acrylate-based polymer or a (meth) acrylate-based one or more substituted or unsubstituted one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, a vinyl group, and a (meth) acrylate group. Copolymers may be included.

상기 점착 .바인더는 (메타)아크릴레이트 수지의 측쇄에 탄소 -탄소 이증결합을 가지는 아크릴레이트를 부가시킨 내재형 점착 바인더를 포함할 수 있다. 예를 들어, 상기 내재형 점착 바인더로는 (메타)아크릴레이트계 베이스 수지의 주쇄에 (메타)아크릴레이트 작용기를 측쇄로 1 wt% 내지 45 wt% 부가한 고분자 수지를 사용할 수 있다.  The adhesive binder may include an internal adhesive binder in which an acrylate having a carbon-carbon double bond is added to the side chain of the (meth) acrylate resin. For example, a polymer resin in which 1 wt% to 45 wt% of a (meth) acrylate functional group is added to the main chain of the (meth) acrylate base resin as a side chain may be used as the intrinsic adhesive binder.

상기 점착 바인더는 100 , 000 내지 1 , 500, 000의 중량평균분자량을 갖는 고분자 수지를 포함할 수 있다.  The adhesive binder may include a polymer resin having a weight average molecular weight of 100, 000 to 1, 500, 000.

상기 광개시제는 벤조인과 그 알킬에테르류, 아세토페논류, 안트라퀴논류, 티오크산톤류, 케탈류, 벤조페논류, αᅳ아미노아세토페논류, 아실포스핀옥사이드류 및 옥심에스테르류로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.  The photoinitiator is a group consisting of benzoin and its alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones, α-aminoacetophenones, acylphosphine oxides, and oxime esters. It may include one or more selected from.

상기 점착 바인더 100 중량부 대비 상기 광개시제 0.01 내지 5 중량부를 포함할 수 있다.  The photoinitiator may include 0.01 to 5 parts by weight based on 100 parts by weight of the adhesive binder.

상기 다이싱 필름 점착층 형성용 조성물은 경화제를 더 포함할 수 있다. 상기 경화제는 이소시아네이트계 화합물, 아지리딘계 화합물, 에폭시계 화합물 및 금속 킬레이트계 화합물로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다. The composition for forming a dicing film adhesive layer may further include a curing agent. The curing agent may include at least one selected from the group consisting of an isocyanate compound, an aziridine compound, an epoxy compound, and a metal chelate compound. Can be.

상기 다이싱 필름 점착층 형성용 조성물은 상기 점착 바인더 100 중량부 대비 상기 경화제 0. 1 내지 30중량부를 포함할 수 있다. 또한, 본 명세서에서는, 기재 필름과 상기 기재 필름의 적어도 일면 상에 형성된 점착충을 포함하고, 상기 점착층은 제 1항의 .다이성 필름 점착층 형성용 조성물을 포함하는, 다이싱 필름이 제공될 수 있다.  The dicing film adhesive layer-forming composition may include 0.01 to 30 parts by weight of the curing agent relative to 100 parts by weight of the adhesive binder. In addition, in the present specification, a dicing film comprising a base film and a pressure-sensitive adhesive formed on at least one surface of the base film, wherein the pressure-sensitive adhesive layer comprises the composition for forming a .dielectric film pressure-sensitive adhesive layer of claim 1 to be provided. Can be.

상기 기재 필름의 두께는 10 내지 200 IM 이고, 상기 점착층의 두께는 0.5 μπι 내지 50 이다.  The base film has a thickness of 10 to 200 IM, and the adhesive layer has a thickness of 0.5 μπι to 50.

또한, 본 명세서에서는, 상기 다이싱 필름; 및 상기 다이싱 필름의 적어도 일면에 형성된 접착층을 포함하는, 다이싱 다이본딩 필름이 제공될 수 있다.  In addition, in the present specification, the dicing film; And an adhesive layer formed on at least one surface of the dicing film, a dicing die bonding film may be provided.

또한, 본 명세서에서는, 상기 다이싱 다이본딩 필름; 및 상기 다이싱 다이본딩 필름의 적어도 일면에 적층된 웨이퍼;를 포함하는 반도체 웨이퍼를 완전 분단 또는 분단 가능하게 부분 처리하는 전처리 단계 ; 상기 전처리 단계 이후 반도체 웨이퍼를 익스팬딩 하는 단계; 및 상기 익스펜딩한 반도체 웨이퍼의 기재 필름에 자외선을 조사하고, 상기 반도체 웨이퍼의 분단에 의해 분리된 개별 칩들올 픽업하는 단계를 포함하는, 반도체 웨이퍼의 다이싱 방법이 제공될 수 있다.  In addition, in the present specification, the dicing die bonding film; And a wafer stacked on at least one surface of the dicing die-bonding film; a preprocessing step of partially or partially dividing the semiconductor wafer; Expanding the semiconductor wafer after the pretreatment step; And irradiating ultraviolet rays to the base film of the expanded semiconductor wafer and picking up individual chips separated by the division of the semiconductor wafer.

【발명의 효과】  【Effects of the Invention】

다이싱 공정에서 필름 사이의 고착화를 방지하여 픽업 성공률이 높일 수 있으며 상대적으로 높은 다이 쉐어 강도를 나타내어 접착력 저하로 인한 박리 현상을 방지할 수 있는 다이싱 다이본딩 필름을 제공하기 위한 다이싱 필름 점착층 형성용 조성물과 상기 조성물을 포함하는 점착층을 포함하는 다이성 필름과 상기 다이싱 필름을 포함하는, 다이싱 다이본딩 필름과 상기 다이싱 다이본딩 필름을 이용하는 반도체 웨이퍼의 다이싱 방법이 제공된다.  Dicing film adhesive layer for providing a dicing die-bonding film that can prevent the sticking between the films in the dicing process to increase the pick-up success rate and exhibit a relatively high die share strength to prevent the peeling phenomenon due to the decrease in adhesion A dicing method comprising a dicing film comprising the composition for forming and the adhesive layer comprising the composition and the dicing film, and a dicing method of a semiconductor wafer using the dicing die bonding film is provided.

【발명을 실시하기 위한 구체적인 내용】  [Specific contents to carry out invention]

이하 발명의 구체적인 구현예에 따른 다이싱 필름, 다이성 다이본딩 필름 및 반도체 웨이퍼의 다이싱 방법에 관하여 보다 상세하게 설명하기로 한다. 발명의 일 구현예에 따르면, (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자 및 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 첨가제; 점착 바인더; 및 광개시제;를 포함하고, 상기 점착 바인더 대비 상기 고분자 첨가제의 중량비가 0.01%· 내지 4.5%인, 다이싱 필름 점착층 형성용 조성물이 제공될 수 있다. Hereinafter, a dicing method according to a specific embodiment of the present invention, a dicing die bonding film, and a dicing method of a semiconductor wafer will be described in detail. According to one embodiment of the invention, a (meth) acrylate-based polymer and a non-polar functional group, a polymer, a (meth) acrylate-based polymer containing at least one fluorine and a silicone modified (meth) acrylate-based containing a semi-functional group A polymer additive comprising at least one polymer selected from the group consisting of polymers; Adhesive binders; And a photoinitiator, wherein the weight ratio of the polymer additive to the adhesive binder is 0.01% to 4.5%, and a dicing film adhesive layer-forming composition may be provided.

이전에는 다이싱 공정 중 픽업 공정 시 필름 사이의 고착화가 발생하는 문제 및 필름 사이의 필강도가 과다하여 칩들의 픽업 성공를이 낮아질 수 있는 문제점이 존재하는 실정이었다ᅳ  Previously, there were problems that fixation between films occurred during the picking process during the dicing process, and that the peeling success between chips was reduced due to excessive peel strength between films.

이에 본 발명자들은 상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자 및 반응성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 첨가제를 특정 함량으로 포함하는 상기 다이싱 필름 점착층 형성용 조성물로부터 형성된 점착층올 포함하는 다이싱 필름을 사용하는 경우, 필름 사이의 고착화 방지 및 필름 사이의 필강도를 낮춰 칩들의 픽업 성공률을 향상시킬 수 있으며, 상대적으로 높은 다이 쉐어 강도를 나타내어 접착력 저하로 인한 박리 현상을 방지할 수 있고, 반도체 제조 과정의 신뢰성을 향상시킬 수 있다는 점을 실험올 통하여 확인하고 발명을 완성하였다.  Accordingly, the inventors of the present invention provide a polymer comprising a (meth) acrylate-based functional group and a non-polar functional group, a (meth) acrylate-based polymer containing at least one fluorine, and a silicone-modified (meth) acrylate-based polymer containing a reactive functional group. When using a dicing film comprising a pressure-sensitive adhesive layer formed from the composition for forming a dicing film pressure-sensitive adhesive layer containing a polymer additive containing at least one polymer selected in a specific content, the anti-fixing between the film and the fill between the film Through the experiments, it is possible to improve the pick-up success rate of chips by lowering the strength, to exhibit a relatively high die share strength, to prevent delamination due to deterioration of adhesion force, and to improve the reliability of the semiconductor manufacturing process. The invention has been completed.

상기 (메타 아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자 및 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자 각각은 점착층 표면에서 상기 점착 바인더와 보다 상용성을 가져서 용이하게 흔합될수 있으면서도 분자 내부에 존재하는 소정의 비극성 부분이 상기 조성물로부터 제조되는 점점착층 상단으로 노출되어 이형성 및 슬립성을 부여할 수 있다.  Each of the (meth) acrylate-based polymer and the non-polar functional group, the (meth) acrylate-based polymer containing at least one fluorine and the silicone-modified (meth) acrylate-based polymer including the semi-aromatic functional group, each of the Certain nonpolar moieties that are present within the molecule, while more compatible with the adhesive binder and can be easily combined, can be exposed to the top of the increasingly adherent layer made from the composition to impart releasability and slippage.

이에 따라, 상기 고분자 첨가제는 상기 점착 바인더와 반웅하여 전사를 최소화하면서도 상술한 비극성 부분이 점착층 표면에 위치하게 되면서 보다 효과적으로 이형성 및 슬립성을 부여할 수 있다.  Accordingly, the polymer additive may be more effective in providing releasability and slippage as the non-polar part is positioned on the surface of the adhesive layer while minimizing transfer by reacting with the adhesive binder.

특히, 상기 고분자 첨가제는 상기 점착 바인더 대비 0.01% 내지 4.5%, —_ In particular, the polymer additive is 0.01% to 4.5% compared to the adhesive binder, —_

또는 0. 1% 내지 2%의 중량비로 사용할 수 있는데, 상대적으로 낮은 사용량에도 불구하고 상기 구현예의 다이싱 필름 점착층 형성용 조성물로부터 제조되는 다이싱 필름의 점착층이 박리 강도, 예를 들어 UV 조사 전 후에 180도 박리력 및 택 강도와 SUS에 대한 박리력이 크게 높아질 수 있다. Or 0.1% to 2% by weight, and despite the relatively low usage, the adhesive layer of the dicing film prepared from the dicing film adhesive layer-forming composition of the embodiment may have a peel strength, for example, UV. 180 degrees peeling force and tack strength and peeling force against SUS can be greatly increased before and after irradiation.

상기 점착 바인더 대비 상기 고분자 첨가제의 중량비가 너무 낮으면, 상기 구현예의 다이싱 필름 점착층 형성용 조성물로부터 제조되는 다이성 필름의 점착층이 박리 강도, 예를 들어 uv 조사 전 후에 180도 박리력 및 택 강도와 If the weight ratio of the polymer additive to the pressure-sensitive adhesive is too low, the adhesive layer of the die film prepared from the dicing film adhesive layer-forming composition of the embodiment is peel strength, for example, 180 degrees peeling force before and after uv irradiation and Tack strength and

SUS에 대한 박리력이 크게 높아질 수 있다. Peeling force against SUS can be greatly increased.

또한, 상기 점착 바인더 대비 상기 고분자 첨가제의 중량비가 너무 높으면, 상기 구현예의 다이싱 필름 점착층 형성용 조성물로부터 제조되는 다이싱 필름의 점착층이 박리 강도는 어느 정도 낮출 수 있으나, 상기 점착층의 다이 쉐어 강도가 크게 낮아져서 접착력 저하로 인한 박리 현상이 나타날 수 있으며, 이에 따라 반도체 제조 과정에서 신뢰성이 저하될 수 있다.  In addition, if the weight ratio of the polymer additive to the adhesive binder is too high, the adhesive strength of the dicing film prepared from the dicing film adhesive layer-forming composition of the embodiment may lower the peel strength to some extent, the die of the adhesive layer As the shear strength is significantly lowered, peeling may occur due to a decrease in adhesive strength, and thus, reliability may be degraded during semiconductor manufacturing.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자는 하기 화학식 1의 반복 단위를 포함할 수 있다.  The polymer including the (meth) acrylate-based functional group and the non-polar functional group may include a repeating unit represented by the following Chemical Formula 1.

[화학식 1 ]  [Formula 1]

Figure imgf000007_0001
Figure imgf000007_0001

상기 화학식 1에서, ^은 수소, 탄소수 1 내지 20의 알킬기이고, ¾는 수소, 탄소수 1 내지 20의 알킬기, 폴리에스테르기 또는 폴리에테르기이며, n은 1 내지 300의 정수이다.  In Formula 1, ^ is hydrogen, an alkyl group having 1 to 20 carbon atoms, ¾ is hydrogen, an alkyl group having 1 to 20 carbon atoms, a polyester group or a polyether group, n is an integer of 1 to 300.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자의 상용 제품의 예로는 BYKO-350 , BYK-352 , BYK-354 , BYK-355 , BYK-356 , BY -358N , BYK-361N , BYK-380 , BYK-392 또는 BYK-394을 들 수 있으나, 상기 고분자 첨가제의 구체적인 예가 이에 한정되는 것은 아니다. 상기 블소를 1이상 포함하는 (메타)아크릴레이트계 고분자는 탄소수 1 내지 10의 퍼플루오로알킬기 또는 탄소수 1 내지 10의 불소화 알케닐기가 치환된Examples of commercially available products of the polymer including the (meth) acrylate-based functional groups and non-polar functional groups include BYKO-350, BYK-352, BYK-354, BYK-355, BYK-356, BY -358N, BYK-361N, BYK- 380, BYK-392 or BYK-394, but the specific examples of the polymer additives are not limited thereto. The (meth) acrylate-based polymer containing one or more of the bloso is substituted with a perfluoroalkyl group having 1 to 10 carbon atoms or a fluorinated alkenyl group having 1 to 10 carbon atoms.

(메타)아크릴레이트계 고분자를 포함할 수 있다. It may contain a (meth) acrylate-based polymer.

상기 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자의 상용 제품의 예로는 프터젠트 222F (네오스사 제조), F470(DIC사), F489 (DIC사) , 또는 V-8FM 등을 들 수 있으나, 상기 고분자 첨가제의 구체적인 예가 이에 한정되는 것은 아니다.  Examples of commercially available products of the (meth) acrylate-based polymer containing one or more of fluorine include Psentant 222F (manufactured by Neos), F470 (DIC), F489 (DIC), or V-8FM. In addition, specific examples of the polymer additives are not limited thereto.

상기 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자는 히드록시기, 탄소수 1내지 10의 알킬렌 알코을, 에폭시, 아미노기, 티올기 또는 카르복실기로 이루어진 군에서 선택된 1종 이상의 반응성 작용기가 1이상 치환된 실리콘 변성 (메타)아크릴레이트계 고분자를 포함할 수 있다.  The silicone-modified (meth) acrylate-based polymer including the semi-functional group includes one or more reactive functional groups selected from the group consisting of a hydroxy group, an alkylene alcohol having 1 to 10 carbon atoms, an epoxy, an amino group, a thiol group, or a carboxyl group. Silicone-modified (meth) acrylate-based polymer may be included.

상기 반응성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자의 보다 구체적인 예로는 히드록시 기능성 실리콘 변성 폴리아크릴레이트를 들 수 있으며, 이의 상용 제품의 예로는 BYK SIL-CLEAN 3700 등을 들 수 있으나, 상기 고분자 첨가제의 구체적인 예가 이에 한정되는 것은 아니다.  More specific examples of the silicone-modified (meth) acrylate-based polymer containing the reactive functional group include a hydroxy functional silicone-modified polyacrylate, examples of commercially available products thereof include BYK SIL-CLEAN 3700, Specific examples of the polymer additives are not limited thereto.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자 및 반응성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 첨가제는 알코올류, 에테르류, 아세테이트류 및 케톤류로 이루어진 군에서 선택된 1종 이상의 유기 용매를 더 포함할 수 있다.  1 type selected from the group consisting of a polymer including the (meth) acrylate-based functional group and a non-polar functional group, a (meth) acrylate-based polymer including one or more fluorine, and a silicone-modified (meth) acrylate-based polymer containing a reactive functional group The polymer additive including the above polymer may further include one or more organic solvents selected from the group consisting of alcohols, ethers, acetates, and ketones.

상기 고분자 첨가제는 상술한 고분자 1 내지 50중량 % 및 잔량의 유기 용매를 포함할 수 있다.  The polymer additive may include 1 to 50% by weight of the polymer and the remaining amount of the organic solvent.

상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자 및 상기 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자 각각이 1 중량 % 내지 50중량 ¾의 유기 용액 기준으로 10 mg KOH/g 내지 50 mg KOH/g , 또는 20 mg KOH/g 내지 40 mg KOH/g의 산가를 가질 수 있다.  10 mg KOH / g based on the organic solution of 1% by weight to 50% by weight of each of the polymer including the (meth) acrylate-based functional group and the non-polar functional group and the silicone-modified (meth) acrylate-based polymer including the semi-aromatic functional group And an acid value of from 50 mg KOH / g, or 20 mg KOH / g to 40 mg KOH / g.

한편, 상기 점착 바인더는 다이싱 필름의 점착충을 형성하는데 사용될 수 있는 것으로 알려진 고분자 수지를 큰 제한 없이 사용할 수 있으며, 예를 들어 소정의 반응성 작용기가 치환된 고분자 수지 또는 반응성 작용기를 포함한 주쇄의 고분자 수지를 사용할 수 있다. On the other hand, the adhesive binder may use a polymer resin known to be able to be used to form a tack of the dicing film without great limitation, for example A polymer resin in which a predetermined reactive functional group is substituted or a polymer resin in a main chain including a reactive functional group can be used.

구체적으로, 상기 점착 바인더는 하이드록시기, 이소시아네이트기, 비닐기 및 (메타)아크릴레이트기로 이루어진 군에서 선택된 1종 이상의 작용기가 1 이상 치환 또는 비치환된 (메타)아크릴레이트계 중합체 또는 (메타)아크릴레이트계 공중합체를 포함할 수 있다.  Specifically, the adhesive binder is a (meth) acrylate polymer or (meth) in which at least one functional group selected from the group consisting of a hydroxyl group, an isocyanate group, a vinyl group, and a (meth) acrylate group is substituted or unsubstituted It may include an acrylate copolymer.

또한, 상기 점착 바인더로는 (메타)아크릴레이트 수지의 측쇄에 탄소ᅳ 탄소 이중결합을 가지는 아크릴레이트를 부가시킨 내재형 점착 바인더일 수 있다. 예를 들어, 상기 내재형 점착 바인더로는 (메타)아크릴레이트계 베이스 수지의 주쇄에 (메타)아크릴레이트 작용기를 측쇄로 1 wt% 내지 45 wt% 부가한 고분자 수지를 사용할 수 있다,  In addition, the pressure-sensitive adhesive binder may be an internal pressure-sensitive adhesive binder in which an acrylate having a carbon to carbon double bond is added to the side chain of the (meth) acrylate resin. For example, a polymer resin in which 1 wt% to 45 wt% of a (meth) acrylate functional group is added to the main chain of the (meth) acrylate base resin as a side chain may be used as the internal adhesive binder.

상기 점착 바인더는 100 , 000 내지 1 , 500 , 000의 중량평균분자량을 갖는 고분자 수지를 포함할 수 있다.  The adhesive binder may include a polymer resin having a weight average molecular weight of 100, 000 to 1, 500, 000.

구체적으로, 상기 하이드록시기, 이소시아네이트기, 비닐기 및 (메타>아크릴레이트기로 이루어진 군에서 선택된 1종 이상의 작용기가 1이상 치환 또는 비치환된 (메타)아크릴레이트계 중합체 또는 (메타)아크릴레이트계 공중합체는 100 , 000 내지 1 , 500 , 000의 중량평균분자량을 가질 수 있다.  Specifically, the (meth) acrylate polymer or (meth) acrylate type in which at least one functional group selected from the group consisting of the hydroxy group, the isocyanate group, the vinyl group and the (meth> acrylate group) is substituted or unsubstituted The copolymer may have a weight average molecular weight of 100, 000 to 1, 500, 000.

본 명세서에서, (메타)아크릴레이트는 아크릴레이트 [acryl ate] 및 (메타)크릴레이트 [ (meth)acrylate]를 모두 포함하는 의미이다.  In the present specification, (meth) acrylate is meant to include both acrylate [acryl ate] and (meth) acrylate [(meth) acrylate].

이러한 (메타)아크릴레이트계 중합체 또는 (메타)아크릴레이트계 공중합체 는 예를 들면, (메타)아크릴산 에스테르계 단량체 및 가교성 관능기 함유 단량체의 중합체 또는 공중합체일 수 있다.  Such a (meth) acrylate polymer or a (meth) acrylate copolymer may be, for example, a polymer or copolymer of a (meth) acrylic acid ester monomer and a crosslinkable functional group-containing monomer.

이 때 (메타)아크릴산 에스테르계 단량체의 예로는 알킬 (메타)아크릴레이트를 들 수 있으며, 보다 구체적으로는 탄소수 1 내지 12의 알킬기를 가지는 단량체로서, 펜틸 (메타)아크릴레이트, n-부틸 (메타)아크릴레이트, 에틸 (메타)아크릴레이트, 메틸 (메타)아크릴레이트, 핵실 (메타)아크릴레이트, n—옥틸 (메타)아크릴레이트, 이소옥틸 (메타)아크릴레이트, 2-에될핵실 (메타)아크릴레이트, 도데실 (메타)아크릴레이트 또는 데실 (메타)아크릴레이트의 일종 또는 이종 이상의 흔합을 들 수 있다. 알킬의 탄소수가 큰 단량체를 사용할수록, 최종 공중합체의 유리전이온도가 낮아지므로, 목적하는 유리전이온도에 따라 적절한 단량체를 선택하면 된다. At this time, examples of the (meth) acrylic acid ester monomer include alkyl (meth) acrylate, and more specifically, a monomer having an alkyl group having 1 to 12 carbon atoms, pentyl (meth) acrylate, and n-butyl (meth). ) Acrylate, ethyl (meth) acrylate, methyl (meth) acrylate, nucleus (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylyl nucleus (meth) Or a mixture of one or more kinds of acrylate, dodecyl (meth) acrylate or decyl (meth) acrylate. The higher the carbon number of the alkyl monomer is used, the lower the glass transition temperature of the final copolymer, What is necessary is just to select the appropriate monomer according to the glass transition temperature of interest.

또한, 가교성 관능기 함유 단량체의 예로는 히드록시기 함유 단량체, 카복실기 함유 단량체 또는 질소 함유 단량체의 일종 또는 이종 이상의 흔합을 들 수 있다. 이 때 히드록실기 함유 화합물의 예로는, 2-히드록시에틸 (메타)아크릴레이트 또는 2-히드록시프로필 (메타)아크릴레이트 등을 들 수 있고, 카복실기 함유 화합물의 예로는, (메타)아크릴산 등을 들 수 있으며, 질소 함유 단량체의 예로는 (메타)아크릴로니트릴, Nᅳ비닐 피롤리돈 또는 Nᅳ비닐 카프로락탐 등을 들 수 있으나, 이에 제한되는 것은 아니다. 상기 (메타)아크릴레이트계 수지에는 또한 상용성 등의 기타 기능성 향상의 관점에서, 초산비닐, 스틸렌 또는 아크릴로니트릴 탄소 -탄소 이중결할함유 저분자량 화합물 등이 추가로 포함될 수 있다.  In addition, examples of the crosslinkable functional group-containing monomer include one or more kinds of hydroxy group-containing monomers, carboxyl group-containing monomers, or nitrogen-containing monomers. At this time, examples of the hydroxyl group-containing compound include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and the like. Examples of the carboxyl group-containing compound include (meth) acrylic acid. And the like, and examples of the nitrogen-containing monomer include (meth) acrylonitrile, N ᅳ vinyl pyrrolidone or N ᅳ vinyl caprolactam, but are not limited thereto. The (meth) acrylate resin may further include vinyl acetate, styrene, or acrylonitrile carbon-carbon double defect-containing low molecular weight compounds and the like from the viewpoint of improving other functionalities such as compatibility.

또한, 상기 (메타)아크릴레이트 수지의 측쇄에 탄소 -탄소 이중결합을 가지는 아크릴레이트를 부가시킨 내재형 점착 바인더는 100 , 000 내지 1 , 500 , 000의 중량평균분자량을 가질 수 있다.  In addition, the internal pressure-sensitive adhesive binder to which the acrylate having a carbon-carbon double bond is added to the side chain of the (meth) acrylate resin may have a weight average molecular weight of 100, 000 to 1, 500, 000.

상기 점착 바인더에 포함되는 고분자 수지의 중량평균분자량이 너무 낮으면, 상기 구현예의 다이싱 필름 점착층 형성용 조성물의 코팅성 또는 웅집력이 저하될 수 있으며, 상기 구현예의 조성물로부터 형성된 점착층의 박리 시 피착체에 잔여물이 남거나 또는 상기 점착층이 파괴될 수 있다.  When the weight average molecular weight of the polymer resin included in the adhesive binder is too low, the coating property or the cohesion of the dicing film adhesive layer-forming composition of the embodiment may be lowered, the peeling of the adhesive layer formed from the composition of the embodiment Residue may remain on the adherend or the adhesive layer may be destroyed.

또한, 상기 점착 바인더에 포함되는 고분자 수지의 중량평균분자량이 너무 높으면, 상기 구현예의 다이성 필름 점착층 형성용 조성물의 자외선 경화가 층분히 일어나지 않을 수 있고 이에 따라 상기 조성물로부터 형성되는 점착층이 박리력이 층분히 낮아지지 않아서 픽업 성공를이 저하될 수 있다.  In addition, when the weight average molecular weight of the polymer resin included in the adhesive binder is too high, ultraviolet curing of the composition for forming a die-film adhesive layer of the embodiment may not occur in a small amount, thereby peeling off the adhesive layer formed from the composition. The force may not be significantly lowered, which may lower the pickup success.

한편, 상기 다이싱 필름 점착층 형성용 조성물은 자외선 경화형 화합물을 더 포함할 수 있다.  On the other hand, the dicing film adhesive layer-forming composition may further comprise an ultraviolet curable compound.

상기 자외선 경화형 화합물의 종류는 특별히 제한되지 않으며, 예를 들면, 중량평균분자량이 500 내지 300 , 000 정도인 다관능성 화합물 (ex . 다관능성 우레탄 아크릴레이트, 다관능성 아크릴레이트 단량체 또는 을리고머 등)을 사용할 수 있다. 이 분야의 평균적 기술자는 목적하는 용도에 따른 적절한 화합물을 용이하게 선택할 수 있다.  The type of the UV-curable compound is not particularly limited, and for example, a polyfunctional compound having a weight average molecular weight of about 500 to 300, 000 (ex. Polyfunctional urethane acrylate, polyfunctional acrylate monomer or oligomer, etc.) Can be used. The average person skilled in the art can easily select the appropriate compound according to the intended use.

상기 자외선 경화형 화합물의 함량은 전술한 점착 바인더 100 중량부에 대하여, 5 중량부 내지 400 중량부, 바람직하게는 10 중량부 내지 200 중량부일 수 있다. 자외선 경화형 화합물의 함량이 5 중량부 미만이면, 경화 후 점착력 저하가 층분하지 않아 픽업성이 떨어질 우려가 있고, 400 중량부를 초과하면, 자외선 조사 전 점착제의 웅집력이 부족하거나, 이형 필름 등과의 박리가 용이하게 이루어지지 않을 우려가 있다. The content of the ultraviolet curable compound is 100 parts by weight of the above-mentioned adhesive binder 5 to 400 parts by weight, preferably 10 to 200 parts by weight, relative to the total amount. If the content of the ultraviolet curable compound is less than 5 parts by weight, there is a risk that the drop in adhesive strength after curing is not divided, the pick-up property may be degraded. There is a fear that it will not be made easily.

한편, 상기 구현예의 다이싱 필름 점착층 형성용 조성물에 포함되는 광개시제의 구체적인 예가 한정되는 것은 아니며, 통상적으로 알려진 광개시제를 별 다른 제한 O없이 사용할 수 있다. 예를 들어, 상기 광개시제로는 벤조인과 그 알킬에테르류, 아세토페논류, 안트라퀴논류, 티오크산톤류, 케탈류, 벤조페논류, α -아미노아세토페논류, 아실포스핀옥사이드류, 옥심에스테르류 또는 이들의 2종 이상의 흔합물을 용할 수 있다.  On the other hand, specific examples of the photoinitiator included in the composition for forming a dicing film adhesive layer of the above embodiment is not limited, and conventionally known photoinitiators may be used without particular limitation O. For example, as the photoinitiator, benzoin and its alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones, α-aminoacetophenones, acylphosphine oxides, and oximes Esters or two or more kinds thereof can be used.

상기 광개시제의 사용량은 제조되는 점착층의 물성 및 특성과 사용되는 점착 바인더의 종류 및 특성 등으로 고려하여 결정될 수 있으며', 예를 들어 상기 구현예의 다이싱 필름 점착층 형성용 조성물은 상기 점착 바인더 100 중량부 대비 상기 광개시제 0.01 내지 8 증량부를 포함할 수 있다. The amount of the photoinitiator is determined in consideration with such type and characteristics of the adhesive binder used and the properties and characteristics of the adhesive layer to be produced, and ', for example, the embodiment dicing film composition for adhesive layer formation is the adhesive binder 100 It may include 0.01 to 8 parts by weight of the photoinitiator relative to parts by weight.

한편, 상기 구현예의 다이싱 필름 점착층 형성용 조성물은 경화제를 더 포함할 수 있다. 상기 구현예의 다이싱 필름 점착층 형성용 조성물을 기재 필름의 코팅시 상기 경화제는 점착 바인더의 반응기와 상은 또는 30 내지 50 °C의 온도에서 반웅하여 가교를 형성할 수 있다. 또한, 상기 경화제에 포함되는 소정의 반웅기가 미반웅 상태로 잔류하다가 픽업 전에 UV 조사를 통해 추가 가교가 진행되어 점착층의 점착력을 낮출 수 있다.  On the other hand, the composition for forming a dicing film adhesion layer of the embodiment may further comprise a curing agent. When the composition for forming the dicing film pressure-sensitive adhesive layer of the embodiment is coated with the base film, the curing agent may react with the reactor of the pressure-sensitive adhesive or react at a temperature of 30 to 50 ° C. to form a crosslink. In addition, the predetermined semi-unggi contained in the curing agent remains in the non-ungung state, and further cross-linking is carried out through UV irradiation before pickup, thereby lowering the adhesive force of the adhesive layer.

상기 경화제는 이소시아네이트계 화합물, 아지리딘계 화합물 , 에폭시계 화합물 및 금속 킬레이트계 화합물로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.  The curing agent may include one or more selected from the group consisting of an isocyanate compound, an aziridine compound, an epoxy compound, and a metal chelate compound.

상기 경화제의 사용량은 제조되는 점착층의 물성 및 특성과 사용되는 점착 바인더의 종류 및 특성 등으로 고려하여 결정될 수 있으며, 예를 들어 상기 구현예의 다이싱 필름 점착층 형성용 조성물은 상기 점착 바인더 100 중량부 대비 상기 경화제 0. 1 내지 30중량부를 포함할 수 있다. 한편, 발명의 다른 구현예에 따르면, 기재 필름과 상기 기재 필름의 적어도 일면 상에 형성된 점착층을 포함하고, 상기 점착층은 상술한 일 구현예의 다이성 필름 점착층 형성용 조성물을 포함하는 다이싱 필름이 제공될 수 있다. 상기 기재필름의 종류는 특별히 제한되지 않으며, 예를 들면, 이 분야에서 공지된 플라스틱 필름 또는 금속박 등을 사용할 수 있다. 예를 들어, 상기 기재 필름은 저밀도 폴리에틸렌, 선형 폴리에틸렌, 중밀도 폴리에틸렌, 고밀도 폴리에틸렌, 초저밀도 폴리에틸렌, 폴리프로필렌의 랜덤 공중합체, 폴리프로필렌의 블록 공중합체, 호모폴리프로필렌, 폴리메틸펜텐 (po l ymethyl pent ene ) , 에틸렌-초산비닐 공중합체, 에틸렌- 메타크릴산 공중합체, 에틸렌—메틸메타크릴레이트 공중합체, 에틸렌 -아이오노머 공중합체, 에틸렌 -비닐알코올 공중합체, 폴리부텐, 스틸렌의 공중합체 또는 이들의 2총 이상의 흔합물을 들 수 있다. 상기에서 2종 이상의 고분자가 흔합물이 포함되는 기재 필름의 의미는, 전술한 고분자들을 각각 포함한 필름이 2층 이상 적층된 구조의 필름 또는 전술한 고분자들이 2이상 포함된 단일층이 필름을 모두 포함한다. The amount of the curing agent may be determined in consideration of the physical properties and properties of the adhesive layer to be prepared and the type and characteristics of the adhesive binder used, for example, the composition for forming a dicing film adhesive layer of the embodiment is 100 weight of the adhesive binder. It may comprise 0.1 to 30 parts by weight of the curing agent relative to parts. On the other hand, according to another embodiment of the invention, the base film and the base film It includes a pressure-sensitive adhesive layer formed on at least one surface, wherein the pressure-sensitive adhesive layer may be provided with a dicing film comprising a composition for forming a die film adhesion layer of the above-described embodiment. The type of the base film is not particularly limited, and for example, a plastic film or a metal foil known in the art may be used. For example, the base film may include low density polyethylene, linear polyethylene, medium density polyethylene, high density polyethylene, ultra low density polyethylene, random copolymer of polypropylene, block copolymer of polypropylene, homopolypropylene, polymethylpentene (po l ymethyl pent ene), ethylene-vinyl acetate copolymer, ethylene-methacrylic acid copolymer, ethylene-methyl methacrylate copolymer, ethylene-ionomer copolymer, ethylene-vinyl alcohol copolymer, polybutene, styrene copolymer or And a combination of two or more of these. The meaning of the base film including a mixture of two or more polymers in the above means that a film having a structure in which two or more layers of films including each of the aforementioned polymers are laminated or a single layer containing two or more of the aforementioned polymers includes both films. do.

상기 기재 필름의 두께는 특별히 한정되지 않으며, 통상 10 卿내지 200 τί\ , 바람직하게는 50 卿내지 180 의 두께로 형성된다. 상기 두께가 10 卿미만이면, 다이싱 공정에서 절단 깊이 ( cut depth)의 조절이 불안해 질 우려가 있고, 200 卿를 초과 하면, 다이성 공정에서 버 (burr )가 다량 발생하게 되거나, 연신률이 떨어져서 익스펜딩 공정이 정확하게 이루어지지 '않을 우려가 있다. The thickness of the base film is not particularly limited, and is usually formed in a thickness of 10 kPa to 200 kPa, preferably 50 kPa to 180. If the thickness is less than 10 mm, the control of the cut depth may become unstable in the dicing process. If the thickness exceeds 200 mm, a large amount of burrs may be generated or the elongation is lowered in the dicing process. the extreme pending process there is a concern not done not "accurately.

상기 기재 필름에는 필요에 따라 매트처리, 코로나 방전 처리, 프라이머 처리 또는 가교 처리 등의 관용적인 물리적 또는 화학적 처리를 가할 수 있다. 상기 점착층의 두께는 0 . 5 im 내지 50 μηι , 또는 5 내지 30 일 수 있다.  The base film may be subjected to conventional physical or chemical treatments such as matt treatment, corona discharge treatment, primer treatment or crosslinking treatment, as necessary. The adhesive layer has a thickness of 0. 5 im to 50 μηι, or 5 to 30 days.

상기 점착층에 포함되는 다이싱 필름 점착층 형성용 조성물에 관한 내용은 상기 일 구현예에 관하여 상술한 내용을 모두 포함한다. 한편, 발명의 또 다른 구현예에 따르면, 상기 다이싱 필름; 및 상기 다이싱 필름의 적어도 일면에 형성된 접착층을 포함하는 다이싱 다이본딩 필름이 제공된다.  The contents of the dicing film adhesive layer-forming composition included in the adhesive layer include all the contents described above with respect to the embodiment. On the other hand, according to another embodiment of the invention, the dicing film; And an adhesive layer formed on at least one surface of the dicing film.

상기 다이싱 필름에 관한 구체적인 내용은 상술한 내용을 모두 포함한다. 상기 접착제충은 에폭시 수지, 저탄성 고분자량 수지 및 접착제층용 경화제를 포함할 수 있다. 상기 에폭시 수지에는 이 분야에서 공지된 일반적인 접착제용 에폭시 수지가 포함될 수 있으며, 예를 들면, 분자 내에 2개 이상의 에폭시기를 함유하고, 중량평균분자량이 100 내지 5 , 000인 에폭시 수지를 사용할 수 있다. Specific contents relating to the dicing film include all the above-mentioned contents. The adhesive charge may include an epoxy resin, a low elastic high molecular weight resin, and a curing agent for an adhesive layer. The epoxy resin may include an epoxy resin for general adhesives known in the art, for example, an epoxy resin containing two or more epoxy groups in a molecule and having a weight average molecular weight of 100 to 5,000.

상기 에폭시 수지는 경화 공정을 통해 하드한 가교 구조를 형성하여, 탁월한 접착성, 내열성 및 기계적 강도를 나타낼 수 있다.  The epoxy resin may form a hard crosslinked structure through a curing process, and may exhibit excellent adhesion, heat resistance, and mechanical strength.

보다 구체적으로 상기 에폭시 수지로는 특히 평균 에폭시 당량이 100 내지 1 , 000인 에폭시 수지를 사용하는 것이 바람직하다. 상기 에폭시 수지의 에폭시 당량이 100 미만이면 가교 밀도가 지나치게 높아져서, 접착 필름이 전체적으로 딱딱한 성질을 나타낼 우려가 있고, 상기 에폭시 수지의 에폭시 당량이 1,000을 초과하면 내열성이 저하될 우려가 있다.  More specifically, as the epoxy resin, it is particularly preferable to use an epoxy resin having an average epoxy equivalent of 100 to 1,000. If the epoxy equivalent of the said epoxy resin is less than 100, a crosslinking density will become high too much, and there exists a possibility that an adhesive film may show a hard property as a whole, and when the epoxy equivalent of the said epoxy resin exceeds 1,000, there exists a possibility that heat resistance may fall.

상기 에폭시 수지의 예로는, 비스페놀 A 에폭시 수지 또는 비스페놀 F 에폭시 수지 등의 이관능성 에폭시 수지; 또는 크레졸 노볼락 에폭시 수지, 페놀 노볼락 에폭시 수지, 4관능성 에폭시 수지, 비페닐형 에폭시 수지, 트리페놀메탄형 에폭시 수지, 알킬 변성 트리페놀메탄형 에폭시 수지, 나프탈렌형 에폭시 수지, 디시클로펜타디엔형 에폭시 수지 또는 '디시클로펜타디엔 변성 페놀형 에폭시 수지 등의 3개 이상의 관능기를 가지는 다관능성 에폭시 수지의 일종 또는 이종 이상을 들 수 있으나, 이에 제한되는 것은 아니다.  As an example of the said epoxy resin, Bifunctional epoxy resin, such as a bisphenol A epoxy resin or a bisphenol F epoxy resin; Or cresol novolac epoxy resin, phenol novolac epoxy resin, tetrafunctional epoxy resin, biphenyl type epoxy resin, triphenol methane type epoxy resin, alkyl modified triphenol methane type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene One kind or two or more kinds of polyfunctional epoxy resins having three or more functional groups, such as a type epoxy resin or a dicyclopentadiene modified phenol type epoxy resin, are not limited thereto.

상기 에폭시 수지로서 이관능성 에폭시 수지 및 다관능성 에폭시 수지의 흔합 수지를 사용하는 것이 바람직하다 .  It is preferable to use the mixed resin of a bifunctional epoxy resin and a polyfunctional epoxy resin as said epoxy resin.

상기 『다관능성 에폭시 수지』 는 3개 이상의 관능기를 가지는 에폭시 수지를 의미한다: 즉, 일반적으로 이관능성 에폭시 수지는 유연성 및 고온에서의 흐름성 등은 우수하나, 내열성 및 경화 속도가 떨어지는 반면, 관능기가 3개 이상인 다관능성 에폭시 수지는 경화 속도가 빠르고, 높은 가교 밀도로 인해 탁월한 내열성을 보이나, 유연성 및 흐름성이 떨어진다. 따라서, 상기 두 종류의 수지를 적절히 흔합, 사용함으로 해서, 접착층의 탄성를 및 택 (tack) 특성을 제어하면서도, 다이싱 공정 시에 칩의 비산이나 버의 발생을 억제할 수 있다. 상기 저탄성 고분자량 수지는 접착제 내에서 소프트 세그먼트를 이루어 고온에서의 웅력 완화 특성을 부여하는 역할을 할 수 있다. 상기 고분자량 수지로서, 상기 에폭시 수지와 블렌딩되어 필름 형성 시에 부서짐을 유발하지 않고, 가교 구조의 형성 후 점탄성을 나타낼 수 있으며, 다른 성분과의 상용성 및 보관 안정성이 우수한 것이라면, 어떠한 수지 성분도 사용될 수 있다. The term “multifunctional epoxy resin” refers to an epoxy resin having three or more functional groups: That is, in general, a bifunctional epoxy resin has excellent flexibility and flowability at high temperatures, but has low heat resistance and curing rate, while a functional group The polyfunctional epoxy resin having three or more has a fast curing rate and shows excellent heat resistance due to high crosslinking density, but is inferior in flexibility and flowability. Therefore, by appropriately mixing and using the above two kinds of resins, it is possible to suppress chip scattering and burr generation during the dicing process while controlling the elasticity and tack characteristics of the adhesive layer. The low elastic high molecular weight resin is a soft segment in the adhesive It can play a role of imparting the relaxation characteristics at high temperatures. As the high molecular weight resin, it may be blended with the epoxy resin to cause viscoelasticity after formation of a crosslinked structure without causing breakage during film formation, and any resin component may be used as long as it has excellent compatibility with other components and storage stability. Can be.

상기 저탄성 고분자량 수지의 구체적인 종류는, 전술한 특성을 만족하는 한 특별히 제한되지 않으나, 예를 들어 폴리이미드, 폴리에테르이미드, 폴리에스테르이미드, 폴리아미드, 폴리에테르술폰, 폴리에테르케톤, 폴리을레핀, 폴리염화비닐ᅳ 페녹시, 반웅성 아크릴로니트릴부타디엔 고무 또는 (메타)아크릴레이트계 수지 등의 일종 또는 이종 이상의 흔합을 사용할 수 있다. 상기 (메타)아크릴레이트계 수지의 구체적인 예로는 (메타)아크릴산 및 그 유도체를 포함하는 아크릴계 공중합체를 들 수 있으며, 이 때 (메타)아크릴산 및 그 유도체의 예로는 (메타)아크릴산; 메틸 (메타)아크릴레이트 또는 에틸 (메타)아크릴레이트 등의 탄소수 1 내지 12의 알킬기를 함유하는 알킬 (메타)아크릴레이트; (메타)아크릴로니트릴 또는 (메타)아크릴아미드; 및 기타 공증합성 단량체들이 포함된다.  The specific kind of the low elastic high molecular weight resin is not particularly limited as long as it satisfies the above-described characteristics. For example, polyimide, polyetherimide, polyesterimide, polyamide, polyether sulfone, polyether ketone, polyolefin Or a mixture of one or more kinds of polyvinyl chloride phenoxy, semi-acrylonitrile butadiene rubber or a (meth) acrylate resin. Specific examples of the (meth) acrylate-based resin may include an acrylic copolymer including (meth) acrylic acid and derivatives thereof, and examples of (meth) acrylic acid and derivatives thereof include (meth) acrylic acid; Alkyl (meth) acrylate containing a C1-C12 alkyl group, such as methyl (meth) acrylate or ethyl (meth) acrylate; (Meth) acrylonitrile or (meth) acrylamide; And other co-polymerizable monomers.

상기 (메타)아크릴레이트계 수지는 또한 글리시딜기, 히드록시기, 카복실기 및 아민기 등의 일종 또는 이종 이상의 관능기를 포함할 수 있으며, 이와 같은 관능기는 글리시딜 (메타)아크릴레이트, 히드록시 (메타)아크릴레이트, 히드록시에틸 (메타)아크릴레이트 또는 카복시 (메타)아크릴레이트 등의 단량체를 공중합시킴으로써 도입할 수 있다.  The (meth) acrylate resin may also include one or more functional groups such as glycidyl group, hydroxy group, carboxyl group and amine group, and such functional group may be glycidyl (meth) acrylate, hydroxy ( It can introduce | transduce by copolymerizing monomers, such as a meth) acrylate, hydroxyethyl (meth) acrylate, or carboxy (meth) acrylate.

상기 접착제 조성물에 포함될 수 있는 경화제는 상기 에폭시 수지 및 /또는 저탄성 고분자량 수지와 반응하여, 가교 구조를 형성할 수 있는 것이라면 특별히 제한되지 않는다. 예를 들면, 상기 두 성분과 동시에 반웅하여 가교 구조를 형성할 수 있는 경화제를 사용할 수 있는데, 이와 같은 경화제는 접착제 내의 소프트 세그먼트 및 하드 세그먼트와 각각 가교 구조를 이루어 내열성을 향상시키는 동시에, 양자의 계면에서 두 세그먼트의 가교제로 작용하여 반도체 패키지의 신뢰성을 향상시킬 수 있다.  The curing agent that can be included in the adhesive composition is not particularly limited as long as it can react with the epoxy resin and / or the low elastic high molecular weight resin to form a crosslinked structure. For example, a curing agent capable of forming a crosslinked structure by simultaneously reacting with the two components may be used. Such a curing agent forms a crosslinked structure with the soft and hard segments in the adhesive, respectively, to improve heat resistance, and at the same time, the interface between the two components. It can act as a cross-linking agent of two segments in to improve the reliability of the semiconductor package.

상기 접착층의 두께가 크게 한정되는 것은 아니나, 예를 들어 1 내지 100 Ά , 또는 3 내지 50 의 범위일 수 있다. 한편, 발명의 또 다른 구현예에 따르면, 상기 다이싱 다이본딩 필름; 및 상기 다이싱 다이본딩 필름의 적어도 일면에 적층된 웨이퍼;를 포함하는 반도체 웨이퍼를 완전 분단 또는 분단 가능하게 부분 처리하는 전처리 단계; 상기 ' 전처리 단계 이후 반도체 웨이퍼를 익스팬딩 하는 단계; 및 상기 익스펜딩한 반도체 웨이퍼의 기재 필름에 자외선을 조사하고, 상기 반도체 웨이퍼의 분단에 의해 분리된 개별 칩들을 픽업하는 단계를 포함하는, 반도체 웨이퍼의 다이성 방법이 제공될 수 있다. The thickness of the adhesive layer is not particularly limited, but may be, for example, in the range of 1 to 100 Ά, or 3 to 50. On the other hand, according to another embodiment of the invention, the dicing die bonding film; And a wafer stacked on at least one surface of the dicing die-bonding film; a pre-processing step of partially or partially dividing the semiconductor wafer. Comprising: Extreme pending the 'pre-treatment step after the semiconductor wafer; And irradiating ultraviolet rays to the base film of the expanded semiconductor wafer, and picking up individual chips separated by the division of the semiconductor wafer.

상기 다이싱 다이본딩 필름에 관한 내용을 상술한 내용을 모두 포함한다. 상기 다이싱 방법의 세부 단계에 관한 내용을 제외하고, 통상적으로 알려진 반도체 웨이퍼의 다이싱 방법에 사용되는 장치, 방법 등을 별 다른 제한 없이 사용할 수 있다.  It includes all the above-mentioned content regarding the dicing die-bonding film. Except for the detailed steps of the dicing method, a device, a method, and the like, which are commonly used for a dicing method of a known semiconductor wafer, may be used without particular limitation.

상기 다이싱 필름을 포함한 다이싱 다이본딩 필름을 사용함에 따라서, 반도체 웨이퍼의 다이싱 공정 중 발생할 수 있는 버 (burr ) 현상을 최소화하여 반도체 칩의 오염을 방지하고 반도체 칩의 신뢰도 및 수명을 향상시킬 수 있다. 본 발명의 구체적인 구현예를 하기의 실시예에서 보다 상세하게 설명한다. 단, 하기의 실시.예는 발명의 구체적인 구현예를 예시하는 것일 뿐, 본 발명의 내용이 하기의 실시예에 의하여 한정되는 것은 아니다. 실시예 1 By using a dicing die-bonding film including the dicing film, it is possible to minimize the burr phenomenon that may occur during the dicing process of the semiconductor wafer to prevent contamination of the semiconductor chip and improve the reliability and life of the semiconductor chip. Can be. Specific embodiments of the present invention are described in more detail in the following examples. However, the embodiments described below. The examples are only illustrative of specific embodiments of the invention, but the content of the present invention is not limited by the following examples. Example 1

광경화형 점착 바인더 수지 100 중량부 대비 이소시아네이트계 경화제 (다관능 이소시아네이트 올리고머) 2 중량부, BYK-Si lc lean 3700 (BYK 사) 0.2 중량부, 및 광개시제로서 다로커 TP0 1 증량부를 UV 경화형 점착 조성물을 제조하였다. 상기 광경화형 점착 바인더 수지로는 아크릴계 베이스 수지의 주쇄에 아크릴레이트 작용기를 측쇄로 20 wt% 부가한 고분자 수지 (Mw 300 , 000)를 사용하였다.  2 parts by weight of isocyanate-based curing agent (polyfunctional isocyanate oligomer), 0.2 parts by weight of BYK-Si lean 3700 (BYK), and 1 part by weight of the photo-curable adhesive binder resin, the photocuring agent, and the increased amount of the photopolymerizable binder resin are UV curable adhesive compositions. Prepared. As the photocurable adhesive binder resin, a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.

상기 UV 경화형 점착 조성물을 lOOum의 폴리을레핀 필름의 한쪽 면에 코팅하고 건조하여 lOum의 점착층이 포함된 다이싱 필름을 제조하였다. 실시예 2 광경화형 점착 바인더 수지 100 중량부 대비 이소시아네이트계 경화제 (다관능 이소시아네이트 올리고머) 2 중량부, BYK-Si lc lean 394 (BYK 사) 0.2 중량부, 및 광개시제로서 다로커 TP0 1 중량부를 UV 경화형 점착 조성물을 제조하였다. 상기 광경화형 점착 바인더 수지로는 아크릴계 베이스 수지의 주쇄에 아크월레이트 작용기를 측쇄로 20 wt% 부가한 고분자 수지 (Mw 300 , 000)를 사용하였다. The UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 μm and dried to prepare a dicing film including an adhesive layer of 100 μm. Example 2 2 parts by weight of an isocyanate-based curing agent (polyfunctional isocyanate oligomer), 0.2 parts by weight of BYK-Si lean 394 (by KK), and 1 part by weight of the polylocker TP0 as a photoinitiator with respect to 100 parts by weight of the photocurable adhesive binder resin. Prepared. As the photocurable adhesive binder resin, a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.

상기 UV 경화형 점착 조성물을 lOOum의 폴리올레핀 필름의 한쪽 면에 코팅하고 건조하여 lOum의 점착층이 포함된 다이싱 필름을 제조하였다. 비교예 1  The UV-curable adhesive composition was coated on one side of a polyolefin film of 100 μm and dried to prepare a dicing film including an adhesive layer of 100 μm. Comparative Example 1

광경화형 점착 바인더 수지 100 중량부 대비 이소시아네이트계 경화제 (다관능 이소시아네이트 올리고머) 2 중량부 및 광개시제로서 다로커 TP0 1 증량부를 흔합하여 uv 경화형 점착 조성물을 제조하였다. 상기 광경화형 점착 바인더 수지로는 아크릴계 베이스 수지의 주쇄에 아크릴레이트 작용기를 측쇄로 20 wt 부가한 고분자 수지 (Mw 300 , 000)를 사용하였다.  The UV curable adhesive composition was prepared by mixing 2 parts by weight of an isocyanate-based curing agent (polyfunctional isocyanate oligomer) with respect to 100 parts by weight of the photocurable pressure-sensitive adhesive binder resin and 1 part by weight of the multilocker TP0 as a photoinitiator. As the photocurable adhesive binder resin, a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.

상기 UV 경화형 점착 조성물을 lOOum의 폴리을레핀 필름의 한쪽 면에 코팅하고 건조하여 lOuni의 점착층이 포함된 다이싱 필름을 제조하였다. 비교예 2  The UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 μm and dried to prepare a dicing film including an adhesive layer of 100 μl. Comparative Example 2

광경화형 점착 바인더 수지 100 중량부 대비 이소시아네이트계 경화제 (다관능 이소시아네이트 올리고머) 2 중량부, BYK-Si l clean 3700 (BYK 사) 5 중량부, 및 광개시제로서 다로커 TP0 1 중량부를 UV 경화형 점착 조성물을 제조하였다. 상기 광경화형 점착 바인더 수지로는 아크릴계 베이스 수지의 주쇄에 아크릴레이트 작용기를 측쇄로 20 wt% 부가한 고분자 수지 (Mw 300 , 000)를 사용하였다.  2 parts by weight of an isocyanate-based curing agent (polyfunctional isocyanate oligomer), 5 parts by weight of BYK-Sil clean 3700 (BYK), and 1 part by weight of the Darocer TP0 as a photoinitiator, based on 100 parts by weight of the photocurable adhesive binder resin. Prepared. As the photocurable adhesive binder resin, a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.

상기 UV 경화형 점착 조성물을 lOOum의 폴리을레핀 필름의 한쪽 면에 코팅하고 건조하여 lOum의 점착층이 포함된 다이싱 필름을 제조하였다. 비교예 3  The UV-curable pressure-sensitive adhesive composition was coated on one side of a polyolefin film of 100 μm and dried to prepare a dicing film including an adhesive layer of 100 μm. Comparative Example 3

광경화형 점착 바인더 수지 100 중량부 대비 이소시아네이트계 경화제 (다관능 이소시아네이트 올리고머) 2 중량부, 실리콘 화합물 오일 L一 7500 (Si l wet 사) 0 . 5중량부 및 광개시제로서 다로커 TPO 1 중량부를 UV 경화형 점착 조성물을 제조하였다. 상기 광경화형 점착 바인더 수지로는 아크릴계 베이스 수지의 주쇄에 아크릴레이트 작용기를 측쇄로 20 wt% 부가한 고분자 수지 (Mw 300 , 000)를 사용하였다. Isocyanate based on 100 parts by weight of photocurable adhesive binder resin 2 parts by weight of a curing agent (polyfunctional isocyanate oligomer), silicone compound oil L one 7500 (Si wet). A UV curable pressure-sensitive adhesive composition was prepared by 5 parts by weight and 1 part by weight of the darocalor TPO as a photoinitiator. As the photocurable adhesive binder resin, a polymer resin (Mw 300, 000) in which 20 wt% of an acrylate functional group was added to the main chain of the acrylic base resin as a side chain was used.

상기 UV 경화형 점착 조성물을 lOOum의 폴리올레핀 필름의 한쪽 면에 코팅하고 건조하여 lOum의 점착층이 포함된 다이싱 필름을 제조하였다. 시험예  The UV-curable adhesive composition was coated on one side of a polyolefin film of 100 μm and dried to prepare a dicing film including an adhesive layer of 100 μm. Test Example

상기 실시예 1 내지 2 및 비교예 1 내지 3에 따라 제조된 다이싱 필름의 박리력, 택 시험, 및 픽업 성공율을 하기와 같이 측정하고 결과를 하기 표 및 The peeling force, tack test, and pick-up success rate of the dicing films prepared according to Examples 1 to 2 and Comparative Examples 1 to 3 were measured as follows, and the results are shown in the following table and

2에 나타내었다. 2 is shown.

1. 다이본딩 필름 /다이싱 필름 간의 180도 박리력 측정 (UV경화 전후) 다이본딩 필름과 PSA 층 사이의 박리력 측정을 위해, 접착 필름을 상은에서 다이싱 필름과 합지한 후 1시간 동안 방치하고, 이 후 폭 25mm의 샘플을 제작하여 300瞧 /min의 속도로 180도 필 강도를 측정하고, 추가로 UV 조사 후의 값도 측정하였다. 상기 측정은 하나의 샘플 당 3회 이상 수행하여 그 평균값을 기재하였다. 1. Determination of 180 degree peeling force between die-bonding film / dicing film (before and after UV curing) For measuring peeling force between the die-bonding film and the PSA layer, the adhesive film was laminated with a dicing film in silver and left for 1 hour. After that, a sample having a width of 25 mm was produced, and the peel strength was measured at 180 degrees at a speed of 300 kW / min, and the value after UV irradiation was further measured. The measurement was performed three or more times per sample to describe the average value.

2. SUS/다이싱 필름 간의 90도 박리력 측정 (UV 경화 전) 2. Measurement of 90 degree peel force between SUS and dicing film (before UV curing)

25mm 폭의 다이싱 필름을 준비하여, SUS 304를 피착체로 하여 부착시켰다. 부착 후 1시간 경화 후에 300隱 /min의 속도로 90도 필 강도를 측정하였다. 상기 측정은 하나의 샘플 당 3회 이상 수행하여 그 평균값을 기재하였다.  A dimming film of 25 mm width was prepared, and SUS 304 was made to adhere and adhered. After hardening for 1 hour after adhesion, the 90 degree peeling strength was measured at the speed of 300 kPa / min. The measurement was performed three or more times per sample to describe the average value.

3. 택 시험 (UV경화 전후) 3. Tack test (before and after UV curing)

플레이트 위에 다이싱 필름의 점착층이 위를 향하게 올려 놓고, 직경 Place the adhesive layer of the dicing film on the plate facing up, the diameter

1인치의 볼 타입 브로브 (probe)를 사용하여 택 강도를 측정하였다. 이 때 프로브에 인가되는 힘은 800gf , 접촉 시간은 0.01초, 프로브를 떼어내는 측정 속도는 1醒 /s였으며, 측정에 사용된 기기는 Texture Ana lyzer 였다. 4. 픽업 성공율 측정 Tack strength was measured using a 1 inch ball type probe. At this time, the force applied to the probe was 800gf, the contact time was 0.01 seconds, the measurement speed of detaching the probe was 1 醒 / s, and the instrument used for the measurement was a texture analyzer. 4. Pickup success rate

상기 실시예들 및 비교예들에 따라 제조된 다이싱 필름으로부터 제조된 다이싱 다이본딩 필름 및 웨이퍼를 7C C 조건에서 라미네이션 시켰다. 이어서 다이싱 장비 (NEON 사 제조)를 사용하여 하기 조건으로 다이싱 공정을 수행한 수, 다이싱 필름 면에 하기 조건으로 자외선 조사를 행하였다. 그 후, 각 칩을 다이본더 (Shinkawa 사)로 200개 픽업하여 픽업.이 되지 않은 개수를 측정하여 퍼센트로 표기하였다. [다이.싱 조건]  Dicing die-bonding films and wafers prepared from dicing films prepared according to the examples and comparative examples were laminated at 7C C conditions. Subsequently, ultraviolet irradiation was performed on the number and the dicing film surface which carried out the dicing process on the following conditions using the dicing equipment (made by NEON company) on the following conditions. Thereafter, 200 chips were picked up by a die bonder (Shinkawa Co., Ltd.), and the number of chips not picked up was measured and expressed in percentage. [Dicing Condition]

블레이드 : 27HEDD  Blade : 27HEDD

블레이드 회전 속도 : 40 , 000rpm  Blade rotation speed : 40, 000rpm

속도 : 30mm/ s  Speed : 30mm / s

¾ 사이즈 : 10瞧 X 10隱  ¾ size : 10 瞧 X 10 隱

cut depth : 70um  cut depth : 70um

[자외선 조사 조건] [UV irradiation condition]

램프 : metal ha 1 i de type  Lamp : metal ha 1 i de type

조도 : 70mW/cni2 (조도 측정 : UV meter ) Illuminance : 70mW / cni 2 (Illuminance measurement: UV meter)

조사량 : 200mJ/cm2 이상 (조사량 측정 : UV meter ) Irradiation amount : 200mJ / cm 2 or more (Radiation dose measurement: UV meter)

[픽업조건] [Pickup condition]

익스팬딩 : ½ηι  Expanding : ½ηι

핀 높이 : 0. 15mm  Fin height : 0.1mm

픽업 강도 : lOOgf  Pickup strength : lOOgf

5. 다이쉐어 강도 (Die Shear Strength) 5. Die Shear Strength

이산화막으로 코팅된 두께 500um 웨이퍼를 사용하여 5隱 5mm 크기로 자른 후, 다이싱 다이본딩 필름과.함께 60°C 조건에서 라미네이션 하고, UV를 조사하여 다이싱 필름을 제거한 후 칩 크기의 접착필름만 남기고 절단하였다. 10讓 x 10mm 크기의 하부칩에 5瞧 x 5mm 크기의 상부칩을 올려 놓은 후, 130°C의 핫플레이트 위에서 2kgf의 힘으로 2초 동안 눌러서 붙인 후 125°C에서 1시간 동안 경화하였다. 상기와 같이 제작된 시험편을 175°C에서 2시간 동안 경화 후 250도에서 상부칩의 다이쉐어 강도를 측정하였다. After cutting to 5 隱 5mm using 500um thick wafer coated with dioxide, and dicing die-bonding film, lamination at 60 ° C condition, and removing the dicing film by irradiation with UV, chip size adhesive film Cut only leaving. The top chip of 5 크기 x 5mm size was placed on the bottom chip of 10 讓 × 10mm size, pressed for 2 seconds with a force of 2kgf on a hot plate of 130 ° C, and then cured at 125 ° C for 1 hour. After the test specimen prepared as described above was cured at 175 ° C for 2 hours, the die share strength of the upper chip was measured at 250 degrees.

【표 1】 Table 1

Figure imgf000019_0001
Figure imgf000019_0001

【표. 2】 【table. 2】

Figure imgf000019_0002
상기 표 1 및 표 2에 나타난 바와 같이, 상기 실시예 1 내지 2에서 제조된 다이성 필름은 비교예 1 에서 제조된 다이싱 필름에 비하여 UV 조사 전 후에 180도 박리력 및 택 강도가 상대적으로 낮고 SUS 박리력 또한 상대적으로 낮으며 높은 픽업 성공율을 나타낸다는 점이 확인되었다.
Figure imgf000019_0002
As shown in Table 1 and Table 2, the dichroic film prepared in Examples 1 to 2 has a relatively low 180-degree peeling force and tack strength before and after UV irradiation as compared to the dicing film prepared in Comparative Example 1 It was also confirmed that the SUS peeling force was also relatively low, indicating a high pickup success rate.

아울러, 상기 실시예 1 내지 2에서 제조된 다이싱 필름은 비교예 2 내지 3에서 제조된 다이싱 필름에 비하여 상대적으로 높은 다이 쉐어 강도를 나타내어 접착력 저하로 인한 박리 현상을 방지할 수 있고 이에 따라 리플로우 크랙을 억제할 수 있으며 반도체 제조 과정의 신뢰성을 향상시킬 수 있다는 점이 확인되었다.  In addition, the dicing film prepared in Examples 1 to 2 exhibits a relatively high die share strength compared to the dicing films prepared in Comparative Examples 2 to 3 can prevent the peeling phenomenon due to the adhesive force decrease and thus ripple It has been found that low cracks can be suppressed and the reliability of the semiconductor manufacturing process can be improved.

Claims

【특허청구범위】 【Patent Claims】 【청구항 1】 【Claim 1】 (메타)C H아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자, 불소를 (Meta)C H Polymer containing acrylate functional group and non-polar functional group, fluorine 2 2 1이상 포함하는 o R c C—— I—— (메타)아크릴레이트계 고분자 및 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 첨가제 ; A polymer additive containing one or more types of polymers selected from the group consisting of o R c C—— I—— (meth)acrylate-based polymers containing at least 1 and silicone-modified (meth)acrylate-based polymers containing semi-male functional groups. ; 점착 바인더 ; 및 Adhesive binder; and 광개시제;를 포함하고, Contains a photoinitiator; 상기 점착 바인더 대비 상기 고분자 첨가제의 중량비가 0.01% 내지 4.5%인, 다이싱 필름 점착층 형성용 조성물. A composition for forming a dicing film adhesive layer, wherein the weight ratio of the polymer additive to the adhesive binder is 0.01% to 4.5%. 【청구항 2】 【Claim 2】 제 1항에 있어서, In clause 1, 상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자는 하기 화학식 1의 반복 단위를 포함하는, 다이싱 필름 점착층 형성용 조성물: A composition for forming a dicing film adhesive layer, wherein the polymer containing the (meth)acrylate-based functional group and the non-polar functional group includes a repeating unit of the following formula (1): [화학식 1] [Formula 1] =0 =0 2 n 2n ᄉ기 화학식 1에서, 은 수소, 탄소수 1 내지 20의 알킬기이고, In group L Formula 1, is hydrogen, an alkyl group having 1 to 20 carbon atoms, R2는 수소, 탄소수 1 내지 20의 알킬기, . 폴리에스테르기 또는 폴리에테르기이며, n은 1 내지 300의 정수이다. R 2 is hydrogen, an alkyl group having 1 to 20 carbon atoms, . It is a polyester group or a polyether group, and n is an integer from 1 to 300. 【청구항 3] [Claim 3] 제 1항에 있어서, In clause 1, 상기 불소를 1이상 포함하는 (메타)아크릴레이트계 고분자는 탄소수 1 내지 10의 퍼플루오로알킬기 또는 탄소수 1 내지 10의 불소화 알케닐기가 치환된 (메타)아크릴레이트계 고분자를 포함하는, 다이싱 필름 점착층 형성용 조성물. The (meth)acrylate-based polymer containing at least one fluorine is substituted with a perfluoroalkyl group having 1 to 10 carbon atoms or a fluorinated alkenyl group having 1 to 10 carbon atoms. A composition for forming a dicing film adhesive layer containing a (meth)acrylate-based polymer. 【청구항 4】 【Claim 4】 제 1항에 있어서, In clause 1, 상기 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자는 히드록시기, 탄소수 1내지 10의 알킬렌 알코올, 에폭시, 아미노기 티올기 또는 카르복실기로 이루어진 군에서 선택된 1종 이상의 반웅성 작용기가 1이상 치환된 실리콘 변성 (메타)아크릴레이트계 고분자를 포함하는, 다이싱 필름 점착층 형성용 조성물ᅳ The silicone-modified (meth)acrylate-based polymer containing the semi-male functional group is substituted with at least one semi-male functional group selected from the group consisting of a hydroxy group, an alkylene alcohol having 1 to 10 carbon atoms, an epoxy group, an amino group, a thiol group, or a carboxyl group. Composition for forming a dicing film adhesive layer containing a silicon-modified (meth)acrylate-based polymer. 【청구항 5】 【Claim 5】 게 1항에 있어서, In paragraph 1, 상기 고분자 첨가제는 알코올류, 에테르류, 아세테이트류 및 케톤류로 이루어진 군에서 선택된 1종 이상의 유기 용매를 더 포함하는, 다이싱 필름 점착층 형성용 조성물. The composition for forming a dicing film adhesive layer, wherein the polymer additive further includes at least one organic solvent selected from the group consisting of alcohols, ethers, acetates, and ketones. 【청구항 6】 【Claim 6】 . 제 5항에 있어서, . In clause 5, 상기 (메타)아크릴레이트계 작용기 및 비극성 작용기를 포함한 고분자 및 상기 반웅성 작용기를 포함하는 실리콘 변성 (메타)아크릴레이트계 고분자 각각이 1 증량 % 내지 50중량 %의 유기 용액 기준으로 10 nig KOH/g 내지 50 nig KOH/g의 산가를 갖는, 다이싱 필름 점착충 형성용 조성물. Each of the polymer containing the (meth)acrylate functional group and the non-polar functional group and the silicone-modified (meth)acrylate polymer containing the semi-male functional group is 10 nig KOH/g based on an organic solution of 1% to 50% by weight. A composition for forming a dicing film adhesive having an acid value of from 50 nig KOH/g. 【청구항 7】 【Claim 7】 제 1항에 있어서, In clause 1, 상기 점착 바인더는 하이드록시기, 이소시아네이트기, 비닐기 및 The adhesive binder includes a hydroxy group, an isocyanate group, a vinyl group, and (메타)아크릴레이트기로 이루어진 군에서 선택된 1종 이상의 작용기가 1 이상 치환 또는 비치환된 (메타)아크릴레이트계 중합체 또는 (메타)아크릴레이트계 공중합체를 포함하는, Containing a (meth)acrylate-based polymer or (meth)acrylate-based copolymer in which one or more functional groups selected from the group consisting of (meth)acrylate groups are substituted or unsubstituted, 다이싱 필름 점착층 형성용 조성물. Composition for forming a dicing film adhesive layer. 【청구항 8】 【Claim 8】 제 1항에 있어서, According to clause 1, 상기 점착 바인더는 (메타)아크릴레이트 수지의 측쇄에 탄소 -탄소 이중결합을 가지는 아크릴레이트를 부가시킨 내재형 '점착 바인더를 포함하는, 다이싱 필름 점착층 형성용 조성물. The adhesive binder is a composition for forming an adhesive layer on a dicing film, comprising an intrinsic adhesive binder in which an acrylate having a carbon-carbon double bond is added to the side chain of a (meth)acrylate resin. 【청구항 9】 【Claim 9】 제 1항에 있어서, In clause 1, 상기 점착 바인더는 100 , 000 내지 1, 500 , 000의 중량평균분자량을 갖는 고분자 수지를 포함하는, 다이싱 필름 점착층 형성용 조성물. The adhesive binder is a composition for forming a dicing film adhesive layer, comprising a polymer resin having a weight average molecular weight of 100,000 to 1,500,000. 【청구항 10】 【Claim 10】 게 1항에 있어서, In paragraph 1, 상기 광개시제는 벤조인과 그 알킬에테르류, 아세토페논류, 안트라퀴논류, 티오크산톤류, 케탈류, 벤조페논류, α—아미노아세토페논류, 아실포스핀옥사이드류 및 옥심에스테르류로 이루어진 군에서 선택된 1종 이상을 포함하는, 다이싱 필름 점착층 형성용 조성물. The photoinitiator is a group consisting of benzoin and its alkyl ethers, acetophenones, anthraquinones, thioxanthone, ketal, benzophenone, α-aminoacetophenone, acylphosphine oxide, and oxime ester. A composition for forming a dicing film adhesive layer, comprising at least one selected from . 【청구항 11】 【Claim 11】 제 1항에 있어서, In clause 1, 상기 점착 바인더 100 중량부 대비 상기 광개시제 0.01 내지 8 중량부를 포함하는, 다이싱 필름 점착층 형성용 조성물. A composition for forming a dicing film adhesive layer, comprising 0.01 to 8 parts by weight of the photoinitiator relative to 100 parts by weight of the adhesive binder. 【청구항 12】 【Claim 12】 거 U항에 있어서, In clause U, 경화제를 더 포함하는, 다이싱 필름 점착층 형성용 조성물. A composition for forming a dicing film adhesive layer, further comprising a curing agent. 【청구항 13】 【Claim 13】 제 12항에 있어서 상기 경화제는 이소시아네이트계 화합물, 아지리딘계 화합물, 에폭시계 화합물 및 금속 킬레이트계 화합물로 이루어진 군에서 선택된 1종 이상을 포함하는, 다이싱 필름 점착층 형성용 조성물. In clause 12 The composition for forming a dicing film adhesive layer, wherein the curing agent includes at least one selected from the group consisting of isocyanate-based compounds, aziridine-based compounds, epoxy-based compounds, and metal chelate-based compounds. 【청구항 14】 【Claim 14】 제 12항에 있어서, In clause 12, 상기 점착 바인더 100 중량부 대비 상기 경화제 0. 1 내지 30중량부를 포함하는, 다이싱 필름 점착층 형성용 조성물. A composition for forming a dicing film adhesive layer, comprising 0.1 to 30 parts by weight of the curing agent relative to 100 parts by weight of the adhesive binder. 【청구항 15】 【Claim 15】 기재 필름과 상기 기재 필름의 적어도 일면 상에 형성된 점착층을 포함하고, It includes a base film and an adhesive layer formed on at least one side of the base film, 상기 점착층은 제 1항의 다이성 필름 점착층 형성용 조성물을 포함하는, 다이싱 필름. , The adhesive layer is a dicing film comprising the composition for forming a die-type film adhesive layer of claim 1. , , , 【청구항 16】 【Claim 16】 제 15항에 있어서, In clause 15, 상기 기재 필름의 두께는 10 mi 내지 200 iM 이고, The thickness of the base film is 10 mi to 200 iM, 상기 점착층의 두께는 0.5 卿 내지 50 인, 다이싱 필름. The thickness of the adhesive layer is 0.5 to 50, dicing film. ' ' 【청구항 17】 【Claim 17】 제 15항의 다이싱 필름; 및 상기 다이싱 필름의 적어도 일면에 형성된 접착충을 포함하는, 다이싱 다이본딩 필름. 【청구항 18】 The dicing film of claim 15; And a dicing die-bonding film comprising an adhesive formed on at least one side of the dicing film. 【Claim 18】 제 17항의 다이싱 다이본딩 필름; 및 상기 다이싱 다이본딩 필름의 적어도 일면에 적층된 웨이퍼;를 포함하는 반도체 웨이퍼를 완전 분단 또는 분단 가능하게 부분 처리하는 전처리 단계; The dicing die bonding film of claim 17; and a wafer laminated on at least one side of the dicing die-bonding film; a pretreatment step of completely dividing or partially processing a semiconductor wafer to enable division; 상기 전처리 단계 이후 반도체 웨이퍼를 익스팬딩 하는 단계; 및 Expanding the semiconductor wafer after the preprocessing step; and 상기 익스펜딩한 반도체 웨이퍼의 기재 필름에 자외선을 조사하고, 상기 반도체 웨이퍼의 분단에 의해 분리된 개별 칩들을 픽업하는 단계를 포함하는, 반도체 웨이퍼의 다이싱 방법 . UV rays are irradiated on the base film of the expanded semiconductor wafer, and A dicing method of a semiconductor wafer, including the step of picking up individual chips separated by dividing the semiconductor wafer.
PCT/KR2014/012284 2013-12-19 2014-12-12 Composition for forming dicing film adhesive layer, and dicing film Ceased WO2015093794A1 (en)

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