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WO2014023065A1 - 液晶显示面板及其制造方法 - Google Patents

液晶显示面板及其制造方法 Download PDF

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Publication number
WO2014023065A1
WO2014023065A1 PCT/CN2012/084554 CN2012084554W WO2014023065A1 WO 2014023065 A1 WO2014023065 A1 WO 2014023065A1 CN 2012084554 W CN2012084554 W CN 2012084554W WO 2014023065 A1 WO2014023065 A1 WO 2014023065A1
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WO
WIPO (PCT)
Prior art keywords
liquid crystal
region
substrate
thin film
film transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2012/084554
Other languages
English (en)
French (fr)
Inventor
陈世烽
许哲豪
施明宏
李征华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to DE112012006791.6T priority Critical patent/DE112012006791T5/de
Priority to US13/805,965 priority patent/US20150146130A1/en
Publication of WO2014023065A1 publication Critical patent/WO2014023065A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region

Definitions

  • the present invention relates to the field of liquid crystal display panels, and in particular, to a liquid crystal display panel and a method of fabricating the same.
  • the conventional method for curing the sealant 207 is to face the thin film transistor array substrate 202 of the liquid crystal display panel facing the ultraviolet light source 10, and place an ultraviolet mask between the thin film transistor array substrate 202 and the ultraviolet light source 10.
  • Ultraviolet Mask 201 irradiating the sealant 207 on the side of the thin film transistor array substrate 202 by the ultraviolet light source 10, and blocking the effective display area in the liquid crystal display panel by using the ultraviolet mask 201 (Active) Area).
  • the sealant 207 is irradiated with the ultraviolet light source 10 in order to cure the sealant 207, and the ultraviolet mask 201 is used to block the effective display area in order to prevent the ultraviolet light source 10 from damaging the liquid crystal molecules in the liquid crystal layer 203.
  • the ultraviolet shielding film 201 is used to block the effective display area, and the pre-tilting material in the liquid crystal display device can be prevented from being pre-cured and shaped.
  • the plane where the ultraviolet mask 201 is located and the plane where the liquid crystal layer 203 of the liquid crystal display panel is located have a certain distance L1 at the distance L1.
  • the distance L2 between the outer edge of the ultraviolet mask 201 and the outer edge of the liquid crystal layer 203 needs to have a minimum value, that is, the distance L2 cannot be smaller than the minimum value, otherwise the liquid crystal layer 203 will be subjected to the ultraviolet light source 10. Irradiation.
  • the conventional technical solution is to reduce the distance L3 between the sealant 207 and the outer edge of the effective display area, so that the distance L3 is as small as possible. In this case, it is necessary to make the distance L3 as small as possible, and to irradiate the sealant 207 with the ultraviolet light source 10, and to make the liquid crystal layer 203 not be irradiated by the ultraviolet light source 10, in the thin film transistor array substrate 202 and The technical solution of placing the ultraviolet mask 201 between the ultraviolet light sources 10 has not solved the technical problem of curing the sealant 207 and preventing the liquid crystal from being damaged.
  • the ultraviolet mask 201 is to be applied to the manufacturing process of the liquid crystal display panel, the ultraviolet mask 201 needs to be fabricated for the actual use of the product, and in the manufacturing process of the liquid crystal display panel, the ultraviolet mask 201 is also required. It is precisely aligned with the LCD panel, otherwise the above purpose will not be achieved.
  • the above technical solution makes the liquid crystal display panel have a high manufacturing cost and complicates the manufacturing process of the liquid crystal display panel.
  • An object of the present invention is to provide a liquid crystal display panel in which a light-transmitting second region is disposed at an edge of a color filter substrate during the process of curing the sealant by using an ultraviolet light source, so that the ultraviolet light source can be made of a color filter. Since the substrate side is irradiated with the sealant, the use of the ultraviolet mask can be omitted, and the liquid crystal in the liquid crystal display panel is not damaged, so that the manufacturing cost of the liquid crystal display panel can be reduced, and the manufacturing process of the liquid crystal display panel can be simplified.
  • Another object of the present invention is to provide a method for manufacturing a liquid crystal display panel.
  • the ultraviolet light source can be made Since the sealant is irradiated on the side of the color filter substrate, the use of the ultraviolet mask can be omitted, and the liquid crystal in the liquid crystal display panel is not damaged, so that the manufacturing cost of the liquid crystal display panel can be reduced, and the manufacturing process of the liquid crystal display panel can be simplified.
  • the present invention provides a liquid crystal display panel comprising: a thin film transistor array substrate; a color filter substrate comprising a light transmissive substrate, a black matrix layer and a colored layer, the transparent substrate having a first a surface and a second surface, the first surface is provided with a first region and a second region, the second region is located outside the first region, and the black matrix layer and the colored layer are disposed at the a liquid crystal layer disposed between the thin film transistor array substrate and the color filter substrate, a first surface of the light transmissive substrate facing the liquid crystal layer; and a bezel disposed on the thin film transistor Between the array substrate and the color filter substrate at a position corresponding to the second region; the liquid crystal layer and the color filter substrate having the black matrix layer and one side of the colored layer adjacent to each other The bezel is disposed at an outer edge of the liquid crystal layer.
  • the liquid crystal layer is disposed within a coverage of the first region.
  • an irradiation range of the ultraviolet light source on the second surface is greater than or equal to a range of projection of the second region on the second surface.
  • the thin film transistor array substrate has a third region and a fourth region, wherein the third region is a projection of the liquid crystal layer on the thin film transistor array substrate, and the fourth region is located at the The outer side of the third area; and the fourth area is provided with a light shielding material.
  • Another object of the present invention is to provide a liquid crystal display panel in which a light-transmitting second region is disposed at an edge of a color filter substrate during the process of curing the sealant by using an ultraviolet light source, so that the ultraviolet light source can be colored by color filtering. Since the sealant is irradiated on the side of the sheet substrate, the use of the ultraviolet mask can be omitted, and the liquid crystal in the liquid crystal display panel is not damaged, so that the manufacturing cost of the liquid crystal display panel can be reduced, and the manufacturing process of the liquid crystal display panel can be simplified.
  • the present invention provides a liquid crystal display panel comprising: a thin film transistor array substrate; a color filter substrate comprising a light transmissive substrate, a black matrix layer and a colored layer, the transparent substrate having a first surface and a second surface, the first surface is provided with a first region and a second region, the second region is located outside the first region, and the black matrix layer and the colored layer are disposed in the first region a liquid crystal layer disposed between the thin film transistor array substrate and the color filter substrate, a first surface of the transparent substrate facing the liquid crystal layer, and a bezel disposed on the thin film transistor array substrate
  • the frame is disposed between the thin film transistor array substrate and the color filter substrate at a position corresponding to the second region between the color filter substrate and the color filter substrate.
  • the liquid crystal layer is disposed within a coverage of the first region.
  • an irradiation range of the ultraviolet light source on the second surface is greater than or equal to a range of projection of the second region on the second surface.
  • the thin film transistor array substrate has a third region and a fourth region, wherein the third region is a projection of the liquid crystal layer on the thin film transistor array substrate, and the fourth region is located at the The outer side of the third area is described, and the fourth area is provided with a light shielding material.
  • Another object of the present invention is to provide a method for manufacturing a liquid crystal display panel.
  • the ultraviolet light source can be made Since the sealant is irradiated on the side of the color filter substrate, the use of the ultraviolet mask can be omitted, and the liquid crystal in the liquid crystal display panel is not damaged, so that the manufacturing cost of the liquid crystal display panel can be reduced, and the manufacturing process of the liquid crystal display panel can be simplified.
  • the present invention provides a method of fabricating a liquid crystal display panel comprising a thin film transistor array substrate, a color filter substrate, a liquid crystal layer and a bezel; the method comprising the following steps: (A) Providing the thin film transistor array substrate; (B) providing the color filter substrate, the color filter substrate comprising a light transmissive substrate, a black matrix layer, and a colored layer, the transparent substrate having a first surface and a first a second surface, the first surface is provided with a first region and a second region, the black matrix layer and the colored layer are disposed on the first region; (C) the thin film transistor array substrate, the The liquid crystal layer and the color filter substrate are integrated, and a sealant is disposed between the thin film transistor array substrate and the color filter substrate, and the liquid crystal layer is disposed on the thin film transistor array substrate and the Between the color filter substrates, the second surface of the transparent substrate faces the liquid crystal layer, and the sealant is disposed on the thin film transistor array substrate and the color filter Between the color filter substrates, the
  • the step (B) further includes the step of: (b1) defining the first region and the second region on a first surface of the light transmissive substrate, a second region is located outside of the first region; and (b2) forming the black matrix layer and the colored layer on the first region.
  • the step (C) further includes the steps of: (c1) disposing a liquid crystal layer within a range covered by the first region; and (c2) setting the sealant. A position corresponding to the second region between the thin film transistor array substrate and the color filter substrate.
  • the step (D) further includes the steps of: (d1) facing the second surface of the light-transmitting substrate toward the ultraviolet light source; (d2) adjusting the irradiation of the ultraviolet light source a range such that an irradiation range of the ultraviolet light source covers the second region of the light transmissive substrate; and (d3) irradiating the light transmissive substrate with the ultraviolet light source.
  • the method further includes: (E) providing a light shielding material on a side of the thin film transistor array substrate facing away from the liquid crystal layer.
  • the step (E) further includes the steps of: (e1) defining a third region and a fourth region on a side of the thin film transistor array substrate facing away from the liquid crystal layer, The fourth region is located outside the third region; and (e2) the light shielding material is disposed on the fourth region.
  • the present invention provides a light-transmitting second region at the edge of the color filter substrate such that the ultraviolet light source can be irradiated from the second surface of the light-transmitting substrate on the color filter substrate side, and the ultraviolet light source is irradiated.
  • the range covers the second area, and the transparent substrate can penetrate the ultraviolet light source.
  • the sealant placed on the second area can be irradiated by the ultraviolet light source to be cured to form a frame, and the ultraviolet mask can be omitted; Since the black matrix layer and the colored layer are disposed on the first region, and the black matrix layer and the colored layer are adjacent to the liquid crystal layer, the black matrix layer 205 and the colored layer 204 may be used to block the ultraviolet light source, and due to the black matrix The distance between the layer 205 and the colored layer 204 and the liquid crystal layer 203 is very small, and when the ultraviolet light source is irradiated to the first region, the black matrix layer and the colored layer can effectively protect the ultraviolet light source irradiated onto the first region ( Blocking) prevents the ultraviolet light source from being transmitted into the liquid crystal layer.
  • the black matrix layer and the colored layer are used to block the ultraviolet light source during the curing of the sealant, the outer edge of the black matrix layer and the colored layer and the liquid crystal layer The distance between the outer edges can be made very small, and the distance between the sealant and the outer edge of the liquid crystal layer can also be made very small, which is advantageous for realizing a narrow bezel in the liquid crystal display panel of the present invention. Since the light shielding material is attached to the position corresponding to the sealant on the thin film transistor array substrate, the backlight can be prevented from leaking at the second region, and the display quality of the liquid crystal display panel can be ensured.
  • FIG. 1 is a schematic view showing a curing manner of a sealant in a conventional liquid crystal display panel
  • FIG. 2 is a schematic view showing a curing manner of a sealant in a liquid crystal display panel of the present invention
  • 3 and 4 are flowcharts showing a method of manufacturing a liquid crystal display panel of the present invention.
  • FIG. 2 is a schematic view showing a curing manner of a sealant in a liquid crystal display panel of the present invention.
  • the liquid crystal display panel of the present invention comprises: a thin film transistor array substrate 302, a color filter substrate, a liquid crystal layer 303, and a bezel.
  • the color filter substrate includes a transparent substrate 306, a black matrix layer 305, and a colored layer 304, and the transparent substrate 306 may be a glass substrate.
  • the transparent substrate 306 has a first surface 3061 and a second surface 3062.
  • the first surface 3061 is provided with a first area A1 and a second area A2.
  • the second area A2 is located outside the first area A1, and the black matrix layer 305 and the coloring Layer 304 is disposed on first region A1.
  • the liquid crystal layer 303 is disposed between the thin film transistor array substrate 302 and the color filter substrate.
  • the first surface 3061 of the transparent substrate 306 faces the liquid crystal layer 303, that is, the liquid crystal layer 303 and the color filter substrate have a black matrix layer 305.
  • Adjacent to one side of the colored layer 304, specifically, the liquid crystal layer 303 is disposed within the coverage of the first area A1.
  • the frame is disposed between the thin film transistor array substrate 302 and the color filter substrate, and the frame is disposed between the thin film transistor array substrate 302 and the color filter substrate at a position corresponding to the second region A2, that is, the frame is disposed on the liquid crystal.
  • the range of the area A2 projected on the second surface 3062 is such that the transparent substrate 306 is transparent, so that the ultraviolet light source 10 can be irradiated onto the sealant 307 through the transparent substrate 306.
  • the transparent substrate 306 Since the second surface 3062 of the transparent substrate 306 is irradiated with the ultraviolet light source 10, and the irradiation range of the ultraviolet light source 10 covers the second area A2, and the transparent substrate 306 can pass through the ultraviolet light source 10, it is placed on the second area A2.
  • the sealant 307 can be irradiated by the ultraviolet light source 10 to be cured to form a bezel, and the use of the ultraviolet mask 201 can be omitted in the process; further, since the black matrix layer 305 and the colored layer 304 are disposed on the first region A1, Moreover, the black matrix layer 305 and the colored layer 304 are adjacent to the liquid crystal layer 303, and therefore, the black matrix layer 305 and the colored layer 304 can be used to block the ultraviolet light source, and due to the black matrix layer 305 and the colored layer 304 and the liquid crystal layer 303 The distance between the ultraviolet light source 10 and the colored layer 304 can effectively protect (block) the ultraviolet light source 10 irradiated onto the first area A1 when the ultraviolet light source 10 is irradiated to the first area A1 to prevent the ultraviolet light.
  • the light source 10 is transmitted into the liquid crystal layer 303.
  • the black matrix layer 305 and the colored layer 304 are used to block the ultraviolet light source 10 during the curing of the sealant 307, the outer sides of the black matrix layer 305 and the colored layer 304 are disposed.
  • the distance D2 between the edge and the outer edge of the liquid crystal layer 303 can be made very small, and the distance D3 between the sealant 307 and the outer edge of the liquid crystal layer 303 can also be made very small. It is advantageous to realize a narrow bezel in the liquid crystal display panel of the present invention.
  • a third region A3 is disposed on a side of the thin film transistor array substrate 302 facing away from the liquid crystal layer 303 and The fourth area A4, the third area A3 is a projection of the liquid crystal layer 303 on the side of the thin film transistor array substrate 302 facing away from the liquid crystal layer 303, or the third area A3 is within the coverage of the liquid crystal layer 303, that is, the third area
  • the area of A3 is smaller than the area of the area corresponding to the liquid crystal layer 303, the fourth area A2 is located outside the third area A3, and the fourth area A4 is provided with the light shielding material 301, which may be black glue or plastic, etc. .
  • FIG. 3 and FIG. 4 are flowcharts showing a method of manufacturing a liquid crystal display panel of the present invention.
  • the liquid crystal display panel includes a thin film transistor array substrate 302, a color filter substrate, a liquid crystal layer 303, and a bezel.
  • a thin film transistor array substrate 302 is provided.
  • a color filter substrate in step 302 to step 303, includes a transparent substrate 306, a black matrix layer 305, and a colored layer 304.
  • the transparent substrate 306 may be a glass substrate, and the transparent substrate 306 has First surface 3061 and second surface 3062. Specifically, in step 302, a first area A1 and a second area A2 are defined on the first surface 3061 of the transparent substrate 306, and the second area A2 is located outside the first area A1.
  • a black matrix layer 305 and a colored layer 304 are formed on the first area A1.
  • steps 304 to 306 the thin film transistor array substrate 302, the liquid crystal layer 303, and the color filter substrate are integrated, and a sealant 307 is disposed between the thin film transistor array substrate 302 and the color filter substrate.
  • step 304 the thin film transistor array substrate 302 and the color filter substrate are integrated, and then liquid crystal is injected between the thin film transistor array substrate 302 and the color filter substrate to form a liquid crystal layer 303.
  • the liquid crystal layer 303 is disposed between the thin film transistor array substrate 302 and the color filter substrate, the first surface 3061 of the transparent substrate 306 faces the liquid crystal layer 303, and further, the liquid crystal layer 303 is disposed at the first Within the range covered by the area A1, the first surface 3061 of the light-transmitting substrate 306 faces the liquid crystal layer 303.
  • the sealant 307 is disposed between the thin film transistor array substrate 302 and the color filter substrate at a position corresponding to the second region A2, that is, the bezel is disposed at the outer edge of the liquid crystal layer 303.
  • the sealant 307 is irradiated with the ultraviolet light source 10 to form a bezel.
  • the second surface 3062 of the light transmissive substrate 306 faces the ultraviolet light source 10.
  • the illumination range of the ultraviolet light source 10 is adjusted such that the illumination range of the ultraviolet light source 10 covers a range in which the second area A2 of the light-transmitting substrate 306 is projected on the first surface 3061.
  • the transparent substrate 306 is irradiated by the ultraviolet light source 10. Since the transparent substrate 306 is transparent, the ultraviolet light source 10 can be irradiated onto the sealant 307 through the transparent substrate 306.
  • the color filter substrate having the black matrix layer 305 and the colored layer 304 faces the ultraviolet light source 10, and the transparent substrate 306 can transmit the ultraviolet light source 10, the ultraviolet light source 10 can be irradiated onto the sealant 307, so that the sealant is made. 307 is cured, and the black matrix layer 305 and the colored layer 304 in the color filter substrate can be utilized as an ultraviolet mask, so that the black matrix layer 305 and the colored layer 304 can block the ultraviolet light source 10 for the liquid crystal layer 303.
  • the use of the ultraviolet mask 201 can be omitted, so that the black matrix layer 305 and the colored layer 304 disposed on the color filter substrate are close to the liquid crystal layer 303, so that the distance D3 between the sealant 307 and the effective display area can be made as small as possible.
  • the liquid crystal layer 303 can be prevented from being irradiated by the ultraviolet light source 10.
  • a light shielding material 301 is disposed on a side of the thin film transistor array substrate 302 facing away from the liquid crystal layer 303.
  • a third area A3 and a fourth area A4 are defined on a side of the thin film transistor array substrate 302 facing away from the liquid crystal layer 303, and the third area A3 is a liquid crystal layer 303 facing away from the liquid crystal layer on the thin film transistor array substrate 302.
  • the projection on one side of the 303, or the third area A3 is in the coverage of the liquid crystal layer 303, that is, the area of the third area A3 is smaller than the area of the area corresponding to the liquid crystal layer 303, and the fourth area A4 is located in the third area A3. The outside.
  • step 311 the light shielding material 301 is disposed on the fourth area A4, which may be black glue or plastic or the like. Therefore, it is possible to prevent the backlight from leaking at the second region A2, and to ensure the display quality of the liquid crystal display panel.
  • Step 310 and step 311 can be integrated in step 301.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
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Description

液晶显示面板及其制造方法 技术领域
本发明涉及液晶显示面板技术领域，特别涉及一种液晶显示面板及其制造方法。
 背景技术
在液晶显示面板的制造过程中，需要对框胶（Sealant）进行固化。如图1所示，传统的对框胶207进行固化的技术手段为：将液晶显示面板的薄膜晶体管阵列基板202面向紫外线光源10，在薄膜晶体管阵列基板202和紫外线光源10之间放置紫外线掩膜（Ultraviolet Mask）201，利用紫外线光源10在薄膜晶体管阵列基板202侧来照射框胶207，利用紫外线掩膜201来遮挡液晶显示面板中的有效显示区（Active Area）。
利用紫外线光源10照射框胶207是为了使框胶207得到固化，利用紫外线掩膜201来遮挡有效显示区是为了避免紫外线光源10对液晶层203中的液晶分子造成损害。对于PSVA（Polymer Sustained Vertical Alignment，高分子稳定垂直配向）模式的的液晶显示装置，利用紫外线掩膜201来遮挡有效显示区还可以防止该液晶显示装置中形成预倾角的材料提前固化定型。
由于紫外线掩膜201放置在薄膜晶体管阵列基板202和紫外线光源10之间，因此，紫外线掩膜201所在的平面和液晶显示面板的液晶层203所在的平面存在一定的距离L1，在该距离L1的值固定的情况下，紫外线掩膜201外侧边缘与液晶层203外侧边缘之间的距离L2需要具有最小值，即，该距离L2不能小于该最小值，否则液晶层203将会受到紫外线光源10的照射。
在将液晶显示面板的边框制作成窄边框时，传统的技术方案是减少框胶207与有效显示区外侧边缘的距离L3，使得该距离L3尽可能地小。在这种情况下，既要使该距离L3尽可能小，又要利用紫外线光源10来照射框胶207，而且又要使得液晶层203不被紫外线光源10照射到，在薄膜晶体管阵列基板202和紫外线光源10之间放置紫外线掩膜201的技术方案已经不能解决固化框胶207以及防止液晶受到损害的技术问题了。
此外，如果要将紫外线掩膜201应用到液晶显示面板的制造过程中，紫外线掩膜201需要针对实际使用的产品来制作，并且，在液晶显示面板的制造过程中，还需要将紫外线掩膜201与液晶显示面板精确对位，否则将无法实现上述目的。上述技术方案使得液晶显示面板具有较高的制造成本，并且使得液晶显示面板的制造工序复杂化。
故，有必要提出一种新的技术方案，以解决上述技术问题。
 技术问题
本发明的一个目的在于提供一种液晶显示面板，在利用紫外线光源来固化框胶的过程中，通过在彩色滤光片基板的边缘设置透光的第二区域，使得紫外线光源可由彩色滤光片基板侧照射框胶，因此可以省略使用紫外线掩膜，且不会对液晶显示面板中的液晶造成损害，使得液晶显示面板的制造成本得以降低，同时简化液晶显示面板的制造工序。
本发明的另一个目的在于提供一种液晶显示面板的制造方法，在利用紫外线光源来固化框胶的过程中，通过在彩色滤光片基板的边缘设置透光的第二区域，使得紫外线光源可由彩色滤光片基板侧照射框胶，因此可以省略使用紫外线掩膜，且不会对液晶显示面板中的液晶造成损害，使得液晶显示面板的制造成本得以降低，同时简化液晶显示面板的制造工序。
 技术解决方案
为解决上述问题，本发明提供了一种一种液晶显示面板，包括：薄膜晶体管阵列基板；彩色滤光片基板，包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述第二区域位于所述第一区域的外侧，所述黑色矩阵层和所述着色层设置在所述第一区域上；液晶层，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第一表面面向所述液晶层；以及边框，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上；所述液晶层与所述彩色滤光片基板具有所述黑色矩阵层和所述着色层的一面相邻，所述边框设置在所述液晶层的外侧边缘处。
在上述液晶显示面板中，所述液晶层设置在所述第一区域的覆盖范围内。
在上述液晶显示面板中，所述紫外线光源在所述第二表面上的照射范围大于或等于所述第二区域在所述第二表面上的投影的范围。
在上述液晶显示面板中，所述薄膜晶体管阵列基板具有第三区域和第四区域，所述第三区域为所述液晶层在所述薄膜晶体管阵列基板上的投影，所述第四区域位于所述第三区域的外侧；且所述第四区域上设置有遮光材料。
本发明的另一个目的在于提供一种液晶显示面板，在利用紫外线光源来固化框胶的过程中，通过在彩色滤光片基板的边缘设置透光的第二区域，使得紫外线光源可由彩色滤光片基板侧照射框胶，因此可以省略使用紫外线掩膜，且不会对液晶显示面板中的液晶造成损害，使得液晶显示面板的制造成本得以降低，同时简化液晶显示面板的制造工序。
为解决上述问题，本发明提供了一种液晶显示面板，包括：薄膜晶体管阵列基板；彩色滤光片基板，包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述第二区域位于所述第一区域的外侧，所述黑色矩阵层和所述着色层设置在所述第一区域上；液晶层，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第一表面面向所述液晶层；以及边框，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述边框设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上。
在上述液晶显示面板中，所述液晶层设置在所述第一区域的覆盖范围内。
在上述液晶显示面板中，所述紫外线光源在所述第二表面上的照射范围大于或等于所述第二区域在所述第二表面上的投影的范围。
在上述液晶显示面板中，所述薄膜晶体管阵列基板具有第三区域和第四区域，所述第三区域为所述液晶层在所述薄膜晶体管阵列基板上的投影，所述第四区域位于所述第三区域的外侧，且所述第四区域上设置有遮光材料。
本发明的另一个目的在于提供一种液晶显示面板的制造方法，在利用紫外线光源来固化框胶的过程中，通过在彩色滤光片基板的边缘设置透光的第二区域，使得紫外线光源可由彩色滤光片基板侧照射框胶，因此可以省略使用紫外线掩膜，且不会对液晶显示面板中的液晶造成损害，使得液晶显示面板的制造成本得以降低，同时简化液晶显示面板的制造工序。
为解决上述问题，本发明提供了一种液晶显示面板的制造方法，所述液晶显示面板包括薄膜晶体管阵列基板、彩色滤光片基板、液晶层和边框；所述方法包括以下步骤：（A）提供所述薄膜晶体管阵列基板；（B）提供所述彩色滤光片基板，所述彩色滤光片基板包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述黑色矩阵层和所述着色层设置在所述第一区域上；（C）将所述薄膜晶体管阵列基板、所述液晶层和所述彩色滤光片基板组合为一体，并在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间设置框胶，所述液晶层置于所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第二表面面向所述液晶层，所述框胶设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上；以及（D）利用紫外线光源由所述透光基板的第二表面照射所述框胶以固化形成所述边框。
在上述液晶显示面板的制造方法中，所述步骤（B）还包括以下步骤：（b1）在所述透光基板的第一表面上定义所述第一区域和所述第二区域，所述第二区域位于所述第一区域的外侧；以及（b2）在所述第一区域上形成所述黑色矩阵层和所述着色层。
在上述液晶显示面板的制造方法中，所述步骤（C）还包括以下步骤：（c1）将液晶层设置在所述第一区域所覆盖的范围内；以及（c2）将所述框胶设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上。
在上述液晶显示面板的制造方法中，所述步骤（D）还包括以下步骤：（d1）将所述透光基板的第二表面面向所述紫外线光源；（d2）调整所述紫外线光源的照射范围，使得所述紫外线光源的照射范围覆盖所述透光基板的所述第二区域；以及（d3）利用所述紫外线光源照射所述透光基板。
在上述液晶显示面板的制造方法中，所述方法还包括：（E）在所述薄膜晶体管阵列基板背向所述液晶层的一面上设置遮光材料。
在上述液晶显示面板的制造方法中，所述步骤（E）还包括以下步骤：（e1）在所述薄膜晶体管阵列基板背向所述液晶层的一面上定义第三区域和第四区域，所述第四区域位于所述第三区域的外侧；以及（e2）将所述遮光材料设置在所述第四区域上。
 有益效果
相对现有技术，本发明通过在彩色滤光片基板的边缘设置透光的第二区域，使得紫外线光源可由彩色滤光片基板侧的透光基板的第二表面进行照射，并且紫外线光源的照射范围覆盖第二区域，而且透光基板可以使紫外线光源穿透，因此，置于第二区域上的框胶可以受到紫外线光源的照射，从而得以固化形成边框，并可以省略使用紫外线掩膜；此外，由于第一区域上设置有黑色矩阵层和着色层，而且，该黑色矩阵层和着色层贴近该液晶层，因此，黑色矩阵层205和着色层204可以用来遮挡紫外线光源，并且由于黑色矩阵层205和着色层204与液晶层203之间的距离非常小，当紫外线光源照射到第一区域时，该黑色矩阵层和着色层可以对照射到第一区域上的紫外线光源进行有效的保护（遮挡），防止该紫外线光源透射到液晶层中。另外，在需要对液晶显示装置进行窄边框设计时，由于在对框胶进行固化的过程中利用了黑色矩阵层和着色层来遮挡紫外线光源，因此黑色矩阵层和着色层的外侧边缘与液晶层外侧边缘之间的距离可以做得非常小，同时，框胶与液晶层外侧边缘的距离也可以做得非常小，有利于在本发明的液晶显示面板中实现窄边框。由于在薄膜晶体管阵列基板上与该框胶对应的位置上贴附了遮光材料，因此可以防止背光于第二区域处泄露，保证液晶显示面板的显示品质。
 附图说明
图1为传统的液晶显示面板中框胶的固化方式的示意图；
图2为本发明的液晶显示面板中框胶的固化方式的示意图；
图3和图4为本发明的液晶显示面板的制造方法的流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。
参考图2，图2为本发明的液晶显示面板中框胶的固化方式的示意图。本发明的液晶显示面板包括：薄膜晶体管阵列基板302、彩色滤光片基板、液晶层303和边框。其中，彩色滤光片基板包括透光基板306、黑色矩阵层305和着色层304，透光基板306可以是玻璃基板。透光基板306具有第一表面3061和第二表面3062，第一表面3061上设置有第一区域A1和第二区域A2，第二区域A2位于第一区域A1的外侧，黑色矩阵层305和着色层304设置在第一区域A1上。液晶层303设置在薄膜晶体管阵列基板302和彩色滤光片基板之间，透光基板306的第一表面3061面向该液晶层303，即，液晶层303与彩色滤光片基板具有黑色矩阵层305和着色层304的一面相邻，具体地，液晶层303设置在第一区域A1的覆盖范围内。边框设置在薄膜晶体管阵列基板302和彩色滤光片基板之间，并且边框设置在薄膜晶体管阵列基板302和彩色滤光片基板之间与第二区域A2对应的位置上，即，边框设置在液晶层303的外侧边缘处，其中，边框由框胶307经紫外线光源10照射透光基板306的第二表面3062固化形成，其中，紫外线光源10在第二表面3062上的照射范围大于或等于第二区域A2在第二表面3062上投影的范围，由于透光基板306是透光的，因此紫外线光源10可以透过该透光基板306照射到框胶307上。
由于利用紫外线光源10照射透光基板306的第二表面3062，并且紫外线光源10的照射范围覆盖第二区域A2，而且透光基板306可以透过紫外线光源10，因此，置于第二区域A2上的框胶307可以受到紫外线光源10的照射，从而得以固化，形成边框，在此过程中可以省略使用紫外线掩膜201；此外，由于第一区域A1上设置有黑色矩阵层305和着色层304，而且，该黑色矩阵层305和着色层304贴近该液晶层303，因此，黑色矩阵层305和着色层304可以用来遮挡紫外线光源，并且由于黑色矩阵层305和着色层304与液晶层303之间的距离非常小，当紫外线光源10照射到第一区域A1时，该黑色矩阵层305和着色层304可以对照射到第一区域A1上的紫外线光源10进行有效的保护（遮挡），防止该紫外线光源10透射到液晶层303中。
在需要对液晶显示装置进行窄边框设计时，由于在对框胶307进行固化的过程中利用了黑色矩阵层305和着色层304来遮挡紫外线光源10，因此黑色矩阵层305和着色层304的外侧边缘与液晶层303外侧边缘之间的距离D2可以做得非常小，同时，框胶307与液晶层303外侧边缘的距离D3也可以做得非常小。有利于在本发明的液晶显示面板中实现窄边框。
在本发明中，为了防止背光于第二区域A2处泄露，保证液晶显示面板的显示品质，需要采取相应的措施：在薄膜晶体管阵列基板302背向液晶层303的一面上设置第三区域A3和第四区域A4，第三区域A3为液晶层303在薄膜晶体管阵列基板302背向液晶层303的一面上的投影，或者，第三区域A3处于液晶层303的覆盖范围内，即，第三区域A3的面积小于液晶层303所对应的区域的面积，第四区域A2位于第三区域A3的外侧，第四区域A4上设置有遮光材料301，该遮光材料301可以是黑色的胶或塑料等等。
参考图3和图4，图3和图4为本发明的液晶显示面板的制造方法的流程图。在本发明中，液晶显示面板包括薄膜晶体管阵列基板302、彩色滤光片基板、液晶层303和边框。
在步骤301，提供薄膜晶体管阵列基板302。
在步骤302至步骤303，提供彩色滤光片基板，其中，彩色滤光片基板包括透光基板306、黑色矩阵层305和着色层304，透光基板306可以是玻璃基板，透光基板306具有第一表面3061和第二表面3062。具体地，在步骤302，在透光基板306的第一表面3061上定义第一区域A1和第二区域A2，第二区域A2位于第一区域A1的外侧。在步骤303，在第一区域A1上形成黑色矩阵层305和着色层304。
在步骤304至步骤306，将薄膜晶体管阵列基板302、液晶层303和彩色滤光片基板组合为一体，并在薄膜晶体管阵列基板302和彩色滤光片基板之间设置框胶307。具体地，在步骤304，将薄膜晶体管阵列基板302和彩色滤光片基板组合为一体，然后在薄膜晶体管阵列基板302和彩色滤光片基板之间注入液晶，形成液晶层303。在步骤305，将液晶层303设置于薄膜晶体管阵列基板302和彩色滤光片基板之间，透光基板306的第一表面3061面向该液晶层303，进一步地，将液晶层303设置在第一区域A1所覆盖的范围内，透光基板306的第一表面3061面向液晶层303。在步骤306，将框胶307设置在薄膜晶体管阵列基板302和彩色滤光片基板之间与第二区域A2对应的位置上，即，边框设置在液晶层303的外侧边缘处。
在步骤307至步骤309，利用紫外线光源10照射框胶307以形成边框。具体地，在步骤307，将透光基板306的第二表面3062面向紫外线光源10。在步骤308，调整紫外线光源10的照射范围，使得紫外线光源10的照射范围覆盖透光基板306的第二区域A2在第一表面3061上投影的范围。在步骤309，利用紫外线光源10照射透光基板306，由于透光基板306是透光的，因此紫外线光源10可以透过该透光基板306照射到框胶307上。由于将具有黑色矩阵层305和着色层304的彩色滤光片基板面向紫外线光源10，而且透光基板306可以透过紫外线光源10，因此可以使得紫外线光源10照射到框胶307上，使得框胶307固化，同时可以利用彩色滤光片基板中的黑色矩阵层305和着色层304来充当紫外线掩膜，使得该黑色矩阵层305和着色层304可以为液晶层303遮挡紫外线光源10，在此过程中可以省略使用紫外线掩膜201，因此设置在彩色滤光片基板上的黑色矩阵层305和着色层304贴近液晶层303，既可以使得框胶307与有效显示区的距离D3尽可能小，又可以使得液晶层303不被紫外线光源10照射到。
在步骤310至步骤311，在薄膜晶体管阵列基板302背向液晶层303的一面上设置遮光材料301。具体地，在步骤310，在薄膜晶体管阵列基板302背向液晶层303的一面上定义第三区域A3和第四区域A4，第三区域A3为液晶层303在薄膜晶体管阵列基板302背向液晶层303的一面上的投影，或者，第三区域A3处于液晶层303的覆盖范围内，即，第三区域A3的面积小于液晶层303所对应的区域的面积，第四区域A4位于第三区域A3的外侧。在步骤311，将遮光材料301设置在第四区域A4上，该遮光材料301可以是黑色的胶或塑料等等。因此可以防止背光于第二区域A2处泄露，保证液晶显示面板的显示品质。步骤310和步骤311可以集成于步骤301中。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
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Claims (14)

  1. 一种液晶显示面板，其包括：
    薄膜晶体管阵列基板；
    彩色滤光片基板，包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述第二区域位于所述第一区域的外侧，所述黑色矩阵层和所述着色层设置在所述第一区域上；
    液晶层，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第一表面面向所述液晶层；以及
    边框，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上；
    所述液晶层与所述彩色滤光片基板具有所述黑色矩阵层和所述着色层的一面相邻，所述边框设置在所述液晶层的外侧边缘处。
  2. 根据权利要求1所述的液晶显示面板，其中
    所述液晶层设置在所述第一区域的覆盖范围内。
  3. 根据权利要求2所述的液晶显示面板，其中
    所述紫外线光源在所述第二表面上的照射范围大于或等于所述第二区域在所述第二表面上的投影的范围。
  4. 根据权利要求3所述的液晶显示面板，其中
    所述薄膜晶体管阵列基板具有第三区域和第四区域，所述第三区域为所述液晶层在所述薄膜晶体管阵列基板上的投影，所述第四区域位于所述第三区域的外侧；且所述第四区域上设置有遮光材料。
  5. 一种液晶显示面板，其包括：
    薄膜晶体管阵列基板；
    彩色滤光片基板，包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述第二区域位于所述第一区域的外侧，所述黑色矩阵层和所述着色层设置在所述第一区域上；
    液晶层，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第一表面面向所述液晶层；以及
    边框，设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上。
  6. 根据权利要求5所述的液晶显示面板，其中
    所述液晶层设置在所述第一区域的覆盖范围内。
  7. 根据权利要求6所述的液晶显示面板，其中
    所述紫外线光源在所述第二表面上的照射范围大于或等于所述第二区域在所述第二表面上的投影的范围。
  8. 根据权利要求7所述的液晶显示面板，其中
    所述薄膜晶体管阵列基板具有第三区域和第四区域，所述第三区域为所述液晶层在所述薄膜晶体管阵列基板上的投影，所述第四区域位于所述第三区域的外侧；且所述第四区域上设置有遮光材料。
  9. 一种液晶显示面板的制造方法，其中
    所述液晶显示面板包括薄膜晶体管阵列基板、彩色滤光片基板、液晶层和边框；所述方法包括以下步骤：
    （A）提供所述薄膜晶体管阵列基板；
    （B）提供所述彩色滤光片基板，所述彩色滤光片基板包括透光基板、黑色矩阵层和着色层，所述透光基板具有第一表面和第二表面，所述第一表面设置有第一区域和第二区域，所述黑色矩阵层和所述着色层设置在所述第一区域上；
    （C）将所述薄膜晶体管阵列基板、所述液晶层和所述彩色滤光片基板组合为一体，并在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间设置框胶，所述液晶层置于所述薄膜晶体管阵列基板和所述彩色滤光片基板之间，所述透光基板的第二表面面向所述液晶层，所述框胶设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上；以及
    （D）利用紫外线光源由所述透光基板的第二表面照射所述框胶以固化形成所述边框。
  10. 根据权利要求9所述的液晶显示面板的制造方法，其中
    所述步骤（B）还包括以下步骤：
    （b1）在所述透光基板的第一表面上定义所述第一区域和所述第二区域，所述第二区域位于所述第一区域的外侧；以及
    （b2）在所述第一区域上形成所述黑色矩阵层和所述着色层。
  11. 根据权利要求10所述的液晶显示面板的制造方法，其中
    所述步骤（C）还包括以下步骤：
    （c1）将液晶层设置在所述第一区域所覆盖的范围内；以及
    （c2）将所述框胶设置在所述薄膜晶体管阵列基板和所述彩色滤光片基板之间与所述第二区域对应的位置上。
  12. 根据权利要求11所述的液晶显示面板的制造方法，其中
    所述步骤（D）还包括以下步骤：
    （d1）将所述透光基板的第二表面面向所述紫外线光源；
    （d2）调整所述紫外线光源的照射范围，使得所述紫外线光源的照射范围覆盖所述透光基板的所述第二区域；以及
    （d3）利用所述紫外线光源照射所述透光基板。
  13. 根据权利要求12所述的液晶显示面板的制造方法，其中
    所述方法还包括：
    （E）在所述薄膜晶体管阵列基板背向所述液晶层的一面上设置遮光材料。
  14. 根据权利要求13所述的液晶显示面板的制造方法，其中
    所述步骤（E）还包括以下步骤：
    （e1）在所述薄膜晶体管阵列基板背向所述液晶层的一面上定义第三区域和第四区域，所述第四区域位于所述第三区域的外侧；以及
    （e2）将所述遮光材料设置在所述第四区域上。
PCT/CN2012/084554 2012-08-09 2012-11-14 液晶显示面板及其制造方法 Ceased WO2014023065A1 (zh)

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