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WO2015079652A1 - Corps d'affichage et son procédé de fabrication - Google Patents

Corps d'affichage et son procédé de fabrication Download PDF

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Publication number
WO2015079652A1
WO2015079652A1 PCT/JP2014/005787 JP2014005787W WO2015079652A1 WO 2015079652 A1 WO2015079652 A1 WO 2015079652A1 JP 2014005787 W JP2014005787 W JP 2014005787W WO 2015079652 A1 WO2015079652 A1 WO 2015079652A1
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Prior art keywords
layer
convex
wavelength
concavo
light
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English (en)
Japanese (ja)
Inventor
雅史 川下
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Toppan Inc
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Toppan Printing Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/418—Refractive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays

Definitions

  • the present invention relates to a display body whose color tone changes according to a change in observation angle using structural coloring, and a manufacturing method thereof.
  • the structural coloration typified by Morpho butterfly scales and iridescent epidermis is not the coloration associated with the energy transition of the electronic state of molecules such as dyes and pigments, but the coloration caused by the action of optical phenomena such as light diffraction, interference, and scattering. It is a phenomenon.
  • Multilayer film interference occurs when reflected light generated at each interface of the laminate interferes with each other, and an optical path difference caused by each layer is an important factor.
  • This optical path difference depends on the refractive index of the constituent material in addition to the physical film thickness of each layer, and also changes depending on the incident angle. Therefore, the structural color development due to multilayer film interference is characterized in that the color tone of the reflected light changes depending on the incident angle of light.
  • JP 2013-122567 A Japanese Patent No. 4228058
  • the color tone of the reflected light by the multilayer laminate as described above is basically determined by the material constituting each layer of the laminate and the physical film thickness, and the color tone change due to the change in observation angle is monotonous. End up.
  • the color tone change of reflected light due to the change in observation angle is moderated.
  • the main effect is to increase the reflectance at a specific angle, and when the structure of the multi-layer laminate is the same, it is difficult to express various color tone changes.
  • the present invention has been made to solve such problems, and has a simple design and a display body having a high design property such that a change in color tone of reflected light due to a change in observation angle varies depending on a pixel region.
  • An object of the present invention is to provide a manufacturing method thereof.
  • One aspect of the present invention is a display body including a base material, a multilayer laminate formed on the surface of the base material, and a fine uneven layer formed on the surface of the multilayer laminate, wherein the multilayer laminate is a laminate of two or more layers. And at least the multilayer laminate and the fine concavo-convex layer are transparent to light of a predetermined wavelength region, and each layer constituting the multilayer laminate is adjacent to the adjacent layer within the predetermined wavelength region. It is composed of materials that have different refractive indices with respect to light of the wavelength, and each layer that constitutes the multilayer laminate and the material that constitutes the fine concavo-convex layer is an optical represented by the product of the respective refractive index and physical film thickness.
  • the film thickness is less than 7/4 times the shortest wavelength in the predetermined wavelength region, and the fine concavo-convex layer has a height difference below the physical film thickness by partially reducing the physical film thickness of the fine concavo-convex layer.
  • It is a display body in which a concavo-convex structure including a convex portion and a concave portion is formed.
  • a one-dimensional diffractive structure composed of a linear concavo-convex structure with a constant period or a two-dimensional diffractive structure composed of a lattice-shaped concavo-convex structure with a constant period may be formed on the surface of the fine concavo-convex layer.
  • the refractive index for light having a wavelength within the wavelength region of the material constituting the fine uneven layer is larger than the refractive index for light having the wavelength of the material constituting the uppermost layer of the multilayer laminate.
  • the uppermost layer of the multilayer laminate and the fine concavo-convex layer is made of a material having a refractive index larger than that of the material constituting the fine concavo-convex layer, with a physical film thickness and refractive index.
  • the optical film thickness which is the product of the above, has a waveguiding layer that is less than 7/4 times the shortest wavelength in the wavelength region. It may be equal to the film thickness.
  • the wavelength region is a visible light wavelength region, and a plurality of pixel regions arranged on a matrix having at least one side of 10 ⁇ m or more are formed on the surface of the fine concavo-convex layer, and each pixel region has a structural period of 200 nm or more and A first one-dimensional diffractive structure having a linear concavo-convex structure of 800 nm or less, in which the linear concavo-convex structure is arranged in a first direction, and a linear concavo-convex structure having a structure period of 200 nm or more and 800 nm or less.
  • a second one-dimensional diffractive structure in which linear concavo-convex structures are arranged in a second direction different from the first direction, and a lattice-like concavo-convex structure having a structural period of 200 nm or more and 800 nm or less, At least one of the two-dimensional diffractive structures may be formed by arranging the lattice-shaped concavo-convex structure in the first direction and the second direction.
  • each layer of the multilayer laminate, and the fine uneven layer are preferably made of a material having an extinction coefficient of 0.1 or less with respect to light in the visible light wavelength region.
  • each layer of the multilayer laminate, the fine uneven layer, and the waveguide layer are made of a material having a refractive index with respect to light having a wavelength in the visible light wavelength region of 1.3 or more and 2.6 or less.
  • the refractive index difference between adjacent layers is preferably at least 0.05.
  • Another aspect of the present invention is a step of forming a multilayer laminate having transparency to visible light wavelength region light on the substrate surface and different refractive indexes in adjacent layers by sequentially laminating each layer. And a step of applying a photocurable resin to the surface of the multilayer laminate, and a step of forming a desired uneven shape on the photocurable resin by an optical nanoimprint method.
  • the refractive index of the light curable resin with respect to light having a wavelength in the visible light wavelength region is larger than the refractive index with respect to the visible light wavelength region of the material constituting the surface of the multilayer laminate.
  • the manufacturing method of the display body includes a step of preparing a base material, and a laminate that has transparency to light having a wavelength in the visible light region on the surface of the base material and has a different refractive index in each adjacent layer.
  • the manufacturing method of the display body includes a step of preparing a base material, and a laminate that has transparency to light having a wavelength in the visible light region on the surface of the base material and has a different refractive index in each adjacent layer. Including a step of sequentially laminating and forming each layer, a step of applying a thermoplastic resin layer to the surface of the uppermost layer of the multilayer laminate, and a step of forming a desired uneven shape on the thermoplastic resin layer by a thermal nanoimprint method. Good.
  • the refractive index of the thermoplastic resin layer with respect to light having a wavelength in the visible light region is larger than the refractive index with respect to light having a wavelength of the material constituting the outermost surface of the multilayer laminate.
  • the method of manufacturing the display body includes a step of preparing a base material, and a laminated body that is transparent to light having a wavelength in the visible light wavelength region on the surface of the base material and has a different refractive index in each adjacent layer. Are formed by sequentially laminating each layer, a step of forming a waveguiding layer on the surface of the multilayer laminate, and a wavelength within the visible light wavelength region than the material constituting the waveguiding layer on the surface of the waveguiding layer.
  • a fine concavo-convex layer having a region in which a one-dimensional or two-dimensional diffractive structure is formed is provided on the surface of a multilayer laminate that is structurally colored by multilayer film interference, and the fine concavo-convex layer further relates to multilayer film interference.
  • the film thickness was designed to be As a result, it is possible to obtain a display body in which reflected light exhibits a unique color tone change due to a change in observation angle using multilayer film interference and diffraction phenomenon, thereby improving the design of the design displayed by the display body. An effect is obtained.
  • the effect of guided mode resonance can be given by designing the structure of the display body optimally. For this reason, it becomes possible to produce the effect of further improving the design of the display object.
  • FIG. 1 is a schematic view of a cross section of a display body according to a first embodiment of the present invention.
  • FIG. 2 is a schematic view of a cross section of a display body according to the second embodiment of the present invention.
  • FIG. 3 is a schematic view of a cross section of a display body according to the third embodiment of the present invention.
  • the wavelength region of light is not particularly limited.
  • the light wavelength region is observed in the visible light wavelength region, or by an ultraviolet camera or an infrared camera.
  • the wavelength region can be limited to the corresponding ultraviolet region or infrared region.
  • a display body that can be visually observed by a person will be described.
  • FIG. 1 is a schematic view of a cross-section of a display body 1 according to a first embodiment of the present invention.
  • a multilayer laminate 21 is formed on a base material 11, and on the multilayer laminate 21, A fine uneven layer 31 is formed.
  • the material of the base material 11 is not particularly limited. However, in order to perform color expression only by structural color development due to multilayer film interference, a material having high transparency in the visible light wavelength region is preferable. Examples thereof include synthetic quartz glass and polyethylene terephthalate. In the first embodiment, the base material 11 is a synthetic quartz glass substrate.
  • the multilayer laminate 21 is formed by laminating materials having different refractive indexes. As a material for forming each layer, the display body 1 needs to be transmissive to light in a wavelength region for displaying a design.
  • a material having high transparency with respect to the visible light wavelength region for example, TiO 2 , Nb 2 O 5 , Ta 2 O 5 , Al 2 O 3 , SiO 2 , Fe 2 O 3 , HfO 2 , MgO, ZrO , SnO 2, Sb 2 O 3 , CeO 3, WO 3, PbO, In 2 O 3, CdO, BaTiO 3, ITO, LiF, BaF 2, CaF 2, MgF 2, AlF 3, CeF 3, ZnS, PbCl 2
  • An inorganic dielectric material such as an organic resin material such as an acrylic resin, a phenol resin, or an epoxy resin can be used.
  • the multilayer laminate 21 is a laminate of TiO 2 and SiO 2 .
  • TiO 2 is formed on the surface of the base material 11 made of synthetic quartz glass.
  • a film forming method for example, a known method such as a vacuum evaporation method, sputtering, or an atomic layer deposition method can be used.
  • SiO 2 is formed on the surface of the formed TiO 2 film.
  • a film forming method for example, a known method such as a vacuum evaporation method, sputtering, or an atomic layer deposition method can be used.
  • the number of layers to be stacked and the physical film thickness of each layer need to be designed so as to obtain a desired reflected light spectrum.
  • a known coating method such as a spin coating method may be used.
  • the physical film thickness it is necessary to design the film thickness within an appropriate range in order to obtain a display body that effectively uses multilayer film interference.
  • Light having a wavelength ⁇ satisfying ⁇ ⁇ / n is strengthened.
  • the physical film thickness of the thin film increases, there are many combinations of m and ⁇ that satisfy the equation, and a plurality of wavelengths in the visible light wavelength region are strengthened, so that color recognition may become unclear.
  • the optical film thickness represented by the product of the refractive index n and the physical film thickness d of each layer of the laminate that structurally develops color by multilayer interference is the target wavelength region. It is preferably designed to be less than 7/4 times the shortest wavelength. Furthermore, in order to recognize a color clearly, it is more preferable that it is less than 5/4 times.
  • the upper limit value of the optical film thickness of each layer forming the multilayer laminate 21 is visible light because it is for the visible light wavelength region.
  • the film thickness of TiO 2 is 160 nm, and the film thickness of SiO 2 is 275 nm. Further, the number of layers to be laminated is 5 layers of TiO 2 and 4 layers of SiO 2 . Therefore, the uppermost layer of the multilayer laminate 21 is TiO 2 .
  • the term “film thickness” simply means a physical film thickness.
  • the fine uneven layer 31 is formed on the multilayer laminate 21.
  • the fine concavo-convex layer 31 also needs to be made of a material that is transparent to the target wavelength region, like the multilayer laminate 21.
  • the optical film thickness which is the product of the refractive index and the physical film thickness, of the fine uneven layer 31 less than 7/4 times the shortest wavelength in the visible light wavelength region in the same manner as each layer of the multilayer laminate 21, Structural coloration by multilayer film interference including the concavo-convex layer 31 can be realized, and a display body with high design can be obtained.
  • the refractive index of the material constituting the fine uneven layer 31 may be larger than the refractive index of the material constituting the uppermost layer of the multilayer laminate 21.
  • the multilayer laminate 21 and the fine uneven layer 31 are preferably made of a material having an extinction coefficient of 0.1 or less with respect to visible light, for example.
  • the concavo-convex structure formed on the fine concavo-convex layer 31 is formed by partially reducing the physical film thickness of the fine concavo-convex layer 31 to form the concavo-convex, and is dimensioned so that incident light is diffracted.
  • a one-dimensional diffractive structure composed of a linear concavo-convex structure having a constant period and a two-dimensional diffractive structure composed of a lattice-shaped concavo-convex structure having a constant period are suitable. By forming this structure, it is possible to obtain a display body 1 with higher design by utilizing the diffraction effect generated in the fine uneven layer 31.
  • the height from the concave surface to the convex surface of the concavo-convex structure is the physical film of the fine concavo-convex layer 31. Thickness (H2) or less.
  • the structural period of the diffractive structure may be a structural period that diffracts light in the target wavelength region.
  • the structural period may be, for example, 200 nm or more and 800 nm or less.
  • a plurality of pixel regions are arranged on the surface of the fine concavo-convex layer 31 and the structural period is changed for each pixel, thereby enabling image display with various color tone changes.
  • one side is arranged on a matrix of 10 ⁇ m or more in order to make a display body that can be visually confirmed by a person. Let it be a pixel area.
  • the constituent material of the fine concavo-convex layer 31 is SiO 2 and the film thickness of the fine concavo-convex layer 31 including the height of the concavo-convex structure is 300 nm.
  • the structures to be formed are a two-dimensional diffractive structure composed of a lattice-like concavo-convex structure with a structure period of 700 nm and a one-dimensional diffractive structure composed of a linear concavo-convex structure with a structure period of 350 nm, and sandwiches a region where no fine structure is formed Form in each individual area.
  • the height of the concave / convex pattern is 200 nm.
  • corrugated layer 31 is a photocurable resin or a thermoplastic resin, for example, it may be only a resin coating step and a fine structure forming step by a photo nanoimprint method or a thermal nanoimprint method.
  • corrugated layer 31 can be simplified. Moreover, the refractive index with respect to the light of the wavelength of visible light wavelength region of the photocurable resin or thermoplastic resin constituting the fine uneven layer 31 is the refractive index with respect to the visible light wavelength region of the material constituting the surface of the multilayer laminate 21. Is preferably larger.
  • a two-dimensional diffractive structure that is a lattice-shaped concavo-convex structure whose arrangement direction matches these one-dimensional diffractive structures may be formed.
  • Various patterns can be configured by appropriately forming a plurality of one-dimensional diffractive structures having different arrangement directions as described above, or two-dimensional diffractive structures arranged in two arrangement directions among them.
  • the multilayer laminated body 21 that expresses the structural color by multilayer film interference is formed on the substrate 1, and the fine uneven layer 31 is further formed, so that diffraction according to the diffraction structure formed on the fine uneven layer 31 is achieved. It is possible to obtain a display body 1 having a unique color tone change to which a phenomenon is given.
  • FIG. 2 is a schematic view of a cross section of the display body 2 according to the second embodiment of the present invention.
  • a multilayer laminate 22 is formed on the substrate 12, and the multilayer laminate 22 is A waveguide layer 42 is formed, and a fine uneven layer 32 is formed on the waveguide layer 42.
  • the guided mode resonance occurs when the light diffracted by the one-dimensional diffractive structure satisfies the phase matching condition for propagating through the waveguide layer 42, and only the wavelength satisfying the guided mode resonance condition is incident. This is an optical phenomenon that reflects to the side. However, this guided mode resonance is most efficient when light is incident vertically, and the viewing angle at which the guided mode resonance can be obtained is very narrow.
  • the material used for the waveguide layer 42 is preferably selected from materials having higher refractive indexes than the outermost surface of the adjacent multilayer stack 22 and the fine uneven layer 32.
  • the film thicknesses of the waveguide layer 42 and the fine uneven layer 32 are preferably limited to those in the first embodiment, and are designed to be optimum film thickness values that satisfy the waveguide mode resonance condition. That is, it is preferable that the optical film thickness, which is the product of the refractive index of the waveguide layer 42 and the physical film thickness, be less than 7/4 times the shortest wavelength in the visible light wavelength region.
  • the film thickness of the fine uneven layer 32 and the height of the uneven structure formed in the fine uneven layer 32 need to match. That is, it is preferable that the waveguide layer 42 is exposed in the recess.
  • Constraints on materials constituting the base material 12, the multilayer laminate 22, and the fine uneven layer 32 are the same as those in the first embodiment. Further, restrictions on the film thicknesses of the layers constituting the multilayer laminate 22 are the same as those in the first embodiment.
  • the method for forming the multilayer laminate 22 on the substrate 12 may be the same as that of the first embodiment.
  • the waveguiding layer 42 if the constituent material is an inorganic dielectric material, a known method such as a vacuum deposition method, sputtering, or an atomic layer deposition method can be used.
  • a known coating method such as a coating method can be used.
  • the method for forming the fine uneven layer 31 in the first embodiment can be applied.
  • the film thickness of the fine concavo-convex layer 32 in the second embodiment is preferably equal to the height of the concavo-convex structure formed in the fine concavo-convex layer 32, for example, when forming the structure by plasma etching, Etching is preferably performed until the surface of the adjacent waveguide layer 42 is exposed. In this case, it is preferable that the material constituting the waveguide layer 42 is resistant to plasma for etching the fine uneven layer 32.
  • the optical nanoimprint method or the thermal nanoimprint method can be more preferably used as a method for forming the fine uneven layer 32.
  • the surface of the waveguide layer 42 can be exposed in the concave portion by performing a residual film removal process using plasma.
  • the material constituting the waveguide layer 42 is resistant to the plasma from which the remaining film is removed.
  • a one-dimensional diffractive structure composed of a linear concavo-convex structure with a constant period is preferable.
  • the wavelength of reflected light due to guided mode resonance is determined by the structure period of the structure.
  • the refractive index of the material constituting the uppermost layer of the multilayer laminate 22 is about 1.45
  • the refractive index of the material constituting the waveguide layer 42 is about 2.0
  • the refractive index of the material forming the fine uneven layer 32 Is approximately 1.7 nm
  • the thickness of the waveguide layer 42 is approximately 100 nm
  • the thickness of the fine uneven layer 32 is approximately 150 nm
  • the structural period of the fine uneven layer 32 is approximately 265 nm, approximately 330 nm, and approximately 370 nm.
  • the reflected light due to the waveguide mode resonance cannot be observed if the display body is tilted more than a certain angle.
  • the periodic structure of the structure formed in the fine uneven layer 32 is less than or equal to the visible light wavelength region, structural coloration by the multilayer laminate 22, the waveguide layer 42, and the fine uneven layer 32 is observed.
  • a diffraction phenomenon due to the one-dimensional diffractive structure acts, and a unique color change different from that in the structure non-formation region is observed in the structure formation region.
  • Each layer of the multilayer laminate 22, the fine concavo-convex layer 32, and the waveguide layer 42 are made of a material having a refractive index with respect to light in the visible light wavelength region of 1.3 or more and 2.6 or less, and are adjacent to each other. It is preferable that the refractive index difference of each layer is at least 0.05 or more.
  • FIG. 3 is a schematic cross-sectional view of the display body 3 according to the third embodiment of the present invention.
  • a multilayer laminate 23 is formed on the base material 13, and a fine laminate is formed on the multilayer laminate 23.
  • An uneven layer 33 is formed.
  • guided mode resonance is used as in the second embodiment.
  • the waveguide layer 42 provided in the second embodiment is not provided, and the film thickness of the fine uneven layer 33 is set to the height of the structure formed in the fine uneven layer 33. By designing the thickness to be thick, the remaining film plays the role of the waveguide layer 42 provided in the second embodiment, and the display body 3 that can use guided mode resonance can be obtained.
  • the material constituting the fine uneven layer 33 needs to be selected from materials having a higher refractive index than the material constituting the uppermost layer of the multilayer laminate 23.
  • the film thickness of the fine concavo-convex layer 33 is further restricted than the film thickness of the fine concavo-convex layer 31 in the first embodiment, and is designed to have a film thickness and a structure height of the fine concavo-convex layer 33 satisfying the waveguide mode resonance condition. It is preferred that
  • the method for forming the fine uneven layer 31 in the first embodiment can be applied.
  • the optical nanoimprint method or the thermal nanoimprint method can be more preferably used as a method for forming the fine uneven layer 33.
  • the remaining film formed by the optical nanoimprint method or the thermal nanoimprint method can serve as the waveguide layer 42 provided in the second embodiment.
  • the structure formed in the fine uneven layer 33 is about 200 nm
  • the thickness of the fine concavo-convex layer 33 is about 300 nm
  • the fine concavo-convex layer 33 has a structural period of about 300 nm and about 350 nm
  • the value obtained by dividing the convex dimension by the structural period is 0.5.
  • Display bodies 3 each having a one-dimensional diffractive structure composed of a linear concavo-convex structure formed in each of the individual regions sandwiching the region where the fine structure is not formed were observed from the front.
  • the blue color is reflected by the guided mode resonance in the region having the structural period of about 300 nm and the green color is reflected by the guided mode resonance in the region having the structural period of about 350 nm
  • a structural color development different from the region where the fine structure is not formed is observed.
  • the display body is observed with a certain angle tilted in the arrangement direction of the linear concavo-convex structure
  • the reflected light due to the waveguide mode resonance cannot be observed if the display body is tilted more than a certain angle.
  • the periodic structures of the structures formed in the fine uneven layer 33 are all in the visible light wavelength region or less, structural coloration due to the multilayer laminate 23 and the fine uneven layer 33 is observed.
  • the display body 3 that exhibits a unique color tone change in which waveguide mode resonance and the effect of the diffraction effect are imparted to the multilayer film interference.
  • Example 1 a display body in which a fine uneven layer made of SiO 2 is formed on the surface of a multilayer laminate made of TiO 2 and SiO 2 by sputtering, charged particle beam exposure and dry etching will be described.
  • a synthetic quartz glass substrate, a synthetic quartz glass substrate and a SiO 2 of the TiO 2 and the thickness 95nm of thickness 45nm are stacked one by four layers alternately by sputtering, and finally the TiO 2 having a thickness of 45nm other Layers were formed to form a multilayer laminate.
  • SiO 2 having a thickness of 300nm was formed on the surface of the multilayer stack was deposited film thickness 50nm chrome (Cr) layer by sputtering SiO 2 layer surface.
  • Both the TiO 2 layer and the SiO 2 layer were formed by reactive sputtering using a metal target.
  • the gases used for the film formation were argon (Ar) and oxygen (O 2 ), both of which were sputtering in an oxide mode.
  • the Cr layer was sputtered with only Ar using a metal target.
  • FEP171 (made by Fuji Film Electronics Materials Co., Ltd.), which is a charged particle beam exposure resist, was applied to the Cr layer surface by 200 nm, and a pattern was drawn on the resist by a variable shaped beam type electron beam.
  • the drawn pattern is a one-dimensional diffractive structure composed of a linear concavo-convex structure having a structure period of 350 nm and a convex dimension divided by the structural period, a structure period of 700 nm, and a convex dimension of the structure period.
  • the dose of electron beam irradiation was 10 ⁇ C / cm 2, and post-exposure baking was performed for 10 minutes on a hot plate heated to 100 ° C.
  • a TMAH aqueous solution was used as a developing solution, and pure water was used as a rinsing solution.
  • an etching process using plasma using a mixed gas of chlorine and oxygen was performed, and the resist pattern was transferred to the Cr film.
  • An ICP dry etching apparatus was applied to the etching process. After introducing 50 sccm of chlorine and 10 sccm of oxygen and setting the pressure in the plasma chamber to 1 Pa, ICP power 500 W and RIE power 50 W were applied to cause plasma discharge.
  • an etching process using plasma using a mixed gas of hexafluoroethane and helium was performed, and the pattern formed on the Cr film was transferred to the SiO 2 layer.
  • An ICP dry etching apparatus was applied to the etching process. Ethane hexafluoride and helium were introduced at 50 sccm at a time, the pressure in the plasma chamber was set to 1 Pa, and then ICP power 500 W and RIE power 200 W were applied to cause plasma discharge. The etching depth of SiO 2 was 200 nm.
  • Example 2 In Example 2, a display body in which the uppermost layer of a multilayer laminate made of TiO 2 and SiO 2 is made of SiO 2 and a fine uneven layer made of a photocurable resin is formed by an ultraviolet nanoimprint method will be described.
  • a one-dimensional diffractive structure consisting of a linear concavo-convex structure having a structure period of 350 nm, a structure height of 200 nm, and a value obtained by dividing the convex dimension by the structure period is 0.5.
  • a pattern composed of a one-dimensional diffractive structure composed of a linear concavo-convex structure having a structure period of 400 nm, a structure height of 200 nm, and a value obtained by dividing the convex dimension by the structure period is 0.5.
  • An ultraviolet nanoimprint mold was prepared, which was formed in a 1 cm square region and each pattern region was arranged without overlapping.
  • Optool registered trademark
  • HD-1100Z manufactured by Daikin Industries, Ltd.
  • a 4-inch synthetic quartz glass wafer was prepared, and a multilayer laminate was formed by alternately stacking TiO 2 having a thickness of 40 nm and SiO 2 having a thickness of 60 nm on the synthetic quartz glass wafer by sputtering. .
  • a photocurable resin MUR-6 manufactured by Maruzen Petrochemical Co., Ltd.
  • a photocurable resin MUR-6 manufactured by Maruzen Petrochemical Co., Ltd.
  • a release agent is applied.
  • the mold surface was brought into contact, a pressure of 2 MPa was applied, and ultraviolet light having a wavelength of 365 nm was irradiated from the back surface of the ultraviolet nanoimprint mold to cure the photocurable resin.
  • the treatment was performed at room temperature, and the exposure amount of ultraviolet light was 100 mJ / cm 2 .
  • the synthetic quartz glass wafer was peeled from the ultraviolet nanoimprint mold to obtain a display body on which a fine uneven layer made of a photocurable resin was formed.
  • the display body of the present invention can be used for display objects with high design properties.
  • it is expected to be suitably used in the field of anti-counterfeiting technology.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

L'invention porte sur un corps d'affichage qui présente une forte esthétique de configuration, à l'aide d'un développement de couleurs structurel. Un corps d'affichage comprenant un substrat, un stratifié multicouche formé sur la surface de substrat et une couche irrégulière fine, formée sur la surface de stratifié multicouche, présente les caractéristiques suivantes : le stratifié multicouche possède deux ou plusieurs couches ; au moins le stratifié multicouche et la couche irrégulière fine transmettent une lumière d'une région de longueur d'onde prescrite ; les couches constituant le stratifié multicouche sont constituées par des matériaux ayant des indices de réfraction différents de ceux des couches adjacentes par rapport à une lumière ayant une longueur d'onde dans la région de longueur d'onde prescrite ; les matériaux constituant les couches qui constituent le stratifié multicouche et les couches irrégulières fines ont chacun une épaisseur de film optique, représentée par le produit de l'indice de réfraction de ces derniers et de l'épaisseur de film physique, qui est inférieure à 7/4 de la longueur d'onde la plus courte dans la région de longueur d'onde prescrite ; l'épaisseur de film physique de la couche irrégulière fine est partiellement réduite dans la couche irrégulière fine, de façon à former ainsi un corps structuré de façon irrégulière comprenant des parties convexes et des parties concaves ayant une différence de hauteur qui est inférieure ou égale à l'épaisseur de film physique.
PCT/JP2014/005787 2013-11-26 2014-11-18 Corps d'affichage et son procédé de fabrication Ceased WO2015079652A1 (fr)

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US11385382B2 (en) 2017-09-29 2022-07-12 Nike, Inc. Structurally-colored articles and methods for making and using structurally-colored articles
US11597996B2 (en) 2019-06-26 2023-03-07 Nike, Inc. Structurally-colored articles and methods for making and using structurally-colored articles
US11612208B2 (en) 2019-07-26 2023-03-28 Nike, Inc. Structurally-colored articles and methods for making and using structurally-colored articles
US11889894B2 (en) 2020-08-07 2024-02-06 Nike, Inc. Footwear article having concealing layer
US11987074B2 (en) 2020-05-29 2024-05-21 Nike, Inc. Structurally-colored articles having layers which taper in thickness
US11986042B2 (en) 2019-10-21 2024-05-21 Nike, Inc. Structurally-colored articles and methods for making and using structurally-colored articles
US12150512B2 (en) 2020-08-07 2024-11-26 Nike, Inc. Footwear article having repurposed material with structural-color concealing layer
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WO2020175464A1 (fr) * 2019-02-26 2020-09-03 凸版印刷株式会社 Filtre de sélection de longueur d'onde, procédé de fabrication de filtre de sélection de longueur d'onde, et dispositif d'affichage
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US11987074B2 (en) 2020-05-29 2024-05-21 Nike, Inc. Structurally-colored articles having layers which taper in thickness
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