[go: up one dir, main page]

WO2010059865A3 - Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor - Google Patents

Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor Download PDF

Info

Publication number
WO2010059865A3
WO2010059865A3 PCT/US2009/065205 US2009065205W WO2010059865A3 WO 2010059865 A3 WO2010059865 A3 WO 2010059865A3 US 2009065205 W US2009065205 W US 2009065205W WO 2010059865 A3 WO2010059865 A3 WO 2010059865A3
Authority
WO
WIPO (PCT)
Prior art keywords
capacitor
electrochemical battery
forming
nanostructure electrode
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2009/065205
Other languages
French (fr)
Other versions
WO2010059865A2 (en
Inventor
Sergey Lopatin
Robert Z. Bachrach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to CN2009801471061A priority Critical patent/CN102224628A/en
Priority to EP09828243A priority patent/EP2351138A2/en
Priority to JP2011537629A priority patent/JP2012510163A/en
Publication of WO2010059865A2 publication Critical patent/WO2010059865A2/en
Publication of WO2010059865A3 publication Critical patent/WO2010059865A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/0033D structures, e.g. superposed patterned layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005Contacting devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/08Rinsing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/623Porosity of the layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0621In horizontal cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0628In vertical cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0671Selective plating
    • C25D7/0678Selective plating using masks
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0685Spraying of electrolyte
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • H01M4/0438Processes of manufacture in general by electrochemical processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G13/00Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • H01M4/0438Processes of manufacture in general by electrochemical processing
    • H01M4/045Electrochemical coating; Electrochemical impregnation
    • H01M4/0452Electrochemical coating; Electrochemical impregnation from solutions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139Processes of manufacture
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

Embodiments described herein generally relate to an electrode structure for an electrochemical battery or capacitor, particularly, apparatus and methods of creating a reliable and cost efficient 3D electrode nano structure for an electrochemical battery or capacitor that has an improved lifetime, lower production costs, and improved process performance.
PCT/US2009/065205 2008-11-24 2009-11-19 Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor Ceased WO2010059865A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2009801471061A CN102224628A (en) 2008-11-24 2009-11-19 Apparatus and method for forming three-dimensional nanostructured electrodes for electrochemical cells or capacitors
EP09828243A EP2351138A2 (en) 2008-11-24 2009-11-19 Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor
JP2011537629A JP2012510163A (en) 2008-11-24 2009-11-19 Apparatus and method for forming 3D nanostructured electrodes for electrochemical cells or capacitors

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11753508P 2008-11-24 2008-11-24
US61/117,535 2008-11-24
US12/620,788 US20100126849A1 (en) 2008-11-24 2009-11-18 Apparatus and method for forming 3d nanostructure electrode for electrochemical battery and capacitor
US12/620,788 2009-11-18

Publications (2)

Publication Number Publication Date
WO2010059865A2 WO2010059865A2 (en) 2010-05-27
WO2010059865A3 true WO2010059865A3 (en) 2010-09-02

Family

ID=42195224

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/065205 Ceased WO2010059865A2 (en) 2008-11-24 2009-11-19 Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor

Country Status (7)

Country Link
US (1) US20100126849A1 (en)
EP (1) EP2351138A2 (en)
JP (1) JP2012510163A (en)
KR (1) KR20110097898A (en)
CN (1) CN102224628A (en)
TW (1) TW201030190A (en)
WO (1) WO2010059865A2 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8206569B2 (en) 2009-02-04 2012-06-26 Applied Materials, Inc. Porous three dimensional copper, tin, copper-tin, copper-tin-cobalt, and copper-tin-cobalt-titanium electrodes for batteries and ultra capacitors
CN102714299A (en) * 2009-10-23 2012-10-03 应用材料公司 Nucleation and growth of tin particles into three dimensional composite active anode for lithium high capacity energy storage device
US20110129732A1 (en) * 2009-12-01 2011-06-02 Applied Materials, Inc. Compressed powder 3d battery electrode manufacturing
KR101108747B1 (en) * 2010-05-13 2012-02-24 삼성전기주식회사 Doping bath for fabricating the energy storage device
US9305716B2 (en) * 2010-12-03 2016-04-05 Imra America, Inc. Rechargeable electrochemical energy storage device
KR20140014189A (en) 2011-02-28 2014-02-05 어플라이드 머티어리얼스, 인코포레이티드 Manufacturing of high capacity prismatic lithium-ion alloy anodes
US20150207171A1 (en) * 2012-08-16 2015-07-23 The Regents Of The University Of California Thin film electrolyte based 3d micro-batteries
US20140328729A1 (en) 2013-05-06 2014-11-06 Liang-Yuh Chen Apparatus for Preparing a Material of a Battery Cell
CN105247111B (en) * 2013-10-25 2017-09-12 Om产业股份有限公司 Manufacturing method of plating products
KR101589034B1 (en) * 2014-02-21 2016-01-28 순천대학교 산학협력단 Thin film battery manufacturing method
US10648096B2 (en) * 2014-12-12 2020-05-12 Infineon Technologies Ag Electrolyte, method of forming a copper layer and method of forming a chip
JP6688564B2 (en) * 2015-05-28 2020-04-28 昭和電線ケーブルシステム株式会社 Method for manufacturing oxide superconducting wire
JP6857531B2 (en) * 2017-03-31 2021-04-14 株式会社荏原製作所 Plating method and plating equipment
CN108447685A (en) * 2018-02-09 2018-08-24 深圳江浩电子有限公司 A high-energy electrode filling device and filling method
JP7650231B2 (en) * 2018-12-12 2025-03-24 アプライド マテリアルズ インコーポレイテッド Free span coating system and method
WO2020126687A1 (en) * 2018-12-21 2020-06-25 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
IL266910B (en) * 2019-05-27 2020-11-30 Addionics Il Ltd Electrochemically produced three-dimensional structures for battery electrodes
WO2020249065A1 (en) * 2019-06-13 2020-12-17 青岛九环新越新能源科技股份有限公司 Composite electrode material, cell, laminated cell, composite cell and composite power cell of all-solid-state energy storage device
US11376559B2 (en) 2019-06-28 2022-07-05 eJoule, Inc. Processing system and method for producing a particulate material
US11121354B2 (en) 2019-06-28 2021-09-14 eJoule, Inc. System with power jet modules and method thereof
WO2020264464A1 (en) 2019-06-28 2020-12-30 eJoule, Inc. Assisted gas flow inside a reaction chamber of a processing system
US11673112B2 (en) 2020-06-28 2023-06-13 eJoule, Inc. System and process with assisted gas flow inside a reaction chamber
CN111389656B (en) * 2020-05-18 2020-11-17 戴林 A Dacromet equipment for strengthening the corners of metal plates

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260144A (en) * 1989-03-23 1993-11-09 Alcan International Limited Metal/air battery with seeded recirculating electrolyte
US20060172179A1 (en) * 2003-09-08 2006-08-03 Intematix Corporation Low platinum fuel cells, catalysts, and method for preparing the same
US20070148527A1 (en) * 2005-12-16 2007-06-28 Stmicroelectronics S.R.L. Fuel cell planarly integrated on a monocrystalline silicon chip and process of fabrication

Family Cites Families (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849880A (en) * 1969-12-12 1974-11-26 Communications Satellite Corp Solar cell array
US3619383A (en) * 1970-05-04 1971-11-09 Norton Co Continuous process of electrodeposition
US3865698A (en) * 1972-01-13 1975-02-11 Auric Corp Process for intermittent electroplating strips
JPS5521502A (en) * 1978-07-25 1980-02-15 Sumitomo Metal Mining Co Ltd Method and device for partial plating
US5588994A (en) * 1980-04-10 1996-12-31 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
US4436558A (en) * 1980-12-15 1984-03-13 The United States Of America As Represented By The United States Department Of Energy Electrochemical photovoltaic cell having ternary alloy film
US4666567A (en) * 1981-07-31 1987-05-19 The Boeing Company Automated alternating polarity pulse electrolytic processing of electrically conductive substances
JPS59103383A (en) * 1982-12-03 1984-06-14 Sanyo Electric Co Ltd Manufacture for photovoltaic force generating device
KR890001111B1 (en) * 1983-09-07 1989-04-24 미쯔비시주우고오교오 가부시기가이샤 Continuous alloy electroplating method and apparatus
US4581108A (en) * 1984-01-06 1986-04-08 Atlantic Richfield Company Process of forming a compound semiconductive material
US4617420A (en) * 1985-06-28 1986-10-14 The Standard Oil Company Flexible, interconnected array of amorphous semiconductor photovoltaic cells
US4869971A (en) * 1986-05-22 1989-09-26 Nee Chin Cheng Multilayer pulsed-current electrodeposition process
US4789437A (en) * 1986-07-11 1988-12-06 University Of Hong Kong Pulse electroplating process
JPS6393402A (en) * 1986-10-06 1988-04-23 Sumitomo Metal Ind Ltd Production of thin-web h-shape steel
US5057163A (en) * 1988-05-04 1991-10-15 Astropower, Inc. Deposited-silicon film solar cell
JPH02166790A (en) * 1988-12-20 1990-06-27 Minolta Camera Co Ltd Plating method for printed board
JPH04266068A (en) * 1991-02-20 1992-09-22 Canon Inc Photoelectric conversion element and its manufacturing method
US5209817A (en) * 1991-08-22 1993-05-11 International Business Machines Corporation Selective plating method for forming integral via and wiring layers
JP3118037B2 (en) * 1991-10-28 2000-12-18 キヤノン株式会社 Method and apparatus for forming deposited film
US5198965A (en) * 1991-12-18 1993-03-30 International Business Machines Corporation Free form packaging of specific functions within a computer system
US5421987A (en) * 1993-08-30 1995-06-06 Tzanavaras; George Precision high rate electroplating cell and method
US5841197A (en) * 1994-11-18 1998-11-24 Adamic, Jr.; Fred W. Inverted dielectric isolation process
US6103604A (en) * 1997-02-10 2000-08-15 Trw Inc. High electron mobility transparent conductor
CA2572503A1 (en) * 1997-04-04 1998-10-15 University Of Southern California Method for electrochemical fabrication including enhanced data manipulation
US5972192A (en) * 1997-07-23 1999-10-26 Advanced Micro Devices, Inc. Pulse electroplating copper or copper alloys
AU736457B2 (en) * 1997-08-27 2001-07-26 Sphelar Power Corporation Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material
US5897368A (en) * 1997-11-10 1999-04-27 General Electric Company Method of fabricating metallized vias with steep walls
AU2233399A (en) * 1998-02-12 1999-08-30 Acm Research, Inc. Plating apparatus and method
US6197181B1 (en) * 1998-03-20 2001-03-06 Semitool, Inc. Apparatus and method for electrolytically depositing a metal on a microelectronic workpiece
US5968333A (en) * 1998-04-07 1999-10-19 Advanced Micro Devices, Inc. Method of electroplating a copper or copper alloy interconnect
KR100616198B1 (en) * 1998-04-21 2006-08-25 어플라이드 머티어리얼스, 인코포레이티드 Electrochemical Deposition System and Method for Electroplating on Substrate
DE19854269B4 (en) * 1998-11-25 2004-07-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thin-film solar cell arrangement and method for producing the same
US6534116B2 (en) * 2000-08-10 2003-03-18 Nutool, Inc. Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
US6103085A (en) * 1998-12-04 2000-08-15 Advanced Micro Devices, Inc. Electroplating uniformity by diffuser design
US6290589B1 (en) * 1998-12-09 2001-09-18 Applied Materials, Inc. Polishing pad with a partial adhesive coating
US7351315B2 (en) * 2003-12-05 2008-04-01 Semitool, Inc. Chambers, systems, and methods for electrochemically processing microfeature workpieces
US6575177B1 (en) * 1999-04-27 2003-06-10 Applied Materials Inc. Semiconductor substrate cleaning system
US6297155B1 (en) * 1999-05-03 2001-10-02 Motorola Inc. Method for forming a copper layer over a semiconductor wafer
DE19935046C2 (en) * 1999-07-26 2001-07-12 Schott Glas Plasma CVD method and device for producing a microcrystalline Si: H layer on a substrate and the use thereof
US7059948B2 (en) * 2000-12-22 2006-06-13 Applied Materials Articles for polishing semiconductor substrates
GB2360235B (en) * 2000-03-10 2002-02-06 Platarg Engineering Ltd Workpiece ejector for transfer press
US6949400B2 (en) * 2002-01-25 2005-09-27 Konarka Technologies, Inc. Ultrasonic slitting of photovoltaic cells and modules
JP3553461B2 (en) * 2000-04-27 2004-08-11 新光電気工業株式会社 Partial plating equipment
US7022910B2 (en) * 2002-03-29 2006-04-04 Konarka Technologies, Inc. Photovoltaic cells utilizing mesh electrodes
US6299745B1 (en) * 2000-05-03 2001-10-09 Honeywell International Inc. Flexible substrate plating rack
US6610189B2 (en) * 2001-01-03 2003-08-26 Applied Materials, Inc. Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature
US7160531B1 (en) * 2001-05-08 2007-01-09 University Of Kentucky Research Foundation Process for the continuous production of aligned carbon nanotubes
US6881318B2 (en) * 2001-07-26 2005-04-19 Applied Materials, Inc. Dynamic pulse plating for high aspect ratio features
US7138014B2 (en) * 2002-01-28 2006-11-21 Applied Materials, Inc. Electroless deposition apparatus
US6706166B2 (en) * 2002-05-06 2004-03-16 Taiwan Semiconductor Manufacturing Co. Ltd. Method for improving an electrodeposition process through use of a multi-electrode assembly
US20040067324A1 (en) * 2002-09-13 2004-04-08 Lazarev Pavel I Organic photosensitive optoelectronic device
US7067045B2 (en) * 2002-10-18 2006-06-27 Applied Materials, Inc. Method and apparatus for sealing electrical contacts during an electrochemical deposition process
JP2004241753A (en) * 2002-12-13 2004-08-26 Canon Inc Solar cell module
US7339110B1 (en) * 2003-04-10 2008-03-04 Sunpower Corporation Solar cell and method of manufacture
US7388147B2 (en) * 2003-04-10 2008-06-17 Sunpower Corporation Metal contact structure for solar cell and method of manufacture
US7265037B2 (en) * 2003-06-20 2007-09-04 The Regents Of The University Of California Nanowire array and nanowire solar cells and methods for forming the same
CN1826699B (en) * 2003-07-24 2010-12-29 株式会社钟化 Silicon thin film solar cells
US7172184B2 (en) * 2003-08-06 2007-02-06 Sunpower Corporation Substrate carrier for electroplating solar cells
US7314543B2 (en) * 2003-10-14 2008-01-01 Intel Corporation Tin deposition
AU2004222793B2 (en) * 2003-10-27 2007-07-26 Mitsubishi Heavy Industries, Ltd. Solar cell and process for producing solar cell
US20060033678A1 (en) * 2004-01-26 2006-02-16 Applied Materials, Inc. Integrated electroless deposition system
DE102004024461A1 (en) * 2004-05-14 2005-12-01 Konarka Technologies, Inc., Lowell Device and method for producing an electronic component with at least one active organic layer
US20060062897A1 (en) * 2004-09-17 2006-03-23 Applied Materials, Inc Patterned wafer thickness detection system
KR100657949B1 (en) * 2005-02-05 2006-12-14 삼성전자주식회사 Cylindrical soft solar cell and manufacturing method thereof
EP1693903B1 (en) * 2005-02-18 2011-05-18 Clean Venture 21 Corporation Array of spherical solar cells and its method of fabrication
US7220671B2 (en) * 2005-03-31 2007-05-22 Intel Corporation Organometallic precursors for the chemical phase deposition of metal films in interconnect applications
DE102005014748B4 (en) * 2005-03-31 2007-02-08 Advanced Micro Devices, Inc., Sunnyvale Technique for electrochemical deposition of a chemical order alloy
JP4644528B2 (en) * 2005-05-24 2011-03-02 新光電気工業株式会社 Partial plating apparatus and partial plating method
US20080041727A1 (en) * 2006-08-18 2008-02-21 Semitool, Inc. Method and system for depositing alloy composition
US20080092947A1 (en) * 2006-10-24 2008-04-24 Applied Materials, Inc. Pulse plating of a low stress film on a solar cell substrate
US20080121276A1 (en) * 2006-11-29 2008-05-29 Applied Materials, Inc. Selective electroless deposition for solar cells
US7736928B2 (en) * 2006-12-01 2010-06-15 Applied Materials, Inc. Precision printing electroplating through plating mask on a solar cell substrate
US20080128019A1 (en) * 2006-12-01 2008-06-05 Applied Materials, Inc. Method of metallizing a solar cell substrate
US7704352B2 (en) * 2006-12-01 2010-04-27 Applied Materials, Inc. High-aspect ratio anode and apparatus for high-speed electroplating on a solar cell substrate
US7799182B2 (en) * 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260144A (en) * 1989-03-23 1993-11-09 Alcan International Limited Metal/air battery with seeded recirculating electrolyte
US20060172179A1 (en) * 2003-09-08 2006-08-03 Intematix Corporation Low platinum fuel cells, catalysts, and method for preparing the same
US20070148527A1 (en) * 2005-12-16 2007-06-28 Stmicroelectronics S.R.L. Fuel cell planarly integrated on a monocrystalline silicon chip and process of fabrication

Also Published As

Publication number Publication date
EP2351138A2 (en) 2011-08-03
KR20110097898A (en) 2011-08-31
US20100126849A1 (en) 2010-05-27
TW201030190A (en) 2010-08-16
WO2010059865A2 (en) 2010-05-27
JP2012510163A (en) 2012-04-26
CN102224628A (en) 2011-10-19

Similar Documents

Publication Publication Date Title
WO2010059865A3 (en) Apparatus and method for forming 3d nanostructure electrode for electrochemical battery or capacitor
WO2012027360A3 (en) Branched nanostructures for battery electrodes
WO2011040704A3 (en) Method for producing a separator, separator produced by same, and method for producing an electrochemical device comprising the separator
EP2343760A4 (en) Method for producing electrode material, electrode material, electrode, and battery
EP2267824A4 (en) Negative electrode for lithium ion secondary battery, and method for production thereof
EP2654107A4 (en) Negative electrode for non-aqueous electrolyte secondary battery, non-aqueous electrolyte secondary battery and production method for negative electrode for non-aqueous electrolyte secondary battery
HUE047344T2 (en) Method for producing solid electrolyte capacitors
EP2445041A4 (en) NONAQUEOUS ELECTROLYTE BATTERY, POSITIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE BATTERY, NEGATIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE BATTERY, SEPARATOR FOR NONAQUEOUS ELECTROLYTE BATTERY, ELECTROLYTE FOR NONAQUEOUS ELECTROLYTE BATTERY, AND METHOD FOR PRODUCTION OF SEPARATOR FOR NON ELECTROLYTE BATTERY AQUEOUS
EP2455998B8 (en) Electrical storage device provided with fiber electrodes, and method for producing same
IL209780A0 (en) Method for producing electrodes for solar cells
HUE038410T2 (en) Method for preparing a positive electrode material through extrusion in presence of an aqueous solvent, positive electrode obtained through said method, and uses thereof
WO2010077494A3 (en) Nerve electrode
EP2618350A4 (en) Method for producing electrode plate group unit for lithium-ion capacitor, and lithium-ion capacitor
EP2299524A4 (en) Positive electrode active material for non-aqueous electrolyte secondary battery, method for production of positive electrode active material for non-aqueous electrolyte secondary battery, positive electrode for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery
WO2011141852A8 (en) Apparatus and method for the production of electric energy storage devices
EP2304835A4 (en) Electrolyte for lithium batteries, lithium batteries and method for producing the same
EP2528148A4 (en) Negative electrode plate for lead storage battery, process for producing same, and lead storage battery
EP2618414A4 (en) Membrane electrode assembly, method for producing membrane electrode assembly, and fuel battery
EP2677578A4 (en) Slurry for secondary battery negative electrodes, secondary battery negative electrode and manufacturing method thereof, and secondary battery
WO2012076230A3 (en) Sodium ion conductor on sodium titanate basis
EP2505604A4 (en) Filmy material, method for producing same, and aqueous dispersion for forming filmy material
EP2665119A4 (en) Method for producing fuel cell electrode catalyst, fuel cell electrode catalyst, and application thereof
EP2408021A4 (en) Process for producing solar battery, and solar battery
EP2573846B8 (en) Negative electrode paste, negative electrode and method for manufacturing negative electrode, and non-aqueous electrolyte secondary battery
EP2537961A4 (en) Electrode base, negative electrode for aqueous solution electrolysis using same, method for producing the electrode base, and method for producing the negative electrode for aqueous solution electrolysis

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200980147106.1

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09828243

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2011537629

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2009828243

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20117014504

Country of ref document: KR

Kind code of ref document: A