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WO2010057970A1 - Procédé de revêtement et dispositif de revêtement - Google Patents

Procédé de revêtement et dispositif de revêtement Download PDF

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Publication number
WO2010057970A1
WO2010057970A1 PCT/EP2009/065541 EP2009065541W WO2010057970A1 WO 2010057970 A1 WO2010057970 A1 WO 2010057970A1 EP 2009065541 W EP2009065541 W EP 2009065541W WO 2010057970 A1 WO2010057970 A1 WO 2010057970A1
Authority
WO
WIPO (PCT)
Prior art keywords
workpieces
coating
gas
outlet openings
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2009/065541
Other languages
German (de)
English (en)
Inventor
Ronald Neidhardt
Klaus Burghoff
Stefan Grosse
Carsten Herweg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of WO2010057970A1 publication Critical patent/WO2010057970A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Definitions

  • PE-CVD plasma enhanced chemical vapor deposition
  • High-quality protective coatings are nowadays deposited in plasma-aided processes in batch systems or in clocked multi-chamber batch plants.
  • the in-line coating processes are aimed at the largest possible batch sizes in order to keep the coating costs low.
  • the workpieces (up to several 10,000 pieces) are rotatably arranged in a coating chamber by up to three axes, wherein the coating chamber can be charged with process gas to form a plasma.
  • the workpieces are rotated relative to the gas outlet openings (gas distributor, gas shower) in order to achieve a uniform separation.
  • the coating is usually carried out in pressure ranges between about 10 "1 to about 10 " 3 mbar, wherein deposition rates of typically between 1 and 2 microns / h can be realized.
  • a disadvantage of the coating processes which are in series is that it is not possible to realize batch sizes which are not economically small and adapted to prefabrication steps.
  • Another significant disadvantage is the long cycle time in known coating methods of up to several hours.
  • the object of the invention is to propose a coating method and a coating apparatus with which even small batch sizes can be economically coated. In particular, should be possible with the method and the device short cycle times.
  • the invention is based on the idea not to arrange the workpieces rotatably as in the prior art, but preferably stationary relative to the gas distributor (gas shower), ie stationary relative to the gas outlet openings, flows through the process gas and / or process liquid to form a plasma stream. Due to the stationary arrangement of the workpieces, high deposition rates of more than 20 ⁇ m / h can be achieved, resulting in a very short total
  • Cycle times are feasible.
  • the cycle times can be further optimized if the coating chamber volume (process chamber volume) is minimized, in particular by arranging the workpieces as close as possible to the gas distributor.
  • the coating chamber volume By minimizing the coating chamber volume, the time required to evacuate the coating chamber can be minimized.
  • a significantly increased deposition rate can be realized with at least constant layer quality.
  • Overall, comparatively cost-effective coating devices can be created since no elaborate cathode technology or high vacuum is required. are dig.
  • the coating method according to the invention and a coating device designed according to the concept of the invention are suitable for integration in production lines.
  • the scope of the invention also includes an embodiment in which the workpieces are not rotated, but in which a, preferably very slow, translatory relative movement between the workpieces and the gas distributor is realized.
  • the workpieces are preferably translated to and / or moved away from the gas distributor.
  • the protective layer obtained by means of the coating process is resistant to abrasion and protects the workpieces from corrosion and / or serves as diffusion protection against oxygen and / or water / water vapor and / or serves as protection against other chemical attacks of acidic or basic media.
  • the at least one applied layer can be realized as, in particular, a coloring and / or structuring, decorative layer.
  • the workpieces can also be successively applied by means of the method embodied according to the concept of the invention or by means of the device several layers in the same coating chamber, preferably first an adhesive layer to which the eigenthe Liehe protective layer based on hydrocarbons and / or silanes ( Doping with, for example, N, O, F are possible by adding further gases) is applied.
  • the adhesive layer can be realized, for example, with silane, tetramethylsilane (TMS), hexamethyldisilazane (HMDS), hexamethyldisilazane oxide (HMDSO) or organometallic compounds.
  • Suitable process gas for forming the plasma stream for the actual coating process are, in particular, halogen-, silicon-, carbon-containing and / or organometallic monomers, i. low molecular weight, crosslinkable substances. Particularly advantageous is the use of acetylene and / or methane to obtain a low-friction, diamond-like carbon layer (DLC layer).
  • DLC layer diamond-like carbon layer
  • the gaseous precursors is also the introduction of highly fluid starting materials with a high proportion of the layer-forming
  • a counter electrode can be assigned to the workpieces, whereby both the counter electrode and the gas distributor can be used without potential or potential. It is very particularly preferred - A -
  • the means electrically contacting the workpieces are not immediately exposed to process gas and / or plasma in order to realize a deposition concentration on the workpieces.
  • the gas distributor used has a plurality of outlet openings, wherein the outlet openings are advantageously such that the process gas emerging from them is activated as plasma immediately after exiting the outlet openings, i. is ignited.
  • outlets can be optional in
  • At least one, preferably only one, outlet opening is assigned to each workpiece for direct (direct) flow. This is particularly preferably rotationally symmetric
  • the coating chamber volume can be reduced to a minimum when the workpieces are located at a small distance from their associated outlet openings.
  • the distance of a workpiece to its associated outlet opening is less than 50mm, preferably less than 30mm. Due to the resulting, direct flow of the workpieces with the plasma stream high deposition rates can be achieved.
  • Components parallel to the flow direction of the plasma stream or the Pias- Mast streams is aligned to achieve the direct flow and the immediate flow around the workpieces with plasma flow.
  • the period of time which the workpieces are subjected to plasma flow is from a value range of less than 10 seconds to 20 minutes.
  • coating rates of more than about 3 ⁇ m, preferably of more than 20 ⁇ m, per hour are advantageously achieved.
  • Optimum coating results are obtained when the workpieces are pretreated and / or cleaned in the coating chamber in which they are subsequently coated.
  • the pretreatment and / or cleaning is preferably carried out by the use of cleaning gases which are activated by high frequency or pulsed DC voltage to form a plasma.
  • cleaning gases which are activated by high frequency or pulsed DC voltage to form a plasma.
  • Very particularly preferably hydrogen, halogen, oxygen, fluorine and / or nitrogen-containing gases are used, which are activated by means of high frequency to a plasma.
  • noble gases is particularly preferred.
  • the pressure during the pretreatment and / or cleaning phase is between about 0.01 mbar and 50 mbar.
  • the excitation of the cleaning or pretreatment gas in the plasma or by its fragmentation gives rise to radicals and / or ions which permit intensive surface cleaning and / or activation.
  • the pretreatment allows a good bond (adhesion) of the actual wear protection coating or a
  • the entire pretreatment time is preferably a few seconds to a few minutes - depending on the base material and layer type.
  • the pressure setting in the pretreatment chamber depends in particular on the gas flow and the suction power of the gas pump. Particularly preferred is an embodiment of the method in which the workpieces are subjected to an AC voltage frequency from a value range between about 1 OkHz and 6GHz. Most preferably, the frequency is selected from a frequency range between about 2OkHz and 400MHz, and it is further preferred that the power to be coupled in is about 0.01-100Watt per cm 2 of workpiece area.
  • the invention also leads to a coating apparatus for coating metallic workpieces, in particular nozzle needles for fuel injectors. Very particularly preferred is the coating device for
  • the device comprises a gas distributor, that is, a plurality of gas outlet openings for applying a plasma stream to the workpieces, which is generated by activating process gas flowing out through the outlet openings and / or process liquid to be evaporated.
  • the coating device comprises means for applying a high-frequency alternating voltage to the workpieces, the power to be coupled preferably corresponding to between about 0.01 W and about 100 Watt per cm 2 workpiece surface.
  • the coating device is characterized in that the workpieces can be positioned in a stationary manner relative to the gas distributor. Alternatively, there is a translational (non-rotatory) relative movement possibility between the workpieces and the gas distributor.
  • the coating device is further characterized by an optimal scalability, in particular when the workpieces, as will be explained later, are arranged on an electrode plate (workpiece carrier).
  • the size of the electrode plate can be adapted to the process. It is conceivable to use electrodes with an areal extent of 1 cm ⁇ 1 cm to> 1 m ⁇ 1 m.
  • the workpieces are arranged in the shape of a mace in and / or on the electrode plate.
  • the workpieces are particularly preferably arranged on an electrode plate, which is preferably aligned parallel to the gas distributor (gas shower), so that the workpieces are aligned with their longitudinal extent parallel to the plasma flow.
  • the workpieces are directly impinged by the plasma stream in order to further optimize the deposition rate.
  • the coating device in which only the workpieces which form the applied electrode with voltage, in particular high-frequency AC voltage or pulsed DC voltage, form.
  • the electrode plate carrying the workpieces is insulated in such a way that the plasma stream can not act on the electrode plate (support plate) directly but impinges exclusively on the workpieces.
  • the deposition can be concentrated on the workpieces.
  • the electrode which is preferably formed exclusively by the workpieces, can be assigned a counterelectrode.
  • the plasma stream can be advantageously shaped by means of auxiliary electrodes in order to reduce inhomogeneities. It is possible to arrange at least one auxiliary electrode between the workpieces and / or in the region of the outlet openings of the gas distributor.
  • the auxiliary electrodes can be at the potential of the workpieces or on the gas distributor or on the suction openings. It is also conceivable to set the auxiliary electrodes to a separately controlled potential, preferably from a frequency range between about 0 and 400 MHz.
  • Fig. 1 a first embodiment of a coating device with vertically arranged workpieces
  • Fig. 2 an alternative embodiment with suspended workpieces.
  • FIG. 1 shows in highly schematic form a coating apparatus 1 for carrying out a PE-CVD coating method.
  • the coating device 1 comprises a metallic gas distributor 2 (gas shower) with a gas inlet 3 and a distribution chamber 4, from which a plurality of outlet openings 5 open.
  • the outlet openings 5 are conically shaped in cross section and expand towards a coating chamber 6 (process chamber) into which the outlet openings 5 open.
  • the workpieces 7 are held in an electrode plate 8 which is electrically insulated in the region of the coating chamber 6 or is provided with an insulation, so that process gas exiting from the outlet openings 5 and / or exiting process liquid to be evaporated, which leads to a plasma stream 9 is activated, can not come into direct contact with the electrode plate 8.
  • the electrode plate 8 is contacted with a known per se means 10 for applying the electrode plate 8 with a voltage.
  • the gas distributor 2 is grounded.
  • each workpiece 7 has an outlet opening 5 assigned to it, wherein each workpiece 7 is arranged coaxially to an imaginary, not shown, longitudinal central axis of the associated outlet opening 5, so that each workpiece 7 can be acted upon directly by plasma stream 9.
  • the outlet openings are arranged offset with advantage to the longitudinal center axes of the workpieces 7.
  • the individual plasma streams overlap in an area between two adjacent ones
  • the workpieces 7 are arranged at a small distance from the associated outlet openings 5, of approximately 40 mm in this exemplary embodiment.
  • the electrode plate 8 In the electrode plate 8 are located between two workpieces 7 suction 1 1 for aspiration of process gas and / or process fluid and / or plasma and for evacuating the coating chamber 6 before the actual coating process.
  • the supplied via the nozzle-like outlet openings 5 process gas is excited in the plasma, partially fragmented and ionized, and forms the plasma streams 9, which are reflected in part on the workpieces 7 as a layer.
  • the pumping out of the plasma from the suction openings 1 1 ensures a plasma stream 9 on the outside of the workpieces 7, which extends along the workpieces 7.
  • the plasma streams 9 can be influenced and controlled via corresponding guide surfaces.
  • the plasma stream 9 forms, depending on the coupled power, the total pressure and the area ratios between the electrode formed by the workpieces 7 and the gas distributor 2 and an optional, not shown here
  • the pressure set in the coating chamber 6 depends on the process gas flow and on the suction power of a vacuum pump (not shown) connected to the coating chamber via the suction openings 11. It is preferably between about 0.01 mbar and 50mbar.
  • the workpieces 7 can be directly pretreated and / or cleaned in the coating chamber 6, for which purpose corresponding cleaning gas, in particular noble gas, is supplied via the gas distributor 2, which is activated as a plasma stream 9.
  • the workpieces 7 are not directly flown with the cleaning gas, but the latter is diffusely distributed in the coating chamber 6.
  • the pressure during this pretreatment and cleaning phase is preferably also 0.01 mbar to 50 mbar.
  • Coating times of less than 10 or 5 minutes can be achieved with the coating device 1 shown in FIG.
  • the cycle time including pumping time is about 10 minutes.
  • the electrode plate 8 goods carrier
  • the residual gas air
  • the high frequency or the pulsed DC voltage is turned on for about 1 to 10 minutes.
  • an adhesive layer is deposited.
  • the reaction gas acetylene is fed.
  • the power of the injected radio frequency can be varied during the process.
  • the gas supply is then stopped and the residual gas is evacuated.
  • FIG. 2 shows an alternative coating device 1.
  • the workpieces 7 are arranged suspended in the coating chamber 6 on an electrode plate 8 (workpiece holder).
  • the workpieces 7 pass through the electrode plate 8.
  • On the side facing away from the gas distributor 2 side of the workpieces 7 is a counter electrode 12, are introduced into the suction 1 1.
  • the counter electrode 12 is optionally connected to the gas distributor 2 (gas shower) to ground, while the electrode plate 8 is connected to means 10 for applying a high-frequency voltage or a pulsed DC voltage. In the case of a high-frequency excitation of the counter electrode 12, a phase matching with the high frequency of the workpieces 7 is necessary.
  • the electrode 8 shown in FIGS. 1 and 2 it is alternatively conceivable to shape it, for example, cylindrically. It is particularly preferred if the then cylindrically contoured electrode 8 to arrange radially within the, preferably then also cylindrical, gas distributor, so that not as in the embodiments shown, a plasma current is achieved from top to bottom, but in the radial direction.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé de revêtement PECVD pour revêtir des pièces (7) métalliques, notamment des pièces de composants de systèmes d'injection de carburant. Selon ce procédé, on applique sur les pièces (7) métalliques une tension alternative haute fréquence ou une tension continue pulsée ou non pulsée, puis ces pièces sont exposées à un courant de plasma (9) provenant d'un diffuseur de gaz (2). Selon l'invention, il est prévu que les pièces (7) soient fixes par rapport au diffuseur de gaz (2). L'invention concerne en outre un dispositif de revêtement (1).
PCT/EP2009/065541 2008-11-24 2009-11-20 Procédé de revêtement et dispositif de revêtement Ceased WO2010057970A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008044024.8 2008-11-24
DE102008044024A DE102008044024A1 (de) 2008-11-24 2008-11-24 Beschichtungsverfahren sowie Beschichtungsvorrichtung

Publications (1)

Publication Number Publication Date
WO2010057970A1 true WO2010057970A1 (fr) 2010-05-27

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ID=41665592

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2009/065541 Ceased WO2010057970A1 (fr) 2008-11-24 2009-11-20 Procédé de revêtement et dispositif de revêtement

Country Status (2)

Country Link
DE (1) DE102008044024A1 (fr)
WO (1) WO2010057970A1 (fr)

Cited By (1)

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CN102424957A (zh) * 2011-12-07 2012-04-25 山东国晶新材料有限公司 一种气相沉积用多层制品支架及化学气相沉积反应室

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DE102012211242A1 (de) 2012-06-29 2014-01-02 Robert Bosch Gmbh Verfahren zum Bearbeiten der Oberfläche eines Bauteils
DE102013007452A1 (de) * 2013-05-02 2014-11-06 Oerlikon Trading Ag, Trübbach Halterung für Tieflochbohrer
DE102020124030B4 (de) * 2020-09-15 2022-06-15 centrotherm international AG Vorrichtung, System und Verfahren zur plasmaunterstützten chemischen Gasphasenabscheidung

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102424957A (zh) * 2011-12-07 2012-04-25 山东国晶新材料有限公司 一种气相沉积用多层制品支架及化学气相沉积反应室

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