WO2010085941A2 - Vorrichtung zum modifizieren der oberflächen von bahn-, platten- und bogenware mit einer einrichtung zur erzeugung eines plasmas - Google Patents
Vorrichtung zum modifizieren der oberflächen von bahn-, platten- und bogenware mit einer einrichtung zur erzeugung eines plasmas Download PDFInfo
- Publication number
- WO2010085941A2 WO2010085941A2 PCT/DE2010/000082 DE2010000082W WO2010085941A2 WO 2010085941 A2 WO2010085941 A2 WO 2010085941A2 DE 2010000082 W DE2010000082 W DE 2010000082W WO 2010085941 A2 WO2010085941 A2 WO 2010085941A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode
- outlet openings
- chamber
- counter electrode
- hollow body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
Definitions
- DE 195 38 176 A1 describes a device in which air flows around electrodes in a housing, wherein the gas stream is conducted in the direction of the treated surface.
- EP 0 914 876 B1 reports a process in which a gas mixture is introduced via a distributor between roller electrodes, wherein the rollers are covered by the web material.
- edges extending transversely to the direction of movement between the side walls and the lower wall are curved and that the average radius of curvature of the edges is greater than 8 mm, preferably greater than 10 mm.
- the curvature is formed by a quarter arc, since such a curved edge on the one hand easily is to produce and on the other hand so that a fluidically optimal effect can be achieved.
- the gap between the electrode and the product is uniformly filled over its entire width with a plasma, if several rows of outlet openings are provided, which are arranged one behind the other viewed in the direction of movement of the goods.
- the openings are designed so that even at low flow rates, a uniform media outlet over the entire electrode width is possible.
- the electrode is made of aluminum or stainless steel.
- the electrode may be provided with a non-conductive coating to provide the benefits of barrier discharge, even when the counter electrode is bare.
- This non-conductive coating can z. B. simply be an oxide layer, as occurs in the anodizing of aluminum, or a ceramic layer.
- the counterelectrode is not positioned outside, but installed in the hollow body electrode opposite the outlet openings, the counterelectrode is thus in a chamber of the electrode, the plasma is generated in the hollow body of the electrode when the high voltage is applied and due to the overpressure in the electrode through the openings of the electrode discharged.
- the counter electrode is arranged above the outlet openings, wherein the distance of the counter electrode to the bottom wall in the region of the outlet openings is smaller than 1 mm. It has been shown that optimal effects can thus be achieved.
- each show in cross section: 1 shows a first embodiment in which the electrode is a single chamber system and the counter electrode is arranged below the electrode, wherein the product to be treated passes through the gap between electrode and counter electrode,
- FIG. 2 shows a second embodiment in which the electrode has a two-chamber system
- Fig. 4 shows a fourth embodiment, wherein the counter electrode is arranged in the chamber of the electrode.
- an electrode 1 which is designed as a hollow profile bar, which extends perpendicular to the plane of the drawing.
- the cross-section of the profile is rectangular, the surface of the long sides being parallel to a web 2 to be treated. Instead of a web can also be treated a sheet or sheet goods.
- the individual plates or sheets pass successively past the electrode and thus also form a path in their sequence.
- a closed chamber 3 is formed, which extends over the width of the web 2 and is closed at the ends of the profile with caps, not shown here.
- edges between the short and long sides of the profile and in particular the web-facing edges 4, 5 are curved.
- a gas inlet 6 At the top of the electrode 1 facing away from the web there is a gas inlet 6.
- a flat and compact counter electrode 8 is arranged below the electrode 1. As a result of the gap 9 formed between the electrode 1 and the counterelectrode 8, the web 2 runs in the direction of the arrow 10.
- the electrode 1 has two chambers 3, 3 'and thus forms a two-chamber system.
- the chambers 3, 3 ' are parallel to each other and transverse to the web 2.
- Each chamber 3, 3 1 has its own gas inlet
- the counter-electrode 8 is constructed symmetrically to the electrode 1 and thus also has a chamber 5a with a gas inlet 6a and gas outlets 7a.
- the counter electrode 8 is disposed opposite to the electrode 1.
- the gas outlets 7, 7a of counter electrode 8 and electrode 1 are located on opposite sides to the gap 9, through which the web 2 is passed.
- a flat and compact counterelectrode 8 is arranged in the chamber 3 of the electrode 1.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Treatment Of Fiber Materials (AREA)
Abstract
Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE112010000200T DE112010000200A5 (de) | 2009-01-28 | 2010-01-28 | Vorrichtung zum modifizieren der oberflächen von bahn-, platten- und bogenware mit einer einrichtung zur erzeugung eines plasmas |
| EP10709952.5A EP2392195B1 (de) | 2009-01-28 | 2010-01-28 | Vorrichtung zum modifizieren der oberflächen von bahn-, platten- und bogenware mit einer einrichtung zur erzeugung eines plasmas |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009006484A DE102009006484A1 (de) | 2009-01-28 | 2009-01-28 | Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas |
| DE102009006484.2 | 2009-01-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2010085941A2 true WO2010085941A2 (de) | 2010-08-05 |
| WO2010085941A3 WO2010085941A3 (de) | 2010-11-18 |
Family
ID=42282684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2010/000082 Ceased WO2010085941A2 (de) | 2009-01-28 | 2010-01-28 | Vorrichtung zum modifizieren der oberflächen von bahn-, platten- und bogenware mit einer einrichtung zur erzeugung eines plasmas |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP2392195B1 (de) |
| DE (2) | DE102009006484A1 (de) |
| WO (1) | WO2010085941A2 (de) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19538176A1 (de) | 1995-10-13 | 1997-04-17 | Arcotec Oberflaechentech Gmbh | Vorrichtung zur Behandlung flächiger Substrate mit einer Koronastation |
| EP0914876B1 (de) | 1997-11-05 | 2001-10-10 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten durch elektrische Entladungen zwischen zwei Elektroden in einer Gasmmischung |
| WO2002006503A2 (en) | 2000-07-18 | 2002-01-24 | United States Department Of Energy | Process for generation of hydrogen gas from various feedstocks using thermophilic bacteria |
| WO2007017271A2 (de) | 2005-08-11 | 2007-02-15 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V: | Plasmaerzeugungsvorrichtung und plasmaerzeugungsverfahren |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19505268C2 (de) * | 1995-02-16 | 1999-02-18 | Fraunhofer Ges Forschung | CVD-Verfahren zur Beschichtung von Substratoberflächen |
| EP1073091A3 (de) * | 1999-07-27 | 2004-10-06 | Matsushita Electric Works, Ltd. | Elektrode für Plasmaerzeugung, Anwendung dieser Elektrode in einem Plasmabehandlungsgerät, und Plasmabehandlung mittels dieses Gerätes |
| JP2007505219A (ja) * | 2003-09-09 | 2007-03-08 | ダウ グローバル テクノロジーズ インコーポレイティド | グロー放電発生化学蒸着 |
| EP1521509B1 (de) * | 2003-09-30 | 2013-11-06 | FUJIFILM Manufacturing Europe B.V. | Verfahren und Anlage zur Herstellung eines Glimmentladungsplasmas unter atmosphärischem Druck |
| EP1686092A4 (de) * | 2003-11-17 | 2012-03-07 | Konica Minolta Holdings Inc | Verfahren zur herstellung von nanostrukturiertem kohlenstoffmaterial, danach hergestelltes nanostrukturiertes kohlenstoffmaterial und substrat mit derartigem nanostrukturiertem kohlenstoffmaterial |
| US20090097165A1 (en) * | 2005-03-28 | 2009-04-16 | Showa Denko K.K. | Method of manufacturing magnetic recording medium, magnetic recording medium and surface treatment apparatus |
| JP2008153147A (ja) * | 2006-12-20 | 2008-07-03 | Seiko Epson Corp | プラズマ処理装置 |
-
2009
- 2009-01-28 DE DE102009006484A patent/DE102009006484A1/de not_active Withdrawn
-
2010
- 2010-01-28 EP EP10709952.5A patent/EP2392195B1/de active Active
- 2010-01-28 DE DE112010000200T patent/DE112010000200A5/de not_active Withdrawn
- 2010-01-28 WO PCT/DE2010/000082 patent/WO2010085941A2/de not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19538176A1 (de) | 1995-10-13 | 1997-04-17 | Arcotec Oberflaechentech Gmbh | Vorrichtung zur Behandlung flächiger Substrate mit einer Koronastation |
| EP0914876B1 (de) | 1997-11-05 | 2001-10-10 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten durch elektrische Entladungen zwischen zwei Elektroden in einer Gasmmischung |
| WO2002006503A2 (en) | 2000-07-18 | 2002-01-24 | United States Department Of Energy | Process for generation of hydrogen gas from various feedstocks using thermophilic bacteria |
| WO2007017271A2 (de) | 2005-08-11 | 2007-02-15 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V: | Plasmaerzeugungsvorrichtung und plasmaerzeugungsverfahren |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102009006484A1 (de) | 2010-07-29 |
| EP2392195B1 (de) | 2014-05-07 |
| WO2010085941A3 (de) | 2010-11-18 |
| DE112010000200A5 (de) | 2012-06-06 |
| EP2392195A2 (de) | 2011-12-07 |
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