[go: up one dir, main page]

WO2009054102A1 - 欠陥分類方法及びその装置 - Google Patents

欠陥分類方法及びその装置 Download PDF

Info

Publication number
WO2009054102A1
WO2009054102A1 PCT/JP2008/002871 JP2008002871W WO2009054102A1 WO 2009054102 A1 WO2009054102 A1 WO 2009054102A1 JP 2008002871 W JP2008002871 W JP 2008002871W WO 2009054102 A1 WO2009054102 A1 WO 2009054102A1
Authority
WO
WIPO (PCT)
Prior art keywords
classification
defect
defect classification
correct answer
condition setting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/002871
Other languages
English (en)
French (fr)
Inventor
Hisae Shibuya
Shunji Maeda
Akira Hamamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of WO2009054102A1 publication Critical patent/WO2009054102A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Signal Processing (AREA)
  • Health & Medical Sciences (AREA)
  • Quality & Reliability (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Analysis (AREA)

Abstract

　外観検査の欠陥分類において、重要欠陥のピュリティまたはアキュラシーまたはその両方が目標値以上になるように調整するなどのニーズがあるが、教示型の欠陥分類は平均的に分類正解率が高くなるよう条件設定されるため、そのようなニーズに応えられないという問題があった。 　特徴量抽出部、欠陥分類部、分類条件設定部を含み、分類条件設定部は、欠陥の特徴量と正解のクラスを対応づけて教示する機能と分類の優先順位を指定する機能を有し、優先順位の高い分類の正解率が高くなるよう条件設定を行う。    
PCT/JP2008/002871 2007-10-22 2008-10-10 欠陥分類方法及びその装置 Ceased WO2009054102A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007273894A JP5022174B2 (ja) 2007-10-22 2007-10-22 欠陥分類方法及びその装置
JP2007-273894 2007-10-22

Publications (1)

Publication Number Publication Date
WO2009054102A1 true WO2009054102A1 (ja) 2009-04-30

Family

ID=40579212

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/002871 Ceased WO2009054102A1 (ja) 2007-10-22 2008-10-10 欠陥分類方法及びその装置

Country Status (2)

Country Link
JP (1) JP5022174B2 (ja)
WO (1) WO2009054102A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011036846A1 (ja) * 2009-09-28 2011-03-31 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
US8892494B2 (en) 2009-07-23 2014-11-18 Hitachi High-Technologies Corporation Device for classifying defects and method for adjusting classification
CN112129869A (zh) * 2020-09-23 2020-12-25 清华大学深圳国际研究生院 基于数据驱动的现场质谱仪稳定输出控制系统及方法
CN113168687A (zh) * 2019-01-22 2021-07-23 株式会社日立高新技术 图像评价装置和方法
US11282229B2 (en) 2018-04-20 2022-03-22 Fanuc Corporation Inspection apparatus
CN116310554A (zh) * 2023-03-14 2023-06-23 凌云光技术股份有限公司 产品分类方法和装置、计算机可读存储介质及检测设备
CN116848551A (zh) * 2021-03-12 2023-10-03 欧姆龙株式会社 辅助装置以及方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5452392B2 (ja) * 2009-12-16 2014-03-26 株式会社日立ハイテクノロジーズ 欠陥観察方法及び欠陥観察装置
US9020237B2 (en) 2010-06-07 2015-04-28 Hitachi High-Technologies Corporation Method for optimizing observed image classification criterion and image classification apparatus
US8315453B2 (en) * 2010-07-27 2012-11-20 Applied Materials Israel, Ltd. Defect classification with optimized purity
WO2012064522A1 (en) * 2010-11-12 2012-05-18 3M Innovative Properties Company Rapid processing and detection of non-uniformities in web-based materials
US10043264B2 (en) 2012-04-19 2018-08-07 Applied Materials Israel Ltd. Integration of automatic and manual defect classification
US9715723B2 (en) 2012-04-19 2017-07-25 Applied Materials Israel Ltd Optimization of unknown defect rejection for automatic defect classification
US10114368B2 (en) 2013-07-22 2018-10-30 Applied Materials Israel Ltd. Closed-loop automatic defect inspection and classification
US9489599B2 (en) * 2013-11-03 2016-11-08 Kla-Tencor Corp. Decision tree construction for automatic classification of defects on semiconductor wafers
JP6531036B2 (ja) * 2015-12-08 2019-06-12 株式会社Ｓｃｒｅｅｎホールディングス 教師データ作成支援方法、画像分類方法、教師データ作成支援装置および画像分類装置
JP7186539B2 (ja) * 2018-08-03 2022-12-09 Ａｕｔｏｍａｇｉ株式会社 錆検出プログラム、錆検出システム及び錆検出方法
JP2022553782A (ja) * 2019-10-28 2022-12-26 スリーエム イノベイティブ プロパティズ カンパニー 自動ビークル修復システム
JP7349066B2 (ja) * 2019-12-17 2023-09-22 日本電気硝子株式会社 欠陥分類方法、欠陥分類装置及びガラス物品の製造方法
US11293970B2 (en) * 2020-01-12 2022-04-05 Kla Corporation Advanced in-line part average testing
CN118265904A (zh) * 2021-11-25 2024-06-28 株式会社日本显示器 显示装置的检查方法以及信息处理装置
JP2023107693A (ja) 2022-01-24 2023-08-03 オムロン株式会社 分類条件設定支援装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005274285A (ja) * 2004-03-24 2005-10-06 Olympus Corp 欠陥分類辞書教示装置
JP2007067130A (ja) * 2005-08-31 2007-03-15 Hitachi High-Technologies Corp 回路パターン検査方法及びその装置
JP2008082821A (ja) * 2006-09-27 2008-04-10 Hitachi High-Technologies Corp 欠陥分類方法及びその装置並びに欠陥検査装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005274285A (ja) * 2004-03-24 2005-10-06 Olympus Corp 欠陥分類辞書教示装置
JP2007067130A (ja) * 2005-08-31 2007-03-15 Hitachi High-Technologies Corp 回路パターン検査方法及びその装置
JP2008082821A (ja) * 2006-09-27 2008-04-10 Hitachi High-Technologies Corp 欠陥分類方法及びその装置並びに欠陥検査装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8892494B2 (en) 2009-07-23 2014-11-18 Hitachi High-Technologies Corporation Device for classifying defects and method for adjusting classification
WO2011036846A1 (ja) * 2009-09-28 2011-03-31 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
JP2011089976A (ja) * 2009-09-28 2011-05-06 Hitachi High-Technologies Corp 欠陥検査装置および欠陥検査方法
US9075026B2 (en) 2009-09-28 2015-07-07 Hitachi High-Technologies Corporation Defect inspection device and defect inspection method
US11282229B2 (en) 2018-04-20 2022-03-22 Fanuc Corporation Inspection apparatus
CN113168687A (zh) * 2019-01-22 2021-07-23 株式会社日立高新技术 图像评价装置和方法
CN112129869A (zh) * 2020-09-23 2020-12-25 清华大学深圳国际研究生院 基于数据驱动的现场质谱仪稳定输出控制系统及方法
CN112129869B (zh) * 2020-09-23 2022-11-18 清华大学深圳国际研究生院 基于数据驱动的现场质谱仪稳定输出控制系统及方法
CN116848551A (zh) * 2021-03-12 2023-10-03 欧姆龙株式会社 辅助装置以及方法
CN116310554A (zh) * 2023-03-14 2023-06-23 凌云光技术股份有限公司 产品分类方法和装置、计算机可读存储介质及检测设备

Also Published As

Publication number Publication date
JP5022174B2 (ja) 2012-09-12
JP2009103508A (ja) 2009-05-14

Similar Documents

Publication Publication Date Title
WO2009054102A1 (ja) 欠陥分類方法及びその装置
MX2010005679A (es) Metodo y aparato para extension de ancho de banda de señal de audio.
WO2008144729A3 (en) Electronic game utilizing photographs
WO2010086194A3 (en) Apparatus, method and computer program for manipulating an audio signal comprising a transient event
WO2017151916A3 (en) Situationally-aware haptic alerts
EP1708139A3 (en) Calibration method and apparatus
WO2014160542A3 (en) Volume leveler controller and controlling method
WO2013049729A3 (en) Optical system and method to mimic zero-border display
SG153741A1 (en) Image distortion correction
WO2006121687A3 (en) Reprice-to-block order
WO2012163370A8 (en) Image processing method and device
EP4462428A3 (en) Apparatus, method and computer program for providing adjusted parameters
WO2008120563A1 (ja) 色処理装置、色処理方法及び記録媒体
WO2009148260A3 (ko) 광학필름 및 이의 제조방법
EP2372646A3 (en) Image processing device, method and program
WO2008040641A3 (de) Verfahren und vorrichtung zur fehlerverwaltung
WO2018034783A3 (en) Retinal see through display power level determination method and apparatus
MX2007003570A (es) Mapas con propiedad de objetivo para sistemas de vigilancia.
WO2008128097A3 (en) Programmable graphics processing element
EP4325478A3 (en) Display system and image display method
WO2007024898A3 (en) Displays with integrated photovoltaic cells
TW200951540A (en) Optical display device manufacturing system and optical display device manufacturing method
WO2008084544A1 (ja) 画像補正プログラム、画像補正方法、画像補正装置
WO2012040700A3 (en) A brightness enhancement method, system and apparatus for low power architectures
EP2016563B8 (en) Method for improving the performance in processing an interprocess digital mockup

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08842318

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08842318

Country of ref document: EP

Kind code of ref document: A1