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WO2008029649A1 - Glass-making processes - Google Patents

Glass-making processes Download PDF

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Publication number
WO2008029649A1
WO2008029649A1 PCT/JP2007/066490 JP2007066490W WO2008029649A1 WO 2008029649 A1 WO2008029649 A1 WO 2008029649A1 JP 2007066490 W JP2007066490 W JP 2007066490W WO 2008029649 A1 WO2008029649 A1 WO 2008029649A1
Authority
WO
WIPO (PCT)
Prior art keywords
vacuum degassing
water vapor
glass
gas
vapor concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/066490
Other languages
French (fr)
Japanese (ja)
Inventor
Hideki Kushitani
Toshiyasu Kawaguchi
Shingo Urata
Hajime Itoh
Kenta Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to KR1020097000999A priority Critical patent/KR101419957B1/en
Priority to JP2008533101A priority patent/JP5434077B2/en
Publication of WO2008029649A1 publication Critical patent/WO2008029649A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • C03B5/2252Refining under reduced pressure, e.g. with vacuum refiners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Definitions

  • the present invention relates to a glass manufacturing method including a step of degassing a vacuum, a method of adjusting a water vapor concentration in an upper space in a vacuum degassing vessel, and a vacuum degassing device.
  • molten glass is introduced into a reduced-pressure atmosphere, and bubbles in the molten glass flow that continuously flows under this reduced-pressure atmosphere are grown to increase the bubbles contained in the molten glass.
  • a vacuum degassing method in which a vacuum degassing method is performed, which is then removed from the vacuum atmosphere.
  • Patent Document 1 Patent Document 1
  • Reference 2 Patent Document 2
  • Patent Document 1 Japanese Patent Laid-Open No. 2000-128422
  • Patent Document 2 International Publication No. 02/098810 Pamphlet
  • An object of the present invention is to provide a glass manufacturing method for performing degassing under reduced pressure without causing bumping.
  • a method of adjusting the water vapor concentration of the atmospheric gas in the vacuum degassing tank that can be preferably applied for such vacuum degassing, and the vacuum degassing of the molten glass capable of such vacuum degassing. It is to provide a foam device.
  • the present inventor has studied in detail the phenomenon in which the bubble layer on the surface of the molten glass in the vacuum degassing tank is enlarged, that is, the vacuum degassing treatment conditions when a so-called bumping occurs to cause a defect. And when the water vapor
  • the present invention provides the following (1) to (8).
  • a glass production method comprising a step of depressurizing and defoaming molten glass by setting the water vapor concentration of the atmospheric gas in the vacuum degassing tank to 60 mol% or less.
  • a decompression housing to be sucked under reduced pressure a decompression deaeration tank provided in the decompression housing for decompressing defoaming of the molten glass, and provided in communication with the decompression defoaming tank, Molten glass having introduction means for introducing the molten glass into the vacuum degassing tank and lead-out means provided in communication with the vacuum degassing tank and for deriving the molten glass after vacuum degassing from the vacuum degassing tank
  • a degassing apparatus comprising: a water vapor concentration measuring means for measuring a water vapor concentration of the atmospheric gas in the vacuum degassing tank; and a low moisture gas for introducing a low moisture gas into an upper space inside the vacuum degassing tank.
  • Vacuum degassing apparatus for molten glass further comprising gas introduction means
  • a water vapor concentration control means that can control the water vapor concentration of the atmospheric gas to a desired value in the vacuum degassing apparatus, and a gas that controls the amount of low moisture gas introduced by a signal from the control means
  • the glass production method of the present invention comprises a step of degassing the molten glass under reduced pressure by setting the water vapor concentration of the atmospheric gas in the vacuum degassing tank to 60 mol% or less, and thereby the vacuum degassing of the molten glass without causing bumping.
  • the effect that foam can be performed is produced.
  • the product has the effect of not causing defects caused by bubbles remaining due to bumping.
  • the glass manufacturing method of this invention can prevent bumping, glass manufacturing can be continued stably.
  • This “stable manufacturing” is a very important factor in quality control for glass manufacturing equipment that operates day and night. This is because once the quality deteriorates, it is necessary to shut down the equipment for repair and adjustment. In addition, it is possible to suppress deposits from adhering to the walls and ceiling of the depressurization defoaming tank from the bumped molten glass, so it is possible to suppress the formation of defects in the glass product due to the fall and improve the quality. .
  • the glass manufacturing method of the present invention reduces moisture in the atmosphere that promotes volatilization of specific components (boron, etc.), it suppresses volatilization of specific components (boron, etc.) in molten glass. There is an effect that can be. And when a glass base plate is manufactured, the deterioration of the flatness can be suppressed.
  • display glass such as liquid crystal glass is strictly regulated in terms of composition, while boron is very volatile, so boron content is rigorously adjusted. There is a need to. Therefore, according to the glass manufacturing method of this invention, it is possible to manufacture efficiently the glass which has the composition and flatness within a specification range.
  • the water vapor concentration is preferably 30 mol% or less.
  • the foam layer is prevented from being enlarged, and thus it is possible to suppress the occurrence of many defects in the glass product (specifically, per unit mass of the glass product). 0.5 bubbles / kg or less).
  • the vacuum degassing apparatus of the present invention can provide a vacuum degassing apparatus suitable for performing the glass manufacturing method of the present invention.
  • FIG. 1 is a diagram showing an example of the configuration of a vacuum degassing apparatus according to the present invention.
  • FIG. 2 is a view showing a vacuum degassing apparatus and the like according to the present invention.
  • FIG. 3 is a diagram showing the results of Example 1 of the present invention.
  • FIG. 4 is a diagram showing the results of Example 3 of the present invention.
  • the glass production method of the present invention comprises a step of defoaming molten glass under a reduced pressure defoaming tank atmosphere gas concentration of 60 mol% or less (hereinafter referred to as “the depressurization defoaming step of the present invention”). . ). And, it is preferable to have a raw material melting step as a pre-process, and it is preferable to have a molding step as a post-process! /. These raw material melting step and molding step are not particularly limited, and may be, for example, a conventionally known step. In addition to these steps, other processes may be provided.
  • Atmosphere gas means an atmosphere gas that fills the space above the molten glass (upper space) inside the vacuum degassing vessel.
  • the reduced-pressure defoaming step of the present invention is a step of defoaming bubbles in the molten glass by flowing the molten glass into a reduced-pressure defoaming tank having a reduced pressure inside.
  • a reduced-pressure defoaming tank having a reduced pressure inside there is no particular limitation as long as it is a step of degassing under reduced pressure with the water vapor concentration of the atmospheric gas in the vacuum degassing tank being 60 mol% or less!
  • this vacuum degassing device Applying a method for adjusting the water vapor concentration of the atmospheric gas in the vacuum degassing tank (hereinafter also referred to as “moisture adjustment method of the present invention”), the water vapor concentration of the atmospheric gas is 60 mol% or less.
  • the reduced-pressure defoaming step of the present invention can be performed.
  • the low moisture gas may be introduced continuously or intermittently.
  • the vacuum degassing step of the present invention to which the moisture adjustment method of the present invention is applied can be performed using, for example, the vacuum degassing apparatus of the present invention.
  • the vacuum degassing apparatus is a vacuum degassing apparatus for degassing molten glass under reduced pressure, wherein the molten glass is allowed to flow inside the reduced pressure state to degas bubbles in the molten glass.
  • FIG. 1 is a view showing a vacuum degassing apparatus 1 which is an example of the configuration of the vacuum degassing apparatus of the present invention.
  • the vacuum degassing tank 12 and the water vapor concentration measuring means 30 included in the vacuum degassing apparatus of the present invention Show low moisture gas introduction means 40!
  • FIG. 2 is a diagram (sectional view) illustrating a vacuum degassing apparatus 10 of the present invention including a vacuum degassing tank 12 (the water vapor concentration measuring means and the low moisture gas introducing means are not described).
  • the cylindrical vacuum degassing tank 12 is housed and arranged in the vacuum housing 11 so that its long axis is oriented in the horizontal direction.
  • a rising pipe 13 oriented in the vertical direction is attached to the lower surface of one end of the vacuum degassing tank 12, and a lowering pipe 14 is attached to the lower surface of the other end.
  • a part of the ascending pipe 13 and the descending pipe 14 is located in the decompression housing 11.
  • the upper surface of the vacuum degassing tank 12 has a plurality of openings. Through at least one opening 6, the low moisture gas 7 is passed from the outside of the vacuum housing 11 to the upper space 5 inside the vacuum degassing tank 12. Introducing power S.
  • An opening 8 formed in the decompression housing 11 is connected to decompression means such as a pump (not shown in FIG. 2; shown as pump 28 in FIG. 1), and is an atmospheric gas 3 that fills the upper space 5 3 Can be discharged to the outside of the vacuum housing 11 (the discharged gas is denoted as atmospheric gas; T), and the pressure inside the vacuum degassing tank 12 can be reduced.
  • the locations of the opening 6 and the opening 8 are not limited to the locations indicated by the opening 6 and the opening 8 in FIG. 2! /, But the opening 6 is on the upstream side of the vacuum degassing tank 12, and the opening 8 is on the downstream side thereof. It ’s better to have it on each side! /,.
  • the opening 6 constituting a part of the low moisture gas introduction means upstream of the vacuum degassing tank 12 the low moisture gas 7 introduced from the opening 6 into the upper space 5 inside the vacuum degassing tank 12 is reduced.
  • the ability to flow from the upstream side of the vacuum degassing tank 12 toward the downstream side where the opening 8 is provided to make the upper space 5 inside the vacuum degassing tank 12 into an atmospheric gas with a uniform low water vapor concentration. S can.
  • a known pressure gauge and thermometer capable of measuring the pressure (P) and temperature (T) of the atmospheric gas 3 are installed in the vacuum degassing tank 12 (not shown).
  • the riser 13 communicates with the vacuum degassing tank 12 and is an introducing means for introducing the molten glass G from the melting tank 20 into the vacuum degassing tank 12. For this reason, the lower end portion of the ascending pipe 13 is fitted into the open end of the upstream pit 22 and is immersed in the molten glass G in the upstream pit 22.
  • the downcomer pipe 14 communicates with the vacuum degassing tank 12 to depressurize the molten glass G after the vacuum degassing. It is a derivation means that descends from the bubble tank 12 and leads to a processing tank (not shown) in a subsequent process. For this reason, the lower end portion of the downcomer pipe 14 is fitted into the open end of the downstream pit 24 and immersed in the molten glass G in the downstream pit 24.
  • a heat insulating material 15 such as a heat insulating brick is provided around the decompression defoaming tank 12, the riser pipe 13, and the downcomer pipe 14 to insulate them.
  • the rising pipe 13 and the lowering pipe 14 are conduits for the molten glass G
  • a material having excellent heat resistance and corrosion resistance to the molten glass is used. It is made using.
  • An example is a hollow tube made of platinum or a platinum alloy. Specific examples of the platinum alloy include a platinum gold alloy and a platinum rhodium alloy.
  • Another example is a hollow tube made of a ceramic non-metallic inorganic material, that is, a dense refractory.
  • the dense refractory include, for example, electric refractories such as alumina electric refractories, dinoleconia electric refractories, alumina-dinoleconia-silica electric refractories, and dense alumina refractories.
  • electric refractories such as alumina electric refractories, dinoleconia electric refractories, alumina-dinoleconia-silica electric refractories, and dense alumina refractories.
  • Dense zirconia silica refractories and dense alumina zirconia silica refractories such as refractories.
  • each component of the vacuum degassing apparatus 10 can be appropriately selected as necessary.
  • the dimensions of the vacuum degassing tank 12 should be appropriately selected according to the vacuum degassing apparatus to be used, regardless of whether the vacuum degassing tank 12 is made of platinum, platinum alloy, or dense refractory. Power S can be. In the case of the vacuum degassing tank 12 shown in FIG. 2, specific examples of the dimensions are as follows.
  • the wall thickness is preferably 4 mm or less, more preferably 0.5 to 1.2 mm.
  • the decompression housing 11 is made of metal, for example, stainless steel, and has a shape and dimensions that can accommodate a decompression deaeration tank.
  • the riser pipe 13 and the downfall pipe 14 can be appropriately selected according to the vacuum degassing apparatus to be used regardless of the force made of platinum, platinum alloy, or dense refractory.
  • the dimensions of the ascending pipe 13 and the descending pipe 14 can be configured as follows. Inner diameter: 0.05—0.8 m, more preferably 0.1—0.6 m
  • Length 0.26m, more preferably 0.44m
  • the wall thickness is preferably 0.45 mm, more preferably 0.84 mm.
  • the vacuum degassing tank of the vacuum degassing apparatus of the present invention is, for example, the vacuum degassing tank 12 having such a configuration.
  • the water vapor concentration measuring means 30 included in the vacuum degassing apparatus of the present invention will be described.
  • the water vapor concentration measuring means 30 is connected to the downstream side of the vacuum degassing tank 12 by piping or the like.
  • a pump 28 as decompression means is connected to the downstream side.
  • the atmospheric gas discharged from the vacuum degassing tank 12; T can be sent S.
  • Atmospheric gas 3 'discharged from pump 28 is released to the atmosphere after purification if necessary.
  • the water vapor concentration measuring means 30 may be a commercially available dew point meter, or a measuring means for measuring the pressure, temperature, gas flow rate and the like of the atmospheric gas 3 'discharged from the vacuum degassing tank 12. It may be. As each measuring means, for example, a conventionally known pressure gauge, thermometer, and gas flow meter can be used.
  • the water vapor concentration is a value representing the amount of water vapor contained in the entire atmospheric gas.
  • the water vapor concentration (C) [mol%] of the atmospheric gas 3 ′ may be measured using a commercially available dew point meter, or alternatively, the water contained in the atmospheric gas; W) It can also be estimated by measuring [g].
  • the water vapor concentration (C) [mol%] in the atmospheric gas 3 ′ is expressed by the following equation (1).
  • the molten glass can be defoamed under reduced pressure without causing bumping, and bubbles are generated due to remaining bubbles in the glass product. Do not cause the defect! / ,! [0028] country
  • the low moisture gas introduction means 40 of the reduced pressure degassing apparatus of the present invention will be described.
  • the low moisture gas introduction means 40 is connected to the upstream side of the reduced pressure defoaming tank 12 by piping or the like. . Then, through this pipe or the like, it is possible to introduce the low moisture gas 7 from the low moisture gas introduction means 40 with the force S.
  • the low moisture gas introduction means 40 includes a low moisture gas generator 41 and a depressurized defoaming tank 12 connected by a pipe or the like.
  • Water gas 7 can be introduced into the upper space 5 of the vacuum degassing tank 12.
  • a flow control valve 42 and a flow meter 44 are provided in this order between the low moisture gas generating device 41 and the vacuum degassing tank 12, and the introduction amount of the low moisture gas 7 can be adjusted with these. it can.
  • the arrangement of the flow control valve 42 and the flow meter 44 may be reversed! /.
  • the low moisture gas introduction means 40 may include introduction means (for example, a high pressure fan) for actively introducing the low moisture gas 7 into the upper space 5 of the vacuum degassing tank 12. Good.
  • introduction means for example, a high pressure fan
  • the upper space 5 and the low moisture gas 7 can be efficiently introduced, which is preferable.
  • the atmosphere is used as the low moisture gas 7
  • the low moisture gas generator described above is used.
  • the above-mentioned water vapor concentration measuring means 30 can measure the gas component of the atmospheric gas 3 'discharged from the upper space 5. Having a component measuring instrument!
  • the low moisture gas is a moisture content higher than the atmospheric gas 3 in the upper space 5.
  • Low moisture gases include air, dry air, N, Examples thereof include an inert gas such as Ar, and there may be a plurality of types as well as one type.
  • the water vapor concentration of the low moisture gas is preferably 0 to 20 mol%, more preferably 0 to 5 mol%, still more preferably O to lmol%.
  • the water vapor concentration of the low moisture gas can be measured using a commercially available outdoor meter.
  • the vacuum degassing apparatus of the present invention is, for example, a vacuum degassing apparatus 1 having such a vacuum degassing tank 12, a water vapor concentration measuring means 30, and a low moisture gas introduction means 40.
  • the low moisture gas introducing means lowers the moisture content.
  • the water vapor concentration of the atmospheric gas in the upper space can be adjusted to a desired concentration by repeating the adjustment as appropriate.
  • the water vapor concentration (C) obtained by the above equation (1) and the target water vapor concentration (C) have the relationship of the following equation (2), so the amount of low moisture gas introduced into the upper space ( F) and lead
  • the force S is used to adjust the water vapor concentration to the target level.
  • V is the introduced gas volume (FX t) [m 3 ] obtained from the introduced amount (F [m 3 / h]) measured by the flow meter 44 and the introduced time (t [h]).
  • FX t the introduced gas volume
  • t the introduced time
  • V is the amount of emissions measured by the flow meter included in the water vapor concentration measuring means 30 (
  • the volume X t) is 0 ⁇ 023 [m 3 ].
  • the vacuum degassing apparatus has a water vapor concentration control unit capable of controlling the water vapor concentration of the atmospheric gas to a desired value, based on a signal from the control unit. It is preferable to further have a gas amount control means for controlling the amount of gas introduced.
  • T, P, F, t, W, S, F, and t are measured constantly and their data are
  • the vacuum degassing apparatus of the present invention has a water vapor concentration control means that can control the water vapor concentration of the upper space to a desired value by the computer. Further, it is preferable that the vacuum degassing apparatus of the present invention has a gas amount control means for enabling the computer to control the opening and closing of the flow rate control valve 42 and feeding back the data of the flow meter 44 to the computer. Furthermore, in order to keep the production performance constant, it is desirable to adjust the flow rate while controlling to a desired pressure.
  • the glass production method of the present invention is preferably carried out using such a vacuum degassing apparatus of the present invention, but other methods may be applied.
  • a vacuum degassing apparatus of the present invention when it is not necessary to introduce gas into the upper space in the depressurization defoaming tank as in the depressurization defoaming apparatus of the present invention, the atmosphere in the depressurization defoaming tank is connected to the atmosphere in the depressurization tank and hooding. The water vapor concentration of the gas in the decompression housing may be reduced.
  • the vacuum degassing treatment conditions are not particularly limited as long as they are within a normal range.
  • the normal pressure treatment conditions are: the atmospheric gas pressure (P) in the upper space inside the vacuum degassing tank is 38 to 460 mmHg (5;! To 613 hPa), and the temperature (T) is 110 ° C to 1500 ° C, especially 1250 ° C ⁇ ; treatment conditions for vacuum degassing at 1450 ° C.
  • the water vapor concentration of the atmospheric gas inside the vacuum degassing tank is set to 60 mol% or less. Then, the bubbles in the molten glass can be degassed under reduced pressure conditions without causing so-called bumping! /.
  • the water vapor concentration of the atmospheric gas inside the vacuum degassing tank is preferably 50 mol% or less, more preferably 40 mol% or less. preferable.
  • a water vapor concentration of 30 mol% or less is preferable because the foam layer tends to be thinner.
  • each bubble may shrink or break, which is preferable because the foam layer becomes thinner.
  • bubbles of a size that can be regarded as a defect in a glass product hardly remain. If the water vapor concentration is lower, the probability of defects occurring in the glass product is further reduced.
  • it is more preferable that it is 25 mol% or less, more preferably 20 mol% or less, and more preferably 15mo 1% or less. More preferably, it is more than S, more preferably 10 mol% or less, and even more preferably 5 mol% or less.
  • bubble shrinkage is a phenomenon that is particularly prominent in molten glass having a specific composition.
  • the glass production method of the present invention, the vacuum degassing apparatus of the present invention, and the moisture adjustment method of the present invention can be preferably used in the case of producing a polysilicate glass.
  • the polysilicate glass has the following composition, for example.
  • Composition range SiO: 55 to 74, Al 2 O: 10 to 20, B 2 O: 5 to; 12 Al 2 O / B 2 O: 1.5
  • volatilization of the volatile components such as Cl, F, and S can be suppressed, so that the composition fluctuation of these components can be prevented and the deterioration of the flatness caused by the composition fluctuation can be suppressed. can do.
  • the glass production method of the present invention, the vacuum degassing apparatus of the present invention, and the water content adjustment method of the present invention are not limited to ordinary glass, and are preferably used particularly when producing a polysilicate glass. If you can do it, sure
  • the low moisture gas introduced into the upper space inside the vacuum degassing tank is preferably a gas having an oxygen concentration lower than the oxygen concentration in the air.
  • the oxygen concentration is preferably 15% by volume or less, more preferably 10% by volume or less, and even more preferably 5% by volume or less.
  • the low moisture gas is preferably a gas not containing oxygen, such as N gas, Ar gas, CO, or the like.
  • the oxygen concentration of the low moisture gas introduced into the upper space is such a value
  • platinum or a platinum alloy is used as the material of the vacuum degassing tank. In this case, the oxidation of the platinum is suppressed, the life of the vacuum degassing tank is extended, and further, the generation of defects derived from platinum in the glass product can be suppressed.
  • the glass manufacturing method of the present invention preferably includes the vacuum degassing step of the present invention, and preferably includes a raw material melting step and a molding step as a pre-process and a post-process.
  • This raw material melting step is, for example, a conventionally known one, for example, a step of melting the raw material by heating to about 1400 ° C. or higher according to the type of glass.
  • the raw material to be used is not particularly limited as long as it is compatible with the glass to be produced. For example, it is possible to use raw materials prepared by mixing conventionally known materials such as cinnabar, boric acid and limestone according to the composition of the final glass product. it can.
  • This raw material may contain the desired fining agent.
  • the molding step may be a conventionally known one, for example, a float molding step, a roll-out molding step, a fusion molding step, or the like.
  • a platinum crucible containing glass raw materials was placed in a vacuum vacuum container.
  • the crucible was heated to melt the glass, and the temperature of the molten glass was adjusted to 1420 ° C. Thereafter, the absolute pressure in the vacuum decompression vessel was set to 26.7 kPa.
  • the composition of the glass raw material used is as follows.
  • Example 1 the thickness of the foam layer was measured with the water vapor concentration of the atmosphere in the vacuum decompression vessel set to 70 mol%, 47 mol%, 31 mol%, and 3 mol%. Furthermore, in Example 1, the low moisture gas, which was air, was changed to N, CO, Ar, and the atmosphere in the vacuum decompression vessel.
  • Example 1 A similar test was conducted with the ambient water vapor concentration being less than lmol%.
  • the glass composition is the same as in Example 1.
  • the thickness of the foam layer becomes 20 mm or more.
  • the water vapor concentration was 3 to 47 mol%, a foam layer having a thickness of about! To 2 mm was formed, but no bumping was confirmed.
  • the atmosphere was N, CO or Ar (water vapor concentration was less than lmol%), no foam layer was formed.
  • the water vapor concentration should be 60 mol% or less.
  • the thickness of the foam layer is 1
  • the shrinkage rate of bubbles in the foam layer was measured for each type of atmosphere.
  • the same porosilicate glass as in Example 1 was used as the molten glass.
  • the results are shown in Fig. 4.
  • the bubble diameter is a normalized value. Normalization is the ratio of the bubble diameter at each time to the bubble diameter when the bubbles inside the molten glass rise and reach the bubble layer. Therefore, the time when the bubble reaches the bubble layer is the elapsed time Os, and the bubble diameter at that time is 1.0.
  • the state of bubbles rising to the surface of the molten glass by vacuum defoaming treatment and then breaking and disappearing was determined using various atmospheric water vapor concentrations (lmol%, 9mol%, 13mol%, 19mol%, 22mol%, 35mol%, 70 mol%) and glass composition (soda lime glass: composition A, composition B, composition C).
  • a 50cc transparent quartz glass beaker was used as a container so that the state of the foam could be observed, and the thickness of the foam layer when about 50 g of glass was melted was measured.
  • the temperature of the molten glass was heated to 1200 ° C.
  • the absolute pressure in the container is 18.7 kPa for composition A, 10.3 kPa for composition B, and 14 for composition C. 4 kPa.
  • the content of each component in Composition A, Composition B, and Composition C was as shown in Table 3 below. In Table 3, “%” indicates mass%.
  • the bumping phenomenon can be prevented and the foam layer can be made thinner, and if the water vapor concentration is further reduced, the bubble breaking rate increases and the bubbles disappear. Turned out to be.
  • the present invention can be applied to a glass manufacturing method including a vacuum degassing apparatus and a vacuum degassing process for molten glass, and is particularly suitable for manufacturing high-quality display glass with few bubbles. It should be noted that the entire contents of the specification, claims, drawings and abstract of Japanese Patent Application No. 2006-233441, filed on August 30, 2006, are hereby incorporated herein by reference. As it is incorporated.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Degasification And Air Bubble Elimination (AREA)

Abstract

The invention provides a glass-making process of conducting vacuum defoaming without bumping; a glass-making process of conducting vacuum defoaming without making blisters remain in glass articles, which blisters result from the enlargement of a foam layer; and a glass-making process of conducting vacuum defoaming while inhibiting the vaporization of specific components (such as boron) contained in molten glass. A glass-making process which comprises the step of vacuum -defoaming molten glass in a vacuum defoaming tank, wherein the water vapor concentration of the atmospheric gas in the tank is controlled to be 60% by mole or below.

Description

明 細 書  Specification

ガラス製造方法  Glass manufacturing method

技術分野  Technical field

[0001] 本発明は、減圧脱泡する工程を具備するガラス製造方法、減圧脱泡槽内の上部空 間の水蒸気濃度を調整する方法、及び減圧脱泡装置に関する。  The present invention relates to a glass manufacturing method including a step of degassing a vacuum, a method of adjusting a water vapor concentration in an upper space in a vacuum degassing vessel, and a vacuum degassing device.

背景技術  Background art

[0002] 従来より、成形されたガラス製品の品質を向上させるために、溶解炉で原料を溶解 した溶融ガラスを成形装置で成形する前に、溶融ガラス内に発生した気泡を除去す る清澄工程が利用されている。  Conventionally, in order to improve the quality of a molded glass product, a clarification process for removing bubbles generated in the molten glass before forming the molten glass in which the raw material is melted in a melting furnace with a molding apparatus. Is being used.

この清澄工程では、減圧雰囲気内に溶融ガラスを導入し、この減圧雰囲気下、連 続的に流れる溶融ガラス流内の気泡を大きく成長させて溶融ガラス内に含まれる気 泡を浮上させ、破泡させて除去し、その後減圧雰囲気から排出する減圧脱泡方法が 知られている。  In this clarification process, molten glass is introduced into a reduced-pressure atmosphere, and bubbles in the molten glass flow that continuously flows under this reduced-pressure atmosphere are grown to increase the bubbles contained in the molten glass. There is known a vacuum degassing method in which a vacuum degassing method is performed, which is then removed from the vacuum atmosphere.

[0003] そして、このような減圧脱泡方法において、好適な減圧脱泡条件を達成するために 、減圧脱泡槽内の圧力や温度を規定した方法が提案されている(特許文献 1、特許 文献 2参照)。  [0003] And, in such a vacuum degassing method, in order to achieve suitable vacuum degassing conditions, a method that defines the pressure and temperature in the vacuum degassing tank has been proposed (Patent Document 1, Patent). Reference 2).

特許文献 1 :特開 2000— 128422号公報  Patent Document 1: Japanese Patent Laid-Open No. 2000-128422

特許文献 2:国際公開第 02/098810号パンフレット  Patent Document 2: International Publication No. 02/098810 Pamphlet

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0004] し力、し、例えば上記のような好適な減圧脱泡条件で減圧脱泡を行っても、減圧脱泡 処理中に、通常 10mm以下程度で溶融ガラス表面に存在する泡層が、 10mm〜数 百 mmへ肥大化し、いわゆる突沸が生じる場合があった。突沸とは、通常時間ととも に消滅するガラス表面に達した泡が、破泡せずに層を成すことによって長時間安定 的に存在し、溶融ガラス界面 (溶融ガラス表面)の上昇を招く現象である。その結果、 減圧脱泡後の溶融ガラスに泡が残存してしまう問題を生じる。 [0004] Even if vacuum defoaming is performed under the preferred vacuum defoaming conditions as described above, for example, during the vacuum defoaming treatment, a foam layer that is usually present on the surface of the molten glass at about 10 mm or less is obtained. There was a case where so-called bumping occurred due to enlargement from 10 mm to several hundred mm. Bumping is a phenomenon in which bubbles that reach the glass surface that normally disappear with time exist stably for a long time by forming a layer without breaking, leading to an increase in the molten glass interface (molten glass surface). It is. As a result, there arises a problem that bubbles remain in the molten glass after vacuum degassing.

また、突沸は生じなくても、泡層が肥大化した結果、ガラス製品に気泡が残存して 欠陥を生じさせる場合があった。 Even if bumping does not occur, as a result of the enlarged foam layer, bubbles remain in the glass product. In some cases, defects were caused.

また、例えば上記のような好適な減圧脱泡条件で減圧脱泡を行っても、溶融ガラス 中の特定の成分 (ホウ素等)が揮散し、ガラス組成が変化してしまう結果、製造したガ ラス素板の平坦度が悪化する場合があった。  Further, for example, even if vacuum degassing is performed under the preferable vacuum degassing conditions as described above, specific components (boron and the like) in the molten glass are volatilized and the glass composition is changed. In some cases, the flatness of the base plate deteriorates.

[0005] 本発明の目的は、突沸をほとんど生じさせないで減圧脱泡を行うガラス製造方法を 提供することにある。 [0005] An object of the present invention is to provide a glass manufacturing method for performing degassing under reduced pressure without causing bumping.

また、泡層の肥大化に由来するガラス製品中の気泡の残存がほとんど生じない、減 圧脱泡を行うガラス製造方法を提供することにある。  It is another object of the present invention to provide a glass production method for depressurization and defoaming in which almost no bubbles remain in the glass product resulting from the enlargement of the foam layer.

また、溶融ガラス中の特定の成分 (ホウ素等)の揮散を抑制して、減圧脱泡を行うガ ラス製造方法を提供することにある。  It is another object of the present invention to provide a glass production method for performing degassing under reduced pressure while suppressing volatilization of specific components (such as boron) in molten glass.

更に、このような減圧脱泡するために好ましく適用することができる減圧脱泡槽の雰 囲気ガスの水蒸気濃度を調整する方法、及びそのような減圧脱泡をすることができる 溶融ガラスの減圧脱泡装置を提供することにある。  Furthermore, a method of adjusting the water vapor concentration of the atmospheric gas in the vacuum degassing tank that can be preferably applied for such vacuum degassing, and the vacuum degassing of the molten glass capable of such vacuum degassing. It is to provide a foam device.

課題を解決するための手段  Means for solving the problem

[0006] 本発明者は、減圧脱泡槽内の溶融ガラス表面の泡層が肥大化する現象、いわゆる 突沸が生じたりして欠陥を生じさせる場合の減圧脱泡処理条件について詳細に検討 した。そして、減圧脱泡槽内の雰囲気ガスの水蒸気濃度が特定値を超えた場合に、 泡層が肥大化してガラス製品中に気泡が多く残存することを見出した。また、前記水 蒸気濃度がこの特定値よりも更に高い別の特定値を超えた場合に、泡層が更に肥大 化し突沸することでガラス製品中に気泡が一層多く残存することを見出した。そして、 それら特定値以下の減圧脱泡条件で減圧脱泡を行うガラス製造方法、そのような条 件で減圧脱泡することができる溶融ガラスの減圧脱泡装置、及びそのような装置の減 圧脱泡槽内の雰囲気ガスの水蒸気濃度を調整する方法が上記の課題を解決するこ とを見出し、本発明を完成させた。 [0006] The present inventor has studied in detail the phenomenon in which the bubble layer on the surface of the molten glass in the vacuum degassing tank is enlarged, that is, the vacuum degassing treatment conditions when a so-called bumping occurs to cause a defect. And when the water vapor | steam density | concentration of the atmospheric gas in a vacuum degassing tank exceeded a specific value, it discovered that a bubble layer enlarged and many bubbles remain | survived in glassware. Further, it has been found that when the water vapor concentration exceeds another specific value higher than this specific value, the foam layer further enlarges and bumps, and more bubbles remain in the glass product. And a glass manufacturing method that performs vacuum degassing under reduced pressure defoaming conditions below these specific values, a vacuum degassing apparatus for molten glass that can be degassed under such conditions, and a pressure reduction of such an apparatus The present inventors have found that a method for adjusting the water vapor concentration of the atmospheric gas in the defoaming tank solves the above-mentioned problems, and has completed the present invention.

[0007] 本発明は次の(1)〜(8)を提供する。 [0007] The present invention provides the following (1) to (8).

(1)減圧脱泡槽の雰囲気ガスの水蒸気濃度を 60mol%以下として、溶融ガラスを減 圧脱泡する工程を具備する、ガラス製造方法。  (1) A glass production method comprising a step of depressurizing and defoaming molten glass by setting the water vapor concentration of the atmospheric gas in the vacuum degassing tank to 60 mol% or less.

(2)前記減圧脱泡槽の雰囲気ガスへ低水分ガスを導入することにより、前記雰囲気 ガスの水蒸気濃度を 60mol%以下とする、上記(1)に記載のガラス製造方法。 (2) By introducing a low moisture gas into the atmosphere gas of the vacuum degassing tank, the atmosphere The glass production method according to (1), wherein the water vapor concentration of the gas is 60 mol% or less.

(3)前記雰囲気ガスの水蒸気濃度を 30mol%以下とする、上記(1)又は(2)に記載 のガラス製造方法。  (3) The glass production method according to (1) or (2), wherein the atmospheric gas has a water vapor concentration of 30 mol% or less.

(4)前記低水分ガスの酸素濃度(体積%)が空気中の酸素濃度(体積%)よりも低!/、 、上記(2)又は(3)に記載のガラス製造方法。  (4) The method for producing glass according to (2) or (3) above, wherein the oxygen concentration (volume%) of the low moisture gas is lower than the oxygen concentration (volume%) in the air.

(5)前記低水分ガスの酸素濃度(体積%)が 15体積%以下である、上記 (4)に記載 のガラス製造方法。  (5) The glass production method according to (4), wherein the oxygen concentration (volume%) of the low moisture gas is 15 volume% or less.

(6)溶融ガラスを減圧脱泡するための減圧脱泡槽の雰囲気ガスの水蒸気濃度を測 定し、その水蒸気濃度の測定結果に基いて、前記減圧脱泡槽の前記雰囲気ガスへ 低水分ガスを導入することにより、前記減圧脱泡槽の前記雰囲気ガスの水蒸気濃度 を 60mol%以下に調整するガラス製造方法。  (6) Measure the water vapor concentration of the atmospheric gas in the vacuum degassing tank for vacuum degassing of the molten glass and, based on the measurement result of the water vapor concentration, move to the atmospheric gas in the vacuum degassing tank. A glass manufacturing method in which the water vapor concentration of the atmospheric gas in the vacuum degassing tank is adjusted to 60 mol% or less by introducing.

(7)減圧吸引される減圧ハウジングと、この減圧ハウジング内に設けられ、溶融ガラス の減圧脱泡を行う減圧脱泡槽と、この減圧脱泡槽に連通して設けられ、減圧脱泡前 の溶融ガラスを前記減圧脱泡槽に導入する導入手段と、前記減圧脱泡槽に連通し て設けられ、減圧脱泡後の溶融ガラスを前記減圧脱泡槽から導出する導出手段とを 有する溶融ガラスの減圧脱泡装置であって、前記減圧脱泡槽の雰囲気ガスの水蒸 気濃度を測定する水蒸気濃度測定手段と、前記減圧脱泡槽の内部の上部空間へ低 水分ガスを導入する低水分ガス導入手段とを更に有する溶融ガラスの減圧脱泡装置  (7) A decompression housing to be sucked under reduced pressure, a decompression deaeration tank provided in the decompression housing for decompressing defoaming of the molten glass, and provided in communication with the decompression defoaming tank, Molten glass having introduction means for introducing the molten glass into the vacuum degassing tank and lead-out means provided in communication with the vacuum degassing tank and for deriving the molten glass after vacuum degassing from the vacuum degassing tank A degassing apparatus comprising: a water vapor concentration measuring means for measuring a water vapor concentration of the atmospheric gas in the vacuum degassing tank; and a low moisture gas for introducing a low moisture gas into an upper space inside the vacuum degassing tank. Vacuum degassing apparatus for molten glass further comprising gas introduction means

(8)前記減圧脱泡装置に、前記雰囲気ガスの水蒸気濃度を所望の値となるように制 御できる水蒸気濃度制御手段と、前記制御手段からの信号により低水分ガスの導入 量を制御するガス量制御手段をさらに有する上記(7)に記載の減圧脱泡装置。(8) A water vapor concentration control means that can control the water vapor concentration of the atmospheric gas to a desired value in the vacuum degassing apparatus, and a gas that controls the amount of low moisture gas introduced by a signal from the control means The vacuum degassing apparatus according to (7), further comprising an amount control unit.

(9)前記低水分ガス導入手段が、減圧脱泡槽の上流側に設けられて!/、る上記(7)又 は(8)に記載の溶融ガラスの減圧脱泡装置。 (9) The vacuum degassing apparatus for molten glass according to (7) or (8), wherein the low moisture gas introducing means is provided upstream of the vacuum degassing tank.

発明の効果 The invention's effect

本発明のガラス製造方法は、減圧脱泡槽内の雰囲気ガスの水蒸気濃度を 60mol %以下として溶融ガラスを減圧脱泡する工程を具備し、これにより、突沸を生じさせな いで溶融ガラスの減圧脱泡を行うことができるという効果を奏する。そして、ガラス製 品に突沸に起因する気泡が残存することにより発生する欠陥を生じさせないという効 果を奏する。また、このような本発明のガラス製造方法は突沸を防ぐことができるので 、ガラス製造を安定して継続することができる。 The glass production method of the present invention comprises a step of degassing the molten glass under reduced pressure by setting the water vapor concentration of the atmospheric gas in the vacuum degassing tank to 60 mol% or less, and thereby the vacuum degassing of the molten glass without causing bumping. The effect that foam can be performed is produced. And made of glass The product has the effect of not causing defects caused by bubbles remaining due to bumping. Moreover, since the glass manufacturing method of this invention can prevent bumping, glass manufacturing can be continued stably.

この「安定製造」というのは、昼夜を問わず運転が行われるガラス製造装置にとって は、品質管理において非常に重要な要素である。一度品質が悪化すると、修理や調 整のために設備を停止させる必要があるからである。また、突沸した溶融ガラスが減 圧脱泡槽の壁や天井へ付着物が付着するのを抑制することができるので、その落下 によるガラス製品の欠陥形成を抑制し、品質向上を図ることができる。  This “stable manufacturing” is a very important factor in quality control for glass manufacturing equipment that operates day and night. This is because once the quality deteriorates, it is necessary to shut down the equipment for repair and adjustment. In addition, it is possible to suppress deposits from adhering to the walls and ceiling of the depressurization defoaming tank from the bumped molten glass, so it is possible to suppress the formation of defects in the glass product due to the fall and improve the quality. .

また、このような本発明のガラス製造方法は、特定の成分 (ホウ素等)の揮散を助長 する雰囲気中水分を低減させるので、溶融ガラス中の特定の成分 (ホウ素等)の揮散 を抑制することができるという効果を奏する。そして、ガラス素板を製造した場合に、 その平坦度の悪化を抑制することができる。特に液晶用のガラスなどのディスプレイ 用のガラスは、その特性の要求から組成の規格が厳格に規定されている一方、ホウ 素は非常に揮散がしゃすいことから、ホウ素の含有量を厳格に調整する必要がある。 よって、本発明のガラス製造方法によれば、規格範囲内の組成と平坦度とを有する ガラスを効率的に製造することが可能である。  In addition, since the glass manufacturing method of the present invention reduces moisture in the atmosphere that promotes volatilization of specific components (boron, etc.), it suppresses volatilization of specific components (boron, etc.) in molten glass. There is an effect that can be. And when a glass base plate is manufactured, the deterioration of the flatness can be suppressed. In particular, display glass such as liquid crystal glass is strictly regulated in terms of composition, while boron is very volatile, so boron content is rigorously adjusted. There is a need to. Therefore, according to the glass manufacturing method of this invention, it is possible to manufacture efficiently the glass which has the composition and flatness within a specification range.

[0009] また、本発明のガラス製造方法は、前記水蒸気濃度が 30mol%以下であることが 好ましい。これにより、上記のように突沸を生じさせないことに加えて、泡層の肥大化 が抑制されて、ガラス製品に多くの欠陥を生じることを抑制する(具体的にはガラス製 品の単位質量当り、 0. 5個/ kg以下の気泡)という効果を奏する。  [0009] In the glass production method of the present invention, the water vapor concentration is preferably 30 mol% or less. As a result, in addition to preventing the occurrence of bumping as described above, the foam layer is prevented from being enlarged, and thus it is possible to suppress the occurrence of many defects in the glass product (specifically, per unit mass of the glass product). 0.5 bubbles / kg or less).

[0010] また、本発明の減圧脱泡装置は、このような本発明のガラス製造方法を行うことに 好適な減圧脱泡装置を提供できる。  [0010] In addition, the vacuum degassing apparatus of the present invention can provide a vacuum degassing apparatus suitable for performing the glass manufacturing method of the present invention.

図面の簡単な説明  Brief Description of Drawings

[0011] [図 1]図 1は、本発明の減圧脱泡装置の一構成例を示す図である。  FIG. 1 is a diagram showing an example of the configuration of a vacuum degassing apparatus according to the present invention.

[図 2]図 2は、本発明の減圧脱泡装置等を示す図である。  FIG. 2 is a view showing a vacuum degassing apparatus and the like according to the present invention.

[図 3]図 3は、本発明の実施例 1の結果を示す図である。  FIG. 3 is a diagram showing the results of Example 1 of the present invention.

[図 4]図 4は、本発明の実施例 3の結果を示す図である。  FIG. 4 is a diagram showing the results of Example 3 of the present invention.

符号の説明 [0012] 1 減圧脱泡装置 Explanation of symbols [0012] 1 Vacuum degassing device

3 雰囲気ガス  3 Atmospheric gas

3 排出された雰囲気ガス  3 Exhausted atmospheric gas

5 上部空間  5 Upper space

6 開口  6 opening

7 低水分ガス  7 Low moisture gas

8 開口  8 opening

9 開口  9 opening

10 減圧脱泡装置  10 Vacuum deaerator

11 減圧  11 Depressurization

12 減圧脱泡槽  12 Vacuum degassing tank

13 上昇管  13 Rise pipe

14 下降管  14 Downcomer

15 断熱材  15 Insulation

20 溶解槽  20 Dissolution tank

22 上流ピット  22 Upstream pit

24 下流ピット  24 Downstream pit

28  28

30 水蒸気濃度測定手段  30 Means for measuring water vapor concentration

40 低水分ガス導入手段  40 Low moisture gas introduction means

41 低水分ガス発生装置  41 Low moisture gas generator

42 流量制御弁  42 Flow control valve

44 流量計  44 Flow meter

G 溶解ガラス  G melting glass

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0013] 本発明のガラス製造方法について説明する。  [0013] The glass production method of the present invention will be described.

本発明のガラス製造方法は、減圧脱泡槽の雰囲気ガスの水蒸気濃度を 60mol% 以下として溶融ガラスを減圧脱泡する工程(以下、「本発明の減圧脱泡工程」とも!/、う 。)を具備する。そして、前工程として原料溶融工程を具備することが好ましぐ後ェ 程として成形工程を具備することが好まし!/、。これら原料溶融工程及び成形工程は 特に限定されず、例えば従来公知の工程であってよい。これらの工程以外に他のェ 程を具備してもよい。 The glass production method of the present invention comprises a step of defoaming molten glass under a reduced pressure defoaming tank atmosphere gas concentration of 60 mol% or less (hereinafter referred to as “the depressurization defoaming step of the present invention”). . ). And, it is preferable to have a raw material melting step as a pre-process, and it is preferable to have a molding step as a post-process! /. These raw material melting step and molding step are not particularly limited, and may be, for example, a conventionally known step. In addition to these steps, other processes may be provided.

なお、本発明において「雰囲気ガス」とは、減圧脱泡槽の内部の、溶融ガラスの上 部の空間(上部空間)を満たす雰囲気ガスを意味する。  In the present invention, “atmosphere gas” means an atmosphere gas that fills the space above the molten glass (upper space) inside the vacuum degassing vessel.

[0014] 本発明のガラス製造方法において本発明の減圧脱泡工程は、内部が減圧状態に された減圧脱泡槽内に溶融ガラスを流すことによって、この溶融ガラス中の気泡を脱 泡する工程であって、前記減圧脱泡槽内の雰囲気ガスの水蒸気濃度を 60mol%以 下として減圧脱泡する工程であれば、特に限定されな!/、。  [0014] In the glass production method of the present invention, the reduced-pressure defoaming step of the present invention is a step of defoaming bubbles in the molten glass by flowing the molten glass into a reduced-pressure defoaming tank having a reduced pressure inside. However, there is no particular limitation as long as it is a step of degassing under reduced pressure with the water vapor concentration of the atmospheric gas in the vacuum degassing tank being 60 mol% or less!

例えば、減圧脱泡装置における減圧脱泡槽の雰囲気ガスの水蒸気濃度を測定し、 水蒸気濃度の測定結果に基いて、前記上部空間へ後述する低水分ガスを導入する ことによって、この減圧脱泡装置の減圧脱泡槽の内部の前記雰囲気ガスの水蒸気濃 度を調整する方法 (以下、「本発明の水分調整方法」ともいう。)を適用して、その雰 囲気ガスの水蒸気濃度を 60mol%以下に調整して、本発明の減圧脱泡工程を行う ことができる。前記低水分ガスは、連続的に導入しても間欠的に導入してもよい。  For example, by measuring the water vapor concentration of the atmospheric gas in the vacuum degassing tank in the vacuum degassing device, and introducing the low moisture gas described later into the upper space based on the measurement result of the water vapor concentration, this vacuum degassing device Applying a method for adjusting the water vapor concentration of the atmospheric gas in the vacuum degassing tank (hereinafter also referred to as “moisture adjustment method of the present invention”), the water vapor concentration of the atmospheric gas is 60 mol% or less. The reduced-pressure defoaming step of the present invention can be performed. The low moisture gas may be introduced continuously or intermittently.

[0015] このような本発明の水分調整方法を適用した本発明の減圧脱泡工程は、例えば本 発明の減圧脱泡装置を用いて行うことができる。  [0015] The vacuum degassing step of the present invention to which the moisture adjustment method of the present invention is applied can be performed using, for example, the vacuum degassing apparatus of the present invention.

[0016] 本発明の減圧脱泡装置について説明する。  [0016] The vacuum degassing apparatus of the present invention will be described.

本発明の減圧脱泡装置は、溶融ガラスを減圧脱泡する減圧脱泡装置であって、減 圧状態にした内部に溶融ガラスを流して、この溶融ガラス中の気泡を脱泡する減圧 脱泡槽と、前記減圧脱泡槽内の雰囲気ガスの水蒸気濃度を測定する水蒸気濃度測 定手段と、前記上部空間へ低水分気体を導入する低水分ガス導入手段とを有し、前 記雰囲気ガスの水蒸気濃度を低減して、前記溶融ガラスを減圧脱泡することができ る減圧脱泡装置であり、例えば、図 1に示す減圧脱泡装置である。  The vacuum degassing apparatus according to the present invention is a vacuum degassing apparatus for degassing molten glass under reduced pressure, wherein the molten glass is allowed to flow inside the reduced pressure state to degas bubbles in the molten glass. A tank, a water vapor concentration measuring means for measuring the water vapor concentration of the atmospheric gas in the vacuum degassing tank, and a low moisture gas introducing means for introducing a low moisture gas into the upper space. A vacuum degassing apparatus capable of reducing the water vapor concentration and degassing the molten glass under reduced pressure, such as the vacuum degassing apparatus shown in FIG.

[0017] 図 1について説明する。図 1は、本発明の減圧脱泡装置の一構成例である減圧脱 泡装置 1を示す図であり、本発明の減圧脱泡装置が有する減圧脱泡槽 12と、水蒸気 濃度測定手段 30と、低水分ガス導入手段 40とを示して!/、る。 [0018] 初めにこの減圧脱泡槽 12について、図 2を用いて説明する。図 2は、減圧脱泡槽 1 2を含む本発明の減圧脱泡装置 10 (水蒸気濃度測定手段及び低水分ガス導入手段 は記載せず)を例示する図(断面図)である。 [0017] Referring to FIG. FIG. 1 is a view showing a vacuum degassing apparatus 1 which is an example of the configuration of the vacuum degassing apparatus of the present invention. The vacuum degassing tank 12 and the water vapor concentration measuring means 30 included in the vacuum degassing apparatus of the present invention Show low moisture gas introduction means 40! [0018] First, the vacuum degassing tank 12 will be described with reference to FIG. FIG. 2 is a diagram (sectional view) illustrating a vacuum degassing apparatus 10 of the present invention including a vacuum degassing tank 12 (the water vapor concentration measuring means and the low moisture gas introducing means are not described).

[0019] 図 2に示す減圧脱泡装置 10において、円筒形状をした減圧脱泡槽 12は、その長 軸が水平方向に配向するように減圧ハウジング 11内に収納配置されて!/、る。減圧脱 泡槽 12の一端の下面には垂直方向に配向する上昇管 13が、他端の下面には下降 管 14が取り付けられている。上昇管 13及び下降管 14は、その一部が減圧ハウジン グ 11内に位置している。  In the vacuum degassing apparatus 10 shown in FIG. 2, the cylindrical vacuum degassing tank 12 is housed and arranged in the vacuum housing 11 so that its long axis is oriented in the horizontal direction. A rising pipe 13 oriented in the vertical direction is attached to the lower surface of one end of the vacuum degassing tank 12, and a lowering pipe 14 is attached to the lower surface of the other end. A part of the ascending pipe 13 and the descending pipe 14 is located in the decompression housing 11.

[0020] そして減圧脱泡槽 12の上面には複数の開口があり、少なくとも 1つの開口 6を通じ て、減圧ハウジング 11の外部から減圧脱泡槽 12の内部の上部空間 5へ低水分ガス 7を導入すること力 Sできる。また、減圧ハウジング 11に形成された開口 8はポンプ等の 減圧手段(図 2には示していない。図 1にポンプ 28として示す。)に繋がれており、上 部空間 5を満たす雰囲気ガス 3を減圧ハウジング 11の外へ排出し (排出されたものを 雰囲気ガス; Tと示す。)、減圧脱泡槽 12の内部を減圧することができる。なお、開口 6及び開口 8の箇所は、図 2で開口 6及び開口 8で示した箇所に限定されな!/、が、開 口 6は減圧脱泡槽 12の上流側、開口 8はその下流側にそれぞれ設けるのが好まし!/、 。低水分ガス導入手段の一部を構成する開口 6を減圧脱泡槽 12の上流側に設ける ことにより、開口 6から減圧脱泡槽 12の内部の上部空間 5へ導入された低水分ガス 7 を、減圧脱泡槽 12の上流側から開口 8が設けられている下流側に向かって流動させ 、減圧脱泡槽 12の内部の上部空間 5を均一な低水蒸気濃度の雰囲気ガスにするこ と力 Sできる。  [0020] And, the upper surface of the vacuum degassing tank 12 has a plurality of openings. Through at least one opening 6, the low moisture gas 7 is passed from the outside of the vacuum housing 11 to the upper space 5 inside the vacuum degassing tank 12. Introducing power S. An opening 8 formed in the decompression housing 11 is connected to decompression means such as a pump (not shown in FIG. 2; shown as pump 28 in FIG. 1), and is an atmospheric gas 3 that fills the upper space 5 3 Can be discharged to the outside of the vacuum housing 11 (the discharged gas is denoted as atmospheric gas; T), and the pressure inside the vacuum degassing tank 12 can be reduced. Note that the locations of the opening 6 and the opening 8 are not limited to the locations indicated by the opening 6 and the opening 8 in FIG. 2! /, But the opening 6 is on the upstream side of the vacuum degassing tank 12, and the opening 8 is on the downstream side thereof. It ’s better to have it on each side! /,. By providing the opening 6 constituting a part of the low moisture gas introduction means upstream of the vacuum degassing tank 12, the low moisture gas 7 introduced from the opening 6 into the upper space 5 inside the vacuum degassing tank 12 is reduced. The ability to flow from the upstream side of the vacuum degassing tank 12 toward the downstream side where the opening 8 is provided to make the upper space 5 inside the vacuum degassing tank 12 into an atmospheric gas with a uniform low water vapor concentration. S can.

また、減圧脱泡槽 12の内部には、雰囲気ガス 3の圧力(P )及び温度 (T )が測定 できる例えば公知の圧力計及び温度計が設置されている(図示せず)。  Further, for example, a known pressure gauge and thermometer capable of measuring the pressure (P) and temperature (T) of the atmospheric gas 3 are installed in the vacuum degassing tank 12 (not shown).

[0021] また、図 2に示すように、上昇管 13は減圧脱泡槽 12と連通しており、溶解槽 20から の溶融ガラス Gを減圧脱泡槽 12に導入する導入手段である。このため、上昇管 13の 下端部は、上流ピット 22の開口端に嵌入され、この上流ピット 22内の溶融ガラス Gに 浸漬されている。 Further, as shown in FIG. 2, the riser 13 communicates with the vacuum degassing tank 12 and is an introducing means for introducing the molten glass G from the melting tank 20 into the vacuum degassing tank 12. For this reason, the lower end portion of the ascending pipe 13 is fitted into the open end of the upstream pit 22 and is immersed in the molten glass G in the upstream pit 22.

下降管 14は、減圧脱泡槽 12に連通しており、減圧脱泡後の溶融ガラス Gを減圧脱 泡槽 12から下降させて後工程の処理槽(図示せず)に導出する導出手段である。こ のため、下降管 14の下端部は、下流ピット 24の開口端に嵌入され、この下流ピット 2 4内の溶融ガラス Gに浸漬されている。 The downcomer pipe 14 communicates with the vacuum degassing tank 12 to depressurize the molten glass G after the vacuum degassing. It is a derivation means that descends from the bubble tank 12 and leads to a processing tank (not shown) in a subsequent process. For this reason, the lower end portion of the downcomer pipe 14 is fitted into the open end of the downstream pit 24 and immersed in the molten glass G in the downstream pit 24.

減圧ハウジング 11内において、減圧脱泡槽 12、上昇管 13及び下降管 14の周囲 には、これらを断熱被覆する断熱用レンガ等の断熱材 15が配設されている。  In the decompression housing 11, a heat insulating material 15 such as a heat insulating brick is provided around the decompression defoaming tank 12, the riser pipe 13, and the downcomer pipe 14 to insulate them.

[0022] 図 2に示す減圧脱泡装置 10において、減圧脱泡槽 12、上昇管 13及び下降管 14 は、溶融ガラス Gの導管であるため、耐熱性及び溶融ガラスに対する耐食性に優れ た材料を用いて作製されている。一例を挙げると、白金又は白金合金製の中空管で ある。 白金合金の具体例としては、白金 金合金、白金 ロジウム合金が挙げられる 。また、他の一例を挙げると、セラミックス系の非金属無機材料製、すなわち、緻密質 耐火物製の中空管である。緻密質耐火物の具体例としては、例えば、アルミナ系電 铸耐火物、ジノレコニァ系電铸耐火物、アルミナージノレコニアーシリカ系電铸耐火物 等の電铸耐火物、並びに緻密質アルミナ系耐火物、緻密質ジルコ二アーシリカ系耐 火物及び緻密質アルミナ ジルコ二アーシリカ系耐火物等の緻密質焼成耐火物が 挙げられる。 In the vacuum degassing apparatus 10 shown in FIG. 2, since the vacuum degassing tank 12, the rising pipe 13 and the lowering pipe 14 are conduits for the molten glass G, a material having excellent heat resistance and corrosion resistance to the molten glass is used. It is made using. An example is a hollow tube made of platinum or a platinum alloy. Specific examples of the platinum alloy include a platinum gold alloy and a platinum rhodium alloy. Another example is a hollow tube made of a ceramic non-metallic inorganic material, that is, a dense refractory. Specific examples of the dense refractory include, for example, electric refractories such as alumina electric refractories, dinoleconia electric refractories, alumina-dinoleconia-silica electric refractories, and dense alumina refractories. Dense zirconia silica refractories and dense alumina zirconia silica refractories such as refractories.

[0023] このような減圧脱泡装置 10の各構成要素の寸法は、必要に応じて適宜選択するこ とができる。減圧脱泡槽 12の寸法は、減圧脱泡槽 12が白金製若しく白金合金製、又 は緻密質耐火物製であるかによらず、使用する減圧脱泡装置に応じて適宜選択する こと力 Sできる。図 2に示す減圧脱泡槽 12の場合、その寸法の具体例は以下の通りで ある。  [0023] The dimensions of each component of the vacuum degassing apparatus 10 can be appropriately selected as necessary. The dimensions of the vacuum degassing tank 12 should be appropriately selected according to the vacuum degassing apparatus to be used, regardless of whether the vacuum degassing tank 12 is made of platinum, platinum alloy, or dense refractory. Power S can be. In the case of the vacuum degassing tank 12 shown in FIG. 2, specific examples of the dimensions are as follows.

水平方向における長さ::!〜 20m  Horizontal length ::! ~ 20m

内径: 0. 2〜3m (断面円形)  Inner diameter: 0.2 to 3m (circular cross section)

減圧脱泡槽 12が白金製若しくは白金合金製である場合、肉厚は 4mm以下である ことが好ましぐより好ましくは 0. 5〜; 1. 2mmである。  When the vacuum degassing tank 12 is made of platinum or a platinum alloy, the wall thickness is preferably 4 mm or less, more preferably 0.5 to 1.2 mm.

[0024] 減圧ハウジング 11は、金属製、例えばステンレス製であり、減圧脱泡槽を収容可能 な形状及び寸法を有して!/、る。 [0024] The decompression housing 11 is made of metal, for example, stainless steel, and has a shape and dimensions that can accommodate a decompression deaeration tank.

上昇管 13及び下降管 14は、白金製若しくは白金合金製、又は緻密質耐火物製で ある力、によらず、使用する減圧脱泡装置に応じて適宜選択することができる。例えば 、上昇管 13及び下降管 14の寸法は以下のように構成することができる。 内径: 0. 05—0. 8m、より好ましくは 0. 1—0. 6m The riser pipe 13 and the downfall pipe 14 can be appropriately selected according to the vacuum degassing apparatus to be used regardless of the force made of platinum, platinum alloy, or dense refractory. For example The dimensions of the ascending pipe 13 and the descending pipe 14 can be configured as follows. Inner diameter: 0.05—0.8 m, more preferably 0.1—0.6 m

長さ: 0. 2 6m、より好ましくは 0. 4 4m  Length: 0.26m, more preferably 0.44m

上昇管 13及び下降管 14が白金製若しくは白金合金製である場合、肉厚は 0. 4 5mmであることが好ましぐより好ましくは 0. 8 4mmである。  When the riser 13 and the downcomer 14 are made of platinum or a platinum alloy, the wall thickness is preferably 0.45 mm, more preferably 0.84 mm.

[0025] 本発明の減圧脱泡装置が有する減圧脱泡槽は、例えばこのような構成を具備する 減圧脱泡槽 12である。 [0025] The vacuum degassing tank of the vacuum degassing apparatus of the present invention is, for example, the vacuum degassing tank 12 having such a configuration.

[0026] 次に、本発明の減圧脱泡装置が有する水蒸気濃度測定手段 30について説明する 図 1において水蒸気濃度測定手段 30は、減圧脱泡槽 12の下流側と配管等で繋が つており、更にその下流側に減圧手段であるポンプ 28が繋がれている。このポンプ 2 8により、減圧脱泡槽 12から排出された雰囲気ガス; Tを水蒸気濃度測定手段 30 送ること力 Sできる。ポンプ 28から排出された雰囲気ガス 3'は、必要な場合は浄化処 理等して大気へ放散する。  Next, the water vapor concentration measuring means 30 included in the vacuum degassing apparatus of the present invention will be described. In FIG. 1, the water vapor concentration measuring means 30 is connected to the downstream side of the vacuum degassing tank 12 by piping or the like. A pump 28 as decompression means is connected to the downstream side. By this pump 28, the atmospheric gas discharged from the vacuum degassing tank 12; T can be sent S. Atmospheric gas 3 'discharged from pump 28 is released to the atmosphere after purification if necessary.

[0027] 水蒸気濃度測定手段 30は、市販の露点計であってもよいし、減圧脱泡槽 12から排 出された雰囲気ガス 3'の圧力、温度、およびガス流量などを測定する測定手段であ つてもよい。各々の測定手段は例えば従来公知の圧力計、温度計、およびガス流量 計を用いることができる。水蒸気濃度は、雰囲気ガス全体の中に含まれる水蒸気の 量を表した値である。 [0027] The water vapor concentration measuring means 30 may be a commercially available dew point meter, or a measuring means for measuring the pressure, temperature, gas flow rate and the like of the atmospheric gas 3 'discharged from the vacuum degassing tank 12. It may be. As each measuring means, for example, a conventionally known pressure gauge, thermometer, and gas flow meter can be used. The water vapor concentration is a value representing the amount of water vapor contained in the entire atmospheric gas.

そして、雰囲気ガス 3'の水蒸気濃度(C) [mol%]は、市販の露点計を用いて測定 してもよいし、代わりに雰囲気ガス; T中に含まれる水を析出させ、その量 (W) [g]を測 ることで概算することもできる。例えば、減圧脱泡層 12から排出された雰囲気ガス; T のガス流量を F [m3/h]、ガス流出時間を t [h]とし、さらに水蒸気濃度測定手段 3 Then, the water vapor concentration (C) [mol%] of the atmospheric gas 3 ′ may be measured using a commercially available dew point meter, or alternatively, the water contained in the atmospheric gas; W) It can also be estimated by measuring [g]. For example, the atmospheric gas discharged from the vacuum degassing layer 12; the gas flow rate of T is F [m 3 / h], the gas outflow time is t [h], and the water vapor concentration measuring means 3

out out  out out

0において計測する雰囲気ガス 3'の圧力及び温度を、 P [Pa]及び T [K]としたとき、  When the pressure and temperature of the atmospheric gas 3 ′ measured at 0 are P [Pa] and T [K],

2 2  twenty two

雰囲気ガス 3'中の水蒸気濃度(C) [mol%]は次の式(1)で表される。  The water vapor concentration (C) [mol%] in the atmospheric gas 3 ′ is expressed by the following equation (1).

式(1)で算出される水蒸気濃度を 60mol%以下とすることで、突沸を生じさせない で溶融ガラスの減圧脱泡を行うことができ、ガラス製品に突沸に起因する気泡が残存 することにより発生する欠陥を生じさせな!/、と!/、う効果を奏する。 [0028] 國 By setting the water vapor concentration calculated by Equation (1) to 60 mol% or less, the molten glass can be defoamed under reduced pressure without causing bumping, and bubbles are generated due to remaining bubbles in the glass product. Do not cause the defect! / ,! [0028] country

C = - ~~ ^-x lOO . . .式 (1 ) C =-~~ ^ -x lOO... Formula ( 1 )

[0029] 各々の単位は、次の通りである。 [0029] Each unit is as follows.

C : mol% W : g T : K P : Pa F : m3/h t : h R (気体定数): J 'K/mol C: mol% W: g T: KP: Pa F: m 3 / ht: h R (gas constant): J 'K / mol

2 2 out out  2 2 out out

[0030] 次に、本発明の減圧脱泡装置が有する低水分ガス導入手段 40について説明する 図 1において低水分ガス導入手段 40は、減圧脱泡槽 12の上流側と配管等で繋が つている。そして、この配管等を通じ、低水分ガス導入手段 40から低水分ガス 7を導 人すること力 Sでさる。  Next, the low moisture gas introduction means 40 of the reduced pressure degassing apparatus of the present invention will be described. In FIG. 1, the low moisture gas introduction means 40 is connected to the upstream side of the reduced pressure defoaming tank 12 by piping or the like. . Then, through this pipe or the like, it is possible to introduce the low moisture gas 7 from the low moisture gas introduction means 40 with the force S.

低水分ガス導入手段 40は、例えば図 1に示すように、低水分ガス発生装置 41と減 圧脱泡槽 12とが配管等で繋がれており、低水分ガス発生装置 41で発生させた低水 分ガス 7を減圧脱泡槽 12の上部空間 5へ導入することができる。そして、低水分ガス 発生装置 41から減圧脱泡槽 12までの間に、流量制御弁 42及び流量計 44がこの順 に備えられており、これらで低水分ガス 7の導入量を調整することができる。  For example, as shown in FIG. 1, the low moisture gas introduction means 40 includes a low moisture gas generator 41 and a depressurized defoaming tank 12 connected by a pipe or the like. Water gas 7 can be introduced into the upper space 5 of the vacuum degassing tank 12. A flow control valve 42 and a flow meter 44 are provided in this order between the low moisture gas generating device 41 and the vacuum degassing tank 12, and the introduction amount of the low moisture gas 7 can be adjusted with these. it can.

なお、流量制御弁 42及び流量計 44の配置は逆であってもよ!/、。  The arrangement of the flow control valve 42 and the flow meter 44 may be reversed! /.

[0031] ここで、低水分ガス導入手段 40は、低水分ガス 7を減圧脱泡槽 12の上部空間 5へ 積極的に導入するための導入手段(例えば、高圧ファン等)を有してもよい。この場 合、上部空間 5 低水分ガス 7を効率よく導入することができるので好ましい。  [0031] Here, the low moisture gas introduction means 40 may include introduction means (for example, a high pressure fan) for actively introducing the low moisture gas 7 into the upper space 5 of the vacuum degassing tank 12. Good. In this case, the upper space 5 and the low moisture gas 7 can be efficiently introduced, which is preferable.

[0032] また、低水分ガス 7として大気を用いる場合であれば、上記の低水分ガス発生装置  [0032] If the atmosphere is used as the low moisture gas 7, the low moisture gas generator described above is used.

41は必要ない。例えば上部空間 5 繋がる配管等の一端が流量制御弁 42の開閉 により大気に開放しており、大気がこの配管を通じて減圧となっている上部空間 5 導入できればよい。  41 is not necessary. For example, it is only necessary to introduce the upper space 5 in which one end of a pipe connected to the upper space 5 is opened to the atmosphere by opening and closing the flow control valve 42 and the atmosphere is decompressed through this pipe.

また、大気以外の例えば不活性ガス等を低水分ガス 7として用いる場合は、上記の 水蒸気濃度測定手段 30が、上部空間 5から排出される雰囲気ガス 3'のガス成分を 測定することができるガス成分測定計を有して!/、ること力 S好ましレ、。  In addition, when an inert gas other than the atmosphere, for example, is used as the low moisture gas 7, the above-mentioned water vapor concentration measuring means 30 can measure the gas component of the atmospheric gas 3 'discharged from the upper space 5. Having a component measuring instrument!

[0033] なお、本発明において低水分ガスとは、上部空間 5における雰囲気ガス 3よりも水分 [0033] In the present invention, the low moisture gas is a moisture content higher than the atmospheric gas 3 in the upper space 5.

(水蒸気濃度)が低い気体を意味する。低水分ガスとしては、大気、乾燥空気、 Nや Arのような不活性ガス等が挙げられ、 1種類のみならず、複数種類であってもよい。 低水分ガスの水蒸気濃度は 0〜20mol%であることが好ましぐ 0〜5mol%であるこ とがより好ましく、 O〜lmol%であることが更に好ましい。なお、低水分ガスの水蒸気 濃度は、市販の露天計などを用いて測定することが可能である。 It means gas with low (water vapor concentration). Low moisture gases include air, dry air, N, Examples thereof include an inert gas such as Ar, and there may be a plurality of types as well as one type. The water vapor concentration of the low moisture gas is preferably 0 to 20 mol%, more preferably 0 to 5 mol%, still more preferably O to lmol%. The water vapor concentration of the low moisture gas can be measured using a commercially available outdoor meter.

[0034] 本発明の減圧脱泡装置は、例えばこのような減圧脱泡槽 12と水蒸気濃度測定手 段 30と低水分ガス導入手段 40とを有する減圧脱泡装置 1である。 The vacuum degassing apparatus of the present invention is, for example, a vacuum degassing apparatus 1 having such a vacuum degassing tank 12, a water vapor concentration measuring means 30, and a low moisture gas introduction means 40.

このような本発明の減圧脱泡装置において、水蒸気濃度測定手段により上部空間 における雰囲気ガスの水蒸気濃度を測定し、所望の水蒸気濃度よりも高くなつた場 合は、低水分ガス導入手段により低水分ガスを導入すると!/、つた調整を適宜繰り返 すことで、上部空間における雰囲気ガスの水蒸気濃度を所望の濃度に調整すること ができる。  In such a vacuum degassing apparatus of the present invention, when the water vapor concentration of the atmospheric gas in the upper space is measured by the water vapor concentration measuring means and becomes higher than the desired water vapor concentration, the low moisture gas introducing means lowers the moisture content. When the gas is introduced! /, The water vapor concentration of the atmospheric gas in the upper space can be adjusted to a desired concentration by repeating the adjustment as appropriate.

例えば上記の式(1)で求められる水蒸気濃度(C)と、 目標とする水蒸気濃度(C ) とは次の式(2)の関係があるので、低水分ガスの上部空間への導入量 (F )及び導  For example, the water vapor concentration (C) obtained by the above equation (1) and the target water vapor concentration (C) have the relationship of the following equation (2), so the amount of low moisture gas introduced into the upper space ( F) and lead

in  in

入時間 (t )、雰囲気ガスの上部空間からの排出量 (F )及び排出時間 (t )、並  Input time (t), discharge amount of atmospheric gas from the upper space (F) and discharge time (t),

in OUT OUT びに低水分ガスの水蒸気濃度(S) [mol%]を調整することで、水蒸気濃度を目標と するィ直とすること力 Sでさる。  In OUT OUT and by adjusting the water vapor concentration (S) [mol%] of the low-moisture gas, the force S is used to adjust the water vapor concentration to the target level.

[0035] [数 2] [0035] [Equation 2]

• · .式 ( 2)• Formula (2)

Figure imgf000013_0001
Figure imgf000013_0001

[0036] 各々の記号の意味、及び単位は次の通りである。 [0036] The meaning and unit of each symbol are as follows.

C : [mol%]、 V (上部空間の容積): [m3]、 V : [m3]、 V : [m3] C: [mol%], V (volume of the upper space): [m 3 ], V: [m 3 ], V: [m 3 ]

1 in out  1 in out

[0037] ここで、 V は流量計 44で測定される導入量 (F [m3/h])と導入時間(t [h])とから 求められる導入ガス体積(F X t ) [m3]の上部空間の温度及び圧力での換算量であ [0037] where V is the introduced gas volume (FX t) [m 3 ] obtained from the introduced amount (F [m 3 / h]) measured by the flow meter 44 and the introduced time (t [h]). The amount of conversion at the temperature and pressure of the upper space of

in in  in in

る。同様に、 V は水蒸気濃度測定手段 30に含まれる流量計で測定される排出量(  The Similarly, V is the amount of emissions measured by the flow meter included in the water vapor concentration measuring means 30 (

out  out

F [m3/h])と排出時間 (t [h])とから求められる排出ガス体積 (F X t ) [m3]の out out out out 上部空間の温度及び圧力での換算量である。 F [m 3 / h]) and the exhaust gas volume (FX t) [m 3 ] obtained from the exhaust time (t [h]) is a conversion amount in the temperature and pressure of the out space.

また、上部空間での圧力を一定に保つ場合は、 V =v とする必要がある。  In order to keep the pressure in the upper space constant, it is necessary to set V = v.

m out  m out

[0038] 例えば、体積 (V) = lm3の上部空間の水蒸気濃度 (C) = 20mol%を、 目標となる 水蒸気濃度 (C )= 10mol%に低減するためには、 V =V の時、低水分ガスの導 [0038] For example, water vapor concentration (C) = 20mol% in the upper space with volume (V) = lm 3 is the target In order to reduce the water vapor concentration (C) = 10 mol%, when V = V, the introduction of low moisture gas

1 in out  1 in out

入量 (V ) = 0. 53m3となる。 Input (V) = 0.53m 3

in  in

したがって、上部空間の温度(T ) = 1673K、圧力(P ) = 25kPaのとき、流量計 44 の位置における導入ガスの温度 (T ) = 298K、圧力 (P ) = 101kPaでは、導入ガス  Therefore, when the temperature of the upper space (T) = 1673K and the pressure (P) = 25kPa, the temperature of the introduced gas at the position of the flow meter 44 (T) = 298K and the pressure (P) = 101kPa, the introduced gas

3 3  3 3

体積 X t )は、 0· 023[m3]となる。 The volume X t) is 0 · 023 [m 3 ].

in in  in in

実際には、溶融ガラスおよび装置構成材等からの水分の蒸発、又はリークガスによ る水蒸気濃度の変化が起こるため、絶えず調整を図る必要がある。  In practice, moisture evaporation from molten glass and equipment components, or changes in water vapor concentration due to leak gas occur, so adjustments must be made constantly.

[0039] なお、ガラス製品の製造中は、定常的にこの水蒸気濃度を監視し、制御すること力 S 好ましい。具体的には、前記減圧脱泡装置に、前記雰囲気ガスの水蒸気濃度を所 望の値となるように制御できる水蒸気濃度制御手段を有することが好ましぐ前記制 御手段からの信号により低水分ガスの導入量を制御するガス量制御手段をさらに有 することが好ましい。 [0039] During the production of glass products, it is preferable to constantly monitor and control the water vapor concentration. Specifically, it is preferable that the vacuum degassing apparatus has a water vapor concentration control unit capable of controlling the water vapor concentration of the atmospheric gas to a desired value, based on a signal from the control unit. It is preferable to further have a gas amount control means for controlling the amount of gas introduced.

例えば、 T、 P、 F 、 t 、 W、 S、 F 及び t を定常的に測定し、これらのデー  For example, T, P, F, t, W, S, F, and t are measured constantly and their data are

2 2 OUT OUT 2 IN IN  2 2 OUT OUT 2 IN IN

タをコンピュータに集め、このコンピュータによって上部空間の水蒸気濃度が所望の 値となるように制御できるような水蒸気濃度制御手段を、本発明の減圧脱泡装置が 有すること力 S好ましい。また、このコンピュータによって流量制御弁 42の開閉が制御 できるようにし、更に流量計 44のデータがこのコンピュータにフィードバックされるガス 量制御手段を、本発明の減圧脱泡装置が有することが好ましい。さらに、生産性能を 一定に保っために、所望の圧力に制御しながら流量を調整することが望ましい。  It is preferable that the vacuum degassing apparatus of the present invention has a water vapor concentration control means that can control the water vapor concentration of the upper space to a desired value by the computer. Further, it is preferable that the vacuum degassing apparatus of the present invention has a gas amount control means for enabling the computer to control the opening and closing of the flow rate control valve 42 and feeding back the data of the flow meter 44 to the computer. Furthermore, in order to keep the production performance constant, it is desirable to adjust the flow rate while controlling to a desired pressure.

[0040] 本発明のガラス製造方法は、このような本発明の減圧脱泡装置を用いて行うことが 好ましいが、他の方法を適用してもよい。例えば、本発明の減圧脱泡装置のように減 圧脱泡槽内の上部空間に気体を導入する必要は必ずしもなぐ減圧脱泡槽内と減圧 ノ、ウジング内の雰囲気が繋がっている場合には、減圧ハウジング内の気体の水蒸気 濃度を低減すればよい。  [0040] The glass production method of the present invention is preferably carried out using such a vacuum degassing apparatus of the present invention, but other methods may be applied. For example, when it is not necessary to introduce gas into the upper space in the depressurization defoaming tank as in the depressurization defoaming apparatus of the present invention, the atmosphere in the depressurization defoaming tank is connected to the atmosphere in the depressurization tank and hooding. The water vapor concentration of the gas in the decompression housing may be reduced.

[0041] 本発明のガラス製造方法において、減圧脱泡処理条件は通常の範囲であれば特 に限定されない。通常の減圧処理条件とは、減圧脱泡槽の内部の上部空間におけ る雰囲気ガスの圧力(P )を 38〜460mmHg (5;!〜 613hPa)とし、温度(T )を 110 0°C〜; 1500°C、特に 1250°C〜; 1450°Cとして減圧脱泡処理を行う処理条件をいう。 [0042] 本発明のガラス製造方法が具備する本発明の減圧脱泡工程では、減圧脱泡槽の 内部の雰囲気ガスの水蒸気濃度を 60mol%以下とする。すると、いわゆる突沸を生 じさせな!/、で溶融ガラス中の気泡の脱泡を、減圧条件下で行うことができる。 [0041] In the glass production method of the present invention, the vacuum degassing treatment conditions are not particularly limited as long as they are within a normal range. The normal pressure treatment conditions are: the atmospheric gas pressure (P) in the upper space inside the vacuum degassing tank is 38 to 460 mmHg (5;! To 613 hPa), and the temperature (T) is 110 ° C to 1500 ° C, especially 1250 ° C ~; treatment conditions for vacuum degassing at 1450 ° C. [0042] In the vacuum degassing step of the present invention included in the glass manufacturing method of the present invention, the water vapor concentration of the atmospheric gas inside the vacuum degassing tank is set to 60 mol% or less. Then, the bubbles in the molten glass can be degassed under reduced pressure conditions without causing so-called bumping! /.

また、この水蒸気濃度が低いほど泡層が薄くなる傾向があるので、減圧脱泡槽の内 部の雰囲気ガスの水蒸気濃度は 50mol%以下であることが好ましぐ 40mol%以下 であることがより好ましい。そして、水蒸気濃度が 30mol%以下であると、泡層が更に 薄くなる傾向があるので好ましい。また、ガラス組成によっては、 1つ 1つの気泡が収 縮又は破泡する場合があり、これにより泡層は更に薄くなるので好ましい。更に、ガラ ス製品に欠陥とみなされる程度の大きさの気泡が残存し難くなるので好ましい。この 水蒸気濃度が更に低ければ、ガラス製品に欠陥が生じる確率が更に低くなるので、 2 5mol%以下であることがより好ましぐ 20mol%以下であることがより好ましぐ 15mo 1%以下であること力 Sより好ましく、 10mol%以下であることがより好ましぐ 5mol%以 下であることが更に好ましい。  In addition, since the bubble layer tends to be thinner as the water vapor concentration is lower, the water vapor concentration of the atmospheric gas inside the vacuum degassing tank is preferably 50 mol% or less, more preferably 40 mol% or less. preferable. A water vapor concentration of 30 mol% or less is preferable because the foam layer tends to be thinner. Also, depending on the glass composition, each bubble may shrink or break, which is preferable because the foam layer becomes thinner. Furthermore, it is preferable because bubbles of a size that can be regarded as a defect in a glass product hardly remain. If the water vapor concentration is lower, the probability of defects occurring in the glass product is further reduced. Therefore, it is more preferable that it is 25 mol% or less, more preferably 20 mol% or less, and more preferably 15mo 1% or less. More preferably, it is more than S, more preferably 10 mol% or less, and even more preferably 5 mol% or less.

[0043] また、本発明者は、上記に加えて、このような気泡の収縮は、特定の組成の溶融ガ ラスについて、特に顕著に発現する現象であることを見出した。  [0043] Further, in addition to the above, the present inventors have found that such bubble shrinkage is a phenomenon that is particularly prominent in molten glass having a specific composition.

具体的には、溶融ガラスがポロシリケートガラスの場合、水蒸気濃度が 30mol%以 下であると、気泡が顕著に収縮する傾向がある。したがって、本発明のガラス製造方 法、本発明の減圧脱泡装置及び本発明の水分調整方法は、ポロシリケートガラスを 製造する場合により好ましく用いることができる。  Specifically, when the molten glass is a polysilicate glass, the bubbles tend to remarkably shrink when the water vapor concentration is 30 mol% or less. Therefore, the glass production method of the present invention, the vacuum degassing apparatus of the present invention, and the moisture adjustment method of the present invention can be preferably used in the case of producing a polysilicate glass.

[0044] ここで!/、うポロシリケートガラスは例えば次のような組成である。  [0044] Here! /, The polysilicate glass has the following composition, for example.

組成の範囲: SiO : 55〜74、 Al O : 10〜20、 B O : 5〜; 12 Al O /B O : 1. 5  Composition range: SiO: 55 to 74, Al 2 O: 10 to 20, B 2 O: 5 to; 12 Al 2 O / B 2 O: 1.5

2 2 3 2 3 2 3 2 3 2 2 3 2 3 2 3 2 3

〜3、 MgO : 0〜5、 CaO : 0〜5、 SrO : 0〜; 12、 BaO : 0〜; 12、 SrO + BaO: 6~ 12 ( 単位は質量%)。 -3, MgO: 0-5, CaO: 0-5, SrO: 0-; 12, BaO: 0-; 12, SrO + BaO: 6-12 (unit: mass%).

[0045] 従来においては好ましい減圧脱泡槽内の圧力、温度条件が提示されていた力 水 蒸気濃度について検討した例はなかった。本発明者は、従来において提示されてい た減圧脱泡条件で脱泡を行っても、突沸したり、泡層が肥大化する原因について鋭 意検討し、従来において着目されていなかった水蒸気濃度に着目することで、このよ うな問題を解決できることを見出した。 [0046] また、本発明者は、水蒸気濃度を 60mol%以下とすることで、溶融ガラス中の特定 の成分 (ホウ素等)の揮散を抑制することができるという効果を奏することをも見出した 。ホウ素等の成分の揮発を抑制することにより、ホウ素等の組成変動を防止できるとと もに、組成変動に起因する平坦度の悪化を抑制することができる。 [0045] In the past, there has been no study on the force / water vapor concentration in which the preferred pressure and temperature conditions in the vacuum degassing tank were presented. The present inventor has eagerly investigated the cause of sudden boiling or enlargement of the foam layer even when defoaming under the reduced-pressure defoaming conditions presented in the past. We found that such a problem can be solved by paying attention. [0046] Further, the present inventor has also found out that volatilization of a specific component (such as boron) in the molten glass can be suppressed by setting the water vapor concentration to 60 mol% or less. By suppressing volatilization of components such as boron, it is possible to prevent variations in composition of boron and the like, and it is possible to suppress deterioration in flatness due to composition variations.

また、揮発のしゃすい成分、例えば、 Cl、 F、 Sなどの揮散を抑制することもできるた め、これらの成分の組成変動を防止できるとともに、組成変動に起因する平坦度の悪 化を抑制することができる。  In addition, the volatilization of the volatile components such as Cl, F, and S can be suppressed, so that the composition fluctuation of these components can be prevented and the deterioration of the flatness caused by the composition fluctuation can be suppressed. can do.

これらの Cl、 F、 Sなどの成分は、水分の揮発に大きく影響を受けていると考えられ る。例えば、 Fは HFとして、 Sは H SOとして揮散すると考えられる。よって、減圧脱  These components such as Cl, F, and S are considered to be greatly affected by moisture volatilization. For example, F is considered to volatilize as HF and S as H 2 SO. Therefore, decompression release

2 4  twenty four

泡槽内の水分濃度をある一定量以下とすることで、水分の揮発に伴って揮散する上 記成分の変動を抑えることができると考えられる。  By setting the water concentration in the foam tank to a certain level or less, it is considered that fluctuations in the above components that volatilize with the volatilization of water can be suppressed.

また、ガラスの特性は、その用途によって非常に細かい規格が存在し、その規格に 適合するように非常に詳細にわたりガラスの組成が決められている。例えば、ホウ素 の含有量についても当然規格が存在する力 従来の方法では、ホウ素が揮散するた めより多くのホウ素を原料として用いる必要があった。また、従来では、ホウ素の揮散 する量は条件によってまちまちであり、場合によっては、ホウ素の含有量の規格を外 れる可能性があった。本発明においては、このような問題点が解消されており、有用 である。  In addition, there are very detailed specifications for the characteristics of glass depending on the application, and the composition of the glass is determined in great detail to meet the specifications. For example, there is naturally a standard for the content of boron. In the conventional method, since boron is volatilized, it is necessary to use more boron as a raw material. Conventionally, the amount of volatilization of boron varies depending on the conditions, and in some cases, the boron content may be out of specification. In the present invention, such problems are solved and useful.

この点からも、本発明のガラス製造方法、本発明の減圧脱泡装置及び本発明の水 分調整方法は、通常のガラスは言うに及ばず、特にポロシリケートガラスを製造する 場合に好ましく用いることができるとレ、える。  Also from this point, the glass production method of the present invention, the vacuum degassing apparatus of the present invention, and the water content adjustment method of the present invention are not limited to ordinary glass, and are preferably used particularly when producing a polysilicate glass. If you can do it, yeah

[0047] また、本発明におレ、て、減圧脱泡槽の内部の上部空間へ導入する低水分ガスは、 酸素濃度が空気中の酸素濃度よりも低いガスであることが好ましい。この酸素濃度は 、 15体積%以下であることが好ましぐ 10体積%以下であることがより好ましぐ 5体 積%以下であることが更に好ましい。また、前記低水分ガスは、酸素を含まない気体 、例えば Nガス、 Arガス、 CO等であることが好ましい。 [0047] Further, in the present invention, the low moisture gas introduced into the upper space inside the vacuum degassing tank is preferably a gas having an oxygen concentration lower than the oxygen concentration in the air. The oxygen concentration is preferably 15% by volume or less, more preferably 10% by volume or less, and even more preferably 5% by volume or less. The low moisture gas is preferably a gas not containing oxygen, such as N gas, Ar gas, CO, or the like.

2 2  twenty two

前記上部空間へ導入する前記低水分ガスの酸素濃度がこのような値であると、上 記のような泡層の薄層化に加え、減圧脱泡槽の材質として白金又は白金合金を用い ている場合に、その白金の酸化を抑制し、減圧脱泡槽の寿命を延ばし、更に、ガラス 製品において、この白金由来の欠陥の生成を抑制することができるので好ましい。 When the oxygen concentration of the low moisture gas introduced into the upper space is such a value, in addition to the thinning of the foam layer as described above, platinum or a platinum alloy is used as the material of the vacuum degassing tank. In this case, the oxidation of the platinum is suppressed, the life of the vacuum degassing tank is extended, and further, the generation of defects derived from platinum in the glass product can be suppressed.

[0048] 上記のように、本発明のガラス製造方法は、本発明の減圧脱泡工程を具備し、前 工程及び後工程として原料溶融工程及び成形工程を具備することが好ましレ、。この 原料溶融工程は、例えば従来公知のものでよぐ例えばガラスの種類に応じて約 14 00°C以上に加熱することによって原料を溶融する工程である。用いる原材料も製造 するガラスに適合させる原材料であれば特に限定されず、例えば硅砂、ホウ酸、石灰 石等の従来公知のものを最終ガラス製品の組成に合わせて調合した原材料を用い ること力 Sできる。この原材料は、所望の清澄剤を含んでもよい。また、この成形工程は 、例えば従来公知のものでよぐ例えばフロート成形工程、ロールアウト成形工程、フ ユージョン成形工程等が挙げられる。 [0048] As described above, the glass manufacturing method of the present invention preferably includes the vacuum degassing step of the present invention, and preferably includes a raw material melting step and a molding step as a pre-process and a post-process. This raw material melting step is, for example, a conventionally known one, for example, a step of melting the raw material by heating to about 1400 ° C. or higher according to the type of glass. The raw material to be used is not particularly limited as long as it is compatible with the glass to be produced. For example, it is possible to use raw materials prepared by mixing conventionally known materials such as cinnabar, boric acid and limestone according to the composition of the final glass product. it can. This raw material may contain the desired fining agent. The molding step may be a conventionally known one, for example, a float molding step, a roll-out molding step, a fusion molding step, or the like.

実施例  Example

[0049] 以下、実施例に基づいて本発明を具体的に説明する。ただし、本発明はこれに限 定されるものではない。  Hereinafter, the present invention will be specifically described based on examples. However, the present invention is not limited to this.

<実施例 1〉  <Example 1>

減圧脱泡を実施する雰囲気を再現するために、ガラス原料が入った白金製のるつ ぼを真空減圧容器内に配置した。るつぼを加熱してガラスを溶融させて、溶融ガラス の温度を 1420°Cとした。その後、真空減圧容器内の絶対圧力を 26. 7kPaとした。 ここで、用いたガラス原料の組成は次の通りである。  In order to reproduce the atmosphere in which vacuum degassing was performed, a platinum crucible containing glass raw materials was placed in a vacuum vacuum container. The crucible was heated to melt the glass, and the temperature of the molten glass was adjusted to 1420 ° C. Thereafter, the absolute pressure in the vacuum decompression vessel was set to 26.7 kPa. Here, the composition of the glass raw material used is as follows.

SiO : 59. 4%、 Al O : 17. 6%、 B O : 7. 9%、 MgO : 3. 2%、 CaO : 3. 7%、 Sr  SiO: 59.4%, Al 2 O: 17.6%, B 2 O: 7.9%, MgO: 3.2%, CaO: 3.7%, Sr

2 2 3 2 3  2 2 3 2 3

0 : 7. 9%、 BaO : 0. 1 %  0: 7.9%, BaO: 0.1%

なお、実施例;!〜 3は、図 1における減圧脱泡槽 12の代わりに、溶融ガラスが入つ た白金製のるつぼを用いて実験を行った力 このるつぼの実験の結果は、図 1にお ける減圧脱泡槽 12の結果と同等とみなすことが可能である。  The examples;! To 3 are the same as those shown in FIG. 1 except that the vacuum defoaming tank 12 shown in FIG. 1 was replaced by a platinum crucible containing molten glass. It can be regarded as equivalent to the result of the vacuum degassing tank 12 in this case.

[0050] 次いで、所望の水蒸気濃度に調整した大気を上記真空減圧容器内へ導入し、真 空減圧容器内の雰囲気の水蒸気濃度 (mol%)を様々な値に変化させ調整した。各 々の水蒸気濃度の場合について、溶融ガラス中の気泡を真空減圧装置に設けた司見 き窓から CCDカメラを用いて撮影した。そして、 30分経過後、るつぼ内で溶融ガラス を急冷し固化させ、固化後のサンプル中に存在する気泡(直径 100 m以上のもの をカウント)の数を測定して気泡密度(個/ kg)を求めた。ここで、溶融ガラスの質量 は 5. Okgであり、減圧前のガラス中の気泡の数は、各々の水蒸気濃度の場合でほぼ 同じィ直であった。 [0050] Next, air adjusted to a desired water vapor concentration was introduced into the vacuum decompression vessel, and the water vapor concentration (mol%) of the atmosphere in the vacuum decompression vessel was changed to various values for adjustment. For each water vapor concentration, the bubbles in the molten glass were photographed using a CCD camera from a viewing window provided in the vacuum decompressor. And after 30 minutes, molten glass in the crucible Was rapidly cooled and solidified, and the number of bubbles (counting those with a diameter of 100 m or more) present in the solidified sample was measured to obtain the bubble density (pieces / kg). Here, the mass of the molten glass was 5. Okg, and the number of bubbles in the glass before decompression was almost the same for each water vapor concentration.

結果を図 3に示す。  The results are shown in Figure 3.

[0051] 図 3から、真空減圧容器内の雰囲気の水蒸気濃度が高いほど、気泡が残存するこ とを確認できる。図 3において、横軸は雰囲気の水蒸気(水分)濃度を表し、縦軸は 気泡の数を Logでとつた値を表して!/、る。  [0051] From FIG. 3, it can be confirmed that bubbles remain as the water vapor concentration in the atmosphere in the vacuum decompression vessel increases. In Fig. 3, the horizontal axis represents the water vapor (moisture) concentration of the atmosphere, and the vertical axis represents the number of bubbles in Log!

なお、水蒸気濃度が 60mol%超の場合は、 CCDカメラで観察している際に溶融ガ ラス界面が急激に上昇し、 V、わゆる突沸現象が生じた。  When the water vapor concentration was more than 60 mol%, the molten glass interface rose rapidly while observing with a CCD camera, and V, a so-called bumping phenomenon occurred.

[0052] <実施例 2〉 <Example 2>

次に、上記の実施例 1と同様の装置を用い、真空減圧容器内の雰囲気の水蒸気濃 度を 70mol%、 47mol%、 31mol%、 3mol%として泡層の厚さを測定した。更に、 実施例 1では大気であった低水分ガスを N、 CO 、 Arとして、真空減圧容器内の雰  Next, using the same apparatus as in Example 1, the thickness of the foam layer was measured with the water vapor concentration of the atmosphere in the vacuum decompression vessel set to 70 mol%, 47 mol%, 31 mol%, and 3 mol%. Furthermore, in Example 1, the low moisture gas, which was air, was changed to N, CO, Ar, and the atmosphere in the vacuum decompression vessel.

2 2  twenty two

囲気の水蒸気濃度を各々 lmol%未満として、同様の試験を行った。ガラス組成は実 施例 1と同じである。  A similar test was conducted with the ambient water vapor concentration being less than lmol%. The glass composition is the same as in Example 1.

結果を第 1表に示す。  The results are shown in Table 1.

[0053] [表 1] 第 1表 [0053] [Table 1] Table 1

Figure imgf000018_0001
Figure imgf000018_0001

[0054] このように、水蒸気濃度が 70mol%であると泡層の厚さは 20mm以上となり、いわ ゆる突沸すること力確認できた。また、水蒸気濃度が、 3〜47mol%であると、;!〜 2m m程度の厚さの泡層が形成されたものの、突沸は確認されなかった。更に、雰囲気 が N、 CO又は Ar (水蒸気濃度が lmol%未満)であると、泡層は生じなかった。上 [0054] As described above, when the water vapor concentration is 70 mol%, the thickness of the foam layer becomes 20 mm or more. We were able to confirm the power to loosely bump. When the water vapor concentration was 3 to 47 mol%, a foam layer having a thickness of about! To 2 mm was formed, but no bumping was confirmed. Furthermore, when the atmosphere was N, CO or Ar (water vapor concentration was less than lmol%), no foam layer was formed. Up

2 2  twenty two

記の結果から、水蒸気濃度は 60mol%以下である必要がある。また、泡層の厚さは 1 From the above results, the water vapor concentration should be 60 mol% or less. The thickness of the foam layer is 1

5mm以下程度であることが好まし!/、。 It is preferable to be about 5mm or less!

[0055] <実施例 3〉 <Example 3>

実施例 2と同様の試験において、各種の雰囲気ごとに泡層内における気泡の収縮 速度を測定した。ここで、溶融ガラスは実施例 1と同じポロシリケートガラスを用いた。 結果を図 4に示す。なお、図 4において泡径は規格化した値を示している。規格化 とは、溶融ガラス内部の気泡が上昇し泡層へ到達した時の気泡径に対する各時間に おける気泡の径の比である。したがって、気泡が泡層へ到達した時が経過時間 Osで あり、その時の泡径が 1. 0である。  In the same test as in Example 2, the shrinkage rate of bubbles in the foam layer was measured for each type of atmosphere. Here, the same porosilicate glass as in Example 1 was used as the molten glass. The results are shown in Fig. 4. In FIG. 4, the bubble diameter is a normalized value. Normalization is the ratio of the bubble diameter at each time to the bubble diameter when the bubbles inside the molten glass rise and reach the bubble layer. Therefore, the time when the bubble reaches the bubble layer is the elapsed time Os, and the bubble diameter at that time is 1.0.

[0056] 図 4から、水蒸気濃度が 31mol%の大気の場合に対して、水蒸気濃度が 3mol% の大気、及び水蒸気濃度が lmol%以下の N、 CO又は Arの場合は、気泡の収縮 [0056] From FIG. 4, it is clear that air bubbles contract in the atmosphere with a water vapor concentration of 3 mol% and with N, CO, or Ar with a water vapor concentration of 1 mol% or less compared to the air with a water vapor concentration of 31 mol%.

2 2  twenty two

速度が速くなつた。  The speed got faster.

この結果から、雰囲気中の水蒸気濃度が低いほうが泡が収縮しやすい、つまり泡が 消失しやすく好ましいことが判明した。  From this result, it was found that the lower the water vapor concentration in the atmosphere, the easier the bubbles to shrink, that is, the bubbles easily disappear.

[0057] <実施例 4〉  <Example 4>

次に、減圧脱泡処理により泡が溶融ガラス表面に浮上しその後破泡 ·消滅する様 子を、各種の雰囲気水蒸気濃度(lmol% , 9mol% , 13mol% , 19mol% , 22mol % , 35mol% , 70mol%)及びガラス組成(ソーダライムガラス:組成 A、組成 B、組成 C)ごとに測定した。ここでは泡の様子の観察が可能となるように、 50ccの透明石英 ガラスビーカーを容器として用い、約 50gのガラスを溶解したときの泡層の厚さを測定 した。また溶融ガラス表面に浮上した泡の数 (B個)及び溶融ガラス表面に達して破  Next, the state of bubbles rising to the surface of the molten glass by vacuum defoaming treatment and then breaking and disappearing was determined using various atmospheric water vapor concentrations (lmol%, 9mol%, 13mol%, 19mol%, 22mol%, 35mol%, 70 mol%) and glass composition (soda lime glass: composition A, composition B, composition C). Here, a 50cc transparent quartz glass beaker was used as a container so that the state of the foam could be observed, and the thickness of the foam layer when about 50 g of glass was melted was measured. In addition, the number of bubbles that floated on the surface of the molten glass (B) and reached the surface of the molten glass

S  S

泡-消滅した泡の数 (B個)を CCDカメラで観察してカウントし、破泡率の値 (B /B  Bubbles-The number of bubbles that disappeared (B) was observed with a CCD camera and counted, and the bubble breakage rate (B / B

B B S  B B S

%)を算出した。泡層の厚さ(mm)及び破泡率(%)下記表 2に示す。  %) Was calculated. The thickness of the foam layer (mm) and the bubble breaking rate (%) are shown in Table 2 below.

[0058] なお、いずれのサンプルの場合も溶融ガラスの温度を 1200°Cに加熱した。容器内 の絶対圧力は、組成 Aの場合 18. 7kPa、組成 Bの場合 10. 3kPa、組成 Cの場合 14 . 4kPaとした。また、組成 A、組成 B、組成 Cにおける各成分の含有率は下記表 3に 示すとおりとした。表 3における%は質量%を示す。 [0058] In all cases, the temperature of the molten glass was heated to 1200 ° C. The absolute pressure in the container is 18.7 kPa for composition A, 10.3 kPa for composition B, and 14 for composition C. 4 kPa. The content of each component in Composition A, Composition B, and Composition C was as shown in Table 3 below. In Table 3, “%” indicates mass%.

[0059] [表 2] [0059] [Table 2]

表 2  Table 2

Figure imgf000020_0001
Figure imgf000020_0001

[0060] [表 3] [0060] [Table 3]

表 3  Table 3

Figure imgf000020_0002
表 2から、容器内の雰囲気の水蒸気濃度が高いほど破泡率が低ぐ気泡が残存す ることを確認できる。具体的には、雰囲気の水蒸気濃度が 60mol%を超えると泡層が 20mm以上の厚さとなる力 60mol%以下であると泡層が薄くなることが確認できる。 なお、水蒸気濃度が 60mol%超の場合は、 CCDカメラで観察している際に溶融ガラ ス界面が急激に上昇し、いわゆる突沸現象が生じた。また、容器内の雰囲気の水蒸 気濃度が 15mol%未満の場合、破泡率が高くなり、好ましいことが分かった。すなわ ち、容器内の雰囲気の水蒸気濃度が 60mol%以下であると突沸現象を防止でき泡 層を薄くすることができるとともに、前記水蒸気濃度をさらに低くすると破泡率が高くな り泡が消滅することが判明した。
Figure imgf000020_0002
From Table 2, it can be confirmed that bubbles with a lower bubble breaking rate remain as the water vapor concentration in the atmosphere in the container increases. Specifically, it can be confirmed that if the water vapor concentration in the atmosphere exceeds 60 mol%, the foam layer becomes thin when the force is 60 mol% or less, which gives the foam layer a thickness of 20 mm or more. When the water vapor concentration was over 60 mol%, the melting glass interface rose rapidly during observation with a CCD camera, and so-called bumping phenomenon occurred. In addition, steaming the atmosphere in the container It was found that when the gas concentration is less than 15 mol%, the bubble breaking rate is high, which is preferable. In other words, if the water vapor concentration in the atmosphere in the container is 60 mol% or less, the bumping phenomenon can be prevented and the foam layer can be made thinner, and if the water vapor concentration is further reduced, the bubble breaking rate increases and the bubbles disappear. Turned out to be.

産業上の利用可能性 Industrial applicability

本発明は、溶融ガラスの減圧脱泡装置及び減圧脱泡工程を具備するガラス製造方 法に適用でき、特に泡の少ない高品質のディスプレイ用ガラスの製造に好適である。 なお、 2006年 8月 30曰に出願された曰本特許出願 2006— 233441号の明細書 、特許請求の範囲、図面及び要約書の全内容をここに引用し、本発明の明細書の開 示として、取り入れるものである。  INDUSTRIAL APPLICABILITY The present invention can be applied to a glass manufacturing method including a vacuum degassing apparatus and a vacuum degassing process for molten glass, and is particularly suitable for manufacturing high-quality display glass with few bubbles. It should be noted that the entire contents of the specification, claims, drawings and abstract of Japanese Patent Application No. 2006-233441, filed on August 30, 2006, are hereby incorporated herein by reference. As it is incorporated.

Claims

請求の範囲 The scope of the claims [1] 減圧脱泡槽の雰囲気ガスの水蒸気濃度を 60mol%以下として、溶融ガラスを減圧 脱泡する工程を具備する、ガラス製造方法。  [1] A glass production method comprising a step of degassing molten glass under reduced pressure by setting the water vapor concentration of the atmospheric gas in the vacuum degassing tank to 60 mol% or less. [2] 前記減圧脱泡槽の雰囲気ガスへ低水分ガスを導入することにより、前記雰囲気ガ スの水蒸気濃度を 60mol%以下とする、請求項 1に記載のガラス製造方法。 [2] The glass manufacturing method according to claim 1, wherein a water vapor concentration of the atmosphere gas is set to 60 mol% or less by introducing a low moisture gas into the atmosphere gas of the vacuum degassing tank. [3] 前記雰囲気ガスの水蒸気濃度を 30mol%以下とする、請求項 1又は 2に記載のガ ラス製造方法。 [3] The glass manufacturing method according to claim 1 or 2, wherein the atmospheric gas has a water vapor concentration of 30 mol% or less. [4] 前記低水分ガスの酸素濃度(体積%)が空気中の酸素濃度(体積%)よりも低い、 請求項 2又は 3に記載のガラス製造方法。  4. The glass production method according to claim 2, wherein the oxygen concentration (volume%) of the low moisture gas is lower than the oxygen concentration (volume%) in the air. [5] 前記低水分ガスの酸素濃度(体積%)が 15体積%以下である、請求項 4に記載の ガラス製造方法。 5. The glass production method according to claim 4, wherein the oxygen concentration (volume%) of the low moisture gas is 15 volume% or less. [6] 溶融ガラスを減圧脱泡するための減圧脱泡槽の雰囲気ガスの水蒸気濃度を測定し 、その水蒸気濃度の測定結果に基いて、前記減圧脱泡槽の前記雰囲気ガスへ低水 分ガスを導入することにより、前記減圧脱泡槽の前記雰囲気ガスの水蒸気濃度を 60 mol%以下に調整するガラス製造方法。  [6] The water vapor concentration of the atmospheric gas in the vacuum degassing tank for vacuum degassing of the molten glass is measured, and the low moisture gas is supplied to the atmospheric gas in the vacuum degassing tank based on the measurement result of the water vapor concentration. A glass manufacturing method in which the water vapor concentration of the atmospheric gas in the vacuum degassing tank is adjusted to 60 mol% or less by introducing. [7] 減圧吸引される減圧ハウジングと、この減圧ハウジング内に設けられ、溶融ガラスの 減圧脱泡を行う減圧脱泡槽と、この減圧脱泡槽に連通して設けられ、減圧脱泡前の 溶融ガラスを前記減圧脱泡槽に導入する導入手段と、前記減圧脱泡槽に連通して 設けられ、減圧脱泡後の溶融ガラスを前記減圧脱泡槽から導出する導出手段とを有 する溶融ガラスの減圧脱泡装置であって、  [7] A decompression housing to be sucked under reduced pressure, a decompression deaeration tank provided in the decompression housing for performing decompression defoaming of the molten glass, and provided in communication with the decompression defoaming tank, Melting having introducing means for introducing the molten glass into the vacuum degassing tank, and deriving means provided in communication with the vacuum degassing tank and for deriving the molten glass after the vacuum degassing from the vacuum degassing tank A vacuum degassing device for glass, 前記減圧脱泡槽の雰囲気ガスの水蒸気濃度を測定する水蒸気濃度測定手段と、 前記減圧脱泡槽の内部の上部空間へ低水分ガスを導入する低水分ガス導入手段 と  Water vapor concentration measuring means for measuring the water vapor concentration of the atmospheric gas in the vacuum degassing tank; and low moisture gas introducing means for introducing low moisture gas into the upper space inside the vacuum degassing tank; を更に有する溶融ガラスの減圧脱泡装置。  A vacuum degassing apparatus for molten glass further comprising: [8] 前記減圧脱泡装置に、前記雰囲気ガスの水蒸気濃度を所望の値となるように制御 できる水蒸気濃度制御手段と、前記制御手段からの信号により低水分ガスの導入量 を制御するガス量制御手段をさらに有する請求項 7に記載の減圧脱泡装置。  [8] A water vapor concentration control means that can control the water vapor concentration of the atmospheric gas to a desired value in the vacuum degassing apparatus, and a gas amount that controls the amount of low moisture gas introduced by a signal from the control means The vacuum degassing apparatus according to claim 7, further comprising a control means. [9] 前記低水分ガス導入手段が、減圧脱泡槽の上流側に設けられている請求項 7又は に記載の溶融ガラスの減圧脱泡装置。 [9] The low moisture gas introducing means is provided on the upstream side of the vacuum degassing tank or A vacuum degassing apparatus for molten glass as described in 1.
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CN101506109A (en) 2009-08-12
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JP5434077B2 (en) 2014-03-05

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