WO2010113777A1 - Photosensitive material, photosensitive-material precursor, and process for producing photosensitive material - Google Patents

Abstract

A photosensitive material which comprises a polymer matrix including a cyclic oligosaccharide derivative as a structural unit, a radical-polymerizable monomer, and a free-radical photopolymerization initiator.

Description

Photosensitive material, photosensitive material precursor and method for producing photosensitive material

The present invention relates to a photosensitive material that can be suitably used as an optical product for forming a refractive index modulation structure in a material, particularly as a hologram recording medium, a precursor thereof, and a manufacturing method thereof.

Phase-type holograms, in which a light-dark interference pattern caused by coherent light interference is recorded as a refractive index modulation structure in a photosensitive material, have higher transmittance and diffraction efficiency than amplitude-type holograms. It has the feature that can be used effectively. Utilizing this feature, application to optical products such as a holographic optical element (HOE) such as a hologram recording medium, an optical filter, a beam splitter, and a head mounted display has been studied, and a part of them has been put into practical use.

In recent years, formation of a photonic crystal structure by three-dimensional holographic lithography (for example, Non-Patent Document 1), formation of an optical waveguide by three-dimensional direct-write photolithography (for example, Non-Patent Document 2), etc. An optical product manufacturing method for forming a desired refractive index distribution structure in a photosensitive material has been studied.

As the photosensitive material, a photosensitive resin (hereinafter also referred to as a photopolymer) is used in consideration of the convenience in manufacturing the optical product, the variety of raw material selection, the stability of the manufactured optical product, and the like. It is advantageous to use.

Photopolymer exposure is generally accompanied by volume shrinkage (hereinafter also simply referred to as shrinkage) caused by the polymerization reaction of monomers. This shrinkage causes distortion and shift in the modulation structure or distribution structure, and becomes a serious problem particularly when a photopolymer is used in the optical product.

For example, when a photopolymer is used for a hologram recording medium, if the shrinkage due to light irradiation during recording or immobilization processing is large, the incident angle and wavelength satisfying the Bragg condition of the reproduction reference light due to distortion or deviation of the modulation structure may be As a result, there is a problem that sufficient diffracted light intensity cannot be obtained when reproducing recorded information. If this contraction is to some extent and isotropic, it can be compensated optically. However, control such as adjustment of the incident angle and wavelength adjustment of the reproduction reference light is necessary on the system side. The problem of complication arises. On the other hand, when the shrinkage is anisotropic, it is difficult to compensate even by the system control as described above, and it becomes difficult to accurately reproduce the recorded information.

Patent Document 1 discloses a technique using cationic ring-opening polymerization in which shrinkage caused by a polymerization reaction is relatively small. Specifically, a hologram recording medium including a photoacid generator, a binder polymer, and a bifunctional and polyfunctional epoxide monomer or oligomer having a specific structure is disclosed. This technique utilizes cationic ring-opening polymerization as a polymerization reaction during optical recording, in which shrinkage accompanying polymerization is relatively small compared to radical polymerization. However, it cannot be said that the shrinkage rate is sufficiently low, and cationic polymerization has a problem that it is difficult to control the molecular weight of the polymer to be produced, and further improved materials have been demanded.

Patent Document 2 discloses a technique using a cleavage reaction in combination. Specifically, a recording medium comprising a recording layer containing a photoacid generator and a polymer in which a polymerizable substituent is bonded to a side chain via a functional group that can be cleaved in the presence of an acid is disclosed. In this technique, the cleavage reaction of the polymer side chain and the polymerization reaction of the polymerizable compound derived from the cleavage side chain are used in combination during optical recording, and the expansion associated with the cleavage reaction and the shrinkage associated with the polymerization reaction are offset. This is intended to reduce the shrinkage rate. However, it is necessary to use a solvent when producing the recording medium, and there is a problem that the thickness is limited in producing a uniform recording layer. In addition, the molecular weight of the polymer is substantially limited to ensure solvent solubility, and is further reduced by side chain cleavage during optical recording, so there is a concern about stability (archival life) after recording. The

Patent Document 3 discloses a technique using an organic-inorganic hybrid matrix. Specifically, a hologram recording material including at least an organometallic compound having a specific structure and a monofunctional polymerizable compound is disclosed. This technique is intended to reduce shrinkage by combining an organic-inorganic hybrid matrix having a relatively rigid structural unit with a monofunctional polymerizable compound that hardly forms a crosslinked structure by a polymerization reaction. However, as in the case of Patent Document 2, it is necessary to use a solvent when producing a recording material, and there is a problem that the thickness is limited in producing a uniform recording layer.

Patent Document 4 discloses an optical product in which a photopolymerizable compound is dispersed in a three-dimensional crosslinked polymer matrix formed in a manufacturing process (in-situ). Here, the three-dimensional cross-linked polymer matrix not only plays a role of imparting physical strength to the optical product to maintain the shape, but also suppresses excessive movement of the photopolymerizable compound, and also causes a polymerization reaction of the photopolymerizable compound It is thought to play a role in reducing volume shrinkage caused by (Non-patent Document 3). Although there is a report of 0.3% (for example, Patent Document 4 and Example 4) as the shrinkage ratio of the optical product obtained by this technique, there is still room for improvement.

In addition, in order to satisfy the compatibility requirements necessary for obtaining the high transparency required for the optical product, combinations of the three-dimensional crosslinked polymer matrix with the photopolymerizable compound and its polymer are limited. There is a problem that the difference in refractive index cannot be made large.

Non-Patent Document 4 includes a research example in which pseudo-polyrotaxane prepared from β-cyclodextrin and both amino-terminated polypropylene glycols is used as a starting material to reduce curing shrinkage of a thermosetting epoxy resin composition. Has been reported. This technique utilizes the thermal dissociation of β-cyclodextrin from the pseudopolyrotaxane, and one of the evidences that dissociation of β-cyclodextrin is that the cured product becomes cloudy. Therefore, it is difficult to apply this technology to optical products where transparency is an essential requirement.

As described above, photosensitive materials, particularly photosensitive materials used for optical products such as hologram recording media, have been improved in performance by various methods, but are still not sufficient, and volume shrinkage during exposure is not sufficient. Therefore, there is a demand for providing a photosensitive material that is small in size and excellent in transparency.

Special table 2001-523842 JP 2005-10378 A JP 2007-156451 A Japanese Patent Laid-Open No. 11-352303

M.M. Campbell, D.C. N. Sharp, M .; T.A. Harrison, R.A. G. Denning, and A.G. J. et al. Turbofield, Fabrication of photonic crystals for the visible spectrum by holographic lithography, Nature, vol. 404, pp. 53-56 (2000). A. C. Sullivan, M .; W. Grabowski, and R.M. R. McLeod, Three-dimensional, direct-write, lithography into photopolymer, Applied Optics, vol. 46, pp. 295-301 (2007). T.A. J. et al. Trendler, J .; E. Boyd and V. L. Colvin, Epoxy Resin-Photopolymer Compositions for Volume Holography, Chemistry of Materials, Vol. 12, pp. 1431-1438 (2000). Y. Isobe, A.M. Sudo, and T.A. Endo, Thermally Dissociable Pseudo-Polyrotaxane as a Supramolecular Shrinkage Superpressor Epoxy-AmineCorporationPool, Journey. 46, pp. 2305-2308 (2008).

The present invention provides a photosensitive material having a small volume shrinkage during exposure and excellent transparency, which can be suitably used as an optical product for forming a refractive index modulation structure in the material, particularly as a hologram recording medium. The purpose is to do.

In order to achieve the above object, the present invention relates to a photosensitive material comprising a polymer matrix containing a cyclic oligosaccharide derivative as a structural unit, a radical polymerizable monomer and a photo radical polymerization initiator.

The inventors of the present invention conducted intensive studies to achieve the above object. As a result, by including a cyclic oligosaccharide derivative as a constituent unit of the polymer matrix, when the photosensitive material is exposed to produce an optical product, volume shrinkage of the photosensitive material is suppressed and transparency is improved. I found that I can do it. Therefore, according to the photosensitive material, it is possible to provide a photosensitive material that can be suitably used particularly as a hologram recording medium and has a small volume shrinkage during exposure and excellent transparency.

In addition, it is not clear why a photosensitive material having a small volume shrinkage at the time of exposure of the photosensitive material and containing a cyclic oligosaccharide derivative as a constituent unit of the polymer matrix can be obtained. It is believed that the cyclic oligosaccharide derivatives are effective in shrinkage resistance resulting from rigidity, shrinkage relaxation resulting from the inclusion of polymerizable monomers, and low crystallinity resulting from bulkiness.

The photosensitive material comprises a polymer matrix forming component containing a cyclic oligosaccharide derivative, a radical polymerizable monomer and a photo radical polymerization initiator, and the polymer matrix forming component is polymerized by a reaction excluding the photo radical polymerization reaction. And preparing a photosensitive material precursor characterized in that the polymer matrix is formed, and the photosensitive material precursor is polymerized by a reaction other than a photo-radical polymerization reaction as described above. It can be obtained by forming a matrix.

Further, the polymer matrix of the photosensitive material of the present invention preferably contains a radical polymerizable compound represented by the chemical formula (1) as a structural unit. Similarly, the polymer matrix-forming component of the photosensitive material precursor of the present invention preferably contains a radical polymerizable compound represented by the chemical formula (1).

（式中、Ａｒは１以上の芳香環を有する２価の基を表し、Ｒ^１、Ｒ^２はそれぞれ水素原子又はメチル基を表し、Ｌ^１は酸素原子、硫黄原子又は－（ＯＲ^３）_ｎＯ－を表し、Ｒ^３はアルキレン基であり、ｎは１～４の数であり、Ｌ^２は芳香環を有してもよい２価の基を表す。）なお、アルキレン基の炭素数は１～６であることが好ましく、１～４であることがより好ましく、１～３であることが特に好ましい。

(In the formula, Ar represents a divalent group having one or more aromatic rings, R ¹ and R ² each represents a hydrogen atom or a methyl group, and L ¹ represents an oxygen atom, a sulfur atom, or — (OR ³ ) _n. O- represents, R ³ is an alkylene group, n is a number from 1 to 4, and L ² represents a divalent group which may have an aromatic ring.) The carbon number of the alkylene group is It is preferably 1 to 6, more preferably 1 to 4, and particularly preferably 1 to 3.

In this case, the presence of an aromatic ring in the polymer matrix makes the polymer matrix and radically polymerizable because it is highly compatible and hardly turbid even when a high-refractive-index radically polymerizable monomer having an aromatic ring in the molecule is used. The difference in refractive index from the monomer or polymer thereof can be increased, and the degree of refractive index modulation of the photosensitive material can be increased. In addition, since at least part of the radical polymerizable monomer can be reacted and copolymerized with the radical polymerizable group present in the polymer matrix when the photosensitive material is exposed to light, compatibility is improved and transparency is improved. The formed refractive index modulation structure is stabilized.

Further, the above-described photosensitive material can be suitably used particularly as a hologram recording medium.

As described above, according to the present invention, an optical product that forms a refractive index modulation structure in a material, particularly a hologram recording medium that can be suitably used, has a small volume shrinkage during exposure and has excellent transparency. Sex material can be provided.

Hereinafter, details of the present invention and other features and advantages will be described in detail based on embodiments.

[Cyclic oligosaccharide derivatives]
In the present invention, various known cyclic oligosaccharide derivatives can be used as the cyclic oligosaccharide derivative contained as a constituent unit of the polymer matrix or a polymer matrix-forming component. Known cyclic oligosaccharides include, for example, cyclodextrin (cyclic glucooligosaccharide consisting of α-1,4 bonds), cyclodextran (cyclic glucooligosaccharide consisting of α-1,6 bonds), cyclomannin (α-1,4 bonds). And cyclic alno-oligosaccharides composed of α-1,4 bonds), cycloawadolin (cyclic rhamno-oligosaccharides composed of α-1,4 bonds), and the like.

Among the cyclic oligosaccharides, cyclodextrin derivatives are preferable from the viewpoint of availability and cost, and α-cyclodextrin derivatives or β-cyclodextrin derivatives are more preferable. Cyclodextrin is a kind of oligosaccharide in which a plurality of glucoses form a cyclic structure with α-1,4 bonds, and has pores inside the cyclic structure. These vacancies are known to have an inclusion effect of taking in molecules of an appropriate size. Utilizing this property, water solubility is added to poorly water-soluble drugs, and volatile components in foods are stabilized. It is already widely used in industry, such as deodorization in the living environment.

As the derivative, from the viewpoint of compatibility with the components constituting the photosensitive material of the present invention, an alkylated derivative in which at least a part of a plurality of hydroxyl groups of the cyclic oligosaccharide is converted to an alkoxy group, a hydroxyalkoxyl group Hydroxyalkylated derivatives converted to acetylated derivatives converted to acetoxyl groups are preferred.

The content of the cyclic oligosaccharide derivative is preferably 1 to 40% by weight, more preferably 5 to 35% by weight, more preferably 10 to 30% by weight with respect to the polymer matrix (in the case of the photosensitive material precursor, the entire polymer matrix-forming component). More preferred is weight percent. If the content of the cyclic oligosaccharide derivative is too high, the viscosity of the photosensitive material precursor becomes high and the production of the photosensitive material becomes complicated, and the elastic modulus and glass transition point of the photosensitive material become high, resulting in refraction. The sensitivity of the rate modulation structure formation may decrease. On the other hand, if the content of the cyclic oligosaccharide derivative is too low, sufficient effects may not be obtained.

The reason why a photosensitive material having a small volume shrinkage during exposure of the photosensitive material and having excellent transparency can be obtained by including a cyclic oligosaccharide derivative as a constituent unit of the polymer matrix is not clear. It is also considered that the sugar derivatives are effective in shrinkage resistance due to rigidity, shrinkage relaxation due to inclusion of polymerizable monomers, low crystallinity due to bulkiness, and the like. Other effects expected by including a cyclic oligosaccharide derivative as a constituent unit of the polymer matrix include imparting biodegradability to the photosensitive material.

[Polymer matrix and polymer matrix forming component]
In the present invention, the polymer matrix is preferably formed by causing polymerization by a reaction other than the photoradical polymerization reaction to the polymer matrix forming component in the photosensitive material precursor. Preferably, the polymer matrix is formed in the manufacturing process of the photosensitive material (in-situ). In this case, the polymer matrix forming component in the photosensitive material precursor is polymerized in the presence of a radical polymerizable monomer and a photo radical polymerization initiator to form a polymer matrix. At this time, if the radical polymerizable monomer or the photo radical polymerization initiator reacts and decreases, the performance as a photosensitive material is lowered, so that a polymer matrix can be formed without reducing them as much as possible. It is preferable to make it.

In the present invention, “polymerization by a reaction other than photoradical polymerization reaction” includes polymerization involving unsaturated groups, as well as condensation and polyaddition, and the monomer (compound as a monomer) is an oligomer exhibiting polymerizability. Including.

Specifically, polycondensation reaction, isocyanate-hydroxyl polyaddition reaction (polyurethane formation), isocyanate-amine polyaddition reaction (polyurea formation), isocyanate-thiol polyaddition reaction, epoxy-amine polyaddition reaction, epoxy-thiol polyaddition reaction Examples include addition reaction, episulfide-amine polyaddition reaction, episulfide-thiol polyaddition reaction and the like. Preferred is an isocyanate-hydroxyl polyaddition reaction.

In order to form a polymer matrix without substantially reducing radically polymerizable monomers, radical photopolymerization initiators, or radically polymerizable compounds represented by the chemical formula (1) described below, what is radical photopolymerization? It is preferable to mix a reaction catalyst or adjust the reaction temperature so that polymerization in another reaction form occurs preferentially.

The reaction for forming the polymer matrix without substantially reducing the radical polymerizable monomer, the photo radical polymerization initiator, or the radical polymerizable compound represented by the chemical formula (1) is promoted by using an appropriate catalyst. Can be made. For example, as a catalyst for isocyanate-hydroxyl polyaddition reaction, tin compounds such as dimethyltin dilaurate and dibutyltin dilaurate, 1,4-diazabicyclo [2,2,2] octane (DABCO), imidazole derivatives, 2,4,6- Tertiary amine compounds such as tris (dimethylaminomethyl) phenol and N, N-dimethylbenzylamine can be used. These catalysts may be used alone or in combination of two or more.

When the case where the polyurethane obtained by the isocyanate-hydroxyl polyaddition reaction is a polymer matrix is described as an example, an isocyanate compound and a hydroxy compound are polymer matrix forming components. In this case, the cyclic oligosaccharide derivative is included as a constituent unit of the polymer matrix or a polymer matrix forming component.

As the isocyanate compound, an isocyanate compound having two or more isocyanate groups in one molecule or a mixture thereof is used. For example, tolylene diisocyanate (TDI), diphenylmethane-4,4′-diisocyanate (MDI), xylylene diisocyanate (XDI), tetramethylxylylene diisocyanate (TMXDI), naphthylene-1,5-diisocyanate (NDI), triphenyl Methane-4,4 ′, 4 ′ ′ -triisocyanate, dicyclohexylmethane-4,4′-diisocyanate (H12MDI), hydrogenated xylylene diisocyanate (H6XDI), hexamethylene diisocyanate (HDI), trimethylhexamethylene diisocyanate (TMHDI) , Isophorone diisocyanate (IPDI), norbornane diisocyanate (NBDI), cyclohexane-1,3,5-triisocyanate and their isocyanates Trimer derived from compounds, biuret, adduct, such as pre-polymers. These isocyanate compounds may be used alone or in combination of two or more.

As the hydroxy compound, a hydroxy compound having two or more hydroxyl groups in one molecule or a mixture thereof is used. For example, polyether polyols, polyester polyols, polycarbonate diols and the like can be mentioned. These hydroxy compounds may be used alone or in combination of two or more.

Further, the polymer matrix and the polymer matrix forming component can contain a radical polymerizable compound represented by the chemical formula (1). As a result, the following advantages can be obtained. In other words, the presence of an aromatic ring in the polymer matrix means that the polymer matrix and the radical polymerizable monomer are highly compatible and difficult to cause turbidity even when a high refractive index radical polymerizable monomer having an aromatic ring in the molecule is used. And the difference in refractive index with the polymer thereof can be increased, and the degree of refractive index modulation of the photosensitive material can be increased.

In addition, since at least part of the radical polymerizable monomer can be reacted and copolymerized with the radical polymerizable group present in the polymer matrix when the photosensitive material is exposed to light, compatibility is improved and transparency is improved. The formed refractive index modulation structure can be stabilized.

In addition, when the polymer matrix forming component contains a radical polymerizable compound represented by the chemical formula (1), it is preferable to participate in the formation of the polymer matrix without substantially reducing the radical polymerizable group. For that purpose, the compound represented by the chemical formula (1) preferably has another polymerizable functional group in addition to the radical polymerizable group. The other polymerizable functional group may not be a radical polymerizable group, and two or more types such that one has an OH group and the other has a carboxylic acid group or a derivative group thereof, as in the case of polymerization with an ester bond. It may consist of these compounds.

The content of the radically polymerizable compound represented by the chemical formula (1) is preferably 0.5 to 20% by weight with respect to the polymer matrix (in the case of the photosensitive material precursor, the entire polymer matrix forming component), preferably 1 to 10% by weight is more preferred, and 2-6% by weight is even more preferred. If the content of the radically polymerizable compound represented by the chemical formula (1) is too high, the viscosity of the photosensitive material precursor becomes high and the production of the photosensitive material becomes complicated, and the shrinkage reduction effect by the cyclic oligosaccharide derivative May be damaged. On the other hand, if the radically polymerizable compound represented by the chemical formula (1) is not contained or if the content is too low, the compatibility between the polymer matrix and the radically polymerizable monomer or the polymer is lowered, and the photosensitive material becomes cloudy. May occur.

As the radically polymerizable compound represented by the chemical formula (1), compounds represented by the chemical formulas (2) to (5) are preferably used.

In chemical formulas (2) to (5), R ¹ represents a hydrogen atom or a methyl group, R ⁴ independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R ⁵ represents a hydrogen atom, a halogen atom, or a halogen atom. An atom, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms is represented. L ¹ represents an oxygen atom, a sulfur atom or — (OR ³ ) _n O—, L ³ represents an oxygen atom, a sulfur atom, —C (O) O— or —N (R ⁶ ) —, and L ⁴ represents A single bond, an oxygen atom, a sulfur atom, a sulfonyl group or an alkylene group is represented. N represents a number of 1 to 4, R ³ represents an alkylene group, and R ⁶ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. The alkylene group preferably has 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms, and particularly preferably 1 to 3 carbon atoms.

Examples of the compound represented by the chemical formula (2) include 9,9-bis (4-hydroxyphenyl) fluorenediglycidyl ether (meth) acrylic acid adduct, 9,9-bis (4-hydroxy-3- And (meth) acrylic acid adduct of methylphenyl) fluorenediglycidyl ether, (meth) acrylic acid adduct of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorenediglycidyl ether, and the like.

Examples of the compound represented by the chemical formula (3) include 9,9-bis (4-hydroxyphenyl) fluorenediglycidyl ether vinyl benzoate adduct, vinyl phenol adduct, vinyl thiophenol adduct, Vinyl aniline adduct, vinyl benzoic acid adduct of 9,9-bis (4-hydroxy-3-methylphenyl) fluorenediglycidyl ether, vinyl phenol adduct, vinyl thiophenol adduct, vinyl aniline adduct, Examples include 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorenediglycidyl ether, vinyl benzoic acid adduct, vinyl phenol adduct, vinyl thiophenol adduct, vinyl aniline adduct, and the like.

Examples of the compound represented by the chemical formula (4) include (meth) acrylic acid adducts of bisphenol A type epoxy resins, (meth) acrylic acid adducts of bisphenol F type epoxy resins, and the like.

Examples of the compound represented by the chemical formula (5) include vinyl benzoic acid adduct, vinyl phenol adduct, vinyl thiophenol adduct, vinyl aniline adduct, bisphenol F type epoxy resin of bisphenol A type epoxy resin. And vinyl benzoic acid adduct, vinyl phenol adduct, vinyl thiophenol adduct, vinyl aniline adduct, and the like.

The compounds represented by the formula (1) or (2) to (5) may be used alone or in combination of two or more.

[Radically polymerizable monomer]
The photosensitive material of the present invention can be suitably used as an optical product for forming a refractive index modulation structure in the material, particularly as a hologram recording medium. In general, the optical product preferably has a high degree of refractive index modulation. For this purpose, it is advantageous to make the difference in refractive index between the polymer matrix and the radical polymerizable monomer or polymer as large as possible. For example, the refractive index difference can be increased by combining a polymer matrix having a lower refractive index and a radical polymerizable monomer having a higher refractive index.

The radical polymerizable monomer blended in the photosensitive material of the present invention or its precursor is not particularly limited as long as it is known to those skilled in the art, but a high refractive index radical having an aromatic ring in the molecule. It is preferable to use a polymerizable monomer.

Examples of the high refractive index radical polymerizable monomer having an aromatic ring in the molecule include styrene, chlorostyrene, bromostyrene, α-methylstyrene, divinylbenzene, vinylnaphthalene, divinylnaphthalene, vinylbiphenyl, divinylbiphenyl, vinyl, and the like. Terphenyl, vinylpyrene, indene, acenaphthylene, dibenzofulvene, phenyl (vinylphenyl) sulfide, benzyl (vinylbenzyl) sulfide, N-vinylcarbazole, phenyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, Naphthoxyethyl (meth) acrylate, tribromophenyl (meth) acrylate, tribromophenoxyethyl (meth) acrylate, alkylene oxide modified bisphenol Di (meth) acrylate of Nord A, di (meth) acrylate of 9,9-bis (4-hydroxyphenyl) fluorene, di (meth) acrylate of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene di (meth) acrylate, bis (4-methacryloylthiophenyl) sulfide, bis (4-vinylthiophenyl) sulfide, and the like. These radically polymerizable monomers may be used alone or in combination of two or more.

The blending amount of the radical polymerizable monomer is preferably 1 to 30% by weight, more preferably 2 to 25% by weight, and still more preferably 3 to 20% by weight with respect to the entire photosensitive material or photosensitive material precursor.

[Photo radical polymerization initiator]
As the radical photopolymerization initiator compounded in the photosensitive material of the present invention or a precursor thereof, various radical photopolymerization initiators known to those skilled in the art can be used, depending on the wavelength of light used. It is preferable to select and use as appropriate.

Preferred photoradical polymerization initiators include, for example, bis (η ⁵ -2,4-cyclopentadien-1-yl) bis (2,6-difluoro-3- (1H-pyrrol-1-yl) phenyl) titanium, Bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2-benzyl-2- (dimethylamino) -1- [4- (morpholine-4 -Yl) phenyl] butan-1-one, 2- (dimethylamino) -2- (4-methylbenzyl) -1- [4- (morpholin-4-yl) phenyl] butan-1-one, 2- Methyl-1- [4- (methylthio) phenyl] -2- (morpholin-4-yl) propan-1-one, 2,2-dimethoxy-1,2-diphenyl Tan-1-one, and the like (1-hydroxycyclohexyl) phenyl ketone.

The blending amount of the radical photopolymerization initiator varies depending on the kind of the radical photopolymerization initiator used, the blending amount of the radical polymerizable monomer, and the like. The range is preferably 0.05 to 20% by weight, more preferably 0.1 to 10% by weight, and still more preferably 0.2 to 5% by weight.

The photosensitive material and photosensitive material precursor of the present invention include a plasticizer, a compatibilizer, a chain transfer agent, a polymerization accelerator, a polymerization inhibitor, a surfactant, an antifoaming agent, a release agent, a stabilizer, You may further contain additives, such as antioxidant and a flame retardant, as needed.

[Manufacture of photosensitive materials]
The manufacturing method of the photosensitive material of this invention is demonstrated. First, a photosensitive material precursor of the present invention, that is, a photosensitive material precursor comprising a polymer matrix forming component, a radical polymerizable monomer and a photo radical polymerization initiator, and containing a cyclic oligosaccharide derivative as the polymer matrix forming component is prepared. To do. Next, the polymer matrix forming component is polymerized by a reaction other than the photoradical polymerization reaction to form a polymer matrix. In this case, the polymer matrix is formed by polymerizing a polymer matrix-forming component in the presence of a radical polymerizable monomer and a photo radical polymerization initiator.

Preferably, the polymer matrix is formed in the manufacturing process (in-situ) of the photosensitive material. In this case, the photosensitive material precursor is applied to a transparent base material such as glass, polycarbonate, polymethyl methacrylate, or cycloolefin polymer, or injected between the base materials, and then polymerization by a reaction other than the photoradical polymerization reaction occurs. For example, a polymer matrix can be formed.

Thereby, a photosensitive material comprising a radical polymerizable monomer and a photo radical polymerization initiator in a polymer matrix containing a cyclic oligosaccharide derivative as a constituent unit can be obtained.

A protective layer may be provided between the base material and the photosensitive material for the purpose of blocking oxygen and moisture. For the protective layer, for example, a film equivalent to the above-mentioned base material, a film such as polyolefin, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyethylene terephthalate or polyethylene-2,6-naphthalenedicarboxylate, glass, or the like is used. Can do.

[Application of photosensitive materials]
The photosensitive material of the present invention is a holographic optical element (such as a volume phase hologram recording medium that records a light-dark interference pattern generated by coherent light interference as a refractive index modulation structure, an optical filter, a beam splitter, and a head-mounted display). (HOE) It is preferably used for applications such as a photonic crystal optical element produced by three-dimensional holographic lithography, or an optical waveguide produced by three-dimensional direct-write photolithography.

Hereinafter, the present invention will be specifically described by way of examples. However, the present invention is not limited to these examples.

Example 1
[Preparation of photosensitive material precursor]
Among polymer matrix forming components, 10.0 parts by weight of methylated β-cyclodextrin (manufactured by Tokyo Chemical Industry Co., Ltd., hydroxyl group equivalent 367.4 g / eq) as a cyclic oligosaccharide derivative (based on the entire polymer matrix forming component) 12.3 wt%), 9,9-bis (4-hydroxyphenyl) fluorenediglycidyl ether acrylic acid adduct (manufactured by Nippon Steel Chemical Co., Ltd.) as the radical polymerizable compound represented by the chemical formula (1) ASF-400) (refractive index n _D = 1.616) 4.0 parts by weight, hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) 22.4 parts by weight, polyether triol (manufactured by Sanyo Chemical Industries, Ltd.) GP-600, average molecular weight of 597) 44.9 parts by weight as a polymer matrix forming catalyst dibutyltin dilaurate (Tokyo Kasei) Kogyo Co., Ltd.) 0.045 parts by weight, phenyl (4-vinylphenyl) sulfide (manufactured by Nippon Steel Chemical Co., Ltd.) (refractive index n _D = 1.648) 15.0 wt. Part of bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium (Ciba・ Specialty Chemicals Co., Ltd. (Irgacure 784) 1.2 parts by weight and 2,4-diphenyl-4-methyl-1-pentene (Tokyo Chemical Industry Co., Ltd.) 2.5 parts by weight as a chain transfer agent Thus, a photosensitive material precursor was prepared.

[Production of hologram recording medium containing photosensitive material]
Next, the gap between two glass substrates (30 mm × 30 mm, thickness 1.2 mm) obtained by bonding the photosensitive material precursor prepared as described above through a silicon film spacer (thickness 0.2 mm). And a heat treatment at 60 ° C. for 5 hours in a nitrogen atmosphere to form a polymer matrix, thereby obtaining a transmission hologram recording medium containing a photosensitive material.

[Evaluation of Hologram Recording Medium Containing Photosensitive Material]
Next, the transmission hologram recording medium obtained as described above was evaluated using a two-beam interference type plane wave tester, SHOT-500G, manufactured by Pulstec Industrial Co., Ltd. A continuous wave (CW) all-solid-state laser (wavelength: 532 nm) was used for recording and reproduction of the hologram. The light intensity (total of ^two light beams) of the recording light on the recording medium was 7 mW / cm ^2, and angle multiplex recording (49 multiplex) was performed so that the total exposure amount was 5000 mJ / cm ² . The diffraction efficiency of the recorded hologram was calculated by the following equation using values obtained by reading the intensity of each of the diffracted light and transmitted light during reproduction with an optical power meter.
Diffraction efficiency (%) = [diffracted light intensity / (transmitted light intensity + diffracted light intensity)] × 100

Using this diffraction efficiency value, M / # (M number) was calculated by the following equation as an index of the multiple recording property of the hologram recording medium. The M / # of the hologram recording medium in this example was 2.3.
M / # = Σ√ (diffraction efficiency)

Further, the shrinkage rate accompanying recording was calculated as an apparent shrinkage rate from the difference (detune angle) between the angle at the time of hologram recording and the diffracted light peak top angle at the time of reproduction. The shrinkage rate of the hologram recording medium in this example was 0.2%. Further, the hologram recording medium in this example was transparent both before and after recording.

(Example 2)
Using 10.0 parts by weight of methylated-α-cyclodextrin (manufactured by CycloLab, Ltd., hydroxyl group equivalent: 273.4 g / eq) as a cyclic oligosaccharide derivative (12.3% by weight based on the entire polymer matrix-forming component), Except for 22.9 parts by weight of hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 44.3 parts by weight of polyether triol (manufactured by Sanyo Chemical Industries, Ltd., GP-600, average molecular weight 597), In the same manner as in Example 1, a transmission hologram recording medium containing a photosensitive material was prepared and evaluated. The obtained hologram recording medium had M / # of 3.1 and a shrinkage rate of 0.2%. Note that the hologram recording medium in this example was transparent both before and after recording.

(Comparative Example 1)
Without using a cyclic oligosaccharide derivative, 53 parts by weight of hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) 23.7 and 53 parts of polyether triol (manufactured by Sanyo Chemical Industry Co., Ltd., GP-600, average molecular weight 597) A photosensitive material precursor was prepared in the same manner as in Example 1 except that the amount was changed to 5 parts by weight. Using the obtained photosensitive material precursor, a transmission hologram recording medium was prepared and evaluated in the same manner as in Example 1. The resulting hologram recording medium had M / # of 2.0 and a shrinkage rate of 0.3%. In addition, the hologram recording medium in this example was transparent before recording, but slightly turbid after recording.

(Example 3)
Among the polymer matrix forming components, 15.0 parts by weight of methylated β-cyclodextrin (produced by Tokyo Chemical Industry Co., Ltd., hydroxyl equivalent 367.4 g / eq) as a cyclic oligosaccharide derivative (based on the entire polymer matrix forming component) 17.7 wt%), an acrylic acid adduct of 9,9-bis (4-hydroxyphenyl) fluorangeglycidyl ether (manufactured by Nippon Steel Chemical Co., Ltd.) as the radical polymerizable compound represented by the chemical formula (1), ASF-400) (refractive index n _D = 1.616) 4.0 parts by weight, hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) 20.1 parts by weight, polyether triol (manufactured by ADEKA Corporation, G- 700, average molecular weight 740) 45.7 parts by weight as a polymer matrix forming catalyst dibutyltin dilaurate (Tokyo Chemical Industry) 0.03 part by weight (made by Co., Ltd.) and 12.0 parts by weight of phenyl (4-vinylphenyl) sulfide (manufactured by Nippon Steel Chemical Co., Ltd.) (refractive index n _D = 1.648) as a radical polymerizable monomer Bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium (Ciba 1.2 parts by weight of Specialty Chemicals (Irgacure 784) and 2.0 parts by weight of 2,4-diphenyl-4-methyl-1-pentene (manufactured by Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent A photosensitive material precursor was prepared. Using the obtained photosensitive material precursor, a transmission hologram recording medium was prepared and evaluated in the same manner as in Example 1. The obtained hologram recording medium had M / # of 3.1 and a shrinkage rate of 0.2%. Further, the hologram recording medium in this example was transparent both before and after recording.

Example 4
20.0 parts by weight of methylated β-cyclodextrin (manufactured by Tokyo Chemical Industry Co., Ltd., hydroxyl group equivalent: 367.4 g / eq) (23.6% by weight with respect to the entire polymer matrix forming component), hexamethylene diisocyanate ( Example 1 except that 19.7 parts by weight of Tokyo Chemical Industry Co., Ltd.) and 41.1 parts by weight of polyether triol (ADEKA, G-700, average molecular weight 740) were used. Thus, a photosensitive material precursor was prepared. Using the obtained photosensitive material precursor, a transmission hologram recording medium was prepared and evaluated in the same manner as in Example 1. The obtained hologram recording medium had an M / # of 3.0 and a shrinkage rate of 0.2%. Further, the hologram recording medium in this example was transparent both before and after recording.

(Example 5)
Among the polymer matrix forming components, 20.0 parts by weight of methylated β-cyclodextrin (manufactured by Tokyo Chemical Industry Co., Ltd., hydroxyl equivalent: 367.4 g / eq) as a cyclic oligosaccharide derivative (based on the entire polymer matrix forming component) 24.1% by weight), an acrylic acid adduct of 9,9-bis (4-hydroxyphenyl) fluorenediglycidyl ether as a radically polymerizable compound represented by the chemical formula (1) (manufactured by Nippon Steel Chemical Co., Ltd.) ASF-400) (refractive index n _D = 1.616) 4.0 parts by weight, hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.), 19.2 parts by weight, polyether triol (manufactured by ADEKA Corporation, G- 700, average molecular weight 740) 39.7 parts by weight as a polymer matrix forming catalyst dibutyltin dilaurate (Tokyo Chemical Industry) 0.04 part by weight) (manufactured by Nippon Steel Chemical Co., Ltd.) (refractive index n _D = 1.648) 4.0 parts by weight as a radical polymerizable monomer Bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium (Ciba 1.2 parts by weight of Specialty Chemicals (Irgacure 784) and 1.0 part by weight of 2,4-diphenyl-4-methyl-1-pentene (manufactured by Tokyo Chemical Industry Co., Ltd.) as a chain transfer agent, plasticizer 10.8 parts by weight of propylene carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) was blended to prepare a photosensitive material precursor.

Using the obtained photosensitive material precursor, a transmission hologram recording medium was prepared and evaluated in the same manner as in Example 1. M / # of the obtained hologram recording medium was 1.7, and the shrinkage percentage was 0.1%. Further, the hologram recording medium in this example was transparent both before and after recording.

(Example 6)
A transmission hologram recording medium was prepared in the same manner as in Example 5 except that 2-vinylnaphthalene (manufactured by Nippon Steel Chemical Co., Ltd.) (refractive index n _D = 1.655) was used as the radical polymerizable monomer. ,evaluated. M / # of the obtained hologram recording medium was 1.7, and the shrinkage percentage was 0.09%. Further, the hologram recording medium in this example was transparent both before and after recording.

(Example 7)
A transmissive hologram recording medium was prepared and evaluated in the same manner as in Example 5 except that acenaphthylene (manufactured by Nippon Steel Chemical Co., Ltd.) (refractive index n _D = 1.678) was used as the radical polymerizable monomer. . M / # of the obtained hologram recording medium was 1.8, and the shrinkage percentage was 0.07%. Further, the hologram recording medium in this example was transparent both before and after recording.

(Comparative Example 2)
Without using a cyclic oligosaccharide derivative, 20.9 parts by weight of hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) and polyether triol (manufactured by ADEKA Co., Ltd., G-700, average molecular weight 740) were 58.1. A photosensitive material precursor was prepared in the same manner as in Example 5 except for changing to parts by weight. Using the obtained photosensitive material precursor, a transmission hologram recording medium was prepared and evaluated in the same manner as in Example 1. The resulting hologram recording medium had M / # of 1.0 and a shrinkage rate of 0.2%. Further, the hologram recording medium in this example was transparent before recording, but slightly turbid after 3 days of recording.

As is clear from the examples and comparative examples, the photosensitive material obtained in the examples according to the present invention, unlike the present invention, has a volume shrinkage ratio as compared with a photosensitive material that does not contain a cyclic oligosaccharide derivative. It was found to be small and excellent in transparency before and after recording. It was also found that the M / # of the hologram recording medium was relatively high.

The present invention has been described in detail based on the above specific examples. However, the present invention is not limited to the above specific examples, and various modifications and changes can be made without departing from the scope of the present invention.

Claims (12)

A polymer matrix containing a cyclic oligosaccharide derivative as a constituent unit;
A radical polymerizable monomer and a photo radical polymerization initiator;
A photosensitive material characterized by comprising: The photosensitive material according to claim 1, wherein the cyclic oligosaccharide derivative is a cyclodextrin derivative. 3. The photosensitive material according to claim 1, wherein the derivative is at least one selected from the group consisting of an alkylated derivative, a hydroxyalkylated derivative and an acetylated derivative. The photosensitive material according to any one of claims 1 to 3, wherein the polymer matrix contains a radically polymerizable compound represented by the chemical formula (1) as a structural unit.

(In the formula, Ar represents a divalent group having one or more aromatic rings, R ¹ and R ² each represents a hydrogen atom or a methyl group, and L ¹ represents an oxygen atom, a sulfur atom, or — (OR ³ ) _n. represents O- and, R ³ is an alkylene group, n is a number from 1 ~ 4, L ² represents also be divalent group having an aromatic ring.) A hologram recording medium comprising the photosensitive material according to any one of claims 1 to 4. A polymer matrix-forming component comprising a cyclic oligosaccharide derivative;
Comprising a radical polymerizable monomer and a photo radical polymerization initiator,
A photosensitive material precursor, wherein the polymer matrix-forming component is polymerized by a reaction other than a photoradical polymerization reaction to form the polymer matrix. The photosensitive material precursor according to claim 6, wherein the cyclic oligosaccharide derivative is a cyclodextrin derivative. The photosensitive material precursor according to claim 6 or 7, wherein the derivative is at least one selected from the group consisting of an alkylated derivative, a hydroxyalkylated derivative and an acetylated derivative. The photosensitive material precursor according to any one of claims 6 to 8, wherein the polymer matrix-forming component further comprises a radical polymerizable compound represented by the chemical formula (2).

(In the formula, Ar represents a divalent group having one or more aromatic rings, R ¹ and R ² each represents a hydrogen atom or a methyl group, and L ¹ represents an oxygen atom, a sulfur atom, or — (OR ³ ) _n. represents O- and, R ³ is an alkylene group, n is a number from 1 ~ 4, L ² represent may also be divalent group having an aromatic ring.) The reaction includes polycondensation reaction, isocyanate-hydroxyl polyaddition reaction, isocyanate-amine polyaddition reaction, isocyanate-thiol polyaddition reaction, epoxy-amine polyaddition reaction, epoxy-thiol polyaddition reaction, episulfide-amine polyaddition reaction, The photosensitive material precursor according to any one of claims 6 to 9, wherein the precursor is at least one selected from the group consisting of an episulfide-thiol polyaddition reaction. A polymer matrix is formed on the polymer matrix-forming component in the photosensitive material precursor according to any one of claims 6 to 10 by polymerization other than a photoradical polymerization reaction. A method for producing a photosensitive material, comprising producing a photosensitive material containing a monomer and a radical photopolymerization initiator. The reaction includes polycondensation reaction, isocyanate-hydroxyl polyaddition reaction, isocyanate-amine polyaddition reaction, isocyanate-thiol polyaddition reaction, epoxy-amine polyaddition reaction, epoxy-thiol polyaddition reaction, episulfide-amine polyaddition reaction, And the method for producing a photosensitive material according to claim 11, wherein the method is at least one selected from the group consisting of episulfide-thiol polyaddition reactions.