[go: up one dir, main page]

WO2009037981A1 - ２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸塩類およびその製造方法 - Google Patents

２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸塩類およびその製造方法 Download PDF

Info

Publication number
WO2009037981A1
WO2009037981A1 PCT/JP2008/066042 JP2008066042W WO2009037981A1 WO 2009037981 A1 WO2009037981 A1 WO 2009037981A1 JP 2008066042 W JP2008066042 W JP 2008066042W WO 2009037981 A1 WO2009037981 A1 WO 2009037981A1
Authority
WO
WIPO (PCT)
Prior art keywords
alkylcarbonyloxy
producing
ammonium salt
same
acid salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066042
Other languages
English (en)
French (fr)
Inventor
Yuji Hagiwara
Masashi Nagamori
Masaki Fujiwara
Jonathan Joachim Jodry
Satoru Narizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008210510A external-priority patent/JP5347371B2/ja
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to KR1020127033866A priority Critical patent/KR20130003042A/ko
Priority to US12/678,250 priority patent/US8581009B2/en
Priority to KR1020107008358A priority patent/KR101234680B1/ko
Priority to CN200880024402.8A priority patent/CN101687741B/zh
Publication of WO2009037981A1 publication Critical patent/WO2009037981A1/ja
Anticipated expiration legal-status Critical
Priority to US13/935,647 priority patent/US8748672B2/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/132—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group
    • C07C29/136—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH
    • C07C29/147—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH of carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/01—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms
    • C07C211/02—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C211/03—Monoamines
    • C07C211/05—Mono-, di- or tri-ethylamine
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/07—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
    • C07C309/12—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00—Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C313/02—Sulfinic acids; Derivatives thereof
    • C07C313/04—Sulfinic acids; Esters thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

カルボン酸ブロモジフルオロエチルエステルを、スルフィン化剤を用いてスルフィン化する際に、有機塩基を使用することによって、２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルフィン酸アンモニウム塩を得る。これを酸化して２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸アンモニウム塩を得る。これを原料とし、オニウム塩に交換するか、鹸化・エステル化を経てオニウム塩に交換することで、２－アルキルカルボニルオキシ－１，１－ジフルオロエタンスルホン酸オニウム塩類を得る。
PCT/JP2008/066042 2007-09-18 2008-09-05 ２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸塩類およびその製造方法 Ceased WO2009037981A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020127033866A KR20130003042A (ko) 2007-09-18 2008-09-05 2-(알킬카르보닐옥시)-1,1-디플루오르에탄술폰산염류 및 그 제조방법
US12/678,250 US8581009B2 (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same
KR1020107008358A KR101234680B1 (ko) 2007-09-18 2008-09-05 2-(알킬카르보닐옥시)-1,1-디플루오르에탄술폰산염류 및 그 제조방법
CN200880024402.8A CN101687741B (zh) 2007-09-18 2008-09-05 2-（烷基羰氧基）-1,1-二氟乙烷磺酸盐类及其制造方法
US13/935,647 US8748672B2 (en) 2007-09-18 2013-07-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007241606 2007-09-18
JP2007-241606 2007-09-18
JP2008210510A JP5347371B2 (ja) 2007-09-18 2008-08-19 ２−（アルキルカルボニルオキシ）−１，１−ジフルオロエタンスルホン酸塩類およびその製造方法
JP2008-210510 2008-08-19

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/678,250 A-371-Of-International US8581009B2 (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same
US13/935,647 Division US8748672B2 (en) 2007-09-18 2013-07-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Publications (1)

Publication Number Publication Date
WO2009037981A1 true WO2009037981A1 (ja) 2009-03-26

Family

ID=40467800

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066042 Ceased WO2009037981A1 (ja) 2007-09-18 2008-09-05 ２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸塩類およびその製造方法

Country Status (1)

Country Link
WO (1) WO2009037981A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119970A1 (en) * 2008-11-07 2010-05-13 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
WO2010104177A1 (ja) * 2009-03-12 2010-09-16 セントラル硝子株式会社 フルオロアルカンスルホン酸アンモニウム塩類およびその製造方法
US20100285405A1 (en) * 2009-05-07 2010-11-11 Jsr Corporation Radiation-sensitive resin composition
US20130108964A1 (en) * 2011-10-26 2013-05-02 Shin-Etsu Chemical Co., Ltd. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
JPWO2020255585A1 (ja) * 2019-06-19 2020-12-24

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007145797A (ja) * 2005-04-06 2007-06-14 Shin Etsu Chem Co Ltd 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP2007304490A (ja) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法
WO2008099869A1 (ja) * 2007-02-15 2008-08-21 Central Glass Company, Limited 光酸発生剤用化合物及びそれを用いたレジスト組成物、パターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007145797A (ja) * 2005-04-06 2007-06-14 Shin Etsu Chem Co Ltd 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP2007304490A (ja) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法
WO2008099869A1 (ja) * 2007-02-15 2008-08-21 Central Glass Company, Limited 光酸発生剤用化合物及びそれを用いたレジスト組成物、パターン形成方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119970A1 (en) * 2008-11-07 2010-05-13 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
US8349533B2 (en) * 2008-11-07 2013-01-08 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
WO2010104177A1 (ja) * 2009-03-12 2010-09-16 セントラル硝子株式会社 フルオロアルカンスルホン酸アンモニウム塩類およびその製造方法
US8877960B2 (en) 2009-03-12 2014-11-04 Central Glass Company, Limited Fluoroalkanesulfonic acid ammonium salts and method for producing same
US20100285405A1 (en) * 2009-05-07 2010-11-11 Jsr Corporation Radiation-sensitive resin composition
US8431324B2 (en) * 2009-05-07 2013-04-30 Jsr Corporation Radiation-sensitive resin composition
KR20130045804A (ko) * 2011-10-26 2013-05-06 신에쓰 가가꾸 고교 가부시끼가이샤 ＡｒＦ 액침 노광용 화학 증폭 포지티브형 레지스트 재료 및 패턴 형성 방법
US8815492B2 (en) * 2011-10-26 2014-08-26 Shin-Etsu Chemical Co., Ltd. Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process
US20130108964A1 (en) * 2011-10-26 2013-05-02 Shin-Etsu Chemical Co., Ltd. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
KR101664520B1 (ko) 2011-10-26 2016-10-10 신에쓰 가가꾸 고교 가부시끼가이샤 ＡｒＦ 액침 노광용 화학 증폭 포지티브형 레지스트 재료 및 패턴 형성 방법
JPWO2020255585A1 (ja) * 2019-06-19 2020-12-24
WO2020255585A1 (ja) * 2019-06-19 2020-12-24 富士フイルム株式会社 活性光線又は放射線の照射によって酸を発生する化合物の精製方法、感活性光線性又は感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法
JP7260643B2 (ja) 2019-06-19 2023-04-18 富士フイルム株式会社 活性光線又は放射線の照射によって酸を発生する化合物の精製方法、感活性光線性又は感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法

Similar Documents

Publication Publication Date Title
WO2009012282A3 (en) Extremum seeking control with reset control
WO2008132964A1 (ja) ３，３，３－トリフルオロプロピンの製造方法
WO2010026408A3 (en) Laser imageable paper
EP2533101A3 (en) Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
WO2009067184A3 (en) Bi-directional trimmer head spool with curved trimmer line guide
WO2006076611A3 (en) Production of metal nanoparticles
WO2009004512A3 (en) Solidification matrix including a salt of a straight chain saturated mono-, di-, or tri- carboxylic acid
ZA200903597B (en) Method for converting nitrile compounds into corresponding carboxylic acids and esters
WO2009094563A3 (en) Crystalline form of calcium-salts of (3s)-aminomethyl-b-methyl-hexanoic acids and methods of use
WO2009037981A1 (ja) ２－（アルキルカルボニルオキシ）－１，１－ジフルオロエタンスルホン酸塩類およびその製造方法
WO2010050730A3 (ko) 벽지 및 그 제조방법
WO2010115653A3 (en) Superalloy component and method of improving the same
WO2010108923A3 (de) Verfahren und vorrichtung zum ansteuern eines eine ansprechverzögerung aufweisenden steuerelements einer antriebseinrichtung
WO2013038175A3 (en) Autonomous vehicle and task modelling
EP1832376A3 (en) System and method for monotoring drilling process parameters and controlling drilling operation
WO2010041063A3 (en) Polymer additives
WO2009133533A3 (en) A method for controlling a transmission of a motor vehicle
WO2008045351A3 (en) Composition and associated method
WO2007103001A3 (en) Searching within a site of a search result
WO2011115371A3 (en) Etchant for metal wiring and method for manufacturing metal wiring using the same
WO2010046198A3 (de) Verfahren und vorrichtung zum anfahren eines hybridfahrzeuges
TW200732728A (en) Lens apparatus
EP2207935B8 (en) Method for improving the stability against vibrations of a stay cable.
WO2009041473A1 (ja) ６－フルオロ－３－ヒドロキシ－２－ピラジンカルボニトリルの有機アミン塩およびその製造法
WO2008132959A1 (ja) 含フッ素カルボン酸化合物を用いた含フッ素ポリマーの製造方法

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880024402.8

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08832427

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20107008358

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 08832427

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 12678250

Country of ref document: US