[go: up one dir, main page]

WO2010081661A3 - Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level - Google Patents

Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level Download PDF

Info

Publication number
WO2010081661A3
WO2010081661A3 PCT/EP2010/000076 EP2010000076W WO2010081661A3 WO 2010081661 A3 WO2010081661 A3 WO 2010081661A3 EP 2010000076 W EP2010000076 W EP 2010000076W WO 2010081661 A3 WO2010081661 A3 WO 2010081661A3
Authority
WO
WIPO (PCT)
Prior art keywords
solution
photovoltaic cell
power density
sheet resistance
density level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2010/000076
Other languages
French (fr)
Other versions
WO2010081661A2 (en
Inventor
Joannes T.V. Hoogboom
Johannes A.E. Oosterholt
Sabrina Ritmeijer
Lucas M.H. Groenewoud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Avantor Performance Materials BV
Original Assignee
Mallinckrodt Baker BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to AU2010205945A priority Critical patent/AU2010205945A1/en
Priority to CN201080004496.XA priority patent/CN102282682B/en
Priority to RU2011134068/28A priority patent/RU2011134068A/en
Priority to MX2011007413A priority patent/MX2011007413A/en
Priority to JP2011545669A priority patent/JP2012515444A/en
Priority to BRPI1006176-2A priority patent/BRPI1006176A2/en
Priority to SG2011050853A priority patent/SG172973A1/en
Priority to EP10716465A priority patent/EP2387801A2/en
Application filed by Mallinckrodt Baker BV filed Critical Mallinckrodt Baker BV
Priority to CA2749836A priority patent/CA2749836A1/en
Publication of WO2010081661A2 publication Critical patent/WO2010081661A2/en
Publication of WO2010081661A3 publication Critical patent/WO2010081661A3/en
Priority to IL213936A priority patent/IL213936A0/en
Anticipated expiration legal-status Critical
Priority to ZA2011/05863A priority patent/ZA201105863B/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2075—Carboxylic acids-salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/137—Batch treatment of the devices
    • H10P50/00—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

Treating thin film amorphous or mono- or multi-crystalline silicon wafer substrate for use in a photovoltaic cell, the wafer substrate having at least one of a pn- or np junction and a partial phosphosilicate or borosilicate glass layer on a top surface of the wafer substrate, to increase at least one of (a) the sheet resistance of the wafer and (b) the power density level of the photovoltaic cell made from said wafer. The treatment solution being an acidic treatment solution of a buffered oxide etch (BOE) solution of at least one tetraalkylammonium hydroxide, acetic acid, at least one non-ionic surfactant, at least one metal chelating agent, a metal free source of ammonia, a metal free source of fluoride ions, and water, mixed with an oxidizer solution and optionally water.
PCT/EP2010/000076 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level Ceased WO2010081661A2 (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
SG2011050853A SG172973A1 (en) 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
RU2011134068/28A RU2011134068A (en) 2009-01-14 2010-01-11 METHOD FOR INCREASING SURFACE RESISTANCE OF PLATE AND / OR POWER DENSITY LEVEL OF PHOTOELECTRIC ELEMENT
MX2011007413A MX2011007413A (en) 2009-01-14 2010-01-11 SOLUTION TO INCREASE THE RESISTANCE OF THE SHEET SHEET AND / OR ELEVATE THE ENERGY DENSITY OF THE PHOTOVOLTAIC CELL.
JP2011545669A JP2012515444A (en) 2009-01-14 2010-01-11 Solution for increasing the sheet resistance of a wafer and / or the output density of a photovoltaic cell
BRPI1006176-2A BRPI1006176A2 (en) 2009-01-14 2010-01-11 solution to increase chip plate resistance and / or photovoltaic cell energy density level
EP10716465A EP2387801A2 (en) 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
CA2749836A CA2749836A1 (en) 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
AU2010205945A AU2010205945A1 (en) 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
CN201080004496.XA CN102282682B (en) 2009-01-14 2010-01-11 Increase the solution of wafer sheet resistance and/or photovoltaic cell power density level
IL213936A IL213936A0 (en) 2009-01-14 2011-07-05 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
ZA2011/05863A ZA201105863B (en) 2009-01-14 2011-08-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US14447909P 2009-01-14 2009-01-14
US61/144,479 2009-01-14
US22568509P 2009-07-15 2009-07-15
US61/225,685 2009-07-15

Publications (2)

Publication Number Publication Date
WO2010081661A2 WO2010081661A2 (en) 2010-07-22
WO2010081661A3 true WO2010081661A3 (en) 2010-10-07

Family

ID=42272664

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2010/000076 Ceased WO2010081661A2 (en) 2009-01-14 2010-01-11 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level

Country Status (14)

Country Link
EP (1) EP2387801A2 (en)
JP (1) JP2012515444A (en)
KR (1) KR20110105396A (en)
CN (1) CN102282682B (en)
AU (1) AU2010205945A1 (en)
BR (1) BRPI1006176A2 (en)
CA (1) CA2749836A1 (en)
IL (1) IL213936A0 (en)
MX (1) MX2011007413A (en)
RU (1) RU2011134068A (en)
SG (1) SG172973A1 (en)
TW (1) TW201036058A (en)
WO (1) WO2010081661A2 (en)
ZA (1) ZA201105863B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011050136A1 (en) 2010-09-03 2012-03-08 Schott Solar Ag Process for the wet-chemical etching of a silicon layer
JP2012238849A (en) 2011-04-21 2012-12-06 Rohm & Haas Electronic Materials Llc Improved polycrystalline texturing composition and method
DE102011103538A1 (en) 2011-06-07 2012-12-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for doping e.g. p-type semiconductor substrate while manufacturing crystalline silicon solar cell, involves utilizing doped silicon as sources, where doped silicon is provided with part of silicon-, hydrogen-atoms of specified range
CN113980580B (en) * 2021-12-24 2022-04-08 绍兴拓邦新能源股份有限公司 A kind of alkali etching polishing method of single crystal silicon wafer

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4113551A (en) * 1976-11-19 1978-09-12 International Business Machines Corporation Polycrystalline silicon etching with tetramethylammonium hydroxide
US5705089A (en) * 1992-03-11 1998-01-06 Mitsubishi Gas Chemical Company, Inc. Cleaning fluid for semiconductor substrate
US20010056052A1 (en) * 1999-04-20 2001-12-27 Nec Corporation Cleaning liquid
US20030153170A1 (en) * 2001-11-14 2003-08-14 Matsushita Electric Industrial Co., Ltd. Method for cleaning semiconductor device and method for fabricating the same
WO2003104901A2 (en) * 2002-06-07 2003-12-18 Mallinckrodt Baker Inc. Microelectronic cleaning and arc remover compositions
JP2005129714A (en) * 2003-10-23 2005-05-19 Sharp Corp Method for manufacturing solar battery cell
JP2005217260A (en) * 2004-01-30 2005-08-11 Sharp Corp Method for manufacturing silicon substrate and method for manufacturing solar cell
US20070099806A1 (en) * 2005-10-28 2007-05-03 Stewart Michael P Composition and method for selectively removing native oxide from silicon-containing surfaces
WO2008157345A2 (en) * 2007-06-13 2008-12-24 Advanced Technology Materials, Inc. Wafer reclamation compositions and methods

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4113551A (en) * 1976-11-19 1978-09-12 International Business Machines Corporation Polycrystalline silicon etching with tetramethylammonium hydroxide
US5705089A (en) * 1992-03-11 1998-01-06 Mitsubishi Gas Chemical Company, Inc. Cleaning fluid for semiconductor substrate
US20010056052A1 (en) * 1999-04-20 2001-12-27 Nec Corporation Cleaning liquid
US20030153170A1 (en) * 2001-11-14 2003-08-14 Matsushita Electric Industrial Co., Ltd. Method for cleaning semiconductor device and method for fabricating the same
WO2003104901A2 (en) * 2002-06-07 2003-12-18 Mallinckrodt Baker Inc. Microelectronic cleaning and arc remover compositions
JP2005129714A (en) * 2003-10-23 2005-05-19 Sharp Corp Method for manufacturing solar battery cell
JP2005217260A (en) * 2004-01-30 2005-08-11 Sharp Corp Method for manufacturing silicon substrate and method for manufacturing solar cell
US20070099806A1 (en) * 2005-10-28 2007-05-03 Stewart Michael P Composition and method for selectively removing native oxide from silicon-containing surfaces
WO2008157345A2 (en) * 2007-06-13 2008-12-24 Advanced Technology Materials, Inc. Wafer reclamation compositions and methods

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JEON M S ET AL: "Performance improvement in simplified processing for screen-printed mc-Si solar cells", CONFERENCE RECORD OF THE THIRTY-FIRST IEEE PHOTOVOLTAIC SPECIALIST CONFERENCE (IEEE CAT. NO. 05CH37608) IEEE PISCATAWAY, NJ, USA,, 3 January 2005 (2005-01-03), pages 1096 - 1099, XP010822959, ISBN: 978-0-7803-8707-2 *

Also Published As

Publication number Publication date
IL213936A0 (en) 2011-07-31
JP2012515444A (en) 2012-07-05
WO2010081661A2 (en) 2010-07-22
BRPI1006176A2 (en) 2019-09-24
TW201036058A (en) 2010-10-01
ZA201105863B (en) 2012-04-25
CN102282682B (en) 2016-07-06
CA2749836A1 (en) 2010-07-22
AU2010205945A1 (en) 2011-09-01
SG172973A1 (en) 2011-08-29
EP2387801A2 (en) 2011-11-23
RU2011134068A (en) 2013-02-20
MX2011007413A (en) 2011-07-21
KR20110105396A (en) 2011-09-26
CN102282682A (en) 2011-12-14

Similar Documents

Publication Publication Date Title
JP6553731B2 (en) N-type double-sided battery wet etching method
PH12012500512A1 (en) Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
WO2010039341A3 (en) Front electrode having etched surface for use in photovoltaic device and method of making same
CN102737981A (en) Method for realizing silicon wafer singleside polishing
WO2011046664A3 (en) A barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells
WO2011106204A3 (en) Single-junction photovoltaic cell
SG169962A1 (en) Texturing semiconductor substrates
WO2015039128A3 (en) Methods, apparatus, and systems for passivation of solar cells and other semiconductor devices
WO2012102845A3 (en) Textured coating with various feature sizes made by using multiple-agent etchant for thin-film solar cells and/or methods of making the same
MY183477A (en) Passivation of light-receiving surfaces of solar cells with crystalline silicon
CN101515611A (en) Process for etching solar cells by combining acid and alkali
WO2010081661A3 (en) Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
CN104009118A (en) Method for preparing efficient N-type crystalline silicon grooving buried contact battery
CN104051575A (en) Manufacturing process of a biomimetic double-sided light-receiving solar cell
CN103199158B (en) Photovoltaic solar cell sheet and lithographic method thereof
CN103646992A (en) Preparation method of P-type crystal silicon double-sided cell
CN102623560A (en) Method for realizing edge insulation of solar cell by wet process
CN103872183B (en) A kind of single-sided polishing method
CN101931030B (en) Preparation technology of nano-modified polysilicon solar cell with high efficiency and low cost
CN104485386B (en) A kind of etching method of polysilicon solar cell
CN103258728A (en) Silicon wafer etching method and manufacturing method of solar battery piece
WO2012110613A3 (en) Conductive transparent glass substrate for photovoltaic cell
WO2012091900A3 (en) Texture coating with etching-blocking layer for thin-film solar cells and/or methods of making the same
WO2011032878A3 (en) Method for manufacturing a thin- film, silicon based solar cell device with etched glass substrate surface
CN105161552A (en) Single surface polished N-type solar cell and preparation method thereof

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080004496.X

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10716465

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: MX/A/2011/007413

Country of ref document: MX

WWE Wipo information: entry into national phase

Ref document number: 13138144

Country of ref document: US

Ref document number: 2749836

Country of ref document: CA

ENP Entry into the national phase

Ref document number: 2011545669

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 5734/CHENP/2011

Country of ref document: IN

WWE Wipo information: entry into national phase

Ref document number: 12332

Country of ref document: GE

Ref document number: 2010716465

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20117018830

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 594544

Country of ref document: NZ

Ref document number: 2010205945

Country of ref document: AU

WWE Wipo information: entry into national phase

Ref document number: a201109962

Country of ref document: UA

Ref document number: A20111106

Country of ref document: BY

WWE Wipo information: entry into national phase

Ref document number: 2011134068

Country of ref document: RU

ENP Entry into the national phase

Ref document number: 2010205945

Country of ref document: AU

Date of ref document: 20100111

Kind code of ref document: A

REG Reference to national code

Ref country code: BR

Ref legal event code: B01A

Ref document number: PI1006176

Country of ref document: BR

ENP Entry into the national phase

Ref document number: PI1006176

Country of ref document: BR

Kind code of ref document: A2

Effective date: 20110713