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WO2010044561A3 - 3족 질화물 반도체 발광소자 - Google Patents

3족 질화물 반도체 발광소자 Download PDF

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Publication number
WO2010044561A3
WO2010044561A3 PCT/KR2009/005706 KR2009005706W WO2010044561A3 WO 2010044561 A3 WO2010044561 A3 WO 2010044561A3 KR 2009005706 W KR2009005706 W KR 2009005706W WO 2010044561 A3 WO2010044561 A3 WO 2010044561A3
Authority
WO
WIPO (PCT)
Prior art keywords
nitride semiconductor
group iii
iii nitride
emitting device
light emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2009/005706
Other languages
English (en)
French (fr)
Other versions
WO2010044561A2 (ko
Inventor
박은현
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EpiValley Co Ltd
Original Assignee
EpiValley Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EpiValley Co Ltd filed Critical EpiValley Co Ltd
Priority to US12/648,692 priority Critical patent/US20100102353A1/en
Publication of WO2010044561A2 publication Critical patent/WO2010044561A2/ko
Publication of WO2010044561A3 publication Critical patent/WO2010044561A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
    • H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials

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  • Led Devices (AREA)

Abstract

본 개시는 기판; 기판 위에 위치하며, 전자와 정공의 재결합을 통해 빛을 생성시키는 활성층을 구비하는 복수개의 3족 질화물 반도체층; 그리고, 활성층에서 생성된 빛을 스캐터링하는 면;으로서, 식각된 제1 면과 제1 면을 덮는 제2 면을 구비하는 스캐터링 면;을 포함하는 것을 특징으로 하는 3족 질화물 반도체 발광소자에 관한 것이다.
PCT/KR2009/005706 2008-10-15 2009-10-07 3족 질화물 반도체 발광소자 Ceased WO2010044561A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/648,692 US20100102353A1 (en) 2008-10-15 2009-12-29 III-Nitride Semiconductor Light Emitting Device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0101155 2008-10-15
KR1020080101155A KR101009651B1 (ko) 2008-10-15 2008-10-15 3족 질화물 반도체 발광소자

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/648,692 Continuation US20100102353A1 (en) 2008-10-15 2009-12-29 III-Nitride Semiconductor Light Emitting Device

Publications (2)

Publication Number Publication Date
WO2010044561A2 WO2010044561A2 (ko) 2010-04-22
WO2010044561A3 true WO2010044561A3 (ko) 2010-08-05

Family

ID=42107018

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/005706 Ceased WO2010044561A2 (ko) 2008-10-15 2009-10-07 3족 질화물 반도체 발광소자

Country Status (3)

Country Link
US (1) US20100102353A1 (ko)
KR (1) KR101009651B1 (ko)
WO (1) WO2010044561A2 (ko)

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US8476658B2 (en) * 2009-11-25 2013-07-02 Jing Jie Dai Semiconductor light-emitting devices
KR100993093B1 (ko) 2010-02-04 2010-11-08 엘지이노텍 주식회사 발광 소자 및 발광 소자 패키지
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EP2509120A1 (en) 2011-04-05 2012-10-10 Imec Semiconductor device and method
JP5875249B2 (ja) * 2011-04-28 2016-03-02 ソウル バイオシス カンパニー リミテッドＳｅｏｕｌ Ｖｉｏｓｙｓ Ｃｏ．，Ｌｔｄ． 半導体基板、半導体装置及びその製造方法
KR101259999B1 (ko) * 2011-04-28 2013-05-06 서울옵토디바이스주식회사 반도체 기판 및 그 제조방법
TW201248725A (en) * 2011-05-31 2012-12-01 Aceplux Optotech Inc Epitaxial substrate with transparent cone, LED, and manufacturing method thereof.
TWI528579B (zh) * 2012-04-18 2016-04-01 新世紀光電股份有限公司 發光二極體元件
CN104246027B (zh) * 2012-08-06 2015-11-25 日本碍子株式会社 复合基板及功能元件
TWI565094B (zh) * 2012-11-15 2017-01-01 財團法人工業技術研究院 氮化物半導體結構
CN103165771B (zh) 2013-03-28 2015-07-15 天津三安光电有限公司 一种具有埋入式孔洞结构的氮化物底层及其制备方法
US20140367693A1 (en) * 2013-06-14 2014-12-18 Epistar Corporation Light-emitting device and the manufacturing method thereof
US9362452B2 (en) * 2013-06-14 2016-06-07 Epistar Corporation Light-emitting device and the manufacturing method thereof
CN104603959B (zh) * 2013-08-21 2017-07-04 夏普株式会社 氮化物半导体发光元件
TWI597863B (zh) * 2013-10-22 2017-09-01 晶元光電股份有限公司 發光元件及其製造方法
KR102284535B1 (ko) * 2014-11-12 2021-08-02 서울바이오시스 주식회사 발광 소자 및 그 제조 방법
JP2016066814A (ja) * 2015-12-22 2016-04-28 株式会社東芝 半導体発光素子、窒化物半導体層成長用基板及び窒化物半導体ウェーハ
KR102591149B1 (ko) * 2021-12-20 2023-10-19 웨이브로드 주식회사 비발광 3족 질화물 반도체 적층체를 제조하는 방법

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Also Published As

Publication number Publication date
WO2010044561A2 (ko) 2010-04-22
KR20100042041A (ko) 2010-04-23
US20100102353A1 (en) 2010-04-29
KR101009651B1 (ko) 2011-01-19

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