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WO2009024860A3 - Euv radiation source - Google Patents

Euv radiation source Download PDF

Info

Publication number
WO2009024860A3
WO2009024860A3 PCT/IB2008/002201 IB2008002201W WO2009024860A3 WO 2009024860 A3 WO2009024860 A3 WO 2009024860A3 IB 2008002201 W IB2008002201 W IB 2008002201W WO 2009024860 A3 WO2009024860 A3 WO 2009024860A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiation source
chamber
euv radiation
source
conduit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2008/002201
Other languages
French (fr)
Other versions
WO2009024860A2 (en
Inventor
Vadim Yevgenyevich Banine
Vladimir Vitalevich Ivanov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/078,663 external-priority patent/US7763871B2/en
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Priority to JP2010521496A priority Critical patent/JP5659015B2/en
Priority to EP08806915A priority patent/EP2191698B1/en
Priority to CN200880103732.6A priority patent/CN101785368B/en
Priority to KR1020107003754A priority patent/KR101528581B1/en
Publication of WO2009024860A2 publication Critical patent/WO2009024860A2/en
Publication of WO2009024860A3 publication Critical patent/WO2009024860A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)

Abstract

A radiation source comprising a chamber (1) and a supply of a plasma generating substance, the source having an interaction point (13) at which the plasma generating substance introduced into the chamber may interact with a laser beam (7) and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit (11) arranged to deliver a buffer gas into the chamber, the conduit having an outlet (12) which is adjacent to the interaction point.
PCT/IB2008/002201 2007-08-23 2008-08-20 Euv radiation source Ceased WO2009024860A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010521496A JP5659015B2 (en) 2007-08-23 2008-08-20 Radiation source
EP08806915A EP2191698B1 (en) 2007-08-23 2008-08-20 Radiation source
CN200880103732.6A CN101785368B (en) 2007-08-23 2008-08-20 Radiation source
KR1020107003754A KR101528581B1 (en) 2007-08-23 2008-08-20 Euv radiation source

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US93564307P 2007-08-23 2007-08-23
US60/935,643 2007-08-23
US12/078,663 US7763871B2 (en) 2008-04-02 2008-04-02 Radiation source
US12/078,663 2008-04-02

Publications (2)

Publication Number Publication Date
WO2009024860A2 WO2009024860A2 (en) 2009-02-26
WO2009024860A3 true WO2009024860A3 (en) 2009-04-16

Family

ID=40019398

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2008/002201 Ceased WO2009024860A2 (en) 2007-08-23 2008-08-20 Euv radiation source

Country Status (7)

Country Link
EP (1) EP2191698B1 (en)
JP (1) JP5659015B2 (en)
KR (1) KR101528581B1 (en)
CN (1) CN101785368B (en)
NL (2) NL1035846A1 (en)
TW (1) TWI448828B (en)
WO (1) WO2009024860A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2414898A1 (en) * 2009-04-02 2012-02-08 ETH Zurich Extreme ultraviolet light source with a debris-mitigated and cooled collector optics
NL2004706A (en) * 2009-07-22 2011-01-25 Asml Netherlands Bv RADIATION SOURCE.
US8598551B2 (en) * 2010-01-07 2013-12-03 Asml Netherlands B.V. EUV radiation source comprising a droplet accelerator and lithographic apparatus
WO2011131431A1 (en) * 2010-04-22 2011-10-27 Asml Netherlands B.V. Collector mirror assembly and method for producing extreme ultraviolet radiation
CN102621815B (en) * 2011-01-26 2016-12-21 Asml荷兰有限公司 Reflection optics and device making method for lithographic equipment
US8866111B2 (en) * 2011-08-05 2014-10-21 Asml Netherlands B.V. Radiation source and method for lithographic apparatus and device manufacturing method
NL2009426A (en) * 2011-10-07 2013-04-09 Asml Netherlands Bv Radiation source.
WO2014063878A2 (en) * 2012-10-26 2014-05-01 Asml Netherlands B.V. Lithographic apparatus
US10101664B2 (en) * 2014-11-01 2018-10-16 Kla-Tencor Corporation Apparatus and methods for optics protection from debris in plasma-based light source
US10034362B2 (en) * 2014-12-16 2018-07-24 Kla-Tencor Corporation Plasma-based light source
EP3291650B1 (en) 2016-09-02 2019-06-05 ETH Zürich Device and method for generating uv or x-ray radiation by means of a plasma
US20250149192A1 (en) * 2022-02-18 2025-05-08 Lawrence Livermore National Security, Llc Plasma and gas based optical components to control radiation damage

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001031678A1 (en) * 1999-10-27 2001-05-03 Jmar Research, Inc. Method and radiation generating system using microtargets
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US20060186356A1 (en) * 2004-09-09 2006-08-24 Yousuke Imai Extreme ultra violet light source device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09245992A (en) * 1996-03-12 1997-09-19 Nikon Corp X-ray generator
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
JP4189658B2 (en) * 2003-05-15 2008-12-03 ウシオ電機株式会社 Extreme ultraviolet light generator
DE102005015274B4 (en) * 2005-03-31 2012-02-23 Xtreme Technologies Gmbh Radiation source for generating short-wave radiation
US8298336B2 (en) * 2005-04-01 2012-10-30 Lam Research Corporation High strip rate downstream chamber
JP2006294606A (en) * 2005-04-12 2006-10-26 Xtreme Technologies Gmbh Plasma radiation source
JP2006329664A (en) * 2005-05-23 2006-12-07 Ushio Inc Extreme ultraviolet light generator
JP2007018931A (en) * 2005-07-08 2007-01-25 Canon Inc Light source apparatus, exposure apparatus, and device manufacturing method
JP2007134166A (en) * 2005-11-10 2007-05-31 Ushio Inc Extreme ultraviolet light source device
JP4904809B2 (en) * 2005-12-28 2012-03-28 ウシオ電機株式会社 Extreme ultraviolet light source device
JP2008041391A (en) * 2006-08-04 2008-02-21 Canon Inc Light source apparatus, exposure apparatus, and device manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001031678A1 (en) * 1999-10-27 2001-05-03 Jmar Research, Inc. Method and radiation generating system using microtargets
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US20060186356A1 (en) * 2004-09-09 2006-08-24 Yousuke Imai Extreme ultra violet light source device

Also Published As

Publication number Publication date
CN101785368B (en) 2013-01-02
NL1035863A1 (en) 2009-02-24
NL1035846A1 (en) 2009-02-24
KR20100049607A (en) 2010-05-12
JP2010537377A (en) 2010-12-02
KR101528581B1 (en) 2015-06-12
WO2009024860A2 (en) 2009-02-26
JP5659015B2 (en) 2015-01-28
TWI448828B (en) 2014-08-11
EP2191698A2 (en) 2010-06-02
CN101785368A (en) 2010-07-21
EP2191698B1 (en) 2012-10-03
TW200919112A (en) 2009-05-01

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