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WO2015075981A1 - Method for producing carbonyl compound - Google Patents

Method for producing carbonyl compound Download PDF

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Publication number
WO2015075981A1
WO2015075981A1 PCT/JP2014/071912 JP2014071912W WO2015075981A1 WO 2015075981 A1 WO2015075981 A1 WO 2015075981A1 JP 2014071912 W JP2014071912 W JP 2014071912W WO 2015075981 A1 WO2015075981 A1 WO 2015075981A1
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group
general formula
carbonyl compound
compound represented
carbon atoms
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French (fr)
Japanese (ja)
Inventor
久 菅野
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Kureha Corp
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Kureha Corp
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/65Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by splitting-off hydrogen atoms or functional groups; by hydrogenolysis of functional groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D319/00Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/041,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • C07D319/081,3-Dioxanes; Hydrogenated 1,3-dioxanes condensed with carbocyclic rings or ring systems

Definitions

  • the present invention relates to a method for producing a carbonyl compound, and more particularly to a method for producing a carbonyl compound by dealkoxycarbonylating a ⁇ -ketoester compound.
  • Patent Document 1 discloses certain 2- (halogenated hydrocarbon substitution) -5-benzyl-1-azolylmethylcyclopenes. Tanol derivatives are described.
  • a 1-benzyl-2-oxocyclopentanecarboxylic acid alkyl ester derivative which is a ⁇ -ketoester compound, is protected from 2-benzyl-5 having a hydroxy group protected.
  • 5-bis (hydroxymethyl) cyclopentanone derivatives are described.
  • an object of the present invention is to provide a novel production method capable of producing a carbonyl compound from a ⁇ -ketoester compound at a low cost and in a high yield.
  • a method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a compound represented by the following general formula (II), which is an organic carboxylate of a tertiary amine And a compound in which dealkoxycarbonylation of the compound represented by the following general formula (II) is carried out in the presence of a halogenated salt.
  • Z 1 represents a substituted or unsubstituted alkyl group, cycloalkyl group, aryl group or heterocyclic group
  • Z 3 and Z 2 independently represent a hydrogen atom, or a substituted or unsubstituted group.
  • R 1 represents an alkyl group having 1 to 4 carbon atoms, and Z 1 and Z 2 may be bonded to each other.
  • Z 1 , Z 2 and Z 3 are the same as Z 1 , Z 2 and Z 3 in general formula (II), respectively.
  • a carbonyl compound can be produced from a ⁇ -ketoester compound at a low cost and in a high yield.
  • the hydroxy group was protected from a 1-benzyl-3,3-bis (hydroxymethyl) -2-oxocyclopentanecarboxylic acid alkyl ester derivative in which the hydroxy group was protected.
  • a benzyl-2,2-bis (hydroxymethyl) cyclopentanone derivative by performing a reaction using (a) an organic carboxylate of a tertiary amine, and (b) a halogenated salt.
  • the yield of 5-benzyl-2,2-bis (hydroxymethyl) cyclopentanone derivatives protected with a hydroxy group was found to be improved, and carbonyl compounds were also used in reactions using other ⁇ -ketoester compounds. It has been found that it can be produced at a low cost and with a high yield, and the present invention has been completed.
  • the method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a ⁇ -ketoester compound represented by the following general formula (II) (hereinafter referred to as compound (II)).
  • compound (II) a ⁇ -ketoester compound represented by the following general formula (II)
  • compound (II) a ⁇ -ketoester compound represented by the following general formula (II)
  • dealkoxycarbonylation which is represented by the general formula (I). This is a method for obtaining a carbonyl compound.
  • Z 1 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group may have a substituent. .
  • the number of carbon atoms of the alkyl group in Z 1 is not particularly limited, and examples of the alkyl group include alkyl groups having 1 to 8 carbon atoms.
  • examples of the alkyl group having 1 to 8 carbon atoms include a methyl group, an ethyl group, a (1-methyl) ethyl group, an n-propyl group, a 1-methylpropyl group, a 2-methylpropyl group, and 1,1-dimethylethyl.
  • the number of carbon atoms constituting the ring of the cycloalkyl group in Z 1 is not particularly limited, and examples of the cycloalkyl group include cycloalkyl groups having 3 to 6 carbon atoms.
  • examples of the cycloalkyl group having 3 to 6 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
  • Examples of the aryl group in Z 1 include a phenyl group, a naphthyl group, an indene group, an azulene group, and a diphenyl group.
  • heterocyclic group there is no particular limitation on the number of atoms constituting the ring of the heterocyclic group in Z 1.
  • heterocyclic group include 3 to 6-membered aliphatic heterocyclic groups and 5 to 6-membered aromatic heterocyclic groups. Can be mentioned.
  • heterocyclic ring constituting the 3- to 6-membered aliphatic heterocyclic ring include azetidine, aziridine, piperidine, piperazine, morpholine, pyrrolidine, oxetane, tetrahydrofuran and tetrahydropyran.
  • heterocyclic ring constituting the 5- to 6-membered aromatic heterocyclic group examples include thiophene, pyridine, thiazole, furan, pyrrole, oxazole, isoxazole, isothiazole, triazole, furasan, imidazole, pyrazole, pyrazine, and pyrimidine. , Triazine and pyridazine.
  • heterocyclic group in Z 1 include condensed heterocyclic rings such as indole, benzofuran, benzothiophene, quinoline, and quinoxaline.
  • Examples of the substituent that the alkyl group, cycloalkyl group, aryl group and heterocyclic group in Z 1 may have include a halogen atom, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, an aromatic heterocyclic group, one or more hydrogen atoms
  • Examples thereof include an aliphatic hydrocarbon group in which an atom is substituted with an aromatic hydrocarbon group or an aromatic heterocyclic group, an alkoxy group, an alkylcarbonylalkyl group, an amide group, a cyano group, and a nitro group.
  • the hydrogen atom in these substituents may be further substituted with a halogen atom, a hydroxy group, an alkoxy group, an alkyl group, a haloalkyl group, an aromatic hydrocarbon group, an aromatic heterocyclic group or the like.
  • the hydroxy group may be protected by a protecting group that protects the hydroxy group.
  • Z 2 and Z 3 independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group each represent a substituent. You may have.
  • the alkyl group, cycloalkyl group, aryl group, and heterocyclic group in Z 2 and Z 3 , and the substituent that the alkyl group, cycloalkyl group, aryl group, and heterocyclic group may have are each alkyl in Z 1 Examples thereof include the same groups as the substituents that the group, cycloalkyl group, aryl group and heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group may have.
  • Z 2 and Z 3 may be the same as each other or different from each other.
  • Z 1 and Z 2 may be bonded to each other to form a ring together with the carbon atom to which Z 1 is bonded and the carbon atom to which Z 2 is bonded.
  • R 1 represents an alkyl group having 1 to 4 carbon atoms.
  • alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, (1-methyl) ethyl group, n-propyl group, 1-methylpropyl group, 2-methylpropyl group, n-butyl group and 1 , 1-dimethylethyl group and the like.
  • tertiary amine that forms the organic carboxylate of tertiary amine
  • examples of the tertiary amine that forms the organic carboxylate of tertiary amine include trimethylamine, triethylamine, ethyldimethylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, Tri-sec-butylamine, tri-tert-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-octylamine, diethylisopropylamine, diisopropylethylamine, tricyclopropylamine, tricyclobutylamine, tetra Aliphatic amines such as methylethylenediamine, tricyclopentylamine and tricyclohexylamine; N-methylpyrrolidine, N-ethylpyrrolidine, N-methylpiperidine, N
  • nitrogen-containing heterocyclic aliphatic amines and nitrogen-containing heterocyclic aromatic amines such as pyridine, collidine, picoline and lutidine.
  • triethylamine, trimethylamine, ethyldimethylamine, N-methylpyrrolidine, pyridine, collidine or picoline is preferable
  • triethylamine, trimethylamine, pyridine or picoline is more preferable
  • triethylamine or pyridine is more preferable.
  • Particularly preferred is triethylamine.
  • the organic carboxylic acid constituting the organic carboxylate of the tertiary amine is preferably an organic monocarboxylic acid, more preferably a saturated or unsaturated aliphatic monocarboxylic acid, and even more preferably a saturated aliphatic monocarboxylic acid.
  • the saturated aliphatic carboxylic acid preferably has 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms.
  • Examples of the organic carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, and isovaleric acid. Among these, formic acid, acetic acid and propionic acid are preferable, and acetic acid is particularly preferable.
  • tertiary amine organic carboxylates include trimethylamine acetate, triethylamine formate, triethylamine acetate, triethylamine propionate, pyridine acetate, 2-picoline Examples thereof include acetate, acetate of 3-picoline and acetate of 4-picoline. Of these, triethylamine acetate or pyridine acetate is preferred.
  • the amount of the organic amine salt of the tertiary amine is, for example, 0.3 to 10 times mol, preferably 0.5 to 5 times mol, more preferably the compound (II). 0.8-3 moles.
  • An organic carboxylate of a tertiary amine can be generated by adding a tertiary amine and an organic carboxylic acid to the reaction system.
  • the addition of the tertiary amine and the organic carboxylic acid is not limited to the case where the tertiary amine and the organic carboxylic acid are separately added to the reaction system, and the reaction system is prepared by mixing a tertiary amine and the organic carboxylic acid in advance. May be added.
  • the mixing ratio of the tertiary amine and the organic carboxylic acid may be 1: 1.
  • the organic carboxylic acid becomes excessive.
  • the amount of the tertiary amine is preferably 1.01 to 5 times mol and more preferably 1.05 to 2 times mol with respect to the organic carboxylic acid.
  • the halide salt is not particularly limited as long as halide ions can be supplied into the system.
  • other metal salts such as quaternary ammonium salts, alkali metal salts, alkaline earth metal salts, and transition metal salts can be used. Can be mentioned. Of these, quaternary ammonium salts and alkali metal salts are preferred.
  • the halogenated quaternary ammonium salt is not limited, and examples of the group bonded to the nitrogen atom of the quaternary ammonium cation constituting the halogenated quaternary ammonium salt include an alkyl group, a substituted or unsubstituted aralkyl group ( Arylalkyl group) and a substituted or unsubstituted aryl group, and the same or different groups may be used.
  • the carbon number of the alkyl group is not limited, and is, for example, 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms, and more preferably 1 to 2 carbon atoms.
  • the alkyl moiety has, for example, 1 to 5 carbon atoms, preferably 1 to 2 carbon atoms.
  • the aryl part of the aralkyl group is, for example, an aryl having 6 to 14 carbon atoms, and a phenyl group is particularly preferable.
  • As the aryl group an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable.
  • the substituent that the aralkyl group and aryl group may have is not particularly limited as long as it does not affect the reaction, and examples thereof include a halogen atom, an alkyl group, an alkoxy group, a phenyl group, a cyano group, and a nitro group.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • alkyl group as a substituent examples include an alkyl group having 1 to 4 carbon atoms, and specifically include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, and sec-butyl group and tert-butyl group.
  • an alkyl group having 1 to 3 carbon atoms is preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, and a methyl group is further preferable.
  • alkoxy group as a substituent examples include an alkoxy group having 1 to 4 carbon atoms, and specific examples include a methoxy group, an ethoxy group, and an n-propoxy group.
  • halide ions constituting the halogenated quaternary ammonium salt examples include fluoride ions, chloride ions, bromide ions, and iodide ions. Of these, fluoride ion, chloride ion and bromide ion are preferable, and chloride ion and bromide ion are more preferable.
  • quaternary ammonium salt represented by the following general formula (III) can be mentioned as a more preferable compound in terms of relatively high solubility in an organic solvent.
  • R 2 to R 5 independently represent an alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group.
  • the alkyl group is preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably an alkyl group having 1 to 2 carbon atoms.
  • the aralkyl group is preferably an aralkyl group having 1 to 5 carbon atoms in the alkyl portion, and more preferably an aralkyl group having 1 to 2 carbon atoms in the alkyl portion.
  • an aryl in the aralkyl group an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable.
  • aryl group an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable.
  • Examples of the substituent that the aralkyl group and aryl group may have include the substituents described above.
  • L ⁇ represents a halide ion, preferably a fluoride ion, a chloride ion or a bromide ion, and more preferably a chloride ion or a bromide ion.
  • R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, substituted or unsubstituted.
  • R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, Quaternary ammonium salts in which L ⁇ is a chloride ion or a bromide ion can be mentioned.
  • halogenated quaternary ammonium salts include tetramethylammonium chloride, tetramethylammonium bromide, tetraethylammonium chloride, tetraethylammonium bromide, tetraethylammonium iodide, methyltriethylammonium chloride, methyltriethylammonium bromide, ethyltrimethylammonium chloride.
  • a hydrogen halide salt of a tertiary amine that forms the organic carboxylate described above a halogenated quaternary ammonium salt can be generated in the reaction system and used.
  • an alkyl halide is produced. This reacts with the tertiary amine present in the system to give a halogenated quaternary ammonium salt in the system.
  • the type of tertiary amine to be used is not particularly limited, but inexpensive triethylamine, trimethylamine, pyridine or picoline is preferable from the viewpoint that it can be used for general purposes.
  • examples of the hydrogen halide forming the hydrogen halide salt include hydrogen fluoride, hydrogen chloride, hydrogen bromide, and hydrogen iodide. Among them, hydrogen chloride and hydrogen bromide are preferable.
  • Examples of the alkali metal constituting the alkali metal halide salt include lithium, sodium, potassium, rubidium and cesium. Among these, lithium, sodium and potassium are more preferable.
  • examples of the halide ions constituting the alkali metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.
  • alkali metal halides include lithium chloride, lithium bromide, lithium iodide, sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide, potassium iodide, rubidium chloride, rubidium bromide. And rubidium iodide, cesium chloride, cesium bromide and cesium iodide.
  • lithium chloride, lithium bromide, lithium iodide, sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide and potassium iodide are preferable, and lithium chloride, lithium bromide, lithium iodide, bromide Sodium and potassium bromide are more preferred.
  • alkaline earth metal constituting the alkaline earth metal halide salt examples include beryllium, magnesium, calcium, strontium and barium.
  • examples of the halide ions constituting the alkaline earth metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.
  • alkaline earth metal halide salt examples include magnesium chloride, magnesium bromide, magnesium iodide, calcium chloride, calcium bromide, calcium iodide, strontium chloride, strontium bromide, barium chloride and barium bromide. be able to.
  • the metal constituting the halogenated metal salt other than the alkali metal halide salt and the alkaline earth metal halide salt is preferably a metal that becomes a monovalent or divalent cation, for example, transition metals such as copper and silver, and Zinc etc. can be mentioned.
  • examples of the halide ions constituting the metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.
  • metal halide salts other than alkali metal halide salts and alkaline earth metal halide salts include copper chloride, copper bromide, copper iodide, zinc chloride, zinc bromide, silver chloride and silver bromide. Can be mentioned.
  • halogenated salt only one kind of compound may be used, or a plurality of compounds may be used in combination. Further, halogenated quaternary ammonium salts, tertiary amine hydrogen halide salts, halogenated alkali metal salts, halogenated alkaline earth metal salts, and other metal halide salts may be used in combination. A combination of both a halogenated quaternary ammonium salt and a halogenated alkali metal salt may be used. From the viewpoint of yield, it is preferable to use a halogenated quaternary ammonium salt.
  • the amount of the halogenated salt (the total amount when a plurality of compounds are included) is, for example, 0.01 to 10 times mol, preferably 0.02 to 3 times the amount of compound (II).
  • the molar ratio is more preferably 0.05 to 1 times.
  • the dealkoxycarbonylation reaction may be carried out in a solvent.
  • the solvent is not particularly limited as long as it does not participate in the reaction, and for example, amides such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methyl-2-pyrrolidone can be preferably used. It is also possible to react by adding other solvents such as toluene to these solvents.
  • the organic carboxylate of a tertiary amine is a liquid, it may be used as a solvent itself and the reaction may be carried out in a system that does not use any other solvent.
  • the reaction temperature is, for example, 0 to 250 ° C., preferably room temperature to 200 ° C., more preferably 50 to 180 ° C., and further preferably 100 to 130 ° C.
  • a heating device using a heat transfer oil is necessary, but if it is about 130 ° C., inexpensive steam can be used. Thereby, since capital investment and running cost can be suppressed more cheaply, the carbonyl compound according to the present invention can be produced at a lower cost.
  • the reaction can be carried out at a lower reaction temperature.
  • the reaction time is, for example, 0.05 hours to several days, preferably 0.1 hours to 5 days, and more preferably 0.5 hours to 2 days.
  • the reaction proceeds without problems even if it is not under an inert gas.
  • the reaction is carried out at a high temperature for a long period of time, depending on the type of amine to be used, if the reaction proceeds in the air, air oxidation may occur and the reaction solution may be colored. In such a case, it is more preferable to carry out the reaction in an inert gas atmosphere such as nitrogen and argon.
  • reaction conditions can be easily designed and set by those skilled in the art by referring to conventionally known production methods.
  • dealkoxycarbonylation means that —CO 2 R 1 is finally replaced with a hydrogen atom. From the viewpoint that —CO 2 R 1 is removed from the ⁇ -ketoester compound to obtain a carbonyl compound, this is the same as the hydrolysis and decarboxylation of the ⁇ -ketoester compound.
  • the reaction is carried out in the absence of water.
  • “dealkoxycarbonylation” in the present invention is clearly distinguished from reactions involving hydrolysis that require water. If water is present in the reaction system, hydroxide ions may be generated from water molecules under conditions containing a base, which may cause undesired side reactions. Preferably it is not.
  • the reaction is carried out using (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt instead of an acid and an alkali.
  • the reaction can be carried out under Therefore, even a compound that is unstable with respect to an acid or an alkali and whose yield is expected to decrease under an acidic condition or a basic condition can be reacted with a high yield.
  • reaction mechanism 1 As the reaction mechanism of dealkoxycarbonylation in the method for producing a carbonyl compound according to the present invention, for example, the following two reaction mechanisms are presumed if a halogenated quaternary ammonium salt is taken as an example of the halogenated salt: (Reaction mechanism 1) In this reaction mechanism, the reaction proceeds by a small amount of hydrogen halide generated from a carboxylic acid derived from a tertiary amine carboxylate and a halide ion derived from a halogenated quaternary ammonium salt.
  • the compound (II) When the halogen atom of the hydrogen halide attacks the alkyl group of the alkyl ester group in the compound (II), the compound (II) is dealkylated to generate ⁇ -ketocarboxylic acid.
  • a compound represented by the general formula (I) is produced by decarboxylation of the produced ⁇ -ketocarboxylic acid.
  • the generated alkyl halide reacts with a tertiary amine in the system to produce a halogenated quaternary ammonium salt. From this fact, since halide ions are regenerated in the system, the reaction proceeds without problems even when the amount of the halide salt is less than or equal to the alkyl ester group.
  • reaction mechanism 2 The halide ion of the halogenated quaternary ammonium salt attacks the alkyl group of the alkyl ester group of the compound (II) to generate an alkyl halide, and a Clapco type decarboxylation reaction proceeds.
  • generated on the obtained ketone receives a proton supply from the carboxylic acid in a system, and the compound shown by general formula (I) is produced
  • the generated alkyl halide reacts with a tertiary amine in the system to produce a halogenated quaternary ammonium salt.
  • the reaction rate is expected to increase because a large amount of hydrogen halide is present in the system. If the amount of the hydrogen halide salt is too large, the acidity in the system also increases, so that when using a compound that is unstable to acids, attention must be paid to the amount used.
  • the amount used can be appropriately selected by those skilled in the art.
  • the reaction mechanism of the carbonyl compound according to the present invention is the above reaction mechanism. And is not limited to other specific reaction mechanisms. Moreover, not only the case of progressing by a single reaction mechanism, but also progressing by a plurality of reaction mechanisms.
  • a compound in which the ⁇ -position of the ketone is alkylated which is produced as a by-product when Clapco decarboxylation occurs, is not produced. This does not occur in the case of the reaction mechanism 1, but even in the case of the reaction mechanism 2, there is a proton supply source in the system, and even if an anion is generated at the ⁇ -position of the ketone, it is quickly neutralized. It is thought to be due to.
  • a preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIa) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt.
  • a carbonyl compound represented by the general formula (Ia) is obtained by dealkoxycarbonylating a ⁇ -ketoester compound having a cyclopentane ring (hereinafter referred to as the compound (IIa)) to obtain a carbonyl compound represented by the general formula (Ia). It is a manufacturing method.
  • Y represents an alkyl group or haloalkyl group having 1 to 6 carbon atoms, an alkenyl group or haloalkenyl group having 2 to 6 carbon atoms, an alkynyl group or haloalkynyl group having 2 to 6 carbon atoms, or the alkyl group, haloalkyl A group, an alkenyl group, a haloalkenyl group, an alkynyl group or a haloalkynyl group in which part of the hydrogen atoms is substituted with —OG (G represents a protecting group for a hydroxy group).
  • alkyl group having 1 to 6 carbon atoms examples include methyl group, ethyl group, (1-methyl) ethyl group, n-propyl group, 1-methylpropyl group, 2-methylpropyl group, n-butyl group, 1 -Methylbutyl group, 2-methylbutyl group, 1-ethylpropyl group, 1,1-dimethylethyl group and the like can be mentioned.
  • an alkyl group having 1 to 4 carbon atoms is preferable, a methyl group and an ethyl group are more preferable, and a methyl group is further preferable.
  • haloalkyl group having 1 to 6 carbon atoms examples include chloromethyl group, dichloromethyl group, trichloromethyl group, 2-chloroethyl group, 1-chloroethyl group, 2,2-dichloroethyl group, 1,2-dichloroethyl group, 2 , 2,2-trichloroethyl group, 3-chloropropyl group, 2,3-dichloropropyl group, 1-chloro-1-methylethyl group, 2-chloro-1-methylethyl group, 2-chloropropyl group, 4 -Chlorobutyl group, 5-chloropentyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, 1-fluoroethyl group, 2,2-difluoroethyl group, 1,2-difluoroethyl group 2,2,2-trifluoroethyl group, 3-fluoro
  • alkenyl group having 2 to 6 carbon atoms examples include ethenyl group, 1,2-dimethylethenyl group, 4-methyl-1,3-butadienyl group, 1-propenyl group, 2-propenyl group, 2-methyl- Examples include 2-propenyl group, 3-methyl-2-propenyl group, 2-butenyl group, 3-butenyl group, and 3-methyl-3-butenyl group. Of these, an alkenyl group having 2 to 4 carbon atoms is preferred.
  • haloalkenyl group having 2 to 6 carbon atoms examples include 2-chloroethenyl group, 2,2-dichloroethenyl group, 2-chloro-2-propenyl group, 3,3-dichloro-2-propenyl group, 2,3 -Dichloro-2-propenyl group, 3,3-dichloro-2-methyl-2-propenyl group, 3-chloro-2-butenyl group, 2-fluoroethenyl group, 2,2-difluoroethenyl group, 2- Fluoro-2-propenyl group, 3,3-difluoro-2-propenyl group, 2,3-difluoro-2-propenyl group, 3,3-difluoro-2-methyl-2-propenyl group, 3-fluoro-2- Butenyl, 2-bromoethenyl, 2,2-dibromoethenyl, 2-bromo-2-propenyl, 3,3-di
  • alkynyl group having 2 to 6 carbon atoms examples include ethynyl group, 1-propynyl group, 2-propynyl group, 1-butynyl group, and 2-butynyl group. Of these, an alkynyl group having 2 to 4 carbon atoms is preferable.
  • haloalkynyl group having 2 to 6 carbon atoms examples include 2-fluoroethynyl group, 2-chloroethynyl group, 3-fluoro-2-propynyl group, 3-chloro-2-propynyl group, and 3-bromo-2 -A propynyl group etc. can be mentioned. Of these, a haloalkynyl group having 2 to 4 carbon atoms is preferable.
  • the protecting group G in —OG is a protecting group that protects a hydroxy group, and is not particularly limited as long as it is a protecting group that dissociates under appropriate conditions to form a hydroxy group.
  • Examples of the protecting group G include a protecting group that dissociates under acidic conditions and a protecting group that cleaves under reducing conditions such as a hydrogenation reaction.
  • N represents an integer of 0-6.
  • n is preferably 0 to 3, and more preferably 0 to 2.
  • the plurality of Ys may be the same or different from each other.
  • two Y may be bonded to one carbon atom.
  • a plurality of Ys may be bonded to each other to form a ring together with the carbon atom to which each Y is bonded.
  • X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a haloalkoxy group having 1 to 4 carbon atoms, a phenyl group, a cyano group, or a nitro group. Represents a group.
  • halogen atom in X examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, among which a fluorine atom, a chlorine atom and a bromine atom are preferable, and a fluorine atom and a chlorine atom are more preferable.
  • alkyl group having 1 to 4 carbon atoms in X include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group.
  • an alkyl group having 1 to 3 carbon atoms is preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, and a methyl group is further preferable.
  • haloalkyl group having 1 to 4 carbon atoms in X examples include, for example, a dichloromethyl group, a trichloromethyl group, a 2-chloroethyl group, a 1-chloroethyl group, a 2,2-dichloroethyl group, a 1,2-dichloroethyl group, 2 , 2,2-trichloroethyl group, 3-chloropropyl group, 2,3-dichloropropyl group, 1-chloro-1-methylethyl group, 2-chloro-1-methylethyl group, 2-chloropropyl group, 4 -Chlorobutyl, fluoromethyl, difluoromethyl, trifluoromethyl, 2-fluoroethyl, 1-fluoroethyl, 2,2-difluoroethyl, 1,2-difluoroethyl, 2,2,2 -Trifluoroethyl group, 3-fluoro
  • a haloalkyl group having 1 to 3 carbon atoms is preferable, a haloalkyl group having 1 to 2 carbon atoms is more preferable, and a trihaloalkyl group having 1 carbon atom is more preferable.
  • Examples of the alkoxy group having 1 to 4 carbon atoms in X include a methoxy group, an ethoxy group, and an n-propoxy group. Among these, an alkoxy group having 1 to 3 carbon atoms is preferable, an alkoxy group having 1 to 2 carbon atoms is more preferable, and a methoxy group is further preferable.
  • haloalkoxy group having 1 to 4 carbon atoms in X examples include, for example, a trifluoromethoxy group, a difluoromethoxy group, a 1,1,2,2,2-pentafluoroethoxy group, and a 2,2 and 2-trifluoroethoxy group.
  • Etc a haloalkoxy group having 1 to 3 carbon atoms is preferable, a haloalkoxy group having 1 to 2 carbon atoms is more preferable, and a dihalomethoxy group and a trihalomethoxy group are further preferable.
  • X is preferably a halogen atom.
  • M represents an integer from 0 to 5.
  • m is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and still more preferably 0 or 1.
  • a plurality of Xs may be the same or different from each other.
  • X may be located at any of positions 2 to 6 of the benzene ring, but when m is 1, a position where 4-substituted benzyl is preferred.
  • n is an integer from 0 to 2
  • X is a halogen atom
  • R 1 is the same as R 1 in the general formula (II).
  • the type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIa), the type and amount of halogenated salt, the type of solvent, the reaction conditions for the reaction, etc. are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.
  • More preferable examples of the compound (IIa) include, for example, a compound represented by the following general formula (IIa-1) and a compound represented by the following general formula (IIa-2).
  • a more preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIb) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halide salt.
  • a carbonyl compound represented by the general formula (Ib) is obtained by subjecting a ⁇ -ketoester compound having a cyclopentane ring (hereinafter referred to as the compound (IIb)) to dealkoxycarbonylation. It is a manufacturing method of a compound.
  • Y 1 and Y 2 are each independently an alkyl group or haloalkyl group having 1 to 6 carbon atoms, or a hydrogen atom of a part of the alkyl group or haloalkyl group is -OG 1 (G 1 is a hydroxy group protecting group). Represents a group substituted by (represents a group).
  • Examples of the alkyl group and haloalkyl group having 1 to 6 carbon atoms in Y 1 and Y 2 are the same as the alkyl group and haloalkyl group having 1 to 6 carbon atoms in Y described above.
  • the protecting group G 1 is a protecting group that protects a hydroxy group, and is not particularly limited as long as it is a protecting group that dissociates under appropriate conditions to form a hydroxy group.
  • the protecting group G 1 for example, protecting groups which dissociate under acidic conditions.
  • Examples of the protecting group that can be dissociated under acidic conditions include, for example, an alkoxymethyl group having 1 to 4 carbon atoms such as a methoxymethyl group and an ethoxymethyl group, an alkoxyethyl group, a methyl group, an ethyl group, and a t-butyl group.
  • the silyl group of can be mentioned.
  • the protective groups in the two hydroxy groups may be bonded to each other, such as when two hydroxy groups are simultaneously protected by acetals such as methylene acetal and ethylidene acetal.
  • protecting groups that cleave under reducing conditions.
  • Protecting groups that are cleaved under reducing conditions include substituted or unsubstituted benzyl groups such as benzyl and p-methoxybenzyl groups.
  • Y 1 and Y 2 may be bonded to each other to form a ring together with the carbon atom to which Y 1 and Y 2 are bonded.
  • R 1, X and m are the same as R 1, X and m in the above general formula (IIa).
  • the type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIb), the type and amount of halogenated salt, the type of solvent, the reaction conditions for the reaction, etc. are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.
  • Another preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIc) in the presence of (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt.
  • a ⁇ -ketoester compound having a cyclopentane ring (hereinafter referred to as compound (IIc)) is dealkoxycarbonylated to obtain a carbonyl compound represented by general formula (Ic) (hereinafter referred to as compound (Ic)). It is a manufacturing method of compound (Ic).
  • G 2 and G 3 independently represent a protecting group protecting a hydroxy group, and specifically represent a protecting group that dissociates under acidic conditions.
  • G 2 and G 3 are bonded to each other to form an oxygen atom to which G 2 and G 3 are bonded, a carbon atom to which the oxygen atom is bonded, and a cyclo atom to which the carbon atom is bonded.
  • a ring may be formed together with the carbon atom of the pentane ring.
  • Examples of the protecting group when G 2 and G 3 are not bonded include, for example, an alkoxymethyl group having 1 to 4 carbon atoms, such as a methoxymethyl group and an ethoxymethyl group, a 1-ethoxyethyl group, and 1 An alkoxy moiety such as a methyl-1-methoxyethyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 4 carbon atoms such as a t-butyl group and a methyl group, a substituted or unsubstituted benzyl group, a substituted Alternatively, an unsubstituted tetrahydropyranyl group, a substituted or unsubstituted tetrahydrofuranyl group, and silyl groups such as an allyl group, a triethylsilyl group, and a t-butyldimethylsilyl group can be exemplified.
  • examples of the protecting group when G 2 and G 3 are bonded to each other include, for example, methylene acetal, ethylidene acetal, t-butyl methylidene ketal, 1-t-butyl ethylidene ketal, 1-phenyl ethylidene ketal, acrolein Acetal, isopropylidene ketal (acetonide), cyclopentylidene ketal, cyclohexylidene ketal, cycloheptylidene ketal, benzylidene acetal, p-methoxybenzylidene acetal, 2,4-dimethoxybenzylidene ketal, 3,4-dimethoxybenzylidene ketal, 2-nitrobenzylidene acetal, 4-nitrobenzylidene acetal, mesitylene acetal, 1-naphthaldehyde acetal, benzo
  • R 1, X and m are the same as R 1, X and m in the above general formula (IIa).
  • the type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIc), the type and amount of halogenated salt, the type of solvent, the reaction conditions of the reaction, etc. are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.
  • G 2 and G 3 are protecting groups that dissociate under acidic conditions. Therefore, when obtaining compound (Ic) from compound (IIc) by the reaction of hydrolysis and decarboxylation, the yield of compound (Ic) is reduced when the reaction is carried out under acidic conditions.
  • the inventors of the present application have conducted various studies. As a result, when compound (IIc) is hydrolyzed and decarboxylated under basic conditions, a side reaction occurs in which the cyclopentane ring is opened, resulting in compound (Ic). It was found that the yield of was reduced. Therefore, in the reaction for obtaining the compound (Ic) from the compound (IIc), a reaction under neutral or nearly neutral conditions is desired.
  • the side reaction in which the cyclopentane ring opens when hydrolyzed and decarboxylated under basic conditions is not limited to the reaction in the compound (IIc), but the compound (IIa) and the compound (IIb) having a cyclopentane ring. It can occur in the reaction in Therefore, for some reason, when the reaction of hydrolysis / decarboxylation under acidic conditions is not desirable in compound (IIa) and compound (IIb), for example, the yield is reduced by hydrolysis / decarboxylation under acidic conditions.
  • the production method of the present invention in which dealkoxycarbonylation is carried out using (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt is particularly preferably used.
  • a preferred embodiment is as follows: (a) an organic carboxylate of a tertiary amine, and (b) a halogenated salt, Production of a carbonyl compound represented by the general formula (Id) is obtained by subjecting a ⁇ -ketoester compound having a cyclopentane ring represented by the formula (IId) to dealkoxycarbonylation to obtain a carbonyl compound represented by the general formula (Id). Is the method.
  • G 4 and G 5 independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 1 to 4 carbon atoms, a phenyl group, a naphthyl group, or a benzyl group.
  • the phenyl and naphthyl groups in G 4 and G 5 and the phenyl moiety in the benzyl group are alkyl groups having 1 to 4 carbon atoms such as methyl and ethyl groups; alkoxy groups having 1 to 4 carbon atoms such as methoxy and ethoxy groups A nitro group; or a halogen atom such as a fluorine atom and a chlorine atom.
  • G 4 and G 5 may be bonded to each other to form a ring together with the carbon atom to which G 4 and G 5 are bonded.
  • G 4 and G 5 are each independently more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group and an n-propyl group. More preferably a group or an ethyl group, and particularly preferably G 4 and G 5 are both methyl groups.
  • R 1, X and m are the same as R 1, X and m in the above general formula (IIa).
  • the reaction conditions and the like of the reaction are the same as the types and amounts of the tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions, respectively.
  • a particularly preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIe) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt.
  • This is a method for producing a carbonyl compound represented by the general formula (Ie), wherein a carbonyl compound represented by the general formula (Ie) is obtained by dealkoxycarbonylation of a ⁇ -ketoester compound having a cyclopentane ring.
  • G 6 and G 7 independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, and an n-propyl group.
  • a hydrogen atom, a methyl group, or an ethyl group is preferable, and both G 6 and G 7 are more preferably a methyl group.
  • X 1 represents a hydrogen atom, a chlorine atom or a fluorine atom.
  • R 1 is the same as R 1 in the general formula (IIa).
  • the method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a compound represented by the following general formula (II), which is a tertiary amine.
  • the compound represented by the following general formula (II) is subjected to dealkoxycarbonylation.
  • Z 1 represents a substituted or unsubstituted alkyl group, cycloalkyl group, aryl group or heterocyclic group
  • Z 3 and Z 2 independently represent a hydrogen atom, or a substituted or unsubstituted group.
  • R 1 represents an alkyl group having 1 to 4 carbon atoms, and Z 1 and Z 2 may be bonded to each other.
  • Z 1 , Z 2 and Z 3 are the same as Z 1 , Z 2 and Z 3 in general formula (II), respectively.
  • the halogenated salt is preferably a halogenated quaternary ammonium salt or a metal halide salt.
  • the halogenated quaternary ammonium salt can be preferably used by generating it in the system by using a tertiary amine hydrogen halide salt.
  • the metal halide salt is preferably an alkali metal halide salt.
  • the halogenated quaternary ammonium salt is preferably a compound represented by the following general formula (III).
  • R 2 to R 5 independently represent an alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group, and L ⁇ represents a halide ion. Yes.
  • R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted benzyl group, or a substituted group. or an unsubstituted phenyl group, L - is preferably a chloride ion or bromide ion.
  • the method for producing a carbonyl compound according to the present invention may be a method using the above tertiary amine organic carboxylate as a solvent and not using any other solvent.
  • the tertiary amine constituting the organic carboxylate of the tertiary amine is preferably triethylamine, trimethylamine, pyridine or picoline.
  • the organic carboxylic acid constituting the organic carboxylate of the tertiary amine is preferably an aliphatic monocarboxylic acid.
  • the compound represented by the general formula (II) is a compound represented by the following general formula (IIa), and the carbonyl compound represented by the general formula (I) is A carbonyl compound represented by the following general formula (Ia) is preferable.
  • R 1 represents an alkyl group having 1 to 4 carbon atoms
  • Y represents an alkyl group or haloalkyl group having 1 to 6 carbon atoms, an alkenyl group or haloalkenyl group having 2 to 6 carbon atoms
  • a part of hydrogen atoms of the alkyl group, haloalkyl group, alkenyl group, haloalkenyl group, alkynyl group or haloalkynyl group is -OG (G is a hydroxy group)
  • n represents an integer of 0 to 6.
  • n is 2 or more
  • a plurality of Y may be the same or different from each other, and n is 2 or more.
  • a plurality of Y may be bonded to each other to form a ring together with the carbon atom to which each Y is bonded, where X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or 1 carbon atom.
  • X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or 1 carbon atom.
  • m represents an integer of 0 to 5
  • m is 2 or more
  • the plurality of Xs may be the same or different.
  • the compound represented by the general formula (IIa) is a compound represented by the following general formula (IIb), and the carbonyl compound represented by the general formula (Ia) is A carbonyl compound represented by the following general formula (Ib) is preferable.
  • Y 1 and Y 2 independently represent an alkyl group having 1 to 6 carbon atoms or a haloalkyl group, or a hydrogen atom in a part of the alkyl group or haloalkyl group is -OG 1 (G 1 Represents a hydroxy-protecting group, and Y 1 and Y 2 may be bonded to each other to form a ring together with the carbon atom to which Y 1 and Y 2 are bonded.
  • R 1, X and m are each the same as R 1, X and m in the general formula (IIa).
  • the compound represented by the general formula (IIb) is a compound represented by the following general formula (IIc), and the carbonyl compound represented by the general formula (Ib) is A carbonyl compound represented by the following general formula (Ic) is preferable.
  • G 2 and G 3 independently represent a protecting group that dissociates under acidic conditions, and G 2 and G 3 may be bonded to each other.
  • R 1 , X, and m are These are the same as R 1 , X and m in the general formula (IIa).
  • a tertiary amine is added to the compound represented by the general formula (IIc), and then an organic carboxylic acid in an amount smaller than the added amount of the tertiary amine is added. It is preferable to carry out dealkoxycarbonylation by adding an organic carboxylate of the tertiary amine in the reaction system by adding.
  • the compound represented by the general formula (IIc) is a compound represented by the following general formula (IId), and the carbonyl compound represented by the general formula (Ic) is A carbonyl compound represented by the following general formula (Id) is preferable.
  • G 4 and G 5 are independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 1 to 4 carbon atoms, or a substituted or unsubstituted phenyl group or naphthyl group. or a benzyl group, G 4 and G 5 bonded to each other, G 4 and G 5 may also form a ring with the carbon atom to which they are attached .
  • R 1, X and m are each the general (It is the same as R 1 , X and m in the formula (IIa).)
  • Example 1 To tetramethylammonium chloride (0.45 g) was added dimethylacetamide (2.5 ml), triethylamine (3.0 ml), and acetic acid (1.2 ml), and then 2- (4-chlorobenzyl) -8,8 -Dimethyl-1-oxo-7,9-dioxaspiro [4.5] decane-2-carboxylic acid methyl ester (Compound 1) (5.0 g) was added, and the mixture was stirred at 125 ° C. for 12 hours for reaction. Toluene was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with toluene.
  • Compound 1 2- (4-chlorobenzyl) -8,8 -Dimethyl-1-oxo-7,9-dioxaspiro
  • Example 2 The target product was obtained in the same manner as in Example 1 except that tetraethylammonium bromide (0.86 g) was used instead of tetramethylammonium chloride and the reaction was performed at 110 ° C. for 12 hours. Yield: 99.7%.
  • Example 3 Tetraethylammonium bromide (0.30 g) was used instead of tetramethylammonium chloride, no solvent (dimethylacetamide) was used, and 110 ° C. for 2 hours, then 115 ° C. for 3 hours, then 120 ° C.
  • the target product was obtained in the same manner as in Example 1 except that the reaction was performed for 11 hours. Yield: 98.3%.
  • Example 4 Dimethylacetamide (2 ml) and toluene (2 ml) were added to tetraethylammonium bromide (0.344 g), and then triethylamine (0.98 ml) and acetic acid (0.394 g) were added. Compound 1 was added to the resulting crude solution. (2.0 g) was added, and the target product was obtained in the same manner as in Example 1 except that the reaction was carried out at 110 ° C. to 114 ° C. for 10 hours. Yield: 98.4%.
  • Example 5 The target product was obtained in the same manner as in Example 4 except that lithium bromide (0.142 g) was used instead of tetraethylammonium bromide and the mixture was stirred at 110 ° C. to 114 ° C. for 12 hours. Yield: 97.3%.
  • Example 6 Acetic acid (0.394 g) and triethylamine (0.98 ml) were dissolved in dimethylacetamide (4 ml) and added to compound 1 (2.0 g), followed by addition of triethylamine hydrochloride (0.451 g) at about 120 ° C. The reaction was allowed for 5 hours. Ethyl acetate and aqueous sodium bicarbonate were added to the reaction solution, and the mixture was partitioned. The organic layer was washed with saturated brine, and then the aqueous layer was extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and then concentrated to obtain the desired product. Yield: 98.7%.
  • Example 7 To tetraethylammonium bromide (0.473 g) was added dimethylacetamide (2 ml), triethylamine (1.1 ml), and acetic acid (0.45 g), and then 3- (4-chlorobenzyl) -2-oxocyclopentanecarboxylic acid. Acid methyl ester (1.0 g) was added and the reaction was allowed to stir at 115-120 ° C. for 12 hours. Toluene was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with toluene. The organic layer was dried over anhydrous sodium sulfate, concentrated and then purified with a silica gel column to give 2- (4-chlorobenzyl) cyclopentanone. Yield: 87.2%.
  • Example 8 To tetraethylammonium bromide (0.593 g), dimethylacetamide (2 ml), triethylamine (1.3 ml), and acetic acid (0.564 g) were added, and then 3- (4-chlorophenyl) -3-oxopropionic acid methyl ester (1.0 g) was added and the reaction was allowed to stir at 120 ° C. for 10 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and then purified on a silica gel column to give 1- (4-chlorophenyl) ethan-1-one. Yield: 91.2%.
  • Example 9 After mixing dimethylacetamide (4 ml), triethylamine (1.4 ml) and acetic acid (0.611 g), 1- (4-chlorobenzyl) -3,3-dimethyl-2-oxocyclopentanecarboxylic acid methyl ester ( 2.0 g) was added, and then triethylamine hydrochloride (0.47 g) was added and reacted at 120 ° C. for 17 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and purified by a silica gel column to give 5- (4-chlorobenzyl) -2,2-dimethylcyclopentanone. Yield: 98.5%.
  • Example 10 After mixing dimethylacetamide (4 ml), pyridine (1.34 g), and acetic acid (1.02 g), 1- (4-chlorobenzyl) -3,3-dimethyl-2-oxocyclopentanecarboxylic acid methyl ester ( 2.0 g) was added, tetramethylammonium chloride (0.52 g) was added, and the mixture was reacted at 120 ° C. for 8 hours and 130 ° C. for 16 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and purified by a silica gel column to give 5- (4-chlorobenzyl) -2,2-dimethylcyclopentanone. Yield: 96.3%.
  • the present invention can be used for the production of 2-benzyl-5,5-di (protected hydroxymethyl) -cyclopentanone derivatives used as raw materials for agricultural chemicals and the like.

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Abstract

In order to provide a method for producing a carbonyl compound with an improved yield, the present invention produces a carbonyl compound represented by general formula (I) by removing the carbonylalkoxy from a compound represented by general formula (II) while in the presence of a tertiary amine organic carboxylate and a halide salt. (In the formula, R1 represents a C1-4 alkyl group.)

Description

カルボニル化合物の製造方法Method for producing carbonyl compound

 本発明は、カルボニル化合物の製造方法に関し、詳細には、β-ケトエステル化合物を脱アルコキシカルボニル化させることによるカルボニル化合物の製造方法に関する。 The present invention relates to a method for producing a carbonyl compound, and more particularly to a method for producing a carbonyl compound by dealkoxycarbonylating a β-ketoester compound.

 農園芸用薬剤および工業用材料保護剤等の有効成分として利用できる化合物として、特許文献1には、ある種の2-(ハロゲン化炭化水素置換)-5-ベンジル-1-アゾリルメチルシクロペンタノール誘導体が記載されている。同文献には、当該誘導体の製造方法における工程の一部として、β-ケトエステル化合物である1-ベンジル-2-オキソシクロペンタンカルボン酸アルキルエステル誘導体から、ヒドロキシ基が保護された2-ベンジル-5,5-ビス(ヒドロキシメチル)シクロペンタノン誘導体を製造する方法が記載されている。 As compounds that can be used as active ingredients such as agricultural and horticultural agents and industrial material protecting agents, Patent Document 1 discloses certain 2- (halogenated hydrocarbon substitution) -5-benzyl-1-azolylmethylcyclopenes. Tanol derivatives are described. In this document, as part of the steps in the method for producing the derivative, a 1-benzyl-2-oxocyclopentanecarboxylic acid alkyl ester derivative, which is a β-ketoester compound, is protected from 2-benzyl-5 having a hydroxy group protected. , 5-bis (hydroxymethyl) cyclopentanone derivatives are described.

国際公開WO2011/070771号(2011年6月16日公開)International Publication WO2011 / 077071 (released on June 16, 2011)

 農園芸用薬剤等の有効成分として利用される2-(ハロゲン化炭化水素置換)-5-ベンジル-1-アゾリルメチルシクロペンタノール誘導体を、より安価で大量に製造するためには、ヒドロキシ基が保護された2-ベンジル-5,5-ビス(ヒドロキシメチル)シクロペンタノン誘導体の収率を向上させることが求められる。 In order to produce 2- (halogenated hydrocarbon-substituted) -5-benzyl-1-azolylmethylcyclopentanol derivatives, which are used as active ingredients in agricultural and horticultural agents, at lower cost and in large quantities, It is required to improve the yield of 2-benzyl-5,5-bis (hydroxymethyl) cyclopentanone derivative in which is protected.

 そこで、本発明は上記の問題点に鑑みてなされたものであり、その目的は、β-ケトエステル化合物からカルボニル化合物を安価に、かつ収率良く製造できる新規な製造方法を提供することにある。 Therefore, the present invention has been made in view of the above problems, and an object of the present invention is to provide a novel production method capable of producing a carbonyl compound from a β-ketoester compound at a low cost and in a high yield.

 本発明に係るカルボニル化合物の製造方法は、下記一般式(II)で示される化合物から下記一般式(I)で示されるカルボニル化合物を製造する方法であって、第3級アミンの有機カルボン酸塩およびハロゲン化塩の存在下で、下記一般式(II)で示される化合物の脱アルコキシカルボニル化を行う構成を有する。 A method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a compound represented by the following general formula (II), which is an organic carboxylate of a tertiary amine And a compound in which dealkoxycarbonylation of the compound represented by the following general formula (II) is carried out in the presence of a halogenated salt.

Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012

(一般式(II)中、Zは、置換または無置換のアルキル基、シクロアルキル基、アリール基または複素環基を表し、ZおよびZは、独立に、水素原子、または置換もしくは無置換のアルキル基、シクロアルキル基、アリール基もしくは複素環基を表し、Rは、炭素数1~4のアルキル基を表す。ZおよびZは互いに結合していてもよい。) (In the general formula (II), Z 1 represents a substituted or unsubstituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and Z 3 and Z 2 independently represent a hydrogen atom, or a substituted or unsubstituted group. Represents a substituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and R 1 represents an alkyl group having 1 to 4 carbon atoms, and Z 1 and Z 2 may be bonded to each other.

Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013

(一般式(I)中、Z、ZおよびZは、それぞれ上記一般式(II)のZ、ZおよびZと同じである。) (In general formula (I), Z 1 , Z 2 and Z 3 are the same as Z 1 , Z 2 and Z 3 in general formula (II), respectively.)

 本発明に係るカルボニル化合物の製造方法により、β-ケトエステル化合物からカルボニル化合物を安価に、かつ収率良く製造することができる。 By the method for producing a carbonyl compound according to the present invention, a carbonyl compound can be produced from a β-ketoester compound at a low cost and in a high yield.

 本発明者らが鋭意検討を行った結果、ヒドロキシ基が保護された1-ベンジル-3,3-ビス(ヒドロキシメチル)-2-オキソシクロペンタンカルボン酸アルキルエステル誘導体からヒドロキシ基が保護された5-ベンジル-2,2-ビス(ヒドロキシメチル)シクロペンタノン誘導体を得る製造工程において、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて反応を行うことにより、ヒドロキシ基が保護された5-ベンジル-2,2-ビス(ヒドロキシメチル)シクロペンタノン誘導体の収率が向上することを見出すとともに、他のβ-ケトエステル化合物を用いた反応においてもカルボニル化合物を安価に、かつ収率良く製造できることを見出し、本発明を完成させるに至った。 As a result of intensive studies by the present inventors, the hydroxy group was protected from a 1-benzyl-3,3-bis (hydroxymethyl) -2-oxocyclopentanecarboxylic acid alkyl ester derivative in which the hydroxy group was protected. -In the production process of obtaining a benzyl-2,2-bis (hydroxymethyl) cyclopentanone derivative, by performing a reaction using (a) an organic carboxylate of a tertiary amine, and (b) a halogenated salt. The yield of 5-benzyl-2,2-bis (hydroxymethyl) cyclopentanone derivatives protected with a hydroxy group was found to be improved, and carbonyl compounds were also used in reactions using other β-ketoester compounds. It has been found that it can be produced at a low cost and with a high yield, and the present invention has been completed.

 以下、本発明に係るカルボニル化合物の製造方法の一実施形態について説明する。 Hereinafter, an embodiment of a method for producing a carbonyl compound according to the present invention will be described.

 本発明に係るカルボニル化合物の製造方法は、下記一般式(II)で示されるβ-ケトエステル化合物(以下、化合物(II)という)から下記一般式(I)で示されるカルボニル化合物を製造する方法であって、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、化合物(II)の脱アルコキシカルボニル化を行うことにより、一般式(I)で示されるカルボニル化合物を得る方法である。 The method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a β-ketoester compound represented by the following general formula (II) (hereinafter referred to as compound (II)). In the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt, the compound (II) is subjected to dealkoxycarbonylation, which is represented by the general formula (I). This is a method for obtaining a carbonyl compound.

Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014

 ここで、Zは、アルキル基、シクロアルキル基、アリール基または複素環基を表しており、当該アルキル基、シクロアルキル基、アリール基および複素環基は、置換基を有していてもよい。 Here, Z 1 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group may have a substituent. .

 Zにおけるアルキル基の炭素数に特に制限はないが、当該アルキル基としては、例えば、炭素数1~8のアルキル基を挙げることができる。炭素数1~8のアルキル基としては、例えば、メチル基、エチル基、(1-メチル)エチル基、n-プロピル基、1-メチルプロピル基、2-メチルプロピル基、1,1-ジメチルエチル基、n-ブチル基、n-ペンチル基、n-へキシル基、n-ヘプチル基およびn-オクチル基等を挙げることができる。 The number of carbon atoms of the alkyl group in Z 1 is not particularly limited, and examples of the alkyl group include alkyl groups having 1 to 8 carbon atoms. Examples of the alkyl group having 1 to 8 carbon atoms include a methyl group, an ethyl group, a (1-methyl) ethyl group, an n-propyl group, a 1-methylpropyl group, a 2-methylpropyl group, and 1,1-dimethylethyl. Group, n-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group and the like.

 Zにおけるシクロアルキル基の環を構成する炭素数に特に制限はないが、当該シクロアルキル基としては、例えば、炭素数3~6のシクロアルキル基を挙げることができる。炭素数3~6のシクロアルキル基としては、例えば、シクロプロピル基、シクロブチル基、シクロペンチル基およびシクロヘキシル基等を挙げることができる。 The number of carbon atoms constituting the ring of the cycloalkyl group in Z 1 is not particularly limited, and examples of the cycloalkyl group include cycloalkyl groups having 3 to 6 carbon atoms. Examples of the cycloalkyl group having 3 to 6 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.

 Zにおけるアリール基としては、例えば、フェニル基、ナフチル基、インデン基、アズレン基およびジフェニル基等を挙げることができる。 Examples of the aryl group in Z 1 include a phenyl group, a naphthyl group, an indene group, an azulene group, and a diphenyl group.

 Zにおける複素環基の環を構成する原子数に特に制限はなく、当該複素環基としては、例えば、3~6員の脂肪族複素環基および5~6員の芳香族複素環基等を挙げることができる。3~6員の脂肪族複素環を構成する複素環としては、例えば、アゼチジン、アジリジン、ピペリジン、ピペラジン、モルホリン、ピロリジン、オキセタン、テトラヒドロフランおよびテトラヒドロピラン等を挙げることができる。また、5~6員の芳香族複素環基を構成する複素環としては、例えば、チオフェン、ピリジン、チアゾール、フラン、ピロール、オキサゾール、イソキサゾール、イソチアゾール、トリアゾール、フラサン、イミダゾール、ピラゾール、ピラジン、ピリミジン、トリアジンおよびピリダジン等を挙げることができる。また、Zにおける複素環基として、インドール、ベンゾフラン、ベンゾチオフェン、キノリンおよびキノキサリン等の縮合したヘテロ環等も挙げられる。 There is no particular limitation on the number of atoms constituting the ring of the heterocyclic group in Z 1. Examples of the heterocyclic group include 3 to 6-membered aliphatic heterocyclic groups and 5 to 6-membered aromatic heterocyclic groups. Can be mentioned. Examples of the heterocyclic ring constituting the 3- to 6-membered aliphatic heterocyclic ring include azetidine, aziridine, piperidine, piperazine, morpholine, pyrrolidine, oxetane, tetrahydrofuran and tetrahydropyran. Examples of the heterocyclic ring constituting the 5- to 6-membered aromatic heterocyclic group include thiophene, pyridine, thiazole, furan, pyrrole, oxazole, isoxazole, isothiazole, triazole, furasan, imidazole, pyrazole, pyrazine, and pyrimidine. , Triazine and pyridazine. In addition, examples of the heterocyclic group in Z 1 include condensed heterocyclic rings such as indole, benzofuran, benzothiophene, quinoline, and quinoxaline.

 Zにおけるアルキル基、シクロアルキル基、アリール基および複素環基が有し得る置換基としては、ハロゲン原子、脂肪族炭化水素基、芳香族炭化水素基、芳香族複素環基、1以上の水素原子が芳香族炭化水素基または芳香族複素環基で置換された脂肪族炭化水素基、アルコキシ基、アルキルカルボニルアルキル基、アミド基、シアノ基およびニトロ基等を挙げることができる。また、これら置換基における水素原子は、さらに、ハロゲン原子、ヒドロキシ基、アルコキシ基、アルキル基、ハロアルキル基、芳香族炭化水素基または芳香族複素環基等によって置換されていてもよい。さらに当該ヒドロキシ基は、ヒドロキシ基を保護する保護基によって保護されていてもよい。 Examples of the substituent that the alkyl group, cycloalkyl group, aryl group and heterocyclic group in Z 1 may have include a halogen atom, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, an aromatic heterocyclic group, one or more hydrogen atoms Examples thereof include an aliphatic hydrocarbon group in which an atom is substituted with an aromatic hydrocarbon group or an aromatic heterocyclic group, an alkoxy group, an alkylcarbonylalkyl group, an amide group, a cyano group, and a nitro group. Further, the hydrogen atom in these substituents may be further substituted with a halogen atom, a hydroxy group, an alkoxy group, an alkyl group, a haloalkyl group, an aromatic hydrocarbon group, an aromatic heterocyclic group or the like. Further, the hydroxy group may be protected by a protecting group that protects the hydroxy group.

 ZおよびZは、独立に、水素原子、アルキル基、シクロアルキル基、アリール基または複素環基を表しており、当該アルキル基、シクロアルキル基、アリール基および複素環基は、置換基を有していてもよい。ZおよびZにおけるアルキル基、シクロアルキル基、アリール基および複素環基、ならびに当該アルキル基、シクロアルキル基、アリール基および複素環基が有し得る置換基としては、それぞれ、Zにおけるアルキル基、シクロアルキル基、アリール基および複素環基、ならびに当該アルキル基、シクロアルキル基、アリール基および複素環基が有し得る置換基と同じものを例示することができる。 Z 2 and Z 3 independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group each represent a substituent. You may have. The alkyl group, cycloalkyl group, aryl group, and heterocyclic group in Z 2 and Z 3 , and the substituent that the alkyl group, cycloalkyl group, aryl group, and heterocyclic group may have are each alkyl in Z 1 Examples thereof include the same groups as the substituents that the group, cycloalkyl group, aryl group and heterocyclic group, and the alkyl group, cycloalkyl group, aryl group and heterocyclic group may have.

 ZおよびZは互いに同じであってもよいし、互いに異なっていてもよい。 Z 2 and Z 3 may be the same as each other or different from each other.

 ZおよびZは互いに結合して、Zが結合している炭素原子およびZが結合している炭素原子とともに、環を形成していてもよい。 Z 1 and Z 2 may be bonded to each other to form a ring together with the carbon atom to which Z 1 is bonded and the carbon atom to which Z 2 is bonded.

 Rは炭素数1~4のアルキル基を表している。炭素数1~4のアルキル基としては、例えば、メチル基、エチル基、(1-メチル)エチル基、n-プロピル基、1-メチルプロピル基、2-メチルプロピル基、n-ブチル基および1,1-ジメチルエチル基等を挙げることができる。 R 1 represents an alkyl group having 1 to 4 carbon atoms. Examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, (1-methyl) ethyl group, n-propyl group, 1-methylpropyl group, 2-methylpropyl group, n-butyl group and 1 , 1-dimethylethyl group and the like.

 第3級アミンの有機カルボン酸塩を形成させる第3級アミンとしては、例えば、トリメチルアミン、トリエチルアミン、エチルジメチルアミン、トリ-n-プロピルアミン、トリイソプロピルアミン、トリ-n-ブチルアミン、トリイソブチルアミン、トリ-sec-ブチルアミン、トリ-tert-ブチルアミン、トリ-n-ペンチルアミン、トリ-n-ヘキシルアミン、トリ-n-オクチルアミン、ジエチルイソプロピルアミン、ジイソプロピルエチルアミン、トリシクロプロピルアミン、トリシクロブチルアミン、テトラメチルエチレンジアミン、トリシクロペンチルアミンおよびトリシクロヘキシルアミン等の脂肪族アミン類;N-メチルピロリジン、N-エチルピロリジン、N-メチルピペリジン、N-エチルピペリジン、N-n-ブチルピペリジン、N-メチルヘキサメチレンイミン、N-エチルヘキサメチレンイミン、N-メチルモルホリン、N-エチルモルホリン、N-ブチルモルホリン、N,N’-ジメチルピペラジン、N,N’-ジエチルピペラジン、1,5-ジアザビシクロ[4.3.1]ノ-5-ネン、1,4-ジアザビシクロ[2.2.2]オクタンおよび1,8-ジアザビシクロ[5.4.0]ウンデ-7-セン等の含窒素複素環式脂肪族アミン類;ならびに、ピリジン、コリジン、ピコリンおよびルチジン等の含窒素複素環式芳香族アミン類等を挙げることができる。中でも、トリエチルアミン、トリメチルアミン、エチルジメチルアミン、N-メチルピロリジン、ピリジン、コリジンまたはピコリンであることが好ましく、トリエチルアミン、トリメチルアミン、ピリジンまたはピコリンであることがより好ましく、トリエチルアミンまたはピリジンであることがさらに好ましく、トリエチルアミンであることが特に好ましい。 Examples of the tertiary amine that forms the organic carboxylate of tertiary amine include trimethylamine, triethylamine, ethyldimethylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, Tri-sec-butylamine, tri-tert-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-octylamine, diethylisopropylamine, diisopropylethylamine, tricyclopropylamine, tricyclobutylamine, tetra Aliphatic amines such as methylethylenediamine, tricyclopentylamine and tricyclohexylamine; N-methylpyrrolidine, N-ethylpyrrolidine, N-methylpiperidine, N-ethylpiperidine, N- -Butylpiperidine, N-methylhexamethyleneimine, N-ethylhexamethyleneimine, N-methylmorpholine, N-ethylmorpholine, N-butylmorpholine, N, N'-dimethylpiperazine, N, N'-diethylpiperazine, 1 , 5-diazabicyclo [4.3.1] no-5-ene, 1,4-diazabicyclo [2.2.2] octane, 1,8-diazabicyclo [5.4.0] unde-7-cene, etc. And nitrogen-containing heterocyclic aliphatic amines; and nitrogen-containing heterocyclic aromatic amines such as pyridine, collidine, picoline and lutidine. Among them, triethylamine, trimethylamine, ethyldimethylamine, N-methylpyrrolidine, pyridine, collidine or picoline is preferable, triethylamine, trimethylamine, pyridine or picoline is more preferable, and triethylamine or pyridine is more preferable. Particularly preferred is triethylamine.

 第3級アミンの有機カルボン酸塩を構成する有機カルボン酸としては、有機モノカルボン酸が好ましく、飽和または不飽和の脂肪族モノカルボン酸がより好ましく、飽和脂肪族モノカルボン酸がさらに好ましい。飽和脂肪族カルボン酸の炭素数は、1~8であることが好ましく、1~4であることがより好ましい。有機カルボン酸の例としては、例えば、ギ酸、酢酸、プロピオン酸、酪酸、イソ酪酸、吉草酸およびイソ吉草酸等を挙げることができる。中でも、ギ酸、酢酸およびプロピオン酸が好ましく、酢酸が特に好ましい。 The organic carboxylic acid constituting the organic carboxylate of the tertiary amine is preferably an organic monocarboxylic acid, more preferably a saturated or unsaturated aliphatic monocarboxylic acid, and even more preferably a saturated aliphatic monocarboxylic acid. The saturated aliphatic carboxylic acid preferably has 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. Examples of the organic carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, and isovaleric acid. Among these, formic acid, acetic acid and propionic acid are preferable, and acetic acid is particularly preferable.

 以上より、第3級アミンの有機カルボン酸塩の好適な具体例としては、トリメチルアミンの酢酸塩、トリエチルアミンのギ酸塩、トリエチルアミンの酢酸塩、トリエチルアミンのプロピオン酸塩、ピリジンの酢酸塩、2-ピコリンの酢酸塩、3-ピコリンの酢酸塩および4-ピコリンの酢酸塩等を挙げることができる。中でも、トリエチルアミンの酢酸塩またはピリジンの酢酸塩であることが好ましい。 From the above, preferred specific examples of the tertiary amine organic carboxylates include trimethylamine acetate, triethylamine formate, triethylamine acetate, triethylamine propionate, pyridine acetate, 2-picoline Examples thereof include acetate, acetate of 3-picoline and acetate of 4-picoline. Of these, triethylamine acetate or pyridine acetate is preferred.

 第3級アミンの有機カルボン酸塩の量は、化合物(II)に対して、例えば、0.3~10倍モルであり、好適には0.5~5倍モルであり、より好適には0.8~3倍モルである。 The amount of the organic amine salt of the tertiary amine is, for example, 0.3 to 10 times mol, preferably 0.5 to 5 times mol, more preferably the compound (II). 0.8-3 moles.

 第3級アミンの有機カルボン酸塩は、第3級アミンと有機カルボン酸とを反応系に加えることにより生成させることができる。第3級アミンおよび有機カルボン酸の添加は、第3級アミンおよび有機カルボン酸を別々に反応系に加える場合に限らず、第3級アミンと有機カルボン酸とを予め混合したものを反応系に加えてもよい。第3級アミンと有機カルボン酸との混合比は1:1であればよい。しかしながら、後述する化合物(IIc)および化合物(IId)等のように、酸性条件下の反応では収率が低下することが予想される化合物について反応を行う場合には、有機カルボン酸が過剰になって反応系が酸性になることを防ぐために、第3級アミンを有機カルボン酸よりも多く用いることが好ましい。この場合、例えば、第3級アミンの量を、有機カルボン酸に対して、1.01~5倍モルとすることが好ましく、1.05~2倍モルとすることがより好ましい。 An organic carboxylate of a tertiary amine can be generated by adding a tertiary amine and an organic carboxylic acid to the reaction system. The addition of the tertiary amine and the organic carboxylic acid is not limited to the case where the tertiary amine and the organic carboxylic acid are separately added to the reaction system, and the reaction system is prepared by mixing a tertiary amine and the organic carboxylic acid in advance. May be added. The mixing ratio of the tertiary amine and the organic carboxylic acid may be 1: 1. However, when the reaction is carried out on a compound whose yield is expected to decrease in the reaction under acidic conditions, such as compound (IIc) and compound (IId) described later, the organic carboxylic acid becomes excessive. In order to prevent the reaction system from becoming acidic, it is preferable to use more tertiary amine than organic carboxylic acid. In this case, for example, the amount of the tertiary amine is preferably 1.01 to 5 times mol and more preferably 1.05 to 2 times mol with respect to the organic carboxylic acid.

 ハロゲン化塩としては、ハロゲン化物イオンを系内に供給できれば、特に制限はなく、例えば、第4級アンモニウム塩、アルカリ金属塩、アルカリ土類金属塩、および遷移金属塩等のその他の金属塩を挙げることができる。中でも、第4級アンモニウム塩およびアルカリ金属塩が好ましい。 The halide salt is not particularly limited as long as halide ions can be supplied into the system. For example, other metal salts such as quaternary ammonium salts, alkali metal salts, alkaline earth metal salts, and transition metal salts can be used. Can be mentioned. Of these, quaternary ammonium salts and alkali metal salts are preferred.

 ハロゲン化第4級アンモニウム塩に制限はなく、ハロゲン化第4級アンモニウム塩を構成する第4級アンモニウムカチオンの窒素原子に結合している基としては、アルキル基、置換もしくは無置換のアラルキル基(アリールアルキル基)、および置換もしくは無置換のアリール基が挙げられ、互いに同一の基でもよいし、異なる基でもよい。また、アルキル基の炭素数に制限はなく、例えば、炭素数1~8であり、好ましくは、1~4であり、より好ましくは、1~2である。またアラルキル基である場合、アルキル部の炭素数は例えば1~5であり、好ましくは、1~2である。アラルキル基のアリール部は、例えば炭素数6~14のアリールであり、中でもフェニル基が好ましい。また、アリール基としては、炭素数6~14のアリール基が好ましく、フェニル基がより好ましい。アラルキル基およびアリール基が有し得る置換基としては、反応に影響しなければ特に制限はないが、例えば、ハロゲン原子、アルキル基、アルコキシ基、フェニル基、シアノ基またはニトロ基が挙げられる。 The halogenated quaternary ammonium salt is not limited, and examples of the group bonded to the nitrogen atom of the quaternary ammonium cation constituting the halogenated quaternary ammonium salt include an alkyl group, a substituted or unsubstituted aralkyl group ( Arylalkyl group) and a substituted or unsubstituted aryl group, and the same or different groups may be used. Further, the carbon number of the alkyl group is not limited, and is, for example, 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms, and more preferably 1 to 2 carbon atoms. In the case of an aralkyl group, the alkyl moiety has, for example, 1 to 5 carbon atoms, preferably 1 to 2 carbon atoms. The aryl part of the aralkyl group is, for example, an aryl having 6 to 14 carbon atoms, and a phenyl group is particularly preferable. As the aryl group, an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable. The substituent that the aralkyl group and aryl group may have is not particularly limited as long as it does not affect the reaction, and examples thereof include a halogen atom, an alkyl group, an alkoxy group, a phenyl group, a cyano group, and a nitro group.

 置換基としてのハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子を挙げることができる。 Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

 置換基としてのアルキル基としては、例えば、炭素数1~4のアルキル基が挙げられ、具体的には、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基およびtert-ブチル基が挙げられる。中でも、炭素数1~3のアルキル基が好ましく、炭素数1~2のアルキル基がより好ましく、メチル基がさらに好ましい。 Examples of the alkyl group as a substituent include an alkyl group having 1 to 4 carbon atoms, and specifically include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, and sec-butyl group and tert-butyl group. Among them, an alkyl group having 1 to 3 carbon atoms is preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, and a methyl group is further preferable.

 置換基としてのアルコキシ基としては、例えば、炭素数1~4のアルコキシ基が挙げられ、具体的には、メトキシ基、エトキシ基およびn-プロポキシ基等が挙げられる。 Examples of the alkoxy group as a substituent include an alkoxy group having 1 to 4 carbon atoms, and specific examples include a methoxy group, an ethoxy group, and an n-propoxy group.

 ハロゲン化第4級アンモニウム塩を構成するハロゲン化物イオンとしては、フッ化物イオン、塩化物イオン、臭化物イオンおよびヨウ化物イオンを挙げることができる。中でも、フッ化物イオン、塩化物イオンおよび臭化物イオンが好ましく、塩化物イオンおよび臭化物イオンがより好ましい。 Examples of the halide ions constituting the halogenated quaternary ammonium salt include fluoride ions, chloride ions, bromide ions, and iodide ions. Of these, fluoride ion, chloride ion and bromide ion are preferable, and chloride ion and bromide ion are more preferable.

 ハロゲン化第4級アンモニウム塩の中でも、有機溶媒に対する溶解度が比較的高いという点で、下記一般式(III)で示される第4級アンモニウム塩をより好ましい化合物として挙げることができる。 Among the halogenated quaternary ammonium salts, a quaternary ammonium salt represented by the following general formula (III) can be mentioned as a more preferable compound in terms of relatively high solubility in an organic solvent.

Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015

 一般式(III)中、R~Rは、独立に、アルキル基、置換もしくは無置換のアラルキル基、または置換もしくは無置換のアリール基を表している。 In general formula (III), R 2 to R 5 independently represent an alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group.

 アルキル基としては、炭素数1~8のアルキル基が好ましく、炭素数1~4のアルキル基がより好ましく、炭素数1~2アルキル基が特に好ましい。 The alkyl group is preferably an alkyl group having 1 to 8 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably an alkyl group having 1 to 2 carbon atoms.

 アラルキル基としては、アルキル部の炭素数が1~5であるアラルキル基が好ましく、アルキル部の炭素数が1~2であるアラルキル基がより好ましい。アラルキル基におけるアリールとしては、炭素数6~14のアリール基が好ましく、フェニル基がより好ましい。 The aralkyl group is preferably an aralkyl group having 1 to 5 carbon atoms in the alkyl portion, and more preferably an aralkyl group having 1 to 2 carbon atoms in the alkyl portion. As the aryl in the aralkyl group, an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable.

 アリール基としては、炭素数6~14のアリール基が好ましく、フェニル基がより好ましい。 As the aryl group, an aryl group having 6 to 14 carbon atoms is preferable, and a phenyl group is more preferable.

 アラルキル基およびアリール基が有し得る置換基としては、上述した置換基を挙げることができる。 Examples of the substituent that the aralkyl group and aryl group may have include the substituents described above.

 一般式(III)中、Lは、ハロゲン化物イオンを表しており、好ましくは、フッ化物イオン、塩化物イオンまたは臭化物イオン、より好ましくは、塩化物イオンまたは臭化物イオンである。 In the general formula (III), L represents a halide ion, preferably a fluoride ion, a chloride ion or a bromide ion, and more preferably a chloride ion or a bromide ion.

 一般式(III)で示される第4級アンモニウム塩のより好ましい形態としては、一般式(III)中、R~Rが、独立に、炭素数1~4のアルキル基、置換もしくは無置換のベンジル基、または置換もしくは無置換のフェニル基であり、Lが、塩化物イオンまたは臭化物イオンである第4級アンモニウム塩が挙げられる。また、一般式(III)で示される第4級アンモニウム塩のさらに好ましい形態としては、一般式(III)中、R~Rが、独立に、炭素数1~4のアルキル基であり、Lが、塩化物イオンまたは臭化物イオンである第4級アンモニウム塩が挙げられる。 As a more preferable form of the quaternary ammonium salt represented by the general formula (III), in the general formula (III), R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, substituted or unsubstituted. And a quaternary ammonium salt which is a substituted or unsubstituted phenyl group, and L is a chloride ion or a bromide ion. Further, as a more preferable form of the quaternary ammonium salt represented by the general formula (III), in the general formula (III), R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, Quaternary ammonium salts in which L is a chloride ion or a bromide ion can be mentioned.

 本反応を達成するためには、反応系内にハロゲン化物イオンを供給することが達成されればよく、ハロゲン化第4級アンモニウム塩の種類に、特に制限はない。ハロゲン化第4級アンモニウム塩の具体例としては、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムブロミド、テトラエチルアンモニウムクロリド、テトラエチルアンモニウムブロミド、テトラエチルアンモニウムアイオダイド、メチルトリエチルアンモニウムクロリド、メチルトリエチルアンモニウムブロミド、エチルトリメチルアンモニウムクロリド、エチルトリメチルアンモニウムブロミド、ベンジルトリメチルアンモニウムクロリド、ベンジルトリメチルアンモニウムブロミド、ベンジルトリエチルアンモニウムクロリド、ベンジルトリエチルアンモニウムブロミド、(4-クロロベンジル)トリメチルアンモニウムクロリド、(4-クロロベンジル)ベンジルトリメチルアンモニウムブロミド、(4-メチルベンジル)ベンジルトリメチルアンモニウムクロリド、(4-メチルベンジル)ベンジルトリメチルアンモニウムブロミド、フェニルトリメチルアンモニウムクロリド、フェニルトリメチルアンモニウムブロミド、フェニルトリエチルアンモニウムクロリド、およびフェニルトリエチルアンモニウムブロミド等を挙げることができる。中でも、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムブロミド、テトラエチルアンモニウムクロリド、テトラエチルアンモニウムブロミド、ベンジルトリメチルアンモニウムクロリド、ベンジルトリメチルアンモニウムブロミド、ベンジルトリエチルアンモニウムクロリド、ベンジルトリエチルアンモニウムブロミド、フェニルトリメチルアンモニウムクロリド、およびフェニルトリメチルアンモニウムブロミド等が好ましく、低コストであるという観点から、テトラメチルアンモニウムクロリド、テトラメチルアンモニウムブロミド、テトラエチルアンモニウムクロリド、およびテトラエチルアンモニウムブロミドがより好ましい。 In order to achieve this reaction, it is only necessary to supply halide ions into the reaction system, and the type of halogenated quaternary ammonium salt is not particularly limited. Specific examples of halogenated quaternary ammonium salts include tetramethylammonium chloride, tetramethylammonium bromide, tetraethylammonium chloride, tetraethylammonium bromide, tetraethylammonium iodide, methyltriethylammonium chloride, methyltriethylammonium bromide, ethyltrimethylammonium chloride. , Ethyltrimethylammonium bromide, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyltriethylammonium chloride, benzyltriethylammonium bromide, (4-chlorobenzyl) trimethylammonium chloride, (4-chlorobenzyl) benzyltrimethylammonium bromide, (4- Methylben Le) benzyltrimethylammonium chloride, mention may be made of (4-methylbenzyl) benzyl bromide, phenyl trimethyl ammonium chloride, phenyl trimethyl ammonium bromide, phenyl triethylammonium chloride, and phenyl triethylammonium bromide and the like. Among them, tetramethylammonium chloride, tetramethylammonium bromide, tetraethylammonium chloride, tetraethylammonium bromide, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyltriethylammonium chloride, benzyltriethylammonium bromide, phenyltrimethylammonium chloride, and phenyltrimethylammonium bromide From the viewpoint of low cost, tetramethylammonium chloride, tetramethylammonium bromide, tetraethylammonium chloride, and tetraethylammonium bromide are more preferable.

 また、上述した有機カルボン酸塩を形成させる第3級アミンのハロゲン化水素塩を加えることで、ハロゲン化第4級アンモニウム塩を反応系内で発生させ、使用することも可能である。第3級アミンのハロゲン化水素塩の作用によってアルコキシカルボニル基の脱アルキル化が進行する際、ハロゲン化アルキルが生成する。これと系内に存在する第3級アミンとが反応してハロゲン化第4級アンモニウム塩を系内で与えるのである。この際、使用される第3級アミンの種類に特に制限はないが、汎用的に使用できるという観点から、安価なトリエチルアミン、トリメチルアミン、ピリジンまたはピコリンが好ましい。また、ハロゲン化水素塩を形成するハロゲン化水素としては、フッ化水素、塩化水素、臭化水素、ヨウ化水素を挙げることができ、中でも、塩化水素および臭化水素が好ましい。 Further, by adding a hydrogen halide salt of a tertiary amine that forms the organic carboxylate described above, a halogenated quaternary ammonium salt can be generated in the reaction system and used. When the dealkylation of the alkoxycarbonyl group proceeds by the action of the tertiary amine hydrogen halide salt, an alkyl halide is produced. This reacts with the tertiary amine present in the system to give a halogenated quaternary ammonium salt in the system. In this case, the type of tertiary amine to be used is not particularly limited, but inexpensive triethylamine, trimethylamine, pyridine or picoline is preferable from the viewpoint that it can be used for general purposes. Further, examples of the hydrogen halide forming the hydrogen halide salt include hydrogen fluoride, hydrogen chloride, hydrogen bromide, and hydrogen iodide. Among them, hydrogen chloride and hydrogen bromide are preferable.

 ハロゲン化アルカリ金属塩を構成するアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウムおよびセシウムを挙げることができる。中でも、リチウム、ナトリウムおよびカリウムがより好ましい。 Examples of the alkali metal constituting the alkali metal halide salt include lithium, sodium, potassium, rubidium and cesium. Among these, lithium, sodium and potassium are more preferable.

 一方、ハロゲン化アルカリ金属塩を構成するハロゲン化物イオンとしては、フッ化物イオン、塩化物イオン、臭化物イオンおよびヨウ化物イオンを挙げることができる。 On the other hand, examples of the halide ions constituting the alkali metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.

 ハロゲン化アルカリ金属塩の具体例としては、塩化リチウム、臭化リチウム、ヨウ化リチウム、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウム、塩化カリウム、臭化カリウム、ヨウ化カリウム、塩化ルビジウム、臭化ルビジウム、ヨウ化ルビジウム、塩化セシウム、臭化セシウムおよびヨウ化セシウムを挙げることができる。中でも、塩化リチウム、臭化リチウム、ヨウ化リチウム、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウム、塩化カリウム、臭化カリウムおよびヨウ化カリウムが好ましく、塩化リチウム、臭化リチウム、ヨウ化リチウム、臭化ナトリウムおよび臭化カリウムがより好ましい。 Specific examples of alkali metal halides include lithium chloride, lithium bromide, lithium iodide, sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide, potassium iodide, rubidium chloride, rubidium bromide. And rubidium iodide, cesium chloride, cesium bromide and cesium iodide. Among these, lithium chloride, lithium bromide, lithium iodide, sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide and potassium iodide are preferable, and lithium chloride, lithium bromide, lithium iodide, bromide Sodium and potassium bromide are more preferred.

 ハロゲン化アルカリ土類金属塩を構成するアルカリ土類金属としては、ベリリウム、マグネシウム、カルシウム、ストロンチウムおよびバリウムを挙げることができる。 Examples of the alkaline earth metal constituting the alkaline earth metal halide salt include beryllium, magnesium, calcium, strontium and barium.

 一方、ハロゲン化アルカリ土類金属塩を構成するハロゲン化物イオンとしては、フッ化物イオン、塩化物イオン、臭化物イオンおよびヨウ化物イオンを挙げることができる。 On the other hand, examples of the halide ions constituting the alkaline earth metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.

 ハロゲン化アルカリ土類金属塩の具体例としては、塩化マグネシウム、臭化マグネシウム、ヨウ化マグネシウム、塩化カルシウム、臭化カルシウム、ヨウ化カルシウム、塩化ストロンチウム、臭化ストロンチウム、塩化バリウムおよび臭化バリウムを挙げることができる。 Specific examples of the alkaline earth metal halide salt include magnesium chloride, magnesium bromide, magnesium iodide, calcium chloride, calcium bromide, calcium iodide, strontium chloride, strontium bromide, barium chloride and barium bromide. be able to.

 ハロゲン化アルカリ金属塩およびハロゲン化アルカリ土類金属塩以外のハロゲン化金属塩を構成する金属としては、一価または二価の陽イオンとなる金属が好ましく、例えば、銅および銀等の遷移金属ならびに亜鉛等を挙げることができる。 The metal constituting the halogenated metal salt other than the alkali metal halide salt and the alkaline earth metal halide salt is preferably a metal that becomes a monovalent or divalent cation, for example, transition metals such as copper and silver, and Zinc etc. can be mentioned.

 一方、ハロゲン化金属塩を構成するハロゲン化物イオンとしては、フッ化物イオン、塩化物イオン、臭化物イオンおよびヨウ化物イオンを挙げることができる。 On the other hand, examples of the halide ions constituting the metal halide salt include fluoride ions, chloride ions, bromide ions, and iodide ions.

 ハロゲン化アルカリ金属塩およびハロゲン化アルカリ土類金属塩以外のハロゲン化金属塩の具体例としては、塩化銅、臭化銅、ヨウ化銅、塩化亜鉛、臭化亜鉛、塩化銀および臭化銀等を挙げることができる。 Specific examples of metal halide salts other than alkali metal halide salts and alkaline earth metal halide salts include copper chloride, copper bromide, copper iodide, zinc chloride, zinc bromide, silver chloride and silver bromide. Can be mentioned.

 ハロゲン化塩は、それぞれ、1種類の化合物のみを用いてもよいし、複数の化合物を組みあわせて用いてもよい。また、ハロゲン化第4級アンモニウム塩、第3級アミンのハロゲン化水素塩、ハロゲン化アルカリ金属塩、ハロゲン化アルカリ土類金属塩、およびその他のハロゲン化金属塩を組み合わせて用いてもよく、例えば、ハロゲン化第4級アンモニウム塩およびハロゲン化アルカリ金属塩の両方を組み合わせて用いてもよい。なお、収率の観点からは、ハロゲン化第4級アンモニウム塩を用いることが好ましい。 As the halogenated salt, only one kind of compound may be used, or a plurality of compounds may be used in combination. Further, halogenated quaternary ammonium salts, tertiary amine hydrogen halide salts, halogenated alkali metal salts, halogenated alkaline earth metal salts, and other metal halide salts may be used in combination. A combination of both a halogenated quaternary ammonium salt and a halogenated alkali metal salt may be used. From the viewpoint of yield, it is preferable to use a halogenated quaternary ammonium salt.

 ハロゲン化塩の量(複数の化合物を含む場合には、その総量)は、化合物(II)に対して、例えば、0.01~10倍モルであり、好適には、0.02~3倍モルであり、より好適には、0.05~1倍モルである。 The amount of the halogenated salt (the total amount when a plurality of compounds are included) is, for example, 0.01 to 10 times mol, preferably 0.02 to 3 times the amount of compound (II). The molar ratio is more preferably 0.05 to 1 times.

 脱アルコキシカルボニル化の反応は溶媒中で行ってもよい。溶媒は、反応に関与しなければ特に制限されず、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミドおよびN-メチル-2-ピロリドン等のアミド類を好適に用いることができる。また、これらの溶媒にトルエン等の他の溶媒を加えて反応することも可能である。また、第3級アミンの有機カルボン酸塩が液体である場合には、それ自体を溶媒としても使用し、その他の溶媒を使用しない系で反応をおこなってもよい。 The dealkoxycarbonylation reaction may be carried out in a solvent. The solvent is not particularly limited as long as it does not participate in the reaction, and for example, amides such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methyl-2-pyrrolidone can be preferably used. It is also possible to react by adding other solvents such as toluene to these solvents. Moreover, when the organic carboxylate of a tertiary amine is a liquid, it may be used as a solvent itself and the reaction may be carried out in a system that does not use any other solvent.

 反応温度は、例えば、0~250℃であり、好適には室温~200℃であり、より好適には50~180℃であり、さらに好適には100~130℃である。反応温度が高温の場合は熱媒油を用いた加熱装置が必要であるが、130℃程度であれば安価なスチームを用いることが可能となる。これにより、設備投資およびランニングコストをより安く抑えることができるため、本発明に係るカルボニル化合物をより安価に製造することができる。 The reaction temperature is, for example, 0 to 250 ° C., preferably room temperature to 200 ° C., more preferably 50 to 180 ° C., and further preferably 100 to 130 ° C. When the reaction temperature is high, a heating device using a heat transfer oil is necessary, but if it is about 130 ° C., inexpensive steam can be used. Thereby, since capital investment and running cost can be suppressed more cheaply, the carbonyl compound according to the present invention can be produced at a lower cost.

 なお、本発明に係る製造方法においては、第3級アミンの有機カルボン酸塩およびハロゲン化塩の両方を使用することにより、例えば第3級アミンの有機カルボン酸塩のみを用いる場合と比較し、より低い反応温度で反応を行うことができる。また、反応時間は、例えば、0.05時間~数日であり、好適には0.1時間~5日であり、より好適には0.5時間~2日である。 In the production method according to the present invention, by using both an organic carboxylate and a halogenated salt of a tertiary amine, for example, compared with a case of using only an organic carboxylate of a tertiary amine, The reaction can be carried out at a lower reaction temperature. The reaction time is, for example, 0.05 hours to several days, preferably 0.1 hours to 5 days, and more preferably 0.5 hours to 2 days.

 なお、反応は不活性ガス下でなくても問題なく進行する。しかしながら、高温下、長時間の反応になると、使用するアミンの種類によっては、空気中で反応を進めると空気酸化を受け、反応液が着色する等、不具合が生ずる場合がある。そのような場合においては窒素およびアルゴン等の不活性ガス雰囲気下で反応を行う方がより好ましい。 It should be noted that the reaction proceeds without problems even if it is not under an inert gas. However, when the reaction is carried out at a high temperature for a long period of time, depending on the type of amine to be used, if the reaction proceeds in the air, air oxidation may occur and the reaction solution may be colored. In such a case, it is more preferable to carry out the reaction in an inert gas atmosphere such as nitrogen and argon.

 その他の反応条件は、当業者であれば、従来公知の製造方法を参照することにより、容易に設計および設定することができる。 Other reaction conditions can be easily designed and set by those skilled in the art by referring to conventionally known production methods.

 本明細書において「脱アルコキシカルボニル化」とは、-COが最終的に水素原子で置換されることをいう。β-ケトエステル化合物から-COが取り除かれ、カルボニル化合物が得られるという観点では、β-ケトエステル化合物の加水分解および脱炭酸と同じである。しかしながら、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化第4級アンモニウム塩またはハロゲン化アルカリ金属塩を用いた本発明に係る製造方法では水の非存在下で反応が進行するため、本発明における「脱アルコキシカルボニル化」は、水を必要とする加水分解を含む反応とは明確に区別される。なお、水が反応系中に存在すると、塩基を含む条件では水分子から水酸化物イオンが生じる場合があり、これにより非所望の副反応が生じる虞があるため、系内に水を含んでいないことが好ましい。 As used herein, “dealkoxycarbonylation” means that —CO 2 R 1 is finally replaced with a hydrogen atom. From the viewpoint that —CO 2 R 1 is removed from the β-ketoester compound to obtain a carbonyl compound, this is the same as the hydrolysis and decarboxylation of the β-ketoester compound. However, in the production method according to the present invention using (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated quaternary ammonium salt or an alkali metal halide salt, the reaction is carried out in the absence of water. As it proceeds, “dealkoxycarbonylation” in the present invention is clearly distinguished from reactions involving hydrolysis that require water. If water is present in the reaction system, hydroxide ions may be generated from water molecules under conditions containing a base, which may cause undesired side reactions. Preferably it is not.

 本発明に係る製造方法では、酸およびアルカリではなく、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて反応を行うため、中性または中性に近い条件下で反応を行うことができる。そのため、酸またはアルカリに対して不安定であり、酸性条件下または塩基性条件下では収率が低下することが予想される化合物においても、収率良く反応を行うことができる。 In the production method according to the present invention, the reaction is carried out using (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt instead of an acid and an alkali. The reaction can be carried out under Therefore, even a compound that is unstable with respect to an acid or an alkali and whose yield is expected to decrease under an acidic condition or a basic condition can be reacted with a high yield.

 本発明に係るカルボニル化合物の製造方法における脱アルコキシカルボニル化の反応機構としては、ハロゲン化塩としてハロゲン化第4級アンモニウム塩を例に挙げれば、例えば以下の2つの反応機構が推定される:
(反応機構1)
本反応機構では、第3級アミンのカルボン酸塩由来のカルボン酸と、ハロゲン化第4級アンモニウム塩由来のハロゲン化物イオンとから微量発生したハロゲン化水素により反応が進行する。化合物(II)におけるアルキルエステル基のアルキル基にハロゲン化水素のハロゲン原子が攻撃することにより、化合物(II)が脱アルキル化され、β-ケトカルボン酸が発生する。生成したβ-ケトカルボン酸の脱炭酸により一般式(I)で示される化合物が生成される。発生したハロゲン化アルキルは、系中の第3級アミンと反応し、ハロゲン化第4級アンモニウム塩が生成される。このことより、ハロゲン化物イオンは系内で再生されるので、ハロゲン化塩の量はアルキルエステル基に対して等モル以下でも問題なく反応が進行する。
(反応機構2)
ハロゲン化第4級アンモニウム塩のハロゲン化物イオンが化合物(II)のアルキルエステル基のアルキル基を攻撃してハロゲン化アルキルが発生するとともに、クラプコ型の脱炭酸反応が進行する。得られたケトン上に生成したアニオンは、系中のカルボン酸からプロトン供給を受け、一般式(I)で示される化合物が生成される。一方、発生したハロゲン化アルキルは、系中の第3級アミンと反応し、ハロゲン化第4級アンモニウム塩が生成される。このことより、ハロゲン化物イオンは系内で再生されるので、ハロゲン化塩の量はアルキルエステル基に対して等モル以下でも問題なく反応が進行する。
また、上記のように、反応機構1および2のどちらの場合でも、系内で発生するハロゲン化アルキルと第3級アミンの反応によりハロゲン化第4級アンモニウム塩が生成する。よって、ハロゲン化第4級アンモニウム塩以外のハロゲン化塩を用いたとしても、反応の進行に伴い、ハロゲン化第4級アンモニウム塩が共存する反応系になると考えられる。なお、反応系内に第3級アミンのハロゲン化水素塩を加えて反応を行う場合は、系内にハロゲン化水素が多く存在するので、反応速度の高まりが期待されるが、第3級アミンのハロゲン化水素塩量が多すぎると系内の酸性度も高まるので、酸に対して不安定な化合物に対して反応を行う場合は使用量に注意が必要である。使用量は当業者であれば、適宜選択することができる。
As the reaction mechanism of dealkoxycarbonylation in the method for producing a carbonyl compound according to the present invention, for example, the following two reaction mechanisms are presumed if a halogenated quaternary ammonium salt is taken as an example of the halogenated salt:
(Reaction mechanism 1)
In this reaction mechanism, the reaction proceeds by a small amount of hydrogen halide generated from a carboxylic acid derived from a tertiary amine carboxylate and a halide ion derived from a halogenated quaternary ammonium salt. When the halogen atom of the hydrogen halide attacks the alkyl group of the alkyl ester group in the compound (II), the compound (II) is dealkylated to generate β-ketocarboxylic acid. A compound represented by the general formula (I) is produced by decarboxylation of the produced β-ketocarboxylic acid. The generated alkyl halide reacts with a tertiary amine in the system to produce a halogenated quaternary ammonium salt. From this fact, since halide ions are regenerated in the system, the reaction proceeds without problems even when the amount of the halide salt is less than or equal to the alkyl ester group.
(Reaction mechanism 2)
The halide ion of the halogenated quaternary ammonium salt attacks the alkyl group of the alkyl ester group of the compound (II) to generate an alkyl halide, and a Clapco type decarboxylation reaction proceeds. The anion produced | generated on the obtained ketone receives a proton supply from the carboxylic acid in a system, and the compound shown by general formula (I) is produced | generated. On the other hand, the generated alkyl halide reacts with a tertiary amine in the system to produce a halogenated quaternary ammonium salt. From this fact, since halide ions are regenerated in the system, the reaction proceeds without problems even when the amount of the halide salt is less than or equal to the alkyl ester group.
Further, as described above, in both cases of Reaction Mechanisms 1 and 2, a halogenated quaternary ammonium salt is formed by the reaction of an alkyl halide generated in the system with a tertiary amine. Therefore, even if a halogenated salt other than the halogenated quaternary ammonium salt is used, it is considered that the reaction system coexists with the halogenated quaternary ammonium salt as the reaction proceeds. When the reaction is carried out by adding a tertiary amine hydrogen halide salt to the reaction system, the reaction rate is expected to increase because a large amount of hydrogen halide is present in the system. If the amount of the hydrogen halide salt is too large, the acidity in the system also increases, so that when using a compound that is unstable to acids, attention must be paid to the amount used. The amount used can be appropriately selected by those skilled in the art.

 しかしながら本発明に係るカルボニル化合物の製造方法は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて反応が進行する限り、その反応機構は、上述の反応機構および他の特定の反応機構に限定されるものではない。また、単一の反応機構により進行する場合に限らず、複数の反応機構により進行するものであってもよい。 However, as long as the reaction proceeds using (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt, the reaction mechanism of the carbonyl compound according to the present invention is the above reaction mechanism. And is not limited to other specific reaction mechanisms. Moreover, not only the case of progressing by a single reaction mechanism, but also progressing by a plurality of reaction mechanisms.

 なお、本発明に係るカルボニル化合物の製造方法においては、クラプコ脱炭酸が起こった場合に副生する、ケトンのα位がアルキル化された化合物は、生成されてこない。これは、反応機構1の場合は生じることはないが、反応機構2の場合であっても、系中にプロトン供給源があり、仮にケトンのα位にアニオンが発生したとしても速やかに中和されることによると考えられる。 In the method for producing a carbonyl compound according to the present invention, a compound in which the α-position of the ketone is alkylated, which is produced as a by-product when Clapco decarboxylation occurs, is not produced. This does not occur in the case of the reaction mechanism 1, but even in the case of the reaction mechanism 2, there is a proton supply source in the system, and even if an anion is generated at the α-position of the ketone, it is quickly neutralized. It is thought to be due to.

 本発明に係るカルボニル化合物の製造方法の好適な一態様は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、下記一般式(IIa)で示されるシクロペンタン環を有するβ-ケトエステル化合物(以下、化合物(IIa)という)を脱アルコキシカルボニル化させることにより、一般式(Ia)で示されるカルボニル化合物を得る、一般式(Ia)で示されるカルボニル化合物の製造方法である。 A preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIa) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt. A carbonyl compound represented by the general formula (Ia) is obtained by dealkoxycarbonylating a β-ketoester compound having a cyclopentane ring (hereinafter referred to as the compound (IIa)) to obtain a carbonyl compound represented by the general formula (Ia). It is a manufacturing method.

Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016

 ここで、Yは、炭素数1~6のアルキル基もしくはハロアルキル基、炭素数2~6のアルケニル基もしくはハロアルケニル基、炭素数2~6のアルキニル基もしくはハロアルキニル基、または該アルキル基、ハロアルキル基、アルケニル基、ハロアルケニル基、アルキニル基もしくはハロアルキニル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)に置換された基を表している。 Y represents an alkyl group or haloalkyl group having 1 to 6 carbon atoms, an alkenyl group or haloalkenyl group having 2 to 6 carbon atoms, an alkynyl group or haloalkynyl group having 2 to 6 carbon atoms, or the alkyl group, haloalkyl A group, an alkenyl group, a haloalkenyl group, an alkynyl group or a haloalkynyl group in which part of the hydrogen atoms is substituted with —OG (G represents a protecting group for a hydroxy group).

 炭素数1~6のアルキル基としては、例えば、メチル基、エチル基、(1-メチル)エチル基、n-プロピル基、1-メチルプロピル基、2-メチルプロピル基、n-ブチル基、1-メチルブチル基、2-メチルブチル基、1-エチルプロピル基および1,1-ジメチルエチル基等を挙げることができる。中でも、炭素数1~4のアルキル基が好ましく、メチル基およびエチル基がより好ましく、メチル基がさらに好ましい。 Examples of the alkyl group having 1 to 6 carbon atoms include methyl group, ethyl group, (1-methyl) ethyl group, n-propyl group, 1-methylpropyl group, 2-methylpropyl group, n-butyl group, 1 -Methylbutyl group, 2-methylbutyl group, 1-ethylpropyl group, 1,1-dimethylethyl group and the like can be mentioned. Among these, an alkyl group having 1 to 4 carbon atoms is preferable, a methyl group and an ethyl group are more preferable, and a methyl group is further preferable.

 炭素数1~6のハロアルキル基としては、クロロメチル基、ジクロロメチル基、トリクロロメチル基、2-クロロエチル基、1-クロロエチル基、2,2-ジクロロエチル基、1,2-ジクロロエチル基、2,2,2-トリクロロエチル基、3-クロロプロピル基、2,3-ジクロロプロピル基、1-クロロ-1-メチルエチル基、2-クロロ-1-メチルエチル基、2-クロロプロピル基、4-クロロブチル基、5-クロロペンチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2-フルオロエチル基、1-フルオロエチル基、2,2-ジフルオロエチル基、1,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3-フルオロプロピル基、2,3-ジフルオロプロピル基、1-フルオロ-1-メチルエチル基、2-フルオロ-1-メチルエチル基、2-フルオロプロピル基、3,3,3-トリフルオロプロピル基、2,2,3,3-テトラフルオロプロピル基、2,2,3,3,3-ペンタフルオロプロピル基、4-フルオロブチル基、5-フルオロペンチル基、ブロモメチル基、ジブロモメチル基、トリブロモメチル基、2-ブロモエチル基、1-ブロモエチル基、2,2-ジブロモエチル基、1,2-ジブロモエチル基、2,2,2-トリブロモエチル基、3-ブロモプロピル基、2,3-ジブロモプロピル基、1-ブロモ-1-メチルエチル基、2-ブロモ-1-メチルエチル基、2-ブロモプロピル基、4-ブロモブチル基、5-ブロモペンチル基、ヨードメチル基、ジヨードメチル基、2-ヨードエチル基、1-ヨードエチル基、2,2-ジヨードエチル基、1,2-ジヨードエチル基、2,2,2-トリヨードエチル基、3-ヨードプロピル基、2,3-ジヨードプロピル基、1-ヨード-1-メチルエチル基、2-ヨード-1-メチルエチル基、2-ヨードプロピル基、および4-ヨードブチル基等を挙げることができる。中でも、炭素数1~4のハロアルキル基が好ましく、炭素数1~3のハロアルキル基がより好ましい。 Examples of the haloalkyl group having 1 to 6 carbon atoms include chloromethyl group, dichloromethyl group, trichloromethyl group, 2-chloroethyl group, 1-chloroethyl group, 2,2-dichloroethyl group, 1,2-dichloroethyl group, 2 , 2,2-trichloroethyl group, 3-chloropropyl group, 2,3-dichloropropyl group, 1-chloro-1-methylethyl group, 2-chloro-1-methylethyl group, 2-chloropropyl group, 4 -Chlorobutyl group, 5-chloropentyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, 1-fluoroethyl group, 2,2-difluoroethyl group, 1,2-difluoroethyl group 2,2,2-trifluoroethyl group, 3-fluoropropyl group, 2,3-difluoropropyl group, 1-fluoro-1-methyl Ethyl group, 2-fluoro-1-methylethyl group, 2-fluoropropyl group, 3,3,3-trifluoropropyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,3,3 , 3-pentafluoropropyl group, 4-fluorobutyl group, 5-fluoropentyl group, bromomethyl group, dibromomethyl group, tribromomethyl group, 2-bromoethyl group, 1-bromoethyl group, 2,2-dibromoethyl group, 1,2-dibromoethyl group, 2,2,2-tribromoethyl group, 3-bromopropyl group, 2,3-dibromopropyl group, 1-bromo-1-methylethyl group, 2-bromo-1-methyl Ethyl group, 2-bromopropyl group, 4-bromobutyl group, 5-bromopentyl group, iodomethyl group, diiodomethyl group, 2-iodoethyl group, 1-iodoethyl 2,2-diiodoethyl group, 1,2-diiodoethyl group, 2,2,2-triiodoethyl group, 3-iodopropyl group, 2,3-diiodopropyl group, 1-iodo-1-methylethyl group 2-iodo-1-methylethyl group, 2-iodopropyl group, 4-iodobutyl group and the like. Among these, a haloalkyl group having 1 to 4 carbon atoms is preferable, and a haloalkyl group having 1 to 3 carbon atoms is more preferable.

 炭素数2~6のアルケニル基としては、例えば、エテニル基、1,2-ジメチルエテニル基、4-メチル-1,3-ブタジエニル基、1-プロペニル基、2-プロペニル基、2-メチル-2-プロペニル基、3-メチル-2-プロペニル基、2-ブテニル基、3-ブテニル基、および3-メチル-3-ブテニル基等を挙げることができる。中でも、炭素数2~4のアルケニル基が好ましい。 Examples of the alkenyl group having 2 to 6 carbon atoms include ethenyl group, 1,2-dimethylethenyl group, 4-methyl-1,3-butadienyl group, 1-propenyl group, 2-propenyl group, 2-methyl- Examples include 2-propenyl group, 3-methyl-2-propenyl group, 2-butenyl group, 3-butenyl group, and 3-methyl-3-butenyl group. Of these, an alkenyl group having 2 to 4 carbon atoms is preferred.

 炭素数2~6のハロアルケニル基としては、例えば、2-クロロエテニル基、2,2-ジクロロエテニル基、2-クロロ-2-プロペニル基、3,3-ジクロロ-2-プロペニル基、2,3-ジクロロ-2-プロペニル基、3,3-ジクロロ-2-メチル-2-プロペニル基、3-クロロ-2-ブテニル基、2-フルオロエテニル基、2,2-ジフルオロエテニル基、2-フルオロ-2-プロペニル基、3,3-ジフルオロ-2-プロペニル基、2,3-ジフルオロ-2-プロペニル基、3,3-ジフルオロ-2-メチル-2-プロペニル基、3-フルオロ-2-ブテニル基、2-ブロモエテニル基、2,2-ジブロモエテニル基、2-ブロモ-2-プロペニル基、3,3-ジブロモ-2-プロペニル基、2,3-ジブロモ-2-プロペニル基、3,3-ジブロモ-2-メチル-2-プロペニル基、3-ブロモ-2-ブテニル基、2-ヨードエテニル基、2,2-ジヨードエテニル基、2-ヨード-2-プロペニル基、3,3-ジヨード-2-プロペニル基、および2,3-ジヨード-2-プロペニル基等を挙げることができる。中でも、炭素数2~4のハロアルケニル基が好ましい。 Examples of the haloalkenyl group having 2 to 6 carbon atoms include 2-chloroethenyl group, 2,2-dichloroethenyl group, 2-chloro-2-propenyl group, 3,3-dichloro-2-propenyl group, 2,3 -Dichloro-2-propenyl group, 3,3-dichloro-2-methyl-2-propenyl group, 3-chloro-2-butenyl group, 2-fluoroethenyl group, 2,2-difluoroethenyl group, 2- Fluoro-2-propenyl group, 3,3-difluoro-2-propenyl group, 2,3-difluoro-2-propenyl group, 3,3-difluoro-2-methyl-2-propenyl group, 3-fluoro-2- Butenyl, 2-bromoethenyl, 2,2-dibromoethenyl, 2-bromo-2-propenyl, 3,3-dibromo-2-propenyl, 2,3-dibromo-2-propenyl Group, 3,3-dibromo-2-methyl-2-propenyl group, 3-bromo-2-butenyl group, 2-iodoethenyl group, 2,2-diiodoethenyl group, 2-iodo-2-propenyl group, 3,3 -Diiodo-2-propenyl group, 2,3-diiodo-2-propenyl group and the like can be mentioned. Of these, a haloalkenyl group having 2 to 4 carbon atoms is preferred.

 炭素数2~6のアルキニル基としては、例えば、エチニル基、1-プロピニル基、2-プロピニル基、1-ブチニル基、および2-ブチニル基等を挙げることができる。中でも、炭素数2~4のアルキニル基が好ましい。 Examples of the alkynyl group having 2 to 6 carbon atoms include ethynyl group, 1-propynyl group, 2-propynyl group, 1-butynyl group, and 2-butynyl group. Of these, an alkynyl group having 2 to 4 carbon atoms is preferable.

 炭素数2~6のハロアルキニル基としては、例えば、2-フルオロエチニル基、2-クロロエチニル基、3-フルオロ-2-プロピニル基、3-クロロ-2-プロピニル基、および3-ブロモ-2-プロピニル基等を挙げることができる。中でも、炭素数2~4のハロアルキニル基が好ましい。 Examples of the haloalkynyl group having 2 to 6 carbon atoms include 2-fluoroethynyl group, 2-chloroethynyl group, 3-fluoro-2-propynyl group, 3-chloro-2-propynyl group, and 3-bromo-2 -A propynyl group etc. can be mentioned. Of these, a haloalkynyl group having 2 to 4 carbon atoms is preferable.

 -OGにおける保護基Gは、ヒドロキシ基を保護する保護基であり、適切な条件下で解離してヒドロキシ基を生成する保護基であれば特に制限はない。保護基Gとしては、例えば、酸性条件下で解離する保護基、および加水素化反応等の還元条件下で開裂する保護基等が挙げられる。 The protecting group G in —OG is a protecting group that protects a hydroxy group, and is not particularly limited as long as it is a protecting group that dissociates under appropriate conditions to form a hydroxy group. Examples of the protecting group G include a protecting group that dissociates under acidic conditions and a protecting group that cleaves under reducing conditions such as a hydrogenation reaction.

 nは0~6の整数を表す。nは好ましくは0~3であり、より好ましくは0~2である。nが2以上である場合、複数あるYは互いに同一であってもよいし、互いに異なっていてもよい。また、nが2以上である場合、1つの炭素原子に2つのYが結合していてもよい。また、nが2以上である場合、複数あるYは互いに結合して、それぞれのYが結合している炭素原子とともに環を形成していてもよい。 N represents an integer of 0-6. n is preferably 0 to 3, and more preferably 0 to 2. When n is 2 or more, the plurality of Ys may be the same or different from each other. When n is 2 or more, two Y may be bonded to one carbon atom. When n is 2 or more, a plurality of Ys may be bonded to each other to form a ring together with the carbon atom to which each Y is bonded.

 Xは、ハロゲン原子、炭素数1~4のアルキル基、炭素数1~4のハロアルキル基、炭素数1~4のアルコキシ基、炭素数1~4のハロアルコキシ基、フェニル基、シアノ基またはニトロ基を表す。 X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a haloalkoxy group having 1 to 4 carbon atoms, a phenyl group, a cyano group, or a nitro group. Represents a group.

 Xにおけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子を挙げることができ、中でも、フッ素原子、塩素原子および臭素原子が好ましく、フッ素原子および塩素原子がより好ましい。 Examples of the halogen atom in X include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, among which a fluorine atom, a chlorine atom and a bromine atom are preferable, and a fluorine atom and a chlorine atom are more preferable.

 Xにおける炭素数1~4のアルキル基としては、具体的には、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基およびtert-ブチル基が挙げられる。中でも、炭素数1~3のアルキル基が好ましく、炭素数1~2のアルキル基がより好ましく、メチル基がさらに好ましい。 Specific examples of the alkyl group having 1 to 4 carbon atoms in X include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. Can be mentioned. Among them, an alkyl group having 1 to 3 carbon atoms is preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, and a methyl group is further preferable.

 Xにおける炭素数1~4のハロアルキル基としては、例えば、ジクロロメチル基、トリクロロメチル基、2-クロロエチル基、1-クロロエチル基、2,2-ジクロロエチル基、1,2-ジクロロエチル基、2,2,2-トリクロロエチル基、3-クロロプロピル基、2,3-ジクロロプロピル基、1-クロロ-1-メチルエチル基、2-クロロ-1-メチルエチル基、2-クロロプロピル基、4-クロロブチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2-フルオロエチル基、1-フルオロエチル基、2,2-ジフルオロエチル基、1,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3-フルオロプロピル基、2,3-ジフルオロプロピル基、1-フルオロ-1-メチルエチル基、2-フルオロ-1-メチルエチル基、2-フルオロプロピル基、3,3,3-トリフルオロプロピル基、2,2,3,3-テトラフルオロプロピル基、2,2,3,3,3-ペンタフルオロプロピル基、4-フルオロブチル基、ジブロモメチル基、トリブロモメチル基、2-ブロモエチル基、2,2-ジブロモエチル基、1,2-ジブロモエチル基、2,2,2-トリブロモエチル基、3-ブロモプロピル基、2,3-ジブロモプロピル基、1-ブロモ-1-メチルエチル基、2-ブロモ-1-メチルエチル基、2-ブロモプロピル基、ジヨードメチル基、2,2-ジヨードエチル基、1,2-ジヨードエチル基、2,2,2-トリヨードエチル基、2,3-ジヨードプロピル基、1-ヨード-1-メチルエチル基および2-ヨード-1-メチルエチル基等が挙げられる。中でも、炭素数1~3のハロアルキル基が好ましく、炭素数1~2のハロアルキル基がより好ましく、炭素数1のトリハロアルキル基がさらに好ましい。 Examples of the haloalkyl group having 1 to 4 carbon atoms in X include, for example, a dichloromethyl group, a trichloromethyl group, a 2-chloroethyl group, a 1-chloroethyl group, a 2,2-dichloroethyl group, a 1,2-dichloroethyl group, 2 , 2,2-trichloroethyl group, 3-chloropropyl group, 2,3-dichloropropyl group, 1-chloro-1-methylethyl group, 2-chloro-1-methylethyl group, 2-chloropropyl group, 4 -Chlorobutyl, fluoromethyl, difluoromethyl, trifluoromethyl, 2-fluoroethyl, 1-fluoroethyl, 2,2-difluoroethyl, 1,2-difluoroethyl, 2,2,2 -Trifluoroethyl group, 3-fluoropropyl group, 2,3-difluoropropyl group, 1-fluoro-1-methylethyl group, 2-fur B-1-Methylethyl group, 2-fluoropropyl group, 3,3,3-trifluoropropyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,3,3,3-pentafluoro Propyl group, 4-fluorobutyl group, dibromomethyl group, tribromomethyl group, 2-bromoethyl group, 2,2-dibromoethyl group, 1,2-dibromoethyl group, 2,2,2-tribromoethyl group, 3-bromopropyl group, 2,3-dibromopropyl group, 1-bromo-1-methylethyl group, 2-bromo-1-methylethyl group, 2-bromopropyl group, diiodomethyl group, 2,2-diiodoethyl group, 1,2-diiodoethyl group, 2,2,2-triiodoethyl group, 2,3-diiodopropyl group, 1-iodo-1-methylethyl group and 2-iodo-1-methylethyl Group, and the like. Among these, a haloalkyl group having 1 to 3 carbon atoms is preferable, a haloalkyl group having 1 to 2 carbon atoms is more preferable, and a trihaloalkyl group having 1 carbon atom is more preferable.

 Xにおける炭素数1~4のアルコキシ基としては、例えば、メトキシ基、エトキシ基およびn-プロポキシ基等が挙げられる。中でも、炭素数1~3のアルコキシ基が好ましく、炭素数1~2のアルコキシ基がより好ましく、メトキシ基がさらに好ましい。 Examples of the alkoxy group having 1 to 4 carbon atoms in X include a methoxy group, an ethoxy group, and an n-propoxy group. Among these, an alkoxy group having 1 to 3 carbon atoms is preferable, an alkoxy group having 1 to 2 carbon atoms is more preferable, and a methoxy group is further preferable.

 Xにおける炭素数1~4のハロアルコキシ基としては、例えば、トリフルオロメトキシ基、ジフルオロメトキシ基、1,1,2,2,2-ペンタフルオロエトキシ基および2,2および2-トリフルオロエトキシ基等が挙げられる。中でも、炭素数1~3のハロアルコキシ基が好ましく、炭素数1~2のハロアルコキシ基がより好ましく、ジハロメトキシ基およびトリハロメトキシ基がさらに好ましい。 Examples of the haloalkoxy group having 1 to 4 carbon atoms in X include, for example, a trifluoromethoxy group, a difluoromethoxy group, a 1,1,2,2,2-pentafluoroethoxy group, and a 2,2 and 2-trifluoroethoxy group. Etc. Among these, a haloalkoxy group having 1 to 3 carbon atoms is preferable, a haloalkoxy group having 1 to 2 carbon atoms is more preferable, and a dihalomethoxy group and a trihalomethoxy group are further preferable.

 Xは、中でも、ハロゲン原子であることが好ましい。 X is preferably a halogen atom.

 mは0~5の整数を表す。mは、好ましくは0~3の整数であり、より好ましくは0~2の整数であり、さらに好ましくは0または1である。mが2以上である場合、複数あるXは互いに同一であってもよいし、互いに異なっていてもよい。mが1以上である場合、Xはベンゼン環の2~6位の何れに位置していてもよいが、mが1である場合には、4-置換ベンジルとなる位置が好ましい。 M represents an integer from 0 to 5. m is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and still more preferably 0 or 1. When m is 2 or more, a plurality of Xs may be the same or different from each other. When m is 1 or more, X may be located at any of positions 2 to 6 of the benzene ring, but when m is 1, a position where 4-substituted benzyl is preferred.

 好ましい一例において、mは0~2の整数であり、mが1または2である場合、Xはハロゲン原子である。 In a preferred example, m is an integer from 0 to 2, and when m is 1 or 2, X is a halogen atom.

 Rは、上記一般式(II)におけるRと同じである。 R 1 is the same as R 1 in the general formula (II).

 化合物(IIa)を脱アルコキシカルボニル化させる反応に用いられる第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに当該反応の反応条件等は、それぞれ、上述の第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに反応条件等と同じである。 The type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIa), the type and amount of halogenated salt, the type of solvent, the reaction conditions for the reaction, etc. These are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.

 化合物(IIa)のより好適な例としては、例えば下記一般式(IIa-1)で示される化合物および下記一般式(IIa-2)で示される化合物が挙げられる。 More preferable examples of the compound (IIa) include, for example, a compound represented by the following general formula (IIa-1) and a compound represented by the following general formula (IIa-2).

Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017

 本発明に係るカルボニル化合物の製造方法のより好適な一態様は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、下記一般式(IIb)で示されるシクロペンタン環を有するβ-ケトエステル化合物(以下、化合物(IIb)という)を脱アルコキシカルボニル化させることにより、一般式(Ib)で示されるカルボニル化合物を得る、一般式(Ib)で示されるカルボニル化合物の製造方法である。 A more preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIb) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halide salt. A carbonyl compound represented by the general formula (Ib) is obtained by subjecting a β-ketoester compound having a cyclopentane ring (hereinafter referred to as the compound (IIb)) to dealkoxycarbonylation. It is a manufacturing method of a compound.

Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018

 ここで、YおよびYは、独立に、炭素数1~6のアルキル基もしくはハロアルキル基、または該アルキル基もしくはハロアルキル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)によって置換された基を表す。 Here, Y 1 and Y 2 are each independently an alkyl group or haloalkyl group having 1 to 6 carbon atoms, or a hydrogen atom of a part of the alkyl group or haloalkyl group is -OG 1 (G 1 is a hydroxy group protecting group). Represents a group substituted by (represents a group).

 YおよびYにおける炭素数1~6のアルキル基およびハロアルキル基は、上述のYにおける炭素数1~6のアルキル基およびハロアルキル基と同じものを例示することができる。 Examples of the alkyl group and haloalkyl group having 1 to 6 carbon atoms in Y 1 and Y 2 are the same as the alkyl group and haloalkyl group having 1 to 6 carbon atoms in Y described above.

 保護基Gは、ヒドロキシ基を保護する保護基であり、適切な条件下で解離してヒドロキシ基を生成する保護基であれば特に制限はない。保護基Gとしては、例えば、酸性条件下で解離する保護基が挙げられる。酸性条件下で解離する保護基としては、例えば、メトキシメチル基およびエトキシメチル基等のアルコキシ部分の炭素数が1~4のアルコキシメチル基およびアルコキシエチル基、メチル基、エチル基およびt-ブチル基等の炭素数1~4のアルキル基、置換または無置換ベンジル基、置換または無置換テトラヒドロピラニル基、置換または無置換テトラヒドロフラニル基、ならびにアリル基、トリエチルシリル基およびt-ブチルジメチルシリル基等のシリル基等を挙げることができる。また、メチレンアセタールおよびエチリデンアセタール等のアセタール類により2つのヒドロキシ基が同時に保護されている場合など、2つのヒドロキシ基における保護基が互いに結合した状態のものであってもよい。 The protecting group G 1 is a protecting group that protects a hydroxy group, and is not particularly limited as long as it is a protecting group that dissociates under appropriate conditions to form a hydroxy group. The protecting group G 1, for example, protecting groups which dissociate under acidic conditions. Examples of the protecting group that can be dissociated under acidic conditions include, for example, an alkoxymethyl group having 1 to 4 carbon atoms such as a methoxymethyl group and an ethoxymethyl group, an alkoxyethyl group, a methyl group, an ethyl group, and a t-butyl group. Such as an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted tetrahydropyranyl group, a substituted or unsubstituted tetrahydrofuranyl group, an allyl group, a triethylsilyl group and a t-butyldimethylsilyl group The silyl group of can be mentioned. In addition, the protective groups in the two hydroxy groups may be bonded to each other, such as when two hydroxy groups are simultaneously protected by acetals such as methylene acetal and ethylidene acetal.

 また、還元条件下で開裂する保護基も挙げられる。還元条件下で開裂する保護基としては、ベンジル基およびp-メトキシベンジル基等の置換または無置換ベンジル基が挙げられる。 Also included are protecting groups that cleave under reducing conditions. Protecting groups that are cleaved under reducing conditions include substituted or unsubstituted benzyl groups such as benzyl and p-methoxybenzyl groups.

 YおよびYは互いに結合して、YおよびYが結合している炭素原子とともに環を形成していてもよい。 Y 1 and Y 2 may be bonded to each other to form a ring together with the carbon atom to which Y 1 and Y 2 are bonded.

 また、R、Xおよびmは、上記一般式(IIa)におけるR、Xおよびmと同じである。 Further, R 1, X and m are the same as R 1, X and m in the above general formula (IIa).

 化合物(IIb)を脱アルコキシカルボニル化させる反応に用いられる第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに当該反応の反応条件等は、それぞれ、上述の第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに反応条件等と同じである。 The type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIb), the type and amount of halogenated salt, the type of solvent, the reaction conditions for the reaction, etc. These are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.

 本発明に係るカルボニル化合物の製造方法の好適な別の態様は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、下記一般式(IIc)で示されるシクロペンタン環を有するβ-ケトエステル化合物(以下、化合物(IIc)という)を脱アルコキシカルボニル化させることにより、一般式(Ic)で示されるカルボニル化合物(以下、化合物(Ic)という)を得る、化合物(Ic)の製造方法である。 Another preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIc) in the presence of (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt. A β-ketoester compound having a cyclopentane ring (hereinafter referred to as compound (IIc)) is dealkoxycarbonylated to obtain a carbonyl compound represented by general formula (Ic) (hereinafter referred to as compound (Ic)). It is a manufacturing method of compound (Ic).

Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019

 ここで、GおよびGは、独立に、ヒドロキシ基を保護している保護基を表しており、詳細には、酸性条件下で解離する保護基を表す。なお、GおよびGは互いに結合して、GおよびGそれぞれが結合している酸素原子、当該酸素原子のそれぞれが結合している炭素原子、ならびに当該炭素原子が結合しているシクロペンタン環の炭素原子とともに環を形成していてもよい。 Here, G 2 and G 3 independently represent a protecting group protecting a hydroxy group, and specifically represent a protecting group that dissociates under acidic conditions. Note that G 2 and G 3 are bonded to each other to form an oxygen atom to which G 2 and G 3 are bonded, a carbon atom to which the oxygen atom is bonded, and a cyclo atom to which the carbon atom is bonded. A ring may be formed together with the carbon atom of the pentane ring.

 GとGとが結合していない場合の保護基としては、例えば、メトキシメチル基およびエトキシメチル基等のアルコキシ部分の炭素数が1~4のアルコキシメチル基、1-エトキシエチル基および1-メチル-1-メトキシエチル基等のアルコキシ部分の炭素数が1~4のアルコキシエチル基、t-ブチル基およびメチル基等の炭素数1~4のアルキル基、置換または無置換ベンジル基、置換または無置換テトラヒドロピラニル基、置換または無置換テトラヒドロフラニル基、ならびにアリル基、トリエチルシリル基およびt-ブチルジメチルシリル基等のシリル基を挙げることができる。 Examples of the protecting group when G 2 and G 3 are not bonded include, for example, an alkoxymethyl group having 1 to 4 carbon atoms, such as a methoxymethyl group and an ethoxymethyl group, a 1-ethoxyethyl group, and 1 An alkoxy moiety such as a methyl-1-methoxyethyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 4 carbon atoms such as a t-butyl group and a methyl group, a substituted or unsubstituted benzyl group, a substituted Alternatively, an unsubstituted tetrahydropyranyl group, a substituted or unsubstituted tetrahydrofuranyl group, and silyl groups such as an allyl group, a triethylsilyl group, and a t-butyldimethylsilyl group can be exemplified.

 一方、GおよびGが互いに結合している場合の保護基としては、例えば、メチレンアセタール、エチリデンアセタール、t-ブチルメチリデンケタール、1-t-ブチルエチリデンケタール、1-フェニルエチリデンケタール、アクロレインアセタール、イソプロピリデンケタール(アセトナイド)、シクロペンチリデンケタール、シクロヘキシリデンケタール、シクロヘプチリデンケタール、ベンジリデンアセタール、p-メトキシベンジリデンアセタール、2,4-ジメトキシベンジリデンケタール、3,4-ジメトキシベンジリデンケタール、2-ニトロベンジリデンアセタール、4-ニトロベンジリデンアセタール、メシチレンアセタール、1-ナフトアルデヒドアセタール、ベンゾフェノンケタール、カンファーケタール、メントン、メトキシメチレンアセタール、エトキシメチレンアセタール、ジメトキシメチレンオルトエステル、1-メトキシエチリデンオルトエステル、1-エトキシエチリデンオルトエステル、メチリデンオルトエステル、フタリドオルトエステル、1,2-ジメトキシエチリデンオルトエステル、α-メトキシベンジリデンオルトエステル、2-オキサシクロペンチリデンオルトエステル、ブタン-2,3-ビスアセタール、シクロヘキサン-1,2-ジアセタール、ビスジヒドロピランケタール、ジ-t-ブチルシリレン、1,3-(1,1,3,3-テトライソプロピル)ジシリオキサニリデン、および1,1,3,3-テトラ-t-ブトキシジシロキサニリデンを挙げることができる。 On the other hand, examples of the protecting group when G 2 and G 3 are bonded to each other include, for example, methylene acetal, ethylidene acetal, t-butyl methylidene ketal, 1-t-butyl ethylidene ketal, 1-phenyl ethylidene ketal, acrolein Acetal, isopropylidene ketal (acetonide), cyclopentylidene ketal, cyclohexylidene ketal, cycloheptylidene ketal, benzylidene acetal, p-methoxybenzylidene acetal, 2,4-dimethoxybenzylidene ketal, 3,4-dimethoxybenzylidene ketal, 2-nitrobenzylidene acetal, 4-nitrobenzylidene acetal, mesitylene acetal, 1-naphthaldehyde acetal, benzophenone ketal, camphor ketal, Methoxymethylene acetal, ethoxymethylene acetal, dimethoxymethylene orthoester, 1-methoxyethylidene orthoester, 1-ethoxyethylidene orthoester, methylidene orthoester, phthalide orthoester, 1,2-dimethoxyethylidene orthoester, α- Methoxybenzylidene orthoester, 2-oxacyclopentylidene orthoester, butane-2,3-bisacetal, cyclohexane-1,2-diacetal, bisdihydropyranketal, di-t-butylsilylene, 1,3- (1, Mention may be made of 1,3,3-tetraisopropyl) disilixanilidene and 1,1,3,3-tetra-t-butoxydisiloxanilidene.

 また、R、Xおよびmは、上記一般式(IIa)におけるR、Xおよびmと同じである。 Further, R 1, X and m are the same as R 1, X and m in the above general formula (IIa).

 化合物(IIc)を脱アルコキシカルボニル化させる反応に用いられる第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに当該反応の反応条件等は、それぞれ、上述の第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに反応条件等と同じである。 The type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of compound (IIc), the type and amount of halogenated salt, the type of solvent, the reaction conditions of the reaction, etc. These are the same as the above-mentioned types and amounts of tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions.

 GおよびGは、酸性条件下で解離する保護基である。そのため、加水分解および脱炭酸の反応により化合物(IIc)から化合物(Ic)を得ようとする場合、酸性条件下で反応を行うと化合物(Ic)の収率が低下してしまう。一方、本願発明者らが種々検討を行ったところ、化合物(IIc)を塩基性条件下で加水分解・脱炭酸させると、シクロペンタン環が開環する副反応が起こることによって、化合物(Ic)の収率が低下してしまうことを見出した。そのため、化合物(IIc)から化合物(Ic)を得る反応においては中性または中性に近い条件化での反応が望まれる。ここで、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて脱アルコキシカルボニル化を行う本発明の製造方法によれば、中性または中性に近い条件下で反応を行うことができる。そのため、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて脱アルコキシカルボニル化を行う本発明の製造方法は、中性または中性に近い条件下で反応を行うことが望まれる化合物(IIc)から化合物(Ic)を製造する方法において特に優れた効果を発揮する。 G 2 and G 3 are protecting groups that dissociate under acidic conditions. Therefore, when obtaining compound (Ic) from compound (IIc) by the reaction of hydrolysis and decarboxylation, the yield of compound (Ic) is reduced when the reaction is carried out under acidic conditions. On the other hand, the inventors of the present application have conducted various studies. As a result, when compound (IIc) is hydrolyzed and decarboxylated under basic conditions, a side reaction occurs in which the cyclopentane ring is opened, resulting in compound (Ic). It was found that the yield of was reduced. Therefore, in the reaction for obtaining the compound (Ic) from the compound (IIc), a reaction under neutral or nearly neutral conditions is desired. Here, according to the production method of the present invention in which dealkoxycarbonylation is carried out using (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt, the neutral or near neutral condition The reaction can be carried out with Therefore, the production method of the present invention in which dealkoxycarbonylation is carried out using (a) an organic carboxylate of a tertiary amine, and (b) a halogenated salt, reacts under neutral or nearly neutral conditions. In the method for producing the compound (Ic) from the compound (IIc) desired to be performed, a particularly excellent effect is exhibited.

 また、塩基性条件下で加水分解・脱炭酸させたときにシクロペンタン環が開環する副反応は、化合物(IIc)における反応に限らず、シクロペンタン環を有する化合物(IIa)および化合物(IIb)における反応においても同様に生じ得る。したがって、何らかの理由により、化合物(IIa)および化合物(IIb)において酸性条件下での加水分解・脱炭酸の反応が望ましくない場合、例えば、酸性条件下での加水分解・脱炭酸では収率が低下してしまう場合には、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩を用いて脱アルコキシカルボニル化を行う本発明の製造方法が特に好適に用いられる。 In addition, the side reaction in which the cyclopentane ring opens when hydrolyzed and decarboxylated under basic conditions is not limited to the reaction in the compound (IIc), but the compound (IIa) and the compound (IIb) having a cyclopentane ring. It can occur in the reaction in Therefore, for some reason, when the reaction of hydrolysis / decarboxylation under acidic conditions is not desirable in compound (IIa) and compound (IIb), for example, the yield is reduced by hydrolysis / decarboxylation under acidic conditions. In this case, the production method of the present invention in which dealkoxycarbonylation is carried out using (a) an organic carboxylate of a tertiary amine and (b) a halogenated salt is particularly preferably used.

 GおよびGが互いに結合して環を形成している場合の好適な態様は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、下記一般式(IId)で示されるシクロペンタン環を有するβ-ケトエステル化合物を脱アルコキシカルボニル化させることにより、一般式(Id)で示されるカルボニル化合物を得る、一般式(Id)で示されるカルボニル化合物の製造方法である。 In the case where G 2 and G 3 are bonded to each other to form a ring, a preferred embodiment is as follows: (a) an organic carboxylate of a tertiary amine, and (b) a halogenated salt, Production of a carbonyl compound represented by the general formula (Id) is obtained by subjecting a β-ketoester compound having a cyclopentane ring represented by the formula (IId) to dealkoxycarbonylation to obtain a carbonyl compound represented by the general formula (Id). Is the method.

Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020

 ここで、GおよびGは、独立に、水素原子、炭素数1~4のアルキル基、炭素数1~4のアルケニル基、フェニル基、ナフチル基もしくはベンジル基を表している。GおよびGにおけるフェニル基およびナフチル基ならびにベンジル基におけるフェニル部は、メチル基およびエチル基等の炭素数1~4のアルキル基;メトキシ基およびエトキシ基等の炭素数1~4のアルコキシ基;ニトロ基;またはフッ素原子および塩素原子等のハロゲン原子で置換されていてもよい。なお、GおよびGは互いに結合して、GおよびGが結合している炭素原子とともに環を形成していてもよい。中でも、GおよびGは、独立に、水素原子、またはメチル基、エチル基およびn-プロピル基等の炭素数1~4のアルキル基であることがより好ましく、独立に、水素原子、メチル基またはエチル基であることがさらに好ましく、GおよびGが何れもメチル基であることが特に好ましい。 Here, G 4 and G 5 independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 1 to 4 carbon atoms, a phenyl group, a naphthyl group, or a benzyl group. The phenyl and naphthyl groups in G 4 and G 5 and the phenyl moiety in the benzyl group are alkyl groups having 1 to 4 carbon atoms such as methyl and ethyl groups; alkoxy groups having 1 to 4 carbon atoms such as methoxy and ethoxy groups A nitro group; or a halogen atom such as a fluorine atom and a chlorine atom. G 4 and G 5 may be bonded to each other to form a ring together with the carbon atom to which G 4 and G 5 are bonded. Among these, G 4 and G 5 are each independently more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group and an n-propyl group. More preferably a group or an ethyl group, and particularly preferably G 4 and G 5 are both methyl groups.

 また、R、Xおよびmは、上記一般式(IIa)におけるR、Xおよびmと同じである。 Further, R 1, X and m are the same as R 1, X and m in the above general formula (IIa).

 一般式(IId)で示されるβ-ケトエステル化合物を脱アルコキシカルボニル化させる反応に用いられる第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに当該反応の反応条件等は、それぞれ、上述の第3級アミンの有機カルボン酸塩の種類および使用量、ハロゲン化塩の種類および使用量、溶媒の種類、ならびに反応条件等と同じである。 The type and amount of tertiary amine organic carboxylate used in the reaction for dealkoxycarbonylation of the β-ketoester compound represented by the general formula (IId), the type and amount of halogenated salt, the type of solvent, The reaction conditions and the like of the reaction are the same as the types and amounts of the tertiary amine organic carboxylates, the types and amounts of halogenated salts, the types of solvents, and the reaction conditions, respectively.

 本発明に係るカルボニル化合物の製造方法の特に好適な態様は、(a)第3級アミンの有機カルボン酸塩、および(b)ハロゲン化塩の存在下で、下記一般式(IIe)で示されるシクロペンタン環を有するβ-ケトエステル化合物を脱アルコキシカルボニル化させることにより、一般式(Ie)で示されるカルボニル化合物を得る、一般式(Ie)で示されるカルボニル化合物の製造方法である。 A particularly preferred embodiment of the method for producing a carbonyl compound according to the present invention is represented by the following general formula (IIe) in the presence of (a) an organic carboxylate salt of a tertiary amine and (b) a halogenated salt. This is a method for producing a carbonyl compound represented by the general formula (Ie), wherein a carbonyl compound represented by the general formula (Ie) is obtained by dealkoxycarbonylation of a β-ketoester compound having a cyclopentane ring.

Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021

 ここで、GおよびGは、独立に、水素原子またはメチル基、エチル基およびn-プロピル基等の炭素数1~4のアルキル基を表している。中でも、独立に、水素原子、メチル基またはエチル基であることが好ましく、GおよびGが何れもメチル基であることがより好ましい。 Here, G 6 and G 7 independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, and an n-propyl group. Among these, independently, a hydrogen atom, a methyl group, or an ethyl group is preferable, and both G 6 and G 7 are more preferably a methyl group.

 Xは水素原子、塩素原子またはフッ素原子を表している。 X 1 represents a hydrogen atom, a chlorine atom or a fluorine atom.

 また、Rは、上記一般式(IIa)におけるRと同じである。 R 1 is the same as R 1 in the general formula (IIa).

 以上のように、本発明に係るカルボニル化合物の製造方法は、下記一般式(II)で示される化合物から下記一般式(I)で示されるカルボニル化合物を製造する方法であって、第3級アミンの有機カルボン酸塩およびハロゲン化塩の存在下で、下記一般式(II)で示される化合物の脱アルコキシカルボニル化を行う構成を有する。 As described above, the method for producing a carbonyl compound according to the present invention is a method for producing a carbonyl compound represented by the following general formula (I) from a compound represented by the following general formula (II), which is a tertiary amine. In the presence of the organic carboxylate and halogenated salt, the compound represented by the following general formula (II) is subjected to dealkoxycarbonylation.

Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022

(一般式(II)中、Zは、置換または無置換のアルキル基、シクロアルキル基、アリール基または複素環基を表し、ZおよびZは、独立に、水素原子、または置換もしくは無置換のアルキル基、シクロアルキル基、アリール基もしくは複素環基を表し、Rは、炭素数1~4のアルキル基を表す。ZおよびZは互いに結合していてもよい。) (In the general formula (II), Z 1 represents a substituted or unsubstituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and Z 3 and Z 2 independently represent a hydrogen atom, or a substituted or unsubstituted group. Represents a substituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and R 1 represents an alkyl group having 1 to 4 carbon atoms, and Z 1 and Z 2 may be bonded to each other.

Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023

(一般式(I)中、Z、ZおよびZは、それぞれ上記一般式(II)のZ、ZおよびZと同じである。) (In general formula (I), Z 1 , Z 2 and Z 3 are the same as Z 1 , Z 2 and Z 3 in general formula (II), respectively.)

 また、本発明に係るカルボニル化合物の製造方法において、上記ハロゲン化塩は、ハロゲン化第4級アンモニウム塩、またはハロゲン化金属塩であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the halogenated salt is preferably a halogenated quaternary ammonium salt or a metal halide salt.

 また、本発明に係るカルボニル化合物の製造方法において、上記ハロゲン化第4級アンモニウム塩は、第3級アミンハロゲン化水素塩を使用することによって系内で発生させることによっても好ましく使用できる。 In the method for producing a carbonyl compound according to the present invention, the halogenated quaternary ammonium salt can be preferably used by generating it in the system by using a tertiary amine hydrogen halide salt.

 また、本発明に係るカルボニル化合物の製造方法において、上記ハロゲン化金属塩は、ハロゲン化アルカリ金属塩であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the metal halide salt is preferably an alkali metal halide salt.

 また、本発明に係るカルボニル化合物の製造方法において、上記ハロゲン化第4級アンモニウム塩は、下記一般式(III)で示される化合物であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the halogenated quaternary ammonium salt is preferably a compound represented by the following general formula (III).

Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024

(一般式(III)中、R~Rは、独立に、アルキル基、置換もしくは無置換のアラルキル基、または置換もしくは無置換のアリール基を表し、Lは、ハロゲン化物イオンを表している。) (In the general formula (III), R 2 to R 5 independently represent an alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group, and L represents a halide ion. Yes.)

 また、本発明に係るカルボニル化合物の製造方法において、上記一般式(III)中、R~Rが、独立に、炭素数1~4のアルキル基、置換もしくは無置換のベンジル基、または置換もしくは無置換のフェニル基であり、Lが、塩化物イオンまたは臭化物イオンであることが好ましい。 In the method for producing a carbonyl compound according to the present invention, in the general formula (III), R 2 to R 5 are independently an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted benzyl group, or a substituted group. or an unsubstituted phenyl group, L - is preferably a chloride ion or bromide ion.

 また、本発明に係るカルボニル化合物の製造方法は、上記第3級アミンの有機カルボン酸塩を溶媒としても使用し、他の溶媒を使用しない方法でもあり得る。 Also, the method for producing a carbonyl compound according to the present invention may be a method using the above tertiary amine organic carboxylate as a solvent and not using any other solvent.

 また、本発明に係るカルボニル化合物の製造方法において、上記第3級アミンの有機カルボン酸塩を構成する第3級アミンは、トリエチルアミン、トリメチルアミン、ピリジンまたはピコリンであることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the tertiary amine constituting the organic carboxylate of the tertiary amine is preferably triethylamine, trimethylamine, pyridine or picoline.

 また、本発明に係るカルボニル化合物の製造方法において、上記第3級アミンの有機カルボン酸塩を構成する有機カルボン酸は、脂肪族モノカルボン酸であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the organic carboxylic acid constituting the organic carboxylate of the tertiary amine is preferably an aliphatic monocarboxylic acid.

 また、本発明に係るカルボニル化合物の製造方法において、上記一般式(II)で示される化合物は、下記一般式(IIa)で示される化合物であり、上記一般式(I)で示されるカルボニル化合物は、下記一般式(Ia)で示されるカルボニル化合物であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the compound represented by the general formula (II) is a compound represented by the following general formula (IIa), and the carbonyl compound represented by the general formula (I) is A carbonyl compound represented by the following general formula (Ia) is preferable.

Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025

(一般式(IIa)中、Rは、炭素数1~4のアルキル基を表し、Yは、炭素数1~6のアルキル基もしくはハロアルキル基、炭素数2~6のアルケニル基もしくはハロアルケニル基、炭素数2~6のアルキニル基もしくはハロアルキニル基、または該アルキル基、ハロアルキル基、アルケニル基、ハロアルケニル基、アルキニル基もしくはハロアルキニル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)に置換された基を表し、nは0~6の整数を表す。nが2以上である場合、複数あるYは互いに同一でも異なっていてもよい。nが2以上である場合、複数あるYは互いに結合して、それぞれのYが結合している炭素原子とともに環を形成していてもよい。Xは、ハロゲン原子、炭素数1~4のアルキル基、炭素数1~4のハロアルキル基、炭素数1~4のアルコキシ基、炭素数1~4のハロアルコキシ基、フェニル基、シアノ基またはニトロ基を表し、mは0~5の整数を表し、mが2以上である場合、複数あるXは互いに同一でも異なっていてもよい。) (In the general formula (IIa), R 1 represents an alkyl group having 1 to 4 carbon atoms, Y represents an alkyl group or haloalkyl group having 1 to 6 carbon atoms, an alkenyl group or haloalkenyl group having 2 to 6 carbon atoms) A part of hydrogen atoms of the alkyl group, haloalkyl group, alkenyl group, haloalkenyl group, alkynyl group or haloalkynyl group is -OG (G is a hydroxy group) And n represents an integer of 0 to 6. When n is 2 or more, a plurality of Y may be the same or different from each other, and n is 2 or more. In this case, a plurality of Y may be bonded to each other to form a ring together with the carbon atom to which each Y is bonded, where X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or 1 carbon atom. Represents a haloalkyl group having 4 to 4, an alkoxy group having 1 to 4 carbon atoms, a haloalkoxy group having 1 to 4 carbon atoms, a phenyl group, a cyano group or a nitro group, m represents an integer of 0 to 5, and m is 2 or more And the plurality of Xs may be the same or different.)

Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026

(一般式(Ia)中、X、Y、mおよびnは、それぞれ上記一般式(IIa)のX、Y、mおよびnと同じである。) (In the general formula (Ia), X, Y, m and n are the same as X, Y, m and n in the general formula (IIa), respectively.)

 また、本発明に係るカルボニル化合物の製造方法において、上記一般式(IIa)で示される化合物は、下記一般式(IIb)で示される化合物であり、上記一般式(Ia)で示されるカルボニル化合物は、下記一般式(Ib)で示されるカルボニル化合物であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the compound represented by the general formula (IIa) is a compound represented by the following general formula (IIb), and the carbonyl compound represented by the general formula (Ia) is A carbonyl compound represented by the following general formula (Ib) is preferable.

Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027

(一般式(IIb)中、YおよびYは、独立に、炭素数1~6のアルキル基もしくはハロアルキル基、または該アルキル基もしくはハロアルキル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)によって置換された基を表し、YおよびYは互いに結合して、YおよびYが結合している炭素原子とともに環を形成していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。) (In General Formula (IIb), Y 1 and Y 2 independently represent an alkyl group having 1 to 6 carbon atoms or a haloalkyl group, or a hydrogen atom in a part of the alkyl group or haloalkyl group is -OG 1 (G 1 Represents a hydroxy-protecting group, and Y 1 and Y 2 may be bonded to each other to form a ring together with the carbon atom to which Y 1 and Y 2 are bonded. R 1, X and m are each the same as R 1, X and m in the general formula (IIa).)

Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028

(一般式(Ib)中、X、Y、Yおよびmは、それぞれ上記一般式(IIb)のX、Y、Yおよびmと同じである。) (In the general formula (Ib), X, Y 1, Y 2 and m are the same as each X in the general formula (IIb), and Y 1, Y 2 and m.)

 また、本発明に係るカルボニル化合物の製造方法において、上記一般式(IIb)で示される化合物は、下記一般式(IIc)で示される化合物であり、上記一般式(Ib)で示されるカルボニル化合物は、下記一般式(Ic)で示されるカルボニル化合物であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the compound represented by the general formula (IIb) is a compound represented by the following general formula (IIc), and the carbonyl compound represented by the general formula (Ib) is A carbonyl compound represented by the following general formula (Ic) is preferable.

Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029

(一般式(IIc)中、GおよびGは、独立に、酸性条件下で解離する保護基を表し、GおよびGは互いに結合していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。) (In General Formula (IIc), G 2 and G 3 independently represent a protecting group that dissociates under acidic conditions, and G 2 and G 3 may be bonded to each other. R 1 , X, and m are These are the same as R 1 , X and m in the general formula (IIa).

Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030

(一般式(Ic)中、X、G、Gおよびmは、それぞれ上記一般式(IIc)のX、G、Gおよびmと同じである。) (In the general formula (Ic), X, G 2 , G 3 and m are the same as X, G 2, G 3 and m of each of the above general formula (IIc).)

 また、本発明に係るカルボニル化合物の製造方法では、上記一般式(IIc)で示される化合物に第3級アミンを添加し、次いで該第3級アミンの添加量よりも少ない量の有機カルボン酸を添加することにより上記第3級アミンの有機カルボン酸塩を反応系中に生じさせ、脱アルコキシカルボニル化を行うことが好ましい。 In the method for producing a carbonyl compound according to the present invention, a tertiary amine is added to the compound represented by the general formula (IIc), and then an organic carboxylic acid in an amount smaller than the added amount of the tertiary amine is added. It is preferable to carry out dealkoxycarbonylation by adding an organic carboxylate of the tertiary amine in the reaction system by adding.

 また、本発明に係るカルボニル化合物の製造方法において、上記一般式(IIc)で示される化合物は、下記一般式(IId)で示される化合物であり、上記一般式(Ic)で示されるカルボニル化合物は、下記一般式(Id)で示されるカルボニル化合物であることが好ましい。 In the method for producing a carbonyl compound according to the present invention, the compound represented by the general formula (IIc) is a compound represented by the following general formula (IId), and the carbonyl compound represented by the general formula (Ic) is A carbonyl compound represented by the following general formula (Id) is preferable.

Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031

(一般式(IId)中、GおよびGは、独立に、水素原子、炭素数1~4のアルキル基、炭素数1~4のアルケニル基、または置換もしくは無置換のフェニル基、ナフチル基もしくはベンジル基を表し、GおよびGは互いに結合して、GおよびGが結合している炭素原子とともに環を形成していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。) (In the general formula (IId), G 4 and G 5 are independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 1 to 4 carbon atoms, or a substituted or unsubstituted phenyl group or naphthyl group. or a benzyl group, G 4 and G 5 bonded to each other, G 4 and G 5 may also form a ring with the carbon atom to which they are attached .R 1, X and m are each the general (It is the same as R 1 , X and m in the formula (IIa).)

Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032

(一般式(Id)中、X、G、Gおよびmは、それぞれ上記一般式(IId)のX、G、Gおよびmと同じである。) (In the general formula (Id), X, G 4 , G 5 and m are the same as X, G 4, G 5 and m respectively above general formula (IId).)

 以下に実施例を示し、本発明の実施の形態についてさらに詳しく説明する。もちろん、本発明は以下の実施例に限定されるものではなく、細部については様々な態様が可能であることはいうまでもない。さらに、本発明は上述した実施形態に限定されるものではなく、請求項に示した範囲で種々の変更が可能であり、それぞれ開示された技術的手段を適宜組み合わせて得られる実施形態についても本発明の技術的範囲に含まれる。また、本明細書中に記載された文献の全てが参考として援用される。 Examples will be shown below, and the embodiments of the present invention will be described in more detail. Of course, the present invention is not limited to the following examples, and it goes without saying that various aspects are possible in detail. Further, the present invention is not limited to the above-described embodiments, and various modifications can be made within the scope shown in the claims, and the present invention is also applied to the embodiments obtained by appropriately combining the disclosed technical means. It is included in the technical scope of the invention. Moreover, all the literatures described in this specification are used as reference.

 〔実施例1〕
 テトラメチルアンモニウムクロリド(0.45g)に、ジメチルアセトアミド(2.5ml)、トリエチルアミン(3.0ml)、および酢酸(1.2ml)を加えた後、2-(4-クロロベンジル)-8,8-ジメチル-1-オキソ-7,9-ジオキサスピロ[4.5]デカン-2-カルボン酸メチルエステル(化合物1)(5.0g)を加え、125℃で12時間撹拌して反応させた。トルエンを加え、飽和重曹水および飽和食塩水で洗浄した後、水層をトルエンで抽出した。有機層を無水硫酸ナトリウムで乾燥し、濃縮した後、シリカゲルカラムで精製して2-(4-クロロベンジル)-8,8-ジメチル-7,9-ジオキサスピロ[4.5]デカン-1-オン(以下、目的物という)を得た。収率:97.2%。
[Example 1]
To tetramethylammonium chloride (0.45 g) was added dimethylacetamide (2.5 ml), triethylamine (3.0 ml), and acetic acid (1.2 ml), and then 2- (4-chlorobenzyl) -8,8 -Dimethyl-1-oxo-7,9-dioxaspiro [4.5] decane-2-carboxylic acid methyl ester (Compound 1) (5.0 g) was added, and the mixture was stirred at 125 ° C. for 12 hours for reaction. Toluene was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with toluene. The organic layer was dried over anhydrous sodium sulfate, concentrated and then purified on a silica gel column to give 2- (4-chlorobenzyl) -8,8-dimethyl-7,9-dioxaspiro [4.5] decan-1-one. (Hereinafter referred to as the target product). Yield: 97.2%.

 〔実施例2〕
 テトラメチルアンモニウムクロリドの代わりにテトラエチルアンモニウムブロミド(0.86g)を用いて、110℃で12時間反応させた以外は実施例1と同様にして、目的物を得た。収率:99.7%。
[Example 2]
The target product was obtained in the same manner as in Example 1 except that tetraethylammonium bromide (0.86 g) was used instead of tetramethylammonium chloride and the reaction was performed at 110 ° C. for 12 hours. Yield: 99.7%.

 〔実施例3〕
 テトラメチルアンモニウムクロリドの代わりにテトラエチルアンモニウムブロミド(0.30g)を用いたこと、溶媒(ジメチルアセトアミド)を用いなかったこと、および110℃で2時間、その後115℃で3時間、さらにその後120℃で11時間反応させたこと以外は実施例1と同様にして、目的物を得た。収率:98.3%。
Example 3
Tetraethylammonium bromide (0.30 g) was used instead of tetramethylammonium chloride, no solvent (dimethylacetamide) was used, and 110 ° C. for 2 hours, then 115 ° C. for 3 hours, then 120 ° C. The target product was obtained in the same manner as in Example 1 except that the reaction was performed for 11 hours. Yield: 98.3%.

 〔実施例4〕
 テトラエチルアンモニウムブロミド(0.344g)にジメチルアセトアミド(2ml)およびトルエン(2ml)を加えた後、トリエチルアミン(0.98ml)および酢酸(0.394g)を加えたこと、得られた粗溶液に化合物1(2.0g)を加え、110℃~114℃で10時間反応させたこと以外は実施例1と同様にして、目的物を得た。収率:98.4%。
Example 4
Dimethylacetamide (2 ml) and toluene (2 ml) were added to tetraethylammonium bromide (0.344 g), and then triethylamine (0.98 ml) and acetic acid (0.394 g) were added. Compound 1 was added to the resulting crude solution. (2.0 g) was added, and the target product was obtained in the same manner as in Example 1 except that the reaction was carried out at 110 ° C. to 114 ° C. for 10 hours. Yield: 98.4%.

 〔実施例5〕
 テトラエチルアンモニウムブロミドの代わりに臭化リチウム(0.142g)を用いて、110℃~114℃で12時間撹拌した以外は実施例4と同様にして、目的物を得た。収率:97.3%。
Example 5
The target product was obtained in the same manner as in Example 4 except that lithium bromide (0.142 g) was used instead of tetraethylammonium bromide and the mixture was stirred at 110 ° C. to 114 ° C. for 12 hours. Yield: 97.3%.

 〔実施例6〕
 酢酸(0.394g)およびトリエチルアミン(0.98ml)をジメチルアセトアミド(4ml)に溶解し、化合物1(2.0g)に加えた後、トリエチルアミン塩酸塩(0.451g)を加え、約120℃で5時間反応させた。反応液に酢酸エチルおよび重曹水を加え、分配した。有機層を飽和食塩水で洗浄した後、水層を酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥した後、濃縮して目的物を得た。収率:98.7%。
Example 6
Acetic acid (0.394 g) and triethylamine (0.98 ml) were dissolved in dimethylacetamide (4 ml) and added to compound 1 (2.0 g), followed by addition of triethylamine hydrochloride (0.451 g) at about 120 ° C. The reaction was allowed for 5 hours. Ethyl acetate and aqueous sodium bicarbonate were added to the reaction solution, and the mixture was partitioned. The organic layer was washed with saturated brine, and then the aqueous layer was extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and then concentrated to obtain the desired product. Yield: 98.7%.

 〔実施例7〕
 テトラエチルアンモニウムブロミド(0.473g)に、ジメチルアセトアミド(2ml)、トリエチルアミン(1.1ml)、および酢酸(0.45g)を加えた後、3-(4-クロロベンジル)-2-オキソシクロペンタンカルボン酸メチルエステル(1.0g)を加え、115~120℃で12時間撹拌して反応させた。トルエンを加え、飽和重曹水および飽和食塩水で洗浄した後、水層をトルエンで抽出した。有機層を無水硫酸ナトリウムで乾燥し、濃縮した後、シリカゲルカラムで精製して2-(4-クロロベンジル)シクロペンタノンを得た。収率:87.2%。
Example 7
To tetraethylammonium bromide (0.473 g) was added dimethylacetamide (2 ml), triethylamine (1.1 ml), and acetic acid (0.45 g), and then 3- (4-chlorobenzyl) -2-oxocyclopentanecarboxylic acid. Acid methyl ester (1.0 g) was added and the reaction was allowed to stir at 115-120 ° C. for 12 hours. Toluene was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with toluene. The organic layer was dried over anhydrous sodium sulfate, concentrated and then purified with a silica gel column to give 2- (4-chlorobenzyl) cyclopentanone. Yield: 87.2%.

 〔実施例8〕
 テトラエチルアンモニウムブロミド(0.593g)に、ジメチルアセトアミド(2ml)、トリエチルアミン(1.3ml)、および酢酸(0.564g)を加えた後、3-(4-クロロフェニル)-3-オキソプロピオン酸メチルエステル(1.0g)を加え、120℃で10時間撹拌して反応させた。酢酸エチルを加え、飽和重曹水および飽和食塩水で洗浄した後、水層を酢酸エチルで抽出した。有機層を無水硫酸ナトリウムで乾燥し、濃縮した後、シリカゲルカラムで精製して1-(4-クロロフェニル)エタン-1-オンを得た。収率:91.2%。
Example 8
To tetraethylammonium bromide (0.593 g), dimethylacetamide (2 ml), triethylamine (1.3 ml), and acetic acid (0.564 g) were added, and then 3- (4-chlorophenyl) -3-oxopropionic acid methyl ester (1.0 g) was added and the reaction was allowed to stir at 120 ° C. for 10 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and then purified on a silica gel column to give 1- (4-chlorophenyl) ethan-1-one. Yield: 91.2%.

 〔実施例9〕
 ジメチルアセトアミド(4ml)、トリエチルアミン(1.4ml)、および酢酸(0.611g)を混合した後、1-(4-クロロベンジル)-3,3-ジメチル-2-オキソシクロペンタンカルボン酸メチルエステル(2.0g)を加えた後、トリエチルアミン塩酸塩(0.47g)を加え、120℃で17時間反応させた。酢酸エチルを加え、飽和重曹水および飽和食塩水で洗浄した後、水層を酢酸エチルで抽出した。有機層を無水硫酸ナトリウムで乾燥し、濃縮した後、シリカゲルカラムで精製して5-(4-クロロベンジル)-2,2-ジメチルシクロペンタノンを得た。収率:98.5%。
Example 9
After mixing dimethylacetamide (4 ml), triethylamine (1.4 ml) and acetic acid (0.611 g), 1- (4-chlorobenzyl) -3,3-dimethyl-2-oxocyclopentanecarboxylic acid methyl ester ( 2.0 g) was added, and then triethylamine hydrochloride (0.47 g) was added and reacted at 120 ° C. for 17 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and purified by a silica gel column to give 5- (4-chlorobenzyl) -2,2-dimethylcyclopentanone. Yield: 98.5%.

 〔実施例10〕
 ジメチルアセトアミド(4ml)、ピリジン(1.34g)、および酢酸(1.02g)を混合した後、1-(4-クロロベンジル)-3,3-ジメチル-2-オキソシクロペンタンカルボン酸メチルエステル(2.0g)を加えた後、テトラメチルアンモニウムクロリド(0.52g)を加え、120℃で8時間、130℃で16時間反応させた。酢酸エチルを加え、飽和重曹水および飽和食塩水で洗浄した後、水層を酢酸エチルで抽出した。有機層を無水硫酸ナトリウムで乾燥し、濃縮した後、シリカゲルカラムで精製して5-(4-クロロベンジル)-2,2-ジメチルシクロペンタノンを得た。収率:96.3%。
Example 10
After mixing dimethylacetamide (4 ml), pyridine (1.34 g), and acetic acid (1.02 g), 1- (4-chlorobenzyl) -3,3-dimethyl-2-oxocyclopentanecarboxylic acid methyl ester ( 2.0 g) was added, tetramethylammonium chloride (0.52 g) was added, and the mixture was reacted at 120 ° C. for 8 hours and 130 ° C. for 16 hours. Ethyl acetate was added, and the mixture was washed with saturated aqueous sodium hydrogen carbonate and saturated brine, and the aqueous layer was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, concentrated and purified by a silica gel column to give 5- (4-chlorobenzyl) -2,2-dimethylcyclopentanone. Yield: 96.3%.

 〔参考例1〕
 化合物1(10.0g)にトルエン(1ml)を加えた後、0.5M水酸化ナトリウム水溶液(27.3ml)に懸濁し、110℃で反応させた。2時間毎(計3回)に0.5M水酸化ナトリウム水溶液(27.3ml)を加えて反応を継続し、合計9時間加熱撹拌を行った。反応終了後の工程は実施例1と同様にして、目的物を得た。収率:80%。
[Reference Example 1]
Toluene (1 ml) was added to compound 1 (10.0 g), then suspended in 0.5 M aqueous sodium hydroxide solution (27.3 ml) and reacted at 110 ° C. Every 2 hours (3 times in total), a 0.5 M aqueous sodium hydroxide solution (27.3 ml) was added to continue the reaction, and the mixture was heated and stirred for a total of 9 hours. After completion of the reaction, the target product was obtained in the same manner as in Example 1. Yield: 80%.

 〔参考例2〕
 化合物1(2.0g)にジメチルアセトアミド(1ml)およびトリエチルアミン(1.7ml)を加え、さらに酢酸(0.63ml)を加えた後、留去物が戻らないようにしながら155℃で11時間反応させた。反応終了後の工程は実施例1と同様にして、目的物を得た。収率:94%。
[Reference Example 2]
Dimethylacetamide (1 ml) and triethylamine (1.7 ml) were added to compound 1 (2.0 g), and then acetic acid (0.63 ml) was added, followed by reaction at 155 ° C. for 11 hours while preventing distillate from returning. I let you. After completion of the reaction, the target product was obtained in the same manner as in Example 1. Yield: 94%.

 本発明は、農薬等の原料となる2-ベンジル-5,5-ジ(保護ヒドロキシメチル)-シクロペンタノン誘導体の製造に利用可能である。 The present invention can be used for the production of 2-benzyl-5,5-di (protected hydroxymethyl) -cyclopentanone derivatives used as raw materials for agricultural chemicals and the like.

Claims (14)

 下記一般式(II)で示される化合物から下記一般式(I)で示されるカルボニル化合物を製造する方法であって、
 第3級アミンの有機カルボン酸塩およびハロゲン化塩の存在下で、下記一般式(II)で示される化合物の脱アルコキシカルボニル化を行うことを特徴とするカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000001
(一般式(II)中、Zは、置換または無置換のアルキル基、シクロアルキル基、アリール基または複素環基を表し、ZおよびZは、独立に、水素原子、または置換もしくは無置換のアルキル基、シクロアルキル基、アリール基もしくは複素環基を表し、Rは、炭素数1~4のアルキル基を表す。ZおよびZは互いに結合していてもよい。)
Figure JPOXMLDOC01-appb-C000002
(一般式(I)中、Z、ZおよびZは、それぞれ上記一般式(II)のZ、ZおよびZと同じである。)
A method for producing a carbonyl compound represented by the following general formula (I) from a compound represented by the following general formula (II),
A method for producing a carbonyl compound, comprising subjecting a compound represented by the following general formula (II) to dealkoxycarbonylation in the presence of an organic carboxylate and a halogenated salt of a tertiary amine.
Figure JPOXMLDOC01-appb-C000001
(In the general formula (II), Z 1 represents a substituted or unsubstituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and Z 3 and Z 2 independently represent a hydrogen atom, or a substituted or unsubstituted group. Represents a substituted alkyl group, cycloalkyl group, aryl group or heterocyclic group, and R 1 represents an alkyl group having 1 to 4 carbon atoms, and Z 1 and Z 2 may be bonded to each other.
Figure JPOXMLDOC01-appb-C000002
(In general formula (I), Z 1 , Z 2 and Z 3 are the same as Z 1 , Z 2 and Z 3 in general formula (II), respectively.)
 上記ハロゲン化塩は、ハロゲン化第4級アンモニウム塩、またはハロゲン化金属塩であることを特徴とする請求項1に記載のカルボニル化合物の製造方法。 The method for producing a carbonyl compound according to claim 1, wherein the halogenated salt is a halogenated quaternary ammonium salt or a metal halide salt.  上記ハロゲン化第4級アンモニウム塩は、第3級アミンハロゲン化水素塩を使用することによって系内で発生させることを特徴とする請求項2に記載のカルボニル化合物の製造方法。 The method for producing a carbonyl compound according to claim 2, wherein the halogenated quaternary ammonium salt is generated in the system by using a tertiary amine hydrogen halide salt.  上記ハロゲン化金属塩は、ハロゲン化アルカリ金属塩であることを特徴とする請求項2に記載のカルボニル化合物の製造方法。 3. The method for producing a carbonyl compound according to claim 2, wherein the metal halide salt is an alkali metal halide salt.  上記ハロゲン化第4級アンモニウム塩は、下記一般式(III)で示される化合物であることを特徴とする請求項2または3に記載のカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000003
(一般式(III)中、R~Rは、独立に、アルキル基、置換もしくは無置換のアラルキル基、または置換もしくは無置換のアリール基を表し、Lは、ハロゲン化物イオンを表している。)
The said halogenated quaternary ammonium salt is a compound shown by the following general formula (III), The manufacturing method of the carbonyl compound of Claim 2 or 3 characterized by the above-mentioned.
Figure JPOXMLDOC01-appb-C000003
(In the general formula (III), R 2 to R 5 independently represent an alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group, and L represents a halide ion. Yes.)
 上記一般式(III)中、R2~R5が、独立に、炭素数1~4のアルキル基、置換もしくは無置換のベンジル基、または置換もしくは無置換のフェニル基であり、L-が、塩化物イオンまたは臭化物イオンであることを特徴とする請求項5に記載のカルボニル化合物の製造方法。 In the above general formula (III), R2 to R5 are independently an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted phenyl group, and L- is a chloride. 6. The method for producing a carbonyl compound according to claim 5, which is an ion or bromide ion.  上記第3級アミンの有機カルボン酸塩を溶媒としても使用し、他の溶媒を使用しないことを特徴とする請求項1~6の何れか1項に記載のカルボニル化合物の製造方法。 The method for producing a carbonyl compound according to any one of claims 1 to 6, wherein the organic carboxylate of the tertiary amine is used as a solvent and no other solvent is used.  上記第3級アミンの有機カルボン酸塩を構成する第3級アミンは、トリエチルアミン、トリメチルアミン、ピリジンまたはピコリンであることを特徴とする請求項1~7の何れか1項に記載のカルボニル化合物の製造方法。 The production of a carbonyl compound according to any one of claims 1 to 7, wherein the tertiary amine constituting the organic carboxylate of the tertiary amine is triethylamine, trimethylamine, pyridine or picoline. Method.  上記第3級アミンの有機カルボン酸塩を構成する有機カルボン酸は、脂肪族モノカルボン酸であることを特徴とする請求項1~8の何れか1項に記載のカルボニル化合物の製造方法。 The method for producing a carbonyl compound according to any one of claims 1 to 8, wherein the organic carboxylic acid constituting the organic carboxylate of the tertiary amine is an aliphatic monocarboxylic acid.  上記一般式(II)で示される化合物は、下記一般式(IIa)で示される化合物であり、
 上記一般式(I)で示されるカルボニル化合物は、下記一般式(Ia)で示されるカルボニル化合物であることを特徴とする請求項1~9の何れか1項に記載のカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000004
(一般式(IIa)中、Rは、炭素数1~4のアルキル基を表し、Yは、炭素数1~6のアルキル基もしくはハロアルキル基、炭素数2~6のアルケニル基もしくはハロアルケニル基、炭素数2~6のアルキニル基もしくはハロアルキニル基、または該アルキル基、ハロアルキル基、アルケニル基、ハロアルケニル基、アルキニル基もしくはハロアルキニル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)に置換された基を表し、nは0~6の整数を表す。nが2以上である場合、複数あるYは互いに同一でも異なっていてもよい。nが2以上である場合、複数あるYは互いに結合して、それぞれのYが結合している炭素原子とともに環を形成していてもよい。Xは、ハロゲン原子、炭素数1~4のアルキル基、炭素数1~4のハロアルキル基、炭素数1~4のアルコキシ基、炭素数1~4のハロアルコキシ基、フェニル基、シアノ基またはニトロ基を表し、mは0~5の整数を表し、mが2以上である場合、複数あるXは互いに同一でも異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000005
(一般式(Ia)中、X、Y、mおよびnは、それぞれ上記一般式(IIa)のX、Y、mおよびnと同じである。)
The compound represented by the general formula (II) is a compound represented by the following general formula (IIa),
10. The method for producing a carbonyl compound according to any one of claims 1 to 9, wherein the carbonyl compound represented by the general formula (I) is a carbonyl compound represented by the following general formula (Ia).
Figure JPOXMLDOC01-appb-C000004
(In the general formula (IIa), R 1 represents an alkyl group having 1 to 4 carbon atoms, Y represents an alkyl group or haloalkyl group having 1 to 6 carbon atoms, an alkenyl group or haloalkenyl group having 2 to 6 carbon atoms) A part of hydrogen atoms of the alkyl group, haloalkyl group, alkenyl group, haloalkenyl group, alkynyl group or haloalkynyl group is -OG (G is a hydroxy group) And n represents an integer of 0 to 6. When n is 2 or more, a plurality of Y may be the same or different from each other, and n is 2 or more. In this case, a plurality of Y may be bonded to each other to form a ring together with the carbon atom to which each Y is bonded, where X is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or 1 carbon atom. Represents a haloalkyl group having 4 to 4, an alkoxy group having 1 to 4 carbon atoms, a haloalkoxy group having 1 to 4 carbon atoms, a phenyl group, a cyano group or a nitro group, m represents an integer of 0 to 5, and m is 2 or more And the plurality of Xs may be the same or different.)
Figure JPOXMLDOC01-appb-C000005
(In the general formula (Ia), X, Y, m and n are the same as X, Y, m and n in the general formula (IIa), respectively.)
 上記一般式(IIa)で示される化合物は、下記一般式(IIb)で示される化合物であり、
 上記一般式(Ia)で示されるカルボニル化合物は、下記一般式(Ib)で示されるカルボニル化合物であることを特徴とする請求項10に記載のカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000006
(一般式(IIb)中、YおよびYは、独立に、炭素数1~6のアルキル基もしくはハロアルキル基、または該アルキル基もしくはハロアルキル基の一部の水素原子が-OG(Gはヒドロキシ基の保護基を表す)によって置換された基を表し、YおよびYは互いに結合して、YおよびYが結合している炭素原子とともに環を形成していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。)
Figure JPOXMLDOC01-appb-C000007
(一般式(Ib)中、X、Y、Yおよびmは、それぞれ上記一般式(IIb)のX、Y、Yおよびmと同じである。)
The compound represented by the general formula (IIa) is a compound represented by the following general formula (IIb),
11. The method for producing a carbonyl compound according to claim 10, wherein the carbonyl compound represented by the general formula (Ia) is a carbonyl compound represented by the following general formula (Ib).
Figure JPOXMLDOC01-appb-C000006
(In General Formula (IIb), Y 1 and Y 2 independently represent an alkyl group having 1 to 6 carbon atoms or a haloalkyl group, or a hydrogen atom in a part of the alkyl group or haloalkyl group is -OG 1 (G 1 Represents a hydroxy-protecting group, and Y 1 and Y 2 may be bonded to each other to form a ring together with the carbon atom to which Y 1 and Y 2 are bonded. R 1, X and m are each the same as R 1, X and m in the general formula (IIa).)
Figure JPOXMLDOC01-appb-C000007
(In the general formula (Ib), X, Y 1, Y 2 and m are the same as each X in the general formula (IIb), and Y 1, Y 2 and m.)
 上記一般式(IIb)で示される化合物は、下記一般式(IIc)で示される化合物であり、
 上記一般式(Ib)で示されるカルボニル化合物は、下記一般式(Ic)で示されるカルボニル化合物であることを特徴とする請求項11に記載のカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000008
(一般式(IIc)中、GおよびGは、独立に、酸性条件下で解離する保護基を表し、GおよびGは互いに結合していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。)
Figure JPOXMLDOC01-appb-C000009
(一般式(Ic)中、X、G、Gおよびmは、それぞれ上記一般式(IIc)のX、G、Gおよびmと同じである。)
The compound represented by the general formula (IIb) is a compound represented by the following general formula (IIc),
The method for producing a carbonyl compound according to claim 11, wherein the carbonyl compound represented by the general formula (Ib) is a carbonyl compound represented by the following general formula (Ic).
Figure JPOXMLDOC01-appb-C000008
(In General Formula (IIc), G 2 and G 3 independently represent a protecting group that dissociates under acidic conditions, and G 2 and G 3 may be bonded to each other. R 1 , X, and m are These are the same as R 1 , X and m in the general formula (IIa).
Figure JPOXMLDOC01-appb-C000009
(In the general formula (Ic), X, G 2 , G 3 and m are the same as X, G 2, G 3 and m of each of the above general formula (IIc).)
 上記一般式(IIc)で示される化合物に第3級アミンを添加し、次いで該第3級アミンの添加量よりも少ない量の有機カルボン酸を添加することにより上記第3級アミンの有機カルボン酸塩を反応系中に生じさせ、脱アルコキシカルボニル化を行うことを特徴とする請求項12に記載のカルボニル化合物の製造方法。 An organic carboxylic acid of the tertiary amine is added by adding a tertiary amine to the compound represented by the general formula (IIc) and then adding an organic carboxylic acid in an amount smaller than the added amount of the tertiary amine. 13. The method for producing a carbonyl compound according to claim 12, wherein a salt is generated in the reaction system to carry out dealkoxycarbonylation.  上記一般式(IIc)で示される化合物は、下記一般式(IId)で示される化合物であり、
 上記一般式(Ic)で示されるカルボニル化合物は、下記一般式(Id)で示されるカルボニル化合物であることを特徴とする請求項12または13に記載のカルボニル化合物の製造方法。
Figure JPOXMLDOC01-appb-C000010
(一般式(IId)中、GおよびGは、独立に、水素原子、炭素数1~4のアルキル基、炭素数1~4のアルケニル基、または置換もしくは無置換のフェニル基、ナフチル基もしくはベンジル基を表し、GおよびGは互いに結合して、GおよびGが結合している炭素原子とともに環を形成していてもよい。R、Xおよびmは、それぞれ上記一般式(IIa)のR、Xおよびmと同じである。)
Figure JPOXMLDOC01-appb-C000011
(一般式(Id)中、X、G、Gおよびmは、それぞれ上記一般式(IId)のX、G、Gおよびmと同じである。)
The compound represented by the general formula (IIc) is a compound represented by the following general formula (IId),
14. The method for producing a carbonyl compound according to claim 12 or 13, wherein the carbonyl compound represented by the general formula (Ic) is a carbonyl compound represented by the following general formula (Id).
Figure JPOXMLDOC01-appb-C000010
(In the general formula (IId), G 4 and G 5 are independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 1 to 4 carbon atoms, or a substituted or unsubstituted phenyl group or naphthyl group. or a benzyl group, G 4 and G 5 bonded to each other, G 4 and G 5 may also form a ring with the carbon atom to which they are attached .R 1, X and m are each the general (It is the same as R 1 , X and m in the formula (IIa).)
Figure JPOXMLDOC01-appb-C000011
(In the general formula (Id), X, G 4 , G 5 and m are the same as X, G 4, G 5 and m respectively above general formula (IId).)
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