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WO2008128122A2 - Formation de couches d'absorbeurs photovoltaïques sur des substrats en forme de feuille - Google Patents

Formation de couches d'absorbeurs photovoltaïques sur des substrats en forme de feuille Download PDF

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Publication number
WO2008128122A2
WO2008128122A2 PCT/US2008/060141 US2008060141W WO2008128122A2 WO 2008128122 A2 WO2008128122 A2 WO 2008128122A2 US 2008060141 W US2008060141 W US 2008060141W WO 2008128122 A2 WO2008128122 A2 WO 2008128122A2
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WIPO (PCT)
Prior art keywords
substrate
layer
absorber layer
elements
aluminum
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PCT/US2008/060141
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WO2008128122A3 (fr
Inventor
Craig Leidholm
Brent Bollman
Yann Roussillon
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Individual
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Individual
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Priority claimed from US12/060,221 external-priority patent/US20090032108A1/en
Application filed by Individual filed Critical Individual
Priority to EP08745698A priority Critical patent/EP2179449A2/fr
Publication of WO2008128122A2 publication Critical patent/WO2008128122A2/fr
Publication of WO2008128122A3 publication Critical patent/WO2008128122A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells

Definitions

  • the present invention relates to fabrication of photovoltaic devices and more specifically to processing and annealing of absorber layers for photovoltaic devices.
  • Efficient photovoltaic devices such as solar cells have been fabricated using absorber layers made with alloys containing elements of group IB, IIIA and VIA, e.g., alloys of copper with indium and/or gallium or aluminum and selenium and/or sulfur.
  • Such absorber layers are often referred to as CIGS layers and the resulting devices are often referred to as CIGS solar cells.
  • the CIGS absorber layer may be deposited on a substrate. It would be desirable to fabricate such an absorber layer on an aluminum foil substrate because Aluminum foil is relatively inexpensive, lightweight, and flexible. Unfortunately, current techniques for depositing CIGS absorber layers are incompatible with the use of aluminum foil as a substrate.
  • Typical deposition techniques include evaporation, sputtering, chemical vapor deposition, and the like. These deposition processes are typically carried out at high temperatures and for extended times. Both factors can result in damage to the substrate upon which deposition is occurring. Such damage can arise directly from changes in the substrate material upon exposure to heat, and/or from undesirable chemical reactions driven by the heat of the deposition process. Thus very robust substrate materials are typically required for fabrication of CIGS solar cells. These limitations have excluded the use of aluminum and aluminum- foil based foils.
  • An alternative deposition approach is the solution-based printing of the CIGS precursor materials onto a substrate. Examples of solution-based printing techniques are described, e.g., in Published PCT Application WO 2002/084708 and commonly-assigned U.S.
  • Patent Application 10/782,017 both of which are incorporated herein by reference.
  • Advantages to this deposition approach include both the relatively lower deposition temperature and the rapidity of the deposition process. Both advantages serve to minimize the potential for heat- induced damage of the substrate on which the deposit is being formed.
  • solution deposition is a relatively low temperature step in fabrication of CIGS solar cells, it is not the only step.
  • a key step in the fabrication of CIGS solar cells is the selenization and annealing of the CIGS absorber layer.
  • Selenization introduces selenium into the bulk CIG or CI absorber layer, where the element incorporates into the film, while the annealing provides the absorber layer with the proper crystalline structure.
  • selenization and annealing has been performed by heating the substrate in the presence of H 2 Se or Se vapor and keeping this nascent absorber layer at high temperatures for long periods of time.
  • Al can migrate into the CIGS absorber layer, disrupting the function of the semiconductor.
  • the impurities that are typically present in the Al foil e.g. Si, Fe, Mn, Ti, Zn, and V
  • the impurities that are typically present in the Al foil can travel along with mobile Al that diffuses into the solar cell upon extended heating, which can disrupt both the electronic and optoelectronic function of the cell.
  • CIGS solar cells cannot be effectively fabricated on aluminum substrates (e.g. flexible foils comprised of Al and/or Al-based alloys) and instead must be fabricated on heavier substrates made of more robust (and more expensive) materials, such as stainless steel, titanium, or molybdenum foils, glass substrates, or metal- or metal-oxide coated glass.
  • aluminum substrates e.g. flexible foils comprised of Al and/or Al-based alloys
  • more robust (and more expensive) materials such as stainless steel, titanium, or molybdenum foils, glass substrates, or metal- or metal-oxide coated glass.
  • current practice does not permit aluminum foil to be used as a substrate.
  • FIG. 1 is a cross-sectional schematic diagram illustrating fabrication of an absorber layer according to an embodiment of the present invention.
  • Embodiments of the present invention allow fabrication of CIGS absorber layers on aluminum foil substrates.
  • the invention lends itself to several variants (which remain, however, optional) used as alternatives or in combination.
  • a nascent absorber layer containing elements of group IB and IDA formed on an aluminum substrate by solution deposition may be annealed by rapid heating from an ambient temperature to a plateau temperature range of between about 200 0 C and about 600 0 C. The temperature is maintained in the plateau range for between about 2 minutes and about 15 minutes, and subsequently reduced.
  • the annealing temperature could be modulated to oscillate within a temperature range without being maintained at a particular plateau temperature.
  • FIG. 1 depicts a partially fabricated photovoltaic device 100, and a rapid heating unit 110 the device generally includes a substrate 102, an optional base electrode 104, and a nascent absorber layer 106.
  • the substrate 102 may be made of a metal such as aluminum.
  • metals such as, but not limited to, stainless steel, molybdenum, titanium, copper, metallized plastic films, or combinations of the foregoing may be used as the substrate 102.
  • Alternative substrates include but are not limited to ceramics, glasses, and the like. Any of these substrates may be in the form of foils, sheets, rolls, the like, or combinations thereof.
  • An aluminum foil substrate 102 may be approximately 5 microns to one hundred or more microns thick and of any suitable width and length.
  • the aluminum foil substrate 102 may be made of aluminum or an aluminum-based alloy.
  • the aluminum foil substrate 102 may be made by metallizing a polymer foil substrate, where the polymer is selected from the group of polyesters, polyethylene naphtalates, polyetherimides, polyethersulfones, polyetheretherketones, polyimides, and/or combinations of the above.
  • the substrate 102 may be in the form of a long sheet of aluminum foil suitable for processing in a roll-to-roll system.
  • the base electrode 104 is made of an electrically conducive material compatible with processing of the nascent absorber layer 106.
  • the base electrode 104 may be a layer of molybdenum, e.g., about 0.1 to 5 microns thick, and optionally from about 0.1 to 1.0 microns thick.
  • the base electrode 104 may be substantially thinner such as in the range of about 5nm to about lOOnm, optionally IOnm to 50nm. These thinner electrodes 104 may be used with thicker layers of barrier layers 103.
  • the base electrode layer may be deposited by sputtering or evaporation or, alternatively, by chemical vapor deposition (CVD), atomic layer deposition (ALD), sol- gel coating, electroplating and the like.
  • CVD chemical vapor deposition
  • ALD atomic layer deposition
  • sol- gel coating electroplating and the like.
  • Aluminum and molybdenum can and often do inter-diffuse into one another, with deleterious electronic and/or optoelectronic effects on the device 100.
  • an intermediate, interfacial layer 103 may be incorporated between the aluminum foil substrate 102 and molybdenum base electrode 104.
  • the interfacial layer may be composed of any of a variety of materials, including but not limited to chromium, vanadium, tungsten, and glass, or compounds such as nitrides (including but not limited to titanium nitride, tantalum nitride, tungsten nitride, hafnium nitride, niobium nitride, zirconium nitride, vanadium nitride, silicon nitride, and/or molybdenum nitride), oxynitrides (including but not limited to oxynitrides of Ti, Ta, V, W, Si, Zr, Nb, Hf, or Mo), oxides (including but not limited to oxides of Ti, Ta, V, W, Si, Zr, Nb, Hf, or Mo), and/or carbides (including but not limited to carbides of Ti, Ta, V, W, Si, Zr, Nb, Hf, or Mo).
  • the materials selected from the aforementioned may be those that are electrically conductive diffusion barriers.
  • the thickness of this layer can range from 10 nm to 50 nm or from 10 nm to 30 nm.
  • the thickness may be in the range of about 50 nm to about 1000 nm.
  • the thickness may be in the range of about 100 nm to about 750 nm.
  • the thickness may be in the range of about 100 nm to about 500 nm.
  • the thickness may be in the range of about 110 nm to about 300 nm.
  • the thickness of the layer 103 is at least 100 nm or more.
  • the thickness of the layer 103 is at least 150 nm or more.
  • the thickness of the layer 103 is at least 200 nm or more.
  • Aluminum and molybdenum can and often do inter-diffuse into one another, with deleterious electronic and/or optoelectronic effects on the device 100.
  • an intermediate, interfacial layer 103 may be incorporated between the aluminum foil substrate 102 and molybdenum base electrode 104.
  • the layer 103 may also be useful in prevent diffusion when other materials are used for substrate 102, besides aluminum.
  • the interfacial layer may be composed of any of a variety of materials, including but not limited to chromium, vanadium, tungsten, and glass, or compounds such as nitrides (including but not limited to titanium nitride, tantalum nitride, tungsten nitride, hafnium nitride, niobium nitride, zirconium nitride vanadium nitride, silicon nitride, or molybdenum nitride), oxynitrides (including but not limited to oxynitrides of Ti, Ta, V, W, Si, Zr, Nb, Hf, or Mo), oxides, and/or carbides.
  • nitrides including but not limited to titanium nitride, tantalum nitride, tungsten nitride, hafnium nitride, niobium nitride, zirconium nitride
  • the material may be selected to be an electrically conductive material.
  • the materials selected from the aforementioned may be those that are electrically conductive diffusion barriers.
  • the thickness of this layer can range from 10 nm to 50 nm or from 10 nm to 30 nm.
  • the thickness may be in the range of about 50 nm to about 1000 nm.
  • the thickness may be in the range of about 100 nm to about 750 nm.
  • the thickness may be in the range of about 100 nm to about 500 nm.
  • the thickness may be in the range of about 110 nm to about 300 nm.
  • the thickness of the layer 103 is at least 100 nm or more.
  • the thickness of the layer 103 is at least 150 nm or more. In one embodiment, the thickness of the layer 103 is at least 200 nm or more.
  • Some embodiments may use two or more layers 103 of different materials, such as but not limited to two nitrides, a nitride/ a carbide, or other combinations of the foregoing materials, wherein one layer may be selected to improve backside reflectivity.
  • some embodiments may include another layer such as but not limited to an aluminum layer above the layer 103 and below the base electrode layer 104.
  • this layer may be comprised of one or more of the following: Cr, Ti, Ta, V, W, Si, Zr, Nb, Hf, and/or Mo.
  • This layer may be thicker than the layer 103. Optionally, it may be the same thickness or thinner than the layer 103.
  • the thickness of this layer above the layer 103 and below the base electrode layer 104 can range from 10 nm to 50 nm or from 10 nm to 30 nm.
  • the thickness may be in the range of about 50 nm to about 1000 nm.
  • the thickness may be in the range of about 100 nm to about 750 nm.
  • the thickness may be in the range of about 100 nm to about 500 nm.
  • the thickness may be in the range of about 110 nm to about 300 nm.
  • some embodiments may include another layer such as but not limited to an aluminum layer above the substrate 102 and below the barrier layer 103.
  • this layer may be comprised of one or more of the following: Cr, Ti, Ta, V, W, Si, Zr, Nb, Hf, and/or Mo.
  • This layer may be thicker than the layer 103.
  • it may be the same thickness or thinner than the layer 103.
  • the thickness of this layer above the substrate 102 and below the barrier layer 103 can range from 10 nm to 150 nm, 50 to lOOnm, or from 10 nm to 50 nm.
  • the thickness may be in the range of about 50 nm to about 1000 nm.
  • the thickness may be in the range of about 100 nm to about 750 nm.
  • the thickness may be in the range of about 100 nm to about 500 nm.
  • the thickness may be in the range of about 110 nm to about 300 nm.
  • this layer 103 may be placed on one or optionally both sides of the substrate 102 (shown as layer 105 in phantom in Figure 1).
  • the protective layers may be of the same material or they may optionally be different materials from the aforementioned materials.
  • This may be comprised of a material such as but not limited to chromium, vanadium, tungsten, or compounds such as nitrides (including tantalum nitride, molybendum nitride, tungsten nitride, titanium nitride, silicon nitride, zirconium nitride, and/or hafnium nitride), oxy-nitrides (including but not limited to oxynitrides of Ti, Ta, V, W, Si, Zr, Nb, Hf, or Mo), oxides (including but not limited to Al 2 O 3 or SiO 2 ), carbides (including SiC), and/or any single or multiple combination of the foregoing.
  • nitrides including tantalum nitride, molybendum nitride, tungsten nitride, titanium nitrid
  • the underside layer 105 may be about 0.05 to about 5 microns thick, optionally from about 0.1 to 1.0 microns thick.
  • the layer may be substantially thinner such as in the range of about 5nm to about lOOnm.
  • the layer 105 may be at least lOOnm.
  • the layer 105 may be at least 150 nm.
  • the layer 105 may be at least 200 nm.
  • the bottom protective layer 105 may be any of the materials listed fro layer 103.
  • the layer 105 may be the same or different from layer 103.
  • some embodiments may include another layer 107 such as but not limited to an aluminum layer below the substrate 102 and above the layer 105.
  • This layer 107 may be thicker than the layer 105 (or the layer 104). Optionally, it may be the same thickness or thinner than the layer 105 (or the layer 104).
  • the layer 107 may be about 0.05 to about 5 microns thick, optionally from about 0.1 to 1.0 microns thick.
  • the layer 107 may be substantially thinner such as in the range of about 5nm to about lOOnm.
  • the layer 107 may be at least lOOnm.
  • the layer 107 may be at least 150 nm.
  • the layer 107 may be at least 200 nm.
  • this layer 107 may be comprised of one or more of the following: Mo, Cu, Ag, Al, Ta, Ni, Cr, NiCr, CrMo, steel, or their alloys.
  • the layer 107 actually comprises of two or more layers of the same or different materials from the aforementioned list.
  • the material for layer 107 may be deposited in a manner so as to be in a stressed condition such as but not limited to compressive stress or tensile stressed, depending on the desired function of layer 107.
  • the layer 107 is provided as a stiffening layer to minimize curling of the substrate 102 that may occur during processing.
  • Layer 107 may be applied evenly across the backside or be thicker in certain areas or be shaped/patterned, such as but not limited to being thicker along the edges of a roll of substrate 102.
  • layer 107 may be a compressive layer such as a compressive molybdenum layer, compressive aluminum, or the like.
  • the layer 104 may be deposited in a manner so as to be in a stressed condition such as but not limited to compressive stress or tensile stressed. Some embodiments may optionally have more than one layer between the protective layer 105 and the substrate 102.
  • the material for the layer 105 may be an electrically insulating material such as but not limited to an oxide, alumina, or similar materials.
  • Layers such as but not limited to layer 105 using electrically insulating material may be thicker, in the range of about 0.5 microns to about 5 microns, optionally about 1 micron to about 3 microns, optionally about 1.5 to 2 microns.
  • the layer 105 may be used with or without the layer 107.
  • some embodiments may proceed with a layer 107 and without a layer 105.
  • some embodiments may proceed with a layer 105 but without a layer 107.
  • any of the foregoing layers may be deposited by approaches like chemical bath deposition (CBD), electrodeposition, electroplating, spray pyrolysis or spray deposition, and/or solution- deposition of particles.
  • CBD chemical bath deposition
  • the formation may occur by one or more solution coating and/or other techniques such as but not limited to sputtering, evaporation, CBD, sol-gel based coating, spray coating, chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), or the like.
  • the nascent absorber layer 106 may include material containing elements of groups IB, IIIA, and (optionally) VIA.
  • the absorber layer copper (Cu) is the group IB element, Gallium (Ga) and/or Indium (In) and/or Aluminum may be the group IIIA elements and Selenium (Se) and/or Sulfur (S) as group VIA elements.
  • the group VIA element may be incorporated into the nascent absorber layer 106 when it is initially solution deposited or during subsequent processing to form a final absorber layer from the nascent absorber layer 106.
  • the nascent absorber layer 106 may be about 1000 nm thick when deposited. Subsequent rapid thermal processing and incorporation of group VIA elements may change the morphology of the resulting absorber layer such that it increases in thickness (e.g., to about twice as much as the nascent layer thickness under some circumstances).
  • the nascent absorber layer is deposited on the substrate 102 either directly on the aluminum or on an uppermost layer such as the electrode 104.
  • the nascent absorber layer may be deposited in the form of a film of a solution- based precursor material containing nanoparticles that include one or more elements of groups IB, IIIA and (optionally) VIA. Examples of such films of such solution-based printing techniques are described e.g., in commonly-assigned U.S.
  • Patent Application 10/782,017 entitled “SOLUTION-BASED FABRICATION OF PHOTOVOLTAIC CELL” and also in PCT Publication WO 02/084708, entitled “METHOD OF FORMING SEMICONDUCTOR COMPOUND FILM FOR FABRICATION OF ELECTRONIC DEVICE AND FILM PRODUCED BY SAME" the disclosures of both of which are incorporated herein by reference.
  • the nascent absorber layer 106 may be formed by a sequence of atomic layer deposition reactions or any other conventional process normally used for forming such layers.
  • Atomic layer deposition of IB-IIIA-VIA absorber layers is described, e.g., in commonly- assigned, co-pending application serial no. 10/943,658 entitled "FORMATION OF CIGS ABSORBER LAYER MATERIALS USING ATOMIC LAYER DEPOSITION AND HIGH THROUGHPUT SURFACE TREATMENT ON COILED FLEXIBLE SUBSTRATES", (Attorney Docket No. NSL-035), which has been incorporated herein by reference above.
  • the nascent absorber layer 106 is then annealed by flash heating it and/or the substrate 102 from an ambient temperature to an average plateau temperature range of between about 200 0 C and about 600 0 C with the heating unit 110.
  • the temperature may be greater than 400 0 C.
  • the temperature may be greater than 500 0 C.
  • the heating unit 110 optionally provides sufficient heat to rapidly raise the temperature of the nascent absorber layer 106 and/or substrate 102 (or a significant portion thereof) e.g., at between about 5 C°/sec and about 150 C°/sec.
  • the heating unit 110 may include one or more infrared (IR) lamps that provide sufficient radiant heat.
  • 8 IR lamps rated at about 500 watts each situated about 1/8" to about 1" from the surface of the substrate 102 (4 above and 4 below the substrate, all aimed towards the substrate) can provide sufficient radiant heat to process a substrate area of about 25 cm 2 per hour in a 4" tube furnace.
  • the lamps may be ramped up in a controlled fashion, e.g., at an average ramp rate of about 10 C°/sec.
  • Those of skill in the art will be able to devise other types and configurations of heat sources that may be used as the heating unit 110.
  • heating and other processing can be carried out by use of IR lamps spaced 1" apart along the length of the processing region, with IR lamps equally positioned both above and below the substrate, and where both the IR lamps above and below the substrate are aimed towards the substrate.
  • IR lamps could be placed either only above or only below the substrate 102, and/or in configurations that augment lateral heating from the side of the chamber to the side of the substrate 102. It should be understood, of course, that other heating sources may be used to provide the desired heating ramp rate.
  • the absorber layer 106 and/or substrate 102 are maintained in the average plateau temperature range for between about 1 minute and about 15 minutes, between about 1 and about 30 minutes.
  • the total time including the ramp may be in the range of about 1 to about 5 minutes, about 1 to about 10 minutes, about 1 minute to about 15 minutes, between about 1 and about 30 minutes.
  • the temperature may be maintained in the desired range by reducing the amount of heat from the heating unit 110 to a suitable level. In the example of IR lamps, the heat may be reduced by simply turning off the lamps. Alternatively, the lamps may be actively cooled.
  • the temperature of the absorber layer 106 and/or substrate 102 is subsequently reduced to a suitable level, e.g., by further reducing or shutting off the supply of heat from the heating unit 110.
  • the total heating time may be in the range of about 1 minute and about 15 minutes, between about 1 and about 30 minutes.
  • group VIA elements such as selenium or sulfur may be incorporated into the absorber layer either before or during the annealing stage.
  • two or more discrete or continuous annealing stages can be sequentially carried out, in which group VIA elements such as selenium or sulfur are incorporated in a second or latter stage.
  • the first annealing stage may be in a non-reactive atmosphere and the second or later stage may be in a reactive atmosphere.
  • the nascent absorber layer 106 may be exposed to H 2 Se gas, H 2 S gas, S, and/or Se vapor before or during flash heating or rapid thermal processing (RTP).
  • RTP rapid thermal processing
  • Any of the foregoing may be used with a carrier gas such as but not limited to an inert gas, to assist with transport.
  • a carrier gas such as but not limited to an inert gas, to assist with transport.
  • the relative brevity of exposure allows the aluminum substrate to better withstand the presence of these gases and vapors, especially at high heat levels.
  • a window layer is typically used as a junction partner for the absorber layer.
  • the junction partner layer may include cadmium sulfide (CdS), indium sulfide (In 2 Ss), zinc sulfide (ZnS), or zinc selenide (ZnSe) or some combination of two or more of these.
  • Layers of these materials may be deposited, e.g., by chemical bath deposition, chemical surface deposition, or spray pyrolysis, to a thickness of about 50 nm to about 100 nm.
  • a transparent electrode e.g., a conductive oxide layer, may be formed on the window layer by sputtering, vapor deposition, CVD, ALD, electrochemical atomic layer epitaxy and the like.
  • Embodiments of the present invention overcome the disadvantages associated with the prior art by rapid thermal processing of nascent CIGS absorber layers deposited or otherwise formed on aluminum substrates.
  • Aluminum substrates are much cheaper and more lightweight than conventional substrates.
  • solar cells based on aluminum substrates can have a lower cost per watt for electricity generated and a far shorter energy payback period when compared to conventional silicon-based solar cells.
  • aluminum substrates allow for a flexible form factor that permits both high-throughput roll-to-roll printing during solar cell fabrication and faster and easier installation processes during solar module and system installation.
  • Embodiments of the present invention allow the fabrication of lightweight and inexpensive photovoltaic devices on aluminum substrates.
  • Flash heating / rapid thermal processing of the nascent absorber layer 106 allows for proper annealing and incorporation of group VIA elements without damaging or destroying the aluminum foil substrate 102.
  • the plateau temperature range is sufficiently below the melting point of aluminum (about 660 0 C) to avoid damaging or destroying the aluminum foil substrate.
  • the use of aluminum foil substrates can greatly reduce the materials cost of photovoltaic devices, e.g., solar cells, made on such substrates thereby reducing the cost per watt. economies of scale may be achieved by processing the aluminum foil substrate in a roll-to-roll fashion, with the various layers of the photovoltaic devices being built up on the substrate as it passes through a series of deposition annealing and other processing stages.
  • the foil substrate may be used with absorber layers that include silicon, amorphous silicon, organic oligomers or polymers (for organic solar cells), bi-layers or interpenetrating layers or inorganic and organic materials (for hybrid organic/inorganic solar cells), dye-sensitized titania nanoparticles in a liquid or gel-based electrolyte (for Graetzel cells in which an optically transparent film comprised of titanium dioxide particles a few nanometers in size is coated with a monolayer of charge transfer dye to sensitize the film for light harvesting), copper- indium-gallium-selenium (for CIGS solar cells), CdSe, CdTe, Cu(In,Ga)(S,Se)2, Cu(In,Ga,Al)(S,Se,Te)2, and/or combinations of the above, where the active materials are present in any of several forms including but not limited to bulk materials, micro-particles, nano-
  • the CIGS cells may be formed by vacuum or non-vacuum processes.
  • the processes may be one stage, two stage, or multi-stage CIGS processing techniques.
  • other possible absorber layers may be based on amorphous silicon (doped or undoped), a nanostructured layer having an inorganic porous semiconductor template with pores filled by an organic semiconductor material (see e.g., US Patent Application Publication US 2005-0121068 Al, which is incorporated herein by reference), a polymer/blend cell architecture, organic dyes, and/or C60 molecules, and/or other small molecules, micro-crystalline silicon cell architecture, randomly placed nanorods and/or tetrapods of inorganic materials dispersed in an organic matrix, quantum dot-based cells, or combinations of the above.
  • CMOS complementary metal-oxide-semiconductor
  • a contact layer 104 to promote electrical contact between the substrate 102 and the absorber layer that is to be formed on it, and/or to limit reactivity of the substrate 102 in subsequent steps, and/or to promote higher quality absorber growth.
  • the contact layer 104 may be but is not limited to a single or multiple layer(s) of molybdenum (Mo), tungsten (W), tantalum (Ta), binary and/or multinary alloys of Mo, W, and/or Ta, with or without the incorporation of a group IA element such as but not limited to sodium, and/or oxygen, and/or nitrogen.
  • the layer may include a continuous layer or optionally a discontinuous layer having, in particular, patterns (either by etching of a continuous layer or by direct deposition of the discontinuous layer with the desired pattern, or by a mask system for example). This applies to any of the layers involved in the present application.

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  • Photovoltaic Devices (AREA)

Abstract

L'invention concerne la formation d'une couche de dispositif photovoltaïque sur un substrat de type feuille d'aluminium ou de polymère métallisé. Une couche naissante d'absorbeur contenant un ou plusieurs éléments du groupe IB et un ou plusieurs éléments du groupe IIIA est formée sur le substrat. On chauffe ensuite rapidement la couche naissante d'absorbeur et/ou le substrat à partir de la température ambiante jusqu'à une température moyenne de palier située entre environ 200 °C et environ 600 °C que l'on maintient pendant 1 à 30 minutes avant de réduire la température.
PCT/US2008/060141 2007-04-11 2008-04-11 Formation de couches d'absorbeurs photovoltaïques sur des substrats en forme de feuille Ceased WO2008128122A2 (fr)

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Application Number Priority Date Filing Date Title
EP08745698A EP2179449A2 (fr) 2007-04-11 2008-04-11 Formation de couches d'absorbeurs photovoltaïques sur des substrats en forme de feuille

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US91125907P 2007-04-11 2007-04-11
US60/911,259 2007-04-11
US12/060,221 US20090032108A1 (en) 2007-03-30 2008-03-31 Formation of photovoltaic absorber layers on foil substrates
US12/060,221 2008-03-31

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WO2008128122A2 true WO2008128122A2 (fr) 2008-10-23
WO2008128122A3 WO2008128122A3 (fr) 2008-12-18

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