[go: up one dir, main page]

WO2008072392A1 - Method of treating discharge gas and apparatus therefor - Google Patents

Method of treating discharge gas and apparatus therefor Download PDF

Info

Publication number
WO2008072392A1
WO2008072392A1 PCT/JP2007/062397 JP2007062397W WO2008072392A1 WO 2008072392 A1 WO2008072392 A1 WO 2008072392A1 JP 2007062397 W JP2007062397 W JP 2007062397W WO 2008072392 A1 WO2008072392 A1 WO 2008072392A1
Authority
WO
WIPO (PCT)
Prior art keywords
exhaust gas
water
chlorine
sulfur hexafluoride
discharge gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/062397
Other languages
French (fr)
Japanese (ja)
Inventor
Toshiaki Kato
Tatsuro Beppu
Hiroshi Imamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanken Techno Co Ltd
Original Assignee
Kanken Techno Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanken Techno Co Ltd filed Critical Kanken Techno Co Ltd
Priority to JP2008549209A priority Critical patent/JPWO2008072392A1/en
Publication of WO2008072392A1 publication Critical patent/WO2008072392A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes
    • B01D53/78Liquid phase processes with gas-liquid contact
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/68Halogens or halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/206Organic halogen compounds
    • B01D2257/2064Chlorine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/30Sulfur compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0216Other waste gases from CVD treatment or semi-conductor manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Definitions

  • the present invention relates to an exhaust gas treatment method and apparatus for exhausting exhaust gas containing at least one of chlorine and sulfur hexafluoride as a safe gas.
  • Chlorine and sulfur hexafluoride used in the semiconductor manufacturing process are discharged as exhaust gas in a mixed state with other gases (for example, PFCs). Chlorine contained in such exhaust gas is extremely toxic to the human body, and sulfur hexafluoride has low toxicity to the human body, but its global warming potential (GWP) is tens of thousands of times that of CO. In addition to atmospheric life
  • an adsorption fixed type in which a component to be removed is adsorbed on a solid adsorbent a heating decomposition type using a fuel flame, an electric heater, atmospheric pressure plasma, or the like.
  • Many methods are used, such as a reaction decomposition method using a chemical reaction and a wet method using water or a chemical solution.
  • Patent Document 1 Japanese Unexamined Patent Publication No. 2000-157830
  • the main subject of the present invention is a single exhaust gas treatment method capable of efficiently and reliably removing chlorine and sulfur hexafluoride from exhaust gas without using an alkaline chemical as the chemical. And to provide the device.
  • the invention described in claim 1 is an "exhaust gas treatment method for purifying exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride, wherein the exhaust gas (F) is heated at a high temperature. With water vapor Alternatively, after reacting with at least one of oxygen, washing with water, the washed exhaust gas (F) is further brought into gas-liquid contact with the alkaline ionized water (A) ”.
  • the exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride is reacted with at least one of water vapor and oxygen at a high temperature, so that chlorine in the exhaust gas is converted into water. It is easily dissolved in salty hydrogen or chloric acid, and sulfur hexafluoride in the exhaust gas (F) is converted into hydrogen fluoride that is soluble in water and sulfur dioxide that is difficult to dissolve in neutral water. Converted. Therefore, by washing the exhaust gas (F) containing these products with water, 90% or more of hydrogen chloride or chlorine oxide in the exhaust gas (F), most of the hydrogen fluoride, and a part of sulfur dioxide are exhausted. (F) It can be removed from the inside.
  • the invention described in claim 2 relates to an exhaust gas treatment device (10) capable of carrying out the exhaust gas treatment method described in claim 1, wherein "exhaust gas (F) and steam or A reactor (12) for reacting at least one of oxygen at high temperature, a water scrubber (14) for washing exhaust gas (F) treated in the reactor (12), and an electrolysis for producing alkaline ionized water (A) Gas-liquid contact means for bringing the Al-ion reion water (A) produced by the electrolyzed water production device (16) into gas-liquid contact with the water production device (16) and the exhaust gas (F) washed with water scrubber (14) ( 18) ”is an exhaust gas treatment device (10).
  • the invention described in claim 3 is the exhaust gas treatment device (10) according to claim 2, wherein either of "reactor (12) force normal pressure plasma (P) or electric heater” is used.
  • the combustion flame is used as a heat source '', and when either the atmospheric pressure plasma (P) or the electric heater is used as the heat source, only electricity and water are used in the exhaust gas (F). It can reliably remove chlorine and sulfur hexafluoride to a safe level.
  • by-product gases such as sulfur oxides are separated from substances generated by the decomposition of exhaust gas (F) when a combustion flame is generated by burning a fuel such as natural gas. Although this occurs, such a by-product gas can also be absorbed by the alkaline water (A) and removed from the exhaust gas (F).
  • chlorine and sulfur hexafluoride in exhaust gas each of which has been conventionally detoxified by a separate method without using an alkaline chemical solution such as caustic soda, can be reduced to a TLV value or less by a single method. Can be reduced.
  • the exhaust gas is reacted with at least one of water vapor and oxygen at high temperature and then washed with water.
  • most of the chlorine and sulfur hexafluoride in the exhaust gas are converted to substances that are soluble in water and then washed with water.
  • most of the chlorine or sulfur hexafluoride in the exhaust gas is removed. Can be removed. Therefore, the harmful components remaining in the exhaust gas can be almost completely removed from the exhaust gas simply by bringing a small amount of alkaline ionized water into gas-liquid contact with the washed exhaust gas.
  • the amount of alkaline ionized water can be remarkably reduced, and the exhaust gas treatment device (more specifically, the electrolyzed water producing device used for producing alkaline ionized water) can be made compact. In addition, even an exhaust gas containing a high concentration of chlorine or sulfur hexafluoride or a large volume of exhaust gas can be reliably removed.
  • FIG. 1 is a schematic view showing an exhaust gas treatment apparatus according to one embodiment of the present invention.
  • FIG. 2 is a schematic view showing an exhaust gas treatment apparatus according to another embodiment of the present invention.
  • FIG. 1 is a schematic view showing one embodiment of an exhaust gas treatment apparatus (10) for carrying out the exhaust gas treatment method of the present invention.
  • the exhaust gas treatment device (10) of this example is roughly composed of a reactor (12), a water scrubber (14), an electrolyzed water production device (16), and a gas-liquid contact means (18). Has been.
  • the reaction furnace (12) is for reacting the exhaust gas (F) containing at least one of chlorine or sulfur hexafluoride, such as semiconductor manufacturing processes, with water vapor or oxygen at a high temperature. And a reaction tube (12a) and a plasma jet torch (12b).
  • the temperature condition for reacting the exhaust gas (F) with water vapor or oxygen is preferably a high temperature of 1000 ° C or higher. If the temperature conditions are strong, the bond between fluorine and sulfur in sulfur hexafluoride can be reliably broken, and even if the exhaust gas (F) contains other PFCs such as CF,
  • the upper limit of the temperature condition depends on the heat resistance of the material constituting the reactor (12).
  • the reaction cylinder (12a) is a straight pipe member formed of a refractory material such as castable, having an internal space (R), and having both ends open.
  • the reaction cylinder (12a) is erected on a water tank (20) for storing water, and an atmospheric pressure plasma (P) serving as a heat source is placed at the upper end of the reaction cylinder (12a).
  • a plasma jet torch (12b) for generating water is attached so as to close the opening.
  • one end of an exhaust gas supply pipe (24) for supplying exhaust gas (F) and water vapor or oxygen toward the internal space (R) of the reaction cylinder (12a) is connected to the upper part of the reaction cylinder (12a). It has been.
  • the plasma jet torch (12b) is an anode composed of a nozzle and the anode.
  • a plasma jet outlet hole cap at the tip of the anode is provided by applying a discharge voltage between the anode and the force sword and feeding a working gas such as nitrogen into the anode.
  • high temperature atmospheric pressure plasma (P) is ejected.
  • the water scrubber (14) is for washing the exhaust gas (F) treated in the reaction furnace (12) with water, and is provided with an exhaust gas inlet (14a) at the lower end.
  • This water scrubber (14) is also erected on the water tank (20) in the same manner as the reaction tube (12a), so that the water sprayed from the spray nozzle (14c) is sent to the water tank (20). It has become.
  • a gas-liquid contact means (18), which will be described later, is attached to the upper part of the scrubber body (14b), and the treated exhaust gas (F) is discharged into the atmosphere at the top outlet of the gas-liquid contact means (18). Connected to the exhaust fan (26) that discharges into the interior.
  • the electrolyzed water production apparatus (16) is an apparatus for producing alkaline ionized water (A) having an alkaline pH of 11 or more and an acid-reduction potential of ⁇ 800 mV or less, and a permselective membrane (for example, a positive permeable membrane). It has a reaction vessel (not shown) in which a positive electrode having Pt (platinum) isotropic force and a negative electrode having Pt isotropic force are opposed to each other via ion permeation). Alkaline ionized water (A) is produced by supplying raw water to this reaction tank and supplying power to each electrode.
  • brine having a pH of about 4 to about LO is used as it is.
  • “boiled water” refers to water that can easily be obtained from the wells such as tap water, well water, and industrial water, and usually contains impurity ions such as sodium and potassium.
  • the exhaust gas treatment device (10) of this example is provided with a water pipe (28) having one end connected to a city water supply such as water supply or well water and the other end connected to a spray nozzle (14c).
  • the brine is supplied to the electrolyzed water production device (16) through the branch water pipe (28a) branched from the water pipe (28).
  • the gas-liquid contact means (18) is provided in the upper part (downstream of the exhaust gas (F) flow direction) in the scrubber body (14b), and is manufactured by the exhaust gas (F) and the electrolyzed water production device (16).
  • Gas and liquid with alkaline ionized water (A) It is for making it contact, and has a porous body filling layer (18a) and an alkali ion water dropping nozzle (18b).
  • the porous material filling layer (18a) is filled with a porous material (30) composed of activated carbon having a fine mesh pores, porous alumina, or hydrophilic sponge having open cells. It is a layer constructed as follows. This porous material packed bed (18a) is attached so that the exhaust gas (F) can be divided through the internal space of the scrubber body (14b), and the alkaline ionized water dripping nozzle (18b) force is also provided. The dropped alkaline ionized water (A) stays in the porous material packed bed (18a) for a certain period.
  • the alkaline ionized water dropping nozzle (18b) is provided above the porous body packed layer (18a) and drops alkaline ionized water (A) so as to face the exhaust gas (F) flow direction.
  • the nozzle body (32) is connected to a supply pipe (34) for supplying alkaline ionized water (A) produced by the electrolyzed water production apparatus (16) to the nozzle body (32).
  • the force shown in the case where the gas-liquid contact means (18) is composed of the porous material packed layer (18a) and the alkali ion water dropping nozzle (18b) is shown in FIG.
  • a porous plate (36a) that divides the internal space of the scrubber body (14b) is attached, and the size of the pores of the porous plate (36a) and the amount of passing air are balanced.
  • a bubbling tank (36) for storing alkali ion water (A) dropped from the alkali ion water dropping nozzle (18b) may be provided on the upper surface of the porous plate (36a).
  • Liquid contact means (18) may be used.
  • the gas-liquid contact means (18) is composed of the porous material packed layer (18a) or the publishing tank (36) and the alkaline ionized water dropping nozzle (18b), so that a small amount of alkaline ionized water is used. (A) Even if the amount used, the exhaust gas (F) and the alkaline ionized water (A) can be reliably brought into gas-liquid contact.
  • the method of adding water vapor or oxygen to the internal space (R) of the reaction tube (12a) together with the exhaust gas (F) is (a) water vapor or oxygen adjusted in a separate line from the exhaust gas (F).
  • the exhaust gas (F) is mixed and supplied to the exhaust gas supply pipe (24).
  • the exhaust gas (F) is washed with a water scrubber (not shown) to remove water-soluble components and dust.
  • water is supplied to the exhaust gas (F) and the exhaust gas (F) containing this water is supplied to the internal space (R) of the reaction tube (12a) (via the exhaust gas supply pipe (24)). It may be a method.
  • the exhaust gas (F) treated in the internal space (R) of the reaction tube (12a) is given to the water scrubber (14) by the negative pressure generated by the operation of the exhaust fan (26).
  • Water is injected into the exhaust gas (F) from the downward spray nozzle (14c).
  • more than 90% of the chlorine-derived components (specifically, salt-hydrogen or chlorate) converted in the reactor (12) and most of the hydrogen fluoride among the components derived from sulfur hexafluoride.
  • a part of sulfur dioxide is absorbed by water and removed from the exhaust gas (F).
  • a plasma jet torch (12b) using a small power source with an output of less than 15 kW is used, and exhaust gas (F) for a total flow rate of 100 liters Z, including 500 cc of chlorine and 500 cc of sulfur hexafluoride.
  • exhaust gas (F) for a total flow rate of 100 liters Z, including 500 cc of chlorine and 500 cc of sulfur hexafluoride.
  • the exhaust gas (F) washed with the water scrubber (14) passes through the porous body packed bed (18a). At that time, it comes into gas-liquid contact with alkaline ionized water (A). Then, chlorine remaining in the exhaust gas (F) or components derived from it (for example, chloric acid) etc. and neutral water, which is difficult to dissolve in neutral water, is absorbed by alkaline ionized water (A), Most of these exhaust gases (F) are removed. Specifically, chlorine that remained at about lOOppm after passing through the water scrubber (14) was reduced to about 0.1 ppm, and that from about 6 litters that remained at about lOOppm after passing through the water scrubber (14) was reduced to 0. It can be reduced to about 2ppm.
  • exhaust gas (F) that has been conventionally detoxified by separate methods without using an alkaline agent such as caustic soda. Chlorine and sulfur hexafluoride can be reduced below the TLV value by a single method.
  • the exhaust gas (F) is reacted with at least one of water vapor or oxygen at a high temperature and then washed with water, that is, the chlorine in the exhaust gas (F). Futsui ⁇ Most of the sulfur can be easily dissolved in water, converted into substances, and then washed with water. At this stage, most of the chlorine or sulfur hexafluoride in the exhaust gas (F) is removed. be able to. Therefore, after that, just by bringing a small amount of alkaline ionized water (A) into gas-liquid contact with the washed exhaust gas (F), harmful components remaining in the exhaust gas (F) can be removed almost completely. it can.
  • the amount of alkali ion water (A) can be significantly reduced, and the exhaust gas treatment device (10) (more specifically, the electrolyzed water production device (16) used for the production of alkali ion water (A)). Can be made compact. Further, even if the exhaust gas (F) containing a high concentration of chlorine or sulfur hexafluoride is a large-capacity exhaust gas (F), the detoxification treatment can be reliably performed.
  • gas-liquid contact means (18) is incorporated in the water scrubber (14) in the present embodiment, the gas-liquid contact means (18) is independent of the water scrubber (14). It may be provided as a separate item.
  • atmospheric pressure plasma (P) is used as a heat source.
  • This heat source may be any type, for example, an electric heater or a combustion flame generated by burning fuel such as natural gas. If atmospheric pressure plasma (P) or an electric heater is used as the heat source, chlorine and sulfur hexafluoride in the exhaust gas (F) can be safely removed using only electricity and water. Can be reliably removed to a certain level.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

A single method of discharge gas treatment in which chlorine and sulfur hexafluoride can be efficiently removed without fail from a discharge gas without using a liquid alkali agent; and an apparatus for the method. The method of discharge gas treatment comprises purifying a discharge gas (F) containing at least one of chlorine and sulfur hexafluoride, and is characterized in that the discharge gas (F) is reacted at a high temperature with at least one of water vapor and oxygen and then washed with water and the discharge gas (F) washed with water is brought into contact with an alkali ion water (A) through gas/liquid contacting. Due to such constitution, the chlorine and sulfur hexafluoride contained in a discharge gas (F), which have conventionally been removed by respective separate methods, can be removed by a single method to a value not higher than a TLV without using an alkali chemical such as caustic soda.

Description

明 細 書  Specification

排ガス処理方法およびその装置  Exhaust gas treatment method and apparatus

技術分野  Technical field

[0001] 本発明は、塩素又は六フッ化硫黄の少なくとも一方を含む排ガスを安全なガスにし て排出する排ガス処理方法とその装置に関する。  The present invention relates to an exhaust gas treatment method and apparatus for exhausting exhaust gas containing at least one of chlorine and sulfur hexafluoride as a safe gas.

背景技術  Background art

[0002] 半導体製造工程で使用された塩素及び六フッ化硫黄は、他のガス (例えば PFCsな ど)と混合した状態で排ガスとして排出されて 、る。このような排ガスに含まれる塩素は 人体に対する毒性が極めて高ぐまた、六フッ化硫黄は人体に対する毒性は低いも のの、地球温暖化係数 (GWP)が COに比べて数万倍と非常に大きぐ加えて大気寿  [0002] Chlorine and sulfur hexafluoride used in the semiconductor manufacturing process are discharged as exhaust gas in a mixed state with other gases (for example, PFCs). Chlorine contained in such exhaust gas is extremely toxic to the human body, and sulfur hexafluoride has low toxicity to the human body, but its global warming potential (GWP) is tens of thousands of times that of CO. In addition to atmospheric life

2  2

命も長いことから、大気中へ少量排出した場合であってもその影響は甚大なものとな る。そこで、従来より、使用済みとなった塩素や六フッ化硫黄等を排ガス中から除害し 、大気中へ排出する塩素や六フッ化硫黄等の量を TLV値 [米国産業衛生専門家会 議 (ACGIH)が定めた労働衛生上の許容濃度]以下に削減する様々な技術の開発が 行われている。  Since the life is long, even if it is released into the atmosphere in a small amount, the effect is enormous. Therefore, conventionally used chlorine and sulfur hexafluoride are detoxified from the exhaust gas, and the amount of chlorine and sulfur hexafluoride etc. discharged into the atmosphere is determined by the TLV value [American Industrial Hygiene Experts Meeting Various technologies have been developed to reduce the concentration to less than the acceptable concentration for occupational health specified by (ACGIH).

[0003] ここで、このような排ガスを除害する方法として、除害したい成分を固形の吸着剤に 吸着させる吸着固定式、燃料炎や電熱ヒータ或いは常圧プラズマ等を使った加熱分 解式、化学反応を利用した反応分解式、水や薬液等を使用した湿式など、多くの方 法が用いられている。  [0003] Here, as a method of removing such exhaust gas, an adsorption fixed type in which a component to be removed is adsorbed on a solid adsorbent, a heating decomposition type using a fuel flame, an electric heater, atmospheric pressure plasma, or the like. Many methods are used, such as a reaction decomposition method using a chemical reaction and a wet method using water or a chemical solution.

[0004] このうち、除害対象物が塩素の場合、薬液として苛性ソーダやアンモニアなどのァ ルカリ薬液を用いた湿式スクラバで吸収処理するのが一般的である。一方、除害対 象物が六フッ化硫黄の場合、燃焼炎、電熱ヒータ或いは常圧プラズマなどによってフ ッ素と硫黄との結合を切断し、これに水蒸気や酸素などを反応させてフッ化水素と二 酸化硫黄に代表される硫黄酸化物 (SOx)とを生成させる。そして、生成したフッ化水 素及び硫黄酸化物を、アルカリ薬液を用いた湿式スクラバで吸収処理するのが一般 的である。  [0004] Of these, when chlorine is the target of detoxification, absorption treatment is generally performed with a wet scrubber using alkaline chemicals such as caustic soda and ammonia as chemicals. On the other hand, when the object to be removed is sulfur hexafluoride, the fluorine-sulfur bond is broken by a combustion flame, an electric heater, or atmospheric pressure plasma, and this is reacted with water vapor, oxygen, etc. to fluorinate. Hydrogen and sulfur oxides (SOx) represented by sulfur dioxide are generated. The generated hydrogen fluoride and sulfur oxide are generally absorbed by a wet scrubber using an alkaline chemical solution.

[0005] このように、塩素及び六フッ化硫黄を除害するためにそれぞれ異なった除害プロセ スが採用されているものの、各除害プロセスは、共に苛性ソーダやアンモニアなどの アルカリ薬剤を使用していることから、高濃度で且つ大量のアルカリ薬剤を排ガス処 理装置の近くに用意しなければない。しかしながら、半導体の製造が行われるタリー ンルーム環境下では、アルカリ薬剤による室内環境の汚染を回避しなければならず、 アルカリ薬剤の貯蔵が非常に困難であるという問題があった。 [0005] Thus, different detoxification processes are used to detoxify chlorine and sulfur hexafluoride. However, since each abatement process uses alkaline chemicals such as caustic soda and ammonia, a high concentration and a large amount of alkaline chemicals must be prepared near the exhaust gas treatment device. Absent. However, in a tailored room environment where semiconductors are manufactured, there is a problem that it is very difficult to store alkaline chemicals because contamination of the indoor environment by alkaline chemicals must be avoided.

[0006] そこで、このようなアルカリ薬剤を使用せず、効率的に排ガス中の塩素ゃ六フツイ匕 硫黄の分解生成物である硫黄酸ィ匕物を排ガス中から除去する技術として、薬液とし てアルカリイオン水 (還元性電解水)を使用する湿式スクラバを用い、排ガスをアルカリ イオン水と気液接触させる技術が提案されて 、る。  [0006] Therefore, as a technique for efficiently removing sulfur oxides, which are decomposition products of chlorinated hexafluorosulfur and sulfur in exhaust gas, without using such an alkaline agent, as a chemical solution, A technique has been proposed in which exhaust gas is brought into gas-liquid contact with alkaline ionized water using a wet scrubber that uses alkaline ionized water (reducing electrolyzed water).

[0007] 力かる技術によれば、薬液として苛性ソーダやアンモニアといったアルカリ薬液を使 用することなぐ排ガス中の塩素や硫黄酸ィ匕物等を吸収して無害化することができ、 これら有害ガスの大気中への排出量を著しく低減することができる。  [0007] According to powerful technology, chlorine, sulfur oxides, etc. in exhaust gas can be absorbed and detoxified without using alkaline chemicals such as caustic soda and ammonia as chemicals. Emissions into the atmosphere can be significantly reduced.

特許文献 1 :特開 2000— 157830号公報  Patent Document 1: Japanese Unexamined Patent Publication No. 2000-157830

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0008] し力しながら、排ガス中の塩素や六フッ化硫黄の濃度が高い場合や排出される排 ガスの量が多い場合、多量のアルカリイオン水が必要となり、そのためにはアルカリィ オン水を製造する電解水製造装置を大型化しなければならず、設備費やランニング コストが著しく上昇するという問題があった。 [0008] However, when the concentration of chlorine or sulfur hexafluoride in the exhaust gas is high or the amount of exhaust gas discharged is large, a large amount of alkaline ionized water is required. The electrolyzed water production apparatus to be produced had to be enlarged, and there was a problem that the equipment cost and running cost increased significantly.

[0009] また、上述のように、従来、排ガス中の塩素及び六フッ化硫黄はそれぞれ別個のプ 口セスで除害処理されて!、たが、これらを共に除害できる単一の排ガス処理方法の 開発が望まれていた。 [0009] In addition, as described above, conventionally, chlorine and sulfur hexafluoride in exhaust gas have been detoxified by separate processes! However, a single exhaust gas treatment that can detoxify them together. Development of a method was desired.

[0010] それゆえ、本発明の主たる課題は、薬液としてアルカリ薬液を使用することなぐ排 ガス中から塩素及び六フッ化硫黄を効率よく確実に除去することが可能な単一の排 ガス処理方法とその装置を提供することである。  [0010] Therefore, the main subject of the present invention is a single exhaust gas treatment method capable of efficiently and reliably removing chlorine and sulfur hexafluoride from exhaust gas without using an alkaline chemical as the chemical. And to provide the device.

課題を解決するための手段  Means for solving the problem

[0011] 請求の範囲第 1項に記載した発明は、「塩素又は六フッ化硫黄の少なくとも一方を 含む排ガス (F)を清浄ィ匕する排ガス処理方法であって、排ガス (F)を高温下で水蒸気 又は酸素の少なくとも一方と反応させた後、水洗し、水洗した排ガス (F)をさらにアル カリイオン水 (A)に気液接触させる」排ガス処理方法である。 [0011] The invention described in claim 1 is an "exhaust gas treatment method for purifying exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride, wherein the exhaust gas (F) is heated at a high temperature. With water vapor Alternatively, after reacting with at least one of oxygen, washing with water, the washed exhaust gas (F) is further brought into gas-liquid contact with the alkaline ionized water (A) ”.

[0012] この発明では、先ず始めに塩素又は六フッ化硫黄の少なくとも一方を含む排ガス (F )を高温下で水蒸気又は酸素の少なくとも一方と反応させているので、排ガス 中の 塩素は、水に溶け易い塩ィ匕水素或いは塩素酸ィ匕物に、また、排ガス (F)中の六フッ化 硫黄は、水に溶け易いフッ化水素と中性の水では溶けにくい二酸ィ匕硫黄とに変換さ れる。このため、これら生成物を含む排ガス (F)を水洗することによって排ガス (F)中の 塩化水素或いは塩素酸化物の 90%以上、フッ化水素の殆ど及び二酸ィヒ硫黄の一 部を排ガス (F)中から除去することができる。  [0012] In the present invention, firstly, the exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride is reacted with at least one of water vapor and oxygen at a high temperature, so that chlorine in the exhaust gas is converted into water. It is easily dissolved in salty hydrogen or chloric acid, and sulfur hexafluoride in the exhaust gas (F) is converted into hydrogen fluoride that is soluble in water and sulfur dioxide that is difficult to dissolve in neutral water. Converted. Therefore, by washing the exhaust gas (F) containing these products with water, 90% or more of hydrogen chloride or chlorine oxide in the exhaust gas (F), most of the hydrogen fluoride, and a part of sulfur dioxide are exhausted. (F) It can be removed from the inside.

[0013] そして、水洗した排ガス (F)をさらにアルカリイオン水 (A)に気液接触させているので 、排ガス (F)中に残留する塩素およびこの塩素に由来する成分或!ヽは中性の水では 溶けにくい二酸ィ匕硫黄をアルカリイオン水 (A)でほとんど吸収し、排ガス (F)から除去 することができる。  [0013] Since the washed exhaust gas (F) is further brought into gas-liquid contact with the alkaline ionized water (A), chlorine remaining in the exhaust gas (F) and components derived from this chlorine or soot are neutral. Almost all of the sulfur dioxide that is hardly soluble in water is absorbed by alkaline ionized water (A) and can be removed from the exhaust gas (F).

[0014] 請求の範囲第 2項に記載した発明は、請求の範囲第 1項に記載の排ガス処理方法 を実施可能な排ガス処理装置 (10)に関するものであり、「排ガス (F)と水蒸気又は酸素 の少なくとも一方とを高温下で反応させる反応炉 (12)と、反応炉 (12)で処理した排ガス (F)を水洗する水スクラバ (14)と、アルカリイオン水 (A)を製造する電解水製造装置 (16) と、水スクラバ (14)にて水洗された排ガス (F)に電解水製造装置 (16)で製造したアル力 リイオン水 (A)を気液接触させる気液接触手段 (18)とを備える」排ガス処理装置 (10)で ある。  [0014] The invention described in claim 2 relates to an exhaust gas treatment device (10) capable of carrying out the exhaust gas treatment method described in claim 1, wherein "exhaust gas (F) and steam or A reactor (12) for reacting at least one of oxygen at high temperature, a water scrubber (14) for washing exhaust gas (F) treated in the reactor (12), and an electrolysis for producing alkaline ionized water (A) Gas-liquid contact means for bringing the Al-ion reion water (A) produced by the electrolyzed water production device (16) into gas-liquid contact with the water production device (16) and the exhaust gas (F) washed with water scrubber (14) ( 18) ”is an exhaust gas treatment device (10).

[0015] 請求の範囲第 3項に記載した発明は、請求の範囲第 2項に記載の排ガス処理装置 (10)において、「反応炉 (12)力 常圧プラズマ (P)又は電熱ヒータのいずれか、あるい は燃焼炎を熱源として ヽる」ことを特徴とするもので、常圧プラズマ (P)又は電熱ヒータ のいずれかを熱源とする場合、電気と水だけで排ガス (F)中の塩素や六フッ化硫黄を 安全なレベルまで確実に除去することができる。一方、燃焼炎を熱源とする場合、天 然ガスなどの燃料を燃焼して燃焼炎を生成したときに排ガス (F)の分解によって生じる 物質とは別に硫黄酸ィ匕物などの副生ガスを生じるが、このような副生ガスもアルカリィ オン水 (A)で吸収して排ガス (F)中から除去することができる。 発明の効果 [0015] The invention described in claim 3 is the exhaust gas treatment device (10) according to claim 2, wherein either of "reactor (12) force normal pressure plasma (P) or electric heater" is used. `` Or the combustion flame is used as a heat source '', and when either the atmospheric pressure plasma (P) or the electric heater is used as the heat source, only electricity and water are used in the exhaust gas (F). It can reliably remove chlorine and sulfur hexafluoride to a safe level. On the other hand, when a combustion flame is used as a heat source, by-product gases such as sulfur oxides are separated from substances generated by the decomposition of exhaust gas (F) when a combustion flame is generated by burning a fuel such as natural gas. Although this occurs, such a by-product gas can also be absorbed by the alkaline water (A) and removed from the exhaust gas (F). The invention's effect

[0016] 本発明によれば、苛性ソーダなどのアルカリ薬液を用いることなぐ従来はそれぞれ 別個の方法で除害していた排ガス中の塩素及び六フッ化硫黄を単一の方法で TLV 値以下にまで低減することができる。  [0016] According to the present invention, chlorine and sulfur hexafluoride in exhaust gas, each of which has been conventionally detoxified by a separate method without using an alkaline chemical solution such as caustic soda, can be reduced to a TLV value or less by a single method. Can be reduced.

[0017] また、排ガスの処理に際し、まず始めに、排ガスを高温下で水蒸気又は酸素の少な くとも一方と反応させた後水洗する。すなわち、排ガス中の塩素や六フッ化硫黄の大 部分を水に溶け易い物質に変換した後、これらを水洗するようにしているので、この 段階で排ガス中の塩素或いは六フッ化硫黄の大半を除去することができる。したがつ て、この後、水洗した排ガスに少量のアルカリイオン水を気液接触させるだけで排ガ ス中に残留する有害成分をほぼ完璧に排ガスから除去することができる。それ故、ァ ルカリイオン水の量を著しく低減することができ、排ガス処理装置 (より具体的にはァ ルカリイオン水の製造に用いる電解水製造装置)をコンパクトなものにすることができ る。また、高濃度の塩素又は六フッ化硫黄を含む排ガスや大容量の排ガスであって も確実に除害処理することができる。  [0017] In the treatment of exhaust gas, first, the exhaust gas is reacted with at least one of water vapor and oxygen at high temperature and then washed with water. In other words, most of the chlorine and sulfur hexafluoride in the exhaust gas are converted to substances that are soluble in water and then washed with water. At this stage, most of the chlorine or sulfur hexafluoride in the exhaust gas is removed. Can be removed. Therefore, the harmful components remaining in the exhaust gas can be almost completely removed from the exhaust gas simply by bringing a small amount of alkaline ionized water into gas-liquid contact with the washed exhaust gas. Therefore, the amount of alkaline ionized water can be remarkably reduced, and the exhaust gas treatment device (more specifically, the electrolyzed water producing device used for producing alkaline ionized water) can be made compact. In addition, even an exhaust gas containing a high concentration of chlorine or sulfur hexafluoride or a large volume of exhaust gas can be reliably removed.

図面の簡単な説明  Brief Description of Drawings

[0018] [図 1]本発明における 1の実施例の排ガス処理装置を示す概略図である FIG. 1 is a schematic view showing an exhaust gas treatment apparatus according to one embodiment of the present invention.

[図 2]本発明における他の実施例の排ガス処理装置を示す概略図である  FIG. 2 is a schematic view showing an exhaust gas treatment apparatus according to another embodiment of the present invention.

符号の説明  Explanation of symbols

[0019] (10)· ··排ガス処理装置 [0019] (10) ... Exhaust gas treatment equipment

(12)…反応炉  (12)… Reactor

(12a)…反応筒  (12a) ... Reaction tube

(12b)…プラズマジェットトーチ  (12b)… Plasma jet torch

(14)…水スクラバ  (14)… Water scrubber

(14b)…スクラバ本体  (14b) ... scrubber body

(14c)…スプレーノズル  (14c) Spray nozzle

(16)…電解水製造装置  (16)… Electrolyzed water production equipment

(18)…気液接触手段  (18)… Gas-liquid contact means

(24)…排ガス送給配管 (26)· ··排気ファン (24)… Exhaust gas supply piping (26) ... Exhaust fan

(28)…配水管  (28)… Water pipe

(28a)…枝配水管  (28a) ... Branch water pipe

(P)…常圧プラズマ  (P)… Atmospheric pressure plasma

(R)…内部空間  (R) ... Internal space

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0020] 以下、本発明を図示実施例に従って詳述する。図 1は、本発明の排ガス処理方法 を実施する排ガス処理装置 (10)の 1の実施例を示す概略図である。この図が示すよう に、本実施例の排ガス処理装置 (10)は、大略、反応炉 (12)、水スクラバ (14)、電解水 製造装置 (16)および気液接触手段 (18)で構成されている。  Hereinafter, the present invention will be described in detail according to the illustrated embodiments. FIG. 1 is a schematic view showing one embodiment of an exhaust gas treatment apparatus (10) for carrying out the exhaust gas treatment method of the present invention. As shown in this figure, the exhaust gas treatment device (10) of this example is roughly composed of a reactor (12), a water scrubber (14), an electrolyzed water production device (16), and a gas-liquid contact means (18). Has been.

[0021] 反応炉 (12)は、半導体製造工程など力 排出された塩素又は六フッ化硫黄の少な くとも一方を含む排ガス (F)を高温下で水蒸気或いは酸素と反応させるためのもので あり、反応筒 (12a)とプラズマジェットトーチ (12b)とを有する。ここで、排ガス (F)を水蒸 気或いは酸素と反応させる際の温度条件としては、 1000°C以上の高温であることが 好ましい。力かる温度条件であれば、六フッ化硫黄のフッ素と硫黄との結合を確実に 切断することができると共に、排ガス (F)中に C Fなど他の PFCsが含まれていても、  [0021] The reaction furnace (12) is for reacting the exhaust gas (F) containing at least one of chlorine or sulfur hexafluoride, such as semiconductor manufacturing processes, with water vapor or oxygen at a high temperature. And a reaction tube (12a) and a plasma jet torch (12b). Here, the temperature condition for reacting the exhaust gas (F) with water vapor or oxygen is preferably a high temperature of 1000 ° C or higher. If the temperature conditions are strong, the bond between fluorine and sulfur in sulfur hexafluoride can be reliably broken, and even if the exhaust gas (F) contains other PFCs such as CF,

2 6  2 6

その大半を熱分解することができるからである。なお、排ガス (F)中に PFCsのうち分 解が困難な CFが含まれて 、る場合には少なくとも 1 ,400〜 1 , 500°C程度の高温が  This is because most of them can be pyrolyzed. If the exhaust gas (F) contains CF, which is difficult to dissociate, PFCs have a high temperature of at least about 1,400 to 1,500 ° C.

4  Four

必要となる。また、温度条件の上限は反応炉 (12)を構成する材料の耐熱性に依存す る。  Necessary. The upper limit of the temperature condition depends on the heat resistance of the material constituting the reactor (12).

[0022] 反応筒 (12a)は、キャスタブルなどの耐火材料で形成され、内部空間 (R)を有してお り、両端が開口した直管型の部材である。本実施例では、この反応筒 (12a)が水を貯 留する水槽 (20)の上に立設されており、反応筒 (12a)の上端には、熱源となる常圧ブラ ズマ (P)を生成するためのプラズマジェットトーチ (12b)が開口を閉塞するように取り付 けられている。また、反応筒 (12a)の上部には、反応筒 (12a)の内部空間 (R)に向けて排 ガス (F)と水蒸気或いは酸素とを供給する排ガス送給配管 (24)の一端が接続されて 、 る。  [0022] The reaction cylinder (12a) is a straight pipe member formed of a refractory material such as castable, having an internal space (R), and having both ends open. In this embodiment, the reaction cylinder (12a) is erected on a water tank (20) for storing water, and an atmospheric pressure plasma (P) serving as a heat source is placed at the upper end of the reaction cylinder (12a). A plasma jet torch (12b) for generating water is attached so as to close the opening. In addition, one end of an exhaust gas supply pipe (24) for supplying exhaust gas (F) and water vapor or oxygen toward the internal space (R) of the reaction cylinder (12a) is connected to the upper part of the reaction cylinder (12a). It has been.

[0023] ここで、プラズマジェットトーチ (12b)とは、ノズルからなるアノードと前記アノード内に 配設された力ソードとを有し、このアノードと力ソードとの間に放電電圧を印加すると 共に、アノード内に窒素などの作動ガスを送給することによって、アノード先端のブラ ズマジェット噴出孔カも高温の常圧プラズマ (P)を噴出させるものである。 [0023] Here, the plasma jet torch (12b) is an anode composed of a nozzle and the anode. A plasma jet outlet hole cap at the tip of the anode is provided by applying a discharge voltage between the anode and the force sword and feeding a working gas such as nitrogen into the anode. Also, high temperature atmospheric pressure plasma (P) is ejected.

[0024] 水スクラバ (14)は、反応炉 (12)で処理した排ガス (F)を水洗するためのものであり、下 端部に排ガス導入口 (14a)が設けられ、図 1中の下方力も上方に向けて排ガス (F)が 通流する直管型のスクラバ本体 (14b)と、排ガス (F)の通流方向に対向するように上方 力も下方に向けて水を噴射する下向きのスプレーノズル (14c)とで構成されている。  [0024] The water scrubber (14) is for washing the exhaust gas (F) treated in the reaction furnace (12) with water, and is provided with an exhaust gas inlet (14a) at the lower end. A straight pipe type scrubber body (14b) through which exhaust gas (F) flows upward, and a downward spray that injects water downward and upward so that the exhaust gas (F) flows in the opposite direction. It consists of a nozzle (14c).

[0025] この水スクラバ (14)も、反応筒 (12a)と同様に水槽 (20)上に立設されており、スプレー ノズル (14c)から噴射された水が水槽 (20)に送り込まれるようになつている。また、スクラ バ本体 (14b)の上部には、後述する気液接触手段 (18)が取り付けられると共に、この 気液接触手段 (18)の頂部出口には、処理済みの排ガス (F)を大気中へと放出する排 気ファン (26)が接続されて 、る。  [0025] This water scrubber (14) is also erected on the water tank (20) in the same manner as the reaction tube (12a), so that the water sprayed from the spray nozzle (14c) is sent to the water tank (20). It has become. A gas-liquid contact means (18), which will be described later, is attached to the upper part of the scrubber body (14b), and the treated exhaust gas (F) is discharged into the atmosphere at the top outlet of the gas-liquid contact means (18). Connected to the exhaust fan (26) that discharges into the interior.

[0026] 電解水製造装置 (16)は、 pHが 11以上のアルカリ性で且つ酸ィ匕還元電位が— 800 mV以下のアルカリイオン水 (A)を製造する装置であり、選択透過膜 (例えば陽イオン 透過)を介して、 Pt (白金)等力もなる陽電極と同じく Pt等力もなる陰電極とが対向配設 された反応槽 (図示せず)を有する。この反応槽に原水を供給して各電極に電力を供 給することによってアルカリイオン水 (A)が製造される。  The electrolyzed water production apparatus (16) is an apparatus for producing alkaline ionized water (A) having an alkaline pH of 11 or more and an acid-reduction potential of −800 mV or less, and a permselective membrane (for example, a positive permeable membrane). It has a reaction vessel (not shown) in which a positive electrode having Pt (platinum) isotropic force and a negative electrode having Pt isotropic force are opposed to each other via ion permeation). Alkaline ionized water (A) is produced by supplying raw water to this reaction tank and supplying power to each electrode.

[0027] 本実施例では、アルカリイオン水 (A)を製造するための原水として、 pH4〜: LO程度 の巿水をそのまま用いている。ここで、「巿水」とは、上水道水や井戸水や工業用水な ど、巿井の水道力も簡単に入手できる水のことであり、通常、ナトリウムやカリウムなど の不純物イオンを含む。原水としてこのような巿水を用いることによって、原水の確保 および電解水製造装置 (16)への供給を容易且つ簡便に行うことができる。なお、本実 施例の排ガス処理装置 (10)は、一端が上水道や井戸水など市井の水道に接続され 他端力スプレーノズル (14c)に接続された配水管 (28)を備えており、この配水管 (28)か ら分枝した枝配水管 (28a)を介して巿水が電解水製造装置 (16)に供給されるようにな つている。  [0027] In this example, as raw water for producing alkaline ionized water (A), brine having a pH of about 4 to about LO is used as it is. Here, “boiled water” refers to water that can easily be obtained from the wells such as tap water, well water, and industrial water, and usually contains impurity ions such as sodium and potassium. By using such brine as the raw water, the raw water can be secured and supplied to the electrolyzed water production device (16) easily and simply. The exhaust gas treatment device (10) of this example is provided with a water pipe (28) having one end connected to a city water supply such as water supply or well water and the other end connected to a spray nozzle (14c). The brine is supplied to the electrolyzed water production device (16) through the branch water pipe (28a) branched from the water pipe (28).

[0028] 気液接触手段 (18)は、スクラバ本体 (14b)内の上部 (排ガス (F)通流方向の下流側)に 設けられ、排ガス (F)と電解水製造装置 (16)で製造したアルカリイオン水 (A)とを気液 接触させるためのものであり、多孔質体充填層 (18a)とアルカリイオン水滴下ノズル (18 b)とを有する。 [0028] The gas-liquid contact means (18) is provided in the upper part (downstream of the exhaust gas (F) flow direction) in the scrubber body (14b), and is manufactured by the exhaust gas (F) and the electrolyzed water production device (16). Gas and liquid with alkaline ionized water (A) It is for making it contact, and has a porous body filling layer (18a) and an alkali ion water dropping nozzle (18b).

[0029] 多孔質体充填層 (18a)は、網目状の微細孔を有する活性炭や多孔質アルミナ或!ヽ は連続気泡を有する親水性のスポンジなどで構成された多孔質体 (30)を充填して構 成された層である。この多孔質体充填層 (18a)は、排ガス (F)がスクラバ本体 (14b)の内 部空間を通流可能に仕切るように取り付けられており、また、アルカリイオン水滴下ノ ズル (18b)力も滴下したアルカリイオン水 (A)が一定期間、多孔質体充填層 (18a)に滞 留するようになっている。このため、排ガス (F)が多孔質体充填層 (18a)を通過する際、 多孔質体 (30)の微多孔に含まれたアルカリイオン水 (A)と排ガス (F)とを広い接触面積 にて効率よく気液接触させることができる。  [0029] The porous material filling layer (18a) is filled with a porous material (30) composed of activated carbon having a fine mesh pores, porous alumina, or hydrophilic sponge having open cells. It is a layer constructed as follows. This porous material packed bed (18a) is attached so that the exhaust gas (F) can be divided through the internal space of the scrubber body (14b), and the alkaline ionized water dripping nozzle (18b) force is also provided. The dropped alkaline ionized water (A) stays in the porous material packed bed (18a) for a certain period. For this reason, when the exhaust gas (F) passes through the porous material packed bed (18a), the alkaline ionized water (A) contained in the micropores of the porous material (30) and the exhaust gas (F) are in a wide contact area. Can be efficiently brought into gas-liquid contact.

[0030] アルカリイオン水滴下ノズル (18b)は、多孔質体充填層 (18a)の上方に設けられ、排 ガス (F)通流方向に対向するようにアルカリイオン水 (A)を滴下するものであり、ノズル 本体 (32)には、該ノズル本体 (32)に電解水製造装置 (16)で製造したアルカリイオン水 ( A)を供給する供給配管 (34)が接続されて 、る。  [0030] The alkaline ionized water dropping nozzle (18b) is provided above the porous body packed layer (18a) and drops alkaline ionized water (A) so as to face the exhaust gas (F) flow direction. The nozzle body (32) is connected to a supply pipe (34) for supplying alkaline ionized water (A) produced by the electrolyzed water production apparatus (16) to the nozzle body (32).

[0031] なお、本実施例では、気液接触手段 (18)が多孔質体充填層 (18a)とアルカリイオン 水滴下ノズル (18b)とで構成されている場合を示した力 図 2に示すように、多孔質体 充填層 (18a)に替えて、スクラバ本体 (14b)の内部空間を区画する多孔板 (36a)を取り 付け、多孔板 (36a)の孔の大きさと通過風量とをバランスさせて多孔板 (36a)の上面に アルカリイオン水滴下ノズル (18b)から滴下したアルカリイオン水 (A)を溜めるバブリン グ槽 (36)を設けるようにしてもよい。また、図示しないが、水スクラバ (14)と同様に、排 ガス (F)通流方向に対向するよう上方力もアルカリイオン水 (A)を噴射する下向きのス プレーノズルのみを設け、これを気液接触手段 (18)とするようにしてもよい。但し、上 述のように気液接触手段 (18)を多孔質体充填層 (18a)或いはパブリング槽 (36)とアル カリイオン水滴下ノズル (18b)とで構成することによって、少な 、アルカリイオン水 (A)使 用量であっても確実に排ガス (F)とアルカリイオン水 (A)とを気液接触させることができ る。  In this example, the force shown in the case where the gas-liquid contact means (18) is composed of the porous material packed layer (18a) and the alkali ion water dropping nozzle (18b) is shown in FIG. In this way, instead of the porous material packed bed (18a), a porous plate (36a) that divides the internal space of the scrubber body (14b) is attached, and the size of the pores of the porous plate (36a) and the amount of passing air are balanced. In addition, a bubbling tank (36) for storing alkali ion water (A) dropped from the alkali ion water dropping nozzle (18b) may be provided on the upper surface of the porous plate (36a). Although not shown in the drawing, as with the water scrubber (14), only a downward spray nozzle that injects alkaline ionized water (A) with an upward force so as to oppose the exhaust gas (F) flow direction is provided. Liquid contact means (18) may be used. However, as described above, the gas-liquid contact means (18) is composed of the porous material packed layer (18a) or the publishing tank (36) and the alkaline ionized water dropping nozzle (18b), so that a small amount of alkaline ionized water is used. (A) Even if the amount used, the exhaust gas (F) and the alkaline ionized water (A) can be reliably brought into gas-liquid contact.

[0032] 次に、以上のように構成された排ガス処理装置 (10)を用いて排ガス (F)中の塩素や 六フッ化硫黄を除去する方法にっ 、て説明する。 [0033] まず、始めに排ガス処理装置 (10)の電源 (図示せず)をオンにしてプラズマジェットト ーチ (12b)を作動させ、反応筒 (12a)内に熱源となる常圧プラズマ (P)を噴出させる。 Next, a method for removing chlorine and sulfur hexafluoride in the exhaust gas (F) using the exhaust gas treatment device (10) configured as described above will be described. [0033] First, the power source (not shown) of the exhaust gas treatment device (10) is turned on to operate the plasma jet torch (12b), and the atmospheric pressure plasma (12a) becomes a heat source in the reaction tube (12a). P) is ejected.

[0034] 続いて、常圧プラズマ (P)の熱により、反応筒 (12a)の内部空間 (R)の温度が 1000°C 以上の高温雰囲気になると、排気ファン (26)を作動させ、排ガス送給配管 (24)を通し て反応筒 (12a)の内部空間 (R)に排ガス (F)と水蒸気或いは酸素とを供給する。すると、 反応筒 (12a)内において、排ガス (F)中の塩素は、水に溶け易い塩ィ匕水素或いは塩素 酸化物に、また、排ガス (F)中の六フッ化硫黄は、水に溶け易いフッ化水素と中性の 水では溶けにくい二酸ィ匕硫黄とに変換される。  [0034] Subsequently, when the temperature of the internal space (R) of the reaction tube (12a) becomes a high temperature atmosphere of 1000 ° C or higher due to the heat of the atmospheric pressure plasma (P), the exhaust fan (26) is operated to Exhaust gas (F) and water vapor or oxygen are supplied to the internal space (R) of the reaction tube (12a) through the feed pipe (24). Then, in the reaction tube (12a), chlorine in the exhaust gas (F) dissolves in salty hydrogen or chlorine oxide, which is easily dissolved in water, and sulfur hexafluoride in the exhaust gas (F) dissolves in water. It is converted into hydrogen fluoride and disulfur disulfide, which are not easily dissolved by neutral water.

[0035] ここで、排ガス (F)と共に反応筒 (12a)の内部空間 (R)に水蒸気或いは酸素を添加す る方法は、(a)排ガス (F)とは別ラインで調整した水蒸気或いは酸素を排ガス (F)と混 合して排ガス送給配管 (24)に供給する方法、(b)排ガス (F)を水スクラバ (図示せず)で 水洗して水溶性成分や粉塵等を除去すると共に排ガス (F)に水分を与え、この水分を 含む排ガス (F)を (排ガス送給配管 (24)を介して)反応筒 (12a)の内部空間 (R)に供給す る方法など、如何なる方法であってもよい。但し、前記 (b)のように排ガス (F)を予め水 スクラバで水洗して反応筒 (12a)に与える方法であれば、反応筒 (12a)に導入される排 ガス (F)カゝら水溶性成分や粉塵が除去されているので、以降の除害処理の際、粉塵 等によるトラブルを防止することができる。  [0035] Here, the method of adding water vapor or oxygen to the internal space (R) of the reaction tube (12a) together with the exhaust gas (F) is (a) water vapor or oxygen adjusted in a separate line from the exhaust gas (F). (B) The exhaust gas (F) is mixed and supplied to the exhaust gas supply pipe (24). (B) The exhaust gas (F) is washed with a water scrubber (not shown) to remove water-soluble components and dust. In addition, water is supplied to the exhaust gas (F) and the exhaust gas (F) containing this water is supplied to the internal space (R) of the reaction tube (12a) (via the exhaust gas supply pipe (24)). It may be a method. However, if the exhaust gas (F) is previously washed with a water scrubber and given to the reaction tube (12a) as in (b), the exhaust gas (F) introduced into the reaction tube (12a) Since water-soluble components and dust are removed, troubles caused by dust and the like can be prevented during the subsequent detoxification treatment.

[0036] 続、て、反応筒 (12a)の内部空間 (R)で処理された排ガス (F)は、排気ファン (26)の作 動による負圧で水スクラバ (14)へと与えられ、この排ガス (F)に下向きのスプレーノズル (14c)から水が噴射される。すると、反応炉 (12)で変換された塩素由来の成分 (具体的 には塩ィ匕水素或いは塩素酸ィ匕物)の 90%以上、六フッ化硫黄由来の成分のうちフッ 化水素の殆ど及び二酸ィ匕硫黄の一部が水に吸収されて排ガス (F)中から除去される 。具体的には、プラズマジェットトーチ (12b)として出力 15kW未満の小型電源を使用 するものを用い、総流量 100リットル Z分、うち塩素 500ccZ分、六フッ化硫黄 500c cZ分の排ガス (F)を処理した場合、水スクラバ (14)での水洗が完了した段階で排ガス (F)中の塩素および六フッ化硫黄由来成分の濃度はそれぞれ lOOppm程度まで低減 されている。  [0036] Next, the exhaust gas (F) treated in the internal space (R) of the reaction tube (12a) is given to the water scrubber (14) by the negative pressure generated by the operation of the exhaust fan (26). Water is injected into the exhaust gas (F) from the downward spray nozzle (14c). Then, more than 90% of the chlorine-derived components (specifically, salt-hydrogen or chlorate) converted in the reactor (12), and most of the hydrogen fluoride among the components derived from sulfur hexafluoride. And a part of sulfur dioxide is absorbed by water and removed from the exhaust gas (F). Specifically, a plasma jet torch (12b) using a small power source with an output of less than 15 kW is used, and exhaust gas (F) for a total flow rate of 100 liters Z, including 500 cc of chlorine and 500 cc of sulfur hexafluoride. When treated, the concentration of chlorine and sulfur hexafluoride-derived components in the exhaust gas (F) has been reduced to about lOOppm at the stage when the water scrubber (14) has been washed.

[0037] 続いて、水スクラバ (14)で水洗された排ガス (F)は、多孔質体充填層 (18a)を通過す るが、その際、アルカリイオン水 (A)と気液接触する。すると、排ガス (F)中に残留する 塩素或いはこれに由来する成分 (例えば塩素酸ィ匕物等)や中性の水では溶けにくい 二酸ィ匕硫黄がアルカリイオン水 (A)に吸収され、これらのほとんど力排ガス (F)中から 除去される。具体的には、水スクラバ (14)通過後に lOOppm程度残留していた塩素を 0. lppm程度に、また、水スクラバ (14)通過後に lOOppm程度残留していた六フツイ匕 硫黄由来成分を 0. 2ppm程度にまで低減することができる。 [0037] Subsequently, the exhaust gas (F) washed with the water scrubber (14) passes through the porous body packed bed (18a). At that time, it comes into gas-liquid contact with alkaline ionized water (A). Then, chlorine remaining in the exhaust gas (F) or components derived from it (for example, chloric acid) etc. and neutral water, which is difficult to dissolve in neutral water, is absorbed by alkaline ionized water (A), Most of these exhaust gases (F) are removed. Specifically, chlorine that remained at about lOOppm after passing through the water scrubber (14) was reduced to about 0.1 ppm, and that from about 6 litters that remained at about lOOppm after passing through the water scrubber (14) was reduced to 0. It can be reduced to about 2ppm.

[0038] このように本実施例の排ガス処理装置 (10)及び排ガス処理方法によれば、苛性ソー ダなどのアルカリ薬剤を用いることなぐ従来はそれぞれ別個の方法で除害していた 排ガス (F)中の塩素や六フッ化硫黄を単一の方法で TLV値以下に低減することがで きる。 [0038] Thus, according to the exhaust gas treatment device (10) and the exhaust gas treatment method of the present embodiment, exhaust gas (F) that has been conventionally detoxified by separate methods without using an alkaline agent such as caustic soda. Chlorine and sulfur hexafluoride can be reduced below the TLV value by a single method.

[0039] また、排ガス (F)の処理に際し、まず始めに、排ガス (F)を高温下で水蒸気又は酸素 の少なくとも一方と反応させた後水洗する、すなわち、排ガス (F)中の塩素ゃ六フツイ匕 硫黄の大部分を水に溶け易 、物質に変換した後、これらを水洗するようにして 、るの で、この段階で排ガス (F)中の塩素或いは六フッ化硫黄の大半を除去することができ る。したがって、この後、水洗した排ガス (F)に少量のアルカリイオン水 (A)を気液接触 させるだけで排ガス (F)中に残留する有害成分をほぼ完璧に排ガス (F)力も除去する ことができる。それ故、アルカリイオン水 (A)の量を著しく低減することができ、排ガス処 理装置 (10)(より具体的にはアルカリイオン水 (A)の製造に用いる電解水製造装置 (16) )をコンパクトなものにすることができる。また、高濃度の塩素又は六フッ化硫黄を含む 排ガス (F)ゃ大容量の排ガス (F)であっても確実に除害処理することができる。  [0039] In the treatment of the exhaust gas (F), first, the exhaust gas (F) is reacted with at least one of water vapor or oxygen at a high temperature and then washed with water, that is, the chlorine in the exhaust gas (F). Futsui 易 Most of the sulfur can be easily dissolved in water, converted into substances, and then washed with water. At this stage, most of the chlorine or sulfur hexafluoride in the exhaust gas (F) is removed. be able to. Therefore, after that, just by bringing a small amount of alkaline ionized water (A) into gas-liquid contact with the washed exhaust gas (F), harmful components remaining in the exhaust gas (F) can be removed almost completely. it can. Therefore, the amount of alkali ion water (A) can be significantly reduced, and the exhaust gas treatment device (10) (more specifically, the electrolyzed water production device (16) used for the production of alkali ion water (A)). Can be made compact. Further, even if the exhaust gas (F) containing a high concentration of chlorine or sulfur hexafluoride is a large-capacity exhaust gas (F), the detoxification treatment can be reliably performed.

[0040] なお、本実施例では、気液接触手段 (18)を水スクラバ (14)内に内蔵する場合を示し たが、この気液接触手段 (18)を水スクラバ (14)とは独立した別個のものとして設けるよ うにしてもよい。  [0040] Although the gas-liquid contact means (18) is incorporated in the water scrubber (14) in the present embodiment, the gas-liquid contact means (18) is independent of the water scrubber (14). It may be provided as a separate item.

[0041] また、本実施例では熱源として常圧プラズマ (P)を用いる場合を示して 、るが、反応 筒 (12a)の内部空間 (R)を高温雰囲気にできるようなものであれば、この熱源は如何な るものであってもよく、例えば、電熱ヒータや天然ガス等の燃料を燃焼させて生成する 燃焼炎などであってもよい。なお、熱源として常圧プラズマ (P)又は電熱ヒータのいず れカを用いた場合には、電気と水だけで排ガス (F)中の塩素や六フッ化硫黄を安全 なレベルまで確実に除去することができる。一方、熱源として燃焼炎を用いた場合に は、天然ガスなどの燃料を燃焼して燃焼炎を生成した際に、排ガス (F)の分解によつ て生じる物質とは別に硫黄酸ィ匕物などの副生ガスが生じる力 このような副生ガスも アルカリイオン水 (A)で吸収して排ガス (F)中から除去することができる。 [0041] Further, in this embodiment, a case where atmospheric pressure plasma (P) is used as a heat source is shown. However, as long as the internal space (R) of the reaction tube (12a) can be in a high temperature atmosphere, This heat source may be any type, for example, an electric heater or a combustion flame generated by burning fuel such as natural gas. If atmospheric pressure plasma (P) or an electric heater is used as the heat source, chlorine and sulfur hexafluoride in the exhaust gas (F) can be safely removed using only electricity and water. Can be reliably removed to a certain level. On the other hand, when a combustion flame is used as a heat source, when a combustion flame is generated by burning a fuel such as natural gas, sulfur oxides are separated from the substances generated by the decomposition of exhaust gas (F). The force generated by by-products such as such by-products can be absorbed by the alkali ion water (A) and removed from the exhaust gas (F).

Claims

請求の範囲 The scope of the claims [1] 塩素又は六フッ化硫黄の少なくとも一方を含む排ガスを清浄化する排ガス処理方 法であって、  [1] An exhaust gas treatment method for purifying exhaust gas containing at least one of chlorine and sulfur hexafluoride, 前記排ガスを高温下で水蒸気又は酸素の少なくとも一方と反応させた後、水洗し、 水洗した前記排ガスをさらにアルカリイオン水に気液接触させる排ガス処理方法。  An exhaust gas treatment method in which the exhaust gas is reacted with at least one of water vapor or oxygen at a high temperature, then washed with water, and the washed exhaust gas is further brought into gas-liquid contact with alkaline ionized water. [2] 排ガスと水蒸気又は酸素の少なくとも一方とを高温下で反応させる反応炉と、 前記反応炉で処理した排ガスを水洗する水スクラバと、  [2] A reaction furnace for reacting exhaust gas with at least one of water vapor or oxygen at high temperature, a water scrubber for washing exhaust gas treated in the reaction furnace, アルカリイオン水を製造する電解水製造装置と、  Electrolyzed water production apparatus for producing alkaline ionized water; 前記水スクラバにて水洗された排ガスに前記電解水製造装置で製造したアルカリィ オン水を気液接触させる気液接触手段とを備える排ガス処理装置。  An exhaust gas treatment apparatus comprising gas-liquid contact means for bringing the alkaline water produced by the electrolyzed water production apparatus into gas-liquid contact with the exhaust gas washed with the water scrubber. [3] 前記反応炉は、常圧プラズマ又は電熱ヒータの ヽずれか、ある!/ヽは燃焼炎を熱源と していることを特徴とする請求の範囲第 2項に記載の排ガス処理装置。 [3] The exhaust gas treatment apparatus according to claim 2, wherein the reaction furnace uses either a normal pressure plasma or an electric heater, or is! / Soot uses a combustion flame as a heat source.
PCT/JP2007/062397 2006-12-15 2007-06-20 Method of treating discharge gas and apparatus therefor Ceased WO2008072392A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008549209A JPWO2008072392A1 (en) 2006-12-15 2007-06-20 Exhaust gas treatment method and apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-338774 2006-12-15
JP2006338774 2006-12-15

Publications (1)

Publication Number Publication Date
WO2008072392A1 true WO2008072392A1 (en) 2008-06-19

Family

ID=39511424

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/062397 Ceased WO2008072392A1 (en) 2006-12-15 2007-06-20 Method of treating discharge gas and apparatus therefor

Country Status (2)

Country Link
JP (1) JPWO2008072392A1 (en)
WO (1) WO2008072392A1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011104531A (en) * 2009-11-18 2011-06-02 Japan Organo Co Ltd Air cleaner
WO2013140653A1 (en) * 2012-03-23 2013-09-26 Kurushima Takeo Method for treating discharge gas
EP2324902A4 (en) * 2008-09-08 2014-06-04 Taiyo Nippon Sanso Corp METHOD AND DEVICE FOR TREATING EXHAUST GAS
CN108579386A (en) * 2018-05-23 2018-09-28 绍兴市鼎泰节能环保科技有限公司 A kind of efficient chemical industry waste gas cleaning system
CN108607344A (en) * 2018-05-23 2018-10-02 绍兴市鼎泰节能环保科技有限公司 A kind of chloride containing work waste gas cleaning system
WO2020224572A1 (en) * 2019-05-06 2020-11-12 (Cnbm) Bengbu Design & Research Institute For Glass Industry Co., Ltd Process and device for producing a chalcogen-containing compound semiconductor
WO2023189306A1 (en) * 2022-03-30 2023-10-05 栗田工業株式会社 Cleaning method, cleaning liquid, and cleaning agent for exhaust gas treatment facility
WO2023199410A1 (en) * 2022-04-12 2023-10-19 カンケンテクノ株式会社 Method for treating exhaust gas containing nitrogen compound, and apparatus for said method
CN117401718A (en) * 2023-10-08 2024-01-16 湖北工业大学 A new method and device for resource-based conversion of sulfur hexafluoride

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000157830A (en) * 1998-11-25 2000-06-13 Kashiyama Kogyo Kk Exhaust gas treatment method and apparatus
JP2003088727A (en) * 2001-09-20 2003-03-25 Hitachi Ltd Processing method of perfluoride treatment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000157830A (en) * 1998-11-25 2000-06-13 Kashiyama Kogyo Kk Exhaust gas treatment method and apparatus
JP2003088727A (en) * 2001-09-20 2003-03-25 Hitachi Ltd Processing method of perfluoride treatment

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2324902A4 (en) * 2008-09-08 2014-06-04 Taiyo Nippon Sanso Corp METHOD AND DEVICE FOR TREATING EXHAUST GAS
JP2011104531A (en) * 2009-11-18 2011-06-02 Japan Organo Co Ltd Air cleaner
WO2013140653A1 (en) * 2012-03-23 2013-09-26 Kurushima Takeo Method for treating discharge gas
JPWO2013140653A1 (en) * 2012-03-23 2015-08-03 武男 久留嶋 Exhaust gas treatment method
CN108579386A (en) * 2018-05-23 2018-09-28 绍兴市鼎泰节能环保科技有限公司 A kind of efficient chemical industry waste gas cleaning system
CN108607344A (en) * 2018-05-23 2018-10-02 绍兴市鼎泰节能环保科技有限公司 A kind of chloride containing work waste gas cleaning system
WO2020224572A1 (en) * 2019-05-06 2020-11-12 (Cnbm) Bengbu Design & Research Institute For Glass Industry Co., Ltd Process and device for producing a chalcogen-containing compound semiconductor
US11885010B2 (en) 2019-05-06 2024-01-30 Cnbm Research Institute For Advanced Glass Materials Group Co., Ltd. Process and device for producing a chalcogen-containing compound semiconductor
WO2023189306A1 (en) * 2022-03-30 2023-10-05 栗田工業株式会社 Cleaning method, cleaning liquid, and cleaning agent for exhaust gas treatment facility
JP2023147648A (en) * 2022-03-30 2023-10-13 栗田工業株式会社 Method for cleaning exhaust gas treatment facility, cleaning liquid and cleaning agent
WO2023199410A1 (en) * 2022-04-12 2023-10-19 カンケンテクノ株式会社 Method for treating exhaust gas containing nitrogen compound, and apparatus for said method
CN117401718A (en) * 2023-10-08 2024-01-16 湖北工业大学 A new method and device for resource-based conversion of sulfur hexafluoride

Also Published As

Publication number Publication date
JPWO2008072392A1 (en) 2010-03-25

Similar Documents

Publication Publication Date Title
WO2008072392A1 (en) Method of treating discharge gas and apparatus therefor
JP2007203290A (en) Method for treating exhaust gas
JP5197306B2 (en) Air purification device
KR101097240B1 (en) Exhaust gas treatment method and apparatus
KR100502946B1 (en) Method of treating substance to be degraded and its apparatus
CN215822784U (en) Exhaust gas purification system
JP6086229B2 (en) Detoxification processing equipment
JP2001054721A (en) Method and device for decomposing fluorocarbons
JPH022825A (en) Electrolytic ozonizer having waste gas decomposing function and method for decomposing waste gas with the same ozonizer
JP4709608B2 (en) Radical treatment equipment
WO2013183300A1 (en) Apparatus and method for processing gas
KR20160069539A (en) Wet gas cleaning system using oxidizing agent produced from the wastewater
JP4451114B2 (en) Functional water production equipment with exhaust gas treatment function
JP2001259357A (en) Waste gas treatment method and treatment device
JP4459648B2 (en) Method and apparatus for treating gas containing fluorine-containing compound
KR101572321B1 (en) Apparatus for purifying polluting gas using ozone
JP4362267B2 (en) Disassembling apparatus and disassembling method
JP2014188497A (en) Detoxification treatment apparatus and detoxification treatment method
US7018514B2 (en) Method and apparatus for processing substances to be decomposed
WO2014207906A1 (en) Method for treating soil-contaminating water using photocatalytic material
CN113209822A (en) Exhaust gas purification system
JP2000157830A (en) Exhaust gas treatment method and apparatus
JP3958126B2 (en) Method for decomposing pollutants and apparatus used therefor
JPS63162025A (en) Removing method for arsine and phosphine
JP3624154B2 (en) Method for decomposing pollutants and decomposing apparatus used therefor

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07767236

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2008549209

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07767236

Country of ref document: EP

Kind code of ref document: A1