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WO2008080537A1 - Objectif de projection pour la lithographie - Google Patents

Objectif de projection pour la lithographie Download PDF

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Publication number
WO2008080537A1
WO2008080537A1 PCT/EP2007/010962 EP2007010962W WO2008080537A1 WO 2008080537 A1 WO2008080537 A1 WO 2008080537A1 EP 2007010962 W EP2007010962 W EP 2007010962W WO 2008080537 A1 WO2008080537 A1 WO 2008080537A1
Authority
WO
WIPO (PCT)
Prior art keywords
correction
pupil plane
elements
correction element
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2007/010962
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German (de)
English (en)
Inventor
Olaf Conradi
Dirk Juergens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of WO2008080537A1 publication Critical patent/WO2008080537A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Definitions

  • the invention relates to a projection objective for lithography.
  • the invention further relates to a method for correcting thermally induced aberrations of a projection objective for lithography.
  • Such a projection lens is known from US 6,262,793 Bl.
  • Such a projection lens is used, for example, in semiconductor lithography for the production of optical components. It has an optical arrangement of optical elements, for example lenses, plane-parallel plates, and / or mirrors, which has a structure of an object-level object (reticle) on a photosensitive layer of a substrate (wafer) arranged in an image plane of the projection objective is, depict.
  • Light rays generated by a light optic pass through the structure during the exposure process and transfer it to the photosensitive layer of the substrate which is subsequently developed thereon, whereby the structure to be imaged is formed.
  • the aberrations of a projection lens may, for example, be intrinsically conditioned to be caused during the manufacturing or assembly process of the optical elements. Furthermore, aberrations occur during operation of the projection lens, as at least one optical element of the optical arrangement is heated by the light rays passing through the projection lens and the optical properties of the at least one optical element, for example its shape and / or its material properties (refractive index, etc.). , change. These operational aberrations can occur briefly or reversibly, so that the optical properties of the at least one optical element are not permanently influenced. Furthermore, lifetime effects have a lasting effect on the optical properties, so that the optical elements are thereby irreversibly changed (compacification, dilution).
  • the projection objective known from US Pat. No. 6,262,793 B1 has two correction elements arranged immediately adjacent in the form of cylindrical lenses whose surfaces have a non-rotationally symmetric aspherization.
  • the surfaces of the lenses are appropriately processed prior to installation, for example, in or near the pupil plane of the projection lens, and the lenses can be additionally rotated about the optical axis and translated along the optical axis.
  • a disadvantage of this projection lens is that a correction effect based on a rotation of the two lenses is limited, since only specific imaging errors can be effectively corrected.
  • complex higher-wave field courses of aberrations are, for example, during operation of the Projection lens can occur due to the arrangement of two lenses or their rotation about the optical axis only limited correctable.
  • Another disadvantage of the known projection lens is that the lens surfaces are not optically changeable during operation of the projection exposure apparatus. Consequently, a corrective effect of the two lenses is often insufficient because, in particular, unpredictable aberrations based on heating of the optical elements can not be achieved by rotating the two correction elements.
  • the object is achieved by a projection objective for lithography, which has an optical arrangement of optical elements along a light propagation direction between an object plane and an image plane, wherein the optical arrangement has at least a first pupil plane, wherein the optical arrangement comprises at least a first and a second correction element for correcting thermally induced aberrations and wherein the at least first and second correction elements are each arranged in a region which is at least optically close to the at least first pupil plane.
  • the object is achieved by a method for correcting thermally induced aberrations of a projection objective for lithography, the projection objective having an optical arrangement of optical elements along a light propagation direction between an object plane and an image plane, the optical arrangement having at least a first pupil plane, wherein the optical arrangement has at least a first and a second correction element for correcting the thermally induced aberrations, wherein the at least first and second correction element are each arranged in a region which is at least optically close to the at least first pupil plane, and wherein a correction position of the at least two correction elements determined is corrected in the predominantly field-constant and / or field-dependent portions of the aberrations.
  • an "arrangement in an area at least optically close to a pupil plane” is to be understood as meaning an arrangement of a correction element within the projection objective whose optical effect is approximately equal to an optical effect of a correction element arranged in the pupil plane.
  • This term also includes the placement of a correction element exactly in the pupil plane of the projection lens and the arrangement of a plurality of optical elements between the correction element and the pupil plane.
  • a criterion for classifying whether a selected position of the correction element is at least optically close to a pupil plane is a ratio of principal ray height to marginal ray height in this position. If this ratio is zero or approximately zero, for example less than 1/4, then one speaks of a position at least optically close to the pupil plane.
  • main beam height is to be understood as meaning the beam height of the main beam of a field point of the object plane with the maximum field height in terms of magnitude.
  • edge beam height denotes the beam height of a beam with maximum aperture, starting from the center of the field of the object plane.
  • an optical element arranged in a pupil plane has an influence on the field constant progression of the wavefront in the image plane of the projection lens, while an optical element provided in the vicinity of the pupil plane influences the field-dependent component of the field profile.
  • the arrangement of the at least two correction elements in at least optically near-pupil areas therefore advantageously allows not only a correction of a field-constant course of the aberrations but also an effective correction of remaining field-dependent portions of the aberrations.
  • a further advantage of the projection objective is that it offers different possible arrangements of the at least two correction elements, which are flexibly adaptable to the respective correction requirements depending on the design of the projection objective and the space requirement of the correction elements. This allows the occurring Abnormal aberration also independent of external influences, for example. An illumination of the projection lens, be corrected without further technically complex measures effectively.
  • the at least two correction elements are each an optical element, preferably a plane parallel plate, a mirror and / or a lens, each with suitably optically effective surfaces.
  • correction elements which are likewise designed as optical elements, are particularly easy to integrate into the optical arrangement of the optical elements and thus into the light path of the projection objective.
  • the configuration of the correction elements as plane-parallel plates, mirrors and / or lenses, each with suitably optically effective surfaces, advantageously provide various design options for the correction elements, which can be implemented depending on the design of the projection objective.
  • the correction elements can each be configured differently from one another.
  • an "optically active surface" is to be understood as meaning a surface which is used by the light in the installed state of the associated correction element in the projection lens.
  • the optical elements have a non-exchangeable lens and / or a mechanically deformable lens.
  • This measure advantageously represents a particularly frequently occurring embodiment of the projection lens whose image errors based on heating of its optical elements are compensated by the correction elements.
  • first correction element and / or the second correction element are optically variable.
  • an "optical change" of the at least first and / or second correction element means a change in its optical properties, in particular its shape and / or material properties (refractive index, thermal expansion coefficient, etc.).
  • the first and / or second correction element have mechanical or thermal manipulators, the actuators of which act on the surface of the correction elements in order to exert a mechanical or thermal force on them.
  • first correction element and / or the second correction element are adjustable in position, in particular designed to be decentered.
  • Positional adjustability generally means a change in the position of the correction elements, so that the first and / or second correction element are rotatable about an optical axis, tiltable with respect to the optical axis and slidable along or transverse to the optical axis.
  • the first correction element and / or the second correction element are exchangeable for at least one other correction element.
  • This measure effects a replacement of the first and / or second correction element by at least one other correction element, which can advantageously support the correction of thermally induced aberrations.
  • the projection lens on a fast changer device in the preferably several exchange elements with different shenasphärisie- ments are kept.
  • first and / or second correction element can be heated for correction.
  • the already mentioned above optical change of the correction or the correction elements can be achieved in a simple manner, wherein at least one of the correction elements corresponding to a heating / cooling is assigned.
  • the at least two correction elements are arranged directly adjacent.
  • This measure has the advantage that the aberrations can be corrected particularly easily, since no additional optical elements arranged between the two correction elements influence the beam path of the light and must be taken into account for the overall correction effect of the two correction elements.
  • the at least two correction elements are arranged at optically conjugate positions.
  • Optically conjugate positions of at least two correction elements are to be understood as meaning those positions whose ratios of principal ray height to marginal ray height are approximately equal.
  • the at least two correction elements are arranged at a distance from each other.
  • This measure has the advantage that, in contrast to a non-spaced arrangement of the at least two correction elements, for example.
  • a variety of beam guidance options of the light can be provided in the projection lens, which can be utilized for the correction of thermally induced aberrations ,
  • the configuration of the projection objective according to the invention can be used particularly advantageously if the optical arrangement of the projection objective has at least two pupil planes, in which case the at least first and second correction element is optically close to the first and / or second pupil plane.
  • the two correction elements can thus be distributed to correction positions in both and / or near both pupil planes, which for reasons of space, which are caused by the design of the projection lens, allows a higher correction potential than if only one pupil plane is present, in which both correction elements may be off Space reasons can not be arranged.
  • the first correction element in the at least first pupil plane and the second correction element in the at least second pupil plane are arranged.
  • This measure has the advantage that by arranging the at least two correction elements in each case one pupil plane, field-constant portions of the aberrations can be corrected particularly effectively, since the respective correction effects of the at least two correction elements overlap.
  • the first correction element is arranged in a pupil plane and the second correction element is arranged at least optically close to a pupil plane of the at least first and second pupil planes.
  • This measure advantageously ensures a particularly effective correction of field-constant and field-dependent profiles of the aberrations in the image plane of the projection lens that can be adapted to the respective projection objective and the aberrations that occur.
  • the first correction element is arranged in front of a pupil plane and the second correction element is arranged behind a pupil plane of the at least first and second pupil planes.
  • This measure has the advantage that the optical effect of the correction elements arranged near a pupil plane in the image plane of the projection lens shows a field-dependent course, so that advantageously the field-dependent portion of the thermally induced aberrations can be corrected particularly well by the additive effect of the at least two correction elements.
  • the two correction elements are arranged symmetrically with respect to the at least first pupil plane.
  • This measure has the advantage that the correction elements spaced equidistant from the first pupil plane have an additive effect on the field-constant component and an at least reduced effect on the field-dependent component of the imaging errors.
  • the desired correction effect can be influenced by the respective configuration of the correction elements.
  • a distance of the first correction element from the at least first pupil plane is not equal to a distance of the second correction element from the at least first pupil plane.
  • This measure advantageously makes it possible, depending on the choice of the distances of the two correction elements to the first pupil plane, to predominantly correct the field-constant or field-dependent components of the aberrations.
  • the at least two correction elements are arranged in front of the at least first pupil plane.
  • the at least two correction elements are arranged behind the at least first pupil plane.
  • the arrangement of the correction elements outside of pupil planes advantageously corrects a field-dependent course of the aberrations in the image plane of the projection objective. Further, the arrangement of the correction elements on one side of a pupil plane enables independent intervention in the course of upper and lower marginal rays of the projection lens.
  • the at least two correction elements are arranged at least optically close to the at least second pupil plane.
  • This measure has the advantage that the aberrations generated optically close to the at least first pupil plane can be corrected at the optically conjugate location, namely optically in the vicinity of the at least second pupil plane. Is the second pupil plane in the light propagation direction seen before the arranged at least first pupil plane, so first an aberration is induced in the projection lens by the correction elements, which is compensated by the actual aberration.
  • the optical arrangement has exactly two correction elements.
  • This measure has the advantage that correcting aberrations with exactly two correction elements is easier to carry out than correcting with three or more correction elements.
  • the first correction element can be used to correct field-constant portions of the aberrations, while the second correction element compensates for a field-dependent course of the aberrations.
  • the correction position of the at least two correction elements is determined by selecting different positions for the at least two correction elements between two optical elements adjacent to the correction elements and an influence of the arrangement of the at least two correction elements in these positions on the aberrations is determined.
  • This measure has the effect that different arrangement possibilities of the two correction elements are determined by calculation and from these the arrangement is selected whose optical effect on the thermally induced aberrations is greatest.
  • the best correction of the aberrations without actually changing the arrangement of the correction elements can, for example, be calculated and optimally adapted to the design of the projection objective and the aberrations that occur.
  • the suitable positions are selected in mutually equidistant intervals. This measure advantageously makes possible a systematic determination of the optimal arrangement positions of the correction elements.
  • an illumination mode of the projection objective is taken into account when determining the optimum position.
  • the heating of the optical elements is determined in particular by the illumination of the projection lens, so that the thermally induced aberrations can be advantageously corrected particularly effective when the respective illumination of the projection lens is taken into account.
  • FIG. 1 shows a schematic representation of a projection exposure apparatus with an illumination system and a projection objective according to the invention
  • Fig. 2 is a detailed embodiment of the projection lens in Fig. 1;
  • FIGS. 3A-3F show various arrangements of two correction elements with respect to a first pupil plane of the projection objective in FIG. 2;
  • FIG. 4 shows different illumination modes of the projection objective in FIG. 2;
  • FIG. 3A-3F show various arrangements of two correction elements with respect to a first pupil plane of the projection objective in FIG. 2;
  • FIG. 4 shows different illumination modes of the projection objective in FIG. 2;
  • FIG. 3A-3F show various arrangements of two correction elements with respect to a first pupil plane of the projection objective in FIG. 2;
  • FIG. 4 shows different illumination modes of the projection objective in FIG. 2;
  • FIG. 5 shows various arrangement positions of the correction elements in FIG. 2;
  • FIG. 6A shows position-dependent RMS values of wavefront curves of the projection objective in FIG. 2 as a function of the illumination modes in FIG. 4, wherein the projection objective has only a first correction element;
  • FIG. 6C are cross sections through the wavefront profiles in FIG. 6B; FIG.
  • FIG. 7A wavefront course of the projection objective in FIG. 2 as a function of the illumination modes in FIG. 4, wherein the projection objective has the first correction element in a first position;
  • FIG. 7B cross sections through the wavefront profiles in FIG. 7A; FIG.
  • FIG. 7C wavefront profile of the projection objective in FIG. 2 as a function of the illumination modes in FIG. 4, wherein the projection objective has a second correction element in a second position;
  • FIG. 7D are cross sections through the wavefront profiles in FIG. 7C.
  • Fig. 1 is provided with the general reference numeral 10 projection lens of a projection exposure apparatus 12 is shown. Further details of the projection lens 10 are shown in FIG.
  • the projection exposure apparatus 12 is, for example, in semiconductor microlithography for the production of finely structured components, for example. Transistors, switches, etc., used to arranged on a holder 14 structure of a reticle 16, which is arranged in an object plane O of the projection lens 10, on a arranged on a holder 18 photosensitive layer of a substrate 20 (wafer), which is arranged in an image plane B of the projection lens 10 is to picture.
  • the projection exposure apparatus 12 has a light source 22 and an illumination optical system 24 arranged between the light source 22 and the reticle 16. Light rays 26 emitted from the light source 22 pass through the illumination optics 24, the reticle 16 and the projection objective 10 and strike the photosensitive layer of the substrate 20. After developing the substrate 20, the structure to be imaged is formed thereon.
  • the projection objective 10 has an optical arrangement 30 of optical elements 32, here illustrated four optical elements 32a-d in the form of four lenses 34a-d, which are respectively received on both sides by means of a clamping mechanism in a socket 36a-d.
  • temperature-induced aberrations due to heating of at least one optical element 32a-d, in this case the optical element 32d are produced in the projection objective 10 during operation of the projection exposure apparatus 12.
  • This local heating leads to a local change in the optical properties of the optical element 32d, for example, to a change in its shape and / or its material properties (refractive index, thermal expansion coefficient, etc.).
  • the aberrations that occur as a result during operation show different field profiles in the image plane B of the projection lens 10, each of which has a field-constant and field-dependent component.
  • the optical arrangement 30 has at least two further optical elements 37 trained correction elements 38, here exactly two correction elements 38a, b, which are formed as plane-parallel plates 40a, b and positively received in sockets 42a, b.
  • the two correction elements 38a, b are further arranged directly adjacent to each other and slightly spaced in areas which is at least optically close to a pupil plane Pi of the projection lens 10.
  • An arrangement in an area "at least optically close to the first pupil plane Pi" is to be understood as meaning not only an arrangement in the first pupil plane Pi or in an area spatially close to the first pupil plane Pi two correction elements 38a, b whose effect is optically approximately equal to an arrangement in the first pupil plane Pi, so that, for example, a plurality of optical elements 32 between the two correction elements 38a, b may be arranged.
  • a criterion according to which an area which is optically close to a pupil plane can be determined is a ratio of principal ray height to marginal ray height in a selected position which in this case must be approximately zero, for example less than 1/4, in particular less than 1/10 ,
  • the term "main beam height” is to be understood as meaning a beam height of a main beam of a field point of the object plane O with maximum field height and "beam edge height" as the beam height of a beam with maximum aperture starting from the center of the field of object plane O.
  • the projection objective 10 additionally has a second pupil plane P2 which, viewed in the light propagation direction, is arranged behind the first pupil plane Pi.
  • FIG. 2 shows a detailed exemplary embodiment of the projection objective 10 shown schematically in FIG. 1, whose optical arrangement 30 comprises a plurality of optical elements 32 in the form of lenses 34, mirrors 44 and plane-parallel plates 46 has, which are seen along the light propagation direction arranged one behind the other.
  • the projection objective 10 has three pupil planes P1-P3 and four field planes Fi-F4, the first or last field plane Fi, F4 corresponding to the object plane O or the image plane B of the projection objective 10.
  • the two correction elements 38a, b are arranged to correct thermally induced aberrations, in this case coma and astigmatism.
  • the first and second correction elements 38a, b are each designed as a plane-parallel plate 40a or curved lens 48a and arranged in the first pupil plane Pi or in the light propagation direction behind the pupil plane Pi immediately adjacent to the first correction element 38a.
  • optical elements 32 and the two correction elements 38a, b are designed to be optically effective, wherein for the purposes of the present invention an "optically effective surface” means that this surface in the installed state of the associated optical element or correction element in the projection objective 10th is used by the light.
  • This surface can be, for example, focusing, defocusing or beam guiding (jet folding) and have rotationally symmetric and non-rotationally symmetric fits corresponding to different orders of the Zernike coefficients.
  • the correction elements 38a, b serve to correct aberrations caused by heating of local regions of the optical elements 32 as a result of, for example, a dipole or quadrupole illumination of the projection lens 10 produced by the illumination optical system 24.
  • the correction element 38a since it is arranged in the first pupil plane Pi, corrects a field-constant course of the aberrations in the image plane B, which here assumes, for example, 70% of the total wavefront error profile. A remaining field dependent The proportion of the field profile of 30% is optimally compensated by the second correction element 38b.
  • the aberrations can occur in front of or behind the correction elements 38a, b in the light propagation direction. If the aberrations occur in optical elements 32, which are arranged in front of the correction elements 38a, b in the light propagation direction, the aberrations are corrected after their formation by the correction elements 38a, b. On the other hand, if the aberrations are caused behind the correction elements 38a, b in the light propagation direction, they are corrected in such a way that corresponding aberrations are first induced by the correction elements 38a, b in the wavefront profile of the projection objective 10, which are then caused by heating behind the first pupil plane Pi arranged optical elements 32 based aberrations can be compensated.
  • FIGS. 3A-3F show various configurations and arrangements of the two correction elements 38a, b arranged in the region of the first pupil plane Pi between the optical elements 32a, b formed as the lenses 34a, b. Further optical elements 32, which may be provided between the optical elements 32a, b, are not shown for the sake of clarity.
  • FIG. 3A shows the case shown in FIG. 2 that the correction element 38a is arranged in the pupil plane Pi, while the correction element 38b is arranged behind the pupil plane Pi, viewed in the light propagation direction.
  • the first correction element 38a is designed as a lens 48a and the second correction element 38b as a plane-parallel plate 40b.
  • the correction element 38a designed as a plane-parallel plate 40a is arranged in front of the first pupil plane Pi and the correction element 38b designed as another plane-parallel plate 40b is arranged in the first pupil plane Pi.
  • FIGS. 1 shows the case shown in FIG. 2 that the correction element 38a is arranged in the pupil plane Pi, while the correction element 38b is arranged behind the pupil plane Pi, viewed in the light propagation direction.
  • the first correction element 38a is designed as a lens 48a and the second correction element 38b as a plane-parallel plate 40b.
  • the correction element 38a designed as a plane-parallel plate 40a is arranged in
  • both correction elements 38a, 38b designed as lenses 48a, b or plane-parallel plates 40a, b can be arranged either in front of or behind the first pupil plane Pi as viewed in the light propagation direction.
  • the correction elements 38a, 38b may also be such be arranged such that both are displaced from the first pupil plane Pi in respectively different directions, so that the first correction element 38a is arranged between the optical element 32a and the first pupil plane Pi and the second correction element 38b between the pupil plane Pi and the optical element 32b ( see Fig. 3E, 3F).
  • a distance di of the first correction element 38a to the pupil plane Pi be non-38b to a distance d 2 of the second correction element to the first pupil plane Pi, so that the two correcting members 38a, b asymmetrically with respect to the first pupil plane Pi are arranged (see. Fig. 3E ). It is also possible for the two correction elements 38a, 38b to be arranged symmetrically about the first pupil plane Pi (see FIG. 3F). Both embodiments advantageously make it possible to influence upper and lower Komastrahlen independently of each other, both correction elements 38a, b additionally exert an additive effect on the field constant course of aberrations.
  • the correction elements 38a, b are designed as lenses 48a, b and in FIG.
  • the correction elements 38a, b may also be designed as refractive elements instead of transmissive elements, which are additionally suitable for beam deflection. As illustrated in FIG. 2, the correction element 38a, b may be formed as the mirror 44 received in the second pupil plane P2 to simultaneously correct the aberrations and guide the beams 28 of light.
  • the correction elements 38a, b may also be arranged in regions which are at least optically close to different pupil planes Pi-P 3 , respectively.
  • the second correction element 38b is arranged in front of and behind the respective pupil plane P1-P3.
  • both correction elements 38a, b are optically close, but outside a pupil plane P1-P3 are arranged, wherein any arrangement with respect to the position with respect to the respective pupil plane P1-P3 and the distance to the respective pupil planes P1-P3 is possible.
  • optically conjugate positions are to be understood as meaning those positions in the projection objective 10 whose respective ratio of principal ray height to marginal ray height is approximately the same, so that the optical effect of the respectively arranged correction elements 38a, b is also approximately the same.
  • the first correction element 38a and / or the second correction element 38b are exchangeable during the operation of the projection objective 10, ie. H.
  • the first correction element 38a and / or the second correction element 38b can be partially or fully automatically removed from a light path of the projection lens 10 by means of a rapid changer mechanism or at least one other correction element can be introduced into the light path.
  • the first correction element 38a and / or the second correction element 38b can have a plurality of replacement correction elements in the changer mechanism, which can then best correct any occurring aberration with other optical properties after their respective introduction into the projection objective 10.
  • the first correction element 38a and / or the second correction element 38b can furthermore be actively optically variable depending on the correction effect of the thermally induced aberrations, so that corresponding mechanical deformation manipulators (not shown) are assigned to them and / or they can also be equipped with thermal manipulators (not shown) that heat or cool the correction elements 38a, b to set a desired optical correction effect in the correction elements 38a, b.
  • the first correction element 38a and / or the second correction element 38b may additionally be configured so as to be positionally adjustable in order to achieve a specific optical corrective effect of the aberrations based on heating of the optical elements 32, manipulators for positional adjustment (not shown) corresponding to the respective correction elements 38a, b being associated.
  • positionally adjustable means that the respective correction element 38a, b is rotatable about an optical axis A, tiltable with respect to the optical axis A, or displaceable along the optical axis A and / or transversely to the same, ie decentered is.
  • At least one optical element 32 of the optical arrangement 30 can be embodied as an exchangeable element and / or as an optically variable element and / or as a position-adjustable element, so that the overall correction effect of the projection objective 10 is increased.
  • FIG. 4 shows eleven different illumination modes 52a-k, which are recorded as a scan-integrated overall wavefront of an empty exposure of the projection objective 10 with comparatively similar light sources 22.
  • the complex illumination modes 52a-k produce, for example, dipole or quadrupole illuminations, annular or even asymmetrical illumination of the optical elements 32.
  • the plane-parallel plate 40a is arranged at least optically close to the first pupil plane Pi in different positions 54a-e for correcting the aberrations caused by the illumination modes 52a-k, which, as shown in FIG. 5, with respect to the light propagation direction seen before the first correction element 38a arranged optical element 32a
  • the remaining square mean values (RMS values) 55a-k shown in FIG. 6A result with respect to the total wavefront integrated in the image plane B for the Zernike coefficients Z5-Z36.
  • the associated to the positions 54a-e Distance Xi-X 5 to the optical element 32a is between 3 mm and 32 mm and increases respectively.
  • position 54b represents the optimal correction position for the correction element 38a since illumination-dependent wavefront peak-to-valley values are between 20 nm and 30 nm. Further, the RMS values 55a-k of position 54b for all illumination modes 52a-k are between 0.8 nm and 5.3 nm, which are the lowest values compared to the other positions 54a, c-d.
  • FIGS. 6B and 6C show the wavefronts 56a-k associated with the respective illumination modes 52a-k in the image plane B of the projection objective 10 and a cross-section 58a-k through the respective wavefront 56a-k in the horizontal or vertical direction.
  • FIGS. 7A, 7C and 7B, 7D respectively show the illumination-dependent wavefronts 60a-k and 62a-k for the first correction element 38a arranged in the position 54a and the correction element 38b arranged in the position 54e associated cross-sections 64a-k, 66a-k through the respective wavefronts 60a-k, 62a-k in the horizontal and vertical directions, respectively.
  • the positions 54a, e of the correction elements 38a, b correspond to their optimal correction positions for the desired correction effect.
  • positions 54a-e are determined by choosing a plurality of different positions 54a-e between two optical elements 32a, b adjacent to the correction elements 38a, b, and an influence of any arrangement of the two correction elements 38a, b in these positions 54a-e on the aberrations that occur is determined.
  • the positions 54a-e can be selected arbitrarily, for example equidistant from one another.
  • the respective illumination 52a-k of the projection lens 10 is also taken into account.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
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  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un objectif de projection (10) pour la lithographie, cet objectif comprenant un ensemble optique (30) d'éléments optiques (32) disposés le long d'une direction de diffusion de la lumière entre un plan objet (O) et un plan image (B). L'ensemble optique (30) présente au moins un premier plan pupille (P<SUB>1</SUB>, P<SUB>2</SUB>) et au moins un premier et un second élément de correction (38a, b) destinés à corriger les erreurs de reproduction d'origine thermique, chacun de ces éléments étant disposé dans une région au moins optiquement proche du ou des premiers plans pupilles (P<SUB>1</SUB>, P<SUB>2</SUB>).
PCT/EP2007/010962 2006-12-29 2007-12-13 Objectif de projection pour la lithographie Ceased WO2008080537A1 (fr)

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DE102006062669.9 2006-12-29
DE102006062669 2006-12-29

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WO2008080537A1 true WO2008080537A1 (fr) 2008-07-10

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PCT/EP2007/010962 Ceased WO2008080537A1 (fr) 2006-12-29 2007-12-13 Objectif de projection pour la lithographie

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DE (1) DE102007062265A1 (fr)
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102165371A (zh) * 2008-09-25 2011-08-24 卡尔蔡司Smt有限责任公司 具有优化的调节可能性的投射曝光设备
US9529269B2 (en) 2012-05-24 2016-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2017016145A (ja) * 2016-09-20 2017-01-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
WO2024256376A1 (fr) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Procédé de production d'un objectif de projection, objectif de projection, installation de lithographie par projection et procédé de lithographie par projection

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008043243A1 (de) * 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator

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EP0851304A2 (fr) * 1996-12-28 1998-07-01 Canon Kabushiki Kaisha Appareil d'exposition par projection et méthode de fabrication d'un dispositif
US5789734A (en) * 1993-05-14 1998-08-04 Canon Kabushiki Kaisha Exposure apparatus that compensates for spherical aberration of an image forming device
US6262793B1 (en) * 1993-12-22 2001-07-17 Nikon Corporation Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
US20020080338A1 (en) * 1994-03-29 2002-06-27 Nikon Corporation Projection exposure apparatus
EP1881373A1 (fr) * 2006-07-18 2008-01-23 ASML Netherlands BV Appareil lithographique, dispositif de correction d'aberrations et méthode de fabrication d'un dispositif
WO2008040494A1 (fr) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Procédé pour améliorer les propriétés de mise en image d'un système optique et un tel système optique

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Publication number Priority date Publication date Assignee Title
US5789734A (en) * 1993-05-14 1998-08-04 Canon Kabushiki Kaisha Exposure apparatus that compensates for spherical aberration of an image forming device
US6262793B1 (en) * 1993-12-22 2001-07-17 Nikon Corporation Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
US20020080338A1 (en) * 1994-03-29 2002-06-27 Nikon Corporation Projection exposure apparatus
EP0851304A2 (fr) * 1996-12-28 1998-07-01 Canon Kabushiki Kaisha Appareil d'exposition par projection et méthode de fabrication d'un dispositif
EP1881373A1 (fr) * 2006-07-18 2008-01-23 ASML Netherlands BV Appareil lithographique, dispositif de correction d'aberrations et méthode de fabrication d'un dispositif
WO2008040494A1 (fr) * 2006-10-02 2008-04-10 Carl Zeiss Smt Ag Procédé pour améliorer les propriétés de mise en image d'un système optique et un tel système optique

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102165371A (zh) * 2008-09-25 2011-08-24 卡尔蔡司Smt有限责任公司 具有优化的调节可能性的投射曝光设备
US8203696B2 (en) 2008-09-25 2012-06-19 Carl Zeiss Smt Gmbh Projection exposure apparatus with optimized adjustment possibility
CN102165371B (zh) * 2008-09-25 2014-04-16 卡尔蔡司Smt有限责任公司 具有优化的调节可能性的投射曝光设备
US9052609B2 (en) 2008-09-25 2015-06-09 Carl Zeiss Smt Gmbh Projection exposure apparatus with optimized adjustment possibility
US9354524B2 (en) 2008-09-25 2016-05-31 Carl Zeiss Smt Gmbh Projection exposure apparatus with optimized adjustment possibility
US10054860B2 (en) 2008-09-25 2018-08-21 Carl Zeiss Smt Gmbh Projection exposure apparatus with optimized adjustment possibility
US9529269B2 (en) 2012-05-24 2016-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2017016145A (ja) * 2016-09-20 2017-01-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
WO2024256376A1 (fr) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Procédé de production d'un objectif de projection, objectif de projection, installation de lithographie par projection et procédé de lithographie par projection
DE102023115801A1 (de) 2023-06-16 2024-12-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Projektionsobjektivs, Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren

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