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WO2012034825A2 - Usine à gaz fluor - Google Patents

Usine à gaz fluor Download PDF

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Publication number
WO2012034825A2
WO2012034825A2 PCT/EP2011/064369 EP2011064369W WO2012034825A2 WO 2012034825 A2 WO2012034825 A2 WO 2012034825A2 EP 2011064369 W EP2011064369 W EP 2011064369W WO 2012034825 A2 WO2012034825 A2 WO 2012034825A2
Authority
WO
WIPO (PCT)
Prior art keywords
fluorine
storage unit
plant according
fluorine gas
gas plant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2011/064369
Other languages
English (en)
Other versions
WO2012034825A3 (fr
Inventor
Ho-Jin Jeon
Oliviero Diana
Peter M. Predikant
Philippe Morelle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Solvay SA
Original Assignee
Solvay SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solvay SA filed Critical Solvay SA
Priority to KR2020177000067U priority Critical patent/KR20170003822U/ko
Priority to KR2020137000012U priority patent/KR20130003432U/ko
Priority to DE212011100142U priority patent/DE212011100142U1/de
Priority to JP2013600047U priority patent/JP3189487U/ja
Priority to CN201190000797.5U priority patent/CN203477887U/zh
Publication of WO2012034825A2 publication Critical patent/WO2012034825A2/fr
Publication of WO2012034825A3 publication Critical patent/WO2012034825A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/06—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures for filling with compressed gases
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/08—Mounting arrangements for vessels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/08—Mounting arrangements for vessels
    • F17C13/084—Mounting arrangements for vessels for small-sized storage vessels, e.g. compressed gas cylinders or bottles, disposable gas vessels, vessels adapted for automotive use
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2201/00—Vessel construction, in particular geometry, arrangement or size
    • F17C2201/01—Shape
    • F17C2201/0104—Shape cylindrical
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0602—Wall structures; Special features thereof
    • F17C2203/0607—Coatings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0634—Materials for walls or layers thereof
    • F17C2203/0636—Metals
    • F17C2203/0639—Steels
    • F17C2203/0643—Stainless steels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0634—Materials for walls or layers thereof
    • F17C2203/0636—Metals
    • F17C2203/0648—Alloys or compositions of metals
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0103—Exterior arrangements
    • F17C2205/0107—Frames
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0123—Mounting arrangements characterised by number of vessels
    • F17C2205/013—Two or more vessels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0123—Mounting arrangements characterised by number of vessels
    • F17C2205/013—Two or more vessels
    • F17C2205/0134—Two or more vessels characterised by the presence of fluid connection between vessels
    • F17C2205/0142—Two or more vessels characterised by the presence of fluid connection between vessels bundled in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0153—Details of mounting arrangements
    • F17C2205/0157—Details of mounting arrangements for transport
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323—Valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F17C2221/014—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/03—Mixtures
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0107—Single phase
    • F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/033—Small pressure, e.g. for liquefied gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/035—High pressure (>10 bar)
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/01—Propulsion of the fluid
    • F17C2227/0128—Propulsion of the fluid with pumps or compressors
    • F17C2227/0157—Compressors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2260/00—Purposes of gas storage and gas handling
    • F17C2260/04—Reducing risks and environmental impact
    • F17C2260/044—Avoiding pollution or contamination
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2265/00—Effects achieved by gas storage or gas handling
    • F17C2265/02—Mixing fluids
    • F17C2265/025—Mixing fluids different fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00—Applications
    • F17C2270/05—Applications for industrial use
    • F17C2270/0518—Semiconductors

Definitions

  • Fluorine gas such as molecular fluorine (F 2 ) and mixtures thereof in particular with inert gases e.g. N 2 or Ar are useful, for example, as cleaning gas for process chambers in semiconductor manufacturing processes.
  • Document WO 2006/067364- Al discloses in a method of delivering high purity fluorine to a processing system, an on-site fluorine generator which supplies high purity fluorine to a fixed storage unit, from which the high purity fluorine is supplied to the processing system.
  • high purity fluorine is also provided in a transportable gas storage vessel, for example, a multi-cylinder pack at a relatively low pressure, typically less than 35 psig.
  • the transportable storage vessel is selectively connected to the fixed storage unit as required to enable the amount of fluorine within the storage unit to be maintained at a desired level.
  • the invention concerns consequently a fluorine gas plant comprising a fluorine generating unit (1) connected to a fluorine supply system (2) having a point of use of fluorine (3), and a permanent fluorine storage unit (4) connectable to said supply system, wherein said fluorine storage unit comprises a plurality of hollow bodies (5).
  • Figure 1 is a schematic view of a fluorine gas plant according to the invention which is connected to a fluorine supply system and a fluorine gas storage unit having, to give an example, 6 hollow bodies.
  • Fluorine gas is understood to denote in particular molecular fluorine (F 2 ) and mixtures thereof, in particular with inert gases.
  • Inert gases can be selected for example from argon and nitrogen.
  • a preferred fluorine gas consists or consists essentially of F 2 .
  • Permanent fluorine storage unit is understood to denote in particular a fluorine storage unit which is integrated into the fluorine plant.
  • the fluorine storage unit can be a transportable unit which is permanently present in the vicinity of the fluorine supply system throughout operation of the fluorine plant.
  • the fluorine storage unit can be a transportable unit which is permanently present in the vicinity of the fluorine supply system throughout operation of the fluorine plant.
  • the permanent fluorine storage unit is permanently present in the vicinity of the fluorine supply system ; nevertheless, during times when the fluorine plant is not in operation, the permanent fluorine storage unit could be separated from the fluorine plant because it is connectable to the supply system, and thus, it is disconnectable in times of non-operation of the fluorine plant. It is possible to close a respective valve or respective valves of the permanent fluorine supply system and disconnect one or more of the hollow bodies in cases where this is necessary, e.g. if there is a problem with the respective hollow body without interruption of the operation of the fluorine plant.
  • the permanent fluorine storage unit allows for a continuing plant operation even in case of failure of one or more of the hollow bodies.
  • the permanent fluorine storage unit is designed to contain more than 90 wt % more preferably more than 95 wt %, most preferably about 100 wt % of the fluorine gas relative to the total weight of fluorine gas stored in the plant. Thus, no additional storage tank is necessary.
  • Fluorine supply system is understood to denote in particular an element which can contain fluorine and which is able to convey fluorine from the fluorine generating unit to the point of use.
  • Possible components of a fluorine supply system include but are not limited to supply lines, compressors, mixers and buffer tanks.
  • Connectable is understood to denote in particular that the permanent fluorine storage unit is equipped to be able to be connected to a component of the fluorine supply system.
  • the permanent fluorine storage unit is equipped to be able to be connected to a fluorine supply line.
  • the fluorine storage unit is connected to a component of the fluorine supply system, in particular a fluorine supply line, throughout operation of the fluorine plant.
  • the fluorine storage unit is directly connected to a component of the fluorine supply system.
  • Suitable equipment for connecting the fluorine storage unit connected to a component of the fluorine supply system includes a manifold (6) connected to each hollow body (5) of the fluorine storage unit through a line and preferably having a shut-off valve (7) in each line allowing to individually isolate each hollow body and said manifold is further connected to a component of the fluorine supply system.
  • parts thereof which are supposed to be in contact with gas such as e.g., if appropriate, hollow bodies, valves and lines for charging and/or discharging gas are suitably made of or coated with material resistant to molecular fluorine.
  • gas e.g., if appropriate, hollow bodies, valves and lines for charging and/or discharging gas
  • material resistant to molecular fluorine examples include Monel metal, stainless steel, copper, and, preferably, nickel.
  • the fluorine storage unit preferably comprises from 4 to 25 hollow bodies, more preferably from 5 to 8 hollow bodies.
  • the hollow bodies are preferably of substantially identical shape and dimensions.
  • An individual hollow body preferably has a deviation of not more than ⁇ 5 % of the average volume of each of the hollow bodies ; preferably, each hollow body has approximately the same inner volume. Cylindrically shaped hollow bodies are preferred.
  • the hollow bodies of the fluorine storage unit can be suitably fixed together by means of an appropriate frame.
  • Particular frame geometries include triangular, square, and rectangular geometries.
  • each of the hollow bodies has a single combined inlet/outlet opening through which F 2 is fed into the hollow body and withdrawn from the body.
  • the fluorine storage unit is generally able to contain or contains fluorine gas at a pressure of at least 25 psig. Often this pressure is equal to or greater than 35 psig, preferably equal to or greater than 40 psig. In the fluorine gas plant according to the invention, the fluorine storage unit is generally able to contain or contains fluorine gas at a pressure of at most 400 psig, usually equal to less than 75 psig. Often, this pressure is equal to or lower than 65 psig, preferably equal to or lower than 60 psig.
  • the fluorine storage unit is preferably able to contain or contains fluorine gas at a pressure of from 25 to 75 psig, and more preferably, the fluorine storage unit is able to contain or contains fluorine gas at a pressure of from 35 to 65 psig, especially preferably from 40 to 60 psig.
  • each of the hollow bodies has an internal volume of equal to or lower than 5000 1, more preferably, equal to or lower than 3000 1.
  • preferred ranges of the internal volume of each of the hollow bodies are from 100 to 5000 1, more preferably, from 100 to 3000 1, most preferably, from 500 to 3000 1, and especially preferably, from 1000 to 3000 1.
  • the fluorine storage unit is generally able to contain or contains fluorine gas at a pressure of at least 25 psig, and that each of the hollow bodies has an internal volume of equal to or greater than 100 1. It is still more preferred that the fluorine storage unit is generally able to contain or contains fluorine gas at a pressure of at least 35 psig, and that each of the hollow bodies has an internal volume of equal to or greater than 500 1.
  • the fluorine storage unit is generally able to contain or contains fluorine gas at a pressure of at most 400 psig, usually equal to less than 75 psig, and that the internal volume of each of the hollow bodies is equal to or lower than 3000 1.
  • the most preferred fluorine storage unit is able to contain or contains fluorine gas at a pressure of from 35 to 65 psig, and each of the hollow bodies has an internal volume of 500 to 3000 1.
  • the hollow bodies of the fluorine storage unit are generally able to contain or contain fluorine gas at the aforesaid pressures. It is particularly preferred that the hollow bodies contain fluorine at the aforesaid pressures.
  • the ratio of the molecular fluorine (F 2 ) stored in the fluorine storage unit to the daily molecular fluorine (F 2 ) producing capacity of the fluorine gas plant is generally from 0.1 to 1, preferably from 0.1 to 0.25.
  • the fluorine generating unit generally comprises an electrolyzer for production of molecular fluorine by electrolysis of molten electrolyte preferably a KF and HF containing molten electrolyte.
  • the fluorine storage unit is preferably mounted on a skid.
  • the point of use can be connected to a further manufacturing plant, for example a chemical plant or, in particular a plant using fluorine for surface treatment.
  • the point of use is often connected to a plant manufacturing micro-electromechanical systems, preferably, to a semiconductor manufacturing plant, especially preferably a manufacture of photovoltaic devices or flat panel displays.
  • the fluorine storage unit is comprised in an enclosed space (8).
  • the fluorine storage unit is comprised in an enclosed space (8), and the fluorine storage unit is mounted on a skid.
  • the enclosed space generally comprises a fluorine sensor capable to trigger connection of the enclosed space to a fluorine destruction system (9).
  • the enclosed space is connected to the fluorine destruction system through a suction line (10) connected to a fan (11) which is operable to transport gas from the enclosed space to the fluorine destruction system.
  • the fluorine destruction system is preferably a scrubber.
  • the scrubber suitably contains an aqueous alkaline solution, for example a KOH solution and, optionally, a reducing agent such as for example sodium thiosulphate or potassium thiosulphate.
  • the fluorine destruction system is capable to destroy fluorine contained in 1 or 2 hollow bodies.
  • the fluorine destruction system is capable to destroy fluorine contained in about 1 hollow body.
  • the fluorine gas plant according to the invention further comprises a mixer (12), preferably a static mixer, said mixer being preferably capable to receive fluorine from the fluorine generating unit (1) and to receive inert gas, such as preferably argon and/or nitrogen, from an inert gas supply line (13).
  • a mixer (12) preferably a static mixer
  • inert gas such as preferably argon and/or nitrogen
  • the invention also concerns a method for supply of fluorine gas comprising use of the fluorine gas plant according to the invention to supply fluorine gas to a point of use.
  • Fig. 1 shows an illustrative preferred fluorine plant of the invention.
  • Fluorine generating unit (1) is connected to fluorine supply system (2) which comprises a fluorine supply line connected to point of use (3), which is connected to a semiconductor manufacturing plant.
  • a pressure control loop (14) adjusts, generally reduces, the pressure of fluorine supplied to the point of use to a desired value.
  • the fluorine supply line is connected to mixer (12) which is further connected to inert gas supply line (13) and a further fluorine supply line connects the mixer (12) to the point of use (3).
  • the fluorine supply system (2) is further connected to fluorine storage unit (4) through manifold (6) connected to each hollow body (5) of the fluorine storage unit through a line and preferably having a shut-off valve (7) at each F 2 -storage-vessel.
  • the fluorine storage unit is contained in enclosed space (8) which comprises a fluorine sensor capable to trigger connection of the enclosed space to the fluorine destruction system (9).
  • the enclosed space is connected to the fluorine destruction system through a suction line (10) connected to a fan (11) which is operable to transport gas from the enclosed space to the fluorine destruction system (9).
  • the F 2 is conveyed through the fluorine supply system (2) to point of use (3) where F 2 is supplied to a flat panel display manufacturing plant using F 2 for chamber cleaning.
  • the F 2 is supplied on demand to the point of use.
  • the fluorine pressure in the fluorine supply system (2) and in the F 2 storage unit (4) is maintained at 3.5 barg by adapting the F 2 production in the F 2 generating unit.
  • the F 2 storage unit (4) comprises 6 identical cylindrically shaped containers having each an internal volume of 1.3 m 3 .
  • the fluorine pressure at the point of use (3) is further reduced to 1.5 barg by a pressure control loop (14).
  • shut-off valves (7) are open and the pressure difference between the F 2 storage unit (4) and the point of use (3) provides a buffer allowing a smooth control of the delivered fluorine flow, even for variable consumption patterns at the point-of-use or during production interruption of the fluorine generating unit.
  • the fluorine is detected through a fluorine detector in the enclosed space and fan (11) is activated to transport the fluorine containing gas from the enclosed space through suction line (10) to the fluorine destruction system (9) which is a scrubber containing an aqueous KOH-solution.
  • the scrubber is able to treat 15 kg F 2 .
  • the fluorine plant according to the invention and the method according to the invention allow for stable, safe and economic fluorine gas supply, in particular for semiconductor applications such as chamber cleaning and etching.
  • the fluorine storage system and optional fluorine destruction system are highly efficient, allowing for stability of supply and high safety of the plant.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Treating Waste Gases (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

La présente invention concerne une usine à gaz fluor comprenant une unité de production de fluor (1), comprenant plusieurs autres étapes de procédé comme l'approvisionnement en matière première, des étapes de purification de F2 et des systèmes de réduction de gaz de dégagement, raccordée à une conduite d'alimentation en fluor (2) dotée d'un entreposage de service de fluor (3), et une unité de stockage permanent de fluor (4) raccordée à ladite conduite d'approvisionnement, ladite unité de stockage de fluor comprenant une pluralité de corps creux.
PCT/EP2011/064369 2010-09-16 2011-08-22 Usine à gaz fluor Ceased WO2012034825A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR2020177000067U KR20170003822U (ko) 2010-09-16 2011-08-22 불소 가스 공장
KR2020137000012U KR20130003432U (ko) 2010-09-16 2011-08-22 불소 가스 공장
DE212011100142U DE212011100142U1 (de) 2010-09-16 2011-08-22 Fluorgasanlage
JP2013600047U JP3189487U (ja) 2010-09-16 2011-08-22 フッ素ガスプラント
CN201190000797.5U CN203477887U (zh) 2010-09-16 2011-08-22 氟气体设备

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10177206 2010-09-16
EP10177206.9 2010-09-16

Publications (2)

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WO2012034825A2 true WO2012034825A2 (fr) 2012-03-22
WO2012034825A3 WO2012034825A3 (fr) 2012-05-10

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PCT/EP2011/064369 Ceased WO2012034825A2 (fr) 2010-09-16 2011-08-22 Usine à gaz fluor

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JP (1) JP3189487U (fr)
KR (2) KR20130003432U (fr)
CN (1) CN203477887U (fr)
DE (1) DE212011100142U1 (fr)
TW (1) TWI531535B (fr)
WO (1) WO2012034825A2 (fr)

Cited By (1)

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US8871174B2 (en) 2010-03-26 2014-10-28 Solvay Sa Method for the supply of fluorine

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015101728A1 (de) 2015-02-06 2016-08-11 Das Environmental Expert Gmbh Verfahren zum Entfernen von Fluor aus fluorhaltigen Abgasen
CN105546333A (zh) * 2016-01-22 2016-05-04 池州森大轻工制品有限公司 一种高纯气体充装系统
CN107337180B (zh) * 2017-07-10 2019-08-23 洛阳森蓝化工材料科技有限公司 一种纯化氟气的填料及其制备方法和应用

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US5837027A (en) * 1996-05-20 1998-11-17 Advanced Technology Materials, Inc. Manufacturing process for gas source and dispensing systems
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US20040151656A1 (en) * 2001-11-26 2004-08-05 Siegele Stephen H. Modular molecular halogen gas generation system
US20040037768A1 (en) * 2001-11-26 2004-02-26 Robert Jackson Method and system for on-site generation and distribution of a process gas
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JP2005024068A (ja) * 2003-07-02 2005-01-27 Toyo Tanso Kk ハロゲンガス又はハロゲン含有ガスの供給装置

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US20060130929A1 (en) 2004-12-22 2006-06-22 Graham Hodgson Method of supplying fluorine
WO2006067364A1 (fr) 2004-12-22 2006-06-29 The Boc Group Plc Procede d’alimentation en fluor

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Publication number Priority date Publication date Assignee Title
US8871174B2 (en) 2010-03-26 2014-10-28 Solvay Sa Method for the supply of fluorine

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Publication number Publication date
KR20130003432U (ko) 2013-06-10
KR20170003822U (ko) 2017-11-07
TWI531535B (zh) 2016-05-01
CN203477887U (zh) 2014-03-12
DE212011100142U1 (de) 2013-04-24
JP3189487U (ja) 2014-03-20
WO2012034825A3 (fr) 2012-05-10
TW201219306A (en) 2012-05-16

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