WO2011087190A1 - Door valve - Google Patents
Door valve Download PDFInfo
- Publication number
- WO2011087190A1 WO2011087190A1 PCT/KR2010/004000 KR2010004000W WO2011087190A1 WO 2011087190 A1 WO2011087190 A1 WO 2011087190A1 KR 2010004000 W KR2010004000 W KR 2010004000W WO 2011087190 A1 WO2011087190 A1 WO 2011087190A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compressed air
- piston
- flow path
- opening
- closing member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H10P72/3406—
-
- H10P72/33—
Definitions
- the present invention relates to a door valve, and more particularly, an opening / closing actuator portion which controls the vertical movement of the opening / closing member and a forward / backward actuator portion which controls the movement in the front-back direction is provided. It relates to a door valve to be operated in the L (L) motion.
- the present applicant improves the arrangement of the sealing material disposed around the wafer movement passage through Patent Application No. 10-2003-0071906 (name of the slit valve) to prevent the damage of the sealing material sealing the movement passage and mounted on the valve drive
- the slit valve which can confirm the operation state by the indicator device is applied.
- the slit valve of the present application is a sealing member 100 for opening and closing the wafer movement passage, and the housing bracket formed separately from the sealing member 100 ( 200, the main shaft 400 extending between the sealing member 100 and the housing bracket 200, and the air cylinder 310 formed in the housing bracket 200 and driven by air pressure.
- a piston 320 formed inside the air cylinder 310, a piston shaft 330 coupled to the piston 320, a moving unit 340 coupled to the piston shaft 330, and the moving portion.
- a valve driving unit 300 having a link coupled to the unit 340 and the main shaft 340 is provided.
- the piston 320 of the air cylinder 310 formed inside the housing bracket 200 is rotated up and down according to the change in the pressure of the compressed air input from the outside. Accordingly, the moving unit 340 rotates up and down simultaneously with the piston, and the main shaft 400 connected to the moving unit 340 via the link 350 also rotates to open the wafer movement path to the sealing member 100. Open and close.
- valve driving unit 300 of the slit valve as shown in FIG. 2 is a one-step operation to vertically rotate the main shaft 400 and the main shaft 400 is rotated vertically forward and backward to the closed Two-step operation of opening and closing the semiconductor wafer movement path with the member 100, that is, it is driven in the shape of the L (L), the guide groove is formed in the shape of the L (L) to drive the L (L) as described above have.
- the link 350 is structurally rotated, the L-shaped shape of the conventional slit valve, that is, the linear L-shaped guide groove, guides the correct L-shaped motion of the valve driving part 300. There was a problem that was not easy.
- an O-ring made of a rubber material is installed in a groove on the contact surface of the opening / closing member that opens and closes the semiconductor wafer movement path by the link as described above.
- fine rotation is performed on the upper (or lower) O-ring. Is generated. Accordingly, the rotation of the O-ring is installed in the groove by the rotation of the O-ring, there was a fear that the departure or hardening from the groove.
- an object of the present invention is to open and close the wafer movement path is provided with a vertical actuating actuator portion for controlling the vertical movement of the opening and closing member and the forward and backward actuator portion for controlling the movement of the front and rear direction.
- the opening and closing member is to provide a door valve to be accurately operated in the L (L) motion.
- the door valve according to the present invention the opening and closing member 100 for opening and closing the semiconductor wafer movement passage; And, installed on the back of the opening and closing member 100, the inner side of the first passage ( A first cylinder 210 having a second flow path 2 formed at a front side thereof and a cover 221 is installed at a front side thereof is installed inside the first cylinder 210, and the first flow path is formed in the first cylinder 210.
- the first compressed air inlet hole 340 is formed so that the compressed air flows in when the wafer movement path is closed); and the second piston 320 by the compressed air introduced from the first compressed air inlet hole 340.
- the fifth passage (5) connected to the lower portion of the second cylinder 310 from the first compressed air inlet hole 340 so as to move upwardly; and by the compressed air introduced into the fifth passage (5)
- a relief valve R1 that is selectively opened when the second piston 320 reaches a top dead center and a check valve C1 that is selectively opened when the second piston 320 reaches a bottom dead center are installed.
- the first compressed air inlet through hole 340 and the fifth channel 5 move the compressed air to the first channel 1.
- a sixth flow passage (6) communicating with the first flow passage (1): a vertical actuating actuator portion (300) provided thereon.
- the opening and closing member 100 for opening and closing the semiconductor wafer movement passage is installed on the back of the opening and closing member 100, A first cylinder 210 having a first flow path 1 formed at an inner rear side and a second flow path 2 formed at a front side thereof, and having a cover 221 provided at a front side thereof, and inside the first cylinder 210.
- a first piston 220 installed and operated back and forth by compressed air flowing into the first flow passage 1 and the second flow passage 2; and connecting the first piston 220 and the opening and closing member 100 to each other.
- compressed air is introduced to open the wafer movement path by the opening / closing member 100, and is installed to communicate with the fourth flow passage 4 and the second flow passage 2 in the vertical operation actuator 300.
- a relief valve R2 that is selectively opened and a check valve C2 that is selectively opened when the first piston 220 reaches a bottom dead center are installed, and when the relief valve R2 is opened, It characterized in that it further comprises; a seventh flow path (7) formed so that the compressed air flows into the upper side of the two cylinder (320).
- the magnet member 321 which is installed in the second piston 320; and is installed in the up and down actuator actuator 300, the magnet member 321 is detected by the position of the second piston 320 It characterized in that it further comprises a; magnetic sensor 360 for detecting the.
- the vertical actuating actuator 300 is installed on the upper and lower surfaces of the second piston 320 in contact with the upper and lower surfaces of the forward and backward actuator 200 which is operated up and down by the vertical actuating actuator unit 300.
- a touch sensor 361 for detecting the position.
- a bellows 400 is provided between the opening and closing member 100 and the forward and backward actuator unit 200, and between the forward and backward actuator unit 200 and the up and down actuator unit 300, respectively. It is characterized by.
- an upper cover 301 and a lower cover 302 for sealing the second cylinder 310 on the upper and lower portions of the up and down actuator unit 300; and formed on the upper cover 301, the A guide part 303 for guiding the upper and lower shafts 330; and installed in the guide part 303 to be in contact with the outer circumferential surface of the upper and lower shafts 330, depending on the load of the opening / closing member 100. It characterized in that it further comprises; bushing 304 to prevent the wear of the upper and lower shafts 330 and the guide portion 303 when the eccentricity occurs.
- check valve (C1, C2) is characterized in that the rapid exhaust valve.
- the opening and closing member for opening and closing the wafer movement path is provided with a vertical actuating actuator portion for controlling the vertical movement of the opening and closing member and the forward and backward actuator portion for controlling the movement in the front and rear direction is precisely L (L). It has the advantage of being operated in motion.
- FIG. 1 is a cross-sectional view of a conventional slit valve
- Figure 2 is a state diagram showing the movement of the link of the conventional slit valve
- FIG. 3 is a front perspective view of a door valve according to a preferred embodiment of the present invention.
- FIG. 4 is a rear perspective view of the door valve according to the preferred embodiment of the present invention.
- FIG. 5 is an exploded perspective view of FIG. 3;
- FIG. 6 is a front and A-A, B-B cross-sectional view of the forward and backward actuator portion of the door valve according to the preferred embodiment of the present invention
- Figure 7 is a cross-sectional perspective view of the A-A cross section and B-B cross section of Figure 6,
- FIG. 8 is a cross-sectional view, a planar view, and a bottom view of a vertical actuating actuator of a door valve according to a preferred embodiment of the present invention
- FIG. 9 is a cross-sectional perspective view of the C-C section of FIG. 8, FIG.
- 10 to 13 is a side view showing a state in which the present invention works
- 15 is a cross-sectional view taken along line E-E of FIG.
- 16 to 17 are cross-sectional views of the forward and backward state of the forward and backward actuator
- 18 to 20 are cross-sectional views of a state in which the present invention is restored to the initial state while opening the semiconductor wafer movement passage.
- Figure 3 is a front perspective view of the door valve according to a preferred embodiment of the present invention
- Figure 4 is a rear perspective view of the door valve according to a preferred embodiment of the present invention
- Figure 5 is an exploded perspective view of Figure 3
- Figure 6 is a preferred view of the present invention
- Figure 7 is a cross-sectional perspective view of the AA cross-section of Figure 6 and a cross-sectional perspective view of the BB cross-section
- Figure 8 is a view of the door valve according to a preferred embodiment of the present invention Sectional, top and bottom views of a vertical actuating actuator
- FIG. 9 is a cross-sectional perspective view of section CC of FIG. 8.
- the opening and closing member 100, the forward and backward actuator unit 200, the vertical actuating actuator unit 300 and includes a first flow path (1), the second flow path (2) , The third flow path (3), the fourth flow path (4), the fifth flow path (5), the sixth flow path (6), the seventh flow path (7), the first cylinder 210, the first piston 220, The second cylinder 310, the second piston 320, the magnet member 321, the upper and lower shaft 330, the first compressed air inlet hole 340, the second compressed air inlet hole 350, the magnetic sensor 360 ), The contact sensor 361 and the connection member (B) may be further included.
- compressed air flows through the first to seventh flow paths to be described later, and the actuator unit 200 and the up and down actuator actuator 300 move forward and backward by the compressed air flowing into the first to seventh flow paths.
- the opening and closing member 100 is installed at the front of the forward and backward actuator unit 200 to be described later to open or close the semiconductor wafer movement path (not shown) by moving forward or backward by the compressed air flowing into the forward and backward actuator unit 200.
- the member to be formed it is preferable that an O-ring is provided on a surface of the semiconductor wafer movement path.
- the forward and backward actuator unit 200 includes a first piston 220 and the first piston installed inside the first cylinder 210 and the first cylinder 210. It consists of a connecting member (B) coupled to the back of the opening and closing member 100 through the central portion of the 220, the connecting member (B) to transfer the front and rear movement of the first piston 220 to the opening and closing member Play a role.
- the first cylinder 210 has a first flow path 1 formed at a rear side thereof and a second flow path 2 formed at a front side thereof. It is the front side.
- the first piston 220 is installed inside the first cylinder 210, and the first piston 220 is operated only inside the first cylinder 210.
- a cover 221 covering the front surface of the first cylinder 210 is installed.
- the first piston 220 is moved back and forth. When the compressed air flows into the first flow passage 1, the first piston 220 moves forward, and when the compressed air flows into the second flow passage 2, the first piston 220 moves backward.
- first piston 220 is a connecting member (B) is installed through the role of connecting the first piston 220 and the above-mentioned opening and closing member 100, such a connection member (B), for example, It is preferable to be made of bolts or coupling pins.
- the opening and closing member 100 coupled to the first piston 220 through the connection member B is operated according to the forward and backward movement of the first piston 220 to open and close the semiconductor wafer movement path.
- the up and down actuator unit 300 is composed of a second cylinder 310, the second piston 320, the upper and lower shaft 330, the first compressed air inlet hole 340, the second compressed air inlet hole 350. do.
- the second cylinder 310 is installed inside the vertical actuating actuator part 300, and the second cylinder 310 is disposed inside the second cylinder 310.
- the piston 320 is installed, and the upper and lower shafts 330 are installed at the center of the second piston 320.
- the second piston 320 is a member installed inside the second cylinder 310 to be operated up and down by compressed air, the second piston 320 is the first compressed air inlet 340 and the second Compressed air is introduced in the vertical direction by the compressed air flowing into the inlet hole (350).
- the upper and lower shafts 330 are connected to a central portion of the second piston 320 and the other side is connected to the forward and backward actuator unit 200. Accordingly, the upper and lower shafts 330 are formed of the second piston. The upward or downward movement is transmitted to the forward and backward actuator 200 to raise or lower the opening / closing member 100 to a height consistent with the semiconductor wafer movement path.
- the first compressed air inflow hole 340 is a member into which compressed air at the time of closing the semiconductor wafer movement path of the opening / closing member 100 flows in the first compressed air inflow hole 340. Compressed air introduced into the) is supplied to the flow passage involved in the advancement of the opening and closing member 100 of the flow paths to be described later, a detailed description thereof will be described later.
- the second compressed air inflow hole 350 plays a role opposite to that of the first compressed air inflow hole 340, that is, when the semiconductor wafer movement path of the opening and closing member 100 is opened. Compressed air flows in.
- Compressed air introduced into the second compressed air inflow hole 350 as described above is supplied to a flow path that is involved in the backward of the opening and closing member 100 among the flow paths to be described later, which will be described later.
- FIG. 10 to 13 is a side view showing the operation of the present invention
- Figure 14 is a DD cross-sectional view of Figure 10
- Figure 15 is an EE cross-sectional view of Figure 11
- Figures 16 to 17 shows the forward and backward movement of the actuator 18 to 20 are cross-sectional views of a state in which the present invention is restored to the initial state while opening the semiconductor wafer movement passage.
- the initial state which will be described later, is a state in which the opening and closing member 100 is completely moved downward as shown in FIGS. 10, 14, and 20.
- first passage 1 is below the first cylinder 210
- second passage 2 is above the first cylinder 210
- third passage 3 is the two upper and lower shafts 330
- fourth flow passage 4 is formed in the up and down direction inside the other up and down shaft among the two up and down shafts 330.
- the fifth flow passage 5 is in communication with the first compressed air inlet through hole 340 and the sixth flow passage (6), but the sixth flow passage (6), the relief valve (R1) and the check valve that opens when a predetermined pressure or more occurs (C1) is provided, the seventh flow path (7) is in communication with the second compressed air inlet hole 350, the seventh flow path (7) is also provided with a relief valve (R2) and check valve (C1) have.
- Compressed air flows into the first compressed air inlet hole 340 in an initial state.
- the compressed air is introduced into the first compressed air inlet hole 340.
- the fifth flow path 5 and the sixth flow path 6, which communicate with each other) and proceed from the state of FIGS. 10 and 14 to the state of FIGS. 11 and 15.
- the fifth flow path 5 and the sixth flow path 6 are the same pressure, that is, the same pressure is generated, the sixth flow path 6, the relief valve (R1) that is selectively opened only when a predetermined pressure or more occurs Is installed so that the compressed air is first introduced into the fifth passage (5).
- the relief valve (R1) is also installed in the seventh flow path (7) to be described later, these relief valves (R1, R2) are introduced into the first compressed air inlet through-hole 340 and the second compressed air inlet through (350) It is preferable to withstand the primary pressure generated by the flow of compressed air into the flow path and then open it at the end. Accordingly, in the design of the present invention, it would be desirable to appropriately select the repulsion coefficient of the spring installed in the relief valve R1.
- the compressed air entering the fifth passage 5 flows into the lower portion of the second cylinder 310 communicating with the fifth passage 5, and thus compressed air flows into the second cylinder 310.
- the vertical shaft 330 installed at the center of the second piston 320 is also moved upward.
- the opening and closing member 100 connected through the first piston 220 and the connection member B is also advanced and the semiconductor wafer movement path is sealed, and this state is called a sealed state.
- the opening and closing member 100 in order to move the semiconductor wafer in a sealed state, the opening and closing member 100 must open the semiconductor wafer movement passage, in which case the compressed air flows into the second compressed air inflow passage 350.
- Compressed air introduced into the second compressed air inlet hole 350 as described above is simultaneously introduced into the fourth flow path 4 and the seventh flow path 7 formed inside the other upper and lower shafts, and the seventh flow path 7 Since the relief valve R2 is installed in the air, the compressed air flows into the fourth flow passage 4 first, and the compressed air introduced into the fourth flow passage 4 flows in communication with the fourth flow passage 4. Flows into (2).
- the relief The valve R2 starts to open gradually, and compressed air flows into the upper side of the second cylinder 310 through the seventh flow passage 7 as shown in FIG. 20.
- the compressed air flows in through the first compressed air inflow hole 340 so as to move backward and forward of the front and rear shafts 230 and the downward shaft 330.
- the compressed air that was present is released to the outside, and this state is called an open state.
- a magnet member 321 is installed on the second piston 320 so that the position of the top dead center or the bottom dead center of the second piston 320 can be checked from the outside, and the magnet member 321 is detected.
- the sensor 360 may be provided in the up and down actuator unit 300.
- the up and down actuator unit 300 is preferably installed so that the upper cover 301 on the upper portion of the up and down actuator actuator 300 to separate the lower cover 302 in the lower, so as to facilitate maintenance, It is preferable that a sealing member (O-ring) of rubber material (not shown) is installed at each coupling portion so as to keep the inside of the second cylinder 310 sealed.
- the lower cover 302 is formed with a straw-shaped tube, which is coupled to communicate with the inside of the third passage 3 and the fourth passage 4 of the upper and lower shafts.
- the vertical shaft 330 may be stably guided.
- the tube is formed to have a length equal to or greater than a distance of vertical movement of the vertical shaft 330 so that the third passage 3 and the fourth passage 4 may be moved even when the second piston 320 is moved to the top dead center. It is preferred to communicate.
- the upper cover 301 has a guide portion 303 upwardly projected to accurately guide the vertical movement of the upper and lower shafts 330. It is preferable that a sealing member (O-ring) of rubber material is installed inside to seal the second cylinder 310.
- this bushing 304 is an eccentric generated when the front and rear of the opening and closing member 100 By reducing the stress generated by the contact between the upper and lower shafts 330 and the guide portion 303 and serves to seal the second cylinder 310 together with the sealing member.
- the bushing 304 installed as described above is installed in a place where stress is directly generated, it may be made of a material having a relatively low hardness such as copper or plastic.
- the bellows 400 is preferably provided between the upper end of the guide portion 303 and the forward and backward actuator unit 200 and between the opening and closing member 100 and the forward and backward actuator unit 200, respectively.
- the bellows 400 serves to attenuate the vibration and noise generated during the operation of the present invention, as well as to protect the main part of the present invention from powder generated from the semiconductor manufacturing process during installation of the vacuum state. Do it.
- the check valves C1 and C2 installed in the sixth flow path 6 and the seventh flow path 7 are members that open only in one direction, similar to the relief valves R1 and R2. C1 and C2 are opened when the compressed air introduced into the first compressed air inlet hole 340 and the second compressed air inlet hole 350 is discharged to the outside, and is opposite to the relief valves R1 and R2. Allow flow of fluid in the
- the check valve (C1) is installed in the sixth flow path (6) is opened when the discharge of the compressed air introduced into the first compressed air inlet through hole 340, when switching from the closed state to the open state,
- the check valve C2 installed in the seventh flow path 7 is opened when the compressed air introduced into the second compressed air inflow through hole 350 is discharged from the open state to the closed state.
- check valves (C1, C2) may be replaced by a rapid exhaust valve, if it is replaced as described above, it will be able to open and close the semiconductor wafer movement path more quickly because the time consumed for exhaust is significantly reduced.
Landscapes
- Actuator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Sliding Valves (AREA)
- Details Of Valves (AREA)
- Fluid-Driven Valves (AREA)
- Check Valves (AREA)
Abstract
Description
๋ณธ ๋ฐ๋ช ์ ๋์ด๋ฐธ๋ธ์ ๊ดํ ๊ฒ์ผ๋ก์, ๋ ์์ธํ๊ฒ๋ ๊ฐํ๋ถ์ฌ์ ์ํ๋ฐฉํฅ ์์ง์์ ์ฃผ๊ดํ๋ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ์ ์ ํ๋ฐฉํฅ์ ์์ง์์ ์ฃผ๊ดํ๋ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ๊ฐ ๊ตฌ๋น๋์ด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ๊ฐ ์ ํํ๊ฒ ์(L)๋ชจ์ ์ผ๋ก ์๋๋๋๋ก ํ๋ ๋์ด๋ฐธ๋ธ์ ๊ดํ ๊ฒ์ด๋ค.The present invention relates to a door valve, and more particularly, an opening / closing actuator portion which controls the vertical movement of the opening / closing member and a forward / backward actuator portion which controls the movement in the front-back direction is provided. It relates to a door valve to be operated in the L (L) motion.
๋ณธ ์ถ์์ธ์ ํนํ์ถ์ 10-2003-0071906ํธ(๋ฐ๋ช ์ ๋ช ์นญ:์ฌ๋ฆฟ๋ฐธ๋ธ)๋ฅผ ํตํ์ฌ ์จ์ดํผ ์ด๋ํต๋ก ์ฃผ์์ ๋ฐฐ์น๋๋ ๋ฐ๋ด์ฌ์ ๋ฐฐ์น๊ตฌ์กฐ๋ฅผ ๊ฐ์ ํ์ฌ ์ด๋ํต๋ก๋ฅผ ๋ฐํํ๋ ๋ฐ๋ด์ฌ์ ์์์ ๋ฐฉ์งํ๊ณ ๋ฐธ๋ธ๊ตฌ๋๋ถ์ ์ฅ์ฐฉ๋๋ ์ธ๋์ผ์ดํธ์ฅ์น๋ก ์๋์ํ๋ฅผ ํ์ธํ ์ ์๋ ์ฌ๋ฆฟ๋ฐธ๋ธ๋ฅผ ์ถ์ํ์๋ค.The present applicant improves the arrangement of the sealing material disposed around the wafer movement passage through Patent Application No. 10-2003-0071906 (name of the slit valve) to prevent the damage of the sealing material sealing the movement passage and mounted on the valve drive The slit valve which can confirm the operation state by the indicator device is applied.
๋ 1์ ์ฐธ์กฐํ๋ฉด, ์ข
๋๊ธฐ์ ์ ๋ฐ๋ฅธ ์ฌ๋ฆฟ๋ฐธ๋ธ์ ๋จ๋ฉด๋๊ฐ ๋์๋์ด ์๋๋ฐ, ์ด ์ถ์์ ์ฌ๋ฆฟ๋ฐธ๋ธ๋ ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๋ฐํ๋ถ์ฌ(100)์, ์๊ธฐ ๋ฐํ๋ถ์ฌ(100)์ ๋ณ๋๋ก ํ์ฑ๋ ํ์ฐ์ง๋ธ๋ผ์ผ(200)๊ณผ, ์๊ธฐ ๋ฐํ๋ถ์ฌ(100)์ ํ์ฐ์ง๋ธ๋ผ์ผ(200) ์ฌ์ด์์ ์ฐ์ฅํ์ฑ๋ ๋ฉ์ธ์คํํธ(400)์, ์๊ธฐ ํ์ฐ์ง๋ธ๋ผ์ผ(200) ๋ด๋ถ์ ํ์ฑ๋๋ฉฐ, ๊ณต๊ธฐ์ ์๋ ฅ์ ์ํด ๊ตฌ๋๋๋ ์์ด์ค๋ฆฐ๋(310)์, ์๊ธฐ ์์ด์ค๋ฆฐ๋(310) ๋ด๋ถ์ ํ์ฑ๋ ํผ์คํค(320)๊ณผ, ์๊ธฐ ํผ์คํค(320)์ ๊ฒฐํฉ๋ ํผ์คํค์คํํธ(330)์, ์๊ธฐ ํผ์คํค์คํํธ(330)์ ๊ฒฐํฉ๋๋ ๋ฌด๋น์ ๋(340)๊ณผ, ์๊ธฐ ๋ฌด๋น์ ๋(340)๊ณผ ๋ฉ์ธ์คํํธ(340)์ ๊ฒฐํฉ๋ ๋งํฌ๊ฐ ๊ตฌ๋น๋ ๋ฐธ๋ธ๊ตฌ๋๋ถ(300)๊ฐ ๊ตฌ๋น๋์ด ์๋ค.Referring to Figure 1, there is shown a cross-sectional view of a slit valve according to the prior art, the slit valve of the present application is a
์๊ธฐ์ ๊ฐ์ ์ฌ๋ฆฟ๋ฐธ๋ธ๋ ์ธ๋ถ์์ ์
๋ ฅ๋๋ ์์ถ ๊ณต๊ธฐ์ ์๋ ฅ์ ๋ณํ์ ๋ฐ๋ผ ํ์ฐ์ง๋ธ๋ผ์ผ(200) ๋ด๋ถ์ ํ์ฑ๋ ์์ด์ค๋ฆฐ๋(310)์ ํผ์คํค(320)์ด ์ํ ํ๋ ๋๋ค. ์ด์ ๋ฐ๋ผ, ๋ฌด๋น์ ๋(340)์ด ์๊ธฐ ํผ์คํค๊ณผ ๋์์ ์ํ ํ๋๋๊ณ , ์๊ธฐ ๋ฌด๋น์ ๋(340)์ ๋งํฌ(350)๋ฅผ ๋งค๊ฐ๋ก ์ฐ๊ฒฐ๋ ๋ฉ์ธ์คํํธ(400)๋ ํ๋๋์ด ๋ฐํ๋ถ์ฌ(100)๋ก ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ค.In the slit valve as described above, the
๋ํ, ์๊ธฐ์ ๊ฐ์ ์ฌ๋ฆฟ๋ฐธ๋ธ์ ๋ฐธ๋ธ๊ตฌ๋๋ถ(300)๋ ๋ 2์ ๋์๋ ๋ฐ์ ๊ฐ์ด ์๊ธฐ ๋ฉ์ธ์คํํธ(400)๋ฅผ ์์ง ์ํํ๋์ํค๋ 1๋จ๊ณ ๋์๊ณผ ์๊ธฐ ๋ฉ์ธ์คํํธ(400)๊ฐ ์์ง ์ ํ๋ฐฉ์ผ๋ก ํ๋๋์ด ์๊ธฐ ๋ฐํ๋ถ์ฌ(100)๋ก ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ 2๋จ๊ณ ๋์, ์ฆ ์(L)์ ํ์์ผ๋ก ๊ตฌ๋๋๋๋ฐ, ์๊ธฐ์ ๊ฐ์ด ์(L)์ ๊ตฌ๋์ด ๋๋๋ก ๊ฐ์ด๋ ํ์ด ์(L)์ ํ์์ผ๋ก ํ์ฑ๋์ด ์๋ค.In addition, the
๊ทธ๋ฌ๋, ์๊ธฐ ๋งํฌ(350)๋ ๊ตฌ์กฐ์ ์ผ๋ก ํ์ ์ด๋์ด ๋๋ฏ๋ก, ์ข
๋์ ์ฌ๋ฆฟ๋ฐธ๋ธ์ ์(L)์ ํ์ ์ฆ ์ง์ ๊ถค์ ์ ๊ฐ์ด๋ ํ์ผ๋ก๋ ๋ฐธ๋ธ๊ตฌ๋๋ถ(300)์ ์ ํํ ์(L)์ ์ด๋์ ๊ฐ์ด๋๊ฐ ์ฉ์ดํ์ง ๋ชปํ ๋ฌธ์ ์ ์ด ์์๋ค.However, since the
๋ํ, ๋ 2์ ๋์๋ ๋ฐ์ ๊ฐ์ด ์(L)์ ํ์์ ๊ฐ์ด๋ ํ(351)์ผ๋ก ์๊ธฐ ๋งํฌ(350)๋ฅผ ๊ฐ์ด๋ ํ ๊ฒฝ์ฐ, ์๊ธฐ ๋งํฌ์ ๊ฐ์ด๋ ํ์ ๋ชจ์๋ฆฌ์ ๋ฐ๋ณต์ ์ธ ๋ง์ฐฐ๋ก ์ธํ ์๋ ฅ์ง์ค์ด ๋ฐ์ํ๊ฒ ๋๋ฉฐ, ์๊ธฐ ๋งํฌ๊ฐ ๊ฐ์ด๋ ํ์ ๋ผ์์ง ์ํ๋ก ํ๋๋๋ฉด, ๋ 2์ ๋์๋ ๋ฐ์ ๊ฐ์ด ๋ฏธ์ธํ ์ ๊ฒฉ์ด ์๊ฒจ ๋ฐํ๋ถ์ฌ๋ก ๋ฐ๋์ฒด ์จ์ดํผ ํต๋ก๋ฅผ ๊ฐํํ๋ ๋์์ด ์ ํํ๊ฒ ์ ์ด๋๊ธฐ ํ๋ ๋ฌธ์ ์ ์ด ์์๋ค.In addition, when guiding the
๋ํ, ์๊ธฐ์ ๊ฐ์ ๋งํฌ์ ์ํด ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ์ ์ ์ด๋ฉด์๋ ๊ณ ๋ฌด์ฌ์ง์ ์ค๋ง์ด ํ์ ์ค์น๋๋๋ฐ, ์ด๋ฌํ ์ค๋ง๊ณผ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก์ ์ ์ด์ ์์ธก(๋๋ ํ์ธก)์ค๋ง์๋ ๋ฏธ์ธํ ํ์ ์ด ๋ฐ์๋๋ค. ์ด์ ๋ฐ๋ผ, ์ค๋ง์ ํ์ ์ ์ํด ์ค๋ง์ ํ์ ์ค์น๋ ์ํ๋ก ํ์ ์ด ๋ฐ์๋์ด ํ์์ ์ดํ๋๊ฑฐ๋ ๊ฒฝํ๋ ์ผ๋ ค๊ฐ ์์๋ค.In addition, an O-ring made of a rubber material is installed in a groove on the contact surface of the opening / closing member that opens and closes the semiconductor wafer movement path by the link as described above. When the O-ring contacts the semiconductor wafer movement path, fine rotation is performed on the upper (or lower) O-ring. Is generated. Accordingly, the rotation of the O-ring is installed in the groove by the rotation of the O-ring, there was a fear that the departure or hardening from the groove.
๋ณธ ๋ฐ๋ช ์ ์์ ํ ๋ฌธ์ ์ ์ ํด๊ฒฐํ๊ณ ์ ์์ถ๋ ๊ฒ์ผ๋ก์, ๋ณธ ๋ฐ๋ช ์ ๋ชฉ์ ์ ๊ฐํ๋ถ์ฌ์ ์ํ๋ฐฉํฅ ์์ง์์ ์ฃผ๊ดํ๋ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ์ ์ ํ๋ฐฉํฅ์ ์์ง์์ ์ฃผ๊ดํ๋ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ๊ฐ ๊ตฌ๋น๋์ด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ๊ฐ ์ ํํ๊ฒ ์(L)๋ชจ์ ์ผ๋ก ์๋๋๋๋ก ํ๋ ๋์ด๋ฐธ๋ธ๋ฅผ ์ ๊ณตํ๋ ๊ฒ์ด๋ค.The present invention has been made to solve the above problems, an object of the present invention is to open and close the wafer movement path is provided with a vertical actuating actuator portion for controlling the vertical movement of the opening and closing member and the forward and backward actuator portion for controlling the movement of the front and rear direction. The opening and closing member is to provide a door valve to be accurately operated in the L (L) motion.
์๊ธฐ์ ๊ฐ์ ๋ฌธ์ ์ ์ ํด๊ฒฐํ๊ธฐ ์ํด ๋ณธ ๋ฐ๋ช
์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ๋, ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ(100);์, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ๋ฐฐ๋ฉด์ ์ค์น๋๋, ๋ด๋ถ ํ์ธก์๋ ์ 1์ ๋ก(1)๊ฐ ์ ์ธก์๋ ์ 2์ ๋ก(2)๊ฐ ํ์ฑ๋๋ฉฐ, ์ ๋ฉด์๋ ์ปค๋ฒ(221)๊ฐ ์ค์น๋๋ ์ 1์ค๋ฆฐ๋(210):์, ์ด ์ 1์ค๋ฆฐ๋(210)์ ๋ด๋ถ์ ์ค์น๋์ด ์๊ธฐ ์ 1์ ๋ก(1)์ ์ 2์ ๋ก(2)์ ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ ํ๋ก ์๋๋๋ ์ 1ํผ์คํค(220):๊ณผ, ์๊ธฐ ์ 1ํผ์คํค(220)๊ณผ ๊ฐํ๋ถ์ฌ(100)๋ฅผ ์ฐ๊ฒฐํ๋ ์ฐ๊ฒฐ๋ถ์ฌ(B):๊ฐ ๊ตฌ๋น๋ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200);์, ๋ด๋ถ์ ํ์ฑ๋๋ ๋ณต์์ ์ 2์ค๋ฆฐ๋(310):์, ์ด ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ์ ์ค์น๋์ด ์์ถ๊ณต๊ธฐ์ ์ํด ์ํ๋ก ์๋๋๋ ์ 2ํผ์คํค(320):๊ณผ, ์ผ์ธก์ ์๊ธฐ ์ 2ํผ์คํค(320)์ ์ฐ๊ฒฐ๋๋ฉฐ, ํ์ธก์ ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฐ๊ฒฐ๋๊ณ , ๋ด๋ถ์๋ ์์ถ๊ณต๊ธฐ๊ฐ ์ ๋๋๋, ์๊ธฐ ์ 1์ ๋ก(1)์ ์ฐํต๋๋ ์ 3์ ๋ก(3)์ ์๊ธฐ ์ 2์ ๋ก(2)์ ์ฐํต๋๋ ์ 4์ ๋ก(4)๊ฐ ํ์ฑ๋๋ ์ํ์คํํธ(330):์, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ์จ์ดํผ ์ด๋ํต๋ก ํ์์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋๋ก ํ์ฑ๋๋ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340):๊ณผ, ์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก๋ถํฐ ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์๊ธฐ ์ 2ํผ์คํค(320)์ด ์ํฅ์ด๋๋๋๋ก ์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก๋ถํฐ ์๊ธฐ ์ 2์ค๋ฆฐ๋(310)์ ํ๋ถ๊น์ง ์ฐ๊ฒฐ๋๋ ์ 5์ ๋ก(5):์, ์๊ธฐ ์ 5์ ๋ก(5)๋ก ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์๊ธฐ ์ 2ํผ์คํค(320)์ด ์์ฌ์ ์ ๋๋ฌํ๋ฉด ์ ํ์ ์ผ๋ก ์ด๋ฆฌ๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)์ ์๊ธฐ ์ 2ํผ์คํค(320)์ด ํ์ฌ์ ์ ๋๋ฌํ๋ฉด ์ ํ์ ์ผ๋ก ์ด๋ฆฌ๋ ์ฒดํฌ๋ฐธ๋ธ(C1)๊ฐ ์ค์น๋๋, ์๊ธฐ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๊ฐ ์ด๋ฆฌ๋ฉด ์์ถ๊ณต๊ธฐ๊ฐ ์๊ธฐ ์ 1์ ๋ก(1)๋ก ์ด๋๋๋๋ก ์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ 5์ ๋ก(5) ๋ฐ ์ 1์ ๋ก(1)์ ์ฐํต๋๋ ์ 6์ ๋ก(6):๊ฐ ๊ตฌ๋น๋ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300);๋ฅผ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In order to solve the above problems, the door valve according to the present invention, the opening and closing
๋ํ, ์๊ธฐ์ ๊ฐ์ ๋ฌธ์ ์ ์ ํด๊ฒฐํ๊ธฐ ์ํด ๋ณธ ๋ฐ๋ช
์ ๋ ๋ค๋ฅธ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ๋, ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ(100);์, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ๋ฐฐ๋ฉด์ ์ค์น๋๋, ๋ด๋ถ ํ์ธก์๋ ์ 1์ ๋ก(1)๊ฐ ์ ์ธก์๋ ์ 2์ ๋ก(2)๊ฐ ํ์ฑ๋๋ฉฐ, ์ ๋ฉด์๋ ์ปค๋ฒ(221)๊ฐ ์ค์น๋๋ ์ 1์ค๋ฆฐ๋(210):์, ์ด ์ 1์ค๋ฆฐ๋(210)์ ๋ด๋ถ์ ์ค์น๋์ด ์๊ธฐ ์ 1์ ๋ก(1)์ ์ 2์ ๋ก(2)์ ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ ํ๋ก ์๋๋๋ ์ 1ํผ์คํค(220):๊ณผ, ์๊ธฐ ์ 1ํผ์คํค(220)๊ณผ ๊ฐํ๋ถ์ฌ(100)๋ฅผ ์ฐ๊ฒฐํ๋ ์ฐ๊ฒฐ๋ถ์ฌ(B):์, ์๊ธฐ ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ฅผ ์ธ๋ถ๋ก๋ถํฐ ๋ฐํํ๋ ํ๋ฉด์ปค๋ฒ(201):๊ฐ ๊ตฌ๋น๋ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200);์, ๋ด๋ถ์ ํ์ฑ๋๋ ๋ณต์์ ์ 2์ค๋ฆฐ๋(310):์, ์ด ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ์ ์ค์น๋์ด ์์ถ๊ณต๊ธฐ์ ์ํด ์ํ๋ก ์๋๋๋ ์ 2ํผ์คํค(320):๊ณผ, ์ผ์ธก์ ์๊ธฐ ์ 2ํผ์คํค(320)์ ์ฐ๊ฒฐ๋๋ฉฐ, ํ์ธก์ ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฐ๊ฒฐ๋๊ณ , ๋ด๋ถ์๋ ์์ถ๊ณต๊ธฐ๊ฐ ์ ๋๋๋, ์๊ธฐ ์ 1์ ๋ก(1)์ ์ฐํต๋๋ ์ 3์ ๋ก(3)์ ์๊ธฐ ์ 2์ ๋ก(2)์ ์ฐํต๋๋ ์ 4์ ๋ก(4)๊ฐ ํ์ฑ๋๋ ์ํ์คํํธ(330):๊ฐ ๊ตฌ๋น๋ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300);๋ฅผ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, the door valve according to another embodiment of the present invention, in order to solve the above problems, the opening and closing
๋ํ, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ์ํด ์จ์ดํผ ์ด๋ํต๋ก๊ฐ ๊ฐ๋ฐฉ๋๋๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉฐ, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์๊ธฐ ์ 4์ ๋ก(4) ๋ฐ ์ 2์ ๋ก(2)์ ์ฐํต๋๋๋ก ์ค์น๋๋ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350);๊ณผ, ์๊ธฐ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)๊ณผ ์ฐํต๋๋ฉฐ, ์๊ธฐ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์๊ธฐ ์ 1ํผ์คํค(220)์ด ํ์ฌ์ ์ ๋๋ฌํ๋ฉด ์ ํ์ ์ผ๋ก ์ด๋ฆฌ๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R2)์ ์๊ธฐ ์ 1ํผ์คํค(220)์ด ํ์ฌ์ ์ ๋๋ฌํ๋ฉด ์ ํ์ ์ผ๋ก ์ด๋ฆฌ๋ ์ฒดํฌ๋ฐธ๋ธ(C2)๊ฐ ์ค์น๋๋, ์๊ธฐ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R2)๊ฐ ์ด๋ฆฌ๋ฉด ์๊ธฐ ์ 2์ค๋ฆฐ๋(320)์ ์์ธก์ผ๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋๋ก ํ์ฑ๋๋ ์ 7์ ๋ก(7);๋ฅผ ๋ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, compressed air is introduced to open the wafer movement path by the opening /
๋ํ, ์๊ธฐ ์ 2ํผ์คํค(320)์ ์ค์น๋๋ ์์๋ถ์ฌ(321);์, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์ค์น๋๋, ์๊ธฐ ์์๋ถ์ฌ(321)๋ฅผ ๊ฐ์งํ์ฌ ์๊ธฐ ์ 2ํผ์คํค(320)์ ์์น๋ฅผ ๊ฒ์ถํ๋ ์์์ ์ผ์(360);๋ฅผ ๋ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, the
๋ํ, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์ค์น๋๋, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์ํด ์ํ๋ก ์๋๋๋ ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ(200)์ ์๋ฉด๊ณผ ํ๋ฉด์ ์ ์ด๋์ด ์๊ธฐ ์ 2ํผ์คํค(320)์ ์์น๋ฅผ ๊ฒ์ถํ๋ ์ ์ด์ ์ผ์(361);๋ฅผ ๋ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, the vertical actuating
๋ํ, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฌ์ด์ ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์ฌ์ด์ ๊ฐ๊ฐ ์ค์น๋๋ ๋ฒจ๋ก์ฐ์ฆ(400);๋ฅผ ๋ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, a
๋ํ, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์๋ถ์ ํ๋ถ์๋ ์๊ธฐ ์ 2์ค๋ฆฐ๋(310)๋ฅผ ๋ฐํํ๋ ์๋ถ์ปค๋ฒ(301) ๋ฐ ํ๋ถ์ปค๋ฒ(302);์, ์๊ธฐ ์๋ถ์ปค๋ฒ(301)์ ํ์ฑ๋๋ฉฐ, ์๊ธฐ ์ํ์คํํธ(330)๊ฐ ๊ฐ์ด๋๋๋๋ก ํ๋ ๊ฐ์ด๋๋ถ(303);์, ์๊ธฐ ๊ฐ์ด๋๋ถ(303)์ ๋ด๋ถ์ ์ค์น๋์ด ์๊ธฐ ์ํ์คํํธ(330)์ ์ธ์ฃผ๋ฉด๊ณผ ์ ์ด๋๋, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ํ์ค์ ๋ฐ๋ฅธ ํธ์ฌ์ ๋ฐ์์ ์๊ธฐ ์ํ์คํํธ(330)์ ๊ฐ์ด๋๋ถ(303)์ ๋ง๋ชจ๋ฅผ ๋ฐฉ์งํ๋ ๋ถ์ฑ(304);์ ๋ ํฌํจํ๋ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, an
๋ํ, ์๊ธฐ ์ฒดํฌ๋ฐธ๋ธ(C1, C2)๋ ๊ธ์๋ฐฐ๊ธฐ๋ฐธ๋ธ์ธ ๊ฒ์ ํน์ง์ผ๋ก ํ๋ค.In addition, the check valve (C1, C2) is characterized in that the rapid exhaust valve.
์ด์ ์์ ํ ๋ฐ์ ๊ฐ์ ๋ณธ ๋ฐ๋ช ์ ์ํ๋ฉด, ๊ฐํ๋ถ์ฌ์ ์ํ๋ฐฉํฅ ์์ง์์ ์ฃผ๊ดํ๋ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ์ ์ ํ๋ฐฉํฅ์ ์์ง์์ ์ฃผ๊ดํ๋ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ๊ฐ ๊ตฌ๋น๋์ด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ ๊ฐํ๋ถ์ฌ๊ฐ ์ ํํ๊ฒ ์(L)๋ชจ์ ์ผ๋ก ์๋๋๋ ์ฅ์ ์ด ์๋ค.According to the present invention as described above, the opening and closing member for opening and closing the wafer movement path is provided with a vertical actuating actuator portion for controlling the vertical movement of the opening and closing member and the forward and backward actuator portion for controlling the movement in the front and rear direction is precisely L (L). It has the advantage of being operated in motion.
๋ 1์ ์ข ๋์ ์ฌ๋ฆฟ๋ฐธ๋ธ์ ๊ตฌ์ฑ๋จ๋ฉด๋,1 is a cross-sectional view of a conventional slit valve,
๋ 2๋ ์ข ๋์ ์ฌ๋ฆฟ๋ฐธ๋ธ์ ๋งํฌ์ ์์ง์์ ๋ํ๋ธ ์ํ๋,Figure 2 is a state diagram showing the movement of the link of the conventional slit valve,
๋ 3์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ ๋ฉด์ฌ์๋, 3 is a front perspective view of a door valve according to a preferred embodiment of the present invention;
๋ 4๋ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ๋ฐฐ๋ฉด์ฌ์๋, 4 is a rear perspective view of the door valve according to the preferred embodiment of the present invention;
๋ 5๋ ๋ 3์ ๋ถํด์ฌ์๋, 5 is an exploded perspective view of FIG. 3;
๋ 6์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ์ ์ ๋ฉด ๋ฐ A-A, B-B๋จ๋ฉด๋, 6 is a front and A-A, B-B cross-sectional view of the forward and backward actuator portion of the door valve according to the preferred embodiment of the present invention;
๋ 7์ ๋ 6์ A-A๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋ ๋ฐ B-B๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋, Figure 7 is a cross-sectional perspective view of the A-A cross section and B-B cross section of Figure 6,
๋ 8์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ํ์๋ ์ก์ถ์์ดํฐ์ ๋จ๋ฉด, ํ๋ฉด ๋ฐ ์ ๋ฉด๋, 8 is a cross-sectional view, a planar view, and a bottom view of a vertical actuating actuator of a door valve according to a preferred embodiment of the present invention;
๋ 9๋ ๋ 8์ C-C๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋,9 is a cross-sectional perspective view of the C-C section of FIG. 8, FIG.
๋ 10 ๋ด์ง ๋ 13์ ๋ณธ ๋ฐ๋ช ์ด ์๋๋๋ ๋ชจ์ต์ ๋ณด์ธ ์ธก๋ฉด๋, 10 to 13 is a side view showing a state in which the present invention works,
๋ 14๋ ๋ 10์ D-D๋จ๋ฉด๋, 14 is a cross-sectional view taken along line D-D of FIG. 10;
๋ 15๋ ๋ 11์ E-E๋จ๋ฉด๋, 15 is a cross-sectional view taken along line E-E of FIG.
๋ 16 ๋ด์ง ๋ 17์ ์ ํ์ง ์ก์ถ์์ดํฐ์ ์ ์ง ๋ฐ ํ์งํ๋ ์ํ์ ๋จ๋ฉด๋,16 to 17 are cross-sectional views of the forward and backward state of the forward and backward actuator,
๋ 18 ๋ด์ง ๋ 20์ ๋ณธ ๋ฐ๋ช ์ด ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐ๋ฐฉํจ๊ณผ ๋์์ ์ด๊ธฐ์ํ๋ก ๋ณต์๋๋ ์ํ์ ๋จ๋ฉด๋์ด๋ค.18 to 20 are cross-sectional views of a state in which the present invention is restored to the initial state while opening the semiconductor wafer movement passage.
์ดํ, ์ฒจ๋ถ๋ ๋๋ฉด์ ์ฐธ์กฐํ์ฌ, ๋ณธ ๋ฐ๋ช ์ ์ค์์๋ค์ ์ค๋ช ํ๊ธฐ๋ก ํ๋ค. ๊ฐ ๋๋ฉด์ ์ ์๋ ๋์ผํ ๋ถํธ๋ ๋์ผํ ๋ถ์ฌ๋ฅผ ๋ํ๋ธ๋ค. ๋ณธ ๋ฐ๋ช ์ ์ค๋ช ํจ์ ์์ด, ๊ด๋ จ๋ ๊ณต์ง ๊ธฐ๋ฅ ํน์ ๊ตฌ์ฑ์ ๊ดํ ๊ตฌ์ฒด์ ์ธ ์ค๋ช ์ ๋ณธ ๋ฐ๋ช ์ ์์ง๋ฅผ ๋ชจํธํ์ง ์๊ฒ ํ๊ธฐ ์ํ์ฌ ์๋ตํ๋ค.Hereinafter, with reference to the accompanying drawings, it will be described embodiments of the present invention. Like reference numerals in the drawings denote like elements. In describing the present invention, detailed descriptions of related well-known functions or configurations are omitted in order not to obscure the subject matter of the present invention.
๋ 3์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ ๋ฉด์ฌ์๋, ๋ 4๋ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ๋ฐฐ๋ฉด์ฌ์๋, ๋ 5๋ ๋ 3์ ๋ถํด์ฌ์๋, ๋ 6์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ์ ์ ๋ฉด ๋ฐ A-A, B-B๋จ๋ฉด๋, ๋ 7์ ๋ 6์ A-A๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋ ๋ฐ B-B๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋, ๋ 8์ ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ์ ์ํ์๋ ์ก์ถ์์ดํฐ์ ๋จ๋ฉด, ํ๋ฉด ๋ฐ ์ ๋ฉด๋, ๋ 9๋ ๋ 8์ C-C๋จ๋ฉด์ ๋จ๋ฉด์ฌ์๋์ด๋ค.Figure 3 is a front perspective view of the door valve according to a preferred embodiment of the present invention, Figure 4 is a rear perspective view of the door valve according to a preferred embodiment of the present invention, Figure 5 is an exploded perspective view of Figure 3, Figure 6 is a preferred view of the present invention Front and back AA, BB cross-sectional view of the front and rear actuator portion of the door valve according to the embodiment, Figure 7 is a cross-sectional perspective view of the AA cross-section of Figure 6 and a cross-sectional perspective view of the BB cross-section, Figure 8 is a view of the door valve according to a preferred embodiment of the present invention Sectional, top and bottom views of a vertical actuating actuator, FIG. 9 is a cross-sectional perspective view of section CC of FIG. 8.
๋ณธ ๋ฐ๋ช
์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ๋, ๊ฐํ๋ถ์ฌ(100), ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200), ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)๊ฐ ํฌํจ๋๋ฉฐ, ์ 1์ ๋ก(1), ์ 2์ ๋ก(2), ์ 3์ ๋ก(3), ์ 4์ ๋ก(4), ์ 5์ ๋ก(5), ์ 6์ ๋ก(6), ์ 7์ ๋ก(7), ์ 1์ค๋ฆฐ๋(210), ์ 1ํผ์คํค(220), ์ 2์ค๋ฆฐ๋(310), ์ 2ํผ์คํค(320), ์์๋ถ์ฌ(321), ์ํ์คํํธ(330), ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340), ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350), ์์์ ์ผ์(360) ,์ ์ด์ ์ผ์(361) ๋ฐ ์ฐ๊ฒฐ๋ถ์ฌ(B)๊ฐ ๋ ํฌํจ๋ ์ ์๋ค.Door valve according to a preferred embodiment of the present invention, the opening and
๋ํ, ํ์ ํ ์ 1~7์ ๋ก์๋ ์์ถ๊ณต๊ธฐ๊ฐ ์ ๋๋๋ฉฐ, ์ด๋ ๊ฒ ์ 1~7์ ๋ก๋ก ์ ๋๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)๊ฐ ๊ตฌ๋๋๋ค.In addition, compressed air flows through the first to seventh flow paths to be described later, and the
์๊ธฐ ๊ฐํ๋ถ์ฌ(100)๋ ํ์ ํ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ ๋ฉด์ ์ค์น๋์ด ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ ์ง ๋๋ ํ์ง๋๋ฉด์ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก(๋ฏธ๋์)๋ฅผ ๊ฐํํ๋ ๋ถ์ฌ๋ก์, ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก์ ๋ง๋ฟ๋ ๋ฉด์๋ ์ค๋ง์ด ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.The opening and
์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)๋ ๋ 6 ๋ด์ง ๋ 7์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ 1์ค๋ฆฐ๋(210)์ ์๊ธฐ ์ 1์ค๋ฆฐ๋(210)์ ๋ด๋ถ์ ์ค์น๋๋ ์ 1ํผ์คํค(220) ๋ฐ ์๊ธฐ ์ 1ํผ์คํค(220)์ ์ค์ฌ๋ถ๋ฅผ ๊ดํตํ์ฌ ๊ฐํ๋ถ์ฌ(100)์ ๋ฐฐ๋ฉด๊ณผ ๊ฒฐํฉ๋๋ ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ก ๊ตฌ์ฑ๋๋๋ฐ, ์ด ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ ์๊ธฐ ์ 1ํผ์คํค(220)์ ์ ํ ์์ง์์ ๊ฐํ๋ถ์ฌ๋ก ์ ๋ฌํ๋ ์ญํ ์ ํ๋ค.As shown in FIGS. 6 to 7, the forward and
์๊ธฐ ์ 1์ค๋ฆฐ๋(210)๋ ๋ 16 ๋ด์ง ๋ 17์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ํ์ธก์๋ ์ 1์ ๋ก(1)๊ฐ ์ ์ธก์๋ ์ 2์ ๋ก(2)๊ฐ ํ์ฑ๋๋๋ฐ, ์ฌ๊ธฐ์ ๊ฐํ๋ถ์ฌ(100)์ ์ธ์ ํ ๊ณณ์ด ์ ์ธก์ด๋ค.As shown in FIGS. 16 to 17, the
์๊ธฐ์ ๊ฐ์ ์ 1์ค๋ฆฐ๋(210)์ ๋ด๋ถ์๋ ์ 1ํผ์คํค(220)์ด ์ค์น๋๋ฉฐ, ์๊ธฐ ์ 1ํผ์คํค(220)์ ์ 1์ค๋ฆฐ๋(210)์ ๋ด๋ถ์์๋ง ์๋๋๋๋ก ๋ 5์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์๊ธฐ ์ 1์ค๋ฆฐ๋(210)์ ์ ๋ฉด์ ๋ฎ๋ ์ปค๋ฒ(221)๊ฐ ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.As shown in FIG. 5, the
์๊ธฐ ์ 1ํผ์คํค(220)์ ์ ํ๋ก ์ด๋๋๋๋ฐ, ์๊ธฐ ์ 1์ ๋ก(1)์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด ์ ์ง, ์๊ธฐ ์ 2์ ๋ก(2)์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด ํ์ง๋๋ค.The
๋ํ, ์๊ธฐ ์ 1ํผ์คํค(220)์ ์ฐ๊ฒฐ๋ถ์ฌ(B)๊ฐ ๊ดํต์ค์น๋์ด ์๊ธฐ ์ 1ํผ์คํค(220)๊ณผ ์์ ํ ๊ฐํ๋ถ์ฌ(100)๋ฅผ ์ฐ๊ฒฐํ๋ ์ญํ ์ ํ๋๋ฐ, ์ด๋ฌํ ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ ์์ปจ๋, ๋ณผํธ๋ ๊ฒฐํฉํ์ผ๋ก ์ ์๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.In addition, the
์๊ธฐ์ ๊ฐ์ด ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ฅผ ๋งค๊ฐ๋ก ์ 1ํผ์คํค(220)๊ณผ ๊ฒฐํฉ๋ ๊ฐํ๋ถ์ฌ(100)๋ ์ 1ํผ์คํค(220)์ ์ ยทํ์ง์ ๋ฐ๋ผ ์๋๋๋ฉด์ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ๋ค.As described above, the opening and closing
์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)๋ ์ 2์ค๋ฆฐ๋(310), ์ 2ํผ์คํค(320), ์ํ์คํํธ(330), ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340), ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ๊ตฌ์ฑ๋๋ค.The up and down
์๊ธฐ ์ 2์ค๋ฆฐ๋(310)๋ ๋ 14 ๋ด์ง ๋ 15, ๋ 18 ๋ด์ง ๋ 20์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ๋ด๋ถ์ ์ค์น๋๋๋ฐ, ์ด๋ฌํ ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ์๋ ์ 2ํผ์คํค(320)์ด ์ค์น๋๋ฉฐ, ์ด ์ 2ํผ์คํค(320)์ ์ค์ฌ๋ถ์๋ ์ํ์คํํธ(330)๊ฐ ์ค์น๋๋ค.As shown in FIGS. 14 to 15 and 18 to 20, the
์๊ธฐ ์ 2ํผ์คํค(320)์ ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ์ ์ค์น๋์ด ์์ถ๊ณต๊ธฐ์ ์ํด ์ํ๋ก ์๋๋๋ ๋ถ์ฌ๋ก์, ์ด๋ฌํ ์ 2ํผ์คํค(320)์ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ํ๋ฐฉํฅ์ผ๋ก ์๋๋๋ค.The
์๊ธฐ ์ํ์คํํธ(330)๋ ์ผ์ธก์ด ์๊ธฐ ์ 2ํผ์คํค(320)์ ์ค์ฌ๋ถ์ ์ฐ๊ฒฐ๋๊ณ , ํ์ธก์ ์๊ธฐ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฐ๊ฒฐ๋๋๋ฐ, ์ด์ ๋ฐ๋ผ, ์๊ธฐ ์ํ์คํํธ(330)๋ ์ 2ํผ์คํค์ ์์น ๋๋ ํ๊ฐ๋๋ ์์ง์์ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ ๋ฌํ์ฌ ๊ฐํ๋ถ์ฌ(100)๋ฅผ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก์ ์ผ์น๋๋ ๋์ด๋ก ์์น์ํค๊ฑฐ๋ ์ด๊ธฐ์ํ๋ก ํ๊ฐ์ํจ๋ค.The upper and
์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ ๋ 14์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก ํ์์์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ ๋ถ์ฌ๋ก์, ์ด๋ฌํ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๋ ํ์ ํ ์ ๋ก๋ค ์ค ๊ฐํ๋ถ์ฌ(100)์ ์ ์ง์ ๊ด์ฌํ๋ ์ ๋ก์ ๊ณต๊ธ๋๋ฉฐ, ์ด์ ๋ํ ์์ธํ ์ค๋ช
์ ํ์ ํ๊ธฐ๋ก ํ๋ค.As shown in FIG. 14, the first compressed
์๊ธฐ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ ๋ 15์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ ๋ฐ๋์ ์ญํ , ์ฆ, ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก ๊ฐ๋ฐฉ์์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ ๋ถ์ฌ์ด๋ค.As shown in FIG. 15, the second compressed
์๊ธฐ์ ๊ฐ์ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๋ ํ์ ํ ์ ๋ก๋ค ์ค ๊ฐํ๋ถ์ฌ(100)์ ํ์ง์ ๊ด์ฌํ๋ ์ ๋ก์ ๊ณต๊ธ๋๋ฉฐ, ์ด์ ๋ํ ์์ธํ ์ค๋ช
์ ํ์ ํ๊ธฐ๋ก ํ๋ค.Compressed air introduced into the second compressed
์ดํ, ๋ณธ ๋ฐ๋ช ์ ๋ฐ๋์งํ ์ค์์์ ๋ฐ๋ฅธ ๋์ด๋ฐธ๋ธ๊ฐ ์๋๋๋ ์์์ ๋ํด ๋ 10 ๋ด์ง ๋ 20์ ์ฐธ์กฐํ์ฌ ์ค๋ช ํ๊ธฐ๋ก ํ๋ค.Hereinafter, the order of operating the door valve according to the preferred embodiment of the present invention will be described with reference to FIGS. 10 to 20.
๋ 10 ๋ด์ง ๋ 13์ ๋ณธ ๋ฐ๋ช ์ด ์๋๋๋ ๋ชจ์ต์ ๋ณด์ธ ์ธก๋ฉด๋, ๋ 14๋ ๋ 10์ D-D๋จ๋ฉด๋, ๋ 15๋ ๋ 11์ E-E๋จ๋ฉด๋, ๋ 16 ๋ด์ง ๋ 17์ ์ ํ์ง ์ก์ถ์์ดํฐ์ ์ ์ง ๋ฐ ํ์งํ๋ ์ํ์ ๋จ๋ฉด๋, ๋ 18 ๋ด์ง ๋ 20์ ๋ณธ ๋ฐ๋ช ์ด ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐ๋ฐฉํจ๊ณผ ๋์์ ์ด๊ธฐ์ํ๋ก ๋ณต์๋๋ ์ํ์ ๋จ๋ฉด๋์ด๋ค.10 to 13 is a side view showing the operation of the present invention, Figure 14 is a DD cross-sectional view of Figure 10, Figure 15 is an EE cross-sectional view of Figure 11, Figures 16 to 17 shows the forward and backward movement of the actuator 18 to 20 are cross-sectional views of a state in which the present invention is restored to the initial state while opening the semiconductor wafer movement passage.
ํนํ, ์ 1~7์ ๋ก์ ๊ณต๊ธ๋๋ ์์ถ๊ณต๊ธฐ์ ํ๋ฆ์ ๋ฐ๋ฅธ ๋ณธ ๋ฐ๋ช
์ ์๋์ ๋ํด ์ค์ ์ ์ผ๋ก ์ค๋ช
ํ๊ธฐ๋ก ํ๋ค. ๋ํ, ํ์ ํ ์ด๊ธฐ์ํ๋ผ ํจ์ ๋ 10, ๋ 14 ๋ฐ ๋ 20์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ๊ฐํ๋ถ์ฌ(100)๊ฐ ์์ ํ ํํฅ์ด๋๋์ด์๋ ์ํ์ด๋ค.In particular, the operation of the present invention according to the flow of compressed air supplied to the first to seventh channels will be described. In addition, the initial state, which will be described later, is a state in which the opening and closing
ํํธ, ์ 1์ ๋ก(1)๋ ์ 1์ค๋ฆฐ๋(210)์ ํ์ธก์, ์ 2์ ๋ก(2)๋ ์ 1์ค๋ฆฐ๋(210)์ ์์ธก์, ์ 3์ ๋ก(3)๋ 2๊ฐ์ ์ํ์คํํธ(330) ์ค ์ผ์ธก ์ํ์คํํธ ๋ด๋ถ์ ์ํ๋ฐฉํฅ์ผ๋ก, ์ 4์ ๋ก(4)๋ 2๊ฐ์ ์ํ์คํํธ(330) ์ค ํ์ธก ์ํ์คํํธ ๋ด๋ถ์ ์ํ๋ฐฉํฅ์ผ๋ก ํ์ฑ๋๋ค.On the other hand, the
๋ํ, ์ 5์ ๋ก(5)๋ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ 6์ ๋ก(6)์ ์ฐํต๋๋, ์ 6์ ๋ก(6)์๋ ์ผ์ ์๋ ฅ ์ด์ ๋ฐ์๋๋ฉด ์ด๋ฆฌ๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)์ ์ฒดํฌ๋ฐธ๋ธ(C1)๊ฐ ์ค์น๋์ด ์์ผ๋ฉฐ, ์ 7์ ๋ก(7)๋ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)๊ณผ ์ฐํต๋๋๋ฐ, ์ด๋ฌํ ์ 7์ ๋ก(7)์๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R2)์ ์ฒดํฌ๋ฐธ๋ธ(C1)๊ฐ ์ค์น๋์ด ์๋ค.In addition, the
๋จผ์ , ๊ฐํ๋ถ์ฌ(100)๋ก ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ํ์ํ๋ ๋์์ ๋ํด ์ค๋ช
ํ๊ธฐ๋ก ํ๋ค.First, an operation of closing the semiconductor wafer movement path with the opening and closing
์ด๊ธฐ์ํ์์ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋๋ฐ, ์ด๋ ๊ฒ ์์ถ๊ณต๊ธฐ๊ฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก ์ ์
๋๊ธฐ ์์ํ๋ฉด, ์์ถ๊ณต๊ธฐ๋ ์๊ธฐ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ฐํต๋๋ ์ 5์ ๋ก(5)์ ์ 6์ ๋ก(6)๋ก ๋์์ ์ง์
ํ๊ฒ ๋๋ฉด์ ๋ 10, 14์ ์ํ์์ ๋ 11, 15์ ์ํ๋ก ์งํ๋๋ค.Compressed air flows into the first compressed
์ด๋, ์๊ธฐ ์ 5์ ๋ก(5)์ ์ 6์ ๋ก(6)์๋ ๋์, ์ฆ, ๊ฐ์ ์๋ ฅ์ด ๋ฐ์๋๋๋ฐ, ์๊ธฐ ์ 6์ ๋ก(6)์๋ ์ผ์ ์๋ ฅ ์ด์ ๋ฐ์ ๋ ๊ฒฝ์ฐ์๋ง ์ ํ์ ์ผ๋ก ์ด๋ฆฌ๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๊ฐ ์ค์น๋์ด ์ 5์ ๋ก(5)์ ๋จผ์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ค.At this time, the
์๊ธฐ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๋ ํ์ ํ ์ 7์ ๋ก(7)์๋ ์ค์น๋๋๋ฐ, ์ด๋ฌํ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1, R2)๋ค์ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋๋ ์์ถ๊ณต๊ธฐ๊ฐ ์ ๋ก๋ก ์ ์
๋์ด ๋ฐ์๋๋ 1์ฐจ์ ์ธ ์๋ ฅ์ ๊ฒฌ๋๋ธ ํ ๋ง์ง๋ง์ ์ด๋ฆฌ๋๋ก ํ๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค. ์ด์ ๋ฐ๋ผ, ๋ณธ ๋ฐ๋ช
์ ์ค๊ณ์ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)์ ์ค์น๋ ์คํ๋ง์ ๋ฐ๋ฐ๊ณ์๋ฅผ ์ ์ ํ๊ฒ ์ ํํ๋ ๊ฒ์ด ์ข์ ๊ฒ์ด๋ค.The relief valve (R1) is also installed in the seventh flow path (7) to be described later, these relief valves (R1, R2) are introduced into the first compressed air inlet through-
์๊ธฐ์ ๊ฐ์ด ์ 5์ ๋ก(5)๋ก ์ง์
๋ ์์ถ๊ณต๊ธฐ๋ ์ 5์ ๋ก(5)์ ์ฐํตํ์ฑ๋ ์ 2์ค๋ฆฐ๋(310)์ ํ๋ถ๋ก ์ ์
๋๋๋ฐ, ์ด๋ ๊ฒ ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ์ ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด, ์ 2ํผ์คํค(320)์ ์ํฅ์ด๋๋๋ฉฐ, ์ด์ ๋ฐ๋ผ, ์๊ธฐ ์ 2ํผ์คํค(320)์ ์ค์ฌ๋ถ์ ์ค์น๋์ด ์๋ ์ํ์คํํธ(330) ๋ํ ์ํฅ์ด๋๋๋ค.As described above, the compressed air entering the
์ด๋, ์ 6์ ๋ก(6)์ ์ค์น๋์ด ์๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๋ ๋ซํ์๋ ์ํ๊ฐ ์ ์ง๋์ด์ผ ํจ์ ๋น์ฐํ๋ค.At this time, it is natural that the relief valve R1 installed in the
์๊ธฐ์ ๊ฐ์ด ์ 2ํผ์คํค(320)์ด ์ํฅ์ด๋๋๋ค๊ฐ ๋ 11, 15์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์์ฌ์ ์ ๋๋ฌํ๋ฉด, ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๋ ์ 6์ ๋ก(6)๋ก ์ง์ค๋๋๋ฐ, ์์ถ๊ณต๊ธฐ๊ฐ ๊ณ์ ๊ณต๊ธ๋๋ฉด, ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๊ฐ ์์ํ ์ด๋ฆฌ๊ธฐ ์์ํ๋ค.As described above, when the
์๊ธฐ์ ๊ฐ์ด ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R1)๊ฐ ์์ํ ์ด๋ฆฌ๊ธฐ ์์ํ๋ฉด, ์์ถ๊ณต๊ธฐ๋ ์ผ์ธก ์ํ์คํํธ์ ๋ด๋ถ์ ํ์ฑ๋ ์ 3์ ๋ก(3)๋ฅผ ๊ฑฐ์ณ ์ 1์ ๋ก(1)๋ก ์ ์
๋๋๋ฐ, ์ด๋ ๊ฒ ์ 1์ ๋ก(1)๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ์ ์ํด ์ 1ํผ์คํค(220)์ ๋ 12, 16์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ ์งํ๊ฒ ๋๋ค.When the relief valve R1 starts to open gradually as described above, the compressed air flows into the
์ด์ ๋ฐ๋ผ, ์ 1ํผ์คํค(220)์ ์ฐ๊ฒฐ๋ถ์ฌ(B)๋ฅผ ๋งค๊ฐ๋ก ์ฐ๊ฒฐ๋์ด ์๋ ๊ฐํ๋ถ์ฌ(100) ๋ํ ์ ์งํ๊ฒ ๋๋ฉด์ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๊ฐ ๋ฐํ๋๋ฉฐ, ์ด๋ฌํ ์ํ๋ฅผ ๋ฐํ์ํ๋ผ๊ณ ํ๋ค.Accordingly, the opening and closing
๋ค์์ผ๋ก, ์๊ธฐ์ ๊ฐ์ด ๊ฐํ๋ถ์ฌ๋ก ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๋ฐํํ ์ํ์์ ์ด๊ธฐ์ํ๋ก ์๋๋๋ ๊ฒ์ ์ค๋ช ํ๊ธฐ๋ก ํ๋ค.Next, it will be described that the operation in the initial state in a state in which the semiconductor wafer movement passage is sealed with the opening and closing member as described above.
์์ ํ ๋ฐ์ ๊ฐ์ด, ๋ฐํ์ํ์์ ๋ฐ๋์ฒด ์จ์ดํผ๋ฅผ ์ด๋์ํค๋ ค๋ฉด, ๊ฐํ๋ถ์ฌ(100)๊ฐ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐ๋ฐฉํด์ผ ํ๋๋ฐ, ์ด๋ฌํ ๊ฒฝ์ฐ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์์ถ๊ณต๊ธฐ๋ฅผ ์ ์
์ํจ๋ค.As described above, in order to move the semiconductor wafer in a sealed state, the opening and closing
์๊ธฐ์ ๊ฐ์ด ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๋ ํ์ธก ์ํ์คํํธ์ ๋ด๋ถ์ ํ์ฑ๋ ์ 4์ ๋ก(4)์ ์ 7์ ๋ก(7)๋ก ๋์์ ์ ์
๋๋๋ฐ, ์๊ธฐ ์ 7์ ๋ก(7)์๋ ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R2)๊ฐ ์ค์น๋์ด ์์ผ๋ฏ๋ก, ์ 4์ ๋ก(4)๋ก ์์ถ๊ณต๊ธฐ๊ฐ ๋จผ์ ์ ์
๋๋ฉฐ, ์ด๋ ๊ฒ ์ 4์ ๋ก(4)๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๋ ์ 4์ ๋ก(4)์ ์ฐํตํ์ฑ๋ ์ 2์ ๋ก(2)๋ก ์ ์
๋๋ค.Compressed air introduced into the second compressed
์๊ธฐ์ ๊ฐ์ด ์ 2์ ๋ก(2)๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด, ์ 1ํผ์คํค(220)์ ๋ 17์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ํ์งํ๋ฉด์ ์ด ์ 1ํผ์คํค(220)์ ์ฐ๊ฒฐ๋ ์ฐ๊ฒฐ๋ถ์ฌ(B) ๋ํ ํ์งํ๋ฉฐ, ์ด์ ๋ฐ๋ผ, ์ฐ๊ฒฐ๋ถ์ฌ(B)์ ์ฐ๊ฒฐ๋ ๊ฐํ๋ถ์ฌ(100) ๋ํ ํ์งํ๊ฒ ๋๋ค.When compressed air flows into the
์๊ธฐ์ ๊ฐ์ด ๊ฐํ๋ถ์ฌ(100)๊ฐ ํ์งํ๋ฉด, ๋ฐํ์ํ๋ฅผ ์ ์งํ๊ณ ์๋ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๊ฐ ๊ฐ๋ฐฉ๋๋ฉฐ, ์๊ธฐ ์ 1ํผ์คํค(220)์ ๋ 17์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ํ์ฌ์ ๊น์ง ํ์งํ๊ฒ ๋๋ค.When the opening and closing
์๊ธฐ์ ๊ฐ์ด ์ 1ํผ์คํค(220)์ด ํ์ฌ์ ๊น์ง ์ด๋๋๋ฉด, ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋๋ ์์ถ๊ณต๊ธฐ๋ ์ 7์ ๋ก(7)์ ์ง์ค๋๋ฉฐ, ์ผ์ ์๋ ฅ ์ด์์ ์๋ ฅ์ด ๋ฐ์๋๋ฉด, ๋ฆด๋ฆฌํ ๋ฐธ๋ธ(R2)๋ ์์ํ ์ด๋ฆฌ๊ธฐ ์์ํ๋ฉด์ ์์ถ๊ณต๊ธฐ๊ฐ ๋ 20์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ 7์ ๋ก(7)๋ฅผ ๊ฑฐ์ณ ์ 2์ค๋ฆฐ๋(310)์ ์์ธก์ผ๋ก ์ ์
๋๋ค.As described above, when the
์๊ธฐ์ ๊ฐ์ด ์ 2์ค๋ฆฐ๋(310)์ ์์ธก์ผ๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด, ์์ฌ์ ์ ์์นํ๊ณ ์๋ ์ 2์ค๋ฆฐ๋(310)๋ ํํฅ์ด๋๋์ด ๊ฒฐ๊ตญ์ ํ์ฌ์ ๊น์ง ์ด๋ํ๊ฒ ๋์ด ์ด๊ธฐ์ํ๋ก ๋์๊ฐ๋ ๊ฒ์ด๋ค.When compressed air flows into the upper side of the
๋ํ, ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์์ถ๊ณต๊ธฐ๊ฐ ์ ์
๋๋ฉด, ์ ํ์คํํธ(230)์ ํ์ง ๋ฐ ์ํ์คํํธ(330)์ ํํฅ์ด๋๋๋๋ก ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ ํตํด ๋ด๋ถ์ ์ ์
๋์ด ์๋ ์์ถ๊ณต๊ธฐ๋ ์ธ๋ถ๋ก ๋ฐฉ์ถ๋๋ฉฐ, ์ด๋ฌํ ์ํ๋ฅผ ๊ฐ๋ฐฉ์ํ๋ผ๊ณ ํ๋ค.In addition, when compressed air flows into the second compressed
ํํธ, ์ 2ํผ์คํค(320)์ ์์ฌ์ ๋๋ ํ์ฌ์ ์ ์์น๋ฅผ ์ธ๋ถ์์ ํ์ธ๊ฐ๋ฅํ๋๋ก ์๊ธฐ ์ 2ํผ์คํค(320)์๋ ์์๋ถ์ฌ(321)๊ฐ ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ฉฐ, ์ด๋ฌํ ์์๋ถ์ฌ(321)๋ฅผ ๊ฐ์งํ๋ ์ผ์(360)๊ฐ ๋ 4์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ๊ตฌ๋น๋๋ ๊ฒ์ด ์ข์ ๊ฒ์ด๋ค.On the other hand, it is preferable that a
๋ํ, ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)๋ ์ ์ง๋ณด์๊ฐ ์ฉ์ดํ๋๋ก ์๊ธฐ ์ํ์๋ ์ก์ถ์์ดํฐ๋ถ(300)์ ์๋ถ์๋ ์๋ถ์ปค๋ฒ(301)๊ฐ ํ๋ถ์๋ ํ๋ถ์ปค๋ฒ(302)๊ฐ ๊ฐ๊ฐ ๋ถ๋ฆฌ๋๋๋ก ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ฉฐ, ์ 2์ค๋ฆฐ๋(310)์ ๋ด๋ถ๊ฐ ๋ฐํ์ํ๋ฅผ ์ ์งํ๋๋ก ๊ฐ๊ฐ์ ๊ฒฐํฉ ๋ถ์์๋ ๋์๋์ง ์์ ๊ณ ๋ฌด์ฌ์ง์ ๋ฐํ๋ถ์ฌ(O๋ง)๊ฐ ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.In addition, the up and down
์๊ธฐ ํ๋ถ์ปค๋ฒ(302)์๋ ๋ 5์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ๋นจ๋ํ์์ ๊ด์ด ํ์ฑ๋์ด ์๋๋ฐ, ์ด๋ฌํ ๊ด์ ์ํ์คํํธ์ ์ 3์ ๋ก(3)์ ์ 4์ ๋ก(4)์ ๋ด๋ถ์ ์ฐํต๋๋๋ก ๊ฒฐํฉ๋๋, ์๊ธฐ ์ํ์คํํธ(330)์ ์ํ๋ฐฉํฅ์ผ๋ก ์ด๋์ ์ํ์คํํธ(330)๊ฐ ์์ ์ ์ผ๋ก ๊ฐ์ด๋๋ ์ ์๋๋ก ํ๋ ์ญํ ์ ํ๋ ๊ฒ๋ ์ข์ ๊ฒ์ด๋ค.As shown in FIG. 5, the
์ด์ ๋ฐ๋ผ, ์๊ธฐ ๊ด์ ์ํ์คํํธ(330)์ ์ํ๋ฐฉํฅ ์ด๋๋๋ ๊ฑฐ๋ฆฌ ์ด์์ ๊ธธ์ด๋ฅผ ๊ฐ๋๋ก ํ์ฑ๋์ด ์๊ธฐ ์ 2ํผ์คํค(320)์ด ์์ฌ์ ๊น์ง ์ด๋๋์ด๋ ์ 3์ ๋ก(3)์ ์ 4์ ๋ก(4)์ ์ฐํต๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.Accordingly, the tube is formed to have a length equal to or greater than a distance of vertical movement of the
๋ํ, ์๊ธฐ ์๋ถ์ปค๋ฒ(301)๋ ๋ 5์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ์ํ์คํํธ(330)์ ์ํ๋ฐฉํฅ์ ์์ง์์ ์ ํํ ๊ฐ์ด๋ํ๋๋ก ๊ฐ์ด๋๋ถ(303)๊ฐ ์ํฅ๋์ถํ์ฑ๋์ด ์์ผ๋ฉฐ, ์ด๋ฌํ ๊ฐ์ด๋๋ถ(303)์ ๋ด๋ถ์๋ ๊ณ ๋ฌด์ฌ์ง์ ๋ฐํ๋ถ์ฌ(O๋ง)๊ฐ ์ค์น๋์ด ์ 2์ค๋ฆฐ๋(310)๋ฅผ ๋ฐํํ๋ ๊ฒ์ด ๋ฐ๋์งํ๋ค.In addition, as shown in FIG. 5, the
ํํธ, ์๊ธฐ ๊ฐ์ด๋๋ถ(303)์ ๋ด๋ถ์๋ ๋ 5์ ๋์๋ ๋ฐ์ ๊ฐ์ด, ๋ถ์ฑ(304)์ด ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ฐ, ์ด๋ฌํ ๋ถ์ฑ(304)์ ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ์ ยทํ์ง์ ๋ฐ์๋๋ ํธ์ฌ์ ์ํด ์๊ธฐ ์ํ์คํํธ(330)์ ๊ฐ์ด๋๋ถ(303)์ ์ ์ด์ ๋ฐ๋ผ ๋ฐ์๋๋ ์๋ ฅ์ ๊ฐ์์์ผ์ฃผ๋ ์ญํ ๊ณผ ์๊ธฐ ๋ฐํ๋ถ์ฌ์ ๋๋ถ์ด ์ 2์ค๋ฆฐ๋(310)๋ฅผ ๋ฐํํ๋ ์ญํ ์ ํ๋ค.On the other hand, the inside of the
์๊ธฐ์ ๊ฐ์ด ์ค์น๋๋ ๋ถ์ฑ(304)์ ์๋ ฅ์ด ์ง์ ๋ฐ์๋๋ ๊ณณ์ ์ค์น๋๋ฏ๋ก ๋์ด๋ ํ๋ผ์คํฑ ๋ฑ ๋น๊ต์ ๊ฒฝ๋๊ฐ ๋ฎ์ ์ฌ์ง๋ก ์ ์๋๋ ๊ฒ์ด ์ข์ ๊ฒ์ด๋ค.Since the
๊ทธ๋ฆฌ๊ณ , ์๊ธฐ ๊ฐ์ด๋๋ถ(303)์ ์๋จ๊ณผ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฌ์ด ๋ฐ ์๊ธฐ ๊ฐํ๋ถ์ฌ(100)์ ์ ํ์ง ์ก์ถ์์ดํฐ๋ถ(200)์ ์ฌ์ด์๋ ๊ฐ๊ฐ ๋ฒจ๋ก์ฐ์ฆ(400)๊ฐ ์ค์น๋๋ ๊ฒ์ด ๋ฐ๋์งํ๋ฐ, ์ด๋ฌํ ๋ฒจ๋ก์ฐ์ฆ(400)๋ ๋ณธ ๋ฐ๋ช
์ ๋์์์ ๋ฐ์๋๋ ์ง๋๊ณผ ์์์ ๊ฐ์์ํค๋ ์ญํ ์ ํจ์ ๋ฌผ๋ก ์ด๊ณ , ์ง๊ณต์ํ ๋ณธ ๋ฐ๋ช
์ ์ค์น์ ๋ฐ๋์ฒด ์ ์กฐ๊ณต์ ์ผ๋ก๋ถํฐ ๋ฐ์๋๋ ํ์ฐ๋๋ก๋ถํฐ ๋ณธ ๋ฐ๋ช
์ ์ฃผ์๋ถ๋ฅผ ๋ณดํธํ๋ ์ญํ ์ ํ๋ค.And, the
๋ค์์ผ๋ก, ์ 6์ ๋ก(6)์ ์ 7์ ๋ก(7)์ ์ค์น๋๋ ์ฒดํฌ๋ฐธ๋ธ(C1, C2)์ ๋ํด ์ค๋ช
ํ๊ธฐ๋ก ํ๋ค.Next, the check valves C1 and C2 provided in the
์๊ธฐ ์ 6์ ๋ก(6)์ ์ 7์ ๋ก(7)์ ์ค์น๋๋ ์ฒดํฌ๋ฐธ๋ธ๋ค(C1, C2)์ ์๊ธฐ ๋ฆด๋ฆฌํ๋ฐธ๋ธ๋ค(R1, R2)๊ณผ ๋ง์ฐฌ๊ฐ์ง๋ก ์ผ๋ฐฉํฅ์ผ๋ก๋ง ๊ฐ๋ฐฉ๋๋ ๋ถ์ฌ์ธ๋ฐ, ์ด๋ฌํ ์ฒดํฌ๋ฐธ๋ธ๋ค(C1, C2)์ ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)๊ณผ ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ๊ฐ ์ธ๋ถ๋ก ๋ฐฐ์ถ์์ ์ด๋ฆฌ๋ฉฐ, ์๊ธฐ ๋ฆด๋ฆฌํ๋ฐธ๋ธ๋ค(R1, R2)๊ณผ๋ ๋ฐ๋๋ฐฉํฅ์ผ๋ก ์ ์ฒด์ ์ ๋์ ํ๋ฝํ๋ค.The check valves C1 and C2 installed in the
์ข ๋ ์์ธํ ์ค๋ช
ํ๋ฉด, ์ 6์ ๋ก(6)์ ์ค์น๋๋ ์ฒดํฌ๋ฐธ๋ธ(C1)๋ ๋ฐํ์ํ์์ ๊ฐ๋ฐฉ์ํ๋ก ์ ํ์, ์ 1์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(340)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ์ ๋ฐฐ์ถ์ ์ด๋ฆฌ๋ฉฐ, ์ 7์ ๋ก(7)์ ์ค์น๋ ์ฒดํฌ๋ฐธ๋ธ(C2)๋ ๊ฐ๋ฐฉ์ํ์์ ๋ฐํ์ํ๋ก ์ ํ์, ์ 2์์ถ๊ณต๊ธฐ ์ ์
ํต๊ณต(350)์ผ๋ก ์ ์
๋ ์์ถ๊ณต๊ธฐ์ ๋ฐฐ์ถ์ ์ด๋ฆฐ๋ค.In more detail, the check valve (C1) is installed in the sixth flow path (6) is opened when the discharge of the compressed air introduced into the first compressed air inlet through
๋ํ, ์๊ธฐ ์ฒดํฌ๋ฐธ๋ธ๋ค(C1, C2)์ ๊ธ์๋ฐฐ๊ธฐ๋ฐธ๋ธ๋ก ๋์ฒด๋ ์๋ ์๋๋ฐ, ์๊ธฐ์ ๊ฐ์ด ๋์ฒด๋ ๊ฒฝ์ฐ, ๋ฐฐ๊ธฐ์ ์๋ชจ๋๋ ์๊ฐ์ด ํ์ ํ ์ค์ด๋ค์ด ์ข ๋ ์ ์ํ๊ฒ ๋ฐ๋์ฒด ์จ์ดํผ ์ด๋ํต๋ก๋ฅผ ๊ฐํํ ์ ์์ ๊ฒ์ด๋ค.In addition, the check valves (C1, C2) may be replaced by a rapid exhaust valve, if it is replaced as described above, it will be able to open and close the semiconductor wafer movement path more quickly because the time consumed for exhaust is significantly reduced. .
์๊ธฐ์ ๊ฐ์ ๊ธ์๋ฐฐ๊ธฐ๋ฐธ๋ธ๋ ๋ํ๋ฏผ๊ตญ ํนํ์ถ์๋ฒํธ ์ 10-2006-0023872ํธ(๋ฐ๋ช ์ ๋ช ์นญ:๊ธ์๋ฐฐ๊ธฐ๋ฐธ๋ธ ์ฅ์น)์ ๊ธฐ์ฌ๋ ๋ฐ์ ๊ฐ์ด, ๊ณต์ง๊ธฐ์ ์ด๋ฏ๋ก ์ด์ ๋ํ ์์ธํ ์ค๋ช ์ ์๋ตํ๋ค.The rapid exhaust valve as described above is known in the Republic of Korea Patent Application No. 10-2006-0023872 (name: rapid exhaust valve device of the invention), so a detailed description thereof will be omitted.
๋๋ฉด๊ณผ ๋ช ์ธ์์์ ์ต์ ์ ์ค์์๋ค์ด ๊ฐ์๋์๋ค. ์ฌ๊ธฐ์, ํน์ ํ ์ฉ์ด๋ค์ด ์ฌ์ฉ๋์์ผ๋, ์ด๋ ๋จ์ง ๋ณธ ๋ฐ๋ช ์ ์ค๋ช ํ๊ธฐ ์ํ ๋ชฉ์ ์์ ์ฌ์ฉ๋ ๊ฒ์ด์ง ์๋ฏธํ์ ์ด๋ ํนํ์ฒญ๊ตฌ๋ฒ์์ ๊ธฐ์ฌ๋ ๋ณธ ๋ฐ๋ช ์ ๋ฒ์๋ฅผ ์ ํํ๊ธฐ ์ํ์ฌ ์ฌ์ฉ๋ ๊ฒ์ ์๋๋ค. ๊ทธ๋ฌ๋ฏ๋ก, ๋ณธ ๊ธฐ์ ๋ถ์ผ์ ํต์์ ์ง์์ ๊ฐ์ง์๋ผ๋ฉด, ์ด๋ก๋ถํฐ ๋ค์ํ ๋ณํ ๋ฐ ๊ท ๋ฑํ ํ ์ค์์๊ฐ ๊ฐ๋ฅํ๋ค๋ ์ ์ ์ดํดํ ๊ฒ์ด๋ค. ๋ฐ๋ผ์, ๋ณธ ๋ฐ๋ช ์ ์ง์ ํ ๊ธฐ์ ์ ๋ณดํธ๋ฒ์๋ ์ฒจ๋ถ๋ ํนํ์ฒญ๊ตฌ๋ฒ์์ ๊ธฐ์ ์ ์ฌ์์ ์ํด ์ ํด์ ธ์ผ ํ ๊ฒ์ด๋ค.The best embodiments have been disclosed in the drawings and the specification. Herein, specific terms have been used, but they are used only for the purpose of illustrating the present invention and are not intended to limit the scope of the present invention as defined in the claims or the claims. Therefore, those skilled in the art will understand that various modifications and equivalent other embodiments are possible from this. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.
Claims (8)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/511,637 US8807527B2 (en) | 2009-10-16 | 2010-06-21 | Door valve |
| JP2012548869A JP5626666B2 (en) | 2010-01-18 | 2010-06-21 | Door valve |
| CN201080055034.0A CN102668022B (en) | 2010-01-18 | 2010-06-21 | gate valve |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020100004247A KR100994761B1 (en) | 2009-10-16 | 2010-01-18 | Door valve |
| KR10-2010-0004247 | 2010-01-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2011087190A1 true WO2011087190A1 (en) | 2011-07-21 |
Family
ID=44305031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2010/004000 Ceased WO2011087190A1 (en) | 2009-10-16 | 2010-06-21 | Door valve |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5626666B2 (en) |
| CN (1) | CN102668022B (en) |
| WO (1) | WO2011087190A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103574084A (en) * | 2012-07-19 | 2014-02-12 | Vatๆง่กๅ ฌๅธ | Vacuum valve |
| US9086173B2 (en) | 2012-07-19 | 2015-07-21 | Vat Holding Ag | Vacuum valve |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6150388B2 (en) * | 2013-06-05 | 2017-06-21 | ๅ ฅๆฑๅทฅ็ ๆ ชๅผไผ็คพ | Gate valves and chambers |
| TWI656293B (en) * | 2014-04-25 | 2019-04-11 | ็ๅฃซๅ๏ผถ๏ฝ๏ฝๆง่ก่กไปฝๆ้ๅ ฌๅธ | Valve |
| JP7245724B2 (en) * | 2019-06-06 | 2023-03-24 | ๅ ฅๆฑๅทฅ็ ๆ ชๅผไผ็คพ | Valve body and vacuum gate valve |
| JP7089245B1 (en) | 2020-12-22 | 2022-06-22 | Smcๆ ชๅผไผ็คพ | Dual gate valve |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050139799A1 (en) * | 2000-03-30 | 2005-06-30 | Lam Research Corporation | Unitary slot valve actuator with dual valves |
| KR100596332B1 (en) * | 2004-01-05 | 2006-07-06 | ์ฃผ์ํ์ฌ ์์ด๋ํผ์์ง๋์ด๋ง | Gate valve |
| KR20090112134A (en) * | 2008-04-23 | 2009-10-28 | ํ๋ฆฌ์์ค ์ฃผ์ํ์ฌ | Two way gate valve |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0343496Y2 (en) * | 1987-11-25 | 1991-09-11 | ||
| JP3256490B2 (en) * | 1998-05-14 | 2002-02-12 | ใคใผใฐใซๅทฅๆฅญๆ ชๅผไผ็คพ | Gate valve |
| JP2000028013A (en) * | 1998-07-13 | 2000-01-25 | Ckd Corp | Gate type vacuum shut-off valve |
| JP3425938B2 (en) * | 2000-12-14 | 2003-07-14 | ๅ ฅๆฑๅทฅ็ ๆ ชๅผไผ็คพ | Gate valve |
| JP3696103B2 (en) * | 2001-02-23 | 2005-09-14 | ๏ผณ๏ฝ๏ฝๆ ชๅผไผ็คพ | High speed pressurizing method and mechanism in cylinder with cushion mechanism |
| JP2004257527A (en) * | 2003-02-27 | 2004-09-16 | Nippon Valqua Ind Ltd | Vacuum gate valve and seal member mounting method |
| KR100448174B1 (en) * | 2003-10-15 | 2004-09-13 | ์ฃผ์ํ์ฌ ์์คํฐ์์ค | Slit valve |
| KR200380587Y1 (en) * | 2004-12-28 | 2005-03-31 | ์์ด์์ค(์ฃผ) | Gate valve |
| KR20070113122A (en) * | 2006-05-24 | 2007-11-28 | ๋ฐฐํธ ํ๋ฉ ์๊ฒ | Closures for vacuum sealing closure of openings in walls |
| DE102006049724A1 (en) * | 2006-10-21 | 2008-04-24 | Robert Bosch Gmbh | Valve arrangement with position sensor |
| KR100772019B1 (en) * | 2007-02-05 | 2007-10-31 | ์ฃผ์ํ์ฌ ์์คํฐ์์ค | Rectangular gate valve |
| JP2010528230A (en) * | 2007-05-18 | 2010-08-19 | ใจใณใใฃใผใซใ ใใฏใใญใธใผใบ ใจใซใจใซใทใผ | Electronic control valve and system including the same |
-
2010
- 2010-06-21 CN CN201080055034.0A patent/CN102668022B/en active Active
- 2010-06-21 WO PCT/KR2010/004000 patent/WO2011087190A1/en not_active Ceased
- 2010-06-21 JP JP2012548869A patent/JP5626666B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050139799A1 (en) * | 2000-03-30 | 2005-06-30 | Lam Research Corporation | Unitary slot valve actuator with dual valves |
| KR100596332B1 (en) * | 2004-01-05 | 2006-07-06 | ์ฃผ์ํ์ฌ ์์ด๋ํผ์์ง๋์ด๋ง | Gate valve |
| KR20090112134A (en) * | 2008-04-23 | 2009-10-28 | ํ๋ฆฌ์์ค ์ฃผ์ํ์ฌ | Two way gate valve |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103574084A (en) * | 2012-07-19 | 2014-02-12 | Vatๆง่กๅ ฌๅธ | Vacuum valve |
| US9086172B2 (en) | 2012-07-19 | 2015-07-21 | Vat Holding Ag | Vacuum valve |
| US9086173B2 (en) | 2012-07-19 | 2015-07-21 | Vat Holding Ag | Vacuum valve |
| CN103574084B (en) * | 2012-07-19 | 2017-06-20 | Vat ๆง่กๅ ฌๅธ | Vacuum valve |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102668022A (en) | 2012-09-12 |
| JP2013529369A (en) | 2013-07-18 |
| CN102668022B (en) | 2014-12-03 |
| JP5626666B2 (en) | 2014-11-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2011087190A1 (en) | Door valve | |
| WO2013109005A1 (en) | Electronic control valve for variable capacity compressor | |
| KR100994761B1 (en) | Door valve | |
| WO2021101209A1 (en) | Dual bellows for slit valves for semiconductor processes and slit valve leak monitoring system using same | |
| WO2011145754A1 (en) | Hydraulic pressure-regulating valve for construction equipment | |
| WO2011105737A2 (en) | Gate valve | |
| WO2013151403A1 (en) | Gate valve ๊ฒ์ดํธ ๋ฐธ๋ธ | |
| US20020157922A1 (en) | Belt guide mechanism | |
| WO2014084620A1 (en) | Piezoelectric element-valve valve and method for fabricating same | |
| WO2023018253A1 (en) | Conductance-adjustable vacuum valve | |
| WO2010085096A1 (en) | Butterfly valve device | |
| WO2011028006A2 (en) | Valve using polarity variation and the interaction between the polarities of a permanent magnet | |
| WO2016178480A1 (en) | Vacuum valve | |
| WO2016204386A1 (en) | Rectangular gate vacuum valve and semiconductor manufacturing apparatus having same | |
| WO2024172206A1 (en) | Check valve assembly for vacuum system | |
| US5653314A (en) | Rodless cylinder with position detector and brake | |
| WO2014175691A1 (en) | Leak detector | |
| WO2017099380A1 (en) | Three-way valve | |
| WO2020166836A1 (en) | Vacuum valve | |
| WO2016085100A1 (en) | Vacuum valve | |
| WO2013051877A2 (en) | Vacuum processing apparatus having a means for preventing counter-pressure between chambers | |
| WO2010110537A2 (en) | Displacement control valve of variable displacement compressor and assembly method | |
| WO2011081295A2 (en) | Three-way valve and pipe body coupling structure | |
| WO2024253411A1 (en) | Pendulum-type control valve | |
| WO2024232565A1 (en) | High-pressure substrate processing apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 201080055034.0 Country of ref document: CN |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10843256 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2012548869 Country of ref document: JP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 13511637 Country of ref document: US |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 10843256 Country of ref document: EP Kind code of ref document: A1 |