WO2009059857A3 - Micromechanical component comprising a membrane lattice - Google Patents
Micromechanical component comprising a membrane lattice Download PDFInfo
- Publication number
- WO2009059857A3 WO2009059857A3 PCT/EP2008/063306 EP2008063306W WO2009059857A3 WO 2009059857 A3 WO2009059857 A3 WO 2009059857A3 EP 2008063306 W EP2008063306 W EP 2008063306W WO 2009059857 A3 WO2009059857 A3 WO 2009059857A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- openings
- micromechanical component
- cavity
- stabilisation element
- distances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0067—Mechanical properties
- B81B3/007—For controlling stiffness, e.g. ribs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/00468—Releasing structures
- B81C1/00476—Releasing structures removing a sacrificial layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0315—Cavities
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Pressure Sensors (AREA)
- Electron Beam Exposure (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The invention relates to a micromechanical component comprising a substrate, a stabilisation element provided with openings, and a cavity located between the stabilisation element and the substrate. According to the invention, the minimum depth of the cavity can be deduced from the distribution of the openings in the stabilisation element. Essentially, the distance between the openings is to be taken into account for the determination of the required depth of the cavity. These distances are advantageously obtained by determining the distances between the centroids of the individual openings.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007053280.8 | 2007-11-08 | ||
| DE200710053280 DE102007053280A1 (en) | 2007-11-08 | 2007-11-08 | Micromechanical component with a membrane grid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2009059857A2 WO2009059857A2 (en) | 2009-05-14 |
| WO2009059857A3 true WO2009059857A3 (en) | 2009-07-16 |
Family
ID=40530521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2008/063306 Ceased WO2009059857A2 (en) | 2007-11-08 | 2008-10-06 | Micromechanical component comprising a membrane lattice |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102007053280A1 (en) |
| WO (1) | WO2009059857A2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020215985A1 (en) | 2020-12-16 | 2022-06-23 | Robert Bosch Gesellschaft mit beschränkter Haftung | Micromechanical component for a capacitive pressure sensor device, capacitive pressure sensor device and a manufacturing method for a capacitive pressure sensor device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020094435A1 (en) * | 2000-06-21 | 2002-07-18 | Hans Artmann | Micromechanical component, in particular a sensor element, having a stabilized membrane and a method of producing such a component |
| US20040069626A1 (en) * | 2000-11-23 | 2004-04-15 | Hans Artmann | Flow sensor |
| FR2863603A1 (en) * | 2003-12-16 | 2005-06-17 | Bosch Gmbh Robert | Production process for a semiconductor element especially a micromechanical element such as a sensor forms a membrane over a cavity on a structured layer by epitaxy |
| US20060057816A1 (en) * | 2004-09-08 | 2006-03-16 | Hubert Benzel | Sensor element with trenched cavity |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10032579B4 (en) | 2000-07-05 | 2020-07-02 | Robert Bosch Gmbh | Method for producing a semiconductor component and a semiconductor component produced by the method |
-
2007
- 2007-11-08 DE DE200710053280 patent/DE102007053280A1/en not_active Withdrawn
-
2008
- 2008-10-06 WO PCT/EP2008/063306 patent/WO2009059857A2/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020094435A1 (en) * | 2000-06-21 | 2002-07-18 | Hans Artmann | Micromechanical component, in particular a sensor element, having a stabilized membrane and a method of producing such a component |
| US20040069626A1 (en) * | 2000-11-23 | 2004-04-15 | Hans Artmann | Flow sensor |
| FR2863603A1 (en) * | 2003-12-16 | 2005-06-17 | Bosch Gmbh Robert | Production process for a semiconductor element especially a micromechanical element such as a sensor forms a membrane over a cavity on a structured layer by epitaxy |
| US20060057816A1 (en) * | 2004-09-08 | 2006-03-16 | Hubert Benzel | Sensor element with trenched cavity |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009059857A2 (en) | 2009-05-14 |
| DE102007053280A1 (en) | 2009-05-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08805058 Country of ref document: EP Kind code of ref document: A2 |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 08805058 Country of ref document: EP Kind code of ref document: A2 |