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WO2012033326A3 - Film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse et son procédé de préparation - Google Patents

Film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse et son procédé de préparation Download PDF

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Publication number
WO2012033326A3
WO2012033326A3 PCT/KR2011/006586 KR2011006586W WO2012033326A3 WO 2012033326 A3 WO2012033326 A3 WO 2012033326A3 KR 2011006586 W KR2011006586 W KR 2011006586W WO 2012033326 A3 WO2012033326 A3 WO 2012033326A3
Authority
WO
WIPO (PCT)
Prior art keywords
coating film
porous ceramic
metal oxide
rare earth
earth metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/006586
Other languages
English (en)
Korean (ko)
Other versions
WO2012033326A2 (fr
Inventor
박동수
이병국
한병동
이정환
변응선
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Institute of Machinery and Materials KIMM
Original Assignee
Korea Institute of Machinery and Materials KIMM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Institute of Machinery and Materials KIMM filed Critical Korea Institute of Machinery and Materials KIMM
Publication of WO2012033326A2 publication Critical patent/WO2012033326A2/fr
Publication of WO2012033326A3 publication Critical patent/WO2012033326A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

La présente invention concerne un film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse, et son procédé de préparation. La présente invention concerne notamment un film de revêtement d'oxyde de métal de terres rares formé sur un film céramique poreux d'un substrat, le film céramique poreux ayant une rugosité de surface moyenne de 0,4 à 2,3 m. Le film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse, et son procédé de préparation, selon la présente invention, peut fournir non seulement l'effet d'assurer des caractéristiques de tension de tenue car le film de revêtement céramique poreux a une épaisseur suffisante, mais également l'effet d'assurer une résistivité au plasma grâce au film de revêtement d'oxyde de terres rares dense, et peut par conséquent être appliqué sur diverses parties d'un appareil semi-conducteur, y compris un appareil de gravure semi-conducteur.
PCT/KR2011/006586 2010-09-06 2011-09-06 Film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse et son procédé de préparation Ceased WO2012033326A2 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20100087099 2010-09-06
KR10-2010-0087099 2010-09-06
KR1020110089675A KR101108692B1 (ko) 2010-09-06 2011-09-05 다공성 세라믹 표면을 밀봉하는 치밀한 희토류 금속 산화물 코팅막 및 이의 제조방법
KR10-2011-0089675 2011-09-05

Publications (2)

Publication Number Publication Date
WO2012033326A2 WO2012033326A2 (fr) 2012-03-15
WO2012033326A3 true WO2012033326A3 (fr) 2012-05-03

Family

ID=45614653

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006586 Ceased WO2012033326A2 (fr) 2010-09-06 2011-09-06 Film de revêtement d'oxyde de métal de terres rares dense pour la protection d'une surface céramique poreuse et son procédé de préparation

Country Status (2)

Country Link
KR (1) KR101108692B1 (fr)
WO (1) WO2012033326A2 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
KR101932429B1 (ko) * 2012-05-04 2018-12-26 (주)코미코 내 플라즈마 코팅막, 이의 제조 방법 및 내 플라즈마성 부품
WO2013176168A1 (fr) * 2012-05-22 2013-11-28 株式会社東芝 Élément pour appareil de traitement par plasma et procédé de fabrication d'un élément pour appareil de traitement par plasma
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US9440886B2 (en) * 2013-11-12 2016-09-13 Applied Materials, Inc. Rare-earth oxide based monolithic chamber material
US9725799B2 (en) 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
US9976211B2 (en) 2014-04-25 2018-05-22 Applied Materials, Inc. Plasma erosion resistant thin film coating for high temperature application
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US20180240649A1 (en) * 2017-02-17 2018-08-23 Lam Research Corporation Surface coating for plasma processing chamber components
KR102016615B1 (ko) * 2017-09-14 2019-08-30 (주)코미코 내플라즈마 특성이 향상된 플라즈마 에칭 장치용 부재 및 그 제조 방법
KR20190057753A (ko) 2017-11-20 2019-05-29 (주)코미코 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 부재
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
WO2020017671A1 (fr) * 2018-07-17 2020-01-23 (주)코미코 Procédé de revêtement par dépôt d'aérosol pour revêtement résistant au plasma
CN110158032B (zh) * 2019-05-09 2021-09-28 成都超纯应用材料有限责任公司 一种耐腐蚀涂层及其制备方法
CN110643993B (zh) * 2019-10-18 2023-11-28 山东大学 钢铁表面Sm2O3改性的激光熔覆材料、复合涂层及其制备方法
KR102522277B1 (ko) 2022-03-24 2023-04-17 주식회사 펨빅스 내플라즈마 2층 코팅막 구조물 및 이의 제조 방법
KR20240145684A (ko) 2023-03-28 2024-10-07 에이씨에스(주) Mlcc 검사 장비의 가공품 코팅 방법
CN117105227B (zh) * 2023-08-21 2025-09-05 黑龙江省科学院高技术研究院 一种铪氧化物表面改性碳化钛粉末的制备方法
CN119786325A (zh) * 2023-10-07 2025-04-08 江苏鲁汶仪器股份有限公司 一种膜层结构及制备方法

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KR20050008855A (ko) * 2002-06-27 2005-01-21 램 리서치 코포레이션 플라즈마 반응기용 열 스프레이 이트리아 함유 코팅
KR20050039565A (ko) * 2003-10-24 2005-04-29 도시바세라믹스가부시키가이샤 내플라즈마 부재 및 그 제조방법 및 열분사막 형성방법
KR20070090531A (ko) * 2006-03-03 2007-09-06 가부시키가이샤 히다치 하이테크놀로지즈 플라즈마 에칭장치 및 플라즈마 처리실 내 부재의 형성방법
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KR20090086896A (ko) * 2008-11-07 2009-08-14 주식회사 코미코 플라즈마 처리 장치용 배플 플레이트의 제조 방법
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Patent Citations (6)

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Publication number Priority date Publication date Assignee Title
KR20050008855A (ko) * 2002-06-27 2005-01-21 램 리서치 코포레이션 플라즈마 반응기용 열 스프레이 이트리아 함유 코팅
KR20050039565A (ko) * 2003-10-24 2005-04-29 도시바세라믹스가부시키가이샤 내플라즈마 부재 및 그 제조방법 및 열분사막 형성방법
KR20070090531A (ko) * 2006-03-03 2007-09-06 가부시키가이샤 히다치 하이테크놀로지즈 플라즈마 에칭장치 및 플라즈마 처리실 내 부재의 형성방법
KR20080036530A (ko) * 2006-10-23 2008-04-28 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 보호층의 저온 에어로졸 증착
KR20100011582A (ko) * 2008-07-25 2010-02-03 주식회사 코미코 세라믹 코팅막 형성 장치
KR20090086896A (ko) * 2008-11-07 2009-08-14 주식회사 코미코 플라즈마 처리 장치용 배플 플레이트의 제조 방법

Also Published As

Publication number Publication date
WO2012033326A2 (fr) 2012-03-15
KR101108692B1 (ko) 2012-01-25

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