[go: up one dir, main page]

WO2008062783A1 - Led device and method for manufacturing the same - Google Patents

Led device and method for manufacturing the same Download PDF

Info

Publication number
WO2008062783A1
WO2008062783A1 PCT/JP2007/072446 JP2007072446W WO2008062783A1 WO 2008062783 A1 WO2008062783 A1 WO 2008062783A1 JP 2007072446 W JP2007072446 W JP 2007072446W WO 2008062783 A1 WO2008062783 A1 WO 2008062783A1
Authority
WO
WIPO (PCT)
Prior art keywords
led
substrate
layer
fluorescent
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/072446
Other languages
French (fr)
Japanese (ja)
Inventor
Takeshi Yagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2008545405A priority Critical patent/JP5309996B2/en
Publication of WO2008062783A1 publication Critical patent/WO2008062783A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0361Manufacture or treatment of packages of wavelength conversion means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8514Wavelength conversion means characterised by their shape, e.g. plate or foil
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/926Multiple bond pads having different sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/722Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips

Definitions

  • the present invention relates to an LED device and a manufacturing method thereof.
  • an LED device including an LED element having a light emitting layer and a fluorescent layer containing a fluorescent material that emits light of different wavelengths when excited by light from the light emitting layer! .
  • Patent Document 1 includes a light emitting layer that emits blue light, and a fluorescent layer that includes a fluorescent material that emits yellow-green light that is excited by the blue light and has a complementary color relationship with blue.
  • White LED lamp power S as an LED device including an LED element is disclosed.
  • the light emitted from the light-emitting layer and transmitted through the fluorescent layer as blue light is mixed with the light converted into yellow-green light by the fluorescent material in the fluorescent layer. The observer sees white light.
  • one LED chip is composed of a transparent substrate and an LED component layer (including a light emitting layer) formed on one surface of the substrate.
  • This LED chip force is mounted on the Si diode element substrate with the LED component layer as the Si diode element substrate (submount element) side, and the fluorescent layer serves as a tray for the Si diode element substrate. It is applied so as to cover the LED chip arranged on the substrate. Therefore, in this LED device, the fluorescent layer is exposed to the outside unless specifically covered with a protective film or the like.
  • Patent Document 1 since the white chromaticity depends on the thickness of the fluorescent layer, in order to suppress the variation in white chromaticity and improve the production yield of the required chromaticity In addition, it is disclosed that it is preferable to make the film thickness of the fluorescent material uniform with high accuracy. Further, in Patent Document 1 below, as a specific manufacturing method for making the film thickness of the phosphor material uniform with high accuracy, the phosphor material is formed by silk screen printing, or the phosphor material is formed. Techniques have been disclosed in which the transparent substrate of the LED chip is polished before, or the fluorescent material is polished after the fluorescent material is formed.
  • a light emitting layer that emits ultraviolet light, and the ultraviolet light A light emitting device and a display device (display) as an LED device including an LED element having a fluorescent layer containing a fluorescent substance that emits visible light when excited is disclosed.
  • an LED constituent layer including a light emitting layer
  • the fluorescent layer is a surface of the substrate opposite to the LED constituent layer or the LED constituent layer. It is formed on the surface opposite to the substrate. Therefore, also in this LED device, the fluorescent layer is exposed to the outside unless specifically covered with a protective film or the like.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2001-15817
  • Patent Document 2 Japanese Patent Publication No. 11 510968
  • the fluorescent layer is exposed to the outside unless it is specifically covered with a protective film or the like, so that the fluorescent layer is affected by the outside (for example, moisture).
  • the phosphor layer deteriorates, and as a result, the durability of the LED device decreases.
  • the present invention has been made in view of such circumstances, and can reduce the influence of the outside world on the fluorescent layer without covering with a special protective film or the like, which in turn can improve durability.
  • An object is to provide an LED device.
  • the present invention it is possible to manufacture an LED device capable of enhancing such durability, and moreover, it is possible to make the thickness of the fluorescent layer uniform with high accuracy, thereby improving the yield.
  • the purpose is to provide a method of manufacturing an LED device that can increase the power S.
  • an LED element including a light emitting layer on a first substrate. And a fluorescent material containing a fluorescent material that emits light of a different wavelength when excited by light from the light emitting layer on a second substrate that transmits light of a predetermined wavelength range.
  • a method of manufacturing an LED device comprising: a step of bonding two substrates;
  • a step of forming an LED constituent layer that includes a light emitting layer and constitutes an LED element on a first substrate, and a second substrate that transmits light in a predetermined wavelength range, Forming a fluorescent layer containing a fluorescent material that emits light of a different wavelength when excited by light from the light emitting layer; and a third substrate on the LED component layer formed on the first substrate. Bonding, removing the first substrate from the LED component layer to which the third substrate is bonded, and the LED having the third substrate bonded and the first substrate removed. Bonding the component layer to the phosphor layer formed on the second substrate, the second substrate, the phosphor layer formed on the second substrate, and the LED component layer. Dividing the joined body into parts including one or more of the LED elements, and an LED comprising: To provide a method of manufacturing location.
  • the method for manufacturing an LED device of the present invention further includes a step of removing the third substrate from the LED constituent layer after the step of joining the LED constituent layer and the fluorescent layer. It is preferable.
  • the step of removing the third substrate from the LED constituent layer includes the step of dividing the joined body, the step of dividing the LED constituent layer and the fluorescent layer after the step of joining the LED constituent layer and the fluorescent layer More preferably, it is before.
  • the method further comprises a step of bonding the LED constituent layer or the third substrate and the circuit board later.
  • “joining the LED constituent layer or the third substrate and the circuit board” means that the LED constituent layer is electrically connected to the circuit board. Means that the LED component layer and the circuit board are electrically connected via the third substrate.
  • the manufacturing method of the LED device includes a step of dividing the bonded body, the method includes a step of bonding the LED constituent layer or the third substrate and the circuit board before the dividing step. Is preferred.
  • the manufacturing method of the LED device includes a step of removing the third substrate, the LED component layer, the circuit substrate, and the circuit substrate are disposed after the step of removing the third substrate and before the dividing step. It is preferable to comprise the step of joining.
  • the third substrate is preferably a circuit board.
  • the bonded body further including the circuit board bonded to the LED constituent layer is divided.
  • the circuit board as the third board is more preferably a circuit board on which a drive circuit for driving the LED element is mounted.
  • the step of forming the LED constituent layer includes a step of forming at least one layer of the LED constituent layer by epitaxial growth.
  • the LED device includes a plurality of the LED elements, and the LED device is a color display or a monochrome display based on a video signal or other display control signal. It is preferable that the display device perform the above.
  • the LED constituent layer that includes the light emitting layer and constitutes the LED element, a substrate that transmits light in a predetermined wavelength region, and a fluorescent layer that is disposed between the LED constituent layer and the substrate.
  • An LED device comprising: a fluorescent layer including a fluorescent substance that emits light of different wavelengths when excited by light from the light emitting layer.
  • the number of the LED elements is two or more, and the luminescent color power to the outside of at least one of the two or more LED elements is the two or more. It is preferable that the color of the light emitted to the outside of at least one of the other LED elements is different.
  • the number of the LED elements is two or more, and the LED device performs color display or monochrome display based on a video signal or other display control signal. Preferably, it constitutes a display device to perform.
  • the LED device of the present invention preferably includes a circuit board on which a drive circuit for driving the LED element is mounted and electrically connected to the LED element.
  • the present invention it is possible to provide an LED device that can reduce the influence of the outside world on the fluorescent layer without being covered with a special protective film or the like, and thus can improve durability.
  • an LED device that can enhance such durability, and moreover, the thickness of the fluorescent layer can be made more accurate and uniform. It is possible to provide a method for manufacturing an LED device that can further increase the yield.
  • FIG. 1 is a schematic cross-sectional view schematically showing an LED chip that forms a main part of an LED device according to a first embodiment of the present invention.
  • FIG. 2 is a schematic cross-sectional view showing a step in the method of manufacturing the LED device according to the first embodiment of the present invention.
  • FIG. 3 is a schematic sectional view showing a step that follows the step of FIG. 2.
  • FIG. 4 is a schematic cross-sectional view showing a step that follows the step of FIG. 3.
  • FIG. 5 is a schematic block diagram showing an LED device according to a second embodiment of the present invention.
  • FIG. 6 is a circuit diagram showing a unit pixel in FIG.
  • FIG. 7 is a diagram showing an arrangement of LED elements of the LED device according to the second embodiment of the present invention.
  • FIG. 8 is a view showing another arrangement example of LED elements.
  • FIG. 9 is a view showing still another arrangement example of LED elements.
  • FIG. 10 is a schematic cross-sectional view showing an LED device according to a second embodiment of the present invention.
  • FIG. 11 is a schematic enlarged cross-sectional view showing an enlarged chip of the LED device of FIG.
  • FIG. 12 is a schematic plan view schematically showing one unit pixel portion of the LED substrate of the chip shown in FIGS. 10 and 11.
  • FIG. 13 A unit pixel portion of the drive circuit board of the chip shown in FIGS. 10 and 11 is schematically illustrated. It is a schematic plan view shown schematically.
  • FIG. 14 is a schematic sectional view showing a modification of the LED device according to the second embodiment of the present invention.
  • FIG. 15 is a schematic cross-sectional view showing one step in the method of manufacturing the LED device according to the second embodiment of the present invention.
  • FIG. 16 is a schematic sectional view showing a step that follows the step of FIG. 15.
  • FIG. 17 is a schematic sectional view showing a step that follows the step of FIG. 16.
  • FIG. 18 is a schematic perspective view schematically showing one step of a method for manufacturing an LED device according to a second embodiment of the present invention.
  • FIG. 19 is a schematic sectional view showing a step that follows the step of FIG. 17.
  • FIG. 20 is a schematic cross-sectional view showing a process of a modification of the method for manufacturing an LED device in the second embodiment of the present invention.
  • FIG. 21 is a schematic sectional view showing a step that follows the step of FIG. 20.
  • FIG. 1 is a schematic cross-sectional view schematically showing an LED chip 1 that forms a main part of the LED device according to the first embodiment of the present invention.
  • the LED device according to the present embodiment is configured as a so-called bullet-type LED lamp or chip-type LED using the LED chip 1 shown in Fig. 1 as the LED chip.
  • the structure of bullet-type LED lamps and chip-type LEDs excludes the structure of LED chip 1. Therefore, a well-known structure can be adopted, and the description thereof is omitted here.
  • the LED chip 1 is a substrate (second substrate) such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment). 2) and an LED element 3 provided on the substrate 2 and emitting white light to the outside through the substrate 2.
  • This LED chip 1 has only one LED element.
  • the LED element 3 includes a fluorescent layer 4, an n-type impurity layer 5, an active layer 6 as a light-emitting layer, a p-type impurity layer 7, and an electrode 8 stacked in this order from the substrate 2 side on the upper surface side of the substrate 2. , 9 and.
  • the n-type impurity layer 5, the active layer 6 and the p-type impurity layer 7 are each composed of an epitaxial growth layer. A part of the n-type impurity layer 5 is not covered with the active layer 6 and the p-type impurity layer 7, and one electrode 8 is formed in that region.
  • the other electrode 9 is formed on the p-type impurity layer 7.
  • the materials of the layers 5 to 7 are set so that blue light is emitted from the active layer 6.
  • each layer 5-7 is composed of a plurality of layers or a buffer layer is added as necessary.
  • the fluorescent layer 4 is a fluorescent material that emits yellow-green light that is excited by the blue light from the active layer 6 and has a complementary color with blue (for example, YAG (yttrium aluminum gallium compound)).
  • YAG yttrium aluminum gallium compound
  • -Containing resin for example, epoxy resin or silicone resin.
  • the n-type impurity layer 5, the active layer 6, the p-type impurity layer 7, and the electrodes 8 and 9 constitute the LED element 3 as a whole. 10 (excluding the fluorescent layer 4).
  • the fluorescent layer 4 is disposed between the LED constituent layer 10 and the substrate 2.
  • the fluorescent layer 4 is not exposed to the outside even if it is not covered with a special protective film or the like. Therefore, according to the present embodiment, the influence of the outside world on the fluorescent layer 4 can be reduced without covering with a special protective film or the like, and the durability can be improved.
  • FIG. 2, 3 and 4 are schematic cross-sectional views schematically showing the respective steps of the LED device manufacturing method according to the present embodiment.
  • a base substrate (first substrate) 11 which serves as a basis for epitaxial growth of the n-type impurity layer 5 and the like of the LED component layer 10.
  • the substrate 11 for example, a sapphire substrate or a SiC substrate is used.
  • a plurality of LED constituent layers 10 including a light emitting layer (active layer) and constituting an LED element are formed on the first substrate 11. That is, the LED constituent layer 10 is formed on the substrate 11 for the plurality of LED chips 1 to be manufactured at once.
  • an n-type impurity layer 5, an active layer 6, and a p-type impurity layer 7 are sequentially formed on the substrate 11 by epitaxial growth, and unnecessary regions of the active layer 6 and the p-type impurity layer 7 are etched. Remove. At this time, the n-type impurity layer 5 remains formed on the entire surface of the substrate 11. Then, the electrodes 8 and 9 are formed of gold or the like and patterned into a predetermined shape by etching. Figure 2 (a) shows this state.
  • a substrate (third substrate) 12 for holding the LED component layer 10 and protecting the mechanical damage force is bonded to the surface of the LED component layer 10 opposite to the substrate 11. This bonding is temporary and will be peeled off later.
  • the substrate 12 is bonded to the LED constituent layer 10 by the thermoplastic wax 13.
  • Figure 2 (b) shows this state.
  • the substrate 11 is removed from the LED constituent layer 10 to which the substrate 12 is bonded.
  • Figure 2 (c) shows this situation.
  • the substrate 11 can be removed by, for example, scraping the substrate 11 with a grinder, or cutting the vicinity of the boundary between the LED component layer 10 and the substrate 11 with a water jet (high pressure jet water) or a wire saw. The ability to do S.
  • a substrate (second substrate) 2 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment) is prepared, and the fluorescent layer 4 described above is provided on the substrate 2.
  • Figure 3 (a) shows this state.
  • the surface of the substrate 2 is uneven due to a patterned layer.
  • V, Na! / Can be used as the substrate 2 through a process accompanied by high-temperature treatment such as formation of an epitaxial growth layer, the substrate 2 is not bent due to high-temperature treatment or the like. Therefore, the thickness of the fluorescent layer 4 can be made uniform with higher accuracy.
  • the substrate 2 is polished and planarized and / or the fluorescent layer 4 is applied before applying the fluorescent layer 4 as necessary. Then, the phosphor layer 4 may be polished and flattened.
  • the fluorescent layer 4 may be formed by, for example, sinoleta screen printing.
  • FIG. 3 (b) shows this state.
  • the fluorescent layer 4 is configured using an adhesive resin such as an epoxy resin or a silicone resin
  • the LED constituent layer 10 and the fluorescent layer 4 are used by utilizing the adhesive property of the fluorescent layer 4. Join layer 4 together.
  • the LED constituent layer 10 and the fluorescent layer 4 may be bonded using a translucent adhesive.
  • thermoplastic wax 13 is removed, whereby the substrate 12 is peeled off from the LED constituent layer 10.
  • Figure 4 (a) shows this state.
  • FIG. 4 (a) a substrate including the LED constituent layer 10 in the state shown in FIG. 4 (a) is divided into each LED chip 1 by dicing.
  • Figure 4 (b) shows this state.
  • a plurality of LED chips 1 are completed at once.
  • a bullet-type LED lamp or a chip-type LED as the LED device according to the present embodiment is completed through a known process such as wire bonding.
  • the thickness of the fluorescent layer 4 can be made uniform with higher accuracy as described above. Therefore, it is possible to manufacture a large number of LED devices having uniform light emission colors (uniform white chromaticity in the present embodiment), and the yield can be further increased.
  • the active layer 6 as a light emitting layer emits blue light and the fluorescent layer 4 excites the blue light as excitation light for all LED chips 1 manufactured in a batch. It is configured to emit yellow-green light, and all LED chips 1 emit white light. But, In each LED chip 1, fluorescent layers emitting different colors are arranged as fluorescent layers 4 (that is, areas corresponding to LED chips 1 having different emission colors in the process shown in FIG. 3 (a)). Then, fluorescent layers that emit different colors may be disposed), and a plurality of LED chips 1 that emit light of different colors may be manufactured at one time.
  • the active layer 6 as a light emitting layer is configured to emit ultraviolet light
  • the fluorescent layer 4 has a predetermined color using the ultraviolet light as excitation light. You may comprise so that light (for example, red light, green light, or blue light) may be emitted.
  • the active layer 6 as the light emitting layer is configured to emit ultraviolet light in all the LED chips 1 manufactured in a batch, and the fluorescent layer 4 in each LED chip 1 is excited by ultraviolet light.
  • fluorescent layers emitting different colors are arranged in regions corresponding to LED chips 1 having different emission colors).
  • a plurality of LED chips 1 that emit light of different colors may be manufactured at a time.
  • the LED chip 1 is configured such that the active layer 6 as the light emitting layer emits ultraviolet light, and the LED layer 1 is divided into three regions by dividing the fluorescent layer 4 into three regions. Three fluorescent layers that are excited by light and emit red light, green light, and blue light, respectively, may be disposed. Even in this case, white light is emitted from the LED chip 1.
  • FIG. 5 is a schematic block diagram showing an LED device 21 according to the second embodiment of the present invention.
  • the LED device 21 according to the present embodiment constitutes a display device that emits and displays a color image corresponding to a video signal.
  • the LED device 21 according to the present embodiment can be configured as, for example, a so-called micro display with a screen of 1 inch or less.
  • the LED device 21 according to the present embodiment includes a plurality of unit pixels 30 arranged two-dimensionally, and LED elements 41R, 41G, 41B of the respective colors of the unit pixels 30 (not shown in FIG. 5). 6 and 7 to be described later), and a horizontal scanning circuit 33 for selecting LED elements 41R, 41G, and 41B of each color of the unit pixel 30 for each column.
  • a video signal processing circuit 34 for controlling the vertical scanning circuit 32 and the horizontal scanning circuit 33 so as to process the input video signal and display an image corresponding to the video signal.
  • the number of unit pixels 30 is 3 ⁇ 3.
  • the present invention is not limited to this.
  • elements other than LED elements 41R, 41G, and 41B in unit pixel 30 are other than LED elements 41R, 41G, and 41B in unit pixel 30.
  • the vertical scanning circuit 32, the horizontal scanning circuit 33, and the video signal processing circuit 34 constitute a drive circuit 31 that drives the LED elements 41R, 41G, and 41B.
  • FIG. 6 is a circuit diagram showing the unit pixel 30 in FIG.
  • Each unit pixel 30 selects a pixel array of a red LED element 41R that emits red light, a green LED element 41G that emits green light, a blue LED element 41B that emits blue light, and a red LED element 41R.
  • the column selection switches 42R, 42G, and 42B are composed of MOS transistors.
  • the force swords of the LED elements 41 R, 41 G, 41 B of all the unit pixels 30 are connected in common by the ground line 43.
  • the anodes of the LED elements 41R, 41G, and 41B are connected to the drains of the corresponding selection switches 42R, 42G, and 42B, respectively.
  • the source of the red column selection switch 42 R is connected in common to each pixel row by the horizontal source line 44 R, and the vertical scanning circuit 32 operated under the control of the video signal processing circuit 34 has a magnitude corresponding to the red luminance value. This voltage is received as a drive signal.
  • the sources of the green column selection switch 42G are connected in common to each pixel row by the horizontal source line 44G, and receive a voltage having a magnitude corresponding to the green luminance value from the vertical scanning circuit 32 as a drive signal.
  • the source of the blue column selection switch 42B is connected in common to each pixel row by the horizontal source line 44B, and receives a voltage having a magnitude corresponding to the blue luminance value from the vertical scanning circuit 32 as a drive signal.
  • the gate of the red column selection switch 42R is connected in common to each pixel column by a vertical selection line 45R, and receives a red column selection signal from the horizontal scanning circuit 33 operating under the control of the video signal processing circuit 34.
  • the gates of the green column selection switch 42G are connected to each pixel column in common by a vertical selection line 45G, and receive a green column selection signal from the horizontal scanning circuit 33.
  • Blue column selection switch 42B gates are connected in common to each column by vertical selection line 45B Then, a blue column selection signal is received from the horizontal scanning circuit 33.
  • the video signal processing circuit 34 obtains the luminance of each color of each pixel 30 based on the video signal and performs control corresponding to the value.
  • the signals are output to the vertical scanning circuit 32 and the horizontal scanning circuit 33, respectively.
  • the vertical scanning circuit 32 and the horizontal scanning circuit 33 are based on the control signal at a predetermined timing! /, And at a predetermined timing, the ON signals (selection signals) of the column selection switches 42R, 42G, and 42B for each color for each pixel column.
  • Signal a voltage corresponding to the luminance value is output to the horizontal source lines 44R, 44G, and 44B of each color for each pixel row.
  • FIG. 7 is a plan view schematically showing the arrangement of the LED elements 41R, 41G, 41B of the respective colors employed in the present embodiment.
  • “R” indicates the red LED element 41R
  • “G” indicates the green LED element 41G
  • “B” indicates the blue LED element 41B.
  • the number of unit pixels 30 is 3 ⁇ 3. These points are the same in FIGS. 8 and 9 described later.
  • each unit pixel 30 is composed of a total of three LED elements 41R, 41G, and 41B, one for each color arranged in the row direction (left and right direction).
  • the arrangement order of the LED elements 41R, 41G, 41B of the respective colors in the unit pixels 30 in the same row is the same force S, and the unit pixels 30 in the rows adjacent to each other in the column direction.
  • the LED elements 41R, 41G, and 41B are out of order.
  • each unit pixel 30 is composed of a total of 2 ⁇ 2 LED elements, one red LED element 41R, two green LED elements 41G, and one blue LED element 41B.
  • FIG. 10 is a schematic cross-sectional view showing the LED device 21 according to the present embodiment.
  • Figure 11 10 is an enlarged schematic cross-sectional view showing the hybridized chip 51 in FIG.
  • FIG. 12 is a schematic plan view schematically showing a part of one unit pixel 30 (only some of the elements) of the LED substrate 52 constituting the chip 51 shown in FIG. 10 and
  • FIG. 13 schematically shows a part of one unit pixel 30 corresponding to FIG. 12 (only some of the elements) of the drive circuit board 53 constituting the chip 51 shown in FIGS. 10 and 11.
  • It is a schematic plan view. 12 and 13 are both viewed from the upper side of FIG. 11, but the lines that should be hidden lines are also shown as solid lines. Note that the cross section along the line AA ′ in FIG. 7, the cross section along the line BB ′ in FIG. 12, and the cross section along the line CC ′ in FIG. 13 are within one plane. Forces included The cross sections shown in FIGS. 10 and 11 are cross sections in the plane.
  • the LED substrate 52 is provided on the substrate 61 and a substrate (second substrate) 61 such as one glass substrate that transmits light in a predetermined wavelength range (visible region in the present embodiment).
  • a substrate (second substrate) 61 such as one glass substrate that transmits light in a predetermined wavelength range (visible region in the present embodiment).
  • Each unit pixel 30 includes LED elements 41R, 41G, and 41B of the respective colors.
  • the red LED element 41R includes a fluorescent layer 62R, an n-type impurity layer 63, and an active layer 64 serving as a light emitting layer, which are sequentially stacked on the lower surface side of the substrate 61 from the substrate 61 side. And a p-type impurity layer 65 and electrodes 66 and 67.
  • the n-type impurity layer 63, the active layer 64, and the p-type impurity layer 65 are each composed of an epitaxially grown layer. A part of the n-type impurity layer 63 is not covered with the active layer 64 and the p-type impurity layer 65, and one electrode 66 is formed in the region.
  • the other electrode 67 is formed on the p-type impurity layer 65.
  • the materials of the layers 63 to 65 are set so that ultraviolet light is emitted from the active layer 64.
  • each of the layers 63 to 65 is composed of a plurality of layers or a buffer layer is added as necessary. Illustration and description of the detailed structure are omitted. To do.
  • the fluorescent layer 62R contains a fluorescent material that emits red light when excited by the ultraviolet light from the active layer 64 of the LED element 41R (for example, CaAlSiON: Eu or YOS: Eu).
  • It is composed of a layer of light-transmitting resin (for example, epoxy resin or silicone resin).
  • the green LED element 41G is different from the red LED element 41R only in that a fluorescent layer 62G is formed instead of the fluorescent layer 62R, and the blue LED element 41B is different from the red LED element 41R.
  • the only difference is that the fluorescent layer 62B is formed in place of the fluorescent layer 62R, and therefore, a duplicate description thereof is omitted.
  • the fluorescent layer 62G is a fluorescent material that emits green light when excited by the ultraviolet light from the active layer 64 of the LED element 41G (for example, ZnS: Cu, A1, (Ba, Sr, Ca) SiO: Eu, etc. Included)
  • It is composed of a layer of light-transmitting resin (for example, epoxy resin or silicone resin).
  • the fluorescent layer 62B is a fluorescent substance that emits blue light when excited by the ultraviolet light from the active layer 64 of the LED element 41B (for example, BAM: Eu (BaMgAl 2 O 3: Eu or (Sr, Ca, Ba, M
  • Translucent resin for example, epoxy resin or
  • each LED element 41R, 41G, 41B the n-type impurity layer 63, the active layer 64, the p-type impurity layer 65, and the electrodes 66, 67 are provided.
  • the LED constituent layers constituting the LED element (excluding the fluorescent layers 62R, 62G and 62B) are 70, and the fluorescent layers 62R, 62G and 62B are the LED constituent layer 70 and the substrate 61, respectively. It is arranged between.
  • the drive circuit 31 that is a part other than the LED elements 41R, 41G, and 41B is mounted on one drive circuit board 53 using a known semiconductor process technology. Yes.
  • a silicon substrate is used as the drive circuit substrate 53.
  • the drive circuit board 53 is electrically connected to the electrodes 66 and 67 of the LED elements 41R, 41G, and 41B of the LED board 52 by bumps 71 and 72, as shown in FIGS.
  • the chip 51 includes an LED substrate 52 and a drive circuit substrate 53 that are bonded to each other by bumps 71 and 72.
  • the above-described red column selection switch 42R includes a source electrode and a drain electrode (not shown) formed by a predetermined diffusion layer formed on the drive circuit board 53, and a gate electrode 73 disposed on a region between them. (See Fig. 13).
  • the source is connected to a wiring pattern connected to the horizontal source line 44R.
  • the drain is connected to an electrode 74 formed thereon and connected by a bump 72.
  • the gate electrode 73 is connected to the vertical selection line 45R by a wiring pattern.
  • the anode of the red LED element 41R and the drain of the red column selection switch 42R are electrically connected by a bump 72 provided between the electrodes 67 and 74.
  • the red LED element 41R is electrically connected by a bump 71 provided between the force sword of the red LED element 41R, the ground wire 43, the force electrode 66, and the ground wire 43.
  • the anodes of the LED elements 41G and 41B and the drains of the selection switches 42G and 42B are electrically connected by the respective bumps 72, and the force swords of the LED elements 41G and 42B and the ground wire 43 are connected to the respective bumps 71. Therefore, each is electrically connected.
  • the bumps 71 and 72 are made of, for example, copper or gold.
  • each color LED element 41R when a current flows between the electrodes 66 and 67, ultraviolet light is emitted from the active layer 64.
  • the fluorescent layer 62R In the red LED element 41R, the fluorescent layer 62R is excited by the ultraviolet light from the active layer 64 to emit red light, and this red light is emitted upward through the substrate 61.
  • the fluorescent layer 62G In the green LED element 41G, the fluorescent layer 62G is excited by the ultraviolet light from the active layer 64 to emit green light, and this green light is emitted upward through the substrate 61.
  • the fluorescent layer 62B is excited by the ultraviolet light from the active layer 64 to emit blue light, and this blue light is emitted upward through the substrate 61.
  • a groove 61a is formed at a position between adjacent LED elements on the substrate 61.
  • the groove 61 a is formed substantially perpendicular to the surface of the substrate 61.
  • the groove 61a may be left empty, but the same crosstalk suppressing effect can be obtained even if the groove 61a is embedded with a light reflecting material such as metal or formed on the surface of the groove 61a by vapor deposition. Can do.
  • the chip 51 is mounted on the support board 54, and the predetermined electrode of the drive circuit board 53 of the chip 51 and the electrode 55 on the support board 54.
  • the wire 56 is wire-bonded with a wire 56, and the wire 56 is sealed with a resin 57.
  • a chip having an LED element including a transparent substrate corresponding to the substrate 61 in FIG. This is because, in general chips, if this is not done, the durability will deteriorate and the light extraction efficiency will decrease due to the high refractive index of the LED light emitting layer.
  • the LED substrate 52 and the drive circuit substrate 53 are hybridized by the bumps 71 and 72.
  • the light layers 62R, 62G, 62 ⁇ are respectively the LED constituent layers 70.
  • the fluorescent layers 62 R, 62 G, 62 B are not exposed to the outside world even if they are not covered with a special protective film, etc. Therefore, according to the present embodiment, In addition, it is possible to reduce the influence of the outside world on the fluorescent layers 62R, 62G, 62B without covering with a special protective film, etc., and as a result, the durability can be improved.
  • the wire 56 is mechanically weak, in this embodiment, Is What sealed with part only resin 57 of the ear 56.
  • the chip 51 may be accommodated in the package 81 as shown in FIG.
  • the package 81 includes a package body 81a and a sealing lid 81b that also serves as a display window, and is a so-called ball grid package.
  • Each solder ball 82 provided on the bottom surface of the package body 81a is electrically connected to each electrode 84 bonded to the electrode of the drive circuit board 53 with a wire 83 through a path (not shown).
  • FIG. FIG. 15, FIG. 16, FIG. 17 and FIG. 19 are schematic cross-sectional views schematically showing the respective steps of this manufacturing method.
  • FIG. 18 is a schematic perspective view schematically showing a predetermined process of this manufacturing method.
  • a substrate (first substrate) 91 serving as a basis for epitaxial growth of the n-type impurity layer 63 and the like of the LED component layer 70 is prepared.
  • the substrate 91 for example, a sapphire substrate or a SiC substrate is used.
  • the LED component layer 70 is formed on the substrate 91 by the amount of the LED elements 41R, 41G, and 41B of the plurality of chips 51 to be manufactured at once. That is, an n-type impurity layer 63, an active layer 64, and a p-type impurity layer 65 are sequentially formed on the substrate 91 by epitaxial growth, and unnecessary regions of the active layer 64 and the p-type impurity layer 65 are removed by etching. .
  • the n-type impurity layer 63 remains formed on the entire surface of the substrate 91.
  • the electrodes 66 and 67 are formed of gold or the like and patterned into a predetermined shape by etching.
  • Figure 15 (a) shows this state.
  • a substrate (third substrate) 92 for holding the LED component layer 70 and protecting the mechanical damage force is bonded to the surface of the LED component layer 70 opposite to the substrate 91. This bonding is temporary and will be peeled off later.
  • the substrate 12 is bonded to the LED constituent layer 10 by the thermoplastic wax 93.
  • the substrate 91 is removed from the LED constituent layer 70 to which the substrate 92 is bonded.
  • Figure 15 (b) shows this state.
  • a substrate (second substrate) 61 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment) is prepared, and the fluorescent layer 62R described above is provided on the substrate 61. , 62G, 62B are formed at positions corresponding to the LED elements 41R, 41G, 41B of the respective colors.
  • Figure 15 (c) shows this state. Note that the method of finally forming the fluorescent layers 62R, 62G, and 62B only in a partial region is well known.
  • the surface of the substrate 61 has no irregularities due to a patterned layer, and the substrate 61 can be used after a process involving high temperature treatment such as formation of an epitaxial growth layer! / ,!
  • the substrate 61 is not bent due to high temperature processing or the like. Therefore, the thickness of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy.
  • the substrate 61 is polished before applying the fluorescent layers 62R, 62G, and 62B, if necessary. Polishing and flattening may be performed, and / or the fluorescent layers 62R, 62G, and 62B may be polished and flattened after the fluorescent layers 62R, 62G, and 62B are formed.
  • the fluorescent layers 62R, 62G, and 62B may be formed by silk screen printing, for example.
  • the lower surface (surface opposite to the substrate 92) of the LED constituent layer 70 in the state shown in FIG. 15 (b) and the upper surfaces of the fluorescent layers 62R, 62G, and 62B in the state shown in FIG. 15 (c). The surface opposite to the substrate 61).
  • the fluorescent layers 62R, 62G, 62B are configured using an adhesive resin such as an epoxy resin or a silicone resin, the adhesive properties of the fluorescent layers 62R, 62G, 62B are utilized. Then, the LED component layer 70 and the fluorescent layers 62R, 62G, and 62B are joined.
  • the LED constituting layer 70 and the fluorescent layers 62R, 62G, and 62B may be joined using a translucent adhesive. Thereafter, by removing the thermoplastic glass 93, the substrate 92 is peeled off from the LED constituent layer 70 and removed.
  • Figure 16 (a) shows this state.
  • a groove 61a is formed at a position between adjacent LED elements by dry etching or the like.
  • the drive circuit board 53 is prepared by using a well-known semiconductor process technique (FIG. 16C).
  • the drive circuit board 53 is provided with, for example, a CMOS circuit by a general CMOS process.
  • bumps 71 and 72 for electrical connection with the LED elements 41R, 41G, and 41B are formed on the drive circuit board 53.
  • FIG. 18 schematically shows this alignment.
  • 101 indicates the substrate in the state shown in FIG. 16 (a)
  • 102 indicates the drive circuit substrate 53 on which the bumps 71 and 72 shown in FIG. 17 (a) are formed.
  • reference numerals 101a and 102a schematically show areas for one chip in the substrates 101 and 102, respectively.
  • Such alignment is performed, and the electrodes 66 and 67 and the amplifiers 71 and 72 are joined.
  • Fig. 17 (b) shows this state. Such bonding by bumps and hybridization by this are well-known techniques.
  • the hybridized substrate in the state shown in FIG. 17 (b) is caused to divert IJ to each chip 51 by dicing.
  • FIG. 19 shows this state. Thus, a plurality of chips 51 are completed at once.
  • the LED device 21 according to the present embodiment shown in FIG. 10 is completed through known processes such as wire bonding and resin sealing.
  • the thicknesses of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy as described above. Therefore, it is possible to further reduce variations in emission color and emission intensity between products and between multiple LED elements of the same product, which in turn can be achieved with the power S to further increase the yield.
  • each unit pixel is configured by only one of the red LED element 41, the green LED element 41G, and the blue LED element 41B, monochrome display is performed. It can be a display device to perform.
  • the drive circuit installed in 53 lights only the red LED element 41R in response to the red light illumination command signal, and turns on only the green LED element 41G in response to the green light illumination command signal. If only LED elements 41B are lit in response to the light and only LED elements 41R, 41G, 41B are lit in response to the white light illumination command signal, red light, green light, blue light and It is possible to provide an illumination device capable of selectively switching illumination with white light. In such an illuminating device, since the problem of crosstalk does not occur, the groove 6 la is unnecessary.
  • FIGS. 20 and 21 are schematic cross-sectional views schematically showing the respective steps of the LED device manufacturing method according to the present modification.
  • a substrate (first substrate) 91 serving as a basis for epitaxial growth of the n-type impurity layer 63 and the like of the LED component layer 70 is prepared.
  • the substrate 91 for example, a sapphire substrate or a SiC substrate is used.
  • the LED component layer 70 is formed on the substrate 91 for the plurality of LED chips 1 to be manufactured at once.
  • the n-type impurity layer 63, the active layer 64, and the p-type impurity layer 65 are sequentially formed on the substrate 91 by epitaxial growth, and unnecessary regions of the active layer 64 and the p-type impurity layer 65 are removed by etching. At this time, the n-type impurity layer 63 remains formed on the entire surface of the substrate 91. Then, the electrodes 66 and 67 are formed of gold or the like and patterned into a predetermined shape by etching. Figure 20 (a) shows this state.
  • the drive circuit board 53 is prepared using a known semiconductor process technology.
  • the drive circuit board 53 is assumed to be provided with a CMOS circuit by a general CMOS process, for example.
  • a silicon substrate is used as the drive circuit substrate 53, and an insulating film 75 is provided so as to cover a part of the silicon substrate.
  • bumps 71 and 72 for electrical connection with the LED elements 41R, 41G, and 41B are formed on the drive circuit board 53.
  • the bumps 71 and 72 are formed so as to be electrically connected to the electrode 43 and the electrode 74, respectively.
  • the bumps 71 and 72 and the electrodes 74 and 43 are made of, for example, copper or gold.
  • FIG. 20 (b) shows a drive circuit board on which bumps 71 and 72 are formed.
  • FIG. 18 schematically shows this alignment.
  • 101 indicates the substrate in the state shown in FIG. 20 (a)
  • 102 indicates the drive circuit substrate 53 on which the bumps 71 and 72 shown in FIG. 20 (a) are formed.
  • reference numerals 101a and 102a schematically show areas for one chip in the substrates 101 and 102, respectively.
  • Such alignment is performed, and the electrodes 66 and 67 and the amplifiers 71 and 72 are joined to each other.
  • the substrate 91 is removed from the LED component layer 70 to which the drive circuit substrate 53 is bonded.
  • FIG. 20 (d) shows this state.
  • the substrate 91 can be removed by, for example, scraping the substrate 91 with a grinder, or cutting the vicinity of the boundary between the LED component layer 70 and the substrate 91 with a water jet (high pressure jet water) or a wire saw. Power to do S
  • the n-type impurity layer 63 is subjected to dry etching or the like to form a groove 63a at a position between adjacent LED elements as shown in FIG. 21 (a).
  • a substrate (second substrate) 61 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in this modification) is prepared, and the fluorescent layer 62R described above is provided on the substrate 61.
  • 62G, 62B are formed at positions corresponding to the LED elements 41R, 41G, 41B of the respective colors.
  • dry etching or the like is performed on the substrate 61 at a position corresponding to the groove 63a shown in FIG. 21 (a) to form a groove 61b as shown in FIG. 21 (b).
  • the method of finally forming the fluorescent layers 62R, 62G, and 62B only in a partial region is well known.
  • the surface of the substrate 61 is not uneven due to a patterned layer or the like, and that the substrate 61 that has not undergone a process involving high-temperature processing such as formation of an epitaxy growth layer can be used. There is no bending due to processing. Therefore, the thickness of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy. In order to make the thickness of the fluorescent layers 62R, 62G, 62B more uniform, the substrate 61 is polished and flattened before applying the fluorescent layers 62R, 62G, 62B, if necessary.
  • the fluorescent layers 62R, 62G, 62B may be polished and planarized.
  • the fluorescent layers 62R, 62G, and 62B may be formed by silk screen printing, for example.
  • the force s that forms the groove 61b is formed first, and then the groove 61b is formed, and then the fluorescent layers 62R, 62G, and 62B are formed by a well-known method. It ’s good.
  • the substrate 61 shown in FIG. 21 (b) and the substrate 91 including the LED constituent layer 70 and the electrode 66 shown in FIG. 21 (a) are aligned, and the fluorescent layers 62R, 62G, 62B are aligned. And n-type impurity layer 63 are bonded so as to be in contact with each other.
  • Figure 21 (c) shows this state. [0103] After that, as in the second embodiment, the hybridized substrate in the state shown in Fig. 21 (c) is divided into chips by dicing. As a result, a plurality of chips 51 as shown in FIG. 19 are completed.
  • the LED device 21 as shown in FIG. 10 is completed through known steps such as wire bonding and resin sealing.
  • the thicknesses of the fluorescent layers 62R, 62G, and 62B can be made uniform with higher accuracy as described above. Therefore, variation in emission color and emission intensity can be further reduced between products and between a plurality of LED elements of the same product, and the yield can be further increased. Further, in this modification, since the drive circuit substrate 53 on which the drive circuit is formed is used as the third substrate in the second embodiment, one step of the substrate removal and bonding process can be omitted. .
  • the drive circuit board 53 on which the drive circuit is mounted is used as the third board.
  • a wiring board that is not initially mounted with the drive circuit is used.
  • a drive circuit may be formed on the wiring board by a known method.
  • another wiring board on which a drive circuit is mounted may be joined on the wiring board so as to be electrically connected.
  • a board for example, a silicon board
  • the electrodes 66 and 67 are electrically connected to the board by a well-known method such as hole formation or through-hole plating.
  • the LED device may be manufactured by electrically connecting the wiring and the drive circuit.
  • the influence of the outside world on the fluorescent layer can be reduced without being covered with a special protective film or the like, and as a result, the durability of the LED device can be improved.
  • a manufacturing method can be provided.
  • the thickness of the fluorescent layer can be made uniform with higher accuracy, and thereby the yield can be further increased.

Landscapes

  • Led Device Packages (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Led Devices (AREA)

Abstract

An LED chip (1) is provided with a second substrate (2) which transmits light of a prescribed wavelength region; an LED configuring layer (10) including a light emitting layer (6); and a fluorescent layer (4) arranged between the second substrate (2) and the LED configuring layer (10). To manufacture the LED chip (1), the LED configuring layer (10) is formed on a first substrate, the fluorescent layer (4) is formed on the second substrate (2), the first substrate is removed from the LED configuring layer (10) after bonding a third substrate on the LED configuring layer (10), and the second substrate (2) having the fluorescent layer (4) is bonded so that the LED configuring layer (10) and the fluorescent layer (4) are in contact with each other.

Description

明 細 書  Specification

LED装置及びその製造方法  LED device and manufacturing method thereof

技術分野  Technical field

[0001] 本発明は、 LED装置及びその製造方法に関するものである。  The present invention relates to an LED device and a manufacturing method thereof.

背景技術  Background art

[0002] 従来から、発光層と該発光層からの光により励起されて異なる波長の光を発する蛍 光物質を含む蛍光層とを有する LED素子を含む、 LED装置が知られて!/、る。  Conventionally, there has been known an LED device including an LED element having a light emitting layer and a fluorescent layer containing a fluorescent material that emits light of different wavelengths when excited by light from the light emitting layer! .

[0003] 例えば、下記特許文献 1には、青色光を発する発光層と、前記青色光により励起さ れて青と補色の関係にある黄緑色の光を発する蛍光物質を含む蛍光層とを有する L ED素子を含む LED装置としての白色 LEDランプ力 S、開示されている。この LED装 置では、前記発光層から発して青色光のままで前記蛍光層を透過した光と、前記蛍 光層の蛍光物質で黄緑色の光に変換された光とが混ざり合うことで、観察者には白 色光に見えるのである。この LED装置では、透明な基板と該基板の一方の面上に形 成された LED構成層(発光層を含む)とによって、 1つの LEDチップが構成されてい る。そして、この LEDチップ力 前記 LED構成層を Siダイオード素子基板(サブマウ ント素子)側として前記 Siダイオード素子基板上に搭載され、前記蛍光層は、前記 Si ダイオード素子基板を受け皿として、前記 Siダイオード素子基板上に配置された前 記 LEDチップを覆うように塗布されている。したがって、この LED装置では、前記蛍 光層は、特別に保護膜等によって覆わない限り、外界に露出する。  [0003] For example, Patent Document 1 below includes a light emitting layer that emits blue light, and a fluorescent layer that includes a fluorescent material that emits yellow-green light that is excited by the blue light and has a complementary color relationship with blue. White LED lamp power S as an LED device including an LED element is disclosed. In this LED device, the light emitted from the light-emitting layer and transmitted through the fluorescent layer as blue light is mixed with the light converted into yellow-green light by the fluorescent material in the fluorescent layer. The observer sees white light. In this LED device, one LED chip is composed of a transparent substrate and an LED component layer (including a light emitting layer) formed on one surface of the substrate. This LED chip force is mounted on the Si diode element substrate with the LED component layer as the Si diode element substrate (submount element) side, and the fluorescent layer serves as a tray for the Si diode element substrate. It is applied so as to cover the LED chip arranged on the substrate. Therefore, in this LED device, the fluorescent layer is exposed to the outside unless specifically covered with a protective film or the like.

[0004] そして、下記特許文献 1には、白色の色度が前記蛍光層の厚さに依存するので、 白色の色度のばらつきを抑えて、要求される色度の生産歩留りを向上させるために、 前記蛍光物質の膜厚を精度良く均一にすることが好ましい旨が、開示されている。さ らに、下記特許文献 1には、前記蛍光物質の膜厚を精度良く均一にするための具体 的な製造方法として、前記蛍光物質をシルクスクリーン印刷により形成したり、前記蛍 光物質の形成前に LEDチップの透明基板を研磨したり、前記蛍光物質の形成後に 蛍光物質を研磨したりする技術が、開示されている。  [0004] And, in Patent Document 1 below, since the white chromaticity depends on the thickness of the fluorescent layer, in order to suppress the variation in white chromaticity and improve the production yield of the required chromaticity In addition, it is disclosed that it is preferable to make the film thickness of the fluorescent material uniform with high accuracy. Further, in Patent Document 1 below, as a specific manufacturing method for making the film thickness of the phosphor material uniform with high accuracy, the phosphor material is formed by silk screen printing, or the phosphor material is formed. Techniques have been disclosed in which the transparent substrate of the LED chip is polished before, or the fluorescent material is polished after the fluorescent material is formed.

[0005] また、例えば、下記特許文献 2には、紫外光を発する発光層と、前記紫外光により 励起されて可視光を発する蛍光物質を含む蛍光層とを有する LED素子を含む LED 装置としての、発光デバイスや表示装置(ディスプレイ)が、開示されている。この LE D装置では、基板上に LED構成層(発光層を含む)が形成され、前記蛍光層は、前 記基板の前記 LED構成層とは反対側の面、又は、前記 LED構成層の前記基板とは 反対側の面に形成されている。したがって、この LED装置においても、前記蛍光層 は、特別に保護膜等によって覆わない限り、外界に露出する。 [0005] Further, for example, in Patent Document 2 below, a light emitting layer that emits ultraviolet light, and the ultraviolet light. A light emitting device and a display device (display) as an LED device including an LED element having a fluorescent layer containing a fluorescent substance that emits visible light when excited is disclosed. In this LED apparatus, an LED constituent layer (including a light emitting layer) is formed on a substrate, and the fluorescent layer is a surface of the substrate opposite to the LED constituent layer or the LED constituent layer. It is formed on the surface opposite to the substrate. Therefore, also in this LED device, the fluorescent layer is exposed to the outside unless specifically covered with a protective film or the like.

特許文献 1 :特開 2001— 15817号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 2001-15817

特許文献 2:特表平 11 510968号公報  Patent Document 2: Japanese Patent Publication No. 11 510968

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0006] しかしながら、前述した従来の LED装置では、前述したように、前記蛍光層は特別 に保護膜等で覆わない限り外界に露出するので、蛍光層が外界の影響 (例えば、湿 気)を受けて蛍光層が劣化してしまい、ひいては当該 LED装置の耐久性が低下して しまう。 [0006] However, in the conventional LED device described above, as described above, the fluorescent layer is exposed to the outside unless it is specifically covered with a protective film or the like, so that the fluorescent layer is affected by the outside (for example, moisture). As a result, the phosphor layer deteriorates, and as a result, the durability of the LED device decreases.

[0007] また、 LED装置を製造するに際して、前記特許文献 1の教示に従って蛍光層をスク リーン印刷により形成したり研磨工程を導入したりしても、前記蛍光物質の膜厚を十 分に精度良く均一にすることは困難である。したがって、製品間において (LED素子 を複数含む製品においては、同一製品における LED素子間においても)、発光色や 発光強度のばらつきを十分に低減することができず、ひいては歩留まりを十分に高め ることはできない。  [0007] Further, when manufacturing an LED device, even if a fluorescent layer is formed by screen printing or a polishing process is introduced according to the teaching of Patent Document 1, the film thickness of the fluorescent material is sufficiently accurate. It is difficult to make it uniform well. Therefore, between products (even in the case of products containing multiple LED elements, even between LED elements in the same product), variations in emission color and emission intensity cannot be reduced sufficiently, and as a result, the yield is sufficiently increased. I can't.

[0008] 本発明は、このような事情に鑑みてなされたもので、特別な保護膜等で覆うことなく 蛍光層に対する外界の影響を低減することができ、ひいては耐久性を高めることがで きる LED装置を提供することを目的とする。  [0008] The present invention has been made in view of such circumstances, and can reduce the influence of the outside world on the fluorescent layer without covering with a special protective film or the like, which in turn can improve durability. An object is to provide an LED device.

[0009] また、本発明は、このような耐久性を高めることができる LED装置を製造することが でき、しかも、蛍光層の厚さをより精度良く均一にすることができてこれにより歩留りを より高めること力 Sできる、 LED装置の製造方法を提供することを目的とする。  [0009] Further, according to the present invention, it is possible to manufacture an LED device capable of enhancing such durability, and moreover, it is possible to make the thickness of the fluorescent layer uniform with high accuracy, thereby improving the yield. The purpose is to provide a method of manufacturing an LED device that can increase the power S.

課題を解決するための手段  Means for solving the problem

[0010] 前記課題を解決するため、本発明では、第 1の基板上に、発光層を含み LED素子 を構成する LED構成層を形成する段階と、所定の波長域の光を透過する第 2の基 板上に、前記発光層からの光により励起されて異なる波長の光を発する蛍光物質を 含む蛍光層を形成する段階と、前記第 1の基板の前記 LED構成層上に、第 3の基板 を接合する段階と、前記第 3の基板が接合された前記 LED構成層から前記第 1の基 板を取り除く段階と、前記第 3の基板が接合され前記第 1の基板が取り除かれた前記 LED構成層に、前記 LED構成層と前記蛍光層とが接するように、前記蛍光層を備え る前記第 2の基板を接合する段階と、を備えたことを特徴とする LED装置の製造方 法を提供する。 In order to solve the above problems, in the present invention, an LED element including a light emitting layer on a first substrate. And a fluorescent material containing a fluorescent material that emits light of a different wavelength when excited by light from the light emitting layer on a second substrate that transmits light of a predetermined wavelength range. Forming a layer, bonding a third substrate on the LED component layer of the first substrate, and forming the first substrate from the LED component layer to which the third substrate is bonded And removing the first substrate, and the LED component layer and the phosphor layer are in contact with the LED component layer to which the third substrate is bonded and the first substrate is removed. A method of manufacturing an LED device, comprising: a step of bonding two substrates;

[0011] また、本発明では、第 1の基板上に、発光層を含み LED素子を構成する LED構成 層を形成する段階と、所定の波長域の光を透過する第 2の基板上に、前記発光層か らの光により励起されて異なる波長の光を発する蛍光物質を含む蛍光層を形成する 段階と、前記第 1の基板上に形成された前記 LED構成層に、第 3の基板を接合する 段階と、前記第 3の基板が接合された前記 LED構成層から前記第 1の基板を取り除 く段階と、前記第 3の基板が接合され前記第 1の基板が取り除かれた前記 LED構成 層と、前記第 2の基板上に形成された前記蛍光層とを接合する段階と、前記第 2の基 板、前記第 2の基板上に形成された前記蛍光層及び前記 LED構成層を有する接合 体を、 1つ以上の前記 LED素子を含む部分に分割する段階と、を備えたことを特徴と する LED装置の製造方法を提供する。  [0011] Further, in the present invention, a step of forming an LED constituent layer that includes a light emitting layer and constitutes an LED element on a first substrate, and a second substrate that transmits light in a predetermined wavelength range, Forming a fluorescent layer containing a fluorescent material that emits light of a different wavelength when excited by light from the light emitting layer; and a third substrate on the LED component layer formed on the first substrate. Bonding, removing the first substrate from the LED component layer to which the third substrate is bonded, and the LED having the third substrate bonded and the first substrate removed. Bonding the component layer to the phosphor layer formed on the second substrate, the second substrate, the phosphor layer formed on the second substrate, and the LED component layer. Dividing the joined body into parts including one or more of the LED elements, and an LED comprising: To provide a method of manufacturing location.

[0012] また、本発明の LED装置の製造方法では、前記 LED構成層と前記蛍光層とを接 合する前記段階の後に、前記 LED構成層から前記第 3の基板を取り除く段階をさら に備えることが好ましい。この前記 LED構成層から前記第 3の基板を取り除く段階は 、前記接合体を分割する段階を有する場合、前記 LED構成層と前記蛍光層とを接 合する前記段階の後で且つ前記分割する段階の前であることがより好ましい。  [0012] Further, the method for manufacturing an LED device of the present invention further includes a step of removing the third substrate from the LED constituent layer after the step of joining the LED constituent layer and the fluorescent layer. It is preferable. When the step of removing the third substrate from the LED constituent layer includes the step of dividing the joined body, the step of dividing the LED constituent layer and the fluorescent layer after the step of joining the LED constituent layer and the fluorescent layer More preferably, it is before.

[0013] また、本発明の LED装置の製造方法では、前記 LED素子を駆動する駆動回路が 搭載された回路基板を用意する段階と、前記 LED構成層と前記蛍光層とを接合する 前記段階の後に、前記 LED構成層又は前記第 3の基板と前記回路基板とを接合す る段階と、を備えることが好ましい。ここで、「LED構成層又は前記第 3の基板と前記 回路基板とを接合する」とは、 LED構成層と回路基板とを電気的に接続するカ 又 は、第 3の基板を介して LED構成層と回路基板とを電気的に接続することを意味して いる。なお、 LED装置の製造方法が前記接合体を分割する段階を有する場合、前 記分割する段階の前に、前記 LED構成層又は前記第 3の基板と前記回路基板とを 接合する段階を備えることが好ましい。さらに、 LED装置の製造方法が前記第 3の基 板を取り除く段階を備える場合、前記第 3の基板を取り除く段階の後で且つ前記分割 する段階の前に、前記 LED構成層と前記回路基板とを接合する段階を備えることが 好ましい。 In the LED device manufacturing method of the present invention, a step of preparing a circuit board on which a drive circuit for driving the LED element is mounted, and a step of bonding the LED component layer and the fluorescent layer are performed. It is preferable that the method further comprises a step of bonding the LED constituent layer or the third substrate and the circuit board later. Here, “joining the LED constituent layer or the third substrate and the circuit board” means that the LED constituent layer is electrically connected to the circuit board. Means that the LED component layer and the circuit board are electrically connected via the third substrate. In the case where the manufacturing method of the LED device includes a step of dividing the bonded body, the method includes a step of bonding the LED constituent layer or the third substrate and the circuit board before the dividing step. Is preferred. Further, when the manufacturing method of the LED device includes a step of removing the third substrate, the LED component layer, the circuit substrate, and the circuit substrate are disposed after the step of removing the third substrate and before the dividing step. It is preferable to comprise the step of joining.

[0014] 本発明の LED装置の製造方法において、前記第 3の基板は回路基板であることが 好ましい。この場合、前記分割する段階では、前記 LED構成層と接合された前記回 路基板をさらに有する前記接合体を分割することが好ましい。  [0014] In the LED device manufacturing method of the present invention, the third substrate is preferably a circuit board. In this case, in the dividing step, it is preferable that the bonded body further including the circuit board bonded to the LED constituent layer is divided.

[0015] また、前記第 3の基板である前記回路基板は、前記 LED素子を駆動する駆動回路 が搭載された回路基板であることがより好ましレ、。 [0015] Further, the circuit board as the third board is more preferably a circuit board on which a drive circuit for driving the LED element is mounted.

[0016] また、本発明の LED装置の製造方法において、前記 LED構成層を形成する前記 段階は、前記 LED構成層の少なくとも 1つの層をェピタキシャル成長により形成する 段階を含むことが好ましい。 [0016] In the LED device manufacturing method of the present invention, it is preferable that the step of forming the LED constituent layer includes a step of forming at least one layer of the LED constituent layer by epitaxial growth.

[0017] また、本発明の LED装置の製造方法において、前記 LED装置は前記 LED素子を 複数含み、前記 LED装置は映像信号又はその他の表示制御信号に基づレ、てカラ 一表示又はモノクロ表示を行う表示装置であることが好ましい。 [0017] In the LED device manufacturing method of the present invention, the LED device includes a plurality of the LED elements, and the LED device is a color display or a monochrome display based on a video signal or other display control signal. It is preferable that the display device perform the above.

[0018] 本発明ではまた、発光層を含み LED素子を構成する LED構成層と、所定の波長 域の光を透過する基板と、前記 LED構成層と前記基板との間に配置された蛍光層 であって、前記発光層からの光により励起されて異なる波長の光を発する蛍光物質 を含む蛍光層と、を備える LED装置を提供する。 [0018] In the present invention, the LED constituent layer that includes the light emitting layer and constitutes the LED element, a substrate that transmits light in a predetermined wavelength region, and a fluorescent layer that is disposed between the LED constituent layer and the substrate. An LED device comprising: a fluorescent layer including a fluorescent substance that emits light of different wavelengths when excited by light from the light emitting layer.

[0019] また、本発明の LED装置は、前記 LED素子の数が 2つ以上であり、前記 2つ以上 の LED素子のうちの少なくとも 1つの LED素子の外部への発光色力 前記 2つ以上 の LED素子のうちの他の少なくとも 1つの LED素子の外部への発光色と異なるもの であることが好ましい。 [0019] Further, in the LED device of the present invention, the number of the LED elements is two or more, and the luminescent color power to the outside of at least one of the two or more LED elements is the two or more. It is preferable that the color of the light emitted to the outside of at least one of the other LED elements is different.

[0020] また、本発明の LED装置は、前記 LED素子の数が 2つ以上であり、当該 LED装置 は、映像信号又はその他の表示制御信号に基づ!/、てカラー表示又はモノクロ表示を 行う表示装置を構成するものであることが好ましレ、。 [0020] Further, in the LED device of the present invention, the number of the LED elements is two or more, and the LED device performs color display or monochrome display based on a video signal or other display control signal. Preferably, it constitutes a display device to perform.

[0021] また、本発明の LED装置は、前記 LED素子を駆動する駆動回路が搭載され前記 LED素子と電気的に接続された回路基板を、備えることが好ましい。 [0021] The LED device of the present invention preferably includes a circuit board on which a drive circuit for driving the LED element is mounted and electrically connected to the LED element.

発明の効果  The invention's effect

[0022] 本発明によれば、特別な保護膜等で覆うことなく蛍光層に対する外界の影響を低 減すること力 Sでき、ひいては耐久性を高めることができる LED装置を提供することが できる。  [0022] According to the present invention, it is possible to provide an LED device that can reduce the influence of the outside world on the fluorescent layer without being covered with a special protective film or the like, and thus can improve durability.

[0023] また、本発明によれば、このような耐久性を高めることができる LED装置を製造する ことができ、しかも、蛍光層の厚さをより精度良く均一にすることができてこれにより歩 留りをより高めることができる、 LED装置の製造方法を提供することができる。  In addition, according to the present invention, it is possible to manufacture an LED device that can enhance such durability, and moreover, the thickness of the fluorescent layer can be made more accurate and uniform. It is possible to provide a method for manufacturing an LED device that can further increase the yield.

図面の簡単な説明  Brief Description of Drawings

[0024] [図 1]本発明の第 1の実施の形態による LED装置の要部をなす LEDチップを模式的 に示す概略断面図である。  FIG. 1 is a schematic cross-sectional view schematically showing an LED chip that forms a main part of an LED device according to a first embodiment of the present invention.

[図 2]本発明の第 1の実施の形態による LED装置の製造方法の一工程を示す概略 断面図である。  FIG. 2 is a schematic cross-sectional view showing a step in the method of manufacturing the LED device according to the first embodiment of the present invention.

[図 3]図 2の工程に引き続く工程を示す概略断面図である。  FIG. 3 is a schematic sectional view showing a step that follows the step of FIG. 2.

[図 4]図 3の工程に引き続く工程を示す概略断面図である。  4 is a schematic cross-sectional view showing a step that follows the step of FIG. 3.

[図 5]本発明の第 2の実施の形態における LED装置を示す概略ブロック図である。  FIG. 5 is a schematic block diagram showing an LED device according to a second embodiment of the present invention.

[図 6]図 5中の単位画素を示す回路図である。  FIG. 6 is a circuit diagram showing a unit pixel in FIG.

[図 7]本発明の第 2の実施の形態による LED装置の LED素子の配置を示す図である  FIG. 7 is a diagram showing an arrangement of LED elements of the LED device according to the second embodiment of the present invention.

[図 8]LED素子の他の配置例を示す図である。 FIG. 8 is a view showing another arrangement example of LED elements.

[図 9]LED素子の更に他の配置例を示す図である。  FIG. 9 is a view showing still another arrangement example of LED elements.

[図 10]本発明の第 2の実施の形態による LED装置を示す概略断面図である。  FIG. 10 is a schematic cross-sectional view showing an LED device according to a second embodiment of the present invention.

[図 11]図 10の LED装置のチップを拡大して示す概略拡大断面図である。  FIG. 11 is a schematic enlarged cross-sectional view showing an enlarged chip of the LED device of FIG.

[図 12]図 10及び図 11に示すチップの LED基板の 1つの単位画素の部分を模式的 に示す概略平面図である。  FIG. 12 is a schematic plan view schematically showing one unit pixel portion of the LED substrate of the chip shown in FIGS. 10 and 11.

[図 13]図 10及び図 11に示すチップの駆動回路基板の 1つの単位画素の部分を模 式的に示す概略平面図である。 [FIG. 13] A unit pixel portion of the drive circuit board of the chip shown in FIGS. 10 and 11 is schematically illustrated. It is a schematic plan view shown schematically.

[図 14]本発明の第 2の実施の形態による LED装置の変形例を示す概略断面図であ  FIG. 14 is a schematic sectional view showing a modification of the LED device according to the second embodiment of the present invention.

[図 15]本発明の第 2の実施の形態による LED装置の製造方法の一工程を示す概略 断面図である。 FIG. 15 is a schematic cross-sectional view showing one step in the method of manufacturing the LED device according to the second embodiment of the present invention.

[図 16]図 15の工程に引き続く工程を示す概略断面図である。  FIG. 16 is a schematic sectional view showing a step that follows the step of FIG. 15.

[図 17]図 16の工程に引き続く工程を示す概略断面図である。  FIG. 17 is a schematic sectional view showing a step that follows the step of FIG. 16.

[図 18]本発明の第 2の実施の形態による LED装置の製造方法の一工程を模式的に 示す概略斜視図である。  FIG. 18 is a schematic perspective view schematically showing one step of a method for manufacturing an LED device according to a second embodiment of the present invention.

[図 19]図 17の工程に引き続く工程を示す概略断面図である。  FIG. 19 is a schematic sectional view showing a step that follows the step of FIG. 17.

[図 20]本発明の第 2の実施の形態における LED装置の製造方法の変形例の工程を 示す概略断面図である。  FIG. 20 is a schematic cross-sectional view showing a process of a modification of the method for manufacturing an LED device in the second embodiment of the present invention.

[図 21]図 20の工程に引き続く工程を示す概略断面図である。  FIG. 21 is a schematic sectional view showing a step that follows the step of FIG. 20.

符号の説明  Explanation of symbols

[0025] 1---LEDチップ、 2, 61…第 2の基板、 4, 41R, 41G, 41B…蛍光層、 5, 63···η型 不純物層、 6, 64···活性層(発光層)、 7, 65···ρ型不純物層、 43···電極 (接地線)、 74, 66, 67…電極、 10, 70' :LED構成層、 71, 72…ノ ンプ、 11, 91…第 1の基 板(基板)、 12, 92···第 3の基板(基板)、 21 'LED装置、 51…チップ、 52---LED 基板、 53···駆動回路基板。  [0025] 1 --- LED chip, 2, 61 ... second substrate, 4, 41R, 41G, 41B ... fluorescent layer, 5, 63 ... η type impurity layer, 6, 64 ... active layer ( Light-emitting layer), 7, 65 ··· ρ-type impurity layer, 43 ··· Electrode (ground wire), 74, 66, 67… Electrode, 10, 70 ': LED component layer, 71, 72 ... , 91 ... 1st substrate (substrate), 12, 92 ... 3rd substrate (substrate), 21 'LED device, 51 ... Chip, 52 --- LED substrate, 53 ... Drive circuit board.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0026] 以下、本発明による LED装置及びその製造方法について、図面を参照して説明す Hereinafter, an LED device and a manufacturing method thereof according to the present invention will be described with reference to the drawings.

[0027] [第 1の実施の形態] [0027] [First embodiment]

[0028] 図 1は、本発明の第 1の実施の形態による LED装置の要部をなす LEDチップ 1を 模式的に示す概略断面図である。  FIG. 1 is a schematic cross-sectional view schematically showing an LED chip 1 that forms a main part of the LED device according to the first embodiment of the present invention.

[0029] 図面には示していないが、本実施の形態による LED装置は、 LEDチップとして図 1 に示す LEDチップ 1を用いた、いわゆる砲弾型 LEDランプ又はチップ型 LEDとして 構成される。砲弾型 LEDランプやチップ型 LEDの構造は、 LEDチップ 1の構造を除 いて周知の構造を採用し得るので、ここでは、その説明は省略する。 [0029] Although not shown in the drawings, the LED device according to the present embodiment is configured as a so-called bullet-type LED lamp or chip-type LED using the LED chip 1 shown in Fig. 1 as the LED chip. The structure of bullet-type LED lamps and chip-type LEDs excludes the structure of LED chip 1. Therefore, a well-known structure can be adopted, and the description thereof is omitted here.

[0030] 本実施の形態では、 LEDチップ 1は、図 1に示すように、所定の波長域(本実施の 形態では、可視領域)の光を透過するガラス基板等の基板(第 2の基板) 2と、基板 2 に設けられ白色光を基板 2を介して外部へ発する LED素子 3とから構成されている。 この LEDチップ 1は、 LED素子を 1つだけ有している。この LEDチップ 1では、基板 2 の図 1中の下面側が光出射側とされる。 In the present embodiment, as shown in FIG. 1, the LED chip 1 is a substrate (second substrate) such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment). 2) and an LED element 3 provided on the substrate 2 and emitting white light to the outside through the substrate 2. This LED chip 1 has only one LED element. In the LED chip 1, the lower surface side of the substrate 2 in FIG.

[0031] LED素子 3は、基板 2の上面側に基板 2側から順に積層された蛍光層 4、 n型不純 物層 5、発光層としての活性層 6及び p型不純物層 7と、電極 8, 9とから構成されてい る。 n型不純物層 5、活性層 6及び p型不純物層 7はそれぞれェピタキシャル成長層 によって構成されている。 n型不純物層 5の一部の領域は、活性層 6及び p型不純物 層 7によって覆われておらず、その領域に一方の電極 8が形成されている。他方の電 極 9は、 p型不純物層 7上に形成されている。本実施の形態では、知られているように 、各層 5〜7の材料等は、活性層 6から青色光が発せられるように設定されている。な お、実際には、知られているように、必要に応じて、各層 5〜7は複数の層で構成され たり、バッファ層が追加されたりする力 その詳細な構造の図示及び説明は省略する 。また、本実施の形態では、蛍光層 4は、活性層 6からの青色光により励起されて青と 補色の関係にある黄緑色の光を発する蛍光物質 (例えば、 YAG (イットリウムアルミ二 ゥムガリウム化合物) )を含有した透光性を有する樹脂 (例えば、エポキシ樹脂又はシ リコーン樹脂)の層で構成されている。 [0031] The LED element 3 includes a fluorescent layer 4, an n-type impurity layer 5, an active layer 6 as a light-emitting layer, a p-type impurity layer 7, and an electrode 8 stacked in this order from the substrate 2 side on the upper surface side of the substrate 2. , 9 and. The n-type impurity layer 5, the active layer 6 and the p-type impurity layer 7 are each composed of an epitaxial growth layer. A part of the n-type impurity layer 5 is not covered with the active layer 6 and the p-type impurity layer 7, and one electrode 8 is formed in that region. The other electrode 9 is formed on the p-type impurity layer 7. In the present embodiment, as is known, the materials of the layers 5 to 7 are set so that blue light is emitted from the active layer 6. In fact, as is known, each layer 5-7 is composed of a plurality of layers or a buffer layer is added as necessary. To do. In the present embodiment, the fluorescent layer 4 is a fluorescent material that emits yellow-green light that is excited by the blue light from the active layer 6 and has a complementary color with blue (for example, YAG (yttrium aluminum gallium compound)). ) -Containing resin (for example, epoxy resin or silicone resin).

[0032] 以上の説明からわかるように、本実施の形態では、 n型不純物層 5、活性層 6、 p型 不純物層 7及び電極 8, 9が、全体として、 LED素子 3を構成する LED構成層(ただ し、蛍光層 4は除く。 ) 10となっており、蛍光層 4は、 LED構成層 10と基板 2との間に 配置されている。 As can be seen from the above description, in the present embodiment, the n-type impurity layer 5, the active layer 6, the p-type impurity layer 7, and the electrodes 8 and 9 constitute the LED element 3 as a whole. 10 (excluding the fluorescent layer 4). The fluorescent layer 4 is disposed between the LED constituent layer 10 and the substrate 2.

[0033] 電極 8, 9間に順電流が流されると、活性層 6から青色光が発し、活性層 6から発し て青色光のままで蛍光層 4を透過した光と、蛍光層 4の蛍光物質で黄緑色の光に変 換された光とが混ざり合うことで、基板 2の下面側の観察者には白色光に見えるので ある。  [0033] When a forward current is passed between the electrodes 8 and 9, blue light is emitted from the active layer 6, the light emitted from the active layer 6 and transmitted through the fluorescent layer 4 as blue light, and the fluorescence of the fluorescent layer 4 The light that has been converted into yellowish green light by the substance mixes with it, so that the viewer on the lower surface side of the substrate 2 looks white light.

[0034] 本実施の形態による LED装置では、 LEDチップ 1において、図 1に示すように、蛍 光層 4が LED構成層 10と基板 2との間に挟まれているので、蛍光層 4は、特別な保 護膜等によって覆わなくても、外界に露出しない。したがって、本実施の形態によれ ば、特別な保護膜等で覆うことなく蛍光層 4に対する外界の影響を低減することがで き、ひいては耐久性を高めることができる。 [0034] In the LED device according to the present embodiment, as shown in FIG. Since the light layer 4 is sandwiched between the LED constituent layer 10 and the substrate 2, the fluorescent layer 4 is not exposed to the outside even if it is not covered with a special protective film or the like. Therefore, according to the present embodiment, the influence of the outside world on the fluorescent layer 4 can be reduced without covering with a special protective film or the like, and the durability can be improved.

[0035] 次に、本実施の形態による LED装置の製造方法の一例について、図 2、図 3及び 図 4を参照して説明する。図 2、図 3及び図 4は、本実施の形態による LED装置の製 造方法の各工程をそれぞれ模式的に示す概略断面図である。  Next, an example of a method for manufacturing the LED device according to the present embodiment will be described with reference to FIGS. 2, 3, and 4. FIG. 2, 3 and 4 are schematic cross-sectional views schematically showing the respective steps of the LED device manufacturing method according to the present embodiment.

[0036] まず、 LED構成層 10の n型不純物層 5等をェピタキシャル成長させる基礎となる基 板(第 1の基板) 11を用意する。基板 11としては、例えば、サファイア基板又は SiC基 板等が用いられる。次いで、第 1の基板 11上に、発光層(活性層)を含み LED素子 を構成する LED構成層 10を、複数形成する。すなわち、基板 11上に、 LED構成層 10を、一括して製造すべき複数の LEDチップ 1の分だけ形成する。具体的には、基 板 11上に、 n型不純物層 5、活性層 6及び p型不純物層 7を順次ェピタキシャル成長 により形成し、活性層 6及び p型不純物層 7の不要領域をエッチングにより除去する。 このとき、 n型不純物層 5は、基板 11上の全面に形成されたままとする。そして、電極 8, 9を金などによって形成し、エッチングにより所定形状にパターユングする。図 2 (a )は、この状態を示している。  [0036] First, a base substrate (first substrate) 11 is prepared which serves as a basis for epitaxial growth of the n-type impurity layer 5 and the like of the LED component layer 10. As the substrate 11, for example, a sapphire substrate or a SiC substrate is used. Next, a plurality of LED constituent layers 10 including a light emitting layer (active layer) and constituting an LED element are formed on the first substrate 11. That is, the LED constituent layer 10 is formed on the substrate 11 for the plurality of LED chips 1 to be manufactured at once. Specifically, an n-type impurity layer 5, an active layer 6, and a p-type impurity layer 7 are sequentially formed on the substrate 11 by epitaxial growth, and unnecessary regions of the active layer 6 and the p-type impurity layer 7 are etched. Remove. At this time, the n-type impurity layer 5 remains formed on the entire surface of the substrate 11. Then, the electrodes 8 and 9 are formed of gold or the like and patterned into a predetermined shape by etching. Figure 2 (a) shows this state.

[0037] 次に、 LED構成層 10を保持し且つ機械的ダメージ力も保護するための基板(第 3 の基板) 12を、基板 11とは反対側の LED構成層 10の表面に接合する。この接合は 、一時的なものであり、後に剥離する。ここでは、熱可塑性ワックス 13により、基板 12 を LED構成層 10に接合している。図 2 (b)は、この状態を示している。  Next, a substrate (third substrate) 12 for holding the LED component layer 10 and protecting the mechanical damage force is bonded to the surface of the LED component layer 10 opposite to the substrate 11. This bonding is temporary and will be peeled off later. Here, the substrate 12 is bonded to the LED constituent layer 10 by the thermoplastic wax 13. Figure 2 (b) shows this state.

[0038] 次いで、基板 12が接合された LED構成層 10から基板 11を取り除く。図 2 (c)は、こ の状態を示している。この基板 11の除去は、例えば、グラインダーで基板 11を削り取 つたり、あるいは、 LED構成層 10と基板 11との境界付近をウォータージェット(高圧 噴流水)又はワイヤーソ一で切断したりすることによって、行うこと力 Sできる。  Next, the substrate 11 is removed from the LED constituent layer 10 to which the substrate 12 is bonded. Figure 2 (c) shows this situation. The substrate 11 can be removed by, for example, scraping the substrate 11 with a grinder, or cutting the vicinity of the boundary between the LED component layer 10 and the substrate 11 with a water jet (high pressure jet water) or a wire saw. The ability to do S.

[0039] 一方、所定の波長域 (本実施の形態では、可視領域)の光を透過するガラス基板等 の基板(第 2の基板) 2を用意し、基板 2上に前述した蛍光層 4を塗布する。図 3 (a)は 、この状態を示している。基板 2の表面にはパターユングされた層などによる凹凸が なぐまた、基板 2としてェピタキシャル成長層形成などの高温処理を伴う工程を経て V、な!/、ものを用いることができるので、基板 2には高温処理などによる湾曲などもなレ、 。したがって、蛍光層 4の厚さをより精度良く均一にすることができる。蛍光層 4の厚さ をより一層精度良く均一にするために、必要に応じて、蛍光層 4を塗布する前に基板 2を研磨して平坦化すること、及び/又は、蛍光層 4を塗布した後に蛍光層 4を研磨 して平坦化することを fiつてもよい。なお、蛍光層 4は、例えば、シノレタスクリーン印刷 により形成してもよい。 On the other hand, a substrate (second substrate) 2 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment) is prepared, and the fluorescent layer 4 described above is provided on the substrate 2. Apply. Figure 3 (a) shows this state. The surface of the substrate 2 is uneven due to a patterned layer. In addition, since V, Na! /, Can be used as the substrate 2 through a process accompanied by high-temperature treatment such as formation of an epitaxial growth layer, the substrate 2 is not bent due to high-temperature treatment or the like. Therefore, the thickness of the fluorescent layer 4 can be made uniform with higher accuracy. In order to make the thickness of the fluorescent layer 4 uniform with higher accuracy, the substrate 2 is polished and planarized and / or the fluorescent layer 4 is applied before applying the fluorescent layer 4 as necessary. Then, the phosphor layer 4 may be polished and flattened. Note that the fluorescent layer 4 may be formed by, for example, sinoleta screen printing.

[0040] 次いで、図 2 (c)に示す状態の LED構成層 10の下面(基板 12とは反対側の面)と、 図 3 (a)に示す状態の蛍光層 4の上面(基板 2とは反対側の面)とを接合する。図 3 (b )は、この状態を示している。本実施の形態では、蛍光層 4がエポキシ樹脂又はシリコ ーン樹脂などの接着性を有する樹脂を用いて構成されているので、蛍光層 4の接着 性を利用して、 LED構成層 10と蛍光層 4とを接合する。もっとも、蛍光層 4とは別に、 透光性を有する接着剤を用いて LED構成層 10と蛍光層 4とを接合してもよい。  Next, the lower surface (surface opposite to the substrate 12) of the LED constituent layer 10 in the state shown in FIG. 2 (c) and the upper surface (substrate 2 and the surface of the fluorescent layer 4 in the state shown in FIG. 3 (a)). The other side). Figure 3 (b) shows this state. In the present embodiment, since the fluorescent layer 4 is configured using an adhesive resin such as an epoxy resin or a silicone resin, the LED constituent layer 10 and the fluorescent layer 4 are used by utilizing the adhesive property of the fluorescent layer 4. Join layer 4 together. However, apart from the fluorescent layer 4, the LED constituent layer 10 and the fluorescent layer 4 may be bonded using a translucent adhesive.

[0041] LED構成層 10の下面と蛍光層 4とを結合した後、熱可塑性ワックス 13を除去する ことで、 LED構成層 10上から基板 12を剥離して取り除く。図 4 (a)は、この状態を示 している。  [0041] After the lower surface of the LED constituent layer 10 and the fluorescent layer 4 are bonded, the thermoplastic wax 13 is removed, whereby the substrate 12 is peeled off from the LED constituent layer 10. Figure 4 (a) shows this state.

[0042] 次に、図 4 (a)に示す状態の LED構成層 10を備える基板を、ダイシングにより各 LE Dチップ 1に分割させる。図 4 (b)は、この状態を示している。以上によって、一括して 複数の LEDチップ 1が完成する。  Next, a substrate including the LED constituent layer 10 in the state shown in FIG. 4 (a) is divided into each LED chip 1 by dicing. Figure 4 (b) shows this state. As a result, a plurality of LED chips 1 are completed at once.

[0043] その後、図面には示していないが、ワイヤボンドなどの周知の工程を経て、本実施 の形態による LED装置としての砲弾型 LEDランプ又はチップ型 LEDが完成する。  Thereafter, although not shown in the drawings, a bullet-type LED lamp or a chip-type LED as the LED device according to the present embodiment is completed through a known process such as wire bonding.

[0044] この製造方法により本実施の形態による LED装置を製造すれば、前述したように蛍 光層 4の厚さをより精度良く均一にするすることができる。したがって、均一な発光色( 本実施の形態では、均一な白色の色度)の LED装置を大量に製造することが可能と なり、歩留りをより高めることができる。  If the LED device according to the present embodiment is manufactured by this manufacturing method, the thickness of the fluorescent layer 4 can be made uniform with higher accuracy as described above. Therefore, it is possible to manufacture a large number of LED devices having uniform light emission colors (uniform white chromaticity in the present embodiment), and the yield can be further increased.

[0045] 前述した製造方法では、一括して製造される全ての LEDチップ 1にお!/、て、発光層 としての活性層 6が青色光を発するとともに蛍光層 4が前記青色光を励起光として黄 緑色の光を発するように構成され、全ての LEDチップ 1は白色光を発する。しかし、 個々の LEDチップ 1にお!/、て蛍光層 4として互いに異なる色を発する蛍光層を配置 させ(すなわち、図 3 (a)に示す工程において、互いに異なる発光色の LEDチップ 1 に対応する領域では互いに異なる色を発する蛍光層を配置させ)、一度に、互いに 異なる色の光を発する複数の LEDチップ 1を製造してもよい。 [0045] In the manufacturing method described above, the active layer 6 as a light emitting layer emits blue light and the fluorescent layer 4 excites the blue light as excitation light for all LED chips 1 manufactured in a batch. It is configured to emit yellow-green light, and all LED chips 1 emit white light. But, In each LED chip 1, fluorescent layers emitting different colors are arranged as fluorescent layers 4 (that is, areas corresponding to LED chips 1 having different emission colors in the process shown in FIG. 3 (a)). Then, fluorescent layers that emit different colors may be disposed), and a plurality of LED chips 1 that emit light of different colors may be manufactured at one time.

[0046] また、一括して製造される全ての LEDチップ 1において、発光層としての活性層 6が 紫外光を発するように構成するとともに、蛍光層 4が前記紫外光を励起光として所定 色の光(例えば、赤色光、緑色光又は青色光)を発するように構成してもよい。  [0046] Further, in all LED chips 1 manufactured in a batch, the active layer 6 as a light emitting layer is configured to emit ultraviolet light, and the fluorescent layer 4 has a predetermined color using the ultraviolet light as excitation light. You may comprise so that light (for example, red light, green light, or blue light) may be emitted.

[0047] さらに、一括して製造される全ての LEDチップ 1において発光層としての活性層 6 が紫外光を発するように構成するとともに、個々の LEDチップ 1において蛍光層 4とし て紫外光により励起されて互いに異なる色を発する蛍光層を配置させ (すなわち、図 3 (a)に示す工程において、互いに異なる発光色の LEDチップ 1に対応する領域で は互いに異なる色を発する蛍光層を配置させ)、一度に、互いに異なる色の光を発 する複数の LEDチップ 1を製造してもよい。  [0047] Furthermore, the active layer 6 as the light emitting layer is configured to emit ultraviolet light in all the LED chips 1 manufactured in a batch, and the fluorescent layer 4 in each LED chip 1 is excited by ultraviolet light. (I.e., in the step shown in Fig. 3 (a), fluorescent layers emitting different colors are arranged in regions corresponding to LED chips 1 having different emission colors). A plurality of LED chips 1 that emit light of different colors may be manufactured at a time.

[0048] さらにまた、 LEDチップ 1において発光層としての活性層 6が紫外光を発するように 構成するとともに、 1つの LEDチップ 1において前記蛍光層 4を 3分割した 3つの領域 の部分として、紫外光により励起されて赤色光、緑色光及び青色光をそれぞれ発す る 3つの蛍光層をそれぞれ配置してもよい。このようにしても、 LEDチップ 1から白色 光が発することになる。  [0048] Furthermore, the LED chip 1 is configured such that the active layer 6 as the light emitting layer emits ultraviolet light, and the LED layer 1 is divided into three regions by dividing the fluorescent layer 4 into three regions. Three fluorescent layers that are excited by light and emit red light, green light, and blue light, respectively, may be disposed. Even in this case, white light is emitted from the LED chip 1.

[0049] [第 2の実施の形態]  [0049] [Second Embodiment]

[0050] 図 5は、本発明の第 2の実施の形態による LED装置 21を示す概略ブロック図であ  FIG. 5 is a schematic block diagram showing an LED device 21 according to the second embodiment of the present invention.

[0051] 本実施の形態による LED装置 21は、映像信号に応じたカラー画像を発光表示す る表示装置を構成している。本実施の形態による LED装置 21は、例えば、画面が 1 インチ以下のレ、わゆるマイクロディスプレイとして構成することも可能である。本実施 の形態による LED装置 21は、図 5に示すように、 2次元状に配置された複数の単位 画素 30と、単位画素 30の各色の LED素子 41R, 41G, 41B (図 5では図示せず。後 述する図 6及び図 7参照。)を行毎に選択する垂直走査回路 32と、単位画素 30の各 色の LED素子 41R, 41G, 41Bを列毎に選択する水平走査回路 33と、外部から入 力される映像信号を処理して当該映像信号に応じた画像表示がなされるように垂直 走査回路 32及び水平走査回路 33を制御する映像信号処理回路 34とを有している 。図 5では、単位画素 30の数は 3 X 3個とされている力 これに限定されるものではな い。 [0051] The LED device 21 according to the present embodiment constitutes a display device that emits and displays a color image corresponding to a video signal. The LED device 21 according to the present embodiment can be configured as, for example, a so-called micro display with a screen of 1 inch or less. As shown in FIG. 5, the LED device 21 according to the present embodiment includes a plurality of unit pixels 30 arranged two-dimensionally, and LED elements 41R, 41G, 41B of the respective colors of the unit pixels 30 (not shown in FIG. 5). 6 and 7 to be described later), and a horizontal scanning circuit 33 for selecting LED elements 41R, 41G, and 41B of each color of the unit pixel 30 for each column. , Enter from outside And a video signal processing circuit 34 for controlling the vertical scanning circuit 32 and the horizontal scanning circuit 33 so as to process the input video signal and display an image corresponding to the video signal. In FIG. 5, the number of unit pixels 30 is 3 × 3. However, the present invention is not limited to this.

[0052] 本実施の形態では、単位画素 30における LED素子 41R, 41G, 41B以外の要素  In the present embodiment, elements other than LED elements 41R, 41G, and 41B in unit pixel 30

(後述する図 6参照)、垂直走査回路 32、水平走査回路 33及び映像信号処理回路 3 4によって、 LED素子 41R, 41G, 41Bを駆動する駆動回路 31が構成されている。  (See FIG. 6 described later), the vertical scanning circuit 32, the horizontal scanning circuit 33, and the video signal processing circuit 34 constitute a drive circuit 31 that drives the LED elements 41R, 41G, and 41B.

[0053] 図 6は、図 5中の単位画素 30を示す回路図である。各単位画素 30は、赤色光を発 光する赤色 LED素子 41Rと、緑色光を発光する緑色 LED素子 41Gと、青色光を発 光する青色 LED素子 41Bと、赤色 LED素子 41Rの画素列を選択する赤色列選択ス イッチ 42Rと、緑色 LED素子 41Gの画素列を選択する緑色列選択スィッチ 42Gと、 青色 LED素子 41Bの画素列を選択する青色列選択スィッチ 42Bとを有している。列 選択スィッチ 42R, 42G, 42Bは MOSトランジスタで構成されている。  FIG. 6 is a circuit diagram showing the unit pixel 30 in FIG. Each unit pixel 30 selects a pixel array of a red LED element 41R that emits red light, a green LED element 41G that emits green light, a blue LED element 41B that emits blue light, and a red LED element 41R. A red column selection switch 42R, a green column selection switch 42G for selecting the pixel column of the green LED element 41G, and a blue column selection switch 42B for selecting the pixel column of the blue LED element 41B. The column selection switches 42R, 42G, and 42B are composed of MOS transistors.

[0054] 全ての単位画素 30の LED素子 41R, 41G, 41Bの力ソードは、接地線 43によって 共通に接続されている。 LED素子 41R, 41G, 41Bのアノードは、対応する選択スィ ツチ 42R, 42G, 42Bのドレインにそれぞれ接続されている。赤色列選択スィッチ 42 Rのソースは、水平ソース線 44Rによって画素行毎に共通に接続され、映像信号処 理回路 34の制御下で作動する垂直走査回路 32から、赤色の輝度値に応じた大きさ の電圧を駆動信号として受ける。緑色列選択スィッチ 42Gのソースは、水平ソース線 44Gによって画素行毎に共通に接続され、垂直走査回路 32から緑色の輝度値に応 じた大きさの電圧を駆動信号として受ける。青色列選択スィッチ 42Bのソースは、水 平ソース線 44Bによって画素行毎に共通に接続され、垂直走査回路 32から青色の 輝度値に応じた大きさの電圧を駆動信号として受ける。  The force swords of the LED elements 41 R, 41 G, 41 B of all the unit pixels 30 are connected in common by the ground line 43. The anodes of the LED elements 41R, 41G, and 41B are connected to the drains of the corresponding selection switches 42R, 42G, and 42B, respectively. The source of the red column selection switch 42 R is connected in common to each pixel row by the horizontal source line 44 R, and the vertical scanning circuit 32 operated under the control of the video signal processing circuit 34 has a magnitude corresponding to the red luminance value. This voltage is received as a drive signal. The sources of the green column selection switch 42G are connected in common to each pixel row by the horizontal source line 44G, and receive a voltage having a magnitude corresponding to the green luminance value from the vertical scanning circuit 32 as a drive signal. The source of the blue column selection switch 42B is connected in common to each pixel row by the horizontal source line 44B, and receives a voltage having a magnitude corresponding to the blue luminance value from the vertical scanning circuit 32 as a drive signal.

[0055] 赤色列選択スィッチ 42Rのゲートは、垂直選択線 45Rによって画素列毎に共通に 接続され、映像信号処理回路 34の制御下で作動する水平走査回路 33から、赤色の 列選択信号を受ける。緑色列選択スィッチ 42Gのゲートは、垂直選択線 45Gによつ て画素列毎に共通に接続され、水平走査回路 33から、緑色の列選択信号を受ける 。青色列選択スィッチ 42Bのゲートは、垂直選択線 45Bによって列毎に共通に接続 され、水平走査回路 33から、青色の列選択信号を受ける。 [0055] The gate of the red column selection switch 42R is connected in common to each pixel column by a vertical selection line 45R, and receives a red column selection signal from the horizontal scanning circuit 33 operating under the control of the video signal processing circuit 34. . The gates of the green column selection switch 42G are connected to each pixel column in common by a vertical selection line 45G, and receive a green column selection signal from the horizontal scanning circuit 33. Blue column selection switch 42B gates are connected in common to each column by vertical selection line 45B Then, a blue column selection signal is received from the horizontal scanning circuit 33.

[0056] 再び図 5を参照すると、映像信号処理回路 34は、外部から映像信号が入力される と、その映像信号に基づき各画素 30の各色の輝度を求めて、その値に対応する制 御信号を、垂直走査回路 32及び水平走査回路 33にそれぞれ出力する。垂直走査 回路 32及び水平走査回路 33は、所定のタイミングで上記制御信号に基づ!/、て所定 のタイミングで、画素列毎に各色の列選択スィッチ 42R, 42G, 42Bのオン信号(選 択信号)、画素行毎に各色の水平ソース線 44R, 44G, 44Bに輝度値に応じた大き さの電圧を出力する。このようにして、単位画素 30毎に輝度値に応じた大きさの電圧 (ひいては電流)を各色の LED素子 41R, 41G, 41Bに印加して、単位画素 30毎に 所望の色、輝度で発光させ、これにより、入力された映像信号が示す画像を発光表 示させる。 Referring again to FIG. 5, when a video signal is input from the outside, the video signal processing circuit 34 obtains the luminance of each color of each pixel 30 based on the video signal and performs control corresponding to the value. The signals are output to the vertical scanning circuit 32 and the horizontal scanning circuit 33, respectively. The vertical scanning circuit 32 and the horizontal scanning circuit 33 are based on the control signal at a predetermined timing! /, And at a predetermined timing, the ON signals (selection signals) of the column selection switches 42R, 42G, and 42B for each color for each pixel column. Signal), a voltage corresponding to the luminance value is output to the horizontal source lines 44R, 44G, and 44B of each color for each pixel row. In this way, a voltage (and current) having a magnitude corresponding to the luminance value is applied to each unit pixel 30 to the LED elements 41R, 41G, and 41B of each color, and light is emitted with a desired color and luminance for each unit pixel 30. As a result, the image indicated by the input video signal is displayed.

[0057] 図 7は、本実施の形態で採用されている各色の LED素子 41R, 41G, 41Bの配置 を模式的に示す平面図である。図 7において、「R」は赤色 LED素子 41Rを示し、「G 」は緑色 LED素子 41Gを示し、「B」は青色 LED素子 41Bを示している。図 7におい ても、単位画素 30の数は 3 X 3個とされている。これらの点は、後述する図 8及び図 9 についても同様である。  FIG. 7 is a plan view schematically showing the arrangement of the LED elements 41R, 41G, 41B of the respective colors employed in the present embodiment. In FIG. 7, “R” indicates the red LED element 41R, “G” indicates the green LED element 41G, and “B” indicates the blue LED element 41B. In FIG. 7, the number of unit pixels 30 is 3 × 3. These points are the same in FIGS. 8 and 9 described later.

[0058] 本実施の形態では、図 7に示すように、各単位画素 30は行方向(左右方向)に並ん だ各色 1つずつ合計 3つの LED素子 41R, 41G, 41Bで構成されている。本実施の 形態では、図 7に示すように、同じ行の各単位画素 30における各色の LED素子 41R , 41G, 41Bの並び順は同一である力 S、列方向に隣り合う行の単位画素 30における LED素子 41R, 41G, 41Bの並び順がずれている。  In the present embodiment, as shown in FIG. 7, each unit pixel 30 is composed of a total of three LED elements 41R, 41G, and 41B, one for each color arranged in the row direction (left and right direction). In the present embodiment, as shown in FIG. 7, the arrangement order of the LED elements 41R, 41G, 41B of the respective colors in the unit pixels 30 in the same row is the same force S, and the unit pixels 30 in the rows adjacent to each other in the column direction. The LED elements 41R, 41G, and 41B are out of order.

[0059] もっとも、各色の LED素子 41R, 41G, 41Bの配置は、図 7に示す例に限定される ものではなぐ例えば、図 8に示す配置や図 9に示す配置を採用してもよい。図 8では 、全ての単位画素 30における各色の LED素子 41R, 41G, 41Bの並び順は同一と されている。図 9では、各単位画素 30は、 1つの赤色 LED素子 41R、 2つの緑色 LE D素子 41G及び 1つの青色 LED素子 41Bの、合計 2 X 2個の LED素子で構成され ている。  [0059] However, the arrangement of the LED elements 41R, 41G, 41B of the respective colors is not limited to the example shown in FIG. 7, and for example, the arrangement shown in FIG. 8 or the arrangement shown in FIG. 9 may be adopted. In FIG. 8, the arrangement order of the LED elements 41R, 41G, 41B of the respective colors in all the unit pixels 30 is the same. In FIG. 9, each unit pixel 30 is composed of a total of 2 × 2 LED elements, one red LED element 41R, two green LED elements 41G, and one blue LED element 41B.

[0060] 図 10は、本実施の形態による LED装置 21を示す概略断面図である。図 11は、図 10中のハイブリッド化されたチップ 51を拡大して示す概略拡大断面図である。図 12 は、図 10及び図 11に示すチップ 51を構成している LED基板 52の 1つの単位画素 3 0の部分(その一部の要素のみ)を模式的に示す概略平面図である。図 13は、図 10 及び図 11に示すチップ 51を構成している駆動回路基板 53の、図 12と対応する 1つ の単位画素 30の部分(その一部の要素のみ)を模式的に示す概略平面図である。な お、図 12及び図 13は、いずれも図 11中の上側から見たものとなっているが、本来隠 れ線とすべき線も実線で示している。なお、図 7中の A—A'線に沿った断面、図 12 中の B— B'線に沿った断面及び図 13中の C— C'線に沿った断面は、 1つの平面内 に含まれる力 図 10及び図 11に示す断面は、その平面における断面を示している。 FIG. 10 is a schematic cross-sectional view showing the LED device 21 according to the present embodiment. Figure 11 10 is an enlarged schematic cross-sectional view showing the hybridized chip 51 in FIG. FIG. 12 is a schematic plan view schematically showing a part of one unit pixel 30 (only some of the elements) of the LED substrate 52 constituting the chip 51 shown in FIG. 10 and FIG. FIG. 13 schematically shows a part of one unit pixel 30 corresponding to FIG. 12 (only some of the elements) of the drive circuit board 53 constituting the chip 51 shown in FIGS. 10 and 11. It is a schematic plan view. 12 and 13 are both viewed from the upper side of FIG. 11, but the lines that should be hidden lines are also shown as solid lines. Note that the cross section along the line AA ′ in FIG. 7, the cross section along the line BB ′ in FIG. 12, and the cross section along the line CC ′ in FIG. 13 are within one plane. Forces included The cross sections shown in FIGS. 10 and 11 are cross sections in the plane.

[0061] LED基板 52は、所定の波長域 (本実施の形態では、可視領域)の光を透過する 1 枚のガラス基板等の基板(第 2の基板) 61と、基板 61に設けられた全ての単位画素 3 0の各色の LED素子 41R, 41G, 41Bとから構成されている。  [0061] The LED substrate 52 is provided on the substrate 61 and a substrate (second substrate) 61 such as one glass substrate that transmits light in a predetermined wavelength range (visible region in the present embodiment). Each unit pixel 30 includes LED elements 41R, 41G, and 41B of the respective colors.

[0062] 赤色 LED素子 41Rは、図 11及び図 12に示すように、基板 61の下面側に基板 61 側から順に積層された蛍光層 62R、 n型不純物層 63、発光層としての活性層 64及 び p型不純物層 65と、電極 66, 67とから構成されている。 n型不純物層 63、活性層 6 4及び p型不純物層 65はそれぞれェピタキシャル成長層によって構成されている。 n 型不純物層 63の一部の領域は、活性層 64及び p型不純物層 65によって覆われて おらず、その領域に一方の電極 66が形成されている。他方の電極 67は、 p型不純物 層 65上に形成されている。本実施の形態では、知られているように、各層 63〜65の 材料等は、活性層 64から紫外光が発せられるように設定されている。なお、実際には 、知られているように、必要に応じて、各層 63〜65は複数の層で構成されたり、バッ ファ層が追加されたりする力 その詳細な構造の図示及び説明は省略する。蛍光層 62Rは、当該 LED素子 41Rの活性層 64からの紫外光により励起されて赤色光を発 する蛍光物質(例えば、 Ca Al Si O N : Eu や Y O S : Eu等)を含  As shown in FIGS. 11 and 12, the red LED element 41R includes a fluorescent layer 62R, an n-type impurity layer 63, and an active layer 64 serving as a light emitting layer, which are sequentially stacked on the lower surface side of the substrate 61 from the substrate 61 side. And a p-type impurity layer 65 and electrodes 66 and 67. The n-type impurity layer 63, the active layer 64, and the p-type impurity layer 65 are each composed of an epitaxially grown layer. A part of the n-type impurity layer 63 is not covered with the active layer 64 and the p-type impurity layer 65, and one electrode 66 is formed in the region. The other electrode 67 is formed on the p-type impurity layer 65. In the present embodiment, as is known, the materials of the layers 63 to 65 are set so that ultraviolet light is emitted from the active layer 64. In fact, as is known, each of the layers 63 to 65 is composed of a plurality of layers or a buffer layer is added as necessary. Illustration and description of the detailed structure are omitted. To do. The fluorescent layer 62R contains a fluorescent material that emits red light when excited by the ultraviolet light from the active layer 64 of the LED element 41R (for example, CaAlSiON: Eu or YOS: Eu).

0. 950 2 4 0. 075 7. 917 0. 050 2 2  0. 950 2 4 0. 075 7. 917 0. 050 2 2

有した透光性を有する樹脂(例えば、エポキシ樹脂又はシリコーン樹脂)の層で構成 されている。  It is composed of a layer of light-transmitting resin (for example, epoxy resin or silicone resin).

[0063] 緑色 LED素子 41Gが赤色 LED素子 41Rと異なる所は蛍光層 62Rに代えて蛍光 層 62Gが形成されている点のみであり、青色 LED素子 41Bが赤色 LED素子 41Rと 異なる所は蛍光層 62Rに代えて蛍光層 62Bが形成されている点のみであるので、そ れらの重複する説明は省略する。 [0063] The green LED element 41G is different from the red LED element 41R only in that a fluorescent layer 62G is formed instead of the fluorescent layer 62R, and the blue LED element 41B is different from the red LED element 41R. The only difference is that the fluorescent layer 62B is formed in place of the fluorescent layer 62R, and therefore, a duplicate description thereof is omitted.

[0064] 蛍光層 62Gは、当該 LED素子 41Gの活性層 64からの紫外光により励起されて緑 色光を発する蛍光物質(例えば、 ZnS : Cu, A1や(Ba, Sr, Ca) SiO : Eu等)を含 [0064] The fluorescent layer 62G is a fluorescent material that emits green light when excited by the ultraviolet light from the active layer 64 of the LED element 41G (for example, ZnS: Cu, A1, (Ba, Sr, Ca) SiO: Eu, etc. Included)

2 4  twenty four

有した透光性を有する樹脂(例えば、エポキシ樹脂又はシリコーン樹脂)の層で構成 されている。  It is composed of a layer of light-transmitting resin (for example, epoxy resin or silicone resin).

[0065] 蛍光層 62Bは、当該 LED素子 41Bの活性層 64からの紫外光により励起されて青 色光を発する蛍光物質(例えば、 BAM : Eu (BaMgAl O : Euや(Sr, Ca, Ba, M  [0065] The fluorescent layer 62B is a fluorescent substance that emits blue light when excited by the ultraviolet light from the active layer 64 of the LED element 41B (for example, BAM: Eu (BaMgAl 2 O 3: Eu or (Sr, Ca, Ba, M

10 17  10 17

g) (PO ) CI : Eu等)を含有した透光性を有する樹脂(例えば、エポキシ樹脂又は g) Translucent resin (for example, epoxy resin or

10 4 6 2 10 4 6 2

シリコーン樹脂)の層で構成されている。  (Silicone resin) layer.

[0066] 以上の説明力、らわかるように、本実施の形態では、各 LED素子 41R, 41G, 41B において、 n型不純物層 63、活性層 64、 p型不純物層 65及び電極 66, 67が、全体 として、当該 LED素子を構成する LED構成層(ただし、蛍光層 62R, 62G, 62Bは 除く。) 70となっており、蛍光層 62R, 62G, 62Bはそれぞれ、 LED構成層 70と基板 61との間に配置されている。  [0066] As can be seen from the above explanatory power, in this embodiment, in each LED element 41R, 41G, 41B, the n-type impurity layer 63, the active layer 64, the p-type impurity layer 65, and the electrodes 66, 67 are provided. As a whole, the LED constituent layers constituting the LED element (excluding the fluorescent layers 62R, 62G and 62B) are 70, and the fluorescent layers 62R, 62G and 62B are the LED constituent layer 70 and the substrate 61, respectively. It is arranged between.

[0067] 図 5及び図 6に示す回路のうち LED素子 41R, 41G, 41B以外の部分である駆動 回路 31が、周知の半導体プロセス技術を用いて、 1つの駆動回路基板 53に搭載さ れている。本実施の形態では、駆動回路基板 53としてシリコン基板が用いられている 。駆動回路基板 53は、図 11 ,図 12及び図 13に示すように、バンプ 71 , 72によって LED基板 52の各 LED素子 41R, 41G, 41Bの電極 66, 67と電気的に接続されて いる。チップ 51は、バンプ 71 , 72によって互いに接合された LED基板 52及び駆動 回路基板 53によって構成されている。  [0067] Of the circuits shown in FIGS. 5 and 6, the drive circuit 31 that is a part other than the LED elements 41R, 41G, and 41B is mounted on one drive circuit board 53 using a known semiconductor process technology. Yes. In the present embodiment, a silicon substrate is used as the drive circuit substrate 53. The drive circuit board 53 is electrically connected to the electrodes 66 and 67 of the LED elements 41R, 41G, and 41B of the LED board 52 by bumps 71 and 72, as shown in FIGS. The chip 51 includes an LED substrate 52 and a drive circuit substrate 53 that are bonded to each other by bumps 71 and 72.

[0068] 前述した赤色列選択スィッチ 42Rは、駆動回路基板 53に形成された所定の拡散 層によるソース及びドレイン(図示せず)と、その両者間の領域の上に配置されたグー ト電極 73 (図 13参照)とからなる MOSトランジスタとして、構成されている。前記ソー スは、水平ソース線 44Rに接続された配線パターンに接続されている。前記ドレイン は、その上に形成されバンプ 72により接続された電極 74と接続されている。ゲート電 極 73は、配線パターンによって垂直選択線 45Rに接続されている。これらの点は、 緑色列選択スィッチ 42G及び青色列選択スィッチ 42Bにつ!/、ても同様である。なお 、接地線 43は、 LED素子 41R, 41G, 41Bと接続するための電極を兼ねている。な お、図 11において、 75はシリコン酸化膜等の絶縁膜である。 The above-described red column selection switch 42R includes a source electrode and a drain electrode (not shown) formed by a predetermined diffusion layer formed on the drive circuit board 53, and a gate electrode 73 disposed on a region between them. (See Fig. 13). The source is connected to a wiring pattern connected to the horizontal source line 44R. The drain is connected to an electrode 74 formed thereon and connected by a bump 72. The gate electrode 73 is connected to the vertical selection line 45R by a wiring pattern. These points The same applies to the green column selection switch 42G and the blue column selection switch 42B. The ground wire 43 also serves as an electrode for connecting to the LED elements 41R, 41G, and 41B. In FIG. 11, reference numeral 75 denotes an insulating film such as a silicon oxide film.

[0069] 図 11に示すように、赤色 LED素子 41Rのアノードと赤色列選択スィッチ 42Rのドレ インとが、電極 67, 74間に設けられたバンプ 72によって電気的に接続されている。ま た、赤色 LED素子 41Rの力ソードと接地線 43と力 電極 66と接地線 43との間に設 けられたバンプ 71によって電気的に接続されている。同様に、 LED素子 41G, 41B のアノードと選択スィッチ 42G, 42Bのドレインとが各バンプ 72によってそれぞれ電 気的に接続され、 LED素子 41G, 42Bの力ソードと接地線 43とが各バンプ 71によつ てそれぞれ電気的に接続されている。バンプ 71 , 72は、例えば、銅や金などで構成 される。 As shown in FIG. 11, the anode of the red LED element 41R and the drain of the red column selection switch 42R are electrically connected by a bump 72 provided between the electrodes 67 and 74. Further, the red LED element 41R is electrically connected by a bump 71 provided between the force sword of the red LED element 41R, the ground wire 43, the force electrode 66, and the ground wire 43. Similarly, the anodes of the LED elements 41G and 41B and the drains of the selection switches 42G and 42B are electrically connected by the respective bumps 72, and the force swords of the LED elements 41G and 42B and the ground wire 43 are connected to the respective bumps 71. Therefore, each is electrically connected. The bumps 71 and 72 are made of, for example, copper or gold.

[0070] 各色 LED素子 41Rでは、電極 66, 67間に電流が流されると、活性層 64から紫外 光が発する。赤色 LED素子 41Rでは、蛍光層 62Rが活性層 64からの紫外光により 励起されて赤色光を発し、この赤色光が基板 61を介して上方へ出射する。緑色 LE D素子 41Gでは、蛍光層 62Gが活性層 64からの紫外光により励起されて緑色光を 発し、この緑色光が基板 61を介して上方へ出射する。青色 LED素子 41Gでは、蛍 光層 62Bが活性層 64からの紫外光により励起されて青色光を発し、この青色光が基 板 61を介して上方へ出射する。  In each color LED element 41R, when a current flows between the electrodes 66 and 67, ultraviolet light is emitted from the active layer 64. In the red LED element 41R, the fluorescent layer 62R is excited by the ultraviolet light from the active layer 64 to emit red light, and this red light is emitted upward through the substrate 61. In the green LED element 41G, the fluorescent layer 62G is excited by the ultraviolet light from the active layer 64 to emit green light, and this green light is emitted upward through the substrate 61. In the blue LED element 41G, the fluorescent layer 62B is excited by the ultraviolet light from the active layer 64 to emit blue light, and this blue light is emitted upward through the substrate 61.

[0071] 本実施の形態では、図 11に示すように、基板 61における隣り合う LED素子間の位 置に溝 61aが形成されている。この溝 61aは、基板 61の表面に対してほぼ垂直に形 成されている。  In the present embodiment, as shown in FIG. 11, a groove 61a is formed at a position between adjacent LED elements on the substrate 61. The groove 61 a is formed substantially perpendicular to the surface of the substrate 61.

[0072] LED素子 41R, 41G, 41Bの蛍光層 62R, 62G, 63力、ら発した光は、上方のみな らず種々の方向へ進行しょうとする。したがって、溝 61aがないとすれば、各 LED素 子の蛍光層から発した光は隣接する LED素子の蛍光層から発した光と入り交じって クロストークが生ずる。これに対し、基板 61に溝 61aが形成されているので、溝 61aの 面で光が全反射するため、 1つの LED素子の蛍光層から発した光の放射される方向 力 る程度集約されて方向性が定まる。このため、隣接する蛍光層から発光した光と 交わるクロストークを抑制でき、コントラストの高い表示が可能となる。もっとも、本発明 では、必ずしも溝 61aを形成する必要はない。なお、溝 61a内は空のままでもよいが 、溝 61aを金属などの光反射材料を埋め込んだりあるいは溝 61aの面に蒸着等によ り形成しても、同様のクロストーク抑制効果を得ることができる。 [0072] The light emitted from the fluorescent layers 62R, 62G, and 63 forces of the LED elements 41R, 41G, and 41B tends to travel not only upward but also in various directions. Therefore, if there is no groove 61a, the light emitted from the fluorescent layer of each LED element is mixed with the light emitted from the fluorescent layer of the adjacent LED element, and crosstalk occurs. On the other hand, since the groove 61a is formed in the substrate 61, the light is totally reflected on the surface of the groove 61a, so that the direction in which the light emitted from the fluorescent layer of one LED element is radiated is concentrated. Directionality is determined. For this reason, crosstalk that intersects with light emitted from the adjacent fluorescent layer can be suppressed, and display with high contrast becomes possible. However, the present invention Then, it is not always necessary to form the groove 61a. The groove 61a may be left empty, but the same crosstalk suppressing effect can be obtained even if the groove 61a is embedded with a light reflecting material such as metal or formed on the surface of the groove 61a by vapor deposition. Can do.

[0073] 再び図 10を参照すると、本実施の形態による LED装置では、チップ 51が支持基 板 54上に搭載され、チップ 51の駆動回路基板 53の所定の電極と支持基板 54上の 電極 55との間がワイヤ 56によってワイヤボンドされ、ワイヤ 56の部分が樹脂 57により 封止されている。 Referring to FIG. 10 again, in the LED device according to the present embodiment, the chip 51 is mounted on the support board 54, and the predetermined electrode of the drive circuit board 53 of the chip 51 and the electrode 55 on the support board 54. The wire 56 is wire-bonded with a wire 56, and the wire 56 is sealed with a resin 57.

[0074] LED素子を有するチップは、図 10中の基板 61に相当する透明基板を含めて全体 を樹脂で封止するのが一般的である。一般的なチップでは、このようにしなければ、 耐久性が悪化したり、 LED発光層の屈折率が高いことに起因する光取り出し効率の 低下を招いたりするからである。  [0074] In general, a chip having an LED element, including a transparent substrate corresponding to the substrate 61 in FIG. This is because, in general chips, if this is not done, the durability will deteriorate and the light extraction efficiency will decrease due to the high refractive index of the LED light emitting layer.

[0075] しかし、本実施の形態による LED装置では、 LED基板 52と駆動回路基板 53とを バンプ 71 , 72によってハイブリッド化している。また、本実施の形態による LED装置 で (ま、図 こ示すよう ίこ、各: LED素子 41R, 41G, 41Βίこお!/ヽて、 光層 62R, 62 G, 62Βがそれぞれ LED構成層 70と基板 61との間に挟まれているので、蛍光層 62 R, 62G, 62Bは、特別な保護膜等によって覆わなくても、外界に露出しない。したが つて、本実施の形態によれば、特別な保護膜等で覆うことなく蛍光層 62R, 62G, 62 Bに対する外界の影響を低減することができ、ひいては耐久性を高めることができる。 また、基板 61の屈折率を空気の屈折率と LED発光層の屈折率のとの中間程度の屈 折率にすることにより、光取り出し効率の低下を抑制することが可能となる。したがつ て、本実施の形態では、チップ 51の全体を樹脂封止する必要はない。ただし、ワイヤ 56部分は機械的に弱いので、本実施の形態においては、ワイヤ 56の部分のみ樹脂 57にて封止しているのである。  However, in the LED device according to the present embodiment, the LED substrate 52 and the drive circuit substrate 53 are hybridized by the bumps 71 and 72. Also, in the LED device according to the present embodiment (as shown in the figure, each of the LED elements 41R, 41G, 41Βί !!), the light layers 62R, 62G, 62Β are respectively the LED constituent layers 70. The fluorescent layers 62 R, 62 G, 62 B are not exposed to the outside world even if they are not covered with a special protective film, etc. Therefore, according to the present embodiment, In addition, it is possible to reduce the influence of the outside world on the fluorescent layers 62R, 62G, 62B without covering with a special protective film, etc., and as a result, the durability can be improved. Therefore, it is possible to suppress a decrease in the light extraction efficiency by setting the refractive index to an intermediate value between the refractive index of the LED light emitting layer and the refractive index of the LED light emitting layer. However, since the wire 56 is mechanically weak, in this embodiment, Is What sealed with part only resin 57 of the ear 56.

[0076] もっとも、本発明では、例えば、チップ 51を図 14に示すようにパッケージ 81内に収 容してもよい。このパッケージ 81は、パッケージ本体 81aと表示窓を兼ねる封止蓋 81 bとから構成され、いわゆるボールグリッドパッケージとなっている。パッケージ本体 81 aの底面に設けられた各半田ボール 82は、図示しない経路で、駆動回路基板 53の 電極にワイヤ 83でボンディングされた各電極 84と電気的に接続されている。 [0077] 次に、本実施の形態による LED装置の製造方法の一例について、図 15、図 16、 図 17及び図 18を参照して説明する。図 15、図 16、図 17及び図 19は、この製造方 法の各工程をそれぞれ模式的に示す概略断面図である。図 18は、この製造方法の 所定の工程を模式的に示す概略斜視図である。 However, in the present invention, for example, the chip 51 may be accommodated in the package 81 as shown in FIG. The package 81 includes a package body 81a and a sealing lid 81b that also serves as a display window, and is a so-called ball grid package. Each solder ball 82 provided on the bottom surface of the package body 81a is electrically connected to each electrode 84 bonded to the electrode of the drive circuit board 53 with a wire 83 through a path (not shown). Next, an example of a method for manufacturing the LED device according to the present embodiment will be described with reference to FIGS. 15, 16, 17, and 18. FIG. FIG. 15, FIG. 16, FIG. 17 and FIG. 19 are schematic cross-sectional views schematically showing the respective steps of this manufacturing method. FIG. 18 is a schematic perspective view schematically showing a predetermined process of this manufacturing method.

[0078] まず、 LED構成層 70の n型不純物層 63等をェピタキシャル成長させる基礎となる 基板(第 1の基板) 91を用意する。基板 91としては、例えば、サファイア基板又は SiC 基板等が用いられる。次いで、基板 91上に、 LED構成層 70を一括して製造すべき 複数のチップ 51の LED素子 41R, 41G, 41Bの分だけ形成する。すなわち、基板 9 1上に、 n型不純物層 63、活性層 64及び p型不純物層 65を順次ェピタキシャル成長 により形成し、活性層 64及び p型不純物層 65の不要領域をエッチングにより除去す る。このとき、 n型不純物層 63は、基板 91上の全面に形成されたままとする。そして、 電極 66, 67を金などによって形成し、エッチングにより所定形状にパターユングする 。図 15 (a)は、この状態を示している。  First, a substrate (first substrate) 91 serving as a basis for epitaxial growth of the n-type impurity layer 63 and the like of the LED component layer 70 is prepared. As the substrate 91, for example, a sapphire substrate or a SiC substrate is used. Next, the LED component layer 70 is formed on the substrate 91 by the amount of the LED elements 41R, 41G, and 41B of the plurality of chips 51 to be manufactured at once. That is, an n-type impurity layer 63, an active layer 64, and a p-type impurity layer 65 are sequentially formed on the substrate 91 by epitaxial growth, and unnecessary regions of the active layer 64 and the p-type impurity layer 65 are removed by etching. . At this time, the n-type impurity layer 63 remains formed on the entire surface of the substrate 91. Then, the electrodes 66 and 67 are formed of gold or the like and patterned into a predetermined shape by etching. Figure 15 (a) shows this state.

[0079] 次に、 LED構成層 70を保持し且つ機械的ダメージ力も保護するための基板(第 3 の基板) 92を、基板 91とは反対側の LED構成層 70の表面に接合する。この接合は 、一時的なものであり、後に剥離する。ここでは、熱可塑性ワックス 93により、基板 12 を LED構成層 10に接合する。次いで、基板 92が接合された LED構成層 70から基 板 91を取り除く。図 15 (b)は、この状態を示している。  Next, a substrate (third substrate) 92 for holding the LED component layer 70 and protecting the mechanical damage force is bonded to the surface of the LED component layer 70 opposite to the substrate 91. This bonding is temporary and will be peeled off later. Here, the substrate 12 is bonded to the LED constituent layer 10 by the thermoplastic wax 93. Next, the substrate 91 is removed from the LED constituent layer 70 to which the substrate 92 is bonded. Figure 15 (b) shows this state.

[0080] 一方、所定の波長域 (本実施の形態では、可視領域)の光を透過するガラス基板等 の基板(第 2の基板) 61を用意し、基板 61上において、前述した蛍光層 62R, 62G, 62Bを、各色の LED素子 41R, 41G, 41Bに対応する位置にそれぞれ形成する。図 15 (c)は、この状態を示している。なお、蛍光層 62R, 62G, 62Bを最終的に一部の 領域のみに形成する手法自体は周知である。基板 61の表面にはパターユングされ た層などによる凹凸がなぐまた、基板 61としてェピタキシャル成長層形成などの高 温処理を伴う工程を経て!/、な!/、ものを用いることができるので、基板 61には高温処 理などによる湾曲などもない。したがって、蛍光層 62R, 62G, 62Bの厚さをより精度 良く均一にすることができる。蛍光層 62R, 62G, 62Bの厚さをより一層精度良く均一 にするために、必要に応じて、蛍光層 62R, 62G, 62Bを塗布する前に基板 61を研 磨して平坦化すること、及び/又は、蛍光層 62R, 62G, 62Bを形成した後に蛍光 層 62R, 62G, 62Bを研磨して平坦化することを行ってもよい。なお、蛍光層 62R, 6 2G, 62Bは、例えば、シルクスクリーン印刷により形成してもよい。 [0080] On the other hand, a substrate (second substrate) 61 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in the present embodiment) is prepared, and the fluorescent layer 62R described above is provided on the substrate 61. , 62G, 62B are formed at positions corresponding to the LED elements 41R, 41G, 41B of the respective colors. Figure 15 (c) shows this state. Note that the method of finally forming the fluorescent layers 62R, 62G, and 62B only in a partial region is well known. The surface of the substrate 61 has no irregularities due to a patterned layer, and the substrate 61 can be used after a process involving high temperature treatment such as formation of an epitaxial growth layer! / ,! The substrate 61 is not bent due to high temperature processing or the like. Therefore, the thickness of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy. In order to make the thickness of the fluorescent layers 62R, 62G, and 62B even more accurate, the substrate 61 is polished before applying the fluorescent layers 62R, 62G, and 62B, if necessary. Polishing and flattening may be performed, and / or the fluorescent layers 62R, 62G, and 62B may be polished and flattened after the fluorescent layers 62R, 62G, and 62B are formed. The fluorescent layers 62R, 62G, and 62B may be formed by silk screen printing, for example.

[0081] 次いで、図 15 (b)に示す状態の LED構成層 70の下面(基板 92とは反対側の面)と 、図 15 (c)に示す状態の蛍光層 62R, 62G, 62Bの上面(基板 61とは反対側の面) とを接合する。本実施の形態では、蛍光層 62R, 62G, 62Bがエポキシ樹脂又はシリ コーン樹脂などの接着性を有する樹脂を用いて構成されているので、蛍光層 62R, 6 2G, 62Bの接着性を利用して、 LED構成層 70と蛍光層 62R, 62G, 62Bとを接合 する。もっとも、蛍光層 62R, 62G, 62Bとは別に、透光性を有する接着剤を用いて L ED構成層 70と蛍光層 62R, 62G, 62Bとを接合してもよい。その後、熱可塑性ヮッ タス 93を除去することで、 LED構成層 70上から基板 92を剥離して取り除く。図 16 (a )は、この状態を示している。  Next, the lower surface (surface opposite to the substrate 92) of the LED constituent layer 70 in the state shown in FIG. 15 (b) and the upper surfaces of the fluorescent layers 62R, 62G, and 62B in the state shown in FIG. 15 (c). (The surface opposite to the substrate 61). In the present embodiment, since the fluorescent layers 62R, 62G, 62B are configured using an adhesive resin such as an epoxy resin or a silicone resin, the adhesive properties of the fluorescent layers 62R, 62G, 62B are utilized. Then, the LED component layer 70 and the fluorescent layers 62R, 62G, and 62B are joined. However, apart from the fluorescent layers 62R, 62G, and 62B, the LED constituting layer 70 and the fluorescent layers 62R, 62G, and 62B may be joined using a translucent adhesive. Thereafter, by removing the thermoplastic glass 93, the substrate 92 is peeled off from the LED constituent layer 70 and removed. Figure 16 (a) shows this state.

[0082] 次いで、ドライエッチング等により、隣り合う LED素子間の位置に溝 61aを形成する  Next, a groove 61a is formed at a position between adjacent LED elements by dry etching or the like.

(図 16 (b) )。  (Figure 16 (b)).

[0083] 一方、駆動回路基板 53を周知の半導体プロセス技術を用いて準備する(図 16 (c) )。ここでは、駆動回路基板 53は、例えば、一般的な CMOSプロセスによる CMOS 回路が配置されたものしている。そして、駆動回路基板 53には、図 17 (a)に示すよう に、 LED素子 41R, 41G, 41Bと電気的に接続するためのバンプ 71 , 72を形成して お <。  On the other hand, the drive circuit board 53 is prepared by using a well-known semiconductor process technique (FIG. 16C). Here, the drive circuit board 53 is provided with, for example, a CMOS circuit by a general CMOS process. As shown in FIG. 17 (a), bumps 71 and 72 for electrical connection with the LED elements 41R, 41G, and 41B are formed on the drive circuit board 53.

[0084] 次に、図 16 (a)に示す状態の基板と、バンプ 71 , 72が形成された駆動回路基板 5 3とを、図 17 (a)に示すように位置合わせする。図 18は、この位置合わせの様子を模 式的に示している。図 18において、 101は図 16 (a)に示す状態の基板を示し、 102 は図 17 (a)に示すバンプ 71 , 72が形成された駆動回路基板 53を示している。また、 図 18において、 101a, 102aは、各基板 101 , 102における 1チップ分の領域をそれ ぞれ模式的に示している。  Next, the substrate in the state shown in FIG. 16 (a) and the drive circuit substrate 53 on which the bumps 71 and 72 are formed are aligned as shown in FIG. 17 (a). Figure 18 schematically shows this alignment. In FIG. 18, 101 indicates the substrate in the state shown in FIG. 16 (a), and 102 indicates the drive circuit substrate 53 on which the bumps 71 and 72 shown in FIG. 17 (a) are formed. In FIG. 18, reference numerals 101a and 102a schematically show areas for one chip in the substrates 101 and 102, respectively.

[0085] このような位置合わせを行い、電極 66, 67とノ ンプ 71 , 72とをそれぞれ接合する。  Such alignment is performed, and the electrodes 66 and 67 and the amplifiers 71 and 72 are joined.

図 17 (b)は、この状態を示している。バンプによるこのような接合とこれによるハイブリ ッド化は、周知の技術である。 [0086] 次いで、図 17 (b)に示す状態のハイブリッド化された基板を、ダイシングにより各チ ップ 51に分害 IJさせる。図 19は、この状態を示している。以上によって、一括して複数 のチップ 51が完成する。 Fig. 17 (b) shows this state. Such bonding by bumps and hybridization by this are well-known techniques. Next, the hybridized substrate in the state shown in FIG. 17 (b) is caused to divert IJ to each chip 51 by dicing. FIG. 19 shows this state. Thus, a plurality of chips 51 are completed at once.

[0087] その後、ワイヤボンドや樹脂封止などの周知の工程を経て、図 10に示す本実施の 形態による LED装置 21が完成する。  Thereafter, the LED device 21 according to the present embodiment shown in FIG. 10 is completed through known processes such as wire bonding and resin sealing.

[0088] この製造方法により本実施の形態による LED装置 21を製造すれば、前述したよう に蛍光層 62R, 62G, 62Bの厚さをより精度良く均一にするすることができる。したが つて、製品間においても、同一製品の複数の LED素子間においても、発光色や発 光強度のばらつきをより一層低減することができ、ひいては歩留まりをより一層高める こと力 Sでさる。  If the LED device 21 according to the present embodiment is manufactured by this manufacturing method, the thicknesses of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy as described above. Therefore, it is possible to further reduce variations in emission color and emission intensity between products and between multiple LED elements of the same product, which in turn can be achieved with the power S to further increase the yield.

[0089] 以上、本発明の各実施の形態について説明した力 本発明はこれらの実施の形態 に限定されるものではない。  [0089] The power described for each embodiment of the present invention has been described above. The present invention is not limited to these embodiments.

[0090] 例えば、前記第 2の実施の形態による LED装置 21において、各単位画素を赤色 L ED素子 41、緑色 LED素子 41G及び青色 LED素子 41Bのいずれかのみで構成す れば、モノクロ表示を行う表示装置とすることができる。  [0090] For example, in the LED device 21 according to the second embodiment, if each unit pixel is configured by only one of the red LED element 41, the green LED element 41G, and the blue LED element 41B, monochrome display is performed. It can be a display device to perform.

[0091] また、例えば、前記第 2の実施の形態による LED装置 21において、駆動回路基板  [0091] Also, for example, in the LED device 21 according to the second embodiment, in the drive circuit board

53に搭載する駆動回路を、赤色光照明指令信号に応答して赤色 LED素子 41Rの みを点灯させ、緑色光照明指令信号に応答して緑色 LED素子 41Gのみを点灯させ 、青色光照明指令信号に応答して青色 LED素子 41Bのみを点灯させ、白色光照明 指令信号に応答して全ての LED素子 41R, 41G, 41Bのみを点灯させるように構成 すれば、赤色光、緑色光、青色光及び白色光による照明を選択的に切り替えて行う ことができる照明装置とすることができる。このような照明装置では、クロストークの問 題が生じないため、前記溝 6 laは不要である。  The drive circuit installed in 53 lights only the red LED element 41R in response to the red light illumination command signal, and turns on only the green LED element 41G in response to the green light illumination command signal. If only LED elements 41B are lit in response to the light and only LED elements 41R, 41G, 41B are lit in response to the white light illumination command signal, red light, green light, blue light and It is possible to provide an illumination device capable of selectively switching illumination with white light. In such an illuminating device, since the problem of crosstalk does not occur, the groove 6 la is unnecessary.

[0092] [第 2の実施の形態の変形例]  [Modification of Second Embodiment]

[0093] 次に、第 2の実施の形態による LED装置の製造方法の変形例を以下に説明する。  Next, a modification of the LED device manufacturing method according to the second embodiment will be described below.

[0094] 本変形例による LED装置の製造方法について、図 20及び図 21を参照して説明す る。図 20及び図 21は、本変形例による LED装置の製造方法の各工程をそれぞれ模 式的に示す概略断面図である。 [0095] まず、 LED構成層 70の n型不純物層 63等をェピタキシャル成長させる基礎となる 基板(第 1の基板) 91を用意する。基板 91としては、例えば、サファイア基板又は SiC 基板等が用いられる。次いで、基板 91上に、 LED構成層 70を、一括して製造すべき 複数の LEDチップ 1の分だけ形成する。すなわち、基板 91上に、 n型不純物層 63、 活性層 64及び p型不純物層 65を順次ェピタキシャル成長により形成し、活性層 64 及び p型不純物層 65の不要領域をエッチングにより除去する。このとき、 n型不純物 層 63は、基板 91上の全面に形成されたままとする。そして、電極 66, 67を金などに よって形成し、エッチングにより所定形状にパターユングする。図 20 (a)は、この状態 を示している。 A method for manufacturing the LED device according to the present modification will be described with reference to FIGS. 20 and 21 are schematic cross-sectional views schematically showing the respective steps of the LED device manufacturing method according to the present modification. First, a substrate (first substrate) 91 serving as a basis for epitaxial growth of the n-type impurity layer 63 and the like of the LED component layer 70 is prepared. As the substrate 91, for example, a sapphire substrate or a SiC substrate is used. Next, the LED component layer 70 is formed on the substrate 91 for the plurality of LED chips 1 to be manufactured at once. That is, the n-type impurity layer 63, the active layer 64, and the p-type impurity layer 65 are sequentially formed on the substrate 91 by epitaxial growth, and unnecessary regions of the active layer 64 and the p-type impurity layer 65 are removed by etching. At this time, the n-type impurity layer 63 remains formed on the entire surface of the substrate 91. Then, the electrodes 66 and 67 are formed of gold or the like and patterned into a predetermined shape by etching. Figure 20 (a) shows this state.

[0096] 一方、駆動回路基板 53を周知の半導体プロセス技術を用いて準備する。ここでは 、駆動回路基板 53は、例えば、一般的な CMOSプロセスによる CMOS回路が配置 されたものとしている。駆動回路基板 53にはシリコン基板が用いられており、シリコン 基板の一部を覆うように絶縁膜 75が設けられている。そして、この駆動回路基板 53 には、図 20 (b)に示すように、 LED素子 41R, 41G, 41Bと電気的に接続するため のバンプ 71 , 72を形成しておく。バンプ 71 , 72は、電極 43及び電極 74とそれぞれ 電気的に導通するように形成されている。バンプ 71 , 72及び電極 74, 43は、例えば 、銅や金などで構成される。図 20 (b)は、バンプ 71 , 72が形成された駆動回路基板 を示している。  On the other hand, the drive circuit board 53 is prepared using a known semiconductor process technology. Here, the drive circuit board 53 is assumed to be provided with a CMOS circuit by a general CMOS process, for example. A silicon substrate is used as the drive circuit substrate 53, and an insulating film 75 is provided so as to cover a part of the silicon substrate. Then, as shown in FIG. 20B, bumps 71 and 72 for electrical connection with the LED elements 41R, 41G, and 41B are formed on the drive circuit board 53. The bumps 71 and 72 are formed so as to be electrically connected to the electrode 43 and the electrode 74, respectively. The bumps 71 and 72 and the electrodes 74 and 43 are made of, for example, copper or gold. FIG. 20 (b) shows a drive circuit board on which bumps 71 and 72 are formed.

[0097] 次に、図 20 (a)に示す状態の基板と、バンプ 71 , 72が形成された駆動回路基板 5 3とを、図 20 (c)に示すように位置合わせする。図 18は、この位置合わせの様子を模 式的に示している。図 18において、 101は図 20 (a)に示す状態の基板を示し、 102 は図 20 (a)に示すバンプ 71 , 72が形成された駆動回路基板 53を示している。また、 図 18において、 101a, 102aは、各基板 101 , 102における 1チップ分の領域をそれ ぞれ模式的に示している。  Next, the substrate in the state shown in FIG. 20 (a) and the drive circuit substrate 53 on which the bumps 71 and 72 are formed are aligned as shown in FIG. 20 (c). Figure 18 schematically shows this alignment. In FIG. 18, 101 indicates the substrate in the state shown in FIG. 20 (a), and 102 indicates the drive circuit substrate 53 on which the bumps 71 and 72 shown in FIG. 20 (a) are formed. In FIG. 18, reference numerals 101a and 102a schematically show areas for one chip in the substrates 101 and 102, respectively.

[0098] このような位置合わせを行い、電極 66, 67とノ ンプ 71 , 72とをそれぞれ接合する。  Such alignment is performed, and the electrodes 66 and 67 and the amplifiers 71 and 72 are joined to each other.

これによつて、 LED構成層 70の電極 67と駆動回路基板 53の電極 74とがバンプ 72 を介して電気的に導通する。また、電極 66と駆動回路基板 53の電極 43とがバンプ 7 1を介して電気的に導通する。図 20 (c)は、この状態を示している。バンプによるこの ような接合とこれによるハイブリッド化は、周知の技術である。 As a result, the electrode 67 of the LED component layer 70 and the electrode 74 of the drive circuit board 53 are electrically connected via the bump 72. Further, the electrode 66 and the electrode 43 of the drive circuit board 53 are electrically connected via the bump 71. Figure 20 (c) shows this state. This by bump Such joining and thus hybridization are well-known techniques.

[0099] 次いで、駆動回路基板 53が接合された LED構成層 70から基板 91を取り除く。図 2 0 (d)は、この状態を示している。この基板 91の除去は、例えば、グラインダーで基板 91を削り取ったり、あるいは、 LED構成層 70と基板 91との境界付近をウォータージ エツト(高圧噴流水)又はワイヤーソ一で切断したりすることによって、行うこと力 Sできる [0099] Next, the substrate 91 is removed from the LED component layer 70 to which the drive circuit substrate 53 is bonded. FIG. 20 (d) shows this state. The substrate 91 can be removed by, for example, scraping the substrate 91 with a grinder, or cutting the vicinity of the boundary between the LED component layer 70 and the substrate 91 with a water jet (high pressure jet water) or a wire saw. Power to do S

[0100] 次いで、 n型不純物層 63にドライエッチング等を施して、図 21 (a)に示すように隣り 合う LED素子間の位置に溝 63aを形成する。 Next, the n-type impurity layer 63 is subjected to dry etching or the like to form a groove 63a at a position between adjacent LED elements as shown in FIG. 21 (a).

[0101] 一方、所定の波長域 (本変形例では、可視領域)の光を透過するガラス基板等の基 板(第 2の基板) 61を用意し、基板 61上において、前述した蛍光層 62R, 62G, 62B を、各色の LED素子 41R, 41G, 41Bに対応する位置にそれぞれ形成する。そして 、基板 61において、図 21 (a)に示す溝 63aに対応する位置にドライエッチング等を 施して、図 21 (b)に示すように溝 61bを形成する。なお、蛍光層 62R, 62G, 62Bを 最終的に一部の領域のみに形成する手法自体は周知である。なお、基板 61の表面 にはパターユングされた層などによる凹凸がなぐまた、基板 61としてェピタキシャノレ 成長層形成などの高温処理を伴う工程を経ていないものを用いることができるので、 基板 61には高温処理などによる湾曲などもない。したがって、蛍光層 62R, 62G, 6 2Bの厚さをより精度良く均一にすることができる。蛍光層 62R, 62G, 62Bの厚さをよ り一層精度良く均一にするために、必要に応じて、蛍光層 62R, 62G, 62Bを塗布す る前に基板 61を研磨して平坦化すること、及び/又は、蛍光層 62R, 62G, 62Bを 形成した後に蛍光層 62R, 62G, 62Bを研磨して平坦化することを行ってもよい。な お、蛍光層 62R, 62G, 62Bは、例えば、シルクスクリーン印刷により形成してもよい 。また、本変形例では、蛍光層 62R, 62G, 62Bを形成した後に、溝 61bを形成した 力 s、先に溝 61bを形成し、その後蛍光層 62R, 62G, 62Bを周知の方法で形成して あよい。 [0101] On the other hand, a substrate (second substrate) 61 such as a glass substrate that transmits light in a predetermined wavelength region (visible region in this modification) is prepared, and the fluorescent layer 62R described above is provided on the substrate 61. , 62G, 62B are formed at positions corresponding to the LED elements 41R, 41G, 41B of the respective colors. Then, dry etching or the like is performed on the substrate 61 at a position corresponding to the groove 63a shown in FIG. 21 (a) to form a groove 61b as shown in FIG. 21 (b). Note that the method of finally forming the fluorescent layers 62R, 62G, and 62B only in a partial region is well known. Note that the surface of the substrate 61 is not uneven due to a patterned layer or the like, and that the substrate 61 that has not undergone a process involving high-temperature processing such as formation of an epitaxy growth layer can be used. There is no bending due to processing. Therefore, the thickness of the fluorescent layers 62R, 62G, 62B can be made uniform with higher accuracy. In order to make the thickness of the fluorescent layers 62R, 62G, 62B more uniform, the substrate 61 is polished and flattened before applying the fluorescent layers 62R, 62G, 62B, if necessary. And / or after forming the fluorescent layers 62R, 62G, 62B, the fluorescent layers 62R, 62G, 62B may be polished and planarized. The fluorescent layers 62R, 62G, and 62B may be formed by silk screen printing, for example. In this modification, after forming the fluorescent layers 62R, 62G, and 62B, the force s that forms the groove 61b is formed first, and then the groove 61b is formed, and then the fluorescent layers 62R, 62G, and 62B are formed by a well-known method. It ’s good.

[0102] 次に、図 21 (b)に示す基板 61と、図 21 (a)に示す LED構成層 70及び電極 66を備 える基板 91とを位置合わせして、蛍光層 62R, 62G, 62Bと n型不純物層 63とがそ れぞれ接触するように接合する。図 21 (c)はこの状態を示している。 [0103] その後、第 2の実施の形態と同様にして、図 21 (c)に示す状態のハイブリッド化され た基板を、ダイシングにより各チップに分割させる。これによつて、図 19に示すような 複数のチップ 51が完成する。 Next, the substrate 61 shown in FIG. 21 (b) and the substrate 91 including the LED constituent layer 70 and the electrode 66 shown in FIG. 21 (a) are aligned, and the fluorescent layers 62R, 62G, 62B are aligned. And n-type impurity layer 63 are bonded so as to be in contact with each other. Figure 21 (c) shows this state. [0103] After that, as in the second embodiment, the hybridized substrate in the state shown in Fig. 21 (c) is divided into chips by dicing. As a result, a plurality of chips 51 as shown in FIG. 19 are completed.

[0104] その後、第 2の実施の形態と同様に、ワイヤボンドや樹脂封止などの周知の工程を 経て、図 10に示すような LED装置 21が完成する。  Thereafter, similarly to the second embodiment, the LED device 21 as shown in FIG. 10 is completed through known steps such as wire bonding and resin sealing.

[0105] この製造方法により LED装置 21を製造すれば、前述したように蛍光層 62R, 62G , 62Bの厚さをより精度良く均一にするすることができる。したがって、製品間におい ても、同一製品の複数の LED素子間においても、発光色や発光強度のばらつきをよ り一層低減することができ、ひいては歩留まりをより一層高めることができる。また、本 変形例では、第 2の実施の形態における第 3の基板として、駆動回路が形成されてい る駆動回路基板 53を用いているため、基板除去'接合工程を 1ステップ省略すること ができる。  [0105] If the LED device 21 is manufactured by this manufacturing method, the thicknesses of the fluorescent layers 62R, 62G, and 62B can be made uniform with higher accuracy as described above. Therefore, variation in emission color and emission intensity can be further reduced between products and between a plurality of LED elements of the same product, and the yield can be further increased. Further, in this modification, since the drive circuit substrate 53 on which the drive circuit is formed is used as the third substrate in the second embodiment, one step of the substrate removal and bonding process can be omitted. .

[0106] なお、本変形例では、第 3の基板として駆動回路が搭載された駆動回路基板 53を 用いたが、駆動回路基板 53に代えて、当初は駆動回路が搭載されていない配線板 を LED構成層 70と接合し、その後、当該配線板上に公知の方法によって駆動回路 を形成してもよい。また、当該配線板上に駆動回路が搭載された別の配線板を電気 的に接続するように接合してもよい。また、駆動回路基板 53に代えて、当初は基板( 例えばシリコン基板)を LED構成層 70と接合し、該基板にホール形成やスルーホー ルめっきなどの周知の手法によって電極 66及び 67と電気的に導通する配線等を形 成した後、当該配線と駆動回路とを電気的に接続して LED装置を製造してもよい。 産業上の利用可能性  In this modification, the drive circuit board 53 on which the drive circuit is mounted is used as the third board. However, instead of the drive circuit board 53, a wiring board that is not initially mounted with the drive circuit is used. After joining to the LED component layer 70, a drive circuit may be formed on the wiring board by a known method. Further, another wiring board on which a drive circuit is mounted may be joined on the wiring board so as to be electrically connected. In place of the drive circuit board 53, a board (for example, a silicon board) is initially bonded to the LED constituent layer 70, and the electrodes 66 and 67 are electrically connected to the board by a well-known method such as hole formation or through-hole plating. After forming a conductive wiring or the like, the LED device may be manufactured by electrically connecting the wiring and the drive circuit. Industrial applicability

[0107] 以上詳細に説明したように、本発明により、特別な保護膜等で覆うことなく蛍光層に 対する外界の影響を低減することができ、ひいては耐久性を高めることができる LED 装置及びその製造方法を提供することができる。また、本発明により、蛍光層の厚さ をより精度良く均一にすることができ、これにより歩留りをより高めることができる。 As described in detail above, according to the present invention, the influence of the outside world on the fluorescent layer can be reduced without being covered with a special protective film or the like, and as a result, the durability of the LED device can be improved. A manufacturing method can be provided. Further, according to the present invention, the thickness of the fluorescent layer can be made uniform with higher accuracy, and thereby the yield can be further increased.

Claims

請求の範囲 The scope of the claims [1] 第 1の基板上に、発光層を含み LED素子を構成する LED構成層を形成する段階 と、  [1] forming an LED component layer that includes a light emitting layer and constitutes an LED element on a first substrate; 所定の波長域の光を透過する第 2の基板上に、前記発光層からの光により励起さ れて異なる波長の光を発する蛍光物質を含む蛍光層を形成する段階と、  Forming a fluorescent layer containing a fluorescent substance that emits light of a different wavelength when excited by light from the light emitting layer on a second substrate that transmits light of a predetermined wavelength range; 前記第 1の基板の前記 LED構成層上に、第 3の基板を接合する段階と、 前記第 3の基板が接合された前記 LED構成層から前記第 1の基板を取り除く段階 と、  Bonding a third substrate on the LED component layer of the first substrate; removing the first substrate from the LED component layer to which the third substrate is bonded; 前記第 3の基板が接合され前記第 1の基板が取り除かれた前記 LED構成層に、前 記 LED構成層と前記蛍光層とが接するように、前記蛍光層を備える前記第 2の基板 を接合する段階と、  The second substrate including the fluorescent layer is bonded so that the LED component layer and the fluorescent layer are in contact with the LED component layer from which the third substrate is bonded and the first substrate is removed. And the stage of を備えたことを特徴とする LED装置の製造方法。  A method for manufacturing an LED device, comprising: [2] 第 1の基板上に、発光層を含み LED素子を構成する LED構成層を形成する段階 と、 [2] forming an LED component layer that includes the light emitting layer and constitutes the LED element on the first substrate; 所定の波長域の光を透過する第 2の基板上に、前記発光層からの光により励起さ れて異なる波長の光を発する蛍光物質を含む蛍光層を形成する段階と、  Forming a fluorescent layer containing a fluorescent substance that emits light of a different wavelength when excited by light from the light emitting layer on a second substrate that transmits light of a predetermined wavelength range; 前記第 1の基板上に形成された前記 LED構成層に、第 3の基板を接合する段階と 前記第 3の基板が接合された前記 LED構成層から前記第 1の基板を取り除く段階 と、  Bonding a third substrate to the LED component layer formed on the first substrate; removing the first substrate from the LED component layer to which the third substrate is bonded; 前記第 3の基板が接合され前記第 1の基板が取り除かれた前記 LED構成層と、前 記第 2の基板上に形成された前記蛍光層とを接合する段階と、  Bonding the LED component layer from which the third substrate is bonded and the first substrate is removed, and the fluorescent layer formed on the second substrate; 前記第 2の基板、前記第 2の基板上に形成された前記蛍光層及び前記 LED構成 層を有する接合体を、 1つ以上の前記 LED素子を含む部分に分割する段階と、 を備えたことを特徴とする LED装置の製造方法。  Dividing the joined body having the second substrate, the fluorescent layer formed on the second substrate, and the LED constituent layer into a portion including one or more LED elements; and A method for manufacturing an LED device. [3] 前記 LED構成層と前記蛍光層とを接合する前記段階の後に、前記 LED構成層か ら前記第 3の基板を取り除く段階をさらに備えたことを特徴とする請求項 1又は 2に記 載の LED装置の製造方法。 [3] The method according to claim 1 or 2, further comprising a step of removing the third substrate from the LED constituent layer after the step of joining the LED constituent layer and the fluorescent layer. The manufacturing method of the LED device. [4] 前記 LED素子を駆動する駆動回路が搭載された回路基板を用意する段階と、 前記 LED構成層と前記蛍光層とを接合する前記段階の後に、前記 LED構成層又 は前記第 3の基板と前記回路基板とを接合する段階と、 [4] After the step of preparing a circuit board on which a driving circuit for driving the LED element is mounted, and the step of bonding the LED component layer and the fluorescent layer, the LED component layer or the third component Bonding the substrate and the circuit board; をさらに備えたことを特徴とする請求項 1〜3のいずれか一項に記載の LED装置の 製造方法。  The method for manufacturing an LED device according to any one of claims 1 to 3, further comprising: [5] 前記第 3の基板は回路基板であることを特徴とする請求項;!〜 4のいずれか一項に 記載の LED装置の製造方法。  [5] The method for manufacturing an LED device according to any one of [1] to [4], wherein the third substrate is a circuit board. [6] 前記第 3の基板である前記回路基板は、前記 LED素子を駆動する駆動回路が搭 載された回路基板であることを特徴とする請求項 5記載の LED装置の製造方法。 6. The method for manufacturing an LED device according to claim 5, wherein the circuit board which is the third board is a circuit board on which a drive circuit for driving the LED element is mounted. [7] 前記 LED構成層を形成する前記段階は、前記 LED構成層の少なくとも 1つの層を ェピタキシャル成長により形成する段階を含むことを特徴とする請求項 1〜6のいず れか一項に記載の LED装置の製造方法。 [7] The step of forming the LED constituent layer includes the step of forming at least one layer of the LED constituent layer by epitaxial growth. A method for manufacturing the LED device according to 1. [8] 前記 LED装置は前記 LED素子を複数含み、前記 LED装置は映像信号又はその 他の表示制御信号に基づいてカラー表示又はモノクロ表示を行う表示装置であるこ とを特徴とする請求項 1〜7のいずれか一項に記載の LED装置の製造方法。 [8] The LED device includes a plurality of the LED elements, and the LED device is a display device that performs color display or monochrome display based on a video signal or another display control signal. The manufacturing method of the LED device as described in any one of 7. [9] 発光層を含み LED素子を構成する LED構成層と、 [9] An LED component layer that includes a light emitting layer and constitutes an LED element; 所定の波長域の光を透過する基板と、  A substrate that transmits light in a predetermined wavelength range; 前記 LED構成層と前記基板との間に配置された蛍光層であって、前記発光層から の光により励起されて異なる波長の光を発する蛍光物質を含む蛍光層と、  A fluorescent layer disposed between the LED component layer and the substrate, the fluorescent layer including a fluorescent substance that emits light of different wavelengths when excited by light from the light emitting layer; を備えたことを特徴とする LED装置。  LED device characterized by comprising [10] 前記 LED素子の数が 2つ以上であり、 [10] The number of the LED elements is two or more, 前記 2つ以上の LED素子のうちの少なくとも 1つの LED素子の外部への発光色が 、前記 2つ以上の LED素子のうちの他の少なくとも 1つの LED素子の外部への発光 色と異なることを特徴とする請求項 9記載の LED装置。  The emission color of at least one LED element out of the two or more LED elements is different from the emission color of at least one other LED element of the two or more LED elements. The LED device according to claim 9, wherein: [11] 前記 LED素子の数が 2つ以上であり、当該 LED装置は、映像信号又はその他の 表示制御信号に基づいてカラー表示又はモノクロ表示を行う表示装置を構成するこ とを特徴とする請求項 9記載の LED装置。 [11] The number of the LED elements is two or more, and the LED device constitutes a display device that performs color display or monochrome display based on a video signal or other display control signal. Item 9. LED device. [12] 前記 LED素子を駆動する駆動回路が搭載され前記 LED素子と電気的に接続され た回路基板を、備えたことを特徴とする請求項 9〜; 11のいずれか一項に記載の LED [12] A drive circuit for driving the LED element is mounted and electrically connected to the LED element. 12. The LED according to claim 9, further comprising a circuit board.
PCT/JP2007/072446 2006-11-20 2007-11-20 Led device and method for manufacturing the same Ceased WO2008062783A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008545405A JP5309996B2 (en) 2006-11-20 2007-11-20 Manufacturing method of LED device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006312541 2006-11-20
JP2006-312541 2006-11-20

Publications (1)

Publication Number Publication Date
WO2008062783A1 true WO2008062783A1 (en) 2008-05-29

Family

ID=39429713

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072446 Ceased WO2008062783A1 (en) 2006-11-20 2007-11-20 Led device and method for manufacturing the same

Country Status (3)

Country Link
JP (1) JP5309996B2 (en)
TW (1) TWI420691B (en)
WO (1) WO2008062783A1 (en)

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010135693A (en) * 2008-12-08 2010-06-17 Toshiba Corp Optical semiconductor device and method of manufacturing optical semiconductor device
US20110012142A1 (en) * 2009-07-20 2011-01-20 Berthold Hahn Method for Producing a Luminous Device and Luminous Device
WO2011009821A1 (en) * 2009-07-20 2011-01-27 Osram Opto Semiconductors Gmbh Method for manufacturing a light source and light source
JP2011258675A (en) * 2010-06-07 2011-12-22 Toshiba Corp Optical semiconductor device
US8110421B2 (en) 2008-12-12 2012-02-07 Kabushiki Kaisha Toshiba Light emitting device and method for manufacturing same
JP2012191225A (en) * 2012-05-23 2012-10-04 Mitsubishi Electric Corp Light-emitting device
CN103050601A (en) * 2009-03-11 2013-04-17 晶元光电股份有限公司 light emitting device
JP2013526052A (en) * 2010-04-30 2013-06-20 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ LED wafer with stacked phosphor layers
CN103544895A (en) * 2013-11-01 2014-01-29 广东威创视讯科技股份有限公司 Light-emitting diode (LED) display module and manufacturing method thereof
WO2014042438A1 (en) * 2012-09-13 2014-03-20 Seoul Viosys Co., Ltd. Method of fabricating gallium nitride based semiconductor device
JP2015524623A (en) * 2012-08-07 2015-08-24 コーニンクレッカ フィリップス エヌ ヴェ LED package and manufacturing method thereof
JP2017139481A (en) * 2011-08-30 2017-08-10 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. Method for bonding a substrate to a semiconductor light emitting device
WO2017180393A3 (en) * 2016-04-12 2018-01-11 Cree, Inc. High density pixelated multi-led chip, devices incorporating it, and methods for fabricating the same
JP2019036719A (en) * 2017-08-18 2019-03-07 インテル コーポレイション Micro light emitting diode (LED) element and display
JP2019174807A (en) * 2018-03-29 2019-10-10 群創光電股▲ふん▼有限公司Innolux Corporation Electronic device
US10529773B2 (en) 2018-02-14 2020-01-07 Cree, Inc. Solid state lighting devices with opposing emission directions
JP2020018939A (en) * 2019-11-12 2020-02-06 王子ホールディングス株式会社 Apparatus for producing absorbent article and method for producing absorbent article
US10586787B2 (en) 2007-01-22 2020-03-10 Cree, Inc. Illumination devices using externally interconnected arrays of light emitting devices, and methods of fabricating same
JP2020057015A (en) * 2015-09-11 2020-04-09 シャープ株式会社 Image display device and method of manufacturing image display device
US10651357B2 (en) 2017-08-03 2020-05-12 Cree, Inc. High density pixelated-led chips and chip array devices
US10734363B2 (en) 2017-08-03 2020-08-04 Cree, Inc. High density pixelated-LED chips and chip array devices
US10903265B2 (en) 2018-12-21 2021-01-26 Cree, Inc. Pixelated-LED chips and chip array devices, and fabrication methods
EP3780123A1 (en) * 2019-08-16 2021-02-17 Commissariat à l'Energie Atomique et aux Energies Alternatives Method for manufacturing optoelectronic devices
JP2021509223A (en) * 2017-12-22 2021-03-18 コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ How to Transfer Electroluminescent Structure
JP2021168360A (en) * 2020-04-13 2021-10-21 日亜化学工業株式会社 Method for manufacturing light emitting device
US11160148B2 (en) 2017-06-13 2021-10-26 Ideal Industries Lighting Llc Adaptive area lamp
US11437548B2 (en) 2020-10-23 2022-09-06 Creeled, Inc. Pixelated-LED chips with inter-pixel underfill materials, and fabrication methods
US11792898B2 (en) 2012-07-01 2023-10-17 Ideal Industries Lighting Llc Enhanced fixtures for area lighting
WO2023213450A1 (en) * 2022-05-03 2023-11-09 Ams-Osram International Gmbh Method for manufacturing a plurality of semiconductor chips and semiconductor chip
US11817526B2 (en) 2019-10-29 2023-11-14 Creeled, Inc. Texturing for high density pixelated-LED chips and chip array devices
CN120239374A (en) * 2024-03-19 2025-07-01 原子能与替代能源委员会 Method for manufacturing an optoelectronic device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1117223A (en) * 1997-06-25 1999-01-22 Toshiba Corp Gallium nitride based semiconductor light emitting device and light emitting device
JP2002185039A (en) * 2000-12-14 2002-06-28 Sony Corp Element transfer method, element holding substrate forming method, and element holding substrate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3840424B2 (en) * 2002-03-28 2006-11-01 富士写真フイルム株式会社 Stimulable phosphor, radiation imaging method and radiation imaging material
KR100495215B1 (en) * 2002-12-27 2005-06-14 삼성전기주식회사 VERTICAL GaN LIGHT EMITTING DIODE AND METHOD OF PRODUCING THE SAME
JP2005063781A (en) * 2003-08-11 2005-03-10 Fuji Xerox Co Ltd Display device and manufacturing method thereof
JP2007335412A (en) * 2007-08-03 2007-12-27 Idemitsu Kosan Co Ltd Multicolor light emitting device and manufacturing method thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1117223A (en) * 1997-06-25 1999-01-22 Toshiba Corp Gallium nitride based semiconductor light emitting device and light emitting device
JP2002185039A (en) * 2000-12-14 2002-06-28 Sony Corp Element transfer method, element holding substrate forming method, and element holding substrate

Cited By (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12341137B2 (en) 2007-01-22 2025-06-24 Creeled, Inc. Illumination devices using externally interconnected arrays of light emitting devices, and methods of fabricating same
US10586787B2 (en) 2007-01-22 2020-03-10 Cree, Inc. Illumination devices using externally interconnected arrays of light emitting devices, and methods of fabricating same
JP2010135693A (en) * 2008-12-08 2010-06-17 Toshiba Corp Optical semiconductor device and method of manufacturing optical semiconductor device
US8581291B2 (en) 2008-12-08 2013-11-12 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing the same
US9431588B2 (en) 2008-12-08 2016-08-30 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing the same
US8906716B2 (en) 2008-12-08 2014-12-09 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing the same
US8110421B2 (en) 2008-12-12 2012-02-07 Kabushiki Kaisha Toshiba Light emitting device and method for manufacturing same
US9478722B2 (en) 2008-12-12 2016-10-25 Kabushiki Kaisha Toshiba Light emitting device and method for manufacturing same
US9184357B2 (en) 2008-12-12 2015-11-10 Kabushiki Kaisha Toshiba Light emitting device and method for manufacturing same
CN103050601A (en) * 2009-03-11 2013-04-17 晶元光电股份有限公司 light emitting device
WO2011009821A1 (en) * 2009-07-20 2011-01-27 Osram Opto Semiconductors Gmbh Method for manufacturing a light source and light source
US20110012142A1 (en) * 2009-07-20 2011-01-20 Berthold Hahn Method for Producing a Luminous Device and Luminous Device
DE102009033915B4 (en) 2009-07-20 2022-05-25 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Method of manufacturing a lighting device and lighting device
US8273588B2 (en) 2009-07-20 2012-09-25 Osram Opto Semiconductros Gmbh Method for producing a luminous device and luminous device
JP2012533895A (en) * 2009-07-20 2012-12-27 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング Light source manufacturing method and light source
JP2013526052A (en) * 2010-04-30 2013-06-20 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ LED wafer with stacked phosphor layers
US8754429B2 (en) 2010-06-07 2014-06-17 Kabushiki Kaisha Toshiba Optical semiconductor device and method for manufacturing same
US8981412B2 (en) 2010-06-07 2015-03-17 Kabushiki Kaisha Toshiba Optical semiconductor device and method for manufacturing same
KR101191488B1 (en) 2010-06-07 2012-10-15 가부시끼가이샤 도시바 Optical semiconductor device and method for manufacturing same
JP2011258675A (en) * 2010-06-07 2011-12-22 Toshiba Corp Optical semiconductor device
US10158049B2 (en) 2011-08-30 2018-12-18 Lumileds Llc Method of bonding a substrate to a semiconductor light emitting device
JP2017139481A (en) * 2011-08-30 2017-08-10 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. Method for bonding a substrate to a semiconductor light emitting device
CN107086198A (en) * 2011-08-30 2017-08-22 皇家飞利浦有限公司 Substrate is engaged into the method to light emitting semiconductor device
KR101934138B1 (en) 2011-08-30 2018-12-31 루미리즈 홀딩 비.브이. Method of bonding a substrate to a semiconductor light emitting device
JP2012191225A (en) * 2012-05-23 2012-10-04 Mitsubishi Electric Corp Light-emitting device
US11792898B2 (en) 2012-07-01 2023-10-17 Ideal Industries Lighting Llc Enhanced fixtures for area lighting
JP2015524623A (en) * 2012-08-07 2015-08-24 コーニンクレッカ フィリップス エヌ ヴェ LED package and manufacturing method thereof
KR101923673B1 (en) 2012-09-13 2018-11-29 서울바이오시스 주식회사 Method of fabricating gallium nitrded based semiconductor device
WO2014042438A1 (en) * 2012-09-13 2014-03-20 Seoul Viosys Co., Ltd. Method of fabricating gallium nitride based semiconductor device
US9159870B2 (en) 2012-09-13 2015-10-13 Seoul Viosys Co., Ltd. Method of fabricating gallium nitride based semiconductor device
CN103544895A (en) * 2013-11-01 2014-01-29 广东威创视讯科技股份有限公司 Light-emitting diode (LED) display module and manufacturing method thereof
JP2020057015A (en) * 2015-09-11 2020-04-09 シャープ株式会社 Image display device and method of manufacturing image display device
US10312224B2 (en) 2016-04-12 2019-06-04 Cree, Inc. High density pixelated LED and devices and methods thereof
CN109643724B (en) * 2016-04-12 2023-11-03 科锐Led公司 High-density pixelated LEDs and devices and methods thereof
US10529696B2 (en) 2016-04-12 2020-01-07 Cree, Inc. High density pixelated LED and devices and methods thereof
US10910352B2 (en) 2016-04-12 2021-02-02 Cree, Inc. High density pixelated LED and devices and methods thereof
WO2017180393A3 (en) * 2016-04-12 2018-01-11 Cree, Inc. High density pixelated multi-led chip, devices incorporating it, and methods for fabricating the same
US11387221B2 (en) 2016-04-12 2022-07-12 Creeled, Inc. High density pixelated LED and devices and methods thereof
CN109643724A (en) * 2016-04-12 2019-04-16 克利公司 High density pixelated LED and device and method therefor
US11776938B2 (en) 2016-04-12 2023-10-03 Creeled, Inc. High density pixelated LED and devices and methods thereof
US11160148B2 (en) 2017-06-13 2021-10-26 Ideal Industries Lighting Llc Adaptive area lamp
US10651357B2 (en) 2017-08-03 2020-05-12 Cree, Inc. High density pixelated-led chips and chip array devices
US11417635B2 (en) 2017-08-03 2022-08-16 Creeled, Inc. High density pixelated-LED chips and chip array devices
US10734363B2 (en) 2017-08-03 2020-08-04 Cree, Inc. High density pixelated-LED chips and chip array devices
JP2019036719A (en) * 2017-08-18 2019-03-07 インテル コーポレイション Micro light emitting diode (LED) element and display
JP7241757B2 (en) 2017-12-22 2023-03-17 コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ Method for transferring electroluminescent structures
JP2021509223A (en) * 2017-12-22 2021-03-18 コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ How to Transfer Electroluminescent Structure
US10529773B2 (en) 2018-02-14 2020-01-07 Cree, Inc. Solid state lighting devices with opposing emission directions
JP2019174807A (en) * 2018-03-29 2019-10-10 群創光電股▲ふん▼有限公司Innolux Corporation Electronic device
JP7394533B2 (en) 2018-03-29 2023-12-08 群創光電股▲ふん▼有限公司 electronic equipment
US11664407B2 (en) 2018-12-21 2023-05-30 Creeled, Inc. Pixelated-LED chips and chip array devices, and fabrication methods
US10903265B2 (en) 2018-12-21 2021-01-26 Cree, Inc. Pixelated-LED chips and chip array devices, and fabrication methods
US10903268B2 (en) 2018-12-21 2021-01-26 Cree, Inc. Pixelated-LED chips and chip array devices, and fabrication methods
FR3099966A1 (en) * 2019-08-16 2021-02-19 Commissariat A L'energie Atomique Et Aux Energies Alternatives Manufacturing process of optoelectronic devices
EP3780123A1 (en) * 2019-08-16 2021-02-17 Commissariat à l'Energie Atomique et aux Energies Alternatives Method for manufacturing optoelectronic devices
CN112397449A (en) * 2019-08-16 2021-02-23 原子能与替代能源委员会 Method for producing an optoelectronic component
US11329188B2 (en) 2019-08-16 2022-05-10 Commissariat à l'énergie atomique et aux énergies alternatives Optoelectronic device manufacturing method
US11817526B2 (en) 2019-10-29 2023-11-14 Creeled, Inc. Texturing for high density pixelated-LED chips and chip array devices
JP7010276B2 (en) 2019-11-12 2022-02-10 王子ホールディングス株式会社 Absorbent article manufacturing equipment
JP2020018939A (en) * 2019-11-12 2020-02-06 王子ホールディングス株式会社 Apparatus for producing absorbent article and method for producing absorbent article
JP2021168360A (en) * 2020-04-13 2021-10-21 日亜化学工業株式会社 Method for manufacturing light emitting device
JP7478947B2 (en) 2020-04-13 2024-05-08 日亜化学工業株式会社 Method for manufacturing a light emitting device
US11437548B2 (en) 2020-10-23 2022-09-06 Creeled, Inc. Pixelated-LED chips with inter-pixel underfill materials, and fabrication methods
WO2023213450A1 (en) * 2022-05-03 2023-11-09 Ams-Osram International Gmbh Method for manufacturing a plurality of semiconductor chips and semiconductor chip
CN120239374A (en) * 2024-03-19 2025-07-01 原子能与替代能源委员会 Method for manufacturing an optoelectronic device

Also Published As

Publication number Publication date
JPWO2008062783A1 (en) 2010-03-04
TW200836375A (en) 2008-09-01
TWI420691B (en) 2013-12-21
JP5309996B2 (en) 2013-10-09

Similar Documents

Publication Publication Date Title
JP5309996B2 (en) Manufacturing method of LED device
JP2008262993A (en) Display device
CN109390437B (en) Miniature light-emitting diode device and method of making the same
US6914262B2 (en) White light emitting diode and method for manufacturing the same
US8450770B2 (en) Light emitting package structure
KR102916587B1 (en) Light-emitting element for display and display device having the same
TWI476946B (en) Light-emitting diode device and method for fabricating the same
US20100012957A1 (en) Light-emitting diode device and method for fabricating the same
KR20190006176A (en) High-density pixel type multi-LED, device including the same, and manufacturing method thereof
WO2020226044A1 (en) Method for manufacturing image display device and image display device
JP2004356116A (en) Light emitting diode
US20220415862A1 (en) Full-color display chip and manufacturing process for semiconductor chip
US20150349219A1 (en) Light emitting device module
CN215118931U (en) Light emitting element for display and display device having the same
US20250063868A1 (en) Micro-led display and method for manufacturing same
WO2021020393A1 (en) Method for manufacturing image display device and image display device
JP2023515983A (en) Multi-wavelength light emitting device and method of manufacturing same
CN107230685A (en) The semiconductor light emitting micro-display and its manufacturing process of a kind of true color
JP4967548B2 (en) Light emitting device
WO2021014972A1 (en) Image display device manufacturing method and image display device
CN109390368B (en) Microdisplay device, method for producing the same, and display panel
KR102906031B1 (en) Display panel having a light-emitting element for display
US12191285B2 (en) Optical projection device having a grid structure
CN119546027A (en) A micro display module and a method for preparing the same
EP4432353A1 (en) Led display pixel element and display device comprising same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07832176

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2008545405

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07832176

Country of ref document: EP

Kind code of ref document: A1