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WO2010038978A2 - Composition de résine photopolymère - Google Patents

Composition de résine photopolymère Download PDF

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Publication number
WO2010038978A2
WO2010038978A2 PCT/KR2009/005593 KR2009005593W WO2010038978A2 WO 2010038978 A2 WO2010038978 A2 WO 2010038978A2 KR 2009005593 W KR2009005593 W KR 2009005593W WO 2010038978 A2 WO2010038978 A2 WO 2010038978A2
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photopolymer resin
pigment
cured film
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2009/005593
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English (en)
Other versions
WO2010038978A3 (fr
Inventor
Jae Gook Han
Young Sung Suh
Kyung Keun Yoon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kolon Industries Inc
Original Assignee
Kolon Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090090886A external-priority patent/KR101148548B1/ko
Application filed by Kolon Industries Inc filed Critical Kolon Industries Inc
Priority to CN200980138835.0A priority Critical patent/CN102216852B/zh
Publication of WO2010038978A2 publication Critical patent/WO2010038978A2/fr
Publication of WO2010038978A3 publication Critical patent/WO2010038978A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present invention relates to a photopolymer resin composition suitable for forming a light blocking film of a liquid crystal display (hereinafter, referred to as "LCD").
  • LCD liquid crystal display
  • a liquid crystal display device displays images using the optical anisotropy and birefringence of liquid crystal molecules, in which liquid crystal alignment is changed by the application of an electric field, and thus light transmission characteristics are also changed depending on the change of liquid crystal alignment.
  • a liquid crystal display device is configured such that two substrates provided with their respective electric field formation electrodes are disposed such that the electrodes face each other, a liquid crystal material is charged between the two substrates, and then a voltage is applied to the electrodes to form an electric field, the electric field moves liquid crystal molecules to change light transmittance, and the change of light transmittance causes the liquid crystal display device to display images.
  • a commonly-used thin film transistor liquid crystal display includes: a lower substrate, called an array substrate, on which thin film transistors and pixel electrodes are arranged; an upper substrate, called a color filter substrate, which includes a plastic or glass substrate on which black matrices and three-color (red, green and blue) layers are repetitively disposed, an overcoat which is formed on the black matrices and the three color layers, made of polyimide, polyacrylate, polyurethane and the like, have a thickness of 1 to 3 um and serves to protect color filters and maintain surface flatness, and an indium tin oxide (ITO) transparent conductive film which is formed on the overcoat and to which a voltage for driving liquid crystal is applied; and liquid crystal charged between the upper and lower substrates, wherein the upper and lower substrates are provided on both sides thereof with polarizing plates for linearly polarizing visible light (natural light).
  • ITO indium tin oxide
  • an external peripheral circuit applies a voltage to a gate of TFT to allow TFT to turn on, thus converting liquid crystal to the state in which a zero phase voltage can be input to the liquid crystal, and then a zero phase voltage is applied to the liquid crystal to store image information in the liquid crystal, and then the TFT turns off to preserve the electric charge stored in a battery charger or subsidiary battery charger, thereby displaying images for a predetermined period of time.
  • a voltage is applied to liquid crystal, liquid crystal alignment is changed. At this time, when light penetrates this liquid crystal, the light is diffracted. This diffracted light penetrates the polarizing plate, thus generating the desired images.
  • the color filter substrate is generally formed by forming black matrices on a transparent plastic or glass substrate and then further sequentially forming red, green and blue color layers having a color pattern, such as a stripe, mosaic or the like, on the transparent plastic or glass substrate using photolithography, a printing method, an ink- jet method or the like.
  • the black matrices serve to improve contrast by blocking the light such that it doesn t penetrate components other than the transparent pixel electrodes.
  • the red, green and blue color layers thereof serve to determine colors by allowing light having specific wavelengths to pass therethrough.
  • the transparent conductive film thereof serves as a common electrode for applying an electric field to liquid crystal.
  • FIG. 1 is a schematic sectional view showing a general liquid crystal display device.
  • the general liquid crystal display device is manufactured by assembling an array substrate (AS) and a color filter substrate (CS).
  • the array substrate (AS) includes a first transparent substrate 22 defined by a plurality of pixel regions (P), a switching region (S) and a storage region (C), a thin film transistor (T) which is formed on one side of the first transparent substrate 22 and formed corresponding to the switching region (S), pixel electrodes 17 formed corresponding to the plurality of pixel regions (P), and a storage capacitor (Cst) formed corresponding to the storage region (C).
  • the array substrate (AS) further includes a gate wire 13 and a data wire 15 which vertically intersect at one or the other side of the plurality of pixel regions (P).
  • the thin film transistor (T) includes a gate electrode 32, a semiconductor layer 34 disposed at a position spaced apart from the gate electrode 32, and a source electrode 36 and a drain electrode 38 disposed at positions spaced apart from the semiconductor layer 34.
  • (C) is used as a first electrode, and an island-shaped metal pattern 30 disposed over the first electrode and brought into contact with the pixel electrode 17 is used as a second electrode.
  • the color filter substrate (CS) includes a second substrate 5, color filters 7a, 7b and
  • the black matrices are designed while leaving margins, but these margins become the major cause of a decrease in the opening ratio.
  • an object of the present invention is to provide a photopolymer resin composition which can exhibit optimum optical density at the time of forming a cured film, and which can be compressed to a predetermined level at the time of applying a predetermined pressure thereto.
  • Another object of the present invention is to provide a photopolymer resin composition which can exhibit optimum optical density at the time of forming a cured film, and which is highly resistant to a certain chemical.
  • Still another object of the present invention is to provide a photopolymer resin composition which can be usefully used to form a black matrix and a spacer for maintaining a cell gap on an array substrate on which color filters are formed at the time of manufacturing a liquid crystal display device.
  • Still another object of the present invention is to provide a photopolymer resin composition which can be usefully used to form the patterns functioning as both a black matrix and a space for maintaining a cell gap.
  • Still another object of the present invention is to provide a photopolymer resin composition which hinders an applied voltage from being held even when color filters are formed on an array substrate.
  • Still another object of the present invention is to provide a photopolymer resin composition which hinders an applied voltage from being held because a spacer for maintaining a cell gap, the spacer being formed on an array substrate, is exposed to the inside of a liquid crystal layer when the spacer is made of the composition.
  • Still another object of the present invention is to provide a photopolymer resin composition which can function as a black matrix and a spacer for maintaining a cell gap because it exhibits a sufficient light blocking effect and has resistance to a certain chemical, and which can decrease the number of poor pixels because it does hinder an applied voltage from being held.
  • An aspect of the present invention provides a photopolymer resin composition, which satisfies the following first and second conditions when a cured film is formed using the photopolymer resin composition:
  • the cured film has an optical density (OD) of 3.0 or more per unit thickness of 3.0 ⁇ m;
  • [27] second condition when a cured film pattern having a lower width of 25 ⁇ 40 ⁇ m and a thickness of 2.5 ⁇ 4.0 ⁇ m is compressed at a loading rate of 5 ⁇ 10 mN/sec using a flat indenter having a diameter 50 ⁇ m until the compressing force of the flat indenter has reached a maximum compressing force of 5 g f and is then held for 5 seconds, a depth to which the cured film pattern is compressed is 15 ⁇ 25% of an initial thickness of the cured film pattern.
  • Another aspect of the present invention provides a photopolymer resin composition, which is formed into a cured film having a chemical resistance index of 97% or more and an optical density (OD) of 3.0 or more per unit thickness of 3.0 ⁇ m, wherein the chemical resistance index is represented as follow:
  • t 0 is an initial thickness of a cured film
  • ti is a thickness of the cured film obtained by immersing the initial cured film in a resist stripping solution at 6O 0 C for 10 minutes and then drying it at 22O 0 C for 30 minutes, these two procedures being performed three times.
  • the resist stripping solution may include, based on the total weight thereof, 4 ⁇ 12% of tetraethylene glycol, 20 ⁇ 40% of triophene tetrahydro- 1,1 -dioxide, 10 ⁇ 20% of diethyleneglycol monoethyl ether, 5 ⁇ 20% of l-amino-2-propanol, and 30 ⁇ 50% of l-methyl-2-pyrrolidinone.
  • the photopolymer resin composition may include an alkali- soluble acrylic binder resin, cardo-based binder resin, a multifunctional monomer having an ethylenic unsaturated double bond, a photopolymerization initiator, and a solvent.
  • the alkali- soluble acrylic binder resin may include an epoxy group.
  • the alkali- soluble acrylic binder resin may have an epoxy equivalent of 200 ⁇ 2000.
  • the photopolymer resin composition may further include a colorant including a pigment blend containing two or more kinds of pigments which can express a black color when they are mixed.
  • the pigment blend essentially includes a red pigment and a blue pigment, and further includes any one selected from among a yellow pigment, a green pigment, a violet pigment and mixtures thereof.
  • the pigment blend may include, based on the solid content of the total weight of the colorant, 10 - 50 wt% of a red pigment, 10 - 50 wt% of a blue pigment, 1 - 20 wt% of a yellow pigment, and 1 - 20 wt% of a green pigment.
  • the pigment blend may further include, based on the solid content of the total weight of the colorant, 1 - 20 wt% of a violet pigment.
  • the pigment blend may further include a black pigment, and the amount of the black pigment may be 10 wt% or less based on the solid content of the total weight of the colorant.
  • the amount of the colorant is 20 - 80 wt% based on the total weight of the composition.
  • the pigment blend may be a pigment-dispersed solution in which the pigments are dispersed in a solvent.
  • the pigment-dispersed solution may include at least one acrylate-based pigment dispersant.
  • the pigment-dispersed solution may include 3 - 20 wt% of a pigment dispersant based on the total weight of the pigment-dispersed solution.
  • the photopolymer resin composition may further satisfy the following third condition:
  • D 1 is a depth to which the cured film pattern is compressed by external pressure
  • D 2 is a difference between an initial height of the cured film pattern to which the external pressure was not applied and a height of the cured film pattern which was recovered after removing the external pressure.
  • the photopolymer resin composition may have a voltage holding ratio of 95% or more
  • the voltage holding ratio is measured at 25 0 C by charging a pollution source, which is prepared by mixing 2 parts by weight of a cured film sample made of the photopolymer resin composition with 100 parts by weight of liquid crystal and then aging the mixture at 65 0 C for 5 hours, in a voltage holding ratio measuring cell, which is fabricated by assembling a glass substrate including an ITO electrode for applying a voltage formed thereon and a glass substrate including an ITO common electrode formed thereon such that the two glass substrates face each other at a cell gap of 5 ⁇ m, and then applying a voltage to the voltage holding ratio measuring cell charged with the pollution source under the condition that the applied voltage has a pulse amplitude of 5 V and a pulse frequency of 60 Hz.
  • Still another aspect of the present invention provides a thin film transistor substrate including a black matrix formed using the photopolymer resin composition through photolithography.
  • Still another aspect of the present invention provides a thin film transistor substrate including a spacer for maintaining a cell gap formed using the photopolymer resin composition through photolithography.
  • Still another aspect of the present invention provides a thin film transistor substrate including a black matrix-integrated spacer for maintaining a cell gap formed using the photopolymer resin composition through photolithography.
  • Still another aspect of the present invention provides a liquid crystal display device including the thin film transistor as a lower substrate.
  • the photopolymer resin composition according to the present invention can be usefully used to form a black matrix and a spacer for maintaining a cell gap on an array substrate on which color filters are formed at the time of manufacturing a liquid crystal display device, and can be usefully used to form the patterns functioning as both a black matrix and a space for maintaining a cell gap.
  • FIG. 1 is a schematic sectional view showing a general liquid crystal display device
  • FIG. 2 is a schematic view evaluating the compressive characteristics of the cured film pattern made of the photopolymer resin composition of the present invention.
  • a lower substrate that is, an array substrate is provided thereon with a color filter layer, and the color filter layer includes R, G and B pixels and black matrices formed therebetween.
  • the margin of the black matrices is minimized, so that the opening ratio of the liquid crystal display device is increased, thereby improving the brightness thereof.
  • black matrices are formed on an array substrate, and thus a spacer for maintaining a cell gap, called a column spacer, can be also formed on the array substrate.
  • the black matrices and the spacer for maintaining a cell gap may be separately formed through an additional pattern forming process.
  • a photopolymer resin composition for forming a light blocking film known as a black matrix, is different from a photopolymer resin composition for forming a spacer for maintaining a cell gap in composition and required properties.
  • black matrices and a spacer for maintaining a cell gap are formed such that their heights are each different, when formed through a single photolithography process, and furthermore that a spacer for maintaining a cell gap is formed on black matrices, or black matrices and a spacer for maintaining a cell gap are integrated with each other such that they perform their respective functions when made of just a single pattern.
  • a photopolymer resin composition according to an embodiment of the present invention satisfies the conditions that a cured film made of the composition has an optical density (OD) of 3.0 or more per unit thickness of 3.0 ⁇ m, and that, when a cured film pattern having a lower width of 25 ⁇ 40 ⁇ m and a thickness of 2.5 ⁇ 4.0 ⁇ m is compressed at a loading rate of 5 ⁇ 10 mN/sec using a flat indenter having a diameter 50 ⁇ m until the compressing force of the flat indenter has reached a maximum compressing force of 5 g f and is then held for 5 seconds, the depth to which the cured film pattern is compressed is 15 ⁇ 25% of the initial thickness of the cured film pattern.
  • OD optical density
  • the photopolymer resin composition according to an embodiment of the present invention can be used to form a light blocking film which satisfies minimum light blocking properties and can be compressed to a predetermined level when a predetermined pressure is applied to the light blocking film.
  • the optical density (OD) per unit thickness of 3.0 ⁇ m is less than 3.0, it is difficult to exhibit an optimal light blocking effect even when the thickness of the cured film made of the composition is somewhat increased, and, when the cured film is used as a light blocking film, the light blocking film cannot block the light penetrating other components except for transparent pixel electrodes because it cannot sufficiently exhibit light blocking properties.
  • a photopolymer resin composition according to an embodiment of the present invention is used to form a spacer for forming a cell gap
  • the photopolymer resin composition have compression recovery properties in addition to the compressive properties. That is, when the upper and lower substrates are assembled during the LCD fabricating process, it is preferred that, when the spacer for maintaining a cell gap is compressed and then the compressing force is removed therefrom, its height is recovered, thus continuously maintaining the cell gap.
  • the photopolymer resin composition according to an embodiment of the present invention further satisfies the condition that when a cured film pattern having a lower width of 25 ⁇ 40 ⁇ m and a thickness of 2.5 ⁇ 4.0 ⁇ m is compressed at a loading rate of 5 ⁇ 10 mN/sec using a flat indenter having a diameter 50 ⁇ m until the compressing force of the flat indenter has reached a maximum compressing force of 5 g f , is held for 5 seconds and is then released from the compression, a recovery rate of the compressed cured film pattern, represented by Formula 1 below, is 50% or more.
  • D 1 is a depth to which the cured film pattern is compressed by external pressure
  • D 2 is a difference between the initial height of the cured film pattern to which the external pressure was not applied and the height of the cured film pattern which was recovered after removing the external pressure.
  • a photopolymer resin composition according to another embodiment of the present invention satisfies the conditions that a cured film made of the composition has an optical density (OD) of 3.0 or more per unit thickness of 3.0 ⁇ m and a chemical resistance index of 97% or more, wherein the chemical resistance index is represented as follow:
  • t 0 is the thickness of an initial cured film
  • ti is the thickness of a cured film obtained by immersing the initial cured film in a resist stripping solution at 6O 0 C for 10 minutes and then drying it at 22O 0 C for 30 minutes, these two procedures being three times.
  • the resist stripping solution is defined as a solution for separating and removing unnecessary resist remaining on a wafer after etching in a microfabrication process, and is a chemical selected in consideration of the photolithography process which can be performed after forming black matrices and spacers for maintaining a cell gap on a lower substrate.
  • the resist stripping solution includes, based on the total weight thereof, 4 ⁇ 12% of tetraethylene glycol, 20 ⁇ 40% of triophene tetrahydro- 1,1 -dioxide, 10 ⁇ 20% of diethyleneglycol monoethyl ether, 5 ⁇ 20% of l-amino-2-propanol, and 30 ⁇ 50% of l-methyl-2-pyrrolidinone.
  • the resist stripping solution is a commercially- available chemical.
  • black matrices and a spacer for maintaining a cell gap may be simultaneously formed so that they are different from each other in height, the heights corresponding to predetermined thickness by patterning the photopolymer resin composition using a slit mask or a half-tone mask, spacers for maintaining a cell gap may be further formed at the positions at which black matrices are formed, or only black matrices may be formed such that they function as spacers for maintaining a cell gap.
  • the damage of the pattern, caused by the resist stripping solution can be minimized at the time of a subsequent photography process for forming transparent electrodes after forming the pattern.
  • liquid crystal display device a liquid crystal material is charged between two substrates including two respective electrodes (a pixel electrode and a common electrode) and facing each other, a voltage is applied to the two electrodes to generate an electric field, and thus the generated electric field moves liquid crystal molecules to change the light transmission, thereby displaying images. Therefore, when foreign conductive materials are mixed with the liquid crystal material charged between the pixel electrode formed on the lower substrate and the common electrode formed on the upper substrate, the difference in potential between the pixel electrode formed on the lower substrate and the common electrode formed on the upper substrate is not maintained in accordance with the intention of initial voltage application, and thus liquid crystal molecules are not oriented or are oriented differently.
  • the display is also caused to be non-functional.
  • the non-functionality of the display may include an adherence phenomenon and a white spot phenomenon.
  • the adherence phenomenon is a phenomenon in which pixels are visibly recognized spotted or are continuously maintained spotted even when they are left for a long time because the transmission rate of pixels to which a voltage is applied and then lowered or shut off is different from that of adjacent pixels to which a voltage is not applied.
  • pixels to which a voltage is applied for a predetermined time look darker than pixels adjacent to the pixels.
  • This adherence phenomenon is known to be caused by the fact that ionic materials adsorbed on electrodes during the application of a voltage continuously influence liquid crystal even when the application of a voltage has been discontinued.
  • the white spot phenomenon is a phenomenon in which a spotted state is recognized because a part of a display area does not have a transmission rate of 0 when a black image is displayed by the application of a voltage.
  • This white spot phenomenon is thought to be caused by the fact that, since the voltage applied between electrodes must be maintained constant, when ionic materials are present in liquid crystal, the ionic materials move in the liquid crystal to generate an electric current, thus decreasing the potential difference between the electrodes.
  • the photopolymer resin composition according to an embodiment of the present invention may have a voltage holding ratio of 95% or more, measured as follows:
  • the voltage holding ratio is measured at 25 0 C by charging a pollution source, which is prepared by mixing 2 parts by weight of a cured film sample made of the photopolymer resin composition with 100 parts by weight of liquid crystal and the aging the mixture at 65 0 C for 5 hours, in a voltage holding ratio measuring cell, which is fabricated by assembling a glass substrate including an ITO electrode for applying a voltage formed thereon and a glass substrate including an ITO common electrode formed thereon such that the two glass substrates face each other at a cell gap of 5 ⁇ m, and then applying a voltage to the voltage holding ratio measuring cell charged with the pollution source under the condition that the applied voltage has a pulse amplitude of 5 V and a pulse frequency of 60 Hz.
  • a cured film made of the photopolymer resin composition of the present invention may cause the discharge of the electric charge.
  • the level in which a voltage is maintained is defined as a voltage holding ratio .
  • This voltage holding ratio is an important factor necessary for an active element such as a TFT-addressing element in which a voltage must be stored in pixels for a predetermined time. It is ideal for the voltage holding ratio to approximate 100%.
  • the photopolymer resin composition will function as a spacer for maintaining a cell gap, it is advantageous in terms of the exposure of the composition to a liquid crystal layer that the voltage holding ratio of the photopolymer resin composition be 97% or more.
  • the photopolymer resin composition according to an embodiment of the present invention includes: an alkali- soluble acrylic binder resin; cardo-based binder resin; a multifunctional monomer having an ethylenic unsaturated double bond; a pho- topolymerization initiator; and a solvent.
  • the alkali- soluble acrylic binder resin may include an epoxy group serving to improve compressive characteristics and chemical resistance.
  • the alkali-soluble acrylic binder resin serves to improve the resistance to a chemical such as the above resist stripping solution, the developability of the composition is influenced by an excess epoxy equivalent, it is preferred that the alkali-soluble acrylic binder resin have an epoxy equivalent of 200 ⁇ 2000.
  • the alkali- soluble acrylic binder resin may be a copolymer prepared by copoly- merizing a monomer including an acid group with a monomer which can be copolymerized with this monomer.
  • the alkali- soluble acrylic binder resin prepared by the copolymerization has a higher film strength than a binder resin prepared by ho- mopolymerization.
  • a polymer compound prepared by the polymer reaction of the copolymer and an ethylenic unsaturated compound including an epoxy group may be used as the alkali-soluble acrylic binder resin.
  • Examples of the monomer including an acid group may include (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, isoprene sulfonic acid, styrene sulfonic acid, 5-norbornene-carboxylic acid, and mixtures thereof.
  • a binder resin including an epoxy group be used.
  • a monomer including epoxy group may be used in combination with the monomer including an acid group.
  • Examples of the monomer including an epoxy group may include, but are not limited to, glycidyl acrylate, glycidyl methacrylate, glycidyl ⁇ -ethyl acrylate, glycidyl ⁇ - n-propyl acylate, glycidyl ⁇ -n-butyl acrylate, acrylic acid-3,4-epoxy butyl, methacrylic acid-3,4-epoxy butyl, acrylic acid-6,7-epoxy heptyl, methacrylic acid-6,7-epoxy heptyl, ⁇ -ethyl acrylic acid-6,7-epoxy heptyl, o-vinlybenzyl glycidyl ether, m- vinlybenzyl glycidyl ether, p-vinlybenzyl glycidyl ether, and the like.
  • the amount of the monomer including an epoxy group may be determined in consideration of the above epoxy equivalent
  • the alkali-soluble acrylic binder resin may be used in an amount of 1 ⁇ 40 wt%, preferably 20 ⁇ 30 wt%, based on the total solid content of the photopolymer resin composition.
  • the photopolymer resin composition according to an embodiment of the present invention may include a cardo- based compound as a binder resin.
  • This cardo-based binder resin is referred to as an acrylate-based binder resin having a main chain provided with a fluorine group, and is not structurally limited.
  • X may be represented by
  • Y may be a residue of an acid anhydride selected from among maleic anhydride, succinic anhydride, cis-l,2,3,6-tetrahydrophthalic anhydride, 3,4,5, 6-tetrahydrophthalic anhydride, phthalic anhydride, itaconic anhydride, 1,2,4- 1,2,4-benzenetricarboxylic anhydride, methyl-tetrahydrophthalic anhydride, citraconic anhydride, 2,3-dimethylmaleic anhydride, l-cyclopentene-l,2-dicarboxylic anhydride, cis-5-norbonene-endo-2,3-dicarboxylic anhydride and 1,8-naphthalic anhydride; and Z may be a residue of an acid dianhydride selected from among 1,2,4,5-bezenetetracarboxylic dianhydride, 4,4'-biphthalic dianhydride, 3,3',4,4'-benzophenonete
  • the cardo-based compound may be used in an amount of 1 ⁇ 40 wt%, preferably 20
  • the photopolymer resin composition according to an embodiment of the present invention may include a multifunctional monomer having an ethylenic unsaturated double bond.
  • This multifunctional monomer serves to form a photoresist phase using light.
  • the multifunctional monomer may be any one selected from the group consisting of propyleneglycol methacrylate, dipentaerythritol hexacrylate, dipen- taerythritol acrylate, neopentylglycol diacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol acrylate, tetraethyleneglycol methacrylate, bisphenoxyethyl alcohol diacrylate, trishydroxyethylisocyanurate trimethacrylate, trimethylpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaeryth
  • the amount of the multifunctional monomer be 0.1 ⁇ 99 parts by weight based on 100 parts by weight of the cardo-based compound from a viewpoint that the adhesion force between pigment and particle composition is increased by the cross-linkage attributable to the radical reaction of a photoinitiator using UV, thus increasing optical density.
  • the photopolymer resin composition according to an embodiment of the present invention may include a photopolymerization initiator.
  • the photopoly- merization initiator may be selected from among: oxime esters, such as l-[9-ethyl-6-(2-methybenzoyl)-9H-carbazole-3-yl]-l-(O-acetyloxime), l,2-octanedione-l[(4-phenylthio)phenyl]-2-benzoyl-oxime, and the like; ketones, such as thioxanthone, 2,4-diethyl thioxanthone, thioxanthone-4-sulfonic acid, ben- zophenone, 4,4'-bis(diethylamino)benzophenone, acetophenone, p- dimethylaminoacetophenone, dimethoxyacetoxybenzophenone, 2,2'-dimethoxy-2
  • the photopolymerization initiator be used in an amount of 1 ⁇ 30 wt% based on the total photopolymer resin composition.
  • the photopolymer resin composition according to an embodiment of the present invention may include a solvent.
  • the solvent may be selected from among propylene glycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate (PGEEA), propylene glycol methyl ether, propylene glycol propyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethyl glycol methyl acetate, ethyl ethoxy propionate, methyl ethoxy propionate, butyl acetate, ethyl acetate, cyclohexanone, acetone, methyl isobutyl ketone, dimethyl formamide, N,N" -dimethyl acetamide, N- methyl pyrrolidinone, dipropylene glycol methyl ether, toluene, methyl cellosolve, and ethyl cellosolve.
  • the amount of the solvent may be 20 ⁇ 60 wt% based on the total photopolymer resin composition.
  • a general additive may be added.
  • the voltage holding ratio can be controlled by adjusting the content ratio of organic/inorganic pigments or by adjusting the kind and content of a pigment dispersant.
  • the photopolymer resin composition according to an embodiment of the present invention may include a colorant including a pigment blend containing two or more kinds of pigments which can express a black color when they are mixed.
  • a photopolymer resin composition for realizing light blocking properties may include a black pigment.
  • a black pigment for example, carbon black or titan black may be used as the black pigment.
  • the black pigment such as carbon black or titan black, acts as an ionic impurity. Therefore, the cured film obtained using the black pigment has poor compressive characteristics, which is not preferable.
  • the photopolymer resin composition according to an embodiment of the present invention expresses an actual black color using the pigment blend.
  • actual black color means a black color which can absorb light over the entire wavelength of a visible region (380 ⁇ 780 nm) based on the UV-spectrum.
  • the mixing of pigments may be performed by dispersing the pigment blend in a solvent to form a pigment-dispersed solution.
  • the pigment blend may essentially include a red pigment and a blue pigment, and may further include a yellow pigment or a green pigment. In addition, the pigment blend may further include a violet pigment.
  • Examples of the pigments includes, based on color index (C.I.), red pigments of C.I. 3, 23, 97, 108, 122, 139, 149, 166, 168, 175, 177, 180, 185, 190, 202, 214, 215, 220, 224, 230, 235, 242, 254, 255, 260, 262, 264, 272; yellow pigments of C.I. 13, 35, 53, 83, 93, 110, 120, 138, 139, 150, 154, 175, 180, 181, 185, 194, 213; blue pigments of C.I. 15, 15:1, 15:3, 15:6, 36, 71, 75; green pigments of C.I. 7, 36; and violet pigments of C.I. 15, 19, 23, 29, 32, 37.
  • C.I. color index
  • a high-resistance black pigment may be added.
  • the black pigment may include, but are not limited to, carbon black, titan black and the like.
  • This pigment blend may include, based on the solid content of the total weight of the colorant, 10 - 50 wt% of a red pigment, 10 - 50 wt% of a blue pigment, 1 - 20 wt% of a yellow pigment, and 1 - 20 wt% of a green pigment.
  • the pigment blend may further include, based on the solid content of the total weight of the colorant, 1 - 20 wt% of a violet pigment.
  • the pigment blend may further include, based on the solid content of the total weight of the colorant, 10 wt% or less of a violet pigment.
  • the black pigment Since the black pigment has electroconductivity, there are problems in that the dielectric constant of a cured film is increased and the compressive characteristics of the cured film are deteriorated. Therefore, it preferred that the black pigment be a high- resistance pigment, and it is more preferred that the black pigment be used in an amount of 5 wt% or less based on the solid content of the total weight of the colorant.
  • the colorant may include a pigment dispersant.
  • the pigment dispersant may include: polymer dispersants, such as modified polyurethane, modified polyacrylate, modified polyester, modified polyamide and the like; and surfactants, such as phosphoric acid ester, polyester, alkylamine, and the like.
  • acrylate -based pigment dispersants for example, Disperbyk-2000, Disperbyk-2001, LP-N-21116 and LP-N-21208 manufactured by BYK chemie Corporation, and EFKA-4300, EFKA-4330, EFKA-4340, EFKA-4400, EFKA-4401, EFKA-4402, EFKA-4046 or EFKA-4060 manufactured by Ciba Corporation, can be more advantageous in terms of a voltage holding ratio.
  • the amount of the pigment dispersant be 3 - 20 wt% based on the total amount of the dispersion-type colorant, that is the pigment-dispersed solution.
  • the amount of the colorant be 20 ⁇ 80 wt%, more preferably, 30 ⁇ 66 wt% based on the total amount of the photopolymer resin composition.
  • the amount of the colorant is less than 20 wt%, the optical density of the formed light blocking film is too low, and thus the light blocking film cannot exhibit sufficient light blocking ability.
  • the amount of the colorant is more than 80 wt%, there are problems in that the amount of the components constituting the photopolymer resin composition decreases, and the photopolymer resin composition is not sufficiently cured, thus deteriorating developability, and in that residues are formed.
  • Such a photopolymer resin composition may be prepared by mixing (a) a pigment blend, (b) an alkali-soluble acrylic binder resin, (c) a cardo-based compound, (d) a multifunctional monomer having an ethylenic unsaturated double bond, (e) a pho- topolymerization initiator and, if necessary, an organic additive with a solvent, stirring the mixture and then filtering the stirred mixture using a membrane filter having a thickness of 5 ⁇ m.
  • the photopolymer resin composition prepared in this way is applied on a glass substrate having a clean surface or a glass substrate including a transparent electrode layer (for example, a glass substrate deposited with ITO or IZO) using a non-contact type applicator such as a spin coater (a rotary applicator), a slit coater (a non-rotary applicator) or the like.
  • a non-contact type applicator such as a spin coater (a rotary applicator), a slit coater (a non-rotary applicator) or the like.
  • a silane coupling agent may be combined with the photopolymer resin composition or may be applied on the glass substrate.
  • the photopolymer resin composition applied on the glass substrate is dried at a temperature of 80 ⁇ 12O 0 C, preferably 90 ⁇ 100 0 C, for 60 ⁇ 150 seconds using a hot plate), is left at room temperature for several hours ⁇ several days or is heated for several minutes ⁇ several hours using a warm air heater or an infrared heater to remove the solvent (so called, a pre-baking process), thereby forming a film having a thickness of 2 ⁇ 5 ⁇ m.
  • the film is exposed by active energy rays such as ultraviolet rays at an energy radiation rate of 30 ⁇ 1000mJ/cm 2 using a mask.
  • the energy radiation rate may be changed depending on the kind of a photopolymer resin composition used to form a light blocking film.
  • the exposed film is developed using a dipping method or a spray method to form a cured film pattern.
  • the developer may be selected from among organic developers, such as monoethanolamine, di- ethanolamine, triethanolamine and the like, and inorganic developers, such as aqueous solutions of sodium hydroxide, potassium hydroxide, ammonia, quaternary ammonium salt and the like.
  • a post-baking process may be performed at a temperature of 150 ⁇ 25O 0 C for 20 ⁇ 40 minutes.
  • the cured film obtained in this way has suitable light blocking properties and compressive characteristics, it can be usefully used to manufacture a liquid crystal display device having a structure in which color filters are formed on a thin film transistor substrate, that is, an array substrate.
  • 3-(methacryloxypropyl)trimethoxysilane 500 g of propylene glycol monomethyl ether acetate and 25 g of azobisisobutylonitrile were put into a 1000 mL four- neck flask, and were then stirred for 30 minutes while blowing nitrogen into the flask. Subsequently, the resulting mixture was slowly heated to 7O 0 C and then reacted at this temperature for 6 hours, and was then heated to 8O 0 C and then further reacted at this temperature for 2 hours, thereby synthesizing an alkali- soluble acrylic binder resin (epoxy equivalent: 600).
  • an alkali- soluble acrylic binder resin epoxy equivalent: 600.
  • a solvent propylene glycol methyl ether acetate (
  • the prepared photopolymer resin composition was formed into a cured film pattern through the following processes. First, the photopolymer resin composition was applied on an IZO-deposited glass substrate having a clean surface using a spin coater at a spin speed of 270 rpm to form a resin coating layer. Thereafter, the resin coating layer was dried at 9O 0 C for 150 seconds using a hot plate to have a thickness of 3.5 ⁇ m. Subsequently, the dried resin coating layer was exposed to active energy rays such as ultraviolet rays at an energy radiation rate of 60 mJ/cm 2 using a mask (gap: 200 ⁇ m). Then, the exposed resin coating layer was developed for 100 seconds using a developer (0.04% KOH, 23 0 C) to form a cured film pattern.
  • active energy rays such as ultraviolet rays at an energy radiation rate of 60 mJ/cm 2 using a mask (gap: 200 ⁇ m.
  • the optical density of the formed cured film was measured using a PMT manufactured by Otsuka Electronics Co., Ltd., in such a manner as to compare the cured film with a reference specimen having an optical density of 2.4, and the results thereof are given in Table 1.
  • FIG. 2 is a schematic view showing the method used to measure the compressive properties of the cured film pattern.
  • the cured film pattern starts to be loaded using a flat indenter having a diameter of 50 ⁇ m, and is then continuously loaded until its compressing force has reached the maximum compressing force.
  • the loaded cured film pattern is held for a predetermined time, the cured film pattern is compressed.
  • the depth to which the cured film pattern is compressed is designated by "D 1 ".
  • the cured film pattern is recovered to a predetermined height when the flat indenter is removed (unloaded).
  • the difference between the initial height (T) of the cured film pattern to which the external pressure as not applied and the height of the cured film pattern which was recovered after removing the external pressure is designated as "D 2 ".
  • a voltage holding ratio measuring cell (manufactured by EHC Corp.) fabricated by assembling a glass substrate (size: lcmxlcm) including an ITO electrode for applying a voltage formed thereon and a glass substrate (size: lcmxlcm) including an ITO common electrode formed thereon such that the two glass substrates face each other at a cell gap of 5 ⁇ m was provided.
  • a pollution source was prepared by scratching the cured film and then mixing 0.02 g of the scratched cured film sample with 1 g of liquid crystal (MLC-7022-100, manufactured by Merck Corp.) in a test tube and then aging the mixture at 65 0 C for 5 hours.
  • liquid crystal MLC-7022-100, manufactured by Merck Corp.
  • the cured film pattern was put into a 500 mL beaker filled with 300 mL of BAKER PRS-2000, immersed at 6O 0 C for 10 minutes, dried at 22O 0 C for 20 minutes, and then the thickness of the cured film pattern was measured using the above method. In this way, the cured film pattern was immersed, dried, and then the thickness thereof was measured again. These procedures were repeated three times. The thickness of the cured film pattern measured three times is designated by "t/ 1 .
  • a photopolymer resin composition was prepared using the same composition and method as in Example 1, except that 20 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 1 and Table 2 below.
  • a photopolymer resin composition was prepared using the same composition and method as in Example 1, except that 50 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 1 and Table 2 below.
  • a photopolymer resin composition was prepared by adding 5 parts by weight of a carbon black pigment-dispersed solution (KLBK-61, manufactured by Mikuni Corporation, 25 wt% of solid content, including 5 wt% of a pigment dispersant (disperbyk-2001, manufactured by BYK Corporation) based on the total amount of the pigment-dispersed solution) to the pigment blend of Example 1.
  • a carbon black pigment-dispersed solution KLBK-61, manufactured by Mikuni Corporation, 25 wt% of solid content, including 5 wt% of a pigment dispersant (disperbyk-2001, manufactured by BYK Corporation) based on the total amount of the pigment-dispersed solution)
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 1 and Table 2 below.
  • a photopolymer resin composition was prepared using the same composition as in Example 1, except that 10 parts by weight of the carbon black pigment of Example 4 were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 1 and Table 2 below. [188]
  • Example 1 except that 15 parts by weight of the carbon black pigment of Example 4 were used. [191] A cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Example 1 except that the alkali- soluble acrylic binder resin obtained from
  • Preparation Example 2 was used instead of the alkali- soluble acrylic binder resin obtained from Preparation Example 1.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Example 8 A photopolymer resin composition was prepared using the same composition and method as in Example 7, except that 20 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used. [199] A cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • the cured film patterns formed of the photopolymer resin compositions according to embodiments of the present invention can be thickly formed on an IZO-deposited film, they can sufficiently function as a spacer for maintaining a cell gap, and that since they have a high voltage holding ratio, poor images are not displayed even when they are exposed to a liquid crystal layer, and thus they can be usefully used as a spacer for maintaining a cell gap.
  • the cured films formed of the photopolymer resin compositions according to embodiments of the present invention have a chemical resistance index of preferably, 97% or more, the cured films, functioning as black matrices and/or spacers for maintaining a cell gap, are not lost, and thus the photopolymer resin composition of the present invention can be usefully used to fabricate a liquid crystal display device in which black matrices and/or spacers for maintaining a cell gap are formed on a lower substrate.
  • a solvent propylene glycol methyl ether acetate
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 3 and Table 4 below.
  • a photopolymer resin composition was prepared using the same composition and method as in Example 9, except that 20 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 3 and Table 4 below.
  • a photopolymer resin composition was prepared using the same composition and method as in Example 9, except that 50 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 3 and Table 4 below.
  • a photopolymer resin composition was prepared by adding 5 parts by weight of a carbon black pigment-dispersed solution (KLBK-61, manufactured by Mikuni Corporation, 25 wt% of solid content, including 5 wt% of a pigment dispersant (disperbyk-2001, manufactured by BYK Corporation) based on the total amount of the pigment-dispersed solution) to the pigment blend of Example 9.
  • KLBK-61 carbon black pigment-dispersed solution
  • a pigment dispersant diserbyk-2001, manufactured by BYK Corporation
  • a photopolymer resin composition was prepared using the same composition as in Example 9, except that 10 parts by weight of the carbon black pigment of Example 12 were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 3 and Table 4 below.
  • Example 9 except that 15 parts by weight of the carbon black pigment of Example 12 were used.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Preparation Example 5 was used instead of the alkali- soluble acrylic binder resin obtained from Preparation Example 4.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Example 16 A photopolymer resin composition was prepared using the same composition and method as in Example 15, except that 20 parts by weight of an alkali-soluble acrylic binder resin and 100 parts by weight of a cardo-based compound were used. [246] A cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Preparation Example 6 was used instead of the alkali- soluble acrylic binder resin obtained from Preparation Example 4. [250] A cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example
  • Preparation Example 7 was used instead of the alkali- soluble acrylic binder resin obtained from Preparation Example 4.
  • a cured film was formed using the same method as in Example 1, and then the properties of the cured film were also evaluated using the same method as in Example 1. The results thereof are given in Table 3 and Table 4 below.
  • the cured film patterns formed of the photopolymer resin compositions according to embodiments of the present invention can be compressed to a predetermined thickness when a predetermined force is applied thereto and have enough optical density to exhibit a light blocking effect, they can be usefully used to form patterns for exhibiting a light blocking effect and maintaining a cell gap.
  • the cured film patterns formed of the photopolymer resin compositions according to embodiments of the present invention can be thickly formed on an IZO-deposited film, they can sufficiently function as a spacer for maintaining a cell gap, and that since they have high voltage holding ratio, poor images are not displayed even when they are exposed to a liquid crystal layer, and thus they can be usefully used as a spacer for maintaining a cell gap.
  • the cured films formed of the photopolymer resin compositions according to embodiments of the present invention have a chemical resistance index of preferably, 97% or more, the cured films, functioning as black matrices and/or spacers for maintaining a cell gap, are not lost, and thus the photopolymer resin composition of the present invention can be usefully used to fabricate a liquid crystal display device in which black matrices and/or spacers for maintaining a cell gap are formed on a lower substrate.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
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  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

La présente invention concerne une composition de résine photopolymère qui peut être utilisée pour former un film bloquant la lumière et un espaceur destiné à maintenir un espace entre cellules qui peut être comprimé et maintenu à une épaisseur prédéterminée lorsqu'une pression prédéterminée est appliquée sur celui-ci. La composition de résine photopolymère comprend : une résine liante acrylique soluble dans les alcalins, une résine liante à base de cardo, un monomère multifonctionnel ayant une double liaison insaturée éthylénique, un initiateur de la photopolymérisation, et un solvant.
PCT/KR2009/005593 2008-09-30 2009-09-30 Composition de résine photopolymère Ceased WO2010038978A2 (fr)

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CN102445842A (zh) * 2010-10-13 2012-05-09 第一毛织株式会社 光敏树脂组合物和使用其的挡光层
US20120262793A1 (en) * 2010-01-20 2012-10-18 Fujifilm Corporation Black curable composition for wafer - level lens, and wafer - level lens
JP2015114414A (ja) * 2013-12-10 2015-06-22 東洋インキＳｃホールディングス株式会社 カラーフィルタ用青色着色組成物、及びカラーフィルタ
US20160282528A1 (en) * 2015-03-24 2016-09-29 Samsung Sdi Co., Ltd. Photosensitive Resin Composition, Black Column Spacer Using the Same and Color Filter
JP2017146618A (ja) * 2011-10-25 2017-08-24 三菱ケミカル株式会社 着色感光性組成物、着色スペーサ、カラーフィルター、及び液晶表示装置
JP2018066992A (ja) * 2016-10-21 2018-04-26 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
US11130838B2 (en) 2018-04-06 2021-09-28 Lg Chem, Ltd. Cardo-based binder resin, photosensitive resin composition comprising same, black matrix, color filter, and display device
JP2023088498A (ja) * 2021-12-15 2023-06-27 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物及びその製造方法、ブラックマトリックス用レジスト組成物、並びにブラックレジスト膜

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KR100574321B1 (ko) * 1999-02-04 2006-04-26 제일모직주식회사 감광성 수지 조성물 및 블랙매트릭스
JP2006133338A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4745093B2 (ja) * 2006-03-17 2011-08-10 東京応化工業株式会社 黒色感光性組成物
JP4745110B2 (ja) * 2006-04-19 2011-08-10 東京応化工業株式会社 感光性組成物及びこの感光性組成物により形成されたカラーフィルタ

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120262793A1 (en) * 2010-01-20 2012-10-18 Fujifilm Corporation Black curable composition for wafer - level lens, and wafer - level lens
CN102445842A (zh) * 2010-10-13 2012-05-09 第一毛织株式会社 光敏树脂组合物和使用其的挡光层
JP2017146618A (ja) * 2011-10-25 2017-08-24 三菱ケミカル株式会社 着色感光性組成物、着色スペーサ、カラーフィルター、及び液晶表示装置
JP2015114414A (ja) * 2013-12-10 2015-06-22 東洋インキＳｃホールディングス株式会社 カラーフィルタ用青色着色組成物、及びカラーフィルタ
US20160282528A1 (en) * 2015-03-24 2016-09-29 Samsung Sdi Co., Ltd. Photosensitive Resin Composition, Black Column Spacer Using the Same and Color Filter
US10216029B2 (en) * 2015-03-24 2019-02-26 Samsung Sdi Co., Ltd. Photosensitive resin composition, black column spacer using the same and color filter
JP2018066992A (ja) * 2016-10-21 2018-04-26 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
US11130838B2 (en) 2018-04-06 2021-09-28 Lg Chem, Ltd. Cardo-based binder resin, photosensitive resin composition comprising same, black matrix, color filter, and display device
JP2023088498A (ja) * 2021-12-15 2023-06-27 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物及びその製造方法、ブラックマトリックス用レジスト組成物、並びにブラックレジスト膜

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