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WO2008118865A3 - Optimized laser pyrolysis reactor and methods therefor - Google Patents

Optimized laser pyrolysis reactor and methods therefor Download PDF

Info

Publication number
WO2008118865A3
WO2008118865A3 PCT/US2008/058036 US2008058036W WO2008118865A3 WO 2008118865 A3 WO2008118865 A3 WO 2008118865A3 US 2008058036 W US2008058036 W US 2008058036W WO 2008118865 A3 WO2008118865 A3 WO 2008118865A3
Authority
WO
WIPO (PCT)
Prior art keywords
tubing assembly
precursor tubing
bottom plate
nozzle
primary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2008/058036
Other languages
French (fr)
Other versions
WO2008118865A2 (en
Inventor
Xuegeng Li
David Jurbergs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Innovalight Inc
Original Assignee
Innovalight Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/967,568 external-priority patent/US20080191193A1/en
Application filed by Innovalight Inc filed Critical Innovalight Inc
Publication of WO2008118865A2 publication Critical patent/WO2008118865A2/en
Anticipated expiration legal-status Critical
Publication of WO2008118865A3 publication Critical patent/WO2008118865A3/en
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/121—Coherent waves, e.g. laser beams
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0869—Feeding or evacuating the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0883—Gas-gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0884—Gas-liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An apparatus for making a set of Group IV nanoparticles is disclosed. The apparatus includes a top plate, the top plate further including an outlet port; a bottom plate; and a casing extending between the top plate and the bottom plate. The apparatus also includes a particle collector assembly configured to be in fluid communication with the outlet port; and a primary precursor tubing assembly passing through the bottom plate into the casing, the primary precursor tubing assembly including a primary precursor tubing assembly nozzle. The apparatus further includes a set of secondary precursor tubing assemblies passing through the bottom plate into the casing, wherein each secondary precursor tubing assembly of the set of secondary precursor tubing assemblies further includes a set of secondary precursor tubing assembly nozzles positioned orthogonally to the primary precursor tubing assembly nozzle, the set of secondary precursor tubing assembly nozzles further configured to be adjusted to a first height above primary precursor tubing assembly nozzle. The apparatus also includes a laser configured to generate a laser beam, the laser beam being substantially perpendicular to the primary precursor tubing assembly nozzle in the reaction zone, wherein the laser may be adjusted to a second height above primary precursor tubing assembly nozzle.
PCT/US2008/058036 2007-03-27 2008-03-24 Optimized laser pyrolysis reactor and methods therefor Ceased WO2008118865A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US92047107P 2007-03-27 2007-03-27
US60/920,471 2007-03-27
US11/967,568 US20080191193A1 (en) 2007-01-22 2007-12-31 In situ modification of group iv nanoparticles using gas phase nanoparticle reactors
US11/967,568 2007-12-31

Publications (2)

Publication Number Publication Date
WO2008118865A2 WO2008118865A2 (en) 2008-10-02
WO2008118865A3 true WO2008118865A3 (en) 2011-02-17

Family

ID=39636869

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/058036 Ceased WO2008118865A2 (en) 2007-03-27 2008-03-24 Optimized laser pyrolysis reactor and methods therefor

Country Status (1)

Country Link
WO (1) WO2008118865A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9175174B2 (en) 2000-10-17 2015-11-03 Nanogram Corporation Dispersions of submicron doped silicon particles

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6599631B2 (en) 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US7226966B2 (en) 2001-08-03 2007-06-05 Nanogram Corporation Structures incorporating polymer-inorganic particle blends
US20090075083A1 (en) 1997-07-21 2009-03-19 Nanogram Corporation Nanoparticle production and corresponding structures
CN101622319B (en) 2007-01-03 2013-05-08 内诺格雷姆公司 Silicon/germanium based nanoparticle inks, doped particles, printing and methods for semiconductor applications
US8895962B2 (en) 2010-06-29 2014-11-25 Nanogram Corporation Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods
CN104919012A (en) 2013-05-24 2015-09-16 纳克公司 Printable ink with silicon/germanium based nanoparticles and with high viscosity alcoholic solvent
KR102176234B1 (en) * 2017-09-07 2020-11-09 주식회사 엘지화학 Reactor for manufacturing nano particle

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4776937A (en) * 1984-05-14 1988-10-11 Allied Corporation Light induced production of ultrafine powders comprising metal silicide powder
WO2001007155A1 (en) * 1999-07-21 2001-02-01 Nanogram Corporation Particle production apparatus
US20030034486A1 (en) * 2001-07-02 2003-02-20 Korgel Brian A. Applications of light-emitting nanoparticles
US6761870B1 (en) * 1998-11-03 2004-07-13 William Marsh Rice University Gas-phase nucleation and growth of single-wall carbon nanotubes from high pressure CO
US20040229447A1 (en) * 2003-03-12 2004-11-18 Swihart Mark T. Process for producing luminescent silicon nanoparticles
WO2006009881A2 (en) * 2004-06-18 2006-01-26 Innovalight, Inc. Process and apparatus for forming nanoparticles using radiofrequency plasmas
US20060188707A1 (en) * 2005-02-24 2006-08-24 Samsung Electronics Co., Ltd. Nanoparticle electroluminescence and method of manufacturing the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4776937A (en) * 1984-05-14 1988-10-11 Allied Corporation Light induced production of ultrafine powders comprising metal silicide powder
US6761870B1 (en) * 1998-11-03 2004-07-13 William Marsh Rice University Gas-phase nucleation and growth of single-wall carbon nanotubes from high pressure CO
WO2001007155A1 (en) * 1999-07-21 2001-02-01 Nanogram Corporation Particle production apparatus
US20030034486A1 (en) * 2001-07-02 2003-02-20 Korgel Brian A. Applications of light-emitting nanoparticles
US20040229447A1 (en) * 2003-03-12 2004-11-18 Swihart Mark T. Process for producing luminescent silicon nanoparticles
WO2006009881A2 (en) * 2004-06-18 2006-01-26 Innovalight, Inc. Process and apparatus for forming nanoparticles using radiofrequency plasmas
US20060188707A1 (en) * 2005-02-24 2006-08-24 Samsung Electronics Co., Ltd. Nanoparticle electroluminescence and method of manufacturing the same

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JI J ET AL: "SURFACE MODIFICATION OF ERBIUM-DOPED SILICON NANOCRYSTALS", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, WASHINGTON, US, vol. 13, no. 12, 1 December 2001 (2001-12-01), pages 4783 - 4786, XP001076945, ISSN: 0897-4756, DOI: DOI:10.1021/CM010644L *
LIAO Y-C ET AL: "Organic monolayer deposition on aerosolized silicon nanoparticles", COMPENDEX,, 1 January 2005 (2005-01-01), XP002537022 *
LIAO Y-C: "Functionalization and transport of nanoparticles", COMPENDEX,, 1 January 2005 (2005-01-01), XP002537021 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9175174B2 (en) 2000-10-17 2015-11-03 Nanogram Corporation Dispersions of submicron doped silicon particles

Also Published As

Publication number Publication date
WO2008118865A2 (en) 2008-10-02

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