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WO2008041781A1 - Method for removal of chlorine gas - Google Patents

Method for removal of chlorine gas Download PDF

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Publication number
WO2008041781A1
WO2008041781A1 PCT/JP2007/069789 JP2007069789W WO2008041781A1 WO 2008041781 A1 WO2008041781 A1 WO 2008041781A1 JP 2007069789 W JP2007069789 W JP 2007069789W WO 2008041781 A1 WO2008041781 A1 WO 2008041781A1
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WIPO (PCT)
Prior art keywords
chlorine gas
gas
aqueous solution
chlorine
sodium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
PCT/JP2007/069789
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French (fr)
Japanese (ja)
Inventor
Yasuhiko Mori
Norihito Omoto
Tadashi Abe
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Publication of WO2008041781A1 publication Critical patent/WO2008041781A1/en
Anticipated expiration legal-status Critical
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/68Halogens or halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/30Alkali metal compounds
    • B01D2251/304Alkali metal compounds of sodium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/60Inorganic bases or salts
    • B01D2251/604Hydroxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/202Single element halogens
    • B01D2257/2025Chlorine

Definitions

  • the present invention relates to a chlorine gas detoxification method, and more particularly, to a chlorine gas detoxification method using an alkaline solution, and to a chlorine gas detoxification method in which chlorate is not generated.
  • exhaust gas containing chlorine gas is treated by neutralizing it with an alkaline solution such as an aqueous sodium hydroxide solution.
  • an alkaline solution such as an aqueous sodium hydroxide solution.
  • sodium hypochlorite is produced, and sodium chlorate is also produced.
  • chlorates such as sodium chlorate (hereinafter referred to as chlorate) in Japan, there are known adverse effects on aquatic plants. It is desirable to discharge Japanese wastewater.
  • a method of decomposing sodium hypochlorite in the neutralized wastewater generated by neutralizing the exhaust gas containing chlorine gas with an aqueous sodium hydroxide solution for example, using a catalyst
  • a method by thermal decomposition a method of degrading by lowering pH
  • a method of reducing using sulfite a method of reducing using sulfite
  • Patent Document 1 chlorine gas is selectively used from an exhaust gas containing chlorine gas and carbon dioxide gas using an aqueous sodium hydroxide solution. Describes the method of detoxifying chlorine to be absorbed and removed.
  • the generated hypochlorite aqueous solution can be decomposed by thermal decomposition and, if necessary, sulfite to decompose hypochlorite. It is disclosed.
  • the present invention has been made to solve the above-described conventional problems, and an object thereof is to provide a method for detoxifying exhaust gas containing chlorine gas using an alkaline solution without generating chlorate. It is.
  • the chlorine gas detoxification method of the present invention is a method for detoxifying chlorine gas contained in exhaust gas, which is 1.0 to the theoretical amount necessary for neutralizing the chlorine gas to the chlorine gas.
  • the chlorine By reacting with sodium hydroxide twice and 1.0 to 1.2 times the theoretical amount of sulfite and / or bisulfite necessary for reducing the chlorine gas, the chlorine
  • the method includes a step of removing gas.
  • the chlorine gas detoxification method of the present invention includes the step (A) of supplying the following aqueous solution (al) and the following aqueous solution (a 2) while supplying the exhaust gas to the first absorption tower. It is characterized by.
  • Aqueous solution (a l) An aqueous solution of sodium hydroxide 1.0 to 1.2 times the theoretical amount necessary to neutralize the chlorine gas.
  • Aqueous solution (a 2) An aqueous solution of sulfite and Z or bisulfite that is 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas.
  • the second absorption tower connected to the first absorption tower is supplied with the exhaust gas after the step (A), and the following aqueous solution (bl) and the following aqueous solution (b 2 ) Is preferably included.
  • Aqueous solution (b l) An aqueous solution of sodium hydroxide in an amount of 0 ⁇ 001 to 0.2 times the theoretical amount necessary to neutralize the chlorine gas.
  • Aqueous solution (b 2) An aqueous solution of sulfite and / or bisulfite that is 0.001 to 0.2 times the theoretical amount necessary to reduce the chlorine gas.
  • the exhaust gas may contain chlorine gas and carbon dioxide gas.
  • chlorine gas can be selectively removed.
  • the action of the chlorine gas, sodium hydroxide, sulfite and / or sulfite hydrate is preferably performed in the range of 10 to 40 ° C.
  • chlorine gas can be efficiently detoxified with little generation of chlorate.
  • FIG. 1 is a schematic view showing an example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention.
  • FIG. 2 is a schematic view showing another example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention.
  • Fig. 3 is a schematic diagram showing an example of a system used in a process for producing chlorine gas from oxygen gas and hydrogen chloride gas.
  • the chlorine gas detoxification method of the present invention is a method for detoxifying chlorine gas contained in an exhaust gas, wherein the chlorine gas has a theoretical amount of 1.0 to 1.0 to a neutral amount necessary for neutralizing the chlorine gas. 1. 2 times sodium hydroxide and 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas, sulfite and / or bisulfite are allowed to act to The method includes a step of removing gas.
  • the exhaust gas contains chlorine gas.
  • sodium hydroxide NaOH
  • the exhaust gas reacts with an aqueous sodium hydroxide solution.
  • Chlorine (Cl 2 ) reacts with sodium hydroxide (the following formula (1)) to produce sodium hypochlorite (N a C 1 O) and sodium chloride (N a C 1).
  • alkaline metal hydroxide such as sodium hydroxide.
  • hypochlorite is not produced at all or can be decomposed before it is converted to chlorate.
  • the pH 7 ⁇ 8 the generation amount of sodium bicarbonate (NaHC_ ⁇ 3) is slight, moreover, the slightly generated sodium bicarbonate (N AHC_ ⁇ 3) is reacted with chlorine (C l 2) because it produces carbon dioxide (C0 2) sodium hypochlorite while generating a (NaC IO) Te, substantially, sodium bicarbonate (N a HC_ ⁇ 2) and sodium carbonate (N a CO s) does not generate (Formula (5) below).
  • sodium hypochlorite produced by the reaction of sodium bicarbonate with (N AHC_ ⁇ 3) and chlorine (C l 2) (N a'C IO) is sulfite (and / or nitrous hydrogen sulfate) By coexisting, it is decomposed by the reaction of the above formula (2).
  • sodium hypochlorite (NaC10) is not substantially formed, and sodium hydrogencarbonate (NaHC0 3 ) and chlorine (Cl 2 ) Reacts. Therefore, even if the exhaust gas contains carbon dioxide, the chlorine gas is removed with little generation of chlorate, and the chlorine gas is selectively removed. Furthermore, it is possible to minimize the generation of sodium bicarbonate (NaHC_ ⁇ 2) and carbon sodium (Na 2 C0 3).
  • the amount of the Al force acting on the chlorine gas is 1.0 to 1.2 times the theoretical amount necessary to neutralize the chlorine gas. If it is less than 1.0 times the theoretical amount, chlorine may not be sufficiently absorbed, and if it exceeds 1.2 times, carbonates and bicarbonates are likely to be formed.
  • the amount of alkali that acts on the chlorine gas is not less than 1.0 times and not more than 1.1 times the theoretical amount necessary to neutralize the chlorine gas.
  • theoretical amount necessary for neutralizing chlorine gas means the stoichiometric amount necessary for neutralizing the total amount of chlorine gas contained in the exhaust gas.
  • the theoretical amount required to neutralize chlorine gas l m o 1 is 2 m o l when sodium hydroxide is used as the alkali. Therefore, in this case, 1.0 to 1.2 times the theoretical amount necessary to neutralize chlorine gas means 2.0 to 2.4 mol.
  • Alkaline action of chlorine on chlorine gas specifically means that chlorine gas and alkali are brought into contact with each other and at least a part thereof is reacted.
  • an alkali metal hydroxide, an alkaline earth metal hydroxide, or the like can be preferably used.
  • Conventionally known alkali metal hydroxides and alkaline earth metal hydroxides can be used.
  • the alkali metal hydroxide and alkaline earth hydroxide may be used alone or in combination.
  • a plurality of materials belonging to the alkali metal hydroxide may be used, a plurality of materials belonging to the alkaline earth metal hydroxide may be used in combination, or these may be combined with each other.
  • the amount is set so that the total amount of alkali used is within the above range.
  • the alkali is preferably used as an aqueous solution.
  • the concentration of the aqueous sodium hydroxide solution is preferably in the range of 7 to 20% by mass. If the amount is less than 7% by mass, the amount of the aqueous solution increases, which is disadvantageous in terms of volumetric efficiency. If the amount exceeds 20% by mass, carbonates and hydrogen carbonates are likely to precipitate, which is a problem.
  • the concentration of the aqueous sodium hydroxide solution is 9% by mass or more and 13% by mass or less.
  • the amount of sulfite and / or bisulfite that acts on chlorine gas is 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas. If it is less than 1.0 times, the production of chlorate may not be sufficiently suppressed, and if it exceeds 1.2 times, the production of chlorate will be sufficiently suppressed. This is because, however, a large amount of expensive sulfite is used, and the concentration of sulfite in the wastewater increases, resulting in an increase in chemical oxygen demand (COD). 'Preferably, the amount of sulfite and / or bisulfite that acts on chlorine gas is not less than 1.0 times and not more than 1.1 times the theoretical amount necessary to reduce the chlorine gas.
  • theoretical amount necessary for reducing chlorine gas means the stoichiometric amount necessary for reducing the total amount of chlorine gas contained in the exhaust gas.
  • the theoretical amount necessary to reduce chlorine gas l m o 1 is l m o l when using sulfite. Therefore, in this case, 1.0 to 1.2 times the theoretical amount necessary to reduce chlorine gas means 1.0 to 1.2 mol.
  • the term “acting” sulfite and / or hydrogen sulfite with chlorine gas specifically means contacting chlorine gas with sulfite and / or bisulfite to react at least partly. .
  • the sulfite for example, sodium sulfite, potassium sulfite and the like can be preferably used.
  • the bisulfite for example, sodium bisulfite, potassium bisulfite and the like can be preferably used. These may be used alone or in combination. Among these, in the present invention, it is particularly preferable to use sodium sulfite and / or sodium hydrogen sulfite. When using a combination of multiple types as sulfites and bisulfites, the total amount of sulfites and bisulfites used should be within the above range.
  • the sulfite and / or hydrogen sulfite is preferably used as an aqueous solution.
  • the concentration of the sodium sulfite aqueous solution is preferably in the range of 2 to 20% by mass. If it is less than 2% by mass, the amount of the aqueous solution is large, which is disadvantageous in terms of volumetric efficiency. If it exceeds 20% by mass, Na 2 S 0 4 and the like are likely to precipitate, which is a problem.
  • the concentration of the sodium sulfite aqueous solution is 3% by mass or more and 15% by mass or less.
  • the alkaline aqueous solution and the aqueous solution of sulfite and Z or bisulfite are allowed to act on chlorine gas
  • the alkaline aqueous solution and the aqueous solution of sulfite and / or bisulfite may be allowed to act respectively.
  • Well, al force And an aqueous solution containing sulfite and z or bisulfite may be allowed to act.
  • FIG. 1 is an example of a chlorine gas abatement system preferably used in the present invention.
  • sodium hydroxide, sulfite, and / or sodium sulfite is used as the alkali will be described as an example.
  • the chlorine gas abatement system includes a first absorption tower 1 0 1 and a second absorption tower 1 0 2 connected to the first absorption tower 1 0 1.
  • a first receiver 10 3 for receiving the product discharged from the tower 1 0 1 is connected to the first absorption tower 1 0 1.
  • exhaust gas is preferably continuously supplied, and sodium hydroxide in an amount of 1.0 to 1.2 times the theoretical amount necessary for neutralizing the chlorine gas is used.
  • a step of removing chlorine gas by supplying 1.0 to 1.2 times the theoretical amount of sodium sulfite required for reducing the chlorine gas (step (A)). It is.
  • the insides of the first absorption tower 1 0 1 and the second absorption tower 1 0 2 are filled with packing materials 1 0 4 and 1 0 5, respectively, thereby improving the gas-liquid contact efficiency and chlorine. Can be removed quickly.
  • packing materials 1 0 4 and 1 0 5 known materials such as Raschig rings and pole rings can be used, for example, and the materials include, for example, fluorine resin, vinyl chloride resin, ceramics, inorganic glass, and the like. Can be mentioned.
  • exhaust gas discharged by a predetermined chlorine generation process is input to the first absorption tower 10 1 through a path 2 0 2.
  • the exhaust gas contains chlorine gas and carbon dioxide gas.
  • the exhaust gas may not contain carbon dioxide gas.
  • the first absorption tower 101 has sodium hydroxide adjusted to 1.0 to 1.2 times the theoretical amount necessary to neutralize chlorine gas contained in the exhaust gas,
  • sodium sulfite adjusted to 1.0 to 1.2 times the theoretical amount necessary for reducing chlorine gas is introduced through the passageway 201.
  • the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution may be supplied as separate aqueous solutions from the route 210, and the aqueous solution containing sodium hydroxide and sodium sulfite as the aqueous solution. It may be performed from 2 0 1. Further, either a sodium hydroxide aqueous solution or a sodium sulfite aqueous solution may be supplied from a route (not shown) different from the route 201. In this way, in the first absorption tower 101, the reaction of chlorine gas and carbon dioxide as described above with sodium hydroxide and sodium sulfite occurs. Sodium chloride and sodium sulfate produced by the reaction are discharged to the first receiver 10 3 through the path 20 3.
  • Sodium chloride and sodium sulfate in the first receiver 10 3 are sucked by the pump P 1 and controlled by the exchanger 1 0 6 and again through the path 2 0 3 a to the first absorption tower 1 0 1 To be sent in or discharged through path 2 10.
  • the pH of the treatment solution in the first receptor 10 3 is maintained in the range of about 7-8.
  • sodium carbonate and sodium bicarbonate do not precipitate, and the cycle of the chlorine gas abatement process is not adversely affected.
  • p H can be prevented occurrence of S_ ⁇ 2 gas by be excessive too be low.
  • chlorine gas, sodium hydroxide and sodium sulfite is preferably carried out in the range of 10 to 40 ° C. Below 10 ° C, chlorine gas, sodium hydroxide and sodium sulfite may not react sufficiently. If it is higher than 40 ° C, the reaction may become too violent. The temperature can be confirmed, for example, by confirming the temperature of the treatment solution in the first receiver 10.
  • Step (B) is performed.
  • the step (B) is based on the premise that chlorine gas is contained in the exhaust gas supplied to the second absorption tower 10 2 through the channel 20 4. Therefore, the step (B) is provided as necessary, and if the entire amount of chlorine gas can be removed by the first absorption tower 101, the step (B) is not performed. May be.
  • process (B) Will be described.
  • the second absorption tower 10 2 is supplied with the exhaust gas that has undergone the step (A) and has a theoretical amount of 0.001 to 0.2 that is necessary for neutralizing chlorine gas. Double alkali and 0.01 to 0.2 times the theoretical amount of sulfite and / or bisulfite required to reduce the chlorine gas is fed through path 2 06 (step ( B))). If the amount of alkali is less than 0.001 times the theoretical amount necessary to neutralize chlorine gas, chlorine may not be sufficiently absorbed. This is because hydrogen carbonate is easily generated.
  • the amount of the Al force acting on the chlorine gas in the second absorption tower 102 is not less than 0.001 times the theoretical amount necessary to neutralize the chlorine gas. Is less than double.
  • the amount of sulfite and hydrogen or bisulphite is less than 0.01 times the theoretical amount necessary to reduce chlorine gas, the formation of kurate is sufficiently suppressed. If it exceeds 0.2 times, it is possible to sufficiently suppress the production of chlorate, but a large amount of expensive sulfite will be used, and the concentration of sulfite in the wastewater will increase. This is because the problem arises that the chemical oxygen demand (COD) increases due to the increase.
  • the amount of sulfite and / or hydrogen sulfite that acts on chlorine gas is not less than 0.001 times and not more than 0.1 times the theoretical amount necessary to reduce the chlorine gas.
  • the chlorine gas here means the total chlorine gas contained in the exhaust gas supplied to the first absorption tower 101 in the step (A).
  • chlorine gas that has not been absorbed and removed in the first absorption tower 101 can be completely absorbed and removed.
  • the action of chlorine gas, sodium hydroxide and sodium sulfite in the second absorption tower 102 is in the range of 10 to 40 ° C, as in the case of the first absorption tower 101.
  • the ⁇ ⁇ ⁇ ⁇ of the treatment solution obtained as a result of this action is preferably maintained within the range of about 7 to 8.5.
  • the alkali supplied into the second absorption tower 102 the above-mentioned alkalis can be used, but it is preferable to use the same ones used in the step (A).
  • the alkali is preferably used as an aqueous solution.
  • the concentration of the aqueous sodium hydroxide solution is preferably in the range of 1 to 10% by mass. If it is less than 1% by mass, 1 A large amount of liquid is disadvantageous in terms of volumetric efficiency, and if it exceeds 10% by mass, it is a problem because carbonates and bicarbonates are likely to precipitate.
  • the concentration of the aqueous sodium hydroxide solution is 1% by mass or more and 5% by mass or less.
  • the sulfite and Z or hydrogen sulfite supplied into the second absorption tower 102 are used, but the same as those used in step (A) can be used.
  • the sulfite and / or hydrogen sulfite is preferably used as an aqueous solution.
  • the concentration of the sodium sulfite aqueous solution is preferably in the range of 2 to 20% by mass. If the amount is less than 2% by mass, the amount of the aqueous solution is large, which is disadvantageous in terms of volumetric efficiency. If the amount exceeds 20% by mass, Na 2 S 0 4 and the like are likely to precipitate, which is a problem.
  • the concentration of the sodium sulfite aqueous solution is 3% by mass or more and 15% by mass or less.
  • the supply of the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution in the second absorption tower 102 may be carried out as separate aqueous solutions from the passage 206, respectively, and the aqueous solution containing sodium hydroxide and sodium sulfite. May be performed from road 2 0 6 as follows. Further, either a sodium hydroxide aqueous solution or a sodium sulfite aqueous solution may be supplied from a route (not shown) different from the route 206.
  • sodium hydroxide, sodium chloride and sodium sulfate supplied to the second absorption tower 10 2 through the path 2 0 5 2 sodium hydroxide (and sodium hydrogen carbonate) again contributes to the reaction with chlorine gas in the second absorption tower 10 2, and sodium chloride and sodium sulfate are discharged from the bottom as they are, and the above cycle is repeated. repeat.
  • FIG. 2 is a schematic view showing another example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention. Note that the configuration of numbers not described in FIG. 2 is the same as that of FIG.
  • a chlorine gas monitor and a flow meter 10 8 are connected to the path 2 0 2, and the concentration and flow rate of chlorine gas in the exhaust gas passing through the path 2 0 2 are continuously measured.
  • the chlorine gas monitor and flow meter 10 8 is connected with a control device 10 9 and receives signals from the chlorine gas monitor and flow meter 10 8.
  • continuous measurement means that measurement is performed intermittently or at intervals of 10 minutes or less.
  • a first aqueous solution supply device 110 and a second aqueous solution supply device 11 1 1 are connected to the control device 109, and the first aqueous solution supply device 110 is a sodium hydroxide solution.
  • an aqueous solution containing sodium sulfite which is supplied into the first absorption tower 1 0 1 via the path 2 0 1
  • the second aqueous solution supply device 1 1 1 includes sodium hydroxide and 1
  • An aqueous solution containing sodium sulfite is held, and this is supplied into the second absorption tower 10 2 via the path 2 0 6.
  • aqueous solution supply device (not shown) is connected to the control device 109, and separates the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution into the first absorption tower 10 0 1 and the second absorption tower 1 0 separately. 2 may be supplied.
  • the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution supplied into the first absorption tower 101 and the second absorption tower 102 are respectively connected to the same passage 2 0 1 and passage 2 0 6. It may be supplied via a different route, or a different route not shown in the figure may be used in combination.
  • a signal related to the concentration and flow rate of chlorine gas in the exhaust gas passing through the path 2 0 2 measured by the chlorine gas monitor and the flow meter 1 0 8 is transmitted to the control device 1 0 9.
  • Receive the signal The control device 10 9 is required to reduce the theoretical amount of sodium hydroxide and the chlorine gas required to neutralize chlorine gas by the program incorporated in the control device 10 9.
  • the theoretical amount of sodium sulfite is calculated, and the amount of 1.0 to 1.2 times and the amount of 0.0 0 1 to 0.2 times the calculated value is calculated.
  • control device 1 09 controls the first aqueous solution supply device 1 1 0 and the second aqueous solution supply device 1 1 1 according to the calculation result, and based on the calculation result, the first absorption tower The amount of the aqueous solution containing sodium hydroxide and sodium sulfite supplied to 101 and the second absorption tower 102 (or the amount of each of the aqueous sodium hydroxide solution and the aqueous sodium sulfite solution) is adjusted.
  • an aqueous solution containing sodium hydroxide and sodium sulfite supplied from the first aqueous solution supply device 1 1 0 into the first absorption tower 1 0 1 (or an aqueous sodium hydroxide solution) Concentration and flow rate of sodium sulfite aqueous solution).
  • the control includes an aqueous solution (or sodium hydroxide aqueous solution) containing sodium hydroxide and sodium sulfite supplied from the second aqueous solution supply device 1 1 1 into the second absorption tower 10 2. And sodium sulfite aqueous solution, respectively).
  • control device 109 can reduce human management.
  • the chlorine gas concentration in the exhaust gas is not constant, it is difficult to fine-tune the aqueous solution containing sodium hydroxide and sodium sulfite (or sodium hydroxide aqueous solution and sodium sulfite aqueous solution, respectively) to be supplied.
  • 1 0 9 to control fine adjustment is possible, chlorine absorption and removal can be more reliably performed, precipitation of carbonates and the like can be prevented, and generation of chlorate can be more reliably suppressed. Can do.
  • a path 2 0 4 connected to the first absorption tower 10 1 and a path 2 0 8 connected to the second absorption tower 1 0 2 are respectively connected to a first chlorine gas module (not shown). It is preferred that a tanabata and a second chlorine gas monitor are connected.
  • the gas module can also be installed at the top of the first absorption tower 101 and the second absorption tower 102, respectively. As a result, the chlorine gas concentration in the gas supplied from the first absorption tower 1001 to the second absorption tower 1002 can be measured. 4 When there is an excessive supply of chlorine gas to the absorption tower 102, it is possible to easily deal with abnormal situations in the system.
  • an aqueous solution containing sodium hydroxide and sodium sulfite supplied to the second absorption tower 102 by connecting the monitor and the control device 109 (or an aqueous solution of sodium hydroxide and an aqueous solution of sodium sulfite, respectively) ) can be controlled.
  • a second chlorine gas monitor it is possible to measure the chlorine gas concentration in the gas released from the second absorption tower 10 2 to the outside. Excessive chlorine release to the outside can be prevented by stopping the system operation when there is an excessive supply of chlorine gas. Also, an aqueous solution containing sodium hydroxide and sodium sulfite to be supplied to the second absorption tower 102 by connecting the monitor and the control device 109 (or an aqueous solution of sodium hydroxide and an aqueous solution of sodium sulfite, respectively) ) Can be controlled to extinguish chlorine gas released to the outside.
  • the exhaust gas containing chlorine gas used in the chlorine gas detoxification method of the present invention is not particularly limited as long as it is a gas containing chlorine gas or a gas containing chlorine gas and carbon dioxide gas.
  • the chlorine gas detoxification method of the invention is a chlorine production method in which, for example, a gas containing hydrogen chloride is oxidized using a gas containing oxygen, comprising the following (1) reaction step, (2) absorption step, ( It can also be suitably used for exhaust gas discharged by a chlorine production method comprising: 3) a drying step; and (4) a purification step.
  • Reaction process In the presence of a catalyst containing ruthenium and Z or a ruthenium compound, a gas containing hydrogen chloride is oxidized with oxygen to obtain a gas mainly composed of chlorine, water, unreacted hydrogen chloride and unreacted oxygen. Process.
  • Purification step The step of obtaining chlorine by separating the dried gas obtained in the drying step into a liquid or gas mainly containing chlorine and a gas mainly containing unreacted oxygen. At least a part of the gas mainly composed of unreacted oxygen in the purification process becomes the exhaust gas in the present invention.
  • FIG. 3 is a schematic diagram showing an example of a system used in a process for producing chlorine gas from oxygen gas and hydrogen chloride gas.
  • the raw material hydrogen chloride gas is fed into the pretreatment tower 1 1 6 through path 2 2 2.
  • a hydrogen chloride-containing gas generated by a process known in the art such as hydrogen chloride generated in a pyrolysis reaction of a chlorine compound can be used.
  • carbon monoxide, phosgene, hydrogen sulfide, sulfur dioxide, carbon tetrachloride, black benzene, dichlorobenzene, and the like are included as impurities.
  • the impurities are removed. is there .
  • the raw hydrogen chloride gas preferably contains about 50% by volume or more of hydrogen chloride gas.
  • the raw material hydrogen chloride gas from which impurities have been removed in the pretreatment tower 1 1 6 is introduced into the reaction tower 1 1 7 through the path 2 2 3 together with the oxygen gas introduced through the path 2 2 1.
  • oxygen gas oxygen or air can be used, but preferably the oxygen concentration is 80% by volume or more.
  • the reaction shown in the reaction step is performed. That is, in the presence of a catalyst containing ruthenium and / or a ruthenium compound, a gas containing hydrogen chloride treated in the pretreatment tower 1 16 is oxidized with a gas containing oxygen, and chlorine, water, unreacted hydrogen chloride and unreacted A gas mainly composed of reactive oxygen is obtained.
  • hydrogen chloride is oxidized with oxygen, it is reacted in a fixed bed reactor using a catalyst containing ruthenium and a ruthenium or ruthenium compound.
  • Japanese Patent Laid-Open No. 9-6 7 103 Japanese Patent Laid-Open No. 10-1 82 1 04, Japanese Patent Laid-Open No. 10-1 94705, Japanese Patent Laid-Open No. 10-338 502, Japanese Patent Laid-Open No. 11-11 80 70 1 gazette
  • catalysts containing ruthenium oxide are preferred.
  • the content of ruthenium oxide in the catalyst is preferably 0.1 to 20% by mass. If the amount of ruthenium oxide is too small, the catalytic activity may be low and the conversion rate of hydrogen chloride may be low. If the amount of ruthenium oxide is excessive, the catalyst price may increase.
  • 10-338502 discloses a supported ruthenium oxide having a ruthenium oxide content of 0.1 to 20% by mass and a ruthenium oxide central diameter of 1.0 to 10.0 nanometers. Catalysts or ruthenium oxide composite oxide type catalysts are described.
  • Gas mainly composed of chlorine, water, unreacted hydrogen chloride, and unreacted oxygen generated by the catalytic reaction performed in the above reaction tower 1 1 7 is input to the absorption tower 1 18 through the path 224. Is done.
  • the absorption process mentioned above is performed. That is, by bringing the gas mainly composed of chlorine, water, unreacted hydrogen chloride and unreacted oxygen obtained in the reaction step into contact with water and Z or hydrochloric acid supplied from line 2 36, and / or By cooling, a solution containing hydrogen chloride and water as main components is recovered, and a gas containing chlorine and unreacted oxygen as main components is obtained. The obtained gas will be supplied to the drying tower 1 1 9 through the path 2225. Further, a solution containing hydrogen chloride and water as main components is introduced into the hydrochloric acid absorption tower 122 through a path 237.
  • the contact temperature is preferably 0 to 100 ° C. and the pressure is 0.05 to lMPa.
  • the concentration of hydrochloric acid to be contacted is preferably 25% by mass or less. In order to prevent the precipitation of chlorine hydrate, it is preferable to employ the method described in JP-A No. 2003-261306.
  • the drying step described above is performed in the drying tower 1 1 9. That is, moisture in the gas obtained in the absorption process is removed.
  • the moisture in the gas after the drying step is 0.5 mgZ 1 or less, preferably 0.1 mg / 1 or less.
  • a compound that removes moisture in the gas and Examples thereof include sulfuric acid, calcium chloride, magnesium perchlorate, and zeolite. Among them, sulfuric acid is preferable.
  • the concentration of sulfuric acid is preferably 90% by mass or more. If the sulfuric acid concentration is less than 90% by mass, the moisture in the gas may not be removed sufficiently.
  • the contact temperature is preferably 0 to 80 ° C and the pressure is preferably 0.05 to IMPa.
  • the waste liquid of sulfuric acid used in the drying process will be disposed through Route 2 39.
  • sulfuric acid is used as the desiccant, it is preferable to remove the sulfuric acid mist immediately after the drying process.
  • purine query miner is disclosed in Japanese Patent Application Laid-Open No. 2 0 0 3-1 8 1 2 3 5 The method described in the gazette can be used.
  • the gas from which moisture has been removed by the drying process is then supplied to the chlorine purification tower 1 2 1 through path 2 26.
  • it may be passed through a compressor if necessary. With this compressor, the gas after moisture removal is compressed to facilitate liquefaction of chlorine.
  • chlorine is obtained by separating the gas obtained in the drying step into a liquid or gas containing chlorine as a main component and a gas containing unreacted oxygen as a main component.
  • a method for separating the liquid or gas mainly containing chlorine and the gas mainly containing unreacted oxygen a method of compressing and / or cooling, and / or a known method (Japanese Patent Laid-Open No. Hei 3). No. 2 6 2 5 1 4 and No. 1 1 1 5 0 0 9 5 4).
  • a liquid containing chlorine as a main component is separated from a gas containing unreacted oxygen as a main component.
  • the liquefaction of chlorine is carried out to the extent that chlorine specified by pressure and temperature can exist in the liquid state. The lower the temperature is within this range, the lower the compression pressure, so the compression power can be reduced.
  • the compression pressure and cooling temperature must be within the optimal economic conditions within this range. It is decided in consideration. In normal operation, the compression pressure for liquefaction of chlorine is 0.5 to 5 MPa and the cooling temperature is -70 to 40 ° C.
  • the obtained liquid containing chlorine as a main component is collected through the route 2 28 and can be used as it is, or after partially or fully vaporized, and used as a raw material for vinyl chloride, phosgene and the like.
  • a part of the heat necessary for vaporization is obtained, and at the same time, the cooling load by the external refrigerant necessary for liquefaction of chlorine in the gas obtained in the drying process is reduced. It is possible. Similarly, it can be used for cooling the reflux liquid of the chlorine purification tower 1 2 1.
  • the gas mainly composed of unreacted oxygen is circulated to the reaction process through path 2 30 or treated as exhaust gas through path 2 29. It will be.
  • the gas mainly composed of unreacted oxygen may contain a chlorine gas.
  • chlorine gas in such exhaust gas is one of the targets for detoxification.
  • a part or all of the gas containing unreacted oxygen as a main component passes through the passage 230 and is supplied to the above-described circulation process. That is, a part or all of the gas containing unreacted oxygen as a main component is supplied as oxygen used in the reaction step.
  • sulfuric acid mist is contained in the gas supplied to the reaction step, it is preferable to remove the sulfuric acid mist. That is, in the washing tower 1 20 to which water is supplied through the path 2 40, the sulfuric acid mist is removed, the gas is washed, and the washed oxygen gas is passed through the path 2 3 2 to the reaction tower. 1 1 Supply to 7.
  • Examples of other methods for removing sulfuric acid mist include a known method (Japanese Patent Laid-Open No. 2000-136086 25).
  • the sulfuric acid mist dissolved in water is supplied from the washing tower 1 2 20 through the path 2 3 1 to the absorption tower 1 1 8 and can be used in the absorption step in the same manner as hydrochloric acid.
  • the exhaust gas mainly composed of unreacted oxygen discharged through the path 2 29 is further introduced into the first absorption tower 10 1 through the path 2 0 It will be used for the method of removing the chlorine gas.
  • the solution mainly composed of hydrogen chloride and water discharged from the path 2 37 is heated with chlorine contained in the solution and bubbling of inert gas such as soot or nitrogen. Then, it is put into the hydrochloric acid absorption tower 1 2 2. The hydrochloric acid concentration is adjusted in the hydrochloric acid absorption tower 1 2 2. The treated chlorine is sent to an exhaust gas detoxification tower (not shown). Further, the solution after the treatment is further introduced into the activated carbon tower 1 2 3 through the path 2 3 4, and after removing organic impurities and the like in the solution, the solution is sent out through the path 2 3 5 and sent out.
  • Hydrochloric acid is adjusted to ⁇ ⁇ in the electrolytic cell, boiler feed It can be used as a raw material for water neutralization, condensation rearrangement reaction of aniline and formalin, hydrochloric acid water electrolysis, food additives, and the like. Further, the solution discharged from the passage 237 can be used as a reaction raw material by recovering hydrogen chloride by the method described in JP-A-2 001-139305.
  • Chlorine gas, oxygen gas, and carbon dioxide gas (volume ratio 2: 1: 1) from a gas introduction tube into a 500m1 bottom discharge glass flask equipped with a mechanical stirrer, thermometer, gas introduction tube and liquid introduction tube ) Are introduced so that the respective flow rates are 28 Om 1 Zm in, 140 ml / min, and 140 ml 1 Zm in, and at the same time, a 10% by mass sodium hydroxide aqueous solution and A 13 mass% sodium sulfite aqueous solution was introduced so that the flow rates would be 25. Ommol / min and 12.5 mmol / min, respectively.
  • treatment solution discharging the solution in the flask (hereinafter referred to as “treatment solution”) from the bottom drainage part, maintaining the liquid level so that the amount of solution in the flask is constant, the volume (V) of the treatment solution in the flask is reduced.
  • the temperature inside the flask was maintained at about 30 ° C.
  • the pH of the treatment solution was maintained in the range of 7-8.
  • concentration of sodium chlorate (chlorate) in the discharged treatment solution 3 hours after passing through was measured by ion chromatography and found to be 30 mass ppm or less.
  • sodium hypochlorite was not detected.
  • the concentration of sodium chloride was 6.21% by mass.
  • Exfoliation treatment was carried out in the same manner as in Example 1 except that no sodium sulfite aqueous solution was introduced.
  • the concentration of sodium chlorate (chlorate) in the obtained treatment solution was measured by ion chromatography and found to be 3.19% by mass.
  • Ma The concentration of sodium hypochlorite was 6.49% by mass as measured by the iodometric titration method.
  • the concentration of sodium chloride was 6.57% by mass.
  • we tried to reduce sodium chlorate and sodium hypochlorite by reacting the treatment solution with 1.3 times the theoretical amount of sodium sulfite solution required to reduce chlorine gas. .
  • sodium hypochlorite was 0% by mass, but sodium chlorate (chlorate) was only reduced to 0.7% by mass.
  • the effect of the present invention was confirmed using an apparatus similar to the apparatus shown in FIG. To make the explanation easier to understand, refer to FIG.
  • a mixed gas consisting of chlorine gas, carbon dioxide gas and air is supplied at a flow rate of 130 m 1 / min (5.8 mm o 1 / min), 260 ml l Zm in, 60 ml l Zm in, so as to continuously feed from the path 202 and simultaneously from the path 201 to 11 mass% sodium hydroxide aqueous solution and 13
  • a mass% aqueous sodium sulfite solution was continuously fed so that the respective flow rates were 12.76 mmol Zmin and 6.38 mmol 1 Zmin.
  • the cooling water was allowed to flow through the jacket at the bottom of the first absorption tower 101 so that the temperature of the treatment solution in the first absorption tower 101 was about 30 ° C.
  • the second absorption tower 102 (made of glass, packing 6 mm magnetic Raschig ring) with a diameter of 30 mm and a height of 300 mm connected to the first absorption tower 101, 3% by mass of hydroxide from the path 206 An aqueous sodium solution and an aqueous 5% by mass aqueous sodium sulfite solution were continuously fed so that the respective flow rates were 1.
  • S Smmol Zmir 0. 64 mmo 1 / min. These amounts are equivalent to 0.1 times the theoretical amount necessary to neutralize chlorine gas and 0.1 times the theoretical amount necessary to reduce chlorine gas, respectively.
  • cooling water was passed through the jacket at the bottom of the second absorption tower 102 so that the temperature of the treatment solution in the second absorption tower 102 was about 30 ° C.
  • the mixed gas and the aqueous sodium hydroxide solution and sulfurous acid in the first absorption tower 101 2 The treatment solution produced by the reaction with the aqueous sodium acid solution was circulated back to the first absorption tower 100 1 using the pump P 1.
  • the treatment solution generated by the reaction with the aqueous sodium hydroxide solution and the sodium sulfite aqueous solution in the second absorption tower 102 is used as the first absorption tower 101 or the second absorption water using the pump P2. It was returned to Tower 1 0 2 and circulated. In this way, the reaction was carried out in the first absorption tower 101 and the second absorption tower 102, and the treatment solution was continuously circulated.
  • Detoxification treatment was performed in the same manner as in Example 2 except that the sodium sulfite aqueous solution was not supplied into the first absorption tower 101 and the second absorption tower 102.
  • the concentration of sodium chlorate (chlorate) in the processing solution obtained was measured by ion chromatography and found to be 2.5% by mass.
  • the concentration of sodium hypochlorite was 5.0% by mass as measured by an iodometric titration method.
  • the pH of the treatment solution was 7.3.
  • chlorine gas can be efficiently removed with almost no chlorate being generated.
  • reducing chlorate to the pm order is usually not possible with the method of using hyposulfite and the like after forming hypochlorite.
  • chlorine gas can be efficiently detoxified while almost all chlorate is generated.

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Abstract

Disclosed is a method for removing a chlorine gas contained in an exhaust gas. The method comprises the step of reacting the chlorine gas with sodium hydroxide in an amount of 1.0 to 1.2 times the theoretical amount required for neutralizing the chlorine gas and a sulfite salt and/or a bisulfite salt in an amount of 1.0 to 1.2 times the theoretical amount required for neutralizing the chlorine gas to remove the chlorine gas.

Description

塩素ガスの除害方法 技術分野  Chlorine gas removal method Technical Field

本発明は、 塩素ガスの除害方法に関し、 より詳しくは、 アルカリ溶液を用いた 塩素ガスの除害方法であって、 塩素明酸塩 (クロレート) が生成しない塩素ガスの 除害方法に関する。  The present invention relates to a chlorine gas detoxification method, and more particularly, to a chlorine gas detoxification method using an alkaline solution, and to a chlorine gas detoxification method in which chlorate is not generated.

 Rice field

 book

背景技術  Background art

一般に、 塩素ガスを含有する排ガスは、 たとえば水酸化ナトリウム水溶液等の アル力リ溶液を用いて中和することにより処理されている。 塩素ガスを水酸化ナ トリゥム水溶液で中和すると次亜塩素酸ナトリゥムが生成するが、 これとともに 塩素酸ナトリウムも生成する。 このような塩素酸ナトリウム等の塩素酸塩 (以下 、 クロレートと称する) の排出規制は国内にはないものの、 水生植物への悪影響 が知られているため、 極力低減もしくは完全になくした上で中和処理排水を排出 することが望ましい。  In general, exhaust gas containing chlorine gas is treated by neutralizing it with an alkaline solution such as an aqueous sodium hydroxide solution. When chlorine gas is neutralized with aqueous sodium hydroxide solution, sodium hypochlorite is produced, and sodium chlorate is also produced. Although there are no regulations on the emission of chlorates such as sodium chlorate (hereinafter referred to as chlorate) in Japan, there are known adverse effects on aquatic plants. It is desirable to discharge Japanese wastewater.

ここで、 塩素ガスを含有する排ガスを水酸化ナトリゥム水溶液で中和処理する "ことにより発生する中和処理排水中の次亜塩素酸ナトリゥムを分解する方法とし ては、 たとえば触媒を用いて分解する方法、 熱分解による方法、 p Hを下げて分 解する方法、 亜硫酸塩を用いて還元処理する方法などが知られている。  Here, as a method of decomposing sodium hypochlorite in the neutralized wastewater generated by neutralizing the exhaust gas containing chlorine gas with an aqueous sodium hydroxide solution, for example, using a catalyst There are known a method, a method by thermal decomposition, a method of degrading by lowering pH, and a method of reducing using sulfite.

たとえば特開 2 0 0 5— 3 0 5 4 1 4号公報 (特許文献 1 ) には、 塩素ガスお よび炭酸ガスを含有する排ガスから、 水酸化ナトリウム水溶液を用いて、 塩素ガ スを選択的に吸収除去する塩素の除害方法について記載されており、 発生した次 亜塩素酸塩水溶液を、 熱分解処理および、 必要に応じて亜硫酸塩で処理して次亜 塩素酸塩を分解することが開示されている。  For example, in Japanese Patent Application Laid-Open No. 2000-305-0 14 (Patent Document 1), chlorine gas is selectively used from an exhaust gas containing chlorine gas and carbon dioxide gas using an aqueous sodium hydroxide solution. Describes the method of detoxifying chlorine to be absorbed and removed. The generated hypochlorite aqueous solution can be decomposed by thermal decomposition and, if necessary, sulfite to decompose hypochlorite. It is disclosed.

しかしながら、 上記亜硫酸塩を用いた処理方法によっては、 塩素ガスのアル力 リ溶液による中和処理によって次亜塩素酸塩とともに生成したクロレートの一部 を分解することは可能であっても、 クロレートの濃度を十分満足できる程度にま で低減できるものではない。 また、 発生した次亜塩素酸塩水溶液を熱分解処理し た場合、 次亜塩素酸塩が分解されるとともに、 クロレートが副生してしまう。 さ らに、 次亜塩素酸塩水溶液を放置しておくと、 次亜塩素酸塩が自然酸化されてク ロレ一トが生成し、 クロレート濃度が増加してしまうという問題もある。 However, depending on the treatment method using sulfite, it is possible to decompose a part of the chlorate produced together with hypochlorite by neutralization treatment with chlorine gas solution. Concentrate enough It cannot be reduced by. In addition, when the generated hypochlorite aqueous solution is pyrolyzed, hypochlorite is decomposed and chlorate is by-produced. In addition, if the aqueous hypochlorite solution is allowed to stand, there is a problem that hypochlorite is spontaneously oxidized to produce chlorate and the chlorate concentration increases.

このように、 塩素ガスをアルカリ溶液で中和処理すると、 次亜塩素酸塩ととも にクロレートが生成し、 当該クロレートは、 従来知られている次亜塩素酸塩の分 解方法によっては十分に分解されない。 そこで、 次亜塩素酸塩の分解を、 クロレ ートを発生させることなく行なう方法、 または生成した次亜塩素酸塩およびクロ レートの双方を十分な程度にまで低減する方法を、 本発明者は開発しょうとした 。 発明の開示  In this way, when chlorine gas is neutralized with an alkaline solution, chlorate is produced together with hypochlorite, and this chlorate may be sufficient depending on the conventionally known methods for decomposing hypochlorite. Not decomposed. Therefore, the present inventor has developed a method for performing decomposition of hypochlorite without generating chloride, or a method for reducing both the produced hypochlorite and chloride to a sufficient extent. I tried to develop. Disclosure of the invention

本発明は上記従来の問題を解決するためになされたものであり、 その目的は、 クロレートを発生させることなく、 塩素ガスを含有する排ガスを、 アルカリ溶液 を用いて除害する方法を提供することである。  The present invention has been made to solve the above-described conventional problems, and an object thereof is to provide a method for detoxifying exhaust gas containing chlorine gas using an alkaline solution without generating chlorate. It is.

本発明の塩素ガスの除害方法は、 排ガス中に含まれる塩素ガスを除害する方法 であって、 前記塩素ガスに、 前記塩素ガスを中和するのに必要な理論量の 1 . 0 〜1 . 2倍の水酸化ナトリウムと、 前記塩素ガスを還元するのに必要な理論量の 1 . 0〜1 . 2倍の亜硫酸塩および/または亜硫酸水素塩と、 を作用させて、 前 記塩素ガスを除去する工程を含むことを特徴とする。  The chlorine gas detoxification method of the present invention is a method for detoxifying chlorine gas contained in exhaust gas, which is 1.0 to the theoretical amount necessary for neutralizing the chlorine gas to the chlorine gas. By reacting with sodium hydroxide twice and 1.0 to 1.2 times the theoretical amount of sulfite and / or bisulfite necessary for reducing the chlorine gas, the chlorine The method includes a step of removing gas.

また、 本発明の塩素ガスの除害方法は、 第 1の吸収塔に、 前記排ガスを供給す るとともに、 下記水溶液 (a l ) ならびに下記水溶液 (a 2 ) を供給する工程 ( A ) を含むことを特徴とする。  The chlorine gas detoxification method of the present invention includes the step (A) of supplying the following aqueous solution (al) and the following aqueous solution (a 2) while supplying the exhaust gas to the first absorption tower. It is characterized by.

水溶液 (a l ) :前記塩素ガスを中和するのに必要な理論量の 1 . 0 ~ 1 . 2倍 の水酸化ナトリウムの水溶液。 Aqueous solution (a l): An aqueous solution of sodium hydroxide 1.0 to 1.2 times the theoretical amount necessary to neutralize the chlorine gas.

水溶液 (a 2 ) :前記塩素ガスを還元するのに必要な理論量の 1 . 0〜1 . 2倍 の亜硫酸塩および Zまたは亜硫酸水素塩の水溶液。 Aqueous solution (a 2): An aqueous solution of sulfite and Z or bisulfite that is 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas.

ここで、 前記第 1の吸収塔に接続された第 2の吸収塔に、 前記工程 (A) を経 た排ガスが供給されるとともに、 下記水溶液 (b l ) ならびに下記水溶液 (b 2 ) を供給する工程 (B) を含むことが好ましい。 Here, the second absorption tower connected to the first absorption tower is supplied with the exhaust gas after the step (A), and the following aqueous solution (bl) and the following aqueous solution (b 2 ) Is preferably included.

水溶液 (b l) :前記塩素ガスを中和するのに必要な理論量の 0 · 001~0. 2倍の水酸化ナトリゥムの水溶液。 Aqueous solution (b l): An aqueous solution of sodium hydroxide in an amount of 0 · 001 to 0.2 times the theoretical amount necessary to neutralize the chlorine gas.

水溶液 (b 2) :前記塩素ガスを還元するのに必要な理論量の 0. 00 1~0. 2倍の亜硫酸塩および/または亜硫酸水素塩の水溶液。 Aqueous solution (b 2): An aqueous solution of sulfite and / or bisulfite that is 0.001 to 0.2 times the theoretical amount necessary to reduce the chlorine gas.

前記排ガスは、 塩素ガスおよび炭酸ガスを含んでいてもよく、 この場合、 本発 明によれば塩素ガスを選択的に除去することが可能である。  The exhaust gas may contain chlorine gas and carbon dioxide gas. In this case, according to the present invention, chlorine gas can be selectively removed.

前記塩素ガスと、 水酸化ナトリゥムならびに亜流酸塩および/または亜硫酸水 素塩との作用は、 1 0〜40°Cの範囲で行なわれることが好ましい。  The action of the chlorine gas, sodium hydroxide, sulfite and / or sulfite hydrate is preferably performed in the range of 10 to 40 ° C.

本発明の塩素の除害方法によれば、 クロレートをほとんど発生させることなく 、 効率的に塩素ガスを除害することができる。 図面の簡単な説明  According to the chlorine detoxification method of the present invention, chlorine gas can be efficiently detoxified with little generation of chlorate. Brief Description of Drawings

図 1は、 本発明の塩素の除害方法に好ましく用いられる塩素ガス除害システム の一例を示す模式図である。  FIG. 1 is a schematic view showing an example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention.

図 2は、 本発明の塩素の除害方法に好ましく用いられる塩素ガス除害システム の別の例を示す模式図である。  FIG. 2 is a schematic view showing another example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention.

図 3は、 酸素ガスと塩化水素ガスとから塩素ガスを製造するプロセスに用いる システムの一例を示す模式図である。  Fig. 3 is a schematic diagram showing an example of a system used in a process for producing chlorine gas from oxygen gas and hydrogen chloride gas.

符号の説明 ,  Explanation of symbols

1 0 1 第 1の吸収塔、 1 02 第 2の吸収塔、 1 03 第 1の受容器、 1 0 4, 1 0 5 充填物、 1 06, 1 07 交換器、 1 08 塩素ガスモニタおよび 流量計、 1 0 9 制御装置、 1 1 0 第 1の水溶液供給装置、 1 1 1 第 2の水 溶液供給装置、 1 1 6 前処理塔、 1 1 7 反応塔、 1 1 8 吸収塔、 1 1 9 乾燥塔、 1 2 0 洗浄塔、 12 1 塩素精製塔、 1 22 塩酸吸収塔、 1 2 3 活性炭塔、 2 0 1, 202, 203, 203 a, 204, 20 5, 206, 2 0 7, 208, 2 09, 2 1 0, 22 1, 22 2, 223, 224, 22 5, 22 6, 22 7, 228, 229, 230, 23 1, 232, 233, 234, 2 3 5, 23 6, 2 3 7, 238, 239, 240 路、 P I, P 2 ポンプ。 発明を実施するための形態 1 0 1 1st absorption tower, 1 02 2nd absorption tower, 1 03 1st receiver, 1 0 4, 4 0 5 packing, 1 06, 1 07 exchanger, 1 08 Chlorine gas monitor and flow meter 1 1 0 9 Control device 1 1 0 1st aqueous solution supply device 1 1 1 2nd aqueous solution supply device 1 1 6 Pretreatment tower 1 1 7 Reaction tower 1 1 8 Absorption tower 1 1 9 Drying tower, 1 2 0 Washing tower, 12 1 Chlorine purification tower, 1 22 Hydrochloric acid absorption tower, 1 2 3 Activated carbon tower, 2 0 1, 202, 203, 203 a, 204, 20 5, 206, 2 0 7, 208 , 2 09, 2 1 0, 22 1, 22 2, 223, 224, 22 5, 22 6, 22 7, 228, 229, 230, 23 1, 232, 233, 234, 2 3 5, 23 6, 2 3 7, 238, 239, 240 lines, PI, P 2 pump. BEST MODE FOR CARRYING OUT THE INVENTION

本発明の塩素ガスの除害方法は、 排ガス中に含まれる塩素ガスを除害する方法 であって、 前記塩素ガスに、 前記塩素ガスを中和するのに必要な理論量の 1. 0 〜1. 2倍の水酸化ナトリウムと、 前記塩素ガスを還元するのに必要な理論量の 1. 0〜1. 2倍の亜硫酸塩および/または亜硫酸水素塩と、 を作用させて、 前 記塩素ガスを除去する工程を含むことを特徴とする。  The chlorine gas detoxification method of the present invention is a method for detoxifying chlorine gas contained in an exhaust gas, wherein the chlorine gas has a theoretical amount of 1.0 to 1.0 to a neutral amount necessary for neutralizing the chlorine gas. 1. 2 times sodium hydroxide and 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas, sulfite and / or bisulfite are allowed to act to The method includes a step of removing gas.

これにより、 クロレートをほとんど発生させることなく、 効率的に塩素ガスを 除害することができる。 このことは、 次のように理解することができる。 本発明 において、 排ガスは塩素ガスを含有するものであるが、 たとえば、 アルカリ金属 水酸化物として水酸化ナトリウム (Na〇H) を用いた場合、 このような排ガス を水酸化ナトリウム水溶液と反応させると、 塩素 (C l 2) は水酸化ナトリウム と反応して (下記式 ( 1 ) ) 、 次亜塩素酸ナトリウム (N a C 1 O) と塩化ナト リウム (N a C 1 ) とが生成する。 As a result, chlorine gas can be efficiently removed with little generation of chlorate. This can be understood as follows. In the present invention, the exhaust gas contains chlorine gas. For example, when sodium hydroxide (NaOH) is used as the alkali metal hydroxide, the exhaust gas reacts with an aqueous sodium hydroxide solution. Chlorine (Cl 2 ) reacts with sodium hydroxide (the following formula (1)) to produce sodium hypochlorite (N a C 1 O) and sodium chloride (N a C 1).

C 1 z + 2 N a OH → N a C 1 O + N a C 1 + H20 ( 1 ) また、 排ガスを水酸化ナトリウム水溶液と接触させる際に、 水酸化ナトリウム だけではなく、 たとえば亜硫酸塩として亜硫酸ナトリウム (Na2 S03) を並存 させると、 下記式 ( 2 ) の反応により、 次亜塩素酸ナトリウム (N a C 1〇) を 分解することが可能となる。 C 1 z + 2 N a OH → Na C 1 O + Na C 1 + H 2 0 (1) When contacting exhaust gas with sodium hydroxide aqueous solution, not only sodium hydroxide but also sulfite, for example When sodium sulfite (Na 2 S0 3 ) coexists as sodium hydrogen chlorite (Na 2 C0), it becomes possible to decompose sodium hypochlorite (N a C 10) by the reaction of the following formula (2).

N a C 1 O + N a2 S〇3 → N a C l + N a2 S〇4 (2) 上記式 (2) の反応により、 一旦生成した次亜塩素酸ナトリウム (N a C I O ) は、 自然酸化等によりクロレート (Na C 103) に変化する前に Na C lや N a2 S〇4に分解される。 あるいは、 たとえば亜硫酸塩として亜硫酸ナトリウム (Na2 S03) を並存させることにより、 下記式 (3) に示される反応により全 く次亜塩素酸ナトリウム (Na C I O) が生成することなく、 塩素が分解除去さ れることも考えられる。 N a C 1 O + N a 2 S 0 3 → N a C l + N a 2 S 0 4 (2) The sodium hypochlorite (N a CIO) once generated by the reaction of the above formula (2) is It is decomposed into Na C l and N a 2 S_〇 4 before changed to chlorate (Na C 10 3) by natural oxidation or the like. Alternatively, for example, sodium sulfite (Na 2 S0 3 ) coexists as a sulfite, so that the reaction shown by the following formula (3) does not produce sodium hypochlorite (Na CIO), and chlorine is decomposed. It may be removed.

C 12 + Na2 S03 + 2 N a OH → 2 N a C 1 + N a2 S 04 + H2 O (3) C 1 2 + Na 2 S0 3 + 2 N a OH → 2 N a C 1 + N a 2 S 0 4 + H 2 O (3)

このように、 塩素ガスを除害する際に水酸化ナトリゥム等のアル力リ金属水酸 化物とともに、 亜硫酸塩を並存させることにより、 次亜塩素酸塩を全く生成させ ないか、 または生成してもクロレートに変化する前に分解することが可能となる 。 その結果、 クロレートをほとんど発生させることなく、 塩素ガスを分解除去す ることが可能となる。 Thus, when detoxifying chlorine gas, it is possible to use alkaline metal hydroxide such as sodium hydroxide. By coexisting sulfite with the compound, hypochlorite is not produced at all or can be decomposed before it is converted to chlorate. As a result, it is possible to decompose and remove chlorine gas with little generation of chlorate.

ここで、 排ガスが塩素ガスとともに炭酸ガス (二酸化炭素、 C02) を含む場 合には、 pH7. 0以上では、 水酸化ナトリウムは炭酸ガスとも反応するが、 P H 7. 0〜: 1 0. 33では、 炭酸ナトリウム (Na2C〇3) は生成せず、 炭酸水 素ナトリウム (NaHC〇3) のみが生成する (下記式 (4) ) 。 Here, when the exhaust gas contains carbon dioxide (carbon dioxide, C0 2 ) together with chlorine gas, sodium hydroxide reacts with carbon dioxide at pH 7.0 or higher, but pH 7.0 ~: 10 in 33, sodium carbonate (Na 2 C_〇 3) does not generate, carbonated water containing sodium (NaHC_〇 3) only generates (the following formula (4)).

C〇2 + Na〇H → N aHC〇3 (4) C_〇 2 + Na_〇_H → N AHC_〇 3 (4)

さらに、 pH7~8では、 この炭酸水素ナトリウム (NaHC〇3) の生成量 は僅かであり、 しかも、 この僅かに生成した炭酸水素ナトリウム (N aHC〇3 ) は塩素 (C l 2) と反応して二酸化炭素 (C02) を生成させながら次亜塩素酸 ナトリウム (NaC I O) を生成するので、 実質上、 炭酸水素ナトリウム (N a HC〇2) や炭酸ナトリウム (N a COs) は生成しない (下記式 (5) ) 。 Furthermore, the pH 7 ~ 8, the generation amount of sodium bicarbonate (NaHC_〇 3) is slight, moreover, the slightly generated sodium bicarbonate (N AHC_〇 3) is reacted with chlorine (C l 2) because it produces carbon dioxide (C0 2) sodium hypochlorite while generating a (NaC IO) Te, substantially, sodium bicarbonate (N a HC_〇 2) and sodium carbonate (N a CO s) does not generate (Formula (5) below).

2 N aHC03 + C 12 → NaC I O + N a C 1 + 2 COz + H20 (5) 2 N aHC0 3 + C 1 2 → NaC IO + NaC 1 + 2 CO z + H 2 0 (5)

ここで、 炭酸水素ナトリウム (N aHC〇3) と塩素 (C l 2) との反応により 生成した次亜塩素酸ナトリウム (N a'C I O) は、 亜硫酸塩 (および/または亜 硫酸水素塩) を並存させることにより、 上記式.(2) の反応によって分解される 。 あるいは、 上記式 (3) と同様の反応を経て、 次亜塩素酸ナトリウム (NaC 1〇) が実質的に生成することなく、 炭酸水素ナトリウム (N aHC03) と塩 素 (C l 2) とが反応する。 よって、 排ガスが炭酸ガスを含む場合であっても、 クロレートをほとんど発生させることなく塩素ガスは除害され、 しかも塩素ガス が選択的に除去される。 さらに、 炭酸水素ナトリウム (NaHC〇2) や炭酸ナ トリウム (Na2C03) の生成を極力抑えることが可能である。 Here, sodium hypochlorite produced by the reaction of sodium bicarbonate with (N AHC_〇 3) and chlorine (C l 2) (N a'C IO) is sulfite (and / or nitrous hydrogen sulfate) By coexisting, it is decomposed by the reaction of the above formula (2). Alternatively, through a reaction similar to the above formula (3), sodium hypochlorite (NaC10) is not substantially formed, and sodium hydrogencarbonate (NaHC0 3 ) and chlorine (Cl 2 ) Reacts. Therefore, even if the exhaust gas contains carbon dioxide, the chlorine gas is removed with little generation of chlorate, and the chlorine gas is selectively removed. Furthermore, it is possible to minimize the generation of sodium bicarbonate (NaHC_〇 2) and carbon sodium (Na 2 C0 3).

本発明の塩素ガスの除害方法において、 塩素ガスに作用させるアル力リの量は 、 前記塩素ガスを中和するのに必要な理論量の 1. 0〜1. 2倍であるが、 これ は理論量の 1. 0倍未満である場合、 塩素が十分に吸収されないおそれがあり、 1. 2倍を超えると、 炭酸塩や炭酸水素塩を生じやすいためである。 好ましくは 、 塩素ガスに作用させるアルカリの量は、 前記塩素ガスを中和するのに必要な理 論量の 1 . 0倍以上 1 . 1倍以下である。 In the chlorine gas detoxification method of the present invention, the amount of the Al force acting on the chlorine gas is 1.0 to 1.2 times the theoretical amount necessary to neutralize the chlorine gas. If it is less than 1.0 times the theoretical amount, chlorine may not be sufficiently absorbed, and if it exceeds 1.2 times, carbonates and bicarbonates are likely to be formed. Preferably The amount of alkali that acts on the chlorine gas is not less than 1.0 times and not more than 1.1 times the theoretical amount necessary to neutralize the chlorine gas.

ここで、 「塩素ガスを中和するのに必要な理論量」 とは、 排ガスに含まれる塩 素ガス全量を中和するのに必要な化学量論量を意味する。 たとえば塩素ガス l m o 1を中和するのに必要な理論量は、 アルカリとして水酸化ナトリウムを用いた 場合、 2 m o lである。 したがってこの場合、 塩素ガスを中和するのに必要な理 論量の 1 . 0 ~ 1 . 2倍とは、 2 . 0〜2 . 4モルを意味する。 塩素ガスにアル カリを 「作用」 させるとは、 具体的には塩素ガスとアルカリとを接触させて、 少 なくとも一部を反応させることを意味する。  Here, “theoretical amount necessary for neutralizing chlorine gas” means the stoichiometric amount necessary for neutralizing the total amount of chlorine gas contained in the exhaust gas. For example, the theoretical amount required to neutralize chlorine gas l m o 1 is 2 m o l when sodium hydroxide is used as the alkali. Therefore, in this case, 1.0 to 1.2 times the theoretical amount necessary to neutralize chlorine gas means 2.0 to 2.4 mol. “Alkaline” action of chlorine on chlorine gas specifically means that chlorine gas and alkali are brought into contact with each other and at least a part thereof is reacted.

上記アルカリとしては、 たとえばアルカリ金属水酸化物、 アルカリ土類金属水 酸化物等を好適に用いることができる。 アルカリ金属水酸化物、 アルカリ土類金 属水酸化物としては、 従来公知のものを使用することができる。 上記アルカリ金 属水酸化物およびアルカリ土類水酸化物は、 それぞれ単独で用いてもよいし、 組 み合わせて用いてもよい。 すなわち、 アルカリ金属水酸化物に属する複数のもの を用いてもよいし、 また、 アルカリ土類金属水酸化物に属する複数のものを組み 合わせて用いてもよいし、 これらを相互に組み合わせてもよい。 これらの中でも 、 本発明においては、 特に水酸化ナトリウムを用いることが好ましい。 なお、 ァ ルカリとして複数種を組み合わせて用いる場合、 その量は、 用いるアルカリの全 体量が上記範囲内となるようにする。  As the alkali, for example, an alkali metal hydroxide, an alkaline earth metal hydroxide, or the like can be preferably used. Conventionally known alkali metal hydroxides and alkaline earth metal hydroxides can be used. The alkali metal hydroxide and alkaline earth hydroxide may be used alone or in combination. In other words, a plurality of materials belonging to the alkali metal hydroxide may be used, a plurality of materials belonging to the alkaline earth metal hydroxide may be used in combination, or these may be combined with each other. Good. Among these, in the present invention, it is particularly preferable to use sodium hydroxide. When a plurality of alkalis are used in combination, the amount is set so that the total amount of alkali used is within the above range.

また、 上記アルカリは、 水溶液として用いられることが好ましい。 アルカリと して水酸化ナトリウムを用いる場合、 その水酸化ナトリウム水溶液の濃度は、 7 〜 2 0質量%の範囲内であることが好ましい。 7質量%未満であると、 水溶液の 液量が多くなつて容積効率の点で不利であり、 2 0質量%を超えると、 炭酸塩や 炭酸水素塩が析出し易くなるため問題である。 好ましくは、 水酸化ナトリウム水 溶液の濃度は、 9質量%以上 1 3質量%以下である。  The alkali is preferably used as an aqueous solution. When sodium hydroxide is used as the alkali, the concentration of the aqueous sodium hydroxide solution is preferably in the range of 7 to 20% by mass. If the amount is less than 7% by mass, the amount of the aqueous solution increases, which is disadvantageous in terms of volumetric efficiency. If the amount exceeds 20% by mass, carbonates and hydrogen carbonates are likely to precipitate, which is a problem. Preferably, the concentration of the aqueous sodium hydroxide solution is 9% by mass or more and 13% by mass or less.

また、 塩素ガスに作用させる亜硫酸塩および または亜硫酸水素塩の量は、 前 記塩素ガスを還元するのに必要な理論量の 1 . 0〜 1 . 2倍であるが、 これは理 論量の 1 . 0倍未満である場合、 クロレートの生成を十分に抑制することができ ないおそれがあり、 1 . 2倍を超えると、 クロレートの生成を十分に抑制するこ とは可能であるが、 高価な亜硫酸塩等を多量に用いることになるとともに、 排水 中の亜硫酸濃度が増加して化学的酸素要求量 (C O D ) が高くなるという問題が 生じるためである。'好ましくは、 塩素ガスに作用させる亜硫酸塩および/または 亜硫酸水素塩の量は、 前記塩素ガスを還元するのに必要な理論量の 1 . 0倍以上 1 . 1倍以下である。 In addition, the amount of sulfite and / or bisulfite that acts on chlorine gas is 1.0 to 1.2 times the theoretical amount necessary to reduce the chlorine gas. If it is less than 1.0 times, the production of chlorate may not be sufficiently suppressed, and if it exceeds 1.2 times, the production of chlorate will be sufficiently suppressed. This is because, however, a large amount of expensive sulfite is used, and the concentration of sulfite in the wastewater increases, resulting in an increase in chemical oxygen demand (COD). 'Preferably, the amount of sulfite and / or bisulfite that acts on chlorine gas is not less than 1.0 times and not more than 1.1 times the theoretical amount necessary to reduce the chlorine gas.

ここで、 「塩素ガスを還元するのに必要な理論量」 とは、 排ガスに含まれる塩 素ガス全量を還元するのに必要な化学量論量を意味する。 たとえば塩素ガス l m o 1を還元するのに必要な理論量は、 亜硫酸塩を用いた場合、 l m o lである。 したがってこの場合、 塩素ガスを還元するのに必要な理論量の 1 . 0〜 1 . 2倍 とは、 1 . 0 ~ 1 . 2モルを意味する。 塩素ガスに亜硫酸塩および/または亜硫 酸水素塩を 「作用」 させるとは、 具体的には塩素ガスと亜硫酸塩および または 亜硫酸水素塩を接触させて、 少なくとも一部を反応させることを意味する。 ' 上記亜硫酸塩としては、 たとえば亜硫酸ナトリウム、 亜硫酸カリウム等を好適 に用いることができる。 また、 上記亜硫酸水素塩としては、 たとえば亜硫酸水素 ナトリウム、 亜硫酸水素カリウム等を好適に用いることができる。 これらはそれ ぞれ単独で用いてもよいし、 組み合わせて用いてもよい。 これらの中でも、 本発 明においては、 特に亜硫酸ナトリゥムおよび/または亜硫酸水素ナトリゥムを用 いることが好ましい。 なお、 亜硫酸塩、 亜硫酸水素塩として複数種を組み合わせ て用いる場合、 その量は、 用いる亜硫酸塩、 亜硫酸水素塩の全体量が上記範囲内 となるようにする。  Here, “theoretical amount necessary for reducing chlorine gas” means the stoichiometric amount necessary for reducing the total amount of chlorine gas contained in the exhaust gas. For example, the theoretical amount necessary to reduce chlorine gas l m o 1 is l m o l when using sulfite. Therefore, in this case, 1.0 to 1.2 times the theoretical amount necessary to reduce chlorine gas means 1.0 to 1.2 mol. The term “acting” sulfite and / or hydrogen sulfite with chlorine gas specifically means contacting chlorine gas with sulfite and / or bisulfite to react at least partly. . 'As the sulfite, for example, sodium sulfite, potassium sulfite and the like can be preferably used. As the bisulfite, for example, sodium bisulfite, potassium bisulfite and the like can be preferably used. These may be used alone or in combination. Among these, in the present invention, it is particularly preferable to use sodium sulfite and / or sodium hydrogen sulfite. When using a combination of multiple types as sulfites and bisulfites, the total amount of sulfites and bisulfites used should be within the above range.

また、 上記亜硫酸塩および/または亜硫酸水素塩は、 水溶液として用いられる ことが好ましい。 たとえば亜硫酸ナトリウムを用いる場合、 その亜硫酸ナトリウ ム水溶液の濃度は、 2 ~ 2 0質量%の範囲内であることが好ましい。 2質量%未 満であると、 水溶液の液量が多くなつて容積効率の点で不利であり、 2 0質量% を超えると、 N a 2 S 04等が析出し易くなるため問題である。 好ましくは、 亜硫 酸ナトリウム水溶液の濃度は、 3質量%以上 1 5質量%以下である。 The sulfite and / or hydrogen sulfite is preferably used as an aqueous solution. For example, when sodium sulfite is used, the concentration of the sodium sulfite aqueous solution is preferably in the range of 2 to 20% by mass. If it is less than 2% by mass, the amount of the aqueous solution is large, which is disadvantageous in terms of volumetric efficiency. If it exceeds 20% by mass, Na 2 S 0 4 and the like are likely to precipitate, which is a problem. . Preferably, the concentration of the sodium sulfite aqueous solution is 3% by mass or more and 15% by mass or less.

塩素ガスに、 上記アルカリ水溶液と、 上記亜硫酸塩および Zまたは亜硫酸水素 塩の水溶液とを作用させる場合、 当該アルカリ水溶液と、 当該亜硫酸塩および または亜硫酸水素塩の水溶液とをそれぞれ作用させるようにしてもよく、 アル力 リならびに、 亜硫酸塩および zまたは亜硫酸水素塩を含む水溶液を作用させるよ うにしてもよい。 When the alkaline aqueous solution and the aqueous solution of sulfite and Z or bisulfite are allowed to act on chlorine gas, the alkaline aqueous solution and the aqueous solution of sulfite and / or bisulfite may be allowed to act respectively. Well, al force And an aqueous solution containing sulfite and z or bisulfite may be allowed to act.

以下、 本発明を、 図を用いて詳細に説明する。 図 1は、 本発明に好ましく用い られる塩素ガス除害システムの一例である。 なお、 以下ではアルカリとして水酸 化ナトリウム、 亜硫酸塩および または亜硫酸水素塩として亜硫酸ナトリウムを 用いた場合を例に挙げて説明する。  Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is an example of a chlorine gas abatement system preferably used in the present invention. In the following description, the case where sodium hydroxide, sulfite, and / or sodium sulfite is used as the alkali will be described as an example.

図 1において、 塩素ガス除害システムは、 第 1の吸収塔 1 0 1と、 当該第 1の 吸収塔 1 0 1に接続された第 2の吸収塔 1 0 2とを備え、 第 1の吸収塔 1 0 1か ら排出される生成物を受容するための第 1の受容器 1 0 3が第 1の吸収塔 1 0 1 に接続されている。 当該第 1の吸収塔 1 0 1にて、 排ガスを、 好ましくは連続的 に供給するとともに、 前記塩素ガスを中和するのに必要な理論量の 1 . 0 ~ 1 . 2倍の水酸化ナトリウムの水溶液、 ならびに、 前記塩素ガスを還元するのに必要 な理論量の 1 . 0〜 1 . 2倍の亜硫酸ナトリウムの水溶液を供給して、 塩素ガス を除去する工程 (工程 (A) ) が行なわれる。  In FIG. 1, the chlorine gas abatement system includes a first absorption tower 1 0 1 and a second absorption tower 1 0 2 connected to the first absorption tower 1 0 1. A first receiver 10 3 for receiving the product discharged from the tower 1 0 1 is connected to the first absorption tower 1 0 1. In the first absorption tower 101, exhaust gas is preferably continuously supplied, and sodium hydroxide in an amount of 1.0 to 1.2 times the theoretical amount necessary for neutralizing the chlorine gas is used. And a step of removing chlorine gas by supplying 1.0 to 1.2 times the theoretical amount of sodium sulfite required for reducing the chlorine gas (step (A)). It is.

第 1の吸収塔 1 0 1および第 2の吸収塔 1 0 2の内部には、 それぞれ充填物 1 0 4、 1 0 5が充填されており、 これにより、 気液の接触効率を高め、 塩素を速 やかに除害することができる。 当該充填物 1 0 4、 1 0 5としては、 たとえば、 ラシヒリング、 ポールリングなどの公知のものを使用することができ、 その材料 は、 たとえば、 フッ素樹脂、 塩化ビニル樹脂、 セラミックス、 無機ガラスなどを 挙げることができる。  The insides of the first absorption tower 1 0 1 and the second absorption tower 1 0 2 are filled with packing materials 1 0 4 and 1 0 5, respectively, thereby improving the gas-liquid contact efficiency and chlorine. Can be removed quickly. As the fillers 10 4 and 10 5, known materials such as Raschig rings and pole rings can be used, for example, and the materials include, for example, fluorine resin, vinyl chloride resin, ceramics, inorganic glass, and the like. Can be mentioned.

第 1の吸収塔 1 0 1には、 たとえば後述する所定の塩素生成プロセスにより排 出された排ガスが路 2 0 2を通って投入される。 当該排ガスは、 塩素ガスおよび 炭酸ガスを含む。 なお、 排ガスは炭酸ガスを含んでいなくてもよい。 また、 第 1 の吸収塔 1 0 1には、 排ガス中に含まれる塩素ガスを中和するのに必要な理論量 に対し 1 . 0〜 1 . 2倍の量に調整された水酸化ナトリウム、 ならびに塩素ガス を還元するのに必要な理論量に対し 1 . 0〜 1 . 2倍の量に調整された亜硫酸ナ トリウムが路 2 0 1を通って投入される。 なお、 水酸化ナトリウム水溶液および 亜硫酸ナトリウム水溶液の供給は、 それぞれ別の水溶液として路 2 0 1から行な われてもよく、 水酸化ナトリゥムおよび亜硫酸ナトリゥムを含む水溶液として路 2 0 1から行なわれてもよい。 また、 水酸化ナトリウム水溶液、 亜硫酸ナトリウ ム水溶液のいずれかを路 2 0 1とは別の図示しない路から供給してもよい。 このようにして、 第 1の吸収塔 1 0 1において、 上記したような塩素ガスおよ び炭酸ガスと、 水酸化ナトリゥムおよび亜硫酸塩ナトリゥムとの反応が生じるこ とになる。 当該反応により生成した塩化ナトリウムおよび硫酸ナトリウムは、 路 2 0 3を通って第 1の受容器 1 0 3に排出される。 第 1の受容器 1 0 3中の塩化 ナトリウムおよび硫酸ナトリウムは、 ポンプ P 1により吸引され、 交換器 1 0 6 により制御されて路 2 0 3 aを通って再び第 1の吸収塔 1 0 1内へ送出されるか 、 または、 路 2 1 0を通って排出される。 For example, exhaust gas discharged by a predetermined chlorine generation process, which will be described later, is input to the first absorption tower 10 1 through a path 2 0 2. The exhaust gas contains chlorine gas and carbon dioxide gas. The exhaust gas may not contain carbon dioxide gas. In addition, the first absorption tower 101 has sodium hydroxide adjusted to 1.0 to 1.2 times the theoretical amount necessary to neutralize chlorine gas contained in the exhaust gas, In addition, sodium sulfite adjusted to 1.0 to 1.2 times the theoretical amount necessary for reducing chlorine gas is introduced through the passageway 201. Note that the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution may be supplied as separate aqueous solutions from the route 210, and the aqueous solution containing sodium hydroxide and sodium sulfite as the aqueous solution. It may be performed from 2 0 1. Further, either a sodium hydroxide aqueous solution or a sodium sulfite aqueous solution may be supplied from a route (not shown) different from the route 201. In this way, in the first absorption tower 101, the reaction of chlorine gas and carbon dioxide as described above with sodium hydroxide and sodium sulfite occurs. Sodium chloride and sodium sulfate produced by the reaction are discharged to the first receiver 10 3 through the path 20 3. Sodium chloride and sodium sulfate in the first receiver 10 3 are sucked by the pump P 1 and controlled by the exchanger 1 0 6 and again through the path 2 0 3 a to the first absorption tower 1 0 1 To be sent in or discharged through path 2 10.

第 1の受容器 1 0 3内の処理溶液の p Hは、 7 ~ 8程度の範囲内に維持されて いる。 これにより、 炭酸ナトリウムや炭酸水素ナトリウムが析出せず、 塩素ガス 除害プロセスのサイクルに悪影響を及ぼすことがない。 また、 p Hが低くなり過 ぎることによる S〇2ガスの発生を防ぐことができる。 The pH of the treatment solution in the first receptor 10 3 is maintained in the range of about 7-8. As a result, sodium carbonate and sodium bicarbonate do not precipitate, and the cycle of the chlorine gas abatement process is not adversely affected. Further, p H can be prevented occurrence of S_〇 2 gas by be excessive too be low.

また、 塩素ガスと、 水酸化ナトリウムおよび亜硫酸ナトリウムとの作用は、 1 0〜4 0 °Cの範囲で行なわれることが好ましい。 1 0 °C未満では、 塩素ガスと、 水酸化ナトリゥムおよび亜硫酸ナトリゥムとが十分に反応しないおそれがある。 また、 4 0 °Cより高いと、 反応が激しくなり過ぎるおそれがある。 なお、 温度の 確認は、 たとえば第 1の受容器 1 0 3内の処理溶液の温度を確認することにより 行なうことができる。  The action of chlorine gas, sodium hydroxide and sodium sulfite is preferably carried out in the range of 10 to 40 ° C. Below 10 ° C, chlorine gas, sodium hydroxide and sodium sulfite may not react sufficiently. If it is higher than 40 ° C, the reaction may become too violent. The temperature can be confirmed, for example, by confirming the temperature of the treatment solution in the first receiver 10.

続いて、 第 1の吸収塔 1 0 1における工程 (A ) を経た未反応およびノまたは 再生した炭酸ガスを含む排ガスは路 2 0 4を通って第 2の吸収塔 1 0 2へ投入さ れ、 工程 (B ) が行なわれる。 ここで、 工程 (B ) は、 上記路 2 0 4を通って第 2の吸収塔 1 0 2へ供給される排ガス中に塩素ガスが含有されることを前提とし たものである。 したがって、 工程 (B ) は、 必要に応じて設けられるものであり 、 第 1の吸収塔 1 0 1にて塩素ガスの全量を除去することができる場合には、 ェ 程 (B ) を行なわなくてもよい。 本発明において、 第 1の吸収塔 1 0 1にて除害 しきれなかった塩素ガスが存在し、 これを完全に吸収除去するためには、 図 1に 示されるように、 第 2の吸収塔 1 0 2を設け、 当該第 2の吸収塔 1 0 2内におい て未反応塩素ガスを完全に吸収かつ除去することが好ましい。 以下、 工程 (B ) について説明する。 Subsequently, the exhaust gas containing unreacted and regenerated or regenerated carbon dioxide gas through the step (A) in the first absorption tower 101 is introduced into the second absorption tower 10 2 through the path 204. Step (B) is performed. Here, the step (B) is based on the premise that chlorine gas is contained in the exhaust gas supplied to the second absorption tower 10 2 through the channel 20 4. Therefore, the step (B) is provided as necessary, and if the entire amount of chlorine gas can be removed by the first absorption tower 101, the step (B) is not performed. May be. In the present invention, there is chlorine gas that could not be completely removed by the first absorption tower 101, and in order to completely absorb and remove this, as shown in FIG. 1, the second absorption tower It is preferable to provide 100 and completely absorb and remove unreacted chlorine gas in the second absorption tower 102. Hereinafter, process (B) Will be described.

第 2の吸収塔 1 0 2内には、 前記工程 (A ) を経た排ガスが供給されるととも に、 塩素ガスを中和するのに必要な理論量の 0 . 0 0 1〜 0 . 2倍のアルカリ、 ならびに、 前記塩素ガスを還元するのに必要な理論量の 0 . 0 0 1〜0 . 2倍の 亜硫酸塩および/または亜硫酸水素塩を、 路 2 0 6を通して供給する (工程 (B ) ) 。 アルカリの量が塩素ガスを中和するのに必要な理論量の 0 . 0 0 1倍未満 である場合、 塩素が十分に吸収されないおそれがあり、 0 . 2倍を超えると、 炭 酸塩や炭酸水素塩を生じやすいためである。 好ましくは、 第 2の吸収塔 1 0 2内 において塩素ガスに作用させるアル力リの量は、 前記塩素ガスを中和するのに必 要な理論量の 0 . 0 0 1倍以上0 . 1倍以下である。 また、 亜硫酸塩およびノま たは亜硫酸水素塩の量が、 塩素ガスを還元するのに必要な理論量の 0 . 0 0 1倍 未満である場合、 ク口レートの生成を十分に抑制することができないおそれがあ り、 0 . 2倍を超えると、 クロレートの生成を十分に抑制することは可能である が、 高価な亜硫酸塩等を多量に用いることになるとともに、 排水中の亜硫酸濃度 が増加して化学的酸素要求量 (C O D ) が高くなるという問題が生じるためであ る。 好ましくは、 塩素ガスに作用させる亜硫酸塩および/または亜硫酸水素塩の 量は、 前記塩素ガスを還元するのに必要な理論量の 0 . 0 0 1倍以上0 . 1倍以 下である。 なお、 ここでいう塩素ガスとは、 工程 (A) において第 1の吸収塔 1 0 1に供給される排ガス内に含まれる全塩素ガスを意味する。 これにより、 第一 吸収塔 1 0 1内では吸収 ·除去されなかった塩素ガスをも完全に吸収除去するこ とができるものである。 なお、 第 2の吸収塔 1 0 2内における塩素ガスと、 水酸 化ナトリウムおよび亜硫酸ナトリウムとの作用は、 第 1の吸収塔 1 0 1の場合と 同様に 1 0〜4 0 °Cの範囲で行なわれることが好ましく、 当該作用の結果得られ る処理溶液の ρ Ηは、 7〜8 . 5程度の範囲内に維持されることが好ましい。 第 2の吸収塔 1 0 2内に供給されるアルカリとしては、 上記したものを用いる ことができるが、 工程 (A) で使用したものと同じものを用いることが好ましい 。 また、 上記アルカリは、 水溶液として用いられることが好ましい。 アルカリと して水酸化ナトリウムを用いる場合、 その水酸化ナトリウム水溶液の濃度は、 1 〜 1 0質量%の範囲内であることが好ましい。 1質量%未満であると、 水溶液の 1 液量が多くなつて容積効率の点で不利であり、 1 0質量%を超えると、 炭酸塩や 炭酸水素塩が析出し易くなるため問題である。 好ましくは、 水酸化ナトリウム水 溶液の濃度は、 1質量%以上 5質量%以下である。 The second absorption tower 10 2 is supplied with the exhaust gas that has undergone the step (A) and has a theoretical amount of 0.001 to 0.2 that is necessary for neutralizing chlorine gas. Double alkali and 0.01 to 0.2 times the theoretical amount of sulfite and / or bisulfite required to reduce the chlorine gas is fed through path 2 06 (step ( B))). If the amount of alkali is less than 0.001 times the theoretical amount necessary to neutralize chlorine gas, chlorine may not be sufficiently absorbed. This is because hydrogen carbonate is easily generated. Preferably, the amount of the Al force acting on the chlorine gas in the second absorption tower 102 is not less than 0.001 times the theoretical amount necessary to neutralize the chlorine gas. Is less than double. In addition, if the amount of sulfite and hydrogen or bisulphite is less than 0.01 times the theoretical amount necessary to reduce chlorine gas, the formation of kurate is sufficiently suppressed. If it exceeds 0.2 times, it is possible to sufficiently suppress the production of chlorate, but a large amount of expensive sulfite will be used, and the concentration of sulfite in the wastewater will increase. This is because the problem arises that the chemical oxygen demand (COD) increases due to the increase. Preferably, the amount of sulfite and / or hydrogen sulfite that acts on chlorine gas is not less than 0.001 times and not more than 0.1 times the theoretical amount necessary to reduce the chlorine gas. The chlorine gas here means the total chlorine gas contained in the exhaust gas supplied to the first absorption tower 101 in the step (A). As a result, chlorine gas that has not been absorbed and removed in the first absorption tower 101 can be completely absorbed and removed. The action of chlorine gas, sodium hydroxide and sodium sulfite in the second absorption tower 102 is in the range of 10 to 40 ° C, as in the case of the first absorption tower 101. The ρ 行 な わ of the treatment solution obtained as a result of this action is preferably maintained within the range of about 7 to 8.5. As the alkali supplied into the second absorption tower 102, the above-mentioned alkalis can be used, but it is preferable to use the same ones used in the step (A). The alkali is preferably used as an aqueous solution. When sodium hydroxide is used as the alkali, the concentration of the aqueous sodium hydroxide solution is preferably in the range of 1 to 10% by mass. If it is less than 1% by mass, 1 A large amount of liquid is disadvantageous in terms of volumetric efficiency, and if it exceeds 10% by mass, it is a problem because carbonates and bicarbonates are likely to precipitate. Preferably, the concentration of the aqueous sodium hydroxide solution is 1% by mass or more and 5% by mass or less.

第 2の吸収塔 1 0 2内に供給される亜硫酸塩および Zまたは亜硫酸水素塩とし ては、 上記したものを用いることができるが、 工程 (A) で使用したものと同じ ものを用いることが好ましい。 また、 上記亜硫酸塩および/または亜硫酸水素塩 は、 水溶液として用いられることが好ましい。 たとえば亜硫酸ナトリウムを用い る場合、 その亜硫酸ナトリウム水溶液の濃度は、 2〜2 0質量%の範囲内である ことが好ましい。 2質量%未満であると、 水溶液の液量が多くなつて容積効率の 点で不利であり、 2 0質量%を超えると、 N a 2 S 04等が析出し易くなるため問 題である。 好ましくは、 亜硫酸ナトリウム水溶液の濃度は、 3質量%以上 1 5質 量%以下である。 As the sulfite and Z or hydrogen sulfite supplied into the second absorption tower 102, those described above can be used, but the same as those used in step (A) can be used. preferable. The sulfite and / or hydrogen sulfite is preferably used as an aqueous solution. For example, when sodium sulfite is used, the concentration of the sodium sulfite aqueous solution is preferably in the range of 2 to 20% by mass. If the amount is less than 2% by mass, the amount of the aqueous solution is large, which is disadvantageous in terms of volumetric efficiency. If the amount exceeds 20% by mass, Na 2 S 0 4 and the like are likely to precipitate, which is a problem. . Preferably, the concentration of the sodium sulfite aqueous solution is 3% by mass or more and 15% by mass or less.

なお、 第 2の吸収塔 1 0 2における水酸化ナトリウム水溶液および亜硫酸ナト リウム水溶液の供給は、 それぞれ別の水溶液として路 2 0 6から行なわれてもよ く、 水酸化ナトリウムおよび亜硫酸ナトリウムを含む水溶液として路 2 0 6から 行なわれてもよい。 また、 水酸化ナトリウム水溶液、 亜硫酸ナトリウム水溶液の いずれかを路 2 0 6とは別の図示しない路から供給してもよい。  The supply of the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution in the second absorption tower 102 may be carried out as separate aqueous solutions from the passage 206, respectively, and the aqueous solution containing sodium hydroxide and sodium sulfite. May be performed from road 2 0 6 as follows. Further, either a sodium hydroxide aqueous solution or a sodium sulfite aqueous solution may be supplied from a route (not shown) different from the route 206.

以上のような工程 (B ) を経て、 第 2の吸収塔 1 0 2の頂部に設けられた路 2 0 8から、 未反応および/または再生した炭酸ガスゃ排ガスに含まれていたその 他のガスが放出される。 また、 第 2の吸収塔 1 0 2の底部からは、 未反応の水酸 化ナトリウム、 塩化ナトリウムおよび硫酸ナトリウム (炭酸水素ナトリウム等も 含み得る) が路 2 0 9を通って排出され、 これらの水酸化ナトリウム、 塩化ナト リウムおよび硫酸ナトリウムは、 ポンプ P 2により吸引され、 交換器 1 0 7によ り、 路 2 0 5または路 2 0 7のいずれかに送出される。  Through the process (B) as described above, other unreacted and / or regenerated carbon dioxide contained in the exhaust gas from the channel 2 08 provided at the top of the second absorption tower 10 2. Gas is released. Also, from the bottom of the second absorption tower 102, unreacted sodium hydroxide, sodium chloride, and sodium sulfate (which may also include sodium hydrogen carbonate, etc.) are discharged through the path 210, Sodium hydroxide, sodium chloride and sodium sulfate are sucked by the pump P 2 and sent to either the path 2 0 5 or the path 2 0 7 by the exchanger 1 07.

路 2 0 7を通って送出された場合は、 路 2 0 3 aを通って再び第 1の吸収塔 1 0 1内へ投入される。 路 2 0 3 aを通って第 1の吸収塔 1 0 1内へ供給された塩 化ナトリゥムおよび硫酸ナトリゥムは、 第 1の吸収塔 1 0 1の底部から路 2 0 3 を通って第 1の受容器 1 0 3へ排出される。 また、 路 2 0 5を通って第 2の吸収 塔 1 0 2へ供給された水酸化ナトリゥム、 塩化ナトリゥムおよび硫酸ナトリゥム 2 においては、 水酸化ナトリウム (および炭酸水素ナトリウム) は第 2の吸収塔 1 0 2内で再び塩素ガスとの反応に寄与し、 塩化ナトリゥムおよび硫酸ナトリゥム はそのまま底部から排出され、 上記のサイクルを繰り返す。 When it is sent through the path 2 0 7, it is again put into the first absorption tower 1 0 1 through the path 2 0 3 a. The sodium chloride and sodium sulfate fed into the first absorption tower 1 0 1 through the path 2 0 3 a are passed from the bottom of the first absorption tower 1 0 1 through the path 2 0 3 to the first It is discharged to the receiver 1 0 3. In addition, sodium hydroxide, sodium chloride and sodium sulfate supplied to the second absorption tower 10 2 through the path 2 0 5 2, sodium hydroxide (and sodium hydrogen carbonate) again contributes to the reaction with chlorine gas in the second absorption tower 10 2, and sodium chloride and sodium sulfate are discharged from the bottom as they are, and the above cycle is repeated. repeat.

次に、 第 1の吸収塔 1 0 1内および第 2の吸収塔 1 0 2内へ供給する水酸化ナ トリウム水溶液および亜硫酸ナトリウム水溶液の制御方法について、 図 2を用い て説明する。 図 2は、 本発明の塩素の除害方法に好ましく用いられる塩素ガス除 害システムの別の例を示す模式図である。 なお、 図 2において説明しない番号の 構成は、 図 1のものと同一である。  Next, a method of controlling the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution supplied into the first absorption tower 101 and the second absorption tower 102 will be described with reference to FIG. FIG. 2 is a schematic view showing another example of a chlorine gas removal system preferably used in the chlorine removal method of the present invention. Note that the configuration of numbers not described in FIG. 2 is the same as that of FIG.

図 2において、 路 2 0 2には塩素ガスモニタおよび流量計 1 0 8が接続され、 路 2 0 2を通過する排ガス中の塩素ガスの濃度および流量を連続的に測定する。 また、 塩素ガスモニタおよび流量計 1 0 8には、 制御装置 1 0 9が接続され、 塩 素ガスモニタおよび流量計 1 0 8からの信号を受信する。 ここで、 連続的に測定 するとは、 間断なく、 または、 1 0分以下の間隔で断続的に測定することを意味 する。  In FIG. 2, a chlorine gas monitor and a flow meter 10 8 are connected to the path 2 0 2, and the concentration and flow rate of chlorine gas in the exhaust gas passing through the path 2 0 2 are continuously measured. The chlorine gas monitor and flow meter 10 8 is connected with a control device 10 9 and receives signals from the chlorine gas monitor and flow meter 10 8. Here, continuous measurement means that measurement is performed intermittently or at intervals of 10 minutes or less.

さらに、 制御装置 1 0 9には、 第 1の水溶液供給装置 1 1 0および第 2の水溶 液供給装置 1 1 1が接続され、 当該第 1の水溶液供給装置 1 1 0は、 水酸化ナト リゥムおよび亜硫酸ナトリゥムを含む水溶液を保有し、 これを路 2 0 1を介して 第 1の吸収塔 1 0 1内に供給し、 また、 当該第 2の水溶液供給装置 1 1 1は、 水 酸化ナトリゥムおよび亜硫酸ナトリゥムを含む水溶液を保有し、 これを路 2 0 6 を介して第 2の吸収塔 1 0 2内に供給する。 なお、 図示しない別の水溶液供給装 置が制御装置 1 0 9に接続され、 水酸化ナトリゥム水溶液と亜硫酸ナトリゥム水 溶液とを別々に第 1の吸収塔 1 0 1内および第 2の吸収塔 1 0 2内に供給するよ うにしてもよい。 この場合、 第 1の吸収塔 1 0 1内および第 2の吸収塔 1 0 2内 に供給されるそれぞれの水酸化ナトリゥム水溶液と亜硫酸ナトリゥム水溶液とは 、 同じ路 2 0 1および路 2 0 6を介して供給されてもよく、 図示しない別の路を 併用して異なる路から供給されてもよい。  Further, a first aqueous solution supply device 110 and a second aqueous solution supply device 11 1 1 are connected to the control device 109, and the first aqueous solution supply device 110 is a sodium hydroxide solution. And an aqueous solution containing sodium sulfite, which is supplied into the first absorption tower 1 0 1 via the path 2 0 1, and the second aqueous solution supply device 1 1 1 includes sodium hydroxide and 1 An aqueous solution containing sodium sulfite is held, and this is supplied into the second absorption tower 10 2 via the path 2 0 6. Note that another aqueous solution supply device (not shown) is connected to the control device 109, and separates the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution into the first absorption tower 10 0 1 and the second absorption tower 1 0 separately. 2 may be supplied. In this case, the sodium hydroxide aqueous solution and the sodium sulfite aqueous solution supplied into the first absorption tower 101 and the second absorption tower 102 are respectively connected to the same passage 2 0 1 and passage 2 0 6. It may be supplied via a different route, or a different route not shown in the figure may be used in combination.

次に、 これらの装置を用いた制御について説明する。 まず、 塩素ガスモニタお よび流量計 1 0 8によって測定された路 2 0 2を通過する排ガス中の塩素ガスの 濃度および流量に関する信号が、 制御装置 1 0 9に送信される。 当該信号を受信 した制御装置 1 0 9は、 当該制御装置 1 0 9内に組み込まれたプログラムによつ て、 塩素ガスを中和するのに必要な水酸化ナトリゥムの理論量および塩素ガスを 還元するのに必要な亜硫酸ナトリゥムの理論量が計算され、 当該計算値に対して 1 . 0 ~ 1 . 2倍の量および 0 . 0 0 1 ~ 0 . 2倍の量が算出される。 Next, control using these devices will be described. First, a signal related to the concentration and flow rate of chlorine gas in the exhaust gas passing through the path 2 0 2 measured by the chlorine gas monitor and the flow meter 1 0 8 is transmitted to the control device 1 0 9. Receive the signal The control device 10 9 is required to reduce the theoretical amount of sodium hydroxide and the chlorine gas required to neutralize chlorine gas by the program incorporated in the control device 10 9. The theoretical amount of sodium sulfite is calculated, and the amount of 1.0 to 1.2 times and the amount of 0.0 0 1 to 0.2 times the calculated value is calculated.

次いで、 制御装置 1 0 9は、 当該算出結果に応じて、 第 1の水溶液供給装置 1 1 0および第 2の水溶液供給装置 1 1 1を制御して、 上記算出結果に基づき第 1 の吸収塔 1 0 1および第 2の吸収塔 1 0 2に供給される水酸化ナトリゥムおよび 亜硫酸ナトリウムを含む水溶液の量 (または、 水酸化ナトリウム水溶液、 亜硫酸 ナトリウム水溶液それぞれの量) を調節する。  Next, the control device 1 09 controls the first aqueous solution supply device 1 1 0 and the second aqueous solution supply device 1 1 1 according to the calculation result, and based on the calculation result, the first absorption tower The amount of the aqueous solution containing sodium hydroxide and sodium sulfite supplied to 101 and the second absorption tower 102 (or the amount of each of the aqueous sodium hydroxide solution and the aqueous sodium sulfite solution) is adjusted.

当該制御装置 1 0 9の制御には、 第 1の水溶液供給装置 1 1 0から第 1の吸収 塔 1 0 1内へ供給される水酸化ナトリゥムおよび亜硫酸ナトリゥムを含む水溶液 (または、 水酸化ナトリウム水溶液、 亜硫酸ナトリウム水溶液それぞれ) の濃度 および流量が含まれる。 また、 同様に、 当該制御には、 第 2の水溶液供給装置 1 1 1から第 2の吸収塔 1 0 2内へ供給される水酸化ナトリゥムおよび亜硫酸ナト リウムを含む水溶液 (または、 水酸化ナトリウム水溶液、 亜硫酸ナトリウム水溶 液それぞれ) の濃度および流量が含まれる。  For the control of the control device 1 0 9, an aqueous solution containing sodium hydroxide and sodium sulfite supplied from the first aqueous solution supply device 1 1 0 into the first absorption tower 1 0 1 (or an aqueous sodium hydroxide solution) Concentration and flow rate of sodium sulfite aqueous solution). Similarly, the control includes an aqueous solution (or sodium hydroxide aqueous solution) containing sodium hydroxide and sodium sulfite supplied from the second aqueous solution supply device 1 1 1 into the second absorption tower 10 2. And sodium sulfite aqueous solution, respectively).

このようにして、 制御装置 1 0 9を用いた制御により、 人による管理を低減で きる。 また、 排ガス中の塩素ガス濃度は一定でないため、 供給する水酸化ナトリ ゥムおよび亜硫酸ナトリウムを含む水溶液 (または、 水酸化ナトリウム水溶液、 亜硫酸ナトリウム水溶液それぞれ) の微調整が困難であるが、 制御装置 1 0 9を 用いて制御することにより、 微調整が可能となり、 より確実に塩素の吸収除去が 可能となり、 炭酸塩等の析出も防止でき、 さらには、 クロレートの発生をより確 実に抑止することができる。  In this way, management by the control device 109 can reduce human management. Moreover, since the chlorine gas concentration in the exhaust gas is not constant, it is difficult to fine-tune the aqueous solution containing sodium hydroxide and sodium sulfite (or sodium hydroxide aqueous solution and sodium sulfite aqueous solution, respectively) to be supplied. By using 1 0 9 to control, fine adjustment is possible, chlorine absorption and removal can be more reliably performed, precipitation of carbonates and the like can be prevented, and generation of chlorate can be more reliably suppressed. Can do.

また、 図 2において、 第 1の吸収塔 1 0 1に接続された路 2 0 4および第 2の 吸収塔 1 0 2に接続された路 2 0 8には、 それぞれ図示しない第 1の塩素ガスモ 二夕および第 2の塩素ガスモニタが接続されていることが好ましい。 当該ガスモ 二夕は、 それぞれ第 1の吸収塔 1 0 1および第 2の吸収塔 1 0 2の頂部に設置す ることもできる。 これにより、 第 1の吸収塔 1 0 1から第 2の吸収塔 1 0 2へ供 給されるガス中の塩素ガス濃度を測定することができ、 当該測定により、 第 2の 4 吸収塔 1 0 2への過剰な塩素ガスの供給がある場合などに、 システム中の異常事 態への対処を容易とすることができる。 また、 当該モニタと制御装置 1 0 9とを 接続させて、 第 2の吸収塔 1 0 2へ供給する水酸化ナトリウムおよび亜硫酸ナト リウムを含む水溶液 (または、 水酸化ナトリウム水溶液、 亜硫酸ナトリウム水溶 液それぞれ) の供給量を制御させることもできる。 In FIG. 2, a path 2 0 4 connected to the first absorption tower 10 1 and a path 2 0 8 connected to the second absorption tower 1 0 2 are respectively connected to a first chlorine gas module (not shown). It is preferred that a tanabata and a second chlorine gas monitor are connected. The gas module can also be installed at the top of the first absorption tower 101 and the second absorption tower 102, respectively. As a result, the chlorine gas concentration in the gas supplied from the first absorption tower 1001 to the second absorption tower 1002 can be measured. 4 When there is an excessive supply of chlorine gas to the absorption tower 102, it is possible to easily deal with abnormal situations in the system. In addition, an aqueous solution containing sodium hydroxide and sodium sulfite supplied to the second absorption tower 102 by connecting the monitor and the control device 109 (or an aqueous solution of sodium hydroxide and an aqueous solution of sodium sulfite, respectively) ) Can be controlled.

同様に、 第 2の塩素ガスモニタを設置することにより、 第 2の吸収塔 1 0 2か ら外部へ放出されるガス中の塩素ガス濃度を測定することができ、 当該測定によ り、 外部への過剰な塩素ガスの供給がある場合などに、 システムの稼動を中止さ せることにより、 外部への塩素の過剰な放出を防止することができる。 また、 当 該モニタと制御装置 1 0 9とを接続させて、 第 2の吸収塔 1 0 2へ供給する水酸 化ナトリウムおよび亜硫酸ナトリウムを含む水溶液 (または、 水酸化ナトリウム 水溶液、 亜硫酸ナトリウム水溶液それぞれ) の供給量を制御させ、 外部へ放出さ れる塩素ガスを消滅させることもできる。  Similarly, by installing a second chlorine gas monitor, it is possible to measure the chlorine gas concentration in the gas released from the second absorption tower 10 2 to the outside. Excessive chlorine release to the outside can be prevented by stopping the system operation when there is an excessive supply of chlorine gas. Also, an aqueous solution containing sodium hydroxide and sodium sulfite to be supplied to the second absorption tower 102 by connecting the monitor and the control device 109 (or an aqueous solution of sodium hydroxide and an aqueous solution of sodium sulfite, respectively) ) Can be controlled to extinguish chlorine gas released to the outside.

次に、 図 1および図 2において、 路 2 0 2から供給される塩素ガス含有排ガス について説明する。 本発明の塩素ガスの除害方法に供される塩素ガスを含む排ガ スは、 塩素ガスを含むガス、 または塩素ガスおよび炭酸ガスを含むガスであれば 特に制限されるものではないが、 本発明の塩素ガスの除害方法は、 たとえば塩化 水素を含むガスを、 酸素を含むガスを用いて酸化する塩素の製造方法であって、 以下の (1 ) 反応工程、 (2 ) 吸収工程、 (3 ) 乾燥工程、 および (4 ) 精製ェ 程、 を有する塩素の製造方法によって排出される排ガスに対しても好適に用いる ことができる。  Next, in FIG. 1 and FIG. 2, the chlorine gas-containing exhaust gas supplied from the passage 220 will be described. The exhaust gas containing chlorine gas used in the chlorine gas detoxification method of the present invention is not particularly limited as long as it is a gas containing chlorine gas or a gas containing chlorine gas and carbon dioxide gas. The chlorine gas detoxification method of the invention is a chlorine production method in which, for example, a gas containing hydrogen chloride is oxidized using a gas containing oxygen, comprising the following (1) reaction step, (2) absorption step, ( It can also be suitably used for exhaust gas discharged by a chlorine production method comprising: 3) a drying step; and (4) a purification step.

( 1 ) 反応工程:ルテニウムおよび Zまたはルテニウム化合物を含む触媒の存 在下、 塩化水素を含むガスを酸素で酸化し、 塩素、 水、 未反応塩化水素および未 反応酸素を主成分とするガスを得る工程。  (1) Reaction process: In the presence of a catalyst containing ruthenium and Z or a ruthenium compound, a gas containing hydrogen chloride is oxidized with oxygen to obtain a gas mainly composed of chlorine, water, unreacted hydrogen chloride and unreacted oxygen. Process.

( 2 ) 吸収工程:反応工程で得た塩素、 水、 未反応塩化水素および未反応酸素 を主成分とするガスを、 水および/または塩酸水と接触させることにより、 およ びノまたは、 冷却することにより、 塩化水素と水を主成分とする溶液を回収し、 塩素と未反応酸素を主成分とするガスを得る工程。  (2) Absorption process: by contacting the gas mainly composed of chlorine, water, unreacted hydrogen chloride and unreacted oxygen obtained in the reaction process with water and / or hydrochloric acid water and cooling or cooling A step of recovering a solution mainly composed of hydrogen chloride and water to obtain a gas mainly composed of chlorine and unreacted oxygen.

( 3 ) 乾燥工程:吸収工程で得たガス中の水分を除去することにより.、 乾燥し たガスを得る工程。 (3) Drying process: By removing the moisture in the gas obtained in the absorption process. Obtaining the necessary gas.

( 4 ) 精製工程:乾燥工程で得た乾燥したガスを、 塩素を主成分とする液体ま たはガスと未反応酸素を主成分とするガスとに分離することにより塩素を得るェ 程。 当該精製工程における未反応酸素を主成分とするガスの少なくとも一部が、 本発明における排ガスとなるものである。  (4) Purification step: The step of obtaining chlorine by separating the dried gas obtained in the drying step into a liquid or gas mainly containing chlorine and a gas mainly containing unreacted oxygen. At least a part of the gas mainly composed of unreacted oxygen in the purification process becomes the exhaust gas in the present invention.

上記各工程について、 図 3を用いて具体的に説明する。 図 3は、 酸素ガスと塩 化水素ガスとから塩素ガスを製造するプロセスに用いるシステムの一例を示す模 式図である。  Each of the above steps will be specifically described with reference to FIG. FIG. 3 is a schematic diagram showing an example of a system used in a process for producing chlorine gas from oxygen gas and hydrogen chloride gas.

図 3において、 原料の塩化水素ガスは、 路 2 2 2を通って前処理塔 1 1 6に投 入される。 原料の塩化水素ガスとしては、 塩素化合物の熱分解反応等において発 生する塩化水素のように、 当該分野で公知のプロセスにより発生した塩化水素含 有ガスを用いることができる。 この際、 不純物として、 一酸化炭素、 ホスゲン、 硫化水素、 二酸化硫黄、 四塩化炭素、 クロ口ベンゼンおよびジクロロベンゼン等 が含まれるが、 上記前処理塔 1 1 6において、 当該不純物を除去するものである 。 なお、 原料の塩化水素ガス中には、 塩化水素ガスが 5 0体積%程度以上含まれ ていることが好ましい。  In FIG. 3, the raw material hydrogen chloride gas is fed into the pretreatment tower 1 1 6 through path 2 2 2. As the raw material hydrogen chloride gas, a hydrogen chloride-containing gas generated by a process known in the art such as hydrogen chloride generated in a pyrolysis reaction of a chlorine compound can be used. In this case, carbon monoxide, phosgene, hydrogen sulfide, sulfur dioxide, carbon tetrachloride, black benzene, dichlorobenzene, and the like are included as impurities. In the pretreatment tower 1 1 6, the impurities are removed. is there . The raw hydrogen chloride gas preferably contains about 50% by volume or more of hydrogen chloride gas.

前処理塔 1 1 6において不純物が除去された原料塩化水素ガスは、 路 2 2 1を 通って投入された酸素ガスと共に路 2 2 3を通って反応塔 1 1 7へ投入される。 当該酸素ガスは、 酸素または空気を用いることができるが、 好ましくは酸素濃度 が 8 0体積%以上のものが好ましい。  The raw material hydrogen chloride gas from which impurities have been removed in the pretreatment tower 1 1 6 is introduced into the reaction tower 1 1 7 through the path 2 2 3 together with the oxygen gas introduced through the path 2 2 1. As the oxygen gas, oxygen or air can be used, but preferably the oxygen concentration is 80% by volume or more.

当該反応塔 1 1 7において、 上記反応工程に示した反応が行われる。 すなわち 、 ルテニウムおよび/またはルテニウム化合物を含む触媒の存在下、 前処理塔 1 1 6で処理された塩化水素を含むガスを、 酸素を含むガスで酸化し、 塩素、 水、 未反応塩化水素および未反応酸素を主成分とするガスを得る。 塩化水素を酸素で 酸化するに際しては、 ルテニウムおよびノまたはルテニウム化合物を含む触媒を 用い、 固定床反応器にて反応させる。 このことにより、 触媒成分の揮発や飛散に よる配管等の閉塞トラブルを伴わず、 かつ揮発や飛散した触媒成分の処理工程を 必要とせず、 また平衡的に有利な温度で塩素を製造できるために、 未反応塩化水 素と水を回収する工程、 塩素と未反応酸素を分離する工程および未反応酸素を反 応に供給する工程を簡略化し、 よって設備コストおよび運転コストを低く抑制し 得る。 In the reaction tower 1 1 7, the reaction shown in the reaction step is performed. That is, in the presence of a catalyst containing ruthenium and / or a ruthenium compound, a gas containing hydrogen chloride treated in the pretreatment tower 1 16 is oxidized with a gas containing oxygen, and chlorine, water, unreacted hydrogen chloride and unreacted A gas mainly composed of reactive oxygen is obtained. When hydrogen chloride is oxidized with oxygen, it is reacted in a fixed bed reactor using a catalyst containing ruthenium and a ruthenium or ruthenium compound. As a result, it is possible to produce chlorine at a temperature that is balanced and advantageous, without causing troubles such as piping clogging due to volatilization or scattering of the catalyst component, without requiring a treatment process for the volatilized or scattered catalyst component. Recovering unreacted hydrogen chloride and water, separating chlorine and unreacted oxygen, and reacting unreacted oxygen Therefore, it is possible to simplify the process of supplying the product and to keep the equipment cost and operation cost low.

ルテニウムおよび zまたはルテニウム化合物を含む触媒としては、 公知の触媒 As catalysts containing ruthenium and z or ruthenium compounds, known catalysts

(特開平 9 - 6 7 1 03号公報、 特開平 1 0— 1 82 1 04号公報、 特開平 1 0 - 1 94705号公報、 特開平 1 0— 338 502号公報、 特開平 1 1一 1 80 70 1号公報) を用いることができる。 中でも酸化ルテニウムを含む触媒が好ま しい。 更に、 触媒中の酸化ルテニウムの含有量は、 0. 1~20質量%が好まし レ^ 酸化ルテニウムの量が過小であると触媒活性が低く塩化水素の転化率が低く なる場合があり、 一方、 酸化ルテニウムの量が過多であると触媒価格が高くなる 場合がある。 たとえば、 特開平 1 0— 338502号公報には、 酸化ルテニウム の含有量が 0. 1~20質量%であり、 酸化ルテニウムの中心径が 1. 0~1 0 . 0ナノメートルである担持酸化ルテニウム触媒または酸化ルテニウム複合酸化 物型触媒が記載されている。 (Japanese Patent Laid-Open No. 9-6 7 103, Japanese Patent Laid-Open No. 10-1 82 1 04, Japanese Patent Laid-Open No. 10-1 94705, Japanese Patent Laid-Open No. 10-338 502, Japanese Patent Laid-Open No. 11-11 80 70 1 gazette) can be used. Of these, catalysts containing ruthenium oxide are preferred. Further, the content of ruthenium oxide in the catalyst is preferably 0.1 to 20% by mass. If the amount of ruthenium oxide is too small, the catalytic activity may be low and the conversion rate of hydrogen chloride may be low. If the amount of ruthenium oxide is excessive, the catalyst price may increase. For example, Japanese Patent Application Laid-Open No. 10-338502 discloses a supported ruthenium oxide having a ruthenium oxide content of 0.1 to 20% by mass and a ruthenium oxide central diameter of 1.0 to 10.0 nanometers. Catalysts or ruthenium oxide composite oxide type catalysts are described.

上記反応塔 1 1 7において行われた触媒反応により生成した、 塩素、 水、 未反 応塩化水素およぴ未反応酸素を主成分とするガスは、 路 224を通って吸収塔 1 18へ投入される。 ここで、 上述した吸収工程が行われる。 すなわち、 反応工程 で得た塩素、 水、 未反応塩化水素および未反応酸素を主成分とするガスを、 路 2 36より供給される水および Zまたは塩酸と接触させることにより、 および/ま たは、 冷却することにより、 塩化水素と水を主成分とする溶液を回収し、 塩素と 未反応酸素を主成分とするガスを得る。 得られたガスは、 路 22 5を通って乾燥 塔 1 1 9へ供給されることになる。 また、 塩化水素と水とを主成分とする溶液は 、 路 237を通って塩酸吸収塔 1 22に投入される。  Gas mainly composed of chlorine, water, unreacted hydrogen chloride, and unreacted oxygen generated by the catalytic reaction performed in the above reaction tower 1 1 7 is input to the absorption tower 1 18 through the path 224. Is done. Here, the absorption process mentioned above is performed. That is, by bringing the gas mainly composed of chlorine, water, unreacted hydrogen chloride and unreacted oxygen obtained in the reaction step into contact with water and Z or hydrochloric acid supplied from line 2 36, and / or By cooling, a solution containing hydrogen chloride and water as main components is recovered, and a gas containing chlorine and unreacted oxygen as main components is obtained. The obtained gas will be supplied to the drying tower 1 1 9 through the path 2225. Further, a solution containing hydrogen chloride and water as main components is introduced into the hydrochloric acid absorption tower 122 through a path 237.

上記吸収工程において、 接触温度は 0〜 1 00°C、 圧力は 0. 05〜 lMP a で行われることが好ましい。 接触させる塩酸水の濃度は、 25質量%以下が好ま しい。 また、 塩素水和物析出防止のために、 特開 2 003— 26 1 306号公報 に記載の方法を採用することが好ましい。  In the absorption step, the contact temperature is preferably 0 to 100 ° C. and the pressure is 0.05 to lMPa. The concentration of hydrochloric acid to be contacted is preferably 25% by mass or less. In order to prevent the precipitation of chlorine hydrate, it is preferable to employ the method described in JP-A No. 2003-261306.

次に、 乾燥塔 1 1 9において上述した乾燥工程が行われる。 すなわち、 吸収ェ 程で得たガス中の水分を除去する。 乾燥工程後のガス中の水分は 0. 5mgZ l 以下、 好ましくは 0. lmg/ 1以下である。 ガス中の水分を除去する化合物と しては、 硫酸、 塩化カルシウム、 過塩素酸マグネシウム、 ゼォライトなどがあげ られるが、 中でも硫酸が好ましい。 Next, the drying step described above is performed in the drying tower 1 1 9. That is, moisture in the gas obtained in the absorption process is removed. The moisture in the gas after the drying step is 0.5 mgZ 1 or less, preferably 0.1 mg / 1 or less. A compound that removes moisture in the gas and Examples thereof include sulfuric acid, calcium chloride, magnesium perchlorate, and zeolite. Among them, sulfuric acid is preferable.

硫酸の濃度は、 9 0質量%以上が好ましい。 硫酸濃度が 9 0質量%よりも小さ いと、 ガス中の水分が十分に除去されないことがある。 接触温度は 0 ~ 8 0 °C、 圧力は 0 . 0 5〜 I M P aで行われることが好ましい。 また、 当該乾燥工程に用 いた硫酸の廃液は、 路 2 3 9を通って廃棄されることになる。 なお、 乾燥剤とし て硫酸を用いた場合には、 乾燥工程の直後で硫酸ミストを除去することが好まし レ たとえば、 プリンクエリミネ一タゃ特開 2 0 0 3— 1 8 1 2 3 5号公報に記 載の方法を用いることができる。  The concentration of sulfuric acid is preferably 90% by mass or more. If the sulfuric acid concentration is less than 90% by mass, the moisture in the gas may not be removed sufficiently. The contact temperature is preferably 0 to 80 ° C and the pressure is preferably 0.05 to IMPa. In addition, the waste liquid of sulfuric acid used in the drying process will be disposed through Route 2 39. When sulfuric acid is used as the desiccant, it is preferable to remove the sulfuric acid mist immediately after the drying process. For example, purine query miner is disclosed in Japanese Patent Application Laid-Open No. 2 0 0 3-1 8 1 2 3 5 The method described in the gazette can be used.

乾燥工程によって水分を除去されたガスは、 次いで、 路 2 2 6を通り塩素精製 塔 1 2 1へ供給される。 ここで、 塩素精製塔 1 2 1に供給される前に、 必要に応 じてコンプレッサを介することもある。 当該コンプレッサにより、 水分除去後の ガスを圧縮して塩素の液化を容易とする。  The gas from which moisture has been removed by the drying process is then supplied to the chlorine purification tower 1 2 1 through path 2 26. Here, before being supplied to the chlorine purification tower 1 2 1, it may be passed through a compressor if necessary. With this compressor, the gas after moisture removal is compressed to facilitate liquefaction of chlorine.

次いで、 塩素精製塔 1 2 1において、 上述した精製工程が行われる。 すなわち 、 乾燥工程で得たガスを、 塩素を主成分とする液体またはガスと未反応酸素を主 成分とするガスとに分離することにより塩素を得る。 塩素を主成分とする液体ま たはガスと未反応酸素を主成分とするガスとに分離する方法としては、 圧縮およ び/または冷却する方法、 および/または公知の方法 (特開平 3— 2 6 2 5 1 4 号公報、 特表平 1 1 一 5 0 0 9 5 4号公報) が挙げられる。  Next, the above-described purification process is performed in the chlorine purification tower 1 2 1. That is, chlorine is obtained by separating the gas obtained in the drying step into a liquid or gas containing chlorine as a main component and a gas containing unreacted oxygen as a main component. As a method for separating the liquid or gas mainly containing chlorine and the gas mainly containing unreacted oxygen, a method of compressing and / or cooling, and / or a known method (Japanese Patent Laid-Open No. Hei 3). No. 2 6 2 5 1 4 and No. 1 1 1 5 0 0 9 5 4).

たとえば、 乾燥工程で得たガスを圧縮および または冷却することによって、 塩素を主成分とする液体が未反応酸素を主成分とするガスと分離される。 塩素の 液化は、 圧力と温度で規定される塩素が液体状態で存在しうる範囲で実施される 。 その範囲で低温にすればするほど、 圧縮圧力が低くなるために圧縮動力は小さ くできるが、 工業的には設備等の問題から、 圧縮圧力と冷却温度はこの範囲内の 最適な経済条件を考慮して決められる。 通常の運転においては、 塩素液化の圧縮 圧力は 0 . 5〜 5 M P a、 冷却温度は— 7 0〜4 0 °Cで行われる。  For example, by compressing and / or cooling the gas obtained in the drying step, a liquid containing chlorine as a main component is separated from a gas containing unreacted oxygen as a main component. The liquefaction of chlorine is carried out to the extent that chlorine specified by pressure and temperature can exist in the liquid state. The lower the temperature is within this range, the lower the compression pressure, so the compression power can be reduced. However, industrially, due to problems with equipment, the compression pressure and cooling temperature must be within the optimal economic conditions within this range. It is decided in consideration. In normal operation, the compression pressure for liquefaction of chlorine is 0.5 to 5 MPa and the cooling temperature is -70 to 40 ° C.

得られた塩素を主成分とする液体は、 路 2 2 8を通って採取され、 そのまま、 あるいは一部または全部を気化させた後、 塩化ビエル、 ホスゲンなどの原料とし て用いることができる。 一部または全部を気化させた後に用いる場合は、 乾燥ェ 程で得られるガスとの熱交換を行うことにより、 気化に必要な熱の一部を得ると 同時に、 乾燥工程で得られるガス中の塩素の液化に必要な外部冷媒による冷却負 荷を削減することが可能である。 同様に、 塩素精製塔 1 2 1の還流液の冷却に用 いることもできる。 The obtained liquid containing chlorine as a main component is collected through the route 2 28 and can be used as it is, or after partially or fully vaporized, and used as a raw material for vinyl chloride, phosgene and the like. When part or all of the product is vaporized, By exchanging heat with the gas obtained in the process, a part of the heat necessary for vaporization is obtained, and at the same time, the cooling load by the external refrigerant necessary for liquefaction of chlorine in the gas obtained in the drying process is reduced. It is possible. Similarly, it can be used for cooling the reflux liquid of the chlorine purification tower 1 2 1.

上記精製工程において、 未反応の酸素を主成分とするガスの大部分は、 路 2 3 0を通って反応工程に循環されるか、 または、 路 2 2 9を通って排ガスとして処 理されることになる。 ここで、 当該未反応の酸素を主成分とするガス中には、 塩 素ガスが含まれている場合もある。 本発明は、 このような排ガス中の塩素ガスを 除害の対象の 1つとするものである。  In the above purification process, most of the gas mainly composed of unreacted oxygen is circulated to the reaction process through path 2 30 or treated as exhaust gas through path 2 29. It will be. Here, the gas mainly composed of unreacted oxygen may contain a chlorine gas. In the present invention, chlorine gas in such exhaust gas is one of the targets for detoxification.

上述したように、 未反応の酸素を主成分とするガスの一部または全部は、 路 2 3 0辛通って上述の循環工程に供される。 すなわち、 当該未反応酸素を主成分と するガスの一部または全部を反応工程に用いる酸素として供給する。 反応工程へ 供給するガス中に硫酸ミストが含有される場合は、 硫酸ミストを除去することが 好ましい。 すなわち、 路 2 4 0を通って水が供給されている洗浄塔 1 2 0におい て、 硫酸ミストを除去して、 上記ガスを洗浄し、 洗浄された酸素ガスを、 路 2 3 2を通して反応塔 1 1 7へ供給するものである。 そ ©他の硫酸ミストを除去する 方法としては、 公知の方法 (特開 2 0 0 2— 1 3 6 8 2 5号公報) が挙げられる 。 また、 水に溶解した当該硫酸ミストは、 洗浄塔 1 2 0から路 2 3 1を通って吸 収塔 1 1 8へ供給され、 塩酸と同様に、 吸収工程に用いられ得る。  As described above, a part or all of the gas containing unreacted oxygen as a main component passes through the passage 230 and is supplied to the above-described circulation process. That is, a part or all of the gas containing unreacted oxygen as a main component is supplied as oxygen used in the reaction step. When sulfuric acid mist is contained in the gas supplied to the reaction step, it is preferable to remove the sulfuric acid mist. That is, in the washing tower 1 20 to which water is supplied through the path 2 40, the sulfuric acid mist is removed, the gas is washed, and the washed oxygen gas is passed through the path 2 3 2 to the reaction tower. 1 1 Supply to 7. Examples of other methods for removing sulfuric acid mist include a known method (Japanese Patent Laid-Open No. 2000-136086 25). In addition, the sulfuric acid mist dissolved in water is supplied from the washing tower 1 2 20 through the path 2 3 1 to the absorption tower 1 1 8 and can be used in the absorption step in the same manner as hydrochloric acid.

上記精製工程において、 路 2 2 9を通って排出される、 未反応の酸素を主成分 とする排ガスは、 さらに路 2 0 2を通って第 1の吸収塔 1 0 1に投入され、 本発 明の塩素ガスの除害方法に供されることになる。  In the above purification process, the exhaust gas mainly composed of unreacted oxygen discharged through the path 2 29 is further introduced into the first absorption tower 10 1 through the path 2 0 It will be used for the method of removing the chlorine gas.

吸収工程において、 路 2 3 7より排出された塩化水素と水とを主成分とする溶 液は、 当該溶液中に含まれる塩素を、 加熱、 および Ζまたは窒素等の不活性なガ スのバプリングにより除去した後に、 塩酸吸収塔 1 2 2へ投入される。 塩酸吸収 塔 1 2 2において、 塩酸濃度が調整される。 当該処理を受けた塩素は排ガス除害 塔 (図示せず) へ送出される。 また、 当該処理後の溶液は、 さらに路 2 3 4を通 つて活性炭塔 1 2 3へ投入され、 溶液中の有機不純物等が除去された後、 路 2 3 5を通って送出され、 送出された塩酸は、 電解槽の ρ Η調整、 ボイラーフィード 水の中和、 ァニリンとホルマリンの縮合転位反応および塩酸水電解の原料や、 食 品添加物等に用いることができる。 また、 路 237より排出した溶液は、 特開 2 001 - 139305号公報に記載の方法で塩化水素を回収して反応原料として 用いることも可能である。 実施例 In the absorption process, the solution mainly composed of hydrogen chloride and water discharged from the path 2 37 is heated with chlorine contained in the solution and bubbling of inert gas such as soot or nitrogen. Then, it is put into the hydrochloric acid absorption tower 1 2 2. The hydrochloric acid concentration is adjusted in the hydrochloric acid absorption tower 1 2 2. The treated chlorine is sent to an exhaust gas detoxification tower (not shown). Further, the solution after the treatment is further introduced into the activated carbon tower 1 2 3 through the path 2 3 4, and after removing organic impurities and the like in the solution, the solution is sent out through the path 2 3 5 and sent out. Hydrochloric acid is adjusted to ρ の in the electrolytic cell, boiler feed It can be used as a raw material for water neutralization, condensation rearrangement reaction of aniline and formalin, hydrochloric acid water electrolysis, food additives, and the like. Further, the solution discharged from the passage 237 can be used as a reaction raw material by recovering hydrogen chloride by the method described in JP-A-2 001-139305. Example

以下、 実施例を挙げて本発明をより詳細に説明するが、 本発明はこれらに限定 されるものではない。  Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited thereto.

<実施例 1 >  <Example 1>

メカニカルスターラー、 温度計、 ガス導入管および液導入管を備えた 500 m 1の底排付ガラス製フラスコ内に、 ガス導入管から塩素ガス、 酸素ガスおよび炭 酸ガス (体積比 2 : 1 : 1) からなる混合ガスを、 それぞれの流量が 28 Om 1 Zm i n、 140m l /m i n, 140 m 1 Zm i nとなるように導入すると同 時に、 液導入管から、 10質量%の水酸化ナトリウム水溶液および 13質量%亜 硫酸ナトリウム水溶液を、 流量がそれぞれ 25. Ommo lノ m i n、 12. 5 mmo 1 /m i nとなるように導入した。 底排部よりフラスコ内の溶液 (以下、 処理溶液という) の排出を行ないつつ、 フラスコ内の溶液量が一定になるように 液面を維持して、 フラスコ内の処理溶液の体積 (V) を供給する液流量 (v0) で除することで示される平均滞留時間て ( = V/v0) を約 30分とした。 フラ スコ内の温度は約 30°Cに維持した。 また、 処理溶液の pHは、 7〜8の範囲に 維持されていた。 通液から 3時間後における排出した処理溶液中の塩素酸ナトリ ゥム (クロレート) の濃度をイオンクロマトグラフィにより測定したところ、 3 0質量 p pm以下であった。 また、 ヨウ素滴定法により測定したところ、 次亜塩 素酸ナトリウムは不検出であった。 塩化ナトリウムの濃度は、 6. 21質量%で あった。 Chlorine gas, oxygen gas, and carbon dioxide gas (volume ratio 2: 1: 1) from a gas introduction tube into a 500m1 bottom discharge glass flask equipped with a mechanical stirrer, thermometer, gas introduction tube and liquid introduction tube ) Are introduced so that the respective flow rates are 28 Om 1 Zm in, 140 ml / min, and 140 ml 1 Zm in, and at the same time, a 10% by mass sodium hydroxide aqueous solution and A 13 mass% sodium sulfite aqueous solution was introduced so that the flow rates would be 25. Ommol / min and 12.5 mmol / min, respectively. While discharging the solution in the flask (hereinafter referred to as “treatment solution”) from the bottom drainage part, maintaining the liquid level so that the amount of solution in the flask is constant, the volume (V) of the treatment solution in the flask is reduced. The average residence time (= V / v 0 ) shown by dividing by the liquid flow rate (v 0 ) to be supplied was about 30 minutes. The temperature inside the flask was maintained at about 30 ° C. In addition, the pH of the treatment solution was maintained in the range of 7-8. The concentration of sodium chlorate (chlorate) in the discharged treatment solution 3 hours after passing through was measured by ion chromatography and found to be 30 mass ppm or less. In addition, when measured by the iodometric titration method, sodium hypochlorite was not detected. The concentration of sodium chloride was 6.21% by mass.

<比較例 1 >  <Comparative Example 1>

亜硫酸ナトリゥム水溶液を導入しないこと以外は、 実施例 1と同様にして除害 処理を行なった。 得られた処理溶液中の塩素酸ナトリウム (クロレート) の濃度 をイオンクロマトグラフィにより測定したところ、 3. 19質量%であった。 ま た、 ヨウ素滴定法により測定したところ、 次亜塩素酸ナトリウムの濃度は 6. 4 9質量%であった。 塩化ナトリウムの濃度は、 6. 57質量%であった。 次に、 当該処理溶液を、 塩素ガスを還元するのに必要な理論量の 1. 3倍の亜硫酸ナト リウム水溶液と反応させることにより、 塩素酸ナトリウムおよび次亜塩素酸ナト リウムの低減を試みた。 結果、 次亜塩素酸ナトリウムは 0質量%となったものの 、 塩素酸ナトリウム (クロレート) は、 0. 7質量%までしか低減されなかった ぐ実施例 2 > Exfoliation treatment was carried out in the same manner as in Example 1 except that no sodium sulfite aqueous solution was introduced. The concentration of sodium chlorate (chlorate) in the obtained treatment solution was measured by ion chromatography and found to be 3.19% by mass. Ma The concentration of sodium hypochlorite was 6.49% by mass as measured by the iodometric titration method. The concentration of sodium chloride was 6.57% by mass. Next, we tried to reduce sodium chlorate and sodium hypochlorite by reacting the treatment solution with 1.3 times the theoretical amount of sodium sulfite solution required to reduce chlorine gas. . As a result, sodium hypochlorite was 0% by mass, but sodium chlorate (chlorate) was only reduced to 0.7% by mass. Example 2>

図 1に示される装置と同様の装置を用いて、 本発明の効果を確認した。 説明を わかりやすくするため、 図 1を参照して説明する。 直径 30mm、 高さ 300m mの第 1の吸収塔 10 1 (ガラス製、 充填物 6 mm磁性ラシヒリング) 内に、 塩 素ガス、 炭酸ガスおよび空気からなる混合ガスを、 それぞれの流量が 130m 1 /m i n ( 5. 8 mm o 1 /m i n) 、 260m l Zm i n、 60m l Zm i n となるように、 路 202から連続的に供給すると同時に、 路 201から 1 1質量 %の水酸化ナトリウム水溶液および 13質量%の亜硫酸ナトリウム水溶液を、 そ れぞれの流量が 12. 76mmo lZm i n、 6. 38 mm o 1 Zm i nとなる ように連続的に供給した。 これらはそれぞれ塩素ガスを中和するのに必要な理論 量の 1. 1倍、 塩素ガスを還元するのに必要な理論量の 1. 1倍に相当する量で ある。 なお、 第 1の吸収塔 101の底部のジャケットに冷却水を流し、 第 1の吸 収塔 101内の処理溶液温度が約 30°Cになるようにした。  The effect of the present invention was confirmed using an apparatus similar to the apparatus shown in FIG. To make the explanation easier to understand, refer to FIG. In the first absorption tower 10 1 (made of glass, packed 6 mm magnetic Raschig ring) with a diameter of 30 mm and a height of 300 mm, a mixed gas consisting of chlorine gas, carbon dioxide gas and air is supplied at a flow rate of 130 m 1 / min (5.8 mm o 1 / min), 260 ml l Zm in, 60 ml l Zm in, so as to continuously feed from the path 202 and simultaneously from the path 201 to 11 mass% sodium hydroxide aqueous solution and 13 A mass% aqueous sodium sulfite solution was continuously fed so that the respective flow rates were 12.76 mmol Zmin and 6.38 mmol 1 Zmin. These amounts are equivalent to 1.1 times the theoretical amount necessary to neutralize chlorine gas and 1.1 times the theoretical amount necessary to reduce chlorine gas, respectively. The cooling water was allowed to flow through the jacket at the bottom of the first absorption tower 101 so that the temperature of the treatment solution in the first absorption tower 101 was about 30 ° C.

一方、 第 1の吸収塔 1 01に接続された直径 30mm、 高さ 300 mmの第 2 の吸収塔 102 (ガラス製、 充填物 6mm磁性ラシヒリング) 内には、 路 206 から 3質量%の水酸化ナトリゥム水溶液および 5質量%の亜硫酸ナトリゥム水溶 液を、 それぞれの流量が 1. S Smmo l Zm i r 0. 64mmo 1 /m i n となるように連続的に供給した。 これらはそれぞれ塩素ガスを中和するのに必要 な理論量の 0. 1倍、 塩素ガスを還元するのに必要な理論量の 0. 1倍に相当す る量である。 同様に、 第 2の吸収塔 102の底部のジャケットに冷却水を流し、 第 2の吸収塔 102内の処理溶液温度が約 30°Cになるようにした。  On the other hand, in the second absorption tower 102 (made of glass, packing 6 mm magnetic Raschig ring) with a diameter of 30 mm and a height of 300 mm connected to the first absorption tower 101, 3% by mass of hydroxide from the path 206 An aqueous sodium solution and an aqueous 5% by mass aqueous sodium sulfite solution were continuously fed so that the respective flow rates were 1. S Smmol Zmir 0. 64 mmo 1 / min. These amounts are equivalent to 0.1 times the theoretical amount necessary to neutralize chlorine gas and 0.1 times the theoretical amount necessary to reduce chlorine gas, respectively. Similarly, cooling water was passed through the jacket at the bottom of the second absorption tower 102 so that the temperature of the treatment solution in the second absorption tower 102 was about 30 ° C.

混合ガスと、 第 1の吸収塔 101において水酸化ナトリウム水溶液および亜硫 2 酸ナトリゥム水溶液との反応により生成した処理溶液は、 ポンプ P 1を用いて第 1の吸収塔 1 0 1に戻して循環させた。 同様に、 第 2の吸収塔 1 0 2において水 酸化ナトリゥム水溶液および亜硫酸ナトリウム水溶液との反応により生成した処 理溶液は、 ポンプ P 2を用いて第 1の吸収塔 1 0 1または第 2の吸収塔 1 0 2に 戻して循環させた。 このようにして第 1の吸収塔 1 0 1および第 2の吸収塔 1 0 2内で反応を行なうとともに、 処理溶液を連続的に循環させた。 The mixed gas and the aqueous sodium hydroxide solution and sulfurous acid in the first absorption tower 101 2 The treatment solution produced by the reaction with the aqueous sodium acid solution was circulated back to the first absorption tower 100 1 using the pump P 1. Similarly, the treatment solution generated by the reaction with the aqueous sodium hydroxide solution and the sodium sulfite aqueous solution in the second absorption tower 102 is used as the first absorption tower 101 or the second absorption water using the pump P2. It was returned to Tower 1 0 2 and circulated. In this way, the reaction was carried out in the first absorption tower 101 and the second absorption tower 102, and the treatment solution was continuously circulated.

また、 混合ガスならびに水酸化ナトリゥムおよび亜硫酸ナトリゥムの供給を行 なうとともに、 路 2 1 0より装置内の処理溶液の一部を排出し、 装置内の溶液量 が一定になるようにして、 装置内の処理溶液の体積 (V ) を供給する液流量 (V 。) で除することで示される平均滞留時間て ( = V / v 0 ) を約 3 0分とした。 通 液から 3時間後における排出した処理溶液中の塩素酸ナトリウム (クロレート) の濃度をイオンクロマトグラフィにより測定したところ、 3 0質量] p p m以下で あった。 また、 ヨウ素滴定法により測定したところ、 次亜塩素酸ナトリウムは検 出されなかった。 処理溶液の p Hは、 7 . 3であった。 In addition, while supplying mixed gas, sodium hydroxide and sodium sulfite, a part of the processing solution in the apparatus is discharged from the path 210, so that the amount of solution in the apparatus becomes constant, The average residence time (= V / v 0 ) shown by dividing the volume (V) of the treatment solution by the liquid flow rate (V) to be supplied was about 30 minutes. The concentration of sodium chlorate (chlorate) in the discharged treatment solution 3 hours after passing through the solution was measured by ion chromatography and found to be 30 mass] ppm or less. In addition, sodium hypochlorite was not detected when measured by the iodometric titration method. The pH of the treatment solution was 7.3.

<比較例 2 >  <Comparative Example 2>

亜硫酸ナトリウム水溶液を第 1の吸収塔 1 0 1および第 2の吸収塔 1 0 2内に 供給しないこと以外は、 実施例 2と同様にして除害処理を行なった。 得られた処 理溶液中の塩素酸ナトリウム (クロレート) の濃度をイオンクロマトグラフィに より測定したところ、 2 . 5質量%であった。 また、 ヨウ素滴定法により測定し たところ、 次亜塩素酸ナトリウムの濃度は 5 . 0質量%であった。 処理溶液の p Hは、 7 . 3であった。  Detoxification treatment was performed in the same manner as in Example 2 except that the sodium sulfite aqueous solution was not supplied into the first absorption tower 101 and the second absorption tower 102. The concentration of sodium chlorate (chlorate) in the processing solution obtained was measured by ion chromatography and found to be 2.5% by mass. The concentration of sodium hypochlorite was 5.0% by mass as measured by an iodometric titration method. The pH of the treatment solution was 7.3.

以上のように、 本発明の塩素ガスの除害方法によれば、 クロレートをほとんど 発生させることなく、 塩素ガスを効率的に除去することができる。 このように、 p mオーダーまでクロレートを低減することは、 次亜塩素酸塩を生成させた後 に亜硫酸塩等を用いて処理する方法では通常成し得ないことである。  As described above, according to the chlorine gas detoxification method of the present invention, chlorine gas can be efficiently removed with almost no chlorate being generated. Thus, reducing chlorate to the pm order is usually not possible with the method of using hyposulfite and the like after forming hypochlorite.

今回開示された実施の形態および実施例はすべての点で例示であって制限的な ものではないと考えられるべきである。 本発明の範囲は上記した説明ではなくて 特許請求の範囲によって示され、 特許請求の範囲と均等の意味および範囲内での すべての変更が含まれることが意図される。 産業上の利用可能性 It should be understood that the embodiments and examples disclosed herein are illustrative and non-restrictive in every respect. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims. Industrial applicability

本発明の塩素の除害方法によれば、 クロレートをほとんど発生させる 、 効率的に塩素ガスを除害することができる。  According to the chlorine detoxification method of the present invention, chlorine gas can be efficiently detoxified while almost all chlorate is generated.

Claims

請 求 の 範 囲 The scope of the claims 排ガス中に含まれる塩素ガスを除害する方法であって、 A method for removing chlorine gas contained in exhaust gas, 前記塩素ガスに、 前記塩素ガスを中和するのに必要な理論量の 1 . 0〜 1. 2 倍の水酸化ナトリウムと、 前記塩素ガスを還元するのに必要な理論量の 1. 0〜 1. 2倍の亜硫酸塩および/または亜硫酸水素塩と、 を作用させて 、 前記塩素ガ スを除去する工程を含むことを特徵とする塩素ガスの除害方法。  To the chlorine gas, 1.0 to 1.2 times the theoretical amount necessary to neutralize the chlorine gas, and 1.0 to the theoretical amount necessary to reduce the chlorine gas 1. A chlorine gas detoxification method characterized by including a step of removing the chlorine gas by reacting with double sulfite and / or bisulfite. 2. 2. 第 1の吸収塔に、 前記排ガスを供給するとともに、 下記水溶液 (a l) ならび に下記水溶液 (a 2) を供給する工程 (A) を含むことを特徴とする請求の範囲 第 1項に記載の塩素ガスの除害方法。  2. The method according to claim 1, further comprising a step (A) of supplying the exhaust gas to the first absorption tower and supplying the following aqueous solution (al) and the following aqueous solution (a 2). How to remove chlorine gas. 水溶液 (a l) :前記塩素ガスを中和するのに必要な理論量の 1. 0~ 1。 2倍 の水酸化ナトリウムの水溶液。 Aqueous solution (a l): 1.0 to 1 of the theoretical amount necessary to neutralize the chlorine gas. Double aqueous solution of sodium hydroxide. 水溶液 (a 2) :前記塩素ガスを還元するのに必要な理論量の 1. 0〜1. 2倍 の亜硫酸塩および Zまたは亜硫酸水素塩の水溶液。 Aqueous solution (a 2): 1.0 to 1.2 times the theoretical amount required to reduce the chlorine gas, and an aqueous solution of sulfite and Z or bisulfite. 3. 3. 前記第 1の吸収塔に接続された第 2の吸収塔に、 前記工程 (A) を経た排ガス が供給されるとともに、 下記水溶液 (b l) ならびに下記水溶液 (b 2) を供給 する工程 (B) を含むことを特徴とする請求の範囲第 2項に記載の塩素ガスの除 害方法。  Step (B) of supplying the following aqueous solution (bl) and the following aqueous solution (b 2) to the second absorption tower connected to the first absorption tower while supplying the exhaust gas after the step (A) The method for removing chlorine gas according to claim 2, comprising: 水溶液 (b l) :前記塩素ガスを中和するのに必要な理論量の 0. 00 1〜0. 2倍の水酸化ナトリウムの水溶液。 Aqueous solution (b l): An aqueous solution of sodium hydroxide in an amount of 0.001 to 0.2 times the theoretical amount necessary to neutralize the chlorine gas. 水溶液 (b 2) :前記塩素ガスを還元するのに必要な理論量の 0. 00 1〜0. 2倍の亜硫酸塩およびノまたは亜硫酸水素塩の水溶液。 Aqueous solution (b2): Aqueous solution of sulfite and hydrogen or bisulfite, 0.001 to 0.2 times the theoretical amount necessary to reduce the chlorine gas. 4 前記排ガスは、 塩素ガスおよび炭酸ガスを含み、 前記塩素ガスを選択的に除去 することを特徴とする請求の範囲第 1〜 3項のいずれかに記載の塩素ガスの除害 方法。 Four 4. The chlorine gas detoxifying method according to claim 1, wherein the exhaust gas contains chlorine gas and carbon dioxide gas, and the chlorine gas is selectively removed. 5 . Five . 前記塩素ガスと、 水酸化ナトリウムならびに亜硫酸塩および/または亜硫酸水 素塩との作用は、 1 0〜4 0 °Cの範囲で行なわれることを特徵とする請求の範囲 第 1〜 3項のいずれかに記載の塩素ガスの除害方法。  The action of the chlorine gas, sodium hydroxide and sulfite and / or sulfite hydrate is carried out in the range of 10 to 40 ° C. A method for removing chlorine gas according to any one of the above.
PCT/JP2007/069789 2006-10-03 2007-10-03 Method for removal of chlorine gas Ceased WO2008041781A1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111298603A (en) * 2020-03-12 2020-06-19 江苏维尤纳特精细化工有限公司 Hydrogen chloride detection processing equipment for chlorothalonil production line and processing technology thereof
CN115353175A (en) * 2022-09-05 2022-11-18 常州大学 Organic wastewater treatment device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4962378A (en) * 1972-10-18 1974-06-17
JPS49106989A (en) * 1973-02-17 1974-10-11
JPH03131319A (en) * 1989-07-01 1991-06-04 Hoechst Ag Method of absorbing chlorine selectively from carbon dioxide containing waste gas
JP2004158730A (en) * 2002-11-08 2004-06-03 Canon Inc Gas treatment method
JP2005305414A (en) * 2004-10-15 2005-11-04 Sumitomo Chemical Co Ltd How to remove chlorine gas

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4962378A (en) * 1972-10-18 1974-06-17
JPS49106989A (en) * 1973-02-17 1974-10-11
JPH03131319A (en) * 1989-07-01 1991-06-04 Hoechst Ag Method of absorbing chlorine selectively from carbon dioxide containing waste gas
JP2004158730A (en) * 2002-11-08 2004-06-03 Canon Inc Gas treatment method
JP2005305414A (en) * 2004-10-15 2005-11-04 Sumitomo Chemical Co Ltd How to remove chlorine gas

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111298603A (en) * 2020-03-12 2020-06-19 江苏维尤纳特精细化工有限公司 Hydrogen chloride detection processing equipment for chlorothalonil production line and processing technology thereof
CN115353175A (en) * 2022-09-05 2022-11-18 常州大学 Organic wastewater treatment device
CN115353175B (en) * 2022-09-05 2023-07-25 常州大学 A treatment device for organic wastewater

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