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WO2009001220A3 - Functionalization of microscopy probe tips - Google Patents

Functionalization of microscopy probe tips Download PDF

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Publication number
WO2009001220A3
WO2009001220A3 PCT/IB2008/002466 IB2008002466W WO2009001220A3 WO 2009001220 A3 WO2009001220 A3 WO 2009001220A3 IB 2008002466 W IB2008002466 W IB 2008002466W WO 2009001220 A3 WO2009001220 A3 WO 2009001220A3
Authority
WO
WIPO (PCT)
Prior art keywords
functionalization
probe tips
tips
microscopy probe
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2008/002466
Other languages
French (fr)
Other versions
WO2009001220A2 (en
WO2009001220A4 (en
WO2009001220A8 (en
Inventor
Ola Nilsen
Helmer Fjellvag
Havard J Haugen
Stale Petter Lyngstadaas
Jan Eirik Ellingsen
Sebastien Francis Lamolle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universitetet i Oslo
Original Assignee
Universitetet i Oslo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitetet i Oslo filed Critical Universitetet i Oslo
Publication of WO2009001220A2 publication Critical patent/WO2009001220A2/en
Publication of WO2009001220A8 publication Critical patent/WO2009001220A8/en
Publication of WO2009001220A3 publication Critical patent/WO2009001220A3/en
Publication of WO2009001220A4 publication Critical patent/WO2009001220A4/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/16—Probe manufacture
    • G01Q70/18—Functionalisation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/406—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G01Q60/42—Functionalisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/50—MFM [Magnetic Force Microscopy] or apparatus therefor, e.g. MFM probes
    • G01Q60/54—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G01Q60/56—Probes with magnetic coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Radiology & Medical Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

The invention comprises a method of functionalizing scanning probe microscope (SPM) tips to image and/or measure interactions between surfaces, including the surfaces of inorganic, organic-inorganic hybrid, organic, magnetic/conductive, hard coatings and biological materials. The invention further comprises the use of atomic layer deposition (ALD) to functionalize SPM tips.
PCT/IB2008/002466 2007-06-26 2008-06-25 Functionalization of microscopy probe tips Ceased WO2009001220A2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US92939907P 2007-06-26 2007-06-26
US60/929,399 2007-06-26
US93500807P 2007-07-23 2007-07-23
US60/935,008 2007-07-23
US3989008P 2008-03-27 2008-03-27
US61/039,890 2008-03-27

Publications (4)

Publication Number Publication Date
WO2009001220A2 WO2009001220A2 (en) 2008-12-31
WO2009001220A8 WO2009001220A8 (en) 2009-04-23
WO2009001220A3 true WO2009001220A3 (en) 2009-06-04
WO2009001220A4 WO2009001220A4 (en) 2009-08-06

Family

ID=40030284

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2008/002466 Ceased WO2009001220A2 (en) 2007-06-26 2008-06-25 Functionalization of microscopy probe tips

Country Status (1)

Country Link
WO (1) WO2009001220A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101975854B (en) * 2010-10-21 2013-07-17 中国科学院化学研究所 Single molecule force spectroscopy-based anti-cancer medicament identification method
KR101465725B1 (en) * 2013-01-23 2014-12-01 성균관대학교산학협력단 Calcium phosphate nano-aggregates using hydrophilic polymer modified orgarnic compound containing catechol group and preparation method therof
US9568496B1 (en) 2015-11-17 2017-02-14 International Business Machines Corporation Scanning probe sensor with a ferromagnetic fluid
WO2018129226A1 (en) * 2017-01-05 2018-07-12 Virginia Commonwealth University System, method, computer-accessible medium and apparatus for dna mapping
CN106701828B (en) * 2017-01-17 2020-05-12 电子科技大学 Method for increasing probability of penetration of nanoprobe through cell membrane
CN107104975A (en) * 2017-05-22 2017-08-29 郑州云海信息技术有限公司 Data poolization layer, system and its implementation of a kind of support isomery based on MDC
US12171886B2 (en) * 2018-12-21 2024-12-24 POSTECH Research and Business Development Foundation Mussel adhesive protein-based photothermal agent and photothermal-responsive adhesive nanoparticles
JP2023503380A (en) * 2019-12-02 2023-01-27 エンリティザ（シャンハイ）ファーマシューティカル カンパニー リミテッド Peptides and their use in treating inflammation
CN117281831B (en) * 2023-11-24 2024-01-30 四川大学华西医院 A ruthenium-based artificial antioxidant enzyme and its preparation method and application

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0511662A1 (en) * 1991-04-30 1992-11-04 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope, molecular processing method using the scanning probe microscope and DNA base arrangement detecting method
EP0540839A1 (en) * 1991-09-26 1993-05-12 Matsushita Electric Industrial Co., Ltd. Probe for atomic force microscope usable for scanning tunneling microscope
EP0727639A1 (en) * 1995-02-15 1996-08-21 BASF Aktiengesellschaft Method of chemically differentiated imaging by means of atomic force microscopy
DE19636582C1 (en) * 1996-09-09 1997-11-27 Forschungszentrum Juelich Gmbh Sensor for measuring ion concentrations
WO2006071126A1 (en) * 2004-12-28 2006-07-06 Universitetet I Oslo Thin films prepared with gas phase deposition technique
US20070164214A1 (en) * 2006-01-14 2007-07-19 Samsung Electronics Co., Ltd. Conductive carbon nanotube tip, probe having the conductive carbon nanotube tip, and method of manufacturing the conductive carbon nanotube tip

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0511662A1 (en) * 1991-04-30 1992-11-04 Matsushita Electric Industrial Co., Ltd. Scanning probe microscope, molecular processing method using the scanning probe microscope and DNA base arrangement detecting method
EP0540839A1 (en) * 1991-09-26 1993-05-12 Matsushita Electric Industrial Co., Ltd. Probe for atomic force microscope usable for scanning tunneling microscope
EP0727639A1 (en) * 1995-02-15 1996-08-21 BASF Aktiengesellschaft Method of chemically differentiated imaging by means of atomic force microscopy
DE19636582C1 (en) * 1996-09-09 1997-11-27 Forschungszentrum Juelich Gmbh Sensor for measuring ion concentrations
WO2006071126A1 (en) * 2004-12-28 2006-07-06 Universitetet I Oslo Thin films prepared with gas phase deposition technique
US20070164214A1 (en) * 2006-01-14 2007-07-19 Samsung Electronics Co., Ltd. Conductive carbon nanotube tip, probe having the conductive carbon nanotube tip, and method of manufacturing the conductive carbon nanotube tip

Also Published As

Publication number Publication date
WO2009001220A2 (en) 2008-12-31
WO2009001220A4 (en) 2009-08-06
WO2009001220A8 (en) 2009-04-23

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