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WO2014015485A1 - Device bearing apparatus - Google Patents

Device bearing apparatus Download PDF

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Publication number
WO2014015485A1
WO2014015485A1 PCT/CN2012/079144 CN2012079144W WO2014015485A1 WO 2014015485 A1 WO2014015485 A1 WO 2014015485A1 CN 2012079144 W CN2012079144 W CN 2012079144W WO 2014015485 A1 WO2014015485 A1 WO 2014015485A1
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WO
WIPO (PCT)
Prior art keywords
hole
gas
vacuum
discharge
carrying device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2012/079144
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French (fr)
Chinese (zh)
Inventor
严茂程
施翔尹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to PCT/CN2012/079144 priority Critical patent/WO2014015485A1/en
Publication of WO2014015485A1 publication Critical patent/WO2014015485A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H10P72/78
    • H10P72/7614

Definitions

  • the present invention relates to a device carrying device, and more particularly to a device carrying device capable of removing static electricity from a surface of a device.
  • Electrostatic damage is caused by electrostatic discharge and lattice breakdown and transistor breakdown. Electrostatic adsorption is the adsorption of fine dust caused by static electricity. Two kinds of electrostatic problems often occur at the same time, which causes damage to the product and makes the product yield greatly. Lowering, which leads to an increase in manufacturing costs.
  • FIG. 1A a schematic diagram of a carrier 10 of a conventional first substrate processing apparatus 100 is disclosed.
  • the carrier 10 is configured to carry a substrate 40 (as shown in FIG. 1C) and to maintain the position of the substrate 40 for subsequent processing.
  • the loading platform 10 mainly includes a bearing surface 11 , a bottom surface 12 , a plurality of through holes 13 , and a plurality of ejector pins 14 .
  • the through holes 13 extend through the bottom surface 12 from the bearing surface 11 .
  • FIG. 1B a cross-sectional view of the conventional stage 10 cut away from the A-A line in FIG. 1A is disclosed.
  • the first substrate processing apparatus 100 firstly extends the ejector pin 14 from the bottom surface 12, and then the substrate 40 is placed in the chassis by a transfer arm (not shown). The ejector pin 14 is retracted into the carrier 10 so that the substrate 40 can be placed flat on the bottom surface 12 of the carrier 10.
  • FIG. 1C a cross-sectional view of the substrate 40 placed on the carrier 10 of FIG. 1B is disclosed.
  • a process of position confirmation is performed to ensure that the substrate 40 is placed in the correct position, and then the through hole 13 is evacuated.
  • the substrate 40 is subsequently processed (for example, an alignment film is printed on a glass substrate).
  • the vacuum of the through hole 13 is released, and the ejector pin 14 is again extended from the bottom surface 12 to lift the substrate 40, and the transfer arm is used to remove the The substrate 40 is used to complete the processing of the substrate.
  • the substrate 40 and the stage 10 achieve the action of contact and separation.
  • FIG. 2 a cross-sectional view of a conventional second substrate processing apparatus 200 is disclosed.
  • an existing method is to further provide an ion wind bar 60 and/or an x-ray device 70 to the second substrate processing device 200, wherein the ion wind bar 60 is located above the substrate 40.
  • the ion wind bar 60 removes static electricity by means of corona discharge, and mainly discharges with a tip of a discharge needle (not shown) to generate an ion wind with charged plural ions, and blows the ions by
  • the manner of the substrate 40 is such that the ions and the static electricity generate a charge neutralization effect; and the x-ray device 70 is located on the side of the substrate 40, and is destaticized by soft x-rays, mainly by soft x
  • the gas is ionized by the radiation in the vicinity of the substrate 40, and the ionized gas is used to neutralize the static electricity on the surface of the substrate 40.
  • the ion wind bar 60 is often composed of a plurality of discharge needles, and the overall volume is large, and the scope of eliminating static electricity is small, and can only be installed on the upper or side of the machine, so that Eliminating static electricity at a short distance, however, the ion wind of the ion blower 60 cannot reach the bottom surface of the substrate 40 at all due to a large amount of static electricity generated by the substrate 40 and the stage 10 due to the instantaneous peeling, so that it cannot be effective.
  • the X-ray device 70 is quickly eliminated because the equipment is too expensive, the generated X-rays are harmful to the human body, and after performing static elimination, it is easy to cause an imbalance of ions in the environment, and it is difficult to be widely applied. In the electronics industry. Further, the soft x-rays generated by the X-ray device 70 are easily absorbed by the air and cannot pass through the substrate 40, and the substrate 40 and the bottom surface are instantaneous when the substrate 40 and the stage 10 are peeled off. The gas between 12 is difficult to ionize, so that a large amount of static electricity on the substrate 40 is still difficult to be eliminated, so that the substrate 40 will still be destroyed by static electricity thereafter.
  • the main object of the present invention is to provide a device carrying device comprising a carrying platform, a vacuum system, a gas supply system and a discharge system.
  • the loading platform has a bearing surface and at least one through hole, and the through hole is defined in the bearing surface and the bottom surface;
  • the vacuum system provides a vacuum suction to the through hole;
  • the air supply system is used for Outputting at least one gas to the through hole;
  • the discharge system ionizing the gas into an ionic fluid; wherein the through hole is for providing the vacuum suction to carry and attract a device; or
  • the ionic fluid is provided when the device is depressurized to eliminate static electricity from the surface of the device.
  • the device carrier can more effectively, more uniformly and more quickly eliminate static electricity on the surface of a device.
  • a secondary object of the present invention is to provide a device carrying device comprising a carrier, a vacuum system, a gas supply system and a discharge system.
  • the loading platform has a bearing surface, at least one through hole and a plurality of ejector pins, the through hole is defined in the bearing surface, and the ejector pin is received in the loading platform or extends upward from the bearing surface
  • the vacuum system provides a vacuum suction to the through hole;
  • the gas supply system outputs at least one gas at a pressure;
  • the discharge system includes at least one discharge tube and a power supply, the discharge tube Discharging the gas to ionize an ion wind, the power supply for providing an electrical signal to the discharge tube; wherein the through hole is for providing the vacuum suction to carry and attract a device; Or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity from the surface of the device.
  • the discharge system simultaneously performs a monitoring action to reduce the amount of ionization of the gas while continuously reducing the static electricity on the surface of the device, so as to ensure that the static electricity on the surface of the device is eliminated, the production can be stopped.
  • the ionic fluid does not cause excessive accumulation of the ionic fluid on the device.
  • Another object of the present invention is to provide a device carrying device wherein the gas supply system includes a gas supply, a conduit, and a screen.
  • the conduit is connected to the bearing surface and the through hole, and filters the gas by using the screen disposed between the gas supply and the through hole, which can not only pass through the
  • the gas of the screen is cleaner to produce a cleaner ion fluid, and may also filter dust or impurities from the gas supply to help ensure that no electrostatic particles remain on the surface of the device or dust.
  • the present invention provides a device carrying device including a carrier, a vacuum system, a gas supply system, and a discharge system.
  • the loading platform has a bearing surface and at least one through hole, and the through hole is defined in the bearing surface and the bottom surface; the vacuum system provides a vacuum suction to the through hole; the air supply system is used for Outputting at least one gas to the through hole; the discharge system ionizing the gas into an ionic fluid; wherein the through hole is for providing the vacuum suction to carry and attract a device; or The ionic fluid is provided when the device is depressurized to eliminate static electricity from the surface of the device.
  • the present invention provides another device carrying device comprising: a carrying platform, a vacuum system, a gas supply system and a discharge system.
  • the loading platform has a bearing surface, at least one through hole and a plurality of ejector pins, the through hole is defined in the bearing surface, and the ejector pin is received in the loading platform or extends upward from the bearing surface
  • the vacuum system provides a vacuum suction to the through hole; the gas supply system outputs at least one gas at a pressure; and the discharge system includes at least one discharge tube and a power supply, the discharge tube Discharging the gas to ionize an ion wind, the power supply for providing an electrical signal to the discharge tube; wherein the through hole is for providing the vacuum suction to carry and attract a device; Or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity from the surface of the device.
  • the discharge system includes: at least one discharge tube that ionizes the gas to form the ionic fluid having a plurality of positive or negative ions; and a power supply that supplies an electrical signal to the discharge And a monitor, wherein the monitor monitors an electrode polarity of the discharge end and a potential difference between the discharge end and the device when the device is disposed on the ejector pin, The electrical signal is then modulated.
  • the electrical signal is a pulsed alternating current signal.
  • the discharge tube includes a discharge end, the discharge end is disposed in the through hole, and the discharge end ionizes the gas into a plurality of positive or negative ions according to the electrical signal.
  • the vacuum system includes: a vacuum generator, at least a first conduit, and a first valve.
  • the vacuum generator is configured to generate the vacuum suction; the at least one first conduit is connected to the through hole; and the first valve is located between the first conduit and the through hole.
  • the gas supply system includes: a gas supply for outputting the gas; at least one second conduit connected to the through hole; and a second valve located at the first Between the two conduits and the through holes; and at least one screen having a plurality of screen openings disposed between the gas supply and the second conduit.
  • the gas supply unit outputs the gas at a pressure of 0.5 MPa (micropascal), and the pore size of the mesh is 0.01 ⁇ m (micrometer).
  • the through hole has a diameter of 4 mm (mm), and a hole wall of the through hole is coated with a silicone layer.
  • the carrying platform further includes a plurality of ejector pins, which are received in the loading platform or protrude from the bearing surface.
  • the device is a glass substrate of a liquid crystal display semi-finished product.
  • the device carrying device of the present invention can more effectively, more uniformly and more quickly eliminate the static electricity on the surface of the bundled device, and can simultaneously perform the monitoring action to continuously reduce the static electricity on the surface of the device.
  • the amount of ionization of the gas is also reduced to ensure that the generation of the ionic fluid is stopped after the static electricity on the surface of the device is eliminated, so that excessive accumulation of the ionic fluid in the device is not caused. Therefore, it can ensure that the device no longer retains electrostatic particles or dust, so as to achieve the goal of improving product yield.
  • 1A is a schematic view of a carrier of a conventional first processing apparatus.
  • Figure 1B is a cross-sectional view of the prior art carrier taken from line A-A of Figure 1A.
  • Figure 1C is a cross-sectional view of the substrate placed on the carrier of Figure 1B.
  • FIG. 2 is a cross-sectional view of a conventional second substrate processing apparatus.
  • Figure 3 is a cross-sectional view of a device carrying device in accordance with an embodiment of the present invention.
  • 3A is a partial enlarged view of a device carrying device according to an embodiment of the present invention.
  • the device carrying device proposed by the invention is mainly used in the field of insulator manufacturing, in particular in the field of semiconductor or optoelectronic product manufacturing. It is mainly used to remove static electricity generated on the surface of the device when the device is separated from the processing platform, and to prevent residual static electricity from damaging the device during subsequent processing.
  • the device carrying device 300 mainly comprises a carrying platform 10, a gas supply system 20, a discharge system 30 and a vacuum system 80 for processing a device 50, which will be described in detail below.
  • FIG. 3A discloses a partial enlarged view of a device carrying device 300 in accordance with an embodiment of the present invention.
  • the device carrying device 300 of the first embodiment of the present invention may be a glass substrate processing device of a liquid crystal display, and the device 50 may be a workpiece or a substrate, and the carrying platform 10 may be a processing platform for printing an alignment film, which is not limited thereto, and the carrier 10 may also be a platform for processing any insulator material, semiconductor substrate or optoelectronic product.
  • the loading platform 10 includes a bearing surface 11 , a bottom surface 12 , and at least one through hole 13 , wherein the through hole 13 is electrically connected to the bearing surface 11 and the bottom surface 12 , but not limited thereto. 13 may also be that the bearing surface 11 and at least one side of the carrying platform 10 are turned on.
  • the carrier 10 can be uniformly opened 30 and 25 diameters respectively corresponding to the length and the width.
  • the through hole 13 of 4 mm, but is not intended to limit the invention.
  • the carrier 10 can further comprise a plurality of ejector pins 14 that are received in the movable platform in the movable platform 10 and extend from the bearing surface 11 as necessary. .
  • the vacuum system 80 is configured to provide a vacuum suction to the through hole 13 to carry and attract the device 50.
  • the vacuum system 80 includes a vacuum generator 81, a plurality of first conduits 82, and a first valve 83, wherein the first conduit 82 is located between the vacuum generator 81 and the through hole 13, and the a first conduit 82 is connected to the interface between the through hole 13 and the bearing surface 11, so that the vacuum generator 81 pulls out the gas in the through hole 13 to make the through hole 13 form a vacuum state.
  • the first valve 83 is located between the vacuum generator 81 and the through hole 13 for controlling the vacuum suction of the vacuum generator 81 to the through hole 13.
  • the air supply system 20 outputs a clean and dry plurality of gases to the through holes 13 at a pressure to release the vacuum state of the through holes 13.
  • the gas supply system 20 includes a gas supply 21, a plurality of second conduits 22, at least one screen 23, and a second valve 24, wherein the gas supply 21 outputs the gas according to the gas pressure; a second duct 22 is disposed between the gas supply 21 and the through hole 13, and the second duct 22 is connected to a boundary between the through hole 13 and the bottom surface 12; the second valve 24 is located Between the second conduit 22 and the through hole 13 for receiving and controlling the gas from the gas supply 21, the gas is transmitted to the through hole by the second conduit 22 13; the screen 23 has a plurality of mesh holes (not shown) for making the gas passing through the screen 23 cleaner, and the screen 23 is disposed on the gas supplier 21 and the Between the through holes 13.
  • the gas pressure may be 0.5 MPa, and the pore size of the mesh may be 0.01 ⁇ m, but not limited thereto
  • the discharge system 30 is configured to excite the gas to ionize the gas into an ionic fluid having a plurality of positive or negative ions, and based on the gas supply system 20 at the gas pressure output.
  • the gas causes the ionic fluid to form an ionic wind to eliminate static electricity from the surface of the device 50.
  • the discharge system 30 includes at least one discharge tube 31, a power supply unit 32, and a monitor 33.
  • the discharge tube 31 includes a discharge end 311, and the discharge end 311 is disposed in the through hole 13;
  • the power supply 32 provides an electrical signal to the discharge tube 31, so that the discharge end 311 performs a tip discharge in the through hole 13 according to the electrical signal, thereby ionizing the gas into the ionic fluid, and The ion wind is blown from the through hole 13 toward the device 50;
  • the monitor 33 is configured to monitor an polarity of the discharge end 311 and a gap between the discharge end 311 and the device 50. a potential difference, thereby calculating a charge amount and an electrode property of the device 50, and modulating the electrical signal of the power supply 32 by using the charge amount of the device 50 and the polarity of the device 50.
  • the discharge end 311 can ionize the ion wind that is equal to the charge amount of the device 50 and the polarity is opposite.
  • the discharge end 311 may be disposed on the shaft center of the through hole 13, the discharge tube 31 may be a discharge needle having conductivity, and the discharge end 311 is one of the discharge needles.
  • the charge amount may be an electrostatic charge amount of the surface of the device 50, and the electrical signal may be a pulsed alternating current signal.
  • a hole in the wall of the through hole 13 may be covered with a silicone resin to prevent ozone generated by the discharge of the discharge end 311 from corroding the hole wall.
  • a transport arm places the device 50 on the ejector pin 14.
  • the ejector pin 14 is again slowly received into the carrier 10 so that the device 50 is disposed on the bottom surface 12, but the ejector pin 14 may be received in the carrier 10
  • the device 50 is placed directly on the bottom surface 12; thereafter, the device 50 is aligned to ensure placement in the correct position and the through hole is utilized by the vacuum system 80 13 is evacuated to form a vacuum state, so that the device 50 is closely attached to the bottom surface 12, and then the device 50 can be printed or surface-processed with an alignment film.
  • the gas is introduced into the second conduit 22 by the gas supply system 20, and the discharge system 30 is activated. Once the gas passes through the discharge end 311, a portion of the gas is ionized into the electron or the ion and mixed with the non-ionized gas to form the ion wind. At this time, since the ion wind passes into the through hole 13, the through hole 13 returns to the atmospheric state from a vacuum state, which helps the ejector pin 14 to lift the device 50, so that the Device 50 exits the bottom surface 12.
  • the ion wind is not only to return the through hole 13 to the atmospheric state, so that the device 50 can be easily separated from the bundled platform 10, and more importantly, the device carrying device 300 may also utilize the positively charged ions or the negatively charged electrons in the ion wind to purge the device 50, thereby causing electrostatic particles and ions dispersed on the surface of the device 50.
  • the wind is electrically neutralized.
  • the gas supply system 20 continues to output the gas from the end of the processing of the device 50 until the device 50 is carried away from the ejector pin 14. And the discharge system 30 continues to ionize the gas.
  • the monitor 32 also continuously monitors the polarity of the discharge end 311, and the potential difference between the discharge end 311 and the device 50, and regulates the pulsed AC signal.
  • the discharge end 311 is ionized out of the ion wind that is equal to the charge amount of the device 50 and opposite in polarity.
  • an advantage of the above features of the embodiments of the present invention is that the device carrying device 300 eliminates static electricity to the device 50 by the carrier 10, the gas supply system 20, and the discharge system 30. And evacuating the through hole by the vacuum system 80. It mainly uses the gas supply system 20 to output the gas at the gas pressure, and ionizes the gas to include the electron or the ion by the discharge end 311 disposed in the through hole 13. The ionic fluid, and because the gas supply system 20 continues to supply the gas at the gas pressure, causing the ionic fluid to blow the surface of the device 50 in the form of the ion wind, and the device 50 Electrical neutralization is performed to achieve the purpose of more efficient, more uniform and more rapid elimination of static electricity.
  • the monitor 33 simultaneously monitors the polarity of the discharge end 311 and between the discharge end 311 and the device 50. a potential difference, and modulating the pulsed alternating current signal of the electrical signal to ensure that the device carrying device 300 can provide an equal amount of electrical power to the static electricity accumulated on the surface of the device 50, and the electrical opposite
  • the ionic fluid and since the monitor 33 is continuously monitoring, the monitor 33 also modulates the pulsed AC as the static electricity on the surface of the device 50 continues to decrease. Signals to ensure that the static electricity on the surface of the device 50 is eliminated, the generation of the ionic fluid can be stopped without causing excessive accumulation of the ionic fluid on the device 50.
  • the second duct 22 of the air supply system 20 is connected to the boundary between the through hole 13 and the bottom surface 12, and utilizes a space disposed between the gas supply 21 and the through hole 13. Screening the screen 23, filtering the gas to not only make the gas passing through the screen hole cleaner, so as to produce a purer ionic fluid, and also filter the dust output from the gas supply unit 21. Or impurities, which helps to ensure that the device 50 no longer retains electrostatic particles or dust to achieve the goal of improving product yield.

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Abstract

A device bearing apparatus (300) comprises: a bearing table (10), a vacuum system (80), a gas supply system (20), and a discharge system (30). The bearing table (10) has a bearing surface (11), a bottom surface (12), and at least one through hole (13), and the through hole (13) connects the bearing surface (11) to the bottom surface (12); the vacuum system (80) provides a vacuum suction to the through hole (13); the gas supply system (20) is used to output gas of at least one kind to the through hole (13); and the discharge system (30) discharges electricity to the gas, so that the gas is ionized into an ionic liquid. Therefore, the through hole (13) can be used to provide the vacuum suction to bear and suck a device (50), or used to provide the ionic liquid when the device (50) is vacuum-released, so as to eliminate static on the surface of the device (50) more efficiently, evenly, and rapidly.

Description

器件承载装置 Device carrier 技术领域Technical field

本发明是有关于一种器件承载装置,特别是有关于一种能去除器件表面的静电的器件承载装置。The present invention relates to a device carrying device, and more particularly to a device carrying device capable of removing static electricity from a surface of a device.

背景技术Background technique

在液晶显示器(Liquid Crystal Display,LCD)、等离子显示器(Plasma Display Panel,PDP)以及半导制程中,常会产生许多静电现象,导致产品损害或产生缺陷。静电对产品所造成的危害主要有:静电破坏(Electro Static Damage;ESD)及静电吸附(Electro Static Attraction;ESA)。静电破坏即是静电放电导致晶格破坏和晶体管击穿,而静电吸附则是静电导致的细微灰尘吸附,两种静电问题常会同时发生,并对产品造成加成的损害,使产品的良率大幅降低,从而成为导致制造成本上升。In Liquid Crystal Display (LCD), Plasma Display (Plasma) In the Display Panel (PDP) and semi-conducting processes, many static phenomena are often generated, resulting in product damage or defects. The main hazards caused by static electricity are: electrostatic damage (Electro Static Damage; ESD) and Electrostatic Static Attraction; ESA). Electrostatic damage is caused by electrostatic discharge and lattice breakdown and transistor breakdown. Electrostatic adsorption is the adsorption of fine dust caused by static electricity. Two kinds of electrostatic problems often occur at the same time, which causes damage to the product and makes the product yield greatly. Lowering, which leads to an increase in manufacturing costs.

请参照图1A所示,其揭示现有第一基板加工装置100的承载台10的示意图。所述承载台10用以承载一基板40(如图1C所示),并使所述基板40的位置保持固定,以便进行后续加工。所述承载台10主要包含一承载面11、一底面12、复数通孔13及复数顶出销14,其中所述通孔13自所述承载面11贯穿所述底面12。Referring to FIG. 1A, a schematic diagram of a carrier 10 of a conventional first substrate processing apparatus 100 is disclosed. The carrier 10 is configured to carry a substrate 40 (as shown in FIG. 1C) and to maintain the position of the substrate 40 for subsequent processing. The loading platform 10 mainly includes a bearing surface 11 , a bottom surface 12 , a plurality of through holes 13 , and a plurality of ejector pins 14 . The through holes 13 extend through the bottom surface 12 from the bearing surface 11 .

请参照图1B所示,其揭示图1A中自A-A虚线切下的现有的承载台10的剖视图。在制造过程中,所述第一基板加工装置100会先使所述顶出销14自所述底面12伸出,此时再利用一搬送臂(未绘示)将所述基板40放置在所述顶出销14上,再令所述顶出销14收回至所述承载台10内,让所述基板40能平放在所述承载台10的所述底面12上。Referring to FIG. 1B, a cross-sectional view of the conventional stage 10 cut away from the A-A line in FIG. 1A is disclosed. In the manufacturing process, the first substrate processing apparatus 100 firstly extends the ejector pin 14 from the bottom surface 12, and then the substrate 40 is placed in the chassis by a transfer arm (not shown). The ejector pin 14 is retracted into the carrier 10 so that the substrate 40 can be placed flat on the bottom surface 12 of the carrier 10.

请参照图1C所示,其揭示所述基板40置于图1B的承载台10上的剖视图。当所述基板40被放在所述底面12上后,会再进行位置确认的程序,以确保所述基板40被放置在正确的位置上,其后利用对所述通孔13进行抽真空,以便使所述基板40牢固于所述所述底面12,并于后续对所述基板40进行加工(例如对一玻璃基板印刷一层配向膜)。一旦加工完成,即解除所述通孔13的真空,并使所述顶出销14再次自所述底面12伸出以使所述基板40被举起,以及利用所述搬送臂取走所述基板40,以完成所述基板的加工程序。然而,在上述过程中,所述基板40和所述承载台10会实现接触和分离的动作。当所述基板40与所述承载台10分离的瞬间,即容易产生大量的剥离静电和摩擦静电,使所述基板40与所述底面12之间产生电位差,若未能立即将所述基板40上的静电消除,就容易因此使所述基板40受到静电的破坏。Referring to FIG. 1C, a cross-sectional view of the substrate 40 placed on the carrier 10 of FIG. 1B is disclosed. After the substrate 40 is placed on the bottom surface 12, a process of position confirmation is performed to ensure that the substrate 40 is placed in the correct position, and then the through hole 13 is evacuated. In order to secure the substrate 40 to the bottom surface 12, the substrate 40 is subsequently processed (for example, an alignment film is printed on a glass substrate). Once the processing is completed, the vacuum of the through hole 13 is released, and the ejector pin 14 is again extended from the bottom surface 12 to lift the substrate 40, and the transfer arm is used to remove the The substrate 40 is used to complete the processing of the substrate. However, in the above process, the substrate 40 and the stage 10 achieve the action of contact and separation. When the substrate 40 is separated from the stage 10, a large amount of stripping static electricity and friction static electricity are easily generated, and a potential difference is generated between the substrate 40 and the bottom surface 12, if the substrate is not immediately taken. The static elimination on 40 is easy to cause the substrate 40 to be damaged by static electricity.

请参照图2所示,其揭示现有的第二基板加工装置200的剖视图。为了消除静电问题,现有的做法是对所述第二基板加工装置200另设置一离子风棒60及/或一x射线装置70,其中所述离子风棒60位于所述基板40上方,所述离子风棒60是以电晕放电的方式去除静电,其主要是利用一放电针(未绘示)的尖端进行放电,以产生具带电的复数离子的离子风,并经由将所述离子吹到所述基板40上的方式使所述离子与静电产生电荷中和效果;而所述x射线装置70是位于所述基板40一侧,并利用软x射线除静电,其主要是借助软x射线对所述基板40附近的气体进行离子化,再利用被离子化的气体来中和所述基板40表面的静电。Referring to FIG. 2, a cross-sectional view of a conventional second substrate processing apparatus 200 is disclosed. In order to eliminate the problem of static electricity, an existing method is to further provide an ion wind bar 60 and/or an x-ray device 70 to the second substrate processing device 200, wherein the ion wind bar 60 is located above the substrate 40. The ion wind bar 60 removes static electricity by means of corona discharge, and mainly discharges with a tip of a discharge needle (not shown) to generate an ion wind with charged plural ions, and blows the ions by The manner of the substrate 40 is such that the ions and the static electricity generate a charge neutralization effect; and the x-ray device 70 is located on the side of the substrate 40, and is destaticized by soft x-rays, mainly by soft x The gas is ionized by the radiation in the vicinity of the substrate 40, and the ionized gas is used to neutralize the static electricity on the surface of the substrate 40.

具体而言,如图2所示,所述离子风棒60常由多个放电针头所组成,整体体积较大而消除静电的作用范围较小,只能安装在机台的上方或侧面,以便消除近距离的静电,然而对于所述基板40和所述承载台10因瞬间剥离所产生的大量静电,所述离子风机60的离子风根本无法到达所述基板40的底表面,故无法有效的快速消除其静电;至于所述X射线装置70则因为设备价格过于昂贵、所产生的X射线对人体有害,且在执行消除静电之后,容易使环境出现离子不平衡等缺点,很难广泛的应用于电子行业。此外,所述X射线装置70所产生的软x射线容易被空气吸收且不能穿过所述基板40,当所述基板40和所述承载台10剥离的瞬间,所述基板40和所述底面12之间的气体很难被离子化,使得所述基板40上的大量静电在依然难被消除,从而导致所述基板40于其后仍将被静电所破坏。Specifically, as shown in FIG. 2, the ion wind bar 60 is often composed of a plurality of discharge needles, and the overall volume is large, and the scope of eliminating static electricity is small, and can only be installed on the upper or side of the machine, so that Eliminating static electricity at a short distance, however, the ion wind of the ion blower 60 cannot reach the bottom surface of the substrate 40 at all due to a large amount of static electricity generated by the substrate 40 and the stage 10 due to the instantaneous peeling, so that it cannot be effective. The X-ray device 70 is quickly eliminated because the equipment is too expensive, the generated X-rays are harmful to the human body, and after performing static elimination, it is easy to cause an imbalance of ions in the environment, and it is difficult to be widely applied. In the electronics industry. Further, the soft x-rays generated by the X-ray device 70 are easily absorbed by the air and cannot pass through the substrate 40, and the substrate 40 and the bottom surface are instantaneous when the substrate 40 and the stage 10 are peeled off. The gas between 12 is difficult to ionize, so that a large amount of static electricity on the substrate 40 is still difficult to be eliminated, so that the substrate 40 will still be destroyed by static electricity thereafter.

故,确实有必要对器件提供一可有效消除静电的加工装置,以解决现有技术所存在的静电问题。Therefore, it is indeed necessary to provide a processing device capable of effectively eliminating static electricity to solve the static problem existing in the prior art.

技术问题technical problem

本发明的目的是提供一种器件承载装置,即对器件提供一种去除静电的加工装置,以解决现有技术所存在的静电问题。SUMMARY OF THE INVENTION It is an object of the present invention to provide a device carrying device that provides a device for removing static electricity to the device to solve the electrostatic problems existing in the prior art.

技术解决方案Technical solution

本发明的主要目的在于提供一种器件承载装置,包含一承载台、一真空系统、一供气系统及一放电系统。所述承载台具有一承载面及至少一通孔,且所述通孔开设于所述承载面及所述底面;所述真空系统提供一真空吸力至所述通孔;所述供气系统用以输出至少一种气体至所述通孔;所述放电系统使所述气体电离成一离子流体;其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。由此所述器件承载装置可更有效率、更均匀且更迅速的消除一器件的表面的静电。The main object of the present invention is to provide a device carrying device comprising a carrying platform, a vacuum system, a gas supply system and a discharge system. The loading platform has a bearing surface and at least one through hole, and the through hole is defined in the bearing surface and the bottom surface; the vacuum system provides a vacuum suction to the through hole; the air supply system is used for Outputting at least one gas to the through hole; the discharge system ionizing the gas into an ionic fluid; wherein the through hole is for providing the vacuum suction to carry and attract a device; or The ionic fluid is provided when the device is depressurized to eliminate static electricity from the surface of the device. Thus the device carrier can more effectively, more uniformly and more quickly eliminate static electricity on the surface of a device.

本发明的次要目的在于提供一种器件承载装置,包含一承载台、一真空系统、一供气系统及一放电系统。所述承载台具有一承载面、至少一通孔及复数顶出销,所述通孔开设于所述承载面,且所述顶出销收纳于所述承载台内或自所述承载面向上伸出;所述真空系统提供一真空吸力至所述通孔;所述供气系统以一气压输出至少一种气体;以及所述放电系统包含至少一放电管及一电源供应器,所述放电管对所述气体放电,使所述气体电离一离子风,所述电源供应器用以提供一电信号至所述放电管;其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。所述放电系统同时持续进行监控动作,使所述器件表面的静电持续减少时,亦同时减少对所述气体的电离量,以确保所述器件表面上的静电被消除后,即可停止产生所述离子流体,不致造成过多的所述离子流体累积在所述器件上。A secondary object of the present invention is to provide a device carrying device comprising a carrier, a vacuum system, a gas supply system and a discharge system. The loading platform has a bearing surface, at least one through hole and a plurality of ejector pins, the through hole is defined in the bearing surface, and the ejector pin is received in the loading platform or extends upward from the bearing surface The vacuum system provides a vacuum suction to the through hole; the gas supply system outputs at least one gas at a pressure; and the discharge system includes at least one discharge tube and a power supply, the discharge tube Discharging the gas to ionize an ion wind, the power supply for providing an electrical signal to the discharge tube; wherein the through hole is for providing the vacuum suction to carry and attract a device; Or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity from the surface of the device. The discharge system simultaneously performs a monitoring action to reduce the amount of ionization of the gas while continuously reducing the static electricity on the surface of the device, so as to ensure that the static electricity on the surface of the device is eliminated, the production can be stopped. The ionic fluid does not cause excessive accumulation of the ionic fluid on the device.

本发明的另一目的在于提供一种器件承载装置,其中所述供气系统包含一气体供应器、一导管及一筛网。所述导管连接于所述承载面及所述通孔处,并利用设置于所述气体供应器及所述通孔之间的所述筛网,对所述气体进行过滤,不但可使通过所述筛网的所述气体更洁净,以便产生更纯净的所述离子流体,还可过滤自所述气体供应器输出的灰尘或杂质,有助于确保所述器件的表面不再残留静电粒子或灰尘。Another object of the present invention is to provide a device carrying device wherein the gas supply system includes a gas supply, a conduit, and a screen. The conduit is connected to the bearing surface and the through hole, and filters the gas by using the screen disposed between the gas supply and the through hole, which can not only pass through the The gas of the screen is cleaner to produce a cleaner ion fluid, and may also filter dust or impurities from the gas supply to help ensure that no electrostatic particles remain on the surface of the device or dust.

为达成本发明的前述目的,本发明提供一种器件承载装置,所述器件承载装置包含一承载台、一真空系统、一供气系统及一放电系统。所述承载台具有一承载面及至少一通孔,且所述通孔开设于所述承载面及所述底面;所述真空系统提供一真空吸力至所述通孔;所述供气系统用以输出至少一种气体至所述通孔;所述放电系统使所述气体电离成一离子流体;其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。To achieve the foregoing objects of the present invention, the present invention provides a device carrying device including a carrier, a vacuum system, a gas supply system, and a discharge system. The loading platform has a bearing surface and at least one through hole, and the through hole is defined in the bearing surface and the bottom surface; the vacuum system provides a vacuum suction to the through hole; the air supply system is used for Outputting at least one gas to the through hole; the discharge system ionizing the gas into an ionic fluid; wherein the through hole is for providing the vacuum suction to carry and attract a device; or The ionic fluid is provided when the device is depressurized to eliminate static electricity from the surface of the device.

再者,本发明提供另一种器件承载装置,所述器件承载装置包含:包含一承载台、一真空系统、一供气系统及一放电系统。所述承载台具有一承载面、至少一通孔及复数顶出销,所述通孔开设于所述承载面,且所述顶出销收纳于所述承载台内或自所述承载面向上伸出;所述真空系统提供一真空吸力至所述通孔;所述供气系统以一气压输出至少一种气体;以及所述放电系统包含至少一放电管及一电源供应器,所述放电管对所述气体放电,使所述气体电离一离子风,所述电源供应器用以提供一电信号至所述放电管;其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。Furthermore, the present invention provides another device carrying device comprising: a carrying platform, a vacuum system, a gas supply system and a discharge system. The loading platform has a bearing surface, at least one through hole and a plurality of ejector pins, the through hole is defined in the bearing surface, and the ejector pin is received in the loading platform or extends upward from the bearing surface The vacuum system provides a vacuum suction to the through hole; the gas supply system outputs at least one gas at a pressure; and the discharge system includes at least one discharge tube and a power supply, the discharge tube Discharging the gas to ionize an ion wind, the power supply for providing an electrical signal to the discharge tube; wherein the through hole is for providing the vacuum suction to carry and attract a device; Or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity from the surface of the device.

在本发明的一实施例中,所述放电系统包含:至少一放电管,电离所述气体以形成具有复数正或负离子的所述离子流体;一电源供应器,提供一电信号至所述放电管;以及一监控器,其中在所述器件安置于所述顶出销上时,所述监控器监测所述放电端之一电极性及所述放电端与所述器件间的一电位差,进而调变所述电信号。In an embodiment of the invention, the discharge system includes: at least one discharge tube that ionizes the gas to form the ionic fluid having a plurality of positive or negative ions; and a power supply that supplies an electrical signal to the discharge And a monitor, wherein the monitor monitors an electrode polarity of the discharge end and a potential difference between the discharge end and the device when the device is disposed on the ejector pin, The electrical signal is then modulated.

在本发明的一实施例中,所述电信号是一脉冲交流信号。In an embodiment of the invention, the electrical signal is a pulsed alternating current signal.

在本发明的一实施例中,所述放电管包含一放电端,所述放电端设置于所述通孔内,且所述放电端依据所述电信号使所述气体电离成复数正或负离子。In an embodiment of the invention, the discharge tube includes a discharge end, the discharge end is disposed in the through hole, and the discharge end ionizes the gas into a plurality of positive or negative ions according to the electrical signal. .

在本发明的一实施例中,所述真空系统包含:一真空产生器、至少一第一导管及一第一阀门。所述真空产生器用以产生所述真空吸力;所述至少一第一导管连接于所述通孔;以及所述第一阀门,位于所述第一导管及通孔之间。In an embodiment of the invention, the vacuum system includes: a vacuum generator, at least a first conduit, and a first valve. The vacuum generator is configured to generate the vacuum suction; the at least one first conduit is connected to the through hole; and the first valve is located between the first conduit and the through hole.

在本发明的一实施例中,所述供气系统包含:一气体供应器,用以输出所述气体;至少一第二导管,连接于所述通孔;一第二阀门,位于所述第二导管及通孔之间;以及至少一筛网,具有复数筛孔,设置于所述气体供应器及所述第二导管之间。In an embodiment of the invention, the gas supply system includes: a gas supply for outputting the gas; at least one second conduit connected to the through hole; and a second valve located at the first Between the two conduits and the through holes; and at least one screen having a plurality of screen openings disposed between the gas supply and the second conduit.

在本发明的一实施例中,所述气体供应器以0.5MPa(兆帕)的压力来输出所述气体,所述筛孔的孔径是0.01μm(微米)。In an embodiment of the invention, the gas supply unit outputs the gas at a pressure of 0.5 MPa (micropascal), and the pore size of the mesh is 0.01 μm (micrometer).

在本发明的一实施例中,所述通孔的直径是4mm(毫米),且所述通孔的一孔壁上披覆一硅树脂层。In an embodiment of the invention, the through hole has a diameter of 4 mm (mm), and a hole wall of the through hole is coated with a silicone layer.

在本发明的一实施例中,所述承载台另包含复数顶出销,收纳于所述承载台内或自所述承载面向上伸出。In an embodiment of the invention, the carrying platform further includes a plurality of ejector pins, which are received in the loading platform or protrude from the bearing surface.

在本发明的一实施例中,所述器件是一液晶显示器半成品的一玻璃基板。In an embodiment of the invention, the device is a glass substrate of a liquid crystal display semi-finished product.

有益效果 Beneficial effect

与现有技术相比较,本发明的器件承载装置可更有效率、更均匀且更迅速的消除所束器件的表面的静电,还可同时持续进行监控动作,使所述器件表面的静电持续减少时,亦同时减少对所述气体的电离量,以确保所述器件表面上的静电被消除后,即可停止产生所述离子流体,不至造成过多的所述离子流体累积在所述器件上,故能确保所述器件不再残留静电粒子或灰尘,以达到提高产品良率的目标。Compared with the prior art, the device carrying device of the present invention can more effectively, more uniformly and more quickly eliminate the static electricity on the surface of the bundled device, and can simultaneously perform the monitoring action to continuously reduce the static electricity on the surface of the device. At the same time, the amount of ionization of the gas is also reduced to ensure that the generation of the ionic fluid is stopped after the static electricity on the surface of the device is eliminated, so that excessive accumulation of the ionic fluid in the device is not caused. Therefore, it can ensure that the device no longer retains electrostatic particles or dust, so as to achieve the goal of improving product yield.

附图说明DRAWINGS

图1A是现有的第一加工装置的承载台的示意图。1A is a schematic view of a carrier of a conventional first processing apparatus.

图1B是图1A中自A-A虚线切下的现有的承载台的剖视图。Figure 1B is a cross-sectional view of the prior art carrier taken from line A-A of Figure 1A.

图1C是基板置于图1B的承载台上的剖视图。Figure 1C is a cross-sectional view of the substrate placed on the carrier of Figure 1B.

图2是现有的第二基板加工装置的剖视图。2 is a cross-sectional view of a conventional second substrate processing apparatus.

图3是本发明实施例的器件承载装置的剖视图。Figure 3 is a cross-sectional view of a device carrying device in accordance with an embodiment of the present invention.

图3A是本发明实施例的器件承载装置的局部放大图。3A is a partial enlarged view of a device carrying device according to an embodiment of the present invention.

本发明的最佳实施方式BEST MODE FOR CARRYING OUT THE INVENTION

为让本发明上述目的、特征及优点更明显易懂,下文特举本发明较佳实施例,并配合附图,作详细说明如下。再者,本发明所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。The above described objects, features, and advantages of the present invention will become more apparent from the aspects of the invention. Furthermore, the directional terms mentioned in the present invention, such as "upper", "lower", "before", "after", "left", "right", "inside", "outside", "side", etc. Just refer to the direction of the additional schema. Therefore, the directional terminology used is for the purpose of illustration and understanding of the invention.

本发明所提出的器件承载装置主要应用在绝缘体制造领域,特别是半导体或光电的产品制造领域。主要是在器件与加工平台分离时,用以去除器件表面瞬间产生的静电,避免残留的静电于后续加工时破坏器件。The device carrying device proposed by the invention is mainly used in the field of insulator manufacturing, in particular in the field of semiconductor or optoelectronic product manufacturing. It is mainly used to remove static electricity generated on the surface of the device when the device is separated from the processing platform, and to prevent residual static electricity from damaging the device during subsequent processing.

请参照图3所示,其揭示本发明实施例的器件承载装置300的剖视图。所述器件承载装置300主要包含一承载台10、一供气系统20、一放电系统30及一真空系统80,用以对一器件50进行加工,本发明将于下文详细说明上述各组件。Referring to FIG. 3, a cross-sectional view of the device carrying device 300 of the embodiment of the present invention is disclosed. The device carrying device 300 mainly comprises a carrying platform 10, a gas supply system 20, a discharge system 30 and a vacuum system 80 for processing a device 50, which will be described in detail below.

图3A揭示本发明实施例的器件承载装置300的局部放大图。请参照图3及3A所示,本发明第一实施例的器件承载装置300可以是一液晶显示器的玻璃基板加工装置,所述器件50可以是一被加工件或一基板,且所述承载台10可以是用以印刷一配向膜的加工平台,但并不限于此,所述承载台10还可以是加工任何绝缘体材料、半导体基板或光电产品的平台。所述承载台10包含一承载面11、一底面12及至少一通孔13,其中所述通孔13导通所述承载面11及所述底面12,但不以此为限,所述通孔13亦可以是导通所述承载面11与所述承载台10的至少一侧面。实作上,若所述器件50的长度、宽度及高度分别是1300mm、1100mm及0.7mm时,则所述承载台10可对应的于长与宽上分别均匀的开设30个及25个直径是4mm的所述通孔13,但不用以限定本发明。此外,所述承载台10还可再包含复数顶出销14,所述顶出销14是以可活动的模式收纳于所述承载台10内,并于必要时自所述承载面11伸出。FIG. 3A discloses a partial enlarged view of a device carrying device 300 in accordance with an embodiment of the present invention. Referring to FIG. 3 and FIG. 3A, the device carrying device 300 of the first embodiment of the present invention may be a glass substrate processing device of a liquid crystal display, and the device 50 may be a workpiece or a substrate, and the carrying platform 10 may be a processing platform for printing an alignment film, which is not limited thereto, and the carrier 10 may also be a platform for processing any insulator material, semiconductor substrate or optoelectronic product. The loading platform 10 includes a bearing surface 11 , a bottom surface 12 , and at least one through hole 13 , wherein the through hole 13 is electrically connected to the bearing surface 11 and the bottom surface 12 , but not limited thereto. 13 may also be that the bearing surface 11 and at least one side of the carrying platform 10 are turned on. In practice, if the length, width, and height of the device 50 are 1300 mm, 1100 mm, and 0.7 mm, respectively, the carrier 10 can be uniformly opened 30 and 25 diameters respectively corresponding to the length and the width. The through hole 13 of 4 mm, but is not intended to limit the invention. In addition, the carrier 10 can further comprise a plurality of ejector pins 14 that are received in the movable platform in the movable platform 10 and extend from the bearing surface 11 as necessary. .

请再参照图3及3A所示,所述真空系统80用以对所述通孔13提供一真空吸力,以承载及吸引所述器件50。所述真空系统80包含一真空产生器81、复数第一导管82及一第一阀门83,其中所述第一导管82位于所述真空产生器81与所述通孔13之间,且所述第一导管82连接于所述通孔13与所述承载面11的交界处,使所述真空产生器81将所述通孔13中的气体抽离,以令所述通孔13形成真空状态;所述第一阀门83位于所述真空产生器81及所述通孔13之间,用以控制所述真空产生器81对所述通孔13的所述真空吸力。Referring again to FIGS. 3 and 3A, the vacuum system 80 is configured to provide a vacuum suction to the through hole 13 to carry and attract the device 50. The vacuum system 80 includes a vacuum generator 81, a plurality of first conduits 82, and a first valve 83, wherein the first conduit 82 is located between the vacuum generator 81 and the through hole 13, and the a first conduit 82 is connected to the interface between the through hole 13 and the bearing surface 11, so that the vacuum generator 81 pulls out the gas in the through hole 13 to make the through hole 13 form a vacuum state. The first valve 83 is located between the vacuum generator 81 and the through hole 13 for controlling the vacuum suction of the vacuum generator 81 to the through hole 13.

如图3及3A所示,所述供气系统20以一气压输出洁净且干燥的复数气体至所述通孔13,以解除所述通孔13的真空状态。所述供气系统20包含一气体供应器21、复数第二导管22、至少一筛网23及一第二阀门24,其中所述气体供应器21依据所述气压输出所述气体;所述第二导管22设置于所述气体供应器21与所述通孔13之间,且所述第二导管22连接于所述通孔13与所述底面12的交界处;所述第二阀门24位于所述第二导管22及所述通孔13之间,用以接收并控制来自于所述气体供应器21的所述气体,使所述气体借助所述第二导管22传送至所述通孔13;所述筛网23具有复数筛孔(未绘示),用以使通过所述筛网23的所述气体更洁净,且所述筛网23设置于所述气体供应器21及所述通孔13之间。再者,所述气压可以是0.5MPa,而所述筛孔的孔径可以是0.01μm,但不以此为限。As shown in FIGS. 3 and 3A, the air supply system 20 outputs a clean and dry plurality of gases to the through holes 13 at a pressure to release the vacuum state of the through holes 13. The gas supply system 20 includes a gas supply 21, a plurality of second conduits 22, at least one screen 23, and a second valve 24, wherein the gas supply 21 outputs the gas according to the gas pressure; a second duct 22 is disposed between the gas supply 21 and the through hole 13, and the second duct 22 is connected to a boundary between the through hole 13 and the bottom surface 12; the second valve 24 is located Between the second conduit 22 and the through hole 13 for receiving and controlling the gas from the gas supply 21, the gas is transmitted to the through hole by the second conduit 22 13; the screen 23 has a plurality of mesh holes (not shown) for making the gas passing through the screen 23 cleaner, and the screen 23 is disposed on the gas supplier 21 and the Between the through holes 13. Furthermore, the gas pressure may be 0.5 MPa, and the pore size of the mesh may be 0.01 μm, but not limited thereto.

再如图3及3A所示,所述放电系统30用以激发所述气体,使所述气体电离成一具有复数正或负离子的离子流体,并基于所述供气系统20以所述气压输出所述气体,进而使所述离子流体形成一离子风,以便消除所述器件50的表面的静电。所述放电系统30包含至少一放电管31、一电源供应器32及一监控器33,所述放电管31包含一放电端311,所述放电端311设置于所述通孔13内;所述电源供应器32提供所述放电管31一电信号,使所述放电端311依据所述电信号于所述通孔13内进行尖端放电,进而将所述气体电离成所述离子流体,并以所述离子风的形式自所述通孔13朝所述器件50吹送;所述监控器33用以监测所述放电端311的一电极性以及所述放电端311与所述器件50间的一电位差,进而计算出所述器件50的一带电量及一电极性,并利用所述器件50的所述带电量及所述电极性对电源供应器32的所述电信号进行调变,使所述放电端311能电离出与所述器件50的所述带电量相等、所述电极性相反的所述离子风。其中,所述放电端311可以是设置于所述通孔13内的轴心上,所述放电管31可以是具导电能力的一放电针,所述放电端311则是所述放电针的一针尖,所述带电量可以是所述器件50的表面的一静电带电量,而所述电信号可以是一脉冲交流信号。此外,所述通孔13的一孔壁上还可披覆一硅树脂,以避免所述放电端311放电所产生的臭氧腐蚀所述孔壁。As further shown in FIGS. 3 and 3A, the discharge system 30 is configured to excite the gas to ionize the gas into an ionic fluid having a plurality of positive or negative ions, and based on the gas supply system 20 at the gas pressure output. The gas, in turn, causes the ionic fluid to form an ionic wind to eliminate static electricity from the surface of the device 50. The discharge system 30 includes at least one discharge tube 31, a power supply unit 32, and a monitor 33. The discharge tube 31 includes a discharge end 311, and the discharge end 311 is disposed in the through hole 13; The power supply 32 provides an electrical signal to the discharge tube 31, so that the discharge end 311 performs a tip discharge in the through hole 13 according to the electrical signal, thereby ionizing the gas into the ionic fluid, and The ion wind is blown from the through hole 13 toward the device 50; the monitor 33 is configured to monitor an polarity of the discharge end 311 and a gap between the discharge end 311 and the device 50. a potential difference, thereby calculating a charge amount and an electrode property of the device 50, and modulating the electrical signal of the power supply 32 by using the charge amount of the device 50 and the polarity of the device 50. The discharge end 311 can ionize the ion wind that is equal to the charge amount of the device 50 and the polarity is opposite. The discharge end 311 may be disposed on the shaft center of the through hole 13, the discharge tube 31 may be a discharge needle having conductivity, and the discharge end 311 is one of the discharge needles. At the tip of the needle, the charge amount may be an electrostatic charge amount of the surface of the device 50, and the electrical signal may be a pulsed alternating current signal. In addition, a hole in the wall of the through hole 13 may be covered with a silicone resin to prevent ozone generated by the discharge of the discharge end 311 from corroding the hole wall.

具体而言,请再参照图3及3A,于所述顶出销14自所述底面12伸出后,一搬运臂(未绘示)将所述器件50置于所述顶出销14上,再使所述顶出销14缓慢收纳至所述承载台10内,以使所述器件50安置于所述底面12上,但亦可以在所述顶出销14收纳于所述承载台10内的情形下,直接将所述器件50放置于所述底面12上;其后,对所述器件50进行对位以确保放置于正确的位置,并利用所述真空系统80对所述通孔13进行抽气,使所述通孔13形成真空状态,进而使所述器件50紧密贴合于所述底面12上,此时即可对所述器件50进行一配向膜的印刷或表面加工,但不以此为限;在结束所述器件50的加工制程后,即利用所述供气系统20将所述气体通入所述第二导管22内,并启动放电系统30。一旦所述气体经过所述放电端311,部分所述气体即被电离成所述电子或所述离子,并与未电离的所述气体混合成所述离子风。此时,因所述离子风通入所述通孔13内,所述通孔13即由真空状态回复至大气状态,有助于所述顶出销14举起所述器件50,使所述器件50离开所述底面12。须注意的是,所述离子风不仅仅是让所述通孔13回复至大气状态,以使所述器件50与所束承载台10能轻易的分离,更重要的是,所述器件承载装置300还可利用所述离子风中带有正电荷的所述离子或带有负电荷的所述电子吹扫所述器件50,进而使散布在所述器件50的表面的静电粒子与所述离子风进行电性中和。Specifically, referring to FIG. 3 and FIG. 3A, after the ejector pin 14 protrudes from the bottom surface 12, a transport arm (not shown) places the device 50 on the ejector pin 14. The ejector pin 14 is again slowly received into the carrier 10 so that the device 50 is disposed on the bottom surface 12, but the ejector pin 14 may be received in the carrier 10 The device 50 is placed directly on the bottom surface 12; thereafter, the device 50 is aligned to ensure placement in the correct position and the through hole is utilized by the vacuum system 80 13 is evacuated to form a vacuum state, so that the device 50 is closely attached to the bottom surface 12, and then the device 50 can be printed or surface-processed with an alignment film. However, it is not limited thereto; after the processing of the device 50 is finished, the gas is introduced into the second conduit 22 by the gas supply system 20, and the discharge system 30 is activated. Once the gas passes through the discharge end 311, a portion of the gas is ionized into the electron or the ion and mixed with the non-ionized gas to form the ion wind. At this time, since the ion wind passes into the through hole 13, the through hole 13 returns to the atmospheric state from a vacuum state, which helps the ejector pin 14 to lift the device 50, so that the Device 50 exits the bottom surface 12. It should be noted that the ion wind is not only to return the through hole 13 to the atmospheric state, so that the device 50 can be easily separated from the bundled platform 10, and more importantly, the device carrying device 300 may also utilize the positively charged ions or the negatively charged electrons in the ion wind to purge the device 50, thereby causing electrostatic particles and ions dispersed on the surface of the device 50. The wind is electrically neutralized.

再者,又如图3及3A所示,自所述器件50的加工制程结束后至所述器件50被带离所述顶出销14之前,所述供气系统20仍持续输出所述气体,且所述放电系统30持续对所述气体进行电离。在此期间,所述监控器32也持续监测所述放电端311的所述电极性,以及所述放电端311与所述器件50之间的所述电位差,并调控所述脉冲交流信号,使所述放电端311电离出与所述器件50的所述带电量相等、所述电极性相反的所述离子风。Furthermore, as shown in FIGS. 3 and 3A, the gas supply system 20 continues to output the gas from the end of the processing of the device 50 until the device 50 is carried away from the ejector pin 14. And the discharge system 30 continues to ionize the gas. During this period, the monitor 32 also continuously monitors the polarity of the discharge end 311, and the potential difference between the discharge end 311 and the device 50, and regulates the pulsed AC signal. The discharge end 311 is ionized out of the ion wind that is equal to the charge amount of the device 50 and opposite in polarity.

如图3及3A所示,本发明实施例上述特征的优点在于:所述器件承载装置300借助所述承载台10、所述供气系统20及所述放电系统30对所述器件50消除静电,并利用所述真空系统80对所述通孔进行抽气。其主要是利用所述供气系统20以所述气压输出所述气体,并借助设置在所述通孔13内的所述放电端311,将所述气体电离成包含所述电子或所述离子的所述离子流体,且由于所述供气系统20持续以所述气压提供所述气体,使得所述离子流体以所述离子风的形式吹拂所述器件50的表面,并于所述器件50上进行电性中和,以达到更有效率、更均匀且更迅速消除静电的目的。再者,当所述器件50安置于所述顶出销14上时,所述监控器33会同时监测所述放电端311的电极性,以及所述放电端311与所述器件50之间的电位差,并据以对所述电信号的所述脉冲交流信号进行调变,以确保所述器件承载装置300可对累积在所述器件50的表面上的静电提供电量大小相等而电性相反的所述离子流体,并且,由于所述监控器33是持续进行监控动作,因此当所述器件50的表面上的静电持续减少时,所述监控器33亦会随之调变所述脉冲交流信号,以确保所述器件50的表面上的静电被消除后,即可停止产生所述离子流体,不至造成过多的所述离子流体累积在所述器件50上。此外,所述供气系统20的所述第二导管22连接于所述通孔13与所述底面12交界处,并利用设置于所述气体供应器21及所述通孔13之间的所述筛网23,对所述气体进行过滤,不但可使通过所述筛孔的所述气体更洁净,以便产生更纯净的所述离子流体,还可过滤自所述气体供应器21输出的灰尘或杂质,故有助于确保所述器件50不再残留静电粒子或灰尘,以达到提高产品良率的目标。As shown in FIGS. 3 and 3A, an advantage of the above features of the embodiments of the present invention is that the device carrying device 300 eliminates static electricity to the device 50 by the carrier 10, the gas supply system 20, and the discharge system 30. And evacuating the through hole by the vacuum system 80. It mainly uses the gas supply system 20 to output the gas at the gas pressure, and ionizes the gas to include the electron or the ion by the discharge end 311 disposed in the through hole 13. The ionic fluid, and because the gas supply system 20 continues to supply the gas at the gas pressure, causing the ionic fluid to blow the surface of the device 50 in the form of the ion wind, and the device 50 Electrical neutralization is performed to achieve the purpose of more efficient, more uniform and more rapid elimination of static electricity. Furthermore, when the device 50 is disposed on the ejector pin 14, the monitor 33 simultaneously monitors the polarity of the discharge end 311 and between the discharge end 311 and the device 50. a potential difference, and modulating the pulsed alternating current signal of the electrical signal to ensure that the device carrying device 300 can provide an equal amount of electrical power to the static electricity accumulated on the surface of the device 50, and the electrical opposite The ionic fluid, and since the monitor 33 is continuously monitoring, the monitor 33 also modulates the pulsed AC as the static electricity on the surface of the device 50 continues to decrease. Signals to ensure that the static electricity on the surface of the device 50 is eliminated, the generation of the ionic fluid can be stopped without causing excessive accumulation of the ionic fluid on the device 50. In addition, the second duct 22 of the air supply system 20 is connected to the boundary between the through hole 13 and the bottom surface 12, and utilizes a space disposed between the gas supply 21 and the through hole 13. Screening the screen 23, filtering the gas to not only make the gas passing through the screen hole cleaner, so as to produce a purer ionic fluid, and also filter the dust output from the gas supply unit 21. Or impurities, which helps to ensure that the device 50 no longer retains electrostatic particles or dust to achieve the goal of improving product yield.

本发明已由上述相关实施例加以描述,然而上施例并未限制本发明的范围。相反的,包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。The present invention has been described by the above related embodiments, but the above examples do not limit the scope of the present invention. Rather, modifications and equivalent arrangements are intended to be included within the scope of the invention.

本发明的实施方式Embodiments of the invention

工业实用性Industrial applicability

序列表自由内容Sequence table free content

Claims (18)

一种器件承载装置,其特征在于:所述器件承载装置包含:A device carrying device, characterized in that: the device carrying device comprises: 一承载台,具有一承载面及至少一通孔,且所述通孔开设于所述承载面;a carrying platform having a bearing surface and at least one through hole, and the through hole is opened on the bearing surface; 一真空系统,提供一真空吸力至所述通孔,所述真空系统包含:一真空产生器,用以产生所述真空吸力;至少一第一导管,连接于所述通孔;以及一第一阀门,位于所述第一导管及通孔之间;a vacuum system providing a vacuum suction to the through hole, the vacuum system comprising: a vacuum generator for generating the vacuum suction; at least one first conduit connected to the through hole; and a first a valve located between the first conduit and the through hole; 一供气系统,输出至少一种气体至所述通孔,所述供气系统包含:一气体供应器,用以输出所述气体;至少一第二导管,连接于所述通孔;一第二阀门,位于所述第一导管及所述通孔之间;以及至少一筛网,具有复数筛孔,设置于所述气体供应器及所述第二导管之间;以及a gas supply system, outputting at least one gas to the through hole, the gas supply system comprising: a gas supply for outputting the gas; at least one second conduit connected to the through hole; a second valve between the first conduit and the through hole; and at least one screen having a plurality of meshes disposed between the gas supply and the second conduit; 一放电系统,对所述气体放电,使所述气体电离成一离子流体,所述放电系统包含:至少一放电管,电离所述气体以形成具有复数正或负离子的所述离子流体;一电源供应器,提供一电信号至所述放电管;以及一监控器,其中所述监控器监测所述放电端之一电极性及所述放电端与所述器件间的一电位差,进而调变所述电信号;a discharge system that discharges the gas to ionize the gas into an ionic fluid, the discharge system comprising: at least one discharge tube ionizing the gas to form the ionic fluid having a plurality of positive or negative ions; Providing an electrical signal to the discharge tube; and a monitor, wherein the monitor monitors an electrode polarity of the discharge end and a potential difference between the discharge end and the device, and further modulates Electric signal 其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。Wherein the through hole is for providing the vacuum suction to carry and attract a device; or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity on the surface of the device. 如权利要求1所述的器件承载装置,其特征在于:所述电信号是一脉冲交流信号。The device carrying device of claim 1 wherein said electrical signal is a pulsed alternating current signal. 如权利要求1所述的器件承载装置,其特征在于:所述放电管包含一放电端,所述放电端设置于所述通孔内,且所述放电端依据所述电信号使所述气体电离成所述正或负离子。The device carrying device according to claim 1, wherein said discharge tube comprises a discharge end, said discharge end is disposed in said through hole, and said discharge end causes said gas according to said electrical signal Ionization into the positive or negative ions. 如权利要求1所述的器件承载装置,其特征在于:所述通孔的直径是4毫米。The device carrying device according to claim 1, wherein said through hole has a diameter of 4 mm. 如权利要求1所述的器件承载装置,其特征在于:所述通孔的一孔壁上披覆一硅树脂层。The device carrying device according to claim 1, wherein a hole of a hole of the through hole is coated with a silicone layer. 如权利要求1所述的器件承载装置,其特征在于:所述承载台另包含复数顶出销,收纳于所述承载台内或自所述承载面向上伸出。The device carrying device of claim 1 wherein said carrier further comprises a plurality of ejector pins received in said tray or extending upwardly from said carrier surface. 如权利要求1所述的器件承载装置,其特征在于:所述器件是一液晶显示器半成品的一玻璃基板。The device carrying device of claim 1 wherein said device is a glass substrate of a semi-finished liquid crystal display. 一种器件承载装置,其特征在于:所述器件承载装置包含:A device carrying device, characterized in that: the device carrying device comprises: 一承载台,具有一承载面及至少一通孔,且所述通孔开设于所述承载面;a carrying platform having a bearing surface and at least one through hole, and the through hole is opened on the bearing surface; 一真空系统,提供一真空吸力至所述通孔;a vacuum system providing a vacuum suction to the through hole; 一供气系统,输出至少一种气体至所述通孔;以及a gas supply system that outputs at least one gas to the through hole; 一放电系统,对所述气体放电,使所述气体电离成一离子流体;a discharge system that discharges the gas to ionize the gas into an ionic fluid; 其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。Wherein the through hole is for providing the vacuum suction to carry and attract a device; or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity on the surface of the device. 如权利要求8所述的器件承载装置,其特征在于:所述放电系统包含:The device carrying device of claim 8 wherein said discharge system comprises: 至少一放电管,电离所述气体以形成具有复数正或负离子的所述离子流体; At least one discharge tube ionizing the gas to form the ionic fluid having a plurality of positive or negative ions; 一电源供应器,提供一电信号至所述放电管;以及a power supply providing an electrical signal to the discharge tube; 一监控器,其中所述监控器监测所述放电端之一电极性及所述放电端与所述器件间的一电位差,进而调变所述电信号。A monitor, wherein the monitor monitors an electrode polarity of the discharge end and a potential difference between the discharge end and the device to modulate the electrical signal. 如权利要求9所述的器件承载装置,其特征在于:所述电信号是一脉冲交流信号。The device carrying device of claim 9 wherein said electrical signal is a pulsed alternating current signal. 如权利要求9所述的器件承载装置,其特征在于:所述放电管包含一放电端,所述放电端设置于所述通孔内,且所述放电端依据所述电信号使所述气体电离成所述正或负离子。A device carrying device according to claim 9, wherein said discharge tube comprises a discharge end, said discharge end is disposed in said through hole, and said discharge end causes said gas in accordance with said electrical signal Ionization into the positive or negative ions. 如权利要求8所述的器件承载装置,其特征在于:所述真空系统包含:The device carrying device of claim 8 wherein said vacuum system comprises: 一真空产生器,用以产生所述真空吸力;a vacuum generator for generating the vacuum suction; 至少一第一导管,连接于所述通孔;以及At least one first conduit coupled to the through hole; 一第一阀门,位于所述第一导管及通孔之间。A first valve is located between the first conduit and the through hole. 如权利要求12所述的器件承载装置,其特征在于:所述供气系统包含:The device carrying device of claim 12 wherein said gas supply system comprises: 一气体供应器,用以输出所述气体;a gas supply for outputting the gas; 至少一第二导管,连接于所述通孔;At least one second conduit connected to the through hole; 一第二阀门,位于所述第一导管及所述通孔之间;以及a second valve located between the first conduit and the through hole; 至少一筛网,具有复数筛孔,设置于所述气体供应器及所述第二导管之间。At least one screen having a plurality of screen openings disposed between the gas supply and the second conduit. 如权利要求8所述的器件承载装置,其特征在于:所述通孔的直径是4毫米。The device carrying device according to claim 8, wherein said through hole has a diameter of 4 mm. 如权利要求8所述的器件承载装置,其特征在于:所述通孔的一孔壁上披覆一硅树脂层。The device carrying device according to claim 8, wherein a hole of the hole of the through hole is covered with a silicone layer. 如权利要求8所述的器件承载装置,其特征在于:所述承载台另包含复数顶出销,收纳于所述承载台内或自所述承载面向上伸出。The device carrying device of claim 8 wherein said carrier further comprises a plurality of ejector pins received in said tray or extending upwardly from said carrier surface. 如权利要求8所述的器件承载装置,其特征在于:所述器件是一液晶显示器半成品的一玻璃基板。The device carrying device according to claim 8, wherein said device is a glass substrate of a liquid crystal display semi-finished product. 一种器件承载装置,其特征在于:所述器件承载装置包含:A device carrying device, characterized in that: the device carrying device comprises: 一承载台,具有一承载面、至少一通孔及复数顶出销,所述通孔开设于所述承载面,所述顶出销收纳于所述承载台内或自所述承载面向上伸出;a loading platform having a bearing surface, at least one through hole and a plurality of ejector pins, the through hole being defined in the bearing surface, the ejector pin being received in the loading platform or extending from the bearing surface ; 一真空系统,提供一真空吸力至所述通孔;a vacuum system providing a vacuum suction to the through hole; 一供气系统,以一气压输出至少一种气体;以及a gas supply system that outputs at least one gas at a pressure; 一放电系统,包含:A discharge system comprising:   至少一放电管,对所述气体放电,使所述气体电离成一离子风;及Disposing at least one discharge tube, discharging the gas to ionize the gas into an ion wind; and   一电源供应器,提供一电信号至所述放电管;a power supply, providing an electrical signal to the discharge tube; 其中所述通孔用以提供所述真空吸力以承载及吸引一器件;或用以在对所述器件解除真空时提供所述离子流体,以便消除所述器件的表面的静电。Wherein the through hole is for providing the vacuum suction to carry and attract a device; or to provide the ionic fluid when the device is relieved of vacuum to eliminate static electricity on the surface of the device.
PCT/CN2012/079144 2012-07-25 2012-07-25 Device bearing apparatus Ceased WO2014015485A1 (en)

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