WO2012008275A1 - Process for production of organic electroluminescent element - Google Patents
Process for production of organic electroluminescent element Download PDFInfo
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- WO2012008275A1 WO2012008275A1 PCT/JP2011/064373 JP2011064373W WO2012008275A1 WO 2012008275 A1 WO2012008275 A1 WO 2012008275A1 JP 2011064373 W JP2011064373 W JP 2011064373W WO 2012008275 A1 WO2012008275 A1 WO 2012008275A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Definitions
- the present invention relates to a method for producing an organic electroluminescence element, and more particularly, to a method for producing an organic electroluminescence element having improved light emission initial characteristics and element lifetime.
- organic electroluminescence elements also referred to as organic EL elements
- a first electrode (anode) made of a transparent conductive film such as ITO (Indium tin oxide) is provided on a transparent base material such as a glass base material, and an organic functional layer including at least a light-emitting layer thereon,
- a second electrode (cathode) made of aluminum or the like is provided in this order, and the first electrode (anode) and the second electrode (cathode) are connected to an external circuit or the peripheral portion of the organic EL element.
- a first electrode (anode) side extraction electrode and a second electrode (cathode) side extraction electrode for connection to the internal drive circuit are formed.
- An organic EL element emits light when a very thin thin film (organic functional layer) of an organic compound including a fluorescent or phosphorescent light emitting layer is sandwiched between a first electrode (anode) and a second electrode (cathode) and a current is passed.
- organic functional layer organic compound including a fluorescent or phosphorescent light emitting layer
- an organic compound is usually an insulator
- current can be injected and driven as an organic EL element by making the organic layer very thin. It can be driven at a low voltage of 10 V or less, and it is possible to obtain high-efficiency light emission.
- the organic EL element is manufactured using a flexible base material (web) in addition to a single-wafer substrate.
- a dry process method such as a vacuum film forming method and a wet process method such as a coating method are known.
- the dry process method has a problem that the composition of the metal oxide thin film formed by sputtering during film formation changes when moisture comes out of the web by vacuum or heating. Therefore, in order to reduce the influence of moisture coming out of the web, in the roll coater type continuous sputtering system, the roll chamber and the film forming chamber are separated by a shielding plate, or preheating (removing moisture) in the roll chamber (web). (See, for example, Patent Document 1). However, since it is necessary to pass the web from the roll chamber to the film forming chamber while making contact with the cooling roll, the roll chamber and the film forming chamber cannot be completely separated. Therefore, the problem that moisture generated in the roll chamber is mixed into the film forming chamber and the composition of the metal oxide thin film formed by sputtering cannot be completely solved.
- the moisture of the substrate increases the moisture partial pressure of the film forming chamber and affects the composition of the sputtered metal oxide film.
- a material that can ensure a vacuum of 10 ⁇ 4 Pa or less it is preferable to use a material that can ensure a vacuum of 10 ⁇ 4 Pa or less.
- a cryopump is preferably provided in order to sufficiently reduce the residual gas in the vacuum device, particularly the amount of moisture, and in that case, the moisture partial pressure in the device can be reduced to about 10 ⁇ 5 Pa or less.
- a large amount of moisture is brought into the apparatus from a substrate or the like, it not only adsorbs to the interface between the light emitting layer and the electron injection layer, but also adversely affects the deposited film, so that sufficient moisture partial pressure management is essential.
- the device driving voltage can be lowered, the occurrence / growth of dark spots can be suppressed, and the initial light emission characteristics and device lifetime can be improved.
- maintaining the environment of the film forming chamber in the vacuum film forming apparatus at low moisture for example, by reducing the water partial pressure to 10 ⁇ 5 Pa or less, is effective in improving the initial light emission characteristics and device life of the organic EL device.
- Patent Document 2 See, for example, Patent Document 2.
- the method there is no suggestion of a method other than using a cryopump in order to sufficiently reduce the water content.
- the moisture partial pressure becomes a specified value when a cryopump is used. The problem is that it takes time.
- the object of the present invention is performed using a flexible film (long substrate), and in the production of an organic electroluminescence device including a vacuum film formation step, the driving voltage is low and the generation / growth of dark spots is suppressed.
- Another object of the present invention is to provide a method for producing an organic electroluminescence device having improved initial light emission characteristics and lifetime.
- At least one of a leader film and a side tape comprising at least a step of sequentially forming a first electrode, an organic functional layer including at least a light emitting layer, and a second electrode on a flexible film (long substrate).
- the process includes a vacuum film forming process performed using a vacuum film forming apparatus.
- the flexible film and at least one of a leader film and a side tape are put into the vacuum film forming apparatus.
- a method for producing an organic electroluminescence element wherein the organic electroluminescence element is dried before the film apparatus is charged, and the vacuum film forming process is performed at a moisture partial pressure of the vacuum film forming apparatus of 5 ⁇ 10 ⁇ 5 Pa or less.
- the driving voltage is low and the generation / growth of dark spots is suppressed.
- an organic electroluminescence device having improved light emission initial characteristics and lifetime can be produced.
- the vacuum film forming step can reduce the moisture content of the film to a certain level or less by setting the water partial pressure in the film forming chamber of the vacuum film forming apparatus to a specified value or less. Although it is effective in improving the initial light emission characteristics and the device lifetime, it takes time for the moisture partial pressure to reach the specified value even if a cryopump is used because the amount of moisture brought into the vacuum film forming apparatus is large.
- the present invention reduces the time for reducing the moisture partial pressure in the film forming chamber to a certain value.
- the original roll components such as the belt-like flexible support, the leader for passing the original roll, and the side tape for non-contact winding are put into the vacuum film formation process.
- the above problem was solved by drying it.
- the water content of a roll-shaped resin film or the like can be measured using a coulometric titration method of Karl Fischer method. Ten samples are taken at random and measured by the coulometric titration method of Karl Fischer method and averaged.
- the moisture of the film forming material (deposition source) supplied to the film forming chamber of the vacuum film forming apparatus is also dried in advance.
- the moisture partial pressure in the film forming chamber can be measured by, for example, ULVAC small partial pressure monitor MALIN (model MA-01). Incidentally, contamination such as moisture, nitrogen and oxygen can be seen.
- the present invention is an organic material comprising at least a step of sequentially forming a first electrode, at least one organic functional layer, and a second electrode on a belt-like flexible support, and a step of forming a sealing layer.
- the present invention relates to the supply of the original winding constituent material and the vacuum film forming material in the vacuum film forming process included in the method of manufacturing the electroluminescent element.
- an organic electroluminescence element hereinafter referred to as an organic EL element
- FIG. 1 is a schematic cross-sectional view showing an example of a layer structure of an organic EL element.
- FIG. 1A is a schematic cross-sectional view showing a constituent layer of an organic EL element on which a sealing film is formed.
- FIG. 1B is a schematic cross-sectional view showing a constituent layer of an organic EL element formed by attaching a sealing film via an adhesive.
- 1a represents an organic EL element.
- the organic EL element 1a includes a first electrode 102, a hole transport layer 103, a light emitting layer 104, an electron injection layer 105, a second electrode 106, and a sealing layer 107 in this order on a substrate 101.
- a first electrode 102 a hole transport layer 103
- a light emitting layer 104 a light emitting layer 104
- an electron injection layer 105 a second electrode 106
- a sealing layer 107 in this order on a substrate 101.
- 1b represents an organic EL element.
- the organic EL element 1b includes a first electrode 102, a hole transport layer 103, a light emitting layer 104, an electron injection layer 105, a second electrode 106, and an adhesive layer 108 as a sealing layer on a substrate 101. And the sealing film 109 in this order.
- a hole injection layer (not shown) may be provided between the first electrode 102 and the hole transport layer 103.
- an electron transport layer (not shown) may be provided between the light emitting layer 104 and the electron injection layer 105.
- a gas barrier film (not shown) may be provided between the first electrode 102 and the substrate 101.
- the present invention relates to a manufacturing method of the organic EL element 1a (1b) shown in FIGS. 1A and 1B and organic EL elements produced by these manufacturing methods.
- the layer structure of the organic EL element shown in this figure is an example, but the following structure can be given as a layer structure of another typical organic EL element.
- Base material / anode / light emitting layer / electron transport layer / cathode / sealing layer (2) Base material / anode / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode / sealing layer (3) substrate / anode / hole transport layer (hole injection layer) / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer (4) substrate / Anode / anode buffer layer (hole injection layer) / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer Each layer is described later.
- FIG. 2 is a schematic diagram showing an example of a process for producing an organic EL element.
- description of the manufacturing process shown by this figure is an example of an organic EL element.
- a gas barrier layer, a first electrode, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer It carries out about the case of the organic EL element in which each layer is formed in the order of sticking a 2nd electrode and a sealing film.
- the first electrode forming step is omitted.
- the manufacturing process 2a includes a supply unit 3 for supplying the original roll 3a1 of the belt-like flexible support, a hole transport layer forming process 4 for forming the hole transport layer, and a light emitting layer for forming the light emitting layer. It consists of a forming step 5 and an electron transport layer forming step 6 for forming an electron transport layer.
- the belt-like flexible support on which the electron transport layer has been formed is wound up by the take-up unit 7 and becomes the original roll 7a of the belt-like flexible support.
- the manufacturing process 2b includes a supply unit 8 for supplying the original roll 7a of the belt-like flexible support, an electron injection layer forming process 9 for forming the electron injection layer, and a second electrode for forming the second electrode.
- the strip-shaped flexible support on which the second electrode has been formed is wound up by the winding unit 11 and becomes the original winding roll 11 a of the strip-shaped flexible support.
- it consists of a supply unit 12 for supplying the original roll 11a of the belt-like flexible support, a sealing layer forming step 13 for forming a sealing layer, and a cutting step 14 for cutting into individual elements. Thereafter, individual elements are formed, wiring and electric circuits are mounted, and an organic electroluminescence panel is formed.
- the manufacturing apparatus shown in the figure is configured so that the atmospheric pressure is continuously reduced from the supply unit 3 to the hole transport layer forming step 4, the light emitting layer forming step 5, the electron transport layer forming step 6 and the winding unit 7 in the manufacturing process 2a.
- the supply unit 8 to the electron injection layer forming step 9, the second electrode forming step 10, and the winding unit 11 are subjected to a vacuum process, and the supply unit in the manufacturing step 2b.
- 12 shows a case where the sealing layer forming step 13 and the cutting step 14 are performed under an atmospheric pressure inert gas process or a vacuum process.
- the supply unit 3 includes a feeding unit 301 and a surface treatment unit 302.
- a strip-shaped flexible support hereinafter referred to as a strip-shaped flexible support A
- a gas barrier film and an anode layer including a first electrode are already formed in this order is wound around a winding core. Supplied in the taken roll state.
- 3a1 shows the former roll of the belt-like flexible support A.
- the surface treatment unit 302 includes a cleaning surface modification processing apparatus and antistatic means, but the antistatic means is omitted here.
- the cleaning surface modification apparatus performs cleaning modification on the surface of the first electrode (not shown) of the belt-like flexible support sent from the supplying step 3 before the application of the organic functional layer.
- a low pressure mercury lamp an excimer is used.
- a low-pressure mercury lamp having a wavelength of 184.2 nm is irradiated at an irradiation intensity of 5 to 20 mW / cm 2 and a distance of 5 to 15 mm.
- the antistatic means includes a non-contact type static elimination prevention device, a contact type static elimination prevention device, and the like, and is performed using, for example, a non-contact type ionizer, a static elimination roll, or a conductive brush connected to the ground.
- the non-contact type antistatic device is preferably used on the first electrode surface side of the belt-like flexible support A, and the contact-type antistatic device is preferably used on the back surface side of the belt-like flexible support A.
- the strip-shaped flexible support A is unwound from the roll and enters the hole transport layer forming step 4.
- the first wet coating is performed by coating the backup roll 4a and the hole transport layer forming coating liquid on the first electrode of the strip-like flexible support A held by the backup roll 4a.
- the first drying device 4c for removing the solvent of the hole transport layer formed on the first electrode of the belt-like flexible support A, and the first for heating the hole transport layer from which the solvent has been removed.
- a heat treatment device 4d for heating the hole transport layer from which the solvent has been removed.
- an antistatic means may be provided, but it is omitted in the figure.
- the coating liquid for forming a hole transport layer by the first wet coater 4b is applied on the first electrode except for a part of one end of the already formed first electrode, for example.
- the first wet coater 4b applies a light emitting layer on the first electrode in accordance with the pattern of the first electrode formed by patterning.
- a die coating method stripe & intermittent coater
- an inkjet method etc. It is possible to use various coating apparatuses used for a flexographic printing method, an offset printing method, a gravure printing method, a screen printing method, a spray coating method using a mask, and the like.
- the first drying device 4c is a drying processing device that removes the solvent by a heated airflow.
- the height is 100 mm from the ejection port of the slit nozzle type toward the film formation surface, the ejection air velocity is 1 m / s, and the width. Carry out with a hand distribution of 5% and a drying temperature of 100 ° C.
- the heat treatment device 4d heats the hole transport layer from the back surface side of the belt-like flexible support A by the back surface heat transfer method, for example, a back surface heat transfer type heat treatment device having a plurality of, for example, 200 ° C. heating rollers. After removing the solvent, the substrate is sucked and conveyed by sucking heat rolls with a temperature of 200 ° C. arranged closely, and heat treatment is performed by heating by backside heat transfer. By this heat treatment, smoothness of the film, removal of residual solvent, curing of the coating film, and the like are performed.
- the back surface heat transfer method for example, a back surface heat transfer type heat treatment device having a plurality of, for example, 200 ° C. heating rollers.
- the belt-like flexible support A enters the light emitting layer forming step 5 after the hole transport layer forming step 4.
- a second wet coater 5b for applying a light emitting layer forming coating solution on the hole transporting layer of the belt-like flexible support A having the hole transporting layer held by the backup roll 5a.
- a second drying device 5c for removing the solvent of the light emitting layer formed on the hole transport layer, and a second heat treatment device 5d for heating the light emitting layer from which the solvent has been removed.
- the same antistatic means as described above may be used, but is omitted.
- the second wet coater 5b is preferably of the same type as the first wet coater 4b.
- the second drying device 5c has the same structure as the first drying device 4c.
- the second heat treatment apparatus 5d has the same structure as that of the first heat treatment apparatus 4d, and heats the light emitting layer formed on the hole transport layer from the back surface side of the belt-like flexible support by the back surface heat transfer method. It is supposed to be.
- the belt-like flexible support is in the electron transport layer coating step 6 after the light emitting layer forming step 5.
- a third wet coater 6b for applying a coating liquid for forming an electron transport layer on the light emitting layer of the belt-like flexible support A held by the backup roll 6a, and on the light emitting layer It has the 3rd drying apparatus 6c which removes the solvent of the formed electron carrying layer, and the 3rd heat processing apparatus 6d which heats the electron carrying layer from which the solvent was removed.
- the same antistatic means as described above may be used, but is omitted.
- the hole transport layer forming step 4, the light emitting layer forming step 5, and the electron transport layer forming step 6 shown in this figure show the case where there is one wet coating device, a drying device, and a heat treatment device, respectively. It is possible to increase according to.
- strip-shaped flexible support 7b in which each layer of the organic functional layer is formed by the winding unit 7 is wound around a winding core with the organic functional layer side outside, and the strip-shaped flexible support (hereinafter, strip-shaped flexible support) is wound.
- the side tape 7c is wound around at least both ends other than the organic functional layer forming portion of the belt-like flexible support B, and wound in a non-contact manner so as to form a space in the intermediate organic functional layer forming portion. .
- non-contact winding it is possible to prevent the organic functional layer which is easily damaged by a thin film from being deteriorated in quality due to scratches or adhesion of foreign substances.
- the roll-shaped side tape 7c is supplied to the winding unit 7, and the roll-shaped flexible support 7a is wound by winding the belt-shaped flexible support 7b and the side tape 7c together.
- the winding-up part 7 is kept in nitrogen atmosphere whose water content is 100 ppm or less, Preferably it is 50 ppm or less.
- a step of wiping unnecessary portions of the formed organic functional layer with a solvent or the like that can dissolve each layer may be provided.
- the wiping step for example, there is a wiping device described in JP-T-2007-515756, etc., and using these, wiping is carried out according to the position of the alignment mark previously formed on the belt-like flexible support. .
- a continuous wiping method is preferred, and when carrying out wiping in the width direction by stopping conveyance, an accumulator mechanism or the like is provided at the front and back to continuously perform from application to winding of the organic functional layer. desirable.
- the wound roll 7a of the strip-like flexible support B is stored in a storage box under reduced pressure (10 ⁇ 6 to 10 ⁇ 2 Pa) or inert gas (for example, nitrogen) environment which is a low moisture environment. Also good.
- the storage period in the storage box is preferably 1 to 200 hours.
- a temperature may be applied to remove oxygen and trace moisture resulting from element deterioration.
- an electron injection layer and a second electrode are formed on the strip-shaped flexible support B once wound up by the manufacturing process 2b.
- Supplied section 8 has a feeding section.
- the strip-shaped flexible support B on which each organic functional layer is formed is supplied in a roll state wound around a winding core.
- 7a shows the roll-shaped strip
- the connecting portion of the supply portion 8, the electron injection layer forming step 9 and the second electrode forming step 10 is separated by the shutter G1, and the supply portion 8 is supplied so that the roll-shaped strip-like flexible support 7a can be supplied. Part 8 is returned to atmospheric pressure.
- the former roll of the leader film is placed in the belt-like flexible support supplying step 8, the leading end of the leader film is joined to the end of the belt-like flexible substrate B, and the belt-like flexible substrate winding is performed.
- the both ends of the leader film are cut and left in the process, or the leader film is wound around the end of the belt-like flexible support B of the original winding roll, that is, the winding core side in advance.
- There is a method of cutting the both ends of the film of the leader after taking it and leaving it in the process.
- a roll-shaped strip-like flexible support 7a wound together with the side tape 7c is set on the feeding portion of the supply unit 8, and the strip-like flexible support 7b and the side are arranged at the time of unwinding.
- the tape 7c is separated, the belt-like flexible support 7b is supplied to the electron injection layer forming step 9, and the side tape 7c is wound up.
- the electron injection layer forming step 9 and the second electrode forming step 10 for forming the second electrode are vacuum process steps.
- the electron injection layer forming step 9 and the second electrode forming step 10 are performed by vacuum deposition.
- a sputtering method, a reactive sputtering method, a molecular beam epitaxy method, a cluster ion beam method, an ion plating method, or the like can be used.
- the belt-like flexible support B is unwound from the roll and enters the electron injection layer forming step 9.
- the electron injection layer forming step 9 and the second electrode forming step 10 are the same vacuum process step, and two vapor deposition portions are continuously provided. If there is a difference in vapor deposition rate between the two vapor deposition sections, the two vapor deposition sections that become the electron injection layer forming step 9 and the second electrode forming step 10 in the same vacuum chamber through an accumulator mechanism so that it can be adjusted. May be provided.
- the electron injection layer forming step 9 the vapor deposition material boat of the second electrode formation part (vapor deposition apparatus) is heated to perform mask vapor deposition, and an electron injection layer is formed on the electron transport layer.
- 9a schematically shows an evaporation source container
- 9b schematically shows a support holder of the vapor deposition apparatus.
- the vapor deposition material boat of the second electrode forming portion (vapor deposition apparatus) is heated to perform mask vapor deposition, and the second electrode is formed on the electron injection layer.
- 10b denotes a support holder
- 10a denotes an evaporation source container.
- the belt-like flexible support B on which the electron injection layer is formed in the electron injection layer formation step 9 is configured to be sent to the second electrode formation step 10 via an accumulator mechanism.
- the strip-shaped flexible support 11b formed up to the second electrode by the winding unit 11 is wound around the winding core with the second electrode side outside, and a roll-shaped flexible support 11a (hereinafter, strip-shaped flexible support) Let flexible support C).
- the side tape 11c is wound around at least both ends other than the organic functional layer forming portion of the belt-like flexible support C, and wound in a non-contact manner so as to form a space in the intermediate organic functional layer forming portion. .
- non-contact winding it is possible to prevent the organic functional layer which is easily damaged by a thin film from being deteriorated in quality due to scratches or adhesion of foreign substances.
- the roll-shaped side tape 11c When using a side tape, the roll-shaped side tape 11c is supplied to the winding part 11, and it forms by winding together the strip
- the leader film, side tape, and other members used here are preferably dried in advance because the time until the degree of vacuum at which a film can be formed becomes long if a large amount of moisture is brought in, and the amount of water is preferably 300 ppm. Hereinafter, it is more desirably 50 ppm or less.
- the winding portion 11 When the roll-shaped strip-shaped flexible support 11a is wound up, the winding portion 11, the electron injection layer forming step 9 and the second electrode forming step 10 are separated by the shutter G2, and the roll-shaped strip-shaped flexible support 11a is separated.
- the winding portion 11 is returned to atmospheric pressure so that the support 11a can be taken out.
- a leader similar to the belt-like flexible support is attached to the end of the belt-like flexible support C, and when the leading end of the leader comes to the roll-like belt-like flexible support 11a, the leader The tip of is cut.
- a leader is disposed to guide the next strip-shaped flexible support.
- Supplied part 12 has a feeding part.
- the belt-like flexible support C formed up to the second electrode is supplied in a roll state wound around the winding core.
- the belt-like flexible support 11b is unwound from the roll 11a and enters the sealing layer forming step 13.
- the belt-like flexible support C wound together with the side tape is set in the feeding portion of the supplying step 12, and the belt-like flexible support 11b and the side tape 11c are separated at the time of unwinding. Then, the belt-like flexible support 11b is supplied to the sealing layer forming step 13, and the side tape 11c is wound up.
- the sealing layer forming step 13 is a sealing film sticking step.
- the sealing layer is unwound from the roll-like sealing film 13b1 and sealed with a sealing resin (adhesive).
- the stop film 13b is pressure-bonded to the belt-like flexible support 11b at the sticking portion constituted by the pressure-bonding roll 13b2, and is further cured and sealed by a curing processing portion (not shown in the drawing).
- the adhesive is applied on the sealing film 13b in this example, but may be applied on the second electrode of the strip-shaped flexible support 11b.
- a hardening process part consists of a heating part or an ultraviolet irradiation part, for example, and is arrange
- the organic electroluminescence element produced on the continuous flexible film in the cutting step 14 is cut into a product size.
- the alignment mark attached to the belt-like flexible support is detected, and the product is punched and cut into a product size according to the position of the alignment mark.
- the continuous flexible film after the organic EL element is punched is then wound into a roll by a winder.
- FIG. 1 An example of an element formed by punching and cutting is schematically shown in FIG.
- (a) is a view of the device when viewed from above
- (b) is a cross-sectional view taken along line O-O ′
- (c) is a cross-sectional view taken along line P-P ′.
- 101 is a base material which is a flexible support
- 102 is a first electrode
- 102a is a first electrode extraction electrode
- 103 to 105 are a hole transport layer, a light emitting layer, an electron transport layer and a hole injection layer
- 106 represents a second electrode
- 106a represents a second electrode extraction electrode
- 108 represents an adhesive layer
- 109 represents a sealing film.
- A indicates the width direction of the belt-like flexible support of the fabricated element
- B indicates the transport direction.
- An organic electroluminescence panel is formed by mounting an electric circuit on each element cut and punched into a product size.
- the sealing layer forming step 13 is preferably sealed by an atmospheric pressure process of an inert gas such as a rare gas or nitrogen gas in order to keep harmful components to a minimum.
- an inert gas such as a rare gas or nitrogen gas
- the cutting process is not necessarily performed in an inert gas atmosphere, but here, an example is shown in which processing is performed continuously with sealing in an inert gas atmosphere.
- sealing layer forming step 13 has been described as an inert gas atmospheric pressure process in the above, sealing may be performed in a vacuum process, for example.
- This flexible film cutting process is preferably performed in an air atmosphere.
- An organic electroluminescence panel is formed by mounting an electric circuit on each element cut and punched into a product size.
- a method of forming a sealing layer on the electrode layer instead of sticking the sealing film may be used.
- a sealing layer forming step for example, a sealing layer forming step such as a silicon oxide layer by a vacuum process such as sputtering, ion plating, or plasma CVD is added.
- a sealing layer forming step combined with a process pressure replacement step similar to the above is added.
- organic light emitting materials contained in the light emitting layer include aromatic heterocyclic compounds such as carbazole, carboline, diazacarbazole, triarylamine derivatives, stilbene derivatives, polyarylenes, aromatic condensed polycycles.
- aromatic heterocyclic compounds such as carbazole, carboline, diazacarbazole, triarylamine derivatives, stilbene derivatives, polyarylenes, aromatic condensed polycycles.
- a dopant may be contained in the light emitting material.
- the dopant include known fluorescent dyes such as perylene derivatives and pyrene derivatives, and in the case of phosphorescent light emitting layers, for example, tris (2-phenylpyridine) iridium, bis (2-phenylpyridine) (acetylacetonate).
- a complex compound such as an orthometalated iridium complex represented by iridium, bis (2,4-difluorophenylpyridine) (picolinato) iridium, and the like is also contained in an amount of about 0.1 to 20% by mass.
- the phosphorescent light emitting method is relatively less likely to cause light emission unevenness due to unevenness of the layer interface due to coating because it has a light emitting region inside the light emitting layer.
- the thickness of the light emitting layer ranges from 1 nm to several hundred nm.
- Examples of materials used in the hole injection / transport layer include phthalocyanine derivatives, heterocyclic azoles, aromatic tertiary amines, polyvinyl carbazole, polyethylene dioxythiophene / polystyrene sulfonic acid (PEDOT: PSS), and the like.
- Polymer materials such as conductive polymers are also used for the light emitting layer, for example, carbazole-based light emitting materials such as 4,4′-dicarbazolylbiphenyl, 1,3-dicarbazolylbenzene, ) Low molecular light emitting materials represented by pyrene light emitting materials such as azacarbazoles, 1,3,5-tripyrenylbenzene, polymer light emitting materials represented by polyphenylene vinylenes, polyfluorenes, polyvinyl carbazoles, etc. Etc.
- carbazole-based light emitting materials such as 4,4′-dicarbazolylbiphenyl, 1,3-dicarbazolylbenzene
- Low molecular light emitting materials represented by pyrene light emitting materials such as azacarbazoles, 1,3,5-tripyrenylbenzene, polymer light emitting materials represented by polyphenylene vinylenes, polyfluorenes, polyvinyl carbazoles, etc.
- Examples of the electron injection / transport layer material include metal complex compounds such as 8-hydroxyquinolinate lithium and bis (8-hydroxyquinolinate) zinc, and the following nitrogen-containing five-membered ring derivatives. That is, oxazole, thiazole, oxadiazole, thiadiazole or triazole derivatives are preferred.
- the film thickness of the organic EL element and each organic layer needs to be about 0.05 to 0.3 ⁇ m, preferably about 0.1 to 0.2 ⁇ m.
- a wet process such as coating and printing is preferable.
- a wet process such as coating and printing is preferable.
- die coat method, screen printing method, flexographic printing method, ink jet method, wire bar method, cap coating method, spray coating method, casting method, roll coating method, bar coating method, gravure coating method, etc. can be used. It is. The use of these wet coating machines can be appropriately selected according to the material of the organic compound layer.
- Each organic material has its own solubility characteristics (solubility parameters, ionization potential, polarity), and there are limitations on the solvents that can be dissolved. In this case, since the solubility is different from each other, the concentration cannot be generally determined.
- the type of the solvent used in the present invention is suitable for the above conditions depending on the organic EL material to be formed.
- halogenated hydrocarbon solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane, chlorobenzene, dichlorobenzene, chlorotoluene, dibutyl ether, tetrahydrofuran, Ether solvents such as dioxane and anisole, alcohol solvents such as methanol, ethanol, isopropanol, butanol, cyclohexanol, 2-methoxyethanol, ethylene glycol, glycerin, benzene, toluene, xylene, ethylben Aromatic hydrocarbon solvents such as hexane, paraffin solvents such as hexane, octane, decane, tetralin, ester solvents such as ethyl acetate, butyl a
- the solvent which can be used is not restricted to these, You may mix and use 2 or more types of these as a solvent.
- organic EL material preferable examples are different depending on each functional layer material.
- a good solvent for example, an aromatic solvent, a halogen solvent, an ether solvent, and the like are preferable.
- the poor solvent include alcohol solvents, ketone solvents, paraffin solvents, and the like. Among them, alcohol solvents and paraffin solvents are used.
- an organic compound having a reactive group may be used in each functional layer.
- an organic compound having a reactive group may be used in each functional layer.
- An organic material having a function having a reactive group in each functional layer may be used.
- the reactive organic compound coating layer After forming the reactive organic compound coating layer, it can be reacted on the substrate to form a network polymer of organic molecules and be cured.
- production of a network polymer can suppress element deterioration by Tg (glass transition point) adjustment of a structure layer.
- the lower layer does not dissolve in the upper layer coating solution. Therefore, the upper layer can be applied by resinating the lower layer and degrading solvent solubility. be able to.
- the hole transport layer is resinized as an organic layer thus crosslinked, dissolution and penetration of the lower layer can be prevented when the light emitting layer is applied as the upper layer.
- the reactive group that can be used is not particularly limited, but typically includes a vinyl group, an ethynyl group, an isocyanate group, an epoxy group, and the like.
- a conductive material used for the anode for injecting holes which is the first electrode, is preferably a material having a work function larger than 4 eV, and is silver, gold, platinum, palladium. And their alloys, metal oxides such as tin oxide, indium oxide and ITO, and organic conductive resins such as polythiophene and polypyrrole are used. It is preferable that it is translucent, and ITO is preferable as a transparent electrode. As a method for forming the ITO transparent electrode, mask vapor deposition or photolithography patterning can be used, but is not limited thereto.
- the conductive material used as the cathode as the second electrode those having a work function smaller than 4 eV are suitable, such as magnesium and aluminum.
- Typical examples of the alloy include magnesium / silver and lithium / aluminum.
- the formation method can be mask vapor deposition, photolithography patterning, plating, printing, or the like, but is not limited thereto.
- Transparent resin films include polyethylene, ethylene-vinyl acetate copolymer, ethylene-vinyl alcohol copolymer, polypropylene, polystyrene, polymethyl methacrylate, polyvinyl chloride, polyvinyl alcohol, polyvinyl butyral, nylon, polyether ether ketone.
- gas barrier film in which a gas barrier layer is formed on these supports.
- gas barrier layer include a thin film having a low moisture permeability made of a material having a low moisture permeability such as silicon oxide, silicon nitride, silicon oxynitride having a thickness of several nanometers to several hundred nanometers.
- the sealing film used in the present invention is preferably a gas barrier resin film having a low moisture permeability.
- a transparent film having a thickness of several nm to several hundreds nm is formed on the above-mentioned flexible support such as polyester such as polyethylene terephthalate, polycarbonate, polyethylene, ethylene-vinyl alcohol copolymer, and polypropylene.
- polyester such as polyethylene terephthalate, polycarbonate, polyethylene, ethylene-vinyl alcohol copolymer, and polypropylene.
- examples thereof include a film in which a thin film made of a material having low moisture permeability such as silicon oxide, silicon nitride, and silicon oxynitride is formed, and a film in which an alumina vapor deposition film or the like that is a gas barrier film is formed.
- a metal vapor-deposited film such as Toppan Printing, a GX film, a silica vapor-deposited film such as Tech Barrier (Mitsubishi Resin), or the above-mentioned film on which a gas barrier layer such as an alumina vapor-deposited film is formed can be used.
- a UV curable adhesive composition made of an acrylic resin, an epoxy resin, a fluorine resin, or the like can be used.
- a UV resin XNR5516 manufactured by Nagase Chemtech Co., Ltd. UV curable adhesive (resin) can be used.
- a heat bonding resin may be used.
- a polyethylene terephthalate film (PET film) having a width of 700 mm and a thickness of 100 ⁇ m was prepared, and a low-density layer made of silicon oxide having a total film thickness of about 90 nm on the prepared PET film by an atmospheric pressure plasma discharge treatment method.
- a transparent gas barrier film in which four layers of medium density layer, high density layer, and medium density layer were laminated was prepared.
- oxygen permeability by a method based on JIS K 7126-1987 it was 1.0 ⁇ 10 ⁇ 3 cm 3 / (m 2 ⁇ 24 hr ⁇ MPa) or less.
- an original winding was introduced into a roll-to-roll vacuum chamber, and an ITO film was formed to a thickness of 130 nm in an argon atmosphere to form a transparent conductive film.
- the surface resistivity of the ITO film was 40 ⁇ / ⁇ .
- a photolithographic resin that is polymerized with ultraviolet light is applied to a rectangular region with a width direction of 670 mm and a longitudinal direction of 720 mm, and after passing through a drying oven at 90 ° C., After aligning the position and exposing the pattern, it was developed, etched, and subjected to alkali treatment while being transported, washed with ion-exchanged water, sprayed with clean air, sufficiently dried, and then wound up.
- an organic functional layer was applied to a roll-shaped PET film obtained by winding the PET film on which the electrode pattern was produced as follows.
- a hole transport layer was formed in the hole transport layer forming step 4.
- Polyethylene dioxythiophene / polystyrene sulfonate (PEDOT / PSS, Baytron P AI4083 manufactured by Bayer) diluted with 65% pure water and 5% methanol for the hole transport layer forming coating solution for forming the hole transport layer Prepared as a coating solution.
- the surface tension of the coating solution for forming the hole transport layer was 40 mN / m (manufactured by Kyowa Interface Chemical Co., Ltd .: surface tension meter CBVP-A3).
- the roll-shaped PET film on which the prepared first electrode is formed is subjected to a charge removal treatment, and then the hole transport layer forming coating solution is applied to the PET film at a temperature of 25 ° C. using a die coat type coating machine.
- the wet coating method was applied so that the thickness after drying was 30 nm.
- a drying device and a heat treatment device are used.
- the height from the slit nozzle type discharge port to the film formation surface is 100 mm
- the discharge air speed is 1 m / s
- the wide air speed distribution is 5%
- the temperature is 120 ° C.
- heat treatment by a back surface heat transfer method was performed at a temperature of 150 ° C. by a heat treatment apparatus to form a hole transport layer.
- the conveyance speed was 3 m / min.
- a light emitting layer was formed.
- a light emitting layer forming coating solution 1% by mass of host dicarbazole derivative (CBP) and 0.05% by mass of dopant iridium complex (Ir (ppy) 3 ) with respect to toluene as solvent What was dissolved was prepared as a coating solution.
- the surface tension of the coating solution for forming the light emitting layer was 28 mN / m at 25 ° C. (manufactured by Kyowa Interface Chemical Co., Ltd .: using surface tension meter CBVP-A3).
- the light emitting layer forming coating solution is formed on the PET film at a temperature of 25 ° C., similar to the hole transport layer forming step. It apply
- a heat treatment of the backside heat transfer method was subsequently performed at a temperature of 150 ° C. by a heat treatment apparatus to form a light emitting layer.
- a coating solution for forming an electron transport layer 2- (4-biphenylyl) -5- (pt-butylphenyl) -1,3,4-oxadiazole (t-Bu--) with respect to ethyl lactate as a solvent. What dissolved PBD) at 1 mass% was prepared as a coating liquid.
- the surface tension of the coating solution for forming an electron transport layer was 29 mN / m at 25 ° C. (manufactured by Kyowa Interface Chemical Co., Ltd .: using a surface tension meter CBVP-A3).
- the electron transport layer forming coating solution is formed on the PET film at a temperature of 25 ° C. in the same die coating method as in the hole transport layer forming step. It applied so that a dry film thickness might be set to 30 nm by the wet application method using the applicator of No.1.
- drying equipment and heat treatment equipment used for drying and heat treatment of the hole transport layer coating film, and the drying equipment discharges 100mm from the slit nozzle type discharge port to the film formation surface.
- a back heat transfer type heat treatment was subsequently performed at a temperature of 150 ° C. by a heat treatment apparatus to form an electron transport layer.
- the unnecessary portion of the formed organic functional layer is wiped off using a wiping apparatus described in, for example, JP-T-2007-515756 using a solvent (for example, acetone) that can dissolve each layer.
- a solvent for example, acetone
- the PET film in which each layer of the organic functional layer was patterned in the winding part 7 was wound around a winding core with the electron transport layer side inside, and wound as a roll film.
- a side tape having a thickness of 500 ⁇ m was wound around both ends of the belt-like flexible support other than the organic functional layer forming portion, and wound in a non-contact manner so as to form a space in the intermediate organic functional layer forming portion.
- the supply unit 8 joins the roll tip of the PET film formed up to the electron transport layer to the end of the leader arranged in the process, and unwinds the electron injection layer. Then, the second electrode and the like were laminated and wound up as a roll-shaped film once around the winding core with the second electrode side inside. At this time, the original winding of the side tape is supplied to the winding unit 11, and a side tape having a thickness of 500 ⁇ m is wound around both ends of the belt-like flexible support other than the organic functional layer forming unit, and the intermediate organic functional layer forming unit is inserted. It wound up non-contactingly so that a space might be formed.
- the roll of PET film formed from the supply unit 8 to the electron transport layer was unwound, and the electron injection layer was formed by mask vapor deposition.
- layer formation was performed by changing the moisture partial pressure in the film forming chamber as shown in Table 1.
- the moisture partial pressure was measured using a ULVAC small partial pressure monitor MALIN (model MA-01).
- the moisture partial pressure change in the film formation chamber was changed by drying the PET film, leader, and side tape formed up to the electron transport layer to be input into the film formation chamber in advance before entering the film formation chamber. .
- lithium fluoride (0.5 nm) is mask-deposited in the electron injection layer forming step 9, and aluminum is further mask-deposited in a second vacuum film forming chamber constituting the second electrode forming step 10 in the subsequent stage.
- the PET film in which the second electrode was patterned in the winding part 11 was wound around a winding core with the second electrode side facing outside, and was wound up as a roll film.
- a leader made of a PET film was joined to the end of the PET film, and the leader was placed in the process by cutting the leading end of the leader after winding.
- a gas barrier layer (90 nm silicon oxide layer) coated with 40 ⁇ m of a sealing resin (adhesive) is formed in the laminating chamber constituting the roll-out of the PET film from the supply unit 12 and the sealing layer forming step.
- Lamination was performed by thermocompression bonding using a used PET film (PET thickness of 80 microns) under a pressure of 0.1 MPa in a nitrogen stream at atmospheric pressure, followed by main curing.
- unwinding of the roll of PET film from the supply unit 12 and winding after lamination are linked to this, and the alignment mark attached to the PET is detected by using the punching device 14a in the cutting process. Cut and punched according to the position.
- the organic EL element schematically shown in FIG. 3 is obtained.
- FIG. 1 An example of a punched device is shown schematically in FIG.
- 101 is a substrate made of PET film
- 102 is a first electrode made of ITO
- 102a is a first electrode extraction electrode
- 103 to 105 are a hole transport layer, a light emitting layer, an electron transport layer
- An organic layer made of a hole injection layer
- 106 a a take-out electrode for the second electrode
- 108 an adhesive layer 109 a sealing film (PET film on which a gas barrier layer has been formed) is there.
- PET film on which a gas barrier layer has been formed is there.
- the organic EL element sealed on the long PET film was formed by roll-to-roll, and the effectiveness of the present invention was confirmed.
- an organic EL element is obtained by mounting a power supply circuit.
- the average value of the light-emitting elements was used as the drive voltage for each element, and the ratio of the element 4 to the drive voltage was determined and evaluated using the following indices. ⁇ or more is preferable, and ⁇ or more is more preferable.
- A No dark spots are generated.
- O One or more dark spots and less than five.
- ⁇ Five or more dark spots and less than ten.
- X Ten or more dark spots.
- Example 2 In the manufacturing apparatus 2b used in Example 1, the roll 7a of the strip-shaped flexible support B wound around the supply unit 8 together with the side tape 7c having different moisture content and the side having different moisture content on the winding unit 11 are used.
- the tape 11c was supplied, the time change until the water partial pressure reached 5 ⁇ 10 ⁇ 5 Pa was measured in the electron injection layer forming step 9 and the second electrode forming step 10, and the results are shown in Table 2.
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Abstract
Description
本発明は、有機エレクトロルミネッセンス素子の製造方法に関し、更に詳しくは、発光初期特性および素子寿命が改善された有機エレクトロルミネッセンス素子の製造方法に関する。 The present invention relates to a method for producing an organic electroluminescence element, and more particularly, to a method for producing an organic electroluminescence element having improved light emission initial characteristics and element lifetime.
近年、フラットディスプレイなどの表示装置や、電子写真複写機、プリンターなどの光源に有機エレクトロルミネッセンス素子(有機EL素子ともいう)の使用が検討されている。この有機EL素子はガラス基材等の透明基材上にITO(Indium tin oxide)等の透明導電膜からなる第1電極(陽極)が設けられ、その上に少なくとも発光層を含む有機機能層、及びアルミニウム等からなる第2電極(陰極)がこの順に設けられることにより構成されたものであり、有機EL素子の周辺部には第1電極(陽極)及び第2電極(陰極)を外部回路又は内部駆動回路に接続するための第1電極(陽極)側取り出し電極及び第2電極(陰極)側取り出し電極が形成されている。 In recent years, the use of organic electroluminescence elements (also referred to as organic EL elements) for display devices such as flat displays, light sources for electrophotographic copying machines, printers, and the like has been studied. In this organic EL element, a first electrode (anode) made of a transparent conductive film such as ITO (Indium tin oxide) is provided on a transparent base material such as a glass base material, and an organic functional layer including at least a light-emitting layer thereon, And a second electrode (cathode) made of aluminum or the like is provided in this order, and the first electrode (anode) and the second electrode (cathode) are connected to an external circuit or the peripheral portion of the organic EL element. A first electrode (anode) side extraction electrode and a second electrode (cathode) side extraction electrode for connection to the internal drive circuit are formed.
有機EL素子に電圧が印加されてその第2電極(陰極)から電子が、第1電極(陽極)から正孔がそれぞれ有機機能層に注入され、この有機機能層中で電子-正孔の再結合が起こることにより発光が生じることが知られている。 When a voltage is applied to the organic EL element, electrons are injected from the second electrode (cathode) and holes are injected from the first electrode (anode) into the organic functional layer, respectively. It is known that light emission occurs when binding occurs.
有機EL素子は蛍光性又はリン光性の発光層を含む有機化合物の非常に薄い薄膜(有機機能層)を第1電極(陽極)と第2電極(陰極)ではさみ電流を流すことで発光する電流駆動型発光素子であり、通常、有機化合物は絶縁体であるが有機層の膜厚を非常に薄くすることにより電流注入が可能となり有機EL素子として駆動することが可能となる。そして10V以下の低電圧で駆動することが可能であり、これにより高効率な発光を得ることも可能なため将来のディスプレイや照明用途として注目を浴びている。また、近年では、生産性の観点等から、有機EL素子は枚葉の基板以外に可撓性基材(ウェブ)を用いて作製されている。 An organic EL element emits light when a very thin thin film (organic functional layer) of an organic compound including a fluorescent or phosphorescent light emitting layer is sandwiched between a first electrode (anode) and a second electrode (cathode) and a current is passed. Although it is a current drive type light emitting element and an organic compound is usually an insulator, current can be injected and driven as an organic EL element by making the organic layer very thin. It can be driven at a low voltage of 10 V or less, and it is possible to obtain high-efficiency light emission. In recent years, from the viewpoint of productivity and the like, the organic EL element is manufactured using a flexible base material (web) in addition to a single-wafer substrate.
このような有機EL素子を作成する際に使用する有機化合物の非常に薄い薄膜の形成方法として、真空成膜法のようなドライプロセス法と塗布法等のウェットプロセス法が知られている。 As a method for forming a very thin thin film of an organic compound used for producing such an organic EL element, a dry process method such as a vacuum film forming method and a wet process method such as a coating method are known.
ドライプロセス法としては、真空や加熱などによりウェブから水分が出てくると、成膜時にスパッタリングにより形成させる金属酸化物薄膜の組成が変化するという問題点がある。そこで、ウェブから出てくる水分の影響を少なくするために、ロールコーター式連続スパッタリング装置において、ロール室と成膜室を遮蔽板で仕切ったり、ロール室で(ウェブを)予備加熱(水分を除去)を行ったりすることが(例えば、特許文献1参照)従来行われてきた。しかしながら、ロール室から成膜室へは冷却ロールに接触させながらウェブを通過させる必要があるため、ロール室と成膜室の間を完全に仕切ることはできない。そのため、ロール室で発生した水分が成膜室に混入し、スパッタリングにより形成させた金属酸化物薄膜の組成が変化するという問題点を完全に解消することはできなかった。 The dry process method has a problem that the composition of the metal oxide thin film formed by sputtering during film formation changes when moisture comes out of the web by vacuum or heating. Therefore, in order to reduce the influence of moisture coming out of the web, in the roll coater type continuous sputtering system, the roll chamber and the film forming chamber are separated by a shielding plate, or preheating (removing moisture) in the roll chamber (web). (See, for example, Patent Document 1). However, since it is necessary to pass the web from the roll chamber to the film forming chamber while making contact with the cooling roll, the roll chamber and the film forming chamber cannot be completely separated. Therefore, the problem that moisture generated in the roll chamber is mixed into the film forming chamber and the composition of the metal oxide thin film formed by sputtering cannot be completely solved.
このように、基材の水分が成膜室の水分分圧を上げ、スパッタされた金属酸化膜の組成に影響することは知られており、真空成膜工程には市販されている汎用真空装置を用いればよいが、10-4Pa以下の真空度を確保できるものが好ましい。また、真空装置内の残留ガス、特に水分量を十分に低減するためクライオポンプを備えていることが好ましく、その場合、装置内水分分圧を10-5Pa程度以下にすることはできる。しかし基材等から持ち込まれ装置内に多くの水分が存在すると発光層、電子注入層の界面に吸着するだけでなく、蒸着膜にも悪影響を及ぼすので十分な水分分圧管理が不可欠である。 As described above, it is known that the moisture of the substrate increases the moisture partial pressure of the film forming chamber and affects the composition of the sputtered metal oxide film. However, it is preferable to use a material that can ensure a vacuum of 10 −4 Pa or less. In addition, a cryopump is preferably provided in order to sufficiently reduce the residual gas in the vacuum device, particularly the amount of moisture, and in that case, the moisture partial pressure in the device can be reduced to about 10 −5 Pa or less. However, if a large amount of moisture is brought into the apparatus from a substrate or the like, it not only adsorbs to the interface between the light emitting layer and the electron injection layer, but also adversely affects the deposited film, so that sufficient moisture partial pressure management is essential.
前記10-5Pa程度以下に水分分圧を管理することで、素子の駆動電圧を低くしたり、ダークスポットの発生・成長を抑制したり、発光初期特性および素子寿命改善に効果がある。真空成膜装置内の成膜室の環境を低水分に保つ、例えば水分分圧を10-5Pa以下にすることで、有機EL素子の発光初期特性および素子寿命改善に効果があることは知られて(例えば、特許文献2参照)いる。その方法として、水分量を十分に低減するためクライオポンプを用いる以外の方法の示唆はない。しかしながら、基材である可撓性支持体以外にも、リーダーフィルム等、他の工程部材も用いるロールツウロールの製造工程においては、クライオポンプを用いた場合、水分分圧が規定値になるのに時間がかかることが問題である。 By controlling the water partial pressure to about 10 −5 Pa or less, the device driving voltage can be lowered, the occurrence / growth of dark spots can be suppressed, and the initial light emission characteristics and device lifetime can be improved. It is known that maintaining the environment of the film forming chamber in the vacuum film forming apparatus at low moisture, for example, by reducing the water partial pressure to 10 −5 Pa or less, is effective in improving the initial light emission characteristics and device life of the organic EL device. (See, for example, Patent Document 2). As the method, there is no suggestion of a method other than using a cryopump in order to sufficiently reduce the water content. However, in a roll-to-roll manufacturing process that uses other process members such as a leader film in addition to the flexible support as a base material, the moisture partial pressure becomes a specified value when a cryopump is used. The problem is that it takes time.
本発明の目的は、可撓性フィルム(長尺基材)を用いて行われ、真空成膜工程を含む有機エレクトロルミネッセンス素子の製造において、駆動電圧が低く、ダークスポットの発生・成長が抑制され、発光初期特性および寿命が改善された有機エレクトロルミネッセンス素子の製造方法を提供することにある。 The object of the present invention is performed using a flexible film (long substrate), and in the production of an organic electroluminescence device including a vacuum film formation step, the driving voltage is low and the generation / growth of dark spots is suppressed. Another object of the present invention is to provide a method for producing an organic electroluminescence device having improved initial light emission characteristics and lifetime.
本発明の上記目的は、以下の構成により達成することができる。 The above object of the present invention can be achieved by the following configuration.
1.少なくとも、可撓性フィルム(長尺基材)上に、第一電極、少なくとも発光層を含む有機機能層、及び第二電極を順次形成する工程から構成され、リーダーフィルム及びサイドテープの少なくとも一つを用いる有機エレクトロルミネッセンス素子の製造方法において、
前記工程が、真空成膜装置を用いて行う真空成膜工程を含み、前記真空成膜装置に投入される、前記可撓性フィルムと、リーダーフィルム及びサイドテープの少なくとも一つとを、該真空成膜装置投入前に乾燥し、前記真空成膜装置の水分分圧が5×10-5Pa以下で真空成膜工程を行うことを特徴とする有機エレクトロルミネッセンス素子の製造方法。
1. At least one of a leader film and a side tape, comprising at least a step of sequentially forming a first electrode, an organic functional layer including at least a light emitting layer, and a second electrode on a flexible film (long substrate). In the manufacturing method of the organic electroluminescence element using
The process includes a vacuum film forming process performed using a vacuum film forming apparatus. The flexible film and at least one of a leader film and a side tape are put into the vacuum film forming apparatus. A method for producing an organic electroluminescence element, wherein the organic electroluminescence element is dried before the film apparatus is charged, and the vacuum film forming process is performed at a moisture partial pressure of the vacuum film forming apparatus of 5 × 10 −5 Pa or less.
2.前記可撓性フィルムと、リーダーフィルム及びサイドテープの少なくとも一つとが、該真空成膜装置に供給する前に水分量300ppm以下まで乾燥されることを特徴とする前記1記載の有機エレクトロルミネッセンス素子の製造方法。 2. 2. The organic electroluminescence device according to 1 above, wherein the flexible film and at least one of the leader film and the side tape are dried to a water content of 300 ppm or less before being supplied to the vacuum film forming apparatus. Production method.
3.前記可撓性フィルムと、リーダーフィルム及びサイドテープの少なくとも一つとが、該真空成膜装置に供給する前に水分量100ppm以下まで乾燥されることを特徴とする前記1記載の有機エレクトロルミネッセンス素子の製造方法。 3. 2. The organic electroluminescent element according to 1 above, wherein the flexible film and at least one of the leader film and the side tape are dried to a water content of 100 ppm or less before being supplied to the vacuum film forming apparatus. Production method.
本発明により、可撓性フィルム(長尺基材)を用いロールツウロールで行われ真空成膜工程を含む有機エレクトロルミネッセンス素子の製造において、駆動電圧が低く、ダークスポットの発生・成長が抑制され、発光初期特性および寿命が改善された有機エレクトロルミネッセンス素子を製造することができる。 According to the present invention, in the production of an organic electroluminescent device using a flexible film (long base material) by roll-to-roll and including a vacuum film forming step, the driving voltage is low and the generation / growth of dark spots is suppressed. Thus, an organic electroluminescence device having improved light emission initial characteristics and lifetime can be produced.
有機エレクトロルミネッセンスの製造方法の工程において、真空成膜工程は、真空成膜装置の成膜室の水分分圧を規定値以下にすることで、膜の含水率を一定以下にすることが可能になり発光初期特性および素子寿命改善に効果があるが、真空成膜装置への持込水分量が多いため、クライオポンプを用いても水分分圧が規定値になるのに時間がかかる。 In the process of the organic electroluminescence manufacturing method, the vacuum film forming step can reduce the moisture content of the film to a certain level or less by setting the water partial pressure in the film forming chamber of the vacuum film forming apparatus to a specified value or less. Although it is effective in improving the initial light emission characteristics and the device lifetime, it takes time for the moisture partial pressure to reach the specified value even if a cryopump is used because the amount of moisture brought into the vacuum film forming apparatus is large.
クライオポンプを用いて、何も入れない状態では、通常水分分圧が規定値になるのに4~5時間掛かるが、未乾燥元巻や工程部材を投入した場合には、規定値になるのに数日掛かるのが現状である。これは、真空成膜装置に投入される、有機EL素子(中間体も含む)が形成された帯状可撓性支持体、元巻を通紙するためのリーダーや非接触巻取りのためのサイドテープ等の元巻構成材料や真空成膜材料(蒸着源)の水分の影響が非常に大きい。 In the state where nothing is put in using a cryopump, it usually takes 4 to 5 hours for the partial pressure of water to reach the specified value. It currently takes several days to complete. This is a strip-shaped flexible support with organic EL elements (including intermediates) formed in a vacuum film forming apparatus, a leader for passing the original roll, and a side for non-contact winding. The influence of moisture of the original winding constituent material such as tape and the vacuum film forming material (deposition source) is very large.
本発明は、真空成膜装置による真空成膜工程を含むロールツウロールで行われる有機エレクトロルミネッセンス素子の製造において、成膜室の水分分圧を一定値まで下げるための時間を短縮するために、真空成膜工程に投入する、前記帯状可撓性支持体、元巻を通紙するためのリーダーや非接触巻取りのためのサイドテープ等の元巻構成材料について、真空成膜装置に投入前に乾燥することで、上記問題を解決した。特に、成膜室の水分分圧を一定値まで下げるための時間を短縮するために、供給される部材の水分量を300ppm以下に事前に乾燥することが好ましい。好ましくは、100ppm以下に乾燥することであり、部材の変質を避けることができる。 In the production of an organic electroluminescence element performed by a roll-to-roll including a vacuum film forming process by a vacuum film forming apparatus, the present invention reduces the time for reducing the moisture partial pressure in the film forming chamber to a certain value. Prior to the vacuum film deposition system, the original roll components such as the belt-like flexible support, the leader for passing the original roll, and the side tape for non-contact winding are put into the vacuum film formation process. The above problem was solved by drying it. In particular, in order to shorten the time for lowering the moisture partial pressure in the film formation chamber to a certain value, it is preferable to dry the moisture content of the supplied member in advance to 300 ppm or less. Preferably, it is drying to 100 ppm or less, and alteration of a member can be avoided.
尚、本発明において、ロール状の樹脂フィルム等の含水率はカール・フィッシャー法の電量滴定法を用いて測定することができる。サンプルをランダムに10サンプル採り、カール・フィッシャー法の電量滴定法で測定し平均をとる。 In the present invention, the water content of a roll-shaped resin film or the like can be measured using a coulometric titration method of Karl Fischer method. Ten samples are taken at random and measured by the coulometric titration method of Karl Fischer method and averaged.
又、本発明は真空成膜装置の成膜室に供給する成膜材料(蒸着源)の水分も事前に乾燥することが望ましい。 Further, in the present invention, it is preferable that the moisture of the film forming material (deposition source) supplied to the film forming chamber of the vacuum film forming apparatus is also dried in advance.
なお、成膜室の水分分圧の測定は、例えば、アルバック社小型分圧モニタMALIN(型式MA-01)により測定することができる。因みに水分、窒素、酸素等のコンタミネーションが見地可能である。 The moisture partial pressure in the film forming chamber can be measured by, for example, ULVAC small partial pressure monitor MALIN (model MA-01). Incidentally, contamination such as moisture, nitrogen and oxygen can be seen.
以下、本発明を実施するための最良の形態について詳細に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the best mode for carrying out the present invention will be described in detail, but the present invention is not limited thereto.
本発明は、少なくとも、帯状可撓性支持体上に、第一電極、少なくとも一層の有機機能層、及び第二電極を順次形成する工程、および、封止層を形成する工程から構成される有機エレクトロルミネッセンス素子の製造方法に含まれる真空成膜工程における、元巻構成材料や真空成膜材料の供給に関する。 The present invention is an organic material comprising at least a step of sequentially forming a first electrode, at least one organic functional layer, and a second electrode on a belt-like flexible support, and a step of forming a sealing layer. The present invention relates to the supply of the original winding constituent material and the vacuum film forming material in the vacuum film forming process included in the method of manufacturing the electroluminescent element.
以下、図を用いて本発明に係る有機エレクトロルミネッセンス素子(以下有機EL素子という)の製造方法について説明する。 Hereinafter, a method for producing an organic electroluminescence element (hereinafter referred to as an organic EL element) according to the present invention will be described with reference to the drawings.
図1は、有機EL素子の層構成の一例を示す概略断面図である。図1の(a)は封止膜が形成された有機EL素子の構成層を示す概略断面図である。図1の(b)は接着剤を介して封止フィルムを貼着することで形成された有機EL素子の構成層を示す概略断面図である。 FIG. 1 is a schematic cross-sectional view showing an example of a layer structure of an organic EL element. FIG. 1A is a schematic cross-sectional view showing a constituent layer of an organic EL element on which a sealing film is formed. FIG. 1B is a schematic cross-sectional view showing a constituent layer of an organic EL element formed by attaching a sealing film via an adhesive.
図1の(a)に示される有機EL素子の層構成につき説明する。 The layer structure of the organic EL element shown in FIG.
図中、1aは有機EL素子を示す。有機EL素子1aは、基材101上に、第一電極102と、正孔輸送層103と、発光層104と、電子注入層105と、第二電極106と、封止層107とをこの順番に有している。
In the figure, 1a represents an organic EL element. The
図1の(b)に示される有機EL素子の層構成に付き説明する。 The layer structure of the organic EL element shown in FIG.
図中、1bは有機EL素子を示す。有機EL素子1bは、基材101上に、第一電極102と、正孔輸送層103と、発光層104と、電子注入層105と、第二電極106、さらに封止層として接着剤層108と、封止フィルム109とをこの順番に有している。本図に示される有機EL素子において、第一電極102と正孔輸送層103の間に正孔注入層(不図示)を設けてもよい。又、発光層104と電子注入層105との間に電子輸送層(不図示)を設けてもよい。本図に示される有機EL素子1aおよび有機EL素子1bでは、第一電極102と基材101との間にガスバリア膜(不図示)を設けてもかまわない。
In the figure, 1b represents an organic EL element. The
本発明は、図1の(a)、図1の(b)に示される有機EL素子1a(1b)の製造方法およびこれらの製造方法により作製された有機EL素子に関するものである。
The present invention relates to a manufacturing method of the
本図に示す有機EL素子の層構成は一例を示したものであるが、他の代表的な有機EL素子の層構成としては次の構成が挙げられる。 The layer structure of the organic EL element shown in this figure is an example, but the following structure can be given as a layer structure of another typical organic EL element.
(1)基材/陽極/発光層/電子輸送層/陰極/封止層
(2)基材/陽極/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極/封止層
(3)基材/陽極/正孔輸送層(正孔注入層)/発光層/正孔阻止層/電子輸送層/陰極バッファー層(電子注入層)/陰極/封止層
(4)基材/陽極/陽極バッファー層(正孔注入層)/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極バッファー層(電子注入層)/陰極/封止層
有機EL素子を構成している各層については後に説明する。
(1) Base material / anode / light emitting layer / electron transport layer / cathode / sealing layer (2) Base material / anode / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode / sealing layer (3) substrate / anode / hole transport layer (hole injection layer) / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer (4) substrate / Anode / anode buffer layer (hole injection layer) / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer Each layer is described later.
図2は、有機EL素子を作製する工程の一例を示す模式図である。なお、本図で示す製造工程の説明は、有機EL素子の一例として、帯状可撓性支持体上にガスバリア層、第一電極、正孔輸送層、発光層、電子輸送層、電子注入層、第二電極、封止フィルムを貼着の順番に各層が形成されている有機EL素子の場合について行う。本図では、第一電極形成工程は省略してある。 FIG. 2 is a schematic diagram showing an example of a process for producing an organic EL element. In addition, description of the manufacturing process shown by this figure is an example of an organic EL element. A gas barrier layer, a first electrode, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, It carries out about the case of the organic EL element in which each layer is formed in the order of sticking a 2nd electrode and a sealing film. In this figure, the first electrode forming step is omitted.
図中、製造工程2aは、帯状可撓性支持体の元巻きロール3a1を供給する供給部3と、正孔輸送層を形成する正孔輸送層形成工程4と、発光層を形成する発光層形成工程5と、電子輸送層を形成する電子輸送層形成工程6からなっている。
In the figure, the
この例では電子輸送層形成後、一旦、電子輸送層が形成された帯状可撓性支持体は巻き取り部7において巻き取られ、帯状可撓性支持体の元巻きロール7aとなる。
In this example, after the electron transport layer is formed, the belt-like flexible support on which the electron transport layer has been formed is wound up by the take-up
図中、製造工程2bは、帯状可撓性支持体の元巻きロール7aを供給する供給部8と、電子注入層を形成する電子注入層形成工程9と、第二電極を形成する第二電極形成工程10で第二電極形成後、一旦、第二電極が形成された帯状可撓性支持体は巻き取り部11において巻き取られ、帯状可撓性支持体の元巻きロール11aとなる。更に、帯状可撓性支持体の元巻きロール11aを供給する供給部12と、封止層を形成する封止層形成工程13と、個別の素子に断裁される断裁工程14からなっている。その後、個別の素子が形成され、配線や電気回路が実装され有機エレクトロルミネッセンスパネルが形成される。
In the figure, the
本図で示される製造装置は、製造工程2aにおいて供給部3から正孔輸送層形成工程4、発光層形成工程5、電子輸送層形成工程6さらに巻き取り部7迄を連続して大気圧不活性ガスプロセスで行い、一旦巻き取った後、製造工程2bにおいて供給部8から電子注入層形成工程9、第二電極形成工程10、巻き取り部11迄を真空プロセス下、製造工程2bにおいて供給部12、封止層形成工程13、断裁工程14を大気圧不活性ガスプロセス又は真空プロセス下で行う場合を示している。
The manufacturing apparatus shown in the figure is configured so that the atmospheric pressure is continuously reduced from the supply unit 3 to the hole transport layer forming step 4, the light emitting layer forming step 5, the electron transport
供給部3では、繰り出し部301と表面処理部302とを有している。繰り出し部301では、例えば、ガスバリア膜と第一電極を含む陽極層とがこの順番で既に形成された帯状可撓性支持体(以下、帯状可撓性支持体Aとする)が巻き芯に巻き取られたロール状態で供給される。3a1は帯状可撓性支持体Aの元巻きロールを示す。
The supply unit 3 includes a
表面処理部302は洗浄表面改質処理装置や、帯電防止手段を有しているがここでは帯電防止手段は省略されている。洗浄表面改質処理装置は、有機機能層塗布前に供給工程3から送られる帯状可撓性支持体の第一電極(不図示)表面の洗浄改質を行うため、例えば、低圧水銀ランプ、エキシマランプ、プラズマ洗浄装置等を使用し、例えば、低圧水銀ランプの場合、波長184.2nmの低圧水銀ランプを、照射強度5~20mW/cm2で、距離5~15mmで照射する。
The
また、帯電防止手段は、非接触式除電防止装置、接触式除電防止装置等からなり、例えば、非接触式のイオナイザーや、除電ロールまたはアース接続した導電性ブラシ等を用いて行われる。非接触式帯電防止装置は帯状可撓性支持体Aの第一電極面側に使用し、接触式帯電防止装置は帯状可撓性支持体Aの裏面側に使用することが好ましい。 The antistatic means includes a non-contact type static elimination prevention device, a contact type static elimination prevention device, and the like, and is performed using, for example, a non-contact type ionizer, a static elimination roll, or a conductive brush connected to the ground. The non-contact type antistatic device is preferably used on the first electrode surface side of the belt-like flexible support A, and the contact-type antistatic device is preferably used on the back surface side of the belt-like flexible support A.
図ではこれら細部は省略されているが、帯状可撓性支持体Aはロールから巻き出されて、正孔輸送層形成工程4に入る。 Although these details are omitted in the figure, the strip-shaped flexible support A is unwound from the roll and enters the hole transport layer forming step 4.
正孔輸送層形成工程4においては、バックアップロール4aと、バックアップロール4aに保持された帯状可撓性支持体Aの第一電極上に正孔輸送層形成用塗布液を塗布する第一湿式塗布機4bと、帯状可撓性支持体Aの第一電極上に形成された正孔輸送層の溶媒を除去する第一乾燥装置4cと、溶媒が除去された正孔輸送層を加熱する第一加熱処理装置4dとを有している。ここで帯電防止手段を設けてもよいが図では省略されている。
In the hole transport layer forming step 4, the first wet coating is performed by coating the
第一湿式塗布機4bによる正孔輸送層形成用塗布液は、例えば、既に形成されている第一電極の片方の端部の一部を除いて第一電極上に塗布される。
The coating liquid for forming a hole transport layer by the first
第一湿式塗布機4bは、パターン化されて形成されている第一電極のパターンに合わせて第一電極上に発光層をパターン塗布するため、例えば、ダイコート方式(ストライプ&間欠コーター)、インクジェット方式、フレキソ印刷方式、オフセット印刷方式、グラビア印刷方式、スクリーン印刷方式、マスクを用いたスプレー塗布方式等に使用する各種塗布装置を使用することが可能である。
The first
第一乾燥装置4cは、加熱された気流による溶媒の除去を行う乾燥処理装置であり、例えば、スリットノズル形式の噴出し口から成膜面に向け高さ100mm、噴出し風速1m/s、幅手分布5%、乾燥温度100℃で実施する。
The
加熱処理装置4dは、帯状可撓性支持体Aの裏面側から正孔輸送層を裏面伝熱方式で加熱する、例えば、複数の例えば200℃の加熱ローラを有する裏面伝熱型の加熱処理装置であり、溶媒除去後、温度200℃のヒートロールを密に並べたロール間から吸引して基板が吸着搬送され、裏面伝熱による加熱で熱処理を行うものである。この加熱処理により膜の平滑性や残留溶媒の除去、また、塗膜の硬化等を行う。
The
帯状可撓性支持体Aは、正孔輸送層形成工程4に次いで発光層形成工程5にはいる。 The belt-like flexible support A enters the light emitting layer forming step 5 after the hole transport layer forming step 4.
発光層形成工程5においては、バックアップロール5aに保持された正孔輸送層を有する帯状可撓性支持体Aの正孔輸送層上に発光層形成用塗布液を塗布する第二湿式塗布機5bと、正孔輸送層上に形成された発光層の溶媒を除去する第二乾燥装置5cと、溶媒が除去された発光層を加熱する第二加熱処理装置5dとを有している。ここでも前記同様の帯電防止手段を用いてよいが省略されている。
In the light emitting layer forming step 5, a second
第二湿式塗布機5bは第一湿式塗布機4bと同じ型式のものが好ましい。
The second
第二乾燥装置5cは第一乾燥装置4cと同じ構造をしている。第二加熱処理装置5dは第一加熱処理装置4dと同じ構造をしており、正孔輸送層上に形成された、発光層を帯状可撓性支持体の裏面側から裏面伝熱方式で加熱するようになっている。
The
帯状可撓性支持体は、発光層形成工程5に次いで電子輸送層塗布工程6にはいる。
The belt-like flexible support is in the electron transport
電子輸送層形成工程6においては、バックアップロール6aに保持された帯状可撓性支持体Aの発光層上に電子輸送層形成用塗布液を塗布する第三湿式塗布機6bと、発光層上に形成された電子輸送層の溶媒を除去する第三乾燥装置6cと、溶媒が除去された電子輸送層を加熱する第三加熱処理装置6dとを有している。ここでも前記同様の帯電防止手段を用いてよいが省略されている。
In the electron transport
本図に示される、正孔輸送層形成工程4、発光層形成工程5、電子輸送層形成工程6は湿式塗布装置、乾燥装置、加熱処理装置がそれぞれ1台の場合を示しているが、必要に応じて増加することが可能となっている。
The hole transport layer forming step 4, the light emitting layer forming step 5, and the electron transport
巻き取り部7で有機機能層各層が形成された帯状可撓性支持体7bを、有機機能層側を外側にして巻き芯に巻き取り、帯状可撓性支持体(以下、帯状可撓性支持体Bとする)のロール7aとする。
The strip-shaped
この時、帯状可撓性支持体Bの有機機能層形成部以外の少なくとも両端にサイドテープ7cを巻き込んで、中間の有機機能層形成部分に空間を形成する様に非接触に巻き取ることが望ましい。非接触巻取りにすることにより、薄膜でダメージの受けやすい有機機能層がスリキズや異物付着により品質不良になることを防止できる。
At this time, it is desirable that the
サイドテープを使用する場合には、巻き取り部7にロール状サイドテープ7c供給し、帯状可撓性支持体7bとサイドテープ7cを一緒に巻き取ることによりロール状の帯状可撓性支持体7aを形成する。巻き取り部7は、帯状可撓性支持体Bの水分含有量を出来るだけ低くするため、水分含有量が100ppm以下、望ましくは50ppm以下の窒素雰囲気に保つ。
When the side tape is used, the roll-shaped
また、巻き取り前に、形成した有機機能層について、その不要部を、各層を溶解できる溶媒等を用いて拭き取る工程を設けてもよい。拭き取り工程としては、例えば、特表2007-515756号公報に記載された拭き取り装置等があるが、これらを用い、予め帯状可撓性支持体上に形成されたアラインメントマークの位置に従って拭き取りを実施する。連続的に拭き取る方法が好ましく、搬送を止めて幅手方向の拭き取りを実施するときは、前後にアキューム機構等を設けて有機機能層の塗布から巻き取りまでを連続して行うようにすることが望ましい。 Further, before winding, a step of wiping unnecessary portions of the formed organic functional layer with a solvent or the like that can dissolve each layer may be provided. As the wiping step, for example, there is a wiping device described in JP-T-2007-515756, etc., and using these, wiping is carried out according to the position of the alignment mark previously formed on the belt-like flexible support. . A continuous wiping method is preferred, and when carrying out wiping in the width direction by stopping conveyance, an accumulator mechanism or the like is provided at the front and back to continuously perform from application to winding of the organic functional layer. desirable.
巻き取られた帯状可撓性支持体Bのロール7aは、低水分環境である減圧下(10-6~10-2Pa)又は不活性ガス(例えば窒素)環境下の収納箱に収納してもよい。収納箱での収納期間は1~200時間が好ましい。素子劣化に起因する酸素や微量水分が取り除くために、温度をかけても良い。
The
次いで、製造工程2bにより、一旦巻き取られた帯状可撓性支持体B上に、電子注入層、第二電極の形成を行う。
Next, an electron injection layer and a second electrode are formed on the strip-shaped flexible support B once wound up by the
供給部8では、繰り出し部を有している。繰り出し部では、有機機能層各層が形成された帯状可撓性支持体Bが巻き芯に巻き取られたロール状態で供給される。7aは製造工程2aで巻き取られたロール状の帯状可撓性支持体(元巻きロールとも言う)を示す。
Supplied section 8 has a feeding section. In the feeding portion, the strip-shaped flexible support B on which each organic functional layer is formed is supplied in a roll state wound around a winding core. 7a shows the roll-shaped strip | belt-shaped flexible support body (it is also called an original winding roll) wound up by the
供給部8と電子注入層形成工程9と第二電極形成工程10の連結部はシャッタG1により分離され、供給部8はロール状の帯状可撓性支持体7aの供給が可能な様に、供給部8が大気圧に戻される。
The connecting portion of the supply portion 8, the electron injection layer forming step 9 and the second
ロール状の帯状可撓性支持体7aの供給時には、毎回帯状可撓性基材を工程内に通す作業(以下、通紙と言う)は煩雑なため、通常、前回加工の終了時にリーダーフィルムと呼ばれる工程部材が工程内に配置されており、リーダーフィルムの終端部と元巻きロール7aの帯状可撓性基材B先端部を接合することで、帯状可撓性基材Bを通紙せずに帯状可撓性基材Bの供給を可能にしている。
When supplying the roll-like
リーダーフィルムの通紙は、リーダーフィルムの元巻きを帯状可撓性支持体供給工程8に配置し、帯状可撓性基材B終端部にリーダーフィルム先端を接合し、帯状可撓性基材巻取り後にリーダーフィルムの両端を断裁して工程内に残す方法や事前に元巻きロールの帯状可撓性支持体Bの終端、すなわち巻き芯側にリーダーフィルムを巻き取っておき、帯状可撓性基材巻取り後にリーダーのフィルム両端を断裁して工程内に残す方法等がある。 For passing the leader film, the former roll of the leader film is placed in the belt-like flexible support supplying step 8, the leading end of the leader film is joined to the end of the belt-like flexible substrate B, and the belt-like flexible substrate winding is performed. After removing the leader film, the both ends of the leader film are cut and left in the process, or the leader film is wound around the end of the belt-like flexible support B of the original winding roll, that is, the winding core side in advance. There is a method of cutting the both ends of the film of the leader after taking it and leaving it in the process.
サイドテープを使用する場合は、供給部8の繰り出し部にサイドテープ7cと一緒に巻かれたロール状の帯状可撓性支持体7aをセットし、巻出し時に帯状可撓性支持体7bとサイドテープ7cが分離され、帯状可撓性支持体7bは電子注入層形成工程9に供給され、サイドテープ7cは巻き取られる。
When a side tape is used, a roll-shaped strip-like
電子注入層形成工程9と第二電極を形成する第二電極形成工程10については、真空プロセス工程であり、例えば、ここでは、電子注入層形成工程9と第二電極形成工程10を真空蒸着により行うことで説明するが、特に限定はなく、例えばスパッタリング法、反応性スパッタリング法、分子線エピタキシー法、クラスタ-イオンビーム法、イオンプレーティング法などを用いることができる。
The electron injection layer forming step 9 and the second
図ではこれら細部は省略されているが、帯状可撓性支持体Bはロールから巻き出されて、電子注入層形成工程9に入る。 Although these details are omitted in the figure, the belt-like flexible support B is unwound from the roll and enters the electron injection layer forming step 9.
電子注入層形成工程9と第二電極形成工程10は、同じ真空プロセス工程であり、2つの蒸着部が連続して設けられている。2つの蒸着部の蒸着速度の違いがある場合には、それを調整できるよう、アキューム機構を介して同じ真空槽内に電子注入層形成工程9、第二電極形成工程10となる2つの蒸着部が設けられても構わない。電子注入層形成工程9において、第二電極形成部(蒸着装置)の蒸着原料ボートが加熱されマスク蒸着が行われ、電子輸送層上に電子注入層が形成される。ここで9aは蒸発源容器、9bは蒸着装置の支持体ホルダーを概略的に示している。
The electron injection layer forming step 9 and the second
第二電極形成工程10においても、第二電極形成部(蒸着装置)の蒸着原料ボートが加熱されマスク蒸着が行われ、電子注入層上に第二電極が形成される。ここでの10bは支持体ホルダー、10aは蒸発源容器を示している。
Also in the second
ここで、電子注入層形成工程9で電子注入層が形成された帯状可撓性支持体Bは、アキューム機構を介して、第二電極形成工程10へ送られる構成となっている。
Here, the belt-like flexible support B on which the electron injection layer is formed in the electron injection layer formation step 9 is configured to be sent to the second
巻き取り部11で第二電極まで形成された帯状可撓性支持体11bを、第二電極側を外側にして巻き芯に巻き取り、ロール状の帯状可撓性支持体11a(以下、帯状可撓性支持体C)とする。
The strip-shaped
この時、帯状可撓性支持体Cの有機機能層形成部以外の少なくとも両端にサイドテープ11cを巻き込んで、中間の有機機能層形成部分に空間を形成する様に非接触に巻き取ることが望ましい。非接触巻取りにすることにより、薄膜でダメージの受けやすい有機機能層がスリキズや異物付着により品質不良になることを防止できる。
At this time, it is desirable that the
サイドテープを使用する場合には、巻き取り部11にロール状サイドテープ11cを供給し、帯状可撓性支持体11bとサイドテープ11cを一緒に巻き取ることにより形成する。ロール状の帯状可撓性支持体11aの取り出し時に減圧から大気圧にする必要がある場合には、サイドテープ11cに通気性のある材料を用いることが望ましい。
When using a side tape, the roll-shaped
ここで使われるリーダーフィルムやサイドテープ等の部材は、持ち込み水分が多いと成膜可能な真空度になるまでの時間が長くなることから事前に乾燥することが望ましく、その水分量は望ましくは300ppm以下、さらに望ましくは50ppm以下である。 The leader film, side tape, and other members used here are preferably dried in advance because the time until the degree of vacuum at which a film can be formed becomes long if a large amount of moisture is brought in, and the amount of water is preferably 300 ppm. Hereinafter, it is more desirably 50 ppm or less.
ロール状の帯状可撓性支持体11aが巻き取られると、巻き取り部11と電子注入層形成工程9と第二電極形成工程10の連結部はシャッタG2により分離され、ロール状の帯状可撓性支持体11aの取り出しが可能な様に、巻き取り部11が大気圧に戻される。
When the roll-shaped strip-shaped
この時、帯状可撓性支持体Cの末端には、帯状可撓性支持体と類似のリーダーが取り付けられ、ロール状の帯状可撓性支持体11aにリーダーの先端が来た時点で、リーダーの先端が切断される。その結果、電子注入層形成工程9と第二電極形成工程10には、次の帯状可撓性支持体を誘導するためにリーダーが配置される。
At this time, a leader similar to the belt-like flexible support is attached to the end of the belt-like flexible support C, and when the leading end of the leader comes to the roll-like belt-like
供給部12では、繰り出し部を有している。繰り出し部では、例えば、第二電極まで形成された帯状可撓性支持体Cが巻き芯に巻き取られたロール状態で供給される。
図ではこれら細部は省略されているが、帯状可撓性支持体11bはロール11aから巻き出されて、封止層形成工程13に入る。
Although these details are omitted in the figure, the belt-like
サイドテープを使用する場合は、供給工程12の繰り出し部にサイドテープと一緒に巻かれた帯状可撓性支持体Cをセットし、巻出し時に帯状可撓性支持体11bとサイドテープ11cが分離され、帯状可撓性支持体11bは封止層形成工程13に供給され、サイドテープ11cは巻き取られる。
When using the side tape, the belt-like flexible support C wound together with the side tape is set in the feeding portion of the supplying
封止層形成工程13は、封止フィルム貼着工程であり、封止フィルム貼着工程においては、ロール状の封止フィルム13b1から巻き出され、封止樹脂(接着剤)が塗布された封止フィルム13bが、圧着ロール13b2で構成される貼着部において、帯状可撓性支持体11bと圧着され、さらに硬化処理部(図では省略されている)により硬化を受けて密封される。
The sealing
接着剤の塗工は、この例では封止フィルム13b上に塗工されるが、帯状可撓性支持体11bの第二電極上に塗工されてもよい。
The adhesive is applied on the
なお、硬化処理部は、例えば、加熱部又は紫外線照射部からなり、熱硬化性接着剤や光硬化性接着剤等を硬化するために配置される。 In addition, a hardening process part consists of a heating part or an ultraviolet irradiation part, for example, and is arrange | positioned in order to harden a thermosetting adhesive, a photocurable adhesive, etc.
封止層形成工程13に続き、断裁工程14で連続可撓性フィルムに作製された有機エレクトロルミネッセンス素子を製品サイズに断裁を行う。打ち抜き断裁機14aを用いて、帯状可撓性支持体に付けられたアラインメントマークを検出し、アラインメントマークの位置に従って製品サイズにカッターによって打ち抜き断裁する。有機EL素子が打ち抜かれた後の連続可撓性フィルムはその後巻き取り機でロール状に巻き取られる。
Following the sealing
打ち抜き断裁され形成された素子の一例を概略で図3に示す。なお、図中、(a)は素子を上方斜めからみた図を、また、(b)はそのO-O’断面図を、(c)はP-P’断面図を示す。101は可撓性支持体である基材、102は第一電極を、102aは第一電極用取り出し電極を、103~105は正孔輸送層、発光層、電子輸送層および正孔注入層からなる有機層を、106は第二電極を、106aは第二電極用取り出し電極、108は接着剤層、109は封止フィルムを示す。また、図中、Aは作製された素子の帯状可撓性支持体の幅手方向を、またBは搬送方向を示す。 An example of an element formed by punching and cutting is schematically shown in FIG. In the figure, (a) is a view of the device when viewed from above, (b) is a cross-sectional view taken along line O-O ′, and (c) is a cross-sectional view taken along line P-P ′. 101 is a base material which is a flexible support, 102 is a first electrode, 102a is a first electrode extraction electrode, 103 to 105 are a hole transport layer, a light emitting layer, an electron transport layer and a hole injection layer. 106 represents a second electrode, 106a represents a second electrode extraction electrode, 108 represents an adhesive layer, and 109 represents a sealing film. In the figure, A indicates the width direction of the belt-like flexible support of the fabricated element, and B indicates the transport direction.
製品サイズに断裁、打ち抜かれた素子に、各素子に電気回路をそれぞれ実装することで有機エレクトロルミネッセンスパネルが形成される。 An organic electroluminescence panel is formed by mounting an electric circuit on each element cut and punched into a product size.
封止層形成工程13については、有害成分を最小に保つため、希ガスあるいは窒素ガス等の不活性ガスの大気圧プロセスで封止することが好ましい。
The sealing
断裁工程は必ずしも不活性ガス雰囲気中で加工する必要はないが、ここでは、不活性ガス雰囲気で封止と連続して加工する例を示している。 The cutting process is not necessarily performed in an inert gas atmosphere, but here, an example is shown in which processing is performed continuously with sealing in an inert gas atmosphere.
封止層形成工程13は、上記では不活性ガスの大気圧プロセスとして説明したが、例えば、真空プロセスにおいて封止を行ってもよい。
Although the sealing
この可撓性フィルム断裁工程は空気雰囲気下で行われることが好ましい。製品サイズに断裁、打ち抜かれた素子に、各素子に電気回路をそれぞれ実装することで有機エレクトロルミネッセンスパネルが形成される。 This flexible film cutting process is preferably performed in an air atmosphere. An organic electroluminescence panel is formed by mounting an electric circuit on each element cut and punched into a product size.
また、封止層形成工程13として、封止フィルムを貼着する代わりに、また、これに加えて封止層を電極層上に形成する方式であってもかまわない。但し、この場合は封止層の形成工程、例えば、スパッタ、イオンプレーティング法、プラズマCVD法等の真空プロセスによる例えば酸化珪素層等の封止層形成工程が追加される。あるいは大気圧プラズマCVD法等の大気圧プロセスの場合には、前記同様の、プロセス圧力置換工程と組み合わせた封止層形成工程が追加される。
Also, as the sealing
(有機機能層において用いられる材料)
次に、有機EL素子を構成するこれら各有機機能層において用いられる材料について説明する。
(Materials used in organic functional layers)
Next, the material used in each of these organic functional layers constituting the organic EL element will be described.
有機機能層のうち、発光層中に含有される有機発光材料としては、カルバゾール、カルボリン、ジアザカルバゾール等の芳香族複素環化合物、トリアリールアミン誘導体、スチルベン誘導体、ポリアリーレン、芳香族縮合多環化合物、芳香族複素縮合環化合物、金属錯体化合物等およびこれらの単独オリゴ体あるいは複合オリゴ体等があげられるが、本発明においてはこれに限られるものではなく、広く公知の材料を用いることができる。 Among the organic functional layers, organic light emitting materials contained in the light emitting layer include aromatic heterocyclic compounds such as carbazole, carboline, diazacarbazole, triarylamine derivatives, stilbene derivatives, polyarylenes, aromatic condensed polycycles. Compounds, aromatic hetero-fused ring compounds, metal complex compounds, and the like, and single oligo compounds or composite oligo compounds thereof, but the present invention is not limited thereto, and widely known materials can be used. .
また層中(成膜材料)には、好ましくは0.1~20質量%程度のドーパントが発光材料中に含まれてもよい。ドーパントとしては、ペリレン誘導体、ピレン誘導体等公知の蛍光色素等、また、リン光発光タイプの発光層の場合、例えば、トリス(2-フェニルピリジン)イリジウム、ビス(2-フェニルピリジン)(アセチルアセトナート)イリジウム、ビス(2,4-ジフルオロフェニルピリジン)(ピコリナート)イリジウム、などに代表されるオルトメタル化イリジウム錯体等の錯体化合物が同様に0.1~20質量%程度含有される。 In the layer (film forming material), preferably about 0.1 to 20% by mass of a dopant may be contained in the light emitting material. Examples of the dopant include known fluorescent dyes such as perylene derivatives and pyrene derivatives, and in the case of phosphorescent light emitting layers, for example, tris (2-phenylpyridine) iridium, bis (2-phenylpyridine) (acetylacetonate). A complex compound such as an orthometalated iridium complex represented by iridium, bis (2,4-difluorophenylpyridine) (picolinato) iridium, and the like is also contained in an amount of about 0.1 to 20% by mass.
りん光発光方式は、発光層内部に発光領域をもつためか、塗布による層界面のムラによる発光ムラを比較的起こしにくい。発光層の膜厚は、1nm~数百nmの範囲に亘る。 The phosphorescent light emitting method is relatively less likely to cause light emission unevenness due to unevenness of the layer interface due to coating because it has a light emitting region inside the light emitting layer. The thickness of the light emitting layer ranges from 1 nm to several hundred nm.
正孔注入・輸送層中に用いられる材料としては、フタロシアニン誘導体、ヘテロ環アゾール類、芳香族三級アミン類、ポリビニルカルバゾール、ポリエチレンジオキシチオフェン/ポリスチレンスルホン酸(PEDOT:PSS)などに代表される導電性高分子等の高分子材料が、また、発光層に用いられる、例えば、4,4′-ジカルバゾリルビフェニル、1,3-ジカルバゾリルベンゼン等のカルバゾール系発光材料、(ジ)アザカルバゾール類、1,3,5-トリピレニルベンゼンなどのピレン系発光材料に代表される低分子発光材料、ポリフェニレンビニレン類、ポリフルオレン類、ポリビニルカルバゾール類などに代表される高分子発光材料などが挙げられる。 Examples of materials used in the hole injection / transport layer include phthalocyanine derivatives, heterocyclic azoles, aromatic tertiary amines, polyvinyl carbazole, polyethylene dioxythiophene / polystyrene sulfonic acid (PEDOT: PSS), and the like. Polymer materials such as conductive polymers are also used for the light emitting layer, for example, carbazole-based light emitting materials such as 4,4′-dicarbazolylbiphenyl, 1,3-dicarbazolylbenzene, ) Low molecular light emitting materials represented by pyrene light emitting materials such as azacarbazoles, 1,3,5-tripyrenylbenzene, polymer light emitting materials represented by polyphenylene vinylenes, polyfluorenes, polyvinyl carbazoles, etc. Etc.
電子注入・輸送層材料としては、8-ヒドロキシキノリナートリチウム、ビス(8-ヒドロキシキノリナート)亜鉛等の金属錯体化合物もしくは以下に挙げられる含窒素五員環誘導体がある。即ち、オキサゾール、チアゾール、オキサジアゾール、チアジアゾールもしくはトリアゾール誘導体が好ましい。具体的には、2,5-ビス(1-フェニル)-1,3,4-オキサゾール、2,5-ビス(1-フェニル)-1,3,4-チアゾール、2,5-ビス(1-フェニル)-1,3,4-オキサジアゾール、2-(4′-tert-ブチルフェニル)-5-(4″-ビフェニル)1,3,4-オキサジアゾール、2,5-ビス(1-ナフチル)-1,3,4-オキサジアゾール、1,4-ビス[2-(5-フェニルオキサジアゾリル)]ベンゼン、1,4-ビス[2-(5-フェニルオキサジアゾリル)-4-tert-ブチルベンゼン]、2-(4′-tert-ブチルフェニル)-5-(4″-ビフェニル)-1,3,4-チアジアゾール、2,5-ビス(1-ナフチル)-1,3,4-チアジアゾール、1,4-ビス[2-(5-フェニルチアジアゾリル)]ベンゼン、2-(4′-tert-ブチルフェニル)-5-(4″-ビフェニル)-1,3,4-トリアゾール、2,5-ビス(1-ナフチル)-1,3,4-トリアゾール、1,4-ビス[2-(5-フェニルトリアゾリル)]ベンゼン等が挙げられる。 Examples of the electron injection / transport layer material include metal complex compounds such as 8-hydroxyquinolinate lithium and bis (8-hydroxyquinolinate) zinc, and the following nitrogen-containing five-membered ring derivatives. That is, oxazole, thiazole, oxadiazole, thiadiazole or triazole derivatives are preferred. Specifically, 2,5-bis (1-phenyl) -1,3,4-oxazole, 2,5-bis (1-phenyl) -1,3,4-thiazole, 2,5-bis (1 -Phenyl) -1,3,4-oxadiazole, 2- (4′-tert-butylphenyl) -5- (4 ″ -biphenyl) 1,3,4-oxadiazole, 2,5-bis ( 1-naphthyl) -1,3,4-oxadiazole, 1,4-bis [2- (5-phenyloxadiazolyl)] benzene, 1,4-bis [2- (5-phenyloxadiazolyl) -4-tert-butylbenzene], 2- (4′-tert-butylphenyl) -5- (4 ″ -biphenyl) -1,3,4-thiadiazole, 2,5-bis (1-naphthyl) -1 , 3,4-thiadiazole, 1,4-bis [2- (5-phenyl) Asiazolyl)] benzene, 2- (4′-tert-butylphenyl) -5- (4 ″ -biphenyl) -1,3,4-triazole, 2,5-bis (1-naphthyl) -1,3,4 -Triazole, 1,4-bis [2- (5-phenyltriazolyl)] benzene and the like.
有機EL素子、各有機層の膜厚は、0.05~0.3μm程度必要であり、好ましくは0.1~0.2μm程度である。 The film thickness of the organic EL element and each organic layer needs to be about 0.05 to 0.3 μm, preferably about 0.1 to 0.2 μm.
また、有機層(有機EL各機能層)の形成方法としてはウェットプロセスである塗布および印刷等が好ましい。例えば、ダイコート方式、スクリーン印刷方式、フレキソ印刷方式、インクジェット方式、ワイヤーバー方式、キャップコート法、スプレー塗布法、キャスト法、ロールコート法、バーコート法、グラビアコート法等の塗布機の使用が可能である。これらの湿式塗布機の使用は有機化合物層の材料に応じて適宜選択することが可能となっている。 Also, as a method for forming the organic layer (organic EL functional layers), a wet process such as coating and printing is preferable. For example, die coat method, screen printing method, flexographic printing method, ink jet method, wire bar method, cap coating method, spray coating method, casting method, roll coating method, bar coating method, gravure coating method, etc. can be used. It is. The use of these wet coating machines can be appropriately selected according to the material of the organic compound layer.
各有機材料には溶解特性(溶解パラメータやイオン化ポテンシャル、極性)がそれぞれにあり、溶解できる溶媒には限定がある。またその際には溶解度もそれぞれ違うため、一概に濃度も決めることができないが、本発明において用いられる溶媒の種類は、成膜しようとする有機EL材料に応じて、前記の条件に適ったものを、公知の溶媒から選択すればよく、例えば、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素、テトラクロロエタン、トリクロロエタン、クロロベンゼン、ジクロロベンゼン、クロロトルエン等のハロゲン系炭化水素系溶媒や、ジブチルエーテル、テトラヒドロフラン、ジオキサン、アニソールなどのエーテル系溶媒、メタノールや、エタノール、イソプロパノール、ブタノール、シクロヘキサノール、2-メトキシエタノール、エチレングリコール、グリセリン等のアルコール系溶媒、ベンゼン、トルエン、キシレン、エチルベンゼン等の芳香族炭化水素系溶媒、ヘキサン、オクタン、デカン、テトラリン等のパラフィン系溶媒、酢酸エチル、酢酸ブチル、酢酸アミルなどのエステル系溶媒、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン等のアミド系溶媒、アセトン、メチルエチルケトン、シクロヘキサノン、イソホロン等のケトン系溶媒、ピリジン、キノリン、アニリン等のアミン系溶媒、アセトニトリル、バレロニトリル等のニトリル系溶媒、チオフェン、二硫化炭素などの硫黄系溶媒が挙げられる。 Each organic material has its own solubility characteristics (solubility parameters, ionization potential, polarity), and there are limitations on the solvents that can be dissolved. In this case, since the solubility is different from each other, the concentration cannot be generally determined. However, the type of the solvent used in the present invention is suitable for the above conditions depending on the organic EL material to be formed. May be selected from known solvents, for example, halogenated hydrocarbon solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane, chlorobenzene, dichlorobenzene, chlorotoluene, dibutyl ether, tetrahydrofuran, Ether solvents such as dioxane and anisole, alcohol solvents such as methanol, ethanol, isopropanol, butanol, cyclohexanol, 2-methoxyethanol, ethylene glycol, glycerin, benzene, toluene, xylene, ethylben Aromatic hydrocarbon solvents such as hexane, paraffin solvents such as hexane, octane, decane, tetralin, ester solvents such as ethyl acetate, butyl acetate, amyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide Amide solvents such as N-methylpyrrolidone, ketone solvents such as acetone, methyl ethyl ketone, cyclohexanone and isophorone, amine solvents such as pyridine, quinoline and aniline, nitrile solvents such as acetonitrile and valeronitrile, thiophene, carbon disulfide And sulfur-based solvents such as
なお、使用可能な溶媒は、これらに限るものではなく、これらを二種以上混合して溶媒として用いてもよい。 In addition, the solvent which can be used is not restricted to these, You may mix and use 2 or more types of these as a solvent.
これらのうち好ましい例としては、有機EL材料において、各機能層材料によっても異なるものの、大凡について、良溶媒としては、例えば芳香族系溶媒、ハロゲン系溶媒、エーテル系溶媒などであり、好ましくは、芳香族系溶媒、エーテル系溶媒である。また、貧溶媒としては、アルコール系溶媒、ケトン系溶媒、パラフィン系溶媒などが挙げられ、なかでもアルコール系溶媒、パラフィン系溶媒である。 Among these, preferable examples of the organic EL material are different depending on each functional layer material. However, as a good solvent, for example, an aromatic solvent, a halogen solvent, an ether solvent, and the like are preferable. Aromatic solvents and ether solvents. Examples of the poor solvent include alcohol solvents, ketone solvents, paraffin solvents, and the like. Among them, alcohol solvents and paraffin solvents are used.
また、本発明では、上記の各機能層において、反応性基をもつ有機化合物(反応性有機化合物)を用いてもよい。反応性有機化合物を用いる層としては特に制限はなく、各層に用いることができる。それぞれ各機能層に反応性基をもつそれぞれの機能をもつ有機材料を用いればよい。 In the present invention, an organic compound having a reactive group (reactive organic compound) may be used in each functional layer. There is no restriction | limiting in particular as a layer using a reactive organic compound, It can use for each layer. An organic material having a function having a reactive group in each functional layer may be used.
反応性有機化合物塗布層を形成後基板上で反応させ、有機分子によるネットワークポリマーを形成させ、硬化させることができる。ネットワークポリマーが生成することで、構成層のTg(ガラス転移点)調整による素子劣化の抑制させることができる。 After forming the reactive organic compound coating layer, it can be reacted on the substrate to form a network polymer of organic molecules and be cured. Generation | occurrence | production of a network polymer can suppress element deterioration by Tg (glass transition point) adjustment of a structure layer.
また、素子使用中の活性ラジカルを用いて分子の共役系の切断または生成を伴う反応を調整することにより、有機EL素子の発光波長を変えたり、特定波長の劣化を抑制すること等も可能である。 It is also possible to change the emission wavelength of the organic EL element, suppress deterioration of the specific wavelength, etc. by adjusting the reaction accompanied by the cleavage or generation of the conjugated system of the molecule using the active radical in use. is there.
一方、製造面では、例えば、塗布により積層する工程の場合では、下層が上層の塗布液に溶解しないことが好ましいため、下層を樹脂化し溶剤溶解性を劣化させることで、上層塗布を可能とすることができる。例えば、正孔輸送層をこのように架橋した有機層として樹脂化することで、上層として発光層を塗布する際に下層の溶解、又浸透を防止することができる。 On the other hand, on the manufacturing side, for example, in the case of a step of laminating by coating, it is preferable that the lower layer does not dissolve in the upper layer coating solution. Therefore, the upper layer can be applied by resinating the lower layer and degrading solvent solubility. be able to. For example, when the hole transport layer is resinized as an organic layer thus crosslinked, dissolution and penetration of the lower layer can be prevented when the light emitting layer is applied as the upper layer.
用いることのできる反応性基としては、特に限定されないが、例えば、ビニル基、エチニル基、イソシアネート基、エポキシ基等が代表的には挙げられる。 The reactive group that can be used is not particularly limited, but typically includes a vinyl group, an ethynyl group, an isocyanate group, an epoxy group, and the like.
また、2つの電極のうち、第一電極である正孔の注入を行う陽極に使用される導電性材料としては、4eVより大きな仕事関数をもつものが適しており、銀、金、白金、パラジウム等およびそれらの合金、酸化スズ、酸化インジウム、ITO等の酸化金属、さらにはポリチオフェンやポリピロール等の有機導電性樹脂が用いられる。透光性であることが好ましく、透明電極としてはITOが好ましい。ITO透明電極の形成方法としては、マスク蒸着またはフォトリソパターニング等が使用できるが、これに限られるものではない。 Of the two electrodes, a conductive material used for the anode for injecting holes, which is the first electrode, is preferably a material having a work function larger than 4 eV, and is silver, gold, platinum, palladium. And their alloys, metal oxides such as tin oxide, indium oxide and ITO, and organic conductive resins such as polythiophene and polypyrrole are used. It is preferable that it is translucent, and ITO is preferable as a transparent electrode. As a method for forming the ITO transparent electrode, mask vapor deposition or photolithography patterning can be used, but is not limited thereto.
また、第二電極である陰極として使用される導電性物質としては、4eVより小さな仕事関数をもつものが適しており、マグネシウム、アルミニウム等。合金としては、マグネシウム/銀、リチウム/アルミニウム等が代表例として挙げられる。また、その形成方法は、マスク蒸着、フォトリソパターニング、メッキ、印刷等が使用できるが、これに限られるものではない。 Also, as the conductive material used as the cathode as the second electrode, those having a work function smaller than 4 eV are suitable, such as magnesium and aluminum. Typical examples of the alloy include magnesium / silver and lithium / aluminum. The formation method can be mask vapor deposition, photolithography patterning, plating, printing, or the like, but is not limited thereto.
また、本発明において、帯状の可撓性支持体としては、透明性樹脂フィルムが用いられる。透明性樹脂フィルムとしては、ポリエチレン、エチレン-酢酸ビニル共重合体、エチレン-ビニルアルコール共重合体、ポリプロピレン、ポリスチレン、ポリメチルメタアクリレート、ポリ塩化ビニル、ポリビニルアルコール、ポリビニルブチラール、ナイロン、ポリエーテルエーテルケトン、ポリサルホン、ポリエーテルサルフォン、テトラフルオロエチレン-パーフルオロアルキルビニルエーテル共重合体、ポリビニルフルオライド、テトラフルオロエチレン-エチレン共重合体、テトラフルオロエチレン-ヘキサフルオロプロピレン共重合体、ポリクロロトリフルオロエチレン、ポリビニリデンフルオライド、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル、ポリカーボネート、ポリウレタン、ポリイミド、ポリエーテルイミド、ポリイミド、ポリプロピレン等のフィルムが挙げられる。 In the present invention, a transparent resin film is used as the belt-like flexible support. Transparent resin films include polyethylene, ethylene-vinyl acetate copolymer, ethylene-vinyl alcohol copolymer, polypropylene, polystyrene, polymethyl methacrylate, polyvinyl chloride, polyvinyl alcohol, polyvinyl butyral, nylon, polyether ether ketone. , Polysulfone, polyethersulfone, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, polyvinyl fluoride, tetrafluoroethylene-ethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, polychlorotrifluoroethylene, Polyesters such as polyvinylidene fluoride, polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyurethane, polyimide Polyetherimide, polyimide, and a film of polypropylene.
またこれら支持体上にガスバリア層を形成したガスバリアフィルムを用いることが好ましい。ガスバリア層としては例えば、厚み数nm~数百nmの酸化珪素、窒化珪素、酸窒化珪素等透湿度の低い材料からなる水分透過率が小さい薄膜が挙げられる。 Further, it is preferable to use a gas barrier film in which a gas barrier layer is formed on these supports. Examples of the gas barrier layer include a thin film having a low moisture permeability made of a material having a low moisture permeability such as silicon oxide, silicon nitride, silicon oxynitride having a thickness of several nanometers to several hundred nanometers.
本発明で用いられる封止フィルムとしては、水分透過率が小さいガスバリア性の樹脂フィルムであることが好ましい。これらのフィルムとしては、ポリエチレンテレフタレート等のポリエステル、ポリカーボネート、ポリエチレン、エチレン-ビニルアルコール共重合体、ポリプロピレン等の上記可撓性支持体として挙げられたフィルム上に透明な厚み数nm~数百nmの酸化珪素、窒化珪素、酸窒化珪素等透湿度の低い材料からなる薄膜を形成したフィルム、また、ガスバリア性の被膜である、アルミナ蒸着膜等を形成したフィルム、等が挙げられる。例えば、金属蒸着フィルムである凸版印刷製、GXフィルム、テックバリア(三菱樹脂)等のシリカ蒸着フィルム、また、アルミナ蒸着フィルム等ガスバリア層を形成した上記フィルム等を用いることができる。 The sealing film used in the present invention is preferably a gas barrier resin film having a low moisture permeability. As these films, a transparent film having a thickness of several nm to several hundreds nm is formed on the above-mentioned flexible support such as polyester such as polyethylene terephthalate, polycarbonate, polyethylene, ethylene-vinyl alcohol copolymer, and polypropylene. Examples thereof include a film in which a thin film made of a material having low moisture permeability such as silicon oxide, silicon nitride, and silicon oxynitride is formed, and a film in which an alumina vapor deposition film or the like that is a gas barrier film is formed. For example, a metal vapor-deposited film such as Toppan Printing, a GX film, a silica vapor-deposited film such as Tech Barrier (Mitsubishi Resin), or the above-mentioned film on which a gas barrier layer such as an alumina vapor-deposited film is formed can be used.
封止に用いる接着剤としては、アクリル系樹脂、エポキシ系樹脂、フッ素系樹脂等からなるUV硬化型接着剤組成物を用いることができ、例えば、ナガセケムテック(株)製、UVレジン XNR5516等のUV硬化型接着剤(樹脂)を用いることができる。また、勿論、熱接着型樹脂でもよい。 As an adhesive used for sealing, a UV curable adhesive composition made of an acrylic resin, an epoxy resin, a fluorine resin, or the like can be used. For example, a UV resin XNR5516 manufactured by Nagase Chemtech Co., Ltd. UV curable adhesive (resin) can be used. Of course, a heat bonding resin may be used.
以下実施例により本発明を説明するが本発明はこれにより限定されるものではない。 Hereinafter, the present invention will be described by way of examples, but the present invention is not limited thereto.
先ず、幅700mm、厚さ100μmのポリエチレンテレフタレートフィルム(PETフィルム)を準備し、準備したPETフィルム上に、大気圧プラズマ放電処理法で、トータルの膜厚で約90nmの酸化珪素からなる低密度層、中密度層、高密度層、中密度層を4層積層した透明ガスバリア性フィルムを作製した。JIS K 7129-1992に準拠した方法により水蒸気透過度を測定した結果、1.0×10-3g/(m2・24h)以下であった。JIS K 7126-1987に準拠した方法により酸素透過度を測定した結果、1.0×10-3cm3/(m2・24hr・MPa)以下であった。 First, a polyethylene terephthalate film (PET film) having a width of 700 mm and a thickness of 100 μm was prepared, and a low-density layer made of silicon oxide having a total film thickness of about 90 nm on the prepared PET film by an atmospheric pressure plasma discharge treatment method. A transparent gas barrier film in which four layers of medium density layer, high density layer, and medium density layer were laminated was prepared. As a result of measuring the water vapor permeability by a method based on JIS K 7129-1992, it was 1.0 × 10 −3 g / (m 2 · 24 h) or less. As a result of measuring oxygen permeability by a method based on JIS K 7126-1987, it was 1.0 × 10 −3 cm 3 / (m 2 · 24 hr · MPa) or less.
次に、スパッタ装置を用いて、ロールトゥーロールの真空チャンバー内に元巻きを導入し、アルゴン雰囲気下で、ITO膜を130nm成膜して、透明導電膜を形成した。このITO膜の表面比抵抗は、40Ω/□であった。 Next, using a sputtering apparatus, an original winding was introduced into a roll-to-roll vacuum chamber, and an ITO film was formed to a thickness of 130 nm in an argon atmosphere to form a transparent conductive film. The surface resistivity of the ITO film was 40Ω / □.
次に、ITO膜の形成された面に、幅方向670mm、長手方向720mmの長方形の領域に、紫外光で重合するフォトリソグラフ用の樹脂を塗布し、90℃の乾燥炉を通過させたのち、位置を合わせパターン露光後、搬送しながら、現像、エッチング、アルカリ処理を経て、イオン交換水で洗浄後、清浄な空気を吹き付けて、十分乾燥したのち、巻き取った。 Next, on the surface on which the ITO film is formed, a photolithographic resin that is polymerized with ultraviolet light is applied to a rectangular region with a width direction of 670 mm and a longitudinal direction of 720 mm, and after passing through a drying oven at 90 ° C., After aligning the position and exposing the pattern, it was developed, etched, and subjected to alkali treatment while being transported, washed with ion-exchanged water, sprayed with clean air, sufficiently dried, and then wound up.
図2の2aの製造工程を用いて、以下の通り前記電極パターンを作製したPETフィルムを巻き取ったロール状のPETフィルムに有機機能層の塗布を行った。
Using the
先ず、正孔輸送層形成工程4において正孔輸送層を形成した。 First, a hole transport layer was formed in the hole transport layer forming step 4.
正孔輸送層形成用塗布液としてポリエチレンジオキシチオフェン・ポリスチレンスルホネート(PEDOT/PSS、Bayer社製 Bytron P AI 4083)を純水で65%、メタノールで5%希釈した溶液を正孔輸送層形成用塗布液として準備した。正孔輸送層形成用塗布液の表面張力は40mN/m(協和界面化学社製:表面張力計CBVP-A3)であった。 Polyethylene dioxythiophene / polystyrene sulfonate (PEDOT / PSS, Baytron P AI4083 manufactured by Bayer) diluted with 65% pure water and 5% methanol for the hole transport layer forming coating solution for forming the hole transport layer Prepared as a coating solution. The surface tension of the coating solution for forming the hole transport layer was 40 mN / m (manufactured by Kyowa Interface Chemical Co., Ltd .: surface tension meter CBVP-A3).
準備された第一電極が形成されたロール状のPETフィルムに帯電除去処理を施した後、PETフィルム上に、正孔輸送層形成用塗布液を温度25℃で、ダイコート方式の塗布機を使用した湿式塗布方式により乾燥後の厚みが30nmになるように塗布した。 The roll-shaped PET film on which the prepared first electrode is formed is subjected to a charge removal treatment, and then the hole transport layer forming coating solution is applied to the PET film at a temperature of 25 ° C. using a die coat type coating machine. The wet coating method was applied so that the thickness after drying was 30 nm.
塗布後、乾燥装置および加熱処理装置を使用して、乾燥装置ではスリットノズル形式の吐出口から成膜面に向け高さ100mm、吐出風速1m/s、幅手の風速分布5%、温度120℃で溶媒を除去した後、引き続き、加熱処理装置により温度150℃で裏面伝熱方式の熱処理を行い、正孔輸送層を形成した。なお、搬送速度は、3m/分とした。 After coating, a drying device and a heat treatment device are used. In the drying device, the height from the slit nozzle type discharge port to the film formation surface is 100 mm, the discharge air speed is 1 m / s, the wide air speed distribution is 5%, and the temperature is 120 ° C. Then, after the solvent was removed, heat treatment by a back surface heat transfer method was performed at a temperature of 150 ° C. by a heat treatment apparatus to form a hole transport layer. The conveyance speed was 3 m / min.
次に、発光層形成工程5で、発光層を形成した。発光層形成用塗布液として、溶媒であるトルエンに対してホストであるジカルバゾール誘導体(CBP)を1質量%、ドーパントであるイリジウム錯体(Ir(ppy)3)を0.05質量%の比率で溶解させたものを塗布液として準備した。発光層形成用塗布液の表面張力は25℃で28mN/m(協和界面化学社製:表面張力計CBVP-A3を使用)であった。準備された、正孔輸送層が形成されたロール状のPETフィルムに帯電除去処理した後、PETフィルム上に、発光層形成用塗布液を温度25℃で、正孔輸送層形成工程と同様のダイコート方式の塗布機を使用した湿式塗布により乾燥膜厚が50nmになるように塗布した。 Next, in the light emitting layer forming step 5, a light emitting layer was formed. As a light emitting layer forming coating solution, 1% by mass of host dicarbazole derivative (CBP) and 0.05% by mass of dopant iridium complex (Ir (ppy) 3 ) with respect to toluene as solvent What was dissolved was prepared as a coating solution. The surface tension of the coating solution for forming the light emitting layer was 28 mN / m at 25 ° C. (manufactured by Kyowa Interface Chemical Co., Ltd .: using surface tension meter CBVP-A3). After the prepared roll-shaped PET film having the hole transport layer formed thereon is subjected to charge removal treatment, the light emitting layer forming coating solution is formed on the PET film at a temperature of 25 ° C., similar to the hole transport layer forming step. It apply | coated so that the dry film thickness might be set to 50 nm by the wet application | coating which used the coating machine of the die coat system.
塗布後、正孔輸送層塗膜の乾燥および加熱処理に使用した乾燥装置および加熱処理装置と同じ装置を使用し、乾燥装置ではスリットノズル形式の吐出口から成膜面に向け高さ100mm、吐出風速1m/s、幅手の風速分布5%、温度60℃で溶媒を除去した後、引き続き、加熱処理装置により温度150℃で裏面伝熱方式の熱処理を行い、発光層を形成した。 After coating, use the same equipment as the drying equipment and heat treatment equipment used for drying and heat treatment of the hole transport layer coating film, and the drying equipment discharges 100mm from the slit nozzle type discharge port to the film formation surface. After removing the solvent at a wind speed of 1 m / s, a wide wind speed distribution of 5%, and a temperature of 60 ° C., a heat treatment of the backside heat transfer method was subsequently performed at a temperature of 150 ° C. by a heat treatment apparatus to form a light emitting layer.
さらに、電子輸送層形成工程6において、電子輸送層を塗布した。
Furthermore, in the electron transport
電子輸送層形成用塗布液として、溶媒である乳酸エチルに対して2-(4-ビフェニリル)-5-(p-t-ブチルフェニル)-1,3,4-オキサジアゾール(t-Bu-PBD)を1質量%で溶解させたものを塗布液として準備した。電子輸送層形成用塗布液の表面張力は25℃で29mN/m(協和界面化学社製:表面張力計CBVP-A3を使用)であった。準備された発光層が形成されたロール状のPETフィルムを帯電除去処理した後、PETフィルム上に、電子輸送層形成用塗布液を温度25℃で、正孔輸送層形成工程と同様のダイコート方式の塗布機を使用した湿式塗布方式により乾燥膜厚が30nmになるように塗布した。 As a coating solution for forming an electron transport layer, 2- (4-biphenylyl) -5- (pt-butylphenyl) -1,3,4-oxadiazole (t-Bu--) with respect to ethyl lactate as a solvent. What dissolved PBD) at 1 mass% was prepared as a coating liquid. The surface tension of the coating solution for forming an electron transport layer was 29 mN / m at 25 ° C. (manufactured by Kyowa Interface Chemical Co., Ltd .: using a surface tension meter CBVP-A3). After the prepared PET film in which the light emitting layer is formed is subjected to charge removal treatment, the electron transport layer forming coating solution is formed on the PET film at a temperature of 25 ° C. in the same die coating method as in the hole transport layer forming step. It applied so that a dry film thickness might be set to 30 nm by the wet application method using the applicator of No.1.
塗布後、正孔輸送層塗膜の乾燥および加熱処理に使用した乾燥装置および加熱処理装置と同じ装置を使用し、乾燥装置ではスリットノズル形式の吐出口から成膜面に向け高さ100mm、吐出風速1m/s、幅手の風速分布5%、温度100℃で溶媒を除去した後、引き続き、加熱処理装置により温度150℃で裏面伝熱方式の熱処理を行い、電子輸送層を形成した。 After coating, use the same equipment as the drying equipment and heat treatment equipment used for drying and heat treatment of the hole transport layer coating film, and the drying equipment discharges 100mm from the slit nozzle type discharge port to the film formation surface. After removing the solvent at a wind speed of 1 m / s, a wide wind speed distribution of 5%, and a temperature of 100 ° C., a back heat transfer type heat treatment was subsequently performed at a temperature of 150 ° C. by a heat treatment apparatus to form an electron transport layer.
その後、巻き取り前に、形成した有機機能層の不要部を、各層を溶解できる溶媒(例えばアセトン)を用いて、例えば、特表2007-515756号公報に記載された拭き取り装置を用いた拭き取り工程を設けた。 Thereafter, before winding, the unnecessary portion of the formed organic functional layer is wiped off using a wiping apparatus described in, for example, JP-T-2007-515756 using a solvent (for example, acetone) that can dissolve each layer. Was established.
乾燥の後に巻き取り部7において有機機能層各層がパターン形成されたPETフィルムを、電子輸送層側を内側にして巻き芯に巻き取り、ロール状のフィルムとして巻き取った。この時、帯状可撓性支持体の有機機能層形成部以外の両端に厚み500μmのサイドテープを巻き込んで、中間の有機機能層形成部分に空間を形成する様に非接触に巻き取った。
After drying, the PET film in which each layer of the organic functional layer was patterned in the winding
次いで、図2の2bで示される製造工程を用いて、供給部8では、工程内配置されたリーダーの端部に電子輸送層まで形成したPETフィルムのロール先端を接合して巻き出し電子注入層、第二電極等を積層して、第二電極側を内側にして巻き芯に巻き取りロール状のフィルムとして一旦巻き取った。この時、巻き取り部11にサイドテープの元巻きを供給し、帯状可撓性支持体の有機機能層形成部以外の両端に厚み500μmのサイドテープを巻き込んで、中間の有機機能層形成部分に空間を形成する様に非接触に巻き取った。
Next, using the manufacturing process shown by 2b in FIG. 2, the supply unit 8 joins the roll tip of the PET film formed up to the electron transport layer to the end of the leader arranged in the process, and unwinds the electron injection layer. Then, the second electrode and the like were laminated and wound up as a roll-shaped film once around the winding core with the second electrode side inside. At this time, the original winding of the side tape is supplied to the winding
供給部8から電子輸送層まで形成したPETフィルムのロールを巻き出して、電子注入層の成膜をマスク蒸着により実施した。 The roll of PET film formed from the supply unit 8 to the electron transport layer was unwound, and the electron injection layer was formed by mask vapor deposition.
以下の電子注入層形成工程9及び第二電極形成工程10において、成膜室の水分分圧を表1に示すように変えて、層形成を行った。水分分圧の測定は、アルバック社小型分圧モニタMALIN(型式MA-01)を用いた。なお、成膜室の水分分圧変化は、成膜室に投入する電子輸送層まで形成されたPETフィルム、リーダー及びサイドテープを、成膜室に投入する前に予め乾燥することで変化させた。
In the following electron injection layer forming step 9 and second
すなわち、電子注入層形成工程9においてフッ化リチウム(0.5nm)をマスク蒸着し、さらに、後段の第二電極形成工程10を構成する第二真空成膜室で、アルミニウムを110nmマスク蒸着した後、巻き取り部11において第二電極がパターン形成されたPETフィルムを、第二電極側を外側にして巻き芯に巻き取り、ロール状のフィルムとして一旦巻き取った。この時、PETフィルムの末端にPETフィルムからなるリーダーを接合し、巻き取り後にリーダーの先端を切断することで、工程内にリーダーを配置する様にした。
That is, lithium fluoride (0.5 nm) is mask-deposited in the electron injection layer forming step 9, and aluminum is further mask-deposited in a second vacuum film forming chamber constituting the second
次いで、図2の2bで示される製造工程を用いて、第二電極を形成したPETフィルムのロールを巻き出して、サイドテープを除去した後に、封止フィルムの積層と断裁を行い、有機EL素子を作製した。 Next, using the manufacturing process shown by 2b in FIG. 2, the roll of the PET film on which the second electrode is formed is unwound, the side tape is removed, and then the sealing film is laminated and cut to obtain an organic EL element. Was made.
また、供給部12からのPETフィルムのロールの巻き出し、封止層形成工程を構成するラミネート室において、封止樹脂(接着剤)が40μm塗布されているガスバリア層(90nmの酸化珪素層)形成済みのPETフィルム(PET厚み80ミクロン)を用いて大気圧の窒素気流下で押圧0.1MPaで熱圧着し、その後本硬化させることでラミネートした。
In addition, a gas barrier layer (90 nm silicon oxide layer) coated with 40 μm of a sealing resin (adhesive) is formed in the laminating chamber constituting the roll-out of the PET film from the
また、供給部12からのPETフィルムのロールの巻き出し、またラミネート後の巻き取りもこれに連動し、断裁工程における打ち抜き装置14aを用いて、PETに付けられたアラインメントマークを検出し、アラインメントマークの位置に従って断裁、打ち抜いた。
Also, unwinding of the roll of PET film from the
図3に概略図で示した有機EL素子が得られる。 The organic EL element schematically shown in FIG. 3 is obtained.
打ち抜かれ作製された素子の一例を概略で図3に示す。なお、図中、101はPETフィルムである基材、102はITOからなる第一電極を、102aは第一電極用取り出し電極を、103~105は正孔輸送層、発光層、電子輸送層および正孔注入層からなる有機層を、106はアルミニウムからなる第二電極を、106aは第二電極用取り出し電極、108は接着剤層、109は封止フィルム(ガスバリア層形成済みのPETフィルム)である。 An example of a punched device is shown schematically in FIG. In the figure, 101 is a substrate made of PET film, 102 is a first electrode made of ITO, 102a is a first electrode extraction electrode, 103 to 105 are a hole transport layer, a light emitting layer, an electron transport layer, and An organic layer made of a hole injection layer, 106 a second electrode made of aluminum, 106 a a take-out electrode for the second electrode, 108 an adhesive layer, 109 a sealing film (PET film on which a gas barrier layer has been formed) is there.
以上により、長尺のPETフィルム上に封止された有機EL素子がロールトゥーロールで形成され本発明の有効性が確認された。 As described above, the organic EL element sealed on the long PET film was formed by roll-to-roll, and the effectiveness of the present invention was confirmed.
各素子を、打ち抜いて切り出した後、電源回路を実装することで有機EL素子が得られる。 After punching out each element and mounting it, an organic EL element is obtained by mounting a power supply circuit.
得られた有機EL素子1~7について以下の評価を行い、結果を表1に示す。 The obtained organic EL elements 1 to 7 were evaluated as follows, and the results are shown in Table 1.
(EL素子評価)
得られた、各有機EL素子について、KEITHLEY製ソースメジャーユニット2400型を用いて、直流電圧を印加して1000cd/m2で発光させた。
(EL element evaluation)
About each obtained organic EL element, DC voltage was applied and light-emitted at 1000 cd / m < 2 > using the source measure unit 2400 type made from KEITHLEY.
各基板5個作製した。基板1個につき2個の発光部があるので、計10個の発光部で評価した。 5 substrates were produced. Since there are two light emitting portions per substrate, a total of 10 light emitting portions were evaluated.
(駆動電圧)
発光した素子の平均値を各素子の駆動電圧とし、素子4の駆動電圧に対する比率を求め、以下の指標で評価した。△以上が好ましく、○以上であることがより好ましい。
(Drive voltage)
The average value of the light-emitting elements was used as the drive voltage for each element, and the ratio of the element 4 to the drive voltage was determined and evaluated using the following indices. Δ or more is preferable, and ○ or more is more preferable.
◎:80%未満
○:80%以上90%未満
△:90%以上110%未満
×:110%以上または発光しない。
A: Less than 80% B: 80% or more and less than 90% B: 90% or more and less than 110% X: 110% or more or no light emission.
(ダークスポットの測定)
作製した有機EL素子に、直流5Vを印加し、100mm2のエリア内のダークスポットの有無についてマイクロスコープを用い目視にてカウントした。
(Dark spot measurement)
A direct current of 5 V was applied to the produced organic EL element, and the presence or absence of dark spots in an area of 100 mm 2 was visually counted using a microscope.
◎:ダークスポットの発生が全くない
○:ダークスポット1個以上、5個未満
△:ダークスポット5個以上、10個未満
×:ダークスポット10個以上。
A: No dark spots are generated. O: One or more dark spots and less than five. Δ: Five or more dark spots and less than ten. X: Ten or more dark spots.
(発光初期特性)
初期の輝度を10mA/cm2で駆動した時の輝度の素子4の輝度に対する比率を求め、以下の指標で評価した。△以上が好ましく、○以上であることがより好ましい。
(Emission initial characteristics)
The ratio of the luminance when the initial luminance was driven at 10 mA / cm 2 to the luminance of the element 4 was obtained and evaluated by the following indices. Δ or more is preferable, and ○ or more is more preferable.
◎:120%以上
○:110%以上120%未満
△:90%以上110%未満
×:90%未満または発光しない。
A: 120% or more B: 110% or more and less than 120% B: 90% or more and less than 110% X: Less than 90% or no light emission.
表1から本発明の有機EL素子は比較に較べて優れた特性を有することが判る。 From Table 1, it can be seen that the organic EL device of the present invention has superior characteristics as compared with the comparison.
実施例2
実施例1で用いられた製造装置2bにおいて、供給部8に水分量の異なるサイドテープ7cと一緒に巻かれた帯状可撓性支持体Bのロール7a及び巻き取り部11に水分量の異なるサイドテープ11cを供給した場合に電子注入層形成工程9及び第二電極形成工程10で水分分圧が5×10-5Paになるまでの時間の変化を計測し、結果を表2に示す。
Example 2
In the
表2から、サイドテープに含まれる水分量が50ppm以下の場合には、工程部材の有無による影響がなく、水分量300ppm以下ならば実務上問題ないことが分かった。 From Table 2, it was found that when the amount of water contained in the side tape was 50 ppm or less, there was no effect due to the presence or absence of process members, and when the amount of water was 300 ppm or less, there was no problem in practice.
1a、1b 有機EL素子
101 基材
102 第一電極
103 正孔輸送層
104 発光層
105 電子注入層
106 第二電極
107 封止層
108 接着剤層
109 封止フィルム
2a、2b、2c 製造工程
3 供給部
4 正孔輸送層形成工程
5 発光層形成工程
6 電子輸送層形成工程
7 巻き取り部
8 供給部
9 電子注入層形成工程
10 第二電極形成工程
11 巻き取り部
12 供給部
13 封止層形成工程
14 断裁工程
DESCRIPTION OF
Claims (3)
前記工程が、真空成膜装置を用いて行う真空成膜工程を含み、前記真空成膜装置に投入される、前記可撓性フィルムと、リーダーフィルム及びサイドテープの少なくとも一つとを、該真空成膜装置投入前に乾燥し、前記真空成膜装置の水分分圧が5×10-5Pa以下で真空成膜工程を行うことを特徴とする有機エレクトロルミネッセンス素子の製造方法。 At least one of a leader film and a side tape, comprising at least a step of sequentially forming a first electrode, an organic functional layer including at least a light emitting layer, and a second electrode on a flexible film (long substrate). In the manufacturing method of the organic electroluminescence element using
The process includes a vacuum film forming process performed using a vacuum film forming apparatus. The flexible film and at least one of a leader film and a side tape are put into the vacuum film forming apparatus. A method for producing an organic electroluminescence element, wherein the organic electroluminescence element is dried before the film apparatus is charged, and the vacuum film forming process is performed at a moisture partial pressure of the vacuum film forming apparatus of 5 × 10 −5 Pa or less.
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| JP2014199789A (en) * | 2012-05-04 | 2014-10-23 | 株式会社半導体エネルギー研究所 | Method of producing light-emitting element, and deposition device |
| WO2018135323A1 (en) | 2017-01-23 | 2018-07-26 | 住友化学株式会社 | Method for manufacturing organic device, and film forming device |
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| JP2010140705A (en) * | 2008-12-10 | 2010-06-24 | Konica Minolta Holdings Inc | Organic electroluminescent panel and manufacturing method therefor and lighting device and display using the organic electroluminescent panel |
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| JP2014199789A (en) * | 2012-05-04 | 2014-10-23 | 株式会社半導体エネルギー研究所 | Method of producing light-emitting element, and deposition device |
| US9578718B2 (en) | 2012-05-04 | 2017-02-21 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting element and deposition apparatus |
| WO2018135323A1 (en) | 2017-01-23 | 2018-07-26 | 住友化学株式会社 | Method for manufacturing organic device, and film forming device |
| KR20190107705A (en) | 2017-01-23 | 2019-09-20 | 스미또모 가가꾸 가부시키가이샤 | Manufacturing method and film-forming apparatus of organic device |
| US10944054B2 (en) | 2017-01-23 | 2021-03-09 | Sumitomo Chemical Company, Limited | Method for manufacturing organic device, and film forming device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5772826B2 (en) | 2015-09-02 |
| JPWO2012008275A1 (en) | 2013-09-09 |
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