WO2008019670A2 - Method for generating oxidic nanoparticles from a material forming oxide particles by film evaporation - Google Patents
Method for generating oxidic nanoparticles from a material forming oxide particles by film evaporation Download PDFInfo
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- WO2008019670A2 WO2008019670A2 PCT/DE2007/001444 DE2007001444W WO2008019670A2 WO 2008019670 A2 WO2008019670 A2 WO 2008019670A2 DE 2007001444 W DE2007001444 W DE 2007001444W WO 2008019670 A2 WO2008019670 A2 WO 2008019670A2
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G9/00—Compounds of zinc
- C01G9/02—Oxides; Hydroxides
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
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- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
- C30B7/005—Epitaxial layer growth
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- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Definitions
- the invention relates to the production of oxide nanoparticles from an oxide particle-forming material, in particular metal oxide particles, and to the formation of a film of such particles on any substrate.
- Nanostructures which themselves are nanoparticles or formed by even distribution and / or regular arrangement of nanoparticles on a substrate, are currently the focus of current research. They represent a class of materials that u. a. due to quantum effects have novel electrical, optical, magnetic and thermodynamic properties. Alongside the primarily academic questions, there is also the problem of reproducible mass production with the simplest possible means for promptly reaching the area of commercial use of nanostructures.
- VLS Vapor Liquid Solid
- MOCV Metal Organic Chemical Vapor Deposition
- ZnO zinc oxide
- the method described in DE 10 2005 060 407 A1 has the disadvantage that it is not readily suitable for coating any desired substrates. Obviously, there are problems with curved, locally recessed or even angled substrate surfaces, if the vaporizing drops are to slide over it. Moreover, the substrate must withstand temperatures above 200 ° C. for a longer time - although it should not oxidize, which restricts the selection of materials, inter alia, in the field of plastics.
- the invention further provides that at least the top of the body of water is freely accessible. It turns out, namely, that the nanoparticles formed according to the invention undergo buoyancy after their formation, which preferably takes place on the underside of the water body, and finally float in large numbers on the water surface. Upon immersion of a substantially arbitrary substrate into the body of water from the surface provided with floating particles they bind immediately to the substrate, so that the substrate is coated after pulling out with a relatively firmly adhering nanoparticle film.
- Fig. 2 shows the known "boiling curve" for water, in which the amount of heat transferred into the body of water is plotted against ⁇ T;
- FIG 3 shows a silicon substrate coated according to the invention with ZnO particles.
- a FEBOR realizes in a manner known per se the continued film boiling of a liquid.
- the heating of the water body differs from one of its interfaces as a function of the temperature difference ⁇ T between body of water and heating surface.
- ⁇ T ⁇ 5 K
- the heat transfer is predominantly convective and with sporadic formation of isolated water vapor bubbles on the heated wall, which possibly detach, rise in the water body and thereby dissolved again (see Fig. 1 left picture).
- ⁇ T is further increased to values of up to 30 K, increased bubble formation takes place gradually, whereby these are formed over a large area, in a more rapid manner
- the reason lies in the increased evaporation in the immediate vicinity of the heated wall.
- the steam can no longer be absorbed and removed by the body of water quickly, so that an insulating cushion of steam between the water and the wall forms over ever larger areas.
- the minimal heat transfer apparently occurs when the entire heating surface is covered by a vapor film, which largely prevents the convective heat transfer. This state marks the onset of film boiling (see Fig. 1 right picture).
- a FlBOR has the task of inducing film boiling and maintaining it by means of suitable control, such as heating temperature.
- FIBOR The exact design of the FIBOR lies within the scope of the expert's actions. However, it should be emphasized that a FIBOR advantageously designed for the purpose of the invention should allow free access to the surface of the water body in order to carry out the inventive dip coating of substrates with nanoparticles. Therefore, a FIBOR appears as an open trough a heater acting from the underside is configured, particularly suitable for the realization of the invention.
- the erfmdungshacke method requires no defined Ataiosphotin- conditions, and in particular no pressure is required. It can be done in indoor air in any laboratory.
- the FIBOR only needs to be supplied with energy (heat) and an aqueous metal salt solution that can be produced quickly and at short notice. Catalysts are not absolutely necessary, and in principle no dangerous by-products are formed.
- Nanoparticles on the water surface and the coating of a substrate by immersion in the solution require a total of only a few minutes. The process is thus many times faster than other wet-chemical processes in which particle growth takes place.
- FIG. 3 shows electron microscope images of a film of zinc oxide nanoparticles prepared according to the invention on a silicon substrate in two magnifications.
- a laboratory hotplate was initially preheated to 250- 270 0 C.
- a 100 ml beaker of aqueous zinc acetate solution was placed on the preheated plate. Measurements prove that the temperature of the underside of the glass corresponded to that of the heating plate after 1-2 minutes.
- XRD X-ray diffraction
- EDX X-ray analysis
- X-Ray diffraction X-ray diffraction
- the substrate is coated with the particle film by immersion in water under atmospheric pressure, the temperature to which the substrate is exposed is practically limited to about 100 ° C. upward. Therefore, both prestructured and some organic substrates can be provided for coating, provided that only the particles produced adhere to them.
- substrates of commercially available, chemically inert polymers such as polymethymethacrylate (PMMA) or any fluoropolymer (eg Teflon®).
- PMMA polymethymethacrylate
- Teflon® fluoropolymer
- the adhesion of the nanoparticles can be favored by a controlled, temperature-induced softening of the polymers.
- the example zinc oxide should not be understood as limiting in analogy to DE 10 2005 060 407 A1. Research in this field is still in its infancy, but it is already clear today that other particles, in particular metal oxide particles, can also be produced in the same way. Of particular commercial importance is titanium dioxide (e.g., as a UV absorber).
- the oxygen to form the oxide particles may be provided by thermal dissociation of water molecules.
- the oxygen dissolved in the solution plays a role in the reaction. If this is confirmed, the monitoring and, if necessary, control of the dissolved oxygen concentration should be considered when constructing a continuous FIBOR. This can be realized by a simple gas pump, which sucks in, for example, room air and via a pipe in the reactor vessel lent possible in the vicinity of the reactive water / water vapor phase boundary passes. Alternatively, one can also initiate pure oxygen from bottles.
- the film boiling is a fixed term, which is associated with the minimum of heat transfer into the fluid as a starting point.
- film boiling should also refer to the case of a possibly (not yet) contiguous vapor film (usually referred to as "transition boiling"), insofar as it is already capable of producing nanoparticles 10 2005 060 407 Al it can be assumed that the nanoparticles can be formed as early as above a wall temperature above 200 ° C, where classic film boiling does not necessarily have to be used, which is why film boiling in the sense of the invention should be understood broadly.
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Abstract
Description
Verfahren zur Erzeugung von oxidischen Nanopartikeln aus einem Oxidpartikel bildenden Material A method of producing oxide nanoparticles from an oxide particle-forming material
Die Erfindung betrifft die Erzeugung von oxidischen Nanopartikeln aus einem Oxidpartikel bildenden Material, insbesondere Metalloxid-Partikeln, und das Bilden eines Films solcher Partikel auf einem beliebigen Substrat.The invention relates to the production of oxide nanoparticles from an oxide particle-forming material, in particular metal oxide particles, and to the formation of a film of such particles on any substrate.
Nanostrukturen, die selbst Nanopartikel sind oder durch gleichmäßige Verteilung und/oder regelmäßige Anordnung von Nanopartikeln auf einem Substrat gebildet werden, stehen zurzeit im Fokus aktueller Forschung. Sie repräsentieren eine Klasse von Materialen, die u. a. aufgrund von Quanteneffekten neuartige elektrische, optische, magnetische und thermodynamische Eigenschaften aufweisen. Neben den vorrangig akademischen Fragen stellt sich dabei auch das Problem der reproduzierbaren Massenfertigung mit möglichst einfachen Mitteln, um zeitnah den Bereich der gewerblichen Nutzung von Nanostrukturen zu erreichen.Nanostructures, which themselves are nanoparticles or formed by even distribution and / or regular arrangement of nanoparticles on a substrate, are currently the focus of current research. They represent a class of materials that u. a. due to quantum effects have novel electrical, optical, magnetic and thermodynamic properties. Alongside the primarily academic questions, there is also the problem of reproducible mass production with the simplest possible means for promptly reaching the area of commercial use of nanostructures.
Zum allgemeinen, die Herstellung von Nanostrukturen betreffenden Stand der Technik wird auf die folgenden Druckschriften verwiesen: D. Rovillain et al.: ,^iIm boi- ling chemical vapor Infiltration - An experimental study on carbon/carbon composi- te materials", Carbon 39, pp. 1355-1365 (2001); BJ. Urban und CT. Avedisian, W. Tsang: „The Film Bioling Reactor: A New Environment for Chemical Processing",For the general state of the art relating to the production of nanostructures, reference is made to the following references: D. Rovillain et al .: "Boiling Chemical Vapor Infiltration - An Experimental Study on Carbon / Carbon Composites", Carbon 39 Urban and CT, Avedisian, W. Tsang: "The Film Bioling Reactor: A New Environment for Chemical Processing", pp. 1355-1365 (2001);
AlChE J. 52(7), pp. 2582-2595 (2006); DE 10 2005 060 407 B3; DE 103 92 447 T5; Dongsheng Wen und Yulong Ding: ,ßxperimental investigation into thepool boiling heat transfer of aqueous based γ-alumina nanofluids", Journal of Nanoparticle Research 7, pp. 265-274 (2005) und S.M. You, J.H. Kim, K.H. Kim: "Effect ofnano- particles on critical heat flux of water in pool boiling heat transfer", Appl. Phys.AlChE J. 52 (7), pp. 2582-2595 (2006); DE 10 2005 060 407 B3; DE 103 92 447 T5; Dongsheng Wen and Yulong Ding: "Experimental investigation into the pool boiling heat transfer of aqueous γ-alumina nanofluids", Journal of Nanoparticle Research 7, pp. 265-274 (2005) and SM You, JH Kim, KH Kim: "Effect of nanotechnology particles on critical heat flux of water in pool boiling heat transfer ", Appl.
Lett. 83(16), pp. 2274-2276 (2003). Insbesondere ist die Erzeugung eines gleichmäßig verteilten Films aus Nanopartikel auf der Oberfläche eines Substrats ist bis heute ein schwieriger Prozess, der üblich mit mehreren Schritten und hohen Kosten verbunden ist, insbesondere wenn die Na- nopartikel überdies in bestimmter Weise angeordnet werden sollen. Typische Verfahren für die Herstellung solcher Strukturen sind Vapour Liquid Solid (VLS) oder MOCV Verfahren. Zwar sind diese Verfahren relativ universell anwendbar, aber sowohl die Kontrolle der Atmosphäre (UHV) als auch die Notwendigkeit hoher Temperaturen (600-10000C) verlangen teures Equipment und machen die Synthese zeit- aufwendig. Vorstrukturierte Substrate wie z.B. MEMS können solch hohen Temperaturen nicht ohne weiteres ausgesetzt werden.Lett. 83 (16), pp. 2274-2276 (2003). In particular, the production of a uniformly distributed film of nanoparticles on the surface of a substrate is still a difficult process, which is usually associated with several steps and high costs, especially if the nanoparticles are to be arranged in a certain way. Typical processes for the preparation of such structures are Vapor Liquid Solid (VLS) or MOCV processes. Although these methods are relatively universally applicable, but both the control of the atmosphere (UHV) and the need for high temperatures (600-1000 0 C) require expensive equipment and make the synthesis time-consuming. Pre-structured substrates such as MEMS can not readily be exposed to such high temperatures.
Zur Reduktion des Aufwandes kennt der Fachmann ebenfalls nasschemische Herstellungsverfahren aus wässriger Lösung, die bei Temperaturen unter 100 C° und bei Atmosphärendruck zu den gewünschten Ergebnissen fuhren (z.B. siehe Law et al.,To reduce the expense, the person skilled in the art also knows aqueous-solution wet-chemical preparation processes which achieve the desired results at temperatures below 100 ° C. and at atmospheric pressure (see, for example, Law et al.
,JJanowire dye-sensitized solar cells", nature materials, 4, 455-459, 2005). Allerdings haben die nasschemischen Methoden neben ihrem sehr langsamen Ablauf (Prozesszeiten von mehreren Stunden bis Tagen) andere Nachteile. So ist etwa kein epitaktisches Wachstum auf Silizium möglich (siehe J. Phys. Chem. B 2001, 105, 3350-3352). Außerdem kommen in manchen Fällen auch Lösungsmittel zum Einsatz, die ein Entsorgungsproblem mit sich bringen.However, the wet-chemical methods have other disadvantages in addition to their very slow process (process times of several hours to days), such as no epitaxial growth on silicon possible (see J. Phys.Chem.A B 2001, 105, 3350-3352) In addition, solvents are also sometimes used which cause a disposal problem.
Beispielsweise ist man heute sehr an der Herstellung von Zinkoxid (ZnO) Nanostruk- turen, etwa Nanostäbchen und Nanoröhren, interessiert. Dies ist schon deshalb der Fall, weil ZnO als Halbleiter eine große Variation an Nanostrukturen bilden kann.For example, one is currently very interested in the production of zinc oxide (ZnO) nanostructures, such as nanorods and nanotubes. This is the case because ZnO, as a semiconductor, can form a large variety of nanostructures.
Überdies werden vielseitige Anwendungen als optoelektronische Bauteile, Laser, Feldemissions- und Gassensor-Materialien erwogen (zur Herstellung und Anwendung von Nanoröhren und Nanostäbchen siehe auch Advanced Materials 2005, 17, 2477). Um nun ZnO-Strukturen epitaktisch zu erzeugen werden entweder spezielle Substrate wie Galliumnitrid (GaN) benutzt oder Silizium-Substrate mit einem so genannten "Seeding Layer" beschichtet, der meistens aus einem bei 400 C° erhitzten ZnO Dünnfilm besteht.Moreover, versatile applications as optoelectronic devices, lasers, field emission and gas sensor materials are considered (for the fabrication and application of nanotubes and nanorods see also Advanced Materials 2005, 17, 2477). In order to epitaxially produce ZnO structures, either special substrates such as gallium nitride (GaN) are used or silicon substrates are coated with a seeding layer, which usually consists of a ZnO thin film heated at 400 ° C.
Eine direkte, nicht eptitaktische Herstellung flächig verteilter ZnO-Strukturen auf Substraten geht aus der Patentanmeldung DE 10 2005 060 407 Al hervor. Dabei werden Metallsalze, insbesondere Zinkacetat, in Wasser gelöst und auf ein zuvor er- hitztes Substrat (z.B. Heizplatte) getropft. Die Tropfen verdampfen, wobei sie auf dem Dampfpolster schweben (Leidenfrost-Effekt), und auf der benetzten Substratfläche verbleiben verteilte Nanostrukturen, insbesondere etwa kleine Büschel aus ZnO- Drähten.A direct, not eptitaktische production of distributed ZnO structures on substrates is shown in the patent application DE 10 2005 060 407 Al. In this case, metal salts, in particular zinc acetate, are dissolved in water and applied to a previously heated substrate (eg heating plate) dripped. The droplets evaporate, floating on the vapor cushion (Leidenfrost effect), and on the wetted substrate surface remain distributed nanostructures, especially about small tufts of ZnO wires.
Der Leidenfrost-Effekt erscheint wesentlich für die Bildung der Nanopartikel aus den zuvor in Wasser gelösten Metallionen. Hierfür wird eine sehr schnell ablaufende Reaktionskinetik im Nichtgleichgewicht an der Phasengrenze Fluid/Wasserdampf an der Unterseite des Tropfens als Ursache angenommen. Die genaue Natur der Prozes- se dort ist bislang nicht geklärt.The Leidenfrost effect appears essential for the formation of nanoparticles from the metal ions previously dissolved in water. For this purpose, a very fast reaction kinetics in the non-equilibrium at the phase boundary fluid / water vapor at the bottom of the drop is taken as the cause. The exact nature of the processes there is not yet clear.
Neben weiteren Vorteilen z.B. hinsichtlich der gerichteten Anordnung von Nano- drähten hat das in der DE 10 2005 060 407 Al beschriebene Verfahren allerdings den Nachteil, dass es nicht ohne weiteres zur Beschichtung beliebiger Substrate ge- eignet ist. Offensichtlich treten Probleme bei gekrümmten, lokal vertieften oder erst recht abgewinkelten Substratoberflächen auf, wenn die verdampfenden Tropfen darüber gleiten sollen. Überdies muss das Substrat Temperaturen oberhalb von 200 0C für längere Zeit standhalten - wobei es auch nicht oxidieren soll, was die Materialauswahl u. a. im Bereich der Kunststoffe einschränkt.However, in addition to further advantages, for example with respect to the directional arrangement of nanowires, the method described in DE 10 2005 060 407 A1 has the disadvantage that it is not readily suitable for coating any desired substrates. Obviously, there are problems with curved, locally recessed or even angled substrate surfaces, if the vaporizing drops are to slide over it. Moreover, the substrate must withstand temperatures above 200 ° C. for a longer time - although it should not oxidize, which restricts the selection of materials, inter alia, in the field of plastics.
Es ist jedoch in einer kürzlich erschienenen Arbeit (Urban and Avedisian, „The Film Boiling Reactor: A New Environment for Chemical Processing", AIChE Journal, 52, 1, S. 2582-2595 (2006)) darauf hingewiesen worden, dass der Prozess des Filmsie- dens („film boiling"), der dem Leidenfrost-Effekt ähnelt, effektive chemische Um- Setzungen ermöglicht. Konkret wird dort ein so genannter FIBOR („film boiling reactor") zur Erzeugung von Wasserstoffgas aus Methanol beschrieben.However, it has been noted in a recent work (Urban and Avedisian, "The Film Boiling Reactor: A New Environment for Chemical Processing," AIChE Journal, 52, 1, pp. 2582-2595 (2006)) that the process Film boiling, similar to the Leidenfrost effect, enables effective chemical reactions. Specifically, a so-called FIBOR ("film boiling reactor") for the production of hydrogen gas from methanol is described there.
Es ist daher die Aufgabe der Erfindung, ein Verfahren zur schnellen Erzeugung von Nanopartikeln anzugeben, das zugleich ein sehr einfaches Aufbringen von Filmen solcher Partikel aufweitgehend beliebige Substrate erlaubt.It is therefore the object of the invention to provide a method for the rapid production of nanoparticles, which at the same time allows a very simple application of films of such particles aufweitgehend any substrates.
Die Aufgabe wird gelöst durch ein Verfahren mit den Merkmalen des Hauptanspruchs. Die Unteransprüche geben vorteilhafte Ausgestaltungen des Verfahrens an.The object is achieved by a method having the features of the main claim. The dependent claims indicate advantageous embodiments of the method.
Erfindungsgemäß ist die Erzeugung der Nanopartikel durch chemische Umsetzung von in Wasser gelösten Ionen, insbesondere Metallionen, an der Phasengrenze Was- - A -According to the invention, the generation of the nanoparticles by chemical reaction of ions dissolved in water, in particular metal ions, at the phase boundary of water. - A -
serAVasserdampf zwischen dem Wasserkörper und einer dem Wasserkörper Wärme zuführenden Fläche (z.B. Heizplatte) vorgesehen. Insofern wird das Konzept der Partikelerzeugung aus der DE 10 2005 060 407 Al übernommen. Die Realisierung dieser Konfiguration erfolgt jedoch hier nicht durch Auftropfen der Lösung, sondern durch Filmsieden in einem ggf. kontinuierlich arbeitenden Reaktor. Das Acronymwater vapor is provided between the water body and a body of water heat supplying surface (e.g., hot plate). In this respect, the concept of particle production is taken from DE 10 2005 060 407 A1. However, the realization of this configuration does not occur here by dripping the solution, but by film boiling in an optionally continuously operating reactor. The acronym
FIBOR wird im Folgenden für diesen Reaktor übernommen.FIBOR is assumed below for this reactor.
Die Erfindung sieht ferner vor, dass wenigstens die Oberseite des Wasserkörpers frei zugänglich ist. Es zeigt sich nämlich, dass die erfmdungsgemäß gebildeten Nanopar- tikel nach ihrer Bildung, die vorzugsweise an der Unterseite des Wasserkörpers stattfindet, Auftrieb erfahren und schließlich in großer Zahl auf der Wasseroberfläche schwimmen. Beim Eintauchen eines weitgehend beliebigen Substrates in den Wasserkörper von der mit schwimmenden Partikeln versehenen Oberfläche her binden diese sofort an das Substrat, so dass das Substrat nach dem Herausziehen mit einem relativ fest haftenden Nanopartikelfilm überzogen ist.The invention further provides that at least the top of the body of water is freely accessible. It turns out, namely, that the nanoparticles formed according to the invention undergo buoyancy after their formation, which preferably takes place on the underside of the water body, and finally float in large numbers on the water surface. Upon immersion of a substantially arbitrary substrate into the body of water from the surface provided with floating particles they bind immediately to the substrate, so that the substrate is coated after pulling out with a relatively firmly adhering nanoparticle film.
Die Erfindung wird nachfolgend näher erläutert. Dazu dienen auch die folgenden Abbildungen:The invention will be explained in more detail below. The following illustrations also serve this purpose:
Fig. 1 skizziert das unterschiedliche Siedeverhalten von Wasser für verschiedene Werte der Temperaturdifferenz ΔT = Twand - Twasser zwischen einer Wärmeenergie abgebenden, mit dem Wasser kontaktierten Wand und dem Wasserkörper selbst;FIG. 1 outlines the different boiling behavior of water for different values of the temperature difference ΔT = Twan d - Twereer between a wall emitting heat energy and the water body itself contacting the water;
Fig. 2 zeigt die bekannte „boiling curve" für Wasser, in der die in den Wasserkörper übertragene Wärmemenge gegen ΔT aufgetragen ist;Fig. 2 shows the known "boiling curve" for water, in which the amount of heat transferred into the body of water is plotted against ΔT;
Fig. 3 zeigt ein erfindungsgemäß mit ZnO-Partikeln beschichtetes Silizium- Substrat.3 shows a silicon substrate coated according to the invention with ZnO particles.
Ein FEBOR realisiert in an sich bekannter Weise das fortgesetzte Filmsieden einer Flüssigkeit. Speziell für Wasser ist bekannt, dass das Erhitzen des Wasserkörpers von einer seiner Grenzflächen her unterschiedlich verläuft in Abhängigkeit vom Temperaturunterschied ΔT zwischen Wasserkörper und Heizfläche. Für ΔT < 5 K erfolgt der Wärmetransport überwiegend konvektiv und unter sporadischer Bildung vereinzelter Wasserdampfblasen an der beheizten Wand, die sich ggf. ablösen, im Wasserkörper aufsteigen und dabei wieder aufgelöst werden (vgl. Fig. 1 linkes Bild). Erhöht man ΔT weiter auf Werte bis zu 30 K, findet nach und nach ver- stärkte Blasenbildung statt, wobei diese großflächig gebildet werden, sich in rascherA FEBOR realizes in a manner known per se the continued film boiling of a liquid. Especially for water, it is known that the heating of the water body differs from one of its interfaces as a function of the temperature difference ΔT between body of water and heating surface. For ΔT <5 K, the heat transfer is predominantly convective and with sporadic formation of isolated water vapor bubbles on the heated wall, which possibly detach, rise in the water body and thereby dissolved again (see Fig. 1 left picture). If ΔT is further increased to values of up to 30 K, increased bubble formation takes place gradually, whereby these are formed over a large area, in a more rapid manner
Folge ablösen und bis zur Wasseroberfläche aufsteigen (vgl. Fig. 1 mittleres Bild). Aus Fig. 2 ist zu entnehmen, dass die in den Wasserkörper abgeführte Wärmemenge vom Beginn der verstärkten Blasenbildung an bis zum Erreichen von ΔT = 30 K besonders stark zunimmt.Remove the string and ascend to the water surface (see Fig. 1 middle picture). From Fig. 2 it can be seen that the amount of heat dissipated in the body of water from the beginning of the increased bubbling until reaching ΔT = 30 K increases particularly strong.
In der Tat sind gewöhnliche Haushaltsherde aus diesem Grund so eingerichtet, dass die Herdplatten absolute Temperaturen um 130 0C erreichen.In fact, ordinary household stoves are designed for this reason so that the stoves reach absolute temperatures around 130 0 C.
Fig. 2 zeigt ebenfalls den Befund, dass die Wärmeübertragung in den Wasserkörper für noch höhere ΔT wieder abnimmt und bei ungefähr ΔT = 200 K ein Minimum erreicht. Der Grund liegt in der verstärkten Verdampfung in unmittelbarer Umgebung der beheizenden Wand. Der Dampf kann nicht mehr schnell genug vom Wasserkörper aufgenommen und abgeführt werden, so dass sich ein isolierendes Dampfpolster zwischen Wasser und Wand über immer größere Flächen ausbildet. Hierin liegt die Analogie zum bekannten Leidenfrost-Effekt. Die minimale Wärmeübertragung tritt offenbar ein, wenn die gesamte Heizfläche von einem Dampffilm bedeckt ist, was den konvektiven Wärmetransport weitgehend unterbindet. Dieser Zustand markiert das Einsetzen des Filmsiedens (vgl. Fig. 1 rechtes Bild). Ein FlBOR hat die Aufgabe, das Filmsieden herbeizuführen und durch geeignete Regelung - etwa der Heiztempe- ratur - aufrecht zu erhalten.FIG. 2 also shows the finding that the heat transfer into the water body decreases again for even higher ΔT and reaches a minimum at approximately ΔT = 200 K. The reason lies in the increased evaporation in the immediate vicinity of the heated wall. The steam can no longer be absorbed and removed by the body of water quickly, so that an insulating cushion of steam between the water and the wall forms over ever larger areas. Herein lies the analogy to the known Leidenfrost effect. The minimal heat transfer apparently occurs when the entire heating surface is covered by a vapor film, which largely prevents the convective heat transfer. This state marks the onset of film boiling (see Fig. 1 right picture). A FlBOR has the task of inducing film boiling and maintaining it by means of suitable control, such as heating temperature.
Die genaue Ausgestaltung des FIBOR liegt im Rahmen des fachmännischen Handelns. Es soll jedoch betont werden, dass ein für den Zweck der Erfindung vorteilhaft ausgebildeter FIBOR den freien Zugang zur Oberfläche des Wasserkörpers gestatten sollte, um die erfϊndungsgemäße Tauchbeschichtung von Substraten mit Nanoparti- keln vorzunehmen.. Von daher erscheint ein FIBOR, der als offener Trog mit einer von der Unterseite her wirkenden Heizeinrichtung ausgestaltet ist, besonders geeignet zur Realisierung der Erfindung.The exact design of the FIBOR lies within the scope of the expert's actions. However, it should be emphasized that a FIBOR advantageously designed for the purpose of the invention should allow free access to the surface of the water body in order to carry out the inventive dip coating of substrates with nanoparticles. Therefore, a FIBOR appears as an open trough a heater acting from the underside is configured, particularly suitable for the realization of the invention.
Es sollen folgende allgemeine Vorteile der Erfindung hervorgehoben werden: 1. Das erfmdungsgemäße Verfahren benötigt keine definierten Ataiosphäreribedin- gungen, und insbesondere ist kein Überdruck erforderlich. Es kann bei Raumluft in jedem Labor durchgeführt werden.The following general advantages of the invention are to be emphasized: 1. The erfmdungsgemäße method requires no defined Ataiosphäreibedin- conditions, and in particular no pressure is required. It can be done in indoor air in any laboratory.
2. Dem FIBOR müssen lediglich Energie (Wärme) und eine wässrige Metallsalzlösung zugeführt werden, die sich schnell und kurzfristig herstellen lässt. Katalysatoren sind nicht zwingend erforderlich, und es entstehen im Prinzip keine gefährlichen Nebenprodukte.2. The FIBOR only needs to be supplied with energy (heat) and an aqueous metal salt solution that can be produced quickly and at short notice. Catalysts are not absolutely necessary, and in principle no dangerous by-products are formed.
3. Die Erzeugung der Nanopartikel aus der wässrigen Lösung, das Auftreiben der3. The generation of nanoparticles from the aqueous solution, the Auftreiben the
Nanopartikel auf die Wasseroberfläche und das Überziehen eines Substrats durch Eintauchen in die Lösung erfordern insgesamt nur einige Minuten. Das Verfahren ist damit um ein Vielfaches schneller als andere nasschemische Verfahren, in denen Partikelwachstum stattfindet.Nanoparticles on the water surface and the coating of a substrate by immersion in the solution require a total of only a few minutes. The process is thus many times faster than other wet-chemical processes in which particle growth takes place.
Die einfachste, jederzeit zu realisierende Ausgestaltung eines geeigneten FEBOR ist ein schlichtes Becherglas auf einer Heizplatte. Ein solcher „Becherglas-Reaktor" wird ohne weitere Maßnahmen nicht in der Lage sein, eine kontinuierliche Produktion von Nanopartikeln aufrecht zu erhalten. Diese zusätzlichen Maßnahmen werden aber, wie oben gesagt, als fachmännisch realisierbar erachtet.The simplest, at any time to realize design of a suitable FEBOR is a simple beaker on a hot plate. Such a "beaker reactor" will not be able to sustain continuous production of nanoparticles without further action, but these additional measures are considered to be expertly practicable, as stated above.
Fig. 3 zeigt Elektronenmikroskop-Aufhahmen eines erfindungsgemäß hergestellten Films aus Zinlcoxid-Nanopartikeln auf einem Silizium-Substrat in zwei Vergrößerungen. Zur Herstellung des Films wurde zunächst eine Labor-Heizplatte auf 250- 270 0C vorgeheizt. Ein 100 ml Becherglas mit wässriger Zinkacetat-Lösung wurde auf die vorgeheizte Platte gestellt. Messungen belegen, dass die Temperatur der Glasunterseite nach 1-2 Minuten der der Heizplatte entsprach.FIG. 3 shows electron microscope images of a film of zinc oxide nanoparticles prepared according to the invention on a silicon substrate in two magnifications. To make the film a laboratory hotplate was initially preheated to 250- 270 0 C. A 100 ml beaker of aqueous zinc acetate solution was placed on the preheated plate. Measurements prove that the temperature of the underside of the glass corresponded to that of the heating plate after 1-2 minutes.
Nach etwa 10-15 Minuten bildete sich ein auf der Wasseroberfläche schwimmender Film, und ein Silizium-Substrat wurde langsam und gleichmäßig - über den Zeitraum von etwa einer Minute - in die Lösung getaucht und wieder herausgezogen. Das zuvor schwimmende Filmmaterial blieb an dem Substrat während der Tauchbewegung haften.After about 10-15 minutes, a film floating on the water surface formed, and a silicon substrate was slowly and uniformly dipped in the solution over the period of about one minute and pulled out again. The previously floating film remained adhered to the substrate during the dipping motion.
Die Aufnahmen aus Fig. 3 beweisen, dass es sich um relativ gleichmäßig verteilte, etwa gleich große Nanopartikel handelt. Ihre Zusammensetzung wurde mittels ener- giedispersiver Röntgenanalytik (EDX) und Röntgendiffiraktometrie (X-Ray- Diffraktion, XRD) als ZnO-Partikel bestätigt.The images from Fig. 3 prove that it is relatively evenly distributed, about the same size nanoparticles. Their composition was determined by means of X-ray diffraction (XRD) confirmed as ZnO particles by X-ray analysis (EDX) and X-ray diffraction (X-Ray diffraction).
Wenn man nach einigen Minuten den Tauchvorgang mit einem zweiten Silizium- Substrat wiederholt, bildet sich ein Nanopartikelfilm, dessen Partikelgrößenverteilung weiter streut als der des Films auf dem ersten Substrat. Der Grund dafür liegt zum einen in der Agglomeration der bereits vorhandenen Nanopartikel und zum anderen in der Anlagerung weiterer Ionen aus der Lösung an diese Partikel, d.h. das Partikelwachstum schreitet mit der Zeit voran. Dieser Sachverhalt ist bei der Umset- zung des Verfahrens in einem kontinuierlich laufenden FIBOR zu berücksichtigen.Repeating the immersion process with a second silicon substrate after a few minutes forms a nanoparticle film whose particle size distribution spreads further than that of the film on the first substrate. The reason for this is, on the one hand, the agglomeration of the already existing nanoparticles and, on the other hand, the addition of further ions from the solution to these particles, i. Particle growth progresses over time. This fact must be taken into account in the implementation of the procedure in a continuous FIBOR.
Da das Substrat durch das Eintauchen in Wasser unter Atmosphärendruck mit dem Partikelfilm überzogen wird, ist die Temperatur, dem das Substrat ausgesetzt wird, praktisch auf etwa 100 0C nach oben beschränkt. Von daher können sowohl vorstrukturierte als auch manche organische Substrate zur Beschichtung vorgesehen werden, sofern nur die erzeugten Partikel an diesen haften. Von besonderem Interesse sind hier Substrate aus kommerziell gängigen, chemisch inerten Polymeren wie etwa Polymethymethacrylat (PMMA) oder irgendein Fluoropolymer (z.B. Teflon ®). Die Haftung der Nanopartikel kann dabei durch eine kontrollierte, temperaturbeding- te Aufweichung der Polymere durchaus begünstigt werden.Since the substrate is coated with the particle film by immersion in water under atmospheric pressure, the temperature to which the substrate is exposed is practically limited to about 100 ° C. upward. Therefore, both prestructured and some organic substrates can be provided for coating, provided that only the particles produced adhere to them. Of particular interest here are substrates of commercially available, chemically inert polymers such as polymethymethacrylate (PMMA) or any fluoropolymer (eg Teflon®). The adhesion of the nanoparticles can be favored by a controlled, temperature-induced softening of the polymers.
Das Beispiel Zinkoxid soll hier in Analogie zur DE 10 2005 060 407 Al nicht einschränkend verstanden werden. Die Forschung in diesem Feld steht noch am Anfang, doch ist schon heute klar, dass sich auch andere Partikel, insbesondere Metalloxid- Partikel, auf die gleiche Weise erzeugen lassen. Von kommerzieller Bedeutung ist insbesondere auch Titandioxid (z.B. als UV- Absorber).The example zinc oxide should not be understood as limiting in analogy to DE 10 2005 060 407 A1. Research in this field is still in its infancy, but it is already clear today that other particles, in particular metal oxide particles, can also be produced in the same way. Of particular commercial importance is titanium dioxide (e.g., as a UV absorber).
Der Sauerstoff zur Bildung der Oxid-Partikel wird dabei möglicherweise durch thermische Dissoziation von Wassermolekülen bereitgestellt. Es ist aber auch denk- bar (und bislang nicht geklärt), dass der in der Lösung gelöste Sauerstoff für die Reaktion eine Rolle spielt. Sollte sich dies bestätigen, wäre beim Aufbau eines kontinuierlichen FIBOR die Überwachung und ggf. Regelung der gelösten Sauerstoffkonzentration in Erwägung zu ziehen. Dies kann durch eine einfache Gaspumpe realisiert werden, die z.B. Raumluft ansaugt und über ein Rohr in das Reaktorgefäß mög- liehst in die Nähe der reaktiven Wasser/Wasserdampf-Phasengrenze leitet. Alternativ kann man auch reinen Sauerstoff aus Flaschen einleiten. Abschließend sei darauf hingewiesen, dass das Filmsieden ein an sich fest stehender Begriff ist, der mit dem Minimum der Wärmeübertragung in das Fluid als Startpunkt verbunden ist. Bei der vorliegenden Erfindung soll der Begriff Filmsieden sich aber auch auf den Fall eines ggf. (noch) nicht zusammenhängenden Dampffilmes (üblicherweise als „transition boiling" bezeichnet) beziehen, soweit dieser bereits zur Produktion von Nanopartikeln in der Lage ist. Im Lichte der DE 10 2005 060 407 Al ist davon auszugehen, dass die Nanopartikel bereits ab einer Wandtemperatur oberhalb von 200 °C entstehen können, wo das klassische Filmsieden noch nicht unbe- dingt eingesetzt haben muss. Von daher ist Filmsieden im Erfindungssinne hier weiter gefasst zu verstehen. The oxygen to form the oxide particles may be provided by thermal dissociation of water molecules. However, it is also conceivable (and not yet clarified) that the oxygen dissolved in the solution plays a role in the reaction. If this is confirmed, the monitoring and, if necessary, control of the dissolved oxygen concentration should be considered when constructing a continuous FIBOR. This can be realized by a simple gas pump, which sucks in, for example, room air and via a pipe in the reactor vessel lent possible in the vicinity of the reactive water / water vapor phase boundary passes. Alternatively, one can also initiate pure oxygen from bottles. Finally, it should be noted that the film boiling is a fixed term, which is associated with the minimum of heat transfer into the fluid as a starting point. In the present invention, however, the term film boiling should also refer to the case of a possibly (not yet) contiguous vapor film (usually referred to as "transition boiling"), insofar as it is already capable of producing nanoparticles 10 2005 060 407 Al it can be assumed that the nanoparticles can be formed as early as above a wall temperature above 200 ° C, where classic film boiling does not necessarily have to be used, which is why film boiling in the sense of the invention should be understood broadly.
Claims
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| EP07817431.5A EP2051936B1 (en) | 2006-08-18 | 2007-08-14 | Method for generating oxidic nanoparticles from a material forming oxide particles |
| US12/377,635 US8129000B2 (en) | 2006-08-18 | 2007-08-14 | Method for generating oxidic nanoparticles from a material forming oxide particles |
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| DE102006038703A DE102006038703B4 (en) | 2006-08-18 | 2006-08-18 | Method and apparatus for producing oxide nanoparticles from an oxide particle-forming material |
| DE102006038703.1 | 2006-08-18 |
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| US (1) | US8129000B2 (en) |
| EP (1) | EP2051936B1 (en) |
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| BR112014002627A2 (en) | 2011-08-03 | 2017-03-01 | Massachusetts Inst Technology | articles for handling colliding liquids and methods of manufacturing them |
| SG10201609944TA (en) | 2011-08-05 | 2017-01-27 | Massachusetts Inst Technology | Devices incorporating a liquid - impregnated surface |
| KR102070556B1 (en) | 2012-03-23 | 2020-01-29 | 메사추세츠 인스티튜트 오브 테크놀로지 | Self-lubricating surfaces for food packaging and processing equipment |
| US9309162B2 (en) | 2012-03-23 | 2016-04-12 | Massachusetts Institute Of Technology | Liquid-encapsulated rare-earth based ceramic surfaces |
| US9625075B2 (en) | 2012-05-24 | 2017-04-18 | Massachusetts Institute Of Technology | Apparatus with a liquid-impregnated surface to facilitate material conveyance |
| US20130337027A1 (en) | 2012-05-24 | 2013-12-19 | Massachusetts Institute Of Technology | Medical Devices and Implements with Liquid-Impregnated Surfaces |
| CA2876381A1 (en) | 2012-06-13 | 2013-12-19 | Massachusetts Institute Of Technology | Articles and methods for levitating liquids on surfaces, and devices incorporating the same |
| BR112015011378A8 (en) | 2012-11-19 | 2019-10-01 | Massachusetts Inst Technology | article comprising a liquid impregnated surface and method of using said article |
| US20140178611A1 (en) | 2012-11-19 | 2014-06-26 | Massachusetts Institute Of Technology | Apparatus and methods employing liquid-impregnated surfaces |
| WO2014127304A1 (en) | 2013-02-15 | 2014-08-21 | Massachusetts Institute Of Technology | Grafted polymer surfaces for dropwise condensation, and associated methods of use and manufacture |
| CN110038726A (en) | 2013-04-16 | 2019-07-23 | 麻省理工学院 | System and method for the separation of the monopole of emulsifier and other mixtures |
| US9585757B2 (en) | 2013-09-03 | 2017-03-07 | Massachusetts Institute Of Technology | Orthopaedic joints providing enhanced lubricity |
| US20150179321A1 (en) | 2013-12-20 | 2015-06-25 | Massachusetts Institute Of Technology | Controlled liquid/solid mobility using external fields on lubricant-impregnated surfaces |
| WO2015196052A1 (en) | 2014-06-19 | 2015-12-23 | Massachusetts Institute Of Technology | Lubricant-impregnated surfaces for electrochemical applications, and devices and systems using same |
| CN113181830B (en) * | 2021-04-30 | 2022-11-29 | 湖南师范大学 | Method for rapidly preparing super particles based on Leidenfrost phenomenon |
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| EP0081409A1 (en) | 1981-11-26 | 1983-06-15 | Commissariat à l'Energie Atomique | Process for increasing the density of porous structures |
| DE10392447T5 (en) | 2002-03-28 | 2005-05-12 | UTC Fuel Cells, LLC, South Windsor | Ceria-based misch metal oxide structure, including the method of preparation and use |
| DE102005060407B3 (en) | 2005-12-15 | 2007-02-08 | Christian-Albrechts-Universität Zu Kiel | Nanostructure production method in substrate used in microelectromechanical system (MEMS) or microchips, involves making drops of solution for nanostructure formation float on substrate, and heating substrate to make drops evaporate |
-
2006
- 2006-08-18 DE DE102006038703A patent/DE102006038703B4/en not_active Expired - Fee Related
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2007
- 2007-08-14 US US12/377,635 patent/US8129000B2/en not_active Expired - Fee Related
- 2007-08-14 WO PCT/DE2007/001444 patent/WO2008019670A2/en not_active Ceased
- 2007-08-14 EP EP07817431.5A patent/EP2051936B1/en not_active Not-in-force
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| EP0081409A1 (en) | 1981-11-26 | 1983-06-15 | Commissariat à l'Energie Atomique | Process for increasing the density of porous structures |
| DE10392447T5 (en) | 2002-03-28 | 2005-05-12 | UTC Fuel Cells, LLC, South Windsor | Ceria-based misch metal oxide structure, including the method of preparation and use |
| DE102005060407B3 (en) | 2005-12-15 | 2007-02-08 | Christian-Albrechts-Universität Zu Kiel | Nanostructure production method in substrate used in microelectromechanical system (MEMS) or microchips, involves making drops of solution for nanostructure formation float on substrate, and heating substrate to make drops evaporate |
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| DE102006038703B4 (en) | 2009-12-17 |
| DE102006038703A1 (en) | 2008-02-28 |
| WO2008019670A3 (en) | 2008-11-20 |
| EP2051936A2 (en) | 2009-04-29 |
| EP2051936B1 (en) | 2014-05-21 |
| US20100285229A1 (en) | 2010-11-11 |
| US8129000B2 (en) | 2012-03-06 |
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