WO2011078060A1 - Process for production of glycidyl ether compounds, and monoallyl monoglycidyl ether compound - Google Patents
Process for production of glycidyl ether compounds, and monoallyl monoglycidyl ether compound Download PDFInfo
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- WO2011078060A1 WO2011078060A1 PCT/JP2010/072715 JP2010072715W WO2011078060A1 WO 2011078060 A1 WO2011078060 A1 WO 2011078060A1 JP 2010072715 W JP2010072715 W JP 2010072715W WO 2011078060 A1 WO2011078060 A1 WO 2011078060A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/12—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/30—Tungsten
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/22—Ethers with hydroxy compounds containing no oxirane rings with monohydroxy compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
- C07D303/27—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds having all hydroxyl radicals etherified with oxirane containing compounds
Definitions
- the present invention relates to a method for producing a glycidyl ether compound and a monoallyl monoglycidyl ether compound. More specifically, the present invention relates to an efficient epoxidation by oxidizing a carbon-carbon double bond of the allyl group of a compound having an allyl ether bond with hydrogen peroxide by using a predetermined catalyst. The present invention relates to a method for producing a characteristic glycidyl ether compound, and a monoallyl monoglycidyl ether compound produced by oxidation of a carbon-carbon double bond of the allyl group of a compound having an allyl ether bond with hydrogen peroxide.
- Glycidyl ether known as a raw material for epoxy resins, is industrially produced on a large scale and is widely used in various fields.
- Patent Document 1 Japanese Patent Laid-Open No. 10-511722
- Patent Document 2 Japanese Patent Laid-Open No. 60-60123
- diallyl ether of bisphenol-A or polyallyl ether of novolac type phenol resin is added to toluene or the like.
- a method of epoxidation with hydrogen peroxide in the presence of a quaternary ammonium salt using sodium tungstate and a phosphoric acid catalyst in an organic solvent is disclosed. This method requires a very large amount of tungsten compound, and the epoxidation rate is not sufficient, so that it cannot be carried out as an industrial production method.
- Patent Document 3 US Pat. No. 5,633,391
- an olefin is epoxidized by contacting the olefin with bis (trimethylsilyl) peroxide as an oxidizing agent in an organic solvent in the presence of a rhenium oxide catalyst.
- bis (trimethylsilyl) peroxide as an oxidizing agent in an organic solvent in the presence of a rhenium oxide catalyst.
- Patent Document 4 Japanese Patent Laid-Open No. 7-145221
- Patent Document 5 Japanese Patent Laid-Open No. 58-173118
- a phenol novolak resin is allyl etherified with an allyl halide and then peroxygenated in an organic solvent.
- a method for epoxidation is disclosed, it is necessary to use peracids which are highly hazardous.
- Patent Document 6 Japanese Patent Publication No. 2002-526383 discloses a method of epoxidation with hydrogen peroxide in the presence of a titanium-containing zeolite catalyst, a tertiary amine, a tertiary amine oxide, or a mixture thereof.
- a titanium-containing zeolite catalyst a tertiary amine, a tertiary amine oxide, or a mixture thereof.
- a substrate having a high molecular weight such as phenyl ether has poor catalytic efficiency and cannot be applied.
- the problem to be solved by the present invention is to provide a method for efficiently producing a glycidyl ether compound from a compound having an allyl ether bond using hydrogen peroxide as an oxidizing agent under mild conditions.
- the present inventor used a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst to produce an aqueous hydrogen peroxide solution and an allyl ether compound.
- a tungsten compound a tertiary organic amine, and phenylphosphonic acid as a catalyst to produce an aqueous hydrogen peroxide solution and an allyl ether compound.
- the present invention is as follows. [1] In a method for producing a corresponding glycidyl ether compound by reacting a compound having an allyl ether bond with hydrogen peroxide and epoxidizing the carbon-carbon double bond of the allyl group, tungsten as a reaction catalyst A method for producing the glycidyl ether compound, comprising using a compound, a tertiary amine, and phenylphosphonic acid.
- the compound having an allyl ether bond is represented by the following formula (1): ⁇ Wherein R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or a carbon number. R 1 and R 2 may be taken together to form an alkylidene group having 2 to 6 carbon atoms or a cycloalkylidene group having 3 to 12 carbon atoms.
- R 3 , R 4 , R 5 , and R 6 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or An aryl group having 6 to 10 carbon atoms, and n represents an integer of 0 or 1.
- the compound having an allyl ether bond is composed of diallyl ether of bisphenol-A, diallyl ether of bisphenol-F, and 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diallyl ether.
- the compound having an allyl ether bond is a C 2-20 ⁇ , ⁇ -polyalkylene glycol diallyl ether, 1,4-cyclohexanedimethanol diallyl ether, and tricyclo [5.2.1.0 2, 6 ]
- R 7 , R 8 , R 9 , and R 10 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a cyclohexane having 3 to 10 carbon atoms.
- An alkyl group or an aryl group having 6 to 10 carbon atoms is shown.
- the monoallyl monoglycidyl ether compound which has a biphenyl frame
- the method for producing a glycidyl ether compound of the present invention by using a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst, and reacting hydrogen peroxide with an allyl ether compound, the corresponding glycidyl ether is obtained.
- Epoxy resins which are useful substances widely used in various industrial fields including the chemical industry as raw materials for various polymers such as electronic materials and adhesives and paint resins, can be produced. It is possible to manufacture safely, with good yield, and at low cost by a simple operation while minimizing the mixing of impurities. Therefore, the method for producing a glycidyl ether compound of the present invention has a great industrial effect.
- the monoallyl monoglycidyl ether compound according to the present invention has an allyl group, it can be hydrosilylated with a compound having an Si—H group, and biphenyl can be added to various compounds having an Si—H group. Since a glycidyl ether group can be introduced, it is extremely useful as a raw material for epoxy resins used for resists and sealing materials.
- FIG. 1 shows the 1 H-NMR measurement result of the product obtained in Example 16.
- FIG. 2 shows the results of 13 C-NMR measurement of the product obtained in Example 16.
- FIG. 3 shows the result of mass spectrometry (MS) measurement of the product obtained in Example 16.
- FIG. 4 shows the 1 H-NMR measurement result of the product obtained in Example 17.
- FIG. 5 shows the results of 13 C-NMR measurement of the product obtained in Example 17.
- FIG. 6 shows the 29 Si-NMR measurement result of the product obtained in Example 17.
- FIG. 7 shows the results of mass spectrometry (MS) measurement of the product obtained in Example 17.
- hydrogen peroxide is used as an oxidizing agent.
- Hydrogen peroxide can be used as an aqueous hydrogen peroxide solution.
- the concentration of hydrogen peroxide is not particularly limited, but is generally selected from the range of 1 to 80%, preferably 5 to 80%, more preferably 10 to 60%. From the viewpoint of industrial productivity and the energy cost of separation, hydrogen peroxide is preferred to have a high concentration, but excessively high concentration and / or excessive hydrogen peroxide is not used. This is preferable from the viewpoints of economy and safety. Reactivity is low when the concentration of hydrogen peroxide is less than 1%.
- the amount of hydrogen peroxide used is not particularly limited, but is 0.5 to 10 equivalents, preferably 0 to the carbon-carbon double bond of the allyl group of the compound having an allyl ether bond to be epoxidized. Selected from the range of 8 to 2 equivalents. If it is out of this range, one raw material will remain excessively, which is not economical.
- tungsten compound used as a catalyst in the method for producing a glycidyl ether compound of the present invention a compound that generates a tungstate anion in water is suitable.
- tungstic acid, tungsten trioxide, tungsten trisulfide, tungsten hexachloride, phosphorus examples include tungstic acid, ammonium tungstate, potassium tungstate dihydrate, sodium tungstate dihydrate, and the like. Tungstic acid, tungsten trioxide, phosphotungstic acid, sodium tungstate dihydrate, and the like are preferable. These tungsten compounds may be used alone or in combination of two or more.
- tungstic acid and an alkali metal salt of tungstic acid may be mixed in the above ratio, or tungstic acid and an alkali compound (alkali metal or alkaline earth metal hydroxide) may be used. , Carbonates, etc.) or a combination of alkali metal or alkaline earth metal salts of tungstic acid and acidic compounds such as mineral acids such as phosphoric acid and sulfuric acid. Partially neutralized salts of acids can be formed. Specific examples of these include a mixture of sodium tungstate and tungstic acid, a mixture of sodium tungstate and mineral acid, or a mixture of tungstic acid and an alkali compound.
- the amount of the tungsten compound used as a catalyst is 0.0001 to 20 mol%, preferably 0.01 to 0.01%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond as a substrate. It is selected from the range of 20 mol%. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 20 mol%, it is economically disadvantageous.
- the tertiary amine used as the catalyst is a tertiary organic amine (trialkylamine) having a total of 6 or more, preferably 10 or more carbon atoms of the alkyl group bonded to the nitrogen atom, and has a high epoxidation reaction activity. preferable.
- Such tertiary organic amines include triethylamine, tributylamine, tri-n-octylamine, tri- (2-ethylhexyl) amine, N, N-dimethyloctylamine, N, N-dimethyllaurylamine, N, N -Dimethylmyristylamine, N, N-dimethylpalmitylamine, N, N-dimethylstearylamine, N, N-dimethylbehenylamine, N, N-dimethylcocoalkylamine, N, N-dimethyl tallow alkylamine, N, N-dimethyl-cured tallow alkylamine, N, N-dimethyloleylamine, N, N-diisopropyl-2-ethylhexylamine, N, N-dibutyl-2-ethylhexylamine, N-methyldioctylamine, N-methyldidecylamine
- the total number of carbon atoms of the alkyl group bonded to the nitrogen atom of the tertiary amine is preferably 50 or less, more preferably 30 or less, considering the solubility of the compound having an allyl ether bond as a reaction substrate. .
- tertiary amines may be used alone or in combination of two or more.
- the amount used is preferably from 0.0001 to 10 mol%, more preferably from 0.01 to 10 mol%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond of the substrate. It is. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 10 mol%, it is economically disadvantageous.
- phenylphosphonic acid is further used as a (co-) catalyst.
- the amount used is preferably from 0.0001 to 10 mol%, more preferably from 0.01 to 10 mol%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond of the substrate. It is. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 10 mol%, it is economically disadvantageous.
- the substrate for epoxidation in the method for producing a glycidyl ether compound of the present invention is not particularly limited as long as it is a compound having an allyl ether bond, and the number of allyl ether bonds contained in the compound may be one. And two or more.
- Compounds having one allyl ether bond include phenyl allyl ether, o-, m-, p-cresol monoallyl ether, biphenyl-2-ol monoallyl ether, biphenyl-4-ol monoallyl ether, butyl allyl ether, Examples thereof include cyclohexyl allyl ether and cyclohexane methanol monoallyl ether.
- the compounds having two allyl ether bonds include 1,5-pentanediol diallyl ether, 1,6-hexanediol diallyl ether, 1,9-nonanediol diallyl ether, 1,10-decanediol diallyl ether, neopentyl glycol ⁇ , ⁇ -alkylenediol diallyl ethers having 2 to 20 carbon atoms such as diallyl ether, ⁇ , ⁇ -polyalkylene glycol diallyl ethers having 2 to 20 carbon atoms, 1,4-cyclohexanedimethanol diallyl ether, tricyclo [ 5.2.1.0 2,6 ] decanedimethanol diallyl ether and the following general formula (1): ⁇ Wherein R 1 and R 2 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, a cycloalkyl group having
- R 6 may be an aryl group having 6 to 10 carbon atoms, or R 1 and R 2 may be combined to form an alkylidene group having 2 to 6 carbon atoms or a cycloalkylidene group having 3 to 12 carbon atoms.
- R 3 , R 4 , R 5 , and R 6 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or An aryl group having 6 to 10 carbon atoms, and n represents an integer of 0 or 1. ⁇ The compound represented by this is mentioned.
- R 1 to R 6 are each independently a hydrogen atom or a methyl group, and n is more preferably 1 or 0.
- Such compounds include bisphenol-A diallyl ether, bisphenol-F diallyl ether, 2,6,2 ′, 6′-tetramethylbisphenol-A diallyl ether, and 2,2′-diallyl.
- Examples of the compound having three or more allyl ether bonds include phenol-formaldehyde / allyl alcohol polycondensate or cresol-formaldehyde / allyl alcohol polycondensate.
- These substrates can be used without an organic solvent or with an organic solvent if necessary, by mixing an aqueous hydrogen peroxide solution and the above-described catalyst to allow the epoxidation reaction to proceed, without using an organic solvent.
- Performing the epoxidation reaction is advantageous in terms of reduction of production cost, simplification of production equipment (for example, omission of explosion-proof equipment, etc.), waste disposal, and improvement of work environment.
- the reaction rate becomes slow and, depending on the solvent, an undesirable reaction such as a hydrolysis reaction may easily proceed.
- a minimum necessary organic solvent may be used.
- the organic solvent that can be used is preferably an aromatic hydrocarbon, an aliphatic hydrocarbon or an alicyclic hydrocarbon, and examples thereof include toluene, xylene, hexane, octane, and cyclohexane. It is advantageous in terms of production cost to keep the amount used to the minimum necessary, and it is preferably used at 50 parts by mass or less, more preferably 30 parts by mass or less with respect to 100 parts by mass of the compound having an allyl ether bond. The When the amount of the organic solvent used exceeds 50 parts by mass with respect to 100 parts by mass of the compound having an allyl ether bond, the substrate concentration decreases and the reactivity decreases.
- the catalyst and substrate are first charged into the reactor, and hydrogen peroxide is consumed in the reaction while keeping the reaction temperature as constant as possible. It is better to add gradually while confirming that it is.
- the amount of hydrogen peroxide accumulated is small and the pressure rise can be minimized.
- reaction temperature is preferably selected in the range of ⁇ 10 to 120 ° C., more preferably 20 ° C. to 100 ° C.
- an organic extraction solvent is prepared by mixing the aqueous layer with a saturated aqueous solution of an inorganic compound and making a difference in specific gravity with the organic layer. Two-layer separation can be carried out without using.
- the specific gravity of the tungsten compound is heavy, in order to bring the aqueous layer to the lower layer, a tungsten compound exceeding the above-mentioned usage amount that is originally necessary as a catalyst may be used. In this case, it is desirable to increase the efficiency of the tungsten compound by reusing the tungsten compound from the aqueous layer.
- the specific gravity of the organic layer may be close to 1.2.
- water is added to bring the specific gravity of the aqueous layer closer to 1, so that It is also possible to bring an organic layer under the layer.
- the extraction of the reaction solution can also be carried out using an organic solvent such as toluene, cyclohexane, hexane, methylene chloride, etc., and an optimal separation method can be selected according to the situation.
- the obtained glycidyl ether compound can be taken out by normal methods, such as distillation, chromatographic separation, recrystallization, and sublimation.
- the compound having an allyl ether bond is a compound having two allyl ether bonds
- a monoallyl monoglycidyl ether compound in which only one allyl ether bond is epoxidized from the reaction product by performing the above separation and purification operation Can be isolated.
- the organic layer contains monoallyl monoglycidyl ether, diglycidyl ether, and unreacted diallyl ether compound, which are described later in Example 16.
- the following general formula (2) ⁇
- R 7 , R 8 , R 9 , and R 10 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a cyclohexane having 3 to 10 carbon atoms.
- An alkyl group or an aryl group having 6 to 10 carbon atoms is shown.
- R 7 , R 8 , R 9 , and R 10 can be methyl groups.
- Example 1 To a 300 mL three-necked flask equipped with a dropping funnel and a Dimroth condenser, 0.950 g (2.88 mmol) of sodium tungstate (manufactured by Nippon Inorganic Chemical Co., Ltd.), 0.720 g of tungstic acid (manufactured by Nippon Inorganic Chemical Co., Ltd.) ( 2.88mmol), Trioctylamine (Guangei Chemical Co., Ltd.) 2.04g (5.76mmol), Phenylphosphonic acid (Nissan Chemical Co., Ltd.) 0.911g (5.76mmol), Allyl phenyl ether 80g (0.576mol) While stirring with a magnetic stirrer, the mixture was heated to 70 ° C.
- Conversion rate (%) (1 ⁇ number of moles of raw material remaining / number of moles of raw material used) ⁇ 100
- Selectivity (%) ⁇ (number of moles of target compound / number of moles of raw material used) ⁇ 10000 ⁇ / conversion rate (%)
- Example 2 to 10 The epoxidation reaction was carried out in the same manner as in Example 1 with the catalyst components and the charged molar ratios shown in Table 1 below. The results are also shown in Table 1 below.
- the distillate was a solid having a melting point of 51.7 ° C., and the viscosity at 60 ° C. was 29 mPa ⁇ s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
- the reaction temperature was gradually raised, the temperature was raised to 70 ° C. over 3 hours, and the reaction was further continued for 17 hours.
- the reaction solution was cooled to room temperature, 200 ml of toluene was added to extract the reaction product, and the organic layer was washed twice with pure water. After distilling off toluene with an evaporator, the initial fraction was removed by distillation under reduced pressure to obtain 84.6 g of a distillate having a boiling point of 80.4 ° C./28 Pa (diallyl ether 94%, the rest being monoallyl ether). These analyzes were performed by gas chromatography. The viscosity of the distillate at 25 ° C. was 8.5 mPa ⁇ s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
- the reaction temperature was gradually raised as the reaction proceeded, the temperature was raised to 70 ° C. over 2 hours, and the reaction was further continued for 10 hours.
- the reaction solution was cooled to room temperature, 200 ml of toluene was added to extract the reaction product, and the organic layer was washed twice with pure water. After distilling off toluene with an evaporator, the initial distillation was removed by distillation under reduced pressure to obtain 84.6 g of a distillate having a boiling point of 72 ° C./133 Pa (diallyl ether 97%, the rest being monoallyl ether). These analyzes were performed by gas chromatography.
- the viscosity of the distillate at 25 ° C. was 2.3 mPa ⁇ s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
- Example 11 to 15 The epoxidation reaction was carried out in the same manner as in Example 1 except that allyl phenyl ether in Example 1 was replaced with the compounds shown in Table 2 below. The results are also shown in Table 2 below.
- Example 16 Monoglycidyl monoallyl ether was isolated from the product obtained in Example 13 and identified in this example. The experimental procedure is described below. To a 300 mL three-necked flask equipped with a dropping funnel and a Dimroth condenser, 0.950 g (2.88 mmol) of sodium tungstate (manufactured by Nippon Inorganic Chemical Co., Ltd.), 0.720 g of tungstic acid (manufactured by Nippon Inorganic Chemical Co., Ltd.) ( 2.88 mmol), trioctylamine (manufactured by Guangei Chemical Co., Ltd.) 2.04 g (5.76 mmol), phenylphosphonic acid (manufactured by Nissan Chemical Co., Ltd.) 0.911 g (5.76 mmol), 3,3 ′, 5,5′- 92.9 g (0.288 mol) of tetramethylbiphenyl-4,4′-diallyl ether was added and heated
- Example 17 In a 50 ml three-necked flask equipped with a reflux condenser, a thermometer, a stirrer, and a serum cap, 0.1 g (0.30 mmol) of monoallyl monoglycidyl ether synthesized in Example 16, 1,1,1,3,5 , 5,5-heptamethyltrisiloxane 0.077 g (0.35 mmol) and toluene 1 ml were added, and the mixture was stirred at room temperature under an argon stream.
- a glycidyl ether compound of the present invention by using a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst, and reacting hydrogen peroxide with an allyl ether compound, the corresponding glycidyl ether is obtained.
- Epoxy resins which are useful substances widely used in various industrial fields including the chemical industry as raw materials for various polymers such as electronic materials and adhesives and paint resins, can be produced. It is possible to manufacture safely, with good yield, and at low cost by a simple operation while minimizing the mixing of impurities.
- the monoallyl monoglycidyl ether compound of the present invention can introduce a biphenyl glycidyl ether group into a compound having various Si—H groups by a hydrosilylation reaction with a compound having an Si—H group. It is useful for synthesizing epoxy resins used for resists and sealing materials having high properties and etching resistance.
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Abstract
Description
本発明は、グリシジルエーテル化合物の製造方法及びモノアリルモノグリシジルエーテル化合物に関する。さらに詳しくは、本発明は、所定の触媒を使用することにより、アリルエーテル結合を有する化合物の該アリル基の炭素-炭素二重結合を過酸化水素により酸化して、効率よくエポキシ化することを特徴とするグリシジルエーテル化合物の製造方法、及びアリルエーテル結合を有する化合物の該アリル基の炭素-炭素二重結合の過酸化水素による酸化により生成するモノアリルモノグリシジルエーテル化合物に関する。 The present invention relates to a method for producing a glycidyl ether compound and a monoallyl monoglycidyl ether compound. More specifically, the present invention relates to an efficient epoxidation by oxidizing a carbon-carbon double bond of the allyl group of a compound having an allyl ether bond with hydrogen peroxide by using a predetermined catalyst. The present invention relates to a method for producing a characteristic glycidyl ether compound, and a monoallyl monoglycidyl ether compound produced by oxidation of a carbon-carbon double bond of the allyl group of a compound having an allyl ether bond with hydrogen peroxide.
エポキシ樹脂の原料として知られるグリシジルエーテルは、工業的に大規模に生産されており、様々な分野で広く使用されている。 Glycidyl ether, known as a raw material for epoxy resins, is industrially produced on a large scale and is widely used in various fields.
従来知られているグリシジルエーテルの製造方法としては、対応するアルコール、フェノールを触媒の存在下又は不在下に塩基性条件下でエピクロロヒドリンと反応させて、グリシジルエーテルを得る方法がある。この方法では有機塩素化合物が必ず残存してしまい、幾つかの用途、例えばエレクトロニクス用途で使用するには、絶縁特性が低くなるという欠点がある。 As a conventionally known method for producing glycidyl ether, there is a method of obtaining glycidyl ether by reacting a corresponding alcohol or phenol with epichlorohydrin under basic conditions in the presence or absence of a catalyst. In this method, the organochlorine compound always remains, and there is a disadvantage that the insulating properties are lowered when used in some applications, for example, electronics applications.
そこで、アリルエーテルを、酸化剤を利用して該アリル基の炭素-炭素二重結合を直接エポキシ化することも検討されている。以下の特許文献1(特表平10-511722号公報)及び特許文献2(特開昭60-60123号公報)には、ビスフェノール-Aのジアリルエーテルやノボラック型フェノール樹脂のポリアリルエーテルをトルエン等の有機溶媒中でタングステン酸ナトリウムとリン酸触媒を用いて、4級アンモニウム塩の存在下で過酸化水素によりエポキシ化する方法が開示されている。この方法はタングステン化合物の使用量を非常に多く必要とする上、エポキシ化速度が十分ではなく、工業的製造方法として実施することはできない。 Therefore, direct epoxidation of an allyl ether carbon-carbon double bond using an oxidizing agent has also been studied. In the following Patent Document 1 (Japanese Patent Laid-Open No. 10-511722) and Patent Document 2 (Japanese Patent Laid-Open No. 60-60123), diallyl ether of bisphenol-A or polyallyl ether of novolac type phenol resin is added to toluene or the like. A method of epoxidation with hydrogen peroxide in the presence of a quaternary ammonium salt using sodium tungstate and a phosphoric acid catalyst in an organic solvent is disclosed. This method requires a very large amount of tungsten compound, and the epoxidation rate is not sufficient, so that it cannot be carried out as an industrial production method.
以下の特許文献3(米国特許第5633391号公報)には、オレフィンを有機溶媒中、酸化レニウム触媒の存在下で、酸化剤としてのビス(トリメチルシリル)ペルオキシドと接触させることにより、オレフィンをエポキシ化する方法が開示されているが、高価な触媒と酸化剤を必要とする上に、フェニルアリルエーテルの場合は収率も十分ではない。 In the following Patent Document 3 (US Pat. No. 5,633,391), an olefin is epoxidized by contacting the olefin with bis (trimethylsilyl) peroxide as an oxidizing agent in an organic solvent in the presence of a rhenium oxide catalyst. Although a method is disclosed, an expensive catalyst and an oxidizing agent are required, and in the case of phenyl allyl ether, the yield is not sufficient.
以下の特許文献4(特開平7-145221号公報)及び特許文献5(特開昭58-173118号公報)には、フェノールノボラック樹脂をハロゲン化アリルによりアリルエーテル化後、有機溶媒中過酸によりエポキシ化する方法が開示されているが、危険性の高い過酸を使用する必要がある。 In the following Patent Document 4 (Japanese Patent Laid-Open No. 7-145221) and Patent Document 5 (Japanese Patent Laid-Open No. 58-173118), a phenol novolak resin is allyl etherified with an allyl halide and then peroxygenated in an organic solvent. Although a method for epoxidation is disclosed, it is necessary to use peracids which are highly hazardous.
また、以下の特許文献6(特表2002-526483号公報)にはチタン含有ゼオライト触媒、及び3級アミン、3級アミンオキサイド又はそれらの混合物の存在下、過酸化水素によりエポキシ化する方法が開示されているが、この方法は分子量の小さなオレフィン化合物を基質とする場合には有用であるものの、フェニルエーテルのような分子量の大きな基質では、触媒効率が悪く、適用することができない。 Patent Document 6 below (Japanese Patent Publication No. 2002-526383) discloses a method of epoxidation with hydrogen peroxide in the presence of a titanium-containing zeolite catalyst, a tertiary amine, a tertiary amine oxide, or a mixture thereof. However, although this method is useful when an olefin compound having a low molecular weight is used as a substrate, a substrate having a high molecular weight such as phenyl ether has poor catalytic efficiency and cannot be applied.
本発明が解決しようとする課題は、温和な条件下、過酸化水素を酸化剤に用いて、アリルエーテル結合を有する化合物からグリシジルエーテル化合物を効率良く製造する方法を提供することである。 The problem to be solved by the present invention is to provide a method for efficiently producing a glycidyl ether compound from a compound having an allyl ether bond using hydrogen peroxide as an oxidizing agent under mild conditions.
ビフェニル骨格を有するモノアリルモノグリシジルエーテル化合物を合成した例は報告されていない。モノアリルモノグリシジルエーテル化合物は、アリル基を有しているため、Si-H基を有する化合物とヒドロシリル化反応させることができ、様々なSi-H基を有する化合物にビフェニルグリシジルエーテル基を導入することができる。例えば、レジスト類や封止材類などに利用されるエポキシ樹脂を合成する際、種々のSi-H基を有するシロキサン化合物とヒドロシリル化することで、1段階の反応により、耐熱性、エッチング耐性が高いビフェニル骨格と硬化に必要となるエポキシ基とを同時に導入することができると考えられ、極めて有用である。したがって、本発明が解決しようとする課題は、耐熱性、エッチング耐性が高いビフェニル骨格を有する新規モノアリルモノグリシジルエーテル化合物を提供することでもある。 No example of synthesizing a monoallyl monoglycidyl ether compound having a biphenyl skeleton has been reported. Since monoallyl monoglycidyl ether compounds have allyl groups, they can be hydrosilylated with compounds having Si—H groups, and biphenyl glycidyl ether groups are introduced into various compounds having Si—H groups. be able to. For example, when synthesizing epoxy resins used for resists and sealants, hydrosilylation with various siloxane compounds having Si-H groups allows heat resistance and etching resistance to be achieved through a one-step reaction. It is considered that a high biphenyl skeleton and an epoxy group necessary for curing can be introduced at the same time, which is extremely useful. Therefore, the problem to be solved by the present invention is to provide a novel monoallyl monoglycidyl ether compound having a biphenyl skeleton having high heat resistance and etching resistance.
本発明者は、前記課題を解決するために鋭意研究及び実験を重ねた結果、触媒としてタングステン化合物、3級有機アミン、及びフェニルホスホン酸を使用して、過酸化水素水溶液とアリルエーテル化合物とを反応させることにより、対応するグリシジルエーテル化合物が高効率で選択的に生成されることを見出し、本発明を完成するに至った。 As a result of intensive studies and experiments to solve the above problems, the present inventor used a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst to produce an aqueous hydrogen peroxide solution and an allyl ether compound. By carrying out the reaction, it was found that the corresponding glycidyl ether compound was selectively produced with high efficiency, and the present invention was completed.
すなわち、本発明は、以下のとおりのものである。
[1]アリルエーテル結合を有する化合物と過酸化水素とを反応させて、該アリル基の炭素-炭素二重結合をエポキシ化することにより対応するグリシジルエーテル化合物を製造する方法において、反応触媒としてタングステン化合物、3級アミン、及びフェニルホスホン酸を使用することを特徴とする前記グリシジルエーテル化合物の製造方法。
That is, the present invention is as follows.
[1] In a method for producing a corresponding glycidyl ether compound by reacting a compound having an allyl ether bond with hydrogen peroxide and epoxidizing the carbon-carbon double bond of the allyl group, tungsten as a reaction catalyst A method for producing the glycidyl ether compound, comprising using a compound, a tertiary amine, and phenylphosphonic acid.
[2]前記タングステン化合物としてタングステン酸の部分中和塩を用いる、前記[1]に記載のグリシジルエーテル化合物の製造方法。 [2] The method for producing a glycidyl ether compound according to [1], wherein a partially neutralized salt of tungstic acid is used as the tungsten compound.
[3]前記タングステン化合物が、タングステン酸ナトリウムとタングステン酸の混合物、タングステン酸ナトリウムと鉱酸の混合物、又はタングステン酸とアルカリ化合物の混合物である、前記[1]または[2]に記載のグリシジルエーテル化合物の製造方法。 [3] The glycidyl ether according to [1] or [2], wherein the tungsten compound is a mixture of sodium tungstate and tungstic acid, a mixture of sodium tungstate and mineral acid, or a mixture of tungstic acid and an alkali compound. Compound production method.
[4]前記3級アミンがトリアルキルアミンであり、その窒素原子に結合したアルキル基の炭素数の合計が6以上50以下である、前記[1]~[3]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [4] The above [1] to [3], wherein the tertiary amine is a trialkylamine, and the total number of carbon atoms of the alkyl group bonded to the nitrogen atom is 6 or more and 50 or less. A process for producing a glycidyl ether compound.
[5]前記アリルエーテル結合を有する化合物が複数のアリルエーテル結合を有する化合物である、前記[1]~[4]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [5] The method for producing a glycidyl ether compound according to any one of [1] to [4], wherein the compound having an allyl ether bond is a compound having a plurality of allyl ether bonds.
[6]前記アリルエーテル結合を有する化合物が2つのアリルエーテル結合を有する化合物であり、反応生成物より一方のアリルエーテル結合のみがエポキシ化されたモノアリルモノグリシジルエーテル化合物を単離する工程をさらに有する、前記[1]~[4]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [6] The step of isolating a monoallyl monoglycidyl ether compound in which the compound having an allyl ether bond is a compound having two allyl ether bonds and only one allyl ether bond is epoxidized from the reaction product The method for producing a glycidyl ether compound according to any one of the above [1] to [4].
[7]反応溶煤として有機溶煤を使用しない、前記[1]~[6]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [7] The method for producing a glycidyl ether compound according to any one of [1] to [6], wherein organic hot metal is not used as the reaction hot metal.
[8]前記アリルエーテル結合を有する化合物が、以下の式(1):
[9]前記アリルエーテル結合を有する化合物が、ビスフェノール-Aのジアリルエーテル、ビスフェノール-Fのジアリルエーテル、及び3,3’,5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテルからなる群より選択される少なくとも一種である、前記[1]~[8]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [9] The compound having an allyl ether bond is composed of diallyl ether of bisphenol-A, diallyl ether of bisphenol-F, and 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diallyl ether. The method for producing a glycidyl ether compound according to any one of [1] to [8], which is at least one selected from the group.
[10]前記アリルエーテル結合を有する化合物が、炭素数2~20のα,ω-ポリアルキレングリコールジアリルエーテル、1,4-シクロヘキサンジメタノールジアリルエーテル、及びトリシクロ[5.2.1.02,6]デカンジメタノールジアリルエーテルからなる群より選択される少なくとも一種である、前記[1]~[7]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [10] The compound having an allyl ether bond is a C 2-20 α, ω-polyalkylene glycol diallyl ether, 1,4-cyclohexanedimethanol diallyl ether, and tricyclo [5.2.1.0 2, 6 ] The process for producing a glycidyl ether compound according to any one of [1] to [7], which is at least one selected from the group consisting of decanedimethanol diallyl ether.
[11]前記アリルエーテル結合を有する化合物が、フェノール-ホルムアルデヒド・アリルアルコール重縮合物またはクレゾール-ホルムアルデヒド・アリルアルコール重縮合物である、[1]~[7]のいずれか1項に記載のグリシジルエーテル化合物の製造方法。 [11] The glycidyl according to any one of [1] to [7], wherein the compound having an allyl ether bond is a phenol-formaldehyde / allyl alcohol polycondensate or a cresol-formaldehyde / allyl alcohol polycondensate. A method for producing an ether compound.
[12]以下の一般式(2):
[13]式中、R7、R8、R9、及びR10がメチル基である、前記[12]に記載のビフェニル骨格を有するモノアリルモノグリシジルエーテル化合物。 [13] The monoallyl monoglycidyl ether compound having a biphenyl skeleton according to the above [12], wherein R 7 , R 8 , R 9 and R 10 are methyl groups.
本発明のグリシジルエーテル化合物の製造方法によれば、触媒としてタングステン化合物、3級有機アミン、及びフェニルホスホン酸を使用して、過酸化水素とアリルエーテル化合物とを反応させることにより、対応するグリシジルエーテル化合物を製造することができ、電子材料分野や、接着剤、塗料樹脂といった各種ポリマーの原料として化学工業をはじめとする様々な産業分野で幅広く用いられる有用な物質であるエポキシ樹脂を、有機塩素系の不純物の混入を極力抑えながら、簡便な操作で安全に、収率良く、かつ、低コストで製造することができる。したがって、本発明のグリシジルエーテル化合物の製造方法は、工業的に多大な効果をもたらす。また、本発明に係るモノアリルモノグリシジルエーテル化合物は、アリル基を有しているため、Si-H基を有する化合物とヒドロシリル化反応させることができ、様々なSi-H基を有する化合物にビフェニルグリシジルエーテル基を導入することができるので、レジスト類や封止材類などに利用されるエポキシ樹脂原料として極めて有用である。 According to the method for producing a glycidyl ether compound of the present invention, by using a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst, and reacting hydrogen peroxide with an allyl ether compound, the corresponding glycidyl ether is obtained. Epoxy resins, which are useful substances widely used in various industrial fields including the chemical industry as raw materials for various polymers such as electronic materials and adhesives and paint resins, can be produced. It is possible to manufacture safely, with good yield, and at low cost by a simple operation while minimizing the mixing of impurities. Therefore, the method for producing a glycidyl ether compound of the present invention has a great industrial effect. In addition, since the monoallyl monoglycidyl ether compound according to the present invention has an allyl group, it can be hydrosilylated with a compound having an Si—H group, and biphenyl can be added to various compounds having an Si—H group. Since a glycidyl ether group can be introduced, it is extremely useful as a raw material for epoxy resins used for resists and sealing materials.
以下、本発明を詳細に説明する。
本発明のグリシジルエーテル化合物の製造方法においては、酸化剤として過酸化水素を用いる。過酸化水素は過酸化水素水溶液として用いることができる。過酸化水素の濃度には特に制限はないが、一般的には1~80%、好ましくは5~80%、より好ましくは10~60%の範囲から選ばれる。工業的な生産性の観点、及び分離の際のエネルギーコストの点からは過酸化水素は高濃度のほうが好ましいが、一方で過度に高濃度の、および/または過剰量の過酸化水素を用いないほうが経済性、安全性などの観点で好ましい。過酸化水素の濃度が1%未満だと反応性が低い。過酸化水素の使用量についても、特に制限はないが、エポキシ化しようとするアリルエーテル結合を有する化合物のアリル基の炭素-炭素二重結合に対して、0.5~10当量、好ましくは0.8~2当量の範囲から選ばれる。この範囲を外れると、一方の原料が過剰に残存することになり経済的でない。
Hereinafter, the present invention will be described in detail.
In the method for producing a glycidyl ether compound of the present invention, hydrogen peroxide is used as an oxidizing agent. Hydrogen peroxide can be used as an aqueous hydrogen peroxide solution. The concentration of hydrogen peroxide is not particularly limited, but is generally selected from the range of 1 to 80%, preferably 5 to 80%, more preferably 10 to 60%. From the viewpoint of industrial productivity and the energy cost of separation, hydrogen peroxide is preferred to have a high concentration, but excessively high concentration and / or excessive hydrogen peroxide is not used. This is preferable from the viewpoints of economy and safety. Reactivity is low when the concentration of hydrogen peroxide is less than 1%. The amount of hydrogen peroxide used is not particularly limited, but is 0.5 to 10 equivalents, preferably 0 to the carbon-carbon double bond of the allyl group of the compound having an allyl ether bond to be epoxidized. Selected from the range of 8 to 2 equivalents. If it is out of this range, one raw material will remain excessively, which is not economical.
本発明のグリシジルエーテル化合物の製造方法において触媒として用いるタングステン化合物としては、水中でタングステン酸アニオンを生成する化合物が好適であり、例えば、タングステン酸、三酸化タングステン、三硫化タングステン、六塩化タングステン、リンタングステン酸、タングステン酸アンモニウム、タングステン酸カリウム二水和物、タングステン酸ナトリウム二水和物等が挙げられるが、タングステン酸、三酸化タングステン、リンタングステン酸、タングステン酸ナトリウム二水和物等が好ましい。これらタングステン化合物は単独で使用しても2種以上を混合使用してもよい。 As the tungsten compound used as a catalyst in the method for producing a glycidyl ether compound of the present invention, a compound that generates a tungstate anion in water is suitable. For example, tungstic acid, tungsten trioxide, tungsten trisulfide, tungsten hexachloride, phosphorus Examples include tungstic acid, ammonium tungstate, potassium tungstate dihydrate, sodium tungstate dihydrate, and the like. Tungstic acid, tungsten trioxide, phosphotungstic acid, sodium tungstate dihydrate, and the like are preferable. These tungsten compounds may be used alone or in combination of two or more.
これらの水中でタングステン酸アニオンを生成する化合物の触媒活性は、タングステン酸アニオン1.0に対して、0.2~0.8の対カチオンが存在したほうが高い。このようなタングステン組成物の調製法としては、例えばタングステン酸とタングステン酸のアルカリ金属塩を前記比率で混合してもよいし、タングステン酸とアルカリ化合物(アルカリ金属又はアルカリ土類金属の水酸化物、炭酸塩等)とを混合するか、タングステン酸のアルカリ金属塩又はアルカリ土類金属塩とリン酸、硫酸等の鉱酸のような酸性化合物を組み合わせることができ、このような調製法によりタングステン酸の部分中和塩を形成することができる。これらの好ましい具体例としては、タングステン酸ナトリウムとタングステン酸の混合物、タングステン酸ナトリウムと鉱酸の混合物、又はタングステン酸とアルカリ化合物の混合物が挙げられる。 The catalytic activity of these compounds that produce tungstate anions in water is higher when a counter cation of 0.2 to 0.8 is present relative to 1.0 tungstate anions. As a method for preparing such a tungsten composition, for example, tungstic acid and an alkali metal salt of tungstic acid may be mixed in the above ratio, or tungstic acid and an alkali compound (alkali metal or alkaline earth metal hydroxide) may be used. , Carbonates, etc.) or a combination of alkali metal or alkaline earth metal salts of tungstic acid and acidic compounds such as mineral acids such as phosphoric acid and sulfuric acid. Partially neutralized salts of acids can be formed. Specific examples of these include a mixture of sodium tungstate and tungstic acid, a mixture of sodium tungstate and mineral acid, or a mixture of tungstic acid and an alkali compound.
タングステン化合物の触媒としての使用量は、タングステン元素として、基質のアリルエーテル結合を有する化合物のアリル基の炭素-炭素二重結合数を基準として0.0001~20モル%、好ましくは0.01~20モル%の範囲から選ばれる。0.0001モル%より少ないと反応性が低く、20モル%より多いと経済的に不利である。 The amount of the tungsten compound used as a catalyst is 0.0001 to 20 mol%, preferably 0.01 to 0.01%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond as a substrate. It is selected from the range of 20 mol%. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 20 mol%, it is economically disadvantageous.
触媒として用いる3級アミンとしては、その窒素原子に結合したアルキル基の炭素数の合計が6以上、好ましくは10以上の3級有機アミン(トリアルキルアミン)が、エポキシ化反応の活性が高くて好ましい。 The tertiary amine used as the catalyst is a tertiary organic amine (trialkylamine) having a total of 6 or more, preferably 10 or more carbon atoms of the alkyl group bonded to the nitrogen atom, and has a high epoxidation reaction activity. preferable.
このような3級有機アミンとしては、トリエチルアミン、トリブチルアミン、トリ-n-オクチルアミン、トリ-(2-エチルヘキシル)アミン、N,N-ジメチルオクチルアミン、N,N-ジメチルラウリルアミン、N,N-ジメチルミリスチルアミン、N,N-ジメチルパルミチルアミン、N,N-ジメチルステアリルアミン、N,N-ジメチルベヘニルアミン、N,N-ジメチルココアルキルアミン、N,N-ジメチル牛脂アルキルアミン、N,N-ジメチル硬化牛脂アルキルアミン、N,N-ジメチルオレイルアミン、N,N-ジイソプロピル-2-エチルヘキシルアミン、N,N-ジブチル-2-エチルヘキシルアミン、N-メチルジオクチルアミン、N-メチルジデシルアミン、N-メチルジココアルキルアミン、N-メチル硬化牛脂アルキルアミン、N-メチルジオレイルアミンなどが挙げられる。3級アミンの窒素原子に結合したアルキル基の炭素数の合計は、反応基質であるアリルエーテル結合を有する化合物の溶解性を考慮すると、50以下であることが好ましく、より好ましくは30以下である。 Such tertiary organic amines include triethylamine, tributylamine, tri-n-octylamine, tri- (2-ethylhexyl) amine, N, N-dimethyloctylamine, N, N-dimethyllaurylamine, N, N -Dimethylmyristylamine, N, N-dimethylpalmitylamine, N, N-dimethylstearylamine, N, N-dimethylbehenylamine, N, N-dimethylcocoalkylamine, N, N-dimethyl tallow alkylamine, N, N-dimethyl-cured tallow alkylamine, N, N-dimethyloleylamine, N, N-diisopropyl-2-ethylhexylamine, N, N-dibutyl-2-ethylhexylamine, N-methyldioctylamine, N-methyldidecylamine, Examples thereof include N-methyldicocoalkylamine, N-methyl hydrogenated beef tallow alkylamine, and N-methyldioleylamine. The total number of carbon atoms of the alkyl group bonded to the nitrogen atom of the tertiary amine is preferably 50 or less, more preferably 30 or less, considering the solubility of the compound having an allyl ether bond as a reaction substrate. .
これらの3級アミンは、単独で使用しても2種以上を混合使用してもよい。その使用量は基質のアリルエーテル結合を有する化合物のアリル基の炭素-炭素二重結合数を基準として0.0001~10モル%が好ましく、より好ましくは0.01~10モル%の範囲から選ばれる。0.0001モル%より少ないと反応性が低く、10モル%より多いと経済的に不利である。 These tertiary amines may be used alone or in combination of two or more. The amount used is preferably from 0.0001 to 10 mol%, more preferably from 0.01 to 10 mol%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond of the substrate. It is. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 10 mol%, it is economically disadvantageous.
本発明のグリシジルエーテル化合物の製造方法では、(助)触媒として、さらに、フェニルホスホン酸を用いる。その使用量は基質のアリルエーテル結合を有する化合物のアリル基の炭素-炭素二重結合数を基準として0.0001~10モル%が好ましく、より好ましくは0.01~10モル%の範囲から選ばれる。0.0001モル%より少ないと反応性が低く、10モル%より多いと経済的に不利である。 In the method for producing a glycidyl ether compound of the present invention, phenylphosphonic acid is further used as a (co-) catalyst. The amount used is preferably from 0.0001 to 10 mol%, more preferably from 0.01 to 10 mol%, based on the number of carbon-carbon double bonds of the allyl group of the compound having an allyl ether bond of the substrate. It is. If it is less than 0.0001 mol%, the reactivity is low, and if it is more than 10 mol%, it is economically disadvantageous.
本発明のグリシジルエーテル化合物の製造方法においてエポキシ化を行う基質としては、アリルエーテル結合を持った化合物であれば特に制限はなく、化合物中に含まれるアリルエーテル結合数は1つであってもよいし、2つ以上であってもよい。アリルエーテル結合数が1つの化合物としては、フェニルアリルエーテル、o-,m-,p-クレゾールモノアリルエーテル、ビフェニル-2-オールモノアリルエーテル、ビフェニル-4-オールモノアリルエーテル、ブチルアリルエーテル、シクロヘキシルアリルエーテル、シクロヘキサンメタノールモノアリルエーテル等が例示できる。 The substrate for epoxidation in the method for producing a glycidyl ether compound of the present invention is not particularly limited as long as it is a compound having an allyl ether bond, and the number of allyl ether bonds contained in the compound may be one. And two or more. Compounds having one allyl ether bond include phenyl allyl ether, o-, m-, p-cresol monoallyl ether, biphenyl-2-ol monoallyl ether, biphenyl-4-ol monoallyl ether, butyl allyl ether, Examples thereof include cyclohexyl allyl ether and cyclohexane methanol monoallyl ether.
アリルエーテル結合数が2つの化合物としては、1,5-ペンタンジオールジアリルエーテル、1,6-ヘキサンジオールジアリルエーテル、1,9-ノナンジオールジアリルエーテル、1,10-デカンジオールジアリルエーテル、ネオペンチルグリコールジアリルエーテルなどの炭素数が2~20のα,ω-アルキレンジオールジアリルエーテル類、炭素数2~20のα,ω-ポリアルキレングリコールジアリルエーテル類、1,4-シクロヘキサンジメタノールジアリルエーテル、トリシクロ[5.2.1.02,6]デカンジメタノールジアリルエーテルや、以下の一般式(1):
このような化合物としては、具体的には、ビスフェノール-Aのジアリルエーテル、ビスフェノール-Fのジアリルエーテル、2,6,2’,6’-テトラメチルビスフェノール-Aジアリルエーテル、2,2’-ジアリルビスフェノール-Aジアリルエーテル、2,2’-ジ-t-ブチルビスフェノール-Aジアリルエーテル、4,4’-ビフェノールジアリルエーテル、2,2’-ジイソプロピルビフェノールジアリルエーテル、4,4’-エチリデンビスフェノールジアリルエーテル、4,4’-シクロヘキシリデンビスフェノールジアリルエーテル、4,4’-(1-α-メチルベンジリデン)ビスフェノールジアリルエーテル、4,4’-(3,3,5-トリメチルシクロヘキシリデン)ビスフェノールジアリルエーテル、4,4’-(1-メチル-ベンジリデン)ビスフェノールジアリルエーテル、3,3’,5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテルなどが挙げられる。 Specific examples of such compounds include bisphenol-A diallyl ether, bisphenol-F diallyl ether, 2,6,2 ′, 6′-tetramethylbisphenol-A diallyl ether, and 2,2′-diallyl. Bisphenol-A diallyl ether, 2,2'-di-t-butylbisphenol-A diallyl ether, 4,4'-biphenol diallyl ether, 2,2'-diisopropylbiphenol diallyl ether, 4,4'-ethylidene bisphenol diallyl ether 4,4′-cyclohexylidene bisphenol diallyl ether, 4,4 ′-(1-α-methylbenzylidene) bisphenol diallyl ether, 4,4 ′-(3,3,5-trimethylcyclohexylidene) bisphenol diallyl ether , 4, 4 - (1-methyl - benzylidene) bisphenol diallyl ether, 3,3 ', 5,5'-tetramethyl-4,4'-diallyl ether.
また、アリルエーテル結合数が3つ以上の化合物としては、フェノール-ホルムアルデヒド・アリルアルコール重縮合物またはクレゾール-ホルムアルデヒド・アリルアルコール重縮合物等が挙げられる。 Examples of the compound having three or more allyl ether bonds include phenol-formaldehyde / allyl alcohol polycondensate or cresol-formaldehyde / allyl alcohol polycondensate.
これらの基質は、有機溶媒を用いないか必要に応じて有機溶媒を用いて、過酸化水素水溶液と前記した触媒とを混合し、エポキシ化反応を進行させることができ、有機溶媒を用いずにエポキシ化反応を行うことが、製造コストの低減、製造設備の簡略化(例えば防爆設備の省略等)、廃棄物処理、作業環境の改善等の点で有利である。溶媒を用いる場合には、反応速度が遅くなる上に、溶媒によっては加水分解反応等の望ましくない反応が進行しやすくなることがあるため、適切に選択する必要がある。反応基質としてのアリルエーテル結合を有する化合物の粘度があまりに高い場合や固体である場合には必要最小限の有機溶媒を用いてもよい。用いることができる有機溶媒としては、芳香族炭化水素、脂肪族炭化水素又は脂環式炭化水素が好ましく、例えばトルエン、キシレン、ヘキサン、オクタン、シクロヘキサン等が挙げられる。使用量は必要最小限に留めた方が製造コスト等の点で有利であり、アリルエーテル結合を有する化合物100質量部に対して好ましくは50質量部以下、より好ましくは30質量部以下で使用される。有機溶媒の使用量がアリルエーテル結合を有する化合物100質量部に対して50質量部を超えると基質濃度が低くなり、反応性が低下する。 These substrates can be used without an organic solvent or with an organic solvent if necessary, by mixing an aqueous hydrogen peroxide solution and the above-described catalyst to allow the epoxidation reaction to proceed, without using an organic solvent. Performing the epoxidation reaction is advantageous in terms of reduction of production cost, simplification of production equipment (for example, omission of explosion-proof equipment, etc.), waste disposal, and improvement of work environment. In the case of using a solvent, the reaction rate becomes slow and, depending on the solvent, an undesirable reaction such as a hydrolysis reaction may easily proceed. When the viscosity of the compound having an allyl ether bond as a reaction substrate is too high or is a solid, a minimum necessary organic solvent may be used. The organic solvent that can be used is preferably an aromatic hydrocarbon, an aliphatic hydrocarbon or an alicyclic hydrocarbon, and examples thereof include toluene, xylene, hexane, octane, and cyclohexane. It is advantageous in terms of production cost to keep the amount used to the minimum necessary, and it is preferably used at 50 parts by mass or less, more preferably 30 parts by mass or less with respect to 100 parts by mass of the compound having an allyl ether bond. The When the amount of the organic solvent used exceeds 50 parts by mass with respect to 100 parts by mass of the compound having an allyl ether bond, the substrate concentration decreases and the reactivity decreases.
また、エポキシ化を行う方法としては工業的に安定に生産を行うことを考えると、触媒と基質を最初に反応器に仕込み、反応温度を極力一定に保ちつつ、過酸化水素については反応で消費されているのを確認しながら、徐々に加えていった方がよい。このような方法を採れば、反応器内で過酸化水素が異常分解して酸素ガスが発生したとしても、過酸化水素の蓄積量が少なく圧力上昇を最小限に留めることができる。 Also, considering the industrially stable production method for epoxidation, the catalyst and substrate are first charged into the reactor, and hydrogen peroxide is consumed in the reaction while keeping the reaction temperature as constant as possible. It is better to add gradually while confirming that it is. By adopting such a method, even if hydrogen peroxide is abnormally decomposed in the reactor and oxygen gas is generated, the amount of hydrogen peroxide accumulated is small and the pressure rise can be minimized.
反応温度があまりに高いと副反応が多くなり、かつ、過酸化水素も分解しやすくなるし、低すぎる場合には過酸化水素の消費速度が遅くなり、反応系内に蓄積することがあるので、反応温度は、好ましくは-10~120℃、より好ましくは20℃~100℃の範囲で選択する。 If the reaction temperature is too high, there will be many side reactions, and hydrogen peroxide will also be easily decomposed. If it is too low, the consumption rate of hydrogen peroxide will slow down and may accumulate in the reaction system. The reaction temperature is preferably selected in the range of −10 to 120 ° C., more preferably 20 ° C. to 100 ° C.
反応終了後は、水層と有機層の比重差がほとんど無い場合があるが、その場合には水層に無機化合物の飽和水溶液を混合して、有機層と比重差をつけることにより有機抽出溶媒を使用しなくても二層分離を行うことができる。特にタングステン化合物の比重は重いので、水層を下層に持って来るために、本来触媒として必要な前記した使用量を超えるタングステン化合物を用いてもよい。この場合、水層からのタングステン化合物を再使用して、タングステン化合物の効率を高めることが望ましい。 After completion of the reaction, there may be almost no difference in specific gravity between the aqueous layer and the organic layer. In that case, an organic extraction solvent is prepared by mixing the aqueous layer with a saturated aqueous solution of an inorganic compound and making a difference in specific gravity with the organic layer. Two-layer separation can be carried out without using. In particular, since the specific gravity of the tungsten compound is heavy, in order to bring the aqueous layer to the lower layer, a tungsten compound exceeding the above-mentioned usage amount that is originally necessary as a catalyst may be used. In this case, it is desirable to increase the efficiency of the tungsten compound by reusing the tungsten compound from the aqueous layer.
また、逆に基質によっては有機層の比重が1.2近くとなるものもあるので、このような場合には水を追添して、水層の比重を1に近づけることにより、上層に水層、下層に有機層を持って来ることもできる。また、反応液の抽出にトルエン、シクロヘキサン、ヘキサン、塩化メチレンなどの有機溶媒を用いて抽出を実施することもでき、状況に応じて最適な分離方法を選択することができる。 Conversely, depending on the substrate, the specific gravity of the organic layer may be close to 1.2. In such a case, water is added to bring the specific gravity of the aqueous layer closer to 1, so that It is also possible to bring an organic layer under the layer. The extraction of the reaction solution can also be carried out using an organic solvent such as toluene, cyclohexane, hexane, methylene chloride, etc., and an optimal separation method can be selected according to the situation.
このようにして水層と分離した有機層を濃縮後、蒸留、クロマト分離、再結晶や昇華等の通常の方法によって、得られたグリシジルエーテル化合物を取り出すことができる。アリルエーテル結合を有する化合物が2つのアリルエーテル結合を有する化合物である場合、上記の分離精製操作を行うことにより、反応生成物より一方のアリルエーテル結合のみがエポキシ化されたモノアリルモノグリシジルエーテル化合物を単離することができる。例えば、ビフェニル骨格を有するジアリルエーテル化合物を基質として用いる場合有機層中にはモノアリルモノグリシジルエーテル、ジグリシジルエーテル、及び未反応のジアリルエーテル化合物が含まれるが、これらから後述の実施例16に記載のカラムクロマトグラフィー等の精製により、例えば以下の一般式(2):
以下、実施例により本発明を更に具体的に説明するが、本発明は以下の実施例に制限されるものではない。 Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to the following examples.
[実施例1]
滴下ロート、ジムロート冷却管を備えた300mLの三ツ口フラスコに、タングステン酸ナトリウム(日本無機化学工業(株)製)0.950g(2.88mmol)、タングステン酸(日本無機化学工業(株)製)0.720g(2.88mmol)、トリオクチルアミン(広栄化学(株)製)2.04g(5.76mmol)、フェニルホスホン酸(日産化学(株)製)0.911g(5.76mmol)、アリルフェニルエーテル80g(0.576mol)を入れ、マグネチックスターラーで撹拌しながら、オイルバスで70℃に加温した後、35%過酸化水素水溶液84.0g (0.864mol)を、反応温度が75℃を超えないように滴下した。滴下終了後、2時間、攪拌を継続し、反応液を室温まで冷却した。この後、酢酸エチルを40g追加し、上層に有機層、下層に水層が来るようにして、有機層を分離した。
[Example 1]
To a 300 mL three-necked flask equipped with a dropping funnel and a Dimroth condenser, 0.950 g (2.88 mmol) of sodium tungstate (manufactured by Nippon Inorganic Chemical Co., Ltd.), 0.720 g of tungstic acid (manufactured by Nippon Inorganic Chemical Co., Ltd.) ( 2.88mmol), Trioctylamine (Guangei Chemical Co., Ltd.) 2.04g (5.76mmol), Phenylphosphonic acid (Nissan Chemical Co., Ltd.) 0.911g (5.76mmol), Allyl phenyl ether 80g (0.576mol) While stirring with a magnetic stirrer, the mixture was heated to 70 ° C. with an oil bath, and 84.0 g (0.864 mol) of 35% aqueous hydrogen peroxide solution was added dropwise so that the reaction temperature did not exceed 75 ° C. After completion of the dropwise addition, stirring was continued for 2 hours, and the reaction solution was cooled to room temperature. Thereafter, 40 g of ethyl acetate was added, and the organic layer was separated so that the upper layer was an organic layer and the lower layer was an aqueous layer.
この有機層を分析した結果、アリルフェニルエーテルの転化率は55.8%であり、そしてグリシジルフェニルエーテルへの選択率は66.3%であった。 As a result of analyzing this organic layer, the conversion of allyl phenyl ether was 55.8%, and the selectivity to glycidyl phenyl ether was 66.3%.
なお、転化率、及び選択率は、ガスクロマトグラフィーにより分析した結果を元に、以下の計算式により計算した。
転化率(%)=(1-残存した原料のモル数/使用した原料のモル数)×100
選択率(%)={(目的化合物のモル数/使用した原料のモル数)×10000}/転化率(%)
In addition, the conversion rate and the selectivity were calculated by the following calculation formula based on the result analyzed by gas chromatography.
Conversion rate (%) = (1−number of moles of raw material remaining / number of moles of raw material used) × 100
Selectivity (%) = {(number of moles of target compound / number of moles of raw material used) × 10000} / conversion rate (%)
[比較例1]
フェニルホスホン酸を加えなかった以外は実施例1と同様の条件で反応を行なった。その結果、アリルフェニルエーテルの転化率は3.6%であり、ガスクロマトグラフィーで極少量のグリシジルフェニルエーテルが検出されたに過ぎなかった。
[Comparative Example 1]
The reaction was carried out under the same conditions as in Example 1 except that phenylphosphonic acid was not added. As a result, the conversion rate of allyl phenyl ether was 3.6%, and only a very small amount of glycidyl phenyl ether was detected by gas chromatography.
[比較例2]
トリオクチルアミンを加えなかった以外は実施例1と同様の条件で反応を行なった。その結果、アリルフェニルエーテルの転化率は5.3%であり、ガスクロマトグラフィーで極少量のグリシジルフェニルエーテルが検出されたに過ぎなかった。
[Comparative Example 2]
The reaction was carried out under the same conditions as in Example 1 except that trioctylamine was not added. As a result, the conversion rate of allyl phenyl ether was 5.3%, and only a very small amount of glycidyl phenyl ether was detected by gas chromatography.
[実施例2~10]
以下の表1に示す触媒成分、仕込みモル比で、実施例1と同様にエポキシ化反応を行った。結果を併せて以下の表1に示す。
[Examples 2 to 10]
The epoxidation reaction was carried out in the same manner as in Example 1 with the catalyst components and the charged molar ratios shown in Table 1 below. The results are also shown in Table 1 below.
[合成例1]:ビスフェノール-Fのジアリルエーテルの合成
2000mlのナス型フラスコに、ビスフェノール-F-ST(三井化学(株)製)200g(0.999mol)、50%含水5%-Pd/C-STDタイプ(エヌ・イーケムキャット(株)製)2.13g(0.499mmol)、トリフェニルホスフィン(北興化学(株)製)2.62g(9.99mmol)、炭酸カリウム(旭硝子(株)製)276g(2.00mol)、酢酸アリル(昭和電工(株)製)220g(2.20mol)、及びイソプロパノール200gを入れ、窒素雰囲気中、85℃で8時間反応させた。反応後、一部サンプリングし、酢酸エチルで希釈後、ガスクロマトグラフィーによる分析で、ビスフェノール-Fジアリルエーテル対モノアリルエーテルの比率が99:1までになっていることを確認した。
[Synthesis Example 1] Synthesis of diallyl ether of bisphenol-F In a 2000 ml eggplant-shaped flask, 200 g (0.999 mol) of bisphenol-F-ST (Mitsui Chemicals), 50% water content 5% -Pd / C- STD type (manufactured by NE Chemcat Co., Ltd.) 2.13 g (0.499 mmol), triphenylphosphine (manufactured by Hokuko Chemical Co., Ltd.) 2.62 g (9.99 mmol), potassium carbonate (manufactured by Asahi Glass Co., Ltd.) 276 g (2.00 mol) ), Allyl acetate (made by Showa Denko KK) 220 g (2.20 mol) and isopropanol 200 g were added and reacted at 85 ° C. for 8 hours in a nitrogen atmosphere. After the reaction, a part was sampled, diluted with ethyl acetate, and analyzed by gas chromatography, and it was confirmed that the ratio of bisphenol-F diallyl ether to monoallyl ether was 99: 1.
この後、反応液にトルエン400gを加え、Pd/Cと析出した固体を濾過により除き、エバポレーターにより、イソプロパノールとトルエンを留去した。この反応、後処理操作を4回繰り返し後、分子蒸留装置(大科工業(株)製)により、留出物748g(単離収率66%、ビスフェノール-Fジアリルエーテル98.7%、残りはモノアリルエーテル)、非留出物368g(ビスフェノール-Fジアリルエーテル88%)を得た。これらの分析はガスクロマトグラフィーにより行なった。留出物の25℃における粘度は、25mPa・s(B型粘度計(BROOKFIELD製DV-E(型式:LVDV-E))により測定)であった。また、異性体比はo,o’-:o,p’-:p,p’-=17:52:31(ガスクロマトグラフィーによる分析値)であった。 Thereafter, 400 g of toluene was added to the reaction solution, Pd / C and the precipitated solid were removed by filtration, and isopropanol and toluene were distilled off by an evaporator. This reaction and post-treatment operation were repeated four times, and then a distillate 748 g (isolation yield 66%, bisphenol-F diallyl ether 98.7%, the rest was monoallyl) with a molecular distillation apparatus (manufactured by Daishin Kogyo Co., Ltd.). Ether) and 368 g of non-distilled product (bisphenol-F diallyl ether 88%). These analyzes were performed by gas chromatography. The viscosity of the distillate at 25 ° C. was 25 mPa · s (measured with a B-type viscometer (DV-E manufactured by BROOKFIELD (model: LVDV-E))). The isomer ratio was o, o '-: o, p'-: p, p '-= 17:52:31 (analyzed value by gas chromatography).
[合成例2]:3,3’,5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテルの合成
2000mlのナス型フラスコに、3,3’,5,5’-テトラメチル-4,4’-ビフェニルジオール(中国:甘粛省化工研究院製)150g(0.619mol)、50%含水5%-Pd/C-STDタイプ(エヌ・イーケムキャット(株)製)1.32g(0.310mmol)、トリフェニルホスフィン(北興化学(株)製)1.624g(6.19mmol)、炭酸カリウム(日本曹達(株)製)171g(1.24mol)、酢酸アリル(昭和電工(株)製)136g(1.36mol)、及びイソプロパノール68.1gを入れ、窒素雰囲気中、85℃で8時間反応させた。反応後、一部サンプリングし、酢酸エチルで希釈後、ガスクロマトグラフィーによる分析で、3,3’,5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテル対モノアリルエーテルの比率が97:3までになっていることを確認した。
Synthesis Example 2 Synthesis of 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diallyl ether 3,3 ′, 5,5′-tetramethyl-4 was added to a 2000 ml eggplant-shaped flask. , 4'-biphenyldiol (China: Made in Gansu Chemical Research Institute) 150g (0.619mol), 50% water content 5% -Pd / C-STD type (made by N.E. Chemcat Co., Ltd.) 1.32g (0.310mmol) , Triphenylphosphine (Hokuko Chemical Co., Ltd.) 1.624 g (6.19 mmol), potassium carbonate (Nippon Soda Co., Ltd.) 171 g (1.24 mol), allyl acetate (Showa Denko Co., Ltd.) 136 g (1.36 mol) , And 68.1 g of isopropanol were added and reacted at 85 ° C. for 8 hours in a nitrogen atmosphere. After the reaction, a part was sampled, diluted with ethyl acetate, and analyzed by gas chromatography. The ratio of 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diallyl ether to monoallyl ether was 97. : Confirmed to be up to 3.
この後、反応液にトルエン200gを加え、Pd/Cと析出した固体を濾過により除き、エバポレーターにより、イソプロパノールとトルエンを留去した。この反応、後処理操作を4回繰り返し後、分子蒸留装置(大科工業(株)製)により、留出物127.5g(単離収率66%、ジアリルエーテル97.9%、残りはモノアリルエーテル)、非留出物31.7g(ジアリルエーテル97.5%)を得た。これらの分析はガスクロマトグラフィーにより行なった。留出物は融点が51.7℃の固体であり、60℃における粘度は、29mPa・s(B型粘度計(BROOKFIELD製DV-E(型式:LVDV-E))により測定)であった。 Thereafter, 200 g of toluene was added to the reaction solution, Pd / C and the precipitated solid were removed by filtration, and isopropanol and toluene were distilled off by an evaporator. This reaction and post-treatment operation were repeated four times, and then a distillate of 127.5 g (isolation yield: 66%, diallyl ether: 97.9%, the remainder being monoallyl ether) was obtained using a molecular distillation apparatus (manufactured by Otsuka Kogyo Co., Ltd.). As a result, 31.7 g of non-distillate (97.5% diallyl ether) was obtained. These analyzes were performed by gas chromatography. The distillate was a solid having a melting point of 51.7 ° C., and the viscosity at 60 ° C. was 29 mPa · s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
[合成例3]:1,4-シクロヘキサンジメタノールジアリルエーテルの合成
1000mlのフラスコに、1,4-シクロヘキサンジオール(イーストマンケミカル製)100g(0.693mol)、50%水酸化ナトリウム水溶液110.9g(1.39mol)、テトラブチルアンモニウムブロマイド(ライオンアクゾー(株)製)1.12g(3.47mmol)、塩化アリル132.7g(1.73mol)を入れ、窒素気流下に最初は40℃で加熱を行い、反応の進行とともに徐々に反応温度を上げて、3時間かけて70℃になるまで昇温し、更に17時間反応させた。反応液を室温まで冷却し、トルエン200mlを加え反応物を抽出し、有機層を純水で2回洗浄した。エバポレーターによりトルエンを留去した後、減圧蒸留により、初留を除去後、沸点80.4℃/28Paの留出分84.6g(ジアリルエーテル94%、残りはモノアリルエーテル)を得た。これらの分析はガスクロマトグラフィーにより行なった。また、留出物の25℃における粘度は、8.5mPa・s(B型粘度計(BROOKFIELD製DV-E(型式:LVDV-E))により測定)であった。
[Synthesis Example 3]: Synthesis of 1,4-cyclohexanedimethanol diallyl ether In a 1000 ml flask, 100 g (0.693 mol) of 1,4-cyclohexanediol (manufactured by Eastman Chemical), 110.9 g of a 50% aqueous sodium hydroxide solution (1.39) mol), tetrabutylammonium bromide (manufactured by Lion Akzo Co., Ltd.) 1.12 g (3.47 mmol) and allyl chloride 132.7 g (1.73 mol) are added and heated at 40 ° C in a nitrogen stream at first. At the same time, the reaction temperature was gradually raised, the temperature was raised to 70 ° C. over 3 hours, and the reaction was further continued for 17 hours. The reaction solution was cooled to room temperature, 200 ml of toluene was added to extract the reaction product, and the organic layer was washed twice with pure water. After distilling off toluene with an evaporator, the initial fraction was removed by distillation under reduced pressure to obtain 84.6 g of a distillate having a boiling point of 80.4 ° C./28 Pa (diallyl ether 94%, the rest being monoallyl ether). These analyzes were performed by gas chromatography. The viscosity of the distillate at 25 ° C. was 8.5 mPa · s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
[合成例4]:1,6-ヘキサンジオールジアリルエーテルの合成
1000mlのフラスコに、1,6-ヘキサンジオール(東京化成(株)製)100g(0.846mol)、50%水酸化ナトリウム水溶液135.4g(1.69mol)、テトラブチルアンモニウムブロマイド(ライオンアクゾー(株)製)1.36g(4.23mmol)、塩化アリル161.9g(2.12mol)を入れ、窒素気流下に最初は40℃で加熱を行い、反応の進行とともに徐々に反応温度を上げて、2時間かけて70℃になるまで昇温し、更に10時間反応させた。反応液を室温まで冷却し、トルエン200mlを加え反応物を抽出し、有機層を純水で2回洗浄した。エバポレーターによりトルエンを留去した後、減圧蒸留により、初留を除去後、沸点72℃/133Paの留出分84.6g(ジアリルエーテル97%、残りはモノアリルエーテル)を得た。これらの分析はガスクロマトグラフィーにより行なった。また、留出物の25℃における粘度は、2.3mPa・s(B型粘度計(BROOKFIELD製DV-E(型式:LVDV-E))により測定)であった。
[Synthesis Example 4]: Synthesis of 1,6-hexanediol diallyl ether In a 1000 ml flask, 100 g (0.846 mol) of 1,6-hexanediol (manufactured by Tokyo Chemical Industry Co., Ltd.), 135.4 g of 50% aqueous sodium hydroxide solution ( 1.69 mol), 1.36 g (4.23 mmol) of tetrabutylammonium bromide (manufactured by Lion Akzo Co., Ltd.), 161.9 g (2.12 mol) of allyl chloride, and initially heating at 40 ° C. under a nitrogen stream. The reaction temperature was gradually raised as the reaction proceeded, the temperature was raised to 70 ° C. over 2 hours, and the reaction was further continued for 10 hours. The reaction solution was cooled to room temperature, 200 ml of toluene was added to extract the reaction product, and the organic layer was washed twice with pure water. After distilling off toluene with an evaporator, the initial distillation was removed by distillation under reduced pressure to obtain 84.6 g of a distillate having a boiling point of 72 ° C./133 Pa (diallyl ether 97%, the rest being monoallyl ether). These analyzes were performed by gas chromatography. The viscosity of the distillate at 25 ° C. was 2.3 mPa · s (measured with a B-type viscometer (DV-E (model: LVDV-E) manufactured by BROOKFIELD)).
[実施例11~15]
実施例1のアリルフェニルエーテルを、以下の表2に示す化合物に代えたほかは、実施例1と同様にエポキシ化反応を行った。結果を併せて以下の表2に示す。
[Examples 11 to 15]
The epoxidation reaction was carried out in the same manner as in Example 1 except that allyl phenyl ether in Example 1 was replaced with the compounds shown in Table 2 below. The results are also shown in Table 2 below.
[実施例16]
実施例13で得られた生成物からモノグリシジルモノアリルエーテルを単離し、本実施例において同定した。実験手順を以下に説明する。
滴下ロート、ジムロート冷却管を備えた300mLの三ツ口フラスコに、タングステン酸ナトリウム(日本無機化学工業(株)製)0.950g(2.88mmol)、タングステン酸(日本無機化学工業(株)製)0.720g(2.88mmol)、トリオクチルアミン(広栄化学(株)製)2.04g(5.76mmol)、フェニルホスホン酸(日産化学(株)製)0.911g(5.76mmol)、3,3’、5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテル92.9g (0.288mol)を入れ、マグネチックスターラーで撹拌しながら、オイルバスで70℃に加温した後、35%過酸化水素水溶液84.0g (0.864mol)を、反応温度が75℃を超えないように滴下した。滴下終了後、2時間、攪拌を継続し、反応液を室温まで冷却した。この後、酢酸エチルを40g追加し、上層に有機層、下層に水層が来るようにして、有機層を分離した。
[Example 16]
Monoglycidyl monoallyl ether was isolated from the product obtained in Example 13 and identified in this example. The experimental procedure is described below.
To a 300 mL three-necked flask equipped with a dropping funnel and a Dimroth condenser, 0.950 g (2.88 mmol) of sodium tungstate (manufactured by Nippon Inorganic Chemical Co., Ltd.), 0.720 g of tungstic acid (manufactured by Nippon Inorganic Chemical Co., Ltd.) ( 2.88 mmol), trioctylamine (manufactured by Guangei Chemical Co., Ltd.) 2.04 g (5.76 mmol), phenylphosphonic acid (manufactured by Nissan Chemical Co., Ltd.) 0.911 g (5.76 mmol), 3,3 ′, 5,5′- 92.9 g (0.288 mol) of tetramethylbiphenyl-4,4′-diallyl ether was added and heated to 70 ° C. in an oil bath while stirring with a magnetic stirrer, and then 84.0 g (0.864 mol) was added dropwise such that the reaction temperature did not exceed 75 ° C. After completion of the dropwise addition, stirring was continued for 2 hours, and the reaction solution was cooled to room temperature. Thereafter, 40 g of ethyl acetate was added, and the organic layer was separated so that the upper layer was an organic layer and the lower layer was an aqueous layer.
この有機層を分析した結果、3,3’、5,5’-テトラメチルビフェニル-4,4’-ジアリルエーテルの転化率は54.2%であり、モノエポキシ体の選択率が64.9%、そしてジエポキシ体への選択率は15.5%であった(実施例13、表2参照)。 As a result of analyzing this organic layer, the conversion of 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diallyl ether was 54.2%, the selectivity of monoepoxy compound was 64.9%, The selectivity to diepoxy was 15.5% (see Example 13, Table 2).
その後、有機層を亜硫酸ナトリウム水溶液で洗浄し、エバポレーター、真空ポンプを用いて有機層の溶媒留去及び乾燥を行い、クルードの反応物が得られ、その後カラムクロマトグラフィー精製(シリカゲル60N(球状、中性):関東化学製、展開溶媒;ヘキサン:酢酸エチル=10:1~3:1)により、3,3’,5,5’-テトラメチルビフェニル-4,4’-ジグリシジルエーテル及び3,3’,5,5’-テトラメチルビフェニル-4,4’-モノアリルモノグリシジルエーテルが得られた。得られた生成物のNMR(1H、13C)及び質量分析(MS)の結果から、得られた生成物は3,3’,5,5’-テトラメチルビフェニル-4,4’-ジグリシジルエーテル及び3,3’,5,5’-テトラメチルビフェニル-4,4’-モノアリルモノグリシジルエーテルであることが確認された。モノアリルモノグリシジルエーテル体の測定結果を図1~3に示す。 Thereafter, the organic layer was washed with an aqueous sodium sulfite solution, and the organic layer was evaporated and dried using an evaporator and a vacuum pump to obtain a crude reaction product, which was then purified by column chromatography (silica gel 60N (spherical, medium). ): Manufactured by Kanto Chemical Co., Ltd., developing solvent: hexane: ethyl acetate = 10: 1-3: 1), 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-diglycidyl ether and 3, 3 ′, 5,5′-tetramethylbiphenyl-4,4′-monoallylmonoglycidyl ether was obtained. From the NMR ( 1 H, 13 C) and mass spectrometry (MS) results of the obtained product, the obtained product was found to be 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-di It was confirmed that they were glycidyl ether and 3,3 ′, 5,5′-tetramethylbiphenyl-4,4′-monoallyl monoglycidyl ether. The measurement results of the monoallyl monoglycidyl ether are shown in FIGS.
MSの測定条件は以下の通りであった:
装置:JEOL JMS-SX102A
試料加熱温度:80℃→〔32℃/min〕→400℃
試料濃度:NMR測定用溶液をジクロロメタンで10倍希釈
試料量:0.5μl *80℃加熱で溶媒により揮発除去してからMSに導入
イオン化法:EI(電子イオン化法)
スキャン範囲:m/z10~800
The measurement conditions for MS were as follows:
Device: JEOL JMS-SX102A
Sample heating temperature: 80 ℃ → [32 ℃ / min] → 400 ℃
Sample concentration: Diluted NMR measurement solution 10 times with dichloromethane Sample volume: 0.5 μl * Volatilized and removed by solvent with heating at 80 ° C, then introduced into MS Ionization method: EI (Electron ionization method)
Scan range: m / z 10 to 800
[実施例17]
還流冷却器、温度計、攪拌装置およびセラムキャップを備えた50ml三ツ口フラスコに、実施例16で合成したモノアリルモノグリシジルエーテル体0.1g(0.30mmol)、1,1,1,3,5,5,5-ヘプタメチルトリシロキサン0.077g(0.35mmol)、及びトルエン1mlを加え、アルゴン気流下、室温で攪拌した。その混合溶液に3%ジビニルテトラメチルジシロキサン白金錯体イソプロピルアルコール溶液0.002g(白金量:6.0×10-5g)を、反応溶液に加え、室温で攪拌した。6時間室温で攪拌した後、減圧下でトルエン溶媒を除去し、クルードの反応物0.13g得た。その後、カラムクロマトグラフィー精製(シリカゲル60N(球状、中性):関東化学製、展開溶媒;トルエン:酢酸エチル=10:1)により、下記構造式(3):
In a 50 ml three-necked flask equipped with a reflux condenser, a thermometer, a stirrer, and a serum cap, 0.1 g (0.30 mmol) of monoallyl monoglycidyl ether synthesized in Example 16, 1,1,1,3,5 , 5,5-heptamethyltrisiloxane 0.077 g (0.35 mmol) and toluene 1 ml were added, and the mixture was stirred at room temperature under an argon stream. To the mixed solution, 0.002 g of 3% divinyltetramethyldisiloxane platinum complex isopropyl alcohol solution (platinum amount: 6.0 × 10 −5 g) was added to the reaction solution and stirred at room temperature. After stirring at room temperature for 6 hours, the toluene solvent was removed under reduced pressure to obtain 0.13 g of a crude reaction product. Then, by column chromatography purification (silica gel 60N (spherical, neutral): manufactured by Kanto Chemical Co., Ltd., developing solvent; toluene: ethyl acetate = 10: 1), the following structural formula (3):
MSの測定条件は、以下の通りであった:
装置:JEOL JMS-SX102A
試料加熱温度:80℃→〔32℃/min〕→400℃
試料濃度:NMR測定用溶液をジクロロメタンで10倍希釈
試料量:0.5μl *80℃加熱で溶媒により揮発除去してからMSに導入
イオン化法:EI(電子イオン化法)
スキャン範囲:m/z10~800
The measurement conditions for MS were as follows:
Device: JEOL JMS-SX102A
Sample heating temperature: 80 ℃ → [32 ℃ / min] → 400 ℃
Sample concentration: Diluted NMR measurement solution 10 times with dichloromethane Sample volume: 0.5 μl * Volatilized and removed by solvent with heating at 80 ° C, then introduced into MS Ionization method: EI (Electron ionization method)
Scan range: m / z 10 to 800
本発明のグリシジルエーテル化合物の製造方法によれば、触媒としてタングステン化合物、3級有機アミン、及びフェニルホスホン酸を使用して、過酸化水素とアリルエーテル化合物とを反応させることにより、対応するグリシジルエーテル化合物を製造することができ、電子材料分野や、接着剤、塗料樹脂といった各種ポリマーの原料として化学工業をはじめとする様々な産業分野で幅広く用いられる有用な物質であるエポキシ樹脂を、有機塩素系の不純物の混入を極力抑えながら、簡便な操作で安全に、収率良く、かつ、低コストで製造することができる。また、本発明のモノアリルモノグリシジルエーテル化合物は、Si-H基を有する化合物とヒドロシリル化反応させることにより様々なSi-H基を有する化合物にビフェニルグリシジルエーテル基を導入することができるので、耐熱性、エッチング耐性が高いレジスト類や封止材類などに利用されるエポキシ樹脂の合成に有用である。 According to the method for producing a glycidyl ether compound of the present invention, by using a tungsten compound, a tertiary organic amine, and phenylphosphonic acid as a catalyst, and reacting hydrogen peroxide with an allyl ether compound, the corresponding glycidyl ether is obtained. Epoxy resins, which are useful substances widely used in various industrial fields including the chemical industry as raw materials for various polymers such as electronic materials and adhesives and paint resins, can be produced. It is possible to manufacture safely, with good yield, and at low cost by a simple operation while minimizing the mixing of impurities. The monoallyl monoglycidyl ether compound of the present invention can introduce a biphenyl glycidyl ether group into a compound having various Si—H groups by a hydrosilylation reaction with a compound having an Si—H group. It is useful for synthesizing epoxy resins used for resists and sealing materials having high properties and etching resistance.
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| WO2014123005A1 (en) * | 2013-02-08 | 2014-08-14 | 三菱瓦斯化学株式会社 | Novel aryl compound and method for producing same |
| JP2018100236A (en) * | 2016-12-20 | 2018-06-28 | Dic株式会社 | Method for producing naphthalene type epoxy compound and naphthalene type epoxy compound |
| JP2021046449A (en) * | 2020-12-25 | 2021-03-25 | Dic株式会社 | Method for producing naphthalene type epoxy compound and naphthalene type epoxy compound |
| US11773207B2 (en) | 2019-01-07 | 2023-10-03 | Shikoku Chemicals Corporation | Thiol compound, method for synthesizing same, and uses for said thiol compound |
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| CN103242264B (en) * | 2013-05-03 | 2015-07-22 | 四川东材绝缘技术有限公司 | Method for synthesizing bisphenol A diglycidyl ethers through halogen-free epoxidation |
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| JP2009256217A (en) * | 2008-04-14 | 2009-11-05 | Showa Denko Kk | Method for producing epoxy compound |
| WO2010073960A1 (en) * | 2008-12-26 | 2010-07-01 | 昭和電工株式会社 | Epoxy compound production method |
| WO2010110151A1 (en) * | 2009-03-25 | 2010-09-30 | 昭和電工株式会社 | Method for producing epoxy compound |
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| CN1310895C (en) * | 2002-02-08 | 2007-04-18 | 住友化学工业株式会社 | Process for producing epoxide compound |
| KR100943421B1 (en) * | 2007-12-24 | 2010-02-19 | 연세대학교 산학협력단 | Photopolymerizable monomer having an unsaturated double bond with an epoxy group and a photopolymerizable composition containing the same |
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2010
- 2010-12-16 CN CN201080058513.8A patent/CN102666518B/en not_active Expired - Fee Related
- 2010-12-16 WO PCT/JP2010/072715 patent/WO2011078060A1/en not_active Ceased
- 2010-12-16 KR KR1020127016471A patent/KR101415113B1/en not_active Expired - Fee Related
- 2010-12-16 JP JP2011547508A patent/JPWO2011078060A1/en active Pending
- 2010-12-22 TW TW099145227A patent/TWI458717B/en not_active IP Right Cessation
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|---|---|---|---|---|
| WO2014123005A1 (en) * | 2013-02-08 | 2014-08-14 | 三菱瓦斯化学株式会社 | Novel aryl compound and method for producing same |
| US9464068B2 (en) | 2013-02-08 | 2016-10-11 | Mitsubishi Gas Chemical Company, Inc. | Allyl compound and method for producing the same |
| JPWO2014123005A1 (en) * | 2013-02-08 | 2017-02-02 | 三菱瓦斯化学株式会社 | Novel allyl compound and production method thereof |
| JP2018100236A (en) * | 2016-12-20 | 2018-06-28 | Dic株式会社 | Method for producing naphthalene type epoxy compound and naphthalene type epoxy compound |
| US11773207B2 (en) | 2019-01-07 | 2023-10-03 | Shikoku Chemicals Corporation | Thiol compound, method for synthesizing same, and uses for said thiol compound |
| JP2021046449A (en) * | 2020-12-25 | 2021-03-25 | Dic株式会社 | Method for producing naphthalene type epoxy compound and naphthalene type epoxy compound |
| JP7038385B2 (en) | 2020-12-25 | 2022-03-18 | Dic株式会社 | Manufacturing method of naphthalene type epoxy compound and naphthalene type epoxy compound |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI458717B (en) | 2014-11-01 |
| CN102666518A (en) | 2012-09-12 |
| KR101415113B1 (en) | 2014-07-04 |
| JPWO2011078060A1 (en) | 2013-05-09 |
| TW201130806A (en) | 2011-09-16 |
| KR20120096552A (en) | 2012-08-30 |
| CN102666518B (en) | 2015-10-21 |
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