WO2011001837A1 - 配線シート付き太陽電池セル、太陽電池モジュールおよび配線シート付き太陽電池セルの製造方法 - Google Patents
配線シート付き太陽電池セル、太陽電池モジュールおよび配線シート付き太陽電池セルの製造方法 Download PDFInfo
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- WO2011001837A1 WO2011001837A1 PCT/JP2010/060354 JP2010060354W WO2011001837A1 WO 2011001837 A1 WO2011001837 A1 WO 2011001837A1 JP 2010060354 W JP2010060354 W JP 2010060354W WO 2011001837 A1 WO2011001837 A1 WO 2011001837A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/90—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers
- H10F19/902—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells
- H10F19/906—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells characterised by the materials of the structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/90—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers
- H10F19/902—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells
- H10F19/908—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells for back-contact photovoltaic cells
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Definitions
- the present invention relates to a solar cell with a wiring sheet, a solar cell module, and a method for manufacturing a solar cell with a wiring sheet.
- a solar cell has formed a pn junction by diffusing an impurity having a conductivity type opposite to that of a silicon substrate into a light receiving surface of a monocrystalline or polycrystalline silicon substrate, for example, Double-sided electrode type solar cells manufactured by forming electrodes on the back surface opposite to the light receiving surface are mainly used.
- Double-sided electrode type solar cells manufactured by forming electrodes on the back surface opposite to the light receiving surface are mainly used.
- the back electrode type solar cell 80 is installed on the wiring sheet 100.
- solder 119 formed on the surface of the p electrode 106 in contact with the p + layer 102 on the back surface of the n-type silicon substrate 101 of the back electrode type solar battery cell 80 is formed on the glass epoxy substrate 111 of the wiring sheet 100.
- Solder 119 is formed on the surface of n-electrode 107 which is placed on solder 119 formed on the surface of wiring 112 and is in contact with n + layer 103 on the back surface of n-type silicon substrate 101 of back-electrode solar cell 80. Is placed on the solder 119 formed on the surface of the n wiring 113 formed on the glass epoxy substrate 111 of the wiring sheet 100.
- the solar cell with a wiring sheet produced as described above is made into a solar cell module by being sealed in a transparent resin such as EVA (ethylene vinyl acetate).
- EVA ethylene vinyl acetate
- FIG. 14 shows that tin diffuses from the solder 119 to the p-type silver electrode 106 and the n-type silver electrode 107 due to heat generated when the solar cell module is driven or the temperature rise of the solar cell module due to solar heat.
- an alloy layer 121 of silver and tin is formed on the surface of the p-type silver electrode 106.
- the diffusion of tin further proceeds, and the alloy layer 121 of silver and tin reaches the contact region where the p-type silver electrode 106 is in contact with the p + layer 102 on the back side of the n-type silicon substrate 101.
- the contact resistance between the p-type silver electrode 106 and the p + layer 102 increases, and the characteristics of the solar cell with the wiring sheet and the solar cell module deteriorate.
- FIG. 14 only the case of the p-type silver electrode 106 is shown, but it goes without saying that the same phenomenon occurs in the n-type silver electrode 107.
- the alloy layer 121 of silver and tin resulting from the diffusion of tin as described above is expanded at an early stage, it has been required to ensure the reliability of the solar cell module for a longer time.
- the electrode of the back electrode type solar cell 80 and the wiring of the wiring sheet 100 are electrically connected by direct contact without using a solder 119 without forming a metal junction.
- a method of performing a general connection can also be considered.
- the contact area between the electrodes and the wirings becomes the surface shape of the electrodes and / or wirings. Therefore, it is difficult to ensure the contact area, and there is a problem that the contact area becomes small.
- an object of the present invention is to provide a solar cell with a wiring sheet, a solar cell module, and a method for manufacturing a solar cell with a wiring sheet that can ensure longer reliability. .
- the present invention includes a back electrode type solar battery cell and a wiring sheet
- the back electrode type solar battery cell includes a semiconductor substrate, a first conductivity type electrode installed on one surface side of the semiconductor substrate, and a first electrode.
- the wiring sheet includes an insulating base, a first conductive type wiring and a second conductive type wiring installed on one surface side of the insulating base,
- the conductive material is electrically connected between the first conductivity type electrode and the first conductivity type wiring and between at least one of the second conductivity type electrode and the second conductivity type wiring.
- the conductive material is a solar cell with a wiring sheet containing a metal that is in contact with at least one of the electrode and the wiring without being metal-bonded.
- the conductive material is at least one selected from the group consisting of aggregated conductive particles, solidified product of aggregated conductive particles and a conductive film. Preferably it contains seeds.
- the hardness of the conductive material is composed of a first conductivity type electrode, a second conductivity type electrode, a first conductivity type wire, and a second conductivity type wire. Preferably it is lower than at least one hardness selected from the group.
- the conductive substance contains at least one of tin and bismuth.
- an insulating resin is installed between the back electrode type solar cell and the wiring sheet.
- the present invention is a solar cell module including any one of the above-described solar cells with a wiring sheet.
- the present invention provides a back electrode type solar cell including a first conductivity type electrode and a second conductivity type electrode installed on one surface side of a semiconductor substrate, and one surface side of an insulating substrate.
- a wiring sheet including a wiring sheet including a wiring for a first conductivity type and a wiring for a second conductivity type installed on a wiring sheet the method comprising: A step of applying an insulating resin containing conductive particles to the surface of the first conductive type and the surface of the second conductive type wiring, and the first conductive type of the back electrode type solar cell on the first conductive type wiring of the wiring sheet.
- the step of installing the electrode and the second conductive type electrode of the back electrode type solar cell on the second conductive type wiring of the wiring sheet, and the pressure applied to at least one of the back electrode type solar cell and the wiring sheet The first conductivity type electrode and Electricity is generated by conductive particles that are in contact with at least one of the electrode and the wiring without metal bonding between the wiring for one conductivity type and at least one between the electrode for the
- a solar cell with a wiring sheet it is possible to provide a solar cell with a wiring sheet, a solar battery module, and a method for manufacturing a solar cell with a wiring sheet that can ensure longer reliability.
- FIG. 1 It is typical sectional drawing of an example of the solar cell module of this invention.
- A)-(g) is typical sectional drawing illustrated about an example of the manufacturing method of the back electrode type photovoltaic cell shown in FIG. It is a typical top view of an example of the back surface of the back electrode type photovoltaic cell shown in FIG.
- A)-(d) is typical sectional drawing illustrating an example of the manufacturing method of the wiring sheet shown in FIG. It is a typical top view of an example of the surface of the wiring sheet used for this invention.
- (A)-(c) is typical sectional drawing illustrating about an example of the manufacturing method of the photovoltaic cell with a wiring sheet used for the solar cell module shown in FIG.
- FIG. (A)-(c) is typical expanded sectional drawing illustrating an example of the electrical connection method of the 1st conductivity type electrode of a back surface electrode type photovoltaic cell and the 1st conductivity type wiring of a wiring sheet. It is. It is typical sectional drawing of another example of the solar cell module of this invention. It is typical sectional drawing of another example of the solar cell module of this invention. It is a figure which shows the temperature profile of the heat processing in Example 1.
- FIG. (A) is the microscope picture of the connection part of the silver electrode of a back surface electrode type photovoltaic cell and the copper wiring of a wiring sheet in the photovoltaic cell with a wiring sheet of Example 1
- (b) is a white line of (a). It is the microscope picture which expanded the surrounded part.
- (A) is the microscope picture of the connection part of the silver electrode of a back surface electrode type photovoltaic cell and the copper wiring of a wiring sheet in the photovoltaic cell with a wiring sheet of a comparative example
- (b) is surrounded by the white line of (a). It is the microscope picture which expanded the vicinity of the part which was shown.
- (A) And (b) is typical sectional drawing illustrated about the manufacturing method of the conventional photovoltaic cell with a wiring sheet. It is a typical expanded sectional view of the p-type silver electrode vicinity of the photovoltaic cell with a wiring sheet shown in FIG. It is a microscope picture of the connection part of the silver electrode of the back electrode type photovoltaic cell in the photovoltaic cell with a wiring sheet of Example 2, and the copper wiring of a wiring sheet.
- FIG. 1 typical sectional drawing of an example of the solar cell module of this invention is shown.
- the solar cell module having the configuration shown in FIG. 1 includes a transparent cell 17 such as a glass substrate and a back film such as a polyester film, each of which has a configuration in which a back electrode type solar cell 8 is installed on a wiring sheet 10. 19 is sealed in a sealing material 18 such as ethylene vinyl acetate.
- an uneven structure such as a texture structure is formed on the light receiving surface of the semiconductor substrate 1 of the back electrode type solar cell 8, and an antireflection film 5 is formed so as to cover the uneven structure.
- a passivation film 4 is formed on the back surface of the semiconductor substrate 1 of the back electrode type solar cell 8.
- the back electrode type solar cell 8 includes a semiconductor substrate 1, a first conductivity type impurity diffusion region 2 and a second conductivity type impurity diffusion region 3 formed on the back surface of the semiconductor substrate 1, and a first conductivity type impurity diffusion.
- a first conductivity type electrode 6 formed in contact with the region 2 and a second conductivity type electrode 7 formed in contact with the second conductivity type impurity diffusion region 3 are included. Therefore, on the back surface side of the semiconductor substrate 1, the first conductivity type electrode 6 corresponding to the first conductivity type impurity diffusion region 2, and the second conductivity type electrode 7 corresponding to the second conductivity type impurity diffusion region 3 are provided. Is formed.
- the first conductivity type electrode 6 and the second conductivity type electrode 7 on the back surface side of the back electrode type solar battery cell 8 each have a shape projecting to the opposite side of the semiconductor substrate 1, and the first conductivity type.
- the electrode width of the mold electrode 6 and the electrode width of the second conductivity type electrode 7 continuously decrease as the distance from the semiconductor substrate 1 increases, and the outer surface of the first conductivity type electrode 6 and the second conductivity type electrode
- Each of the outer surfaces 7 is a curved surface that is curved like the side surface of a cylinder.
- the first conductivity type impurity diffusion region 2 and the second conductivity type impurity diffusion region 3 are each formed in a strip shape extending to the front surface side and / or the back surface side of FIG.
- the type impurity diffusion regions 2 and the second conductivity type impurity diffusion regions 3 are alternately arranged at predetermined intervals on the back surface of the semiconductor substrate 1.
- first conductivity type electrode 6 and the second conductivity type electrode 7 are also formed in strips extending to the front side and / or the back side of the paper surface of FIG.
- the electrode 6 and the second conductivity type electrode 7 pass through the opening provided in the passivation film 4 along the first conductivity type impurity diffusion region 2 and the second conductivity type impurity diffusion region 3 on the back surface of the semiconductor substrate 1, respectively.
- the first conductivity type impurity diffusion region 2 and the second conductivity type impurity diffusion region 3 are formed in contact with each other.
- the wiring sheet 10 includes an insulating base 11, a first conductive type wiring 12 and a second conductive type wiring 13 formed on the surface of the insulating base 11.
- the first conductive type wiring 12 on the insulating base 11 of the wiring sheet 10 is formed in a shape facing the first conductive type electrode 6 on the back surface of the back electrode type solar cell 8 one by one. Yes.
- the second conductive type wiring 13 on the insulating substrate 11 of the wiring sheet 10 is formed in a shape facing the second conductive type electrode 7 on the back surface of the back electrode type solar cell 8 one by one. Yes.
- the first conductive type wiring 12 and the second conductive type wiring 13 of the wiring sheet 10 are also formed in a strip shape extending to the front side and / or the back side of the paper surface of FIG.
- said back surface electrode type photovoltaic cell 8 and said wiring sheet 10 are by the insulating resin 16 which is an electrically insulating resin installed between the back surface electrode type photovoltaic cell 8 and the wiring sheet 10.
- the second conductivity type of the back electrode type solar battery cell 8 is connected between the first conductivity type electrode 6 of the back electrode type solar cell 8 and the first conductivity type wire 12 of the wiring sheet 10.
- the conductive electrode 20 and the second conductive type wiring 13 of the wiring sheet 10 are electrically connected to each other by the conductive material 20.
- the conductive material 20 is used for the first conductivity type electrode 6 and the second conductivity type electrode 7 of the back electrode type solar cell 8 and for the first conductivity type wiring 12 and the second conductivity type of the wiring sheet 10.
- a metal that is in contact with each of the wirings 13 without being metal-bonded is included. That is, in the conductive substance 20, the part which the conductive substance 20 contacts with these members should just be comprised from the metal which is contacting at least these members, without metal-bonding.
- the conductive material 20 is composed of the first conductivity type electrode 6, the second conductivity type electrode 7, the first conductivity type wiring 12, and the second conductivity type wiring 13 and the metal
- the conductive material 20 includes the first conductivity type electrode 6, the second conductivity type electrode 7, the first conductivity type wiring 12, and the metal in contact with each other without being bonded. It is only necessary to include a metal that is in contact with at least one of the second conductivity type wirings 13 without metal bonding.
- the electrical connection between the n-electrode 107 and the n-wiring 113 of the wiring sheet 100 is a direct connection in which the n-electrode 107 and the n-wiring 113 are directly in contact with each other without inserting anything between them, Since it depends on the shape of the electrode (p electrode 106 and n electrode 107) of the solar cell 80 and the shape of the wiring 100 (p wiring 112 and n wiring 113) of the wiring sheet, the electrical contact area is reduced. It was.
- the electrical connection between the first conductive type electrode 6 of the back electrode type solar battery cell 8 and the first conductive type wiring 12 of the wiring sheet 10 and the back electrode type solar battery cell 8 of the first type is made by the conductive material 20 that is in contact with each other without being metal-bonded.
- the mechanical connection between the cell 8 and the wiring sheet 10 is performed by an insulating resin 16.
- the present invention it is possible to reduce the contact resistance between the electrode of the back electrode type solar cell and the wiring of the wiring sheet while maintaining the mechanical connection between the back electrode type solar cell and the wiring sheet. Therefore, it can have high characteristics.
- an alloy layer for example, an alloy layer of tin in the solder and silver in the silver electrode
- an alloy layer of tin in the solder and silver in the silver electrode that causes a decrease in reliability between the back electrode type solar cell and the wiring sheet. Therefore, it is possible to make these electrical connections, and it is possible to ensure reliability for a longer time.
- the conductive material 20 includes a metal that is in contact with the electrode of the back electrode type solar battery cell and the wiring of the wiring sheet so as to electrically connect them without forming a metal bond.
- a solidified product of a melt of aggregated conductive particles is used as the conductive material 20.
- the particle diameter of the conductive particles is not particularly limited as long as the particles are agglomerated, and can be, for example, about 20 ⁇ m to 35 ⁇ m.
- “aggregation” means that the distance between the conductive particles after the connection between the back electrode type solar cell and the wiring sheet is larger than that before the connection between the back electrode type solar cell and the wiring sheet. It means that it is shrinking as a whole.
- examples of the solidified product of the aggregated conductive particle melt include those obtained by melting and solidifying the aggregated conductive particles such as solder particles.
- examples of the solidified product of the aggregated conductive particle melt include those obtained by melting and solidifying the aggregated conductive particles such as solder particles.
- what contains at least one of tin and bismuth can be used, for example.
- the hardness of the conductive material 20 is at least 1 selected from the group consisting of the first conductivity type electrode 6, the second conductivity type electrode 7, the first conductivity type wiring 12, and the second conductivity type wiring 13.
- the hardness is lower than all the hardnesses of the first conductivity type electrode 6, the second conductivity type electrode 7, the first conductivity type wiring 12, and the second conductivity type wiring 13. preferable. In this case, there is a tendency that the destruction of the electrode of the back electrode type solar cell 8 and the wiring of the wiring sheet 10 due to the conductive material 20 can be effectively suppressed.
- “hardness” means Vickers hardness (Hv).
- the insulating resin 16 for example, a thermosetting and / or photosetting resin such as a conventionally known epoxy resin can be used.
- the insulating resin 16 may contain an additive such as a conventionally known curing agent.
- a semiconductor substrate 1 in which slice damage 1a is formed on the surface of the semiconductor substrate 1 is prepared by, for example, slicing from an ingot.
- the semiconductor substrate for example, a silicon substrate made of polycrystalline silicon, single crystal silicon, or the like having either n-type or p-type conductivity can be used.
- the slice damage 1a on the surface of the semiconductor substrate 1 is removed.
- the removal of the slice damage 1a is performed, for example, when the semiconductor substrate 1 is made of the above silicon substrate, the surface of the silicon substrate after the above slice is mixed with an aqueous solution of hydrogen fluoride and nitric acid, sodium hydroxide, or the like. It can be performed by etching with an alkaline aqueous solution or the like.
- the size and shape of the semiconductor substrate 1 after removal of the slice damage 1a are not particularly limited, but the thickness of the semiconductor substrate 1 can be, for example, 100 ⁇ m or more and 500 ⁇ m or less, and particularly preferably about 200 ⁇ m. .
- a first conductivity type impurity diffusion region 2 and a second conductivity type impurity diffusion region 3 are formed on the back surface of the semiconductor substrate 1, respectively.
- the first conductivity type impurity diffusion region 2 is formed by a method such as vapor phase diffusion using a gas containing the first conductivity type impurity or coating diffusion in which a heat treatment is applied after applying the paste containing the first conductivity type impurity. Can be formed.
- the second conductivity type impurity diffusion region 3 is formed by a method such as vapor phase diffusion using a gas containing the second conductivity type impurity or coating diffusion in which a heat treatment is applied after applying the paste containing the second conductivity type impurity. can do.
- the first conductivity type impurity diffusion region 2 is not particularly limited as long as it includes the first conductivity type impurity and exhibits n-type or p-type conductivity.
- the first conductivity type impurity for example, an n-type impurity such as phosphorus can be used when the first conductivity type is n-type, and when the first conductivity type is p-type, for example, boron or A p-type impurity such as aluminum can be used.
- the second conductivity type impurity diffusion region 3 is not particularly limited as long as it contains the second conductivity type impurity and exhibits a conductivity type opposite to that of the first conductivity type impurity diffusion region 2.
- an n-type impurity such as phosphorus can be used when the second conductivity type is n-type, and when the second conductivity type is p-type, for example, boron or A p-type impurity such as aluminum can be used.
- the first conductivity type may be either n-type or p-type
- the second conductivity type may be a conductivity type opposite to the first conductivity type. That is, when the first conductivity type is n-type, the second conductivity type is p-type, and when the first conductivity type is p-type, the second conductivity type is n-type.
- the gas containing the first conductivity type impurity when the first conductivity type is n-type, for example, a gas containing an n-type impurity such as phosphorus such as POCl 3 can be used.
- a gas containing p-type impurities such as boron such as BBr 3 can be used.
- the gas containing the second conductivity type impurity when the second conductivity type is n-type, for example, a gas containing an n-type impurity such as phosphorus such as POCl 3 can be used.
- a gas containing p-type impurities such as boron such as BBr 3 can be used.
- a passivation film 4 is formed on the back surface of the semiconductor substrate 1.
- the passivation film 4 can be formed by a method such as a thermal oxidation method or a plasma CVD (Chemical Vapor Deposition) method.
- the passivation film 4 for example, a silicon oxide film, a silicon nitride film, or a stacked body of a silicon oxide film and a silicon nitride film can be used, but is not limited thereto.
- the thickness of the passivation film 4 can be, for example, 0.05 ⁇ m or more and 1 ⁇ m or less, and particularly preferably about 0.2 ⁇ m.
- an uneven structure such as a texture structure is formed on the entire light receiving surface of the semiconductor substrate 1, and then an antireflection film 5 is formed on the uneven structure.
- the texture structure can be formed, for example, by etching the light receiving surface of the semiconductor substrate 1.
- the semiconductor substrate 1 is a silicon substrate
- the semiconductor is used by using an etching solution in which a solution obtained by adding isopropyl alcohol to an alkaline aqueous solution such as sodium hydroxide or potassium hydroxide is heated to 70 ° C. or higher and 80 ° C. or lower, for example. It can be formed by etching the light receiving surface of the substrate 1.
- the antireflection film 5 can be formed by, for example, a plasma CVD method.
- a silicon nitride film or the like can be used, but is not limited thereto.
- a part of the passivation film 4 on the back surface of the semiconductor substrate 1 is removed to form a contact hole 4a and a contact hole 4b.
- the contact hole 4 a is formed so as to expose at least part of the surface of the first conductivity type impurity diffusion region 2
- the contact hole 4 b is at least part of the surface of the second conductivity type impurity diffusion region 3. It is formed so as to be exposed.
- the contact hole 4a and the contact hole 4b are formed after a resist pattern having openings at portions corresponding to the formation positions of the contact hole 4a and the contact hole 4b is formed on the passivation film 4 by using, for example, photolithography technology.
- the first conductivity type electrode 6 in contact with the first conductivity type impurity diffusion region 2 through the contact hole 4a and the second conductivity type impurity diffusion region 3 in contact with the second conductivity type impurity diffusion region 3 through the contact hole 4b.
- a back electrode type solar cell 8 is produced.
- first conductivity type electrode 6 and the second conductivity type electrode 7 for example, electrodes made of metal such as silver can be used.
- FIG. 3 shows a schematic plan view of an example of the back surface of the back electrode type solar battery cell 8 shown in FIG. 1 manufactured as described above.
- the first conductivity type electrode 6 and the second conductivity type electrode 7 are each formed in a strip shape.
- Each of the plurality of strip-shaped first conductivity type electrodes 6 is connected to one strip-shaped first conductivity type collector electrode 60, and each of the plurality of strip-shaped second conductivity type electrodes 7 is formed of one strip-shaped electrode.
- the first conductivity type collector electrode 60 is formed so as to extend in a direction perpendicular to the longitudinal direction of the strip-like first conductivity type electrode 6, and the second conductivity type collector electrode 60.
- the electric electrode 70 is formed so as to extend in a direction perpendicular to the longitudinal direction of the strip-shaped second conductivity type electrode 7.
- one comb-shaped electrode is formed by one first conductivity type collecting electrode 60 and a plurality of first conductivity type electrodes 6.
- one comb-shaped electrode is formed by one second-conductivity-type collecting electrode 70 and a plurality of second-conductivity-type electrodes 7.
- the first conductivity type electrode 6 and the second conductivity type electrode 7 corresponding to the comb teeth of the comb-shaped electrode are arranged so as to face each other and mesh the comb teeth one by one.
- One strip-shaped first conductivity type impurity diffusion region 2 is arranged on the back surface portion of the semiconductor substrate 1 with which the strip-shaped first conductivity type electrode 6 is in contact, and the strip-shaped second conductivity type electrode 7 is in contact therewith.
- One strip-shaped second conductivity type impurity diffusion region 3 is disposed on the back surface portion of the semiconductor substrate 1.
- a conductive layer 41 is formed on the surface of the insulating substrate 11.
- the insulating base material 11 for example, a substrate made of a resin such as polyester, polyethylene naphthalate, or polyimide can be used, but is not limited thereto.
- the thickness of the insulating substrate 11 can be set to, for example, 10 ⁇ m or more and 200 ⁇ m or less, and particularly preferably about 25 ⁇ m.
- a layer made of metal such as copper can be used, but is not limited thereto.
- a resist 42 is formed on the conductive layer 41 on the surface of the insulating substrate 11.
- the resist 42 is formed in a shape having an opening at a place other than the place where the wiring sheet 10 such as the first conductive type wiring 12 and the second conductive type wiring 13 is left.
- a conventionally known one can be used.
- a resist obtained by curing a resin applied at a predetermined position by a method such as screen printing, dispenser application, or ink jet application can be used.
- the conductive layer 41 is patterned by removing the conductive layer 41 exposed from the resist 42 in the direction of the arrow 43, and from the remainder of the conductive layer 41. Wiring of the wiring sheet 10 such as the first conductive type wiring 12 and the second conductive type wiring 13 is formed.
- the removal of the conductive layer 41 can be performed, for example, by wet etching using an acid or alkali solution.
- the wiring sheet 10 is produced by removing all the resist 42 from the surface of the first conductive type wiring 12 and the surface of the second conductive type wiring 13.
- FIG. 5 shows a schematic plan view of an example of the surface of the wiring sheet 10 produced as described above.
- the first conductive type wiring 12 and the second conductive type wiring 13 are each formed in a strip shape.
- a strip-like connection wiring 14 is formed on the surface of the insulating base material 11 of the wiring sheet 10, and the first conductivity type wiring 12 and the second conductivity type wiring 13 are formed by the connection wiring 14. Electrically connected.
- the connection wiring 14 can be formed from the remaining portion of the conductive layer 41, for example, similarly to the first conductivity type wiring 12 and the second conductivity type wiring 13.
- the first conductive type wiring 12 and the second conductive type wiring 13 of the wiring sheet 10 manufactured as described above are made of conductive particles, for example.
- the insulating resin 16 in which the conductive material 20 is dispersed is applied.
- the insulating resin 16 in which the conductive substance 20 made of conductive particles is dispersed can be applied by a method such as screen printing, dispenser application, or inkjet application.
- the back electrode type solar cell 8 is installed on the wiring sheet 10.
- the back electrode type solar cell 8 has the first conductivity type electrode 6 of the back electrode type solar cell 8 installed on the first conductivity type wire 12 of the wiring sheet 10 and the wiring sheet 10.
- the second conductivity type electrode 7 of the back electrode type solar cell 8 is installed on the wiring sheet 10 so as to be installed on the second conductivity type wiring 13.
- the insulating resin 16 is made of a thermosetting resin
- the insulating resin 16 and the conductive material 20 are heated to cure the insulating resin 16 and to conduct the conductive conductive particles.
- the active substance 20 is melted to form a melt.
- the insulating resin 16 is made of a photocurable resin
- the insulating resin 16 is cured by irradiating the insulating resin 16 with light such as ultraviolet rays, and the conductive material 20 is heated, thereby aggregating the conductive property.
- the conductive material 20 as particles is melted to form a melt.
- the heating of the conductive material 20 is, for example, a temperature at which the conductive material 20 melts, and the metal in the conductive material 20 is the first conductive type electrode 6, the second conductive type electrode 7, This can be performed by heating the conductive material 20 to a temperature at which a metal bond is not formed with each of the first conductivity type wiring 12 and the second conductivity type wiring 13. Then, by heating the conductive material 20, the conductive material 20 is melted, and the first conductive type electrode 6, the second conductive type electrode 7, the first conductive type wiring 12, and the second conductive type wiring.
- the conductive material 20 can follow at least one shape selected from the group consisting of thirteen.
- the insulating resin 16 is made of a thermosetting resin and the heating temperature of the conductive material 20 is equal to or higher than the curing temperature of the insulating resin 16, the curing of the insulating resin 16 and the conductive material are performed. It is preferable to perform the melting of 20 in the same process from the viewpoint of increasing the production efficiency.
- the insulating resin 16 applied on the respective surfaces of the first conductive type wiring 12 and the second conductive type wiring 13 of the wiring sheet 10 by the heating process after the installation of the back electrode type solar cell 8.
- the conductive material 20 aggregates on the respective surfaces of the first conductive type wiring 12 and the second conductive type wiring 13 of the wiring sheet 10, and a part of the insulating resin 16 is the first conductive type of the wiring sheet 10. The region moves between the wiring 12 and the second conductivity type wiring 13.
- the molten material of the conductive material 20 is cooled and solidified, for example, to room temperature, thereby allowing the back electrode type solar cell to pass through the solidified material of the melt of the conductive material 20 as shown in FIG.
- the first conductivity type electrode 6 of the battery cell 8 and the first conductivity type wiring 12 of the wiring sheet 10 are electrically connected, and the second conductivity type electrode 7 of the back electrode type solar cell 8 and the wiring sheet. 10 second conductive type wirings 13 are electrically connected.
- the back surface electrode type photovoltaic cell 8 and the wiring sheet 10 are mechanically connected by curing the insulating resin 16 as described above.
- FIG. 1 shows a schematic enlarged cross-sectional view illustrating an example. Note that the passivation film 4 is not shown in FIGS. 7A to 7C for convenience of explanation.
- a back electrode type solar cell is disposed above the surface of the first conductivity type wiring 12 coated with an insulating resin 16 in which a conductive material 20 made of conductive particles is dispersed.
- the back electrode type solar cell 8 is installed so that the first conductivity type electrode 6 of the cell 8 is located.
- the first conductive type electrode 6 and the first conductive type wiring 12 are interposed.
- the conductive material 20 made of conductive particles aggregates.
- the temperature is equal to or higher than the temperature at which the conductive material 20 melts, and the temperature is equal to or lower than the temperature at which the conductive material 20 does not form a metal bond with each of the first conductivity type electrode 6 and the first conductivity type wiring 12.
- the conductive material 20 is heated and then cooled. As a result, as shown in FIG. 7 (c), the conductive material 20 is melted to become a melt and then solidified to become a solidified material.
- the conductive material 20 is composed of the first conductivity type electrode 6 and
- the first conductive type wiring 12 is physically sandwiched between the first conductive type electrode 6 and the first conductive type wiring 12 without forming a metal bond with each of the first conductive type wirings 12, and is in contact therewith. Thus, electrical connection between the first conductivity type electrode 6 and the first conductivity type wiring 12 is achieved.
- the photovoltaic cell with a wiring sheet produced as described above includes, for example, a transparent substrate 17 such as a glass substrate provided with a sealing material 18 such as ethylene vinyl acetate, and a sealing material as shown in FIG.
- FIG. 1 shows a back electrode type solar cell 8 sandwiched between a back film 19 such as a polyester film provided with 18 and constituting a solar cell with a wiring sheet in a sealing material 18.
- An example of the solar cell module of the present invention is produced.
- both the first conductivity type electrode and the second conductivity type electrode are formed only on one surface side (back side) of the semiconductor substrate described above.
- so-called back-contact solar cells solar cells
- solar cells such as MWT (Metal Wrap Through) cells (solar cells with a part of electrodes arranged in through holes provided in a semiconductor substrate) All of the solar cells having a structure in which current is taken out from the back surface side opposite to the light receiving surface side.
- the concept of the solar cell with a wiring sheet in the present invention includes not only a configuration in which a plurality of back electrode type solar cells are installed on the wiring sheet, but also a single back electrode type solar cell on the wiring sheet.
- the configuration installed in is also included.
- FIG. 8 shows a schematic cross-sectional view of another example of the solar cell module of the present invention.
- the solar cell module of the present embodiment for example, as shown in FIG. 8, between the first conductivity type electrode 6 of the back electrode type solar cell 8 and the first conductivity type wiring 12 of the wiring sheet 10.
- the first conductive type electrode 6 and the first conductive type wiring 12 are electrically connected by being sandwiched so that the conductive material 20 made of a conductive film is in contact with the conductive material 20 without metal bonding, and The conductive material 20 made of a conductive film is in contact with the second conductive type electrode 7 of the back electrode type solar battery cell 8 and the second conductive type wiring 13 of the wiring sheet 10 without metal bonding.
- the second conductivity type electrode 7 and the second conductivity type wiring 13 are electrically connected to each other.
- the electrical connection between the mold electrode 7 and the second conductive type wiring 13 of the wiring sheet 10 is made by the conductive material 20 that is in contact with each other without metal bonding, and the back electrode type solar cell 8 and the wiring sheet 10 are connected.
- the electrical contact area of the electrode of the back electrode type solar cell 8 and the wiring of the wiring sheet 10 can be increased, it is high compared with the conventional solar cell module. It can have properties.
- a metal plating film or a metal plate can be used.
- a material of the conductive film for example, a material containing at least one of tin and bismuth can be used.
- the metal plating film is formed on the surface of the first conductivity type wiring 12 and / or the surface of the second conductivity type wiring 13 by, for example, conventionally known electroplating or electroless plating.
- the electrode can be sandwiched so as to be in contact with the non-plated electrode without metal bonding.
- the metal plate is sandwiched so as to be in contact with the metal plate without being metal-bonded by being placed on the surface of the first conductivity type wiring 12 and / or on the surface of the second conductivity type wiring 13 as it is. be able to.
- FIG. 9 shows a schematic cross-sectional view of another example of the solar cell module of the present invention.
- the solar cell module of the present embodiment for example, as shown in FIG. 9, between the first conductivity type electrode 6 of the back electrode type solar cell 8 and the first conductivity type wiring 12 of the wiring sheet 10.
- the first conductive type electrode 6 and the first conductive type wiring 12 are electrically connected by sandwiching the conductive substance 20 made of the aggregate of conductive particles so as to be in contact without metal bonding.
- the conductive material 20 made of an aggregate of conductive particles is metal-bonded between the second conductive type electrode 7 of the back electrode type solar cell 8 and the second conductive type wiring 13 of the wiring sheet 10.
- the second conductive type electrode 7 and the second conductive type wiring 13 are electrically connected to each other so as to be in contact with each other.
- the electrical connection between the mold electrode 7 and the second conductive type wiring 13 of the wiring sheet 10 is made by the conductive material 20 that is in contact with each other without metal bonding, and the back electrode type solar cell 8 and the wiring sheet 10 are connected.
- the agglomerates of conductive particles can be sandwiched so as to be in contact with each other without metal bonding by, for example, heat treatment at a temperature at which the agglomerates of conductive particles do not melt.
- the shape of the conductive particles contained in the aggregate of the conductive particles is preferably spherical or flaky.
- the aggregate of conductive particles may include a plurality of types of conductive particles.
- the size of the conductive particles is preferably larger than the surface roughness of the electrode of the back electrode type solar cell 8 and / or the surface roughness of the wiring of the wiring sheet 10.
- the electrode and wiring sheet of the back electrode type solar cell 8 due to the conductive particles entering the recesses on the surface of the electrode of the back electrode type solar cell 8 and / or the surface of the wiring of the wiring sheet 10.
- the size of the conductive particles is preferably smaller than the distance between adjacent electrodes of the back electrode type solar cell 8 and / or the distance between adjacent wirings of the wiring sheet 10. In this case, even when conductive particles are arranged between adjacent electrodes of the back electrode type solar cell 8 and / or between adjacent wirings of the wiring sheet 10, the adjacent electrode of the back electrode type solar cell 8. A short circuit between the adjacent wirings of the wiring sheet 10 can be suppressed.
- the substance constituting the conductive particles for example, particles composed of a metal such as copper, tin, copper, gold, nickel, and aluminum and / or particles on which a metal containing at least one of them is plated are used. be able to. Further, even non-metallic particles such as carbon particles including graphite particles can be used as conductive particles as long as they are conductive substances.
- an n-type silicon substrate having a pseudo square light-receiving surface and a back surface each having a side of 126 mm and a thickness of 200 ⁇ m was prepared. Then, phosphorus is selectively diffused on the back surface of the n-type silicon substrate to form a strip-shaped n + layer, and boron is selectively diffused on the back surface of the n-type silicon substrate to form a strip-shaped p + layer. .
- the strip-shaped n + layer and the strip-shaped p + layer were formed so as to be alternately arranged on the back surface of the n-type silicon substrate.
- a silver electrode (n electrode) having a curved surface whose outer surface is curved like a cylindrical side surface is formed on the n + layer on the back surface of the n-type silicon substrate, and the band shape is formed on the p + layer.
- a curved silver electrode (p electrode) whose outer surface was curved like a side surface of a cylinder was formed.
- the thickness of the silver electrode (distance to the outer surface of the n electrode in the direction perpendicular to the back surface of the n-type silicon substrate) was 9 ⁇ m, the surface roughness was ⁇ 3 ⁇ m, and the width was 100 ⁇ m. .
- a wiring sheet in which copper wiring (n wiring and p wiring) was formed on the surface of a polyester film as an insulating substrate was prepared as a wiring sheet.
- the copper wiring had a thickness of 35 ⁇ m, a surface roughness of ⁇ 3 ⁇ m, and a width of 550 ⁇ m.
- the distance between adjacent copper wirings was 200 ⁇ m.
- solder particles are aggregated between the silver electrode of the back electrode type solar cell and the copper wiring of the wiring sheet by installing the back electrode type solar cell produced as described above on the wiring sheet. At the same time, part of the epoxy resin was moved to the region between the copper wirings.
- the solder particles and the epoxy resin aggregated in the region between the back electrode type solar cell and the wiring sheet were each heat-treated with the thermal profile shown in FIG. 10 and then cooled to room temperature.
- the agglomerated solder particles were melted without forming metal bonds with the silver electrode (n electrode and p electrode) of the back electrode solar cell and the copper wiring (n wiring and p wiring) of the wiring sheet.
- the above heat treatment was performed as follows. First, as shown in FIG. 10, the temperature of the back electrode solar cell is applied to the wiring sheet while exhausting the gas inside the heating device, and the temperature is equal to or lower than the temperature at which the epoxy resin begins to cure. The temperature inside the heating apparatus was increased to 60 ° C. in 3 minutes.
- the exhaust of the gas inside the heating device is stopped, the temperature inside the heating device is raised to 140 ° C. in 1 minute, and then raised to 145 ° C. in 1 minute, Hold at 145 ° C. for 10 minutes. Thereafter, the temperature inside the heating apparatus was cooled to room temperature (25 ° C.).
- FIG. 11A shows a photomicrograph of the connection portion between the silver electrode of the back electrode type solar battery cell and the copper wiring of the wiring sheet in the solar battery cell with the wiring sheet of Example 1, and FIG. The micrograph which expanded the part surrounded by the white line of 11 (a) is shown.
- the back electrode type solar cell is heated on the wiring sheet by applying pressure (pressing) to 60 ° C., which is lower than the temperature at which the epoxy resin begins to cure, in 3 minutes. The temperature inside the device was raised.
- the exhaust of the gas inside the heating device was stopped, and then the temperature inside the heating device was raised to 140 ° C. over 1 minute, then raised to 160 ° C. over 1 minute, and held at 160 ° C. for 10 minutes. . Thereafter, the temperature inside the heating apparatus was cooled to room temperature (25 ° C.).
- FIG. 12A shows a photomicrograph of the connection portion between the silver electrode of the back electrode type solar cell and the copper wiring of the wiring sheet in the solar cell with the wiring sheet of the comparative example, and FIG. The micrograph which expanded the vicinity of the part enclosed with the white line of (a) is shown.
- Example 2 First, the same back electrode type solar cell and wiring sheet as Example 1 were prepared. Next, an epoxy resin containing conductive particles made of tin, silver, copper and nickel on each surface of copper wiring (n wiring and p wiring) of the wiring sheet and having a particle size of 12 ⁇ m or more and 38 ⁇ m or less was applied.
- the epoxy resin was cooled to room temperature after being heated to a temperature sufficient to cure the epoxy resin using a predetermined heating device.
- the conductive particles sandwiched between the back electrode type solar cell and the wiring sheet are transferred to the silver electrode (n electrode and p electrode) of the back electrode type solar cell and the wiring sheet (n wiring and p wiring).
- the present invention can be used for a solar cell with a wiring sheet, a solar cell module, and a method for manufacturing a solar cell with a wiring sheet.
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Abstract
Description
図1に、本発明の太陽電池モジュールの一例の模式的な断面図を示す。図1に示す構成の太陽電池モジュールは、裏面電極型太陽電池セル8が配線シート10上に設置された構成の配線シート付き太陽電池セルがガラス基板などの透明基板17とポリエステルフィルムなどのバックフィルム19との間のエチレンビニルアセテートなどの封止材18中に封止された構成となっている。
図8に、本発明の太陽電池モジュールの他の一例の模式的な断面図を示す。本実施の形態の太陽電池モジュールにおいては、たとえば図8に示すように、裏面電極型太陽電池セル8の第1導電型用電極6と配線シート10の第1導電型用配線12との間に導電性膜からなる導電性物質20がこれらと金属結合することなく接触するように挟み込まれて第1導電型用電極6と第1導電型用配線12とが電気的に接続されているとともに、裏面電極型太陽電池セル8の第2導電型用電極7と配線シート10の第2導電型用配線13との間にも導電性膜からなる導電性物質20がこれらと金属結合することなく接触するように挟み込まれて第2導電型用電極7と第2導電型用配線13とが電気的に接続されている点に特徴がある。
図9に、本発明の太陽電池モジュールの他の一例の模式的な断面図を示す。本実施の形態の太陽電池モジュールにおいては、たとえば図9に示すように、裏面電極型太陽電池セル8の第1導電型用電極6と配線シート10の第1導電型用配線12との間に導電性粒子の凝集物からなる導電性物質20を金属結合することなく接触するように挟み込まれて第1導電型用電極6と第1導電型用配線12とが電気的に接続されているとともに、裏面電極型太陽電池セル8の第2導電型用電極7と配線シート10の第2導電型用配線13との間にも導電性粒子の凝集物からなる導電性物質20も金属結合することなく接触するように挟み込まれて第2導電型用電極7と第2導電型用配線13とが電気的に接続されている点に特徴がある。
まず、1辺がそれぞれ126mmの擬似正方形状の受光面および裏面を有し、厚さが200μmのn型シリコン基板を用意した。そして、n型シリコン基板の裏面にリンを選択的に拡散して帯状のn+層を形成するとともに、n型シリコン基板の裏面にボロンを選択的に拡散して帯状のp+層を形成した。ここで、帯状のn+層と帯状のp+層とはそれぞれ、n型シリコン基板の裏面に交互に配列するように形成された。
上記の熱処理を以下のようにして行なったこと以外は実施例1と同様にして比較例の配線シート付き太陽電池セルを作製した。
図11(a)および図11(b)と、図12(a)および図12(b)とを比較すれば明らかなように、実施例1の配線シート付き太陽電池セルにおいては、比較例の配線シート付き太陽電池セルと比べて、凝集した半田粒子の溶融物の固化物と、銀電極および銅配線のそれぞれとの接触面積が大きくなるため、実施例1の配線シート付き太陽電池セルおよびそれを含む太陽電池モジュールの信頼性をより長く確保することができ、特性も高くなることが考えられる。
まず、実施例1と同様の裏面電極型太陽電池セルと配線シートとを用意した。次に、配線シートの銅配線(n配線およびp配線)のそれぞれの表面上に、錫、銀、銅およびニッケルより構成されている、粒径が12μm以上38μm以下の導電性粒子を含むエポキシ樹脂を塗布した。
Claims (7)
- 裏面電極型太陽電池セル(8)と、
配線シート(10)と、を備え、
前記裏面電極型太陽電池セル(8)は、半導体基板(1)と、前記半導体基板(1)の一方の面側に設置された第1導電型用電極(6)と第2導電型用電極(7)とを含み、
前記配線シート(10)は、絶縁性基材(11)と、前記絶縁性基材(11)の一方の面側に設置された第1導電型用配線(12)と第2導電型用配線(13)とを含み、
前記第1導電型用電極(6)と前記第1導電型用配線(12)との間、および前記第2導電型用電極(7)と前記第2導電型用配線(13)との間の少なくとも一方の間が導電性物質(20)により電気的に接続されており、
前記導電性物質(20)は、電極(6,7)および配線(12,13)の少なくとも一方と金属結合せずに接触する金属を含む、配線シート付き太陽電池セル。 - 前記導電性物質(20)が、凝集した導電性粒子、凝集した導電性粒子の溶融物の固化物および導電性膜からなる群から選択された少なくとも1種を含むことを特徴とする、請求の範囲第1項に記載の配線シート付き太陽電池セル。
- 前記導電性物質(20)の硬度が、前記第1導電型用電極(6)、前記第2導電型用電極(7)、前記第1導電型用配線(12)および前記第2導電型用配線(13)からなる群から選択された少なくとも1つの硬度よりも低いことを特徴とする、請求の範囲第1項または第2項に記載の配線シート付き太陽電池セル。
- 前記導電性物質(20)が、錫およびビスマスの少なくとも一方を含むことを特徴とする、請求の範囲第1項から第3項のいずれかに記載の配線シート付き太陽電池セル。
- 前記裏面電極型太陽電池セル(8)と前記配線シート(10)との間に絶縁性樹脂(16)が設置されていることを特徴とする、請求の範囲第1項から第4項のいずれかに記載の配線シート付き太陽電池セル。
- 請求の範囲第1項から第5項のいずれかに記載の配線シート付き太陽電池セルを含む、太陽電池モジュール。
- 半導体基板(1)の一方の面側に設置された第1導電型用電極(6)と第2導電型用電極(7)とを含む裏面電極型太陽電池セル(8)と、絶縁性基材(11)の一方の面側に設置された第1導電型用配線(12)と第2導電型用配線(13)とを含む配線シート(10)と、を備えた配線シート付き太陽電池セルを製造する方法であって、
前記配線シート(10)の前記第1導電型用配線(12)の表面および前記第2導電型用配線(13)の表面にそれぞれ導電性粒子を含む絶縁性樹脂(16)を塗布する工程と、
前記配線シート(10)の前記第1導電型用配線(12)上に前記裏面電極型太陽電池セル(8)の前記第1導電型用電極(6)を設置するとともに、前記配線シート(10)の前記第2導電型用配線(13)上に前記裏面電極型太陽電池セル(8)の前記第2導電型用電極(7)を設置する工程と、
前記裏面電極型太陽電池セル(8)および前記配線シート(10)の少なくとも一方に圧力を加えることによって前記第1導電型用電極(6)と前記第1導電型用配線(12)との間および前記第2導電型用電極(7)と前記第2導電型用配線(13)との間の少なくとも一方の間を金属結合せずに接触する前記導電性粒子により電気的に接続する工程と、を含む、配線シート付き太陽電池セルの製造方法。
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| CN2010800293727A CN102473767A (zh) | 2009-07-02 | 2010-06-18 | 带有布线板的太阳能电池单元、太阳能电池模块以及带有布线板的太阳能电池单元的制造方法 |
| JP2011520866A JPWO2011001837A1 (ja) | 2009-07-02 | 2010-06-18 | 配線シート付き太陽電池セル、太陽電池モジュールおよび配線シート付き太陽電池セルの製造方法 |
| EP10794007A EP2439784A1 (en) | 2009-07-02 | 2010-06-18 | Solar battery cell with wiring sheet, solar battery module, and method for producing solar battery cell with wiring sheet |
| US13/382,054 US20120097245A1 (en) | 2009-07-02 | 2010-06-18 | Solar cell with interconnection sheet, solar cell module, and method for producing solar cell with internconnection sheet |
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| WO2012081613A1 (ja) * | 2010-12-17 | 2012-06-21 | シャープ株式会社 | 太陽電池および太陽電池の製造方法 |
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| KR101444793B1 (ko) | 2011-06-09 | 2014-09-29 | 주식회사 에스에너지 | 후면 전극형 태양전지 모듈 및 그 제조방법 |
| JP2023520119A (ja) * | 2020-02-14 | 2023-05-16 | シャンラオ ジンコ ソーラー テクノロジー デベロップメント シーオー.,エルティーディー | 太陽電池それと太陽電池パネル及びその製造方法 |
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| JP2013214603A (ja) * | 2012-04-02 | 2013-10-17 | Sharp Corp | 配線シート付き太陽電池セルの製造方法および太陽電池モジュールの製造方法 |
| JP2014002899A (ja) * | 2012-06-18 | 2014-01-09 | Sekisui Chem Co Ltd | 導電接着材料、太陽電池モジュール部品及び太陽電池モジュール部品の製造方法 |
| JP2013058808A (ja) * | 2012-12-25 | 2013-03-28 | Sharp Corp | 太陽電池および太陽電池の製造方法 |
| JP2023520119A (ja) * | 2020-02-14 | 2023-05-16 | シャンラオ ジンコ ソーラー テクノロジー デベロップメント シーオー.,エルティーディー | 太陽電池それと太陽電池パネル及びその製造方法 |
| US12490524B2 (en) | 2020-02-14 | 2025-12-02 | Shangrao Xinyuan YueDong Technology Development Co. Ltd | Solar battery, and solar battery panel and method for manufacturing same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102473767A (zh) | 2012-05-23 |
| KR20120031302A (ko) | 2012-04-02 |
| EP2439784A1 (en) | 2012-04-11 |
| JPWO2011001837A1 (ja) | 2012-12-13 |
| US20120097245A1 (en) | 2012-04-26 |
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