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WO2009035075A1 - 磁気記録媒体 - Google Patents

磁気記録媒体 Download PDF

Info

Publication number
WO2009035075A1
WO2009035075A1 PCT/JP2008/066531 JP2008066531W WO2009035075A1 WO 2009035075 A1 WO2009035075 A1 WO 2009035075A1 JP 2008066531 W JP2008066531 W JP 2008066531W WO 2009035075 A1 WO2009035075 A1 WO 2009035075A1
Authority
WO
WIPO (PCT)
Prior art keywords
recording medium
magnetic recording
layer
lubricating
substituents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066531
Other languages
English (en)
French (fr)
Inventor
Kunihiro Imai
Takako Matsumoto
Takeshi Watanabe
Akira Furuta
Kazuhiro Kusakawa
Masami Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Device Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Device Technology Co Ltd filed Critical Fuji Electric Device Technology Co Ltd
Priority to JP2009532237A priority Critical patent/JP4632144B2/ja
Priority to US12/733,420 priority patent/US10068603B2/en
Publication of WO2009035075A1 publication Critical patent/WO2009035075A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M107/00Lubricating compositions characterised by the base-material being a macromolecular compound
    • C10M107/38Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. anti-static or antifriction
    • G11B5/725Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253Fluorocarbon lubricant
    • G11B5/7257Perfluoropolyether lubricant
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2211/00Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2211/04Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
    • C10M2211/042Alcohols; Ethers; Aldehydes; Ketones
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/04Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
    • C10M2213/043Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen used as base material
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01Physico-chemical properties
    • C10N2020/04Molecular weight; Molecular weight distribution
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/08Resistance to extreme temperature
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/14Electric or magnetic purposes
    • C10N2040/18Electric or magnetic purposes in connection with recordings on magnetic tape or disc
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015Dispersions of solid lubricants
    • C10N2050/02Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/023Multi-layer lubricant coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Lubricants (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

 本発明の磁気記録媒体は、非磁性基板上に少なくとも磁性層、保護層および潤滑層からなる磁気記録媒体であり、前記潤滑層を構成する潤滑剤が下記の一般式(1)、(2)または(3)で表される潤滑剤であり、前記潤滑剤の置換基R1、R2、R3およびR4は、有機基であり、且つ前記潤滑剤の末端部分の置換基R1およびR2の少なくとも一方、並びに置換基R3およびR4が複数の官能基を有し、前記官能基間の最短距離が、3原子以上、好ましくは5原子離れていることを特徴とする。本発明の磁気記録媒体は、磁性層温度が150°Cから200°Cとなる熱アシスト記録方式に使用することができる。本発明の磁気記録媒体は、前記潤滑層の潤滑剤揮発量が、初期膜厚量の10%未満であることを特徴とする。   【化1】
PCT/JP2008/066531 2007-09-14 2008-09-12 磁気記録媒体 Ceased WO2009035075A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009532237A JP4632144B2 (ja) 2007-09-14 2008-09-12 磁気記録媒体
US12/733,420 US10068603B2 (en) 2007-09-14 2008-09-12 Magnetic recording medium

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007239490 2007-09-14
JP2007-239491 2007-09-14
JP2007239491 2007-09-14
JP2007-239490 2007-09-14

Publications (1)

Publication Number Publication Date
WO2009035075A1 true WO2009035075A1 (ja) 2009-03-19

Family

ID=40452081

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066531 Ceased WO2009035075A1 (ja) 2007-09-14 2008-09-12 磁気記録媒体

Country Status (3)

Country Link
US (1) US10068603B2 (ja)
JP (1) JP4632144B2 (ja)
WO (1) WO2009035075A1 (ja)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012070464A1 (ja) * 2010-11-22 2012-05-31 山陽特殊製鋼株式会社 磁気記録媒体のシード層用合金およびスパッタリングターゲット材
JP2018024614A (ja) * 2016-08-10 2018-02-15 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
WO2019054148A1 (ja) * 2017-09-13 2019-03-21 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JPWO2021020076A1 (ja) * 2019-07-31 2021-02-04
JP2021046424A (ja) * 2020-12-02 2021-03-25 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JPWO2021131961A1 (ja) * 2019-12-23 2021-07-01
JPWO2022113854A1 (ja) * 2020-11-27 2022-06-02
US11639330B2 (en) 2017-08-21 2023-05-02 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11767483B2 (en) 2018-09-12 2023-09-26 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11820953B2 (en) 2019-03-12 2023-11-21 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium and magnetic recording medium
US11879109B2 (en) 2019-09-18 2024-01-23 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
JPWO2024185621A1 (ja) * 2023-03-07 2024-09-12
US12100434B2 (en) 2020-02-07 2024-09-24 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US12338407B2 (en) 2019-11-07 2025-06-24 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8663822B2 (en) 2011-10-04 2014-03-04 HGST Netherlands B.V. Lubricant layer that provides a stable head-to-disk interface in humid conditions
US9090717B2 (en) * 2011-12-19 2015-07-28 HGST Netherlands B.V. UV cross-linking neat lubricant mixtures for magnetic recording media
CN114550755B (zh) * 2016-02-22 2023-09-29 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP6763014B2 (ja) 2016-03-10 2020-09-30 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
WO2018116742A1 (ja) 2016-12-20 2018-06-28 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
US11479641B2 (en) 2017-08-21 2022-10-25 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
JP7138646B2 (ja) 2017-09-07 2022-09-16 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
US11661408B2 (en) 2018-09-12 2023-05-30 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US12129445B2 (en) 2019-07-31 2024-10-29 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
WO2021065380A1 (ja) 2019-10-01 2021-04-08 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP7732454B2 (ja) 2020-06-11 2025-09-02 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP7786454B2 (ja) 2021-04-08 2025-12-16 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体

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JP2006328418A (ja) * 2006-07-24 2006-12-07 Hoya Corp 磁気記録媒体用フッ素系潤滑剤及び磁気記録媒体

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JP2004152460A (ja) * 2002-09-03 2004-05-27 Hoya Corp 磁気ディスクおよびその製造方法
JP2006328418A (ja) * 2006-07-24 2006-12-07 Hoya Corp 磁気記録媒体用フッ素系潤滑剤及び磁気記録媒体

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012070464A1 (ja) * 2010-11-22 2012-05-31 山陽特殊製鋼株式会社 磁気記録媒体のシード層用合金およびスパッタリングターゲット材
CN112201281B (zh) * 2016-08-10 2022-03-18 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP2018024614A (ja) * 2016-08-10 2018-02-15 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
US10803898B2 (en) 2016-08-10 2020-10-13 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN112201281A (zh) * 2016-08-10 2021-01-08 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11639330B2 (en) 2017-08-21 2023-05-02 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
WO2019054148A1 (ja) * 2017-09-13 2019-03-21 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN111278797A (zh) * 2017-09-13 2020-06-12 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
CN111278797B (zh) * 2017-09-13 2023-06-16 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11261394B2 (en) 2017-09-13 2022-03-01 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording media, and magnetic recording medium
US11767483B2 (en) 2018-09-12 2023-09-26 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11820953B2 (en) 2019-03-12 2023-11-21 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium and magnetic recording medium
JP7447903B2 (ja) 2019-07-31 2024-03-12 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
WO2021020076A1 (ja) * 2019-07-31 2021-02-04 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JPWO2021020076A1 (ja) * 2019-07-31 2021-02-04
US11912824B2 (en) 2019-07-31 2024-02-27 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN114174251A (zh) * 2019-07-31 2022-03-11 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
CN114174251B (zh) * 2019-07-31 2023-10-27 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11879109B2 (en) 2019-09-18 2024-01-23 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US12338407B2 (en) 2019-11-07 2025-06-24 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
JPWO2021131961A1 (ja) * 2019-12-23 2021-07-01
JP7647578B2 (ja) 2019-12-23 2025-03-18 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US12100434B2 (en) 2020-02-07 2024-09-24 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
WO2022113854A1 (ja) * 2020-11-27 2022-06-02 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JPWO2022113854A1 (ja) * 2020-11-27 2022-06-02
JP7790354B2 (ja) 2020-11-27 2025-12-23 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP2021046424A (ja) * 2020-12-02 2021-03-25 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP7012807B2 (ja) 2020-12-02 2022-02-14 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JPWO2024185621A1 (ja) * 2023-03-07 2024-09-12
WO2024185621A1 (ja) * 2023-03-07 2024-09-12 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP7806966B2 (ja) 2023-03-07 2026-01-27 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体

Also Published As

Publication number Publication date
JPWO2009035075A1 (ja) 2010-12-24
US10068603B2 (en) 2018-09-04
JP4632144B2 (ja) 2011-02-16
US20100233513A1 (en) 2010-09-16

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