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WO2008078185A3 - Antireflective coating compositions - Google Patents

Antireflective coating compositions Download PDF

Info

Publication number
WO2008078185A3
WO2008078185A3 PCT/IB2007/004198 IB2007004198W WO2008078185A3 WO 2008078185 A3 WO2008078185 A3 WO 2008078185A3 IB 2007004198 W IB2007004198 W IB 2007004198W WO 2008078185 A3 WO2008078185 A3 WO 2008078185A3
Authority
WO
WIPO (PCT)
Prior art keywords
coating compositions
antireflective coating
etch
regulated
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2007/004198
Other languages
French (fr)
Other versions
WO2008078185A8 (en
WO2008078185A2 (en
Inventor
David Abdallah
Francis Houlihan
Mark Neisser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AZ ELECTRONIC COATING COMPOSITIONS
AZ ELECTRONIC COATING COMPOSIT
Original Assignee
AZ ELECTRONIC COATING COMPOSITIONS
AZ ELECTRONIC COATING COMPOSIT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ ELECTRONIC COATING COMPOSITIONS, AZ ELECTRONIC COATING COMPOSIT filed Critical AZ ELECTRONIC COATING COMPOSITIONS
Priority to KR1020097012584A priority Critical patent/KR101442865B1/en
Priority to EP07859255A priority patent/EP2102287A2/en
Priority to JP2009542269A priority patent/JP5487501B2/en
Priority to CN2007800472922A priority patent/CN101605854B/en
Publication of WO2008078185A2 publication Critical patent/WO2008078185A2/en
Publication of WO2008078185A3 publication Critical patent/WO2008078185A3/en
Anticipated expiration legal-status Critical
Publication of WO2008078185A8 publication Critical patent/WO2008078185A8/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/06—Polysulfones; Polyethersulfones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/20—Polysulfones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
    • C09D181/06—Polysulfones; Polyethersulfones
    • H10P95/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/952—Utilizing antireflective layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyethers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
PCT/IB2007/004198 2006-12-20 2007-12-19 Antireflective coating compositions Ceased WO2008078185A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020097012584A KR101442865B1 (en) 2006-12-20 2007-12-19 Antireflective coating composition
EP07859255A EP2102287A2 (en) 2006-12-20 2007-12-19 Antireflective coating compositions
JP2009542269A JP5487501B2 (en) 2006-12-20 2007-12-19 Antireflection film composition
CN2007800472922A CN101605854B (en) 2006-12-20 2007-12-19 Anti-reflective coating composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/613,410 2006-12-20
US11/613,410 US7759046B2 (en) 2006-12-20 2006-12-20 Antireflective coating compositions

Publications (3)

Publication Number Publication Date
WO2008078185A2 WO2008078185A2 (en) 2008-07-03
WO2008078185A3 true WO2008078185A3 (en) 2008-08-28
WO2008078185A8 WO2008078185A8 (en) 2009-07-09

Family

ID=39491493

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2007/004198 Ceased WO2008078185A2 (en) 2006-12-20 2007-12-19 Antireflective coating compositions

Country Status (7)

Country Link
US (2) US7759046B2 (en)
EP (1) EP2102287A2 (en)
JP (1) JP5487501B2 (en)
KR (1) KR101442865B1 (en)
CN (1) CN101605854B (en)
TW (1) TWI419947B (en)
WO (1) WO2008078185A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7550249B2 (en) * 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
WO2012005806A2 (en) * 2010-05-10 2012-01-12 The Penn State Research Foundation Signal-responsive plastics
JP5266299B2 (en) * 2010-12-01 2013-08-21 信越化学工業株式会社 Resist underlayer film material and pattern forming method using the same
US8623589B2 (en) * 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
JP6157160B2 (en) * 2013-03-15 2017-07-05 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ Upper layer film forming composition and resist pattern forming method using the same
US9296922B2 (en) * 2013-08-30 2016-03-29 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
US9274426B2 (en) * 2014-04-29 2016-03-01 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective coating compositions and processes thereof
US11474430B2 (en) * 2017-08-26 2022-10-18 Irresistible Materials Ltd Multiple trigger monomer containing photoresist compositions and method
CN112166153A (en) * 2018-03-26 2021-01-01 佐治亚理工研究公司 Transient polymer formulations, articles thereof, and methods of making and using the same
JP2022543480A (en) * 2019-08-09 2022-10-12 ジョージア テック リサーチ コーポレイション Rapid synthesis of polyaldehyde
CN113930151B (en) * 2021-10-14 2022-06-21 厦门恒坤新材料科技股份有限公司 Anti-reflective coating composition containing self-crosslinkable mercaptomelamine polymer, preparation method thereof and pattern forming method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3792026A (en) * 1970-09-08 1974-02-12 Dow Chemical Co High molecular weight olefin polysulfone resins and process for their preparation
WO1996014806A1 (en) * 1994-11-16 1996-05-23 Hercules Incorporated Medical devices composed of low ceiling temperature polymers
US5919598A (en) * 1995-08-21 1999-07-06 Brewer Science, Inc. Method for making multilayer resist structures with thermosetting anti-reflective coatings
US6479879B1 (en) * 2000-11-16 2002-11-12 Advanced Micro Devices, Inc. Low defect organic BARC coating in a semiconductor structure
JP2007279459A (en) * 2006-04-07 2007-10-25 Asahi Kasei Corp Refractive index control thin film

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2899412A (en) 1959-08-11 Polysulfone resins from bicycloheptene
US2310605A (en) 1939-02-03 1943-02-09 Freeport Sulphur Co Production of sulphur dioxideolefin resins
US2625525A (en) 1949-11-17 1953-01-13 Phillips Petroleum Co Terpolymers of sulfur dioxide, monoolefinic materials and a liquid polymer of a conjugated diene, and their production
US2703793A (en) 1951-07-10 1955-03-08 Du Pont Process for preparing interpolymers of so2 with propylene and an acrylate
GB744264A (en) 1952-09-29 1956-02-01 Phillips Petroleum Co Improvements in or relating to resins
US2779749A (en) 1952-09-29 1957-01-29 Phillips Petroleum Co Stabilized unsaturate-so2 resins containing acrylates
GB757046A (en) 1953-04-20 1956-09-12 Phillips Petroleum Co Improvements in or relating to resin/rubber compositions
US2794014A (en) 1953-10-15 1957-05-28 Dow Chemical Co Water-soluble heteropolymers of acrylic acid, allyl alcohol, and sulfur dioxide and processes for producing the same
US2778812A (en) 1953-11-23 1957-01-22 Dow Chemical Co Water soluble copolymers of so2, an acrylic acid and a vinyl alkyl ether
US2943077A (en) 1956-11-01 1960-06-28 Du Pont Copolymers of ethylene and sulfur dioxide
US3313785A (en) 1963-06-11 1967-04-11 Union Carbide Corp Polysulfones and method for their production
US3278490A (en) * 1963-08-05 1966-10-11 Diamond Alkali Co Polychloroaldehydes and process of preparing same
US3308102A (en) 1964-05-08 1967-03-07 Dow Chemical Co Polysulfone flocculants
US3364995A (en) 1966-02-14 1968-01-23 Dow Chemical Co Hydraulic fracturing fluid-bearing earth formations
GB1118950A (en) 1966-12-29 1968-07-03 Andersen & Brunn England Ltd Improvements relating to bottle capsules
US3663507A (en) 1970-01-02 1972-05-16 Minnesota Mining & Mfg Linear polyarylsulfones having functional groups thereon
US3883446A (en) 1973-02-09 1975-05-13 Continental Oil Co Phosphorus-free detergent formulation
US3890287A (en) 1973-09-21 1975-06-17 Dow Chemical Co Polysulfone copolymers
US3893127A (en) 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
US3915704A (en) * 1973-11-01 1975-10-28 Xerox Corp Photoinduced, acid catalyzed degradation of degradable polymers
US3884696A (en) 1974-03-05 1975-05-20 Bell Telephone Labor Inc Positive photoresist comprising polysulfones formed by reacting vinyl aromatic hydrocarbons with sulfur dioxide
US3898350A (en) 1974-06-27 1975-08-05 Ibm Terpolymers for electron beam positive resists
US3935331A (en) 1975-01-09 1976-01-27 Rca Corporation Preparation of olefin SO2 copolymer electron beam resist films and use of same for recording
US3935332A (en) 1975-01-09 1976-01-27 Rca Corporation Development of poly(1-methyl-1-cyclopentene-SO2) electron beam resist
US4070295A (en) 1976-02-02 1978-01-24 Exxon Research And Engineering Company Sulfone copolymeric additive for hydrocarbon oils
US4153741A (en) 1976-07-30 1979-05-08 Rca Corporation Method for forming a surface relief pattern in a poly(olefin sulfone) layer
US4045318A (en) 1976-07-30 1977-08-30 Rca Corporation Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer
US4126712A (en) 1976-07-30 1978-11-21 Rca Corporation Method of transferring a surface relief pattern from a wet poly(olefin sulfone) layer to a metal layer
US4267257A (en) 1976-07-30 1981-05-12 Rca Corporation Method for forming a shallow surface relief pattern in a poly(olefin sulfone) layer
US4097618A (en) 1977-03-09 1978-06-27 Rca Corporation Method of transferring a surface relief pattern from a poly(1-methyl-1-cyclopropene sulfone) layer to a non-metallic inorganic layer
US4289845A (en) 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
US4393160A (en) 1980-12-23 1983-07-12 Rca Corporation Aqueous developable poly(olefin sulfone) terpolymers
US4341861A (en) 1980-12-23 1982-07-27 Rca Corporation Aqueous developable poly(olefin sulfone) terpolymers
US4405776A (en) 1981-03-16 1983-09-20 Rca Corporation Positive radiation sensitive resist terpolymer from omega alkynoic acid
US4355094A (en) 1981-03-16 1982-10-19 Rca Corporation Positive radiation sensitive resist terpolymers
JPS5852638A (en) 1981-09-24 1983-03-28 Hitachi Ltd Radiation sensitive composition
US4396702A (en) 1981-11-10 1983-08-02 Rca Corporation Method of forming pattern in positive resist media
US4397938A (en) 1981-12-14 1983-08-09 Rca Corporation Method of forming resist patterns using X-rays or electron beam
US4397939A (en) 1981-12-14 1983-08-09 Rca Corporation Method of using a positive electron beam resist medium
US4504372A (en) 1982-03-12 1985-03-12 Ciba-Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for its preparation
US4398001A (en) 1982-03-22 1983-08-09 International Business Machines Corporation Terpolymer resist compositions
JPS5988737A (en) * 1982-11-15 1984-05-22 Hitachi Ltd Radiation sensitive organic high polymer material
DE3563273D1 (en) 1984-03-19 1988-07-14 Nippon Oil Co Ltd Novel electron beam resist materials
CA1269794A (en) 1985-10-15 1990-05-29 Eit Drent Copolymers of so.sub.2 and ethene
US4820829A (en) * 1986-01-16 1989-04-11 Ciba-Geigy Corporation Substituted o-phthalaldehydes
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
JPH0629323B2 (en) * 1986-06-18 1994-04-20 チッソ株式会社 Multi-component copolymer composed of sulfur dioxide and vinyl compound
US4996136A (en) 1988-02-25 1991-02-26 At&T Bell Laboratories Radiation sensitive materials and devices made therewith
US5200544A (en) 1988-02-25 1993-04-06 At&T Bell Laboratories Resist materials
US5298367A (en) 1991-03-09 1994-03-29 Basf Aktiengesellschaft Production of micromoldings having a high aspect ratio
KR950000074B1 (en) 1991-03-28 1995-01-09 금호석유화학 주식회사 Polypolymer of Sulfur Dioxide and Nuclear Substituted Trialkylgermylstyrene
JP3272002B2 (en) 1991-09-02 2002-04-08 昭和電工株式会社 Method for producing polyorganosilsesquioxane
JPH0721055B2 (en) * 1991-10-31 1995-03-08 チッソ株式会社 Copolymer of Sulfur Dioxide and Nuclear Substituted Styrene Derivative
US6773864B1 (en) 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
TW211080B (en) 1991-12-12 1993-08-11 American Telephone & Telegraph
US5384376A (en) 1992-12-23 1995-01-24 Eastman Kodak Company Organic/inorganic hybrid materials
US6770726B1 (en) 1995-09-12 2004-08-03 Gelest, Inc. β-substituted organosilsesquioxane polymers
JPH11286549A (en) 1998-02-05 1999-10-19 Canon Inc Photosensitive resin, resist using the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method
KR20010023776A (en) * 1998-07-10 2001-03-26 잔디해머,한스루돌프하우스 Composition for bottom reflection preventive film and novel polymeric dye for use in the same
DE19838315A1 (en) * 1998-08-24 2000-03-02 Basf Drucksysteme Gmbh Material for engraving recording using coherent electromagnetic radiation and printing plate with it
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
US6139920A (en) 1998-12-21 2000-10-31 Xerox Corporation Photoresist compositions
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
JP2001106785A (en) 1999-08-05 2001-04-17 Canon Inc Photosensitive resin, resist composition using the photosensitive resin, pattern forming method using the resist composition, device manufactured by the pattern forming method, and exposure method using a resist having the photosensitive resin
JP2001166479A (en) * 1999-12-06 2001-06-22 Toray Ind Inc Positive type radiation sensitive composition and method for producing resist pattern using same
JP2001166480A (en) * 1999-12-06 2001-06-22 Toray Ind Inc Positive type radiation sensitive composition and method for producing resist pattern using same
JP3795333B2 (en) 2000-03-30 2006-07-12 東京応化工業株式会社 Anti-reflection film forming composition
JP4406806B2 (en) * 2000-04-27 2010-02-03 日立化成工業株式会社 Positive photosensitive resin composition, pattern manufacturing method, and electronic component
US20030176614A1 (en) 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
JP3660941B2 (en) 2000-12-15 2005-06-15 東京都 Degradable polymer compound
JP2002251014A (en) * 2001-02-27 2002-09-06 Sumitomo Chem Co Ltd Chemically amplified resist composition
TWI264442B (en) 2002-03-25 2006-10-21 Shinetsu Chemical Co Novel esters, polymers, resist compositions and patterning process
US6737117B2 (en) 2002-04-05 2004-05-18 Dow Corning Corporation Hydrosilsesquioxane resin compositions having improved thin film properties
US6730454B2 (en) 2002-04-16 2004-05-04 International Business Machines Corporation Antireflective SiO-containing compositions for hardmask layer
US6919161B2 (en) 2002-07-02 2005-07-19 Shin-Etsu Chemical Co., Ltd. Silicon-containing polymer, resist composition and patterning process
US7108958B2 (en) 2002-07-31 2006-09-19 Brewer Science Inc. Photosensitive bottom anti-reflective coatings
AU2003295517A1 (en) 2002-11-12 2004-06-03 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
TW200424767A (en) 2003-02-20 2004-11-16 Tokyo Ohka Kogyo Co Ltd Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method
KR100857967B1 (en) 2003-06-03 2008-09-10 신에쓰 가가꾸 고교 가부시끼가이샤 Antireflective Film Material, and Antireflective Film and Pattern Formation Method Using the Same
US7303785B2 (en) 2003-06-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
KR20060131735A (en) 2003-10-07 2006-12-20 허니웰 인터내셔날 인코포레이티드 Coating and hard mask compositions, integrated methods and uses thereof for integrated circuit devices
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
US7537879B2 (en) 2004-11-22 2009-05-26 Az Electronic Materials Usa Corp. Photoresist composition for deep UV and process thereof
KR101137812B1 (en) * 2004-12-20 2012-04-18 주식회사 동진쎄미켐 Organic polymer for forming organic anti-reflective coating layer, and organic composition including the same
JP5296297B2 (en) 2005-04-04 2013-09-25 東レ・ファインケミカル株式会社 Silicone copolymer having condensed polycyclic hydrocarbon group and process for producing the same
US7550249B2 (en) 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3792026A (en) * 1970-09-08 1974-02-12 Dow Chemical Co High molecular weight olefin polysulfone resins and process for their preparation
WO1996014806A1 (en) * 1994-11-16 1996-05-23 Hercules Incorporated Medical devices composed of low ceiling temperature polymers
US5919598A (en) * 1995-08-21 1999-07-06 Brewer Science, Inc. Method for making multilayer resist structures with thermosetting anti-reflective coatings
US6479879B1 (en) * 2000-11-16 2002-11-12 Advanced Micro Devices, Inc. Low defect organic BARC coating in a semiconductor structure
JP2007279459A (en) * 2006-04-07 2007-10-25 Asahi Kasei Corp Refractive index control thin film

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
R.E. COOK, E.A.: "Effect of olefin structure on the ceiling temperature for olefin polysulfone frmation", JOURNAL OF POLYMER SCIENCE, vol. 26, 1957, pages 351 - 364, XP002484599 *

Also Published As

Publication number Publication date
KR20090106473A (en) 2009-10-09
TWI419947B (en) 2013-12-21
WO2008078185A8 (en) 2009-07-09
US8211621B2 (en) 2012-07-03
US20080153035A1 (en) 2008-06-26
JP5487501B2 (en) 2014-05-07
JP2010513650A (en) 2010-04-30
CN101605854B (en) 2012-07-25
CN101605854A (en) 2009-12-16
WO2008078185A2 (en) 2008-07-03
US7759046B2 (en) 2010-07-20
TW200838957A (en) 2008-10-01
US20100248137A1 (en) 2010-09-30
EP2102287A2 (en) 2009-09-23
KR101442865B1 (en) 2014-09-19

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