WO2012099184A1 - Method for producing fluoroamine - Google Patents
Method for producing fluoroamine Download PDFInfo
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- WO2012099184A1 WO2012099184A1 PCT/JP2012/051024 JP2012051024W WO2012099184A1 WO 2012099184 A1 WO2012099184 A1 WO 2012099184A1 JP 2012051024 W JP2012051024 W JP 2012051024W WO 2012099184 A1 WO2012099184 A1 WO 2012099184A1
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- FNMJXCPSNIUPRI-UHFFFAOYSA-N CC(C)C(CF)NC Chemical compound CC(C)C(CF)NC FNMJXCPSNIUPRI-UHFFFAOYSA-N 0.000 description 1
- XXNLNCNIRRSULU-UHFFFAOYSA-N CN(CCO)S(c1ccccc1[N+]([O-])=O)(=O)=O Chemical compound CN(CCO)S(c1ccccc1[N+]([O-])=O)(=O)=O XXNLNCNIRRSULU-UHFFFAOYSA-N 0.000 description 1
- OMMBEQZVNCHVOJ-UHFFFAOYSA-N CNCCCF Chemical compound CNCCCF OMMBEQZVNCHVOJ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/36—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
- C07C303/38—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids by reaction of ammonia or amines with sulfonic acids, or with esters, anhydrides, or halides thereof
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/62—Preparation of compounds containing amino groups bound to a carbon skeleton by cleaving carbon-to-nitrogen, sulfur-to-nitrogen, or phosphorus-to-nitrogen bonds, e.g. hydrolysis of amides, N-dealkylation of amines or quaternary ammonium compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/36—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
- C07C303/40—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids by reactions not involving the formation of sulfonamide groups
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to a method for producing fluoroamines.
- the applicant of the present patent application removes alcohols by a combination of sulfuryl fluoride (SO 2 F 2 ) and an organic base (performed in the presence of a “salt or complex comprising an organic base and hydrogen fluoride” as necessary).
- SO 2 F 2 sulfuryl fluoride
- an organic base performed in the presence of a “salt or complex comprising an organic base and hydrogen fluoride” as necessary.
- a hydroxyfluorination reaction is disclosed (Patent Document 1).
- the manufacturing method of optically active fluoroamines using this method is also disclosed (patent document 2).
- Patent Documents 1 and 2 disclose a phthaloyl group and a benzylidene group as amino-protecting groups, but these protecting groups can be applied only to primary amines and not secondary amines.
- the present inventors have disclosed amino alcohols protected with typical amino-protecting groups [benzyl (Bn) group, tert-butoxycarbonyl (Boc) group, benzyloxycarbonyl (Cbz) group and acetyl (Ac) group].
- benzyl (Bn) group tert-butoxycarbonyl (Boc) group
- benzyloxycarbonyl (Cbz) group acetyl (Ac) group.
- the above-described dehydroxyfluorination reaction was examined, but the target reaction hardly proceeded (see Comparative Examples 1 to 4).
- the amino group protected with the Boc group, Cbz group and Ac group is considered to have sufficiently suppressed nucleophilicity, but this effect alone is a suitable amino group protecting group in the dehydroxyfluorination reaction. I could't.
- the present invention includes [Invention 1] to [Invention 12] and provides a method for producing a fluoroamine.
- [Invention 1] General formula [1]: [Wherein R 1 represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group, and R 2 independently represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. M represents an integer of 2, 3 or 4, n represents an integer of 4, 6 or 8, and P 1 represents an ortho, meta or para-nitrobenzenesulfonyl group.
- [Invention 3] General formula [3]: [Wherein R 1 represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group, and R 2 independently represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. M represents an integer of 2, 3 or 4, and n represents an integer of 4, 6 or 8. ]
- R 1 , R 2 , m and n are the same as those in the above-mentioned formula [3].
- P 1 represents an ortho, meta or para-nitrobenzenesulfonyl group.
- a suitable protecting group for an amino group that hardly causes a side reaction in the dehydroxyfluorination reaction of amino alcohols by a combination of sulfuryl fluoride and an organic base it is possible to provide a suitable protecting group for an amino group that hardly causes a side reaction in the dehydroxyfluorination reaction of amino alcohols by a combination of sulfuryl fluoride and an organic base.
- an amino group and a hydroxyl group coexist in the amino alcohol of the raw material substrate, but only the amino group can be selectively protected in the amino group protecting step.
- deprotection can be performed without side reactions under mild reaction conditions in the deprotection step.
- fluoroamines can be obtained with high purity and good yield.
- a preferred method for producing fluoroamines of the present invention includes an amino group protecting step of protecting an amino group of an amino alcohol represented by the general formula [3] with a nitrobenzenesulfonyl group, and an amino alcohol protecting method represented by the general formula [1]. 3 steps: a dehydroxyfluorination step for reacting the product with sulfuryl fluoride in the presence of an organic base, and a deprotection step for deprotecting the protecting group of the amino group of the protected fluoroamine represented by the general formula [2] including.
- R 1 of the amino alcohol represented by the general formula [3] represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group.
- the alkyl group is a linear or branched chain or cyclic group (having 3 or more carbon atoms) having 1 to 18 carbon atoms.
- the aromatic ring group is an aromatic hydrocarbon group having 1 to 18 carbon atoms such as a phenyl group, a naphthyl group and an anthryl group, or a pyrrolyl group (including a nitrogen protector), a pyridyl group, a furyl group, a thienyl group, an indolyl group.
- the substituted alkyl group and the substituted aromatic ring group each have a substituent in any number and in any combination on any carbon atom or nitrogen atom of the above alkyl group and aromatic ring group.
- substituents include halogen atoms such as fluorine, chlorine and bromine, lower alkyl groups such as methyl, ethyl and propyl, lower haloalkyl groups such as fluoromethyl, chloromethyl and bromomethyl, methoxy and ethoxy Lower alkoxy groups such as propoxy group, lower haloalkoxy groups such as fluoromethoxy group, chloromethoxy group and bromomethoxy group, lower alkoxycarbonyl groups such as cyano group, methoxycarbonyl group, ethoxycarbonyl group and propoxycarbonyl group, phenyl group , Aromatic groups such as naphthyl, anthryl, pyrrolyl (including nitrogen protected), pyridyl, furyl, thienyl, indolyl (including nitrogen protected), quinolyl, benzofuryl and benzothienyl , Protector of carboxyl group, Protection of amino groups, as well as protection and the like of the hydroxy
- lower means a linear or branched chain or cyclic group (in the case of 3 or more carbon atoms) having 1 to 6 carbon atoms.
- aromatic ring group of the “substituent” is a protected form of a halogen atom, a lower alkyl group, a lower haloalkyl group, a lower alkoxy group, a lower haloalkoxy group, a cyano group, a lower alkoxycarbonyl group, or a carboxyl group.
- the amino group protector and the hydroxyl group protector can be substituted.
- pyrrolyl, indolyl, carboxyl, amino and hydroxyl protecting groups are described in Protective Groups in Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc. And the like.
- an alkyl group and a substituted alkyl group are preferable, and a methyl group is particularly preferable.
- R 2 in the aminoalcohols represented by the general formula [3] each independently represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group.
- the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group are the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group described in R 1 of the amino alcohol represented by the general formula [3]. Is the same.
- the carbon atom substituted by R 2 is an asymmetric carbon, any stereochemistry (R-form, S-form or racemic form) can be adopted.
- any combination of stereochemistry can be taken (for example, when two asymmetric carbons are present, R, R isomer, R, S isomer, S, R form, S, S form, or any diastereomeric mixture thereof).
- two R 2 of the aminoalcohols represented by the general formula [3] are each directly between arbitrary carbon atoms or nitrogen atoms [including amino group protectors, and the protecting group is a nitrobenzenesulfonyl group. It is not limited, and the protecting group described in the above-mentioned book of the protecting group can be taken], and a cyclic structure can be taken by a covalent bond through an oxygen atom or a sulfur atom. Is also included in the claims. Among these, a hydrogen atom, an alkyl group, and a substituted alkyl group are preferable, and a hydrogen atom is particularly preferable.
- M in the amino alcohol represented by the general formula [3] represents an integer of 2, 3 or 4. Among them, integers of 2 and 3 are preferable, and integer 2 is particularly preferable.
- N in the amino alcohol represented by the general formula [3] represents an integer of 4, 6 or 8.
- integers of 4 and 6 are preferable, and integer 4 is particularly preferable.
- n takes the integer 4
- m takes the integer 3
- n takes the integer 6
- n takes the integer 8.
- amino alcohols represented by the general formula [3] amino alcohols represented by the general formula [7] are preferable, and amino alcohols represented by the general formula [11] are particularly preferable.
- aminoalcohols represented by the general formula [7] are commercially available and are easily available on a large scale.
- the fluoroamines represented by the general formula [12] obtained therefrom are important as intermediates for medicines and agrochemicals.
- aminoalcohols represented by the general formula [3] can also be used in the form of salts with inorganic acids such as hydrogen chloride, hydrogen bromide and sulfuric acid or organic acids such as oxalic acid, phthalic acid and paratoluenesulfonic acid. .
- the amino group protecting step can be carried out by employing a general method in organic synthesis [for example, the above-mentioned book of protecting groups, the Chemical Society of Japan, 5th edition experimental chemistry course (Maruzen), etc.]. Specifically, the amino alcohol represented by the general formula [3] is added in the presence of a base to the general formula [13]: [Wherein the nitro group is substituted at the ortho, meta or para position, and X represents a halogen atom. ]
- a protected amino alcohol represented by the general formula [1] can be produced by reacting with a nitrobenzenesulfonyl halide represented by the general formula [1].
- R 1, R 2, m, and n in the general formula [1] is the same as R 1, R 2, m, and n in the general formula [3].
- P 1 represents an ortho, meta, or para-nitrobenzenesulfonyl group.
- the nitro group of the nitrobenzenesulfonyl halide represented by the general formula [13] is substituted at the ortho, meta or para position. Of these, the ortho and para positions are preferred, and the ortho position is particularly preferred.
- X in the nitrobenzenesulfonyl halide represented by the general formula [13] represents a halogen atom.
- the halogen atom is the same as the halogen atom described in the “substituents for R 1 ” of R 1 of the amino alcohol represented by the general formula [3]. Of these, chlorine and bromine are preferable, and chlorine is particularly preferable.
- ortho and para-nitrobenzenesulfonyl chloride are preferable, and ortho-nitrobenzenesulfonyl chloride is particularly preferable.
- Ortho and para-nitrobenzenesulfonyl chloride are commercially available and are readily available. Ortho-nitrobenzenesulfonyl chloride is less expensive and is suitable for production on a large scale.
- the amount of the nitrobenzenesulfonyl halide represented by the general formula [13] may be 0.7 mol or more, preferably 0.8 to 5 mol, based on 1 mol of the amino alcohol represented by the general formula [3]. 9 to 3 mol is particularly preferred.
- the base is an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide.
- an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide.
- Organic bases such as 0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene.
- organic bases are preferable, and triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 2,4,6-collidine, 4-dimethylaminopyridine and 1,8-diazabicyclo [5.4.0] undec-7- En is particularly preferred. These bases can be used alone or in combination.
- the amount of the base used may be 0.35 mol or more, preferably 0.4 to 20 mol, particularly preferably 0.45 to 15 mol, relative to 1 mol of the aminoalcohol represented by the general formula [3].
- the amino alcohol represented by the general formula [3] is used in the form of a salt with an inorganic acid or an organic acid, it is added in consideration of the amount of base necessary for neutralizing the acid, It is convenient to continuously protect the amino group in the same reaction system.
- the base used for acid neutralization is the same as the above base.
- the order of addition of the base is not particularly limited, and an amino alcohol represented by the general formula [3] and a nitrobenzenesulfonyl halide represented by the general formula [13] are added to the reaction solvent and finally a base is added to achieve a good result. May be obtained.
- Reaction solvents include aliphatic hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as toluene and xylene, halogens such as methylene chloride and 1,2-dichloroethane, tetrahydrofuran and tert-butyl methyl ether Ethers such as ethyl acetate and esters such as ethyl acetate and n-butyl acetate, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide and 1,3-dimethyl-2-imidazolidinone Amides such as acetonitrile, nitriles such as acetonitrile and propionitrile, dimethyl sulfoxide and water.
- aliphatic hydrocarbons such as n-hexane and n-heptane
- aromatic hydrocarbons such as toluene and xy
- n-heptane, toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile, dimethyl sulfoxide and water are preferable.
- Toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile And water are particularly preferred.
- These reaction solvents can be used alone or in combination. When used in combination with water, the reaction can be carried out in a two-phase system.
- the reaction solvent may be used in an amount of 0.05 L (liter) or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L with respect to 1 mol of the aminoalcohol represented by the general formula [3]. .
- This reaction can also be carried out neat without using a reaction solvent.
- the reaction temperature may be in the range of ⁇ 80 to + 200 ° C., preferably ⁇ 60 to + 150 ° C., particularly preferably ⁇ 40 to + 100 ° C.
- the reaction time may be within a range of 24 hours or less, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
- a protected amino alcohol represented by the general formula [1] can be obtained by employing a general operation in organic synthesis.
- the crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary.
- a salt of an amino alcohol represented by the general formula [3] with an inorganic acid or a halide ion derived from the nitrobenzenesulfonyl halide represented by the general formula [13] may cause impurities as a by-product (special feature). (See Kai 2010-163422). In such a case, water washing of the organic layer containing the target product, a short column, etc. are effective.
- the protected amino alcohol represented by the general formula [1] is reacted with sulfuryl fluoride in the presence of an organic base to obtain the protected fluoroamine represented by the general formula [2].
- R 1, R 2, m, n, and P 1 in the general formula [2] are the same as R 1, R 2, m, n, and P 1 in the general formula [1].
- the amount of sulfuryl fluoride used may be 0.7 mol or more, preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol, based on 1 mol of the protected amino alcohol represented by the general formula [1]. .
- the organic base is the same as the organic base described in the base in the amino group protecting step.
- the organic base is not limited to these, and organic bases generally used in organic synthesis can also be employed.
- organic bases generally used in organic synthesis can also be employed.
- triethylamine, diisopropylethylamine, tri-n-butylamine, pyridine, 2,6-lutidine, 2,4,6-collidine and 1,8-diazabicyclo [5.4.0] undec-7-ene are preferable, triethylamine, Diisopropylethylamine, tri-n-butylamine, pyridine and 1,8-diazabicyclo [5.4.0] undec-7-ene are particularly preferred.
- These organic bases can be used alone or in combination.
- the amount of the organic base used may be 0.7 mol or more, preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol, based on 1 mol of the protected amino alcohol represented by the general formula [1].
- organic base of the “salt or complex comprising an organic base and hydrogen fluoride” is the same as the organic base described in the dehydroxyfluorination step, and the “preferred” and “particularly preferable” organic bases are also the same. These organic bases of “a salt or complex comprising an organic base and hydrogen fluoride” can be used alone or in combination.
- the molar ratio of the organic base to hydrogen fluoride in the “salt or complex comprising an organic base and hydrogen fluoride” may be used in the range of 100: 1 to 1: 100, preferably 50: 1 to 1:50, Particularly preferred is 25: 1 to 1:25.
- the amount used in the case of using “a salt or complex comprising an organic base and hydrogen fluoride” is 0.001 as fluoride ion (F ⁇ ) with respect to 1 mol of the protected amino alcohol represented by the general formula [1].
- 05 mol or more may be used, preferably 0.07 to 30 mol, particularly preferably 0.09 to 15 mol.
- reaction solvent is the same as the reaction solvent excluding water described in the amino group protecting step, and the “preferred” and “particularly preferable” reaction solvents are the same (of course, excluding water). These reaction solvents can be used alone or in combination.
- the amount of the reaction solvent used may be 0.05 L or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L with respect to 1 mol of the protected amino alcohol represented by the general formula [1]. This reaction can also be carried out neat without using a reaction solvent.
- the reaction temperature may be in the range of ⁇ 50 to + 200 ° C., preferably ⁇ 40 to + 150 ° C., particularly preferably ⁇ 30 to + 100 ° C.
- the reaction time may be within a range of 48 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, and nuclear magnetic resonance. It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
- the post-treatment can employ a general operation in organic synthesis to obtain a protected fluoroamine represented by the general formula [2].
- the crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary.
- the dehydroxyfluorination reaction in this step proceeds by a bimolecular nucleophilic substitution (S N 2) reaction. Therefore, when the raw material substrate is an optically active alcohol, the target product can be obtained as an optically active fluorinated product having an inverted stereochemistry. In particular, in the case of an optically active secondary alcohol, the reaction proceeds at a high inversion rate.
- the deprotection step can be performed by employing a general method in organic synthesis [for example, the above-mentioned book of protecting groups, the Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc.]. Specifically, the protected fluoroamine represented by the general formula [2] is added in the presence of a base to the general formula [14]: [Wherein R 5 represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. ]
- the fluoroamine represented by the general formula [4] can be produced by reacting with the thiol represented by the general formula [4].
- R 1, R 2, m, and n in the general formula [4] are the same as R 1, R 2, m, and n in the general formula [3].
- R 5 of the thiols represented by the general formula [14] represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group.
- the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group are the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group described in R 1 of the amino alcohol represented by the general formula [3]. Is the same. Among these, an alkyl group and an aromatic ring group are preferable, and a phenyl group is particularly preferable.
- Thiophenol is highly reactive and is commercially available as an industrial chemical.
- the amount of the thiol represented by the general formula [14] may be 0.7 mol or more with respect to 1 mol of the protected fluoroamine represented by the general formula [2], preferably 0.8 to 20 mol, .9 to 15 mol is particularly preferred.
- the base is the same as the base described in the amino group protecting step.
- an inorganic base is preferable, and lithium carbonate, sodium carbonate, potassium carbonate, and cesium carbonate are particularly preferable.
- These bases can be used alone or in combination.
- the organic base 1,8-diazabicyclo [5.4.0] undec-7-ene is frequently used as a deprotecting base.
- the amount of the base used may be 0.35 mol or more, preferably 0.4 to 20 mol, particularly preferably 0.45 to 15 mol, relative to 1 mol of the protected fluoroamine represented by the general formula [2].
- the reaction solvent is the same as the reaction solvent described in the amino group protection step.
- n-heptane, toluene, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl Sulfoxides are preferred, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl sulfoxide are particularly preferred.
- These reaction solvents can be used alone or in combination.
- the amount of the reaction solvent used may be 0.05 L or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L, relative to 1 mol of the protected fluoroamine represented by the general formula [2]. This reaction can also be carried out neat without using a reaction solvent.
- the reaction temperature may be in the range of ⁇ 50 to + 100 ° C., preferably ⁇ 40 to + 90 ° C., particularly preferably ⁇ 30 to + 80 ° C.
- the reaction time may be performed within 36 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
- a fluoroamine represented by the general formula [4] can be obtained by employing a general operation in organic synthesis.
- the crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary. If the target product has a low boiling point, it is convenient to directly recover and distill the reaction-terminated liquid.
- the target product can also be obtained by purification in the form of a salt with an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or an organic acid such as oxalic acid, phthalic acid and paratoluenesulfonic acid.
- the filtrate and the washing solution were combined, and the volume was concentrated to about 1/3 by concentration under reduced pressure, 1.00 L of water was added, and the mixture was extracted with 1.50 L of ethyl acetate.
- the aqueous layer was re-extracted twice with 500 mL of ethyl acetate, and the organic layers were combined and concentrated under reduced pressure. After concentration, 200 mL of toluene is added and further concentrated under reduced pressure. As a result, 533 g of a protected amino alcohol was obtained. The yield was 96%.
- the gas chromatography purity was 92.0%.
- the amount of the target product was confirmed by the internal standard method (internal standard substance ⁇ , ⁇ , ⁇ -trifluorotoluene) from 19 F-NMR analysis of the crude product, but it contained only 88.0 mg at the maximum. There wasn't. The yield was less than 5%.
- Fluoroamines targeted in the present invention can be used as intermediates for medicines and agricultural chemicals.
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Abstract
Description
本発明は、フルオロアミン類の製造方法に関する。 The present invention relates to a method for producing fluoroamines.
本特許出願人は、スルフリルフルオリド(SO2F2)と有機塩基の組み合わせ(必要に応じて「有機塩基とフッ化水素とからなる塩または錯体」の存在下に行う)によるアルコール類の脱ヒドロキシフッ素化反応を開示している(特許文献1)。また、本手法を用いる光学活性フルオロアミン類の製造方法も開示している(特許文献2)。 The applicant of the present patent application removes alcohols by a combination of sulfuryl fluoride (SO 2 F 2 ) and an organic base (performed in the presence of a “salt or complex comprising an organic base and hydrogen fluoride” as necessary). A hydroxyfluorination reaction is disclosed (Patent Document 1). Moreover, the manufacturing method of optically active fluoroamines using this method is also disclosed (patent document 2).
スルフリルフルオリドと有機塩基の組み合わせによるアミノアルコール類の脱ヒドロキシフッ素化反応では、アミノ基の保護基の選定が重要である。保護基で保護したアミノ基に求核性が残ると、隣接基関与による1,2-転位(特開2009-286779号公報)や、中間体のフルオロ硫酸エステル体への分子間求核攻撃等の副反応が起こる。特許文献1と2では、アミノ基の保護基としてフタロイル基とベンジリデン基を開示しているが、これらの保護基は第一級アミンにしか適用できず、第二級アミンには適用できない。 In the dehydroxyfluorination reaction of amino alcohols using a combination of sulfuryl fluoride and an organic base, it is important to select a protective group for the amino group. If the nucleophilicity remains in the amino group protected by the protecting group, 1,2-rearrangement involving neighboring groups (Japanese Patent Laid-Open No. 2009-286777), intermolecular nucleophilic attack on the fluorosulfate ester intermediate, etc. Side reaction occurs. Patent Documents 1 and 2 disclose a phthaloyl group and a benzylidene group as amino-protecting groups, but these protecting groups can be applied only to primary amines and not secondary amines.
この様な状況の下、スルフリルフルオリドと有機塩基の組み合わせによるアミノアルコール類の脱ヒドロキシフッ素化反応において、副反応が起こり難い好適なアミノ基の保護基が要望されている。 Under such circumstances, there is a demand for a suitable amino-protecting group in which side reactions are unlikely to occur in the dehydroxyfluorination reaction of amino alcohols by a combination of sulfuryl fluoride and an organic base.
本発明者らは、代表的なアミノ基の保護基[ベンジル(Bn)基、tert-ブトキシカルボニル(Boc)基、ベンジルオキシカルボニル(Cbz)基とアセチル(Ac)基]で保護したアミノアルコール類について、上記の脱ヒドロキシフッ素化反応を検討したが、目的とする反応は殆ど進行しなかった(比較例1~4を参照)。Boc基、Cbz基およびAc基で保護したアミノ基は、その求核性が十分に抑えられているものと考えられるが、この効果だけでは脱ヒドロキシフッ素化反応における好適なアミノ基の保護基に成り得なかった。 The present inventors have disclosed amino alcohols protected with typical amino-protecting groups [benzyl (Bn) group, tert-butoxycarbonyl (Boc) group, benzyloxycarbonyl (Cbz) group and acetyl (Ac) group]. The above-described dehydroxyfluorination reaction was examined, but the target reaction hardly proceeded (see Comparative Examples 1 to 4). The amino group protected with the Boc group, Cbz group and Ac group is considered to have sufficiently suppressed nucleophilicity, but this effect alone is a suitable amino group protecting group in the dehydroxyfluorination reaction. I couldn't.
一方で、メタンスルホニル基、ベンゼンスルホニル基およびパラトルエンスルホニル基で保護したアミノアルコール類では、所望の脱ヒドロキシフッ素化反応が良好に進行することを見出した。しかしながら、これらの保護基は副反応を伴わずに脱保護することができず、フルオロアミン類の製造方法という観点から発明を完結することができなかった。 On the other hand, it was found that the desired dehydroxyfluorination reaction proceeds well in amino alcohols protected with a methanesulfonyl group, a benzenesulfonyl group and a paratoluenesulfonyl group. However, these protecting groups could not be deprotected without side reactions, and the invention could not be completed from the viewpoint of a method for producing fluoroamines.
この様な状況の下、本発明者らは、鋭意検討した結果、フルオロアミン類の有用な製造方法を見出し、本発明に到達した。 Under such circumstances, as a result of intensive studies, the present inventors have found a useful method for producing fluoroamines and have reached the present invention.
すなわち、本発明は[発明1]~[発明12]を含み、フルオロアミン類の製造方法を提供する。 That is, the present invention includes [Invention 1] to [Invention 12] and provides a method for producing a fluoroamine.
[発明1]
一般式[1]:
で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させる脱ヒドロキシフッ素化工程を含む、一般式[2]:
で示されるフルオロアミン類保護体を製造する方法。
[Invention 1]
General formula [1]:
Which includes a dehydroxyfluorination step in which a protected amino alcohol represented by formula (2) is reacted with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base:
A process for producing a protected fluoroamine compound represented by the formula:
[発明2]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明1に記載の方法。
[Invention 2]
The method according to invention 1, wherein the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
[発明3]
一般式[3]:
で示されるアミノアルコール類のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[1]:
で示されるアミノアルコール類保護体に変換するアミノ基保護工程、
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[2]:
で示されるフルオロアミン類保護体に変換する脱ヒドロキシフッ素化工程、および
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[4]:
で示されるフルオロアミン類を製造する方法。
[Invention 3]
General formula [3]:
By protecting the amino group of the amino alcohol represented by general formula [1]:
An amino group protecting step for converting into a protected amino alcohol represented by
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [2]:
And a deprotection step for deprotecting the protecting group of the amino group of the protected fluoroamines, which is converted to a protected fluoroamines represented by the general formula [4]:
A process for producing a fluoroamine represented by the formula:
[発明4]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明3に記載の方法。
[Invention 4]
The method according to claim 3, wherein the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
[発明5]
一般式[5]:
で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させる脱ヒドロキシフッ素化工程を含む、一般式[6]:
で示されるフルオロアミン類保護体を製造する方法。
[Invention 5]
General formula [5]:
Which includes a dehydroxyfluorination step in which a protected amino alcohol represented by formula ( II ) is reacted with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base:
A process for producing a protected fluoroamine compound represented by the formula:
[発明6]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明5に記載の方法。
[Invention 6]
6. The method according to claim 5, wherein the dehydroxyfluorination step is performed in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
[発明7]
一般式[7]:
で示されるアミノアルコール類のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[5]:
で示されるアミノアルコール類保護体に変換するアミノ基保護工程、
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[6]:
で示されるフルオロアミン類保護体に変換する脱ヒドロキシフッ素化工程、および
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[8]:
で示されるフルオロアミン類を製造する方法。
[Invention 7]
General formula [7]:
By protecting the amino group of the amino alcohol represented by general formula [5]:
An amino group protecting step for converting into a protected amino alcohol represented by
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [6]:
And a deprotection step of deprotecting the protecting group of the amino group of the protected fluoroamines, which is converted to a protected fluoroamines represented by the general formula [8]:
A process for producing a fluoroamine represented by the formula:
[発明8]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明7に記載の方法。
[Invention 8]
The method according to invention 7, wherein the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
[発明9]
一般式[9]:
で示されるフルオロアミン類保護体を製造する方法。
[式中、Meはメチル基を表す。]
[Invention 9]
General formula [9]:
A process for producing a protected fluoroamine compound represented by the formula:
[Wherein, Me represents a methyl group. ]
[発明10]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明9に記載の方法。
[Invention 10]
The method according to invention 9, wherein the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
[発明11]
一般式[11]:
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[10]:
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[12]:
[式中、Meはメチル基を表す。]
[Invention 11]
General formula [11]:
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [10]:
[Wherein, Me represents a methyl group. ]
[発明12]
脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明11に記載の方法。
[Invention 12]
The method according to invention 11, wherein the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
本発明の好適な態様に依れば、スルフリルフルオリドと有機塩基の組み合わせによるアミノアルコール類の脱ヒドロキシフッ素化反応において、副反応が起こり難い好適なアミノ基の保護基を提供できる。また、本発明の好適な態様に依れば、原料基質のアミノアルコール類にはアミノ基とヒドロキシル基が共存するが、アミノ基保護工程においてアミノ基だけを選択的に保護することができる。さらに、本発明の好適な態様に依れば、脱保護工程において緩和な反応条件により副反応を伴わずに脱保護することができる。最後に、本発明の好適な態様に依れば、フルオロアミン類を高い純度で収率良く得ることができる。 According to the preferred embodiment of the present invention, it is possible to provide a suitable protecting group for an amino group that hardly causes a side reaction in the dehydroxyfluorination reaction of amino alcohols by a combination of sulfuryl fluoride and an organic base. Further, according to a preferred embodiment of the present invention, an amino group and a hydroxyl group coexist in the amino alcohol of the raw material substrate, but only the amino group can be selectively protected in the amino group protecting step. Furthermore, according to a preferred embodiment of the present invention, deprotection can be performed without side reactions under mild reaction conditions in the deprotection step. Finally, according to the preferred embodiment of the present invention, fluoroamines can be obtained with high purity and good yield.
本発明のフルオロアミン類の製造方法について詳細に説明する。 The method for producing the fluoroamines of the present invention will be described in detail.
本発明の好ましいフルオロアミン類の製造方法は、一般式[3]で示されるアミノアルコール類のアミノ基をニトロベンゼンスルホニル基で保護するアミノ基保護工程、一般式[1]で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリドと反応させる脱ヒドロキシフッ素化工程、および一般式[2]で示されるフルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程の3工程を含む。 A preferred method for producing fluoroamines of the present invention includes an amino group protecting step of protecting an amino group of an amino alcohol represented by the general formula [3] with a nitrobenzenesulfonyl group, and an amino alcohol protecting method represented by the general formula [1]. 3 steps: a dehydroxyfluorination step for reacting the product with sulfuryl fluoride in the presence of an organic base, and a deprotection step for deprotecting the protecting group of the amino group of the protected fluoroamine represented by the general formula [2] including.
1 アミノ基保護工程
初めに、アミノ基保護工程について具体的に説明する。
1 Amino Group Protection Step First, the amino group protection step will be specifically described.
一般式[3]で示されるアミノアルコール類のR1は、アルキル基、置換アルキル基、芳香環基または置換芳香環基を表す。該アルキル基は、炭素数1~18の、直鎖状もしくは分枝状の鎖式または環式(炭素数3以上の場合)のものである。該芳香環基は、炭素数1~18の、フェニル基、ナフチル基およびアントリル基等の芳香族炭化水素基、またはピロリル基(窒素保護体も含む)、ピリジル基、フリル基、チエニル基、インドリル基(窒素保護体も含む)、キノリル基、ベンゾフリル基およびベンゾチエニル基等の窒素原子、酸素原子もしくは硫黄原子等のヘテロ原子を含む芳香族複素環基である。該置換アルキル基および置換芳香環基は、それぞれ上記のアルキル基および芳香環基の、任意の炭素原子または窒素原子上に、任意の数および任意の組み合わせで、置換基を有する。係る置換基は、フッ素、塩素および臭素等のハロゲン原子、メチル基、エチル基およびプロピル基等の低級アルキル基、フルオロメチル基、クロロメチル基およびブロモメチル基等の低級ハロアルキル基、メトキシ基、エトキシ基およびプロポキシ基等の低級アルコキシ基、フルオロメトキシ基、クロロメトキシ基およびブロモメトキシ基等の低級ハロアルコキシ基、シアノ基、メトキシカルボニル基、エトキシカルボニル基およびプロポキシカルボニル基等の低級アルコキシカルボニル基、フェニル基、ナフチル基、アントリル基、ピロリル基(窒素保護体も含む)、ピリジル基、フリル基、チエニル基、インドリル基(窒素保護体も含む)、キノリル基、ベンゾフリル基およびベンゾチエニル基等の芳香環基、カルボキシル基の保護体、アミノ基の保護体、ならびにヒドロキシル基の保護体等である。なお、本明細書において、"低級"とは、炭素数1~6の、直鎖状もしくは分枝状の鎖式または環式(炭素数3以上の場合)であるものを意味する。また、上記の“係る置換基は”の芳香環基には、ハロゲン原子、低級アルキル基、低級ハロアルキル基、低級アルコキシ基、低級ハロアルコキシ基、シアノ基、低級アルコキシカルボニル基、カルボキシル基の保護体、アミノ基の保護体およびヒドロキシル基の保護体等が置換することもできる。さらに、ピロリル基、インドリル基、カルボキシル基、アミノ基およびヒドロキシル基の保護基は、Protective Groups in Organic Synthesis,Third Edition,1999,John Wiley & Sons,Inc.等に記載された保護基である。その中でもアルキル基および置換アルキル基が好ましく、メチル基が特に好ましい。 R 1 of the amino alcohol represented by the general formula [3] represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. The alkyl group is a linear or branched chain or cyclic group (having 3 or more carbon atoms) having 1 to 18 carbon atoms. The aromatic ring group is an aromatic hydrocarbon group having 1 to 18 carbon atoms such as a phenyl group, a naphthyl group and an anthryl group, or a pyrrolyl group (including a nitrogen protector), a pyridyl group, a furyl group, a thienyl group, an indolyl group. An aromatic heterocyclic group containing a hetero atom such as a nitrogen atom, oxygen atom or sulfur atom such as a group (including a nitrogen-protected form), a quinolyl group, a benzofuryl group and a benzothienyl group. The substituted alkyl group and the substituted aromatic ring group each have a substituent in any number and in any combination on any carbon atom or nitrogen atom of the above alkyl group and aromatic ring group. Such substituents include halogen atoms such as fluorine, chlorine and bromine, lower alkyl groups such as methyl, ethyl and propyl, lower haloalkyl groups such as fluoromethyl, chloromethyl and bromomethyl, methoxy and ethoxy Lower alkoxy groups such as propoxy group, lower haloalkoxy groups such as fluoromethoxy group, chloromethoxy group and bromomethoxy group, lower alkoxycarbonyl groups such as cyano group, methoxycarbonyl group, ethoxycarbonyl group and propoxycarbonyl group, phenyl group , Aromatic groups such as naphthyl, anthryl, pyrrolyl (including nitrogen protected), pyridyl, furyl, thienyl, indolyl (including nitrogen protected), quinolyl, benzofuryl and benzothienyl , Protector of carboxyl group, Protection of amino groups, as well as protection and the like of the hydroxyl groups. In the present specification, “lower” means a linear or branched chain or cyclic group (in the case of 3 or more carbon atoms) having 1 to 6 carbon atoms. In addition, the aromatic ring group of the “substituent” is a protected form of a halogen atom, a lower alkyl group, a lower haloalkyl group, a lower alkoxy group, a lower haloalkoxy group, a cyano group, a lower alkoxycarbonyl group, or a carboxyl group. The amino group protector and the hydroxyl group protector can be substituted. Furthermore, pyrrolyl, indolyl, carboxyl, amino and hydroxyl protecting groups are described in Protective Groups in Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc. And the like. Among these, an alkyl group and a substituted alkyl group are preferable, and a methyl group is particularly preferable.
一般式[3]で示されるアミノアルコール類のR2は、それぞれ独立に水素原子、アルキル基、置換アルキル基、芳香環基または置換芳香環基を表す。該アルキル基、置換アルキル基、芳香環基および置換芳香環基は、一般式[3]で示されるアミノアルコール類のR1において記載したアルキル基、置換アルキル基、芳香環基および置換芳香環基と同じである。R2が置換した炭素原子が不斉炭素の場合は、任意の立体化学(R体、S体またはラセミ体)を採ることができる。また、複数の不斉炭素が存在する場合は、任意の立体化学の組み合わせを採ることができる(例えば、2つの不斉炭素が存在する場合は、R,R体、R,S体、S,R体、S,S体または、これらの任意のジアステレオマー混合物)。さらに、一般式[3]で示されるアミノアルコール類の2つのR2が直接的にそれぞれ任意の炭素原子同士で、もしくは窒素原子[アミノ基の保護体も含まれ、保護基はニトロベンゼンスルホニル基に限定されず、前述の保護基の成書等に記載された保護基を採ることができる]、酸素原子もしくは硫黄原子を介して、共有結合により環状構造を採ることができ、この様な環状構造も請求項に含まれるものとする。その中でも水素原子、アルキル基および置換アルキル基が好ましく、水素原子が特に好ましい。 R 2 in the aminoalcohols represented by the general formula [3] each independently represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. The alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group are the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group described in R 1 of the amino alcohol represented by the general formula [3]. Is the same. When the carbon atom substituted by R 2 is an asymmetric carbon, any stereochemistry (R-form, S-form or racemic form) can be adopted. In addition, when a plurality of asymmetric carbons are present, any combination of stereochemistry can be taken (for example, when two asymmetric carbons are present, R, R isomer, R, S isomer, S, R form, S, S form, or any diastereomeric mixture thereof). Furthermore, two R 2 of the aminoalcohols represented by the general formula [3] are each directly between arbitrary carbon atoms or nitrogen atoms [including amino group protectors, and the protecting group is a nitrobenzenesulfonyl group. It is not limited, and the protecting group described in the above-mentioned book of the protecting group can be taken], and a cyclic structure can be taken by a covalent bond through an oxygen atom or a sulfur atom. Is also included in the claims. Among these, a hydrogen atom, an alkyl group, and a substituted alkyl group are preferable, and a hydrogen atom is particularly preferable.
一般式[3]で示されるアミノアルコール類のmは、2、3または4の整数を表す。その中でも2および3の整数が好ましく、整数2が特に好ましい。 M in the amino alcohol represented by the general formula [3] represents an integer of 2, 3 or 4. Among them, integers of 2 and 3 are preferable, and integer 2 is particularly preferable.
一般式[3]で示されるアミノアルコール類のnは、4、6または8の整数を表す。その中でも4および6の整数が好ましく、整数4が特に好ましい。整数mとnの関係は、mが整数2の時はnが整数4を採り、mが整数3の時はnが整数6を採り、mが整数4の時はnが整数8を採る。 N in the amino alcohol represented by the general formula [3] represents an integer of 4, 6 or 8. Among these, integers of 4 and 6 are preferable, and integer 4 is particularly preferable. Regarding the relationship between the integers m and n, when m is the integer 2, n takes the integer 4, when m is the integer 3, n takes the integer 6, and when m is the integer 4, n takes the integer 8.
一般式[3]で示されるアミノアルコール類の中でも、一般式[7]で示されるアミノアルコール類が好ましく、一般式[11]で示されるアミノアルコール類が特に好ましい。一般式[7]で示されるアミノアルコール類は、その多くが市販されており、大量規模での入手が容易である。一般式[11]で示されるアミノアルコール類は、これから得られる一般式[12]で示されるフルオロアミン類が医農薬中間体として重要である。 Among amino alcohols represented by the general formula [3], amino alcohols represented by the general formula [7] are preferable, and amino alcohols represented by the general formula [11] are particularly preferable. Many of the aminoalcohols represented by the general formula [7] are commercially available and are easily available on a large scale. Of the amino alcohols represented by the general formula [11], the fluoroamines represented by the general formula [12] obtained therefrom are important as intermediates for medicines and agrochemicals.
一般式[3]で示されるアミノアルコール類は、塩化水素、臭化水素および硫酸等の無機酸またはシュウ酸、フタル酸およびパラトルエンスルホン酸等の有機酸との塩の形で用いることもできる。 The aminoalcohols represented by the general formula [3] can also be used in the form of salts with inorganic acids such as hydrogen chloride, hydrogen bromide and sulfuric acid or organic acids such as oxalic acid, phthalic acid and paratoluenesulfonic acid. .
アミノ基保護工程は、有機合成における一般的な方法[例えば、前述の保護基の成書、日本化学会編第5版実験化学講座(丸善)等]を採用することにより行うことができる。具体的には、一般式[3]で示されるアミノアルコール類を塩基の存在下に、一般式[13]:
で示されるニトロベンゼンスルホニルハライドと反応させることにより、一般式[1]で示されるアミノアルコール類保護体を製造することができる。
The amino group protecting step can be carried out by employing a general method in organic synthesis [for example, the above-mentioned book of protecting groups, the Chemical Society of Japan, 5th edition experimental chemistry course (Maruzen), etc.]. Specifically, the amino alcohol represented by the general formula [3] is added in the presence of a base to the general formula [13]:
A protected amino alcohol represented by the general formula [1] can be produced by reacting with a nitrobenzenesulfonyl halide represented by the general formula [1].
一般式[1]におけるR1、R2、m、およびnは、一般式[3]におけるR1、R2、m、およびnと同じである。また、一般式[1]におけるP1は、オルト、メタまたはパラ-ニトロベンゼンスルホニル基を表す。 R 1, R 2, m, and n in the general formula [1] is the same as R 1, R 2, m, and n in the general formula [3]. In the general formula [1], P 1 represents an ortho, meta, or para-nitrobenzenesulfonyl group.
一般式[13]で示されるニトロベンゼンスルホニルハライドのニトロ基は、オルト、メタまたはパラ位に置換する。その中でもオルトおよびパラ位が好ましく、オルト位が特に好ましい。 The nitro group of the nitrobenzenesulfonyl halide represented by the general formula [13] is substituted at the ortho, meta or para position. Of these, the ortho and para positions are preferred, and the ortho position is particularly preferred.
一般式[13]で示されるニトロベンゼンスルホニルハライドのXは、ハロゲン原子を表す。該ハロゲン原子は、一般式[3]で示されるアミノアルコール類のR1の“係る置換基は”において記載したハロゲン原子と同じである。その中でも塩素および臭素が好ましく、塩素が特に好ましい。 X in the nitrobenzenesulfonyl halide represented by the general formula [13] represents a halogen atom. The halogen atom is the same as the halogen atom described in the “substituents for R 1 ” of R 1 of the amino alcohol represented by the general formula [3]. Of these, chlorine and bromine are preferable, and chlorine is particularly preferable.
一般式[13]で示されるニトロベンゼンスルホニルハライドの中でも、オルトおよびパラ-ニトロベンゼンスルホニルクロリドが好ましく、オルト-ニトロベンゼンスルホニルクロリドが特に好ましい。オルトおよびパラ-ニトロベンゼンスルホニルクロリドは、これらが市販されており、入手が容易である。オルト-ニトロベンゼンスルホニルクロリドは、より安価であり、大量規模での製造に好適である。 Among the nitrobenzenesulfonyl halides represented by the general formula [13], ortho and para-nitrobenzenesulfonyl chloride are preferable, and ortho-nitrobenzenesulfonyl chloride is particularly preferable. Ortho and para-nitrobenzenesulfonyl chloride are commercially available and are readily available. Ortho-nitrobenzenesulfonyl chloride is less expensive and is suitable for production on a large scale.
一般式[13]で示されるニトロベンゼンスルホニルハライドの使用量は、一般式[3]で示されるアミノアルコール類1molに対して0.7mol以上を用いれば良く、0.8~5molが好ましく、0.9~3molが特に好ましい。 The amount of the nitrobenzenesulfonyl halide represented by the general formula [13] may be 0.7 mol or more, preferably 0.8 to 5 mol, based on 1 mol of the amino alcohol represented by the general formula [3]. 9 to 3 mol is particularly preferred.
塩基は、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水酸化リチウム、水酸化ナトリウム、水酸化カリウムおよび水酸化セシウム等の無機塩基、ならびにトリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリn-ブチルアミン、ピリジン、2,6-ルチジン、2,4,6-コリジン、4-ジメチルアミノピリジン、1,5-ジアザビシクロ[4.3.0]ノナ-5-エンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン等の有機塩基である。その中でも有機塩基が好ましく、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、2,6-ルチジン、2,4,6-コリジン、4-ジメチルアミノピリジンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが特に好ましい。これらの塩基は単独でまたは組み合わせて用いることができる。 The base is an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide. , And triethylamine, diisopropylethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 2,6-lutidine, 2,4,6-collidine, 4-dimethylaminopyridine, 1,5-diazabicyclo [4.3. Organic bases such as 0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene. Among them, organic bases are preferable, and triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 2,4,6-collidine, 4-dimethylaminopyridine and 1,8-diazabicyclo [5.4.0] undec-7- En is particularly preferred. These bases can be used alone or in combination.
塩基の使用量は、一般式[3]で示されるアミノアルコール類1molに対して0.35mol以上を用いれば良く、0.4~20molが好ましく、0.45~15molが特に好ましい。一般式[3]で示されるアミノアルコール類を無機酸または有機酸との塩の形で用いる場合は、酸の中和に必要な塩基の使用量を加味して加えて、酸の中和とアミノ基の保護を同一の反応系で連続的に行うことが簡便である。酸の中和に用いる塩基は、上記の塩基と同じである。 The amount of the base used may be 0.35 mol or more, preferably 0.4 to 20 mol, particularly preferably 0.45 to 15 mol, relative to 1 mol of the aminoalcohol represented by the general formula [3]. When the amino alcohol represented by the general formula [3] is used in the form of a salt with an inorganic acid or an organic acid, it is added in consideration of the amount of base necessary for neutralizing the acid, It is convenient to continuously protect the amino group in the same reaction system. The base used for acid neutralization is the same as the above base.
塩基の添加順序は、特に制限はなく、反応溶媒に一般式[3]で示されるアミノアルコール類と一般式[13]で示されるニトロベンゼンスルホニルハライドを加え、最後に塩基を加えることにより好結果が得られる場合がある。 The order of addition of the base is not particularly limited, and an amino alcohol represented by the general formula [3] and a nitrobenzenesulfonyl halide represented by the general formula [13] are added to the reaction solvent and finally a base is added to achieve a good result. May be obtained.
反応溶媒は、n-ヘキサンおよびn-ヘプタン等の脂肪族炭化水素系、トルエンおよびキシレン等の芳香族炭化水素系、塩化メチレンおよび1,2-ジクロロエタン等のハロゲン系、テトラヒドロフランおよびtert-ブチルメチルエーテル等のエーテル系、酢酸エチルおよび酢酸n-ブチル等のエステル系、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミドおよび1,3-ジメチル-2-イミダゾリジノン等のアミド系、アセトニトリルおよびプロピオニトリル等のニトリル系、ジメチルスルホキシドならびに水等である。その中でもn-ヘプタン、トルエン、塩化メチレン、テトラヒドロフラン、酢酸エチル、N,N-ジメチルホルムアミド、アセトニトリル、ジメチルスルホキシドおよび水が好ましく、トルエン、塩化メチレン、テトラヒドロフラン、酢酸エチル、N,N-ジメチルホルムアミド、アセトニトリルおよび水が特に好ましい。これらの反応溶媒は単独でまたは組み合わせて用いることができる。水と組み合わせて用いる場合は、2相系で反応を行うこともできる。 Reaction solvents include aliphatic hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as toluene and xylene, halogens such as methylene chloride and 1,2-dichloroethane, tetrahydrofuran and tert-butyl methyl ether Ethers such as ethyl acetate and esters such as ethyl acetate and n-butyl acetate, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide and 1,3-dimethyl-2-imidazolidinone Amides such as acetonitrile, nitriles such as acetonitrile and propionitrile, dimethyl sulfoxide and water. Of these, n-heptane, toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile, dimethyl sulfoxide and water are preferable. Toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile And water are particularly preferred. These reaction solvents can be used alone or in combination. When used in combination with water, the reaction can be carried out in a two-phase system.
反応溶媒の使用量は、一般式[3]で示されるアミノアルコール類1molに対して0.05L(リットル)以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本反応は反応溶媒を用いずにニートの状態で行うこともできる。 The reaction solvent may be used in an amount of 0.05 L (liter) or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L with respect to 1 mol of the aminoalcohol represented by the general formula [3]. . This reaction can also be carried out neat without using a reaction solvent.
反応温度は、-80~+200℃の範囲で行えば良く、-60~+150℃が好ましく、-40~+100℃が特に好ましい。 The reaction temperature may be in the range of −80 to + 200 ° C., preferably −60 to + 150 ° C., particularly preferably −40 to + 100 ° C.
反応時間は、24時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be within a range of 24 hours or less, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
後処理は、有機合成における一般的な操作を採用することにより、一般式[1]で示されるアミノアルコール類保護体を得ることができる。粗生成物は、必要に応じて活性炭処理、分別蒸留、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。特に、一般式[3]で示されるアミノアルコール類の無機酸との塩や一般式[13]で示されるニトロベンゼンスルホニルハライドに由来するハロゲン化物イオンが不純物の副生原因になる場合がある(特開2010-163422号公報を参照)。この様な場合には、目的物を含む有機層の水洗やショートカラム等が効果的である。 In the post-treatment, a protected amino alcohol represented by the general formula [1] can be obtained by employing a general operation in organic synthesis. The crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary. In particular, a salt of an amino alcohol represented by the general formula [3] with an inorganic acid or a halide ion derived from the nitrobenzenesulfonyl halide represented by the general formula [13] may cause impurities as a by-product (special feature). (See Kai 2010-163422). In such a case, water washing of the organic layer containing the target product, a short column, etc. are effective.
2 脱ヒドロキシフッ素化工程
次に、脱ヒドロキシフッ素化工程について具体的に説明する。
2 Dehydroxyfluorination process Next, a dehydroxyfluorination process is demonstrated concretely.
脱ヒドロキシフッ素化工程は、一般式[1]で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]で示されるフルオロアミン類保護体を製造することができる。 In the dehydroxyfluorination step, the protected amino alcohol represented by the general formula [1] is reacted with sulfuryl fluoride in the presence of an organic base to obtain the protected fluoroamine represented by the general formula [2]. Can be manufactured.
一般式[2]におけるR1、R2、m、n、およびP1は、一般式[1]におけるR1、R2、m、n、およびP1と同じである。 R 1, R 2, m, n, and P 1 in the general formula [2] are the same as R 1, R 2, m, n, and P 1 in the general formula [1].
スルフリルフルオリドの使用量は、一般式[1]で示されるアミノアルコール類保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of sulfuryl fluoride used may be 0.7 mol or more, preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol, based on 1 mol of the protected amino alcohol represented by the general formula [1]. .
有機塩基は、アミノ基保護工程の塩基において記載した有機塩基と同じである。しかしながら、これらに限定されず、有機合成において一般的に用いられる有機塩基も採用することができる。その中でもトリエチルアミン、ジイソプロピルエチルアミン、トリn-ブチルアミン、ピリジン、2,6-ルチジン、2,4,6-コリジンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが好ましく、トリエチルアミン、ジイソプロピルエチルアミン、トリn-ブチルアミン、ピリジンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが特に好ましい。これらの有機塩基は単独でまたは組み合わせて用いることができる。 The organic base is the same as the organic base described in the base in the amino group protecting step. However, the organic base is not limited to these, and organic bases generally used in organic synthesis can also be employed. Among them, triethylamine, diisopropylethylamine, tri-n-butylamine, pyridine, 2,6-lutidine, 2,4,6-collidine and 1,8-diazabicyclo [5.4.0] undec-7-ene are preferable, triethylamine, Diisopropylethylamine, tri-n-butylamine, pyridine and 1,8-diazabicyclo [5.4.0] undec-7-ene are particularly preferred. These organic bases can be used alone or in combination.
有機塩基の使用量は、一般式[1]で示されるアミノアルコール類保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of the organic base used may be 0.7 mol or more, preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol, based on 1 mol of the protected amino alcohol represented by the general formula [1].
「有機塩基とフッ化水素とからなる塩または錯体」の有機塩基は、脱ヒドロキシフッ素化工程において記載した有機塩基と同じであり、“好ましい”および“特に好ましい”有機塩基も同じである。これらの「有機塩基とフッ化水素とからなる塩または錯体」の有機塩基は単独でまたは組み合わせて用いることができる。 The organic base of the “salt or complex comprising an organic base and hydrogen fluoride” is the same as the organic base described in the dehydroxyfluorination step, and the “preferred” and “particularly preferable” organic bases are also the same. These organic bases of “a salt or complex comprising an organic base and hydrogen fluoride” can be used alone or in combination.
「有機塩基とフッ化水素とからなる塩または錯体」の有機塩基とフッ化水素のmol比は、100:1から1:100の範囲で用いれば良く、50:1から1:50が好ましく、25:1から1:25が特に好ましい。アルドリッチ(Aldrich、2009-2010カタログ)から市販されている「トリエチルアミン1molとフッ化水素3molからなる錯体」または「ピリジン~30%(~10mol%)とフッ化水素~70%(~90mol%)からなる錯体」を用いるのが便利である。 The molar ratio of the organic base to hydrogen fluoride in the “salt or complex comprising an organic base and hydrogen fluoride” may be used in the range of 100: 1 to 1: 100, preferably 50: 1 to 1:50, Particularly preferred is 25: 1 to 1:25. Commercially available from Aldrich (2009-2010 catalog) “complex consisting of 1 mol of triethylamine and 3 mol of hydrogen fluoride” or “from pyridine˜30% (˜10 mol%) and hydrogen fluoride˜70% (˜90 mol%) It is convenient to use "complex".
「有機塩基とフッ化水素とからなる塩または錯体」を用いる場合の使用量は、一般式[1]で示されるアミノアルコール類保護体1molに対して、フッ化物イオン(F-)として0.05mol以上を用いれば良く、0.07~30molが好ましく、0.09~15molが特に好ましい。 The amount used in the case of using “a salt or complex comprising an organic base and hydrogen fluoride” is 0.001 as fluoride ion (F − ) with respect to 1 mol of the protected amino alcohol represented by the general formula [1]. 05 mol or more may be used, preferably 0.07 to 30 mol, particularly preferably 0.09 to 15 mol.
反応溶媒は、アミノ基保護工程において記載した水を除く反応溶媒と同じであり、“好ましい”および“特に好ましい”反応溶媒も同じである(当然、水を除く)。これらの反応溶媒は単独でまたは組み合わせて用いることができる。 The reaction solvent is the same as the reaction solvent excluding water described in the amino group protecting step, and the “preferred” and “particularly preferable” reaction solvents are the same (of course, excluding water). These reaction solvents can be used alone or in combination.
反応溶媒の使用量は、一般式[1]で示されるアミノアルコール類保護体1molに対して0.05L以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本反応は反応溶媒を用いずにニートの状態で行うこともできる。 The amount of the reaction solvent used may be 0.05 L or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L with respect to 1 mol of the protected amino alcohol represented by the general formula [1]. This reaction can also be carried out neat without using a reaction solvent.
反応温度は、-50~+200℃の範囲で行えば良く、-40~+150℃が好ましく、-30~+100℃が特に好ましい。 The reaction temperature may be in the range of −50 to + 200 ° C., preferably −40 to + 150 ° C., particularly preferably −30 to + 100 ° C.
反応時間は、48時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be within a range of 48 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, and nuclear magnetic resonance. It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
後処理は、有機合成における一般的な操作を採用することにより、一般式[2]で示されるフルオロアミン類保護体を得ることができる。粗生成物は、必要に応じて活性炭処理、分別蒸留、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。本工程の脱ヒドロキシフッ素化反応は二分子求核置換(SN2)反応で進行する。よって、原料基質が光学活性アルコールの場合は、目的物が立体化学の反転した光学活性フッ素化物として得られる。特に光学活性第二級アルコールの場合は、高い反転率で反応が進行する。 The post-treatment can employ a general operation in organic synthesis to obtain a protected fluoroamine represented by the general formula [2]. The crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary. The dehydroxyfluorination reaction in this step proceeds by a bimolecular nucleophilic substitution (S N 2) reaction. Therefore, when the raw material substrate is an optically active alcohol, the target product can be obtained as an optically active fluorinated product having an inverted stereochemistry. In particular, in the case of an optically active secondary alcohol, the reaction proceeds at a high inversion rate.
3 脱保護工程
最後に、脱保護工程について具体的に説明する。
3 Deprotection Step Finally, the deprotection step will be specifically described.
脱保護工程は、有機合成における一般的な方法[例えば、前述の保護基の成書、日本化学会編第5版実験化学講座(丸善)等]を採用することにより行うことができる。具体的には、一般式[2]で示されるフルオロアミン類保護体を塩基の存在下に、一般式[14]:
で示されるチオール類と反応させることにより、一般式[4]で示されるフルオロアミン類を製造することができる。
The deprotection step can be performed by employing a general method in organic synthesis [for example, the above-mentioned book of protecting groups, the Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc.]. Specifically, the protected fluoroamine represented by the general formula [2] is added in the presence of a base to the general formula [14]:
The fluoroamine represented by the general formula [4] can be produced by reacting with the thiol represented by the general formula [4].
一般式[4]におけるR1、R2、m、およびnは、一般式[3]におけるR1、R2、m、およびnと同じである。 R 1, R 2, m, and n in the general formula [4] are the same as R 1, R 2, m, and n in the general formula [3].
一般式[14]で示されるチオール類のR5は、アルキル基、置換アルキル基、芳香環基または置換芳香環基を表す。該アルキル基、置換アルキル基、芳香環基および置換芳香環基は、一般式[3]で示されるアミノアルコール類のR1において記載したアルキル基、置換アルキル基、芳香環基および置換芳香環基と同じである。その中でもアルキル基および芳香環基が好ましく、フェニル基が特に好ましい。チオフェノールは、反応性が高く、工業薬品として市販されている。 R 5 of the thiols represented by the general formula [14] represents an alkyl group, a substituted alkyl group, an aromatic ring group or a substituted aromatic ring group. The alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group are the alkyl group, substituted alkyl group, aromatic ring group and substituted aromatic ring group described in R 1 of the amino alcohol represented by the general formula [3]. Is the same. Among these, an alkyl group and an aromatic ring group are preferable, and a phenyl group is particularly preferable. Thiophenol is highly reactive and is commercially available as an industrial chemical.
一般式[14]で示されるチオール類の使用量は、一般式[2]で示されるフルオロアミン類保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of the thiol represented by the general formula [14] may be 0.7 mol or more with respect to 1 mol of the protected fluoroamine represented by the general formula [2], preferably 0.8 to 20 mol, .9 to 15 mol is particularly preferred.
塩基は、アミノ基保護工程において記載した塩基と同じである。その中でも無機塩基が好ましく、炭酸リチウム、炭酸ナトリウム、炭酸カリウムおよび炭酸セシウムが特に好ましい。これらの塩基は単独でまたは組み合わせて用いることができる。一般的な有機合成において、アミノ基の保護基としてニトロベンゼンスルホニル基を用いる場合は、脱保護の塩基として有機塩基の1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが多用される。しかしながら、本発明の脱保護工程では、無機塩基を用いる方が緩和な反応条件を採用することができ、副反応を伴わずに収率良く脱保護することができる(本発明の好ましい態様)。 The base is the same as the base described in the amino group protecting step. Among these, an inorganic base is preferable, and lithium carbonate, sodium carbonate, potassium carbonate, and cesium carbonate are particularly preferable. These bases can be used alone or in combination. In general organic synthesis, when a nitrobenzenesulfonyl group is used as a protecting group for an amino group, the organic base 1,8-diazabicyclo [5.4.0] undec-7-ene is frequently used as a deprotecting base. . However, in the deprotection step of the present invention, it is possible to employ milder reaction conditions when using an inorganic base, and it is possible to perform deprotection with good yield without side reactions (preferred embodiment of the present invention).
塩基の使用量は、一般式[2]で示されるフルオロアミン類保護体1molに対して0.35mol以上を用いれば良く、0.4~20molが好ましく、0.45~15molが特に好ましい。 The amount of the base used may be 0.35 mol or more, preferably 0.4 to 20 mol, particularly preferably 0.45 to 15 mol, relative to 1 mol of the protected fluoroamine represented by the general formula [2].
反応溶媒は、アミノ基保護工程において記載した反応溶媒と同じである。その中でもn-ヘプタン、トルエン、塩化メチレン、テトラヒドロフラン、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、アセトニトリルおよびジメチルスルホキシドが好ましく、テトラヒドロフラン、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、アセトニトリルおよびジメチルスルホキシドが特に好ましい。これらの反応溶媒は単独でまたは組み合わせて用いることができる。 The reaction solvent is the same as the reaction solvent described in the amino group protection step. Among them, n-heptane, toluene, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl Sulfoxides are preferred, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl sulfoxide are particularly preferred. These reaction solvents can be used alone or in combination.
反応溶媒の使用量は、一般式[2]で示されるフルオロアミン類保護体1molに対して0.05L以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本反応は反応溶媒を用いずにニートの状態で行うこともできる。 The amount of the reaction solvent used may be 0.05 L or more, preferably 0.1 to 20 L, particularly preferably 0.15 to 10 L, relative to 1 mol of the protected fluoroamine represented by the general formula [2]. This reaction can also be carried out neat without using a reaction solvent.
反応温度は、-50~+100℃の範囲で行えば良く、-40~+90℃が好ましく、-30~+80℃が特に好ましい。 The reaction temperature may be in the range of −50 to + 100 ° C., preferably −40 to + 90 ° C., particularly preferably −30 to + 80 ° C.
反応時間は、36時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be performed within 36 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
後処理は、有機合成における一般的な操作を採用することにより、一般式[4]で示されるフルオロアミン類を得ることができる。粗生成物は、必要に応じて活性炭処理、分別蒸留、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。目的物の沸点が低い場合は、反応終了液を直接、回収蒸留することが簡便である。また、目的物は、塩化水素、臭化水素および硫酸等の無機酸またはシュウ酸、フタル酸およびパラトルエンスルホン酸等の有機酸との塩の形で精製して得ることもできる。 In the post-treatment, a fluoroamine represented by the general formula [4] can be obtained by employing a general operation in organic synthesis. The crude product can be purified to a high purity by activated carbon treatment, fractional distillation, recrystallization, column chromatography or the like, if necessary. If the target product has a low boiling point, it is convenient to directly recover and distill the reaction-terminated liquid. The target product can also be obtained by purification in the form of a salt with an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or an organic acid such as oxalic acid, phthalic acid and paratoluenesulfonic acid.
[実施例]
実施例により本発明の実施の形態を具体的に説明するが、本発明はこれらの実施例に限定されるものではない。比較例1~4は、本発明とは異なるアミノ基の保護基を用いた場合の結果である。
[Example]
Embodiments of the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. Comparative Examples 1 to 4 are the results when an amino-protecting group different from the present invention was used.
塩化メチレン30.0mL(0.752L/mol)に、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;1.97(br、1H)、3.00(s、3H)、3.42(m、2H)、3.80(m、2H)、7.84(Ar、4H)。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 1.97 (br, 1H), 3.00 (s, 3H), 3.42 (m, 2H), 3 .80 (m, 2H), 7.84 (Ar, 4H).
ステンレス鋼(SUS)製耐圧反応容器に、上記で得られたアミノアルコール類保護体(精製品)5.93g(22.8mmol、1.00eq)、アセトニトリル23.0mL(1.01L/mol)、ジイソプロピルエチルアミン4.95g(38.3mmol、1.68eq)とジイソプロピルエチルアミン・三フッ化水素1.43g(7.56mmol、0.332eq)を加えて溶解し、-78℃の冷媒浴に浸し、スルフリルフルオリド6.30g(61.7mmol、2.71eq)をボンベより吹き込み、室温で4時間攪拌した。反応終了液に炭酸カリウム水溶液[炭酸カリウム3.00g(21.7mmol、0.952eq)と水30.0mLから調製]を加え、酢酸エチル60.0mLで抽出し、回収有機層を無水硫酸ナトリウムで乾燥し、減圧濃縮し、真空乾燥し、ショートカラム(シリカゲル/酢酸エチル:n-ヘキサン=2:1)で精製することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;3.03(s、3H)、3.61(m、2H)、4.62(m、2H)、7.83(Ar、4H)。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 3.03 (s, 3H), 3.61 (m, 2H), 4.62 (m, 2H), 7 .83 (Ar, 4H).
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-58.84(m、1F)。 19 F-NMR (reference material; C 6 F 6 , deuterated solvent; CDCl 3 ), δ ppm; −58.84 (m, 1F).
N,N-ジメチルホルムアミド20.0mL(2.03L/mol)に、上記で得られたフルオロアミン類保護体(精製品)2.58g(9.84mmol、1.00eq)と炭酸カリウム4.09g(29.6mmol/3.01eq)を加え、チオフェノール2.69g(24.4mmol、2.48eq)を0℃で加え、同温度で1時間攪拌した。反応終了液を直接、回収蒸留することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;2.48(s、3H)、2.87(m、2H)、4.54(m、2H)、アミノプロトンは帰属できず。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 2.48 (s, 3H), 2.87 (m, 2H), 4.54 (m, 2H), amino Proton cannot be assigned.
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-61.95(m、1F)。 19 F-NMR (reference material; C 6 F 6 , deuterated solvent; CDCl 3 ), δ ppm; −61.95 (m, 1F).
アセトニトリル2.20L(1.03L/mol)に、下記式:
ステンレス鋼(SUS)製耐圧反応容器に、上記で得られたアミノアルコール類保護体533g(2.05mol、1.00eq)、アセトニトリル500mL(0.244L/mol)、ジイソプロピルエチルアミン329g(2.55mol、1.24eq)とジイソプロピルエチルアミン・三フッ化水素39.7g(0.210mol、0.102eq)を加えて溶解し、氷浴に浸してスルフリルフルオリド246g(2.41mol、1.18eq)をボンベより吹き込み、室温で2.5時間攪拌した。反応終了液を減圧濃縮後、酢酸エチル500mLと水500mLを加えた。生じた結晶を濾過により分取した後に、濾液に酢酸エチル1.00Lと水500mLを加えて2層分離を行った。得られた有機層を水1.00Lで2回、続いて塩化ナトリウム50.0gを含む食塩水500mLにて洗浄した。減圧濃縮後、酢酸エチル1.20Lとn-ヘプタン1.20Lにより再沈殿を行い、先に分取した結晶と合わせて真空乾燥を行い、下記式:
1,3-ジメチル-2-イミダゾリジノン300mL(0.987L/mol)に、上記で得られたフルオロアミン類保護体79.6g(304mmol、1.00eq)、チオフェノール53.7g(487mmol、1.60eq)と炭酸カリウム82.2g(595mmol、1.96eq)を0℃で加え、室温にて3時間攪拌した。反応終了液を直接、回収蒸留することにより、下記式:
アセトニトリル53.0mL(0.987L/mol)に、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;1.82(m、2H)、2.65(br、1H)、2.93(s、3H)、3.38(m、2H)、3.70(m、2H)、7.60-7.70(Ar、3H)、7.96(Ar、1H)。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 1.82 (m, 2H), 2.65 (br, 1H), 2.93 (s, 3H), 3 .38 (m, 2H), 3.70 (m, 2H), 7.60-7.70 (Ar, 3H), 7.96 (Ar, 1H).
ステンレス鋼(SUS)製耐圧反応容器に、上記で得られたアミノアルコール類保護体2.91g(10.6mmol、1.00eq)、アセトニトリル11.0mL(1.04L/mol)、ジイソプロピルエチルアミン1.65g(12.8mmol、1.21eq)とジイソプロピルエチルアミン・三フッ化水素200mg(1.06mmol、0.100eq)を加えて溶解し、0℃でスルフリルフルオリド4.60g(45.1mmol、4.25eq)をボンベより吹き込み、室温で3.5時間攪拌した。反応終了液に炭酸カリウム水溶液[炭酸カリウム830mg(6.01mmol、0.567eq)と水10.0mLから調製]を加え、酢酸エチル40.0mLで抽出した。有機層を水20.0mL、食塩水20.0mLにて洗浄後、無水硫酸ナトリウムで乾燥した。これを減圧濃縮後、ショートカラム(シリカゲル/酢酸エチル:n-ヘキサン=2:1)で精製することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;1.95-2.06(m、2H)、2.94(s、3H)、3.39(m、2H)、4.46(m、1H)、4.58(m、1H)、7.60-7.70(Ar、3H)、7.99(Ar、1H)。 1 H-NMR (reference material; Me 4 Si, heavy solvent; CDCl 3 ), δ ppm; 1.95-2.06 (m, 2H), 2.94 (s, 3H), 3.39 (m, 2H), 4.46 (m, 1H), 4.58 (m, 1H), 7.60-7.70 (Ar, 3H), 7.99 (Ar, 1H).
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-59.85(m、1F)。 19 F-NMR (reference material; C 6 F 6 , deuterated solvent; CDCl 3 ), δ ppm; −59.85 (m, 1F).
1,3-ジメチル-2-イミダゾリジノン8.50mL(1.0L/mol)に、上記で得られたフルオロアミン類保護体(精製品)2.34g(8.47mmol、1.00eq)と炭酸カリウム2.28g(16.5mmol、1.95eq)を加え、チオフェノール1.50g(13.6mmol、1.61eq)を0℃で加え、室温で3日間攪拌した。反応終了液を直接、回収蒸留することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;2.00(m、2H)、2.46(s、3H)、2.75(m、2H)、4.48(m、1H)、4.59(m、1H)、アミノプロトンは帰属できず。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 2.00 (m, 2H), 2.46 (s, 3H), 2.75 (m, 2H), 4 .48 (m, 1H), 4.59 (m, 1H), amino proton cannot be assigned.
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-59.82(m、1F)。 19 F-NMR (reference material; C 6 F 6 , deuterated solvent; CDCl 3 ), δ ppm; −59.82 (m, 1F).
アセトニトリル50.0mL(0.998L/mol)に、バリノール5.70g(55.3mmol、1.10eq)とトリエチルアミン5.52g(54.6mmol、1.09eq)を加えて溶解し、オルト-ニトロベンゼンスルホニルクロリド11.1g(50.1mmol、1.00eq)を0℃で加え、室温で終夜攪拌した。反応終了後、酢酸エチル40.0mLと水20.0mLを加えて2層分離し、水層を酢酸エチル30.0mLにて2回再抽出した。有機層を合わせ、少量のシリカゲルカラムに有機層を通した後に減圧濃縮を行った。得られた濃縮物をアセトニトリル50.0mLとN,N-ジメチルホルムアミド50.0mLに溶解した後に、ヨードメタン10.9g(76.8mmol、1.53eq)と60%水素化ナトリウム2.39g(59.8mmol、1.19eq)を添加した後に50℃で3時間撹拌した。反応終了後、酢酸エチル300mLと水40.0mLを加えて2層分離を行い、水層を酢酸エチル40.0mLで再抽出した。有機層を合わせ、少量のシリカゲルカラムに有機層を通した後に減圧濃縮を行い、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.83(d、3H)、0.96(d、3H)、1.77(m、1H)、1.97(m、1H)、2.93(s、3H)、3.57(m、2H)、3.85(m、1H)、7.60-7.70(Ar、3H)、8.05(Ar、1H)。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 0.83 (d, 3H), 0.96 (d, 3H), 1.77 (m, 1H), 1 .97 (m, 1H), 2.93 (s, 3H), 3.57 (m, 2H), 3.85 (m, 1H), 7.60-7.70 (Ar, 3H), 8. 05 (Ar, 1H).
ステンレス鋼(SUS)製耐圧反応容器に、上記で得られたアミノアルコール類保護体3.33g(11.0mmol、1.00eq)、アセトニトリル11.0mL(1.00L/mol)、ジイソプロピルエチルアミン1.76g(13.6mmol、1.24eq)とジイソプロピルエチルアミン・三フッ化水素200mg(1.06mmol、0.0964eq)を加えて溶解し、0℃でスルフリルフルオリド4.00g(39.2mmol、3.56eq)をボンベより吹き込み、室温で3時間攪拌した。反応終了液に炭酸カリウム水溶液[炭酸カリウム820mg(5.93mmol、0.539eq)と水20.0mLから調製]を加え、酢酸エチル30.0mLで抽出した。有機層を水20.0mLで2回洗浄後、無水硫酸ナトリウムで乾燥した。減圧濃縮後、ショートカラム(シリカゲル/酢酸エチル:n-ヘキサン=1:1)で精製することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.92(d、3H)、1.04(d、3H)、2.04(m、1H)、2.97(s、3H)、3.72(m、1H)、4.49-4.71(m、2H)、7.60-7.70(Ar、3H)、8.00(Ar、1H)。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 0.92 (d, 3H), 1.04 (d, 3H), 2.04 (m, 1H), 2 .97 (s, 3H), 3.72 (m, 1H), 4.49-4.71 (m, 2H), 7.60-7.70 (Ar, 3H), 8.00 (Ar, 1H) ).
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-66.71(m、1F)。 19 F-NMR (reference material; C 6 F 6 , heavy solvent; CDCl 3 ), δ ppm; −66.71 (m, 1F).
1,3-ジメチル-2-イミダゾリジノン10.0mL(0.935L/mol)に、上記で得られたフルオロアミン類保護体3.26g(10.7mmol、1.00eq)と炭酸カリウム2.66g(19.2mmol、1.79eq)を加え、チオフェノール1.68g(15.2mmol、1.42eq)を0℃で加え、室温で終夜攪拌した。反応終了液を直接、回収蒸留することにより、下記式:
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.96(m、6H)、1.88(m、1H)、2.48(m、4H)、4.30-4.60(m、2H)、アミノプロトンは帰属できず。 1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 0.96 (m, 6H), 1.88 (m, 1H), 2.48 (m, 4H), 4 .30-4.60 (m, 2H), amino proton cannot be assigned.
19F-NMR(基準物質;C6F6、重溶媒;CDCl3)、δ ppm;-67.57(m、1F)。 19 F-NMR (reference material; C 6 F 6 , heavy solvent; CDCl 3 ), δ ppm; −67.57 (m, 1F).
[比較例1]
ステンレス鋼(SUS)製耐圧反応容器に、下記式:
In a pressure resistant reaction vessel made of stainless steel (SUS), the following formula:
[比較例2]
ステンレス鋼(SUS)製耐圧反応容器に、下記式:
In a pressure resistant reaction vessel made of stainless steel (SUS), the following formula:
[比較例3]
ステンレス鋼(SUS)製耐圧反応容器に、下記式:
In a pressure resistant reaction vessel made of stainless steel (SUS), the following formula:
[比較例4]
ステンレス鋼(SUS)製耐圧反応容器に、下記式:
In a pressure resistant reaction vessel made of stainless steel (SUS), the following formula:
本発明で対象とするフルオロアミン類は医農薬中間体として利用できる。 Fluoroamines targeted in the present invention can be used as intermediates for medicines and agricultural chemicals.
Claims (12)
で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させる脱ヒドロキシフッ素化工程を含む、一般式[2]:
で示されるフルオロアミン類保護体を製造する方法。 General formula [1]:
Which includes a dehydroxyfluorination step in which a protected amino alcohol represented by formula (2) is reacted with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base:
A process for producing a protected fluoroamine compound represented by the formula:
で示されるアミノアルコール類のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[1]:
で示されるアミノアルコール類保護体に変換するアミノ基保護工程、
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[2]:
で示されるフルオロアミン類保護体に変換する脱ヒドロキシフッ素化工程、および
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[4]:
で示されるフルオロアミン類を製造する方法。 General formula [3]:
By protecting the amino group of the amino alcohol represented by general formula [1]:
An amino group protecting step for converting into a protected amino alcohol represented by
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [2]:
And a deprotection step for deprotecting the protecting group of the amino group of the protected fluoroamines, which is converted to a protected fluoroamines represented by the general formula [4]:
A process for producing a fluoroamine represented by the formula:
で示されるアミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させる脱ヒドロキシフッ素化工程を含む、一般式[6]:
で示されるフルオロアミン類保護体を製造する方法。 General formula [5]:
Which includes a dehydroxyfluorination step in which a protected amino alcohol represented by formula ( II ) is reacted with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base:
A process for producing a protected fluoroamine compound represented by the formula:
で示されるアミノアルコール類のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[5]:
で示されるアミノアルコール類保護体に変換するアミノ基保護工程、
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[6]:
で示されるフルオロアミン類保護体に変換する脱ヒドロキシフッ素化工程、および
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[8]:
で示されるフルオロアミン類を製造する方法。 General formula [7]:
By protecting the amino group of the amino alcohol represented by general formula [5]:
An amino group protecting step for converting into a protected amino alcohol represented by
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [6]:
And a deprotection step of deprotecting the protecting group of the amino group of the protected fluoroamines, which is converted to a protected fluoroamines represented by the general formula [8]:
A process for producing a fluoroamine represented by the formula:
[式中、Meはメチル基を表す。] General formula [9]:
[Wherein, Me represents a methyl group. ]
該アミノアルコール類保護体を有機塩基の存在下にスルフリルフルオリド(SO2F2)と反応させることにより、一般式[10]:
該フルオロアミン類保護体のアミノ基の保護基を脱保護する脱保護工程を含む、一般式[12]:
[式中、Meはメチル基を表す。] General formula [11]:
By reacting the protected amino alcohol with sulfuryl fluoride (SO 2 F 2 ) in the presence of an organic base, the general formula [10]:
[Wherein, Me represents a methyl group. ]
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| CN201280006135.8A CN103328439B (en) | 2011-01-21 | 2012-01-19 | Method for producing fluoroamine |
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| JP2012-003742 | 2012-01-12 | ||
| JP2012003742A JP5857750B2 (en) | 2011-01-21 | 2012-01-12 | Method for producing fluoroamines |
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| CN117466742B (en) * | 2023-10-23 | 2025-12-26 | 扬州工业职业技术学院 | A method for one-pot synthesis of β-nitro alcohols from alcohol compounds as starting materials |
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| WO2010047266A1 (en) * | 2008-10-22 | 2010-04-29 | セントラル硝子株式会社 | Method for producing fluorosulfuric acid ester |
| WO2010055755A1 (en) * | 2008-11-11 | 2010-05-20 | セントラル硝子株式会社 | PROCESS FOR PRODUCING α-SUBSTITUTED ESTER |
| WO2010071129A1 (en) * | 2008-12-17 | 2010-06-24 | セントラル硝子株式会社 | Method for manufacturing hydroxyl group substitution product |
| WO2010113835A1 (en) * | 2009-03-31 | 2010-10-07 | セントラル硝子株式会社 | Method for producing imidic acid compound |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5369853B2 (en) * | 2008-04-28 | 2013-12-18 | セントラル硝子株式会社 | Process for producing α-fluoro-β-amino acids |
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2012
- 2012-01-12 JP JP2012003742A patent/JP5857750B2/en not_active Expired - Fee Related
- 2012-01-19 WO PCT/JP2012/051024 patent/WO2012099184A1/en not_active Ceased
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| JPH08151351A (en) * | 1994-11-28 | 1996-06-11 | Mitsui Toatsu Chem Inc | Method for producing chloroalkylamine hydrochloride |
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| CN103328439B (en) | 2015-01-28 |
| JP2012162517A (en) | 2012-08-30 |
| CN103328439A (en) | 2013-09-25 |
| JP5857750B2 (en) | 2016-02-10 |
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