WO2011071151A1 - Method for producing indium metal, molten salt electrolytic cell, and method for purifying low melting point metal - Google Patents
Method for producing indium metal, molten salt electrolytic cell, and method for purifying low melting point metal Download PDFInfo
- Publication number
- WO2011071151A1 WO2011071151A1 PCT/JP2010/072248 JP2010072248W WO2011071151A1 WO 2011071151 A1 WO2011071151 A1 WO 2011071151A1 JP 2010072248 W JP2010072248 W JP 2010072248W WO 2011071151 A1 WO2011071151 A1 WO 2011071151A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- indium
- molten salt
- metal
- electrolytic cell
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B58/00—Obtaining gallium or indium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/001—Dry processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/14—Refining in the solid state
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
- C25C3/34—Electrolytic production, recovery or refining of metals by electrolysis of melts of metals not provided for in groups C25C3/02 - C25C3/32
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/005—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells of cells for the electrolysis of melts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Definitions
- the present invention relates to a method for producing metal indium from a metal indium-containing alloy, a molten salt electrolytic cell, and a method for purifying a low melting point metal.
- ITO indium-tin oxide
- a method for producing metal indium by a molten salt electrolysis method is known.
- a method is known in which metallic indium is collected at the cathode by molten salt electrolysis using mercury (indium-tin amalgam) containing metallic indium-tin as an anode and a molten salt electrolyte as a medium (for example, Patent Documents). 1).
- mercury indium-tin amalgam
- tin is mixed in metal indium. Therefore, by using amalgam, indium is selectively oxidized and dissolved. It has been.
- an aluminum chloride-based molten salt electrolyte bath mainly composed of aluminum chloride and containing at least one kind of chloride is used for electroplating aluminum or aluminum alloy.
- the composition of the electrolyte bath is adjusted so that the aluminum chloride content is 50 mol% or less.
- a method of purifying an electrolyte bath by adjusting so that the precipitated impurities are separated from the bath see, for example, Patent Document 4).
- an electrolytic cell used for the molten salt electrolysis method there is an electrolytic cell in which a cathode is arranged at the bottom, a layer of a molten salt bath is held on the cathode, and an anode is held in a container made of a porous body on the cathode. It is disclosed (for example, see Patent Document 5).
- molten salt electrolysis is performed at a temperature of 160 ° C. or higher using mercury for the anode. For this reason, it is a method that requires consideration for health and the environment, for example, when mercury partially vaporizes as vapor.
- the metal indium deposited on the cathode contains a small amount of mercury, and it was necessary to combine further advanced purification techniques to remove the mercury.
- the molten salt containing indium chloride described in the cited document 2 comes into contact with air having a normal gas composition, that is, a high water vapor concentration, the moisture content of the molten salt becomes high, and the molten salt is denatured by a chemical reaction.
- the cell voltage is increased and the quality of metallic indium deposited on the cathode is decreased.
- the content of indium chloride is preferably 50 to 67% by weight. The reason is that when the content is lower than 50% by weight, zinc is mixed in the precipitated indium, which is not preferable. If it is higher, tin is mixed in the deposited indium, which is not preferable.
- ammonium chloride described in the cited document 3 increases the melting point of the molten salt, so that the electric resistance of the molten salt is increased, the electrolytic cell voltage is increased, the impurity content is increased, and the decomposition of ammonium chloride is increased. Since the odor of ammonia as a product deteriorates the working environment, there are many problems such as the need for an exhaust gas treatment facility as a countermeasure.
- the molten salt is mainly composed of aluminum chloride, so that the hygroscopic property is remarkable and the hydrolyzability is remarkable.
- the molten salt may be altered by moisture slightly leaking into the phase part.
- aluminum chloride has a high vapor pressure, a part of the aluminum chloride evaporates, the composition changes, and industrially long-term stable operation is difficult.
- the present inventors made this aluminum chloride as a molten salt and produced metal indium from a metal indium-containing alloy. As a result, it has been found that there are many problems such as a part of metal aluminum being electrodeposited in metal indium and reducing the purity of indium.
- the present invention has been made in view of the above problems, and is highly purified from an effective and efficient method for producing metal indium that can solve various problems of conventional methods, that is, a metal indium-containing alloy. It is an object to provide a method for producing high-recovery metal indium over a long period of time, a molten salt electrolytic cell for producing a low-melting-point metal containing metal indium, and a method for purifying a low-melting-point metal using the same. And
- the present inventors have optimized the type and composition of the electrolyte used for molten salt electrorefining and optimized the water content in the molten salt.
- the purity of metallic indium deposited on the cathode can be increased, the electrolyte of the molten salt is stabilized, and the metallic indium can be efficiently electrodeposited and recovered.
- the inventors have found a molten salt electrolysis tank and a molten salt electrolysis apparatus for producing a low melting point metal containing metal indium, and have completed the present invention.
- the present invention uses a metal indium-containing alloy as an anode, metal indium as a cathode, and indium chloride-zinc chloride molten salt containing indium chloride as a main component as an electrolyte, and eluting indium from the anode as a cation by molten salt electrolysis.
- Indium chloride is electrodeposited on the cathode, and the indium chloride content in the indium chloride-zinc chloride molten salt is 68% by weight or more, and the water content is 0.5% by weight.
- a method for producing metal indium is provided as follows.
- indium chloride is preferably indium monochloride.
- molten salt electrolysis is preferably performed in a gas atmosphere having a water vapor concentration of 1% by volume or less. Moreover, it is preferable to carry out molten salt electrolysis in a gas atmosphere having an oxygen concentration of 10% by volume or less.
- the gas in the gas atmosphere is more preferably at least one selected from nitrogen, argon, and helium.
- the operating temperature of the molten salt electrolysis is preferably 140 to 500 ° C.
- an alloy obtained by reducing an indium compound can also be used as the metal indium-containing alloy.
- the indium compound is more preferably an indium oxide-containing material, and the indium oxide-containing material is more preferably ITO scrap.
- the present invention also provides a molten salt electrolytic cell for purifying a low-melting point metal, containing a liquid material of an alloy containing the low-melting point metal, and an anode chamber having an opening into which an anode lead wire can be inserted.
- An inner cylinder for holding a molten salt layer of a low-melting-point metal halide on the liquid material and allowing the liquid material to communicate in the anode chamber without causing the molten salt layer to flow outside, and a refined low-melting-point metal
- a cathode chamber having an introduction port and a discharge port, the introduction port being disposed so as to be located in the molten salt layer, and having a cathode lead wire capable of being inserted therein and filled with a low melting point metal;
- a molten salt electrolyzer is provided.
- the inner cylinder is preferably composed of one or more selected from glass, ceramics and fluororesin.
- the molten salt electrolyzer according to the present invention preferably includes an inert gas inlet and an exhaust gas outlet in the inner cylinder.
- the cathode chamber is preferably made of glass. More preferably, the cathode chamber has a plurality of inlets.
- the anode chamber may be composed of one or more selected from stainless steel, iron, titanium, and graphite. Among these, it is more preferable to be made of stainless steel.
- the anode chamber preferably further has a lead-out port for leading out the alloy containing the low-melting-point metal after purification, and more preferably a nozzle is formed at the lead-out port.
- the present invention further accommodates an alloy containing at least one metal selected from indium, tin and gallium in the anode chamber, and corresponds to the metal on the liquid material of the alloy in the inner cylinder.
- the molten salt of the metal halide to be retained is retained, and a voltage is applied with the anode lead wire and the cathode lead wire inserted to cause molten salt electrolysis, and purified indium, tin and gallium are discharged from the outlet of the cathode chamber.
- the present invention provides a method for purifying a low melting point metal, wherein one or more metals selected from the group consisting of:
- molten salt electrolysis it is preferable to carry out molten salt electrolysis at 50 ° C. to 400 ° C.
- molten salt electrolysis it is preferable to carry out molten salt electrolysis at 1 to 200 A / dm 2 .
- a method for producing highly purified metal indium over a long period of time with a high recovery rate and a molten salt electrolytic cell for producing a low melting point metal containing metal indium, And a method for purifying a low-melting-point metal using the same.
- FIG. 2 is a cross-sectional view taken along the line II-II in FIG. 2 is a schematic cross-sectional view of an H-type electrolytic cell used in Examples 1 and 2 and Comparative Example 1.
- FIG. 2 is a schematic cross-sectional view of an H-type continuous electrolytic cell used in Example 3 and Comparative Examples 2, 3, and 4.
- FIG. 1 is a schematic cross-sectional view taken along the line II-II in FIG. 2 is a schematic cross-sectional view of an H-type electrolytic cell used in Examples 1 and 2 and Comparative Example 1.
- FIG. 2 is a schematic cross-sectional view of an H-type continuous electrolytic cell used in Example 3 and Comparative Examples 2, 3, and 4.
- the method for producing metal indium according to the present invention uses a metal indium-containing alloy as an anode, metal indium as a cathode, and indium chloride-zinc chloride molten salt containing indium chloride as a main component as an electrolyte.
- Metal indium-containing alloy refers to a metal-like substance composed of metal indium and one or more other metal elements and / or non-metal elements, and the bonding state thereof is not particularly limited.
- the content of metal indium is not particularly limited. That is, it can be suitably used regardless of whether metal indium is a main component or a trace amount.
- the metal indium content in the metal indium-containing alloy is preferably 100 ppm by weight to 99.999% by weight, more preferably 1% by weight to 99.99, from the degree of metal indium purification, indium recovery, and indium productivity. % By weight, more preferably 60% by weight to 99.9% by weight.
- the type of metal other than metal indium in the metal indium-containing alloy is not particularly limited.
- metals having good separation and purification from indium in molten salt electrolysis are Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu. , Zn, Ga, Ge, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Sn, Cs, Ba, Ta, W, Re, Os, Ir, Pt, Au, Tl, Pb Bi, especially Sn, Cu, Fe, Si, Ni, Pb, Na, Ca and Mg are preferable because they can be easily separated and purified from indium.
- metal indium-containing alloy used indium solder after using metal indium as solder, metal indium-containing alloy obtained by reducing the indium compound, and the like can also be used.
- the indium compound is not particularly limited as long as it is a compound containing indium, and specific examples include indium oxide-containing materials such as indium oxide, indium hydroxide, indium chloride, indium sulfate, indium nitrate, and ITO scrap. it can.
- a method of reducing the ITO scrap with a reducing agent, dissolving the ITO scrap in an acidic aqueous solution such as hydrochloric acid, nitric acid, sulfuric acid, or a mixed acid thereof After obtaining indium chloride, indium sulfate, indium nitrate or the like, and then adding an alkali to form a compound containing indium hydroxide, and further converting the compound containing indium hydroxide into indium oxide by heat treatment, a reducing agent Or a solution containing indium chloride, indium sulfate or indium nitrate, and then adding a base metal rather than indium, specifically metallic aluminum or metallic zinc.
- Metal-indium-containing alloy Obtaining method, and the like.
- the “metal indium” as the cathode preferably has a metal indium content of 95% by weight or more.
- a salt containing indium is naturally essential.
- indium chloride is used because it has a low melting point, excellent oxidation resistance, and low electrical resistance.
- indium chloride alone is not economical because indium is a rare metal and expensive.
- the content of indium chloride in the molten salt is 68% by weight or more based on the total amount of the molten salt, and the moisture content of the molten salt is based on the total amount of the molten salt. As 0.5% by weight or less is essential.
- the content of indium chloride is less than 68% by weight, that is, when the zinc chloride content is 32% by weight or more, zinc is considerably electrodeposited on the cathode, and the purity of metallic indium is lowered.
- zinc chloride has a low electrical conductivity in the molten salt, and if it is contained at 32% by weight or more, the liquid resistance increases, the electrolytic cell voltage increases, and the running cost increases, which is not economical.
- the electrolytic cell voltage can be lowered, the melting point can be lowered, and the operating temperature can be lowered.
- the content of indium chloride in the molten salt is preferably 70% by weight or more, and more preferably 75% by weight or more.
- Patent Document 2 when the content of indium chloride is higher than 67% by weight, it is described that tin is mixed in the precipitated indium, which is not preferable. Not only the content of indium chloride is set to 68% by weight or more, but also the water content of the molten salt is set to 0.5% by weight or less, so that tin is not mixed in indium, and further the conductivity in the molten salt is increased. The liquid resistance is reduced, the electrolytic cell voltage is lowered, and the running cost is reduced, so that it is economical and the present invention has been completed.
- the water content exceeds 0.5% by weight, solids are deposited in the molten salt, inhibiting the deposition of indium metal on the cathode, leading to a decrease in current efficiency.
- the impurity content in the metal indium deposited on the cathode becomes high, and sufficient purification may not be possible.
- the molten salt in this prior document is a chloride mainly composed of aluminum chloride.
- Indium chloride contained in the molten salt includes InCl, InCl 2 , and InCl 3 whose indium valences are monovalent, divalent, and trivalent, and it is essential to include at least one of them. More preferred is InCl that has a low melting point and enables molten salt electrolysis at a lower temperature.
- the molten salt electrolyte bath containing InCl since indium move univalent preferable from the fact that compared to InCl 3 is trivalent, it triples the production rate of In in the same amount of electricity.
- the moisture content in the present invention is a value based on the moisture content of the molten salt, and the moisture content indicates the moisture content per unit weight of the molten salt containing moisture (edited by the Powder Engineering Society). , "Handbook of Powder Engineering", page 588 (1986)).
- the “water content” in the present invention refers to dehydrating methanol to a water content of 20 ppm by weight or less, dissolving a molten salt therein, sampling a part thereof, Karl Fischer reagent (manufactured by Sigma Aldrich, This is a value calculated by titration with the product name “Hydranal Composite 5”).
- the “water content” in the molten salt in the present invention indicates the water content at any time during the operation from the beginning of molten salt electrolysis to the end of molten salt electrolysis.
- the most preferred embodiment is to dehydrate the water in the molten salt before the start of operation, reduce the water content in the molten salt to 0.5 wt% or less, prevent water absorption of the molten salt even during operation, It is to keep the weight percent or less.
- the water content of a preferable molten salt is 0.4% by weight or less.
- the water vapor concentration in the gas phase part in contact with the molten salt is not particularly limited, but when the water vapor concentration is low, the water content of the molten salt evaporates, but when it is high, the molten salt absorbs moisture and the water content increases. Sometimes. Therefore, as one method for keeping the water content low, there is a method for keeping the water vapor concentration in the gas phase part (gas atmosphere) in the electrolytic cell low. Specifically, the water vapor concentration in the gas phase part is preferably 1% by volume or less, more preferably 0.5% by volume or less.
- the component of the gaseous phase part which is contacting with molten salt is not specifically limited, For example, air, nitrogen, argon, helium, hydrogen, carbon monoxide, a carbon dioxide etc. can be used.
- the oxygen concentration in the gas phase is 10% by volume or less, whereby the dissolved oxygen concentration in the molten salt can be kept low, and oxidation of the molten salt and electrodeposited indium can be prevented.
- the main component of the gas phase part is at least one selected from nitrogen, argon and helium.
- the “main component” means a component contained by 50% by volume or more with respect to the total volume of the gas phase part.
- the shape of the electrolytic cell used for molten salt electrolysis is not particularly limited as long as the anode chamber and the cathode chamber are not in contact with each other and electricity does not flow directly. In other words, the anode chamber and the cathode chamber need only be separated from each other.
- the appropriate electrolytic cell shape differs depending on the operation method such as whether the anode and the cathode are solid or liquid, and whether the operation is a continuous type or a batch type, and may be appropriately selected.
- the cathode chamber and the anode chamber are partitioned by a partition, and the upper part of both electrodes is a molten salt electrolyte bath.
- Examples include an electrolytic cell in which a salt bridge structure or an electrolytic cell shape is cylindrical, and an anode is placed in an insulating container in the center of a molten salt electrolyte bath, and a cathode is disposed so as to surround the anode. be able to.
- the gas atmosphere in the molten salt electrolyzer may sometimes improve the stability of the molten salt by lowering the water vapor concentration and the oxygen concentration.
- the area where the molten salt comes into contact with the gas phase part may be reduced, and moisture absorption of the molten salt may be suppressed.
- the contact area with the gas phase part is 0.1 to 100 m 2 / m 3 per unit molten salt volume, more preferably 0.2 to 80 m 2 / m 3 .
- the current density is preferably 1 ⁇ 200A / dm 2.
- the production rate per unit electrode area may decrease. From the viewpoint of productivity, the higher the current density, the better.
- the current density is more preferably 2 to 100 A / dm 2 and further 3 to 50 A / dm 2 .
- the operating temperature of the molten salt electrolysis is not particularly limited as long as it is equal to or higher than the melting point of the molten salt electrolyte. 90 to 500 ° C. is preferable, and 100 to 450 ° C. is more preferable from the viewpoint of corrosion of the apparatus material and operation of molten salt electrolysis.
- the time required for the molten salt electrolysis is sufficient if it can be electrolyzed for 50 to 100% of indium contained in the alloy in order to avoid a sufficient recovery rate and contamination with impurities.
- the molten salt electrolytic cell described below is only one aspect of the present invention, and the present invention is naturally not limited to the following contents.
- the molten salt electrolysis cell 100 in this embodiment includes an anode chamber 1, an inner cylinder 2, and a cathode chamber 8.
- the anode chamber 1 is an open container for containing an alloy liquid material 9 containing a low melting point metal.
- the inner cylinder 2 is disposed in the container so that an end surface having an opening faces the bottom surface inside the anode chamber 1.
- the cathode chamber 8 has an inlet 3 for introducing a low-melting point metal and an outlet 7 for leading out the low-melting point metal.
- the inlet 3 is arranged inside the inner cylinder 2 and leads out the low-melting point metal.
- the outlet 7 is disposed outside the inner cylinder 2.
- the inside of the cathode chamber 8 is filled with a low melting point metal 11.
- the molten salt electrolyzer may be disposed on the heater 12 and may be electrolyzed while being heated by the heater 12 from the lower part of the anode chamber 1.
- the anode chamber 1 is a container for holding a liquid material (anolyte 9) of an alloy containing a low-melting-point metal, and the anolyte 9 is charged into the space formed by the anode chamber 1 and the inner cylinder 2 from the opening side. It is possible to insert the lead wire 14 for the anode. Further, if the electrolysis operation is continued for a long time, the components that have not been electrolyzed constituting the alloy are concentrated in the anode chamber 1, so that the composition of the anolyte 9 can be kept constant after purification from the opening.
- the anolyte 9 used that is, the used anolyte 9 can also be derived.
- the anode chamber 1 may be provided with a separate outlet.
- the lead-out port may be disposed in a gap between the anode chamber 1 and the inner cylinder 2.
- An extraction nozzle 4 may be formed at the outlet, and it is more preferable to extract the refined alloy intermittently or continuously.
- the extraction nozzle 4 is opened when the content of the low melting point metal contained in the anolyte 9 is 30% by weight or less, and preferably 50% by weight or less, the purity of the low melting point metal is obtained. Can do.
- the supply of the anolyte 9 may be continuous or intermittent, and the supply location of the alloy may be from the gap between the anode chamber 1 and the inner cylinder 2 or a separate supply unit may be provided.
- the material of the anode chamber 1 is not particularly limited as long as it does not react with the held alloy.
- Preferable is graphite or a metal material that is hardly damaged, and specific examples of the metal material include stainless steel, nickel-base alloy, iron, iron-base alloy, titanium, and titanium-base alloy.
- the material comprised from 1 or more types chosen from stainless steel, iron, titanium, and graphite is preferable, and stainless steel is more preferable from the surface of corrosion resistance and economical efficiency.
- the shape of the anode chamber 1 is not particularly limited, such as a cylindrical shape, a square shape, or a polygonal shape. Preferably, it is a cylindrical type or a square type that is easy to manufacture and has high mechanical strength.
- the inner cylinder 2 is open at the bottom, and has, for example, an inert gas inlet 5 and an exhaust gas outlet 6 that can be opened and closed at the top. Since the upper part of the inner cylinder 2 is closed, the contact between the surface of the molten salt 10 and the outside air can be cut off, so that the mixing of moisture in the atmosphere, which is a cause of deterioration of the molten salt 10, can be prevented, and stable operation for a long time Is possible.
- the inert gas introduced into the gas phase portion in contact with the molten salt 10 include nitrogen gas and argon gas.
- the inner cylinder 2 accommodates a liquid material 9 of an alloy containing a low-melting-point metal inside, and a molten salt layer 10 of a low-melting-point metal halide is held on the liquid material.
- the anolyte 9 is stored at the bottom of the inner cylinder 2, and the molten salt is supplied from the inert gas inlet 5 and the exhaust gas outlet 6. Examples include a method of pouring, or putting a powdered metal salt in the inner cylinder, turning the inner cylinder 2 over the anolyte 9 and heating to melt the metal salt.
- a part of the lower side surface of the inner cylinder 2 is slit-shaped. It is cut out. Thereby, the anolyte 9 can go back and forth between the inside and the outside of the inner cylinder 2, and the composition of the anolyte 9 can be made uniform.
- the material of the inner cylinder 2 is not particularly limited as long as it does not react with an alloy containing a molten salt and a low melting point metal held inside. From the viewpoint of price and ease of production, it is preferably composed of one or more selected from glass, ceramics and fluororesin, more preferably quartz glass and ceramics.
- the cathode chamber 8 is filled with a low melting point metal 11, and a cathode lead wire 15 can be inserted into a portion disposed outside the inner cylinder 2.
- the purity of the low melting point metal 11 preliminarily filled in the cathode chamber 8 before electrodeposition is preferably such that the content of the low melting point metal is 90% by weight or more.
- the inlet 3 in the cathode chamber 8 is composed of one or a plurality of containers depending on the size of the equipment.
- the purified low-melting-point metal liquid (catholyte 11) that is electrolytically deposited on the surface of the inlet 3 is gathered by the connected pipes, and from the outlet 7. Discharged and collected continuously or intermittently.
- the arrangement of the introduction port 3 is not particularly limited, but as shown in FIG. 2, the oxidative dissolution of the low melting point metal from the anode alloy becomes more uniform as the introduction port 3 is uniformly dispersed in the molten salt layer 10, that is, This is preferable because the current density distribution can be reduced.
- the cross-sectional area (the area of the molten salt 10 in FIG. 2) is reduced, so that the electrical resistance of the molten salt 10 is increased.
- the cross-sectional area of the inlet 3 is 30 to 70%, more preferably 40 to 60% of the inner cylinder cross-sectional area.
- the cathode chamber 8 be formed of an insulator.
- insulators glass, ceramics, and fluororesins that are highly corrosion resistant to molten salts and low-melting metals are preferable, and glass that is easy to manufacture, has high heat resistance, is inexpensive, and is also quartz. Glass is preferred.
- the shape of the cathode chamber 8 is not particularly limited as long as the low melting point metal can be electrolytically deposited. A cube, a rectangular parallelepiped, and a cylinder are preferable.
- the anode chamber 1 contains an alloy containing one or more metals selected from indium, tin and gallium, and the alloy in the inner cylinder 2 A molten metal halide corresponding to the metal is held on the liquid. Then, by applying a voltage with the anode lead wire 14 and the cathode lead wire 15 inserted, molten salt electrolysis is performed, and one kind selected from purified indium, tin and gallium from the outlet 7 of the cathode chamber 8. The above metals are derived.
- the alloy containing one or more metals selected from indium, tin and gallium can be purified by the above purification method.
- an alloy containing indium is suitably purified by the purification method according to this embodiment because it has a relatively low melting point and high production efficiency in molten salt electrolytic purification.
- the alloy refers to a metal-like substance composed of a metal element and / or a non-metal element, and the bonding state thereof is not particularly limited.
- the content of the low melting point metal is not particularly limited. That is, even if the low melting point metal is a main component or a trace amount is contained, it can be suitably used.
- the content of the low melting point metal in the alloy is preferably 100 wtppm to 99.999 wt%, more preferably 1 wt% to 99.99 wt%, and even more preferably 60 wt%. 99.9 wt%.
- the type of metal other than the low melting point metal in the alloy is not particularly limited.
- metals having good separation and purification from low melting point metals in molten salt electrolysis are Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni. , Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Cs, Ba, Ta, W, Re, Os, Ir, Pt, Au, Tl, Pb, Bi
- Cu, Fe, and Ni are preferable because separation and purification are easy.
- the molten salt 10 held in the inner cylinder 2 contains a metal halide corresponding to the metal to be refined, and has a specific gravity smaller than that of an alloy containing a low melting point metal held in the anode chamber 1.
- a molten salt electrolyte that can be electrolyzed.
- a mixed molten salt of a metal halide and a zinc halide corresponding to the metal to be purified and a mixed molten salt of a metal halide and an aluminum halide corresponding to the metal to be purified can be mentioned.
- the object to be refined is an alloy containing indium
- the metal halide corresponding to the metal to be purified is preferably more than 50% by weight based on the total amount of the mixed molten salt, and more than 65% by weight. It is preferable that the content be 75% by weight or more.
- the water content in the molten salt is preferably 0.7% by weight or less, more preferably 0.5% by weight or less, and further preferably 0.4% by weight or less.
- the current density is preferably 1 to 200 A / dm 2 .
- the current density is more preferably 2 to 150 A / dm 2 , further 3 to 100 A / dm 2 .
- the temperature at which the molten salt electrolysis is performed is not particularly limited as long as the electrolyte bath, the alloy containing the low melting point metal, and the low melting point metal are all in a molten state.
- the temperature of the molten salt 11 is preferably 50 ° C. to 400 ° C., more preferably 90 ° C. to 350 ° C. from the viewpoint of corrosion of the apparatus material and operation of molten salt electrolysis.
- the molten salt electrolytic cell according to the present embodiment has a structure in which moisture hardly enters, the amount of moisture in the molten salt can be maintained at a low level over a long period of time. Further, according to the purification method according to the present embodiment, the molten salt is supplied to the upper surface of the liquid material (anolyte) of the alloy containing the low melting point metal, and the used anolyte can be appropriately extracted, The concentration of the low melting point metal halide in the molten salt can be kept constant. As a result, the low melting point metal to be purified can be produced from the low melting point metal with a high recovery rate over a long period of time.
- the measuring method of the water content in the molten salt in the present invention is to dehydrate methanol (manufactured by Kanto Chemical Co., Ltd., reagent special grade) to have a water content of 20 ppm by weight or less, in which the molten salt is dissolved, A part of the sample was sampled and titrated with a Karl Fischer reagent (Sigma Aldrich, trade name “Hydranal Composite 5”).
- Example 1 As raw material for the metal indium-containing alloy, 1814 g of ITO scrap (91.1 wt% indium oxide, 8.9 wt% tin oxide) generated during the production of the ITO target was ground to an average particle size of 51 ⁇ m with a crusher, and reduced to 1735 g of ground powder. 170.9 g of graphite (product name “KS-75”, manufactured by Lonza) was mixed, and the mixture was placed in a magnetic crucible having an internal volume of 1 L and charged into an electric furnace. After replacing the inside of the electric furnace with nitrogen gas, the temperature of the furnace wall was raised to 1100 ° C. in 6 hours and held at 1100 ° C. for 3 hours. After completion of the reaction, the inside of the electric furnace was cooled and the total weight of the reduction product and the unreacted raw material powder was measured to be 1456.3 g.
- ITO scrap 91.1 wt% indium oxide, 8.9 wt% tin oxide
- the electrolytic cell is an H-type electrolytic cell made of Pyrex (registered trademark) glass having an inner diameter of 2 cm and a height of 13 cm, and an anode of 63.2 g of an indium-tin alloy as a reduction product.
- the cathode was charged with 29.9 g of indium metal having a purity of 99.999% by weight.
- the water content at this time was 0.4% by weight.
- the electrolytic cell voltage changed at 4.5V.
- a portion of the metal indium on the cathode is taken out, dissolved in hydrochloric acid (manufactured by Kanto Chemical Co., Ltd., reagent grade), the impurity content is obtained with an ICP (inductively coupled plasma) analyzer, and the amount and purity of the charged metal indium
- ICP inductively coupled plasma
- Indium oxide was produced using the recovered metal indium as a raw material, an ITO target was produced from the indium oxide and tin oxide, and the sputtering performance as the ITO target was evaluated. As a result, the generation of nodules was hardly observed, and it was reusable as a raw material for producing the ITO target.
- Example 2 The indium-tin alloy recovered by the reduction in Example 1 was used, and molten salt electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type electrolytic cell as in Example 1.
- the anode chamber was charged with 61.7 g of the alloy, and the cathode chamber was charged with 30.4 g of 99.999 wt% metallic indium prepared separately.
- Platinum lead wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 240 ° C., and molten salt electrolysis was performed.
- Molten salt electrolysis was carried out for 14 hours using the constant current device used in Example 1 with a current value of 0.94 A and a current density of 30 A / dm 2 .
- Comparative Example 1 The indium-tin alloy recovered by the reduction in Example 1 was used, and molten salt electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type electrolytic cell as in Example 1.
- the anode chamber was charged with 63.3 g of the alloy, and the cathode chamber was charged with 30.1 g of indium metal having a purity of 99.999 wt% prepared separately.
- the water content was adjusted to 0.9% by weight by adding water to the molten salt.
- the electrolytic cell voltage was unstable and increased to the initial 5.2V and 6.1V just before the end of the operation.
- Example 3 In order to purify and recover metallic indium from used indium solder, molten salt electrolytic purification was performed.
- the used indium solder contained 99.22 wt% of the main component indium, 4580 wt ppm of tin, which is an impurity, and 3220 wt ppm of copper.
- tin which is an impurity
- 3220 wt ppm of copper 3220 wt ppm of copper.
- an H-type continuous electrolytic cell made of Pyrex (registered trademark) glass shown in FIG. 4 was used for the molten salt electrolytic purification.
- the anode chamber was charged with 143.9 g of the alloy, and the cathode chamber was charged with 49.1 g of 99.999 wt% metallic indium prepared separately.
- the water content at this time was 0.4% by weight.
- Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and nitrogen gas is continuously introduced into the electrolytic cell at 1.2 L / hr. Molten salt electrolysis was carried out while circulating the product. At this time, the water vapor concentration in the nitrogen gas was 0.1 vol%.
- Example 2 In the molten salt electrolysis, the constant current apparatus used in Example 1 was used, and the current value was set to 0.45 A and the current density was set to 20 A / dm 2, and the current was continuously supplied for 30 days. Since indium in the anode chamber is electrolyzed and the holding amount decreases, 46.3 g of used indium solder is supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
- metal indium can be recovered from the cathode chamber with a current efficiency of 99% or more, and over 30 days, the content of impurities tin, copper, zinc is small, It was a good result. Further, the water content in the molten salt was measured after the operation was completed, and as a result, it was as low as 0.2% by weight and good.
- the electrolytic cell voltage was as high as 3.5 V immediately before supplying the indium solder to the anode chamber because the maximum distance between the electrodes was 3.5 V, and immediately after the insertion, the distance between the electrodes was minimum and became 2.5 V. This electrolytic cell voltage remained substantially constant over 30 days.
- the molten salt electrolytic purification used an H-type continuous electrolytic cell made of Pyrex (registered trademark) glass as shown in FIG.
- the anode chamber was charged with 140.3 g of the alloy, and the cathode chamber was charged with 50.4 g of metallic indium of 99.999 wt% prepared separately.
- the water content at this time was 0.4% by weight.
- Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and nitrogen gas is continuously introduced into the gas phase of the electrolytic cell at 1.2 L / hr. Molten salt electrolysis was carried out while circulating. At this time, the water vapor concentration in the nitrogen gas was 0.1 vol%.
- Molten salt electrolysis was carried out continuously for 30 days using the constant current apparatus used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, 45.2 g of used indium solder was supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
- Table 2 shows the weight of metal indium recovered from the cathode chamber, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc.
- Comparative Example 3 Using the used indium solder used in Comparative Example 2, electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type continuous electrolytic cell as in Example 3.
- the anode chamber was charged with 145.7 g of the alloy, and the cathode chamber was charged with 50.4 g of metallic indium with a purity of 99.999 wt% prepared separately.
- the water content was 0.7% by weight by adding water to the molten salt.
- Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and the gas phase of the electrolytic cell is 1% of water having a water vapor concentration of 1.5 vol%. Molten salt electrolysis was performed while continuously flowing at 2 L / hr.
- Molten salt electrolysis was carried out continuously by using the constant current device used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, used indium solder is supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
- Table 3 shows the operation results during this period, that is, the weight of recovered metal indium, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc.
- Pyrex registered trademark
- Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is 290 ° C., and nitrogen gas having a water vapor concentration of 0.1 vol% is added to the gas phase of the electrolytic cell.
- Molten salt electrolysis was performed while continuously flowing at 1.2 L / hr.
- Molten salt electrolysis was carried out continuously by using the constant current device used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, used indium solder is supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
- the indium recovered from the cathode chamber had a very high zinc content and was not sufficiently purified, so the operation was stopped in 3 days.
- Stainless steel wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 250 ° C.
- Molten salt electrolysis was conducted by setting the current value to 0.45 A and the current density to 20 A / dm 2 .
- Molten salt electrolysis was performed while continuously flowing nitrogen gas having a water vapor concentration of 0.3 vol% at 1.2 L / hr in the gas phase of the electrolytic cell.
- Table 5 shows the impurity content in the indium flowing out of the cathode chamber immediately before the shutdown.
- the indium recovered from the cathode chamber had a very high aluminum content and was not sufficiently purified.
- Example 4 Using the molten salt electrolytic cell shown in FIG. 1, an alloy containing metal indium was supplied to the anode chamber with the following apparatus configuration and molten salt composition, and purified metal indium was electrolytically deposited in the cathode chamber. 1.
- Anode chamber size length 280 mm ⁇ width 350 mm ⁇ depth 140 mm, thickness 5 mm
- Material Stainless steel (SUS304) Shape: Square tank (with anolyte extraction nozzle) 2) Inner cylinder size: length 250mm x width 250mm x height 250mm, thickness 3mm
- Material Quartz glass Shape: Square bath (Bottom: Opening, Lower side: 30mm x 30mm slits, 2 on each side, Upper: With 2 nozzles) 3) Size of cathode chamber: length 30 mm ⁇ width 200 mm ⁇ depth 30 mm, thickness 3 mm, 5 materials: quartz glass shape: 5 square vessels
- Electrolysis temperature 300 ° C
- the composition of the metal indium-containing alloy (anolyte 9) supplied to the anode chamber 1 was metal indium 90.3 wt% and metal tin 9.7 wt%, and 80.1 kg was charged at the start of the electrolysis operation.
- 100 A is energized with a DC power generator 13 (Kikusui Electronics Co., Ltd., trade name “PAS10-105”), the anode current density is 16 A / dm 2 , and the cathode current density is 33 A / dm 2 continuously.
- Driving was carried out.
- the metal indium electrolytically deposited in the cathode chamber 8 averaged 10.2 kg per day and could be continuously recovered from the outlet 7.
- the anode chamber 1 was supplied with 10.2 kg of the alloy having the above composition per day. On the 14th day from the start of operation, since the tin content of the indium-containing alloy held in the anode chamber 1 has become slightly higher, 40.2 kg of the anolyte 9 is extracted from the extraction nozzle 4 while the electrolytic operation is continued. 40.2 kg of the alloy having the above composition was supplied in a molten state, and electrolysis was continued. At the time of this anolyte exchange, the molten salt 10 can be operated without coming into contact with the atmosphere, and no deterioration such as discoloration or solidification of the molten salt 10 was observed.
- the tin content in the metal indium electrodeposited on the cathode by the 14-day molten salt electrolytic purification was 580 wtppm, and the tin content in the anolyte extracted from the extraction nozzle 4 was 25.6 wt%.
- the water content in the molten salt was 0.3 wt%.
- Example 5 In the apparatus configuration shown in Example 4, an alloy containing metal tin (anolyte 9) was supplied to the anode chamber 1, and purified metal tin was electrolytically deposited in the cathode chamber 8.
- the composition of the molten salt 10 was a mixed molten salt of 76 wt% tin chloride and 24 wt% zinc chloride, and the electrolysis temperature was 350 ° C.
- the composition of the metal tin-containing alloy supplied to the anode chamber 1 was 95.3 wt% metal tin and 4.7 wt% metal lead, and 80.3 kg was charged at the start of the electrolysis operation.
- the DC power generator 13 (manufactured by Kikusui Electronics Co., Ltd., trade name “PAS10-105”) was energized at 100 A for continuous operation.
- Metal tin electrolytically deposited in the cathode chamber 8 averaged 5.3 kg per day and could be continuously recovered from the outlet 7.
- the anode chamber 1 was supplied with 5.3 kg of the alloy having the above composition per day.
- the lead content in the metal tin electrolytically deposited on the cathode was 12 wtppm, and the lead content in the anolyte extracted from the extraction nozzle 4 was 8.7 wt%.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
本発明は、金属インジウム含有合金から金属インジウムを製造する方法、溶融塩電解槽、及び低融点金属の精製法に関するものである。 The present invention relates to a method for producing metal indium from a metal indium-containing alloy, a molten salt electrolytic cell, and a method for purifying a low melting point metal.
インジウムは、特定の鉱石中に高濃度で含まれることはなく、亜鉛鉱などに微量成分として含まれる希少金属である。近年、インジウムを主成分とするインジウム-スズ酸化物(ITO)は液晶表示装置の透明導電膜などに使用され、その需要が急激に伸びている。そのため、ITO製造工程内から発生したインジウムを含む端材や、ITOをターゲットとして使用した後のスクラップ(これらを総称して「ITOスクラップ」という)から金属インジウムを精製、回収することで、高価な金属インジウムをリサイクル利用する方法が種々検討されている。 Indium is a rare metal that is not contained in a specific ore at a high concentration and is contained as a trace component in zinc ore. In recent years, indium-tin oxide (ITO) containing indium as a main component has been used for a transparent conductive film of a liquid crystal display device, and its demand has been rapidly increased. Therefore, it is expensive by refining and recovering metal indium from scraps containing indium generated from within the ITO manufacturing process and scrap after using ITO as a target (collectively referred to as “ITO scrap”). Various methods for recycling metal indium have been studied.
これらの方法の一つとして、溶融塩電解法による金属インジウムの製造方法が知られている。たとえば、金属インジウム-スズを含む水銀(インジウム-スズアマルガム)を陽極とし、溶融塩電解質を媒体とした溶融塩電解にて、陰極に金属インジウムを回収する方法が知られている(例えば、特許文献1参照)。この方法では、金属インジウムとスズの標準析出電位が近い為、通常の溶融塩電解では、金属インジウムにスズが混入するので、アマルガムを使用することにより、インジウムを選択的に酸化溶解させる方法がとられている。 As one of these methods, a method for producing metal indium by a molten salt electrolysis method is known. For example, a method is known in which metallic indium is collected at the cathode by molten salt electrolysis using mercury (indium-tin amalgam) containing metallic indium-tin as an anode and a molten salt electrolyte as a medium (for example, Patent Documents). 1). In this method, since the standard precipitation potentials of metal indium and tin are close, in ordinary molten salt electrolysis, tin is mixed in metal indium. Therefore, by using amalgam, indium is selectively oxidized and dissolved. It has been.
また、インジウムを含む合金から金属インジウムを回収する方法として、インジウム含有合金を陽極とし、一塩化インジウムを含む溶融塩電解質を用いて電解精製し、陰極に金属インジウムを析出させる方法も知られている(例えば、特許文献2参照)。 In addition, as a method for recovering metallic indium from an alloy containing indium, a method is also known in which an indium-containing alloy is used as an anode, electrolytic purification is performed using a molten salt electrolyte containing indium monochloride, and metallic indium is deposited on the cathode. (For example, refer to Patent Document 2).
更に、金属インジウム含有合金を陽極とし、塩化インジウムと塩化亜鉛を含む混合溶融塩を用いて電解精製する方法において、該混合溶融塩の耐酸化性を向上させる目的で塩化アンモニウムを添加する方法も知られている(例えば、特許文献3参照)。 Further, in a method of electrolytic purification using a mixed molten salt containing indium chloride and zinc chloride using an alloy containing indium metal as an anode, a method of adding ammonium chloride for the purpose of improving the oxidation resistance of the mixed molten salt is also known. (For example, see Patent Document 3).
一方、塩化アルミニウムを主体として、少なくとも1種の塩化物を含む塩化アルミニウム系溶融塩電解質浴は、アルミニウム又はアルミニウム合金の電気メッキ等に使用されている。この電解質浴中に含まれる水分等の不純物量が多くなると、平滑なメッキ被膜の形成が困難となるため、この不純物を除去すべく、電解質浴の組成を塩化アルミニウム含有量が50モル%以下になるように調整し、沈澱した不純物を浴から分離することによって電解質浴を精製する方法が知られている(例えば、特許文献4参照)。 On the other hand, an aluminum chloride-based molten salt electrolyte bath mainly composed of aluminum chloride and containing at least one kind of chloride is used for electroplating aluminum or aluminum alloy. When the amount of impurities such as moisture contained in the electrolyte bath increases, it becomes difficult to form a smooth plating film. Therefore, in order to remove this impurity, the composition of the electrolyte bath is adjusted so that the aluminum chloride content is 50 mol% or less. There is known a method of purifying an electrolyte bath by adjusting so that the precipitated impurities are separated from the bath (see, for example, Patent Document 4).
また、溶融塩電解法に用いる電解槽として、底部に陰極を配し、該陰極上に溶融塩浴の層を保持し、その上に多孔質体からなる容器中に陽極を保持した電解槽が開示されている(例えば、特許文献5参照)。 Moreover, as an electrolytic cell used for the molten salt electrolysis method, there is an electrolytic cell in which a cathode is arranged at the bottom, a layer of a molten salt bath is held on the cathode, and an anode is held in a container made of a porous body on the cathode. It is disclosed (for example, see Patent Document 5).
引用文献1に記載された方法によって、スズをはじめとする不純物を殆ど含まない精製された金属インジウムを回収することは可能であるが、陽極に水銀を用い、温度160℃以上にて溶融塩電解するため、水銀が一部蒸気となって揮発するなど、実施にあたっては健康面や環境面に配慮が要求される方法である。また、陰極に析出した金属インジウム中には微量ながら水銀が含まれ、その水銀除去のため更なる高度な精製技術を組み合わせる必要があった。
Although it is possible to recover purified metal indium containing almost no impurities such as tin by the method described in the cited
また、引用文献2に記載された、塩化インジウムを含む溶融塩は、通常のガス組成、即ち水蒸気濃度が高い空気と接触すると、溶融塩の水分含有量が高くなり、溶融塩が化学反応により変性し、槽電圧の上昇や陰極に析出した金属インジウムの品位を低下させる。又、吸湿により劣化した溶融塩は一部又は全量を交換する必要がある。
Moreover, when the molten salt containing indium chloride described in the cited
又、この特許文献2では、塩化インジウムの含有量が50~67重量%が好ましく、その理由は、50重量%より低い場合は、析出するインジウム中に亜鉛が混入して好ましくなく、67重量%より高い場合は、析出するインジウム中にスズが混入して好ましくないからである。
In
また、引用文献3に記載された、塩化アンモニウムの添加は、溶融塩の融点を高め、そのため溶融塩の電気抵抗が高まって電解槽電圧がアップし、不純物含量も高まり、又、塩化アンモニウムの分解生成物であるアンモニアの臭気が作業環境を悪化させるため、その対策として排ガス処理設備が必要となるなど多くの課題があった。
In addition, the addition of ammonium chloride described in the cited
また、引用文献4に記載された方法によって、電気メッキ等の電気化学的操作は可能であるが、この溶融塩は塩化アルミニウムを主体とするため吸湿性が顕著で、加水分解性が著しく、気相部に僅かに漏れ込んだ水分によって溶融塩が変質することがあった。又、塩化アルミニウムは蒸気圧が高いため、塩化アルミニウムの一部が蒸発し、組成が変化し、工業的に長期安定運転が困難であった。又、本発明者らはこの塩化アルミニウムを溶融塩とし、金属インジウム含有合金から金属インジウムの製造を行った。その結果、金属インジウム中に金属アルミニウムが一部電析し、インジウムの純度を低下させるなど、多くの課題があることが判った。
Although the electrochemical operation such as electroplating can be performed by the method described in the cited
そして、確かに、引用文献5に記載された電解槽により合金から金属インジウムなどの有用成分を電解析出できる。しかしながら、通常の電解槽には用いない特殊な多孔質体が必要なため設備コストが高く、運転操作においても多孔質体の破損トラブルがないよう細心の留意が必要であった。
And indeed, useful components such as metal indium can be electrolytically deposited from the alloy by the electrolytic cell described in the cited
本発明は、上記問題点に鑑みてなされたものであり、従来法の種々の問題点を解決できる効果的、効率的な金属インジウムの製造方法、すなわち、金属インジウム含有合金から、高度に精製された金属インジウムを長期間に亘って、高回収率で製造する方法、金属インジウムを含む低融点金属を製造する溶融塩電解槽、及びそれを用いた低融点金属の精製法を提供することを目的とする。 The present invention has been made in view of the above problems, and is highly purified from an effective and efficient method for producing metal indium that can solve various problems of conventional methods, that is, a metal indium-containing alloy. It is an object to provide a method for producing high-recovery metal indium over a long period of time, a molten salt electrolytic cell for producing a low-melting-point metal containing metal indium, and a method for purifying a low-melting-point metal using the same. And
本発明者らは、金属インジウム含有合金から金属インジウムを製造する技術について鋭意検討した結果、溶融塩電解精製に用いる電解質の種類とその組成を適正化し、且つ溶融塩中の水分含有量を適正化することで、陰極に析出する金属インジウムの純度を高くでき、溶融塩の電解質を安定化させ、効率良く金属インジウムを電析回収できることを見出した。また、金属インジウムを含む低融点金属を製造する溶融塩電解槽、及び、溶融塩電解装置を見出し、本発明を完成するに至った。 As a result of intensive studies on the technology for producing metal indium from an alloy containing metal indium, the present inventors have optimized the type and composition of the electrolyte used for molten salt electrorefining and optimized the water content in the molten salt. Thus, it has been found that the purity of metallic indium deposited on the cathode can be increased, the electrolyte of the molten salt is stabilized, and the metallic indium can be efficiently electrodeposited and recovered. In addition, the inventors have found a molten salt electrolysis tank and a molten salt electrolysis apparatus for producing a low melting point metal containing metal indium, and have completed the present invention.
すなわち本発明は、陽極として金属インジウム含有合金、陰極として金属インジウム、電解質として塩化インジウムを主成分とする塩化インジウム-塩化亜鉛溶融塩を使用し、溶融塩電解により、陽極からインジウムを陽イオンとして溶出させ、陰極上に金属インジウムを電析する金属インジウムの製造方法であって、塩化インジウム-塩化亜鉛溶融塩中、塩化インジウム含有量が68重量%以上であり、水分含有量が0.5重量%以下である金属インジウムの製造方法を提供する。 That is, the present invention uses a metal indium-containing alloy as an anode, metal indium as a cathode, and indium chloride-zinc chloride molten salt containing indium chloride as a main component as an electrolyte, and eluting indium from the anode as a cation by molten salt electrolysis. Indium chloride is electrodeposited on the cathode, and the indium chloride content in the indium chloride-zinc chloride molten salt is 68% by weight or more, and the water content is 0.5% by weight. A method for producing metal indium is provided as follows.
ここで本発明は、塩化インジウムが一塩化インジウムであるであることが好ましい。 In the present invention, indium chloride is preferably indium monochloride.
また本発明においては、水蒸気濃度が1容量%以下のガス雰囲気中にて溶融塩電解することが好ましい。また、酸素濃度が10容量%以下のガス雰囲気中にて溶融塩電解することが好ましい。ここで、ガス雰囲気中のガスが、窒素、アルゴン、ヘリウムから選ばれた1種以上であることがより好ましい。 In the present invention, molten salt electrolysis is preferably performed in a gas atmosphere having a water vapor concentration of 1% by volume or less. Moreover, it is preferable to carry out molten salt electrolysis in a gas atmosphere having an oxygen concentration of 10% by volume or less. Here, the gas in the gas atmosphere is more preferably at least one selected from nitrogen, argon, and helium.
また本発明においては、溶融塩電解の操作温度が140~500℃であることが好ましい。 In the present invention, the operating temperature of the molten salt electrolysis is preferably 140 to 500 ° C.
また本発明においては、金属インジウム含有合金として、インジウム化合物を還元処理して得られる合金を用いることもできる。インジウム化合物は酸化インジウム含有物質であることがより好ましく、酸化インジウム含有物質がITOスクラップであることがさらに好ましい。 In the present invention, an alloy obtained by reducing an indium compound can also be used as the metal indium-containing alloy. The indium compound is more preferably an indium oxide-containing material, and the indium oxide-containing material is more preferably ITO scrap.
また、本発明は、低融点金属を精製する溶融塩電解槽であって、低融点金属を含む合金の液状物を収容し、陽極用導線を挿入可能な開口を有する陽極室と、収容された液状物上に低融点金属のハロゲン化物の溶融塩層を保持し、当該溶融塩層を外部に流出させずに陽極室内で液状物を連通させるための内筒と、精製後の低融点金属の導入口及び導出口を有し、当該導入口が溶融塩層内に位置するように配置されており、陰極用導線を挿入可能で内部が低融点金属で充填された陰極室と、を備える、溶融塩電解槽を提供する。 The present invention also provides a molten salt electrolytic cell for purifying a low-melting point metal, containing a liquid material of an alloy containing the low-melting point metal, and an anode chamber having an opening into which an anode lead wire can be inserted. An inner cylinder for holding a molten salt layer of a low-melting-point metal halide on the liquid material and allowing the liquid material to communicate in the anode chamber without causing the molten salt layer to flow outside, and a refined low-melting-point metal A cathode chamber having an introduction port and a discharge port, the introduction port being disposed so as to be located in the molten salt layer, and having a cathode lead wire capable of being inserted therein and filled with a low melting point metal; A molten salt electrolyzer is provided.
ここで、本発明に係る溶融塩電解槽は、内筒が、ガラス、セラミックス及びフッ素樹脂から選ばれる1種以上から構成されることが好ましい。 Here, in the molten salt electrolyzer according to the present invention, the inner cylinder is preferably composed of one or more selected from glass, ceramics and fluororesin.
また、本発明に係る溶融塩電解槽は、内筒に不活性ガス導入口及び排ガス排出口を備えることが好ましい。 The molten salt electrolyzer according to the present invention preferably includes an inert gas inlet and an exhaust gas outlet in the inner cylinder.
また、本発明においては、陰極室がガラスから構成されることが好ましい。また、陰極室が導入口を複数有することがより好ましい。 In the present invention, the cathode chamber is preferably made of glass. More preferably, the cathode chamber has a plurality of inlets.
また、本発明においては、陽極室がステンレス、鉄、チタン及び黒鉛から選ばれる1種以上から構成されていてもよい。なかでも、ステンレスから構成されるのがより好ましい。 In the present invention, the anode chamber may be composed of one or more selected from stainless steel, iron, titanium, and graphite. Among these, it is more preferable to be made of stainless steel.
また、本発明においては、陽極室が、精製後の低融点金属を含む合金を導出するための導出口をさらに有することが好ましく、導出口にノズルが形成されていることがより好ましい。 In the present invention, the anode chamber preferably further has a lead-out port for leading out the alloy containing the low-melting-point metal after purification, and more preferably a nozzle is formed at the lead-out port.
本発明はさらに、上記溶融塩電解槽において、陽極室にインジウム、スズ及びガリウムから選ばれる1種以上の金属を含む合金を収容し、内筒内の当該合金の液状物上に、金属に対応する金属ハロゲン化物の溶融塩を保持させ、陽極用導線及び陰極用導線を挿入した状態で電圧を印加することにより、溶融塩電解させ、陰極室の導出口から、精製されたインジウム、スズ及びガリウムから選ばれる1種以上の金属を導出させる、低融点金属の精製法を提供する。 In the molten salt electrolytic cell, the present invention further accommodates an alloy containing at least one metal selected from indium, tin and gallium in the anode chamber, and corresponds to the metal on the liquid material of the alloy in the inner cylinder. The molten salt of the metal halide to be retained is retained, and a voltage is applied with the anode lead wire and the cathode lead wire inserted to cause molten salt electrolysis, and purified indium, tin and gallium are discharged from the outlet of the cathode chamber. The present invention provides a method for purifying a low melting point metal, wherein one or more metals selected from the group consisting of:
ここで、50℃~400℃で溶融塩電解させることが好ましい。 Here, it is preferable to carry out molten salt electrolysis at 50 ° C. to 400 ° C.
また、1~200A/dm2で溶融塩電解させることが好ましい。 Further, it is preferable to carry out molten salt electrolysis at 1 to 200 A / dm 2 .
本発明によれば、金属インジウム含有合金から、高度に精製された金属インジウムを長期間に亘って高回収率で製造する方法、並びに、金属インジウムを含む低融点金属を製造する溶融塩電解槽、及びそれを用いた低融点金属の精製法を提供することができる。 According to the present invention, from a metal indium-containing alloy, a method for producing highly purified metal indium over a long period of time with a high recovery rate, and a molten salt electrolytic cell for producing a low melting point metal containing metal indium, And a method for purifying a low-melting-point metal using the same.
以下、場合により図面を参照しながら本発明の好適な実施形態について詳細に説明する。なお、図面の寸法比率は図示の比率に限られるものではない。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings as the case may be. In addition, the dimensional ratio of drawing is not restricted to the ratio of illustration.
本発明に係る金属インジウムの製造方法は、陽極として金属インジウム含有合金、陰極として金属インジウム、電解質として塩化インジウムを主成分とする塩化インジウム-塩化亜鉛溶融塩を使用し、溶融塩電解により、陽極からインジウムを陽イオンとして溶出させ、陰極上に金属インジウムを電析する金属インジウムの製造方法であって、塩化インジウム-塩化亜鉛溶融塩中、塩化インジウム含有量が68重量%以上であり、水分含有量が0.5重量%以下であることを特徴とするものである。 The method for producing metal indium according to the present invention uses a metal indium-containing alloy as an anode, metal indium as a cathode, and indium chloride-zinc chloride molten salt containing indium chloride as a main component as an electrolyte. A method for producing metal indium by eluting indium as a cation and electrodepositing metal indium on a cathode, wherein the indium chloride content in the indium chloride-zinc chloride molten salt is 68% by weight or more, and the water content Is 0.5% by weight or less.
陽極としての「金属インジウム含有合金」は、金属インジウムと他の一種類以上の金属元素及び/又は非金属元素からなる金属様の物質をいい、その結合状態などについては特に限定しない。金属インジウムの含有量についても特に限定しない。すなわち、金属インジウムが主成分であっても、微量含まれるものであっても好適に用いることができる。金属インジウムの精製度合い、インジウムの回収率、インジウムの生産性から、金属インジウム含有合金中の金属インジウム含有量は好ましくは100重量ppmから99.999重量%、より好ましくは1重量%から99.99重量%、更に好ましくは60重量%から99.9重量%である。 “Metal indium-containing alloy” as an anode refers to a metal-like substance composed of metal indium and one or more other metal elements and / or non-metal elements, and the bonding state thereof is not particularly limited. The content of metal indium is not particularly limited. That is, it can be suitably used regardless of whether metal indium is a main component or a trace amount. The metal indium content in the metal indium-containing alloy is preferably 100 ppm by weight to 99.999% by weight, more preferably 1% by weight to 99.99, from the degree of metal indium purification, indium recovery, and indium productivity. % By weight, more preferably 60% by weight to 99.9% by weight.
金属インジウム含有合金中の金属インジウム以外の金属の種類は特に限定しないが、例を挙げるとLi,Na,Mg,Al,Si,K,Ca,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge,As,Se,Sr,Y,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Cd,Sn,Sb,Te,Cs,Ba,Ta,W,Re,Os,Ir,Pt,Au,Tl,Pb,Biから選ばれた1種以上である。 The type of metal other than metal indium in the metal indium-containing alloy is not particularly limited. For example, Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co , Ni, Cu, Zn, Ga, Ge, As, Se, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Sn, Sb, Te, Cs, Ba, Ta, W, Re , Os, Ir, Pt, Au, Tl, Pb, Bi.
これらの中で溶融塩電解におけるインジウムとの分離精製が良好な金属は、Li,Na,Mg,Al,Si,K,Ca,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge,Sr,Y,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Cd,Sn,Cs,Ba,Ta,W,Re,Os,Ir,Pt,Au,Tl,Pb,Biであり、特にSn,Cu,Fe,Si,Ni,Pb,Na,Ca,Mgは、インジウムとの分離精製が容易であり好ましい。 Among these, metals having good separation and purification from indium in molten salt electrolysis are Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu. , Zn, Ga, Ge, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Sn, Cs, Ba, Ta, W, Re, Os, Ir, Pt, Au, Tl, Pb Bi, especially Sn, Cu, Fe, Si, Ni, Pb, Na, Ca and Mg are preferable because they can be easily separated and purified from indium.
又、金属インジウム含有合金としては、金属インジウムをハンダとして使用した後の使用済みインジウムハンダや、インジウム化合物を還元処理して得られた金属インジウム含有合金等も使用することができる。インジウム化合物としては、インジウムを含む化合物であれば特に限定しないが、具体的には酸化インジウム,水酸化インジウム,塩化インジウム,硫酸インジウム,硝酸インジウム等やITOスクラップ等の酸化インジウム含有物質を挙げることができる。 In addition, as the metal indium-containing alloy, used indium solder after using metal indium as solder, metal indium-containing alloy obtained by reducing the indium compound, and the like can also be used. The indium compound is not particularly limited as long as it is a compound containing indium, and specific examples include indium oxide-containing materials such as indium oxide, indium hydroxide, indium chloride, indium sulfate, indium nitrate, and ITO scrap. it can.
例えば、ITOスクラップから金属インジウム含有合金を得る方法としては、ITOスクラップを還元剤にて還元処理する方法、ITOスクラップを、塩酸、硝酸、硫酸等やこれらの混酸等の酸性水溶液に溶解して、塩化インジウム、硫酸インジウム又は硝酸インジウム等を得、次いでアルカリを添加することで水酸化インジウムを含む化合物とし、更に該水酸化インジウムを含む化合物を加熱処理して酸化インジウムに転化させた後に、還元剤と反応させることで金属インジウム含有合金を得る方法や、塩化インジウム、硫酸インジウム又は硝酸インジウムを含む水溶液とした後、インジウムよりも卑な金属、具体的には金属アルミニウムや金属亜鉛を添加することで、金属インジウム含有合金を置換析出させ、金属インジウム含有合金を得る方法等を挙げることができる。 For example, as a method of obtaining an alloy containing indium metal from ITO scrap, a method of reducing the ITO scrap with a reducing agent, dissolving the ITO scrap in an acidic aqueous solution such as hydrochloric acid, nitric acid, sulfuric acid, or a mixed acid thereof, After obtaining indium chloride, indium sulfate, indium nitrate or the like, and then adding an alkali to form a compound containing indium hydroxide, and further converting the compound containing indium hydroxide into indium oxide by heat treatment, a reducing agent Or a solution containing indium chloride, indium sulfate or indium nitrate, and then adding a base metal rather than indium, specifically metallic aluminum or metallic zinc. Metal-indium-containing alloy Obtaining method, and the like.
陰極としての「金属インジウム」は、金属インジウムの含有量が95重量%以上であることが好ましい。 The “metal indium” as the cathode preferably has a metal indium content of 95% by weight or more.
溶融塩としては、先ずインジウムを含む塩が当然ながら必須である。その種類として、融点が低く、且つ、耐酸化性に優れ、電気抵抗が低い特徴を有する点から、塩化インジウムを使用する。しかしながら、塩化インジウムを単独で使用すると、インジウムは希少金属で、高価であるため、経済的ではない。 As a molten salt, first, a salt containing indium is naturally essential. As the type, indium chloride is used because it has a low melting point, excellent oxidation resistance, and low electrical resistance. However, using indium chloride alone is not economical because indium is a rare metal and expensive.
そこで、塩化インジウム以外の塩を含む混合溶融塩として使用するが、その塩として、吸湿性及び加水分解性が低く、比較的融点も低い特徴を有する点を考慮して、塩化亜鉛を併用する。 Therefore, although it is used as a mixed molten salt containing a salt other than indium chloride, zinc chloride is used in combination, considering that the salt has characteristics of low hygroscopicity and hydrolyzability and relatively low melting point.
本発明に係る金属インジウムの製造方法においては、溶融塩中、塩化インジウムの含有量を、溶融塩全量を基準として68重量%以上とし、更に、溶融塩の水分含有量を、溶融塩全量を基準として0.5重量%以下とすることを必須とする。塩化インジウムの含量が68重量%より少ない場合、即ち塩化亜鉛含量が32重量%以上では、陰極に亜鉛がかなり電析し、金属インジウムの純度が低下する。更に、塩化亜鉛は溶融塩中において導電率が低く、32重量%以上含有すると液抵抗が大きくなり、電解槽電圧がアップし、ランニングコストがアップするため経済的ではない。塩化インジウムを68重量%以上含むことにより電解槽電圧を低くでき、又融点を低くでき、運転操作温度を低くできる。これらのことから溶融塩中の塩化インジウムの含有量としては、70重量%以上が好ましく、75重量%以上がより好ましい。 In the method for producing metal indium according to the present invention, the content of indium chloride in the molten salt is 68% by weight or more based on the total amount of the molten salt, and the moisture content of the molten salt is based on the total amount of the molten salt. As 0.5% by weight or less is essential. When the content of indium chloride is less than 68% by weight, that is, when the zinc chloride content is 32% by weight or more, zinc is considerably electrodeposited on the cathode, and the purity of metallic indium is lowered. Furthermore, zinc chloride has a low electrical conductivity in the molten salt, and if it is contained at 32% by weight or more, the liquid resistance increases, the electrolytic cell voltage increases, and the running cost increases, which is not economical. By containing 68% by weight or more of indium chloride, the electrolytic cell voltage can be lowered, the melting point can be lowered, and the operating temperature can be lowered. Accordingly, the content of indium chloride in the molten salt is preferably 70% by weight or more, and more preferably 75% by weight or more.
また、既述の様に、特許文献2では、塩化インジウムの含有量が67重量%より高い場合は、析出するインジウム中にスズが混入して好ましくないと記載されているが、本発明では、塩化インジウム含有量を68重量%以上にするだけでなく、溶融塩の水分含有量が0.5重量%以下とすることにより、インジウム中にスズが混入せず、更に、溶融塩中において導電率が高くなり、液抵抗が小さくなり、電解槽電圧が低下してランニングコストが低減するため経済的であることを明らかにして、本発明を完成した。水分含有量が0.5重量%を越えると、溶融塩中には固形物が析出し、陰極上での金属インジウムの電析を阻害し、電流効率の低下を招き、更には、理由は定かではないが、陰極に析出する金属インジウム中の不純物含量が高くなり、十分な精製ができないことがある。
In addition, as described above, in
前述の特許文献4における溶融時においては、溶融塩中の水分含有量を0.5重量%以下とすることが記載されているが、この先行文献における溶融塩は、塩化アルミニウムを主体とする塩化アルミニウム系溶融塩であって、塩化インジウム含有量は50モル%以下(=53重量%以下)であり、塩化インジウム含有量やその作用が本発明とは全く相違する。
At the time of melting in the above-mentioned
溶融塩に含まれる塩化インジウムには、インジウムの価数が1価、2価、3価であるInCl、InCl2、InCl3があり、いずれか1種以上を含むことを必須とする。より好ましくは、融点が低く、より低温での溶融塩電解が可能なInClである。InClを含む溶融塩電解質浴では、インジウムは1価で移動するため、3価であるInCl3に比べ、同じ電気量でもInの生産速度を3倍にできることからも好ましい。 Indium chloride contained in the molten salt includes InCl, InCl 2 , and InCl 3 whose indium valences are monovalent, divalent, and trivalent, and it is essential to include at least one of them. More preferred is InCl that has a low melting point and enables molten salt electrolysis at a lower temperature. The molten salt electrolyte bath containing InCl, since indium move univalent preferable from the fact that compared to InCl 3 is trivalent, it triples the production rate of In in the same amount of electricity.
尚、本発明における水分含有量とは、溶融塩の湿量をベースとした値であり、湿量とは、水分を含んだ溶融塩の単位重量当りの水分量を示す(粉体工学会編、「粉体工学便覧」第588頁(1986年)参照)。そして、本発明における「水分含有量」とは、メタノールを脱水して水分量を20重量ppm以下とし、これに溶融塩を溶解し、一部をサンプリングし、カールフィッシャー試薬(シグマアルドリッチ社製、商品名「ハイドラナールコンポジット5」)にて滴定して算出した値である。
The moisture content in the present invention is a value based on the moisture content of the molten salt, and the moisture content indicates the moisture content per unit weight of the molten salt containing moisture (edited by the Powder Engineering Society). , "Handbook of Powder Engineering", page 588 (1986)). And the “water content” in the present invention refers to dehydrating methanol to a water content of 20 ppm by weight or less, dissolving a molten salt therein, sampling a part thereof, Karl Fischer reagent (manufactured by Sigma Aldrich, This is a value calculated by titration with the product name “
尚、本発明における溶融塩中の「水分含有量」とは、溶融塩電解開始当初~溶融塩電解終了するまでの運転中のいずれかの時点における水分量を示すものである。最も好ましい態様は、運転開始前に溶融塩の水分を脱水し、溶融塩中における水分含有量を0.5重量%以下に低減し、運転中も溶融塩の水分吸収を防止し、0.5重量%以下を維持することである。更に、好ましい溶融塩の水分含有量は、0.4重量%以下である。 The “water content” in the molten salt in the present invention indicates the water content at any time during the operation from the beginning of molten salt electrolysis to the end of molten salt electrolysis. The most preferred embodiment is to dehydrate the water in the molten salt before the start of operation, reduce the water content in the molten salt to 0.5 wt% or less, prevent water absorption of the molten salt even during operation, It is to keep the weight percent or less. Furthermore, the water content of a preferable molten salt is 0.4% by weight or less.
溶融塩と接触している気相部の水蒸気濃度は特に限定しないが、水蒸気濃度が低い場合、溶融塩の水分は蒸発するが、逆に高い場合、溶融塩が吸湿し水分含有量が高くなることもある。そのため、水分含有量を低く維持する方法の一つとして、電解槽中の気相部(ガス雰囲気)の水蒸気濃度を低く維持する方法がある。具体的には、気相部の水蒸気濃度を1容量%以下とすることが好ましく、より好ましくは0.5容量%以下である。又、溶融塩と接触している気相部の成分は特に限定することなく、例えば、空気,窒素,アルゴン,ヘリウム,水素,一酸化炭素,二酸化炭素などを使用することができる。好ましくは気相部の酸素濃度を10容量%以下とすることであり、これにより溶融塩中の溶存酸素濃度を低く維持でき、溶融塩や電析インジウムの酸化を防止することができる。更に好ましくは気相部の主成分を窒素、アルゴン、ヘリウムから選ばれた1種以上とすることである。ここで「主成分」とは、気相部の全容積に対して、50体積%以上含まれた成分を意味する。 The water vapor concentration in the gas phase part in contact with the molten salt is not particularly limited, but when the water vapor concentration is low, the water content of the molten salt evaporates, but when it is high, the molten salt absorbs moisture and the water content increases. Sometimes. Therefore, as one method for keeping the water content low, there is a method for keeping the water vapor concentration in the gas phase part (gas atmosphere) in the electrolytic cell low. Specifically, the water vapor concentration in the gas phase part is preferably 1% by volume or less, more preferably 0.5% by volume or less. Moreover, the component of the gaseous phase part which is contacting with molten salt is not specifically limited, For example, air, nitrogen, argon, helium, hydrogen, carbon monoxide, a carbon dioxide etc. can be used. Preferably, the oxygen concentration in the gas phase is 10% by volume or less, whereby the dissolved oxygen concentration in the molten salt can be kept low, and oxidation of the molten salt and electrodeposited indium can be prevented. More preferably, the main component of the gas phase part is at least one selected from nitrogen, argon and helium. Here, the “main component” means a component contained by 50% by volume or more with respect to the total volume of the gas phase part.
溶融塩電解に用いる電解槽の形状は、陽極室と陰極室が接しておらず、直接電気が流れない構造であれば特に制限はない。即ち、陽極室と陰極室が隔離された構造であればよく、例えば、成書「溶融塩技術は21世紀のキーテクノロジー 溶融塩の応用(アイピーシー出版編)」で紹介されている、通常使用される溶融塩電解槽を適用できる。陽極、陰極が固体であるか液体であるか、運転操作が連続式か回分式か、等の運転操作方法によっても、適正な電解槽形状は異なり、適宜選定すれば良い。 The shape of the electrolytic cell used for molten salt electrolysis is not particularly limited as long as the anode chamber and the cathode chamber are not in contact with each other and electricity does not flow directly. In other words, the anode chamber and the cathode chamber need only be separated from each other. For example, the normal use introduced in the book "Molten salt technology is a key technology of the 21st century: Application of molten salt (IPC Publishing)" A molten salt electrolyzer can be applied. The appropriate electrolytic cell shape differs depending on the operation method such as whether the anode and the cathode are solid or liquid, and whether the operation is a continuous type or a batch type, and may be appropriately selected.
具体的には、陽極室の金属インジウム含有合金が溶融しており、陰極室の金属インジウムも溶融している場合、陰極室と陽極室を隔壁にて仕切り、両極の上部を溶融塩電解質浴で塩橋させた構造、或いは電解槽形状が円筒型であって、陽極が溶融塩電解質浴の中央部の絶縁性の容器に入れられ、陽極を囲むように陰極が配置された電解槽などを挙げることができる。溶融塩電解槽のガス雰囲気は、前述の通り、水蒸気濃度や酸素濃度を低くすることで溶融塩の安定性をアップできることもある。更に、溶融塩電解槽の構造によっては、溶融塩が気相部と接触する面積を低減し溶融塩の吸湿を抑制できることもある。好ましくは気相部との接触面積を、単位溶融塩容量当たり0.1~100m2/m3とすることであり、より好ましくは0.2~80m2/m3である。 Specifically, when the metal indium-containing alloy in the anode chamber is melted and the metal indium in the cathode chamber is also melted, the cathode chamber and the anode chamber are partitioned by a partition, and the upper part of both electrodes is a molten salt electrolyte bath. Examples include an electrolytic cell in which a salt bridge structure or an electrolytic cell shape is cylindrical, and an anode is placed in an insulating container in the center of a molten salt electrolyte bath, and a cathode is disposed so as to surround the anode. be able to. As described above, the gas atmosphere in the molten salt electrolyzer may sometimes improve the stability of the molten salt by lowering the water vapor concentration and the oxygen concentration. Furthermore, depending on the structure of the molten salt electrolysis tank, the area where the molten salt comes into contact with the gas phase part may be reduced, and moisture absorption of the molten salt may be suppressed. Preferably, the contact area with the gas phase part is 0.1 to 100 m 2 / m 3 per unit molten salt volume, more preferably 0.2 to 80 m 2 / m 3 .
このような溶融塩電解法では、電流密度を高くできることが一つの特徴であり、電流密度は1~200A/dm2が好ましい。1A/dm2未満で運転すると、単位電極面積当たりの生産速度が低下する場合がある。生産性の面からは電流密度は高いほど良いが、200A/dm2を超える電流密度では陰極に金属インジウムが析出する際、不純物を取り込み、高純度のインジウムが得にくくなることがある。電流密度としては、より好ましくは2~100A/dm2、更には、3~50A/dm2である。 In such a molten salt electrolysis method, a One of the features that can increase the current density, the current density is preferably 1 ~ 200A / dm 2. When operating at less than 1 A / dm 2 , the production rate per unit electrode area may decrease. From the viewpoint of productivity, the higher the current density, the better. However, at a current density exceeding 200 A / dm 2 , when metal indium is deposited on the cathode, impurities may be taken in and it may be difficult to obtain high-purity indium. The current density is more preferably 2 to 100 A / dm 2 and further 3 to 50 A / dm 2 .
又、溶融塩電解の操作温度は、溶融塩電解質の融点以上であれば特に限定されない。装置材質の腐食、溶融塩電解の運転操作面から90~500℃が好ましく、100~450℃が更に好ましい。 Also, the operating temperature of the molten salt electrolysis is not particularly limited as long as it is equal to or higher than the melting point of the molten salt electrolyte. 90 to 500 ° C. is preferable, and 100 to 450 ° C. is more preferable from the viewpoint of corrosion of the apparatus material and operation of molten salt electrolysis.
更に、溶融塩電解に要する時間は、十分な回収率および不純物の混入を回避するために、合金中に含まれるインジウムの50~100%を電解できる時間行えば十分である。 Furthermore, the time required for the molten salt electrolysis is sufficient if it can be electrolyzed for 50 to 100% of indium contained in the alloy in order to avoid a sufficient recovery rate and contamination with impurities.
以上述べた適正な運転条件にて電解することで、陰極に高純度な金属インジウムを析出することができるが、該金属インジウムが目標とする純度にまで達成していない場合は、同様の操作で溶融塩電解を更に1回以上実施して目標とする純度に達するまで精製しても良い。あるいは、不純物の種類によっては、従来から知られている金属インジウムの精製方法を組み合わせて実施しても良い。具体的には、アルカリ金属水酸化物を用いたアルカリ溶鋳法や塩化アンモニウム等の塩素化剤を用いた塩化法等を採用でき、これらの精製技術を適宜組み合わせることで、より効果的、効率的に金属インジウムを製造することができる。 By electrolyzing under the proper operating conditions described above, high-purity metal indium can be deposited on the cathode, but if the metal indium has not achieved the target purity, the same operation is performed. Molten salt electrolysis may be further performed one or more times, and purification may be performed until the target purity is reached. Or depending on the kind of impurity, you may implement combining the purification method of the metal indium known conventionally. Specifically, alkali casting methods using alkali metal hydroxides and chlorination methods using chlorinating agents such as ammonium chloride can be adopted, and by combining these purification techniques as appropriate, more effective and efficient Indium metal can be manufactured.
続いて、本実施形態に係る溶融塩電解槽について、図1及び2に基づいて説明する。下記で説明する溶融塩電解槽はあくまで本発明の態様の一つであり、当然ながら本発明は下記の内容に限定されるものではない。 Subsequently, the molten salt electrolyzer according to this embodiment will be described with reference to FIGS. The molten salt electrolytic cell described below is only one aspect of the present invention, and the present invention is naturally not limited to the following contents.
<溶融塩電解槽>
図1及び2に示すように、本実施形態における溶融塩電解槽100は、陽極室1、内筒2及び陰極室8から構成される。陽極室1は、低融点金属を含む合金の液状物9を収容するための開放された容器である。内筒2は、この容器内に、開口を有する端面が、陽極室1内部の底面と対向するように配置されている。そして、内筒2の壁面及び上記開口を有する端面の反対側の面が、陽極室1に収容された低融点金属を含む合金の液状物9の一部を覆っている。陰極室8は、低融点金属を導入する導入口3及び当該低融点金属を導出する導出口7を有し、導入口3が内筒2の内部に配置されており、低融点金属を導出する導出口7が内筒2の外部に配置されている。また、陰極室8の内部は低融点金属11で充填されている。溶融塩電解槽は、ヒーター12上に配置され、陽極室1の下部よりヒーター12にて加熱しながら電解を実施してもよい。
<Molten salt electrolytic cell>
As shown in FIGS. 1 and 2, the molten
(陽極室1)
陽極室1は低融点金属を含む合金の液状物(陽極液9)を保持するための容器であり、陽極室1と内筒2により形成される空間には、開口側から陽極液9の投入や陽極用導線14の挿入が可能である。また、電解の運転操作を長時間継続すると、合金を構成する電解されなかった成分が陽極室1中にて濃縮されるので、陽極液9の組成を一定に保つために、当該開口から精製後の合金、すなわち、使用した陽極液9を導出することもできる。精製後の合金を導出するために、陽極室1には、別途導出口が設けられていてもよい。当該導出口は、陽極室1と内筒2の間の隙間に配置されていてもよい。導出口には、抜き出しノズル4が形成されていてもよく、精製後の合金を間欠的或いは連続的に抜き出すことがより好ましい。なお、陽極液9に含まれる低融点金属の含有量が30重量%以下、好ましくは50重量%以下となった時点で抜き出しノズル4を開けると、低融点金属の純度がより高いものを得ることができる。陽極液9の供給も連続であっても間欠的であっても良く、合金の供給場所は陽極室1と内筒2との間の隙間からでも、あるいは別途供給部を設けても構わない。
(Anode chamber 1)
The
陽極室1の材質は保持している合金と反応しないものであれば特に限定されない。好ましくは、破損のおそれがほとんどない、黒鉛や金属材料であり、金属材料としては、具体的にはステンレス、ニッケル基合金、鉄、鉄基合金、チタン、チタン基合金である。中でも、ステンレス、鉄、チタン及び黒鉛から選ばれた1種以上から構成された材料が好ましく、耐食性、経済性の面からステンレスがより好ましい。
The material of the
陽極室1の形状は、円筒型、角型、多角形型など特に限定されない。好ましくは、製作が容易で、機械的強度が高い円筒型、角型である。
The shape of the
(内筒2)
内筒2は、下部が開口し、例えば、上部に開閉可能な不活性ガス導入口5および排ガス排出口6を有している。内筒2の上部が閉じられていることにより、溶融塩10表面と外気との接触が遮断できるため、溶融塩10の劣化原因である大気中の水分の混入を防止でき、長期間の安定運転が可能となる。溶融塩10と接触している気相部に導入する不活性ガスとしては、窒素ガスやアルゴンガスなどが挙げられる。
内筒2には、その内側に低融点金属を含む合金の液状物9が収容され、当該液状物上に低融点金属のハロゲン化物の溶融塩層10が保持されている。陽極液9の上部に浮遊状態で溶融塩層10形成させるには、具体的には、内筒2の底部に陽極液9を貯え、不活性ガス導入口5および排ガス排出口6から溶融塩を注ぎ込む、又は、内筒の中に粉末状の金属塩を入れておき、陽極液9の上で内筒2をひっくり返し、加熱を行って前記金属塩を溶融させる方法などが挙げられる。
また、当該溶融塩層10を外部に流出させることなく、内筒2の内側と外側とで陽極液9を移動可能にするため、例えば、内筒2の下方部側面の一部がスリット状に切り欠かれている。これにより、陽極液9が内筒2の内部と外部とで行き来でき、陽極液9の組成が均一化できる。
(Inner cylinder 2)
The
The
Further, in order to allow the
内筒2の材質は、内部に保持されている溶融塩、低融点金属を含む合金と反応しないものであれば、特に限定されない。価格、製作の容易さから好ましくはガラス、セラミックス、フッ素樹脂から選ばれた1種以上から構成され、より好ましくは石英ガラス、セラミックスである。
The material of the
(陰極室8)
陰極室8は、内部に低融点金属11が充填されるものであり、内筒2の外部に配置された部分には、陰極用導線15を挿入することができる。電析を行う前に陰極室8に予め充填される低融点金属11の純度は、低融点金属の含有量が90重量%以上であることが好ましい。
(Cathode chamber 8)
The
陰極室8における導入口3は設備の大きさによって、1個又は複数個の容器から構成される。導入口3が、複数の容器から構成される場合、導入口3の表面で電解析出した精製低融点金属の液状物(陰極液11)は、連結された配管によって集合され、導出口7から連続的に、または間欠的に排出され、回収される。また、導入口3の配置は特に限定されないが、図2に示すように、溶融塩層10中、導入口3を均等に分散させるほど陽極の合金から低融点金属の酸化溶解が均一となり、即ち電流密度分布が小さくできるので好ましい。導入口3の断面積、即ち陰極液11と溶融塩10との界面の面積が大きいほど電解析出できる面積が大きくなり、電気抵抗が小さくなるので好ましいが、大きすぎると結果として溶融塩10の断面積(図2の溶融塩10の面積)が小さくなり、そのため溶融塩10の電気抵抗が増すことになる。好ましくは導入口3の断面積が内筒断面積の30~70%、より好ましくは40~60%とすることである。
The
陰極室8は絶縁体から形成されることを必須とする。絶縁体のなかでも、好ましくは溶融塩や低融点金属に対し耐食性が高いガラス、セラミックス、フッ素樹脂であり、より好ましくは製作が容易で、耐熱性が高く、安価なガラスであり、更には石英ガラスが好ましい。
陰極室8の形状は、低融点金属が電解析出できる形状であれば特に限定されない。好ましくは立方体、直方体、円柱である。
It is essential that the
The shape of the
<低融点金属の精製法>
続いて、本実施形態に係る低融点金属の精製法について説明する。当該低融点金属の精製法では、上記の溶融塩電解槽100において、陽極室1にインジウム、スズ及びガリウムから選ばれる1種以上の金属を含む合金を収容し、内筒2内の当該合金の液状物上に、上記金属に対応する金属ハロゲン化物の溶融塩を保持させる。そして、陽極用導線14及び陰極用導線15を挿入した状態で電圧を印加することにより、溶融塩電解させ、陰極室8の導出口7から、精製されたインジウム、スズ及びガリウムから選ばれる1種以上の金属を導出させる。
<Purification of low melting point metal>
Subsequently, a method for purifying a low melting point metal according to the present embodiment will be described. In the method for refining the low melting point metal, in the molten salt
上記精製法により、インジウム、スズ及びガリウムから選ばれた1種以上の金属を含む合金を精製することができる。中でも、インジウムを含む合金は、融点が比較的低く、溶融塩電解精製での生産効率が良いため、本実施形態に係る精製法によって好適に精製される。なお、合金とは金属元素及び/又は非金属元素からなる金属様の物質をいい、その結合状態などについては特に限定しない。低融点金属の含有量についても特に限定しない。すなわち、低融点金属が主成分であっても、微量含まれるものであっても好適に用いることができる。低融点金属の精製度合い、回収率、生産性から、合金中の低融点金属の含有量は好ましくは100wtppmから99.999wt%、より好ましくは1wt%から99.99wt%、更に好ましくは60wt%から99.9wt%である。 The alloy containing one or more metals selected from indium, tin and gallium can be purified by the above purification method. Among them, an alloy containing indium is suitably purified by the purification method according to this embodiment because it has a relatively low melting point and high production efficiency in molten salt electrolytic purification. The alloy refers to a metal-like substance composed of a metal element and / or a non-metal element, and the bonding state thereof is not particularly limited. The content of the low melting point metal is not particularly limited. That is, even if the low melting point metal is a main component or a trace amount is contained, it can be suitably used. From the degree of purification, recovery rate, and productivity of the low melting point metal, the content of the low melting point metal in the alloy is preferably 100 wtppm to 99.999 wt%, more preferably 1 wt% to 99.99 wt%, and even more preferably 60 wt%. 99.9 wt%.
合金中の低融点金属以外の金属の種類は特に限定しないが、例を挙げるとLi,Na,Mg,Al,Si,K,Ca,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ge,As,Se,Sr,Y,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Cd,Sb,Te,Cs,Ba,Ta,W,Re,Os,Ir,Pt,Au,Tl,Pb,Biから選ばれた1種以上である。 The type of metal other than the low melting point metal in the alloy is not particularly limited. For example, Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni , Cu, Zn, Ge, As, Se, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Sb, Te, Cs, Ba, Ta, W, Re, Os, Ir, Pt , Au, Tl, Pb, Bi.
これらの中で溶融塩電解における低融点金属との分離精製が良好な金属は、Li,Na,Mg,Al,Si,K,Ca,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ge,Sr,Y,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Cd,Cs,Ba,Ta,W,Re,Os,Ir,Pt,Au,Tl,Pb,Biであり、特にCu,Fe,Niは、分離精製が容易であり好ましい。 Among these, metals having good separation and purification from low melting point metals in molten salt electrolysis are Li, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni. , Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, Cs, Ba, Ta, W, Re, Os, Ir, Pt, Au, Tl, Pb, Bi In particular, Cu, Fe, and Ni are preferable because separation and purification are easy.
内筒2に保持される溶融塩10は、精製対象となる金属に対応する金属ハロゲン化物を含み、かつ、陽極室1に保持されている低融点金属を含む合金よりも比重が小さく、溶融塩電解の操作が可能な溶融塩電解質であれば特に限定されない。たとえば、精製対象となる金属に対応する金属ハロゲン化物とハロゲン化亜鉛との混合溶融塩、精製対象となる金属に対応する金属ハロゲン化物とハロゲン化アルミニウムとの混合溶融塩が挙げられる。より具体的には、精製対象がインジウムを含む合金である場合には、塩化亜鉛と一塩化インジウムの混合溶融塩や、臭化アルミニウムと一臭化インジウムの混合溶融塩などを好適に用いることができる。なお、精製される金属の純度の観点から、精製対象となる金属に対応する金属ハロゲン化物は、混合溶融塩全量を基準にして、50重量%より多くすることが好ましく、65重量%以上とすることが好ましく、75重量%以上とすることがより好ましい。また、溶融塩中の水分含有量は、0.7重量%以下であることが好ましく、0.5重量%以下であることがより好ましく、0.4重量%以下であることがさらに好ましい。
The
上記溶融塩電解槽を用いることにより、本実施形態に係る精製法においては、高い電流密度にて電解することができる。電流密度は1~200A/dm2が好ましい。1A/dm2未満で運転すると、単位電極面積当たりの生産速度が低下することがある。生産性の面からは電流密度は高いほど良いが、200A/dm2を超える電流密度では陰極に有用な低融点金属が電解析出する際、不純物を取り込み、純度が低下することがある。電流密度として、より好ましくは2~150A/dm2、更には3~100A/dm2である。 By using the molten salt electrolyzer, electrolysis can be performed at a high current density in the purification method according to the present embodiment. The current density is preferably 1 to 200 A / dm 2 . When operating at less than 1 A / dm 2 , the production rate per unit electrode area may decrease. From the viewpoint of productivity, the higher the current density, the better. However, at a current density exceeding 200 A / dm 2 , when a low melting point metal useful for the cathode is electrolytically deposited, impurities may be incorporated and the purity may be lowered. The current density is more preferably 2 to 150 A / dm 2 , further 3 to 100 A / dm 2 .
また、溶融塩電解を実施する温度は、電解質浴、低融点金属を含む合金および低融点金属の全てが溶融状態であれば特に限定しない。装置材質の腐食、溶融塩電解の運転操作面から溶融塩11の温度は、50℃~400℃が好ましく、90℃~350℃であることがより好ましい。
Further, the temperature at which the molten salt electrolysis is performed is not particularly limited as long as the electrolyte bath, the alloy containing the low melting point metal, and the low melting point metal are all in a molten state. The temperature of the
本実施形態に係る溶融塩電解槽は、水分が入り込みにくい構造となっているため溶融塩中の水分量を長期間に亘って低いレベルに維持することができる。また、本実施形態に係る精製法によれば、低融点金属を含む合金の液状物(陽極液)の表上面に溶融塩が供給され、かつ、使用した陽極液を適宜抜き出すことができるため、溶融塩中における、低融点金属のハロゲン化物の濃度を一定に保つことができる。これにより、低融点金属から、精製対象の低融点金属を長期間に亘って、高回収率で製造することができる。 Since the molten salt electrolytic cell according to the present embodiment has a structure in which moisture hardly enters, the amount of moisture in the molten salt can be maintained at a low level over a long period of time. Further, according to the purification method according to the present embodiment, the molten salt is supplied to the upper surface of the liquid material (anolyte) of the alloy containing the low melting point metal, and the used anolyte can be appropriately extracted, The concentration of the low melting point metal halide in the molten salt can be kept constant. As a result, the low melting point metal to be purified can be produced from the low melting point metal with a high recovery rate over a long period of time.
以下、本発明を実施例により説明するが、本発明はこれらの実施例にのみ限定されるものではない。 Hereinafter, the present invention will be described by way of examples, but the present invention is not limited to these examples.
なお、本発明における溶融塩中の水分含有量の測定方法は、メタノール(関東化学(株)社製、試薬特級)を脱水し、水分量20重量ppm以下とし、これに溶融塩を溶解し、一部をサンプリングし、カールフィッシャー試薬(シグマアルドリッチ社製、商品名「ハイドラナールコンポジット5」)にて滴定して算出した。
In addition, the measuring method of the water content in the molten salt in the present invention is to dehydrate methanol (manufactured by Kanto Chemical Co., Ltd., reagent special grade) to have a water content of 20 ppm by weight or less, in which the molten salt is dissolved, A part of the sample was sampled and titrated with a Karl Fischer reagent (Sigma Aldrich, trade name “
実施例1
金属インジウム含有合金の原料として、ITOターゲット製造時に発生したITOスクラップ(酸化インジウム91.1重量%、酸化スズ8.9重量%)1814gをクラッシャーで平均粒径51μmに粉砕し、粉砕粉1735gと還元剤のグラファイト(ロンザ社製、商品名「KS-75」)170.9gを混合後、混合物を内容積1Lの磁製ルツボに入れ、電気炉に仕込んだ。電気炉内は窒素ガスにて置換後、炉壁の温度を1100℃まで6時間で昇温し、1100℃で3時間保持した。反応終了後、電気炉内を冷却し、還元生成物と未反応原料粉の合計重量を測定したところ1456.3gであった。
Example 1
As raw material for the metal indium-containing alloy, 1814 g of ITO scrap (91.1 wt% indium oxide, 8.9 wt% tin oxide) generated during the production of the ITO target was ground to an average particle size of 51 μm with a crusher, and reduced to 1735 g of ground powder. 170.9 g of graphite (product name “KS-75”, manufactured by Lonza) was mixed, and the mixture was placed in a magnetic crucible having an internal volume of 1 L and charged into an electric furnace. After replacing the inside of the electric furnace with nitrogen gas, the temperature of the furnace wall was raised to 1100 ° C. in 6 hours and held at 1100 ° C. for 3 hours. After completion of the reaction, the inside of the electric furnace was cooled and the total weight of the reduction product and the unreacted raw material powder was measured to be 1456.3 g.
該処理物をX線回折装置にて分析したところ、スクラップ中にあった酸化インジウムの回折ピークは弱くなり、代わりに金属インジウムの強いピークが認められたため、粉砕したITOスクラップ中の酸化インジウムの還元が良好であることを確認した。又、酸化スズもほぼ全量金属スズに転化しており、還元生成物はインジウム-スズ合金であることを確認できた。 When the processed product was analyzed with an X-ray diffractometer, the diffraction peak of indium oxide in the scrap became weak, and instead a strong peak of metal indium was observed, so the reduction of indium oxide in the ground ITO scrap was reduced. Was confirmed to be good. Also, almost all of the tin oxide was converted to metallic tin, and it was confirmed that the reduction product was an indium-tin alloy.
次に、該合金から金属インジウムを精製回収するため、溶融塩電解を実施した。電解槽は図3に示すような、パイレックス(登録商標)ガラスにて製作した内径2cm、高さ13cmのH型電解槽とし、陽極には還元生成物であるインジウム-スズ合金63.2gを、陰極には別途準備した純度99.999重量%の金属インジウム29.9gを仕込んだ。また、仕込みの溶融塩重量は70.3gであり、その組成は一塩化インジウム(三塩化インジウム(稀産金属(株)社製、無水品)と金属インジウムを350℃で反応させて合成したもの)73.5重量%(=71.5モル%)、塩化亜鉛(東信化学工業(株)社製、純度99%以上)28.5モル%とした。そしてこの時の水分含有量は0.4重量%であった。 Next, in order to purify and recover metallic indium from the alloy, molten salt electrolysis was performed. As shown in FIG. 3, the electrolytic cell is an H-type electrolytic cell made of Pyrex (registered trademark) glass having an inner diameter of 2 cm and a height of 13 cm, and an anode of 63.2 g of an indium-tin alloy as a reduction product. The cathode was charged with 29.9 g of indium metal having a purity of 99.999% by weight. The weight of the molten salt charged was 70.3 g, and the composition was synthesized by reacting indium trichloride (indium trichloride (manufactured by Rare Metal Co., Ltd., anhydrous)) and metal indium at 350 ° C. ) 73.5 wt% (= 71.5 mol%), zinc chloride (manufactured by Toshin Chemical Industry Co., Ltd., purity 99% or more) 28.5 mol%. The water content at this time was 0.4% by weight.
次いで、該電解槽の陽極と陰極に白金導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を240℃として溶融塩電解を実施した。溶融塩電解は、定電流装置(菊水電子工業(製)、商品名「PMC18-5」)を用い、電流値0.94A、電流密度30A/dm2に設定して8時間通電した。 Next, platinum conducting wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 240 ° C., and molten salt electrolysis was performed. Molten salt electrolysis was carried out for 8 hours using a constant current device (Kikusui Electronics Co., Ltd., trade name “PMC18-5”) at a current value of 0.94 A and a current density of 30 A / dm 2 .
その結果、陽極室に仕込んだインジウム-スズ合金からは金属インジウム31.5gが溶解し、陰極室から金属インジウム61.1gが得られ、電解終了時の溶融塩中の水分含量は0.3重量%であった。陰極室への仕込量は29.9gであったので、電析量は31.2gになり、回収率99.0%と良好であった。 As a result, 31.5 g of metal indium was dissolved from the indium-tin alloy charged in the anode chamber, and 61.1 g of metal indium was obtained from the cathode chamber. The water content in the molten salt at the end of electrolysis was 0.3 wt. %Met. Since the amount charged into the cathode chamber was 29.9 g, the amount of electrodeposition was 31.2 g, which was a good recovery rate of 99.0%.
又、電解槽電圧は4.5Vで推移した。 Moreover, the electrolytic cell voltage changed at 4.5V.
陰極の金属インジウムの一部を取り出し、塩酸(関東化学(株)社製、試薬特級)にて溶解後、ICP(誘導結合プラズマ)分析装置にて不純物含量を求め、仕込金属インジウムの量と純度から補正した電析金属インジウム中のスズ含量は95重量ppmと低く、亜鉛含量も2重量ppmと低く良好であった。 A portion of the metal indium on the cathode is taken out, dissolved in hydrochloric acid (manufactured by Kanto Chemical Co., Ltd., reagent grade), the impurity content is obtained with an ICP (inductively coupled plasma) analyzer, and the amount and purity of the charged metal indium The tin content in the indium-deposited metal indium was as low as 95 ppm by weight, and the zinc content was as low as 2 ppm by weight.
この回収された金属インジウムを原料として酸化インジウムを製造し、その酸化インジウムと酸化スズとからITOターゲットを製造し、ITOターゲットとしてのスパッタリング性能を評価した。その結果、ノジュールの発生が殆ど認められず、ITOターゲットの製造原料として再利用可能であった。 Indium oxide was produced using the recovered metal indium as a raw material, an ITO target was produced from the indium oxide and tin oxide, and the sputtering performance as the ITO target was evaluated. As a result, the generation of nodules was hardly observed, and it was reusable as a raw material for producing the ITO target.
実施例2
実施例1の還元により回収したインジウム-スズ合金を用い、実施例1と同様のパイレックス(登録商標)ガラス製H型電解槽を用いて溶融塩電解精製を実施した。
陽極室には該合金61.7gを、陰極室には別途準備した純度99.999重量%の金属インジウム30.4gを仕込んだ。仕込みの溶融塩重量は75.4gであり、その組成は一塩化インジウム73.6重量%(=71.6モル%)、塩化亜鉛28.4モル%、水分含量0.5重量%とした。該電解槽の陽極と陰極に白金導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を240℃として溶融塩電解を実施した。
Example 2
The indium-tin alloy recovered by the reduction in Example 1 was used, and molten salt electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type electrolytic cell as in Example 1.
The anode chamber was charged with 61.7 g of the alloy, and the cathode chamber was charged with 30.4 g of 99.999 wt% metallic indium prepared separately. The weight of the molten salt charged was 75.4 g, and its composition was 73.6% by weight of indium monochloride (= 71.6% by mole), 28.4% by mole of zinc chloride, and 0.5% by weight of water content. Platinum lead wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 240 ° C., and molten salt electrolysis was performed.
溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.94A、電流密度30A/dm2に設定して14時間通電した。 Molten salt electrolysis was carried out for 14 hours using the constant current device used in Example 1 with a current value of 0.94 A and a current density of 30 A / dm 2 .
その結果、陽極室に仕込んだインジウム-スズ合金からは55.8gが溶解し、陰極室からは86.1gが得られ、電解終了時の溶融塩中の水分含量は0.3重量%であった。陰極室への仕込量は30.4gであったので、電析量は55.7gになる。陰極の金属インジウムの一部を取り出し、塩酸にて溶解後、ICP分析装置にて不純物含量を求め、仕込金属インジウムの量と純度から補正した電析金属インジウム中のスズは520重量ppm、亜鉛含量も3重量ppmと低く良好であった。また、陽極室に仕込んだインジウム重量56.5gに対し、陰極室に電析させたインジウム重量55.7gで、回収率98.6%と良好であった。 As a result, 55.8 g was dissolved from the indium-tin alloy charged in the anode chamber, and 86.1 g was obtained from the cathode chamber. The water content in the molten salt at the end of electrolysis was 0.3% by weight. It was. Since the amount charged into the cathode chamber was 30.4 g, the amount of electrodeposition was 55.7 g. A part of the metal indium on the cathode is taken out, dissolved in hydrochloric acid, the impurity content is obtained with an ICP analyzer, and tin in the deposited metal indium corrected from the amount and purity of the charged metal indium is 520 ppm by weight, the zinc content Was also as low as 3 ppm by weight. Further, the weight of indium electrodeposited in the cathode chamber was 55.7 g against the indium weight of 56.5 g charged in the anode chamber, and the recovery rate was 98.6%, which was good.
又、電解槽電圧は4.8Vで推移した。 Moreover, the electrolytic cell voltage changed at 4.8V.
比較例1
実施例1の還元により回収したインジウム-スズ合金を用い、実施例1と同様のパイレックス(登録商標)ガラス製H型電解槽を用いて溶融塩電解精製を実施した。陽極室には該合金63.3gを、陰極室には別途準備した純度99.999重量%の金属インジウム30.1gを仕込んだ。仕込みの溶融塩重量は70.8gであり、その組成は一塩化インジウム73.5重量%(=71.5モル%)、塩化亜鉛28.5モル%であった。水分含有量は溶融塩に水分を添加して0.9重量%とした。
Comparative Example 1
The indium-tin alloy recovered by the reduction in Example 1 was used, and molten salt electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type electrolytic cell as in Example 1. The anode chamber was charged with 63.3 g of the alloy, and the cathode chamber was charged with 30.1 g of indium metal having a purity of 99.999 wt% prepared separately. The weight of the molten salt charged was 70.8 g, and the composition was 73.5% by weight of indium monochloride (= 71.5% by mole) and 28.5% by mole of zinc chloride. The water content was adjusted to 0.9% by weight by adding water to the molten salt.
該電解槽の陽極と陰極に白金導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を240℃として溶融塩電解を実施した。溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.94A、電流密度30A/dm2に設定し、実施例2と同様に14時間通電した。 Platinum lead wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 240 ° C., and molten salt electrolysis was performed. Molten salt electrolysis was carried out for 14 hours in the same manner as in Example 2, using the constant current device used in Example 1 and setting the current value to 0.94 A and the current density to 30 A / dm 2 .
その結果、陽極室に仕込んだインジウム-スズ合金からは53.8gが溶解し、陰極室からは83.7gが得られ、電解終了時の溶融塩中の水分含量は0.8重量%であった。陰極室への仕込量は30.1gであったので、電析量は53.6gになる。陰極の金属インジウムの一部を取り出し、塩酸にて溶解後、ICP分析装置にて不純物含量を求め、仕込金属インジウムの量と純度から補正した電析金属インジウム中のスズは1860重量ppm、亜鉛含量も52重量ppmと高かった。また、陽極室に仕込んだインジウム重量57.2gに対し、陰極室に電析させたインジウム重量は53.7g、インジウム回収率93.9%と、実施例2の98.6%より低かった。 As a result, 53.8 g was dissolved from the indium-tin alloy charged in the anode chamber, and 83.7 g was obtained from the cathode chamber. The water content in the molten salt at the end of electrolysis was 0.8% by weight. It was. Since the amount charged into the cathode chamber was 30.1 g, the amount of electrodeposition was 53.6 g. A part of the metal indium on the cathode was taken out, dissolved in hydrochloric acid, the impurity content was determined with an ICP analyzer, and tin in the electrodeposited metal indium corrected from the amount and purity of the charged metal indium was 1860 ppm by weight, the zinc content Was as high as 52 ppm by weight. In addition, the weight of indium electrodeposited in the cathode chamber was 53.7 g, the indium recovery rate was 93.9%, which was lower than 98.6% in Example 2, compared to 57.2 g of indium charged in the anode chamber.
又、電解槽電圧は不安定で初期5.2V、運転終了直前6.1Vにアップした。 Also, the electrolytic cell voltage was unstable and increased to the initial 5.2V and 6.1V just before the end of the operation.
実施例3
使用済みインジウムハンダから金属インジウムを精製回収するため、溶融塩電解精製を実施した。使用済みインジウムハンダは、主成分のインジウムを99.22重量%、不純物であるスズを4580重量ppm、銅を3220重量ppmを含んでいた。
溶融塩電解精製は、図4に示すパイレックス(登録商標)ガラス製H型の連続式電解槽を用いた。陽極室には該合金143.9gを、陰極室には別途準備した純度99.999重量%の金属インジウム49.1gを仕込んだ。仕込みの溶融塩重量は127.1gであり、その組成は一塩化インジウム68.1重量%(=65.9モル%)、塩化亜鉛34.1モル%とした。この時の水分含有量は0.4重量%であった。該電解槽の陽極と陰極にステンレス導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を290℃とし、電解槽のガス相に、窒素ガスを1.2L/hrで連続的に流通しながら溶融塩電解を実施した。この時の窒素ガス中の水蒸気濃度は0.1vol%であった。
Example 3
In order to purify and recover metallic indium from used indium solder, molten salt electrolytic purification was performed. The used indium solder contained 99.22 wt% of the main component indium, 4580 wt ppm of tin, which is an impurity, and 3220 wt ppm of copper.
For the molten salt electrolytic purification, an H-type continuous electrolytic cell made of Pyrex (registered trademark) glass shown in FIG. 4 was used. The anode chamber was charged with 143.9 g of the alloy, and the cathode chamber was charged with 49.1 g of 99.999 wt% metallic indium prepared separately. The weight of the molten salt charged was 127.1 g, and the composition was 68.1% by weight of indium monochloride (= 65.9% by mole) and 34.1% by mole of zinc chloride. The water content at this time was 0.4% by weight. Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and nitrogen gas is continuously introduced into the electrolytic cell at 1.2 L / hr. Molten salt electrolysis was carried out while circulating the product. At this time, the water vapor concentration in the nitrogen gas was 0.1 vol%.
溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.45A、電流密度20A/dm2に設定して30日間、連続通電した。陽極室のインジウムは電解され、保持量が減少するため、1日に1回使用済みインジウムハンダ46.3gを供給した。陰極室に電析した金属インジウムはオーバーフロー管より連続的に流出させることで回収した。
In the molten salt electrolysis, the constant current apparatus used in Example 1 was used, and the current value was set to 0.45 A and the current density was set to 20 A /
その結果、陰極室から回収した金属インジウムの重量、陰極室の電流効率、そして不純物スズ,銅,亜鉛の含有量を、以下の表1に示す。 As a result, the weight of metal indium recovered from the cathode chamber, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc are shown in Table 1 below.
この表から、30日間の連続運転にも拘らず、陰極室からは金属インジウムが電流効率99%以上で回収でき、更に、30日間に亘って、不純物スズ、銅、亜鉛の含有量は少なく、良好な結果であった。又、運転終了後に溶融塩中の水分含有量を測定した結果0.2重量%と低く良好であった。 From this table, despite the continuous operation for 30 days, metal indium can be recovered from the cathode chamber with a current efficiency of 99% or more, and over 30 days, the content of impurities tin, copper, zinc is small, It was a good result. Further, the water content in the molten salt was measured after the operation was completed, and as a result, it was as low as 0.2% by weight and good.
又、電解槽電圧は、陽極室にインジウムハンダを供給する直前が極間距離が最大となるため3.5Vと高く、入れた直後は極間距離が最小となり2.5Vとなった。この電解槽電圧は30日間に亘ってほぼ一定で推移した。 Moreover, the electrolytic cell voltage was as high as 3.5 V immediately before supplying the indium solder to the anode chamber because the maximum distance between the electrodes was 3.5 V, and immediately after the insertion, the distance between the electrodes was minimum and became 2.5 V. This electrolytic cell voltage remained substantially constant over 30 days.
比較例2
実施例3にて使用した使用済インジウムハンダから金属インジウムを精製回収するため、溶融塩電解精製を実施した。
Comparative Example 2
In order to purify and recover metallic indium from the used indium solder used in Example 3, molten salt electrolytic purification was performed.
溶融塩電解精製は、実施例3と同様、図4に示すパイレックス(登録商標)ガラス製H型の連続式電解槽を用いた。陽極室には該合金140.3gを、陰極室には別途準備した純度99.999重量%の金属インジウム50.4gを仕込んだ。仕込みの溶融塩重量は125.6gであり、その組成は一塩化インジウム63.1重量%(=60.8モル%)、塩化亜鉛39.2モル%とした。この時の水分含有量は0.4重量%であった。該電解槽の陽極と陰極にステンレス導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を290℃とし、電解槽のガス相に窒素ガスを1.2L/hrで連続的に流通しながら溶融塩電解を実施した。この時の窒素ガス中の水蒸気濃度は0.1vol%であった。 As in Example 3, the molten salt electrolytic purification used an H-type continuous electrolytic cell made of Pyrex (registered trademark) glass as shown in FIG. The anode chamber was charged with 140.3 g of the alloy, and the cathode chamber was charged with 50.4 g of metallic indium of 99.999 wt% prepared separately. The weight of the molten salt charged was 125.6 g, and the composition was 63.1% by weight of indium monochloride (= 60.8% by mole) and 39.2% by mole of zinc chloride. The water content at this time was 0.4% by weight. Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and nitrogen gas is continuously introduced into the gas phase of the electrolytic cell at 1.2 L / hr. Molten salt electrolysis was carried out while circulating. At this time, the water vapor concentration in the nitrogen gas was 0.1 vol%.
溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.45A、電流密度20A/dm2に設定して30日間、連続通電した。陽極室のインジウムは電解され、保持量が減少するため、1日に1回使用済みインジウムハンダ45.2gを供給した。陰極室に電析した金属インジウムはオーバーフロー管より連続的に流出させることで回収した。 Molten salt electrolysis was carried out continuously for 30 days using the constant current apparatus used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, 45.2 g of used indium solder was supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
その結果、運転終了後に溶融塩中の水分含有量を測定した結果0.3重量%と低かった。又、陰極室から回収した金属インジウムの重量、陰極室の電流効率、そして不純物スズ,銅,亜鉛の含有量を、以下の表2に示す。 As a result, the moisture content in the molten salt was measured after the operation was completed, and the result was as low as 0.3% by weight. Table 2 below shows the weight of metal indium recovered from the cathode chamber, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc.
この表から、30日間の連続運転中、電流効率は約97%で、実施例3の99%以上よりも低く生産性が劣り、不純物の亜鉛含有量も多く、十分な精製ができなかった。 From this table, during continuous operation for 30 days, the current efficiency was about 97%, lower than 99% or more of Example 3, the productivity was inferior, the impurity zinc content was large, and sufficient purification was not possible.
比較例3
比較例2に用いた使用済みインジウムハンダを用い、実施例3と同様のパイレックス(登録商標)ガラス製H型の連続式電解槽を用いて電解精製を実施した。陽極室には該合金145.7gを、陰極室には別途準備した純度99.999重量%の金属インジウム50.4gを仕込んだ。仕込みの溶融塩重量は128.6gであり、その組成は一塩化インジウム63.2重量%(=61.5モル%)、塩化亜鉛38.5モル%とした。水分含有量は、溶融塩に水分を添加して0.7重量%とした。該電解槽の陽極と陰極にステンレス導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を290℃とし、電解槽のガス相には、水蒸気濃度1.5vol%の空気を1.2L/hrで連続的に流通しながら溶融塩電解を実施した。
Comparative Example 3
Using the used indium solder used in Comparative Example 2, electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type continuous electrolytic cell as in Example 3. The anode chamber was charged with 145.7 g of the alloy, and the cathode chamber was charged with 50.4 g of metallic indium with a purity of 99.999 wt% prepared separately. The weight of the molten salt charged was 128.6 g, and the composition was 63.2% by weight of indium monochloride (= 61.5% by mole) and 38.5% by mole of zinc chloride. The water content was 0.7% by weight by adding water to the molten salt. Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is set to 290 ° C., and the gas phase of the electrolytic cell is 1% of water having a water vapor concentration of 1.5 vol%. Molten salt electrolysis was performed while continuously flowing at 2 L / hr.
溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.45A、電流密度20A/dm2に設定して連続通電した。陽極室のインジウムは電解され、保持量が減少するため、1日に1回使用済みインジウムハンダを供給した。陰極室に電析した金属インジウムはオーバーフロー管より連続的に流出させることで回収した。 Molten salt electrolysis was carried out continuously by using the constant current device used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, used indium solder is supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
その結果、溶融塩中には白色固形物が大量に生成し、運転開始10日目にはで電流効率76%まで低下したので停止した。この間の運転結果、すなわち回収した金属インジウム重量、陰極室の電流効率、そして不純物スズ,銅,亜鉛の含有量を、以下の表3に示す。 As a result, a large amount of white solid was generated in the molten salt, and the current efficiency dropped to 76% on the 10th day after the start of operation. Table 3 below shows the operation results during this period, that is, the weight of recovered metal indium, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc.
この表から、陰極室の電流効率は95.5%から76.0%に急激に低下し、又、不純物スズ、銅の含有量は高く十分な精製ができなかった。10日間の連続運転終了後に溶融塩中の水分含有量を測定した結果3.5重量%に増加していた。 From this table, the current efficiency of the cathode chamber rapidly decreased from 95.5% to 76.0%, and the contents of impurities tin and copper were high, and sufficient purification was not possible. As a result of measuring the water content in the molten salt after the continuous operation for 10 days, it was increased to 3.5% by weight.
比較例4
比較例2に用いた使用済みインジウムハンダを用い、実施例3と同様のパイレックス(登録商標)ガラス製H型の連続式電解槽を用いて電解精製を実施した。陽極室には該合金141.7gを、陰極室には別途準備した純度99.999重量%の金属インジウム48.5gを仕込んだ。仕込みの溶融塩重量は135.3gであり、その組成は一塩化インジウム46.6重量%(=45.3モル%)、塩化亜鉛54.7モル%、水分含有量0.4重量%とした。該電解槽の陽極と陰極にステンレス導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を290℃とし、電解槽のガス相には、水蒸気濃度0.1vol%の窒素ガスを1.2L/hrで連続的に流通しながら溶融塩電解を実施した。
Comparative Example 4
Using the used indium solder used in Comparative Example 2, electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type continuous electrolytic cell as in Example 3. The anode chamber was charged with 141.7 g of the alloy, and the cathode chamber was charged with 48.5 g of 99.999 wt% metallic indium prepared separately. The weight of the molten salt charged was 135.3 g, and the composition thereof was 46.6% by weight of indium monochloride (= 45.3% by mole), 54.7% by mole of zinc chloride, and 0.4% by weight of water content. . Stainless steel wires are inserted into the anode and cathode of the electrolytic cell, the electrolytic cell is placed in an electric muffle furnace, the temperature of the electrolytic cell is 290 ° C., and nitrogen gas having a water vapor concentration of 0.1 vol% is added to the gas phase of the electrolytic cell. Molten salt electrolysis was performed while continuously flowing at 1.2 L / hr.
溶融塩電解は、実施例1にて用いた定電流装置を用い、電流値0.45A、電流密度20A/dm2に設定して連続通電した。陽極室のインジウムは電解され、保持量が減少するため、1日に1回使用済みインジウムハンダを供給した。陰極室に電析した金属インジウムはオーバーフロー管より連続的に流出させることで回収した。 Molten salt electrolysis was carried out continuously by using the constant current device used in Example 1 with a current value of 0.45 A and a current density of 20 A / dm 2 . Since indium in the anode chamber is electrolyzed and the holding amount decreases, used indium solder is supplied once a day. The metal indium electrodeposited in the cathode chamber was recovered by continuously flowing out from the overflow tube.
回収した金属インジウム重量、陰極室の電流効率、そして不純物スズ,銅,亜鉛の含有量を、以下の表4に示す。 The weight of recovered metal indium, the current efficiency of the cathode chamber, and the contents of impurities tin, copper, and zinc are shown in Table 4 below.
比較例5
比較例2に用いた使用済みインジウムハンダを用い、実施例3と同様のパイレックス(登録商標)ガラス製H型の連続式電解槽を用いて電解精製を実施した。陽極室には該合金137.5gを、陰極室には別途準備した純度99.999重量%の金属インジウム51.6gを仕込んだ。仕込みの溶融塩重量は115.4gであり、その組成は一塩化インジウム26.2重量%(=25.5モル%)、塩化アルミニウム(日本軽金属(株)、無水、純度99.0%以上)74.5モル%とした。この時の水分含有量は0.5重量%であった。該電解槽の陽極と陰極にステンレス導線を挿入し、電解槽ごと電気マッフル炉に入れ、電解槽の温度を250℃とした。溶融塩電解は、電流値0.45A、電流密度20A/dm2に設定して通電した。電解槽のガス相には、水蒸気濃度0.3vol%の窒素ガスを1.2L/hrで連続的に流通しながら溶融塩電解を実施した。
Comparative Example 5
Using the used indium solder used in Comparative Example 2, electrolytic purification was performed using the same Pyrex (registered trademark) glass H-type continuous electrolytic cell as in Example 3. The anode chamber was charged with 137.5 g of the alloy, and the cathode chamber was charged with 51.6 g of 99.999% by weight metallic indium prepared separately. The weight of the molten salt charged was 115.4 g, and the composition was 26.2% by weight of indium monochloride (= 25.5 mol%), aluminum chloride (Nippon Light Metal Co., Ltd., anhydrous, purity 99.0% or more) It was 74.5 mol%. The water content at this time was 0.5% by weight. Stainless steel wires were inserted into the anode and cathode of the electrolytic cell, and the electrolytic cell was placed in an electric muffle furnace, and the temperature of the electrolytic cell was 250 ° C. Molten salt electrolysis was conducted by setting the current value to 0.45 A and the current density to 20 A / dm 2 . Molten salt electrolysis was performed while continuously flowing nitrogen gas having a water vapor concentration of 0.3 vol% at 1.2 L / hr in the gas phase of the electrolytic cell.
その結果、運転開始13hr後、排ガスラインに白色固形物がスケーリングし、ラインが閉塞し、連続運転が困難となったため停止した。運転停止直前の陰極室から流出したインジウム中不純物含量を、以下の表5に示す。 As a result, 13 hours after the start of operation, white solids were scaled in the exhaust gas line, the line was closed, and continuous operation became difficult. Table 5 below shows the impurity content in the indium flowing out of the cathode chamber immediately before the shutdown.
この表から、陰極室から回収したインジウム中にはアルミニウム含有量が非常に多く、精製が不十分であった。 From this table, the indium recovered from the cathode chamber had a very high aluminum content and was not sufficiently purified.
実施例4
図1に示した溶融塩電解槽を用いて、以下の装置構成および溶融塩組成にて、金属インジウムを含む合金を陽極室に供給し、陰極室に精製した金属インジウムを電解析出させた。
1.装置構成
1)陽極室
大きさ:縦280mm×横350mm×深さ140mm、厚み5mm
材質:ステンレス鋼(SUS304)
形状:角槽(陽極液抜き出しノズル付き)
2)内筒
大きさ:縦250mm×横250mm×高さ250mm、厚み3mm
材質:石英ガラス
形状:角槽(底部:開口、側面下部:30mm×30mmのスリット各面2ヶ所、上部:ノズル2ヶ所付)
3)陰極室
大きさ:縦30mm×横200mm×深さ30mm、厚み3mm、5個
材質:石英ガラス
形状:角槽5個
2.溶融塩浴
組成:一塩化インジウム:塩化亜鉛=78:22(モル%)(=一塩化インジウム80重量%)、水分含量0.4wt%
電解温度:300℃
Example 4
Using the molten salt electrolytic cell shown in FIG. 1, an alloy containing metal indium was supplied to the anode chamber with the following apparatus configuration and molten salt composition, and purified metal indium was electrolytically deposited in the cathode chamber.
1. Apparatus configuration 1) Anode chamber size: length 280 mm × width 350 mm × depth 140 mm,
Material: Stainless steel (SUS304)
Shape: Square tank (with anolyte extraction nozzle)
2) Inner cylinder size: length 250mm x width 250mm x height 250mm, thickness 3mm
Material: Quartz glass Shape: Square bath (Bottom: Opening, Lower side: 30mm x 30mm slits, 2 on each side, Upper: With 2 nozzles)
3) Size of cathode chamber:
Electrolysis temperature: 300 ° C
陽極室1に供給した金属インジウム含有合金(陽極液9)の組成は、金属インジウム90.3wt%、金属スズ9.7wt%であり、電解運転開始時に80.1kgを仕込んだ。直流電源発生装置13(菊水電子工業(株)製、商品名「PAS10-105」)にて100Aを通電、陽極の電流密度は16A/dm2、陰極の電流密度は33A/dm2にて連続運転を実施した。陰極室8に電解析出した金属インジウムは1日当り平均10.2kgで、導出口7から連続的に回収できた。陽極室1には前記組成の合金を1日当り10.2kgずつ供給した。運転開始14日目に、陽極室1に保持しているインジウム含有合金のスズ含量がやや高くなってきたため、電解運転を継続したまま、抜き出しノズル4から陽極液9を40.2kgを抜き出し、代わりに前記組成の合金を40.2kgを溶融状態で供給し、電解を継続した。この陽極液交換の際、溶融塩10は大気と接触することなく操作でき、溶融塩10の変色や固化などの劣化は全く見られなかった。
The composition of the metal indium-containing alloy (anolyte 9) supplied to the
この14日間の溶融塩電解精製によって陰極に電解析出した金属インジウム中のスズ含量は580wtppm、抜き出しノズル4から抜き出した陽極液中のスズ含量は25.6wt%であった。又、溶融塩中の水分含量は0.3wt%であった。
The tin content in the metal indium electrodeposited on the cathode by the 14-day molten salt electrolytic purification was 580 wtppm, and the tin content in the anolyte extracted from the
実施例5
実施例4に示した装置構成にて、金属スズを含む合金(陽極液9)を陽極室1に供給し、陰極室8に精製した金属スズを電解析出させた。なお、溶融塩10の組成は、塩化スズ76wt%、塩化亜鉛24wt%の混合溶融塩とし、電解温度は350℃とした。
Example 5
In the apparatus configuration shown in Example 4, an alloy containing metal tin (anolyte 9) was supplied to the
陽極室1に供給した金属スズ含有合金の組成は、金属スズ95.3wt%、金属鉛4.7wt%であり、電解運転開始時に80.3kgを仕込んだ。直流電源発生装置13(菊水電子工業(株)製、商品名「PAS10-105」)にて100A通電し連続運転を実施した。陰極室8に電解析出した金属スズは1日当り平均5.3kgで、導出口7から連続的に回収できた。陽極室1には前記組成の合金を1日当り5.3kgずつ供給した。運転開始14日目に、陽極室1に保持しているスズ含有合金の鉛含量が高まってきたため、電解運転を継続したまま、抜き出しノズル4から陽極液9を41.2kg抜き出し、前記組成の合金を41.2kg供給し、電解を継続した。
The composition of the metal tin-containing alloy supplied to the
この14日間の溶融塩電解精製によって、陰極に電解析出した金属スズ中の鉛含量は12wtppm、抜き出しノズル4から抜き出した陽極液中の鉛含量は8.7wt%であった。
As a result of the 14-day molten salt electrolytic purification, the lead content in the metal tin electrolytically deposited on the cathode was 12 wtppm, and the lead content in the anolyte extracted from the
1…陽極室、2…内筒、3…導入口、4…抜き出しノズル、5…不活性ガス導入口、6…排ガス排出口、7…導出口、8…陰極室、9…陽極液、10、18…溶融塩、11…陰極液、12…ヒーター、13…直流電源発生装置、14…陽極用導線、15…陰極用導線、16…陽極(室)粗In合金、17…陰極(室)精製In、19:陽極用導線(保護管付白金導線)、20:陰極用導線(保護管付白金導線)、21…密栓、22…陽極(室)粗In合金、23…陰極(室)精製In、24…溶融塩、25…陽極用導線(SUS線)、26…陰極用導線(SUS線)、27…粗In合金投入口、28…精製Inオーバーフロー口、29…ガス導入口、30…排ガス出口、31…ガス連通管
DESCRIPTION OF
Claims (21)
前記塩化インジウム-塩化亜鉛溶融塩中、塩化インジウム含有量が68重量%以上であり、水分含有量が0.5重量%以下である金属インジウムの製造方法。 Metal indium-containing alloy as anode, metal indium as cathode, indium chloride-zinc chloride molten salt containing indium chloride as main component is used as electrolyte, and indium is eluted from anode as cation by molten salt electrolysis A method for producing metal indium that deposits metal indium,
A method for producing metallic indium, wherein the indium chloride-zinc chloride molten salt has an indium chloride content of 68% by weight or more and a water content of 0.5% by weight or less.
前記低融点金属を含む合金の液状物を収容し、陽極用導線を挿入可能な開口を有する陽極室と、
収容された前記液状物上に前記低融点金属のハロゲン化物の溶融塩層を保持し、当該溶融塩層を外部に流出させずに前記陽極室内で前記液状物を連通させるための内筒と、
精製後の前記低融点金属の導入口及び導出口を有し、当該導入口が前記溶融塩層内に位置するように配置されており、陰極用導線を挿入可能で内部が前記低融点金属で充填された陰極室と、を備える、溶融塩電解槽。 A molten salt electrolytic cell for purifying a low melting point metal,
An anode chamber containing an alloy liquid containing the low-melting-point metal and having an opening into which an anode conductor can be inserted;
An inner cylinder for holding the molten salt layer of the low-melting-point metal halide on the contained liquid material, and allowing the liquid material to communicate in the anode chamber without causing the molten salt layer to flow outside;
It has an inlet and an outlet for the low-melting-point metal after purification, and is arranged so that the inlet is located in the molten salt layer. The lead wire for the cathode can be inserted, and the inside is the low-melting-point metal. A molten salt electrolysis cell comprising: a filled cathode chamber.
前記陽極室にインジウム、スズ及びガリウムから選ばれる1種以上の金属を含む合金を収容し、前記内筒内の当該合金の液状物上に、前記金属に対応する金属ハロゲン化物の溶融塩を保持させ、陽極用導線及び陰極用導線を挿入した状態で電圧を印加することにより、溶融塩電解させ、前記陰極室の導出口から、精製されたインジウム、スズ及びガリウムから選ばれる1種以上の金属を導出させる、低融点金属の精製法。 The molten salt electrolyzer according to any one of claims 10 to 18,
An alloy containing one or more metals selected from indium, tin and gallium is accommodated in the anode chamber, and a molten metal halide corresponding to the metal is held on the liquid material of the alloy in the inner cylinder. One or more metals selected from purified indium, tin, and gallium from the outlet of the cathode chamber by applying a voltage with the anode conductor and cathode conductor inserted, and performing molten salt electrolysis A method for purifying low melting point metals.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-280006 | 2009-12-10 | ||
| JP2009280006A JP5532886B2 (en) | 2009-12-10 | 2009-12-10 | Method for producing metallic indium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2011071151A1 true WO2011071151A1 (en) | 2011-06-16 |
Family
ID=44145694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2010/072248 Ceased WO2011071151A1 (en) | 2009-12-10 | 2010-12-10 | Method for producing indium metal, molten salt electrolytic cell, and method for purifying low melting point metal |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5532886B2 (en) |
| TW (1) | TW201139693A (en) |
| WO (1) | WO2011071151A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102978665A (en) * | 2012-12-21 | 2013-03-20 | 江西稀有金属钨业控股集团有限公司 | Abnormal tungsten cathode or molybdenum cathode |
| KR101717204B1 (en) | 2016-01-22 | 2017-03-17 | (주)코리아테크노브레인 | Apparatus for recovering metal including indium, system for recovering indium and method for recovering indium from indium-tin metral |
| WO2018187194A1 (en) * | 2017-04-03 | 2018-10-11 | Battelle Energy Alliance, Llc | System for determining molten salt mass, and related methods |
| CN110419103A (en) * | 2017-03-08 | 2019-11-05 | 欧司朗光电半导体有限公司 | For manufacturing the method and opto-electronic device of opto-electronic device |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140212347A1 (en) * | 2011-08-17 | 2014-07-31 | Jernkontoret Ab | Recovery of lead and indium from glass, primarily from electronic waste material |
| US9150973B2 (en) * | 2011-08-19 | 2015-10-06 | Jernkontoret Ab | Process for recovering metals and an electrolytic apparatus for performing the process |
| KR101719307B1 (en) * | 2016-02-26 | 2017-03-23 | 주식회사 엔코 | Method for recovering high-purity indium compound using the complex fused-saltmolten salt electrorefining |
| KR102255478B1 (en) * | 2019-05-08 | 2021-05-25 | 한국생산기술연구원 | Method of controlling impurity of indium metal by electrolytic refining of molten salt |
| CN112961985B (en) * | 2021-02-01 | 2023-06-13 | 韶关市欧莱高纯材料技术有限公司 | Fire recovery process for recovering refined indium from target material recovered material |
| KR102715581B1 (en) * | 2021-12-22 | 2024-10-11 | 주식회사 퀀타머티리얼스 | Method of high purity indium-gallium collecting from igzo waste targer |
| CN116121816A (en) * | 2022-12-26 | 2023-05-16 | 郑州大学 | Method and device for recycling and preparing indium tin alloy from waste indium tin oxide target |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU531380A1 (en) * | 1970-05-25 | 1978-07-05 | Новосибирский оловозавод | Method of indium electrolytic refining |
| JP2001174590A (en) * | 1999-12-15 | 2001-06-29 | Toshiba Corp | Radioactive waste treatment method |
| WO2006046800A1 (en) * | 2004-10-26 | 2006-05-04 | 9Digit Company Limited | Method for manufacturing high purity indium and apparatus therefor |
-
2009
- 2009-12-10 JP JP2009280006A patent/JP5532886B2/en active Active
-
2010
- 2010-12-06 TW TW99142414A patent/TW201139693A/en unknown
- 2010-12-10 WO PCT/JP2010/072248 patent/WO2011071151A1/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU531380A1 (en) * | 1970-05-25 | 1978-07-05 | Новосибирский оловозавод | Method of indium electrolytic refining |
| JP2001174590A (en) * | 1999-12-15 | 2001-06-29 | Toshiba Corp | Radioactive waste treatment method |
| WO2006046800A1 (en) * | 2004-10-26 | 2006-05-04 | 9Digit Company Limited | Method for manufacturing high purity indium and apparatus therefor |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102978665A (en) * | 2012-12-21 | 2013-03-20 | 江西稀有金属钨业控股集团有限公司 | Abnormal tungsten cathode or molybdenum cathode |
| CN102978665B (en) * | 2012-12-21 | 2016-05-18 | 江西稀有金属钨业控股集团有限公司 | A kind of special-shaped tungsten cathode or molybdenum negative electrode |
| KR101717204B1 (en) | 2016-01-22 | 2017-03-17 | (주)코리아테크노브레인 | Apparatus for recovering metal including indium, system for recovering indium and method for recovering indium from indium-tin metral |
| CN110419103A (en) * | 2017-03-08 | 2019-11-05 | 欧司朗光电半导体有限公司 | For manufacturing the method and opto-electronic device of opto-electronic device |
| CN110419103B (en) * | 2017-03-08 | 2024-04-26 | 欧司朗光电半导体有限公司 | Method for producing an optoelectronic component and optoelectronic component |
| WO2018187194A1 (en) * | 2017-04-03 | 2018-10-11 | Battelle Energy Alliance, Llc | System for determining molten salt mass, and related methods |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201139693A (en) | 2011-11-16 |
| JP2011122197A (en) | 2011-06-23 |
| JP5532886B2 (en) | 2014-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2011071151A1 (en) | Method for producing indium metal, molten salt electrolytic cell, and method for purifying low melting point metal | |
| Fray et al. | Reduction of titanium and other metal oxides using electrodeoxidation | |
| JP5043027B2 (en) | Recovery method of valuable metals from ITO scrap | |
| US20180119299A1 (en) | Method and apparatus for producing metal by electrolytic reduction | |
| JP5043029B2 (en) | Recovery method of valuable metals from ITO scrap | |
| US6843896B2 (en) | Apparatus for processing metals | |
| US20180245177A1 (en) | Optimized ore processing using molten salts for leaching and thermal energy source | |
| WO2008053616A1 (en) | Method for collection of valuable metal from ito scrap | |
| CN115305503A (en) | Method for preparing metal lithium by molten salt electrolysis | |
| CN102408134A (en) | Electrochemical dissolution method of iridium powder | |
| JP5544746B2 (en) | Method for producing metallic indium | |
| JPH0684551B2 (en) | Process for producing praseodymium or praseodymium-containing alloy | |
| US3983018A (en) | Purification of nickel electrolyte by electrolytic oxidation | |
| Kartal et al. | Direct electrochemical reduction of copper sulfide in molten borax | |
| CN110629042A (en) | A kind of tartaric acid system leaching antimony oxide material and method for electrowinning metal antimony | |
| GB2534332A (en) | Method and apparatus for producing metallic tantalum by electrolytic reduction of a feedstock | |
| Shamsuddin | Electrometallurgy | |
| JP2014133939A (en) | Method for producing titanium | |
| JP4087196B2 (en) | Method for recovering ruthenium and / or iridium | |
| RO132597B1 (en) | Process for recovering precious metals from electrical and electronic waste by anodic dissolution in ionic liquids | |
| JPH024994A (en) | Manufacture of neodymium or neodynium alloy | |
| JP5707925B2 (en) | Molten salt electrolytic cell and method for purifying low melting point metal | |
| Jayakumar et al. | Molten Salt Electrowinning of Metals and Materials: Opportunities and Challenges | |
| Fray | Electrochemical processing using slags, fluxes and salts | |
| CN105063660B (en) | A kind of method that nano-silicon powder is directly prepared in electrorefining processes |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10836070 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 10836070 Country of ref document: EP Kind code of ref document: A1 |