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WO2008136139A1 - Procédé de fabrication de poudre d'oxyde métallique sphérique - Google Patents

Procédé de fabrication de poudre d'oxyde métallique sphérique Download PDF

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Publication number
WO2008136139A1
WO2008136139A1 PCT/JP2007/065937 JP2007065937W WO2008136139A1 WO 2008136139 A1 WO2008136139 A1 WO 2008136139A1 JP 2007065937 W JP2007065937 W JP 2007065937W WO 2008136139 A1 WO2008136139 A1 WO 2008136139A1
Authority
WO
WIPO (PCT)
Prior art keywords
powder
metal oxide
production
spherical
powders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/065937
Other languages
English (en)
Japanese (ja)
Inventor
Toshiaki Ishimaru
Wataru Suehiro
Hideaki Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Publication of WO2008136139A1 publication Critical patent/WO2008136139A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C1/00—Magnetic separation
    • B03C1/02—Magnetic separation acting directly on the substance being separated
    • B03C1/26—Magnetic separation acting directly on the substance being separated with free falling material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C1/00—Magnetic separation
    • B03C1/02—Magnetic separation acting directly on the substance being separated
    • B03C1/025—High gradient magnetic separators
    • B03C1/031—Component parts; Auxiliary operations
    • B03C1/033—Component parts; Auxiliary operations characterised by the magnetic circuit
    • B03C1/0335—Component parts; Auxiliary operations characterised by the magnetic circuit using coils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C1/00—Magnetic separation
    • B03C1/02—Magnetic separation acting directly on the substance being separated
    • B03C1/30—Combinations with other devices, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Glanulating (AREA)
  • Silicon Compounds (AREA)

Abstract

La présente invention concerne un procédé de fabrication de poudre d'oxyde métallique sphérique comprenant l'étape consistant à injecter au moins une matière première pulvérulente choisie dans le groupe des poudres métalliques, des poudres d'oxyde métallique et des poudres d'hydroxyde métallique dans une flamme afin d'obtenir une poudre sphérique et à recueillir ladite poudre sphérique dans un collecteur, caractérisé en ce qu'il comprend une étape consistant à faire passer une poudre devant être traitée et contenant au moins soit la matière première pulvérulente soit la poudre sphérique recueillie à travers un dispositif d'élimination des impuretés afin de limiter la quantité d'impuretés présentes dans la poudre devant être traitée à 450 impuretés/50 g ou moins.
PCT/JP2007/065937 2007-04-26 2007-08-16 Procédé de fabrication de poudre d'oxyde métallique sphérique Ceased WO2008136139A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-116739 2007-04-26
JP2007116739A JP2010159168A (ja) 2007-04-26 2007-04-26 球状金属酸化物粉末の製造方法

Publications (1)

Publication Number Publication Date
WO2008136139A1 true WO2008136139A1 (fr) 2008-11-13

Family

ID=39943261

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/065937 Ceased WO2008136139A1 (fr) 2007-04-26 2007-08-16 Procédé de fabrication de poudre d'oxyde métallique sphérique

Country Status (2)

Country Link
JP (1) JP2010159168A (fr)
WO (1) WO2008136139A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015086120A (ja) * 2013-10-31 2015-05-07 株式会社トクヤマ 球状シリカ微粉末とその製造方法
JP2019182694A (ja) * 2018-04-05 2019-10-24 三菱ケミカル株式会社 合成シリカガラス粉

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787591B2 (ja) * 2011-04-20 2015-09-30 原子燃料工業株式会社 異物除去装置及び異物除去方法並びに酸化ウランペレット及び燃料集合体の製造方法
JP7542433B2 (ja) * 2020-12-25 2024-08-30 モメンティブ・テクノロジーズ・山形株式会社 石英ガラス原料粉の磁性体粉除去装置、及びこの磁性体粉除去装置を用いた磁性体粉除去方法
JP7663678B2 (ja) 2021-03-31 2025-04-16 デンカ株式会社 金属酸化物粉末及びその製造方法
JP2023036470A (ja) * 2021-09-02 2023-03-14 デンカ株式会社 無機酸化物粒子の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1147633A (ja) * 1997-08-07 1999-02-23 Toshiba Chem Corp 金属除去装置
JP2000317342A (ja) * 1999-04-28 2000-11-21 Nippon Magnetics Kk 磁性物除去装置
JP2002179409A (ja) * 2000-12-12 2002-06-26 Denki Kagaku Kogyo Kk 微細球状無機質粉末の製造方法
JP2005187302A (ja) * 2003-12-26 2005-07-14 Mitsubishi Rayon Co Ltd 高純度非磁性金属酸化物粉末及びその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1147633A (ja) * 1997-08-07 1999-02-23 Toshiba Chem Corp 金属除去装置
JP2000317342A (ja) * 1999-04-28 2000-11-21 Nippon Magnetics Kk 磁性物除去装置
JP2002179409A (ja) * 2000-12-12 2002-06-26 Denki Kagaku Kogyo Kk 微細球状無機質粉末の製造方法
JP2005187302A (ja) * 2003-12-26 2005-07-14 Mitsubishi Rayon Co Ltd 高純度非磁性金属酸化物粉末及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015086120A (ja) * 2013-10-31 2015-05-07 株式会社トクヤマ 球状シリカ微粉末とその製造方法
JP2019182694A (ja) * 2018-04-05 2019-10-24 三菱ケミカル株式会社 合成シリカガラス粉

Also Published As

Publication number Publication date
JP2010159168A (ja) 2010-07-22

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