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WO2008037927A3 - Gold alloy layer having nitrogen atoms inserted therein and related processing method - Google Patents

Gold alloy layer having nitrogen atoms inserted therein and related processing method Download PDF

Info

Publication number
WO2008037927A3
WO2008037927A3 PCT/FR2007/052017 FR2007052017W WO2008037927A3 WO 2008037927 A3 WO2008037927 A3 WO 2008037927A3 FR 2007052017 W FR2007052017 W FR 2007052017W WO 2008037927 A3 WO2008037927 A3 WO 2008037927A3
Authority
WO
WIPO (PCT)
Prior art keywords
nitrogen atoms
alloy layer
gold alloy
processing method
related processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2007/052017
Other languages
French (fr)
Other versions
WO2008037927A2 (en
Inventor
Denis Busardo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ionics France SA
Original Assignee
Quertech Ingenierie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quertech Ingenierie SA filed Critical Quertech Ingenierie SA
Priority to EP07823862A priority Critical patent/EP2066829A2/en
Publication of WO2008037927A2 publication Critical patent/WO2008037927A2/en
Publication of WO2008037927A3 publication Critical patent/WO2008037927A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Adornments (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

The invention relates to a gold alloy layer having nitrogen atoms inserted to a thickness higher than or equal to 0.05 μm and a related multi-energy implantation method.
PCT/FR2007/052017 2006-09-26 2007-09-26 Gold alloy layer having nitrogen atoms inserted therein and related processing method Ceased WO2008037927A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP07823862A EP2066829A2 (en) 2006-09-26 2007-09-26 Gold alloy layer having nitrogen atoms inserted therein and related processing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0608403 2006-09-26
FR0608403A FR2906261B1 (en) 2006-09-26 2006-09-26 NITRIDING DEVICE BY IONIC IMPLANTATION OF A GOLD ALLOY PART AND METHOD USING SUCH A DEVICE

Publications (2)

Publication Number Publication Date
WO2008037927A2 WO2008037927A2 (en) 2008-04-03
WO2008037927A3 true WO2008037927A3 (en) 2008-07-24

Family

ID=38932911

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2007/052017 Ceased WO2008037927A2 (en) 2006-09-26 2007-09-26 Gold alloy layer having nitrogen atoms inserted therein and related processing method

Country Status (3)

Country Link
EP (1) EP2066829A2 (en)
FR (1) FR2906261B1 (en)
WO (1) WO2008037927A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2939150B1 (en) * 2008-12-01 2011-10-21 Quertech Ingenierie PROCESS FOR TREATING A METAL PART WITH AN ION BEAM
FR2939973B1 (en) * 2008-12-16 2012-11-23 Quertech Ingenierie METHOD FOR MANUFACTURING CONNECTOR ELEMENT COMPRISING A SUBSTRATE HAVING A GOLDEN LAYER
FR2949236B1 (en) 2009-08-19 2011-10-28 Aircelle Sa ION IMPLANTATION METHOD FOR PRODUCING A HYDROPHOBIC SURFACE
EP3425085A1 (en) * 2017-07-07 2019-01-09 The Swatch Group Research and Development Ltd Method for surface treatment of metal powder particles and metal powder particles obtained using said method
BE1028380B1 (en) 2020-06-08 2022-01-17 Ionics Sa LAYER OF NICKEL-GOLD ALLOY HAVING NITROGEN ATOMS INSERTED THEREOF AND METHOD OF PROCESSING THEREOF

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085491A2 (en) * 2004-02-04 2005-09-15 Societe Quertech Ingenierie (Qi) Device and method for nitriding by ionic implantation of an aluminium alloy part

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085491A2 (en) * 2004-02-04 2005-09-15 Societe Quertech Ingenierie (Qi) Device and method for nitriding by ionic implantation of an aluminium alloy part

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
ANTTILA A ET AL: "Nitrogen implantation of metals", JOURNAL OF APPLIED PHYSICS USA, vol. 57, no. 4, 15 February 1985 (1985-02-15), pages 1423 - 1425, XP002480358, ISSN: 0021-8979 *
LEECH P W: "THE TRIBOLOGICAL PROPERTIES OF N2+ IMPLANTED AU AG CU ALLOY AND PALLADIUM IN SLIDING CONTACT WITH GOLD ELECTROPLATE", IEEE TRANSACTIONS ON COMPONENTS,HYBRIDS,AND MANUFACTURINGTECHNOLOGY, IEEE INC. NEW YORK, US, vol. 13, no. 2, 1 June 1990 (1990-06-01), pages 353 - 357, XP000179246, ISSN: 0148-6411 *

Also Published As

Publication number Publication date
FR2906261A1 (en) 2008-03-28
FR2906261B1 (en) 2010-02-26
WO2008037927A2 (en) 2008-04-03
EP2066829A2 (en) 2009-06-10

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