WO2011015550A1 - Système évaporateur pour des couches et composants organiques - Google Patents
Système évaporateur pour des couches et composants organiques Download PDFInfo
- Publication number
- WO2011015550A1 WO2011015550A1 PCT/EP2010/061202 EP2010061202W WO2011015550A1 WO 2011015550 A1 WO2011015550 A1 WO 2011015550A1 EP 2010061202 W EP2010061202 W EP 2010061202W WO 2011015550 A1 WO2011015550 A1 WO 2011015550A1
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- WO
- WIPO (PCT)
- Prior art keywords
- organic
- heated
- substrate
- mixture
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/34—Applying different liquids or other fluent materials simultaneously
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the invention relates to a process for producing organic layers, organic multilayer systems or organic components, in particular organic
- OLEDs organic light emitting diodes
- OFET organic field effect transistors
- the invention relates to organic layers, organic multilayer systems or organic
- Organic solar cells consist of a sequence of thinner ones
- Contacting can be effected by metal layers, transparent conductive oxides (TCOs) and / or transparent conductive polymers (PEDOT-PSS, PANI).
- TCOs transparent conductive oxides
- PEDOT-PSS transparent conductive polymers
- a solar cell converts light energy into electrical energy.
- photoactive is understood here, namely the conversion of light energy into electrical power.
- organic-based devices over conventional inorganic-based devices (semiconductors such as silicon, gallium arsenide) is the sometimes extremely high optical absorption coefficients (up to 2 ⁇ 10 5 cm -1 ), which offers the possibility of low material and material costs Energy expenditure to produce very thin solar cells. Further technological aspects are the low cost, the possibility of producing flexible large-area components on plastic films, and the almost unlimited possibilities of variation and the unlimited availability of organic chemistry.
- semiconductor-based devices semiconductorsemiconductors such as silicon, gallium arsenide
- n or p denotes an n- or p-type doping, which leads to an increase in the density of free electrons or holes in the thermal equilibrium state. In this sense, such layers are primarily to be understood as transport layers.
- i-layer designates an undoped layer (intrinsic layer).
- One or more i-layer (s) may in this case consist of layers of a material as well as a mixture of two materials (so-called interpenetrating networks). The light incident through the transparent base contact generates excitons in the i-layer or in the n- / p-layer. These excitons can only by very high electrical
- the transport layers are transparent or largely transparent materials with a wide band gap (wide-gap).
- wide-gap materials here materials are referred to, the absorption maximum in the wavelength range ⁇ 450 nm, preferably at ⁇ 400 nm.
- Thin films certainly fulfill this criterion.
- the use of monocrystalline organic materials is not possible and the production of multiple layers with sufficient structural perfection is still very difficult.
- the i-layer is a mixed layer
- phase separation Material in the mixed layer. This partial segregation is referred to as phase separation.
- the equilibrium charge carrier concentration in the layer is increased and the conductivity is increased.
- the doped layers are used as injection layers on the
- Patent application EP0000829 or a mixed layer
- ADABCO materials are as
- small molecules are understood to mean non-polymeric organic molecules having monodisperse molecular weights of between 100 and 2,000 Under normal pressure (air pressure of the surrounding atmosphere) and at
- these small molecules can also be photoactive, it being understood under photoactive that the molecules are under Light incidence change its charge state.
- a deposition in a low-pressure gas phase organic vapor phase deposition, OVPD, eg US20083112966.
- OVPD organic vapor phase deposition
- the organic material in the unheated state, is in solid form and it is also the only material that is converted to the gas phase.
- a ceramic or a metal may be present which preferably has a highly porous form
- Evaporation temperatures often between 200 and 400 0 C, in some cases even more than 500 0 C and these temperatures survive many organic molecules not decomposition.
- the evaporator sources must be filled with so much material that ideally an uninterrupted production for one week is possible.
- the organic materials must withstand the high temperatures inside the evaporator without decomposition for at least one or more days.
- tracking systems are currently being discussed: In these systems, the actual amount of organics is in a separate container or chamber and is gradually introduced gradually into the source space. This is eg over pressed pellets, which have a chute in the
- Tracking system are technically very difficult to implement and thus complex and expensive.
- a special problem is that the unit that tracks the material must not be evaporated with material, otherwise the tracking system will become "clogged".
- the invention is therefore based on the object
- the base pressure without running coating is in the range 10 ⁇ 2 to 10 -10 mbar, if the deposition is a gas stream, the pressure suitable surfaces of up to 10 ⁇ ° mbar be high) located.
- the object is achieved by a method for the deposition of organic materials according to claim 1.
- the source of the evaporator system is constructed so that in it the organic material to be deposited is mixed in a further material, wherein the further material serves as a carrier material and the mixture of both materials or at least as Carrier material serving further material is present in liquid or supercritical form,
- the support material can in this process in a predominant ratio (> 10 times the mol
- a vacuum system containing such a source is one
- the organic material is not solid, but in dissolved form.
- the organic material is simply dissolved in a solvent.
- a solvent For better solubility, it can be the
- Solvent (co-solvent) should be present to the
- a plurality of organic materials may be dissolved to form a mixed layer or a doped layer of a
- the solvent in the supercritical state also called supercritical state or super- / supercritical fluid:
- the three phases are first distinguished solid, liquid and gaseous.
- the p (T) diagram also called phase diagram, there are clear boundaries of the three phases, which are referred to as sublimation curve, melting curve and vapor pressure curve.
- the solvent is first liquefied in a condenser. Before it flows into the extractor, the fluid becomes the extraction pressure pE
- the fluid loads with the substance to be micronized.
- the loading yE depends strongly on the extraction pressure pE, the TE extraction temperature and the residence time in the extractor.
- the supercritical solution is heated to the desired pre-expansion temperature TO.
- the material system one can influence the size of the particles via the temperature TO, and on the other hand one becomes
- Particles are deposited on a filter that
- the supercritical phase of a solvent is used to dissolve therein the organic material and then to expand this supercritical mixture through a nozzle into a vacuum system in which the dissolved organic
- Material can be deposited on a surface to be coated. This is the formerly supercritical
- the nozzle is heated to supply the necessary heat of vaporization for fluid and the organic material to be vaporized and to prevent clogging of the nozzle.
- the organic material to be transported is transferred by the expansion in its gas phase and from this deposited on a surface to be coated or on a heated plate. This is very advantageous if molecular films with particularly low crystallinity are to be produced.
- a particular advantage of the present invention is that it is possible to use various substances as solvents which otherwise behave completely inert both with regard to the organic substances and with respect to the surfaces to be coated and the organic materials which may have already been deposited on them.
- Another advantage is the possibility of using substances as solvents which do not dissolve the organic materials to be deposited under normal pressure.
- substances whose critical temperature Tc ⁇ 600 K and whose critical pressure pc is ⁇ 25 MPa can be used as the solvent.
- Solvent nor ammonia, water, methanol, propanol, methane and also fluoroalkanes or hydrofluoroalkanes in question.
- more than one organic substance is deposited simultaneously.
- the mixing ratio of the materials to be separated can thus already be adjusted in the supercritical phase.
- particles, ie clusters of the organic material are formed after exiting the nozzle. In such a case, the layers deposited on the substrate will also become bulk of them
- Particles or clusters exist. This can be for the
- the particles may be in crystalline form. Especially if two different
- organic materials can be used, so can the
- the organic material is not present in the form of particles in the vacuum, but isolated. In the case of small molecules, at least a large proportion of the molecules should then be present individually.
- particle formation at the nozzle may be e.g. be prevented by suitable pressure and temperature conditions to evaporate the organic material as completely as possible.
- the resulting particles are then separated:
- a heated component Figure 3
- This component may be a plate, or a tube, possibly in a porous form with enlarged
- the object formed therefrom can then be referred to as an evaporator and as such for
- the organic material is in supercritical carbon dioxide (CO2), xenon, ethane, propane, butane, ethyne, ethene, ethanol,
- an organic component is produced, which is used as an organic pin solar cell or
- an organic component is produced, which is pronounced as organic light emitting diode (OLED), organic memory device, organic transistor or organic diode.
- OLED organic light emitting diode
- Multi-layer system or an organic device can be produced using supercritical organic materials.
- Materials or at least serving as a carrier material further material is formed as a fluid and this
- Material mixture is expanded into the vacuum of a coating system.
- a fluid is considered both a liquid phase and a supercritical phase of the carrier material.
- the deposition is via adjustable process parameters, such as
- the material mixture is stored in a container.
- Container is located outside of the serving for coating vacuum chamber.
- the increased pressure refers relative to the pressure of the
- a further co-carrier material or co-solvent is present in the material mixture.
- it is a continuous process.
- it is a continuous process which requires refilling at the earliest after 10 hours, preferably after 50 hours.
- substances whose critical temperature Tc ⁇ 600 K, in particular Tc ⁇ 450 K and their critical pressure pc ⁇ 25 MPa are used as carrier material.
- the organic material is selected in a material selected from the group consisting of carbon dioxide (CO 2 ), xenon, ethane,
- more than one organic material is dissolved in the carrier material.
- more than one organic material is dissolved in the carrier material and the various organic materials are simultaneously deposited on the substrate.
- At least one organic material is a small molecule. In a further embodiment of the invention, at least one organic material is a
- the deposition is carried out on a heated substrate, wherein the substrate is heated to such a temperature that the
- Layer of the deposited organic material on the substrate is achieved.
- the heated component is a tube. In a further embodiment of the invention, the heated component is a plate.
- the heated component is a free-formed surface.
- the heated component has a porous shape with enlarged
- the carrier material is pumped out of the coating plant and then used again for the production of the material mixture.
- the expansion takes place in the vacuum chamber by means of a nozzle.
- the nozzle is heated.
- the nozzle is heated.
- an organic layer by means of the method according to the invention or the device according to the invention an organic layer, an organic
- Multilayer system or an organic device in particular an organic solar cell, an organic light emitting diode (OLED), an organic thin film memory, an organic laser or an organic field effect transistor (OFET).
- OLED organic light emitting diode
- OFET organic field effect transistor
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
L'invention porte sur un procédé de fabrication de couches organiques, de systèmes multicouches organiques ou de composants organiques, en particulier de cellules solaires organiques, de diodes électroluminescentes organiques ou (OLED), de mémoires à couche mince organiques, de lasers organiques ou de transistors à effet de champ organiques (OFET). En particulier, l'invention porte sur un procédé suivant lequel on produit une couche organique ou un système multicouche organique ou un composant organique en utilisant des matériaux organiques hypercritiques.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009035876 | 2009-08-03 | ||
| DE102009035876.5 | 2009-08-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2011015550A1 true WO2011015550A1 (fr) | 2011-02-10 |
Family
ID=42938527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2010/061202 Ceased WO2011015550A1 (fr) | 2009-08-03 | 2010-08-02 | Système évaporateur pour des couches et composants organiques |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2011015550A1 (fr) |
Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0000829A1 (fr) | 1977-08-02 | 1979-02-21 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Elément transducteur photo-électrique |
| US4582731A (en) * | 1983-09-01 | 1986-04-15 | Battelle Memorial Institute | Supercritical fluid molecular spray film deposition and powder formation |
| US5093698A (en) | 1991-02-12 | 1992-03-03 | Kabushiki Kaisha Toshiba | Organic electroluminescent device |
| US20020187272A1 (en) * | 1999-11-26 | 2002-12-12 | Asahi Glass Company Limited | Method and apparatus for forming thin film of organic material |
| US6559375B1 (en) | 1998-11-27 | 2003-05-06 | Dieter Meissner | Organic solar cell or light-emitting diode |
| EP1391944A2 (fr) * | 2002-08-21 | 2004-02-25 | Eastman Kodak Company | Ensemble d'éclairage à solide utilisant une couche liquide comprimée |
| DE102004014046A1 (de) | 2003-03-19 | 2004-09-30 | Technische Universität Dresden | Photoaktives Bauelement mit organischen Schichten |
| US20050110005A1 (en) | 2003-11-26 | 2005-05-26 | Forrest Stephen R. | Bipolar organic devices |
| US20050221018A1 (en) * | 2004-03-31 | 2005-10-06 | Eastman Kodak Company | Process for the deposition of uniform layer of particulate material |
| US20060041248A1 (en) * | 2004-08-23 | 2006-02-23 | Patton David L | Pharmaceutical compositions delivery system and methods |
| WO2006092134A1 (fr) | 2005-03-04 | 2006-09-08 | Heliatek Gmbh | Composant photoactif organique |
| WO2006092135A1 (fr) | 2005-03-04 | 2006-09-08 | Heliatek Gmbh | Composant photoactif a couches organiques |
| WO2006100058A2 (fr) | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Dispositif de chauffage, installation de revetement et procede pour mettre en oeuvre la vaporisation ou la sublimation de matieres de revetement |
| US20080311296A1 (en) | 2001-09-04 | 2008-12-18 | The Trustees Of Princeton University | Device and Method for Organic Vapor Jet Deposition |
-
2010
- 2010-08-02 WO PCT/EP2010/061202 patent/WO2011015550A1/fr not_active Ceased
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0000829A1 (fr) | 1977-08-02 | 1979-02-21 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Elément transducteur photo-électrique |
| US4582731A (en) * | 1983-09-01 | 1986-04-15 | Battelle Memorial Institute | Supercritical fluid molecular spray film deposition and powder formation |
| US5093698A (en) | 1991-02-12 | 1992-03-03 | Kabushiki Kaisha Toshiba | Organic electroluminescent device |
| US6559375B1 (en) | 1998-11-27 | 2003-05-06 | Dieter Meissner | Organic solar cell or light-emitting diode |
| US20020187272A1 (en) * | 1999-11-26 | 2002-12-12 | Asahi Glass Company Limited | Method and apparatus for forming thin film of organic material |
| US20080311296A1 (en) | 2001-09-04 | 2008-12-18 | The Trustees Of Princeton University | Device and Method for Organic Vapor Jet Deposition |
| EP1391944A2 (fr) * | 2002-08-21 | 2004-02-25 | Eastman Kodak Company | Ensemble d'éclairage à solide utilisant une couche liquide comprimée |
| DE102004014046A1 (de) | 2003-03-19 | 2004-09-30 | Technische Universität Dresden | Photoaktives Bauelement mit organischen Schichten |
| WO2004083958A2 (fr) | 2003-03-19 | 2004-09-30 | Technische Universität Dresden | Composant photo-actif presentant des couches organiques |
| US20050110005A1 (en) | 2003-11-26 | 2005-05-26 | Forrest Stephen R. | Bipolar organic devices |
| US20050221018A1 (en) * | 2004-03-31 | 2005-10-06 | Eastman Kodak Company | Process for the deposition of uniform layer of particulate material |
| US20060041248A1 (en) * | 2004-08-23 | 2006-02-23 | Patton David L | Pharmaceutical compositions delivery system and methods |
| WO2006092134A1 (fr) | 2005-03-04 | 2006-09-08 | Heliatek Gmbh | Composant photoactif organique |
| WO2006092135A1 (fr) | 2005-03-04 | 2006-09-08 | Heliatek Gmbh | Composant photoactif a couches organiques |
| WO2006100058A2 (fr) | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Dispositif de chauffage, installation de revetement et procede pour mettre en oeuvre la vaporisation ou la sublimation de matieres de revetement |
Non-Patent Citations (4)
| Title |
|---|
| C.W. TANG ET AL., APPL. PHYS. LETT., vol. 48, 1986, pages 183 |
| HIRAMOTO, APPL. PHYS.LETT., vol. 58, 1991, pages 1062 |
| HIRAMOTO, CHEM. LETT., vol. 1990, 1990, pages 327 |
| MARTIN PFEIFFER: "Controlled doping of organic vacuum deposited dye layers: basics and applications", PHD THESIS TU-DRESDEN, 1999 |
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