WO2010035421A1 - Apparatus for water treatment - Google Patents
Apparatus for water treatment Download PDFInfo
- Publication number
- WO2010035421A1 WO2010035421A1 PCT/JP2009/004574 JP2009004574W WO2010035421A1 WO 2010035421 A1 WO2010035421 A1 WO 2010035421A1 JP 2009004574 W JP2009004574 W JP 2009004574W WO 2010035421 A1 WO2010035421 A1 WO 2010035421A1
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- WIPO (PCT)
- Prior art keywords
- water
- treatment
- ultraviolet irradiation
- treated
- magnetic
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
Definitions
- the present invention relates to a water treatment apparatus, and more particularly to a water treatment apparatus capable of sterilizing various types of water in an extremely short time.
- sterilization has a very wide meaning depending on the user.
- terms such as sterilization, disinfection, and sterilization are distinguished as follows. Also, when considering the prior art, attention must be paid to these distinctions.
- “Sterilization” refers to the killing of all microorganisms present in the object. “Disinfection” refers to killing target microorganisms. “Sterilization” is conventionally used interchangeably with disinfection, but is an unclear term. It should be noted that when the term “sterilization” is used, unlike “sterilization”, not all microorganisms are killed. The above usage is in accordance with the New Infectious Disease Law and the Ordinance of the Ministry of Health and Welfare.
- the “microorganism” to be sterilized in the present invention mainly includes fungi, bacteria, viruses, and protozoa.
- a sterilization / disinfection method a physical method, a chemical method, and a combination of these methods are known.
- a physical sterilization / disinfection method there is a method using high temperature or high pressure. For example, there is a method of holding at a high pressure at 100 ° C. or higher for a predetermined time. At this time, the object to be sterilized is placed in an environment of steam, water or dry heat. A method of maintaining a temperature higher than room temperature in water has been widely used since ancient times because it is not harmful. However, it should be noted that the microorganisms that can be sterilized differ depending on the temperature and cannot be sterilized.
- an intermittent sterilization method As an application of the method using high temperature, there is an intermittent sterilization method. The intermittent sterilization method is intended to sterilize by removing the bacterial spore state, and after raising the temperature, lowering it allows germination and killing of highly durable spores even at high temperatures. It is what.
- Patent Document 3 discloses a water supply apparatus for magnetic ionized water that is processed while circulating water discharged from a tank. In this apparatus, a magnetic field is applied after irradiating ultraviolet rays in the circulation path, and water can be completely sterilized. However, in Patent Document 3, sterilization is only performed by ultraviolet irradiation (see paragraph 0050). The magnetic magnet circuit is provided only for the purpose of generating magnetic ionized water. In this document, the term “complete sterilization” is used. However, even though complete sterilization is intended, sterilization intended in this specification, that is, killing highly durable microorganisms such as spore bacteria. There is no disclosure of data, and it is extremely suspicious whether it has been completely destroyed. In the past sterilization techniques, there are many literatures that recognize that sterilization can be performed by applying ultraviolet rays, and although sterilization is possible, sterilization is not performed. Even if sterilization is performed under certain conditions, spore germs have not been sterilized.
- the present invention was created based on the above background, and an object of the present invention is to provide a water treatment apparatus capable of sterilizing and sterilizing all microorganisms in a normal temperature region (0 to 40 ° C.) in a very short time. To do.
- the water treatment apparatus of the present invention is a water treatment apparatus that is supplied with treatment target water and performs a predetermined treatment on the treatment target water in a treatment passage, and is provided on the treatment passage with ultraviolet rays applied to the treatment target water.
- An ultraviolet irradiation device that irradiates; a magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated; and between the ultraviolet irradiation device and the magnetic device in the treatment passage.
- a certain percentage of microorganisms are killed by passing the water to be treated through the ultraviolet irradiation apparatus.
- radicals or chemical species that increase radicals for example, superoxide (.O 2 ⁇ ), hydrogen ions (H 3 O + ), hydroxyl radicals (HO.) Hydrogen peroxide (H 2 O 2 ), singlet oxygen ( 1 O 2 ), and ozone (O 3 ) are generated.
- the radicals between the ultraviolet irradiation device and the magnetic device in the treatment path are further increased by the radical increasing means.
- at least one chemical species that increases radicals is increased.
- radicals used in the present invention are mainly composed of constituent elements of water, radicals that have passed through the magnetic device become harmless water.
- the water treatment apparatus of the present invention it is possible to sterilize using a substance that returns to water without using chemicals, and to obtain harmless water that can be consumed. And since the water that has passed through this magnetic device has a high detergency as it is generally said, it can be suitably used for washing foods, etc. It can be suitably used for germination, for example, cultivation of sprout.
- the radical increasing means is a small unit that allows air or oxygen to enter from the upstream side of the ultraviolet irradiation apparatus in the processing passage or between the ultraviolet irradiation apparatus and the magnetic apparatus. It can be a hole or a gap.
- the radical increasing means may be a gas supply device for supplying air or oxygen from the outside upstream of the ultraviolet irradiation device in the processing passage or between the ultraviolet irradiation device and the magnetic device.
- the radical increasing means may use a hydrogen peroxide generator disposed upstream of the ultraviolet irradiation device in the processing path or between the ultraviolet irradiation device and the magnetic device.
- a quantity adjusting device can be provided.
- the sterilizing power of the magnetic device can be further increased, or the harm of the already mixed metal ions can be reduced.
- the water to be treated can be provided from a tank, and a circulation passage connecting the treatment passage and the tank can be provided downstream of the magnetic device.
- any microorganism can be sterilized within a few minutes by circulating the water to be treated in the water treatment apparatus of the present invention and sterilizing.
- radicals are very unstable, the distance between the ultraviolet irradiation device and the magnetic device is shortened, and the water to be treated is passed through the magnetic device with a sufficient amount of radicals. The sterilizing power can be effectively exhibited.
- the water treatment apparatus of the present invention it is possible to sterilize all microorganisms in water in a very short time. And if the food etc. which want to disinfect are wash
- the water treatment apparatus 1 is supplied with the treatment target water A1 from the tank 10 in which the treatment target water A1 is stored, performs a predetermined treatment, and returns the treatment target water A1 to the tank 10.
- the water treatment apparatus 1 mainly includes a pump P, an ultraviolet irradiation device 20, a radical increasing unit 30 as an example of a radical increasing unit, and a magnetic device 40.
- the piping 90 (91-94) which enables circulation of the process target water A1 is provided.
- the tank 10 stores the target water A1.
- the tank 10 is not necessary in principle for the realization of the water treatment apparatus 1 of the present invention, but it is desirable to provide the tank 10 when the treatment target water A1 is treated in a large amount.
- the material of the tank 10 is preferably stainless steel such as SUS316 (JIS).
- the treatment target water A1 that can be treated by the water treatment apparatus 1 of the present invention is not particularly limited as long as it is pure water or other substances dissolved or mixed in water.
- Specific examples of the target water A1 include groundwater, spring water, hot springs, mineral springs, tap water, rainwater, seawater, deep water, waste water from factories, households, agricultural products, marine products, water containing chemicals, Examples include water storage tanks, ballast water, cultivation water, aquaculture water, pool circulation water, medical sterilization water, bathtub water, precision equipment washing water, and semiconductor washing water.
- the pipe 90 includes an introduction pipe 91 that introduces raw water (the water to be treated A1 and water that has not been treated by the water treatment apparatus 1) into the tank 10, and the ultraviolet irradiation apparatus 20 Connected to the introduction pipe 91 in order to return the treatment target water A1 of the treatment pipe 92 downstream of the magnetic apparatus 40 to the tank 10 and the treatment pipe 92 constituting the treatment passage that passes through the radical increasing part 30 and the magnetic apparatus 40 in this order.
- a circulation pipe 93 that constitutes the circulation path and a water discharge pipe 94 that discharges the water to be treated A1 (treated water) that has flowed out of the magnetic device 40.
- the water discharge pipe 94 constitutes a water discharge passage.
- the pump P is provided downstream of the tank 10 on the processing pipe 92 so as to suck the processing target water A1 in the tank 10 and pump it toward the ultraviolet irradiation device 20.
- the arrangement of the pump P is not limited to the form shown in FIG. 1 and may be provided at any position on the processing pipe 92 and the circulation pipe 93.
- a plurality of pumps P may be provided according to the necessary pumping pressure.
- the pumping direction of the processing target water A1 by the pump P needs to allow the processing target water A1 to pass through the ultraviolet irradiation device 20 and the magnetic device 40 in this order as described above.
- the ultraviolet irradiation device 20 is for irradiating the treatment target water A1 with ultraviolet rays through which the treatment target water A1 passes.
- the ultraviolet irradiation device 20 a known so-called ultraviolet sterilization device can be used.
- the ultraviolet irradiation device 20 includes a quartz tube 24 in a cylindrical case 23 having an introduction port 21 into which the water to be treated A1 flows in and an outlet port 22 through which it flows out.
- the tube 24 has an ultraviolet lamp 25.
- the ultraviolet lamp 25 one having a peak wavelength of 254 nm or 185 nm can be used. One or both of these may be selected according to the microorganism to be sterilized.
- the ultraviolet irradiation device 20 can sterilize microorganisms by irradiation with ultraviolet rays per se, but cannot sterilize them.
- the treatment target water A1 is irradiated with ultraviolet rays by the ultraviolet irradiation device 20, the above-described sterilization is performed, and various highly reactive radicals or chemical species that increase radicals are generated from the water.
- These radicals include superoxide (.O 2 ⁇ ), hydrogen ions (H 3 O + ), ozone (O 3 ), hydroxyl radicals (HO.), And hydrogen peroxide (H 2 O) as active oxygen. 2 ), singlet oxygen ( 1 O 2 ), and the like.
- ClO - is also generated.
- the radical increasing portion 30 may be an apparatus in which a female screw hole 32 is formed in a stainless steel pipe 31 and a male screw 33 is screwed into the female screw hole 32.
- the male screw 33 is screwed into the female screw hole 32 through a slight gap. Therefore, when the water to be treated A1 flows into the passage 34 in the stainless steel pipe 31, air slightly enters the passage 34 from the gap between the female screw hole 32 and the male screw 33 due to the negative pressure generated according to the flow velocity of the water to be treated A1. To do.
- nanobubbles The air that has entered the passage 34 is agitated by the flow of the water A1 to be treated, becomes nanobubbles or microbubbles (hereinafter simply referred to as “nanobubbles”), and is hydrogen peroxide (H 2 O derived from water and oxygen). 2 ) including radicals or chemical species that increase radicals are generated. Other chemical species include superoxide (.O 2 ⁇ ), hydrogen ion (H 3 O + ), hydroxyl radical (HO.), Singlet oxygen ( 1 O 2 ), metal-oxygen complex (M -OO) and ozone (O 3 ).
- the generation of the nanobubbles 35 may be adjusted by adjusting the screwing amount of the male screw 33 so that these chemical species are sufficiently generated. Moreover, it is better to set the flow rate of the water to be treated A1 in the stainless steel pipe 31 sufficiently high.
- the stainless steel pipe 31 used for the radical increasing part 30 it is desirable to use SUS316 in JIS (Japanese Industrial Standard), for example.
- JIS Japanese Industrial Standard
- a small amount of iron (Fe) contained in the stainless steel tube 31 of the radical increasing part 30 is dissolved in the treatment target water A1 as metal ions, whereby the sterilizing power in the magnetic device 40 is enhanced.
- the magnetic device 40 is provided with a plurality of magnets 42 arranged outside the pipe 41 through which the water to be treated A1 flows.
- the magnet 42 is disposed so that the water to be treated A1 flowing through the pipe 41 crosses the magnetic field lines. But the arrangement
- the magnet 42 is desirably as strong as possible, and a neodymium magnet can be suitably used.
- the magnet 42 preferably has a magnetic flux density of 0.9 T (9000 Gauss) or more, more preferably 1.2 T (12000 Gauss) or more, and further preferably 1.4 T (14000 Gauss) or more. If the magnetic flux density of the magnet 42 is less than 0.9 T, sterilization in the magnetic device 40 will be insufficient. The larger the magnetic flux density of the magnet 42, the higher the sterilizing power in the magnetic device 40.
- the flow rate of the water to be treated A1 is 2 m / s or more. This is for generating sufficient radicals and increasing the sterilizing power of the magnetic device 40.
- the length (path) of the flow path between the radical increasing portion 30 and the magnetic device 40 is preferably 20 cm or less, and 10 cm or less. Is more desirable.
- the length of the flow path between the ultraviolet irradiation apparatus 20 and the magnetic apparatus 40 is 20 cm or less. It is more desirable that it is 10 cm or less.
- the activated carbon filter 50 is provided on the water discharge pipe 94 on the downstream side of the portion where the treatment pipe 92 branches off from the circulation pipe 93.
- the activated carbon filter 50 is a conventionally known filter filled with activated carbon, and can be arbitrarily provided. Further, such a physical filter may be arranged at a position different from the above. For example, as shown in FIG. 1, a filter 61 may be provided on the circulation pipe 93, or a filter 62 may be provided on the introduction pipe 91 immediately after the raw water is taken in.
- the water treatment apparatus 1 configured as described above operates as follows.
- the raw water introduced from the introduction pipe 91 first enters the tank 10.
- the water to be treated A1 is sucked from the tank 10 by the pump P and enters the treatment pipe 92.
- the treatment target water A1 is sterilized by entering the ultraviolet irradiation device 20. At this time, not all microorganisms are killed, and microorganisms hidden behind suspended solids and highly resistant microorganisms such as spores remain. And a radical generate
- the treatment target water A1 that has passed through the ultraviolet irradiation device 20 then enters the radical increasing unit 30.
- the radical increasing part 30 air enters through a gap between the female screw hole 32 and the male screw 33 provided in the side part in the stainless steel pipe 31, and becomes nanobubbles 35 in the processing target water A 1 that flows at high speed.
- chemical species such as hydrogen peroxide that increases radicals or radicals in the treatment target water A1 increase.
- iron slightly dissolves from the stainless steel pipe 31 into the treatment target water A1.
- the treatment target water A1 having increased radicals enters the magnetic device 40 and passes across the magnetic field lines at high speed. At this time, the sterilizing power of radicals increases, and radicals are converted from an oxidized form to a reduced form. That is, it returns to harmless beneficial water. By increasing the sterilizing power of radicals, some microorganisms that could not be killed by the ultraviolet irradiation device 20 and highly resistant spore bacteria are also killed.
- the microorganisms including the spore bacteria can be sterilized by passing the treatment target water A1 through the water treatment apparatus 1 once.
- the sterilized target water A1 can be appropriately taken out from the outlet pipe 94 and used for experimental water, drinking water, domestic water and the like. Since the outlet pipe 94 is not connected to the tank 10 but is connected between the magnetic device 40 and the tank 10, sterilization integrity and water harmlessness can be further ensured.
- the treatment target water A1 that has passed through a strong magnetic field at a high speed in the magnetic device 40 has a very high osmotic power and a detergency, as is well known. can do. Therefore, the treatment target water A1 that has come out of the magnetic device 40 may be returned into the tank 10 through the circulation pipe 93. Thereby, microorganisms adhering to the inner wall of the tank 10 or suspended matter (microorganism remaining in the tank 10) can be peeled off and suspended in water. The peeled microorganisms are introduced into the processing pipe 92 and completely killed by passing through the ultraviolet irradiation device 20, the radical increasing unit 30, and the magnetic device 40.
- the water treatment device 1 of the present embodiment by passing through the magnetic device 40 in a state in which radicals are increased, particularly by the ultraviolet irradiation device 20, the radical increasing unit 30, and the magnetic device 40, Microorganisms that cannot be killed by normal sterilization methods such as spore bacteria can also be killed. Furthermore, the water to be treated A1 in the tank 10 can be sterilized within a few minutes by returning the water whose cleaning power has been increased by the magnetic treatment to the tank 10 and performing the treatment again.
- the water treatment apparatus 1 of this embodiment is connected in two stages in series, and the food and the like may be washed in the tank 110 at the subsequent stage.
- the cleaning water A2 sterilized by the first-stage apparatus can be cleaned using a large amount of cleaning water, so that the efficiency of cleaning and sterilization can be increased.
- FIG. 6 is a diagram showing another form of the radical increasing means. Since the radical increasing means only needs to generate chemical species mainly composed of hydrogen peroxide, the method is not limited to the above-described method using nanobubbles, and a so-called method for generating hydrogen peroxide may be used.
- the hydrogen peroxide generator 130 shown in FIG. 6 is an example of radical increasing means, and the electrolytic cell 131 is divided into two chambers, that is, an anode chamber 133 and a cathode chamber 134 by a diaphragm 132.
- An anode 135 is provided in the anode chamber 133, and a cathode 136 is provided in the cathode chamber 134.
- the cathode 136 is a porous member, and air or oxygen can be introduced into the cathode chamber 134 by permeation.
- a voltage is applied between the anode 135 and the cathode 136.
- Such a hydrogen peroxide generator 130 may be provided anywhere as long as it is upstream of the magnetic device 40 on the processing pipe 92.
- the ultraviolet irradiation device may also serve as the radical increasing means.
- the ultraviolet irradiation apparatus when the water to be treated A1 is irradiated with ultraviolet rays, superoxide (.O 2 ⁇ ), hydrogen ions (H 3 O + ), hydroxyl radicals (HO.), Hydrogen peroxide (H Radicals such as 2 O 2 ) and singlet oxygen ( 1 O 2 ) are generated. Therefore, if these chemical species are sufficiently generated in the ultraviolet irradiation apparatus, the ultraviolet irradiation apparatus can be used as the radical increasing means (or the ultraviolet irradiation apparatus can also serve as the radical increasing means).
- FIG. 7 is a cross-sectional view of an ion amount regulator having both radical increasing means.
- the ion amount adjuster 230 is formed by mounting a cartridge 239 having a metal layer on at least the surface in a cylindrical column 231. Both the one end 239a and the other end 239b of the cartridge 239 are formed in a tapered shape so that the flow of the treatment target water A1 flowing from the one end 239a toward the other end 239b becomes smooth.
- the pipe 232a extends through the inlet-side cover 232 into which the water to be treated A1 flows, and the female screw hole 234 and the male screw 235 are provided on the side of the pipe 232a in the same manner as the radical increasing part 30 described above. Then, like the radical increasing part 30, air enters the pipe 232 a from the gap between the male screw 235 and the female screw hole 234, and nanobubbles are generated in the ion amount adjuster 230.
- nanobubbles are generated and function as radical increasing means, and metal ions are supplied to enhance the sterilizing power in the magnetic device 40.
- metal ions are supplied to enhance the sterilizing power in the magnetic device 40.
- harmful heavy metals already dissolved in the water to be treated A1 can be rendered harmless.
- the cartridge 239 of the ion amount adjuster 230 is dissolved and decreases, it is preferable that it can be easily replaced.
- the metal material that can be used for the surface of the cartridge 239 include Fe, Co, Ag, Pb, Ni, Al, Mg, Zn, Cu, and Ti.
- the cartridge 239 preferably contains at least one of these metals. More specifically, as the cartridge 239, for example, a metal cartridge in which Ti is mixed with austenitic stainless steel, a metal cartridge in which Zn is mixed in austenitic stainless steel, a metal cartridge in which Cu is mixed in austenitic stainless steel, or the like. Can be mentioned.
- At least the inner peripheral surface of the pipe 90 of the water treatment apparatus 1 contains the metal as described above.
- Materials may be used.
- the processing pipe 92 can be made of stainless steel such as SUS316 (JIS) or copper. Thereby, since metal ion can be supplied to process target water A1, sterilization power can be strengthened or heavy metals etc. can be made harmless.
- the radical increasing portion 30 air is intruded through the gap, but oxygen may be intruded.
- a small hole may be provided instead of the gap between the members.
- air or oxygen may be forcibly injected and supplied into the processing pipe 92 from a pump or a cylinder (gas supply device).
- the position where air or oxygen is introduced into the processing pipe 92 may be anywhere between the tank 10 and the magnetic apparatus 40 or in the circulation pipe 93 as long as it is in front of the magnetic apparatus 40. That is, any place other than the path through which the treated water flows from the magnetic device 40 through the water discharge pipe 94 may be used.
- the processing target water A1 entering the magnetic device 40 has a position and configuration that include sufficient radicals.
- microorganisms in the water to be treated A1 adhere to the inner wall of the tank 10 and remain in the tank 10. In order to avoid this, it is desirable to generate a water flow for separating microorganisms attached to the inner wall.
- a straight tubular stainless steel pipe 91a is provided at the downstream end of the introduction pipe 91, and this stainless steel pipe 91a is directed toward the inner wall 10a of the tank 10 to be treated water A1. So as to be discharged along the inner peripheral surface of the tank 10. Thereby, the water flow along the inner peripheral surface of the tank 10 can be generated by discharging the processing target water A1 from the stainless steel pipe 91a.
- a straight tubular stainless steel pipe 92a is provided at the upstream end of the processing pipe 92, and the stainless steel pipe 92a is disposed along the inner peripheral surface of the tank 10, so that the inside of the tank 10 can be obtained without countering the water flow.
- the treatment target water A1 can be sucked and sent out to the treatment pipe 92 (water treatment apparatus 1).
- the stainless steel pipe 91a is disposed so as to discharge the treatment target water A1 obliquely downward, and the end portion (suction port) of the stainless steel tube 92a is disposed below the end portion (discharge port) of the stainless steel tube 91a.
- a spiral water flow can be generated in the tank 10, and the treatment target water A ⁇ b> 1 can be sucked from the stainless steel pipe 92 a along the spiral water flow.
- the treatment target water A1 in the tank 10 can be uniformly sent to the water treatment device 1 and sterilized. .
- the water treatment apparatus used in the following tests has substantially the same configuration as the above-described embodiment (see FIG. 1) (members corresponding to the filters 61 and 62 are not provided).
- Water in the tank was treated by storing 30 l of tap water or pure water in the tank and operating the water treatment device for a predetermined time.
- the water discharged from the magnetic device is returned to the tank through the circulation pipe and introduced into the treatment pipe again. That is, in this test, treatment is performed while circulating water.
- the water treatment apparatus was operated, and at 1 minute, 2 minutes, and 3 minutes after the start of treatment, the sample water was taken out from the tank, dropped into the culture medium to culture the bacteria, and the number of colonies was counted. These tests were performed for each bacterium.
- the water in the tank was not particularly heated, and the test was performed at room temperature (20 ° C.).
- the water treatment apparatus was operated (room temperature 24 ° C., water temperature 21 ° C., pH 6.5). Then, about 1 second after the start of the operation, 1 ml of water that once passed through the apparatus exiting from the water discharge pipe was collected, and mixed culture was performed at 30 ° C. for 3 to 7 days to count the number of colonies. Such a test was carried out individually for 13 types of microorganisms shown in FIG. 12, and was carried out 10 times for each microorganism.
- the spore bacteria No. 1 can be obtained by passing the water treatment device of the present invention once. All 13 fungi, including 8 Bacillus subtilis, were sterilized. Thus, according to the water treatment apparatus of the present invention, microorganisms can be sterilized in a very short time.
- a test apparatus that performs sterilization by ultraviolet irradiation includes a tank 10 in which the processing target water A1 is stored, a processing pipe 192 in which the processing target water A1 from the tank 10 flows, a pump P, and ultraviolet irradiation.
- a device 120 two ultraviolet lamps (peak wavelengths: 254 nm, 185 nm)) and a water discharge pipe 194 for discharging the water to be treated A1 discharged from the ultraviolet irradiation device 120 are provided.
- Tank volume 30 l
- Flow velocity in processing piping 3.0m / s
- Total length of piping 3m
- the ultraviolet lamp of the ultraviolet irradiation device was turned on, and the pump was started 3 minutes later. Then, after discarding the first 10 l of water discharged from the water discharge pipe, the water discharged from the water discharge pipe was collected, 1 ml was mixed and cultured at 35 ° C., and the number of colonies was counted.
- Such a test was performed individually for the five types of microorganisms shown in FIG. 14, and was performed five times for each microorganism. The test was performed at room temperature (25 ° C.).
- the ultraviolet light irradiation device and the radical increase part were removed from the water treatment device of the present invention, and the test device in which the flow path between the tank and the magnetic device was formed with a stainless steel tube was used to treat only with the magnetic device. Water treatment was performed. The magnetic flux density of the magnet of the magnetic device is 1.37T. The test was performed individually for the five types of microorganisms shown in FIG.
- test apparatus is operated at a flow rate of 3.0 m / s, and 100 ⁇ l of water to be treated is collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish, mixed culture on a standard agar medium, and the number of bacteria is counted. It was measured. The culture was performed at 35 ° C. and observed for up to 48 hours.
- test apparatus is operated at a flow rate of 3.0 m / s, and 100 ⁇ l of water to be treated is collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish, mixed culture on a standard agar medium, and the number of bacteria is counted. It was measured. The culture was performed at 35 ° C. and observed for up to 48 hours.
- test apparatus was operated at a flow rate of 3.0 m / s, and 100 ⁇ l of water to be treated was collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish and inoculated into a GVPC basal medium, and the number of bacteria was measured. .
- the culture was performed at 37 ° C. and observed up to 5 days.
- the residual chlorine concentration was 0.6 ppm after 1 minute treatment, 0.2 ppm after 2 minutes treatment, and 0 ppm after 3 minutes treatment. That is, the residual chlorine concentration decreased as the treatment time passed, and the residual chlorine was not completely detected after 3 minutes.
- residues residual chlorine contained in the water to be treated can be decomposed in a short time.
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Abstract
Description
本発明は、水処理装置に関し、詳しくは、各種の水を極めて短い時間で滅菌することが可能な水処理装置に関する。 The present invention relates to a water treatment apparatus, and more particularly to a water treatment apparatus capable of sterilizing various types of water in an extremely short time.
これまで、水の無害化や殺菌について多くの研究がなされている。しかし、これまでの殺菌は、高温を利用したものであって食品を傷めることなく殺菌ができなかったり、殺菌したとしても不十分であったりしている。
この「殺菌」という用語は、使用する者によって意味に非常に幅があり、本明細書においては、滅菌、消毒、殺菌などの用語を、以下のように区別して用いる。また、先行技術を検討する際においても、これらの区別に注意しなければならない。
So far, many studies have been made on detoxification and sterilization of water. However, conventional sterilization uses high temperature, and cannot be sterilized without damaging food, or even if sterilized, it is insufficient.
The term “sterilization” has a very wide meaning depending on the user. In this specification, terms such as sterilization, disinfection, and sterilization are distinguished as follows. Also, when considering the prior art, attention must be paid to these distinctions.
「滅菌」は、対象物に存在するすべての微生物を殺滅することをいう。「消毒」は、目標とする微生物を殺滅することをいう。「殺菌」は、慣習的に消毒と同意義で使われているが、不明確な言葉である。注意すべきことは、「殺菌」の語が使われるときは、「滅菌」と異なり、すべての微生物が殺滅されるわけではないことである。以上の用法は、感染症新法および厚生省令に従ったものである。なお、本発明で滅菌の対象としている「微生物」は、主として、真菌、細菌、ウイルスおよび原虫を含む。 “Sterilization” refers to the killing of all microorganisms present in the object. “Disinfection” refers to killing target microorganisms. “Sterilization” is conventionally used interchangeably with disinfection, but is an unclear term. It should be noted that when the term “sterilization” is used, unlike “sterilization”, not all microorganisms are killed. The above usage is in accordance with the New Infectious Disease Law and the Ordinance of the Ministry of Health and Welfare. In addition, the “microorganism” to be sterilized in the present invention mainly includes fungi, bacteria, viruses, and protozoa.
一般に、滅菌・消毒の方法は、物理的方法、化学的方法およびこれらを組み合わせた方法が知られている。
物理的な滅菌・消毒方法としては、高温や高圧を使用する方法がある。例えば、高圧で100℃以上に所定の時間保持する方法がある。このとき、滅菌対象物は、蒸気中、水中または乾熱中の環境に置かれる。水中において常温より高い温度に維持する方法は、害が無いため昔から広く用いられている。但し、温度によって、消毒できる微生物が異なり、滅菌できない場合があることに注意する必要がある。高温を用いる方法を応用したものとして間欠滅菌法がある。間欠滅菌法は、細菌の芽胞状態を解いて滅菌を行おうとするものであり、温度を上昇させた後、下降させることで、高温でも非常に耐久性の高い芽胞を発芽させ、殺滅を可能とするものである。
Generally, as a sterilization / disinfection method, a physical method, a chemical method, and a combination of these methods are known.
As a physical sterilization / disinfection method, there is a method using high temperature or high pressure. For example, there is a method of holding at a high pressure at 100 ° C. or higher for a predetermined time. At this time, the object to be sterilized is placed in an environment of steam, water or dry heat. A method of maintaining a temperature higher than room temperature in water has been widely used since ancient times because it is not harmful. However, it should be noted that the microorganisms that can be sterilized differ depending on the temperature and cannot be sterilized. As an application of the method using high temperature, there is an intermittent sterilization method. The intermittent sterilization method is intended to sterilize by removing the bacterial spore state, and after raising the temperature, lowering it allows germination and killing of highly durable spores even at high temperatures. It is what.
化学的な消毒方法としては、いわゆる薬剤を用いる方法があり、対象となる微生物に適した薬剤が選定される。化学的な消毒方法では、一般に滅菌はできない。 As a chemical disinfection method, there is a method using a so-called drug, and a drug suitable for the target microorganism is selected. Chemical sterilization methods generally cannot sterilize.
しかし、高温や高圧を用いた場合、食品を除菌する(食品に付着した微生物を殺滅する)のには適さない。高温や高圧により、食品中の細胞が破壊されるなど変質してしまうからである。また、化学的な薬剤を用いる方法も、薬剤の残留を考慮すると、食品の除菌には適さない。そのため、高温、高圧を用いない、常温(40℃未満)での安全且つ完全な滅菌方法が求められているのである。 However, when high temperature or high pressure is used, it is not suitable for sterilizing food (killing microorganisms attached to food). This is because the cells in the food are deteriorated due to high temperature or high pressure. In addition, a method using a chemical drug is not suitable for sterilization of food in consideration of the residual of the drug. Therefore, a safe and complete sterilization method at normal temperature (less than 40 ° C.) without using high temperature and high pressure is required.
高温、高圧を用いない物理的な殺菌方法としては、従来、紫外線による殺菌が行われてきた。しかし、紫外線による殺菌は、微生物に紫外線が直接当たらなければ効果がないこともあり、それだけでは極めて不完全な殺菌方法であった。 As a physical sterilization method that does not use high temperature and high pressure, sterilization by ultraviolet rays has been conventionally performed. However, sterilization with ultraviolet rays may not be effective unless the microorganisms are directly exposed to ultraviolet rays, and that alone is an extremely incomplete sterilization method.
一方、水を活性化させるための装置が、これまで多々研究されている。水の活性化としては、電場や磁場を水に掛けることにより、水を活性化させる方法がしばしば採用される。例えば、特許文献1の廃液の濾過活性装置や特許文献2の磁気波動水調整装置では、水に磁場を掛けることにより水を活性化している。そして、磁気により活性化した水に紫外線を照射することで、殺菌をしている。
しかし、紫外線による殺菌は、それだけでは極めて不完全であるのは前述したとおりであり、滅菌には程遠いものである。
On the other hand, many devices for activating water have been studied so far. As activation of water, a method of activating water by applying an electric field or a magnetic field to water is often employed. For example, in the waste liquid filtration activation device of
However, as described above, sterilization by ultraviolet rays is extremely incomplete by itself, and is far from sterilization.
特許文献3においては、タンクから出水した水を循環させながら処理する磁気電離水の給水装置が開示されている。この装置においては、循環路において、紫外線を照射した後、磁場を与えており、水の完全殺菌が可能であるとしている。しかし、特許文献3においては、あくまで殺菌は紫外線照射により行われている(段落0050参照)。そして、磁気マグネット回路は、あくまで磁気電離水を生成することを目的として設けられている。また、同文献においては、「完全殺菌」との言葉が使われているが、完全殺菌といっても、本明細書で目的とする滅菌、つまり、芽胞菌などの耐久性が高い微生物の殺滅も完全になされているかは、データの開示も無く極めて疑わしい。これまでの殺菌技術においては、紫外線を当てれば殺菌ができるとの認識に立つ文献が多く、殺菌ができると述べつつも、滅菌はされていないのである。仮に、ある条件で滅菌がされているとしても、芽胞菌の滅菌までは行われていないのである。
また、特許文献3の装置においては、タンクに戻った水を供給しているので、供給される水は、タンク内に残った雑菌が混入する可能性が高いという問題がある。
さらに、上述の特許文献以外の技術(オートクレーブなど)も含め、従来の種々の滅菌装置(高圧蒸気滅菌器、乾熱滅菌器が多く使用される)においては、滅菌に掛かる時間があまり重視されておらず、少なくとも1~2時間を要するものであった。
Moreover, in the apparatus of
Furthermore, in various conventional sterilizers (including high-pressure steam sterilizers and dry heat sterilizers) including technologies (such as autoclaves) other than the above-mentioned patent documents, the time required for sterilization is very important. It took at least 1-2 hours.
本発明は、以上の背景に基づいて創案されたものであり、あらゆる微生物の殺菌・滅菌を、極めて短時間に常温領域(0~40℃)において実現する水処理装置を提供することを目的とする。 The present invention was created based on the above background, and an object of the present invention is to provide a water treatment apparatus capable of sterilizing and sterilizing all microorganisms in a normal temperature region (0 to 40 ° C.) in a very short time. To do.
本発明の水処理装置は、処理対象水が供給され、処理通路内で前記処理対象水に所定の処理をする水処理装置であって、前記処理通路上に設けられ前記処理対象水に紫外線を照射する紫外線照射装置と、前記処理通路における前記紫外線照射装置の下流に設けられ、流通する前記処理対象水に磁場をかける磁気装置と、前記処理通路における前記紫外線照射装置と前記磁気装置との間の、スーパーオキシド(・O2 -)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、過酸化水素(H2O2)、一重項酸素(1O2)、金属-酸素錯体(M-OO)、オゾン(O3)の少なくとも1種を増加させるラジカル増加手段とを備えたことを特徴とする。 The water treatment apparatus of the present invention is a water treatment apparatus that is supplied with treatment target water and performs a predetermined treatment on the treatment target water in a treatment passage, and is provided on the treatment passage with ultraviolet rays applied to the treatment target water. An ultraviolet irradiation device that irradiates; a magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated; and between the ultraviolet irradiation device and the magnetic device in the treatment passage. , Superoxide (.O 2 − ), hydrogen ion (H 3 O + ), hydroxyl radical (HO.), Hydrogen peroxide (H 2 O 2 ), singlet oxygen ( 1 O 2 ), metal-oxygen complex And a radical increasing means for increasing at least one of (M-OO) and ozone (O 3 ).
このような水処理装置によれば、処理対象水が紫外線照射装置内を通過することで、ある程度の割合の微生物が殺滅される。また、処理対象水が紫外線照射装置を通過することで、ラジカルまたはラジカルを増加させる化学種、例えば、スーパーオキシド(・O2 -)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、過酸化水素(H2O2)、一重項酸素(1O2)、オゾン(O3)が生成される。単に通常の水に紫外線を照射した場合、これらのラジカルの量は非常に少量であるので、本発明においては、さらにラジカル増加手段により、処理通路における紫外線照射装置と磁気装置との間の上記ラジカルまたはラジカルを増加させる化学種の少なくとも1種を増加させる。 According to such a water treatment apparatus, a certain percentage of microorganisms are killed by passing the water to be treated through the ultraviolet irradiation apparatus. Further, when the water to be treated passes through the ultraviolet irradiation device, radicals or chemical species that increase radicals, for example, superoxide (.O 2 − ), hydrogen ions (H 3 O + ), hydroxyl radicals (HO.) Hydrogen peroxide (H 2 O 2 ), singlet oxygen ( 1 O 2 ), and ozone (O 3 ) are generated. When ordinary water is simply irradiated with ultraviolet rays, the amount of these radicals is very small. Therefore, in the present invention, the radicals between the ultraviolet irradiation device and the magnetic device in the treatment path are further increased by the radical increasing means. Alternatively, at least one chemical species that increases radicals is increased.
そして、このラジカルが増加した状態で、処理対象水を磁気装置に通過させて処理対象水に磁場を与えることで、ラジカルの酸化力による殺菌力が強くなり、処理対象水中の微生物を一斉に殺滅する。このラジカルと磁場との相互作用により、強力な殺菌がなされると同時に、ラジカルの酸化力が無くなる。本発明で用いているラジカルは、主として水の構成元素からなるから、磁気装置を通過したラジカルは無害な水となる。
このように、本発明の水処理装置によれば、薬品を用いることなく、水に戻る物質を用いて、滅菌を行うことができ、かつ、飲用可能な無害な水を得ることができる。
そして、この磁気装置を通過した水は、一般にも言われているように洗浄力が高いため、食品などの洗浄に好適に用いることができ、浸透力が高く、微生物がいないため、種子の浸漬、発芽、例えばスプラウトの栽培に好適に用いることができる。
Then, in a state where the radicals are increased, the treatment target water is passed through the magnetic device and a magnetic field is applied to the treatment target water, so that the sterilization power due to the oxidizing power of the radicals is increased, and the microorganisms in the treatment target water are killed all at once. Perish. Due to the interaction between the radical and the magnetic field, strong sterilization is performed and at the same time, the oxidizing power of the radical is lost. Since radicals used in the present invention are mainly composed of constituent elements of water, radicals that have passed through the magnetic device become harmless water.
As described above, according to the water treatment apparatus of the present invention, it is possible to sterilize using a substance that returns to water without using chemicals, and to obtain harmless water that can be consumed.
And since the water that has passed through this magnetic device has a high detergency as it is generally said, it can be suitably used for washing foods, etc. It can be suitably used for germination, for example, cultivation of sprout.
前記した水処理装置において、前記ラジカル増加手段は、前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間において、外部から空気または酸素が侵入可能にされた小孔または隙間とすることができる。また、前記ラジカル増加手段は、前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間において、外部から空気または酸素を供給するガス供給器とすることもできる。さらに、前記ラジカル増加手段は、前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間に配置された過酸化水素発生装置を用いることもできる。 In the above-described water treatment apparatus, the radical increasing means is a small unit that allows air or oxygen to enter from the upstream side of the ultraviolet irradiation apparatus in the processing passage or between the ultraviolet irradiation apparatus and the magnetic apparatus. It can be a hole or a gap. Further, the radical increasing means may be a gas supply device for supplying air or oxygen from the outside upstream of the ultraviolet irradiation device in the processing passage or between the ultraviolet irradiation device and the magnetic device. Further, the radical increasing means may use a hydrogen peroxide generator disposed upstream of the ultraviolet irradiation device in the processing path or between the ultraviolet irradiation device and the magnetic device.
前記した水処理装置においては、前記処理通路における前記磁気装置より上流側に、ケースと、当該ケースの中に設けられ、表面に露出した金属を含んでなる交換可能なイオン供給カートリッジとを有するイオン量調整装置を備えることができる。 In the water treatment apparatus described above, an ion having a case and a replaceable ion supply cartridge provided in the case and including a metal exposed on the surface, upstream of the magnetic device in the treatment passage. A quantity adjusting device can be provided.
このようにイオン量調整装置により、金属イオンの量を調整することで、磁気装置における殺菌力をさらに増したり、既に混入している金属イオンの害を減少させたりすることができる。 Thus, by adjusting the amount of metal ions by the ion amount adjusting device, the sterilizing power of the magnetic device can be further increased, or the harm of the already mixed metal ions can be reduced.
前記した水処理装置において、前記処理対象水はタンクから供給され、前記磁気装置の下流で前記処理通路と前記タンクとを接続する循環通路を備えることができる。 In the above-described water treatment apparatus, the water to be treated can be provided from a tank, and a circulation passage connecting the treatment passage and the tank can be provided downstream of the magnetic device.
このように、本発明の水処理装置に処理対象水を循環させて殺菌を行うことで、数分のうちにいかなる微生物をも滅菌することができる。 Thus, any microorganism can be sterilized within a few minutes by circulating the water to be treated in the water treatment apparatus of the present invention and sterilizing.
そして、この循環通路における前記磁気装置と前記タンクとの間には、滅菌・無害化された処理済みの水を取り出す出水通路を設けることが望ましい。 Further, it is desirable to provide a water discharge passage between the magnetic device and the tank in the circulation passage for taking out the sterilized and harmless treated water.
このように、タンクに戻る前の磁気装置の下流部分に出水通路を設けることで、微生物を混入させることなく、滅菌・無害化された処理済みの水を得ることができる。 As described above, by providing a water discharge passage in the downstream portion of the magnetic device before returning to the tank, it is possible to obtain sterilized and harmless treated water without mixing microorganisms.
ラジカルは、非常に不安定であるから、紫外線照射装置と磁気装置の間を短くして、ラジカルの量が十分な状態で処理対象水を磁気装置に通すことで、本発明の水処理装置による殺菌力を効果的に発揮することができる。 Since radicals are very unstable, the distance between the ultraviolet irradiation device and the magnetic device is shortened, and the water to be treated is passed through the magnetic device with a sufficient amount of radicals. The sterilizing power can be effectively exhibited.
本発明の水処理装置によれば、処理対象水について、極めて短時間で、あらゆる微生物を滅菌することが可能である。そして、この水処理装置により処理された水で、除菌したい食品などを洗浄すれば、対象物に付着した微生物を取り除くことができる。また、本発明の水処理装置により処理された水は、無害・無菌であるため、飲用、実験用、農業用などに好適に用いることができる。 According to the water treatment apparatus of the present invention, it is possible to sterilize all microorganisms in water in a very short time. And if the food etc. which want to disinfect are wash | cleaned with the water processed with this water treatment apparatus, the microorganisms adhering to the target object can be removed. Moreover, since the water treated by the water treatment apparatus of the present invention is harmless and sterile, it can be suitably used for drinking, experimental use, agricultural use and the like.
次に、本発明の実施形態について、適宜図面を参照しながら詳細に説明する。
図1に示すように、水処理装置1は、処理対象水A1が貯溜されたタンク10から処理対象水A1が供給され、所定の処理をしてタンク10へ還流させることで処理対象水A1の滅菌を行う装置である。水処理装置1は、主としてポンプPと、紫外線照射装置20と、ラジカル増加手段の一例としてのラジカル増加部30と、磁気装置40とを備えてなる。なお、水処理装置1の各装置を接続するため、処理対象水A1を循環可能にする配管90(91~94)が設けられている。
Next, embodiments of the present invention will be described in detail with reference to the drawings as appropriate.
As shown in FIG. 1, the
タンク10は、処理対象水A1が貯溜されるものである。タンク10は、本発明の水処理装置1の実現のため、原理的には必要なものではないが、処理対象水A1の処理をある程度大量にまとめて行う場合に設けるのが望ましい。タンク10の材質は、SUS316(JIS)などのステンレスを用いるのが望ましい。
The
本発明の水処理装置1で処理することができる処理対象水A1は、純水または水に他の物質が溶解または混入したものであれば特に限定されない。処理対象水A1の具体的な例としては、地下水、湧水、温泉、鉱泉、水道水、雨水、海水、深層水、工場・家庭・農産物処理・水産物処理などの廃水、薬剤の入った水、貯水槽、バラスト水、栽培用水、養殖用水、プールの循環水、医療用滅菌水、浴槽水、精密機器洗浄水、半導体洗浄水などを挙げることができる。
The treatment target water A1 that can be treated by the
配管90は、原水(処理対象水A1であり、水処理装置1で処理前の水)をタンク10へ導入する導入管91と、タンク10から取り出した処理対象水A1を、紫外線照射装置20、ラジカル増加部30および磁気装置40にこの順に通過させる、処理通路を構成する処理配管92と、磁気装置40の下流で処理配管92の処理対象水A1をタンク10に戻すため、導入管91に接続された循環通路を構成する循環配管93と、磁気装置40から出た処理対象水A1(処理済みの水)を出水させる出水配管94とを備えてなる。出水配管94は、出水通路を構成する。
The
ポンプPはタンク10内の処理対象水A1を吸引して紫外線照射装置20に向けて圧送すべく、処理配管92上におけるタンク10の下流に設けられている。ポンプPの配置は図1の形態に限定されず、処理配管92および循環配管93上のいずれの位置に設けてもよい。また、必要な圧送圧力に応じ、複数個のポンプPを設けてもよい。なお、ポンプPによる処理対象水A1の圧送方向は、前記したように処理対象水A1が、紫外線照射装置20、磁気装置40の順に通過するようにする必要がある。
The pump P is provided downstream of the
紫外線照射装置20は、内部を処理対象水A1が通過し、処理対象水A1に紫外線を照射するものである。紫外線照射装置20としては、公知のいわゆる紫外線殺菌装置を用いることができる。例えば、図2に示すように、紫外線照射装置20は、処理対象水A1が流入する導入口21および流出する導出口22を備えた円筒状のケース23内に、石英管24を備え、この石英管24内に紫外線ランプ25を有した構成となっている。紫外線ランプ25としては、ピーク波長が254nmまたは185nmのものを用いることができる。殺菌する対象の微生物に応じて、これらの一方または双方を選択すればよい。
The
ここで、紫外線照射装置20は、微生物に対する紫外線の照射自体による微生物の殺菌はできるが、滅菌はできないことに注意する必要がある。紫外線照射装置20で処理対象水A1に紫外線が照射されると、上記の殺菌がなされるとともに、水から反応性が高い各種のラジカルまたはラジカルを増加させる化学種が発生する。このラジカルとしては、スーパーオキシド(・O2
-)、水素イオン(H3O+)、オゾン(O3)、ヒドロキシルラジカル(HO・)が含まれ、活性酸素として、過酸化水素(H2O2)、一重項酸素(1O2)、などが含まれる。また、水中に塩素が含まれる場合には、ClO-も発生する。
Here, it should be noted that the
ラジカル増加部30は、本実施形態においては、図3に示すように、ステンレス管31に雌ねじ孔32が形成され、この雌ねじ孔32に雄ねじ33が螺合された装置を用いることができる。雄ねじ33は雌ねじ孔32に対して僅かな隙間を介して螺合している。そのため、ステンレス管31内の通路34に処理対象水A1が流れると、処理対象水A1の流速に応じて生じる負圧により、雌ねじ孔32と雄ねじ33の隙間から通路34内に僅かに空気が侵入する。通路34に入った空気は、処理対象水A1の流れによって攪拌され、ナノバブルまたはマイクロバブル(以下、単に「ナノバブル」とする)となって、水および酸素に由来する、過酸化水素(H2O2)を含むラジカルまたはラジカルを増加させる化学種が発生する。この化学種としては、他にも、スーパーオキシド(・O2
-)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、一重項酸素(1O2)、金属-酸素錯体(M-OO)、オゾン(O3)が含まれる。
In the present embodiment, as shown in FIG. 3, the radical increasing
水処理装置1の使用に当たっては、これらの化学種が十分に生じるように、雄ねじ33のねじ込み量を調整してナノバブル35の発生を調整するとよい。また、ステンレス管31内の処理対象水A1の流速を十分高く設定した方がよい。
When using the
ラジカル増加部30に用いるステンレス管31としては、例えばJIS(日本工業規格)でいえばSUS316を用いるのが望ましい。ラジカル増加部30のステンレス管31に含まれる鉄(Fe)は、微量が金属イオンとして処理対象水A1に溶解することで、磁気装置40における殺菌力が増強される。
As the
磁気装置40は、図4に示すように、処理対象水A1が流れるパイプ41の外側に、複数の磁石42が配列されて設けられている。磁石42は、パイプ41を流れる処理対象水A1が磁力線を横断するように配置されている。もっとも、磁石42の配置は図4に示したものに限られず、処理対象水A1の水流が磁力線を横断することができれば、他の配置であっても構わない。
磁石42としては、できるだけ強力なものが望ましく、ネオジム磁石を好適に用いることができる。磁石42としては、磁束密度が0.9T(9000Gauss)以上であることが望ましく、1.2T(12000Gauss)以上であることがより望ましく、1.4T(14000Gauss)以上であることがさらに望ましい。
磁石42の磁束密度は、0.9Tより小さいと、磁気装置40内での滅菌が不十分となる。磁石42の磁束密度は、大きい方が磁気装置40内での殺菌力が高い。
As shown in FIG. 4, the
The
If the magnetic flux density of the
上述の紫外線照射装置20、ラジカル増加部30および磁気装置40のそれぞれにおいて、処理対象水A1の流速は、2m/s以上であるのが望ましい。ラジカルを十分に発生させ、また、磁気装置40での殺菌力を高くするためである。また、ラジカルが酸化力を有した状態で磁気装置40に行き着くようにするため、ラジカル増加部30と磁気装置40との間の流路の長さ(道のり)は、20cm以下が望ましく、10cm以下がさらに望ましい。なお、紫外線照射装置20と磁気装置40の間の配管部分がラジカル増加部30を形成しているときは、紫外線照射装置20と磁気装置40の間の流路の長さが20cm以下であるのが望ましく、10cm以下であるのがさらに望ましい。
In each of the above-described
活性炭フィルタ50は、処理配管92が循環配管93と分岐する部分よりも下流側の出水配管94上に設けられている。活性炭フィルタ50は、活性炭が充填された従来公知のフィルタであり、任意的に設けることができる。また、このような物理的フィルタは、上記と異なる位置に配置しても良い。例えば、図1に示すように、循環配管93上にフィルタ61を設けてもよいし、原水が取り込まれてすぐの導入管91上にフィルタ62を設けてもよい。
The activated
以上のように構成された水処理装置1は、次のように動作する。導入管91から導入された原水は、まず、タンク10に入る。そして、タンク10から、ポンプPにより処理対象水A1が吸引されて処理配管92へ入る。
The
処理対象水A1は、紫外線照射装置20内に入ることで、殺菌される。このとき、すべての微生物が殺滅されるわけではなく、浮遊物の陰に隠れた微生物や耐性の高い微生物、例えば芽胞菌は残存する。そして、処理対象水A1に紫外線が当たることで、水からラジカルが発生する。例えば、上述したように、スーパーオキシド(・O2
-)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、過酸化水素(H2O2)、一重項酸素(1O2)が発生し、また、水道水などの場合には、ClO-も発生する。
The treatment target water A1 is sterilized by entering the
紫外線照射装置20を通過した処理対象水A1は、次にラジカル増加部30に入る。ラジカル増加部30では、ステンレス管31内の側部に設けられた雌ねじ孔32および雄ねじ33の隙間から空気が侵入して、高速で流れる処理対象水A1内でナノバブル35となる。これにより、処理対象水A1内の、ラジカルまたはラジカルを増加させる過酸化水素などの化学種が増加する。また、ステンレス管31から処理対象水A1内に鉄が僅かに溶け込む。
The treatment target water A1 that has passed through the
ラジカルが増加した処理対象水A1は、磁気装置40に入って、高速で磁力線を横切るように通過する。このとき、ラジカルの殺菌力が増加するとともに、ラジカルが酸化型から還元型へ転換する。すなわち、無害な有益水へと戻る。ラジカルの殺菌力が増加することで、紫外線照射装置20では殺滅できなかった一部の微生物や、耐性の高い芽胞菌なども殺滅される。
The treatment target water A1 having increased radicals enters the
このように、処理対象水A1を水処理装置1に一度通過させることで、芽胞菌を含めた微生物を滅菌することができる。滅菌された処理対象水A1は、適宜、出水配管94から取り出して、実験用水、飲料水、生活用水などに用いることができる。出水配管94は、タンク10に接続されているのではなく、磁気装置40とタンク10の間に接続されているので、滅菌の完全性および水の無害性をより確保することができる。
Thus, the microorganisms including the spore bacteria can be sterilized by passing the treatment target water A1 through the
なお、磁気装置40において強力な磁場を高速で通過した処理対象水A1は、よく知られているように非常に浸透力が高く、洗浄力があるため、何かに付着している微生物を剥離することができる。そこで、磁気装置40から出た処理対象水A1を、循環配管93を通してタンク10内へ戻してもよい。これにより、タンク10の内壁や浮遊物などに付着している微生物(タンク10内に残っている微生物)を剥離して、水中に浮遊させることができる。そして、剥離された微生物は、処理配管92に導入されて、紫外線照射装置20、ラジカル増加部30および磁気装置40を通過することで完全に殺滅される。
The treatment target water A1 that has passed through a strong magnetic field at a high speed in the
以上説明したように、本実施形態の水処理装置1によれば、紫外線照射装置20、ラジカル増加部30および磁気装置40により、特に、ラジカルが増加した状態で磁気装置40を通過することにより、芽胞菌などの通常の殺菌方法では殺滅することができない微生物をも殺滅することができる。さらに、磁気処理により洗浄力が増加した水をタンク10に戻して再度処理を行うことで、タンク10内の処理対象水A1を数分のうちに滅菌することができる。
As described above, according to the
本実施形態の水処理装置1を用いて食品などの除菌をする場合、タンク10内で洗浄をすればよい。これにより、磁気処理水の洗浄力と相俟って、食品の表面に付着した微生物を除菌することができる。
食品などの除菌を効率良く行う場合、図5に示すように、本実施形態の水処理装置1を2段直列に繋いで、後段のタンク110で、食品などを洗浄するとよい。このように、2段にすることで、1段目の装置で滅菌された洗浄力の高い洗浄水A2を大量に用いて洗浄できるので、洗浄、除菌の効率を上げることができる。
What is necessary is just to wash | clean in the
In the case of efficiently sterilizing food and the like, as shown in FIG. 5, the
以上に、本発明の実施形態について説明したが、本発明は、前記実施形態に限定されることなく適宜変形して実施することができる。
図6は、ラジカル増加手段の他の形態を示す図である。ラジカル増加手段は、過酸化水素を主とする化学種を発生すれば良いから、前記したナノバブルを用いる方法に限らず、いわゆる過酸化水素を発生する方法を用いてもよい。例えば、図6に示した過酸化水素発生装置130は、ラジカル増加手段の一例であり、電解槽131を隔膜132により2つの部屋、すなわち陽極室133と陰極室134に分ける。そして、陽極室133には陽極135を設け、陰極室134には、陰極136を設ける。陰極136は、多孔性の部材とし、浸透により陰極室134内に空気または酸素を導入可能としておく。そして、陽極135および陰極136の間に電圧を掛ける。
Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments and can be appropriately modified and implemented.
FIG. 6 is a diagram showing another form of the radical increasing means. Since the radical increasing means only needs to generate chemical species mainly composed of hydrogen peroxide, the method is not limited to the above-described method using nanobubbles, and a so-called method for generating hydrogen peroxide may be used. For example, the
このような2つの陽極室133と陰極室134に分かれた電解槽131に処理対象水A1を通すことで、1/2O2+H2O→H2O2の反応により、過酸化水素が発生する。
By passing the treatment target water A1 through the
このような過酸化水素発生装置130は、処理配管92上における磁気装置40より上流であれば、どこに設けてもよい。
Such a
また、ラジカル増加手段として紫外線照射装置を用いてもよい(図1に示す構成において、ラジカル増加部30の代わりに紫外線照射装置を設けてもよい)。また、紫外線照射装置(図1に示す構成における紫外線照射装置20)がラジカル増加手段を兼ねていてもよい。前記したように、処理対象水A1に紫外線が照射されると、水から、スーパーオキシド(・O2
-)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、過酸化水素(H2O2)、一重項酸素(1O2)などのラジカルが発生する。そのため、これらの化学種が紫外線照射装置で十分に生じるのであれば、紫外線照射装置をラジカル増加手段として用いることができる(または紫外線照射装置がラジカル増加手段を兼ねることができる)。
Moreover, you may use an ultraviolet irradiation device as a radical increase means (in the structure shown in FIG. 1, you may provide an ultraviolet irradiation device instead of the radical increase part 30). Further, the ultraviolet irradiation device (the
また、ラジカル増加手段と合わせて、または別個に、処理対象水A1内の金属イオン量を調整するイオン量調整器を設けてもよい。図7は、ラジカル増加手段を併せ持ったイオン量調整器の断面図である。図7に示すように、イオン量調整器230は、円筒状のカラム231内に少なくとも表面に金属層を有するカートリッジ239が装着されてなる。カートリッジ239の一端239aおよび他端239bは、ともにテーパ状に形成され、一端239aから他端239bに向けて流れる処理対象水A1の流れがスムーズになるようになっている。カラム231の一端および他端には、それぞれカートリッジの一端239aおよび他端239bに沿った形状の蓋232,233が設けられている。処理対象水A1が流入してくる入口側の蓋232はパイプ232aが延び、前記したラジカル増加部30と同様に、パイプ232aの側部に雌ねじ孔234と、雄ねじ235が設けられている。そして、ラジカル増加部30と同様に雄ねじ235と雌ねじ孔234の隙間から空気がパイプ232a内に侵入して、イオン量調整器230内でナノバブルを生じるようになっている。
Further, an ion amount adjuster that adjusts the amount of metal ions in the treatment target water A1 may be provided in combination with or separately from the radical increasing means. FIG. 7 is a cross-sectional view of an ion amount regulator having both radical increasing means. As shown in FIG. 7, the
このようなイオン量調整器230によれば、ナノバブルを生じて、ラジカル増加手段として機能するとともに、金属イオンを供給して、磁気装置40内での殺菌力を増強し、また、金属の種類の選択次第で、既に処理対象水A1内に溶解している有害な重金属類を無害化することもできる。
According to such an
イオン量調整器230のカートリッジ239は、溶解して減少するので、容易に交換可能であるのが好ましい。カートリッジ239の表面に用いることができる金属の材質としては、Fe,Co,Ag,Pb,Ni,Al,Mg,Zn,Cu,Tiなどを挙げることができる。カートリッジ239は、これらの金属のうちの少なくとも1種を含有していることが望ましい。より具体的には、カートリッジ239として、例えば、オーステナイト系ステンレス鋼にTiを配合した金属カートリッジや、オーステナイト系ステンレス鋼にZnを配合した金属カートリッジ、オーステナイト系ステンレス鋼にCuを配合した金属カートリッジなどを挙げることができる。
Since the
さらに、このようなイオン量調整器230と合わせて、または別個に、水処理装置1の配管90(特に処理配管92の磁気装置40より上流)の少なくとも内周面に上記したような金属を含む材料を用いてもよい。例えば、処理配管92を、SUS316(JIS)などのステンレス製や、銅製とすることができる。これにより、処理対象水A1に金属イオンを供給することができるので、殺菌力を増強したり、重金属類などを無害化したりすることができる。
Further, in combination with or separately from such an
前記実施形態においては、ラジカル増加部30において、隙間から空気を侵入させたが酸素を侵入させてもよい。また、部材同士の隙間に代えて、小孔を設けてもよい。また、空気や酸素をポンプやボンベ(ガス供給器)などから、強制的に処理配管92内に注入して供給してもよい。さらに、空気や酸素を処理配管92に入れる位置は、磁気装置40の前であれば、タンク10から磁気装置40の間や、循環配管93のどこであってもよい。すなわち、磁気装置40から出水配管94を通って処理済みの水が出ていく経路以外であれば、どこであってもよい。もっとも、磁気装置40に入る処理対象水A1が、十分なラジカルを含むような位置および構成にするのが望ましい。
In the above embodiment, in the radical increasing
なお、前記実施形態のように、タンク10に貯溜した処理対象水A1を水処理装置1に供給する構成において、処理対象水A1中の微生物がタンク10の内壁に付着してタンク10内に残留しないように、内壁に付着した微生物を剥離するための水流を発生させることが望ましい。
In the configuration in which the water to be treated A1 stored in the
例えば、図8(a),(b)に示すように、導入管91の下流端に直管状のステンレス管91aを設け、このステンレス管91aを、タンク10の内壁10aに向けて処理対象水A1を吐出するように、タンク10の内周面に沿わせるように配置する。これにより、ステンレス管91aから処理対象水A1が吐出されることで、タンク10の内周面に沿う水流を発生させることができる。さらに、処理配管92の上流端に直管状のステンレス管92aを設け、このステンレス管92aを、タンク10の内周面に沿わせるように配置することで、水流に逆らうことなく、タンク10内の処理対象水A1を吸引し、処理配管92(水処理装置1)に送り出すことができる。
For example, as shown in FIGS. 8A and 8B, a straight tubular
なお、斜め下方に向けて処理対象水A1を吐出するようにステンレス管91aを配置し、ステンレス管92aの端部(吸入口)をステンレス管91aの端部(吐出口)よりも下方に配置することで、タンク10内にらせん状の水流を発生でき、さらに、らせん状の水流に沿って処理対象水A1をステンレス管92aから吸引することができる。これにより、水流によって内壁10aから剥離した微生物を、水流に沿ってステンレス管92aから吸引することができるので、タンク10内の処理対象水A1を満遍なく水処理装置1に送り出して滅菌することができる。
The
次に、本発明の水処理装置の滅菌の効果を確認した実施例について説明する。なお、以下の試験で用いた水処理装置は、前記した実施形態(図1参照)と略同様の構成を有している(フィルタ61,62に相当する部材は設けていない。)。
Next, examples in which the sterilization effect of the water treatment apparatus of the present invention has been confirmed will be described. In addition, the water treatment apparatus used in the following tests has substantially the same configuration as the above-described embodiment (see FIG. 1) (members corresponding to the
<水処理装置による滅菌試験1>
本発明の水処理装置により、図9~図11の菌名に掲げた57種類の微生物の滅菌試験をした。なお、図中(表中)に示した菌名は、ラテン語表記が正式な名称であり、カタカナ表記は参考として表示している。
<
Using the water treatment apparatus of the present invention, sterilization tests were conducted on 57 types of microorganisms listed in the names of the bacteria in FIGS. In addition, the bacteria name shown in the figure (in the table) is an official name in Latin notation, and katakana notation is displayed for reference.
[試験方法]
水処理装置の仕様は、下記の通りである。
タンク水量 30 l
処理配管における流速 2.5m/s
ラジカル増加部のパイプ材質 SUS316
磁気装置の磁石の磁束密度 1.37T
[Test method]
The specifications of the water treatment device are as follows.
Tank volume 30 l
Flow velocity in treatment pipe 2.5m / s
Pipe material SUS316 of the radical increase part
Magnetic device magnetic flux density 1.37T
タンク内に水道水または純水30 lを貯溜し、水処理装置を所定時間動作させることで、タンク内の水を処理した。なお、本試験では、磁気装置から出た水は、循環配管を通してタンク内に戻され、再度処理配管に導入されている。すなわち、本試験では、水を循環させながら処理している。 Water in the tank was treated by storing 30 l of tap water or pure water in the tank and operating the water treatment device for a predetermined time. In this test, the water discharged from the magnetic device is returned to the tank through the circulation pipe and introduced into the treatment pipe again. That is, in this test, treatment is performed while circulating water.
その後、1mlあたり10000個となるように菌をタンク内に入れた。このときの、処理前のタンク内の水1mlを36℃にて混釈培養しコロニー数をカウントしたのが図9~図11における「対照」である。 Thereafter, the bacteria were placed in the tank so that there would be 10,000 per ml. At this time, 1 ml of water in the tank before the treatment was mixed-cultured at 36 ° C., and the number of colonies was counted as “control” in FIGS.
その後、水処理装置を作動させ、処理開始後1分、2分、3分のそれぞれにおいて、タンク内からサンプルの水を取り出し、培地に滴下して菌を培養し、コロニー数をカウントした。これらの試験を各菌ごとに行った。タンクの水は、特に加温せず、試験は室温下(20℃)で行った。 Thereafter, the water treatment apparatus was operated, and at 1 minute, 2 minutes, and 3 minutes after the start of treatment, the sample water was taken out from the tank, dropped into the culture medium to culture the bacteria, and the number of colonies was counted. These tests were performed for each bacterium. The water in the tank was not particularly heated, and the test was performed at room temperature (20 ° C.).
[試験結果]
図9~図11に示すように、57種の菌中、10種の菌は1分間の処理で滅菌され、50種の菌は、2分間経過した時点で滅菌され、3分間経過した時点では、57種のすべての菌が滅菌された。このように、従来であれば、高温を用いても十数分以上掛かっていた滅菌の処理を、常温(40℃以下)において、3分以内で行うことができた。
[Test results]
As shown in FIGS. 9 to 11, of 57 types of bacteria, 10 types of bacteria are sterilized by treatment for 1 minute, 50 types of bacteria are sterilized after 2 minutes, and when 3 minutes have passed. All 57 species were sterilized. As described above, conventionally, the sterilization treatment that has taken 10 or more minutes even at high temperatures can be performed within 3 minutes at room temperature (40 ° C. or less).
特に、最も耐性が強いとされる芽胞(spore 99%)である、No.38のBacillus subtilisであっても3分以内で滅菌されていることから、現在知りうる菌についてはすべてについて3分以内で滅菌が可能であると推測される。 In particular, most resistant are spores are strong (spore 99%), No. Since 38 is sterilized at an even within 3 minutes Bacillus subtilis, and 3 minutes for all the bacteria can know now It is estimated that sterilization is possible.
<水処理装置による滅菌試験2>
本発明の水処理装置により、図12の菌名に掲げた13種類の微生物の滅菌試験をした。なお、本試験は、水の循環処理を行ってタンク内からサンプルを取り出す方法ではなく、水処理装置を一度通した水を出水配管から採取してサンプルとする方法で行った。
<
The sterilization test of 13 types of microorganisms listed in the name of the bacteria in FIG. In addition, this test was not the method of taking out the sample from the tank by performing the water circulation treatment, but the method of collecting the water once passed through the water treatment apparatus from the outlet pipe to make the sample.
[試験方法]
水処理装置の仕様は、下記の通りである。
タンクの材質 SUS316
タンク水量 30 l
処理配管における流速 3.1m/s
ラジカル増加部のパイプ材質 SUS316
磁気装置の磁石の磁束密度 1.37T
[Test method]
The specifications of the water treatment device are as follows.
Tank material SUS316
Tank volume 30 l
Flow velocity in treatment piping 3.1m / s
Pipe material SUS316 of the radical increase part
Magnetic device magnetic flux density 1.37T
純水30 lをタンク内に入れた。次に、菌株を約106個/mlとなるように希釈して、タンク内の水に添加した。このときの、タンク内の水1mlを採取して、30℃にて3~7日間、混釈培養しコロニー数をカウントしたのが図12における「対照」である。 30 l of pure water was placed in the tank. Next, the strain was diluted to about 10 6 cells / ml and added to the water in the tank. At this time, 1 ml of water in the tank was collected and cultured in pour at 30 ° C. for 3 to 7 days, and the number of colonies was counted as “control” in FIG.
その後、水処理装置を作動させた(室温24℃、水温21℃、pH6.5)。そして、作動開始から約1秒後に出水配管から出る装置内を1回通過した水を1ml採取し、30℃にて3~7日間、混釈培養してコロニー数をカウントした。このような試験を、図12に示す13種類の微生物について個別に実施し、各微生物について10回ずつ実施した。
Thereafter, the water treatment apparatus was operated (
[試験結果]
図12に示すように、本発明の水処理装置を一度通過させるだけで、芽胞菌であるNo.8のBacillus subtilisを含む、13種類すべての菌が滅菌された。このように、本発明の水処理装置によれば、微生物を極めて短い時間で滅菌することができる。
[Test results]
As shown in FIG. 12, the spore bacteria No. 1 can be obtained by passing the water treatment device of the present invention once. All 13 fungi, including 8 Bacillus subtilis, were sterilized. Thus, according to the water treatment apparatus of the present invention, microorganisms can be sterilized in a very short time.
<紫外線照射による殺菌との比較試験>
本発明の水処理装置による殺菌(滅菌)と、紫外線照射による殺菌とを比較した試験をした。
<Comparison test with sterilization by UV irradiation>
A test was conducted comparing sterilization (sterilization) using the water treatment apparatus of the present invention and sterilization using ultraviolet irradiation.
[試験方法]
水処理装置の仕様は、下記の通りである。
タンク水量 30 l
処理配管における流速 2.5m/s
ラジカル増加部のパイプ材質 SUS316
磁気装置の磁石の磁束密度 1.37T
[Test method]
The specifications of the water treatment device are as follows.
Tank volume 30 l
Flow velocity in treatment pipe 2.5m / s
Pipe material SUS316 of the radical increase part
Magnetic device magnetic flux density 1.37T
紫外線照射による殺菌を行う試験装置は、図13に示すように、処理対象水A1が貯溜されるタンク10と、タンク10からの処理対象水A1が流れる処理配管192と、ポンプPと、紫外線照射装置120(紫外線ランプ 2本(ピーク波長:254nm,185nm))と、紫外線照射装置120から出た処理対象水A1を出水させる出水配管194とを有している。
As shown in FIG. 13, a test apparatus that performs sterilization by ultraviolet irradiation includes a
試験装置の仕様は、下記の通りである。
タンク水量 30 l
処理配管における流速 3.0m/s
配管(ポンプ、紫外線照射装置を含む)の全長 3m
The specifications of the test equipment are as follows.
Tank volume 30 l
Flow velocity in processing piping 3.0m / s
Total length of piping (including pump and UV irradiation device) 3m
純水30 lをタンク内に入れ、予め菌数を調整した菌液(約106個/ml)をタンク内に入れた。このときの、処理前のタンク内の水1mlを採取し、35℃にて混釈培養しコロニー数をカウントしたのが図14(a),(b)における「対照」である。 30 l of pure water was put in the tank, and a bacterial solution (about 10 6 cells / ml) whose number of bacteria was adjusted in advance was put in the tank. At this time, 1 ml of water in the tank before the treatment was collected, mixed culture was performed at 35 ° C., and the number of colonies was counted as “control” in FIGS. 14 (a) and 14 (b).
タンク内の水を採取した後、紫外線照射装置の紫外線ランプを点灯させ、その3分後にポンプを始動した。そして、出水配管から出る最初の10 l分の水を捨てた後、出水配管から出る水を採取し、1mlを35℃にて混釈培養してコロニー数をカウントした。このような試験を、図14に示す5種類の微生物について個別に実施し、各微生物について5回ずつ実施した。なお、試験は室温下(25℃)で行った。 After collecting water in the tank, the ultraviolet lamp of the ultraviolet irradiation device was turned on, and the pump was started 3 minutes later. Then, after discarding the first 10 l of water discharged from the water discharge pipe, the water discharged from the water discharge pipe was collected, 1 ml was mixed and cultured at 35 ° C., and the number of colonies was counted. Such a test was performed individually for the five types of microorganisms shown in FIG. 14, and was performed five times for each microorganism. The test was performed at room temperature (25 ° C.).
[試験結果]
図14(a)に示すように、本発明の水処理装置で処理した場合には、5種類すべての菌が滅菌された。一方、図14(b)に示すように、紫外線照射だけで処理した場合には、芽胞を形成するBacillus subtilisについて、完全に滅菌できない場合があった(5回目)。紫外線照射装置120は、強力な紫外線ランプを2本有し、かつ、紫外線が微生物に当たりやすいように工夫されているので、紫外線の照射だけでもほとんどの菌を殺菌することができているが、これが一般的な紫外線照射装置であれば、さらに殺菌力が低下するものと推測され、処理量が多い場合には高い確率で滅菌できない場合があると推測される。
[Test results]
As shown in FIG. 14 (a), when treated with the water treatment apparatus of the present invention, all five types of bacteria were sterilized. On the other hand, as shown in FIG. 14 (b), when treated only with ultraviolet irradiation, Bacillus subtilis that formed spores could not be completely sterilized (fifth time). The
<磁気による処理試験>
図15に示す5種類の微生物について、磁気のみで滅菌することが可能か試験した。
[試験方法]
本試験では、本発明の水処理装置から、紫外線照射装置とラジカル増加部を取り外し、ステンレス管でタンクと磁気装置との間の流路を形成した試験装置を用いて、磁気装置だけで処理対象水の処理を行った。磁気装置の磁石の磁束密度は1.37Tである。試験は、図15に示す5種類の微生物について個別に実施した。
<Magnetic treatment test>
About five types of microorganisms shown in FIG. 15, it was tested whether it was possible to sterilize only by magnetism.
[Test method]
In this test, the ultraviolet light irradiation device and the radical increase part were removed from the water treatment device of the present invention, and the test device in which the flow path between the tank and the magnetic device was formed with a stainless steel tube was used to treat only with the magnetic device. Water treatment was performed. The magnetic flux density of the magnet of the magnetic device is 1.37T. The test was performed individually for the five types of microorganisms shown in FIG.
(Staphylococcus aureus・Pseudomonas aeruginosa・Bacillus subtilis)
純水25 l(23℃)をタンク内に入れ、0.45%滅菌食塩水2mlに約3×108個/mlの菌液を調整した。タンク内に菌液250μlを入れ、よく攪拌して約3×103個/mlとした。そして、タンク内から処理対象水100μlを滅菌シャーレに採取し、標準寒天培地で混釈培養して「未処理」の菌数を測定した。次に、流速3.0m/sで試験装置を作動させ、60分後まで10分おきにタンク内から処理対象水100μlを滅菌シャーレに採取し、標準寒天培地で混釈培養し、菌数を測定した。なお、培養は35℃で行い、48時間まで観察した。
(Staphylococcus aureus, Pseudomonas aeruginosa, Bacillus subtilis)
25 l of pure water (23 ° C.) was placed in the tank, and about 3 × 10 8 cells / ml of bacterial solution was prepared in 2 ml of 0.45% sterile saline. The bacterial solution (250 μl) was placed in the tank and stirred well to make about 3 × 10 3 cells / ml. Then, 100 μl of water to be treated was collected from the tank in a sterilized petri dish and mixed-cultured on a standard agar medium to measure the number of “untreated” bacteria. Next, the test apparatus is operated at a flow rate of 3.0 m / s, and 100 μl of water to be treated is collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish, mixed culture on a standard agar medium, and the number of bacteria is counted. It was measured. The culture was performed at 35 ° C. and observed for up to 48 hours.
(Escherichia coli)
純水25 l(23℃)をタンク内に入れ、0.45%滅菌食塩水2mlに約1.5×108個/mlの菌液を調整した。タンク内に菌液2.5mlを入れ、よく攪拌して約1.5×104個/mlとした。そして、タンク内から処理対象水100μlを滅菌シャーレに採取し、標準寒天培地で混釈培養して「未処理」の菌数を測定した。次に、流速3.0m/sで試験装置を作動させ、60分後まで10分おきにタンク内から処理対象水100μlを滅菌シャーレに採取し、標準寒天培地で混釈培養し、菌数を測定した。なお、培養は35℃で行い、48時間まで観察した。
(Escherichia coli)
25 l of pure water (23 ° C.) was placed in the tank, and about 1.5 × 10 8 cells / ml of bacterial solution was prepared in 2 ml of 0.45% sterile saline. Into the tank, 2.5 ml of the bacterial solution was placed and stirred well to obtain about 1.5 × 10 4 cells / ml. Then, 100 μl of water to be treated was collected from the tank in a sterilized petri dish and mixed-cultured on a standard agar medium to measure the number of “untreated” bacteria. Next, the test apparatus is operated at a flow rate of 3.0 m / s, and 100 μl of water to be treated is collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish, mixed culture on a standard agar medium, and the number of bacteria is counted. It was measured. The culture was performed at 35 ° C. and observed for up to 48 hours.
(Legionella pneumophila)
純水25 l(23℃)をタンク内に入れ、0.45%滅菌食塩水2mlに約3×108個/mlの菌液を調整した。タンク内に菌液250μlを入れ、よく攪拌して約3×103個/mlとした。そして、タンク内から処理対象水100μlを滅菌シャーレに採取し、GVPC基礎培地に接種して「未処理」の菌数を測定した。次に、流速3.0m/sで試験装置を作動させ、60分後まで10分おきにタンク内から処理対象水100μlを滅菌シャーレに採取し、GVPC基礎培地に接種して菌数を測定した。なお、培養は37℃で行い、5日まで観察した。
(Legionella pneumophila)
25 l of pure water (23 ° C.) was placed in the tank, and about 3 × 10 8 cells / ml of bacterial solution was prepared in 2 ml of 0.45% sterile saline. The bacterial solution (250 μl) was placed in the tank and stirred well to make about 3 × 10 3 cells / ml. Then, 100 μl of water to be treated was collected from the tank in a sterile petri dish and inoculated into the GVPC basal medium, and the number of “untreated” bacteria was measured. Next, the test apparatus was operated at a flow rate of 3.0 m / s, and 100 μl of water to be treated was collected from the tank every 10 minutes until 60 minutes later in a sterile petri dish and inoculated into a GVPC basal medium, and the number of bacteria was measured. . The culture was performed at 37 ° C. and observed up to 5 days.
[試験結果]
図15に示すように、磁気のみをかける場合でも、処理時間が長くなるにつれて菌数が減少する傾向が確認されたが、60分処理した場合であっても滅菌には程遠いものであった。したがって、磁気のみで短時間に滅菌することができないことが確認された。
[Test results]
As shown in FIG. 15, even when only magnetism was applied, it was confirmed that the number of bacteria decreased as the treatment time increased, but even when treated for 60 minutes, it was far from sterilization. Therefore, it was confirmed that it was not possible to sterilize in a short time using only magnetism.
<残留物の濃度測定試験>
本発明の水処理装置で処理した水に含まれる残留物(残留塩素(ClO-))の濃度を測定した。
<Residue concentration measurement test>
The density | concentration of the residue (residual chlorine (ClO < - >)) contained in the water processed with the water treatment apparatus of this invention was measured.
[試験方法]
水処理装置の仕様は、下記の通りである。
タンク水量 30 l
処理配管における流速 2.5m/s
ラジカル増加部のパイプ材質 SUS316
磁気装置の磁石の磁束密度 1.37T
[Test method]
The specifications of the water treatment device are as follows.
Tank volume 30 l
Flow velocity in treatment pipe 2.5m / s
Pipe material SUS316 of the radical increase part
Magnetic device magnetic flux density 1.37T
タンク内に水道水30 l(22℃)を貯溜し、水処理装置を所定時間動作させることで、タンク内の水を処理した。その後、処理開始後1分、2分、3分のそれぞれにおいて、タンク内からサンプルの水を取り出し、DPD(ジエチルパラフェニレンジアミン)試薬を加えた。そして、そのときの発色と標準カラーチャートとを比較して残留塩素(遊離残塩)濃度を判定した(いわゆる、DPD法)。なお、タンク内に入れた水道水の残留塩素濃度は1.0ppmであった。 30 l of tap water (22 ° C.) was stored in the tank, and the water in the tank was treated by operating the water treatment device for a predetermined time. Thereafter, at 1 minute, 2 minutes, and 3 minutes after the start of the treatment, water of the sample was taken out from the tank, and DPD (diethylparaphenylenediamine) reagent was added. The color development at that time was compared with the standard color chart to determine the residual chlorine (free residual salt) concentration (so-called DPD method). In addition, the residual chlorine concentration of the tap water put in the tank was 1.0 ppm.
[試験結果]
残留塩素濃度は、1分間の処理で0.6ppm、2分間の処理で0.2ppm、3分間の処理で0ppmとなった。すなわち、処理時間が経過するにつれて残留塩素濃度が減少していき、3分間経過した時点で残留塩素は完全に検出されなかった。以上より、本発明の水処理装置によれば、微生物を短時間で滅菌できるだけでなく、処理対象水に含まれる残留物(残留塩素)も短時間に分解することができる。
[Test results]
The residual chlorine concentration was 0.6 ppm after 1 minute treatment, 0.2 ppm after 2 minutes treatment, and 0 ppm after 3 minutes treatment. That is, the residual chlorine concentration decreased as the treatment time passed, and the residual chlorine was not completely detected after 3 minutes. As described above, according to the water treatment apparatus of the present invention, not only microorganisms can be sterilized in a short time, but also residues (residual chlorine) contained in the water to be treated can be decomposed in a short time.
Claims (10)
前記処理通路上に設けられ前記処理対象水に紫外線を照射する紫外線照射装置と、
前記処理通路における前記紫外線照射装置の下流に設けられ、流通する前記処理対象水に磁場をかける磁気装置と、
前記処理通路における前記紫外線照射装置と前記磁気装置との間の、スーパーオキシド(・O2 -)、水素イオン(H3O+)、ヒドロキシルラジカル(HO・)、過酸化水素(H2O2)、一重項酸素(1O2)、金属-酸素錯体(M-OO)、オゾン(O3)の少なくとも1種を増加させるラジカル増加手段とを備えたことを特徴とする水処理装置。 A water treatment apparatus that is supplied with water to be treated and performs a predetermined treatment on the water to be treated in a treatment passage,
An ultraviolet irradiation device that is provided on the treatment path and irradiates the treatment target water with ultraviolet rays;
A magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated;
Superoxide (.O 2 − ), hydrogen ions (H 3 O + ), hydroxyl radicals (HO.), Hydrogen peroxide (H 2 O 2 ) between the ultraviolet irradiation device and the magnetic device in the treatment path. ), Radical increasing means for increasing at least one of singlet oxygen ( 1 O 2 ), metal-oxygen complex (M-OO), and ozone (O 3 ).
前記処理通路上に設けられ前記処理対象水に紫外線を照射する紫外線照射装置と、
前記処理通路における前記紫外線照射装置の下流に設けられ、流通する前記処理対象水に磁場をかける磁気装置と、
前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間に設けられ、外部から空気または酸素が侵入可能な小孔または隙間とを備えたことを特徴とする水処理装置。 A water treatment apparatus that is supplied with water to be treated and performs a predetermined treatment on the water to be treated in a treatment passage,
An ultraviolet irradiation device that is provided on the treatment path and irradiates the treatment target water with ultraviolet rays;
A magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated;
Water provided at the upstream side of the ultraviolet irradiation device in the processing passage or between the ultraviolet irradiation device and the magnetic device, and having a small hole or a gap through which air or oxygen can enter from the outside Processing equipment.
前記処理通路上に設けられ前記処理対象水に紫外線を照射する紫外線照射装置と、
前記処理通路における前記紫外線照射装置の下流に設けられ、流通する前記処理対象水に磁場をかける磁気装置と、
前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間に設けられ、外部から空気または酸素を供給するガス供給器とを備えたことを特徴とする水処理装置。 A water treatment apparatus that is supplied with water to be treated and performs a predetermined treatment on the water to be treated in a treatment passage,
An ultraviolet irradiation device that is provided on the treatment path and irradiates the treatment target water with ultraviolet rays;
A magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated;
A water treatment apparatus comprising a gas supply unit that supplies air or oxygen from the outside, provided on the upstream side of the ultraviolet irradiation apparatus in the processing passage or between the ultraviolet irradiation apparatus and the magnetic apparatus. .
前記処理通路上に設けられ前記処理対象水に紫外線を照射する紫外線照射装置と、
前記処理通路における前記紫外線照射装置の下流に設けられ、流通する前記処理対象水に磁場をかける磁気装置と、
前記処理通路における前記紫外線照射装置の上流側または前記紫外線照射装置と前記磁気装置との間に配置された過酸化水素発生装置とを備えたことを特徴とする水処理装置。 A water treatment apparatus that is supplied with water to be treated and performs a predetermined treatment on the water to be treated in a treatment passage,
An ultraviolet irradiation device that is provided on the treatment path and irradiates the treatment target water with ultraviolet rays;
A magnetic device that is provided downstream of the ultraviolet irradiation device in the treatment passage and applies a magnetic field to the water to be treated;
A water treatment apparatus comprising: a hydrogen peroxide generator disposed upstream of the ultraviolet irradiation apparatus in the processing passage or between the ultraviolet irradiation apparatus and the magnetic apparatus.
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| JP2009539956A JPWO2010035421A1 (en) | 2008-09-26 | 2009-09-14 | Water treatment equipment |
| CN2009801379366A CN102164863A (en) | 2008-09-26 | 2009-09-14 | Apparatus for water treatment |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2009/004574 Ceased WO2010035421A1 (en) | 2008-09-26 | 2009-09-14 | Apparatus for water treatment |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2010035421A1 (en) |
| CN (1) | CN102164863A (en) |
| WO (1) | WO2010035421A1 (en) |
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| JP2012525247A (en) * | 2009-04-30 | 2012-10-22 | ロワラ | Purification method and apparatus for removing xenobiotics in water |
| JP2014213215A (en) * | 2013-04-22 | 2014-11-17 | 中村物産有限会社 | Sterilization apparatus and sterilization method |
| CN104163538A (en) * | 2014-07-13 | 2014-11-26 | 朱建林 | Apparatus for removing malachite green by employing cooperation treatment of magnetization, UV irradiation and oxygen dissolve |
| JP2015020940A (en) * | 2013-07-22 | 2015-02-02 | 国立大学法人静岡大学 | Hydrogen peroxide synthesis method |
| JP2015110205A (en) * | 2013-12-06 | 2015-06-18 | 中村物産有限会社 | Sterilization device and sterilization method |
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| WO2016203604A1 (en) * | 2015-06-18 | 2016-12-22 | 神田 智一 | Cleaning device and cleaning method in which same is used |
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| JPH10156349A (en) * | 1996-12-03 | 1998-06-16 | Tadashi Mochiki | Method for sterilizing, deodorizing and purifying air and water and device therefor |
| JP2002028649A (en) * | 2000-07-14 | 2002-01-29 | Atlas:Kk | Fluid cleaner |
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| WO2006043351A1 (en) * | 2004-10-19 | 2006-04-27 | Yamada Evidence Research Co., Ltd. | Radical-containing water production apparatus and use thereof |
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| WO2008096508A1 (en) * | 2007-02-05 | 2008-08-14 | Nippon Lithograph, Inc. | System for providing dampening water by lowering the surface tension of water to be used in offset printing, so-called lithographic printing, system |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012525247A (en) * | 2009-04-30 | 2012-10-22 | ロワラ | Purification method and apparatus for removing xenobiotics in water |
| CN101811750A (en) * | 2010-04-02 | 2010-08-25 | 浙江大学 | Magnetic assist-photolysis composite water purifier and application thereof |
| JP2014213215A (en) * | 2013-04-22 | 2014-11-17 | 中村物産有限会社 | Sterilization apparatus and sterilization method |
| JP2015020940A (en) * | 2013-07-22 | 2015-02-02 | 国立大学法人静岡大学 | Hydrogen peroxide synthesis method |
| JP2015110205A (en) * | 2013-12-06 | 2015-06-18 | 中村物産有限会社 | Sterilization device and sterilization method |
| JPWO2015088043A1 (en) * | 2013-12-12 | 2017-03-16 | 山田 光男 | Water reforming unit, reforming system and reforming method |
| WO2015088043A1 (en) * | 2013-12-12 | 2015-06-18 | 山田光男 | Water modification unit, modification system and modification method |
| CN104163538A (en) * | 2014-07-13 | 2014-11-26 | 朱建林 | Apparatus for removing malachite green by employing cooperation treatment of magnetization, UV irradiation and oxygen dissolve |
| WO2016203604A1 (en) * | 2015-06-18 | 2016-12-22 | 神田 智一 | Cleaning device and cleaning method in which same is used |
| US20190047882A1 (en) * | 2016-03-04 | 2019-02-14 | Tomokazu KANDA | Coating liquid preparing device and coating device |
| WO2018146268A1 (en) * | 2017-02-10 | 2018-08-16 | Suez Groupe | Method and apparatus for cleaning and disinfection of conduits |
| JP2021013681A (en) * | 2019-07-16 | 2021-02-12 | 東芝ライフスタイル株式会社 | Washing machine |
| JP7344688B2 (en) | 2019-07-16 | 2023-09-14 | 東芝ライフスタイル株式会社 | washing machine |
| JP7022466B1 (en) | 2021-02-01 | 2022-02-18 | テンソー電磁技術工業株式会社 | Micro bubble amplification device |
| JP2022117919A (en) * | 2021-02-01 | 2022-08-12 | テンソー電磁技術工業株式会社 | Micro bubble amplification device |
| KR20210045961A (en) * | 2021-04-07 | 2021-04-27 | 재단법인 한국탄소산업진흥원 | Manufacturing mathod of high density form of catalysts for carbon nanotubes |
| KR102500346B1 (en) | 2021-04-07 | 2023-02-15 | 재단법인 한국탄소산업진흥원 | Manufacturing mathod of high density form of catalysts for carbon nanotubes |
| WO2025102129A1 (en) * | 2023-11-17 | 2025-05-22 | Guimaraes Maria Giulia | Device for generating single oxygen by magnetic field action for in situ oxidation/degradation of complex chemical systems |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102164863A (en) | 2011-08-24 |
| JPWO2010035421A1 (en) | 2012-02-16 |
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