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WO2009031656A1 - 吊り下げ装置及び露光装置 - Google Patents

吊り下げ装置及び露光装置 Download PDF

Info

Publication number
WO2009031656A1
WO2009031656A1 PCT/JP2008/066091 JP2008066091W WO2009031656A1 WO 2009031656 A1 WO2009031656 A1 WO 2009031656A1 JP 2008066091 W JP2008066091 W JP 2008066091W WO 2009031656 A1 WO2009031656 A1 WO 2009031656A1
Authority
WO
WIPO (PCT)
Prior art keywords
suspending
exposure
exposure apparatus
connecting member
suspending apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066091
Other languages
English (en)
French (fr)
Inventor
Noriya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of WO2009031656A1 publication Critical patent/WO2009031656A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16FSPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

 吊り下げ装置は、物体を吊り下げ支持するための連結部材を備える。前記連結部材は、前記物体に接続された第1部材と、前記第1部材に連結された第2部材と、を有し、前記第1部材と前記第2部材とは、第1方向に対しては相対位置が規定され且つ前記第1方向とは異なる第2方向に対しては相対移動可能に連結されている。
PCT/JP2008/066091 2007-09-07 2008-09-05 吊り下げ装置及び露光装置 Ceased WO2009031656A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007232947 2007-09-07
JP2007-232947 2007-09-07

Publications (1)

Publication Number Publication Date
WO2009031656A1 true WO2009031656A1 (ja) 2009-03-12

Family

ID=40428968

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066091 Ceased WO2009031656A1 (ja) 2007-09-07 2008-09-05 吊り下げ装置及び露光装置

Country Status (3)

Country Link
US (1) US20090274537A1 (ja)
TW (1) TW200912560A (ja)
WO (1) WO2009031656A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009024870A1 (de) * 2008-06-10 2009-12-31 Carl Zeiss Smt Ag Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul
EP2753979B1 (en) * 2011-09-09 2020-01-15 ASML Netherlands B.V. Vibration isolation module and substrate processing system

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03105683U (ja) * 1990-02-15 1991-11-01
JPH05319774A (ja) * 1992-05-20 1993-12-03 Kito Corp 走行用レールの吊下支持装置
JPH09151658A (ja) * 1995-11-30 1997-06-10 Nichibei Co Ltd 移動間仕切壁のランナ連結装置
JPH11150062A (ja) * 1997-11-14 1999-06-02 Nikon Corp 除振装置及び露光装置並びに除振台の除振方法
JP2003130132A (ja) * 2001-10-22 2003-05-08 Nec Ameniplantex Ltd 除振機構
WO2007040254A1 (ja) * 2005-10-05 2007-04-12 Nikon Corporation 露光装置及び露光方法
JP2007113939A (ja) * 2005-10-18 2007-05-10 Nikon Corp 計測装置及び計測方法、ステージ装置、並びに露光装置及び露光方法
JP2007142313A (ja) * 2005-11-22 2007-06-07 Nikon Corp 計測工具及び調整方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5090171A (en) * 1989-08-01 1992-02-25 Komatsu Wall Industry Co., Ltd. Movable partitioning panel
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
SG88823A1 (en) * 1996-11-28 2002-05-21 Nikon Corp Projection exposure apparatus
DE69735016T2 (de) * 1996-12-24 2006-08-17 Asml Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
TW449672B (en) * 1997-12-25 2001-08-11 Nippon Kogaku Kk Process and apparatus for manufacturing photomask and method of manufacturing the same
KR20010042133A (ko) * 1998-03-26 2001-05-25 오노 시게오 노광방법, 노광장치, 포토마스크, 포토마스크의 제조방법,마이크로디바이스, 및 마이크로디바이스의 제조방법
WO1999066370A1 (en) * 1998-06-17 1999-12-23 Nikon Corporation Method for producing mask
US6272779B1 (en) * 1998-10-30 2001-08-14 Steelcase Development Inc. Display board system
US6279761B1 (en) * 1999-03-01 2001-08-28 Steelcase Development Inc. Information display system
US6745813B2 (en) * 2000-07-31 2004-06-08 Kim Charles Yorgason Rolling pivot for track suspended articulated panels
US7185589B2 (en) * 2002-06-26 2007-03-06 Modernfold, Inc. Multi-program trolleys and switches
DE20306212U1 (de) * 2003-04-23 2003-06-18 Julius Blum Ges.m.b.H., Höchst Ausziehführungsgarnitur für Schubladen od.dgl.
DE10323274B3 (de) * 2003-05-21 2005-01-20 Dorma Gmbh + Co. Kg Schienenführung für ein hängend geführtes Schiebeelement
JP4656448B2 (ja) * 2004-09-30 2011-03-23 株式会社ニコン 投影光学装置及び露光装置
US20070030462A1 (en) * 2005-08-03 2007-02-08 Nikon Corporation Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers
US7433050B2 (en) * 2005-10-05 2008-10-07 Nikon Corporation Exposure apparatus and exposure method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03105683U (ja) * 1990-02-15 1991-11-01
JPH05319774A (ja) * 1992-05-20 1993-12-03 Kito Corp 走行用レールの吊下支持装置
JPH09151658A (ja) * 1995-11-30 1997-06-10 Nichibei Co Ltd 移動間仕切壁のランナ連結装置
JPH11150062A (ja) * 1997-11-14 1999-06-02 Nikon Corp 除振装置及び露光装置並びに除振台の除振方法
JP2003130132A (ja) * 2001-10-22 2003-05-08 Nec Ameniplantex Ltd 除振機構
WO2007040254A1 (ja) * 2005-10-05 2007-04-12 Nikon Corporation 露光装置及び露光方法
JP2007113939A (ja) * 2005-10-18 2007-05-10 Nikon Corp 計測装置及び計測方法、ステージ装置、並びに露光装置及び露光方法
JP2007142313A (ja) * 2005-11-22 2007-06-07 Nikon Corp 計測工具及び調整方法

Also Published As

Publication number Publication date
TW200912560A (en) 2009-03-16
US20090274537A1 (en) 2009-11-05

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