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WO2014008660A1 - 液晶面板的制作方法及装置 - Google Patents

液晶面板的制作方法及装置 Download PDF

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Publication number
WO2014008660A1
WO2014008660A1 PCT/CN2012/078606 CN2012078606W WO2014008660A1 WO 2014008660 A1 WO2014008660 A1 WO 2014008660A1 CN 2012078606 W CN2012078606 W CN 2012078606W WO 2014008660 A1 WO2014008660 A1 WO 2014008660A1
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Prior art keywords
array substrate
tft array
liquid crystal
substrate
crystal panel
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PCT/CN2012/078606
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English (en)
French (fr)
Inventor
郑文达
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US13/638,617 priority Critical patent/US20140011299A1/en
Publication of WO2014008660A1 publication Critical patent/WO2014008660A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing

Definitions

  • the present invention relates to the field of manufacturing liquid crystal panels, and in particular, to a method and device for fabricating a liquid crystal panel.
  • TFT Thin Film Transistor, thin film field effect transistor
  • the manufacture of liquid crystal panels typically includes array processing and box-forming processes.
  • the array process includes forming a TFT array substrate and a CF substrate.
  • an alignment film is formed on the TFT array substrate and the CF substrate, and the CF substrate and the TFT array substrate are pasted and injected into the liquid crystal.
  • the TFT array substrate generally includes a scan line, a data line, a TFT array, and a pixel electrode. After the TFT array substrate is formed, it is necessary to detect the TFT array substrate to confirm whether the scan lines and the data lines on the TFT substrate are defective. After detecting the defect-free TFT array substrate, the process proceeds to a process of forming a package. Before the alignment film is coated on the TFT array substrate, the TFT array substrate needs to be cleaned to remove particles or oil on the TFT array substrate.
  • the scan line or the data line of the TFT array substrate is often broken.
  • the array substrate is easily broken or slightly broken, and the plating line of the repairing machine on the array substrate may be caused after cleaning the array substrate.
  • the strip substrate is stripped, and the array substrate is broken.
  • the array substrate is irradiated with ultraviolet light, the electron energy level of the array substrate is easily increased, so that electrostatic scratching occurs before the subsequent coating of the alignment film.
  • the TFT array substrate After the TFT array substrate is cleaned until the alignment film is formed on the TFT array substrate, the TFT array substrate is not detected. Therefore, in the card forming process, if the TFT array substrate is broken due to cleaning. When assembled with the CF substrate, there is a disconnection on the array substrate, which causes poor alignment or a dead pixel of the liquid crystal panel, which in turn causes the liquid crystal panel to be scrapped.
  • the main object of the present invention is to provide a method and a device for fabricating a liquid crystal panel, which aim to reduce the scrap rate of the liquid crystal panel.
  • the present invention provides a method for fabricating a liquid crystal panel, comprising the following steps:
  • the TFT array substrate is processed accordingly.
  • the step of performing a cleaning process on the TFT array substrate comprises:
  • the TFT array substrate is washed with water by a cleaner
  • the TFT array substrate is irradiated with ultraviolet light.
  • the step of performing corresponding processing on the TFT array substrate according to the result of the array test processing includes:
  • the repairing machine repairs the TFT array substrate by wire breakage
  • the repaired TFT array substrate is sent to a box process.
  • the step of performing corresponding processing on the TFT array substrate according to the result of the array test processing includes: if the array test processing result is that there is no disconnection on the TFT array substrate, the TFT array substrate is Feed into the box process.
  • the method further includes:
  • the box forming device forms an alignment film on the TFT array substrate, and bonds a CF substrate to the liquid crystal between the TFT array substrate and the CF substrate.
  • the water washing of the TFT array substrate by the cleaner comprises spraying water to the array substrate by a water spray device and cleaning the TFT array substrate by the brush with the water spray device.
  • the invention also provides a device for fabricating a liquid crystal panel, comprising:
  • a card forming device for forming an alignment film on the TFT array substrate, and bonding a CF substrate to the liquid crystal between the TFT array substrate and the CF substrate.
  • the cleaning mechanism comprises:
  • An ultrasonic device for cleaning the water-washed array substrate in combination with a cleaning agent to remove small particles on the array substrate
  • An ultraviolet light irradiating device is configured to irradiate the array substrate with ultraviolet light to remove organic substances on the array substrate.
  • the cleaner comprises a water spray device for spraying water to the array substrate and a brush for cleaning the array substrate in cooperation with the water spray device.
  • the repairing machine is specifically configured to perform wire break repair on the TFT array substrate when the array test processing result is that there is a wire breakage on the TFT array substrate.
  • the invention also provides a device for fabricating a liquid crystal panel, comprising:
  • a repair machine for repairing broken wires on the TFT array substrate is a repair machine for repairing broken wires on the TFT array substrate.
  • the cleaning mechanism comprises:
  • An ultrasonic device for cleaning the water-washed array substrate in combination with a cleaning agent to remove small particles on the array substrate
  • An ultraviolet light irradiating device is configured to irradiate the array substrate with ultraviolet light to remove organic substances on the array substrate.
  • the cleaner comprises a water spray device for spraying water to the array substrate and a brush for cleaning the array substrate in cooperation with the water spray device.
  • the repairing machine is specifically configured to perform wire break repair on the TFT array substrate when the array test processing result is that there is a wire breakage on the TFT array substrate.
  • the method and device for fabricating a liquid crystal panel according to the present invention can prevent the TFT of the cleaning mechanism from being broken during the cleaning process by performing the cleaning process on the array substrate after the array process is completed, and then performing array detection and wire break repair.
  • the array substrate enters the box forming device, which reduces the scrap rate of the liquid crystal panel.
  • the array detector detects the TFT array substrate, the damage of the particles on the TFT array substrate to the array tester is avoided.
  • FIG. 1 is a schematic structural view of a preferred embodiment of a manufacturing apparatus for a liquid crystal panel of the present invention
  • FIG. 2 is a schematic structural view of a cleaning mechanism in a preferred embodiment of a manufacturing apparatus for a liquid crystal panel according to the present invention
  • FIG. 3 is a schematic flow chart of a preferred embodiment of a method for fabricating a liquid crystal panel of the present invention.
  • a preferred embodiment of the present invention provides a device for fabricating a liquid crystal panel, comprising: a cleaning mechanism 201, an array testing machine 202, a repairing machine 203, and a box forming device 204, wherein:
  • the cleaning mechanism 201 is configured to perform cleaning processing on the TFT array substrate having the TFT array, the data lines, the scan lines, the pixel electrodes, and the like;
  • the array testing machine 202 is configured to perform an array test on the cleaned TFT array substrate to detect whether there is a disconnection of the data line, the scan line, and the like of the TFT array substrate;
  • the repairing machine 203 is used for repairing a broken line in the TFT array substrate
  • the box forming device 204 is configured to form an alignment film on the TFT array substrate, and bond a CF substrate to the liquid crystal between the TFT array substrate and the CF substrate.
  • the TFT array substrate is first cleaned by the cleaning mechanism 201, and then the array detector 202 performs array test on the TFT array substrate.
  • the above cleaning mechanism 201 includes a cleaner 2011, an ultrasonic waver 2012, and an ultraviolet light irradiation machine 2013.
  • the cleaner 2011 is used for water washing the TFT array substrate to remove large particles on the TFT array substrate; the ultrasonic device 2012 is used for generating ultrasonic waves, and cleaning the washed TFT array substrate in combination with a cleaning agent. And removing the small particles on the TFT array substrate; the ultraviolet light irradiator 2013 is configured to perform ultraviolet light irradiation on the TFT array substrate after removing the particles to remove organic substances such as oil stains on the array substrate.
  • the cleaner 2011 specifically includes a water spray device for spraying water onto the array substrate, and a brush for rolling the cleaning array substrate while the water spray device sprays water onto the array substrate.
  • the TFT array substrate may be broken or other defects, for example, cleaning the TFT array substrate by using the cleaner 2011 or the ultrasonic waver 2012, removing large particles on the TFT array substrate or When the small particles are small, the TFT array substrate is easily broken; when the ultraviolet light irradiation device 2013 irradiates the TFT array substrate with ultraviolet light, the electron energy level of the TFT array substrate is easily increased, so that electrostatic breakdown occurs before the subsequent formation of the alignment film. The phenomenon caused the LCD panel to be scrapped.
  • the array detector 202 performs an array test on the TFT array substrate to detect possible disconnection of the TFT array substrate and avoid the liquid crystal panel from being scrapped.
  • the repairing machine 203 is used to repair the TFT array substrate that is detected by the array detector 202 and has a disconnection.
  • the array tester 202 performs array test on the cleaned array substrate. Since the TFT array substrate is provided with a TFT array, a data line, a scan line, a pixel electrode, and the like, the array test refers to detecting the data line and the scan line of the TFT array substrate, and determining whether the TFT array substrate has a disconnection condition by detecting.
  • the repairing machine 203 repairs the broken line of the TFT array substrate, and then sends the repaired TFT array substrate into The cartridge device 204; when the array test processing result is that there is no disconnection on the TFT array substrate, the TFT array substrate is sent to the cassette forming device 204.
  • the forming device 204 is configured to form an alignment film on the TFT array substrate and a CF substrate, and then apply a sealant on the TFT array substrate or the CF substrate, and correspondingly deposit liquid crystal on the CF substrate or the TFT array substrate, and then The TFT array substrate and the CF substrate are bonded together, and the bonded TFT array substrate and CF substrate are subjected to photoalignment processing.
  • the TFT array substrate that causes the disconnection of the cleaning mechanism 201 in the cleaning process can be prevented from entering the card forming device 204, thereby reducing the rejection rate of the liquid crystal panel.
  • the TFT array substrate is cleaned by the cleaning mechanism 201 to remove the particles on the TFT array substrate, and then the array detector 202 detects the TFT array substrate, thereby avoiding damage to the array testing machine 202 by the particles on the TFT array substrate.
  • a method for fabricating a liquid crystal panel according to a preferred embodiment of the present invention is implemented based on the apparatus for fabricating a liquid crystal panel shown in FIG. 1 and FIG. 2, the method comprising:
  • Step S1 performing a cleaning process on the TFT array substrate
  • the TFT array substrate is cleaned by the cleaning mechanism 201.
  • the cleaner 2011 performs water washing on the TFT array substrate to remove larger particles on the TFT array substrate; then, the ultrasonic waver 2012 generates ultrasonic waves, and combines the detergent to the water-washed TFT array. The substrate is cleaned to remove small particles on the TFT array substrate. Finally, the ultraviolet light irradiator 2013 irradiates the TFT array substrate after removing the particles with ultraviolet light to remove oil stains on the TFT array substrate. Organic matter.
  • the cleaner 2011 specifically includes a water spray device for spraying water onto the array substrate, and a brush for rolling the cleaning array substrate while the water spray device sprays water onto the array substrate.
  • Step S2 performing an array test on the cleaned TFT array substrate
  • the array test refers to detecting the data line and the scan line of the TFT array substrate, and determining whether the TFT array substrate has a disconnection condition by detecting.
  • the TFT array substrate may be broken or other defects.
  • cleaning the TFT array substrate with the cleaner 2011 or the ultrasonic waver 2012 is easy to remove large particles or small particles on the TFT array substrate.
  • the TFT array substrate is broken; when the ultraviolet light irradiation device irradiates the TFT array substrate with ultraviolet light, the electron energy level of the TFT array substrate is easily increased, resulting in electrostatic damage before the subsequent coating of the alignment film, resulting in The LCD panel is scrapped.
  • the TFT array substrate is subjected to an array test to detect the disconnection caused by the TFT array substrate during the cleaning process, and the liquid crystal panel is discarded.
  • Step S3 Perform corresponding processing on the TFT array substrate according to the result of the array test processing.
  • an array test is performed on the cleaned TFT array substrate by the array testing machine 202.
  • the repairing machine 203 is opposite to the The TFT array substrate is subjected to wire break repair, and the repaired TFT array substrate is sent to the cassette forming device 204 for a card forming process; when the array test processing result is that there is no wire breakage on the TFT array substrate, the The array substrate is directly fed into the cassette forming device 204 for a cassette process.
  • the process of forming a package includes forming an alignment film on the TFT array substrate and a CF substrate, then applying a sealant on the TFT array substrate or the CF substrate, and injecting liquid crystal on the CF substrate or the TFT array substrate correspondingly, and then The TFT array substrate and the CF substrate are bonded together, and the bonded TFT array substrate and CF substrate are subjected to photoalignment processing.
  • the TFT array substrate that causes the disconnection of the cleaning mechanism 201 in the cleaning process can be prevented from entering the card forming device 204, thereby reducing the rejection rate of the liquid crystal panel.
  • the TFT array substrate is cleaned by the cleaning mechanism 201 to remove the particles on the TFT array substrate, and then the array detector 202 detects the TFT array substrate, thereby avoiding damage to the array testing machine 202 by the particles on the TFT array substrate.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)

Description

液晶面板的制作方法及装置
技术领域
本发明涉及液晶面板制作技术领域，尤其涉及一种液晶面板的制作方法及装置。
背景技术
TFT（Thin Film Transistor，薄膜场效应晶体管）液晶面板的制造通常包括阵列制程和成盒制程。其中，阵列制程包括形成TFT阵列基板及CF基板；成盒制程中，在TFT阵列基板及CF基板上形成配向膜，并将CF基板和TFT阵列基板贴合并注入液晶。
所述TFT阵列基板一般包括扫描线、数据线、TFT阵列及像素电极。在TFT阵列基板形成后，需要对TFT阵列基板进行检测，以确认TFT基板上的扫描线、数据线是否存在缺陷。经过检测无缺陷的TFT阵列基板，进入成盒制程，在TFT阵列基板涂布配向膜之前，需要对TFT阵列基板进行清洁，以去除TFT阵列基板上的微粒或油污等。
但是，在去除TFT阵列基板上的微粒或油污时，经常会造成TFT阵列基板的扫描线或数据线出现断线的情况。比如，在清洗阵列基板过程中，在刮除阵列基板上的微粒时，容易造成阵列基板断线或微断线，并有可能会让修补机在阵列基板上的镀线，在清洗阵列基板后被剥离，造成阵列基板断线；同样，在对阵列基板进行紫外光照射时，容易使阵列基板的电子能阶升高，致使后续涂布配向膜前产生静电击伤现象。
而在对TFT阵列基板清洁之后至在TFT阵列基板上形成配向膜之前，不会再对TFT阵列基板进行检测，因此，在成盒制程中，若将由于清洁而造成存在断线的TFT阵列基板与CF基板组装，则会由于阵列基板上存在断线，造成液晶面板的配向不良或者出现坏点，进而导致液晶面板报废。
发明内容
本发明的主要目的在于提供一种液晶面板的制作方法及装置，旨在降低液晶面板的报废率。
为了达到上述目的，本发明提出一种液晶面板的制作方法，包括以下步骤：
对TFT阵列基板进行清洁处理；
对清洁处理后的TFT阵列基板进行阵列测试；
根据阵列测试处理结果，对所述TFT阵列基板进行相应处理。
优选地，所述对TFT阵列基板进行清洁处理的步骤包括：
通过清洁器对所述TFT阵列基板进行水洗；
通过超音波并结合清洁剂对水洗后的TFT阵列基板进行清洁；
对所述TFT阵列基板进行紫外光照射。
优选地，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤包括：
若所述阵列测试处理结果为所述TFT阵列基板上存在断线，则修补机对所述TFT阵列基板进行断线修补；
将修补后的TFT阵列基板送入成盒制程。
优选地，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤包括：若所述阵列测试处理结果为所述TFT阵列基板上不存在断线，则所述TFT阵列基板被送入成盒制程。
优选地，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤之后还包括：
成盒装置在所述TFT阵列基板上形成配向膜，并将一CF基板与其贴合并在TFT阵列基板与CF基板之间注入液晶。
优选地，所述通过清洁器对所述TFT阵列基板进行水洗包括由一喷水装置向阵列基板喷水及由毛刷配合所述喷水装置清洁TFT阵列基板。
本发明还提出一种液晶面板的制作装置，包括：
清洁机构，用于对TFT阵列基板进行清洁处理；
阵列测试机，用于对清洁处理后的TFT阵列基板进行阵列测试；
修补机，用于修补TFT阵列基板上的断线；
成盒装置，用于在所述TFT阵列基板上形成配向膜，并将一CF基板与其贴合并在TFT阵列基板与CF基板之间注入液晶。
优选地，所述清洁机构包括：
清洁器，用于对所述阵列基板进行水洗，去除所述阵列基板上的较大微粒；
超音波器，用于结合清洁剂对水洗后的阵列基板进行清洁，去除所述阵列基板上的较小微粒；
紫外光照射机，用于对所述阵列基板进行紫外光照射，去除所述阵列基板上的有机物。
优选地，所述清洁器包括一用于向阵列基板喷水的喷水装置和配合所述喷水装置清洁阵列基板的毛刷。
优选地，所述修补机具体用于当所述阵列测试处理结果为所述TFT阵列基板上存在断线时，对所述TFT阵列基板进行断线修补。
本发明还提出一种液晶面板的制作装置，包括：
清洁机构，用于对TFT阵列基板进行清洁处理；
阵列测试机，用于对清洁处理后的TFT阵列基板进行阵列测试；
修补机，用于修补TFT阵列基板上的断线。
优选地，所述清洁机构包括：
清洁器，用于对所述阵列基板进行水洗，去除所述阵列基板上的较大微粒；
超音波器，用于结合清洁剂对水洗后的阵列基板进行清洁，去除所述阵列基板上的较小微粒；
紫外光照射机，用于对所述阵列基板进行紫外光照射，去除所述阵列基板上的有机物。
优选地，所述清洁器包括一用于向阵列基板喷水的喷水装置和配合所述喷水装置清洁阵列基板的毛刷。
优选地，所述修补机具体用于当所述阵列测试处理结果为所述TFT阵列基板上存在断线时，对所述TFT阵列基板进行断线修补。
本发明提出的一种液晶面板的制作方法及装置，通过对完成阵列制程后的阵列基板进行清洁处理之后，再进行阵列检测与断线修补，可避免清洁机构在清洁处理中造成断线的TFT阵列基板进入成盒装置，降低了液晶面板的报废率。同时，由于TFT阵列基板先经过清洁机构清洁处理清除TFT阵列基板上的微粒后再由阵列检测机对TFT阵列基板进行检测，避免了TFT阵列基板上的微粒对阵列测试机的损伤。
附图说明
图1是本发明液晶面板的制作装置较佳实施例的结构示意图；
图2是本发明液晶面板的制作装置较佳实施例中清洁机构的结构示意图；
图3是本发明液晶面板的制作方法较佳实施例的流程示意图。
本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。
具体实施方式
以下将结合附图及实施例，对实现发明目的的技术方案作详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
如图1所示，本发明较佳实施例提出一种液晶面板的制作装置，包括：清洁机构201、阵列测试机202、修补机203及成盒装置204，其中：
清洁机构201用于对具有TFT阵列、数据线、扫描线、像素电极等的TFT阵列基板进行清洁处理；
阵列测试机202用于对清洁处理后的TFT阵列基板进行阵列测试，以检测TFT阵列基板的数据线、扫描线等是否存在断线；
修补机203用于修补TFT阵列基板中的断线；
所述成盒装置204用于在所述TFT阵列基板上形成配向膜，并将一CF基板与其贴合并在TFT阵列基板与CF基板之间注入液晶。
在本实施例中，当TFT阵列基板完成阵列制程后，首先由清洁机构201对TFT阵列基板进行清洁，然后由阵列检测机202对TFT阵列基板进行阵列测试。
如图2所示，上述清洁机构201包括清洁器2011、超音波器2012以及紫外光照射机2013。
清洁器2011用于对所述TFT阵列基板进行水洗，以去除所述TFT阵列基板上的较大微粒；超音波器2012用于产生超音波，并结合清洁剂对水洗后的TFT阵列基板进行清洁，以去除所述TFT阵列基板上的较小微粒；紫外光照射机2013用于对去除微粒后的所述TFT阵列基板进行紫外光照射，以去除所述阵列基板上的油污等有机物。
上述清洁器2011具体包括一喷水装置和一毛刷，所述喷水装置用于向阵列基板喷水，毛刷用于在喷水装置向阵列基板喷水的同时，滚动清洁阵列基板。
如前所述，在上述清洁处理过程中，可能会造成TFT阵列基板断线或者其他缺陷，比如，采用清洁器2011或超音波器2012清洗TFT阵列基板，在去除TFT阵列基板上的大微粒或小微粒时，容易造成TFT阵列基板断线；在紫外光照射机2013对TFT阵列基板进行紫外光照射时，容易使TFT阵列基板的电子能阶升高，致使后续形成配向膜前产生静电击伤现象，而造成液晶面板报废。
因此，本实施例在对TFT阵列基板进行清洁机构201清洁处理后，由阵列检测机202对TFT阵列基板进行阵列测试，以检测TFT阵列基板可能出现的断线，避免液晶面板报废。
所述修补机203用于修补阵列检测机202检测出的存在断线的TFT阵列基板。
具体地，本实施例通过阵列测试机202对经过清洁处理后的阵列基板进行阵列测试。由于TFT阵列基板上布置有TFT阵列、数据线、扫描线以及像素电极等，该阵列测试是指对TFT阵列基板的数据线、扫描线进行检测，通过检测判断TFT阵列基板是否存在断线情况。
当所述阵列测试机202的测试结果为所述TFT阵列基板上存在断线时，所述修补机203对所述TFT阵列基板的断线进行修补，然后将修补后的TFT阵列基板送入成盒装置204；当所述阵列测试处理结果为所述TFT阵列基板上不存在断线时，所述TFT阵列基板被送入成盒装置204。
成盒装置204用于在所述TFT阵列基板及一CF基板上形成配向膜，然后在TFT阵列基板或CF基板上涂框胶，并相应地在CF基板或TFT阵列基板上滴注液晶，然后将TFT阵列基板和CF基板贴合，再对贴合后的TFT阵列基板和CF基板进行光配向处理。
本实施例通过上述方案，可避免清洁机构201在清洁处理中造成断线的TFT阵列基板进入成盒装置204，降低了液晶面板的报废率。同时，由于TFT阵列基板先经过清洁机构201清洁处理清除TFT阵列基板上的微粒后再由阵列检测机202对TFT阵列基板进行检测，避免了TFT阵列基板上的微粒对阵列测试机202的损伤。
如图3所示，本发明较佳实施例提出的一种液晶面板的制作方法，基于上述图1及图2所示的液晶面板的制作装置而实施，该方法包括：
步骤S1，对TFT阵列基板进行清洁处理；
在本实施例中，当阵列基板完成阵列制程形成TFT阵列、数据线、扫描线、像素电极等后，由清洁机构201对该TFT阵列基板进行清洁。
具体地，首先，清洁器2011对所述TFT阵列基板进行水洗，以去除所述TFT阵列基板上的较大微粒；然后，超音波器2012产生超音波，并结合清洁剂对水洗后的TFT阵列基板进行清洁，以去除所述TFT阵列基板上的较小微粒；最后，紫外光照射机2013对去除微粒后的所述TFT阵列基板进行紫外光照射，以去除所述TFT阵列基板上的油污等有机物。
上述清洁器2011具体包括一喷水装置和一毛刷，所述喷水装置用于向阵列基板喷水，毛刷用于在喷水装置向阵列基板喷水的同时，滚动清洁阵列基板。
步骤S2，对清洁处理后的TFT阵列基板进行阵列测试；
由于TFT阵列基板上布置有TFT阵列、数据线、扫描线以及像素电极等，该阵列测试是指对TFT阵列基板的数据线、扫描线进行检测，通过检测判断TFT阵列基板是否存在断线情况。
在上述清洁处理过程中，可能会造成TFT阵列基板断线或者其他缺陷，比如，采用清洁器2011或超音波器2012清洗TFT阵列基板，在除去TFT阵列基板上的大微粒或小微粒时，容易造成TFT阵列基板断线；在紫外光照射机2013对TFT阵列基板进行紫外光照射时，容易使TFT阵列基板的电子能阶升高，致使后续涂布配向膜前产生静电击伤现象，而造成液晶面板报废。
因此，本实施例在对TFT阵列基板进行清洁处理后，对TFT阵列基板进行阵列测试，以检测出TFT阵列基板在清洁处理过程中造成的断线，避免液晶面板报废。
步骤S3，根据阵列测试处理结果，对所述TFT阵列基板进行相应处理。
具体地，本实施例通过阵列测试机202对经过清洁处理后的TFT阵列基板进行阵列测试，当所述阵列测试处理结果为所述TFT阵列基板上存在断线时，所述修补机203对所述TFT阵列基板进行断线修补，并将修补后的TFT阵列基板送入成盒装置204进行成盒制程；当所述阵列测试处理结果为所述TFT阵列基板上不存在断线，则所述阵列基板直接被送入成盒装置204进行成盒制程。
所述成盒制程包括在所述TFT阵列基板及一CF基板上形成配向膜，然后在TFT阵列基板或CF基板上涂框胶，并相应地在CF基板或TFT阵列基板上滴注液晶，然后将TFT阵列基板和CF基板贴合，再对贴合后的TFT阵列基板和CF基板进行光配向处理。
本实施例通过上述方案，可避免清洁机构201在清洁处理中造成断线的TFT阵列基板进入成盒装置204，降低了液晶面板的报废率。同时，由于TFT阵列基板先经过清洁机构201清洁处理清除TFT阵列基板上的微粒后再由阵列检测机202对TFT阵列基板进行检测，避免了TFT阵列基板上的微粒对阵列测试机202的损伤。
以上所述仅为本发明的优选实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (14)

  1. 一种液晶面板的制作方法，其特征在于，包括以下步骤：
    对TFT阵列基板进行清洁处理；
    对清洁处理后的TFT阵列基板进行阵列测试；
    根据阵列测试处理结果，对所述TFT阵列基板进行相应处理。
  2. 根据权利要求1所述的液晶面板的制作方法，其特征在于，所述对TFT阵列基板进行清洁处理的步骤包括：
    通过清洁器对所述TFT阵列基板进行水洗；
    通过超音波并结合清洁剂对水洗后的TFT阵列基板进行清洁；
    对所述TFT阵列基板进行紫外光照射。
  3. 根据权利要求1所述的液晶面板的制作方法，其特征在于，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤包括：
    若所述阵列测试处理结果为所述TFT阵列基板上存在断线，则修补机对所述TFT阵列基板进行断线修补；
    将修补后的TFT阵列基板送入成盒制程。
  4. 根据权利要求3所述的液晶面板的制作方法，其特征在于，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤包括：若所述阵列测试处理结果为所述TFT阵列基板上不存在断线，则所述TFT阵列基板被送入成盒制程。
  5. 根据权利要求1所述的液晶面板的制作方法，其特征在于，所述根据阵列测试处理结果，对所述TFT阵列基板进行相应处理的步骤之后还包括：
    成盒装置在所述TFT阵列基板上形成配向膜，并将一CF基板与其贴合并在TFT阵列基板与CF基板之间注入液晶。
  6. 根据权利要求2所述的液晶面板的制作方法，其特征在于，所述通过清洁器对所述TFT阵列基板进行水洗包括由一喷水装置向阵列基板喷水及由毛刷配合所述喷水装置清洁TFT阵列基板。
  7. 一种液晶面板的制作装置，其特征在于，包括：
    清洁机构，用于对TFT阵列基板进行清洁处理；
    阵列测试机，用于对清洁处理后的TFT阵列基板进行阵列测试；
    修补机，用于修补TFT阵列基板上的断线；
    成盒装置，用于在所述TFT阵列基板上形成配向膜，并将一CF基板与其贴合并在TFT阵列基板与CF基板之间注入液晶。
  8. 根据权利要求7所述的液晶面板的制作装置，其特征在于，所述清洁机构包括：
    清洁器，用于对所述阵列基板进行水洗，去除所述阵列基板上的较大微粒；
    超音波器，用于结合清洁剂对水洗后的阵列基板进行清洁，去除所述阵列基板上的较小微粒；
    紫外光照射机，用于对所述阵列基板进行紫外光照射，去除所述阵列基板上的有机物。
  9. 根据权利要求8所述的液晶面板的制作装置，其特征在于，所述清洁器包括一用于向阵列基板喷水的喷水装置和配合所述喷水装置清洁阵列基板的毛刷。
  10. 根据权利要求7所述的液晶面板的制作装置，其特征在于，所述修补机具体用于当所述阵列测试处理结果为所述TFT阵列基板上存在断线时，对所述TFT阵列基板进行断线修补。
  11. 一种液晶面板的制作装置，其特征在于，包括：
    清洁机构，用于对TFT阵列基板进行清洁处理；
    阵列测试机，用于对清洁处理后的TFT阵列基板进行阵列测试；
    修补机，用于修补TFT阵列基板上的断线。
  12. 根据权利要求11所述的液晶面板的制作装置，其特征在于，所述清洁机构包括：
    清洁器，用于对所述阵列基板进行水洗，去除所述阵列基板上的较大微粒；
    超音波器，用于结合清洁剂对水洗后的阵列基板进行清洁，去除所述阵列基板上的较小微粒；
    紫外光照射机，用于对所述阵列基板进行紫外光照射，去除所述阵列基板上的有机物。
  13. 根据权利要求12所述的液晶面板的制作装置，其特征在于，所述清洁器包括一用于向阵列基板喷水的喷水装置和配合所述喷水装置清洁阵列基板的毛刷。
  14. 根据权利要求11所述的液晶面板的制作装置，其特征在于，所述修补机具体用于当所述阵列测试处理结果为所述TFT阵列基板上存在断线时，对所述TFT阵列基板进行断线修补。
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