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WO2009038143A1 - 導電性積層体 - Google Patents

導電性積層体 Download PDF

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Publication number
WO2009038143A1
WO2009038143A1 PCT/JP2008/066880 JP2008066880W WO2009038143A1 WO 2009038143 A1 WO2009038143 A1 WO 2009038143A1 JP 2008066880 W JP2008066880 W JP 2008066880W WO 2009038143 A1 WO2009038143 A1 WO 2009038143A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
laminate
conductive laminate
conductive
visible light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066880
Other languages
English (en)
French (fr)
Inventor
Masayuki Morino
Kazuya Takemoto
Hideaki Miyazawa
Michihisa Tomida
Tamotsu Morimoto
Yuichi Hino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to CN200880107651A priority Critical patent/CN101803489A/zh
Priority to EP20080832608 priority patent/EP2192828A1/en
Priority to JP2009533183A priority patent/JPWO2009038143A1/ja
Publication of WO2009038143A1 publication Critical patent/WO2009038143A1/ja
Priority to US12/726,905 priority patent/US20100171406A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

　透過、反射バンドが広く、導電性（電磁波遮蔽性）、可視光線透過性、可視光線反射防止性、近赤外線遮蔽性および耐湿性に優れた導電性積層体、これを使用したプラズマディスプレイ用電磁波遮蔽体などを提供する。 　基体２１と、基体２１上に形成された導電膜２２とを有する導電性積層体２０であって、導電膜２２は、基体２１側から、高屈折率層（２３ａ～２３ｅ）と金属層（２４ａ～２４ｄ）とがこの順で交互に計２ｎ＋１層［ただし、ｎは１～１２の整数である。］積層され、基体２１から最も離れた位置に、さらに水素化炭素層２５を有する多層構造体であり、高屈折率層（２３ａ～２３ｅ）の屈折率は、１．５～２．７であり、水素化炭素層２５は、炭素原子と水素原子とを含み水素原子含有量が９～５０原子％であることを特徴とする導電性積層体。
PCT/JP2008/066880 2007-09-19 2008-09-18 導電性積層体 Ceased WO2009038143A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN200880107651A CN101803489A (zh) 2007-09-19 2008-09-18 导电性层叠体
EP20080832608 EP2192828A1 (en) 2007-09-19 2008-09-18 Conductive laminate
JP2009533183A JPWO2009038143A1 (ja) 2007-09-19 2008-09-18 導電性積層体
US12/726,905 US20100171406A1 (en) 2007-09-19 2010-03-18 Electroconductive laminate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-242795 2007-09-19
JP2007242795 2007-09-19

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/726,905 Continuation US20100171406A1 (en) 2007-09-19 2010-03-18 Electroconductive laminate

Publications (1)

Publication Number Publication Date
WO2009038143A1 true WO2009038143A1 (ja) 2009-03-26

Family

ID=40467953

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066880 Ceased WO2009038143A1 (ja) 2007-09-19 2008-09-18 導電性積層体

Country Status (7)

Country Link
US (1) US20100171406A1 (ja)
EP (1) EP2192828A1 (ja)
JP (1) JPWO2009038143A1 (ja)
KR (1) KR20100057032A (ja)
CN (1) CN101803489A (ja)
TW (1) TW200932529A (ja)
WO (1) WO2009038143A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016052080A1 (ja) * 2014-09-30 2016-04-07 富士フイルム株式会社 反射防止膜及びレンズ並びに撮像装置
WO2016052079A1 (ja) * 2014-09-30 2016-04-07 富士フイルム株式会社 反射防止膜及びレンズ並びに撮像装置
JP2018510076A (ja) * 2015-03-16 2018-04-12 エルジー・ケム・リミテッド 伝導性構造体およびこれを含む電子素子

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6282142B2 (ja) * 2014-03-03 2018-02-21 日東電工株式会社 赤外線反射基板およびその製造方法
US10150141B2 (en) * 2014-03-21 2018-12-11 Halliburton Energy Services, Inc. Manufacturing process for integrated computational elements
CN104538089A (zh) * 2014-10-30 2015-04-22 唐炎毅 一种用于调光薄膜的导电膜结构
JP6379071B2 (ja) * 2015-06-15 2018-08-22 Ｊｘ金属株式会社 電磁波シールド材
JP6932498B2 (ja) * 2016-12-08 2021-09-08 デュポン帝人アドバンスドペーパー株式会社 電磁波抑制シート
CN107689264B (zh) * 2017-08-11 2023-05-09 宁波大学 透明导电薄膜及制备方法、聚合物分散液晶组件的制备方法
JP7612377B2 (ja) 2020-10-28 2025-01-14 キヤノン株式会社 光学部品および光学機器
CN115460900B (zh) * 2022-09-13 2025-06-17 中国航发北京航空材料研究院 高透过率的防眩电磁屏蔽膜及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126155A (ja) * 1997-06-30 1999-01-29 Mitsui Chem Inc エレクトロルミネッセンス素子用保護フィルム
JP2000268408A (ja) * 1999-03-19 2000-09-29 Hitachi Maxell Ltd 光記録媒体
JP2005271495A (ja) 2004-03-26 2005-10-06 Kiyoshi Chiba 積層体
JP2006186309A (ja) 2004-11-30 2006-07-13 Asahi Glass Co Ltd 導電性積層体、プラズマディスプレイ用電磁波遮蔽フィルムおよびプラズマディスプレイ用保護板
JP2007242795A (ja) 2006-03-07 2007-09-20 Cmk Corp プリント配線板とその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073785A (en) * 1990-04-30 1991-12-17 Xerox Corporation Coating processes for an ink jet printhead
JP2006284887A (ja) * 2005-03-31 2006-10-19 International Display Technology Kk 低抵抗ｄｌｃ配向膜を備えた液晶セルとその製造方法
JP2007219280A (ja) * 2006-02-17 2007-08-30 Sumitomo Electric Ind Ltd 屈折率変調型回折光学素子の作製方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126155A (ja) * 1997-06-30 1999-01-29 Mitsui Chem Inc エレクトロルミネッセンス素子用保護フィルム
JP2000268408A (ja) * 1999-03-19 2000-09-29 Hitachi Maxell Ltd 光記録媒体
JP2005271495A (ja) 2004-03-26 2005-10-06 Kiyoshi Chiba 積層体
JP2006186309A (ja) 2004-11-30 2006-07-13 Asahi Glass Co Ltd 導電性積層体、プラズマディスプレイ用電磁波遮蔽フィルムおよびプラズマディスプレイ用保護板
JP2007242795A (ja) 2006-03-07 2007-09-20 Cmk Corp プリント配線板とその製造方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016052080A1 (ja) * 2014-09-30 2016-04-07 富士フイルム株式会社 反射防止膜及びレンズ並びに撮像装置
WO2016052079A1 (ja) * 2014-09-30 2016-04-07 富士フイルム株式会社 反射防止膜及びレンズ並びに撮像装置
JPWO2016052080A1 (ja) * 2014-09-30 2017-06-15 富士フイルム株式会社 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置
JPWO2016052079A1 (ja) * 2014-09-30 2017-07-06 富士フイルム株式会社 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置
US9766375B2 (en) 2014-09-30 2017-09-19 Fujifilm Corporation Antireflection film, lens, and imaging device
US9841535B2 (en) 2014-09-30 2017-12-12 Fujifilm Corporation Antireflection film, lens, and imaging device
JP2018510076A (ja) * 2015-03-16 2018-04-12 エルジー・ケム・リミテッド 伝導性構造体およびこれを含む電子素子

Also Published As

Publication number Publication date
US20100171406A1 (en) 2010-07-08
KR20100057032A (ko) 2010-05-28
CN101803489A (zh) 2010-08-11
JPWO2009038143A1 (ja) 2011-01-06
EP2192828A1 (en) 2010-06-02
TW200932529A (en) 2009-08-01

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