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WO2009051199A1 - 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 - Google Patents

光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 Download PDF

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Publication number
WO2009051199A1
WO2009051199A1 PCT/JP2008/068792 JP2008068792W WO2009051199A1 WO 2009051199 A1 WO2009051199 A1 WO 2009051199A1 JP 2008068792 W JP2008068792 W JP 2008068792W WO 2009051199 A1 WO2009051199 A1 WO 2009051199A1
Authority
WO
WIPO (PCT)
Prior art keywords
lens barrel
optical member
device manufacturing
section
member cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/068792
Other languages
English (en)
French (fr)
Inventor
Jin Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2009538148A priority Critical patent/JPWO2009051199A1/ja
Publication of WO2009051199A1 publication Critical patent/WO2009051199A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

　ミラー（４１）のような光学部材を冷却する冷却装置は、冷却部材（５１）と、ミラー（４１）の裏面（４１Ｂ）に冷却部材（５１）の接触面（５１Ａ）を密着させる係合機構（５２）とを含む。裏面（４１Ｂ）と接触面（５１Ａ）は平坦化されている。ミラー（４１）の裏面（４１Ｂ）には、溝部（４６）と張出部（４８）とを有する係止部（４４）が形成されている。係合機構（５２）の軸部（５７）が係止部（４４）の張出部（４８）と係合した状態で、係合機構（５２）の係合部材（６０）は、ばね（５８）により冷却部材（５１）側に付勢される。
PCT/JP2008/068792 2007-10-18 2008-10-16 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 Ceased WO2009051199A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009538148A JPWO2009051199A1 (ja) 2007-10-18 2008-10-16 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007271328 2007-10-18
JP2007-271328 2007-10-18

Publications (1)

Publication Number Publication Date
WO2009051199A1 true WO2009051199A1 (ja) 2009-04-23

Family

ID=40563167

Family Applications (1)

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PCT/JP2008/068792 Ceased WO2009051199A1 (ja) 2007-10-18 2008-10-16 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法

Country Status (4)

Country Link
US (1) US20090103063A1 (ja)
JP (1) JPWO2009051199A1 (ja)
TW (1) TW200931194A (ja)
WO (1) WO2009051199A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015151152A1 (ja) * 2014-03-31 2015-10-08 ギガフォトン株式会社 ミラー装置
CN109812994A (zh) * 2019-02-14 2019-05-28 浙江中控太阳能技术有限公司 一种用于定日镜的反射镜支撑组件及定日镜
JP2021173977A (ja) * 2020-04-30 2021-11-01 凸版印刷株式会社 反射型フォトマスクブランクス及び反射型フォトマスク
JP2024510784A (ja) * 2021-03-25 2024-03-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および照明均一性補正方法
JP2024545536A (ja) * 2022-05-13 2024-12-09 雲南中宣液態金属科技有限公司 ガリウム系液体金属と組み合わせて使用される金属構造体及びその製造方法と用途

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2002907A1 (nl) * 2008-06-10 2009-12-11 Asml Netherlands Bv Method and system for thermally conditioning an optical element.
DE102011005778A1 (de) * 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
JP5949777B2 (ja) * 2011-10-28 2016-07-13 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランクの製造方法
DE102012201221B4 (de) 2012-01-27 2022-03-03 Carl Zeiss Smt Gmbh Optische Spiegel-Baugruppe zur Strahlführung sowie Spiegel-Temperiervorrichtung mit einer derartigen Spiegel-Baugruppe
US8969836B1 (en) * 2013-11-26 2015-03-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for electron beam lithography
DE102014219770A1 (de) * 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
DE102020206697B4 (de) * 2020-05-28 2025-05-22 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Temperieren von Elementen in mikrolithographischen Projektionsbelichtungsanlagen

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05506517A (ja) * 1990-05-28 1993-09-22 マシネンファブリック　カール　エイチ．アーノルド　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング　ウント　カンパニー　ケージー レーザ材料加工装置用の偏向鏡ハウジング及び光線分離フィルター
JP2000036449A (ja) * 1998-07-17 2000-02-02 Nikon Corp 露光装置
JP2004039851A (ja) * 2002-07-03 2004-02-05 Nikon Corp ミラー冷却装置及び露光装置
JP2004246030A (ja) * 2003-02-13 2004-09-02 Canon Inc 光学素子、光学素子保持装置、温度調節装置、露光装置及びデバイスの製造方法
JP2006317913A (ja) * 2005-04-12 2006-11-24 Xtreme Technologies Gmbh プラズマに基づく短波長放射線源用の集光鏡

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4783034A (en) * 1985-08-13 1988-11-08 General Datacomm, Inc. Slide lock mechanism
WO1999026278A1 (en) * 1997-11-14 1999-05-27 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
US20040051984A1 (en) * 2002-06-25 2004-03-18 Nikon Corporation Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments
JP4018564B2 (ja) * 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05506517A (ja) * 1990-05-28 1993-09-22 マシネンファブリック　カール　エイチ．アーノルド　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング　ウント　カンパニー　ケージー レーザ材料加工装置用の偏向鏡ハウジング及び光線分離フィルター
JP2000036449A (ja) * 1998-07-17 2000-02-02 Nikon Corp 露光装置
JP2004039851A (ja) * 2002-07-03 2004-02-05 Nikon Corp ミラー冷却装置及び露光装置
JP2004246030A (ja) * 2003-02-13 2004-09-02 Canon Inc 光学素子、光学素子保持装置、温度調節装置、露光装置及びデバイスの製造方法
JP2006317913A (ja) * 2005-04-12 2006-11-24 Xtreme Technologies Gmbh プラズマに基づく短波長放射線源用の集光鏡

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015151152A1 (ja) * 2014-03-31 2015-10-08 ギガフォトン株式会社 ミラー装置
JPWO2015151152A1 (ja) * 2014-03-31 2017-04-13 ギガフォトン株式会社 ミラー装置
US9882334B2 (en) 2014-03-31 2018-01-30 Gigaphoton Inc. Mirror device
CN109812994A (zh) * 2019-02-14 2019-05-28 浙江中控太阳能技术有限公司 一种用于定日镜的反射镜支撑组件及定日镜
JP2021173977A (ja) * 2020-04-30 2021-11-01 凸版印刷株式会社 反射型フォトマスクブランクス及び反射型フォトマスク
JP2024510784A (ja) * 2021-03-25 2024-03-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および照明均一性補正方法
JP2024545536A (ja) * 2022-05-13 2024-12-09 雲南中宣液態金属科技有限公司 ガリウム系液体金属と組み合わせて使用される金属構造体及びその製造方法と用途

Also Published As

Publication number Publication date
US20090103063A1 (en) 2009-04-23
TW200931194A (en) 2009-07-16
JPWO2009051199A1 (ja) 2011-03-03

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