WO2010013765A1 - Method for manufacturing magnetic recording medium, and magnetic recording medium - Google Patents
Method for manufacturing magnetic recording medium, and magnetic recording medium Download PDFInfo
- Publication number
- WO2010013765A1 WO2010013765A1 PCT/JP2009/063543 JP2009063543W WO2010013765A1 WO 2010013765 A1 WO2010013765 A1 WO 2010013765A1 JP 2009063543 W JP2009063543 W JP 2009063543W WO 2010013765 A1 WO2010013765 A1 WO 2010013765A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- recording medium
- magnetic recording
- etching
- forming
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
Landscapes
- Drying Of Semiconductors (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Heads (AREA)
Abstract
Provided is a method for manufacturing a magnetic recording medium, wherein the magnetic recording medium can be surely planarized without grinding a recording magnetic layer. A manufacturing apparatus having a stop layer forming chamber (116), an embedding layer forming chamber (117), a first etching chamber (118) and a second etching chamber (119) is used, and the following steps are executed; a step of forming a recording magnetic layer with an uneven pattern, a step of filling a recessed section of the recording magnetic layer by forming an embedding layer composed of a nonmagnetic material in the recessed section, an etching step of removing an excess embedding layer by etching, and a step of forming a film of a nonmagnetic material as a stop layer prior to the etching step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010522746A JP5174170B2 (en) | 2008-07-31 | 2009-07-30 | Magnetic recording medium manufacturing method and magnetic recording medium manufacturing apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008197736 | 2008-07-31 | ||
| JP2008-197736 | 2008-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2010013765A1 true WO2010013765A1 (en) | 2010-02-04 |
Family
ID=41610464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2009/063543 Ceased WO2010013765A1 (en) | 2008-07-31 | 2009-07-30 | Method for manufacturing magnetic recording medium, and magnetic recording medium |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5174170B2 (en) |
| CN (2) | CN101645276B (en) |
| WO (1) | WO2010013765A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011118974A (en) * | 2009-12-02 | 2011-06-16 | Hitachi Global Storage Technologies Netherlands Bv | Magnetic recording medium and method for manufacturing the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130004736A1 (en) * | 2011-06-30 | 2013-01-03 | Seagate Technology, Llc | Method of protecting patterned magnetic materials of a stack |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08274142A (en) * | 1995-03-30 | 1996-10-18 | Anelva Corp | In-line type film deposition system |
| JP2006318648A (en) * | 2003-12-25 | 2006-11-24 | Tdk Corp | Method for filling recessed section in irregular pattern, and manufacturing method of magnetic recording medium |
| JP2007220196A (en) * | 2006-02-16 | 2007-08-30 | Fujitsu Ltd | Magnetic recording medium and method for manufacturing the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62162219A (en) * | 1986-01-10 | 1987-07-18 | Hitachi Maxell Ltd | Double-sided magnetic recording medium and its manufacturing method |
| CN1240635C (en) * | 1996-02-26 | 2006-02-08 | 日本碍子株式会社 | Crystalled glass and manufacture thereof, magnetic disc and substrate therefor |
| JP2005056535A (en) * | 2003-08-07 | 2005-03-03 | Tdk Corp | Method and device for manufacturing magnetic recording medium |
| JP3916636B2 (en) * | 2005-02-15 | 2007-05-16 | Tdk株式会社 | Magnetic recording medium, magnetic recording / reproducing apparatus |
| US20070137063A1 (en) * | 2005-12-21 | 2007-06-21 | Hitachi Global Storage Technologies Netherlands, B.V. | Carbon beam deposition chamber for reduced defects |
-
2009
- 2009-07-30 WO PCT/JP2009/063543 patent/WO2010013765A1/en not_active Ceased
- 2009-07-30 JP JP2010522746A patent/JP5174170B2/en active Active
- 2009-07-31 CN CN2009101617101A patent/CN101645276B/en active Active
- 2009-07-31 CN CN200910161707XA patent/CN101645275B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08274142A (en) * | 1995-03-30 | 1996-10-18 | Anelva Corp | In-line type film deposition system |
| JP2006318648A (en) * | 2003-12-25 | 2006-11-24 | Tdk Corp | Method for filling recessed section in irregular pattern, and manufacturing method of magnetic recording medium |
| JP2007220196A (en) * | 2006-02-16 | 2007-08-30 | Fujitsu Ltd | Magnetic recording medium and method for manufacturing the same |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011118974A (en) * | 2009-12-02 | 2011-06-16 | Hitachi Global Storage Technologies Netherlands Bv | Magnetic recording medium and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101645275A (en) | 2010-02-10 |
| JP5174170B2 (en) | 2013-04-03 |
| CN101645276A (en) | 2010-02-10 |
| CN101645276B (en) | 2011-06-15 |
| JPWO2010013765A1 (en) | 2012-01-12 |
| CN101645275B (en) | 2011-06-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09803007 Country of ref document: EP Kind code of ref document: A1 |
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| DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 2010522746 Country of ref document: JP |
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| NENP | Non-entry into the national phase |
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| 122 | Ep: pct application non-entry in european phase |
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