WO2008084653A1 - Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same - Google Patents
Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same Download PDFInfo
- Publication number
- WO2008084653A1 WO2008084653A1 PCT/JP2007/074657 JP2007074657W WO2008084653A1 WO 2008084653 A1 WO2008084653 A1 WO 2008084653A1 JP 2007074657 W JP2007074657 W JP 2007074657W WO 2008084653 A1 WO2008084653 A1 WO 2008084653A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- infrared absorbing
- binder resin
- polymer
- same
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007800485246A CN101573409B (en) | 2006-12-26 | 2007-12-21 | Binder resin for near-infrared absorbing film and near-infrared absorbing filter using same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006348770A JP2008156539A (en) | 2006-12-26 | 2006-12-26 | Binder resin for near-ir absorptive film and near-ir absorptive filter utilizing the same |
| JP2006-348770 | 2006-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008084653A1 true WO2008084653A1 (en) | 2008-07-17 |
Family
ID=39608550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/074657 Ceased WO2008084653A1 (en) | 2006-12-26 | 2007-12-21 | Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2008156539A (en) |
| KR (1) | KR20090102748A (en) |
| CN (1) | CN101573409B (en) |
| WO (1) | WO2008084653A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017104735A1 (en) * | 2015-12-18 | 2017-06-22 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared cut filter, method of manufacturing near-infrared cut filter, solid-state imaging device, camera module, and image display device |
| CN107365401A (en) * | 2017-06-15 | 2017-11-21 | 东南大学 | A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101942284A (en) * | 2010-09-05 | 2011-01-12 | 苏州达信科技电子有限公司 | Adhesive and manufacturing method thereof |
| CN102031047B (en) * | 2010-11-17 | 2013-04-10 | 南京工业大学 | Night vision compatible near-infrared absorption film material and preparation method thereof |
| KR101618689B1 (en) * | 2012-12-24 | 2016-05-09 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using the same |
| JP6673219B2 (en) * | 2014-12-03 | 2020-03-25 | コニカミノルタ株式会社 | Laminated film |
| KR101904500B1 (en) | 2016-02-24 | 2018-11-28 | 주식회사 엘엠에스 | Optical article and optical filter containing the same |
| KR101976660B1 (en) * | 2016-07-13 | 2019-05-09 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using the same and display device |
| KR102087261B1 (en) | 2017-02-16 | 2020-03-10 | 삼성에스디아이 주식회사 | Photosensitive resin composition, black pixel defining layer using the same and display device |
| KR102364239B1 (en) * | 2017-12-21 | 2022-02-16 | 동우 화인켐 주식회사 | Colored photosensitive composition, color filter and image display device |
| CN108388040B (en) * | 2018-02-08 | 2020-09-22 | 苏州市联超光电科技有限公司 | Resin optical filter and preparation method thereof |
| JP2020126982A (en) * | 2019-02-06 | 2020-08-20 | 日立化成株式会社 | Film adhesive and adhesive sheet |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1180249A (en) * | 1996-11-28 | 1999-03-26 | Kanegafuchi Chem Ind Co Ltd | Preparation of (meth)acrylate-based polymer having hydroxyl group at terminal |
| JP2000053723A (en) * | 1998-08-11 | 2000-02-22 | Kanegafuchi Chem Ind Co Ltd | Polymer composition having hydroxy terminal, and use |
| JP2006220906A (en) * | 2005-02-10 | 2006-08-24 | Toray Ind Inc | Optical film |
| JP2007070605A (en) * | 2005-08-12 | 2007-03-22 | Nippon Shokubai Co Ltd | Near infrared absorbing composition |
| JP2007298667A (en) * | 2006-04-28 | 2007-11-15 | Hitachi Chem Co Ltd | Optical filter |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100424121C (en) * | 2003-09-09 | 2008-10-08 | 3M创新有限公司 | (Meth)acrylic films and preparation of films and receptor sheets using the same |
| JP4682299B2 (en) * | 2003-11-17 | 2011-05-11 | 綜研化学株式会社 | Pressure sensitive adhesive for protective sheet |
| US7285313B2 (en) * | 2004-01-20 | 2007-10-23 | Lg Chem Ltd. | Acrylic pressure-sensitive adhesive composition for polarizing film |
-
2006
- 2006-12-26 JP JP2006348770A patent/JP2008156539A/en active Pending
-
2007
- 2007-12-21 WO PCT/JP2007/074657 patent/WO2008084653A1/en not_active Ceased
- 2007-12-21 KR KR1020097011781A patent/KR20090102748A/en not_active Withdrawn
- 2007-12-21 CN CN2007800485246A patent/CN101573409B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1180249A (en) * | 1996-11-28 | 1999-03-26 | Kanegafuchi Chem Ind Co Ltd | Preparation of (meth)acrylate-based polymer having hydroxyl group at terminal |
| JP2000053723A (en) * | 1998-08-11 | 2000-02-22 | Kanegafuchi Chem Ind Co Ltd | Polymer composition having hydroxy terminal, and use |
| JP2006220906A (en) * | 2005-02-10 | 2006-08-24 | Toray Ind Inc | Optical film |
| JP2007070605A (en) * | 2005-08-12 | 2007-03-22 | Nippon Shokubai Co Ltd | Near infrared absorbing composition |
| JP2007298667A (en) * | 2006-04-28 | 2007-11-15 | Hitachi Chem Co Ltd | Optical filter |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017104735A1 (en) * | 2015-12-18 | 2017-06-22 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared cut filter, method of manufacturing near-infrared cut filter, solid-state imaging device, camera module, and image display device |
| JPWO2017104735A1 (en) * | 2015-12-18 | 2018-09-13 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared cut filter, method for producing near-infrared cut filter, solid-state imaging device, camera module, and image display device |
| US10989846B2 (en) | 2015-12-18 | 2021-04-27 | Fujifilm Corporation | Near infrared absorbing composition, near infrared cut filter, method of manufacturing near infrared cut filter, solid image pickup element, camera module, and image display device |
| CN107365401A (en) * | 2017-06-15 | 2017-11-21 | 东南大学 | A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof |
| CN107365401B (en) * | 2017-06-15 | 2019-09-10 | 东南大学 | A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101573409B (en) | 2011-09-07 |
| JP2008156539A (en) | 2008-07-10 |
| KR20090102748A (en) | 2009-09-30 |
| CN101573409A (en) | 2009-11-04 |
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| Date | Code | Title | Description |
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| WWE | Wipo information: entry into national phase |
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